Vacuum processing equipment, platen chamber

Abstract

Reduce the weight of the platen chamber. [Solution] A platen chamber having a platen mechanism for rotating a substrate under reduced pressure between a horizontal and vertical position, comprising a bottom portion, a rear wall portion erected upward from the rear end of the bottom portion and having a slit formed therein for loading and unloading the substrate, lateral side wall portions erected upward from the left and right ends of the bottom portion and having their rear ends connected to the rear wall portion, a front flange portion erected upward from the front end of the bottom portion and connected to the front end of the lateral side wall portion and surrounding a processing opening that opens toward the vacuum processing section, and a curved top portion connected to the upper ends of the front flange portion, the rear wall portion and the lateral side wall portion, respectively, wherein the lateral side wall portion is curved outward from the curved top portion toward the bottom portion.

Description

Technical Field

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[0001] The present invention relates to a technology suitable for use in a vacuum processing apparatus.

Background Art

[0002] In the field of semiconductor devices and flat panel displays (FPDs), vacuum processing of substrates is performed. Examples of vacuum processing of substrates include film forming processes such as vapor deposition, sputtering, and CVD, heat treatment, etching treatment, and the like.

[0003] In a general vacuum processing apparatus, vacuum processing is performed on a substrate in a reduced-pressure vacuum chamber. The vacuum processing apparatus performs vacuum processing in a vertical position (standing position) where the substrate is upright, that is, in a posture where the surface of the substrate to be processed is along a substantially vertical direction. The vacuum processing apparatus may also transport the substrate in the vertical position. Further, the substrate is transported in a horizontal position (lying position) where the substrate is laid down, that is, in a posture where the surface of the substrate to be processed is along a substantially horizontal direction. The vacuum processing apparatus has a platen chamber that rotates the substrate to change the posture of the substrate between a horizontal position (lying position) and a vertical position (standing position) (Patent Document 1).

[0004] In recent years, glass substrates have been increasing in size in FPD manufacturing. So-called platen chambers that change the posture of the glass substrate between a horizontal position (lying position) and a vertical position (standing position) have also been increasing in size.

Prior Art Documents

Patent Documents

[0005]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0006] Since the rotation of the glass substrate is performed under reduced pressure and vacuum, the platen chamber needs to be strong enough to withstand the pressure difference between the inside and outside. For this reason, reducing the weight of the platen chamber was not easy. Furthermore, with the increasing size of glass substrates, the external dimensions of the platen chamber, which requires space for the glass substrate to rotate, have also increased. In addition, the increased size of the platen chamber has led to an increase in the weight of the platen chamber itself. Therefore, there was a demand to reduce the weight of the platen chamber as much as possible. Moreover, the increased weight and size of the platen chamber may cause problems during transportation to the installation site.

[0007] One possible solution to the increased size of the platen chamber is to design it to be detachable and then assembled and installed. In this case, a sealing section would need to be provided at the assembly point of the platen chamber. This would increase the overall length of the required sealing section for the platen chamber. Furthermore, there is a possibility that particle generation will increase at the assembly point. In addition, the weight corresponding to the assembly and sealing sections would increase.

[0008] This invention has been made in view of the above circumstances and aims to achieve the following objectives. 1. Reduce the weight of the platen chamber that changes the orientation of the substrate vertically and horizontally. 2. Maintain the necessary platen chamber strength. 3. To facilitate seal maintenance. 4. Reduce particle generation. [Means for solving the problem]

[0009] (1) A platen chamber according to one aspect of the present invention is A platen chamber having a platen mechanism that rotates the substrate under reduced pressure between a horizontal position where it can be loaded and unloaded, and a vertical position where it is positioned close to the vacuum processing unit and can be vacuum processed, The bottom and, A rear wall portion is erected upward from the rear end of the bottom portion, and has a slit formed therein for loading and unloading the substrate, Lateral side wall sections are erected upward from the left and right ends of the bottom, and their rear ends are connected to the rear wall section, A front flange portion is erected upward from the front end of the bottom portion, connected to the front end of the lateral side wall portion, and surrounds the processing opening that opens toward the vacuum processing section, The curved top portion is connected to the upper ends of the front flange portion, the rear wall portion, and the lateral side wall portion, respectively. It has, The aforementioned lateral side wall portion curves outward from the curved top portion to the bottom portion, This resolved the above issues. (2) The platen chamber of the present invention is as described in (1) above, The three surfaces, the curved top section and the left and right lateral side walls, are curved surfaces that curve outward. It is possible. (3) The platen chamber of the present invention is as described in (1) above, The platen mechanism comprises a platen shaft having a horizontal axis, The platen shaft passes through the aforementioned lateral side wall portion at a position close to the bottom portion and the front flange portion. The aforementioned curved apex is, The front connection position connecting to the front flange portion is higher than the rear connection position connecting to the rear wall portion. The platen axis curves outward and convexly from the front connection position to the rear connection position, It is possible. (4) The platen chamber of the present invention is as described in (1) above, Both the front flange portion and the rear wall portion are substantially flat plates. The lateral side wall portion has a smaller outward convex curvature at the front vertical line position where it connects to the front flange portion than the outward convex curvature at the rear vertical line position where it connects to the rear wall portion. It is possible. (5) The platen chamber of the present invention is as described in (1) above, The left and right lateral side wall portions are each composed of a conical surface having a vertex behind the rear wall portion. It can be. (6) In the above (1), the platen chamber of the present invention The left and right lateral side wall portions are each composed of a combination of planes along a virtual triangular surface having a vertex behind the rear wall portion. It can be. (7) In the above (3), the platen chamber of the present invention A front end is connected to the front flange portion, and it descends rearward and a rear end is connected to the bottom portion to form a truss, and a lateral outer end is connected to the inner surface of the lateral side wall portion, It has an inner rib portion located above the platen shaft. It can be. (8) In the above (1), the platen chamber of the present invention The lateral side wall portion has a smaller plate thickness than the rear wall portion. [[ID=​​​​​​​​​​​​​​​​​​​​​​​​ The bottom and, A rear wall portion is erected upward from the rear end of the bottom portion, and has a slit formed therein for loading and unloading the substrate, Lateral side wall sections are erected upward from the left and right ends of the bottom, and their rear ends are connected to the rear wall section, A front flange portion is erected upward from the front end of the bottom portion, connected to the front end of the lateral side wall portion, and surrounds the processing opening that opens toward the vacuum processing section, The curved top portion is connected to the upper ends of the front flange portion, the rear wall portion, and the lateral side wall portion, respectively. It has, The aforementioned lateral side wall portion is curved (bent) outward from the curved top portion to the bottom portion, This resolved the above issues.

[0011] In the above configuration, by providing a lateral side wall that curves outward, the chamber (platen chamber) can have sufficient strength to prevent excessive deformation when subjected to the load applied to it due to the pressure difference with the outside when the inside of the chamber (platen chamber) is depressurized. Furthermore, by connecting the lateral side walls to the front flange, rear wall, curved top, and bottom sections, respectively, the chamber can be made strong enough to prevent excessive deformation when subjected to loads applied to it due to the pressure difference with the outside when the chamber is depressurized.

[0012] Here, the load due to the pressure difference between the inside and outside is applied in a way that would crush the chamber. However, by providing lateral side walls that curve outward, it is possible to withstand the load caused by this pressure difference and prevent deformation of the chamber. Similarly, by connecting the lateral side walls to the front flange, rear wall, and curved top section, respectively, it is possible to withstand the load caused by the pressure difference between the inside and outside and prevent deformation of the chamber.

[0013] This allows for sufficient strength to be maintained even when the thickness of the chamber walls is reduced. Therefore, the weight of the chamber can be reduced. Furthermore, since the necessary strength of the chamber can be maintained, there is no need to provide ribs, which were conventionally provided on the outer surface of the chamber. Therefore, compared to conventional chambers, the weight can be reduced by eliminating the ribs. At the same time, compared to conventional chambers, the size of the chamber can be reduced and the chamber space can be saved, depending on the space that would normally be occupied by the ribs.

[0014] Here, the statement that the lateral side wall curves outward from the curved top to the bottom means that, in a vertical plane section along the lateral direction, the lateral side wall curves outward in a convex shape. Furthermore, the statement that the lateral side wall curves outward in a convex shape means that, in a vertical plane section along the lateral direction, the lateral side wall at a position midway between the curved top and the bottom in the vertical direction is located outside the chamber, relative to the straight line connecting the position of the lateral side wall connected to the curved top and the position of the lateral side wall connected to the bottom. In particular, the line formed by the boundary where the lateral side wall connects to the front flange can curve outward in a convex shape. Similarly, the line formed by the boundary where the lateral side wall connects to the rear wall can also curve outward in a convex shape.

[0015] At the same time, this means that along the entire length in the front-to-back direction, the longitudinal cross-sections of the lateral side walls all form curves that curve outward and convex. In this case, the curvature of the curves of the lateral side walls may change depending on the position in the front-to-back direction. In other words, the curvature of the longitudinal cross-sections of the lateral side walls can have a distribution in the front-to-back direction. Furthermore, the curvature of the curve of the lateral side wall may remain constant depending on the position in the front-to-back direction. In other words, the curvature of the longitudinal cross-section of the lateral side wall can remain unchanged in the front-to-back direction.

[0016] Similarly, when we say that the lateral sidewall curves outward from the curved top to the bottom, it means that in a vertical plane section along the lateral direction, the lateral sidewall forms a broken line that is bent outward. A broken line is composed of straight lines connected in a curved manner. In particular, the boundary line formed by the connection between the lateral side wall and the front flange can be drawn as a bent line that is outwardly convex. Furthermore, the boundary line formed by the connection between the lateral side wall and the rear wall can also be drawn as a bent line that is outwardly convex.

[0017] Furthermore, if the number of bends in a broken line is increased infinitely, it corresponds to a curve. Here, curvature refers to the degree to which, in a vertical plane section along the horizontal direction, the position midway between the top and bottom of the curve in the vertical direction is located outside the chamber, relative to the straight line connecting the position connected to the top and bottom of the curve.

[0018] At the same time, this means that the lateral side wall section curves outward in a convex shape along its entire length in the front-to-back direction. In this case, the vertical cross-section of the lateral side wall section may have varying spacings between the intersections of adjacent polylines in the vertical direction depending on the position in the front-to-back direction. In other words, the vertical cross-section of the lateral side wall section has a distribution in the front-to-back direction for the spacings between the intersections of polylines in the vertical direction. Furthermore, curving outward in a convex shape means that the polylines of the vertical cross-section of the lateral side wall section intersect at angles smaller than 180° at the intersections of the polylines, so that they incline inward towards the chamber. Furthermore, the curvature of the broken line of the lateral side wall may remain constant depending on the position in the front-to-back direction. In other words, the curvature of the longitudinal cross-section of the lateral side wall can remain unchanged in the front-to-back direction.

[0019] Furthermore, the vertical position in which the substrate is positioned close to the vacuum processing unit and capable of vacuum processing means that the surface to be processed is aligned vertically, and the substrate faces the vacuum processing unit such as the cathode or deposition source. Alternatively, the vertical position in which the substrate is positioned close to the vacuum processing unit and capable of vacuum processing means that the surface to be processed is aligned vertically, and when transported while maintaining this orientation, the substrate faces the vacuum processing unit such as the cathode or deposition source. In this case, the platen chamber can also function as a load / unload chamber, or the platen chamber can also function as a transfer chamber.

[0020] In the present invention, (2) The platen chamber of the present invention is as described in (1) above, The three surfaces, the curved top section and the left and right lateral side walls, are curved surfaces that curve outward. It is possible.

[0021] In the above configuration, the curved top section and the left and right lateral side walls are connected to the bottom section, the front flange section, and the rear wall section. The front flange section and the rear wall section are approximately flat. The lateral side walls curve outward from the curved top section to the bottom section. In other words, in a vertical plane section along the lateral direction, the lateral side walls form a curved or bent line that curves outward. The lateral side walls curve outward. In a vertical plane section along the lateral direction, the position of the lateral side wall section midway between the curved top section and the bottom section in the vertical direction is located outside the chamber, relative to the position where the lateral side wall section is connected to the curved top section and the bottom section. Here, a curved surface includes a curved surface whose cross-section is a circular arc and a bent surface whose cross-section is a broken line.

