Liquid discharge apparatus, control method, substrate processing apparatus, and method of manufacturing article

Abstract

To provide a technique advantageous for adjusting a discharge speed and a discharge amount of liquid discharged from each of a plurality of nozzles.SOLUTION: A liquid discharge apparatus that discharges a liquid includes: a discharge head that includes a plurality of nozzles that discharge the liquid and a piezoelectric element that is provided in each of the plurality of nozzles and to which a drive signal is applied; and a control unit that determines, for each of the plurality of nozzles, the drive signal so as to adjust the discharge speed and the discharge amount of the liquid discharged from the nozzle to a target range based on a function indicating a correlation between the discharge speed and the discharge amount of the liquid discharged from the nozzle, wherein the control unit obtains an influence degree of a pressure fluctuation in a space between the nozzles due to driving of the piezoelectric element on the discharge speed and the discharge amount of the liquid, and corrects the function based on the influence degree.SELECTED DRAWING: Figure 6

Description

[Technical Field]

[0001] The present invention relates to a liquid ejection apparatus, a control method, a substrate processing apparatus, and a method for manufacturing an article. [Background technology]

[0002] Liquid ejection devices such as inkjet devices are generally configured to apply kinetic energy to liquid using an energy-generating element such as a piezoelectric element to eject the liquid from a nozzle. Recently, liquid ejection devices have become known that include a liquid ejection head that includes multiple pressure chambers, each equipped with a piezoelectric element, and multiple nozzles individually connected to each of the multiple pressure chambers, and that can independently control the ejection of liquid from each nozzle. In such liquid ejection devices, the multiple pressure chambers are connected to a common liquid chamber that stores the liquid.

[0003] Because each pressure chamber has manufacturing errors (dimensional variations), even if a drive signal with the same waveform is applied to each piezoelectric element, variations may occur in at least one of the ejection speed and ejection amount of the liquid ejected from the nozzle. Such variations in ejection characteristics can cause quality degradation, such as uneven concentration or streaks in the liquid when the liquid is supplied to an object such as a substrate or recording medium.

[0004] Therefore, a technique for suppressing variations in the ejection characteristics of a liquid ejection head has been proposed (see Patent Document 1). Patent Document 1 discloses a technique for adjusting either the voltage or the pulse width of a drive signal applied to each of a plurality of piezoelectric elements so that variations in the ejection speed and ejection amount of liquid ejected from each nozzle are corrected. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] Patent No. 3835532 Summary of the Invention [Problem to be solved by the invention]

[0006] Conventional technology can correct the ejection speed and ejection volume of liquid ejected from each nozzle by adjusting the voltage and pulse width of the drive signal for each nozzle. However, the relationship between the voltage and pulse width of the drive signal and the ejection speed and ejection volume of liquid ejected from a nozzle can vary significantly depending on whether or not nearby nozzles are operating. This is because in liquid ejection heads, pressure waves from piezoelectric elements propagate through the liquid chamber, causing unstable ejection of liquid from nearby nozzles, a phenomenon known as crosstalk.

[0007] The present invention has been made in view of the problems with the conventional technology, and has as its exemplary object to provide a technique that is advantageous for adjusting the ejection speed and ejection amount of liquid ejected from each of a plurality of nozzles. [Means for solving the problem]

[0008] In order to achieve the above-mentioned object, one aspect of the present invention provides a liquid ejection device that ejects liquid, comprising an ejection head including a plurality of nozzles that eject the liquid, and piezoelectric elements provided in each of the plurality of nozzles and to which a drive signal is applied, and a control unit that determines the drive signal for each of the plurality of nozzles based on a function that indicates the correlation between the ejection speed and ejection amount of the liquid ejected from the nozzle so as to adjust the ejection speed and ejection amount of the liquid ejected from the nozzle to within a target range, wherein the control unit determines the degree of influence that pressure fluctuations in the space between the nozzles due to driving of the piezoelectric elements have on the ejection speed and ejection amount of the liquid, and corrects the function based on the degree of influence.

[0009] Further objects and other aspects of the present invention will become apparent from the following description of the embodiments with reference to the accompanying drawings. [Effects of the Invention]

[0010] According to the present invention, for example, it is possible to provide a technique that is advantageous for adjusting the ejection speed and ejection amount of liquid ejected from each of a plurality of nozzles. [Brief explanation of the drawings]

[0011] [Figure 1] 1 is a diagram schematically illustrating a configuration of a liquid ejection device according to one aspect of the present invention. [Figure 2] FIG. 2 is a diagram schematically illustrating the configuration of a discharge head. [Figure 3] FIG. 3 is a diagram schematically showing a drive signal applied to a piezoelectric element. [Figure 4] 10 is a flowchart illustrating a basic correction process for ejection variations of an ejection head. [Figure 5] FIG. 1 is a diagram for explaining the concept of crosstalk. [Figure 6] 10 is a flowchart for explaining an outline of a correction process for correcting ejection variations of the ejection head. [Figure 7] 10 is a flowchart for explaining a specific example of correction processing when there is no influence of crosstalk. [Figure 8] FIG. 8 is a diagram schematically illustrating the calculation process in steps S303 to S305 shown in FIG. 7. [Figure 9] 10 is a flowchart illustrating a specific example of correction processing when there is an influence of crosstalk. [Figure 10] FIG. 10 is a diagram specifically illustrating steps S401 and S402 shown in FIG. [Figure 11] 10 is a flowchart illustrating a specific example of correction processing when there is an influence of crosstalk. [Figure 12] FIG. 12 is a diagram specifically illustrating step S501 shown in FIG. [Figure 13] 10 is a flowchart for explaining a specific example of correction processing in the fourth embodiment. [Figure 14] FIG. 14 is a diagram specifically illustrating step S601 shown in FIG. [Figure 15] 13 is a flowchart for explaining a specific example of correction processing in the fifth embodiment. DETAILED DESCRIPTION OF THE INVENTION

[0012] Hereinafter, embodiments will be described in detail with reference to the accompanying drawings. Note that the following embodiments do not limit the invention according to the claims. Although multiple features are described in the embodiments, not all of these multiple features are necessarily essential to the invention, and multiple features may be combined arbitrarily. Furthermore, in the accompanying drawings, the same reference numerals are used to designate the same or similar components, and redundant explanations will be omitted.

[0013] In the following description, directions are indicated using the XYZ coordinate system, which is a Cartesian coordinate system. The X, Y, and Z axes are perpendicular to each other. The direction along the X axis is referred to as the X direction, the direction along the Y axis as the Y direction, and the direction along the Z axis as the Z direction. For example, the positive direction of the X axis refers to the direction indicated by the X axis arrow in the XYZ coordinate system, and the negative direction of the X axis refers to the direction opposite to the direction indicated by the X axis arrow in the XYZ coordinate system. When simply referred to as the X direction, it refers to the direction parallel to the X axis, regardless of the direction indicated by the X axis arrow in the XYZ coordinate system. The same applies to the Y and Z axes other than the X axis. The plane containing the X and Y axes is referred to as the XY plane. The negative direction of the Z axis is also the direction of gravity, and the X and Y directions are also horizontal.

