Mask group, mask, and method for manufacturing organic devices

Abstract

To increase the light transmittance in organic devices. [Solution] When viewed along the normal direction of the mask, the mask laminate 55 may comprise a first mask region M1 including the through region having a first aperture ratio, and a second mask region M2 including the through region having a second aperture ratio smaller than the first aperture ratio. The second mask region may include the through region and an overlapping region surrounded by the through region in a plan view. The overlapping region may include the shielding regions of two or more masks in a plan view. The overlapping region may include a first overlapping region 581 and a second overlapping region 582 adjacent to the first overlapping region across the through region. The first overlapping region may have a first mask shape. The second overlapping region may have a second mask shape different from the first mask shape.

Description

Technical Field

[0001] Embodiments of the present disclosure relate to a method for manufacturing a mask group, a mask, and an organic device.

Background Art

[0002] In recent years, in electronic devices such as smart phones and tablet PCs, high-definition display devices have been demanded by the market. The display device has, for example, a pixel density of 400 ppi or more, or 800 ppi or more.

[0003] An organic EL display device has attracted attention because it has good responsiveness and / or low power consumption. As a method for forming pixels of an organic EL display device, a method of attaching materials constituting the pixels to a substrate by vapor deposition is known. For example, first, a substrate on which an anode is formed in a pattern corresponding to an element is prepared. Subsequently, an organic layer is formed on the anode by attaching an organic material onto the anode through a through hole of a mask. Subsequently, a cathode is formed on the organic layer by attaching a conductive material onto the organic layer through a through hole of the mask.

Prior Art Documents

Patent Documents

[0004]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0005] The larger the area of the cathode, the lower the electrical resistance of the cathode. On the other hand, the larger the area of the cathode, the lower the light transmittance in the organic device.

Means for Solving the Problems

[0006] A group of masks according to one embodiment of the present disclosure may comprise two or more masks. The masks may comprise shielding regions and through holes. A mask laminate formed by stacking two or more of the masks may comprise through regions that overlap the through holes when viewed along the normal direction of the masks. When viewed along the normal direction of the masks, the mask laminate may comprise a first mask region including the through regions having a first aperture ratio, and a second mask region including the through regions having a second aperture ratio smaller than the first aperture ratio. The second mask region may comprise the through regions and an overlapping region surrounded by the through regions in a plan view. The overlapping region may comprise the shielding regions of the two or more masks in a plan view. The overlapping region may comprise a first overlapping region and a second overlapping region adjacent to the first overlapping region across the through regions. The first overlapping region may have a first mask shape. The second overlapping region may have a second mask shape different from the first mask shape. [Effects of the Invention]

[0007] According to one embodiment of this disclosure, the light transmittance in an organic device can be increased. [Brief explanation of the drawing]

[0008] [Figure 1] This is a plan view showing an example of an organic device according to one embodiment of the present disclosure. [Figure 2] This is a plan view showing the second display area of ​​the organic device. [Figure 3] This is a plan view showing an example of the second electrode in the second display area. [Figure 4] This is a plan view showing an example of how to classify the transparent areas in the second display region. [Figure 5] This is a plan view showing an example of a pixel group. [Figure 6] This is a plan view showing an example of a branch electrode of the second electrode. [Figure 7] This is a plan view showing the region enclosed by the dashed line labeled VII in the organic device shown in Figure 3. [Figure 8] It is a plan view showing a state where the second electrode is removed from the organic device of FIG. 7. [Figure 9] It is a cross-sectional view taken along the line A-A of the organic device of FIG. 7. [Figure 10] It is a cross-sectional view taken along the line B-B of the organic device of FIG. 7. [Figure 11] It is a diagram showing an example of a vapor deposition apparatus provided with a mask device. [Figure 12] It is a plan view showing an example of a mask device. [Figure 13] It is a plan view showing a mask of a mask device. [Figure 14] It is a diagram showing a first mask device and a second mask device. [Figure 15] It is a diagram showing an example of a cross-sectional structure of a mask. [Figure 16] It is a plan view showing an example of a first mask. [Figure 17] It is a plan view showing an example of a second mask. [Figure 18] It is a plan view showing an example of a mask laminate. [Figure 19] It is a plan view showing an example of a method of classifying overlapping regions of a mask laminate. [Figure 20] It is a plan view showing an example of a branch region of an overlapping region. [Figure 21] It is a plan view showing an example of a second display region according to a reference form. [Figure 22] It is a plan view showing an example of a second display region. [Figure 23] It is a plan view showing an example of a mask laminate. [Figure 24] It is a plan view showing an example of a first mask. [Figure 25] It is a plan view showing an example of a second mask. [Figure 26] It is a plan view showing an example of a third mask. [Figure 27] It is a plan view showing an example of a second display region. [[ID=6I]] [Figure 28] It is a plan view showing an example of a mask laminate. [Figure 29] This is a plan view showing an example of the first mask. [Figure 30] This is a plan view showing an example of a second mask. [Figure 31] This is a plan view showing the second electrode related to Example 1. [Figure 32] This figure shows the method for evaluating the diffraction characteristics of the second electrode. [Figure 33] This figure shows the evaluation results for the second electrode in Example 1. [Figure 34] This figure shows the evaluation results for the second electrode in Example 1. [Figure 35] This is a plan view showing the second electrode related to Example 2. [Figure 36] This figure shows the evaluation results for the second electrode in Example 2. [Figure 37] This figure shows the evaluation results for the second electrode in Example 2. [Figure 38] This is a plan view showing an example of an organic device. [Figure 39] This is a plan view showing an example of the second display area. [Figure 40] This is a plan view showing an example of a mask for forming an inhibitory layer. [Figure 41] This is a cross-sectional view showing an example of the process for forming the suppression layer. [Figure 42] This is a plan view showing an example of a mask for forming the second electrode. [Figure 43] This is a cross-sectional view showing an example of the process for forming the second electrode. [Figure 44] This is a cross-sectional view showing an example of the process for forming the second electrode. [Figure 45] This is a cross-sectional view showing an example of the process for removing the second electrode. [Figure 46] This is a plan view showing the second electrode related to Example 3. [Figure 47] This is a plan view showing the second electrode according to Example 4. [Figure 48] This is a plan view showing the second electrode related to Example 5. [Figure 49] This is a plan view showing the second electrode according to Example 6. [Modes for carrying out the invention]

[0009] In this specification and these drawings, unless otherwise specified, terms such as "substrate," "base material," "plate," "sheet," and "film," which refer to the material that forms the basis of a certain structure, are not distinguished from one another solely by differences in designation.

[0010] In this specification and these drawings, unless otherwise specified, terms that identify shapes, geometric conditions, and their degrees, such as "parallel" and "orthogonal," as well as values ​​of lengths and angles, should be interpreted not strictly, but to include a range in which similar functionality can be expected.

[0011] In this specification and these drawings, unless otherwise specified, when a component or region is described as being "on top of," "below," "upper side," "lower side," or "upward" or "downward" of another component or region, this includes cases where one component is in direct contact with another. Furthermore, it also includes cases where another component is located between one component and another, i.e., where they are indirectly in contact. In addition, unless otherwise specified, the terms "up," "upper side," or "upward," or "down," "lower side," or "downward," may be used with the direction of up and down reversed.

[0012] In this specification and these drawings, unless otherwise specified, identical or similarly functioning parts are denoted by the same or similar reference numerals, and repeated descriptions may be omitted. Furthermore, the dimensional ratios in the drawings may differ from the actual ratios for illustrative purposes, and some components may be omitted from the drawings.

[0013] In this specification and these drawings, embodiments of the disclosure may be combined with other embodiments and modifications to the extent that they do not contradict each other, unless otherwise specified. Other embodiments may also be combined with each other, and other embodiments with modifications to the extent that they do not contradict each other. Modifications may also be combined with each other to the extent that they do not contradict each other.

[0014] In this specification and these drawings, unless otherwise specified, when disclosing multiple steps in a method such as a manufacturing method, other steps not disclosed may be performed between the disclosed steps. Furthermore, the order of the disclosed steps is arbitrary as long as it does not create a contradiction.

[0015] In this specification and these drawings, unless otherwise specified, the range represented by the symbol "~" includes the numbers or elements placed before and after the symbol "~". For example, the numerical range defined by the expression "34~38 mass%" is the same as the numerical range defined by the expression "34 mass% or more and 38 mass% or less". For example, the range defined by the expression "mask 50A~50B" includes mask 50A and mask 50B.

[0016] In one embodiment of this specification, an example is described in which a group of masks comprising multiple masks is used to form electrodes on a substrate when manufacturing an organic EL display device. However, the use of the group of masks is not particularly limited, and this embodiment can be applied to groups of masks used for various purposes. For example, the group of masks of this embodiment may be used to form electrodes for a device that displays or projects images or videos for representing virtual reality (VR) or augmented reality (AR). The group of masks of this embodiment may also be used to form electrodes for display devices other than organic EL displays, such as electrodes for liquid crystal displays. Furthermore, the group of masks of this embodiment may be used to form electrodes for organic devices other than display devices, such as electrodes for pressure sensors.

[0017] A first aspect of this disclosure is an organic device, circuit board and A first electrode located on the substrate, The organic layer located on the first electrode, The system comprises a second electrode located on the organic layer, When viewed along the direction normal to the substrate, the organic device comprises a first display region including the second electrode having a first occupancy rate, and a second display region including the second electrode having a second occupancy rate smaller than the first occupancy rate. The second display area includes the second electrode and a transparent area surrounded by the second electrode in a plan view. The aforementioned permeable region includes a first permeable region and a second permeable region adjacent to the first permeable region with the second electrode in between. The first transparent region has a first shape, The second transparent region is an organic device having a second shape different from the first shape.

[0018] A second aspect of this disclosure is that, in the organic device according to the first aspect described above, the area of ​​the first transparent region may be different from the area of ​​the second transparent region.

[0019] A third aspect of the present disclosure is an organic device according to either the first or second aspect described above, wherein the permeable region may include a third permeable region adjacent to the first and second permeable regions with respect to the second electrode. The third permeable region may have a third shape different from the first and second shapes.

[0020] A fourth aspect of the present disclosure is an organic device according to each of the first to third aspects described above, wherein the permeable region may include a fourth permeable region adjacent to the first and second permeable regions with respect to the second electrode. The fourth permeable region may have a fourth shape different from the first and second shapes.

[0021] A fifth aspect of this disclosure is that in an organic device according to each of the first to fourth aspects described above, 80% or more of the transparent area may correspond to the first transparent area.

[0022] A sixth aspect of the present disclosure is an organic device according to each of the first to fifth aspects described above, wherein the second display area may have a first division ratio of 80% or more. The first division ratio is the percentage of the first division number to the total number of pixel groups including four organic layers, the first division number is the number of divided pixel groups, and the paths connecting the four organic layers of the divided pixel groups may partially include the transparent area.

[0023] A seventh aspect of the present disclosure is an organic device according to each of the first to sixth aspects described above, wherein in the second display area, the second electrode may include a main electrode and a branch electrode connected to the main electrode. The branch electrode may include two first electrode ends in the first electrode direction and one second electrode end in the second electrode direction intersecting the first electrode direction. The two first electrode ends and the one second electrode end may be in contact with the transparent area.

[0024] An eighth aspect of this disclosure is an organic device according to the seventh aspect described above, wherein the second electrode may include a first layer and a second layer. The first display area may include an electrode overlap area arranged in a 23-period along the second direction of the element. The electrode overlap area may include the first layer and the second layer in a plan view. The width of the first electrode end may be 0.4 times or more of the 23-period.

[0025] A ninth aspect of the present disclosure is an organic device according to either the seventh or eighth aspect described above, wherein the second electrode may include a first layer and a second layer. The first display area may include an electrode overlap area arranged in a thirteenth period along the first direction of the element. The electrode overlap area may include the first layer and the second layer in a plan view. The width of the second electrode end may be 0.4 times or more of the thirteenth period.

[0026] A tenth aspect of this disclosure is a group of masks, With two or more masks, The mask comprises a shielding region and through holes, A mask laminate formed by stacking two or more of the aforementioned masks includes through-regions that overlap the through-holes when viewed along the normal direction of the masks, When viewed along the normal direction of the mask, the mask laminate comprises a first mask region including the through region having a first aperture ratio, and a second mask region including the through region having a second aperture ratio smaller than the first aperture ratio. The second mask region includes the penetrating region and the overlapping region enclosed by the penetrating region in a plan view. The overlapping region, in a plan view, includes the occlusion regions of two or more of the masks. The overlapping region includes a first overlapping region and a second overlapping region adjacent to the first overlapping region, separated by the penetrating region. The first overlapping region has a first mask shape, The second overlapping region is a group of masks having a second mask shape different from the first mask shape.

[0027] An eleventh aspect of this disclosure is that, in the mask group according to the tenth aspect described above, the area of ​​the first overlapping region may be different from the area of ​​the second overlapping region.

[0028] A twelfth aspect of this disclosure is a group of masks according to either the tenth aspect or the eleventh aspect described above, wherein the overlapping region may include a third overlapping region adjacent to the first overlapping region and the second overlapping region, with the through-region in between. The third overlapping region may have a third mask shape different from the first mask shape and the second mask shape.

[0029] A thirteenth aspect of this disclosure is that, in the mask group according to each of the tenth to twelfth aspects described above, the overlapping region may include a fourth overlapping region adjacent to the first overlapping region and the second overlapping region, with the through-region in between. The fourth overlapping region may have a fourth mask shape different from the first mask shape and the second mask shape.

[0030] A fourteenth aspect of this disclosure is that in each of the mask groups according to the tenth to thirteenth aspects described above, 80% or more of the overlapping region may correspond to the first overlapping region.

[0031] A fifteenth aspect of the present disclosure is a group of masks according to each of the tenth to fourteenth aspects described above, wherein in the second mask region, the through region may include a trunk region and branch regions connected to the trunk region. The branch region may include two first region ends in the first hole direction and one second region end in the second hole direction intersecting the first hole direction. The two first region ends and the one second region end may be in contact with the overlapping region.

[0032] A sixteenth aspect of this disclosure is a group of masks according to the fifteenth aspect described above, wherein the first mask region may include overlapping hole regions aligned in a 27-period along the second mask direction. The overlapping hole regions may include the through holes of two or more masks in a plan view. The width of the edge of the first region may be 0.4 times or more of the 27-period.

[0033] A 17th aspect of the present disclosure is a group of masks according to either the 15th aspect or the 16th aspect described above, wherein the first mask region may include overlapping hole regions arranged in a 17th period along the first mask direction. The overlapping hole regions may include the through holes of two or more masks in a plan view. The width of the second region edge may be 0.4 times or more of the 17th period.

[0034] An eighteenth aspect of this disclosure is a mask having a third mask direction and a fourth mask direction intersecting the third mask direction, It comprises a shielding area and a through hole, When viewed along the normal direction of the mask, the mask comprises a third mask region including the through-hole having a third aperture ratio, and a fourth mask region including the through-hole having a fourth aperture ratio smaller than the third aperture ratio. In the third region of the mask, the through holes are arranged in the third direction of the mask with a 35th period. In the fourth region of the mask, the average distance between the center points of two through holes aligned in the third direction of the mask is 1.1 times or more the 35th period.

[0035] A 19th aspect of the present disclosure is a mask according to the 18th aspect described above, wherein in the fourth region of the mask, the standard deviation of the distance between the center points of two through holes aligned in the third direction of the mask may be 0.2 times or more the 35th period.

[0036] A 20th aspect of this disclosure is a method for manufacturing an organic device, The process includes a second electrode formation step in which a second electrode is formed on an organic layer on a first electrode on a substrate using the mask group described above, The second electrode formation step is as follows: A step of forming the first layer of the second electrode by a deposition method using the first mask, The method for manufacturing an organic device comprises the step of forming a second layer of the second electrode by a vapor deposition method using the second mask.

[0037] One embodiment of this disclosure will be described in detail with reference to the drawings. Note that the embodiments described below are examples of embodiments of this disclosure, and this disclosure is not to be construed as being limited to these embodiments only.

[0038] First, the organic device 100 will be described. The organic device 100 includes electrodes formed by using the mask group of this embodiment. Figure 1 is a plan view showing an example of the organic device 100 as viewed along the direction normal to the substrate of the organic device 100. In the following description, viewing along the direction normal to the surface of a base material such as a substrate will also be referred to as a plan view.

[0039] The organic device 100 includes a substrate and a plurality of elements 115 arranged along the in-plane direction of the substrate. The elements 115 are, for example, pixels. The organic device 100 may include a first display area 101 and a second display area 102 in a plan view, as shown in Figure 1. The second display area 102 may have a smaller area than the first display area 101. As shown in Figure 1, the second display area 102 may be surrounded by the first display area 101. Although not shown, a portion of the outer edge of the second display area 102 may be collinear with a portion of the outer edge of the first display area 101.

[0040] Figure 2 is a plan view showing an enlarged view of the second display area 102 and its surroundings in Figure 1. In the first display area 101, the elements 115 may be arranged along two different directions. In the examples shown in Figures 1 and 2, two or more elements 115 in the first display area 101 may be arranged along the element first direction G1. Two or more elements 115 in the first display area 101 may be arranged along the element second direction G2 which intersects the element first direction G1. The element second direction G2 may be perpendicular to the element first direction G1.

[0041] The organic device 100 includes a second electrode 140. The second electrode 140 is located on an organic layer 130, which will be described later. The second electrode 140 may be electrically connected to two or more organic layers 130. For example, the second electrode 140 may overlap two or more organic layers 130 in a plan view. The second electrode 140 located in the first display area 101 is also referred to as the second electrode 140X. The second electrode 140 located in the second display area 102 is also referred to as the second electrode 140Y.

[0042] The second electrode 140X has a first occupancy ratio. The first occupancy ratio is calculated by dividing the total area of ​​the second electrode 140 located in the first display area 101 by the area of ​​the first display area 101. The second electrode 140Y has a second occupancy ratio. The second occupancy ratio is calculated by dividing the total area of ​​the second electrode 140 located in the second display area 102 by the area of ​​the second display area 102. The second occupancy ratio may be smaller than the first occupancy ratio. For example, as shown in Figure 2, the second display area 102 may include an opaque area 103 and a transparent area 104. The transparent area 104 does not overlap with the second electrode 140Y in a plan view. The transparent area 104 may be surrounded by the second electrode 140Y in a plan view. The opaque area 103 overlaps with the second electrode 140Y in a plan view.