[0022] Similarly, the curved top section curves outward from the front flange section to the rear wall section. In a vertical plane section along the front-to-back direction, the curved top section curves outward and convexly. In other words, the curved top section curves outward and convexly. In a vertical plane section along the front-to-back direction, the position midway between the front flange section and the rear wall section in the front-to-back direction is located outside the chamber, relative to the straight line connecting the position where the curved top section is connected to the front flange section and the position where it is connected to the rear wall section.

[0023] As a result, while the front flange, rear wall, and bottom are formed as substantially flat surfaces, the curved top section and the left and right lateral side walls connected to the front flange, rear wall, and bottom are formed as three surfaces that curve outward. This allows the chamber to have sufficient strength to prevent excessive deformation when subjected to loads applied to it due to the pressure difference with the outside when the pressure inside the chamber is reduced. Furthermore, the curved top section and the three left and right lateral side walls can have sufficient strength to prevent excessive deformation when subjected to loads applied to the chamber due to the pressure difference with the outside when the chamber is depressurized.

[0024] Here, the load due to the pressure difference between the inside and outside is applied in a way that would crush the chamber. However, by having three surfaces—a curved top section that bends outward and the left and right lateral side walls—the chamber can withstand the load caused by this pressure difference and prevent deformation. Similarly, by connecting the curved top section and the left and right lateral side walls to the front flange section, the rear wall section, and the bottom section, respectively, the chamber can withstand the load caused by the pressure difference between the inside and outside and prevent deformation.

[0025] This allows for sufficient strength to be maintained even when the thickness of the chamber walls is reduced. Therefore, the weight of the chamber can be reduced. Furthermore, since the necessary strength of the chamber can be maintained, there is no need to provide ribs, which were conventionally provided on the outer surface of the chamber. Therefore, compared to conventional chambers, the weight can be reduced by eliminating the ribs. At the same time, compared to conventional chambers, the size of the chamber can be reduced and the chamber space can be saved, depending on the space that would normally be occupied by the ribs.

[0026] Furthermore, the curvature of the curved top portion may remain constant regardless of its position in the left-right direction. In other words, the curvature of the vertical cross-section of the curved top portion can remain unchanged in the left-right direction. The platen chamber has a symmetrical shape.

[0027] (3) The platen chamber of the present invention is as described in (1) above, The platen mechanism comprises a platen shaft having a horizontal axis, The platen shaft passes through the aforementioned lateral side wall portion at a position close to the bottom portion and the front flange portion. The aforementioned curved apex is, The front connection position connecting to the front flange portion is higher than the rear connection position connecting to the rear wall portion. The platen axis curves outward and convexly from the front connection position to the rear connection position, It is possible.

[0028] In the above configuration, the platen shaft has an axis aligned horizontally. The platen shaft is located below the front flange in the vertical direction. The platen shaft is close to the front flange. The platen shaft is close to the bottom. The through hole through which the platen shaft passes is formed in the lateral side wall close to the bottom and the front flange. As a result, the substrate, which is rotatably supported around the platen shaft by the platen mechanism, rotates between a lateral position and a vertical position to change its orientation.

[0029] The outward-curving top section allows for minimizing the internal volume of the chamber without hindering the rotation of the substrate within the chamber. At the same time, the through-hole through which the platen shaft passes is located close to the front flange and the bottom, thereby maintaining strength. The through-hole through which the platen shaft passes is located close to the front flange and the bottom, which helps to suppress deformation during depressurization.

[0030] (4) The platen chamber of the present invention is as described in (1) above, Both the front flange portion and the rear wall portion are substantially flat plates. The lateral side wall portion has a smaller outward convex curvature at the front vertical line position (front end boundary curve, front end boundary line) connecting to the front flange portion than the outward convex curvature at the rear vertical line position (rear end boundary curve, rear end boundary polyline) connecting to the rear wall portion. It is possible.

[0031] In the above configuration, the front flange portion and the rear wall portion are substantially flat plates erected in a substantially vertical direction from the bottom. The lateral side wall portion has a front end boundary curve formed by the boundary connected to the front flange portion that curves outward and convexly. The lateral side wall portion has a rear end boundary curve formed by the boundary connected to the rear wall portion that curves outward and convexly. Comparing the front and rear boundary curves, the curvature of the front boundary curve is smaller than that of the rear boundary curve in the lateral side wall section. In other words, the radius of curvature of the rear boundary curve is smaller than that of the front boundary curve. The front flange section may also be inclined at a small angle backward as it moves upward from the bottom, approaching the rear wall section.

[0032] Furthermore, the lateral side wall section depicts a bent line where the front end boundary fold line formed by the boundary connected to the front flange section is bent outward. The lateral side wall section also depicts a bent line where the rear end boundary fold line formed by the boundary connected to the rear wall section is bent outward. Comparing the front boundary line and the rear boundary line, similar to the front boundary curve and the rear boundary curve, the curvature of the lateral side wall portion is smaller for the front boundary line than for the rear boundary line. In other words, the degree to which the lateral side wall portion protrudes outward in the lateral direction at a position midway between the curved top and bottom in the vertical direction, relative to the line connecting the position connected to the curved top and the position connected to the bottom, is greater for the front boundary line than for the rear boundary line.

[0033] In other words, the angle at which the fold lines formed by the lateral side walls incline inward towards the chamber at the intersection of the fold lines is greater at the front boundary fold line than at the rear boundary fold line. Even in this case, the front flange portion may be inclined at a small angle backward as it moves upward from the bottom, approaching the rear wall portion.

[0034] (5) The platen chamber of the present invention is as described in (1) above, The left and right lateral side walls are both composed of conical surfaces whose apex is located further back than the rear wall. It is possible.

[0035] In the above configuration, the front flange portion and the rear wall portion are substantially flat plates erected substantially vertically from the bottom. The lateral side wall portion is a substantially circular arc in which the front end boundary curve formed by the boundary connected to the front flange portion is curved outward convexly. The lateral side wall portion is a substantially circular arc in which the rear end boundary curve formed by the boundary connected to the rear wall portion is curved outward convexly.

[0036] The curvature of the front boundary curve is smaller than the curvature of the rear boundary curve in the lateral side wall section. Furthermore, the platen chamber has a symmetrical shape. This allows it to withstand loads caused by the pressure difference between the inside and outside, preventing deformation of the chamber. Sufficient strength can be maintained even with a reduced chamber wall thickness. Therefore, the chamber can be made lighter, smaller, and more space-saving.

[0037] In this case, the lateral side wall can be easily formed by curving a single plate to match the curvature.

[0038] (6) The platen chamber of the present invention is as described in (1) above, The left and right lateral side walls are each composed of a combination of planes along a virtual triangular plane whose vertex is located further back than the rear wall. It is possible.

[0039] In the above configuration, the lateral side wall section traces a fold line in which the front end boundary fold line formed by the boundary connected to the front flange section is bent outward. The lateral side wall section traces a fold line in which the rear end boundary fold line formed by the boundary connected to the rear wall section is bent outward. The rear end boundary fold line and the front end boundary fold line are similar in shape. Furthermore, even if the front flange section is tilted at a small angle backward so as it moves upward from the bottom, approaching the rear wall section, the rear end boundary fold line and the front end boundary fold line are approximately similar in shape.

[0040] The curvature of the front boundary fold line is smaller than the curvature of the rear boundary fold line in the lateral side wall. Furthermore, the platen chamber has a symmetrical shape. This allows it to withstand loads caused by the pressure difference between the inside and outside, preventing deformation of the chamber. Sufficient strength can be maintained even with a reduced chamber wall thickness. Therefore, the chamber can be made lighter, smaller, and more space-saving.

[0041] In this case, the lateral side wall can be formed by folding a single plate along a fold line.

[0042] (7) The platen chamber of the present invention is as described in (3) above, The front end is connected to the front flange portion and descends toward the rear, with the rear end connected to the bottom portion to form a truss, and the lateral outer end is connected to the inner surface of the lateral side wall portion. Having an inner rib portion located above the platen axis, It is possible.

[0043] In the above configuration, the inner rib section is a flat plate. The inner lateral end of the inner rib section is straight. The entire length of the outer lateral end of the inner rib section is connected to the inner surface of the lateral side wall section. The inner rib section may not be inclined in the circumferential direction. The inner rib section is inclined to descend toward the rear. The inner rib section is located in front of the platen axis and above the platen axis. The rear end of the inner rib section is located below the platen axis. The inner rib section has a plate surface that is parallel to the axis of the platen axis and in a twisted position. The inner rib section, the front flange section, and the bottom section surround the platen axis. When viewed from left to right, the inner rib section, the front flange section, and the bottom section form a triangle that includes the platen axis. The front end of the inner rib is connected to the front flange located inside the lateral side wall. The rear end of the inner rib is connected to the bottom located inside the lateral side wall.

[0044] The inner rib section, the front flange section, and the bottom section form a truss structure near the platen shaft penetration point. This allows the chamber to withstand loads caused by the pressure difference between the inside and outside, preventing deformation of the chamber near the platen shaft penetration point. Even if the thickness of the chamber wall is reduced, sufficient strength can be maintained near the platen shaft penetration point. Therefore, the chamber can be made lighter, smaller, and more space-saving. Furthermore, it does not hinder the rotational movement of the platen shaft.

[0045] (8) The platen chamber of the present invention is as described in (1) above, The aforementioned lateral side wall portion has a smaller plate thickness than the aforementioned rear wall portion. It is possible.

[0046] In the above configuration, the thickness of the lateral side walls is smaller than the thickness of the front flange. The thickness of the lateral side walls is smaller than the thickness of the rear wall. The thickness of the curved top is smaller than the thickness of the front flange. The thickness of the curved top is smaller than the thickness of the rear wall. The thickness of the curved top is smaller than the thickness of the lateral side walls. The rear wall has a slit equipped with a door valve for loading and unloading a substrate positioned laterally perpendicular to the rear wall. The front flange can support a substrate positioned vertically so as to face the vacuum processing unit.

[0047] In other words, each plate thickness is, Rear wall section ≥ Front flange section > Lateral side wall section ≥ Curved top section It satisfies the relationship.

[0048] In other words, even if the flat rear wall and front flange sections are set to a thickness that provides sufficient deformation resistance, the outward-convex lateral side walls and curved top sections can be set to a smaller thickness. The outward-convex lateral side walls and curved top sections have the necessary deformation resistance. This allows the chamber to withstand loads caused by the pressure difference between the inside and outside, preventing deformation. It also allows for weight reduction. At the same time, it allows for a smaller chamber and saves space compared to conventional chambers. Note that each plate thickness is the average value in each configuration, or the value of the largest area portion.

[0049] (9) The platen chamber of the present invention is as described in (1) above, The bottom portion has multiple parallel projections (extending in the left-right direction; sheet piles), It is possible.

[0050] In the above configuration, the bottom has irregularities formed by bent lines extending in the left-right direction. The bottom has multiple protrusions extending in the left-right direction. All of the multiple protrusions have the same dimensions in the vertical direction. All of the multiple protrusions have the same dimensions in the front-to-back direction. The dimensions of the protrusions do not change in the left-right direction. All of the multiple protrusions have the same dimensions in the left-right direction. The bottom has a so-called sheet pile structure.

[0051] This ensures that the chamber has sufficient strength to prevent excessive deformation when subjected to the load applied due to the pressure difference between the inside and outside of the chamber during depressurization. The multiple protrusions on the bottom allow it to withstand the load caused by this pressure difference, preventing deformation of the chamber. Similarly, the multiple protrusions on the bottom allow it to withstand the load caused by the pressure difference between the inside and outside, preventing deformation of the chamber.

[0052] (10) The platen chamber of the present invention is as described in (1) above, The lateral side wall portions facing each other in the left-right direction have a lateral separation distance that is the same as or smaller than the position of the rear vertical line connecting to the rear wall portion compared to the position of the front vertical line connecting to the front flange portion. It is possible.

[0053] In the above configuration, the rear wall allows a substrate in a lateral position to be loaded and unloaded in the front-rear direction perpendicular to the rear wall. The rear wall has a slit equipped with a door valve. The front flange supports a substrate in a vertical position facing the vacuum processing unit. In this case, the opening of the front flange is positioned with enough space to place a mask around the substrate. Alternatively, the opening of the front flange is positioned with enough space to allow the substrate and the vacuum processing unit to swing relative to each other in the left-right direction. The platen chamber has a trapezoidal shape when viewed from above. The platen chamber has a trapezoidal shape when viewed from above, with the rear wall being the shorter side and the front flange being the longer side.