[0014] In this embodiment, the term "liquid" refers to a liquid (ink) used to form a pattern (characters, images, etc.) or a film on an object such as a substrate or a recording medium. The components of the "liquid" are not particularly limited, but for example, a liquid containing a solute and a solvent for forming a functional thin film such as an electrode or an optical filter, or a functional element such as an organic EL element can be used.

[0015] In this embodiment, the act of discharging and supplying (applying) a liquid to an object may be referred to as "recording," but this is not necessarily limited to recording information such as characters or images. For example, "recording" also includes supplying a liquid to an object in order to manufacture an article such as a functional thin film, a functional element, or a three-dimensional object. Furthermore, the object to which the liquid is supplied is not limited to a recording medium for recording information such as characters or images, but also includes a component, such as a substrate, that serves as a base material for manufacturing an article such as a functional thin film, a functional element, or a three-dimensional object.

[0016] Figures 1(a) and 1(b) are diagrams that schematically show the configuration of a liquid ejection device 1 according to one aspect of the present invention. Figure 1(a) shows a top view of the liquid ejection device 1, and Figure 1(b) shows a side view of the liquid ejection device 1. Note that Figures 1(a) and 1(b) show only some of the components of the liquid ejection device 1.

[0017] In this embodiment, the liquid ejection device 1 is embodied as an inkjet device that ejects liquid. However, the liquid ejection device 1 may also be embodied as a substrate processing apparatus that processes substrates for display panels or semiconductors. In this case, the liquid ejection device 1 ejects liquid onto the substrate to form a liquid pattern or film on the substrate.

[0018] The liquid ejection device 1 has an ejection head 3, a main scanner 4, a main scanning guide rail 5, a sub-scanning guide rail 7, a support member 8, a base 9, a stage 10, a supply path 11, a discharge path 12, a liquid tank 25, and a control unit CU.

[0019] The target object 6 is an object to which the liquid ejected from the ejection head 3 is supplied, and is placed at a predetermined position on the stage 10. The stage 10 is a holding unit that holds the target object 6, and is fixed to a base 9.

[0020] The main scanning guide rail 5 extends along the Y direction, which is the main scanning direction. The sub scanning guide rail 7 extends along the X direction, which is the sub scanning direction. The support member 8 supports the sub scanning guide rail 7.

[0021] The ejection head 3 includes a plurality of nozzles arranged along the sub-scanning direction (X direction) so as to face the object 6 held by the stage 10. The ejection head 3 is fixed to the main scanner 4 and is freely scanned in a plane parallel to the XY plane at a height (position) a predetermined distance away from the object 6 in the Z direction. Note that, to scan the ejection head 3 relative to the object 6, the ejection head 3 and the object 6 may be moved relative to each other; for example, the ejection head 3 may be fixed and the object 6 may be moved. Liquid is supplied to the ejection head 3 from a liquid tank 25 that stores the liquid via a supply path 11. Liquid that is not ejected from the ejection head 3 is returned to the liquid tank 25 from the ejection head 3 via a discharge path 12.

[0022] The control unit CU is configured, for example, by a computer (information processing device) including a CPU, memory, etc., and controls the entire liquid ejection device 1. The control unit CU controls each part of the liquid ejection device 1 to operate the liquid ejection device 1 in accordance with a program stored in the memory.

[0023] An example of the configuration of the ejection head 3 will be described with reference to Fig. 2. Fig. 2 is a diagram schematically illustrating the configuration of the ejection head 3. As described above, the ejection head 3 includes a plurality of nozzles 31 for ejecting liquid. Each of the plurality of nozzles 31 communicates (is connected to) a common liquid chamber 33 that stores liquid supplied from a liquid tank 25 via a flow path 32. Liquid is supplied to each nozzle 31 from the common liquid chamber 33 via the flow path 32. In other words, the common liquid chamber 33 can simultaneously supply liquid to each nozzle 31 via the flow path 32.

[0024] A piezoelectric element 34 such as a piezo element is provided near (above) each nozzle 31. By applying (giving) a drive signal to the piezoelectric element 34, a pressure chamber 36, which is the space between the piezoelectric element 34 and the nozzle 31, is pressurized, and liquid 35 (droplets) are ejected from the nozzle 31.

[0025] 3(a), 3(b), and 3(c) are diagrams schematically illustrating drive signals applied to the piezoelectric element 34. The drive signals illustrated in FIGS. 3(a), 3(b), and 3(c) are signals for driving the piezoelectric element 34, and are generated, for example, by (a signal generating circuit included in) the control unit CU. As illustrated in FIGS. 3(a) to 3(c), the drive signal includes two or more parameters including at least a first parameter and a second parameter, and in this embodiment, includes a voltage V as the first parameter and a pulse width P as the second parameter. Note that the voltage V is also the pulse amplitude.

[0026] The drive signal shown in Fig. 3(a) is defined by a trapezoidal drive waveform, and the drive signal shown in Fig. 3(b) is defined by a rectangular drive waveform. The drive waveforms that define the drive signals shown in Fig. 3(a) and Fig. 3(b) are called PULL-PUSH waveforms, and the drive waveform that defines the drive signal shown in Fig. 3(b) is called PULL-PUSH-PULL waveform.

[0027] 3(a), 3(b), and 3(c), the drive waveform defining the drive signal includes a rising portion 42, a hold portion 43, and a falling portion 44. The rising portion 42 is a portion that rises from a first potential V1 to a second potential V2 (>V1) different from the first potential V1. The hold portion 43 is a portion that maintains a constant potential, i.e., the second potential V2, after the rising portion 42. The falling portion 44 is a portion that falls from the second potential V2 to the first potential V1 after the hold portion 43. The first potential V1 is a reference potential, such as ground potential. The second potential V2 is the peak potential of the pulse.

[0028] In the rising portion 42, a forced displacement is applied to the piezoelectric element 34 in a direction that increases the volume of the pressure chamber 36, generating a negative pressure in the pressure chamber 36. After passing through the hold portion 43, at the timing when the pressure reverses and rises due to the reaction force, in the falling portion 44, a forced displacement is applied to the piezoelectric element 34 in a direction that contracts the volume of the pressure chamber 36, efficiently pressurizing the liquid. Therefore, if the time width from the timing at which the drive signal starts to rise to the timing at which it starts to fall deviates significantly from the resonance period of the pressure chamber 36, the liquid cannot be efficiently pressurized, and the ejection of the liquid 35 from the nozzle 31 becomes unstable. For this reason, it is preferable to set the time width from the timing at which the drive signal starts to rise to the timing at which it starts to fall to a range of ¼ to ¾ of the resonance period of the pressure chamber 36.

[0029] Furthermore, it is possible to select a drive waveform for the drive signal that is individually adjusted for each piezoelectric element 34 and / or each liquid 35 (droplet) ejected from the nozzle 31. Specifically, it is possible to adjust the drive waveform by individually setting the value of the voltage V (value of the first parameter) that is the potential of the hold portion 43 and the value of the pulse width P (value of the second parameter) that is the time width of the hold portion 43.