[0043] The ratio of the second market share to the first market share may be, for example, 0.2 or greater, 0.3 or greater, or 0.4 or greater. The ratio of the second market share to the first market share may be, for example, 0.6 or less, 0.7 or less, or 0.8 or less. The range of the ratio of the second market share to the first market share may be determined by a first group consisting of 0.2, 0.3 and 0.4, and / or a second group consisting of 0.6, 0.7 and 0.8. The range of the ratio of the second market share to the first market share may be determined by a combination of any one value from the first group and any one value from the second group. The range of the ratio of the second market share to the first market share may be determined by a combination of any two values ​​from the first group. The range of the ratio of the second market share to the first market share may be determined by a combination of any two values ​​from the second group. For example, the ratio of the second occupancy rate to the first occupancy rate may be 0.2 or more and 0.8 or less, 0.2 or more and 0.7 or less, 0.2 or more and 0.6 or less, 0.2 or more and 0.4 or less, 0.2 or more and 0.3 or less, 0.3 or more and 0.8 or less, 0.3 or more and 0.7 or less, 0.3 or more and 0.6 or less, 0.3 or more and 0.4 or less, 0.4 or more and 0.8 or less, 0.4 or more and 0.7 or less, 0.4 or more and 0.6 or less, 0.6 or more and 0.8 or less, 0.6 or more and 0.7 or less, or 0.7 or more and 0.8 or less.

[0044] The transmittance of the non-transparent region 103 is also referred to as the first transmittance. The transmittance of the transparent region 104 is also referred to as the second transmittance. Since the transparent region 104 does not include the second electrode 140Y, the second transmittance is higher than the first transmittance. Therefore, in the second display region 102 which includes the transparent region 104, light that reaches the organic device 100 can pass through the transparent region 104 and reach optical components on the back side of the substrate. Optical components are components that realize some function by detecting light, such as cameras. Since the second display region 102 includes the non-transparent region 103, if the element 115 is a pixel, an image can be displayed in the second display region 102. In this way, the second display region 102 can detect light and display an image. The functions of the second display region 102 realized by detecting light include sensors such as cameras, fingerprint sensors, and facial recognition sensors. The higher the second transmittance and lower the second occupancy rate of the transparent area 104 of the second display area 102, the greater the amount of light the sensor can receive.

[0045] If either the dimension of the non-transparent region 103 in the element's first direction G1 and element's second direction G2, or the dimension of the transmittance region 104 in the element's first direction G1 and element's second direction G2, is 1 mm or less, the first and second transmittances are measured using a micro-spectrophotometer. Either an Olympus OSP-SP200 or an Otsuka Electronics LCF series micro-spectrophotometer can be used. Both micro-spectrophotometers can measure transmittance in the visible range from 380 nm to 780 nm. Quartz, borosilicate glass for TFT liquid crystals, or alkali-free glass for TFT liquid crystals are used as the reference. The measurement results at 550 nm are used as the first and second transmittances. If the dimensions of the non-transmitting region 103 in the first element direction G1 and the second element direction G2, and the dimensions of the transmitting region 104 in the first element direction G1 and the second element direction G2 are both greater than 1 mm, the first and second transmittances are measured using a spectrophotometer. Either the UV-2600i or UV-3600i Plus ultraviolet-visible spectrophotometer manufactured by Shimadzu Corporation can be used. By attaching a micro-aperture unit to the spectrophotometer, the transmittance of a region with a maximum dimension of 1 mm can be measured. Air is used as the reference. The measurement results at 550 nm are used as the first and second transmittances.

[0046] The ratio of the second transmittance TR2 to the first transmittance TR1, TR2 / TR1, may be, for example, 1.2 or greater, 1.5 or greater, or 1.8 or greater. TR2 / TR1 may be, for example, 2 or less, 3 or less, or 4 or less. The range of TR2 / TR1 may be determined by a first group consisting of 1.2, 1.5, and 1.8, and / or a second group consisting of 2, 3, and 4. The range of TR2 / TR1 may be determined by a combination of any one value from the first group and any one value from the second group. The range of TR2 / TR1 may be determined by a combination of any two values ​​from the first group. The range of TR2 / TR1 may be determined by a combination of any two values ​​from the second group. For example, TR2 / TR1 may be 1.2 or more and 4 or less, 1.2 or more and 3 or less, 1.2 or more and 2 or less, 1.2 or more and 1.8 or less, 1.2 or more and 1.5 or less, 1.5 or more and 4 or less, 1.5 or more and 3 or less, 1.5 or more and 2 or less, 1.5 or more and 1.8 or less, 1.8 or more and 4 or less, 1.8 or more and 3 or less, 1.8 or more and 2 or less, 2 or more and 4 or less, 2 or more and 3 or less, and 3 or more and 4 or less.

[0047] As shown in Figure 2, the second electrode 140 may include an electrode connection terminal. The electrode connection terminal connects the second electrode 140Y to the second electrode 140X. The electrode connection terminal corresponds to the boundary between the second electrode 140X and the second electrode 140Y. The electrode connection terminal may include a first electrode connection terminal 140Z1, a second electrode connection terminal 140Z2, a third electrode connection terminal 140Z3, and a fourth electrode connection terminal 140Z4. The first electrode connection terminal 140Z1 is located at one boundary in the first direction G1 of the element. The second electrode connection terminal 140Z2 is located at the other boundary in the first direction G1 of the element. The third electrode connection terminal 140Z3 is located at one boundary in the second direction G2 of the element. The fourth electrode connection terminal 140Z4 is located at the other boundary in the second direction G2 of the element. In the example shown in Figure 2, the boundary line defining "one boundary in the element's first direction G1" extends to the element's second direction G2. Therefore, the angle between the boundary line defining "one boundary in the element's first direction G1" and the element's first direction G1 is 90°. Although not shown in the figure, the boundary line defining "one boundary in the element's first direction G1" does not have to be a straight line. For example, if the contour of the second display area 102 is a circle, the boundary line defining "one boundary in the element's first direction G1" is an arc. In this case, the angle between the boundary line defining "one boundary in the element's first direction G1" and the element's first direction G1 is greater than 45° and less than or equal to 90°. In other words, a boundary line that is greater than 45° and less than or equal to 90° with respect to the element's first direction G1, and is located on one side of the element's first direction G1, may be defined as "one boundary in the element's first direction G1". Similarly, a boundary line located on the other side of the element in the first direction G1, where the angle it makes with respect to the element's first direction G1 is greater than 45° and 90° or less, may be defined as the "other boundary line in the element's first direction G1." A boundary line located on one side of the element in the second direction G2, where the angle it makes with respect to

[0048] As shown in Figure 2, the second electrode 140Y of the second display area 102 may include an area extending from one electrode connection end to the other electrode connection end. For example, the second electrode 140Y may include the following areas. Each area may overlap with one another. The second electrode 140Y may include all of the following types of areas. The second electrode 140Y may include a portion of the following types of areas. • Region extending from the first electrode connection end 140Z1 to the second electrode connection end 140Z2 • Region extending from the first electrode connection end 140Z1 to the third electrode connection end 140Z3 • Region extending from the first electrode connection end 140Z1 to the fourth electrode connection end 140Z4 • Region extending from the second electrode connection end 140Z2 to the third electrode connection end 140Z3 • Region extending from the second electrode connection end 140Z2 to the fourth electrode connection end 140Z4 • Region extending from the third electrode connection end 140Z3 to the fourth electrode connection end 140Z4

[0049] Figure 3 is a plan view showing an enlarged view of the second electrode 140X in the first display area 101 and the second electrode 140Y in the second display area 102. Both the second electrode 140X and the second electrode 140Y may overlap the organic layer 130 in a plan view. The organic layer 130 is a component of the element 115.

[0050] In the first display area 101, the organic layers 130 may be arranged in a 11th period P11 along the first element direction G1. In the second display area 102, the organic layers 130 may be arranged in a 12th period P12 along the first element direction G1. The 12th period P12 may be greater than the 11th period P11. As will be described later, the 12th period P12 may be the same as the 11th period P11.

[0051] The ratio of the 12th period P12 to the 11th period P11 may be, for example, 1.0 or greater, 1.1 or greater, 1.3 or greater, or 1.5 or greater. The ratio of the 12th period P12 to the 11th period P11 may be, for example, 2.0 or less, 3.0 or less, or 4.0 or less. The range of the ratio of the 12th period P12 to the 11th period P11 may be determined by a first group consisting of 1.0, 1.1, 1.3, and 1.5, and / or a second group consisting of 2.0, 3.0, and 4.0. The range of the ratio of the 12th period P12 to the 11th period P11 may be determined by a combination of any one value from the first group and any one value from the second group. The range of the ratio of the 12th period P12 to the 11th period P11 may be determined by a combination of any two values ​​from the first group. The range of the ratio of the 12th period P12 to the 11th period P11 may be determined by any two combinations of values ​​included in the second group described above. For example, the ratio of the 12th period P12 to the 11th period P11 may be 1.0 or more and 4.0 or less, 1.0 or more and 3.0 or less, 1.0 or more and 2.0 or less, 1.0 or more and 1.5 or less, 1.0 or more and 1.3 or less, 1.0 or more and 1.1 or less, 1.1 or more and 4.0 or less, 1.1 or more and 3.0 or less, 1.1 or more and 2.0 or less, 1.1 or more and 1.5 or less. The following are also acceptable: 1.1 to 1.3, 1.3 to 4.0, 1.3 to 3.0, 1.3 to 2.0, 1.3 to 1.5, 1.5 to 4.0, 1.5 to 3.0, 1.5 to 2.0, 2.0 to 4.0, 2.0 to 3.0, and 3.0 to 4.0. When the ratio of the 12th period P12 to the 11th period P11 is small, the difference in pixel density between the first display area 101 and the second display area 102 becomes small. This suppresses the occurrence of a visual difference between the first display area 101 and the second display area 102.

[0052] In the first display area 101, the organic layers 130 may be arranged along the second element direction G2 in a 21st period P21. In the second display area 102, the organic layers 130 may be arranged along the second element direction G2 in a 22nd period P22. The 22nd period P22 may be greater than the 21st period P21. As will be described later, the 22nd period P22 may be the same as the 21st period P21.

[0053] The ratio of the 22nd period P22 to the 21st period P21 may be, for example, 1.0 or greater, 1.1 or greater, 1.3 or greater, or 1.5 or greater. The ratio of the 22nd period P22 to the 21st period P21 may be, for example, 2.0 or less, 3.0 or less, or 4.0 or less. The range of the ratio of the 22nd period P22 to the 21st period P21 may be determined by a first group consisting of 1.0, 1.1, 1.3, and 1.5, and / or a second group consisting of 2.0, 3.0, and 4.0. The range of the ratio of the 22nd period P22 to the 21st period P21 may be determined by a combination of any one value from the first group and any one value from the second group. The range of the ratio of the 22nd period P22 to the 21st period P21 may be determined by a combination of any two values ​​from the first group. The range of the ratio of the 22nd period P22 to the 21st period P21 may be determined by any two combinations of values ​​included in the second group described above. For example, the ratio of the 22nd period P22 to the 21st period P21 may be 1.0 or more and 4.0 or less, 1.0 or more and 3.0 or less, 1.0 or more and 2.0 or less, 1.0 or more and 1.5 or less, 1.0 or more and 1.3 or less, 1.0 or more and 1.1 or less, 1.1 or more and 4.0 or less, 1.1 or more and 3.0 or less, 1.1 or more and 2.0 or less, 1.1 or more and 1.5 or less. The following are also acceptable: 1.1 to 1.3, 1.3 to 4.0, 1.3 to 3.0, 1.3 to 2.0, 1.3 to 1.5, 1.5 to 4.0, 1.5 to 3.0, 1.5 to 2.0, 2.0 to 4.0, 2.0 to 3.0, and 3.0 to 4.0. When the ratio of the 22nd period P22 to the 21st period P21 is small, the difference in pixel density between the first display area 101 and the second display area 102 becomes smaller. This suppresses the occurrence of a visual difference between the first display area 101 and the second display area 102.

[0054] As shown in Figure 3, the second electrode 140Y may be arranged irregularly. This allows the transparent region 104 surrounded by the second electrode 140Y to have an irregular shape. This suppresses the reinforcement of light diffracted when passing through the transparent region 104. Therefore, it is possible to suppress the incidence of diffracted light with high intensity on the sensor. This, for example, can suppress blurring of the image generated by the sensor.

[0055] An example of an irregular shape is described. As shown in Figure 3, the permeable region 104 may include a first permeable region 1041 and a second permeable region 1042. The second permeable region 1042 is adjacent to the first permeable region 1041 with the second electrode 140Y in between. The first permeable region 1041 has a first shape. The second permeable region 1042 may have a second shape different from the first shape. The specific differences between the first and second shapes are arbitrary. For example, the area of ​​the second shape may differ from the area of ​​the first shape.

[0056] The term "first permeable region 1041" does not necessarily have to represent a specific permeable region 104. For example, as shown in Figure 4, a different permeable region 104 from the one in Figure 3 may correspond to the first permeable region 1041. The shapes of the second electrode 140 and permeable region 104 in Figure 4 are the same as those of the second electrode 140 and permeable region 104 in Figure 3. In the example in Figure 4, there is a permeable region 104 adjacent to the first permeable region 1041 across the second electrode 140Y, and which has a different shape from the first permeable region 1041. That is, in the example in Figure 4, there is a permeable region 104 that corresponds to the second permeable region 1042 in relation to the first permeable region 1041. In this way, when two permeable regions 104 adjacent to each other across the second electrode 140 have different shapes, one of the permeable regions 104 can be called the first permeable region 1041, and the other permeable region 104 can be called the second permeable region 1042. If only multiple other transparent regions 104 having the same shape exist around a single transparent region 104, the single transparent region 104 is not referred to as the first transparent region 1041.

[0057] The second display area 102 may have a first matching rate. The first matching rate is the percentage of the first matching number to the total number of transparent areas 104. The first matching number is the number of transparent areas 104 that can be called the first transparent area 1041 in relation to the second transparent area 1042. The first matching rate may be, for example, 80% or more, 85% or more, or 90% or more. The first matching rate may be, for example, 95% or less, 97% or less, or 99% or less. The range of the first matching rate may be defined by a first group consisting of 80%, 85%, and 90%, and / or a second group consisting of 95%, 97%, and 99%. The range of the first matching rate may be defined by a combination of any one value included in the first group and any one value included in the second group. The range of the first matching rate may be defined by a combination of any two values ​​included in the first group. The range of the first applicability rate may be determined by any two combinations of values ​​included in the second group described above. For example, the first applicability rate may be 80% or more and 99% or less, 80% or more and 97% or less, 80% or more and 95% or less, 80% or more and 90% or less, 80% or more and 85% or less, 85% or more and 99% or less, 85% or more and 97% or less, 85% or more and 95% or less, 85% or more and 90% or less, 90% or more and 99% or less, 90% or more and 97% or less, 90% or more and 95% or less, 95% or more and 99% or less, 95% or more and 97% or more and 99% or less.

[0058] The second transparent region 1042 may be adjacent to the first transparent region 1041 with the first electrode 120 and the second electrode 140Y in between. In the example shown in Figures 3 and 4, the second transparent region 1042 is adjacent to the first transparent region 1041 with the first electrode 120 and the second electrode 140Y in the first direction G1 of the element.

[0059] As shown in Figures 3 and 4, the permeable region 104 may include a third permeable region 1043. The third permeable region 1043 is adjacent to the first permeable region 1041 and the second permeable region 1042, with the second electrode 140Y in between. The third permeable region 1043 may have a third shape different from the first and second shapes. For example, the area of ​​the third shape may be different from the area of ​​the first shape and the area of ​​the second shape.

[0060] The second display area 102 may have a second matching rate. The second matching rate is the percentage of the second matching number relative to the total number of transparent areas 104. The second matching number is the number of transparent areas 104 that can be called the first transparent area 1041 in relation to the second transparent area 1042 and the third transparent area 1043. The range of the second matching rate can be the range of the first matching rate described above.

[0061] The third transparent region 1043 may be adjacent to the first transparent region 1041 with the first electrode 120 and the second electrode 140Y in between. In the example shown in Figures 3 and 4, the third transparent region 1043 is adjacent to the first transparent region 1041 with the first electrode 120 and the second electrode 140Y in the second direction G2 of the element.

[0062] As shown in Figures 3 and 4, the permeable region 104 may include a fourth permeable region 1044. The fourth permeable region 1044 is adjacent to the first permeable region 1041 and the second permeable region 1042, with the second electrode 140Y in between. The fourth permeable region 1044 may have a fourth shape different from the first and second shapes. For example, the area of ​​the fourth shape may be different from the area of ​​the first shape and the area of ​​the second shape. The fourth shape may also be different from the third shape.

[0063] The second display area 102 may have a third matching rate. The third matching rate is the percentage of the number of third matching areas relative to the total number of transparent areas 104. The number of third matching areas is the number of transparent areas 104 that can be called the first transparent area 1041 in relation to the second transparent area 1042, the third transparent area 1043, and the fourth transparent area 1044. The range of the third matching rate can be the range of the first matching rate described above.

[0064] The fourth transparent region 1044 may be adjacent to the first transparent region 1041 with the first electrode 120 and the second electrode 140Y in between. In the example shown in Figure 4, the fourth transparent region 1044 is adjacent to the first transparent region 1041 with the first electrode 120 and the second electrode 140Y in the second direction G2 of the element.

[0065] As shown in Figures 3 and 4, the permeable region 104 may include a fifth permeable region 1045. The fifth permeable region 1045 is adjacent to the first permeable region 1041 across the second electrode 140Y. The fifth permeable region 1045 may also be adjacent to the fourth permeable region 1044 across the second electrode 140Y. The fifth permeable region 1045 may have a fifth shape different from the first shape. For example, the area of ​​the fifth shape may be different from the area of ​​the first shape. The fifth shape may also be different from the second, third, and fourth shapes.

[0066] The second display area 102 may have a fourth matching rate. The fourth matching rate is the percentage of the fourth matching number to the total number of transparent areas 104. The fourth matching number is the number of transparent areas 104 that can be called the first transparent area 1041 in relation to the second transparent area 1042, the third transparent area 1043, the fourth transparent area 1044, and the fifth transparent area 1045. The range of the fourth matching rate can be the range of the first matching rate described above.

[0067] The fifth transparent region 1045 may be adjacent to the first transparent region 1041 with the first electrode 120 and the second electrode 140Y in between. In the example shown in Figures 3 and 4, the fifth transparent region 1045 is adjacent to the first transparent region 1041 with the first electrode 120 and the second electrode 140Y in the second direction G2 of the element.

[0068] As shown in Figures 3 and 4, the permeable region 104 may include a sixth permeable region 1046. The sixth permeable region 1046 is adjacent to the first permeable region 1041 with the second electrode 140Y in between. The sixth permeable region 1046 may have a sixth shape different from the first shape. For example, the area of ​​the sixth shape may be different from the area of ​​the first shape. The sixth shape may also be different from the second, third, fourth, and fifth shapes.

[0069] The second display area 102 may have a fifth matching rate. The fifth matching rate is the percentage of the number of fifth matching items to the total number of transparent areas 104. The number of fifth matching items is the number of transparent areas 104 that can be called the first transparent area 1041 in relation to the second transparent area 1042, the third transparent area 1043, the fourth transparent area 1044, the fifth transparent area 1045, and the sixth transparent area 1046. The range of the fifth matching rate can be the range of the first matching rate described above.

[0070] The sixth transparent region 1046 may be adjacent to the first transparent region 1041 with the first electrode 120 and the second electrode 140Y in between. In the example shown in Figures 3 and 4, the sixth transparent region 1046 is adjacent to the first transparent region 1041 with the first electrode 120 and the second electrode 140Y in the first direction G1 of the element.