[0054] This allows the chamber to have sufficient strength to prevent excessive deformation when subjected to the load applied due to the pressure difference between the inside and outside of the chamber during depressurization. The trapezoidal shape when viewed from above allows it to withstand the load caused by this pressure difference, preventing deformation of the chamber. Similarly, the trapezoidal shape when viewed from above allows it to withstand the load caused by the pressure difference between the inside and outside, preventing deformation of the chamber. The internal space of the platen chamber can be minimized, resulting in space savings.

[0055] (11) A vacuum apparatus according to another aspect of the present invention is: A platen chamber is provided as described in any of (1) to (10) above, It is possible.

[0056] In the above configuration, the vacuum apparatus can have sufficient strength to prevent excessive deformation when subjected to loads caused by the pressure difference between the inside and outside of the vacuum apparatus during depressurization. It can withstand the load caused by this pressure difference, preventing deformation of the vacuum apparatus. Similarly, it can withstand loads caused by the pressure difference between the inside and outside, preventing deformation of the vacuum apparatus. The internal space of the vacuum apparatus can be minimized, resulting in space savings. [Effects of the Invention]

[0057] According to the present invention, it is possible to provide a platen chamber and vacuum processing apparatus that can reduce the weight of the platen chamber that changes the orientation of the substrate vertically and horizontally, maintain the necessary platen chamber strength, facilitate seal maintenance, and reduce particle generation. [Brief explanation of the drawing]

[0058] [Figure 1] This is a schematic diagram showing a first embodiment of the vacuum processing apparatus according to the present invention. [Figure 2] This is a perspective view showing a platen chamber in a first embodiment of the vacuum processing apparatus according to the present invention. [Figure 3]This is a partially transparent perspective view showing the platen chamber in a first embodiment of the vacuum processing apparatus according to the present invention. [Figure 4] This is a perspective view showing a platen chamber in a first embodiment of the vacuum processing apparatus according to the present invention. [Figure 5] This is a perspective view showing a platen chamber in a first embodiment of the vacuum processing apparatus according to the present invention. [Figure 6] This is a top view showing a platen chamber in a first embodiment of the vacuum processing apparatus according to the present invention. [Figure 7] This is a bottom view showing the platen chamber in a first embodiment of the vacuum processing apparatus according to the present invention. [Figure 8] This is a right-hand side view showing the platen chamber in a first embodiment of the vacuum processing apparatus according to the present invention. [Figure 9] This is a left side view showing the platen chamber in a first embodiment of the vacuum processing apparatus according to the present invention. [Figure 10] This is a rear view showing the platen chamber in a first embodiment of the vacuum processing apparatus according to the present invention. [Figure 11] This is a front view showing the platen chamber in a first embodiment of the vacuum processing apparatus according to the present invention. [Figure 12] This is a perspective view showing a platen chamber in a second embodiment of the vacuum processing apparatus according to the present invention. [Figure 13] This is a rear view showing the platen chamber in a second embodiment of the vacuum processing apparatus according to the present invention. [Figure 14] This is a left side view showing the platen chamber in a second embodiment of the vacuum processing apparatus according to the present invention. [Figure 15] This is an explanatory diagram showing the right lateral side wall portion in a second embodiment of the vacuum processing apparatus according to the present invention. [Modes for carrying out the invention]

[0059] Hereinafter, a first embodiment of the vacuum processing apparatus and platen chamber according to the present invention will be described with reference to the drawings. This embodiment is provided to give a better understanding of the spirit of the invention and does not limit the present invention unless otherwise specified.

[0060] In this embodiment, the positional relationships of each component are explained by setting up an XYZ Cartesian coordinate system. The direction parallel to gravity, that is, the vertical direction, is referred to as the Z direction. Within the Z direction, the direction that coincides with the direction of gravity is referred to as the downward direction, and the direction opposite to the direction of gravity is referred to as the upward direction. In the following description, "plan view" means viewing the object in the direction of gravity or downward. The transport direction of the glass substrate is referred to as the front-back direction or X direction within the horizontal direction. The direction perpendicular to the Z direction and the X direction is referred to as the left-right direction or Y direction.

[0061] <Vacuum Processing Equipment> Figure 1 is a schematic side view showing the vacuum apparatus in this embodiment. In the figure, reference numeral 1 denotes the vacuum apparatus. In this embodiment, the vacuum processing apparatus 1 will be described as a sputtering apparatus that performs film deposition and other processes as a vacuum treatment.

[0062] The vacuum processing apparatus 1 according to this embodiment is used, for example, in the manufacturing process of FPDs (Flat Panel Displays). The vacuum processing apparatus 1 performs vacuum processing on a single-wafer substrate GS made of glass or resin under a vacuum atmosphere. The vacuum processing apparatus 1 is applicable to interback type sputtering apparatuses that perform vacuum processing such as heat treatment, film deposition treatment, and etching treatment, as well as deposition apparatuses used in the manufacture of organic ELs. In other words, in the vacuum processing apparatus 1, the surface treatment is a film deposition treatment, that is, a sputtering treatment is performed. The vacuum processing apparatus 1 is a substrate processing apparatus.

[0063] As shown in Figure 1, the vacuum processing apparatus 1 comprises a load / unload chamber 2, a transfer chamber 3, and a vacuum processing chamber 4. The vacuum processing apparatus 1 may have multiple vacuum processing chambers 4. The load / unload chamber 2, the transfer chamber 3, and the vacuum processing chambers 4 are connected to each other.

[0064] Multiple chambers 2,4 may be arranged to surround the transfer chamber 3. Each of the multiple chambers 2,4 may be, for example, two load / unload chambers (chambers) 2 formed adjacent to each other, and multiple vacuum processing chambers (deposition chambers) 4. Partition valves are positioned between the load / unload chamber 2 and the transfer chamber 3, between the vacuum processing chamber 4 and the transport chamber 3, and between the film deposition chamber 4 and the transfer chamber 3. Furthermore, the vacuum processing apparatus 1 has a control device (not shown) that controls the vacuum processing apparatus 1. The control device controls the operation in the film deposition chamber 4, the transfer chamber 3, and the load / unload chamber 2.

[0065] <Load / Unload Room> Load / unload chamber 2 loads / unloads glass substrates GS in a horizontal position with the processing surface aligned horizontally. Load / unload chamber 2 loads / unloads approximately rectangular glass substrates (substrates to be processed) GS. If the vacuum processing apparatus 1 has two load / unload chambers 2, one load / unload chamber 2 functions as a load chamber for loading glass substrates GS from the outside to the inside of the vacuum processing apparatus 1. The other load / unload chamber 2 functions as an unload chamber for unloading glass substrates GS from the inside to the outside of the vacuum processing apparatus 1.

[0066] <Transfer Chamber> The transfer chamber 3 is positioned between the vacuum processing chamber 4 and the load / unload chamber 2. The transfer chamber 3 connects the vacuum processing chamber 4 and the load / unload chamber 2. The transfer chamber 3 can transport glass substrates GS to and from the vacuum processing chamber 4. The transfer chamber 3 can transport glass substrates GS to and from the load / unload chamber 2. The transfer chamber 3 can transport glass substrates GS in a lateral position with the surface to be processed aligned horizontally.

[0067] The transfer chamber 3 includes a transport device 3a located inside the transfer chamber 3. The transport device 3a is, for example, a transport robot. The conveying device 3a includes a rotating shaft, a drive source for rotating the rotating shaft, a robot arm attached to the rotating shaft, a robot hand formed on a part of the robot arm, and a vertical movement mechanism. The robot arm includes a first and second moving rail that intersect each other, a first base that can move along the second moving rail relative to the first moving rail, and a second base that can move the robot hand relative to the second moving rail. The conveying device 3a can move the glass substrate GS, which is the object to be conveyed, between chambers 2, 3, and 4. The robot arm may be composed of a first active arm, a second active arm, a first driven arm, and a second driven arm that can bend relative to each other.

[0068] <Vacuum Processing Room> Vacuum processing chamber 4 performs vacuum processing on the surface of the glass substrate GS to be processed. Multiple vacuum processing chambers 4 may perform the same film deposition process, or they may perform different film deposition processes. For example, vacuum processing chamber 4 performs sputtering on the surface of a glass substrate GS. Vacuum processing chamber 4 forms a film, such as a ZnO-based or In2O3-based transparent conductive film, on the surface of the glass substrate GS by sputtering. In this case, vacuum processing chamber 4 is a film deposition chamber. Vacuum processing chamber 4 performs sputtering in a reduced-pressure atmosphere.

[0069] The vacuum processing apparatus (sputtering apparatus) 1 according to this embodiment is a side-sputtering type as shown in the figure. In other words, the vacuum processing chamber 4 performs sputtering on a glass substrate GS whose surface to be processed is in a vertical position approximately aligned with the Z direction.

[0070] The vacuum processing chamber 4 comprises a plasma chamber 4m and a platen chamber 4n. The platen chamber 4n changes the orientation of the glass substrate GS, which has been transported in a horizontal position, to a vertical position. The plasma chamber 4m performs vacuum processing, such as film deposition, on the vertically positioned glass substrate GS.

[0071] <Plasma Chamber> In the plasma chamber 4m, a film deposition process is performed on the glass substrate GS. In other words, the plasma chamber 4m is part of the vacuum processing chamber 4. The plasma chamber 4m is equipped with a power supply 4p, a gas atmosphere setting mechanism 4g, and a cathode unit (vacuum processing unit) 5. The power supply 4p, gas atmosphere setting mechanism 4g, and cathode unit 5 perform film deposition on the glass substrate GS. The power supply 4p, gas atmosphere setting mechanism 4g, and cathode unit 5 are an example of a vacuum processing unit. The vacuum processing unit may also be called a substrate processing mechanism or a film deposition source. If the vacuum processing unit 1 is a vapor deposition apparatus, the vacuum processing unit is a vapor deposition source.

[0072] The 4-pin power supply is connected to the backing plate 6 of the cathode unit 5. The 4-pin power supply applies a negative potential sputtering voltage to the backing plate 6. The gas atmosphere setting mechanism 4g is configured to set the gas atmosphere inside the vacuum processing chamber 4. The gas atmosphere setting mechanism 4g includes a gas introduction section for introducing a processing gas into the plasma chamber 4m and a high-vacuum exhaust section for reducing the internal space of the plasma chamber 4m (creating a high vacuum). The gas introduction section is connected to a gas supply source. The gas introduction section is, for example, a mass flow controller that adjusts the flow rate of the processing gas supplied from the gas supply source. The high-vacuum exhaust section is, for example, a turbomolecular pump.

[0073] The cathode unit 5 has a target 7 and a backing plate 6. The target 7 and backing plate 6 are located inside the plasma chamber 4m. The cathode unit 5 is erected inside the 4m plasma chamber. The cathode unit 5 includes a target 7 and a backing plate 6 that holds the target 7.

[0074] The backing plate 6 functions as a cathode electrode. The backing plate 6 is erected in the plasma chamber 4m at the position furthest from the transfer chamber 3. A target 7 is fixed to the front side of the backing plate 6, facing the glass substrate GS approximately parallel to it when processing the glass substrate GS. The backing plate 6 is an electrode for applying a negative potential sputtering voltage to the target 7. A magnetron magnetic circuit is installed on the rear side of the backing plate 6 to form a predetermined magnetic field on the target 7. The magnetron magnetic circuit is mounted on a rocking mechanism. The rocking mechanism has a drive device that rocks the magnetron magnetic circuit. The drive device of the rocking mechanism is configured to allow the magnetron magnetic circuit to rock.

[0075] The plasma chamber 4m has an opening 4b that opens into the platen chamber 4n and a connecting flange 4c that surrounds the opening 4b. The connecting flange 4c is the part that connects to the connecting flange portion 13 of the platen chamber 4n.

[0076] <Platen Chamber> The platen chamber 4n is adjacent to the plasma chamber 4m in the X direction. The platen chamber 4n has a processing opening 4d that opens into the plasma chamber 4m and a connecting flange portion (front flange portion) 13 that surrounds the processing opening 4d. The connecting flange portion 13 is the part that connects to the connecting flange 4c of the plasma chamber 4m.

