Indication device

Abstract

The present invention provides a display device with improved light extraction efficiency and a wider viewing angle. [Solution] In the display device, the first protrusion of the third insulating layer is provided through the first opening region provided in the fourth insulating layer, and the third insulating layer, the fourth insulating layer, and the fifth insulating layer each have a first refractive index, a second refractive index, and a third refractive index, respectively, where the third refractive index is smaller than the first and second refractive indexes, and the second refractive index is smaller than the first refractive index.

Description

Technical Field

[0005] , , ,

[0001] Embodiments of the present invention relate to a display device.

Background Art

[0002] A display device having an organic EL (Electro-Luminescence) layer has been developed.

Prior Art Documents

Patent Documents

[0003]

Patent Document 1

Patent Document 2

Patent Document 3

Patent Document 4

Patent Document 5

Summary of the Invention

Problems to be Solved by the Invention

[0004] This embodiment provides a display device with improved light extraction efficiency. Further, this embodiment provides a display device capable of widening the viewing angle.

Means for Solving the Problems

[0005] A display device according to an embodiment includes a backplane including a plurality of transistors, a plurality of banks provided on the backplane, an anode provided in an opening between adjacent banks, an organic EL layer provided on the anode, a cathode provided on the organic EL layer, A first insulating layer is provided covering the cathode, A second insulating layer is provided covering the first insulating layer, A third insulating layer is provided on the second insulating layer and has a flat portion and a first convex portion, A fourth insulating layer is provided on the third insulating layer, A fifth insulating layer is provided on the fourth insulating layer, Equipped with, The first protrusion of the third insulating layer is provided penetrating the first opening region provided in the fourth insulating layer, The third insulating layer, the fourth insulating layer, and the fifth insulating layer each have a first refractive index, a second refractive index, and a third refractive index, respectively. The third refractive index is smaller than the first and second refractive indices, and the second refractive index is smaller than the first refractive index.

[0006] Furthermore, a display device according to one embodiment is A backplane containing multiple transistors, Multiple banks are provided on the aforementioned backplane, An anode and, provided in the opening between adjacent banks, An organic EL layer is provided on the anode, A cathode is provided on the aforementioned organic EL layer, A first insulating layer is provided covering the cathode, A second insulating layer is provided covering the first insulating layer, A third insulating layer is provided on the second insulating layer and has a flat portion and a first convex portion, A fourth insulating layer is provided on the third insulating layer, A fifth insulating layer is provided on the fourth insulating layer, Equipped with, The first protrusion of the third insulating layer is provided penetrating the first opening region provided in the fourth insulating layer, The third insulating layer, the fourth insulating layer, and the fifth insulating layer each have a first refractive index, a second refractive index, and a third refractive index, respectively. The third refractive index is greater than the first refractive index and the second refractive index, and the second refractive index is greater than the first refractive index.