[0071] Two transparent regions 104 having different shapes may be adjacent to each other, with the first electrode 120 and the second electrode 140Y in the direction in which the multiple first electrodes 120 are regularly arranged. In the example shown in Figure 4, as described above, in the first direction G1 of the element, the first transparent region 1041 and the second transparent region 1042 are adjacent, and the first transparent region 1041 and the sixth transparent region 1046 are adjacent. In the example shown in Figure 4, as described above, in the second direction G2 of the element, the first transparent region 1041 and the third transparent region 1043 are adjacent, the first transparent region 1041 and the fourth transparent region 1044 are adjacent, and the first transparent region 1041 and the fifth transparent region 1045 are adjacent.

[0072] According to this embodiment, in a direction in which multiple first electrodes 120 are regularly aligned, it is possible to suppress the reinforcement of light diffracted when passing through the transmission region 104.

[0073] As shown in Figure 3, a second electrode 140Y or a transparent region 104 exists between two adjacent organic layers 130 in the first element direction G1 or the second element direction G2. The configuration of the second display region 102 in the region between two adjacent organic layers 130 in a plan view may be classified into the 11th type T11, the 12th type T12, the 13th type T13, the 21st type T21, the 22nd type T22, or the 23rd type T23. The 11th type T11 includes a transparent region 104 between two adjacent organic layers 130 in the first element direction G1, having dimensions of 0.5 × 12th period P12 or larger in the first element direction G1. The 12th type T12 includes a transparent region 104 between two adjacent organic layers 130 in the first element direction G1, having dimensions of less than 0.5 × 12th period P12 in the first element direction G1. The 13th type T13 includes a second electrode 140Y that extends continuously in the first direction G1 of the device between two adjacent organic layers 130 in the first direction G1 of the device. The 21st type T21 includes a transparent region 104 between two adjacent organic layers 130 in the second element direction G2, having dimensions of 0.5 × 22nd period P22 or larger in the second element direction G2. The 22nd type T22 includes a transparent region 104 between two adjacent organic layers 130 in the second element direction G2, having dimensions of less than 0.5 × 22nd period P22 in the second element direction G2. The 23rd type T23 includes a second electrode 140Y that extends continuously in the second direction G2 of the element between two adjacent organic layers 130 in the second direction G2 of the element. Although not shown in the diagram, the configuration of the second display area 102 between two adjacent organic layers 130 may be classified into other types.

[0074] It is preferable that the 13th type T13 and the 23rd type T23 are not locally concentrated. For example, it is preferable that the pixel group 115G, which includes four organic layers 130, includes one of the 11th type T11, the 12th type T12, the 21st type T21, or the 22nd type T22. When the pixel group 115G includes one of the 11th type T11, the 12th type T12, the 21st type T21, or the 22nd type T22, the second electrode 140Y is interrupted somewhere in the path connecting the four organic layers 130 in the first element direction G1 or the second element direction G2 in a plan view. That is, the path connecting the four organic layers 130 partially includes the transmission region 104. This makes it possible to suppress the reinforcement of light diffracted when passing through the transmission region 104. A pixel group 115G that includes either type 11T11, type 12T12, type 21T21, or type 22T22 is also called a segmented pixel group.

[0075] Figure 5 is an enlarged view of a portion of Figure 3. The pixel group 115G includes a first organic layer 1301, a second organic layer 1302, a third organic layer 1303, and a fourth organic layer 1304. The first organic layer 1301 and the second organic layer 1302 are adjacent in the first element direction G1. The third organic layer 1303 and the fourth organic layer 1304 are adjacent in the first element direction G1. The first organic layer 1301 and the third organic layer 1303 are adjacent in the second element direction G2. The second organic layer 1302 and the fourth organic layer 1304 are adjacent in the second element direction G2.

[0076] The region between the first organic layer 1301 and the second organic layer 1302 is composed of the 11th type T11. The region between the third organic layer 1303 and the fourth organic layer 1304 is composed of the 12th type T12. The region between the first organic layer 1301 and the third organic layer 1303 is composed of the 21st type T21. The region between the second organic layer 1302 and the fourth organic layer 1304 is composed of the 23rd type T23.

[0077] The second display area 102 may have a first division ratio. The first division ratio is the percentage of the first division number to the total number of pixel groups 115G present in the second display area 102. The first division number is the number of pixel groups 115G that include any of the 11th type T11, 12th type T12, 21st type T21, or 22nd type T22. The first division ratio may be, for example, 80% or more, 85% or more, or 90% or more. The first division ratio may be, for example, 95% or less, 97% or less, or 99% or less. The range of the first division ratio may be defined by a first group consisting of 80%, 85%, and 90%, and / or a second group consisting of 95%, 97%, and 99%. The range of the first division ratio may be defined by a combination of any one value from the first group and any one value from the second group. The range of the first division rate may be determined by any two combinations of values ​​included in the first group described above. The range of the first division rate may be determined by any two combinations of values ​​included in the second group described above. For example, the first division rate may be 80% or more and 99% or less, 80% or more and 97% or less, 80% or more and 95% or less, 80% or more and 90% or less, 80% or more and 85% or less, 85% or more and 99% or less, 85% or more and 97% or less, 85% or more and 95% or less, 85% or more and 90% or less, 90% or more and 99% or less, 90% or more and 97% or less, 90% or more and 95% or less, 95% or more and 99% or less, 95% or more and 97% or more and 99% or less.

[0078] As shown in Figure 3, the second display area 102 may include an 11-12 arrangement T11-12 where the 11th type T11 and the 12th type are aligned in the first element direction G1. The second display area 102 may include an 11-13 arrangement T11-13 where the 11th type T11 and the 13th type are aligned in the first element direction G1. The second display area 102 may include a 12-13 arrangement where the 12th type T11 and the 13th type are aligned in the first element direction G1. The second display area 102 may include a 21-22 arrangement where the 21st type T21 and the 22nd type are aligned in the second element direction G2. The second display area 102 may include a 21-23 arrangement where the 21st type T21 and the 23rd type are aligned in the second element direction G2. The second display area 102 may include a 22-23 arrangement where the 22nd type T21 and the 23rd type are aligned in the second element direction G2.

[0079] As shown in Figures 3 and 4, the second electrode 140Y may include a main electrode 141 and branch electrodes 142. The main electrode 141 forms a path extending from one electrode connection end to the other electrode connection end. The branch electrodes 142 are connected to the main electrode 141.

[0080] Figure 6 is a plan view showing an example of a branch electrode 142. The branch electrode 142 may be a first branch electrode 142A or a second branch electrode 142B.

[0081] The first branch electrode 142A includes two first electrode ends 1421 and one second electrode end 1422. The first electrode ends 1421 are the ends of the branch electrode 142 in the fifth electrode direction G5. The two first electrode ends 1421 face each other in a direction perpendicular to the fifth electrode direction G5. The fifth electrode direction G5 may be parallel to the first element direction G1. Although not shown, the fifth electrode direction G5 may not be parallel to the first element direction G1. The second electrode end 1422 is the end of the branch electrode 142 in the sixth electrode direction G6. The sixth electrode direction G6 intersects the fifth electrode direction G5. The sixth electrode direction G6 may be perpendicular to the fifth electrode direction G5. The two first electrode ends 1421 and the one second electrode end 1422 are in contact with the transparent region 104.

[0082] The second branch electrode 142B includes one first electrode end 1421 and two second electrode ends 1422. The two second electrode ends 1422 face each other in a direction perpendicular to the sixth electrode direction G6. The one first electrode end 1421 and the two second electrode ends 1422 are in contact with the transparent region 104.

[0083] The width W51 of the first electrode end 1421 may have a constant ratio to the 21st period P21. The ratio of the width W51 to the 21st period P21 may be, for example, 0.4 or more, 0.6 or more, or 0.8 or more. The ratio of the width W51 to the 21st period P21 may be, for example, 1.2 or less, 1.4 or less, or 1.6 or less. The range of the ratio of the width W51 to the 21st period P21 may be defined by a first group consisting of 0.4, 0.6 and 0.8, and / or a second group consisting of 1.2, 1.4 and 1.6. The range of the ratio of the width W51 to the 21st period P21 may be defined by a combination of any one value from the first group and any one value from the second group. The range of the ratio of the width W51 to the 21st period P21 may be defined by a combination of any two values ​​from the first group. The range of the ratio of width W51 to period 21 P21 may be determined by any two combinations of values ​​included in the second group described above. For example, the ratio of width W51 to period 21 P21 may be 0.4 or more and 1.6 or less, 0.4 or more and 1.4 or less, 0.4 or more and 1.2 or less, 0.4 or more and 0.8 or less, 0.4 or more and 0.6 or less, 0.6 or more and 1.6 or less, 0.6 or more and 1.4 or less, 0.6 or more and 1.2 or less, 0.6 or more and 1.8 or less, 0.8 or more and 1.6 or less, 0.8 or more and 1.4 or less, 0.8 or more and 1.2 or less, 1.2 or more and 1.6 or less, 1.2 or more and 1.4 or less, and 1.4 or more and 1.6 or less.

[0084] The width W51 may be, for example, 20 μm or more, 40 μm or more, or 60 μm or more. The width W51 may be, for example, 110 μm or less, 130 μm or less, or 150 μm or less. The range of the width W51 may be defined by a first group consisting of 20 μm, 40 μm, and 60 μm, and / or a second group consisting of 110 μm, 130 μm, and 150 μm. The range of the width W51 may be defined by a combination of any one value included in the first group and any one value included in the second group. The range of the width W51 may be defined by a combination of any two values ​​included in the first group. The range of the width W51 may be defined by a combination of any two values ​​included in the second group. For example, the width W51 may be 20 μm or more and 150 μm or less, 20 μm or more and 130 μm or less, 20 μm or more and 110 μm or less, 20 μm or more and 60 μm or less, 20 μm or more and 40 μm or less, 40 μm or more and 150 μm or less, 40 μm or more and 130 μm or less, 40 μm or more and 110 μm or less, 40 μm or more and 60 μm or less, 60 μm or more and 150 μm or less, 60 μm or more and 130 μm or less, 60 μm or more and 110 μm or less, 110 μm or more and 150 μm or less, 110 μm or more and 130 μm or more and 150 μm or less.

[0085] The width W61 of the second electrode end 1422 may have a constant ratio with respect to the 11th period P11. The ratio of the width W61 to the 11th period P11 may be, for example, 0.4 or more, 0.6 or more, or 0.8 or more. The ratio of the width W61 to the 11th period P11 may be, for example, 1.2 or less, 1.4 or less, or 1.6 or less. The range of the ratio of the width W61 to the 11th period P11 may be determined by a first group consisting of 0.4, 0.6 and 0.8, and / or a second group consisting of 1.2, 1.4 and 1.6. The range of the ratio of the width W61 to the 11th period P11 may be determined by a combination of any one value from the first group and any one value from the second group. The range of the ratio of the width W61 to the 11th period P11 may be determined by a combination of any two values ​​from the first group. The range of the ratio of width W61 to the 11th period P11 may be determined by any two combinations of values ​​included in the second group described above. For example, the ratio of width W61 to the 11th period P11 may be 0.4 or more and 1.6 or less, 0.4 or more and 1.4 or less, 0.4 or more and 1.2 or less, 0.4 or more and 0.8 or less, 0.4 or more and 0.6 or less, 0.6 or more and 1.6 or less, 0.6 or more and 1.4 or less, 0.6 or more and 1.2 or less, 0.6 or more and 1.8 or less, 0.8 or more and 1.6 or less, 0.8 or more and 1.4 or less, 0.8 or more and 1.2 or less, 1.2 or more and 1.6 or less, 1.2 or more and 1.4 or less, and 1.4 or more and 1.6 or less.

[0086] The width W61 may be, for example, 20 μm or more, 40 μm or more, or 60 μm or more. The width W61 may be, for example, 110 μm or less, 130 μm or less, or 150 μm or less. The range of the width W61 may be defined by a first group consisting of 20 μm, 40 μm, and 60 μm, and / or a second group consisting of 110 μm, 130 μm, and 150 μm. The range of the width W61 may be defined by a combination of any one value included in the first group and any one value included in the second group. The range of the width W61 may be defined by a combination of any two values ​​included in the first group. The range of the width W61 may be defined by a combination of any two values ​​included in the second group. For example, the width W61 may be 20 μm or more and 150 μm or less, 20 μm or more and 130 μm or less, 20 μm or more and 110 μm or less, 20 μm or more and 60 μm or less, 20 μm or more and 40 μm or less, 40 μm or more and 150 μm or less, 40 μm or more and 130 μm or less, 40 μm or more and 110 μm or less, 40 μm or more and 60 μm or less, 60 μm or more and 150 μm or less, 60 μm or more and 130 μm or less, 60 μm or more and 110 μm or less, 110 μm or more and 150 μm or less, 110 μm or more and 130 μm or more and 150 μm or less.

[0087] The inclusion of branch electrodes 142 in the second electrode 140Y makes it easier to arrange the second electrode 140Y irregularly. This further suppresses the reinforcement of light diffracted when passing through the transmission region 104.

[0088] The layer structure of the second electrode 140 will now be described. Figure 7 is a plan view showing an enlarged view of the region enclosed by the dashed line labeled VII in the organic device 100 of Figure 3.

[0089] The second electrode 140 may include multiple layers. For example, the second electrode 140 may include a first layer 140A and a second layer 140B. The first layer 140A and the second layer 140B are formed by a deposition method using the first mask 50A and the second mask 50B, respectively, as described later.

[0090] In the first display area 101, the first layer 140A may be aligned in the third element direction G3 and the fourth element direction G4. The third element direction G3 is a direction that intersects both the first element direction G1 and the second element direction G2. The angle that the third element direction G3 makes with the first element direction G1 and the second element direction G2 is, for example, 20° or more and 70° or less. The fourth element direction G4 is a direction that intersects both the first element direction G1 and the second element direction G2. The angle that the fourth element direction G4 makes with the first element direction G1 and the second element direction G2 is, for example, 20° or more and 70° or less. The third element direction G3 intersects with the fourth element direction G4. For example, the third element direction G3 may be perpendicular to the fourth element direction G4.

[0091] The code G31 represents the spacing between two adjacent first layers 140A in the third element direction G3. The spacing G31 may be, for example, 5 μm or more, 10 μm or more, or 15 μm or more. The spacing G31 may be, for example, 30 μm or less, 40 μm or less, or 50 μm or less. The range of the spacing G31 may be defined by a first group consisting of 5 μm, 10 μm, and 15 μm, and / or a second group consisting of 30 μm, 40 μm, and 50 μm. The range of the spacing G31 may be defined by a combination of any one value from the first group and any one value from the second group. The range of the spacing G31 may be defined by a combination of any two values ​​from the first group. The range of the spacing G31 may be defined by a combination of any two values ​​from the second group. For example, the spacing G31 may be 5 μm or more and 50 μm or less, 5 μm or more and 40 μm or less, 5 μm or more and 30 μm or less, 5 μm or more and 15 μm or less, 5 μm or more and 10 μm or less, 10 μm or more and 50 μm or less, 10 μm or more and 40 μm or less, 10 μm or more and 30 μm or less, 10 μm or more and 15 μm or less, 15 μm or more and 50 μm or less, 15 μm or more and 40 μm or less, 15 μm or more and 30 μm or less, 30 μm or more and 50 μm or less, 30 μm or more and 40 μm or more and 50 μm or less.

[0092] The code G41 represents the spacing between two adjacent first layers 140A in the fourth element direction G4. The range of spacing G41 can be the same as the range of spacing G31 described above.

[0093] In the first display area 101, the second layer 140B may be arranged in the third element direction G3 and the fourth element direction G4, similar to the first layer 140A. The range of spacing between two adjacent second layers 140B in the third element direction G3 can be the range of spacing G31 described above. The range of spacing between two adjacent second layers 140B in the fourth element direction G4 can be the range of spacing G41 described above.

[0094] The first layer 140A may be connected to the second layer 140B in the first element direction G1. In this case, as shown in Figure 7, the electrode overlap region 145 may be aligned along the first element direction G1 in a 13th period P13 in the first display area 101. The electrode overlap region 145 is a region where multiple layers of the second electrode 140 overlap in a plan view. In this embodiment, the electrode overlap region 145 is a region where the first layer 140A and the second layer 140B overlap. The range of the 13th period P13 can be the range of the 11th period P11 described above.

[0095] The first layer 140A may be connected to the second layer 140B in the second element direction G2. In this case, in the first display area 101, the electrode overlapping area 145 may be aligned along the second element direction G2 in a 23rd period P23. The range of the 23rd period P23 can be the range of the 21st period P21 described above.

[0096] The width W51 of the first electrode end 1421 described above may have a constant ratio to the 23rd period P23. The range of the ratio of the width W51 to the 23rd period P23 can be the range of "the ratio of the width W51 to the 21st period P21".

[0097] The width W61 of the second electrode end 1422 described above may have a constant ratio to the 13th period P13. The range of the ratio of the width W61 to the 13th period P13 can be the range of "the ratio of the width W61 to the 11th period P11".

[0098] The area of ​​the electrode overlap region 145 may be smaller than the area of ​​the first layer 140A. The ratio of the area of ​​the electrode overlap region 145 to the area of ​​the first layer 140A may be, for example, 0.02 or more, 0.05 or more, or 0.10 or more. The ratio of the area of ​​the electrode overlap region 145 to the area of ​​the first layer 140A may be, for example, 0.20 or less, 0.30 or less, or 0.40 or less. The range of the ratio of the area of ​​the electrode overlap region 145 to the area of ​​the first layer 140A may be determined by a first group consisting of 0.02, 0.05 and 0.10, and / or a second group consisting of 0.20, 0.30 and 0.40. The range of the ratio of the area of ​​the electrode overlap region 145 to the area of ​​the first layer 140A may be determined by a combination of any one value included in the first group and any one value included in the second group. The range of the ratio of the area of ​​the electrode overlap region 145 to the area of ​​the first layer 140A may be determined by any two combinations of values ​​included in the first group described above. The range of the ratio of the area of ​​the electrode overlap region 145 to the area of ​​the first layer 140A may be determined by any two combinations of values ​​included in the second group described above. For example, the ratio of the area of ​​the electrode overlap region 145 to the area of ​​the first layer 140A may be 0.02 or more and 0.40 or less, 0.02 or more and 0.30 or less, 0.02 or more and 0.20 or less, 0.02 or more and 0.10 or less, 0.02 or more and 0.05 or less, 0.05 or more and 0.50 or less, 0.05 or more and 0.30 or less, 0.05 or more and 0.20 or less, 0.05 or more and 0.10 or less, 0.10 or more and 0.40 or less, 0.10 or more and 0.30 or less, 0.10 or more and 0.20 or less, 0.20 or more and 0.40 or less, 0.20 or more and 0.30 or less, or 0.30 or more and 0.40 or less.

[0099] The area of ​​the electrode overlap region 145 may be smaller than the area of ​​the second layer 140B. The range of the ratio of the area of ​​the electrode overlap region 145 to the area of ​​the second layer 140B can be the same as the range of the "ratio of the area of ​​the electrode overlap region 145 to the area of ​​the first layer 140A" described above.