[0030] In the liquid ejection device 1, variations may occur in the ejection characteristics of each nozzle 31, i.e., in at least one of the ejection speed and ejection amount of the liquid 35 ejected from each nozzle, due to manufacturing errors of each nozzle 31, for example, each pressure chamber 36, in the ejection head 3. In this case, it is necessary to correct the variations in the ejection characteristics of each nozzle 31 in the ejection head 3, as this can cause deterioration in the quality of articles manufactured from the target object 6 to which the liquid 35 is supplied. Therefore, a correction process for correcting the variations in the ejection characteristics of each nozzle 31 in the ejection head 3 (hereinafter referred to as "ejection variations of the ejection head 3") will be described below.

[0031] First, a basic correction process for the ejection variation of the ejection head 3 will be described with reference to Fig. 4. This correction process is executed by the control unit CU comprehensively controlling each part of the liquid ejection device 1, and corrects the ejection variation of the ejection head 3 by adjusting the drive waveform (voltage V and pulse width P) of the drive signal applied to each piezoelectric element 34.

[0032] In S101, a first drive signal is applied to each piezoelectric element 34 provided for each nozzle 31, and the velocity and volume of the liquid 35 ejected from each nozzle 31, i.e., the ejection velocity and ejection amount of each nozzle 31, are obtained. At this time, the first drive signal applied to each piezoelectric element 34 may be a common drive signal for all nozzles 31, or may be a drive signal that corrects for variations in the dimensions of the pressure chambers 36 and variations in the characteristics of the piezoelectric elements 34 for each nozzle 31. Furthermore, the first drive signal is defined by a trapezoidal or rectangular drive waveform and may be a drive signal called a PULL-PUSH waveform (FIGS. 3(a) and 3(b)), or a drive signal called a PULL-PUSH-PULL waveform (FIG. 3(c)).

[0033] In S102, the change rate of the ejection speed and ejection volume of a representative nozzle among the plurality of nozzles 31 when the drive signal applied to the representative nozzle is changed is acquired. Specifically, a second drive signal is applied to the piezoelectric element 34 provided for the representative nozzle among the plurality of nozzles 31 to acquire the velocity and volume of the liquid 35 ejected from the representative nozzle, i.e., the ejection speed and ejection volume of the representative nozzle. The ejection speed and ejection volume of the representative nozzle are then compared with the ejection speed and ejection volume of each nozzle 31 acquired in S101 to determine the change rate of the ejection speed and ejection volume of the representative nozzle. Here, the change rate is a function that indicates the correlation between the ejection speed and ejection volume of the liquid 35 ejected from the representative nozzle. Note that the second drive signal applied to the representative nozzle is a drive signal different from the first drive signal, for example, a drive signal obtained by changing the drive waveform of the first drive signal. Furthermore, the representative nozzle is the nozzle used to eject the liquid 35. The representative nozzle may be at least one of the plurality of nozzles 31, and may be, for example, a nozzle located at an end in the sub-scanning direction, or a nozzle located in the center.

[0034] In S103, the drive signal applied to each piezoelectric element 34 provided for each nozzle 31 is adjusted (set). Specifically, based on the rate of change in the discharge speed and discharge amount of the representative nozzle acquired in S102, the drive signal applied to each piezoelectric element 34 is adjusted so that the discharge speed and discharge amount of the liquid 35 discharged from each nozzle 31 become the target discharge speed and target discharge amount.

[0035] In S104, the drive signal adjusted in S103 is applied to each piezoelectric element 34 provided for each nozzle 31, and the speed and volume of the liquid 35 ejected from each nozzle 31, i.e., the ejection speed and ejection amount of each nozzle 31, are confirmed. If the ejection speed and ejection amount of each nozzle 31 have not been adjusted to be within an allowable range (target range) for the target ejection speed and target ejection amount, the drive signal applied to each piezoelectric element 34 is readjusted. On the other hand, if the ejection speed and ejection amount of each nozzle 31 have been adjusted to be within an allowable range for the target ejection speed and target ejection amount, the process of correcting the ejection variation of the ejection head 3 is completed.

[0036] Although the basic correction process for correcting the ejection variations of the ejection head 3 has been described, in actual operation, the rate of change in the ejection speed and ejection volume differs for each nozzle due to the influence of crosstalk. Figure 5 is a diagram illustrating the concept of crosstalk. For example, when liquid 35 is ejected from nozzle 31a of the ejection head 3, a pressure wave 37 from a piezoelectric element 34 provided for nozzle 31a propagates through the common liquid chamber 33 to nozzle 31b adjacent to nozzle 31a. The pressure wave 37 from the piezoelectric element 34 also propagates to nozzle 31c, which is two nozzles away from nozzle 31a. However, the pressure wave attenuates depending on the distance of the propagation path, and its influence is less than that of nozzle 31b. This phenomenon, in which pressure fluctuations (interference) in the spaces between nozzles (such as the flow paths 32 and the common liquid chamber 33) caused by the driving of the piezoelectric element 34 affect the ejection speed and ejection volume of liquid 35 ejected from the nozzles, is referred to as crosstalk.

[0037] The discharge speed and discharge amount (discharge characteristics) of the liquid 35 discharged from the nozzle 31 by driving the piezoelectric element 34 are significantly affected by crosstalk, and therefore it is necessary to correct the discharge variation of the discharge head 3 while taking this effect into consideration. In order to reduce the effects of crosstalk, when discharging the liquid 35 from the nozzle 31a, it is preferable not to discharge the liquid 35 from the nozzle 31b adjacent to the nozzle 31a, which is more affected by crosstalk. On the other hand, from the viewpoint of productivity, it is preferable to operate as many nozzles 31 as possible at a high frequency. Therefore, a correction process is required to correct the discharge variation of the discharge head 3 while taking the effects of crosstalk into consideration.

[0038] First Embodiment An overview of the correction process for correcting ejection variations of the ejection head 3 in this embodiment will be described with reference to Fig. 6. The correction process in this embodiment is executed by the control unit CU comprehensively controlling each part of the liquid ejection device 1. Furthermore, like the basic correction process, the correction process in this embodiment corrects ejection variations of the ejection head 3 by adjusting the drive waveform (voltage V and pulse width P) of the drive signal applied to each piezoelectric element 34.

[0039] In S201, similar to S101, a first drive signal is applied to each piezoelectric element 34 provided for each nozzle 31, and the velocity and volume of the liquid 35 ejected from each nozzle 31, i.e., the ejection velocity and ejection amount of each nozzle 31, are obtained.

[0040] In S202, similar to S102, for a representative nozzle of the plurality of nozzles 31, the rate of change in the ejection speed and ejection amount of the representative nozzle when the drive signal applied to the representative nozzle is changed is acquired.

[0041] In S203, for each of the plurality of nozzles 31, the degree of influence (crosstalk influence) of pressure fluctuation in the space between the nozzles due to driving of the piezoelectric element 34, i.e., crosstalk, on the ejection speed and ejection amount of the liquid 35 ejected from the nozzle 31 is calculated.