Brief Description of Drawings

[0007] [Figure 1] Figure 1 is an overall perspective view of the display device of Embodiment 1. [Figure 2] Figure 2 is a partial plan view showing an example of the schematic configuration of the display device. [Figure 3] Figure 3 is a cross-sectional view taken along line A1 - A2 of the display device shown in Figure 2. [Figure 4] Figure 4 is a cross-sectional view showing another configuration of the display device shown in Figure 2. [Figure 5] Figure 5 is a cross-sectional view showing an example of the schematic configuration of the display device of Embodiment 1. [Figure 6] Figure 6 is a diagram showing the light emission of the display device shown in Figure 5. [Figure 7] Figure 7 is a plan view showing an example of the schematic configuration of the display device [Figure 8] Figure 8 is a plan view showing an example of the schematic configuration of the display device [Figure 9] Figure 9 is a plan view showing an example of the schematic configuration of the display device [Figure 10] Figure 10 is a plan view showing an example of the schematic configuration of the display device [Figure 11] Figure 11 is a cross-sectional view showing the manufacturing process of the display device of Embodiment 1. [Figure 12] Figure 12 is a cross-sectional view showing the manufacturing process of the display device of Embodiment 1. [Figure 13] Figure 13 is a cross-sectional view showing the manufacturing process of the display device of Embodiment 1. [Figure 14] Figure 14 is a cross-sectional view showing the manufacturing process of the display device of Embodiment 1. [Figure 15] Figure 15 is a cross-sectional view showing the manufacturing process of the display device of Embodiment 1. [Figure 16] Figure 16 is a cross-sectional view showing the manufacturing process of the display device of Embodiment 1. [Figure 17] Figure 17 is a cross-sectional view showing the manufacturing process of the display device according to Embodiment 1. [Figure 18] Figure 18 is a cross-sectional view showing another configuration example of the display device in Embodiment 1. [Figure 19] Figure 19 is a cross-sectional view showing another configuration example of the display device in Embodiment 1. [Figure 20] Figure 20 is a cross-sectional view showing another configuration example of the display device in Embodiment 1. [Figure 21] Figure 21 is a cross-sectional view showing another configuration example of the display device in Embodiment 1. [Figure 22] Figure 22 is a cross-sectional view showing another configuration example of the display device in Embodiment 1. [Figure 23] Figure 23 is a cross-sectional view showing another configuration example of the display device in Embodiment 1. [Figure 24] Figure 24 is a cross-sectional view showing another configuration example of the display device in Embodiment 1. [Figure 25] Figure 25 is a cross-sectional view showing another configuration example of the display device in Embodiment 1. [Figure 26] Figure 26 is a cross-sectional view showing an example of the configuration of the display device in Embodiment 2. [Modes for carrying out the invention]

[0008] The embodiments of the present invention will be described below with reference to the drawings. Note that the disclosure is merely an example, and modifications that can be easily conceived by those skilled in the art while maintaining the spirit of the invention are naturally included within the scope of the present invention. Furthermore, in order to clarify the explanation, the drawings may schematically represent the width, thickness, shape, etc., of each part compared to the actual embodiment, but these are merely examples and do not limit the interpretation of the present invention. In addition, in this specification and in each drawing, elements similar to those described above in previously shown drawings are denoted by the same reference numerals, and detailed explanations may be omitted as appropriate.

[0009] The embodiments described herein are not general in nature, but rather embodiments that illustrate the same or corresponding specific technical features of the present invention. A display device according to one embodiment will be described in detail below with reference to the drawings.

[0010] In this embodiment, the first direction X, the second direction Y, and the third direction Z are orthogonal to each other, but they may intersect at angles other than 90 degrees. The direction toward the tip of the arrow in the third direction Z is defined as up or upward, and the direction opposite to the direction toward the tip of the arrow in the third direction Z is defined as down or downward. The first direction X, the second direction Y, and the third direction Z may also be referred to as the X direction, the Y direction, and the Z direction, respectively.

[0011] Furthermore, when referring to "the second member above the first member" and "the second member below the first member," the second member may be in contact with the first member or may be located away from the first member. In the latter case, a third member may be interposed between the first member and the second member. On the other hand, when referring to "the second member above the first member" and "the second member below the first member," the second member is in contact with the first member.

[0012] Furthermore, assuming that there is an observation position for observing the display device on the tip side of the arrow in the third direction Z, viewing from this observation position toward the XY plane defined by the first direction X and the second direction Y is called a planar view. Viewing a cross-section of the display device in the XZ plane defined by the first direction X and the third direction Z, or in the YZ plane defined by the second direction Y and the third direction Z, is called a cross-sectional view.

[0013] [Embodiment 1] Figure 1 is an overall perspective view of the display device of Embodiment 1. The display device DSP has a display area DA and a peripheral area FA provided around the display area DA on a substrate SUB1. The display device DSP has a plurality of pixels PX arranged within the display area DA. In the display device DSP, light LT from the back surface is transmitted to the front surface, and vice versa.

[0014] The edge region EA of substrate SUB1 is located outside substrate SUB2. A wiring board PCS is provided in region EA. The wiring board PCS is equipped with a drive element DRV that outputs video signals and drive signals. Signals from the drive element DRV are input to the pixels PX of the display region DA via the wiring board PCS. Based on the video signal and various control signals, the pixels PX emit light.