[0100] Figure 8 is a plan view showing the organic device 100 of Figure 7 with the second electrode 140 removed. The organic layer 130 may include a first organic layer 130A, a second organic layer 130B, and a third organic layer 130C. The first organic layer 130A, the second organic layer 130B, and the third organic layer 130C are, for example, a red light-emitting layer, a blue light-emitting layer, and a green light-emitting layer. In the following description, the term and reference numeral "organic layer 130" will be used when describing the configuration of the organic layer common to the first organic layer 130A, the second organic layer 130B, and the third organic layer 130C.

[0101] The arrangement of the second electrode 140 and the organic layer 130 in a plan view is detected by observing the organic device 100 using a high-magnification digital microscope. Based on the detection results, the occupancy rate, area, dimensions, spacing, etc., can be calculated. If the organic device 100 is equipped with a cover such as a cover glass, the cover may be removed by peeling it off or destroying it before observing the second electrode 140 and the organic layer 130. A scanning electron microscope may be used instead of a digital microscope.

[0102] As shown in Figures 7 and 8, one organic layer 130, which includes one first organic layer 130A, one second organic layer 130B, and one third organic layer 130C, may overlap one first layer 140A or one second layer 140B in a plan view.

[0103] Next, an example of the layer configuration of the organic device 100 will be described. Figure 9 is a cross-sectional view of the organic device in Figure 7 along line AA. Figure 10 is a cross-sectional view of the organic device in Figure 7 along line BB.

[0104] The organic device 100 comprises a substrate 110 and an element 115 located on the substrate 110. The element 115 may have a first electrode 120, an organic layer 130 located on the first electrode 120, and a second electrode 140 located on the organic layer 130.

[0105] The organic device 100 may include an insulating layer 160 located between two adjacent first electrodes 120 in a plan view. The insulating layer 160 may contain, for example, polyimide. The insulating layer 160 may overlap the ends of the first electrodes 120. The insulating layer 160 may overlap the electrode overlap region 145 in a plan view. For example, in a plan view, the electrode overlap region 145 may be surrounded by the contour of the insulating layer 160. The electrode overlap region 145 includes multiple layers of the second electrode 140. Therefore, the electrode overlap region 145 has a lower transmittance than a single layer of the second electrode 140. When light transmitted through the electrode overlap region 145 is emitted from the organic device 100, unevenness in light intensity may occur. By overlapping the insulating layer 160 with the electrode overlap region 145, unevenness in light intensity can be suppressed.

[0106] The organic device 100 may be an active-matrix type. For example, although not shown in the figures, the organic device 100 may include a switch. The switch is electrically connected to each of the multiple elements 115. The switch is, for example, a transistor. The switch can control the ON / OFF state of voltage or current to the corresponding element 115.

[0107] The substrate 110 may be a plate-shaped member having insulating properties. Preferably, the substrate 110 has transparency that allows light to pass through.

[0108] When the substrate 110 has a predetermined transparency, it is preferable that the transparency of the substrate 110 is such that it can transmit light from the organic layer 130 and display an image. For example, it is preferable that the transmittance of the substrate 110 in the visible light region be 70% or more, and more preferably 80% or more. The transmittance of the substrate 110 can be measured by the test method for total light transmittance of transparent plastic materials in accordance with JIS K7361-1.

[0109] The substrate 110 may or may not be flexible. The substrate 110 can be appropriately selected depending on the application of the organic device 100.

[0110] As the material for the substrate 110, for example, rigid materials that do not allow flexibility, such as quartz glass, Pyrex® glass, synthetic quartz plate, or alkali-free glass, or flexible materials that allow flexibility, such as resin film, optical resin plate, or thin glass, can be used. The substrate may also be a laminate having a barrier layer on one or both sides of a resin film.

[0111] The thickness of the substrate 110 can be appropriately selected depending on the material used for the substrate 110 and the application of the organic device 100, but for example, it may be 0.005 mm or more. Alternatively, the thickness of the substrate 110 may be 5 mm or less.

[0112] The element 115 can perform some function by applying a voltage between the first electrode 120 and the second electrode 140, or by allowing a current to flow between the first electrode 120 and the second electrode 140. For example, if the element 115 is a pixel of an organic EL display device, the element 115 can emit light that constitutes an image.

[0113] The first electrode 120 includes a conductive material. For example, the first electrode 120 includes a metal, a conductive metal oxide, or other conductive inorganic material. The first electrode 120 may also include a transparent and conductive metal oxide, such as indium tin oxide.

[0114] The materials that make up the first electrode 120 include metals such as Au, Cr, Mo, Ag, and Mg; inorganic oxides such as indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide, and indium oxide; and conductive polymers such as metal-doped polythiophene. These conductive materials may be used individually or in combination of two or more types. When using two or more types, layers made of each material may be laminated. Alternatively, alloys containing two or more materials may be used. For example, magnesium alloys such as MgAg can be used.

[0115] The organic layer 130 contains an organic material. When an electric current is passed through the organic layer 130, the organic layer 130 can perform some function. "Electrification" means that a voltage is applied to the organic layer 130, or that an electric current flows through the organic layer 130. The organic layer 130 can be a light-emitting layer that emits light when an electric current is passed through it, or a layer whose light transmittance or refractive index changes when an electric current is passed through it. The organic layer 130 may also contain an organic semiconductor material.

[0116] The stacked structure including the first electrode 120, the first organic layer 130A, and the second electrode 140 is also referred to as the first element 115A. The stacked structure including the first electrode 120, the second organic layer 130B, and the second electrode 140 is also referred to as the second element 115B. The stacked structure including the first electrode 120, the third organic layer 130C, and the second electrode 140 is also referred to as the third element. When the organic device 100 is an organic EL display device, the first element 115A, the second element 115B, and the third element are each subpixels.

[0117] In the following explanation, the term and symbol "element 115" will be used when describing the configuration of elements common to the first element 115A, the second element 115B, and the third element.

[0118] When a voltage is applied between the first electrode 120 and the second electrode 140, the organic layer 130 located between them is driven. If the organic layer 130 is a light-emitting layer, light is emitted from the organic layer 130 and extracted to the outside from either the second electrode 140 side or the first electrode 120 side.

[0119] If the organic layer 130 includes a light-emitting layer that emits light when an electric current is applied, the organic layer 130 may further include a hole injection layer, a hole transport layer, an electron transport layer, an electron injection layer, and the like. For example, if the first electrode 120 is the anode, the organic layer 130 may have a hole injection transport layer between the light-emitting layer and the first electrode 120. The hole injection transport layer may be a hole injection layer having a hole injection function, a hole transport layer having a hole transport function, or a layer having both hole injection and hole transport functions. Furthermore, the hole injection transport layer may be a laminate of a hole injection layer and a hole transport layer. When the second electrode 140 is the cathode, the organic layer 130 may have an electron injection transport layer between the light-emitting layer and the second electrode 140. The electron injection transport layer may be an electron injection layer having an electron injection function, an electron transport layer having an electron transport function, or a layer having both electron injection and electron transport functions. Furthermore, the electron injection transport layer may be a laminate of an electron injection layer and an electron transport layer.

[0120] The light-emitting layer contains a light-emitting material. The light-emitting layer may also contain additives that improve leveling properties.

[0121] As the luminescent material, known materials can be used, such as dye-based materials, metal complex-based materials, and polymer-based materials. Examples of dye-based materials that can be used include cyclopentadiene derivatives, tetraphenylbutadiene derivatives, triphenylamine derivatives, oxadiazole derivatives, pyrazoloquinoline derivatives, distyrylbenzene derivatives, distyrylarylene derivatives, silole derivatives, thiophene ring compounds, pyridine ring compounds, perinone derivatives, perylene derivatives, oligothiophene derivatives, oxadiazole dimers, pyrazolin dimers, and the like. Examples of metal complex materials include aluminum quinolinol complexes, benzoquinolinol beryllium complexes, benzoxazole zinc complexes, benzothiazole zinc complexes, azomethyl zinc complexes, porphyrin zinc complexes, eurobium complexes, etc., in which the central metal is Al, Zn, Be, or a rare earth metal such as Tb, Eu, Dy, and the ligands are oxadiazole, thiadiazole, phenylpyridine, phenylbenzimidazole, quinoline, etc. Examples of polymer materials that can be used include poly(p-phenylenevinylene) derivatives, polythiophene derivatives, poly(p-phenylene) derivatives, polysilane derivatives, polyacetylene derivatives, polyvinylcarbazole derivatives, polyfluorene derivatives, polyquinoxaline derivatives, and copolymers thereof.

[0122] The luminescent layer may contain dopants for purposes such as improving luminescence efficiency or changing the emission wavelength. Examples of dopants include perylene derivatives, coumarin derivatives, rubrene derivatives, quinacridone derivatives, squarium derivatives, porphyrin derivatives, styryl dyes, tetracene derivatives, pyrazoline derivatives, decacyclene, phenoxazone, quinoxaline derivatives, carbazole derivatives, and fluorene derivatives. Alternatively, organometallic complexes that exhibit phosphorescence and primarily contain heavy metal ions such as platinum and iridium can be used as dopants. Dopants may be used individually or in combination of two or more.

[0123] Furthermore, as luminescent materials and dopants, for example, materials described in

[0094] to

[0099] of Japanese Patent Application Publication No. 2010-272891 and

[0053] to

[0057] of International Publication No. 2012 / 132126 can also be used.

[0124] The thickness of the light-emitting layer is not particularly limited as long as it is a thickness that can provide a field for electron-hole recombination and exhibit the function of emitting light. For example, it can be 1 nm or more, or 500 nm or less.

[0125] Known materials can be used as the hole-injection transport material for the hole-injection transport layer. For example, triazole derivatives, oxadiazole derivatives, imidazole derivatives, polyarylalkane derivatives, pyrazoline derivatives, pyrazolone derivatives, phenylenediamine derivatives, arylamine derivatives, aminosubstituted chalcone derivatives, oxazole derivatives, styrylanthracene derivatives, fluorenone derivatives, hydrazone derivatives, stilbene derivatives, silazane derivatives, polythiophene derivatives, polyaniline derivatives, polypyrrole derivatives, phenylamine derivatives, anthracene derivatives, carbazole derivatives, fluorene derivatives, distylylbenzene derivatives, polyphenylenevinylene derivatives, porphyrin derivatives, styrylamine derivatives, etc. can be used. Spiro compounds, phthalocyanine compounds, metal oxides, etc. can also be given as examples. Furthermore, for example, compounds described in

[0106] of Japanese Patent Publication No. 2011-119681, International Publication No. 2012 / 018082, Japanese Patent Publication No. 2012-069963, and International Publication No. 2012 / 132126 can also be appropriately selected and used.

[0126] Furthermore, if the hole injection transport layer is a laminate of a hole injection layer and a hole transport layer, the hole injection layer may contain additive A, the hole transport layer may contain additive A, or both the hole injection layer and the hole transport layer may contain additive A. Additive A may be a low molecular weight compound or a high molecular weight compound. Specifically, fluorine compounds, ester compounds, hydrocarbon compounds, etc., can be used.

[0127] Known materials can be used as electron-injection transport materials in the electron-injection transport layer. For example, alkali metals, alkali metal alloys, alkali metal halides, alkaline earth metals, alkaline earth metal halides, alkaline earth metal oxides, alkali metal organic complexes, magnesium halides and oxides, aluminum oxide, etc. can be used. In addition, as electron-injection transport materials, for example, vasocuproin, vasophenanthroline, phenanthroline derivatives, triazole derivatives, oxadiazole derivatives, pyridine derivatives, nitro-substituted fluorene derivatives, anthraquinodimethane derivatives, diphenylquinone derivatives, thiopyrandioxide derivatives, aromatic ring tetracarboxylic anhydrides such as naphthalene and perylene, carbodiimide, fluorenylidenemethane derivatives, anthraquinodimethane derivatives, anthrone derivatives, quinoxaline derivatives, metal complexes such as quinolinol complexes, phthalocyanine compounds, distylylpyrazine derivatives, etc. can be used.

[0128] Furthermore, a metal-doped layer can be formed by doping an electron-transporting organic material with an alkali metal or alkaline earth metal, and this can be used as an electron injection transport layer. Examples of electron-transporting organic materials include vasocuproin, vasophenanthroline, phenanthroline derivatives, triazole derivatives, oxadiazole derivatives, pyridine derivatives, metal complexes such as tris(8-quinolinolato)aluminum (Alq3), and polymer derivatives thereof. In addition, Li, Cs, Ba, Sr, etc. can be used as the metal for doping.

[0129] The second electrode 140 contains a conductive material such as a metal. The second electrode 140 is formed on the organic layer 130 by a vapor deposition method using a mask, which will be described later. Platinum, gold, silver, copper, iron, tin, chromium, aluminum, indium, lithium, sodium, potassium, calcium, magnesium, chromium, carbon, etc. can be used as materials to constitute the second electrode 140. These materials may be used individually or in combination of two or more types. When using two or more types, layers made of each material may be laminated. In addition, alloys containing two or more types of materials may be used. For example, magnesium alloys such as MgAg, aluminum alloys such as AlLi, AlCa, and AlMg, alloys of alkali metals and alkaline earth metals, etc. can be used.

[0130] The thickness of the second electrode 140 may be, for example, 5 nm or more, 10 nm or more, 50 nm or more, or 100 nm or more. The thickness of the second electrode 140 may be, for example, 200 nm or less, 500 nm or less, 1 μm or less, or 100 μm or less. The range of the thickness of the second electrode 140 may be defined by a first group consisting of 5 nm, 10 nm, 50 nm and 100 nm, and / or a second group consisting of 200 nm, 500 nm, 1 μm and 100 μm. The range of the thickness of the second electrode 140 may be defined by a combination of any one value included in the first group and any one value included in the second group. The range of the thickness of the second electrode 140 may be defined by a combination of any two values ​​included in the first group. The range of the thickness of the second electrode 140 may be defined by a combination of any two values ​​included in the second group. For example, the thickness of the second electrode 140 may be 5 nm to 100 μm, 5 nm to 1 μm, 5 nm to 500 nm, 5 nm to 200 nm, 5 nm to 100 nm, 5 nm to 50 nm, 5 nm to 10 nm, 10 nm to 100 μm, 10 nm to 1 μm, 10 nm to 500 nm, 10 nm to 200 nm, 10 nm to 100 nm, 10 nm to 50 nm, or 50 nm to 100 μm. , may be 50 nm or more and 1 μm or less, may be 50 nm or more and 500 nm or less, may be 50 nm or more and 200 nm or less, may be 50 nm or more and 100 nm or less, may be 100 nm or more and 100 μm or less, may be 100 nm or more and 1 μm or less, may be 100 nm or more and 500 nm or less, may be 100 nm or more and 200 nm or less, may be 200 nm or more and 100 μm or less, may be 200 nm or more and 500 nm or less, may be 500 nm or more and 100 μm or less, may be 500 nm or more and 1 μm or less, may be 1 μm or more and 100 μm or less. The thinner the electrode 140, the higher the transmittance of the electrode 140, and the higher the transmittance of the opaque region 103. Light incident on the opaque region 103 can reach the sensor in proportion to the transmittance of the opaque region 103. By increasing the transmittance of the opaque region 103, the amount of light received by the sensor can be increased.

[0131] The thickness of each component of the organic device 100, such as the thickness of the substrate 110 and the thickness of the second electrode 140, can be measured by observing a cross-sectional image of the organic device 100 using a scanning electron microscope.

[0132] Next, a method for forming the second electrode 140 of the organic device 100 described above by a vapor deposition method will be explained. Figure 11 shows a vapor deposition apparatus 10. The vapor deposition apparatus 10 performs a vapor deposition process in which a vapor deposition material is deposited onto the target object.

[0133] The deposition apparatus 10 may include a deposition source 6, a heater 8, and a mask device 40 inside. The deposition apparatus 10 may also include an exhaust means for creating a vacuum atmosphere inside the deposition apparatus 10. The deposition source 6 is, for example, a crucible. The deposition source 6 contains a deposition material 7, such as a conductive material. The heater 8 heats the deposition source 6 to evaporate the deposition material 7 under a vacuum atmosphere. The mask device 40 is positioned opposite the crucible 6.

[0134] As shown in Figure 11, the masking device 40 may include at least one mask 50 and a frame 41 that supports the mask 50. The frame 41 may include a first frame surface 41a and a second frame surface 41b. The mask 50 may be fixed to the first frame surface 41a. The second frame surface 41b is located on the opposite side of the first frame surface 41a. The frame 41 may also include an opening 42. The opening 42 penetrates from the first frame surface 41a to the second frame surface 41b. The mask 50 may be fixed to the frame 41 so as to cross the opening 42 in a plan view. The frame 41 may also support the mask 50 while pulling it in the plane direction. This can suppress the bending of the mask 50.

[0135] As mask 50, either the first mask 50A or the second mask 50B described later may be used. In the following description, when describing the mask configuration common to the first mask 50A and the second mask 50B, the term and symbol "mask 50" will be used. Similarly, when describing the mask components such as through holes and shielding areas described later, when describing content common to the first mask 50A and the second mask 50B, symbols consisting only of numbers, such as "53" and "54," without any letters, will be used. On the other hand, when describing content specific to the first mask 50A and the second mask 50B, symbols with corresponding letters such as "A" and "B" after the numbers may be used.

[0136] The mask 50 of the masking apparatus 40 faces the substrate 110. The substrate 110 is the object to which the deposition material 7 is deposited. The substrate 110 includes a first surface 111 and a second surface 112. The first surface 111 faces the mask 50. The mask 50 includes a plurality of through holes 53. The through holes 53 allow the deposition material 7 that has flown in from the deposition source 6 to pass through. The deposition material 7 that has passed through the through holes 53 adheres to the first surface 111 of the substrate 110. The mask 50 includes a first surface 51a and a second surface 51b. The first surface 51a faces the first surface 111. The second surface 51b is located on the opposite side of the first surface 51a. The through holes 53 penetrate from the first surface 51a to the second surface 51b.

[0137] The deposition apparatus 10 may include a substrate holder 2 for holding the substrate 110. The substrate holder 2 may be movable in the thickness direction of the substrate 110. The substrate holder 2 may be movable in the planar direction of the substrate 110. The substrate holder 2 may control the tilt of the substrate 110. For example, the substrate holder 2 may include a plurality of chucks attached to the outer edge of the substrate 110. Each chuck may be independently movable in the thickness direction or the planar direction of the substrate 110.

[0138] The deposition apparatus 10 may include a mask holder 3 for holding the mask apparatus 40. The mask holder 3 may be movable in the thickness direction of the mask 50. The mask holder 3 may be movable in the plane direction of the mask 50. For example, the mask holder 3 may include a plurality of chucks attached to the outer edge of the frame 41. Each chuck may be independently movable in the thickness direction or the plane direction of the mask 50.

[0139] The position of the mask 50 of the masking device 40 relative to the substrate 110 can be adjusted by moving at least one of the substrate holder 2 or the mask holder 3.