[0077] The connecting flange 4c and the connecting flange portion 13 are connected so as to face each other. By connecting the connecting flange 4c and the connecting flange portion 13, the plasma chamber 4m and the platen chamber 4n are assembled, forming the vacuum processing chamber 4. Furthermore, because the connecting flange 4c and the connecting flange portion 13 are connected, the opening 4b and the processing opening 4d are in communication with each other. As a result, an internal space 4e is formed between the plasma chamber 4m and the platen chamber 4n. The internal space 4e is sealed by the connection of the connecting flange 4c and the connecting flange portion 13.

[0078] In the sealed structure of the internal space 4e, an O-ring is placed on one of the connecting flange 4c and the connecting flange portion 13, and a sealing surface is formed on the other of the connecting flange 4c and the connecting flange portion 13. The surface on which the connecting flange 4c and the connecting flange portion 13 are connected to each other is the docking surface. The docking surface is an example of the boundary position between the processing chamber and the rear chamber.

[0079] In this embodiment, the shape of the docking surface is substantially flat. However, the shape of the docking surface is not limited to a flat surface. The shape of the docking surface may be determined according to the shape of the connecting flange 4c and the connecting flange portion 13. The docking surface may be located further away from the platen chamber 4n in the X direction than the target 7 and backing plate 6. In this case, the target 7 and backing plate 6 protrude from the connecting flange 4c toward the platen chamber 4n. Alternatively, the docking surface may be located further away from the target 7 and backing plate 6 in the X direction, closer to the transport port 4a.

[0080] As shown in Figure 1, the internal space 4e has a front space 4e1 and a back space 4e2. The front space 4e1 and the back space 4e2 are adjacent to each other in the X direction. The front space 4e1 is the space facing the surface where the film-deposited surface of the glass substrate GS is exposed during film deposition. The front space 4e1 may be formed by a combination of the internal space of the plasma chamber 4m and the internal space of the platen chamber 4n. A backing plate 6 to which the target 7 is fixed is placed in the front space 4e1.

[0081] The back space 4e2 is the main internal space of the platen chamber 4n. The back space 4e2 is the space facing the back surface of the glass substrate GS during film deposition. The platen chamber 4n is a rear chamber located on the back side of the substrate being processed relative to the deposition chamber where the film deposition process is performed. The platen mechanism 4h is located in the back space 4e2. The platen mechanism 4h can be called a rotational support mechanism.

[0082] These front space 4e1 and back space 4e2 form the internal space 4e of the vacuum processing chamber 4, which is assembled from the plasma chamber 4m and the platen chamber 4n, in a sealed state. A mask 4j is placed at the boundary position (processing opening) 4d between the front space 4e1 and the back space 4e2.

[0083] The platen chamber 4n has a transport port 4a. The transport port 4a is an opening through which the glass substrate GS passes when the glass substrate GS is transported in the X direction. The transport port 4a is located between the transfer chamber 3 and the vacuum processing chamber 4. The platen chamber 4n is adjacent to the transfer chamber 3 via the transport port 4a. A partition valve is located at the transport port 4a. The opening and closing of the partition valve switches between a state in which the platen chamber 4n and the transfer chamber 3 are in communication, and a state in which the platen chamber 4n is isolated from the transfer chamber 3.

[0084] The platen chamber 4n has a platen mechanism 4h. The platen mechanism 4h supports the glass substrate GS, which is fed in from the transport port 4a, in a lateral position. The platen mechanism 4h rotates the glass substrate GS while supporting it. The platen mechanism 4h supports the glass substrate GS in a vertical position during the film deposition process in the plasma chamber 4m. The platen mechanism 4h changes the orientation of the glass substrate GS between the lateral and vertical positions.

[0085] The plasma chamber 4m and the platen chamber 4n are separable from each other in the X direction. When the plasma chamber 4m and the platen chamber 4n are separated, the mask 4j may be placed inside the platen chamber 4n. At the same time, the target 7 and the backing plate 6 may be placed inside the plasma chamber 4m.

[0086] <Mask> The mask 4j is positioned inside the platen chamber 4n. In the X direction, the mask 4j is closer to the transport port 4a than to the connecting flange portion 13. The mask 4j is positioned between the glass substrate GS in the film deposition upright position (vertical position) and the cathode unit 5. The mask 4j is erected facing the plasma chamber 4m. Mask 4j has a substantially rectangular mask frame. Mask 4j may have multiple ribs stretched across the mask frame so as to extend in the longitudinal and transverse directions. The multiple ribs define the inner region of the mask frame. The mask frame is made of a rigid metal such as SUS. The ribs are made of metal foil such as Invar. The ribs are fixed to the mask frame with both ends pulled taut by the mask frame. Inside the mask frame, the region surrounded by multiple ribs stretched in the vertical and horizontal directions is the film deposition region.

[0087] The mask 4j has a deposition opening in its central portion. The deposition opening is an opening formed by the mask frame. The deposition opening is located at the boundary between the front space 4e1 and the back space 4e2. The mask 4j has mask support sections. These support sections are provided at both ends of the mask frame in the Z direction and at both ends of the mask frame in the Y direction. The mask 4j is supported by the platen chamber 4n or plasma chamber 4m by the mask support sections. At this time, the position of the mask 4j can be aligned in the pre-deposition process by a mask alignment section (not shown).

[0088] <Platen mechanism> The platen mechanism 4h includes a platen shaft (rotating shaft) 4h1, a substrate holding part 4h2, and a lift pin 4f. The platen mechanism 4h is located in the lower part of the rear space 4e2 inside the platen chamber 4n. The platen shaft 4h1 extends in the Y direction. The platen shaft 4h1 is substantially parallel to at least one of the conveying port 4a and the connecting flange portion 13.

[0089] The platen shaft 4h1 is rotatable around a center of rotation along the Y direction. A rotary drive unit 4h11 is connected to the platen shaft 4h1. The rotary drive unit 4h11 enables the platen shaft 4h1 to rotate around its center of rotation. The rotary drive unit 4h11 includes a rotary drive source such as a motor, and a rotary transmission unit such as a reduction gear that transmits the driving force of the rotary drive source to the platen shaft 4h1.

[0090] As described later, the platen shaft 4h1 penetrates the side wall forming the platen chamber 4n. The platen shaft 4h1 penetrates the side wall forming the back space 4e2 of the platen chamber 4n. The position where the platen shaft 4h1 penetrates the side wall of the platen chamber 4n is near the connecting flange portion 13. The position where the platen shaft 4h1 penetrates the side wall of the platen chamber 4n is spaced apart from the connecting flange portion 13. The rotary drive unit 4h11 is located outside the vacuum processing chamber 4. The rotary drive unit 4h11 may be connected to both ends of the platen shaft 4h1 in the Y direction.

[0091] The substrate holder 4h2 is attached to the platen shaft 4h1 via a fixing part 4h3. The substrate holder 4h2 is, for example, a platen. When the substrate holder 4h2 is in the horizontal transport position (spear position), the contour shape of the substrate holder 4h2 is approximately rectangular when viewed in the Z direction. The substrate holder 4h2 is rotatable around the rotation center of the platen shaft 4h1 between the horizontal transport position and the film deposition upright position. The substrate holding section 4h2 can support the back surface of the glass substrate GS within the platen chamber 4n. The platen mechanism 4h can rotate the glass substrate GS between the horizontal transport position and the film deposition upright position while supporting the glass substrate GS with the substrate holding section 4h2.

[0092] When the glass substrate GS is moved horizontally through the transport port 4a, the substrate holder 4h2 is in the horizontal transport position. In this case, the substrate holder 4h2 has a rectangular shape with its contour aligned along the X and Y directions. The substrate holder 4h2 in the horizontal transport position supports the glass substrate GS in a lateral position.

[0093] The platen mechanism 4h can transport the glass substrate GS into the deposition chamber 4 from the transport opening 4a when the substrate holding section 4h2 is positioned in the horizontal transport position. The platen mechanism 4h can also transport the glass substrate GS out of the deposition chamber 4 from the transport opening 4a when the substrate holding section 4h2 is positioned in the horizontal transport position. In other words, in the horizontal transport position, the platen mechanism 4h can maintain a supported state for the glass substrate GS and can also release the supported state for the glass substrate GS.

[0094] The platen mechanism 4h supports the glass substrate GS in a vertical position when the substrate holding section 4h2 is positioned in the film deposition upright position. In the film deposition upright position, the substrate holding section 4h2 supports the glass substrate GS so as to face the mask 4j. In this state, the platen mechanism 4h maintains the holding (support) of the glass substrate GS so that it faces the target 7 during film deposition. In this state, the film deposition process is performed on the glass substrate GS.

[0095] The platen mechanism 4h includes a lift pin 4f and a lift pin moving device 4f1 that moves the lift pin 4f up and down. The lift pin 4f is provided on the substrate holding section 4h2. The lift pin 4f is a pin that extends in the vertical direction. Multiple lift pins 4f are arranged along the upper surface of the substrate holding section 4h2 at approximately equal intervals. When the glass substrate GS is loaded into the vacuum processing chamber 4) or when the glass substrate GS is unloaded from the vacuum processing chamber 4), the lift pin 4f protrudes upward from the substrate holding section 4h2, which is positioned in a horizontal transport position. The lift pin 4f protruding upward from the substrate holding section 4h2 supports the glass substrate GS located above the substrate holding section 4h2.

[0096] In the raised position, the tip of the lift pin 4f is positioned above the surface of the substrate holding portion 4h2. In the raised position, the tip of the lift pin 4f is above the substrate holding portion 4h2 in the horizontal transport position, and it contacts and supports the back surface of the glass substrate GS. The lift pin 4f is moved vertically downward from its raised position to its lowered position by the lift pin moving device 4f1. In the lowered position, the tip of the lift pin 4f is positioned below the surface of the substrate holder 4h2. In the lowered position, the lift pin 4f is positioned so as not to interfere with the rotational movement of the substrate holder 4h2. In the lowered position, the lift pin 4f places the glass substrate GS onto the substrate holder 4h2. The lift pin 4f may be provided in the substrate holding portion 4h2, or it may be provided at the bottom of the platen chamber 4n.

[0097] The lift pin moving device 4f1 is a drive device such as a drive motor located outside the vacuum processing chamber 4. The lift pin moving device 4f1 has a configuration in which the lift pin 4f is extended or retracted by the drive device. The lift pin 4f can be driven by the drive device while maintaining the airtight seal of the chamber 4. With this configuration, when loading or unloading the glass substrate GS into or out of the film deposition chamber 4, the glass substrate GS can be freely transferred between the substrate holding unit 4h2 and the robot hand of the transfer device 3a. The platen mechanism 4h allows for the receiving and transfer of the glass substrate GS by the lift pin 4f when the substrate holding section 4h2 is positioned in the horizontal transport position.

[0098] <Platen Chamber Outer Shell> The platen chamber 4n has a pressure-resistant chamber wall as its outer shell. In the following description, the chamber wall of platen chamber 4n will be referred to as platen chamber 10.

[0099] Figure 2 is a perspective view of the platen chamber of this embodiment, seen from the upper right rear. Figure 3 is a perspective view of the platen chamber of this embodiment, partially transparent, seen from the upper right rear. Figure 4 is a perspective view of the platen chamber of this embodiment, seen from the upper right front. Figure 5 is a perspective view of the platen chamber of this embodiment, seen from the lower right front. Figure 6 is a top view of the platen chamber in this embodiment. Figure 7 is a bottom view of the platen chamber in this embodiment. Figure 8 is a right side view of the platen chamber in this embodiment. Figure 9 is a left side view of the platen chamber in this embodiment. Figure 10 is a rear view of the platen chamber in this embodiment. Figure 11 is a front view of the platen chamber in this embodiment.

[0100] As shown in Figures 2 to 11, the platen chamber 10 has a bottom portion 11, a rear wall portion 12, a front flange portion (connecting flange portion) 13, a right lateral side wall portion (lateral side wall portion) 14, a left lateral side wall portion (lateral side wall portion) 15, and a curved top portion 16. The platen chamber 10 has three curved surfaces, the curved top section 16, the right lateral wall section 14, and the left lateral wall section 15, all of which are curved in an outward convex direction. The bottom portion 11 extends along a substantially horizontal plane. The bottom portion 11 covers the lower surface of the platen chamber 10.