[0015] Figure 2 is a partial plan view showing an example of the schematic configuration of a display device. Multiple pixels PX include pixels PXR that emit red light, pixels PXG that emit green light, and pixels PXB that emit blue light. Pixels PXR, PXG, and PXB are also referred to as the first pixel, second pixel, and third pixel, respectively.

[0016] Pixel PXR is positioned adjacent to pixel PXB along the first direction X. Pixel PXR is also positioned adjacent to pixel PXG along the second direction Y. Pixel PXG is positioned adjacent to pixel PXB along the first direction X. Pixel PXG is positioned adjacent to pixel PXR along the second direction Y. Pixel PXB is positioned adjacent to pixels PXR and PXG along the first direction. Pixel PXB is also positioned adjacent to other pixels PXB along the second direction Y.

[0017] Figure 3 is a cross-sectional view of the display device shown in Figure 2 along the line A1-A2. The base material BA1 may be made of glass or a resin material, for example. The resin material may be acrylic, polyimide, polyethylene terephthalate, polyethylene naphthalate, etc., and may be formed as a single layer or a laminate of multiple layers of any of these materials.

[0018] An insulating layer UC1 is provided on the substrate BA1. The insulating layer UC1 is formed, for example, by forming a single layer or a laminate of silicon oxide film and silicon nitride film.

[0019] A light-shielding layer BM may be provided on the insulating layer UC1, superimposed on the transistor Tr. The light-shielding layer BM suppresses changes in transistor characteristics caused by light penetration from the back surface of the transistor Tr's channel. If the light-shielding layer BM is formed of a conductive layer, it is also possible to impart a back-gate effect to the transistor Tr by applying a predetermined potential.

[0020] An insulating layer UC2 is provided, covering the insulating layer UC1 and the light-shielding layer BM. The insulating layer UC2 can be made of the same material as the insulating layer UC1. The insulating layer UC2 may be made of a different material than the insulating layer UC1. For example, silicon oxide can be used for the insulating layer UC1 and silicon nitride for the insulating layer UC2. The insulating layers UC1 and UC2 together constitute the insulating layer UC.

[0021] A transistor Tr is provided on the insulating layer UC. The transistor Tr has a semiconductor layer SC, an insulating layer GI, a gate electrode GE (scan line GL), an insulating layer ILI, a source electrode SE (signal line SL), and a drain electrode DE.

[0022] Amorphous silicon, polysilicon, or oxide semiconductor is used as the semiconductor layer SC. As the insulating layer GI, for example, silicon oxide or silicon nitride is provided as a single layer or in multiple layers.

[0023] For example, a molybdenum tungsten alloy (MoW) is used as the gate electrode (GE). The gate electrode (GE) may be integrally formed with the scan line (GL).

[0024] An insulating layer ILI is provided covering the semiconductor layer SC and the gate electrode GE. The insulating layer ILI is formed, for example, by a single layer or stacking of silicon oxide layers or silicon nitride layers.

[0025] A source electrode SE and a drain electrode DE are provided on the insulating layer ILI. The source electrode SE and the drain electrode DE are connected to the source region and drain region of the semiconductor layer SC, respectively, via contact holes provided in the insulating layer ILI and the insulating layer GI. The source electrode SE may be integrally formed with the signal line SL.

[0026] An insulating layer PAS is provided, covering the source electrode SE, the drain electrode DE, and the insulating layer ILI. An insulating layer PLL is provided, covering the insulating layer PAS.

[0027] The insulating layer PAS is formed using an inorganic insulating material. Examples of inorganic insulating materials include single-layer or multi-layer silicon oxide or silicon nitride. The insulating layer PLL is formed using an organic insulating material. Examples of organic insulating materials include photosensitive acrylic and polyimide. By providing the insulating layer PLL, the step created by the transistor Tr can be flattened.