[0140] The deposition apparatus 10 may be equipped with a cooling plate 4. The cooling plate 4 may be positioned on the second surface 112 side of the substrate 110. The cooling plate 4 may have a flow path for circulating a coolant inside the cooling plate 4. The cooling plate 4 can suppress the temperature of the substrate 110 from rising during the deposition process.

[0141] The deposition apparatus 10 may be equipped with a magnet 5 located on the second surface 112 side. The magnet 5 may be stacked on the cooling plate 4. The magnet 5 attracts the mask 50 towards the substrate 110 by magnetic force. This reduces or eliminates the gap between the mask 50 and the substrate 110. This suppresses the occurrence of shadows during the deposition process. As a result, the dimensional accuracy and positional accuracy of the second electrode 140 can be improved. In this application, shadow refers to the phenomenon in which the deposition material 7 enters the gap between the mask 50 and the substrate 110, causing the thickness of the second electrode 140 to become uneven. Alternatively, an electrostatic chuck that utilizes electrostatic force may be used to attract the mask 50 towards the substrate 110.

[0142] Next, the mask device 40 will be described. Figure 12 is a plan view showing the mask device 40. The mask device 40 may include two or more masks 50. The masks 50 may be fixed to the frame 41, for example, by welding.

[0143] The frame 41 includes a pair of first sides 411 and a pair of second sides 412. The frame 41 may have a rectangular outline. A mask 50 may be fixed to the first sides 411 under tension. The first sides 411 may be longer than the second sides 412. The frame 41 may include an opening 42 enclosed by the pair of first sides 411 and the pair of second sides 412.

[0144] The mask 50 includes at least one cell 52. The cell 52 includes through holes 53 and shielding regions 54. The mask 50 may include two or more cells 52. When a display device such as an organic EL display device is manufactured using the mask 50, one cell 52 may correspond to the display area of ​​one organic EL display device, i.e., one screen. One cell 52 may correspond to multiple display areas. The mask 50 may include shielding regions 54 located between the cells 52. Although not shown in the figures, the mask 50 may include through holes 53 located between the cells 52.

[0145] Cell 52 may have, for example, a roughly square, or more precisely, a roughly rectangular, outline in a plan view. Each cell 52 may have contours of various shapes depending on the shape of the display area of ​​the organic EL display device. For example, each cell 52 may have a circular contour.

[0146] Figure 13 is a plan view showing an enlarged example of a mask 50. The mask 50 has a first mask direction D1 and a second mask direction D2 intersecting the first mask direction D1. The first mask direction D1 may be perpendicular to the second mask direction D2. The first mask direction D1 may correspond to the first element direction G1, and the second mask direction D2 may correspond to the second element direction G2.

[0147] The mask 50 includes through holes 53 and shielding areas 54. The through holes 53 are aligned in the first mask direction D1 and the second mask direction D2.

[0148] When the mask 50 is viewed along the normal direction of the first surface 51a, the mask 50 comprises a third mask region M3 and a fourth mask region M4. The third mask region M3 corresponds to the first display region 101 of the organic device 100. The fourth mask region M4 corresponds to the second display region 102 of the organic device 100.

[0149] In the third mask region M3, the through-holes 53 have a third aperture ratio. The third aperture ratio is calculated by dividing the total area of ​​the through-holes 53 located in the third mask region M3 by the area of ​​the third mask region M3. In the fourth mask region M4, the through-holes 53 have a fourth aperture ratio. The fourth aperture ratio is calculated by dividing the total area of ​​the through-holes 53 located in the fourth mask region M4 by the area of ​​the fourth mask region M4. The fourth aperture ratio may be smaller than the third aperture ratio.

[0150] The ratio of the fourth aperture ratio to the third aperture ratio may be, for example, 0.2 or greater, 0.3 or greater, or 0.4 or greater. The ratio of the fourth aperture ratio to the third aperture ratio may be, for example, 0.6 or less, 0.7 or less, or 0.8 or less. The range of the ratio of the fourth aperture ratio to the third aperture ratio may be determined by a first group consisting of 0.2, 0.3 and 0.4, and / or a second group consisting of 0.6, 0.7 and 0.8. The range of the ratio of the fourth aperture ratio to the third aperture ratio may be determined by a combination of any one value from the first group and any one value from the second group. The range of the ratio of the fourth aperture ratio to the third aperture ratio may be determined by a combination of any two values ​​from the first group. The range of the ratio of the fourth aperture ratio to the third aperture ratio may be determined by a combination of any two values ​​from the second group. For example, the ratio of the fourth aperture ratio to the third aperture ratio may be 0.2 or more and 0.8 or less, 0.2 or more and 0.7 or less, 0.2 or more and 0.6 or less, 0.2 or more and 0.4 or less, 0.2 or more and 0.3 or less, 0.3 or more and 0.8 or less, 0.3 or more and 0.7 or less, 0.3 or more and 0.6 or less, 0.3 or more and 0.4 or less, 0.4 or more and 0.8 or less, 0.4 or more and 0.7 or less, 0.4 or more and 0.6 or less, 0.6 or more and 0.8 or less, 0.6 or more and 0.7 or less, or 0.7 or more and 0.8 or less.

[0151] The mask 50 may have alignment marks 50M. The alignment marks 50M are formed, for example, at the corners of the cells 52 of the mask 50. The alignment marks 50M may be used to align the mask 50 with respect to the substrate 110 in the process of forming the second electrode 140 on the substrate 110 by vapor deposition using the mask 50. The alignment marks 50M may be formed, for example, in a position that overlaps with the frame 41. When manufacturing the mask apparatus 40, the alignment marks 50M may be used to align the mask 50 with the frame 41.

[0152] In the process of forming the second electrode 140, multiple masks 50 may be used. For example, as shown in Figure 14, the mask 50 may include a first mask 50A and a second mask 50B. The first mask 50A and the second mask 50B may constitute different mask devices 40. The mask device 40 that includes the first mask 50A will also be referred to as the first mask device 40A. The mask device 40 that includes the second mask 50B will also be referred to as the second mask device 40B.

[0153] In the process of forming the second electrode 140, for example, the first layer 140A of the second electrode 140 is formed on the substrate 110 using the first mask device 40A in the deposition apparatus 10. Subsequently, the second layer 140B of the second electrode 140 is formed on the substrate 110 using the second mask device 40B in the deposition apparatus 10. In this way, in the process of forming the second electrode 140 of the organic device 100, multiple masks 50, such as the first mask 50A and the second mask 50B, are used in sequence. The group of multiple masks 50 used to form the second electrode 140 of the organic device 100 is also called a "mask group".

[0154] Figure 15 shows an example of the cross-sectional structure of the mask 50. The mask 50 has a plurality of through holes 53 formed in the metal plate 51. The through holes 53 penetrate the metal plate 51 from the first surface 51a to the second surface 51b.

[0155] The through hole 53 may include a first recess 531 and a second recess 532. The first recess 531 is located on the first surface 51a side. The second recess 532 is located on the second surface 51b side. The first recess 531 is connected to the second recess 532 in the thickness direction of the metal plate 51.

[0156] In a plan view, the dimension r2 of the second recess 532 may be larger than the dimension r1 of the first recess 531. The first recess 531 may be formed by etching or other processing of the metal plate 51 from the first surface 51a side. The second recess 532 may be formed by etching or other processing of the metal plate 51 from the second surface 51b side. The first recess 531 and the second recess 532 are connected at a connecting portion 533.

[0157] Reference numeral 534 indicates a through-hole. The opening area of ​​the through-hole 53 in a plan view is minimized at the through-hole 534. The through-hole 534 may be defined by a connecting portion 533.

[0158] In the deposition method using the mask 50, the deposition material 7 that passes through the through-hole 534 from the second surface 51b to the first surface 51a adheres to the substrate 110, thereby forming layers such as the first layer 140A, the second layer 140B, and the third layer 140C on the substrate 110. The contour of the layers formed on the substrate 110 in the in-plane direction of the substrate 110 is determined by the contour of the through-hole 534 in plan view. The contour of the through-hole 53 shown in plan views such as Figures 16 to 20, described later, is the contour of the through-hole 534. The area of ​​the through-hole 53 may be the area of ​​the through-hole 534. The dimensions of the through-hole 53 in plan view may be the dimensions r of the through-hole 534.

[0159] The area of ​​the metal plate 51 other than the through-hole 534 can shield the deposition material 7 directed toward the substrate 110. The area of ​​the metal plate 51 other than the through-hole 534 is also called the shielding area 54. In the plan views of the mask 50, such as Figures 13, 14, 16, and 17, the shielding area 54 is shaded with diagonal lines. The shielding region 54 of the fourth region M4 of the mask may include a recess that does not penetrate the metal plate 51. By providing a recess in the fourth region M4 of the mask, the rigidity of the fourth region M4 of the mask can be reduced. This reduces the difference between the rigidity of the fourth region M4 of the mask and the rigidity of the third region M3 of the mask. Therefore, it is possible to suppress the formation of wrinkles in the mask 50 due to the difference in rigidity. Wrinkles tend to form, for example, when tension is applied to the mask 50.

[0160] The thickness T of the mask 50 may be, for example, 5 μm or more, 10 μm or more, 15 μm or more, or 20 μm or more. The thickness T of the mask 50 may be, for example, 25 μm or less, 30 μm or less, 50 μm or less, or 100 μm or less. The range of the thickness T of the mask 50 may be defined by a first group consisting of 5 μm, 10 μm, 15 μm and 20 μm, and / or a second group consisting of 25 μm, 30 μm, 50 μm and 100 μm. The range of the thickness T of the mask 50 may be defined by a combination of any one value included in the first group and any one value included in the second group. The range of the thickness T of the mask 50 may be defined by a combination of any two values ​​included in the first group. The range of the thickness T of the mask 50 may be defined by a combination of any two values ​​included in the second group. For example, the thickness T of the mask 50 may be 5 μm or more and 100 μm or less, 5 μm or more and 50 μm or less, 5 μm or more and 30 μm or less, 5 μm or more and 25 μm or less, 5 μm or more and 20 μm or less, 5 μm or more and 15 μm or less, 5 μm or more and 10 μm or less, 10 μm or more and 100 μm or less, 10 μm or more and 50 μm or less, 10 μm or more and 30 μm or less, 10 μm or more and 25 μm or less, 10 μm or more and 20 μm or less, 10 μm or more and 15 μm or less, or 15 μm or more and 100 μm or less. It is also fine if it is 15 μm or more and 50 μm or less, 15 μm or more and 30 μm or less, 15 μm or more and 25 μm or less, 15 μm or more and 20 μm or less, 20 μm or more and 100 μm or less, 20 μm or more and 50 μm or less, 20 μm or more and 30 μm or less, 20 μm or more and 25 μm or less, 25 μm or more and 100 μm or less, 25 μm or more and 50 μm or less, 25 μm or more and 30 μm or less, 30 μm or more and 100 μm or less, 30 μm or more and 50 μm or less, and 50 μm or more and 100 μm or less.

[0161] A contact-type measurement method can be used to measure the thickness T of the mask 50. For this contact-type measurement method, the HEIDENHAIM-METRO "MT1271" length gauge manufactured by Heidenhaim, which is equipped with a ball bush guide plunger, can be used.

[0162] The cross-sectional shape of the through-hole 53 is not limited to the shape shown in Figure 15. Furthermore, the method for forming the through-hole 53 is not limited to etching; various methods can be employed. For example, the mask 50 may be formed by plating in such a way that the through-hole 53 is created.

[0163] As the material constituting the mask 50, for example, an iron alloy containing nickel can be used. The iron alloy may further contain cobalt in addition to nickel. For example, as the material for the mask 50, an iron alloy can be used in which the total content of nickel and cobalt is 30% by mass or more and 54% by mass or less, and the cobalt content is 0% by mass or more and 6% by mass or less. As an iron alloy containing nickel or nickel and cobalt, Invar material containing 34% by mass or more and 38% by mass or less of nickel can be used, Super Invar material containing 30% by mass or more and 34% by mass or less of nickel in addition to cobalt can be used, and low thermal expansion Fe-Ni plated alloy containing 38% by mass or more and 54% by mass or less of nickel can be used. By using such an iron alloy, the thermal expansion coefficient of the mask 50 can be lowered. For example, when a glass substrate is used as the substrate 110, the thermal expansion coefficient of the mask 50 can be made to a low value equivalent to that of the glass substrate. This makes it possible to suppress the decrease in dimensional and positional accuracy of the vapor-deposited layer formed on the substrate 110 during the vapor deposition process, which is caused by the difference in thermal expansion coefficients between the mask 50 and the substrate 110.

[0164] Next, the first mask 50A will be described in detail. Figure 16 is a plan view showing an enlarged view of the third mask region M3 and the fourth mask region M4 of the first mask 50A. The first mask 50A includes a first through hole 53A and a first shielding region 54A.

[0165] The first mask 50A has a first mask direction D1, a second mask direction D2, a third mask direction D3, and a fourth mask direction D4. The first mask direction D1 may be parallel to the first element direction G1 during the deposition process. The second mask direction D2 may be parallel to the second element direction G2 during the deposition process. The third mask direction D3 is a direction that intersects both the first mask direction D1 and the second mask direction D2. The angle that the third mask direction D3 makes with respect to the first mask direction D1 and the second mask direction D2 is, for example, 20° or more and 70° or less. The fourth mask direction D4 is a direction that intersects both the first mask direction D1 and the second mask direction D2. The angle that the fourth mask direction D4 makes with respect to the first mask direction D1 and the second mask direction D2 is, for example, 20° or more and 70° or less. The third mask direction D3 intersects with respect to the fourth mask direction D4. For example, the third mask direction D3 may be perpendicular to the fourth mask direction D4.

[0166] In the third region M3 of the mask, the first through-holes 53A may be aligned along the third direction D3 of the mask with a 35th period P35. In the third region M3 of the mask, the first through-holes 53A may be aligned along the fourth direction D4 of the mask with a 45th period P45.

[0167] The symbol G35 represents the spacing between two adjacent first through-holes 53A located in the third mask region M3 and in the third mask direction D3. The spacing G35 may be, for example, 5 μm or more, 10 μm or more, or 15 μm or more. The spacing G35 may be, for example, 30 μm or less, 40 μm or less, or 50 μm or less. The range of the spacing G35 may be defined by a first group consisting of 5 μm, 10 μm, and 15 μm, and / or a second group consisting of 30 μm, 40 μm, and 50 μm. The range of the spacing G35 may be defined by a combination of any one value from the first group and any one value from the second group. The range of the spacing G35 may be defined by a combination of any two values ​​from the first group. The range of the spacing G35 may be defined by a combination of any two values ​​from the second group. For example, the spacing G35 may be 5 μm or more and 50 μm or less, 5 μm or more and 40 μm or less, 5 μm or more and 30 μm or less, 5 μm or more and 15 μm or less, 5 μm or more and 10 μm or less, 10 μm or more and 50 μm or less, 10 μm or more and 40 μm or less, 10 μm or more and 30 μm or less, 10 μm or more and 15 μm or less, 15 μm or more and 50 μm or less, 15 μm or more and 40 μm or more and 40 μm or more and 50 μm or less.

[0168] The symbol G45 represents the spacing between two adjacent first through-holes 53A located in the fourth mask region M4 and in the fourth mask direction D4. The range of spacing G45 can be the same as the range of spacing G35 described above.

[0169] As shown in Figure 16, in the fourth mask region M4, the first through-holes 53A may be aligned along the third mask direction D3. In the fourth mask region M4, the distance K35 between the center points of two adjacent first through-holes 53A in the third mask direction D3 may be N1 times the 35th period P35. N1 may be a number greater than or equal to 1. N1 may be an integer greater than or equal to 1. The value of N1 may differ depending on the position.

[0170] The mean value of N1 may be, for example, 1.1 or greater, 1.2 or greater, or 1.5 or greater. The mean value of N1 may be, for example, 2.0 or less, 2.5 or less, or 3.0 or less. The range of the mean value of N1 may be determined by a first group consisting of 1.1, 1.2 and 1.5, and / or a second group consisting of 2.0, 2.5 and 3.0. The range of the mean value of N1 may be determined by a combination of any one value from the first group and any one value from the second group. The range of the mean value of N1 may be determined by a combination of any two values ​​from the first group. The range of the mean value of N1 may be determined by a combination of any two values ​​from the second group. For example, the mean value of N1 may be 1.1 or more and 3.0 or less, 1.1 or more and 2.5 or less, 1.1 or more and 2.0 or less, 1.1 or more and 1.5 or less, 1.1 or more and 1.2 or less, 1.2 or more and 3.0 or less, 1.2 or more and 2.5 or less, 1.2 or more and 2.0 or less, 1.2 or more and 1.5 or less, 1.5 or more and 3.0 or less, 1.5 or more and 2.5 or less, 1.5 or more and 2.0 or less, 2.0 or more and 3.0 or less, 2.0 or more and 2.5 or less, or 2.5 or more and 3.0 or less.

[0171] The ratio of the standard deviation of N1 to the mean of N1 may be, for example, 0.2 or greater, 0.3 or greater, or 0.4 or greater. The ratio of the standard deviation of N1 to the mean of N1 may be, for example, 0.6 or less, 0.7 or less, or 0.8 or less. The range of the ratio of the standard deviation of N1 to the mean of N1 may be determined by a first group consisting of 0.2, 0.3 and 0.4, and / or a second group consisting of 0.6, 0.7 and 0.8. The range of the ratio of the standard deviation of N1 to the mean of N1 may be determined by a combination of any one value from the first group and any one value from the second group. The range of the ratio of the standard deviation of N1 to the mean of N1 may be determined by a combination of any two values ​​from the first group. The range of the ratio of the standard deviation of N1 to the mean of N1 may be determined by a combination of any two values ​​from the second group. For example, the ratio of the standard deviation of N1 to the mean of N1 may be between 0.2 and 0.8, between 0.2 and 0.7, between 0.2 and 0.6, between 0.2 and 0.4, between 0.2 and 0.3, between 0.3 and 0.8, between 0.3 and 0.7, between 0.3 and 0.6, between 0.3 and 0.4, between 0.4 and 0.8, between 0.4 and 0.7, between 0.4 and 0.6, between 0.6 and 0.8, or between 0.6 and 0.7.

[0172] In the fourth region M4 of the mask, the first through-holes 53A may be aligned along the fourth direction D4 of the mask. In the fourth region M4 of the mask, the distance K45 between the center points of two adjacent first through-holes 53A in the fourth direction D4 of the mask may be N2 times the 45th period P45. N2 may be a number greater than or equal to 1. N2 may be an integer greater than or equal to 1. The value of N2 may differ depending on the position. The range of the average value of N2 may be the range of the average value of N1 described above. The range of the ratio of the standard deviation of N2 to the average value of N2 may be the range of the "ratio of the standard deviation of N1 to the average value of N1" described above.

[0173] Referring to Figure 17, the second mask 50B will be explained. For parts of the second mask 50B that are configured similarly to the first mask 50A, redundant explanations may be omitted.