[0101] The rear wall portion 12 is erected upward from the rear end of the bottom portion 11. The rear wall portion 12 has a planar shape along the Z and Y directions. The rear wall portion 12 is substantially flat. The rear wall portion 12 has a transport opening 4a for loading and unloading glass substrates GS. The transport opening 4a is a slit in which the dimension in the Y direction is longer than the dimension in the Z direction. The transport opening 4a is formed in the center of the rear wall portion 12 in the Y direction. The transport opening 4a has a substantially rectangular contour when viewed in the X direction.

[0102] The rear wall portion 12 has a rear inner lower transverse rib portion 72s1 and a rear inner upper transverse rib portion 72s2. Both the rear inner lower transverse rib portion 72s1 and the rear inner upper transverse rib portion 72s2 are located on the front surface 12b. The rear inner lower transverse rib portion 72s1 and the rear inner upper transverse rib portion 72s2 are arranged along the Y direction. The rear inner lower transverse rib portion 72s1 and the rear inner upper transverse rib portion 72s2 are located close to the transport opening 4a. The rear inner lower transverse rib portion 72s1 and the rear inner upper transverse rib portion 72s2 are arranged along the transport opening 4a. The rear inner lower transverse rib portion 72s1 is located below the transport opening 4a. The rear inner upper transverse rib portion 72s2 is located above the transport opening 4a.

[0103] The right lateral wall section 14 and the left lateral wall section 15 are lateral wall sections. The right lateral wall section 14 is erected from the rightmost end in the Y direction of the bottom section 11 upward in the Z direction. The front end of the right lateral wall section 14 in the X direction is connected to the front flange section 13. The rear end of the right lateral wall section 14 in the X direction is connected to the rear wall section 12. The upper end of the right lateral wall section 14 in the Z direction is connected to the curved top section 16. The lower end of the right lateral wall section 14 in the Z direction is connected to the bottom section 11.

[0104] The left lateral side wall section 15 is erected from the left end in the Y direction of the bottom section 11 upward in the Z direction. The front end in the X direction of the left lateral side wall section 15 is connected to the front flange section 13. The rear end in the X direction of the left lateral side wall section 15 is connected to the rear wall section 12. The upper end in the Z direction of the left lateral side wall section 15 is connected to the curved top section 16. The lower end in the Z direction of the left lateral side wall section 15 is connected to the bottom section 11. The right lateral wall section 14 and the left lateral wall section 15 are symmetrical in the Y direction. The shapes of the right lateral wall section 14 and the left lateral wall section 15 will be described later.

[0105] The front flange portion (connecting flange portion) 13 is erected from the front end in the X direction of the bottom portion 11 upward in the Z direction. The front flange portion 13 has a planar shape along the Z and Y directions. The front flange portion 13 has a substantially flat plate shape. The front flange portion 13 has a processing opening 4d that opens toward the vacuum processing unit 5. The front flange portion 13 surrounds the entire circumference of the rectangular processing opening 4d. The front flange portion 13 is frame-shaped.

[0106] The front flange portion 13 has a larger contour shape than the contour formed by the right lateral side wall portion 14, the left lateral side wall portion 15, and the curved top portion 16 when viewed from the front. The front flange portion 13 is connected to the rear surface of the right lateral side wall portion 14, the left lateral side wall portion 15, and the curved top portion 16, which are located towards the rear in the X direction. The front flange portion 13 and the rear wall portion 12 are substantially parallel to each other. The upper end of the front flange portion 13 may be closer to the rear wall portion 12 in the X direction than its lower end. The upper end of the front flange portion 13 is positioned higher than the upper end of the rear wall portion 12.

[0107] The curved top section 16 has its front end in the X direction connected to the front flange section 13. The curved top section 16 has its rear end in the X direction connected to the rear wall section 12. The curved top section 16 has its right end in the Y direction connected to the right lateral wall section 14. The curved top section 16 has its left end in the Y direction connected to the left lateral wall section 15. The curved top section 16 is a curved surface that curves outward from the front flange section 13 to the rear wall section 12. The curved top section 16 has a constant height in the Y direction. The height of the curved top section 16 changes gradually in the X direction. In other words, the curved top section 16 has a surface similar to a cylindrical surface around the central axis of the platen axis 4h1.

[0108] The curved top section 16 connects to the front flange section 13 via a horizontal line B36 at the front upper boundary. The horizontal line B36 at the front upper boundary is the connection point between the curved top section 16 and the front flange section 13. The horizontal line B36 at the front upper boundary is a straight line along the Y direction. The curved top section 16 connects to the rear wall section 12 via a horizontal line B26 at the rear upper boundary. The horizontal line B26 at the rear upper boundary is the connection point between the curved top section 16 and the rear wall section 12. The horizontal line B26 at the rear upper boundary is a straight line along the Y direction.

[0109] The horizontal line B26 at the rear upper boundary is lower in the Z direction than the horizontal line B36 at the front upper boundary. The curved top section 16 has a front connection position where it connects to the front flange section 13 that is higher than the rear connection position where it connects to the rear wall section 12. The curved top section 16 curves outward convexly around the platen axis 4h1 from the rear upper boundary transverse line B26 to the front upper boundary transverse line B36. The curved top section 16 rises from the rear upper boundary transverse line B26 to the front upper boundary transverse line B36.

[0110] The curved top section 16 extends rearward in the X direction from the horizontal line B36 at the front upper boundary. The curved top section 16 connects to the front flange section 13 in a substantially horizontal direction. The curved top section 16 extends approximately upward in the Z direction from the horizontal line B26 at the rear upper end boundary. The curved top section 16 connects to the rear wall section 12 in an approximately perpendicular direction. The curved top section 16 may also be connected to the rear wall section 12 at an inclination greater than approximately perpendicular.

[0111] The curved top section 16 connects to the right lateral wall section 14 at the upper right boundary curve B46. The upper right boundary curve B46 is the connection point between the curved top section 16 and the right lateral wall section 14. The upper right boundary curve B46 is the boundary line between the curved top section 16 and the right lateral wall section 14. Both the curved top section 16 and the right lateral wall section 14 are curved surfaces. Therefore, the upper right boundary curve B46 is the junction line between the two curved surfaces. The upper right boundary curve B46 is the rightmost position of the curved top section 16. The upper right boundary curve B46 is the uppermost position of the right lateral side wall section 14. The upper right boundary curve B46 is an arc-shaped curve. The rear end of the upper right boundary curve B46 connects to the rear wall section 12. The front end of the upper right boundary curve B46 connects to the front flange section 13.

[0112] The curved top section 16 connects to the left lateral wall section 15 at the upper left boundary curve B56. The upper left boundary curve B56 is the connection point between the curved top section 16 and the left lateral wall section 15. The upper left boundary curve B56 is the boundary line between the curved top section 16 and the left lateral wall section 15. Both the curved top section 16 and the left lateral wall section 15 are curved surfaces. Therefore, the upper left boundary curve B56 is the junction line between the two curved surfaces. The upper left boundary curve B56 is the leftmost position of the curved top section 16. The upper left boundary curve B56 is the uppermost position of the left lateral side wall section 15. The upper left boundary curve B56 is an arc-shaped curve. The rear end of the upper left boundary curve B56 connects to the rear wall section 12. The front end of the upper left boundary curve B56 connects to the front flange section 13.

[0113] The upper right boundary curve B46 and the upper left boundary curve B56 are symmetrical to each other. The distance in the Y direction between the leading end of the upper right boundary curve B46 and the leading end of the upper left boundary curve B56 is greater than the distance in the Y direction between the trailing end of the upper right boundary curve B46 and the trailing end of the upper left boundary curve B56.

[0114] Since the curved top section 16 connects to the front flange section 13 in a substantially horizontal direction, the upper right end boundary curve B46 and the upper left end boundary curve B56 may be straight in the vicinity of their connection to the front upper end boundary horizontal line B36. The upper right end boundary curve B46 and the upper left end boundary curve B56 may be straight in the vicinity of the front upper end boundary horizontal line B36, extending backward in the X direction from the front upper end boundary horizontal line B36.

[0115] The curved top section 16 is provided with an outer front reinforcing rib section 76s2 near where the upper right end boundary curve B46 and the upper left end boundary curve B56 transition from straight lines to curves. The outer front reinforcing rib section 76s2 is positioned near the front upper end boundary horizontal line B36. The outer front reinforcing rib section 76s2 is connected to the outer surface of the curved top section 16. The outer front reinforcing rib section 76s2 protrudes outward from the curved curved top section 16. The outer front reinforcing rib section 76s2 is positioned along the front upper end boundary horizontal line B36. The outer front reinforcing rib section 76s2 is positioned along the Y direction.

[0116] Since the curved top section 16 connects to the rear wall section 12 in a direction approximately perpendicular to it, the upper right end boundary curve B46 and the upper left end boundary curve B56 may be straight lines in the vicinity of their connection to the rear upper end boundary horizontal line B26. The upper right end boundary curve B46 and the upper left end boundary curve B56 may be straight lines that extend approximately upward in the Z direction from the rear upper end boundary horizontal line B26 in the vicinity of the rear upper end boundary horizontal line B26.

[0117] The curved top section 16 is provided with an outer rear reinforcing rib section 76s1 near where the upper right end boundary curve B46 and the upper left end boundary curve B56 transition from straight lines to curves. The outer rear reinforcing rib section 76s1 is positioned near the rear upper end boundary horizontal line B26. The outer rear reinforcing rib section 76s1 is connected to the outer surface of the curved top section 16. The outer rear reinforcing rib section 76s1 protrudes outward from the curved curved top section 16. The outer rear reinforcing rib section 76s1 is positioned along the rear upper end boundary horizontal line B26. The outer rear reinforcing rib section 76s1 is positioned along the Y direction.

[0118] The front flange portion 13 connects to the right lateral side wall portion 14 at the right front end boundary curve B34. The right front end boundary curve B34 is the connection point between the front flange portion 13 and the right lateral side wall portion 14. The right front end boundary curve B34 is formed along the rear surface 13b of the front flange portion 13. The right front end boundary curve B34 is the front end position of the right lateral side wall portion 14. The right front end boundary curve B34 is the front longitudinal line position, the front end boundary curve. The right front end boundary curve B34 is a curve that curves in an arc shape. The upper end of the right front end boundary curve B34 connects to the right upper end boundary curve B46 and the front upper end boundary horizontal line B36 at a single point. The lower end of the right front boundary curve B34 connects to the right lower boundary line B14 and the front lower boundary horizontal line B13. The front lower boundary horizontal line B13 is the connection point between the front flange portion 13 and the bottom portion 11. The right lower boundary line B14 is the connection point between the right lateral side wall portion 14 and the bottom portion 11.

[0119] The front flange portion 13 connects to the left lateral side wall portion 15 at the left front end boundary curve B35. The left front end boundary curve B35 is the connection point between the front flange portion 13 and the left lateral side wall portion 15. The left front end boundary curve B35 is formed along the rear surface 13b of the front flange portion 13. The left front end boundary curve B35 is the front end position of the left lateral side wall portion 15. The left front end boundary curve B35 is the front longitudinal line position, the front end boundary curve. The left front end boundary curve B35 is a curve that curves in an arc shape. The upper end of the left front end boundary curve B35 connects to the left upper end boundary curve B56 and the front upper end boundary horizontal line B36 at a single point. The lower end of the left front boundary curve B35 connects to the left lower boundary line B15 and the front lower boundary horizontal line B13. The left lower boundary line B15 is the connection point between the left lateral side wall 15 and the bottom 11.

[0120] The right front end boundary curve B34 and the left front end boundary curve B35 are symmetrical to each other. Both the right front end boundary curve B34 and the left front end boundary curve B35 are formed on the rear surface 13b of the front flange portion 13, which is a flat surface. The curvature of the right front end boundary curve B34 and the curvature of the left front end boundary curve B35 are both equal. The radius of curvature of the right front end boundary curve B34 and the radius of curvature of the left front end boundary curve B35 are both equal.

[0121] The rear wall section 12 connects to the right lateral side wall section 14 via the right rear end boundary curve B24. The right rear end boundary curve B24 is the connection point between the rear wall section 12 and the right lateral side wall section 14. The right rear end boundary curve B24 is formed along the front surface 12b of the rear wall section 12. The right rear end boundary curve B24 is the rear end position of the right lateral side wall section 14. The right rear end boundary curve B24 is the rear vertical line position and rear end boundary curve. The right rear end boundary curve B24 is a curve that curves in an arc shape. The upper end of the right rear end boundary curve B24 connects to the right upper end boundary curve B46 and the rear upper end boundary horizontal line B26 at a single point. The lower end of the right rear boundary curve B24 connects to the right lower boundary line B14 and the rear lower boundary horizontal line B12. The rear lower boundary horizontal line B12 is the connection point between the rear wall 12 and the bottom 11.