[0028] An anode AD is provided on the insulating layer PLL. Anode AD is connected to the drain electrode DE via contact holes provided in the insulating layer PAS and the PLL. The anode provided in pixel PXR is denoted as anode ADR, the anode provided in pixel PXB as anode ADB, and the anode provided in pixel PXG as anode ADG. When there is no need to distinguish between anode ADR, anode ADG, and anode ADB, they are simply called anode AD.

[0029] The anode AD may be formed, for example, as a laminate of a reflective electrode and a transparent electrode. The reflective electrode is formed using a highly reflective conductive material, such as silver (Ag) or molybdenum tungsten alloy (MoW). The transparent electrode is formed using, for example, indium tin oxide (ITO) or indium zinc oxide (IZO).

[0030] In this embodiment, the structure from the substrate BA1 to the insulating layer PLL is a backplane BPS. Furthermore, the structure from the insulating layer UC1 to the insulating layer PLL is a backplane layer BPL.

[0031] A bank BK (also called a protrusion or rib) is provided between adjacent anodes AD. The bank BK is made of the same organic material as the insulating layer PLL. The bank BK is opened up so as to expose a portion of the anode AD. In other words, the bank BK is superimposed on the other part of the anode AD. The region between adjacent bank BKs is called the opening OP. As mentioned above, the anode AD is located in the opening OP. It can also be said that the anode AD is located between adjacent bank BKs.

[0032] An opening provided in pixel PXR is denoted as opening OPR, an opening provided in pixel PXB as opening OPB, and an opening provided in pixel PXG as opening OPG. When there is no need to distinguish between openings OPR, OPB, and OPG, they are simply referred to as opening OP.

[0033] The edges of the opening OP preferably have a gently tapered shape in cross-section. If the edges of the opening OP have a steep shape, poor coverage will occur in the organic EL layer ELY that is formed later.

[0034] An organic EL layer ELY is provided superimposed on the anode AD and between it and the adjacent bank BK. The organic EL layer ELY includes a hole injection layer, a hole transport layer, an emissive layer, an electron transport layer, and an electron injection layer. The organic EL layer ELY may further include an electron blocking layer and a hole blocking layer if necessary.

[0035] The organic EL layer provided in pixel PXR is denoted as organic EL layer ELYR, the organic EL layer provided in pixel PXB is denoted as organic EL layer ELYB, and the organic EL layer provided in pixel PXG is denoted as organic EL layer ELYG. When there is no need to distinguish between organic EL layers ELYR, ELYG, and ELYB, they are simply called organic EL layer ELY.

[0036] A cathode CD is provided on the organic EL layer ELY. The cathode CD is formed using, for example, a magnesium-silver alloy (MgAg) film, a single layer of silver (Ag), or a laminate of silver (Ag) and a transparent conductive material. The transparent conductive material can be, for example, indium tin oxide (ITO) or indium zinc oxide (IZO).

[0037] An insulating layer SEY1 is provided covering the cathode CD. The insulating layer SEY1 is formed of a light-transmitting inorganic insulating material layer or an organic insulating material layer. The insulating layer SEY1 is a layer for adjusting the optical cavity (also called a microcavity) of the light-emitting layer in the organic EL layer ELY.

[0038] An insulating layer SEY2 is provided covering the insulating layer SEY1. The insulating layer SEY1 has the function of preventing moisture from entering the organic EL layer ELY from the outside, sealing the organic EL layer ELY, and planarizing the layer. The insulating layer SEY2 may be formed, for example, by sandwiching an organic insulating material layer between two inorganic insulating material layers.

[0039] The inorganic insulating material layer of the insulating layer SEY2 is preferably an insulating layer with high gas barrier properties in order to prevent the intrusion of external moisture. An inorganic insulating material layer with high gas barrier properties is formed from, for example, an inorganic insulating layer material containing nitrogen, more specifically, silicon nitride or aluminum nitride.

[0040] The organic insulating material layer of the insulating layer SEY2 has the function of sealing the organic EL layer ELY and planarizing it. Examples of materials for the organic insulating layer include acrylic resin, epoxy resin, and polyimide resin.