[0174] The second mask 50B includes a second through-hole 53B and a second shielding region 54B. In the third region M3 of the mask, the second through-hole 53B may be aligned along the third direction D3 of the mask in a 36th period P36, similar to the first through-hole 53A. The 36th period P36 may be the same as the 35th period P35 in the first mask 50A. In the third region M3 of the mask, the second through-hole 53B may be aligned along the fourth direction D4 of the mask in a 45th period P45, similar to the first through-hole 53A. The 46th period P46 may be the same as the 45th period P45 in the first mask 50A.

[0175] The symbol G36 represents the spacing between two adjacent second through-holes 53B located in the third mask region M3 and in the third mask direction D3. The range of spacing G36 can be the same as the range of spacing G35 described above.

[0176] The symbol G46 represents the spacing between two adjacent second through-holes 53B located in the third mask region M3 and in the fourth mask direction D4. The range of spacing G46 can be the same as the range of spacing G35 described above.

[0177] In the fourth mask region M4, the second through-holes 53B may be aligned along the third mask direction D3. In the fourth mask region M4, the distance K36 between the center points of two adjacent second through-holes 53B in the third mask direction D3 may be N3 times the 36th period P36. N3 may be a number greater than or equal to 1. N3 may be an integer greater than or equal to 1. The value of N3 may differ depending on the position. The range of the average value of N3 may be the range of the average value of N1 described above. The range of the ratio of the standard deviation of N3 to the average value of N3 may be the range of the "ratio of the standard deviation of N1 to the average value of N1" described above.

[0178] In the fourth mask region M4, the second through-holes 53B may be aligned along the fourth mask direction D4. In the fourth mask region M4, the distance K46 between the center points of two adjacent second through-holes 53B in the fourth mask direction D4 may be N4 times the 46th period P46. N4 may be a number greater than or equal to 1. N4 may be an integer greater than or equal to 1. The value of N4 may differ depending on the position. The range of the average value of N4 may be the range of the average value of N1 described above. The range of the ratio of the standard deviation of N4 to the average value of N4 may be the range of the "ratio of the standard deviation of N1 to the average value of N1" described above.

[0179] In the method for measuring the shape and arrangement of through-holes 53A to 53B in each mask 50A to 50B, parallel light is incident on either the first surface 51a or the second surface 51b along the normal direction of each mask. The parallel light is emitted from the other surface. The shape of the region occupied by the emitted light is measured as the shape of the through-hole 53.

[0180] The method for calculating N1 is explained below. First, the arrangement and shape of all first through-holes 53A located in the fourth region M4 of the mask are measured and analyzed using a SOKIA AMIC-701 dimensional measuring machine. From this, the distance K35 is calculated for all first through-holes 53A located in the fourth region M4 of the mask. Similarly, the arrangement and shape of the first through-holes 53A located in the third region M3 of the mask are measured and analyzed. From this, the 35th period P35 is calculated. Next, the distance K35 is divided by the 35th period P35. This allows N1 to be calculated for all first through-holes 53A located in the fourth region M4 of the mask. N2, N3, and N4 are calculated in the same way. Alternatively, N1, N2, N3, and N4 may be calculated based on the design drawings and design values ​​for manufacturing the mask.

[0181] Next, the positional relationship between the first mask 50A and the second mask 50B will be explained. Figure 18 is a plan view showing the mask laminate 55. The mask laminate 55 comprises two or more masks 50 stacked on top of each other. The mask laminate 55 shown in Figure 18 comprises the first mask 50A and the second mask 50B stacked on top of each other.

[0182] In the mask laminate 55, the alignment marks 50M of each mask 50A to 50B may overlap. Alternatively, the masks 50A to 50B may be stacked based on the arrangement of the cells 52 of each mask 50A to 50B. Alternatively, the masks 50A to 50B may be stacked based on the arrangement of the through holes 53A to 53B and shielding areas 54A to 54B of each mask 50A to 50B. When stacking the masks 50A to 50B, tension may or may not be applied to each mask 50A to 50B.

[0183] Furthermore, a diagram showing two or more masks 50 stacked on top of each other may be obtained by superimposing the image data of each mask 50. For example, first, an imaging device is used to acquire image data relating to the contours of the through holes 53A to 53B of each mask 50A to 50B. Then, an image processing device is used to superimpose the image data of each mask 50A to 50B. This allows for the creation of a diagram like that shown in Figure 18. When acquiring the image data, tension may or may not be applied to each mask 50A to 50B. A diagram showing two or more masks 50 stacked on top of each other may also be obtained by superimposing the design drawings for manufacturing each mask 50A to 50C.

[0184] As shown in Figure 18, the mask laminate 55 includes a through region 55A, an overlapping region 58, and a hole overlapping region 59.

[0185] In a plan view, the through-region 55A includes at least one of the through-holes 53 of the mask 50 contained in the mask laminate 55. In the example shown in Figure 18, the through-region 55A includes at least one of the through-holes 53A to 53B of each mask 50A to 50B. That is, in a plan view, the through-region 55A overlaps with at least one of the through-holes 53A to 53B of each mask 50A to 50B. Therefore, in the deposition process, at least one layer of the second electrode 140 is formed in the region of the substrate 110 corresponding to the through-region 55A.

[0186] The pore overlap region 59 is a region in a plan view where the through holes 53 of two or more masks 50 overlap. That is, the pore overlap region 59 includes at least two of the through holes 53 of two or more masks 50 included in the mask laminate 55 in a plan view. In the example shown in Figure 18, the pore overlap region 59 is a region in a plan view where the first through hole 53A and the second through hole 53B overlap. That is, the pore overlap region 59 includes the first through hole 53A and the second through hole 53B. Therefore, in the deposition process, at least two layers of the second electrode 140 are formed in the region of the substrate 110 corresponding to the pore overlap region 59.

[0187] The overlapping region 58 is the region where all the shielding regions 54 of each mask 50 overlap in a plan view. That is, the overlapping region 58 includes all the shielding regions 54 of each mask 50 in a plan view. In other words, the overlapping region 58 does not overlap with any of the through-holes 53 of each mask in a plan view. In the example shown in Figure 18, the overlapping region 58 is the region where the first shielding region 54A and the second shielding region 54B overlap in a plan view. That is, the overlapping region 58 includes the first shielding region 54A and the second shielding region 54B. Therefore, in the deposition process, the second electrode 140 is not formed in the region of the substrate 110 corresponding to the hole overlapping region 59. That is, in the deposition process, a transparent region 104 is formed in the region of the substrate 110 corresponding to the overlapping region 58.

[0188] In a plan view, the mask laminate 55 comprises a first mask region M1 and a second mask region M2. The first mask region M1 corresponds to the first display region 101 of the organic device 100. The second mask region M2 corresponds to the second display region 102 of the organic device 100.

[0189] In the first mask region M1, the penetration region 55A has a first aperture ratio. The first aperture ratio is calculated by dividing the total area of ​​the penetration regions 55A located in the first mask region M1 by the area of ​​the first mask region M1. In the second mask region M2, the penetration region 55A has a second aperture ratio. The second aperture ratio is calculated by dividing the total area of ​​the penetration regions 55A located in the second mask region M2 by the area of ​​the second mask region M2. The second aperture ratio may be smaller than the first aperture ratio.

[0190] The ratio of the second aperture ratio to the first aperture ratio may be, for example, 0.2 or greater, 0.3 or greater, or 0.4 or greater. The ratio of the second aperture ratio to the first aperture ratio may be, for example, 0.6 or less, 0.7 or less, or 0.8 or less. The range of the ratio of the second aperture ratio to the first aperture ratio may be determined by a first group consisting of 0.2, 0.3 and 0.4, and / or a second group consisting of 0.6, 0.7 and 0.8. The range of the ratio of the second aperture ratio to the first aperture ratio may be determined by a combination of any one value from the first group and any one value from the second group. The range of the ratio of the second aperture ratio to the first aperture ratio may be determined by a combination of any two values ​​from the first group. The range of the ratio of the second aperture ratio to the first aperture ratio may be determined by a combination of any two values ​​from the second group. For example, the ratio of the second aperture ratio to the first aperture ratio may be 0.2 or more and 0.8 or less, 0.2 or more and 0.7 or less, 0.2 or more and 0.6 or less, 0.2 or more and 0.4 or less, 0.2 or more and 0.3 or less, 0.3 or more and 0.8 or less, 0.3 or more and 0.7 or less, 0.3 or more and 0.6 or less, 0.3 or more and 0.4 or less, 0.4 or more and 0.8 or less, 0.4 or more and 0.7 or less, 0.4 or more and 0.6 or less, 0.6 or more and 0.8 or less, 0.6 or more and 0.7 or less, or 0.7 or more and 0.8 or less.

[0191] In the first region M1 of the mask, the first through-holes 53A and the second through-holes 53B may be arranged alternately in the first direction D1 of the mask. The first through-hole 53A may be connected to the second through-hole 53B in the first direction D1 of the mask. In this case, in the first region M1 of the mask, the overlapping hole regions 59 may be arranged along the first direction D1 of the mask in a 17-period P17.

[0192] In the first region M1 of the mask, the first through-hole 53A and the second through-hole 53B may be arranged alternately in the second direction D2 of the mask. The first through-hole 53A may be connected to the second through-hole 53B in the second direction D2 of the mask. In this case, in the first region M1 of the mask, the overlapping hole region 59 may be arranged along the second direction D2 of the mask in a 27-period P27.

[0193] The area of ​​the overlapping hole region 59 may be smaller than the area of ​​the first through hole 53A. The ratio of the area of ​​the overlapping hole region 59 to the area of ​​the first through hole 53A may be, for example, 0.02 or more, 0.05 or more, or 0.10 or more. The ratio of the area of ​​the overlapping hole region 59 to the area of ​​the first through hole 53A may be, for example, 0.20 or less, 0.30 or less, or 0.40 or less. The range of the ratio of the area of ​​the overlapping hole region 59 to the area of ​​the first through hole 53A may be determined by a first group consisting of 0.01, 0.05 and 0.10, and / or a second group consisting of 0.20, 0.30 and 0.40. The range of the ratio of the area of ​​the overlapping hole region 59 to the area of ​​the first through hole 53A may be determined by a combination of any one of the values ​​included in the first group described above and any one of the values ​​included in the second group described above. The range of the ratio of the area of ​​the hole overlap region 59 to the area of ​​the first through hole 53A may be determined by any two combinations of values ​​included in the first group described above. The range of the ratio of the area of ​​the hole overlap region 59 to the area of ​​the first through hole 53A may be determined by any two combinations of values ​​included in the second group described above. For example, the ratio of the area of ​​the hole overlap region 59 to the area of ​​the first through hole 53A may be 0.01 or more and 0.40 or less, 0.01 or more and 0.30 or less, 0.01 or more and 0.20 or less, 0.01 or more and 0.10 or less, 0.01 or more and 0.05 or less, 0.05 or more and 0.40 or less, 0.05 or more and 0.30 or less, 0.05 or more and 0.20 or less, 0.05 or more and 0.10 or less, 0.10 or more and 0.40 or less, 0.10 or more and 0.30 or less, 0.20 or more and 0.40 or less, 0.20 or more and 0.30 or less, or 0.30 or more and 0.40 or less.

[0194] The area of ​​the overlapping hole region 59 may be smaller than the area of ​​the second through hole 53B. The range of the ratio of the area of ​​the overlapping hole region 59 to the area of ​​the second through hole 53B can be the same as the range of the "ratio of the area of ​​the overlapping hole region 59 to the area of ​​the first through hole 53A" described above.

[0195] As shown in Figure 18, the overlapping regions 58 may be arranged irregularly in the second mask region M2. This allows the transparent regions 104 corresponding to the overlapping regions 58 to have an irregular shape.

[0196] An example of an irregular shape is described. As shown in Figure 18, the overlapping region 58 may include a first overlapping region 581 and a second overlapping region 582. The second overlapping region 582 is adjacent to the first overlapping region 581, separated by a through region 55A. The first overlapping region 581 has a first mask shape. The second overlapping region 582 may have a second mask shape that is different from the first mask shape. The specific differences between the first mask shape and the second mask shape are arbitrary. For example, the area of ​​the second mask shape may be different from the area of ​​the first mask shape.

[0197] The term "first overlapping region 581" does not necessarily refer to a specific overlapping region 58. For example, as shown in Figure 19, an overlapping region 58 different from the one in Figure 18 may correspond to the first overlapping region 581. The shapes of the through-region 55A and overlapping region 58 in Figure 19 are the same as those of the through-region 55A and overlapping region 58 in Figure 18. In the example of Figure 19, there is an overlapping region 58 adjacent to the first overlapping region 581 across the through-region 55A, and which has a different shape from the first overlapping region 581. That is, in the example of Figure 19, there is an overlapping region 58 that corresponds to the second overlapping region 582 in relation to the first overlapping region 581. In this way, when two overlapping regions 58 adjacent to each other across the through-region 55A have different shapes, one of the overlapping regions 58 can be called the first overlapping region 581, and the other overlapping region 58 can be called the second overlapping region 582.

[0198] The second mask region M2 may have an eleventh matching rate. The eleventh matching rate is the percentage of the number of eleventh matching cases relative to the total number of overlapping regions 58. The number of eleventh matching cases is the number of overlapping regions 58 that can be called the first overlapping region 581 in relation to the second overlapping region 582. The eleventh matching rate may be, for example, 80% or more, 85% or more, or 90% or more. The eleventh matching rate may be, for example, 95% or less, 97% or less, or 99% or less. The range of the eleventh matching rate may be defined by a first group consisting of 80%, 85%, and 90%, and / or a second group consisting of 95%, 97%, and 99%. The range of the eleventh matching rate may be defined by a combination of any one value from the first group and any one value from the second group. The range of the eleventh matching rate may be defined by a combination of any two values ​​from the first group. The range of the 11th category rate may be determined by any two combinations of values ​​included in the second group described above. For example, the 11th category rate may be 80% or more and 99% or less, 80% or more and 97% or less, 80% or more and 95% or less, 80% or more and 90% or less, 80% or more and 85% or less, 85% or more and 99% or less, 85% or more and 97% or less, 85% or more and 95% or less, 85% or more and 90% or less, 90% or more and 99% or less, 90% or more and 97% or less, 90% or more and 95% or less, 95% or more and 99% or less, 95% or more and 97% or more and 99% or less.

[0199] As shown in Figures 18 and 19, the overlapping region 58 may include a third overlapping region 583. The third overlapping region 583 is adjacent to the first overlapping region 581 and the second overlapping region 582, separated by the through-region 55A. The third overlapping region 583 may have a third mask shape different from the first and second mask shapes. For example, the area of ​​the third mask shape may differ from the area of ​​the first mask shape and the area of ​​the second mask shape.

[0200] The second mask region M2 may have a 12th matching rate. The 12th matching rate is the percentage of the number of 12th matching cases relative to the total number of overlapping regions 58. The 12th matching case is the number of overlapping regions 58 that can be called the first overlapping region 581 in relation to the second overlapping region 582 and the third overlapping region 583. The range of the 12th matching rate can be the range of the 11th matching rate described above.

[0201] As shown in Figures 18 and 19, the overlapping region 58 may include a fourth overlapping region 584. The fourth overlapping region 584 is adjacent to the first overlapping region 581 and the second overlapping region 582, separated by a through-region 55A. The fourth overlapping region 584 may have a fourth mask shape different from the first and second mask shapes. For example, the area of ​​the fourth mask shape may be different from the area of ​​the first mask shape and the area of ​​the second mask shape. The fourth mask shape may also be different from the third mask shape.

[0202] The second mask region M2 may have a 13th matching rate. The 13th matching rate is the percentage of the number of 13th matching cases relative to the total number of overlapping regions 58. The 13th matching case is the number of overlapping regions 58 that can be called the first overlapping region 581 in relation to the second overlapping region 582, the third overlapping region 583, and the fourth overlapping region 584. The range of the 13th matching rate can be the range of the 11th matching rate described above.

[0203] As shown in Figures 18 and 19, the overlapping region 58 may include a fifth overlapping region 585. The fifth overlapping region 585 is adjacent to the first overlapping region 581 across the through region 55A. The fifth overlapping region 585 may also be adjacent to the fourth overlapping region 584 across the through region 55A. The fifth overlapping region 585 may have a fifth mask shape different from the first mask shape. For example, the area of ​​the fifth mask shape may be different from the area of ​​the first mask shape. The fifth mask shape may also be different from the second, third, and fourth mask shapes.

[0204] The second mask region M2 may have a 14th matching rate. The 14th matching rate is the percentage of the number of 14th matching cases relative to the total number of overlapping regions 58. The 14th matching case is the number of overlapping regions 58 that can be called the first overlapping region 581 in relation to the second overlapping region 582, the third overlapping region 583, the fourth overlapping region 584, and the fifth overlapping region 585. The range of the 14th matching rate can be the range of the 11th matching rate described above.

[0205] As shown in Figures 18 and 19, the overlapping region 58 may include a sixth overlapping region 586. The sixth overlapping region 586 is adjacent to the first overlapping region 581 across the through region 55A. The sixth overlapping region 586 may have a sixth mask shape different from the first mask shape. For example, the area of ​​the sixth mask shape may be different from the area of ​​the first mask shape. The sixth mask shape may also be different from the second, third, fourth, and fifth mask shapes.

[0206] The second mask region M2 may have a 15th matching rate. The 15th matching rate is the percentage of the number of 15th matching cases relative to the total number of overlapping regions 58. The 15th matching case is the number of overlapping regions 58 that can be called the first overlapping region 581 in relation to the second overlapping region 582, the third overlapping region 583, the fourth overlapping region 584, the fifth overlapping region 585, and the sixth overlapping region 586. The range of the 15th matching rate can be the range of the 11th matching rate described above.

[0207] Next, the through-region 55A will be described. As shown in Figures 18 and 19, the through-region 55A may include a connection terminal 55Z. The connection terminal 55Z connects the through-region 55A of the second mask region M2 to the through-region 55A of the first mask region M1. The connection terminal 55Z is a through-region 55A located at the boundary between the first mask region M1 and the second mask region M2. Similar to the electrode connection terminal 140Z of the second electrode 140 described above, the connection terminal 55Z may include a first connection terminal, a second connection terminal, a third connection terminal, and a fourth connection terminal. The first connection terminal is located at one boundary in the first mask direction D1. The second connection terminal is located at the other boundary in the first mask direction D1. The third connection terminal is located at one boundary in the second mask direction D2. The fourth connection terminal is located at the other boundary in the second mask direction D2.

[0208] Similar to the second electrode 140Y of the second display area 102, the through-area 55A of the second mask area M2 may include an area extending from one connection end to another. For example, the through-area 55A may include the following areas. Each area may overlap with one another. The through-area 55A may include all of the following types of areas. The through-area 55A may include some of the following types of areas. • The region extending from the first connection end to the second connection end. • The region extending from the first connection end to the third connection end. • The region extending from the first connection end to the fourth connection end. • The region extending from the second connection end to the third connection end. • The region extending from the second connection terminal to the fourth connection terminal. • The region extending from the third connection terminal to the fourth connection terminal

[0209] As shown in Figures 18 and 19, the through-region 55A of the second mask region M2 may include a trunk region 56 and a branch region 57. The trunk region 56 constitutes a path extending from one connection end to another. The branch region 57 is connected to the trunk region 56.