[0042] In S203, the specific method for calculating the crosstalk influence degree is not limited. For example, the crosstalk influence degree on each nozzle 31 is calculated using the discharge speed and discharge amount of the liquid 35 discharged from each nozzle 31 acquired in S201. Specifically, the discharge speed and discharge amount of the liquid 35 discharged from each nozzle 31 in a state where the liquid 35 is not discharged from adjacent nozzles and the influence of crosstalk is not occurring are set to the discharge speed and discharge amount acquired in S201. Next, the liquid 35 is discharged from the adjacent nozzle, that is, in a state where the influence of crosstalk is occurring, a first drive signal is applied to each piezoelectric element 34 provided for each nozzle 31, and the discharge speed and discharge amount of the liquid 35 discharged from each nozzle 31 are acquired. Then, by comparing the discharge speed and discharge amount in a state where the influence of crosstalk is not occurring with the discharge speed and discharge amount in a state where the influence of crosstalk is occurring, the influence of crosstalk can be quantified, that is, the crosstalk influence degree can be calculated. For example, the difference between the ejection speed and ejection amount when there is no crosstalk effect and the ejection speed and ejection amount when there is a crosstalk effect is calculated as the degree of crosstalk effect.

[0043] In S204, the change rates of the ejection speed and ejection volume of the representative nozzle obtained in S202 are corrected based on the crosstalk influence degree calculated in S203. Specifically, the change rates of the ejection speed and ejection volume of the representative nozzle are corrected according to the stroke influence degree of each nozzle 31.

[0044] In S205, the drive signal applied to each piezoelectric element 34 provided for each nozzle 31 is adjusted (set). Specifically, based on the rate of change in the discharge speed and discharge amount of the representative nozzle corrected in S204, the drive signal applied to each piezoelectric element 34 is adjusted so that the discharge speed and discharge amount of the liquid 35 discharged from each nozzle 31 become the target discharge speed and target discharge amount.

[0045] In S206, the drive signal adjusted in S205 is applied to each piezoelectric element 34 provided for each nozzle 31, and the speed and volume of the liquid 35 ejected from each nozzle 31, i.e., the ejection speed and ejection amount of each nozzle 31, are confirmed. If the ejection speed and ejection amount of each nozzle 31 have not been adjusted to be within an allowable range (target range) for the target ejection speed and target ejection amount, the drive signal applied to each piezoelectric element 34 is readjusted. On the other hand, if the ejection speed and ejection amount of each nozzle 31 have been adjusted to be within an allowable range for the target ejection speed and target ejection amount, the process of correcting the ejection variation of the ejection head 3 is completed.

[0046] As described above, in this embodiment, when there is the influence of crosstalk, the degree of crosstalk influence is calculated for each nozzle 31 of the ejection head 3. Then, based on the degree of crosstalk influence of each nozzle 31, corrections are made to the rate of change in the ejection speed and ejection amount of the representative nozzle, thereby correcting the variation in the ejection characteristics of each nozzle 31 with high precision. Therefore, this embodiment can provide a technique that is advantageous for adjusting the ejection speed and ejection amount of the liquid 35 ejected from each of the multiple nozzles 31, even when there is the influence of crosstalk.

[0047] Furthermore, in this embodiment, the drive signal is adjusted (determined) using the voltage V and pulse width P of the drive signal as parameters, but this is not limiting, and the drive signal may be adjusted using other parameters. For example, the drive signal may be adjusted using the slope of the rising portion 42 or the falling portion 44 of the drive waveform that defines the drive signal as a parameter. Furthermore, the drive waveforms shown in Figures 3(a), 3(b), and 3(c) may be used as parameters, and the drive signal may be adjusted by selecting these drive waveforms.

[0048] Second Embodiment In the second embodiment, a more specific description will be given of the correction process for correcting the ejection variations of the ejection head 3. First, a specific example of the correction process when there is no influence of crosstalk will be described with reference to FIG.

[0049] In S301, a drive signal (drive signal before adjustment) is applied to each piezoelectric element 34 provided for each nozzle 31, and the velocity and volume of the liquid 35 ejected from each nozzle 31, i.e., the ejection velocity and ejection amount of each nozzle 31, are measured (acquired).

[0050] In S302, a first rate of change in the discharge speed and discharge amount of the liquid 35 when the voltage V of the drive signal applied to the piezoelectric element 34 is changed is obtained for each of the multiple nozzles 31. Here, the first rate of change is a function (first function) that indicates the correlation between the voltage V of the drive signal and the discharge speed and discharge amount of the liquid 35 discharged from the nozzle 31. Specifically, the first rate of change indicates the rate of change in the discharge speed relative to the discharge amount of the liquid 35 discharged from the nozzle 31 when the voltage V is changed while keeping the pulse width P of the drive signal constant (the slope when the x-axis is the discharge amount and the y-axis is the discharge speed).

[0051] In S303, a second rate of change in the discharge speed and discharge amount of the liquid 35 when the pulse width P of the drive signal applied to the piezoelectric element 34 is changed is obtained for each of the multiple nozzles 31. Here, the second rate of change is a function (second function) that indicates the relative relationship between the pulse width P of the drive signal and the discharge speed and discharge amount of the liquid 35 discharged from the nozzle 31. Specifically, the second rate of change indicates the rate of change in the discharge speed relative to the discharge amount of the liquid 35 discharged from the nozzle 31 when the pulse width P is changed while keeping the voltage V of the drive signal constant (the slope when the x-axis is the discharge amount and the y-axis is the discharge speed).

[0052] In this embodiment, all nozzles 31 in the ejection head 3 are designated as representative nozzles (nozzles in use), and so in S302 and S303, the first change rate and the second change rate are acquired for each of the plurality of nozzles 31. However, as described above, the representative nozzle may be at least one or more nozzles of the plurality of nozzles 31 (for example, a nozzle located at the end or center in the sub-scanning direction). Also, in this embodiment, an example will be described in which the ejection amount of liquid 35 is reduced.

[0053] In S304, a pulse width P of a drive signal to be applied to the corresponding piezoelectric element 34 is calculated for each of the multiple nozzles 31. In this embodiment, the pulse width P of the drive signal is calculated based on the target discharge speed and target discharge amount, the discharge speed and discharge amount (measured values) acquired in S301, the first change rate acquired in S302, and the second change rate acquired in S303. Specifically, a region Z in which the voltage V of the drive signal can be adjusted in a later process is obtained from the target discharge speed and target discharge amount and the first change rate acquired in S302. More specifically, the region Z is a region in which the discharge speed and discharge amount can be adjusted using only the voltage V of the drive signal. First, a first line is obtained, with the x-axis representing the discharge amount and the y-axis representing the discharge speed, passing through the upper limit of the target discharge speed and the lower limit of the target discharge amount, and having a slope of the first change rate. Similarly, a second line is obtained, passing through the lower limit of the target discharge speed and the upper limit of the target discharge amount, and having a slope of the first change rate. Then, the area sandwiched between the first line and the second line is defined as area Z, and in this area Z, the pulse width W of the drive signal is calculated based on the second rate of change.

[0054] In S305, the voltage V of the drive signal to be applied to the corresponding piezoelectric element 34 is calculated for each of the multiple nozzles 31. In this embodiment, the voltage V of the drive signal is calculated based on the target discharge speed and target discharge amount, the discharge speed and discharge amount (measured values) acquired in S301, and the first rate of change acquired in S302. Specifically, the voltage V of the drive signal to be applied to the piezoelectric element 34 is calculated from the target discharge speed, target discharge amount, and first rate of change so as to fall within the area Z determined in S304.