[0122] The rear wall section 12 connects to the left lateral side wall section 15 at the left rear end boundary curve B25. The left rear end boundary curve B25 is the connection point between the rear wall section 12 and the left lateral side wall section 15. The left rear end boundary curve B25 is formed along the front surface 12b of the rear wall section 12. The left rear end boundary curve B25 is the rear end position of the left lateral side wall section 15. The left rear end boundary curve B25 is the rear vertical line position and rear end boundary curve. The left rear end boundary curve B25 is a curve that curves in an arc shape. The upper end of the left rear end boundary curve B25 connects to the left upper end boundary curve B56 and the rear upper end boundary horizontal line B26 at a single point. The lower end of the left rear boundary curve B25 connects to the left lower boundary line B15 and the rear lower boundary horizontal line B12.

[0123] The right rear boundary curve B24 and the left rear boundary curve B25 are symmetrical to each other. Both the right rear boundary curve B24 and the left rear boundary curve B25 are formed on the front surface 12b of the rear wall portion 12, which is a plane. The curvature of the right rear boundary curve B24 and the curvature of the left rear boundary curve B25 are both equal. The radius of curvature of the right rear boundary curve B24 and the radius of curvature of the left rear boundary curve B25 are both equal.

[0124] The right front boundary curve B34 and the right rear boundary curve B24 both lie on the same conical surface. In other words, the right lateral side wall portion 14 lies on a conical surface. The right front boundary curve B34, the right rear boundary curve B24, and the right lateral side wall portion 14 all lie on a conical surface with a single vertex. Therefore, when the front flange portion 13 and the rear wall portion 12 are parallel to each other, the right front boundary curve B34 and the right rear boundary curve B24 are similar arcs. When the front flange portion 13 and the rear wall portion 12 are approximately parallel to each other, the right front boundary curve B34 and the right rear boundary curve B24 are approximately similar arcs. When the front flange portion 13 is inclined with a small angle of inclination from a position parallel to the rear wall portion 12, the right front boundary curve B34 and the right rear boundary curve B24 are approximately similar arcs. The outward convex curvature of the right front boundary curve B34 is smaller than the outward convex curvature of the right rear boundary curve B24. The radius of curvature of the right front boundary curve B34 is larger than the radius of curvature of the right rear boundary curve B24.

[0125] The apex of the conical surface of the right lateral wall portion 14 is located outside the platen chamber 10. The apex of the conical surface of the right lateral wall portion 14 is located behind the rear wall portion 12 in the X direction. The apex of the conical surface of the right lateral wall portion 14 is located closer to the center of the platen chamber 10 in the Y direction than the right rear end boundary curve B24. The apex of the conical surface of the right lateral wall portion 14 may be located above the rear upper end boundary horizontal line B26 in the Z direction. The apex of the conical surface of the right lateral wall portion 14 may be located between the rear upper end boundary horizontal line B26 and the rear lower end boundary horizontal line B12 in the Z direction. The apex of the conical surface of the right lateral wall portion 14 may be located below the rear lower end boundary horizontal line B12 in the Z direction.

[0126] The left front boundary curve B35 and the left rear boundary curve B25 both lie on the same conical surface. In other words, the left lateral side wall portion 15 lies on a conical surface. The left front boundary curve B35, the left rear boundary curve B25, and the left lateral side wall portion 15 all lie on a conical surface with a single vertex. Therefore, when the front flange portion 13 and the rear wall portion 12 are parallel to each other, the left front boundary curve B35 and the left rear boundary curve B25 are similar arcs. When the front flange portion 13 and the rear wall portion 12 are approximately parallel to each other, the left front boundary curve B35 and the left rear boundary curve B25 are approximately similar arcs. When the front flange portion 13 is inclined with a small angle of inclination from a position parallel to the rear wall portion 12, the left front boundary curve B35 and the left rear boundary curve B25 are approximately similar arcs. The outward convex curvature of the left front boundary curve B35 is smaller than that of the left rear boundary curve B25. The radius of curvature of the left front boundary curve B35 is larger than that of the left rear boundary curve B25.

[0127] The apex of the conical surface of the left lateral wall portion 15 is located outside the platen chamber 10. The apex of the conical surface of the left lateral wall portion 15 is located behind the rear wall portion 12 in the X direction. The apex of the conical surface of the left lateral wall portion 15 is located closer to the center of the platen chamber 10 in the Y direction than the left rear end boundary curve B25. The apex of the conical surface of the left lateral wall portion 15 may be located above the rear upper end boundary horizontal line B26 in the Z direction. The apex of the conical surface of the left lateral wall portion 15 may be located between the rear upper end boundary horizontal line B26 and the rear lower end boundary horizontal line B12 in the Z direction. The apex of the conical surface of the left lateral wall portion 15 may be located below the rear lower end boundary horizontal line B12 in the Z direction.

[0128] The right lateral wall section 14 and the left lateral wall section 15 face each other in the left-right direction. The right lateral wall section 14 and the left lateral wall section 15 have symmetrical shapes in the Y direction. Since both the right lateral wall section 14 and the left lateral wall section 15 are composed of conical surfaces, the distance between them in the Y direction is greater in front of them than behind them. In other words, the distance between the right front boundary curve B34 and the left front boundary curve B35 in the Y direction is greater in front of them than the distance between the right rear boundary curve B24 and the left rear boundary curve B25 in the Y direction.

[0129] Furthermore, since both the right lateral wall portion 14 and the left lateral wall portion 15 are composed of conical surfaces, the distance between them in the Y direction decreases as you move towards the rear in the X direction. Therefore, the platen chamber 10 has a trapezoidal shape when viewed from above. The platen chamber 10 has a trapezoidal outline when viewed from above, with the rear wall portion 12 being the shorter side and the front flange portion 13 being the longer side. This is because the Y-direction dimension of the mask 4j is larger than the Y-direction dimension of the conveying port 4a.

[0130] Furthermore, if the Y-direction dimension of the transport port 4a and the Y-direction dimension of the mask 4j are approximately the same, the platen chamber 10 can have a rectangular outer contour in which the length of the side of the rear wall portion 12 and the length of the side of the front flange portion 13 are approximately the same when viewed from above. Furthermore, if the Y-direction dimension of the mask 4j is smaller than the Y-direction dimension of the transport opening 4a, the platen chamber 10 may have a trapezoidal outline when viewed from above, with the rear wall portion 12 being the longer side and the front flange portion 13 being the shorter side.

[0131] The right lateral side wall portion 14 has a through hole portion 14h. The through hole portion 14h is formed in a position close to the bottom portion 11 and the front flange portion 13. The through hole portion 14h is a through hole through which the platen shaft 4h1 passes. The right lateral side wall portion 14 may have a through working opening 14m. The working opening 14m may have a larger opening area than the through hole portion 14h. The working opening 14m is formed in a position closer to the rear wall portion 12 in the X direction than the through hole portion 14h. The working opening 14m can be closed and sealed by a door or the like (not shown).

[0132] The left lateral side wall portion 15 has a through hole portion 14h. The through hole portion 14h is formed in a position close to the bottom portion 11 and the front flange portion 13. The through hole portion 14h is a through hole through which the platen shaft 4h1 passes. The left lateral side wall portion 15 may have a through working opening 14m. The working opening 14m may have a larger opening area than the through hole portion 14h. The working opening 14m is formed in a position closer to the rear wall portion 12 in the X direction than the through hole portion 14h. The working opening 14m can be closed and sealed by a door or the like (not shown).

[0133] The through-hole 14h of the right lateral wall portion 14 and the through-hole 14h of the left lateral wall portion 15 are located in a position that overlaps when viewed in the Y direction. The left and right through-holes 14h are located coaxially. The left and right through-holes 14h have the same diameter. The left and right through-holes 14h are at the same distance from the bottom portion 11. The left and right through-holes 14h are at the same distance from the front flange portion 13. Both the left and right through-holes 14h have a pipe section having an axis in the Y direction along the through-hole. Both the left and right through-holes 14h have a through-flange section formed around the through-hole. The strength of the left and right through-holes 14h is increased by the pipe section and the flange section. The strength of the left and right working openings 14m can also be increased by a structure having a pipe section and a flange section, similar to the through-holes 14h.

[0134] The base 11 has multiple parallel ridges. These multiple ridges extend in the left-right direction. In other words, the base 11 has a structure similar to that of so-called sheet piles. The base 11 has a structure in which indents and outdents alternate. The bottom 11 has a bottom top surface 11a, a bottom rear inclined surface 11b, a bottom bottom bottom surface 11c, a bottom front inclined surface 11d, a bottom top surface 11e, a bottom rear inclined surface 11f, a bottom bottom bottom surface 11g, a bottom front inclined surface 11h, a bottom top surface 11j, a bottom rear inclined surface 11k, and a bottom bottom surface 11m, all of which have a length dimension in the Y direction greater than their width dimension in the X direction.

[0135] The bottom upper surfaces 11a, 11e, and 11j are all on the same plane. The bottom upper surfaces 11a, 11e, and 11j are all approximately horizontal. The bottom upper surfaces 11a, 11e, and 11j are on the same plane as the rear inner lower transverse rib portion 72s1. The bottom upper surfaces 11a, 11e, and 11j may be on a horizontal plane above the rear inner lower transverse rib portion 72s1. The bottom upper surfaces 11a, 11e, and 11j may be on a horizontal plane below the rear inner lower transverse rib portion 72s1.

[0136] The bottom surfaces 11c, 11g, and 11m are all on the same plane. The bottom surfaces 11c, 11g, and 11m are all approximately horizontal. The top surfaces 11a, 11e, and 11j are located above the bottom surfaces 11c, 11g, and 11m in the Z direction.

[0137] The bottom upper surfaces 11a, 11e, 11j, 11c, 11g, and 11m are all parallel. The bottom upper surfaces 11a, 11e, and 11j all have the same width dimension in the X direction. The bottom lower surfaces 11c and 11g all have the same width dimension in the X direction. The width dimension in the X direction of the bottom lower surface 11m is greater than the width dimension in the X direction of the bottom lower surface 11g. The width dimensions in the X direction of the bottom upper surfaces 11a, 11e, and 11j are greater than the width dimension in the X direction of the bottom lower surface 11g.

[0138] The rear bottom inclined surface 11b is connected to the top bottom surface 11a at its rear in the X direction. The front of the rear bottom inclined surface 11b is connected to the bottom bottom surface 11c. The rear bottom inclined surface 11b slopes downward in the X direction from the top bottom surface 11a to the bottom bottom surface 11c. The rear bottom inclined surface 11f is connected to the top bottom surface 11e at its rear in the X direction. The front of the rear bottom inclined surface 11f is connected to the bottom bottom surface 11g. The rear bottom inclined surface 11f slopes downward in the X direction from the top bottom surface 11e to the bottom bottom surface 11g.

[0139] The bottom rear inclined surface 11b and the bottom rear inclined surface 11f are parallel. The bottom rear inclined surface 11k is connected to the bottom upper surface 11j at its rear in the X direction. The bottom rear inclined surface 11k is connected to the bottom lower surface 11m at its front in the X direction. The bottom rear inclined surface 11k slopes downward in the X direction from the bottom upper surface 11j to the bottom lower surface 11m. The bottom rear inclined surface 11k and the bottom rear inclined surface 11f are parallel. The angle of inclination of the bottom rear inclined surface 11b with respect to the bottom upper surface 11a, the angle of inclination of the bottom rear inclined surface 11f with respect to the bottom upper surface 11e, and the angle of inclination of the bottom rear inclined surface 11k with respect to the bottom upper surface 11j are all of equal magnitude.