[0210] Figure 20 is a plan view showing an example of a branch region 57. Branch region 57 may be the first branch region 57A or the second branch region 57B.

[0211] The first branch region 57A includes two first region ends 571 and one second region end 572. The first region ends 571 are the ends of the branch region 57 in the fifth mask direction D5. The two first region ends 571 face each other in a direction perpendicular to the fifth mask direction D5. The fifth mask direction D5 may be parallel to the first mask direction D1. Although not shown, the fifth mask direction D5 may not be parallel to the first mask direction D1. The second region end 572 is the end of the branch region 57 in the sixth mask direction D6. The sixth mask direction D6 intersects the fifth mask direction D5. The sixth mask direction D6 may be perpendicular to the fifth mask direction D5. The two first region ends 571 and the one second region end 572 are tangent to the overlapping region 58.

[0212] The second branch region 57B includes one first region end 571 and two second region ends 572. The two second region ends 572 face each other in a direction perpendicular to the sixth mask direction D6. The one first region end 571 and the two second region ends 572 are in contact with the overlapping region 58.

[0213] The width W55 at the edge 571 of the first region may have a constant ratio with respect to the 27th period P27. The ratio of the width W55 to the 27th period P27 may be, for example, 0.4 or more, 0.6 or more, or 0.8 or more. The ratio of the width W55 to the 27th period P27 may be, for example, 1.2 or less, 1.4 or less, or 1.6 or less. The range of the ratio of the width W55 to the 27th period P27 may be defined by a first group consisting of 0.4, 0.6 and 0.8, and / or a second group consisting of 1.2, 1.4 and 1.6. The range of the ratio of the width W55 to the 27th period P27 may be defined by a combination of any one value from the first group and any one value from the second group. The range of the ratio of the width W55 to the 27th period P27 may be defined by a combination of any two values ​​from the first group. The range of the ratio of the width W55 to the 27th period P27 may be determined by any two combinations of values ​​included in the second group described above. For example, the ratio of the width W55 to the 27th period P27 may be 0.4 or more and 1.6 or less, 0.4 or more and 1.4 or less, 0.4 or more and 1.2 or less, 0.4 or more and 0.8 or less, 0.4 or more and 0.6 or less, 0.6 or more and 1.6 or less, 0.6 or more and 1.4 or less, 0.6 or more and 1.2 or less, 0.6 or more and 0.8 or less, 0.8 or more and 1.6 or less, 0.8 or more and 1.4 or less, 0.8 or more and 1.2 or less, 1.2 or more and 1.6 or less, 1.2 or more and 1.4 or less, and 1.4 or more and 1.6 or less.

[0214] The width W65 at the edge 572 of the second region may have a constant ratio with respect to the 17th period P17. The ratio of the width W65 to the 17th period P17 may be, for example, 0.4 or more, 0.6 or more, or 0.8 or more. The ratio of the width W65 to the 17th period P17 may be, for example, 1.2 or less, 1.4 or less, or 1.6 or less. The range of the ratio of the width W65 to the 17th period P17 may be defined by a first group consisting of 0.4, 0.6 and 0.8, and / or a second group consisting of 1.2, 1.4 and 1.6. The range of the ratio of the width W65 to the 17th period P17 may be defined by a combination of any one value from the first group and any one value from the second group. The range of the ratio of the width W65 to the 17th period P17 may be defined by a combination of any two values ​​from the first group. The range of the ratio of width W65 to the 17th period P17 may be determined by any two combinations of values ​​included in the second group described above. For example, the ratio of width W65 to the 17th period P17 may be 0.4 or more and 1.6 or less, 0.4 or more and 1.4 or less, 0.4 or more and 1.2 or less, 0.4 or more and 0.8 or less, 0.4 or more and 0.6 or less, 0.6 or more and 1.6 or less, 0.6 or more and 1.4 or less, 0.6 or more and 1.2 or less, 0.6 or more and 0.8 or less, 0.8 or more and 1.6 or less, 0.8 or more and 1.4 or less, 0.8 or more and 1.2 or less, 1.2 or more and 1.6 or less, 1.2 or more and 1.4 or less, and 1.4 or more and 1.6 or less.

[0215] The inclusion of branch regions 57 within the penetrating region 55A makes it easier to arrange the penetrating region 55A irregularly. This allows for the irregular formation of the second electrode 140Y. This further suppresses the reinforcement of light diffracted when passing through the transmission region 104.

[0216] Next, we will describe an example of a method for manufacturing the organic device 100.

[0217] First, a substrate 110 on which the first electrode 120 is formed is prepared. The first electrode 120 is formed, for example, by forming a conductive layer constituting the first electrode 120 on the substrate 110 by a sputtering method, and then patterning the conductive layer by a photolithography method. An insulating layer 160 located between two adjacent first electrodes 120 in a plan view may also be formed on the substrate 110.

[0218] Next, as shown in Figure 8, an organic layer 130 including a first organic layer 130A and a second organic layer 130B is formed on the first electrode 120. The first organic layer 130A may be formed, for example, by a vapor deposition method using a mask having through-holes corresponding to the first organic layer 130A. For example, the first organic layer 130A can be formed by vapor deposition of an organic material or the like onto the first electrode 120 corresponding to the first organic layer 130A via a mask. The second organic layer 130B may also be formed by a vapor deposition method using a mask having through-holes corresponding to the second organic layer 130B.

[0219] Next, a second electrode formation step may be performed. In the second electrode formation step, the second electrode 140 is formed on the organic layer 130 using the mask group described above. First, a step may be performed to form the first layer 140A of the second electrode 140 by a vapor deposition method using the first mask 50A. For example, a conductive material such as a metal is vapor-deposited onto the organic layer 130 via the first mask 50A. This forms the first layer 140A. Next, a step may be performed to form the second layer 140B of the second electrode 140 by a vapor deposition method using the second mask 50B. For example, a conductive material such as a metal is vapor-deposited onto the organic layer 130 via the second mask 50B. This forms the second layer 140B. In this way, as shown in Figure 7, a second electrode 140 including the first layer 140A and the second layer 140B can be formed.

[0220] The order in which the first layer 140A and the second layer 140B are formed is not particularly limited. For example, the deposition process may be carried out in the order of second layer 140B followed by first layer 140A.

[0221] This section summarizes the effects of this disclosure.

[0222] If the second display area 102 of the organic device 100 includes a transparent area 104, light reaching the organic device 100 can pass through the transparent area 104 and reach optical components on the back side of the substrate. Therefore, the second display area 102 can detect light and display an image. For this reason, the functions of sensors such as cameras and fingerprint sensors can be implemented in the second display area 102.

[0223] If the shape of the transmission region 104 is not constant, it is possible to suppress the reinforcement of light diffracted as it passes through the transmission region 104. Therefore, it is possible to suppress the incidence of diffracted light with high intensity on the sensor. This makes it possible to suppress blurring of the image generated by the sensor, for example.

[0224] Figure 21 is a plan view showing an enlarged example of a second display area 102 relating to a reference embodiment. In the example shown in Figure 21, the shape of the transparent area 104 is constant. Specifically, the transparent area 104 is square in plan view. In this case, the light diffracted when passing through the transparent area 104 may reinforce each other in certain directions. As a result, the image generated by the sensor provided in the second display area 102 may become blurred.

[0225] In contrast, as shown in the example in Figure 3 above, since the shape of the transmission region 104 is not constant, it is possible to suppress the reinforcement of light diffracted when passing through the transmission region 104. Therefore, it is possible to suppress the incidence of diffracted light with high intensity on the sensor. This makes it possible to suppress blurring of the image generated by the sensor, for example.

[0226] It is possible to make various modifications to the embodiment described above. Other embodiments will be described below, with reference to the drawings as needed. In the following description and the drawings used therein, parts that can be configured in the same way as the embodiment described above will be given the same reference numerals as those used for the corresponding parts in the embodiment described above, and redundant explanations will be omitted. In addition, if it is clear that the effects and advantages obtained in the embodiment described above can also be obtained in other embodiments, the explanation may be omitted.

[0227] In the above-described embodiment, an example was shown in which the organic layer 130 of the first display area 101 and the organic layer 130 of the second display area 102 have the same dimensions. However, the organic layer 130 of the second display area 102 may have different dimensions from the organic layer 130 of the first display area 101. For example, as shown in Figure 22, the organic layer 130 of the second display area 102 may have larger dimensions than the organic layer 130 of the first display area 101.

[0228] The first display region 101 shown in Figure 22 has the same configuration as the first display region 101 described above, shown in Figures 3 and 7. Specifically, in the first display region 101, the organic layers 130, including the first organic layer 130A, the second organic layer 130B, and the third organic layer 130C, are arranged in the first element direction G1 and the second element direction G2. The second electrode 140X includes the first layer 140A, the second layer 140B, and the third layer 140C. In a plan view, one first layer 140A or one second layer 140B overlaps one organic layer 130.

[0229] In the second display area 102, the second electrode 140Y may include a first layer 140A, a second layer 140B, and a third layer 140C. The first layer 140A, the second layer 140B, and the third layer 140C are each formed by a vapor deposition method using the first mask 50A, the second mask 50B, and the third mask 50C, which will be described later.

[0230] The third layer 140C may overlap with the organic layer 130, which includes the first organic layer 130A, the second organic layer 130B, and the third organic layer 130C. The first layer 140A and the second layer 140B do not have to overlap with the organic layer 130.

[0231] In the example in Figure 22, the second electrode 140Y may be arranged irregularly. This allows the transparent region 104 surrounded by the second electrode 140Y to have an irregular shape. For example, similar to the example in Figure 3, the transparent region 104 may include a first transparent region 1041 and a second transparent region 1042. The transparent region 104 may include a third transparent region 1043. The transparent region 104 may include a fourth transparent region 1044. The transparent region 104 may include a fifth transparent region 1045. The transparent region 104 may include a sixth transparent region 1046.

[0232] Figure 24 is a plan view showing an example of the first mask 50A. Figure 25 is a plan view showing an example of the second mask 50B. Figure 26 is a plan view showing an example of the third mask 50C.

[0233] As shown in Figure 24, the first mask 50A includes a first through-hole 53A and a first shielding region 54A. Similar to the example shown in Figure 16, in the fourth region M4 of the mask, the distance K35 between the center points of two adjacent first through-holes 53A in the third direction D3 of the mask may be N1 times the 35th period P35. In the fourth region M4 of the mask, the distance K45 between the center points of two adjacent first through-holes 53A in the fourth direction D4 of the mask may be N2 times the 45th period P45.

[0234] As shown in Figure 25, the second mask 50B includes a second through-hole 53B and a second shielding region 54B. Similar to the example shown in Figure 17, in the fourth region M4 of the mask, the distance K36 between the center points of two adjacent second through-holes 53B in the third direction D3 of the mask may be N3 times the 36th period P36. In the fourth region M4 of the mask, the distance K46 between the center points of two adjacent second through-holes 53B in the fourth direction D4 of the mask may be N4 times the 46th period P46.

[0235] As shown in Figure 26, the third mask 50C includes a third mask region M3 and a fourth mask region M4. The third mask 50C may have a third through-hole 53C and a third shielding region 54C in the fourth mask region M4. The third through-hole 53C may be aligned in the 18th period P18 in the first mask direction D1. The third through-hole 53C may be aligned in the 28th period P28 in the second mask direction D2. The third mask 50C includes a third shielding region 54C in the third mask region M3. The third mask 50C does not have to include a third through-hole 53C in the third mask region M3.

[0236] Figure 23 is a plan view showing a mask laminate 55. The mask laminate 55 comprises a stacked first mask 50A, a second mask 50B, and a third mask 50C. In the mask laminate 55, the first through-hole 53A and the second through-hole 53B may be connected to the third through-hole 53C in the first mask direction D1. The first through-hole 53A and the second through-hole 53B may be connected to the third through-hole 53C in the second mask direction D2.

[0237] The mask laminate 55 comprises a through region 55A, an overlapping region 58, and a hole overlapping region 59. Similar to the example in Figure 18, the overlapping region 58 may be irregularly arranged in the second mask region M2. This allows the transparent region 104 corresponding to the overlapping region 58 to have an irregular shape. For example, similar to the example in Figure 18, the overlapping region 58 may include a first overlapping region 581 and a second overlapping region 582. The overlapping region 58 may include a third overlapping region 583. The overlapping region 58 may include a fourth overlapping region 584. The overlapping region 58 may include a fifth overlapping region 585. The overlapping region 58 may include a sixth overlapping region 586.

[0238] In the second electrode formation step, the second electrode 140 is formed using a mask group including a first mask 50A, a second mask 50B, and a third mask 50C. First, a step of forming a first layer 140A of the second electrode 140 by a vapor deposition method using the first mask 50A may be performed. Subsequently, a step of forming a second layer 140B of the second electrode 140 by a vapor deposition method using the second mask 50B may be performed. Subsequently, a third layer 140C of the second electrode 140 may be formed by a vapor deposition method using the third mask 50C. In this way, as shown in FIG. 22, the second electrode 140 including the first layer 140A, the second layer 140B, and the third layer 140C can be formed.

[0239] In the above-described embodiment, an example in which the organic layer 130 including the first organic layer 130A, the second organic layer 130B, and the third organic layer 130C overlaps with one layer of the second electrode 140 in a plan view is shown. However, the organic layer 130 may overlap with two or more layers of the second electrode 140. For example, as shown in FIG. 27, the first organic layer 130A and the third organic layer 130C may overlap with one layer of the second electrode 140, and the second organic layer 130B may overlap with another one layer of the second electrode 140.

[0240] As shown in FIG. 27, the second electrode 140 may include a first layer 140A and a second layer 140B. The first layer 140A may include an eleventh layer 140A1 and a twelfth layer 140A2. The twelfth layer 140A2 may have an area larger than that of the eleventh layer 140A1. The second layer 140B may include a twenty-first layer 140B1 and a twenty-second layer 140B2. The twenty-second layer 140B2 may have an area larger than that of the twenty-first layer 140B1.

[0241] The eleventh layer 140A1 may be connected to the twenty-second layer 140B2 in the first element direction G1. The eleventh layer 140A1 may be connected to the twenty-first layer 140B1 in the second element direction G2. The twenty-first layer 140B1 may be connected to the twelfth layer 140A2 in the first element direction G1. The twenty-second layer 140B2 may be connected to the twelfth layer 140A2 in the second element direction G2.

[0242] One first organic layer 130A and one third organic layer 130C may overlap one twelfth layer 140A2 or one twenty-second layer 140B2 in plan view. One second organic layer 130B may overlap one eleventh layer 140A1 or one twenty-first layer 140B1 in plan view.

[0243] In the example of FIG. 27, the second electrode 140Y may be irregularly arranged. Thereby, the transmission region 104 surrounded by the second electrode 140Y can have an irregular shape. For example, similar to the example of FIG. 3, the transmission region 104 may include a first transmission region 1041 and a second transmission region 1042. The transmission region 104 may include a third transmission region 1043. The transmission region 104 may include a fourth transmission region 1044. The transmission region 104 may include a fifth transmission region 1045. The transmission region 104 may include a sixth transmission region 1046.

[0244] FIG. 29 is a plan view showing an example of the first mask 50A. FIG. 30 is a plan view showing an example of the second mask 50B.

[0245] As shown in FIG. 29, the first mask 50A includes a first through hole 53A and a first shielding region 54A. Similar to the example shown in FIG. 16, in the mask fourth region M4, the distance K35 between the center points of two adjacent first through holes 53A in the mask third direction D3 may be N1 times the 35th period P35. In the mask fourth region M4, the distance K45 between the center points of two adjacent first through holes 53A in the mask fourth direction D4 may be N2 times the 45th period P45.

[0246] As shown in Figure 30, the second mask 50B includes a second through-hole 53B and a second shielding region 54B. Similar to the example shown in Figure 17, in the fourth region M4 of the mask, the distance K36 between the center points of two adjacent second through-holes 53B in the third direction D3 of the mask may be N3 times the 36th period P36. In the fourth region M4 of the mask, the distance K46 between the center points of two adjacent second through-holes 53B in the fourth direction D4 of the mask may be N4 times the 46th period P46.

[0247] Figure 28 is a plan view showing the mask laminate 55. The mask laminate 55 comprises a first mask 50A and a second mask 50B that are stacked on top of each other.

[0248] The mask laminate 55 comprises a through region 55A, an overlapping region 58, and a hole overlapping region 59. Similar to the example in Figure 18, the overlapping region 58 may be irregularly arranged in the second mask region M2. This allows the transparent region 104 corresponding to the overlapping region 58 to have an irregular shape. For example, similar to the example in Figure 18, the overlapping region 58 may include a first overlapping region 581 and a second overlapping region 582. The overlapping region 58 may include a third overlapping region 583. The overlapping region 58 may include a fourth overlapping region 584. The overlapping region 58 may include a fifth overlapping region 585. The overlapping region 58 may include a sixth overlapping region 586.

[0249] An example of the organic device 100 will be described with reference to Figures 38 and 39.

[0250] Figure 38 is a plan view showing an example of an organic device 100. Element 115 located in the first display area 101 is also referred to as element 115X. Element 115 located in the second display area 102 is also referred to as element 115Y.

[0251] In the first display area 101, the organic layers of element 115X may be arranged in an 11th period P11 along the element's first direction G1. In the second display area 102, the organic layers of element 115Y may be arranged in a 12th period P12 along the element's first direction G1. The 12th period P12 may be the same as the 11th period P11. By having the 12th period P12 be the same as the 11th period P11, it is possible to suppress the occurrence of a visual difference between the first display area 101 and the second display area 102.

[0252] In the first display area 101, the organic layers of element 115X may be arranged in a 21st period P21 along the element's second direction G2. In the second display area 102, the organic layers of element 115Y may be arranged in a 22nd period P22 along the element's second direction G2. The 22nd period P22 may be the same as the 21st period P21. By having the 22nd period P22 be the same as the 21st period P21, it is possible to suppress the occurrence of a visual difference between the first display area 101 and the second display area 102.

[0253] Figure 39 is a plan view showing an example of the second display area 102 of Figure 38. In Figure 38, the first electrode 120, which is covered by the second electrode 140, is shown by a dotted line. The first electrode 120 may include a first A electrode 120A, a first B electrode 120B, and a first C electrode 120C. The first A electrode 120A overlaps the first organic layer described above in a plan view. The first B electrode 120B overlaps the second organic layer described above in a plan view. The first C electrode 120C overlaps the third organic layer described above in a plan view.

[0254] Element 115X may include at least one first A electrode 120A, at least one first B electrode 120B, and at least one first C electrode 120C. For example, element 115X may include one first A electrode 120A, one first B electrode 120B, and two first C electrodes 120C. The period of element 115X in the first direction G1 and the second direction G2 of the element may be determined based on the period of either the first A electrode 120A or the first B electrode 120B.