[0055] In S306, for each of the plurality of nozzles 31, the values ​​of the pulse width P and voltage V of the drive signal to be applied to the corresponding piezoelectric element 34 are determined (set) so that the discharge speed and discharge amount of the liquid 35 discharged from each nozzle 31 become the target discharge speed and target discharge amount. In this embodiment, the values ​​of the pulse width P and voltage V of the drive signal to be applied to each piezoelectric element 34 are determined based on the pulse width P and voltage V of the drive signal calculated in S304 and S305, respectively.

[0056] In this embodiment, as shown in S304 to S306, after determining the pulse width P (value) of the drive signal, the voltage V (value) of the drive signal is determined, thereby adjusting the liquid 35 discharged from the nozzle 31 to the target discharge speed and target discharge amount. The pulse width P of the drive signal is not changed after it is determined in order to reduce changes in the influence of crosstalk that would occur if the pulse width P were changed.

[0057] Furthermore, in this embodiment, an area Z in which the voltage V of the drive signal can be adjusted is determined, and the pulse width P of the drive signal is determined, and then the voltage V is adjusted with the pulse width P fixed. However, an area Z' in which the pulse width P of the drive signal can be adjusted is determined, and then the voltage V of the drive signal is determined, and then the pulse width P is adjusted with the voltage V fixed. Note that area Z' is determined as an area sandwiched between a line that passes through the upper limit of the target discharge speed and the lower limit of the target discharge amount and has a slope of the second rate of change, and a line that passes through the lower limit of the target discharge speed and the upper limit of the target discharge amount and has a slope of the second rate of change.

[0058] In S307, a drive signal including the voltage V and pulse width P of the value determined in S306 is applied to each piezoelectric element 34 provided for each nozzle 31, and the velocity and volume of the liquid 35 ejected from each nozzle 31, i.e., the ejection velocity and ejection amount of each nozzle 31, are measured (acquired).

[0059] In S308, it is determined whether the ejection speed and ejection volume of each nozzle 31 measured in S307 are within an acceptable range (target range) for the target ejection speed and target ejection volume. If the ejection speed and ejection volume of each nozzle 31 are not within the acceptable range, the process proceeds to S309. In S309, for each of the multiple nozzles 31, the value of the voltage V of the drive signal is determined (adjusted) based on the ejection speed and ejection volume of each nozzle 31 measured in S307, while the pulse width P of the drive signal applied to the corresponding piezoelectric element 34 is fixed. On the other hand, if the ejection speed and ejection volume of each nozzle 31 are within the acceptable range, the process of correcting the ejection variation of the ejection head 3 ends.

[0060] The steps S303 to S305 will be described in detail with reference to Figures 8(a), 8(b), and 8(c). Figures 8(a), 8(b), and 8(c) are diagrams that schematically show the steps S303 to S305, particularly the calculation process, and illustrate the flow by which the discharge speed and discharge amount of each nozzle 31 measured in S301 are adjusted to fall within the target range 81. In Figures 8(a), 8(b), and 8(c), the vertical axis represents the discharge speed of the nozzle 31, and the horizontal axis represents the discharge amount of the nozzle 31.

[0061] 8(a), a first rate of change of the ejection speed and ejection volume of the nozzle 31 when the voltage V of the drive signal is changed, and a second rate of change of the ejection speed and ejection volume of the nozzle 31 when the pulse width P of the drive signal is changed are acquired. Next, based on the first rate of change, a region Z in which the ejection speed and ejection volume of the nozzle 31 can be adjusted using only the voltage V of the drive signal is calculated. Then, by changing the pulse width P of the drive signal based on the second rate of change, the ejection speed and ejection volume of the nozzle 31 are corrected in accordance with (the slope of) the second rate of change, and adjusted to within region Z. In this way, FIG. 8(a) shows the steps S302 to S304.

[0062] 8(b), after the discharge speed and discharge rate of the nozzle 31 are adjusted to region Z, the voltage V of the drive signal is changed based on the first rate of change, whereby the discharge speed and discharge rate of the nozzle 31 are corrected in accordance with (the gradient of) the first rate of change and adjusted to within target range 81. Note that target range 81 is an allowable range for the target discharge speed and target discharge rate of each nozzle 31. In this way, FIG. 8(b) shows the step of S305.

[0063] 8(c), the value of the voltage V of the drive signal and the value of the pulse width P of the drive signal are determined within the target range 81 so that the discharge speed and discharge amount of the nozzle 31 ultimately become the target discharge speed and target discharge amount. In this way, FIG. 8(c) shows the step of S306.

[0064] Next, a specific example of correction processing when there is the influence of crosstalk will be described with reference to Fig. 9. This correction processing includes steps S401 and S402 to deal with fluctuations in the second rate of change due to the influence of crosstalk, in addition to steps S301 to S309 shown in Fig. 7. Note that steps S301 to S309 are the same as the steps described with reference to Fig. 7, so detailed description thereof will be omitted here.

[0065] In S401, as in S204, for each of the multiple nozzles 31, the pressure fluctuation in the space between the nozzles due to the driving of the piezoelectric element 34, i.e., the degree of influence (crosstalk influence) of crosstalk on the ejection speed and ejection amount of the liquid 35 ejected from the nozzle 31 is calculated.

[0066] In S402, for each of the plurality of nozzles 31, the second change rate (the ejection speed and ejection volume of the nozzle 31 when the pulse width P of the drive signal is changed) obtained in S303 is corrected based on the crosstalk influence degree obtained in S401. In this embodiment, a correction coefficient (first correction coefficient) according to the crosstalk influence degree is obtained, and the second change rate is corrected using this correction coefficient. In subsequent steps, the second change rate corrected in S402 is used instead of the second change rate obtained in S303. For example, in S304, the pulse width P of the drive signal is calculated based on the target ejection speed and target ejection volume, the (measured) ejection speed and ejection volume obtained in S301, the first change rate obtained in S302, and the second change rate corrected in S402.

[0067] The steps S401 and S402 will be described in detail with reference to FIGS. 10(a), 10(b), and 10(c). FIG. 10(a) is a diagram showing an example of the crosstalk influence calculated for each of the plurality of nozzles 31. In FIG. 10(a), the vertical axis represents the crosstalk influence, and the horizontal axis represents the nozzle number. In this embodiment, the crosstalk influence is expressed as the discharge speed / discharge amount of the nozzle 31, which is an index focusing on the degree of fluctuation in the balance between the discharge speed and the discharge amount. The nozzle number is a number (identifier) ​​assigned to identify each of the plurality of nozzles 31, and is assigned, for example, in the order in which the nozzles 31 are arranged. FIG. 10(b) is a diagram showing an example of a correction coefficient representing the correlation between the crosstalk influence and the second change rate shown in FIG. 10(a). In FIG. 10(b), the vertical axis represents the second change rate, and the horizontal axis represents the crosstalk influence (the discharge speed / discharge amount of the nozzle 31). By using the correction coefficient shown in FIG. 10(b), it is possible to estimate the fluctuation of the second change rate due to the influence of crosstalk. FIG. 10(c) is a diagram showing an example of the second change rate, which is a function showing the correlation between the discharge speed and discharge amount of the nozzle 31. In FIG. 10(c), the vertical axis represents the discharge speed of the nozzle 31, and the horizontal axis represents the discharge amount of the nozzle 31. The second change rate (slope) shown in FIG. 10(c) is corrected using the correction coefficient shown in FIG. 10(b).