[0140] The bottom front inclined surface 11d is connected to the bottom bottom surface 11c at its rear in the X direction. The bottom front inclined surface 11d is connected to the bottom top surface 11e at its front in the X direction. The bottom front inclined surface 11d slopes downward in the X direction from the bottom top surface 11e towards the bottom bottom surface 11c. The bottom front inclined surface 11h is connected to the bottom bottom surface 11g at its rear in the X direction. The bottom front inclined surface 11h is connected to the bottom top surface 11j at its front in the X direction. The bottom front inclined surface 11h slopes downward in the X direction from the bottom top surface 11j towards the bottom bottom surface 11g. The angle of inclination of the front base inclined surface 11d with respect to the top base surface 11e and the angle of inclination of the front base inclined surface 11h with respect to the top base surface 11j are both of equal magnitude. The angle of inclination of the rear base inclined surface 11b with respect to the top base surface 11a and the angle of inclination of the front base inclined surface 11d with respect to the bottom base surface 11c are both of equal magnitude.

[0141] The bottom rear inclined surface 11b, the bottom bottom surface 11c, and the bottom front inclined surface 11d form downward ridges in the Z direction relative to the bottom top surfaces 11a, 11e, and 11j. The bottom rear inclined surface 11f, the bottom bottom surface 11g, and the bottom front inclined surface 11h form downward ridges in the Z direction relative to the bottom top surfaces 11a, 11e, and 11j. The bottom rear inclined surface 11k and the bottom bottom surface 11m form downward ridges in the Z direction relative to the bottom top surfaces 11a, 11e, and 11j. The bottom upper surface 11a and the bottom rear inclined surface 11b form upward-pointing protrusions in the Z direction with respect to the bottom lower surfaces 11c, 11g, and 11m. The bottom front inclined surface 11d, the bottom upper surface 11e, and the bottom rear inclined surface 11f form upward-pointing protrusions in the Z direction with respect to the bottom lower surfaces 11c, 11g, and 11m. The bottom front inclined surface 11h, the bottom upper surface 11j, and the bottom rear inclined surface 11k form upward-pointing protrusions in the Z direction with respect to the bottom lower surfaces 11c, 11g, and 11m.

[0142] The bottom portion 11 has equal dimensions in the vertical direction across multiple protrusions. The bottom portion 11 has equal dimensions in the front-to-back direction across multiple protrusions. The left-to-right dimension of the bottom portion 11 across multiple protrusions is determined by the Y-direction distance between the right lower boundary line B14 and the left lower boundary line B15.

[0143] The bottom upper surfaces 11a, 11e, and 11j are located below the lower end of the platen mechanism in the Z direction. As a result, the bottom portion 11 does not obstruct the movement of the glass substrate GS by the platen mechanism. The bottom portion 11 has increased strength due to the formation of multiple protrusions.

[0144] The bottom portion 11 is through which the gas atmosphere setting mechanism 4g and the lift pin moving device 4f1 pass. The gas atmosphere setting mechanism 4g and the lift pin moving device 4f1 penetrate the bottom 11 at predetermined positions on the bottom upper surface 11a, bottom upper surface 11e, bottom upper surface 11j, bottom lower surface 11c, bottom lower surface 11g, and bottom lower surface 11m. By setting the positions where the gas atmosphere setting mechanism 4g and the lift pin moving device 4f1 penetrate the bottom 11 to be on the bottom upper surface 11a, bottom upper surface 11e, bottom upper surface 11j, bottom lower surface 11c, bottom lower surface 11g, and bottom lower surface 11m, it is possible to easily form through holes and maintain a sealed environment.

[0145] <Inner rib section> The platen chamber 10 has a right inwardly inclined rib portion (inner rib portion) 74 and a left inwardly inclined rib portion (inner rib portion) 75. The right inwardly inclined rib portion 74 and the left inwardly inclined rib portion 75 are located on the left and right sides of the platen chamber 10 at a lower front position.

[0146] The right inclined rib portion 74 is positioned in the front lower right position of the platen chamber 10. The right inclined rib portion 74 is flat. The right inclined rib portion 74 is inclined to descend towards the rear in the X direction. The right inclined rib portion 74 is located above the through hole portion 14h. The right inclined rib portion 74 is not connected to the through hole portion 14h. The right inclined rib portion 74 may be connected to the through hole portion 14h. The right inclined rib portion 74 is not connected to the work opening 14m. The right inclined rib portion 74 may be connected to the work opening 14m.

[0147] The right inclined rib portion 74 has its front end 74d connected to the rear surface 13b of the front flange portion 13. The connection point of the front end 74d with the rear surface 13b is in a straight line along the Y direction. The entire length of the front end 74d is connected to the rear surface 13b of the front flange portion 13.

[0148] The right inclined rib portion 74 has its rear end 74a connected to the bottom rear inclined surface 11f of the bottom portion 11. The connection point of the rear end 74a with the bottom portion 11 is in a straight line along the Y direction. The entire length of the rear end 74a is connected to the bottom portion 11. The right inward sloping rib portion 74 may have its rear end 74a connected to the bottom surface 11g of the bottom portion 11. The right inward sloping rib portion 74 may also have its rear end 74a connected to the boundary position between the bottom rear sloping surface 11f and the bottom surface 11g of the bottom portion 11.

[0149] The right inclined rib portion 74 has its right outer end (lateral outer end) 74b connected to the right lateral side wall portion 14. The right outer end 74b is a curve that follows the inner surface of the right lateral side wall portion 14. The right outer end 74b slopes downward from the front end 74d toward the rear end 74a. The entire length of the right outer end 74b is connected to the right lateral side wall portion 14.

[0150] The right inclined rib portion 74 has a straight left inner end 74c. The left inner end 74c slopes downward along the X direction from the front end 74d to the rear end 74a. The left inner end 74c is a straight line that substantially coincides with the vertical side of the processing opening 4d of the front flange portion 13 when viewed in the X direction. The left inner end 74c is a straight line along the X direction when viewed in the Z direction. The left inner end 74c is a straight line that substantially coincides with the vertical side of the processing opening 4d of the front flange portion 13 when viewed in the Z direction. The left inner end 74c may not be connected to any other part of the platen chamber 10.

[0151] The right inclined rib portion 74 forms a truss structure near the lower end of the front flange portion 13 and near the front end of the bottom portion 11 when viewed in the Y direction. When viewed in the Y direction, the through hole portion 14h is located inside the truss structure of the right inclined rib portion 74, the front flange portion 13 and the bottom portion 11. The through hole portion 14h may not be connected to any of the right inclined rib portion 74, the front flange portion 13 and the bottom portion 11.

[0152] The truss structure formed by the right inclined rib portion 74 is connected to the right lateral side wall portion 14 on both sides in the Y direction. The through-hole portion 14h is a position where a large load is applied to the platen chamber 10 during the drive of the platen mechanism. By forming the truss structure close to the through-hole portion 14h, the platen chamber 10 can withstand the load at its front lower part and prevent deformation at its front lower part. The platen chamber 10 can be strengthened by the right inclined rib portion 74.

[0153] The left inwardly inclined rib portion 75 is positioned in the front lower left position of the platen chamber 10. The left inwardly inclined rib portion 75 is flat. The left inwardly inclined rib portion 75 is inclined to descend towards the rear in the X direction. The left inwardly inclined rib portion 75 is located above the through hole portion 14h. The left inwardly inclined rib portion 75 is not connected to the through hole portion 14h. The left inwardly inclined rib portion 75 may be connected to the through hole portion 14h. The left inwardly inclined rib portion 75 is not connected to the work opening 14m. The left inwardly inclined rib portion 75 may be connected to the work opening 14m.

[0154] The left inwardly sloping rib portion 75 has its front end 75d connected to the rear surface 13b of the front flange portion 13. The connection point of the front end 75d with the rear surface 13b is in a straight line along the Y direction. The entire length of the front end 75d is connected to the rear surface 13b of the front flange portion 13.

[0155] The left inward sloping rib portion 75 has its rear end 75a connected to the bottom rear sloping surface 11f of the bottom portion 11. The connection point of the rear end 75a with the bottom portion 11 is in a straight line along the Y direction. The entire length of the rear end 75a is connected to the bottom portion 11. The left inwardly sloping rib portion 75 may have its rear end 75a connected to the bottom surface 11g of the bottom portion 11. The left inwardly sloping rib portion 75 may also have its rear end 75a connected to the boundary position between the bottom rear inclined surface 11f and the bottom surface 11g of the bottom portion 11.

[0156] The left inwardly sloping rib portion 75 has its left outer end (lateral outer end) 75b connected to the left lateral side wall portion 15. The left outer end 75b is a curve that follows the inner surface of the left lateral side wall portion 15. The left outer end 75b slopes downward from the front end 75d toward the rear end 75a. The entire length of the left outer end 75b is connected to the left lateral side wall portion 15.

[0157] The left inwardly sloping rib portion 75 has a straight right inner end 75c. The right inner end 75c slopes downward along the X direction from the front end 75d to the rear end 75a. The right inner end 75c is a straight line that substantially coincides with the vertical side of the processing opening 4d of the front flange portion 13 when viewed in the X direction. The right inner end 75c is a straight line along the X direction when viewed in the Z direction. The right inner end 75c is a straight line that substantially coincides with the vertical side of the processing opening 4d of the front flange portion 13 when viewed in the Z direction. The right inner end 75c may not be connected to any other part of the platen chamber 10.

[0158] The left inwardly inclined rib portion 75 forms a truss structure near the lower end of the front flange portion 13 and near the front end of the bottom portion 11 when viewed in the Y direction. When viewed in the Y direction, the through-hole portion 14h is located inside the truss structure of the left inwardly inclined rib portion 75, the front flange portion 13, and the bottom portion 11. The through-hole portion 14h may not be connected to any of the left inwardly inclined rib portion 75, the front flange portion 13, or the bottom portion 11.

[0159] The truss structure formed by the left inward-sloping rib portion 75 is connected to the left lateral side wall portion 15 on both sides in the Y direction. The through-hole portion 14h is a position where a large load is applied to the platen chamber 10 during the drive of the platen mechanism. By forming the truss structure close to the through-hole portion 14h, the platen chamber 10 can withstand the load at its front lower part and prevent deformation at its front lower part. The platen chamber 10 can be strengthened by the left inward-sloping rib portion 75.

[0160] The right inclined rib portion 74 and the left inclined rib portion 75 are symmetrical. The right inclined rib portion 74 and the left inclined rib portion 75 can prevent deformation on both the left and right sides of the front lower part of the platen chamber 10. The right inclined rib portion 74 and the left inclined rib portion 75 do not obstruct the movement of the glass substrate GS by the platen mechanism inside the platen chamber 10. By having the right inclined rib portion 74 and the left inclined rib portion 75, the platen chamber 10 can maintain the necessary strength without providing strength reinforcing members such as ribs on the outer surface of the chamber.

[0161] The platen chamber 10 has different plate thicknesses in its bottom portion 11, rear wall portion 12, front flange portion 13, right lateral side wall portion 14, left lateral side wall portion 15, and curved top portion 16. The lateral side wall portion 14 and the left lateral side wall portion 15 have the same plate thickness. The thickness of the lateral side wall section 14 and the left lateral side wall section 15 is smaller than the thickness of the rear wall section 12. The thickness of the lateral side wall section 14 and the left lateral side wall section 15 is smaller than the thickness of the front flange section 13. The thickness of the lateral side wall section 14 and the left lateral side wall section 15 is larger than the thickness of the curved top section 16. The thickness of the front flange portion 13 is smaller than the thickness of the rear wall portion 12. The thickness of the curved top portion 16 is smaller than the thickness of the rear wall portion 12. The thickness of the curved top portion 16 is smaller than the thickness of the front flange portion 13. The thickness of the front flange portion 13 is smaller than the thickness of the rear wall portion 12.

[0162] Furthermore, the plate thickness of the bottom portion 11 is smaller than the plate thickness of the front flange portion 13.

[0163] In other words, the plate thickness in the platen chamber 10 satisfies the following relationship. Rear wall section 12 ≥ Front flange section 13 > Lateral side wall sections 14, 15 ≥ Curved top section 16

[0164] in particular, ·Back wall; 65mm • Front flange section; 30mm · Lateral side wall part; 19mm ·Curved top; 15mm ·Bottom 11;21mm It can be done this way.

[0165] Furthermore, the plate thickness of the right inwardly inclined rib section (inner rib section) 74 and the left inwardly inclined rib section (inner rib section) 75 can be 19 mm. The plate thickness of the rear inner lower transverse rib portion 72s1 and the rear inner upper transverse rib portion 72s2 can be 19 mm. The plate thickness of the outer rear reinforcing rib section 76s1 and the outer front reinforcing rib section 76s2 can be 19 mm.