[0255] Element 115Y, like element 115X, may include at least one first A electrode 120A, at least one first B electrode 120B, and at least one first C electrode 120C. For example, element 115Y, like element 115X, may include one first A electrode 120A, one first B electrode 120B, and two first C electrodes 120C. The period of element 115Y in the first direction G1 and the second direction G2 of element may be determined based on the period of either the first A electrode 120A or the first B electrode 120B.

[0256] The area of ​​element 115Y in the second display area 102 may be smaller than the area of ​​element 115X in the first display area 101. For example, the area of ​​the organic layer of element 115Y in the second display area 102 may be smaller than the area of ​​the organic layer of element 115X in the first display area 101. For example, the area of ​​the first electrode of element 115Y in the second display area 102 may be smaller than the area of ​​the first electrode of element 115X in the first display area 101. By making the area of ​​element 115Y smaller than the area of ​​element 115X, transparent areas 104 such as the first transparent area 1041, the second transparent area 1042, and the third transparent area 1043 can be formed in the second display area 102, as shown in Figure 39. In the example shown in Figure 39, the area of ​​the first electrode of element 115X is the sum of the area of ​​one first A electrode 120A, the area of ​​one first B electrode 120B, and the areas of two first C electrodes 120C. In the example shown in Figure 39, the area of ​​the first electrode of element 115Y is the sum of the area of ​​one first A electrode 120A, the area of ​​one first B electrode 120B, and the areas of two first C electrodes 120C.

[0257] The ratio of the area of ​​the first electrode of element 115Y to the area of ​​the first electrode of element 115X may be, for example, 0.1 or more, 0.2 or more, or 0.3 or more. The ratio of the area of ​​the first electrode of element 115Y to the area of ​​the first electrode of element 115X may be, for example, 0.5 or less, 0.7 or less, or 0.9 or less. The range of the ratio of the area of ​​the first electrode of element 115Y to the area of ​​the first electrode of element 115X may be determined by a first group consisting of 0.1, 0.2 and 0.3, and / or a second group consisting of 0.5, 0.7 and 0.9. The range of the ratio of the area of ​​the first electrode of element 115Y to the area of ​​the first electrode of element 115X may be determined by a combination of any one value included in the first group described above and any one value included in the second group described above. The range of the ratio of the area of ​​the first electrode of element 115Y to the area of ​​the first electrode of element 115X may be determined by any two combinations of values ​​included in the first group described above. The range of the ratio of the area of ​​the first electrode of element 115Y to the area of ​​the first electrode of element 115X may be determined by any two combinations of values ​​included in the second group described above. For example, the ratio of the area of ​​the first electrode of element 115Y to the area of ​​the first electrode of element 115X may be 0.1 or more and 0.9 or less, 0.1 or more and 0.7 or less, 0.1 or more and 0.5 or less, 0.1 or more and 0.3 or less, 0.1 or more and 0.2 or less, 0.2 or more and 0.9 or less, 0.2 or more and 0.7 or less, 0.2 or more and 0.5 or less, 0.2 or more and 0.3 or less, 0.3 or more and 0.9 or less, 0.3 or more and 0.7 or less, 0.3 or more and 0.5 or less, 0.5 or more and 0.9 or less, 0.5 or more and 0.7 or less, or 0.7 or more and 0.9 or less.

[0258] Two transparent regions 104 having different shapes may be adjacent to each other, with the first electrode 120 and the second electrode 140Y in between, in the direction in which the multiple first electrodes 120 are regularly arranged. In the example shown in Figure 39, the multiple first electrodes 120 are also regularly arranged in the third direction G3 and the fourth direction G4 of the element. In the example shown in Figure 39, in the third direction G3 of the element, the first transparent region 1041 and the third transparent region 1043 are adjacent to each other, with the first electrode 120 and the second electrode 140Y in between. In the example shown in Figure 39, the angle that the third direction G3 of the element makes with respect to the first direction G1 and the second direction G2 of the element is 45°. In the example shown in Figure 39, the fourth direction G4 of the element is perpendicular to the third direction G3 of the element.

[0259] An example of a method for forming the transparent region 104 will be described with reference to Figures 40 to 43. Specifically, an example of forming a suppression layer on the substrate 110 before the step of forming the second electrode 140 will be described. The suppression layer has the characteristic that the conductive material constituting the second electrode 140 does not easily adhere to it.

[0260] Figure 40 is a plan view showing an example of a mask 60 for forming a suppression layer. The mask 60 includes at least one cell 62. The cell 62 includes through holes 63 and shielding regions 64. The mask 60 may include two or more cells 62. One cell 62 may correspond to the display area of ​​one organic EL display device, i.e., one screen.

[0261] Mask 60, like mask 50 described above, includes a third mask region M3 and a fourth mask region M4. The third mask region M3 corresponds to the first display region 101 of the organic device 100. The fourth mask region M4 corresponds to the second display region 102 of the organic device 100.

[0262] The third mask region M3 includes a shielding region 64. The third mask region M3 does not necessarily include a through hole 63. That is, the entire area of ​​the third mask region M3 may be composed of the shielding region 64.

[0263] The mask fourth region M4 includes through-holes 63 and shielding regions 64. The through-holes 63 in the mask fourth region M4 correspond to the transmission regions 104. The shielding regions 64 may be arranged irregularly. As a result, the through-holes 63 surrounded by the shielding regions 64 can have an irregular shape. For example, the mask fourth region M4 may have different shapes and include two adjacent through-holes 63 sandwiching the shielding region 64. For example, the mask fourth region M4 may include first through-holes to sixth through-holes corresponding to the above-described first transmission region 1041 to sixth transmission region 1046.

[0264] FIG. 41 is a cross-sectional view showing an example of a suppression layer forming process for forming the suppression layer 170. The suppression layer forming process is performed after the process of forming the organic layer 130 and before the process of forming the second electrode 140.

[0265] The suppression layer forming process may include a process of depositing a material of the suppression layer 170 on the substrate 110 through the mask 60. As shown in FIG. 41, the suppression layer 170 is formed in a region of the substrate 110 overlapping the through-hole 63.

[0266] FIG. 42 is a plan view showing an example of a mask 50 for forming the second electrode 140. The mask 50 includes at least one cell 52. The cell 52 is constituted by a through-hole 53. The cell 52 is surrounded by a shielding region 54.

[0267] FIG. 43 is a cross-sectional view showing an example of a process for forming the second electrode 140. The second electrode 140 is formed by depositing a material of the second electrode 140 on the substrate 110 through the mask 50 of FIG. 42. As described above, the suppression layer 170 has the property that the conductive material constituting the second electrode 140 hardly adheres thereto. As shown in FIG. 43, it is possible to suppress the formation of the second electrode 140 on the suppression layer 170. Therefore, the region where the suppression layer 170 is formed can function as the transmission region 104.

[0268] The suppression layer 170 is transparent. For example, the transmittance of the laminate including the substrate 110 and the suppression layer 170 is preferably 70% or more, and more preferably 80% or more. The transmittance of the laminate including the substrate 110 and the suppression layer 170 can be measured by the test method for total light transmittance of transparent plastic materials in accordance with JIS K7361-1.

[0269] The material of the inhibitory layer 170 may be the material of a nucleation inhibiting coating described in WO2017072678A1 or WO2019150327A1. For example, the material of the inhibitory layer 170 may include organic materials such as low molecular weight organic materials and organic polymers. The organic material may be, for example, a polycyclic aromatic compound. A polycyclic aromatic compound includes an organic molecule comprising a core portion and at least one terminal portion bonded to the core portion. The organic molecule may contain one or more heteroatoms such as nitrogen, sulfur, oxygen, phosphorus, and aluminum. The number of terminal portions may be one or more, two or more, three or more, or four or more. If the organic molecule contains two or more terminal portions, the two or more terminal portions may be the same or different.

[0270] The terminal portion may contain a biphenylyl moiety represented by any of the following chemical structures: (la), (lb), and (lc). (la) JPEG2026053395000002.jpg3271(lb) JPEG2026053395000003.jpg5264(lc) JPEG2026053395000004.jpg5666

[0271] The substituents Ra and Rb may each be independently selected from deuterium, fluorine, alkyl, cycloalkyl, arylalkyl, silyl, aryl, heteroaryl, fluoroalkyl, and any combination thereof.

[0272] Referring to Figures 44 and 45, an example of a method for forming the transparent region 104 will be described. Specifically, an example of forming the transparent region 104 by partially removing the second electrode 140 will be described.

[0273] Figure 44 is a cross-sectional view showing an example of the process for forming the second electrode 140. The second electrode 140 in Figure 44 is formed, for example, by depositing the material for the second electrode 140 onto the substrate 110 via the mask 50 shown in Figure 42. In this case, the second electrode 140 is formed over the entire area of ​​the first display region 101 and the second display region 102.

[0274] After the step of forming the second electrode 140, a step of partially removing the second electrode 140 is performed. For example, as shown in Figure 45, the second electrode 140 in the second display area 102 is partially irradiated with a laser L. The second electrode 140 irradiated with the laser L scatters, forming a transparent area 104.

[0275] Although not shown in the figures, the laser L may be irradiated onto the second electrode 140 through a laser mask. The laser mask includes through holes corresponding to the transmission region 104. [Examples]

[0276] Next, embodiments of the present disclosure will be described in more detail by reference to examples, but embodiments of the present disclosure are not limited to the following examples unless they exceed the gist of the disclosure.

[0277] Example 1 The diffraction that occurs in light passing through the transmission region 104 was verified by simulation.

[0278] The substrate 110 and second electrode 140 shown in Figure 31 were designed. The second electrode 140 is arranged irregularly. Therefore, the transparent region 104 surrounded by the second electrode 140 can have an irregular shape.

[0279] Based on the configuration shown in Figure 32, the intensity distribution of light passing through the transmission region 104 and reaching the screen 113 was calculated by simulation. First, light L1 was incident on the substrate 110 along the normal direction of the substrate 110. Next, the diffraction of light caused by the second electrode 140 was calculated by simulation. The symbol L2 represents the light that travels in a straight line without diffraction and reaches the screen 113. The symbol Pc represents the destination of light L3 on the screen 113. The symbol L3 represents the light that is diffracted by the second electrode 140. The wavelength of light L1 is 550 nm. The distance between the second electrode 140 and the screen 113 is 5000 mm. Refraction of light due to the substrate 110 was ignored.

[0280] The simulation results are shown in Figures 33 and 34. The horizontal axis represents the distance from point Pc. The vertical axis represents the intensity of light that reached screen 113. Figure 33 shows the simulation results when the transmittance of the second electrode 140 is set to 0%. Figure 34 shows the simulation results when the transmittance of the second electrode 140 is set to 60%.

[0281] Example 2 The substrate 110 and second electrode 140 shown in Figure 35 were designed. The second electrode 140 is arranged in a regular grid pattern. Therefore, the transparent region 104 surrounded by the second electrode 140 is square.

[0282] The intensity distribution of light passing through the transmission region 104 and reaching the screen 113 was calculated by simulation. The simulation results are shown in Figures 36 and 37. Figure 36 shows the simulation results when the transmittance of the second electrode 140 is set to 0%. Figure 37 shows the simulation results when the transmittance of the second electrode 140 is set to 60%.

[0283] As can be seen from the comparison between Figure 33 and Figure 36, and between Figure 34 and Figure 37, the irregular shape of the transmission region 104 suppressed the arrival of high-intensity diffracted light L3 at the screen 113.

[0284] Example 3 The first A electrode 120A, the first B electrode 120B, the first C electrode 120C, and the second electrode 140 shown in Figure 46 were designed. Each of the multiple transparent regions 104 has a cross shape. The multiple transparent regions 104 are regularly arranged along the first element direction G1 and the second element direction G2.

[0285] Similar to Example 1, the intensity distribution of light passing through the transmission region 104 and reaching the screen 113 was calculated by simulation. The simulation settings were as follows. • Transmittance of transparent area 104: 100% • Transmittance of the second electrode 140: 60% • Transmittance of electrode 1A 120A, electrode 1B 120B, and electrode 1C 120C: 0%

[0286] The maximum intensity of diffracted light appearing in the intensity distribution was 9.5%. The intensity of diffracted light is normalized by the light intensity at point Pc on screen 113.

[0287] Example 4 The first A electrode 120A, the first B electrode 120B, the first C electrode 120C, and the second electrode 140 shown in Figure 47 were designed. The period of the element 115 in the first element direction G1 and the second element direction G2 is the same as in Example 3. The multiple transparent regions 104 all have a rectangular shape. The multiple transparent regions 104 are regularly arranged along the first element direction G1 and the second element direction G2.

[0288] Similar to Example 3, the intensity distribution of light passing through the transmission region 104 and reaching the screen 113 was calculated by simulation. The maximum intensity of the diffracted light appearing in the intensity distribution was 9.5%.

[0289] Example 5 The first A electrode 120A, the first B electrode 120B, the first C electrode 120C, and the second electrode 140 shown in Figure 48 were designed. The period of element 115 in the first element direction G1 and the second element direction G2 is the same as in Example 3.

[0290] In Example 5, the second electrode 140Y is irregularly arranged. Therefore, the transparent region 104 surrounded by the second electrode 140Y has an irregular shape. The transparent region 104 is located between two adjacent elements 115 in the first element direction G1, and between two adjacent elements 115 in the second element direction G2. Some of the transparent region 104 is circular. Some of the transparent region 104 is rectangular. Some of the rectangular transparent regions 104 are connected to adjacent transparent regions 104.

[0291] Example 5 includes two adjacent circular transparent regions 104 separated by one element 115 in the third element direction G3. Example 5 also includes two adjacent circular transparent regions 104 separated by one element 115 in the fourth element direction G4. In Example 5, the angle that the third element direction G3 makes with the first element direction G1 and the second element direction G2 is 45°. In Example 5, the fourth element direction G4 is orthogonal to the third element direction G3. In Example 5, the probability that two circular transparent regions 104 are adjacent separated by one element 115 is 1 / 16. The probability is the ratio of the number of combinations in the second category to the number of combinations in the first category. The number of combinations in the first category is the number of combinations of two adjacent transparent regions 104 separated by one element 115 in the third element direction G3 or the fourth element direction G4. The second number of combinations is the number of combinations of two adjacent circular transparent regions 104 with one element 115 in between in the third element direction G3 or the fourth element direction G4.

[0292] Similar to Example 3, the intensity distribution of light passing through the transmission region 104 and reaching the screen 113 was calculated by simulation. The maximum intensity of the diffracted light appearing in the intensity distribution was 5.5%.

[0293] Example 6 The first A electrode 120A, the first B electrode 120B, the first C electrode 120C, and the second electrode 140 shown in Figure 49 were designed. The period of element 115 in the first direction G1 and the second direction G2 of the element is the same as in Example 3.

[0294] In Example 6, the second electrode 140Y is arranged irregularly, similar to the case in Example 5. Therefore, the transparent region 104 surrounded by the second electrode 140Y has an irregular shape. The transparent region 104 is located between two adjacent elements 115 in the first element direction G1, and between two adjacent elements 115 in the second element direction G2. Some of the transparent region 104 is circular. Some of the transparent region 104 is rectangular. Some of the rectangular transparent region 104 is connected to adjacent transparent region 104.

[0295] Example 6, like Example 5, includes two adjacent circular transparent regions 104 separated by one element 115 in the third element direction G3. Example 6, like Example 5, includes two adjacent circular transparent regions 104 separated by one element 115 in the fourth element direction G4. In Example 5, the probability that the two circular transparent regions 104 are adjacent separated by one element 115 is 1 / 4.

[0296] Similar to Example 3, the intensity distribution of light passing through the transmission region 104 and reaching the screen 113 was calculated by simulation. The maximum intensity of the diffracted light appearing in the intensity distribution was 5.3%.

Claims

1. A group of masks, Have two or more masks, The mask comprises a shielding region and through holes, A mask laminate formed by stacking two or more of the aforementioned masks includes through-regions that overlap the through-holes when viewed along the normal direction of the masks, When viewed along the normal direction of the mask, the mask laminate comprises a first mask region including the through region having a first aperture ratio, and a second mask region including the through region having a second aperture ratio smaller than the first aperture ratio. The second mask region includes the penetrating region and the overlapping region enclosed by the penetrating region in a plan view. The overlapping region, in a plan view, includes the shielding regions of two or more of the masks. The overlapping region includes a first overlapping region and a second overlapping region adjacent to the first overlapping region, separated by the penetrating region. The first overlapping region has a first mask shape, The second overlapping region is a group of masks having a second mask shape different from the first mask shape.

2. The mask group according to claim 1, wherein the area of ​​the first overlapping region is different from the area of ​​the second overlapping region.

3. The overlapping region includes a third overlapping region adjacent to the first overlapping region and the second overlapping region, with the penetrating region in between. The mask group according to claim 1 or 2, wherein the third overlapping region has a third mask shape different from the first mask shape and the second mask shape.

4. The overlapping region includes a fourth overlapping region adjacent to the first overlapping region and the second overlapping region, with the penetrating region in between. The mask group according to any one of claims 1 to 3, wherein the fourth overlapping region has a fourth mask shape different from the first mask shape and the second mask shape.

5. The mask group according to any one of claims 1 to 4, wherein 80% or more of the overlapping region corresponds to the first overlapping region.

6. In the second mask region, the penetrating region includes a trunk region and branch regions connected to the trunk region. The branch region includes two first region ends in the first direction of the hole and one second region end in the second direction of the hole that intersects the first direction of the hole. The mask group according to any one of claims 1 to 5, wherein the two first region edges and the one second region edge are in contact with the overlapping region.

7. The first mask region includes overlapping pore regions aligned in a 27-period pattern along the second mask direction. The aforementioned hole overlapping region includes the through holes of two or more of the masks in a plan view. The mask group according to claim 6, wherein the width of the first region edge is 0.4 times or more the 27th period.

8. The first mask region includes overlapping pore regions arranged in a 17-period pattern along the first mask direction, The aforementioned hole overlapping region includes the through holes of two or more of the masks in a plan view. The mask group according to claim 6 or 7, wherein the width of the edge of the second region is 0.4 times or more the 17th period.

9. A mask having a third mask direction and a fourth mask direction intersecting the third mask direction, It comprises a shielding area and a through hole, When viewed along the normal direction of the mask, the mask comprises a third mask region including the through-hole having a third aperture ratio, and a fourth mask region including the through-hole having a fourth aperture ratio smaller than the third aperture ratio. In the third region of the mask, the through holes are arranged in the third direction of the mask in a 35-period pattern. In the fourth region of the mask, the average distance between the center points of two through holes aligned in the third direction of the mask is 1.1 times or more the 35th period.

10. The mask according to claim 9, wherein in the fourth region of the mask, the standard deviation of the distance between the center points of two through holes aligned in the third direction of the mask is 0.2 times or more the 35th period.

11. A method for manufacturing an organic device, The method comprises a second electrode formation step of forming a second electrode on an organic layer on a first electrode on a substrate using a group of masks described in any one of claims 1 to 8, The second electrode formation step is as follows: A step of forming the first layer of the second electrode by a deposition method using the first mask, A method for manufacturing an organic device, comprising the step of forming a second layer of the second electrode by a vapor deposition method using the second mask.

Images