[0068] In this way, this embodiment focuses on fluctuations in the second rate of change (the rate of change in the ejection speed relative to the ejection volume of the nozzle 31 when the pulse width P of the drive signal is changed) due to the influence of crosstalk, and corrects the second rate of change based on the degree of crosstalk influence. Therefore, according to this embodiment, even when there is the influence of crosstalk, it is possible to correct variations in the ejection characteristics of each nozzle 31 with high precision, and it is possible to realize a technology that is advantageous for adjusting the ejection speed and ejection volume of the nozzle 31.

[0069] Furthermore, in this embodiment, the case where the second change rate is corrected based on the crosstalk influence degree has been described, but the first change rate may be corrected instead of or in addition to the second change rate.

[0070] <Third embodiment> A specific example of the correction process for correcting ejection variations of the ejection head 3 in the third embodiment will be described with reference to Figure 11. In addition to the steps S301 to S309, S401, and S402 shown in Figure 9, this correction process includes S501 in order to address variations in the ejection speed and ejection amount of the nozzle 31 relative to the pulse width P of the drive signal due to the influence of crosstalk. Note that S301 to S309, S401, and S402 are the same as the steps described with reference to Figures 7 and 9, so detailed description thereof will be omitted here.

[0071] In the second embodiment, the second rate of change was corrected by focusing on the fact that the second rate of change varies due to the effects of crosstalk. However, in reality, the effects of crosstalk cause fluctuations not only in the second rate of change but also in the rate of change of the ejection volume of the nozzle 31 relative to the pulse width P of the drive signal. In other words, the rate of change of the ejection volume of the nozzle 31 when the pulse width P of the drive signal is changed also varies due to the effects of crosstalk. Furthermore, the rate of change of the ejection speed of the nozzle 31 relative to the pulse width P of the drive signal also varies due to the effects of crosstalk.

[0072] In S501, for each of the plurality of nozzles 31, a third rate of change in the ejection speed of the nozzle 31 and a fourth rate of change in the ejection volume of the nozzle 31 when the pulse width P of the drive signal is changed are corrected based on the crosstalk influence degree calculated in S401. Here, the third rate of change is a function (third function) that indicates the relative relationship between the pulse width P of the drive signal and the ejection speed of the liquid 35 ejected from the nozzle 31. Furthermore, the fourth rate of change is a function (fourth function) that indicates the relative relationship between the pulse width P of the drive signal and the ejection volume of the liquid 35 ejected from the nozzle 31. In this embodiment, a correction coefficient (third correction coefficient) corresponding to the crosstalk influence degree is calculated, and the third rate of change is corrected using this correction coefficient. Similarly, a correction coefficient (fourth correction coefficient) corresponding to the crosstalk influence degree is calculated, and the fourth rate of change is corrected using this correction coefficient.

[0073] In S304, the pulse width P of the drive signal is calculated based on the target discharge speed and target discharge volume, the discharge speed and discharge volume obtained in S301, the first change rate obtained in S302, the second change rate corrected in S402, and the third and fourth change rates corrected in S501.

[0074] The step S501 will be described in detail with reference to FIGS. 12(a) and 12(b). FIG. 12(a) is a diagram showing an example of a correction coefficient representing the correlation between the crosstalk influence degree and the third change rate. In FIG. 12(a), the vertical axis represents the third change rate, and the horizontal axis represents the crosstalk influence degree (the discharge speed / discharge amount of the nozzle 31). FIG. 12(b) is a diagram showing an example of a correction coefficient representing the correlation between the crosstalk influence degree and the fourth change rate. In FIG. 12(b), the vertical axis represents the fourth change rate, and the horizontal axis represents the crosstalk influence degree (the discharge speed / discharge amount of the nozzle 31). Using the correction coefficient shown in FIG. 12(a), it is possible to estimate the fluctuation in the third change rate due to the influence of crosstalk, and using the correction coefficient shown in FIG. 12(b), it is possible to estimate the fluctuation in the fourth change rate due to the influence of crosstalk. Therefore, in S501, the third change rate (slope) is corrected using the correction coefficient shown in Fig. 12(a), and the fourth change rate (slope) is corrected using the correction coefficient shown in Fig. 12(b). Note that it is preferable to obtain the third change rate and the fourth change rate in advance.

[0075] In this way, this embodiment focuses on fluctuations in the third change rate and the fourth change rate due to the influence of crosstalk, and corrects the third change rate and the fourth change rate based on the degree of crosstalk influence. Therefore, according to this embodiment, even when there is the influence of crosstalk, it is possible to correct variations in the ejection characteristics of each nozzle 31 with high precision, and it is possible to realize a technology that is advantageous for adjusting the ejection speed and ejection amount of the nozzle 31.

[0076] <Fourth embodiment> A specific example of the correction process for correcting ejection variations of the ejection head 3 in the fourth embodiment will be described with reference to Fig. 13. This correction process includes steps S601 and S602 in addition to steps S301, S302, S304 to S309, and S401 shown in Fig. 11, taking into account the effects of crosstalk. Note that steps S301, S302, S304 to S309, and S401 are the same as the steps described with reference to Figs. 7 and 11, and therefore detailed description thereof will be omitted here.

[0077] In S601, the multiple nozzles 31 are classified (grouped) into at least two or more groups based on the crosstalk influence degree calculated in S401. In this embodiment, each of the multiple nozzles 31 is classified into one of multiple groups having different ranges of crosstalk influence degree according to the crosstalk influence degree calculated in S401. For example, as shown in FIG. 14, the multiple groups according to the crosstalk influence degree are set as a first group having a crosstalk influence degree in a first range, a second group having a crosstalk influence degree in a second range, and a third group having a crosstalk influence degree in a third range. Then, each of the multiple nozzles 31 is classified into one of the first group, second group, or third group according to the crosstalk influence degree. FIG. 14 is a diagram specifically illustrating the process of S601. In FIG. 14, the vertical axis represents the crosstalk influence degree, and the horizontal axis represents the nozzle number.

[0078] In S602, a second rate of change in the discharge speed and discharge amount of the liquid 35 when the pulse width P of the drive signal applied to the piezoelectric element 34 is changed is acquired for each group classified in S601. In subsequent steps, S304 to S309 are performed for each group classified in S601, rather than for each of the multiple nozzles 31.

[0079] In this way, this embodiment focuses on the fluctuation of the second change rate due to the influence of crosstalk, classifies each of the multiple nozzles 31 into groups according to the degree of crosstalk influence, and obtains the second change rate for each group. Therefore, according to this embodiment, even when there is the influence of crosstalk, it is possible to correct the variation in the ejection characteristics of each nozzle 31 with high precision, and it is possible to realize a technology that is advantageous for adjusting the ejection speed and ejection amount of the nozzles 31.