[0166] In this embodiment, the vacuum apparatus 1 has a platen chamber 10 in which the three surfaces of the lateral side wall 14, the left lateral side wall 15, and the curved top 16 are made of curved surfaces, and multiple protrusions are formed on the bottom 11, thereby providing sufficient strength against stress caused by the difference in internal and external pressure, and preventing deformation. Furthermore, since the platen chamber 10 has a truss structure formed by the right inward inclined rib 74 and the left inward inclined rib 75, it has sufficient strength against loads caused by the rotational movement of the platen mechanism, and can prevent deformation.

[0167] This makes it possible to reduce the plate thickness of the right lateral wall portion 14 and the left lateral wall portion 15 and the curved top portion 16 compared to conventional designs. Consequently, the weight of the platen chamber 10 can be reduced. In particular, the thickness of the lateral side wall section 14 and the left lateral side wall section 15 can be reduced by about 30% compared to conventional designs. The thickness of the curved top section 16 can also be reduced by about 30% compared to conventional designs.

[0168] Therefore, it is not necessary to provide the strength-reinforcing ribs R (see Figure 1) that were conventionally provided on the outer surface in multiple locations, and the weight of the platen chamber 10 can be reduced.

[0169] Furthermore, it is possible to manufacture the platen chamber 10 without forming the joint R1 (see Figure 1) that was previously required. This reduces the weight required for the joint R1. Also, since there is no joint R1, there is no need to perform sealing. Moreover, since there are no particles generated from the joint R1, it is possible to significantly reduce particle generation, which is a problem in vacuum processing.

[0170] At the same time, the truss structure eliminates the need for a load-bearing mechanism that was previously required due to the rotational movement of the platen mechanism, thereby reducing weight. Furthermore, the truss structure improves the reliability of the platen mechanism's operation.

[0171] A second embodiment of the vacuum processing apparatus and platen chamber according to the present invention will be described below with reference to the drawings. Figure 12 is a perspective view of the platen chamber in this embodiment, viewed from the upper right rear. Figure 13 is a rear view of the platen chamber in this embodiment. Figure 14 is a left side view of the platen chamber in this embodiment. Figure 15 is an explanatory diagram of the right lateral side wall portion 14 in this embodiment. In this embodiment, the differences from the first embodiment described above are the points relating to the curved top portion 16 and the lateral side wall portion 14 and the left lateral side wall portion 15. Other components corresponding to the first embodiment described above are denoted by the same reference numerals and their descriptions are omitted.

[0172] In Figure 15, the left right lateral wall portion 14 is depicted in the same way as the right lateral wall portion 14 in Figure 13. In Figure 15, the right right lateral wall portion 14 is the right lateral wall portion 14 that corresponds to the left lateral wall portion 15 in Figure 14, but viewed in a horizontally inverted manner. As shown in Figures 12 and 13, the platen chamber 10 of this embodiment has a structure in which the right lateral side wall 14 and the left lateral side wall 15 are made by bending a flat plate. Since the right lateral side wall 14 and the left lateral side wall 15 are symmetrical, the following description will focus on the right lateral side wall 14.

[0173] In this embodiment, the right lateral wall portion 14 is composed of a combination of planes along a virtual triangular plane having a vertex 14P located behind the rear wall portion 12 in the X direction. The right lateral wall portion 14 has a first plane 14a, a second plane 14b, a third plane 14c, a fourth plane 14d, and a fifth plane 14e, running from bottom to top. The first plane 14a, the second plane 14b, the third plane 14c, the fourth plane 14d, and the fifth plane 14e are all part of a virtual triangular plane that shares a common vertex 14P.

[0174] The boundary line between the first plane 14a and the second plane 14b is boundary line 14ab. The boundary line between the second plane 14b and the third plane 14c is boundary line 14bc. The boundary line between the third plane 14c and the fourth plane 14d is boundary line 14cd. The boundary line between the fourth plane 14d and the fifth plane 14e is boundary line 14de. Boundary lines 14ab, 14bc, 14cd, and 14de all intersect at vertex 14P.

[0175] The first plane 14a, the second plane 14b, the third plane 14c, the fourth plane 14d, and the fifth plane 14e are pyramidal surfaces corresponding to the conical surface of the right lateral wall portion 14 in the first embodiment. Therefore, the vertex of the conical surface of the right lateral wall portion 14 in the first embodiment is the same point as vertex 14P.

[0176] The right lateral wall portion 14 and the left lateral wall portion 15 of this embodiment are composed of a virtual triangular surface, which is a pyramidal surface corresponding to the conical surface of the first embodiment. As a result, the right lateral wall portion 14 and the left lateral wall portion 15 can have the same strength as the right lateral wall portion 14 and the left lateral wall portion 15 of the first embodiment.

[0177] Furthermore, as shown in Figure 15, the lower end position of the substrate holding section 4h2 in the horizontal transport position is indicated by the lower end line 4h2u. The transport opening 4a is located slightly above this lower end line 4h2u. The through-hole section 14h is located slightly below this lower end line 4h2u.

[0178] In this embodiment, the platen chamber 10 has a sheet pile structure for its curved top section 16, as shown in Figures 12 and 13.

[0179] The curved roof section 16 of this embodiment is composed of multiple planes extending from the rear wall section 12 to the front flange section 13. The curved roof section 16 has a front roof inclined surface 16a, an inner roof inclined surface 16b, a rear roof inclined surface 16c, an outer roof inclined surface 16d, a front roof inclined surface 16e, an inner roof inclined surface 16f, a rear roof inclined surface 16g, an outer roof inclined surface 16h, a front roof inclined surface 16j, an inner roof inclined surface 16k, a rear roof inclined surface 16m, and an outer roof inclined surface 16n.

[0180] The inner curved surfaces 16b, 16f, and 16k constitute inner curved surfaces that curve around the platen axis 4h1. These inner curved surfaces correspond to the curved surface of the curved top section 16 in the first embodiment. The outer surfaces 16d, 16h, and 16n constitute outer surfaces that curve around the platen axis 4h1. These outer surfaces correspond to the curved surfaces of the curved top portion 16 in the first embodiment. The outer surfaces are spaced further apart than the inner surfaces in the radial direction of the platen axis 4h1.

[0181] The front ceiling inclined surface 16j, the inner ceiling curved surface 16k, and the rear ceiling inclined surface 16m form protrusions that project from the outer curved surface toward the platen axis 4h1. The front ceiling inclined surface 16e, the inner ceiling curved surface 16f, and the rear ceiling inclined surface 16g form protrusions that project from the outer curved surface toward the platen axis 4h1. The front ceiling inclined surface 16a, the inner ceiling curved surface 16b, and the rear ceiling inclined surface 16c form protrusions that project from the outer curved surface toward the platen axis 4h1.

[0182] The rear top surface 16c, the outer top surface 16d, and the front top surface 16e form protrusions that project in a direction away from the platen axis 4h1 relative to the inner surface. The rear top surface 16g, the outer top surface 16h, and the front top surface 16j form protrusions that project in a direction away from the platen axis 4h1 relative to the inner surface.

[0183] The curved top portion 16 of this embodiment may extend in the X and Y directions and may also include an outer top reinforcing rib portion 76s4 and an outer top reinforcing rib portion 76s5 along the inner curved surface. The platen chamber 10 of this embodiment can have the same strength as the bottom 11 of the first embodiment due to the curved top section 16 which has a sheet pile structure.

[0184] Furthermore, in the present invention, it is also possible to individually select and combine each of the configurations in the above-described embodiments. [Explanation of Symbols]

[0185] 1… Vacuum processing equipment 2…Load / Unload Chamber 3…Transfer chamber 4. Vacuum processing chamber (deposition chamber) 4h... Platen mechanism 4h2u…bottom line 5… Cathode unit (vacuum processing unit) 10... Platen Chamber 11...Bottom 11a, 11e, 11j...Bottom top surface 11b, 11f, 11k...bottom rear slope 11c, 11g, 11m…bottom surface 11d,11h…Bottom front inclined surface 12...Rear wall 13…Connecting flange section (front flange section) 14...Right side wall part (horizontal side wall part) 14a...first plane 14ab,14bc,14cd,14de...boundary straight line 14b…Second plane 14c...Third plane 14d…4th plane 14e…5th plane 14h...Through hole part 14m…Work opening 14P...Peak 15...Left lateral side wall part (lateral side wall part) 16…Kokutenbu 16a,16e,16j…Tenzen slope 16b,16f,16k…Tenai curved surface 16c, 16g, 16m…Tengo slope 16d,16h,16n…Celestial curved surface 72s1...Rear inner lower transverse rib section 72s2...Rear inner upper transverse rib section 74...Right inward sloping rib section (inner rib section) 74b…Right outer edge (lateral outer edge) 75...Left inward sloping rib section (inner rib section) 75b…Left outer edge (lateral outer edge) 76s1... Outer rear reinforcing rib section 76s2... Outer front reinforcing rib section 76s4...Exterior reinforcing rib section 76s5...Exterior reinforcing rib section B12…Horizontal lower boundary horizontal line B13…Front lower border horizontal straight line B14…Bottom right border B15…Bottom left border B24…Right rear end boundary curve B25…Left rear end boundary curve B26…Rear upper boundary horizontal straight line B34...Right front boundary curve B35…Left front edge boundary curve B36…Front upper boundary horizontal straight line B46…Top right boundary curve B56…Left upper boundary curve GS... Glass substrate (substrate to be processed)

Claims

1. A platen chamber having a platen mechanism that rotates the substrate under reduced pressure between a horizontal position where it can be loaded and unloaded, and a vertical position where it is positioned close to the vacuum processing unit and can be vacuum processed, The bottom and, A rear wall portion is erected upward from the rear end of the bottom portion, and has a slit formed therein for loading and unloading the substrate, Lateral side wall sections are erected upward from the left and right ends of the bottom, and their rear ends are connected to the rear wall section, A front flange portion is erected upward from the front end of the bottom portion, connected to the front end of the lateral side wall portion, and surrounds the processing opening that opens toward the vacuum processing section, The curved top portion is connected to the upper ends of the front flange portion, the rear wall portion, and the lateral side wall portion, respectively. It has, The aforementioned lateral side wall portion curves outward from the curved top portion to the bottom portion, A platen chamber characterized by the following features.

2. The three surfaces, the curved top section and the left and right lateral side walls, are curved surfaces that curve outward. The platen chamber according to claim 1, characterized in that it is a platen chamber.

3. The platen mechanism comprises a platen shaft having a horizontal axis, The platen shaft passes through the aforementioned lateral side wall portion at a position close to the bottom portion and the front flange portion. The aforementioned curved ceiling section is, The front connection position connecting to the front flange portion is higher than the rear connection position connecting to the rear wall portion. The platen axis curves outward and convexly from the front connection position to the rear connection position, The platen chamber according to claim 1, characterized in that it is a platen chamber.

4. Both the front flange portion and the rear wall portion are substantially flat plates. The lateral side wall portion has a smaller outward convex curvature at the front vertical line position where it connects to the front flange portion than the outward convex curvature at the rear vertical line position where it connects to the rear wall portion. The platen chamber according to claim 1, characterized in that it is a platen chamber.

5. The left and right lateral side walls are both composed of conical surfaces whose apex is located further back than the rear wall. The platen chamber according to claim 1, characterized in that it is a platen chamber.

6. The left and right lateral side walls are each composed of a combination of planes along a virtual triangular plane whose vertex is located further back than the rear wall. The platen chamber according to claim 1, characterized in that it is a platen chamber.

7. The front end is connected to the front flange portion and descends toward the rear, with the rear end connected to the bottom portion to form a truss, and the lateral outer end is connected to the inner surface of the lateral side wall portion. Having an inner rib portion located above the platen axis, The platen chamber according to claim 3, characterized in that it is as described above.

8. The aforementioned lateral side wall portion has a smaller plate thickness than the aforementioned rear wall portion. The platen chamber according to claim 1, characterized in that it is a platen chamber.

9. The bottom portion has several parallel ridges. The platen chamber according to claim 1, characterized in that it is a platen chamber.

10. The lateral side wall portions facing each other in the left-right direction have a lateral separation distance that is the same as or smaller than the position of the rear vertical line connecting to the rear wall portion compared to the position of the front vertical line connecting to the front flange portion. The platen chamber according to claim 1, characterized in that it is a platen chamber.

11. A platen chamber according to any one of claims 1 to 10, A vacuum processing apparatus characterized by the following:

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