[0080] In this embodiment, since the crosstalk influence degree of each nozzle 31 is obtained, after the second change rate is obtained for each group, step S402 of correcting the second change rate based on the crosstalk influence degree may be incorporated into the correction process shown in Figure 13.

[0081] Fifth Embodiment A specific example of the correction process for correcting ejection variations of the ejection head 3 in the fifth embodiment will be described with reference to Figure 15. This correction process includes S701 in consideration of the effects of crosstalk, in addition to the steps S301, S302, S304 to S309, S401, S601, and S602 shown in Figure 13. Note that S301, S302, S304 to S309, S401, S601, and S602 are the same as the steps described with reference to Figures 7, 11, and 13, so detailed description thereof will be omitted here.

[0082] In S701, a third rate of change in the ejection speed of the nozzles 31 and a fourth rate of change in the ejection volume of the nozzles 31 when the pulse width P of the drive signal is changed are acquired for each group classified in S601. In subsequent steps, S304 to S309 are performed for each group classified in S601, rather than for each of the multiple nozzles 31.

[0083] As described above, this embodiment focuses on the effects of crosstalk, classifies each of the multiple nozzles 31 into groups according to the degree of crosstalk influence, and obtains the second change rate, third change rate, and fourth change rate for each group. Therefore, according to this embodiment, even when there is the effect of crosstalk, it is possible to correct the variation in the ejection characteristics of each nozzle 31 with high precision, and realizes a technology that is advantageous for adjusting the ejection speed and ejection amount of the nozzles 31.

[0084] In this embodiment, since the crosstalk influence degree of each nozzle 31 is obtained, after the second change rate is obtained for each group, step S402 of correcting the second change rate based on the crosstalk influence degree may be incorporated into the correction process shown in Fig. 13. Furthermore, after the third change rate and fourth change rate are obtained for each group, step S501 of correcting the third change rate and fourth change rate based on the crosstalk influence degree may be incorporated into the correction process shown in Fig. 13.

[0085] Sixth Embodiment In the first to fifth embodiments, the second change rate, the third change rate, and the fourth change rate are corrected according to the degree of influence of crosstalk. As described above, the influence of crosstalk occurs due to pressure fluctuations in the spaces between the nozzles (such as the flow paths 32 and the common liquid chamber 33) caused by driving the piezoelectric elements 34. Therefore, if it is thought that the influence of crosstalk will change due to a change in the ejection conditions of the liquid 35 in the ejection head 3, it is preferable to newly determine (re-determine) the degree of crosstalk influence. Here, possible ejection conditions include, for example, the ejection timing at which each of the multiple nozzles 31 ejects the liquid 35, and whether or not each of the multiple nozzles 31 ejects the liquid 35 (whether or not adjacent nozzles eject the liquid 35).

[0086] Seventh Embodiment The method for manufacturing an article according to an embodiment of the present invention is suitable for manufacturing articles such as display panels for organic electroluminescence (EL) displays, microdevices such as semiconductor devices, and elements having fine structures. The method for manufacturing an article according to this embodiment includes a step of discharging a liquid onto a substrate using a liquid discharge apparatus 1 (or a substrate processing apparatus having the liquid discharge apparatus 1), and a step of processing the substrate onto which the liquid has been discharged, specifically, drying the substrate to obtain a substrate on which a dry film has been formed. The method for manufacturing an article according to this embodiment also includes a step of manufacturing an article from the substrate on which the dry film has been formed. Furthermore, the method for manufacturing an article according to this embodiment includes other well-known steps (such as baking, cooling, cleaning, oxidation, film formation, vapor deposition, doping, planarization, etching, resist stripping, dicing, bonding, and packaging). The method for manufacturing an article according to this embodiment is advantageous over conventional methods in at least one of the performance, quality, productivity, and production cost of the article.

[0087] The disclosure of the present specification includes the following liquid ejection apparatus, control method, substrate processing apparatus, and method for manufacturing an article.

[0088] (Item 1) A liquid ejection device that ejects liquid, an ejection head including a plurality of nozzles that eject the liquid, and a piezoelectric element that is provided in each of the plurality of nozzles and to which a drive signal is applied; a control unit that determines the drive signal for each of the plurality of nozzles based on a function that indicates a correlation between the ejection speed and the ejection amount of the liquid ejected from the nozzle so as to adjust the ejection speed and the ejection amount of the liquid ejected from the nozzle to be within a target range; and the control unit determines the degree of influence that pressure fluctuations in the spaces between the nozzles caused by driving the piezoelectric elements have on the ejection speed and ejection amount of the liquid, and corrects the function based on the degree of influence. A liquid ejection device characterized by:

[0089] (Item 2) the drive signal includes at least a first parameter and a second parameter; the functions include a first function that indicates a correlation between the first parameter and the ejection speed and ejection amount of the liquid ejected from the nozzle, and a second function that indicates a correlation between the second parameter and the ejection speed and ejection amount of the liquid ejected from the nozzle, the control unit determines values ​​of the first parameter and the second parameter based on the first function and the second function. 2. The liquid ejection device according to item 1,

[0090] (Item 3) The liquid ejection device described in item 2 is characterized in that the control unit calculates a first correction coefficient for each of the plurality of nozzles according to the degree of influence, and corrects the second function using the first correction coefficient.

[0091] (Item 4) the first parameter includes a voltage of the drive signal; the second parameter includes a pulse width of the drive signal; the first function indicates a rate of change in ejection speed relative to the ejection amount of the liquid ejected from the nozzle when the voltage is changed while the pulse width is kept constant, the second function indicates a rate of change in ejection speed relative to the ejection amount of the liquid ejected from the nozzle when the voltage is kept constant and the pulse width is changed. 4. The liquid ejection device according to item 2 or 3,

[0092] (Item 5) The control unit determining, for each of the plurality of nozzles, values ​​of the first parameter and the second parameter based also on a third function that indicates a correlation between the second parameter and an ejection speed of the liquid ejected from the nozzle, and a fourth function that indicates a correlation between the second parameter and an ejection amount of the liquid ejected from the nozzle; correcting each of the third function and the fourth function based on the degree of influence; 5. The liquid ejection device according to item 4,

[0093] (Item 6) The control unit determining a second correction coefficient corresponding to the degree of influence for each of the plurality of nozzles, and correcting the third function using the second correction coefficient; determining a third correction coefficient corresponding to the degree of influence for each of the plurality of nozzles, and correcting the fourth function using the third correction coefficient; 6. The liquid ejection device according to item 5,

[0094] (Item 7) the first parameter includes a voltage of the drive signal; the second parameter includes a pulse width of the drive signal; the third function indicates a rate of change in the ejection velocity of the liquid ejected from the nozzle when the pulse width is changed while the voltage is kept constant, the fourth function indicates a rate of change in the ejection amount of the liquid ejected from the nozzle when the pulse width is changed while the voltage is kept constant, 6. The liquid ejection device according to item 5,

[0095] (Item 8) 8. The liquid ejection device according to item 4 or 7, wherein the control unit determines the voltage of the drive signal after determining the pulse width of the drive signal.

[0096] (Item 9) The control unit classifying each of the plurality of nozzles into one of a plurality of groups according to the degree of influence; obtaining the second function for each group; 9. The liquid ejection device according to any one of items 2 to 8, wherein:

[0097] (Item 10) The control unit classifying each of the plurality of nozzles into one of a plurality of groups according to the degree of influence; obtaining the third function and the fourth function for each group; 7. The liquid ejection device according to item 6,

[0098] (Item 11) The liquid ejection device according to any one of items 1 to 10, wherein the control unit newly calculates the degree of influence when the ejection conditions of the liquid in the ejection head are changed.

[0099] (Item 12) Item 12. A liquid ejection device according to item 11, characterized in that the ejection conditions include at least one of the ejection timing for ejecting the liquid from each of the plurality of nozzles and whether or not the liquid is ejected from each of the plurality of nozzles.

[0100] (Item 13) A method for controlling a liquid ejection device having an ejection head including a plurality of nozzles that eject liquid, and piezoelectric elements that are provided in each of the plurality of nozzles and to which a drive signal is applied, comprising: determining the drive signal for each of the plurality of nozzles based on a function indicating a correlation between the ejection speed and the ejection amount of the liquid ejected from the nozzle so as to adjust the ejection speed and the ejection amount of the liquid ejected from the nozzle to be within a target range; In the step, the degree of influence of pressure fluctuations in the spaces between the nozzles caused by driving the piezoelectric elements on the ejection speed and ejection amount of the liquid is calculated, and the function is corrected based on the degree of influence. A control method comprising:

[0101] (Item 14) A substrate processing apparatus for processing a substrate, a stage for holding the substrate; a liquid ejection apparatus according to any one of items 1 to 12, which ejects liquid onto the substrate held by the stage; A substrate processing apparatus comprising:

[0102] (Item 15) Discharging a liquid onto a substrate using the substrate processing apparatus according to item 14; processing the substrate onto which the liquid has been discharged; manufacturing an article from the processed substrate; A method for manufacturing an article, comprising:

[0103] The invention is not limited to the above-described embodiments, and various changes and modifications can be made without departing from the spirit and scope of the invention. Accordingly, the following claims are appended to apprise the public of the scope of the invention. [Explanation of symbols]

[0104] 1: Liquid ejection device 3: Ejection head 31: Nozzle 34: Piezoelectric element 35: Liquid CU: Control unit

Claims

1. A liquid ejection device that ejects liquid, an ejection head including a plurality of nozzles that eject the liquid, and a piezoelectric element that is provided in each of the plurality of nozzles and to which a drive signal is applied; a control unit that determines the drive signal for each of the plurality of nozzles based on a function that indicates a correlation between the ejection speed and the ejection amount of the liquid ejected from the nozzle so as to adjust the ejection speed and the ejection amount of the liquid ejected from the nozzle to be within a target range; and the control unit determines the degree of influence that pressure fluctuations in the spaces between the nozzles caused by driving the piezoelectric elements have on the ejection speed and ejection amount of the liquid, and corrects the function based on the degree of influence. A liquid ejection device characterized by:

2. the drive signal includes at least a first parameter and a second parameter; the functions include a first function that indicates a correlation between the first parameter and the ejection speed and ejection amount of the liquid ejected from the nozzle, and a second function that indicates a correlation between the second parameter and the ejection speed and ejection amount of the liquid ejected from the nozzle, the control unit determines values ​​of the first parameter and the second parameter based on the first function and the second function, The liquid ejection device according to claim 1 .

3. The liquid ejection device according to claim 2 , wherein the control unit calculates a first correction coefficient for each of the plurality of nozzles according to the degree of influence, and corrects the second function using the first correction coefficient.

4. the first parameter includes a voltage of the drive signal; the second parameter includes a pulse width of the drive signal; the first function indicates a rate of change in ejection speed relative to the ejection amount of the liquid ejected from the nozzle when the voltage is changed while the pulse width is kept constant, the second function indicates a rate of change in ejection speed relative to the ejection amount of the liquid ejected from the nozzle when the voltage is kept constant and the pulse width is changed; 3. The liquid ejection device according to claim 2.

5. The control unit determining, for each of the plurality of nozzles, values ​​of the first parameter and the second parameter based also on a third function that indicates a correlation between the second parameter and an ejection speed of the liquid ejected from the nozzle, and a fourth function that indicates a correlation between the second parameter and an ejection amount of the liquid ejected from the nozzle; correcting each of the third function and the fourth function based on the degree of influence; 5. The liquid ejection device according to claim 4.

6. The control unit determining a second correction coefficient corresponding to the degree of influence for each of the plurality of nozzles, and correcting the third function using the second correction coefficient; determining a third correction coefficient corresponding to the degree of influence for each of the plurality of nozzles, and correcting the fourth function using the third correction coefficient; 6. The liquid ejection device according to claim 5.

7. the first parameter includes a voltage of the drive signal; the second parameter includes a pulse width of the drive signal; the third function indicates a rate of change in the ejection velocity of the liquid ejected from the nozzle when the pulse width is changed while the voltage is kept constant, the fourth function indicates a rate of change in the ejection amount of the liquid ejected from the nozzle when the pulse width is changed while the voltage is kept constant, 6. The liquid ejection device according to claim 5.

8. 8. The liquid ejection apparatus according to claim 4, wherein the control unit determines the voltage of the drive signal after determining the pulse width of the drive signal.

9. The control unit classifying each of the plurality of nozzles into one of a plurality of groups according to the degree of influence; obtaining the second function for each group; 3. The liquid ejection device according to claim 2.

10. The control unit classifying each of the plurality of nozzles into one of a plurality of groups according to the degree of influence; obtaining the third function and the fourth function for each group; 7. The liquid ejection device according to claim 6.

11. The liquid ejection device according to claim 1 , wherein the control unit newly calculates the degree of influence when the ejection conditions of the liquid in the ejection head are changed.

12. 12. The liquid ejection apparatus according to claim 11, wherein the ejection conditions include at least one of an ejection timing at which the liquid is ejected from each of the plurality of nozzles and whether or not the liquid is ejected from each of the plurality of nozzles.

13. A method for controlling a liquid ejection device having an ejection head including a plurality of nozzles that eject liquid, and piezoelectric elements that are provided in each of the plurality of nozzles and to which a drive signal is applied, comprising: determining the drive signal for each of the plurality of nozzles based on a function indicating a correlation between the ejection speed and the ejection amount of the liquid ejected from the nozzle so as to adjust the ejection speed and the ejection amount of the liquid ejected from the nozzle to be within a target range; In the step, the degree of influence of pressure fluctuations in the spaces between the nozzles caused by driving the piezoelectric elements on the ejection speed and ejection amount of the liquid is calculated, and the function is corrected based on the degree of influence. A control method comprising:

14. A substrate processing apparatus for processing a substrate, a stage for holding the substrate; a liquid ejection apparatus according to claim 1 that ejects liquid onto the substrate held by the stage; A substrate processing apparatus comprising:

15. Discharging a liquid onto a substrate using the substrate processing apparatus according to claim 14; processing the substrate onto which the liquid has been discharged; manufacturing an article from the processed substrate; A method for manufacturing an article, comprising:

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