[0041] An insulating layer IN is provided on the insulating layer SEY2. Details of insulating layer IN will be described later.

[0042] An insulating layer OCI is provided on the insulating layer IN. The insulating layer OCI may be formed using, for example, epoxy resin or silicone resin. However, in the display device DSP shown in Figure 3, the insulating layer OCI does not need to be provided.

[0043] A circular polarizer CPP is provided on the insulating layer OCI, or on the insulating layer IN if the insulating layer OCI is not provided. The circular polarizer CPP serves to prevent reflections from external light.

[0044] The light emitted in the organic EL layer ELY is extracted upwards via the cathode CD. In other words, the display device DSP of this embodiment has a top emission structure.

[0045] The structure from the base material BA1 to the insulating layer SEY2 corresponds to substrate SUB1 shown in Figure 1. The circular polarizer CPP corresponds to substrate SUB2 shown in Figure 1.

[0046] Figure 4 is a cross-sectional view showing another configuration of the display device shown in Figure 2. In the display device DSP shown in Figure 4, the structure from the substrate BA1 to the insulating layer IN is the same as the structure of the display device DSP shown in Figure 3.

[0047] An insulating layer OCI is provided on the insulating layer IN. The insulating layer OCI may be formed using, for example, epoxy resin or silicone resin. However, in the display device DSP shown in Figure 4, the insulating layer OCI may not be provided.

[0048] A light-shielding layer LS is provided on the insulating layer OCI, or on the insulating layer IN if the insulating layer OCI is not provided, in a region that does not overlap with the organic EL layer ELY. In Figure 4, the light-shielding layer LS is superimposed on a part of the transistor Tr, but it may also be superimposed on the entire transistor Tr.

[0049] A color filter CF is provided on the insulating layer IN in the region where it overlaps with the organic EL layer ELY. Color filters CFR, CFG, and CFB are provided overlapping the organic EL layers ELYR, ELYG, and ELYB, respectively. Color filters CFR, CFG, and CFB transmit red (R), green (G), and blue (B) light, respectively.

[0050] The light-shielding layer LS is provided between adjacent color filters CFR and CF, between adjacent color filters CFG and CFB, and between adjacent color filters CFB and CFR. By providing the light-shielding layer LS between adjacent color filters CF (color filter CFR, color filter CFG, and color filter CFB), color mixing can be prevented.

[0051] An insulating layer OCY is provided covering the light-shielding layer LS, color filter CFR, color filter CFG, and color filter CFB. The insulating layer OCY may be formed using, for example, epoxy resin or silicone resin.

[0052] The display device DSP shown in Figure 4 does not include the substrate SUB2 shown in Figure 1. In Figure 4, the structure from the base material BA1 to the insulating layer OCI is referred to as substrate SUB1.

[0053] In Embodiment 1, the display device DSP shown in Figure 3 is called a polarizing display device. This is because the display device DSP shown in Figure 3 has a circular polarizer CPP. In Embodiment 1, the display device DSP shown in Figure 4 is called a color filter display device. This is because the display device DSP shown in Figure 4 has a color filter CF.

[0054] Figure 5 is a cross-sectional view showing an example of the schematic configuration of the display device of Embodiment 1. The display device DSP shown in Figure 5 mainly shows the configuration from the anode AD upwards. The configuration from the backplane BPS, anode AD, bank BK, organic EL layer ELY, cathode CD, insulating layer SEY1, and insulating layer SEY2 shown in Figure 5 is the same as the configuration shown in Figures 3 and 4.

[0055] An insulating layer IN is provided on the insulating layer SEY2. The insulating layer IN comprises insulating layer IN1, insulating layer IN2, and insulating layer IN3.

[0056] The insulating layer IN1 has a flat portion IN1a and a convex portion IN1b. The flat portion IN1a covers the insulating layer SEY2. The convex portion IN1b protrudes from the flat portion IN1a in the region that overlaps with the opening OP.

[0057] An insulating layer IN2 is provided on an insulating layer IN1. The insulating layer IN2 has regions IN2a and IN2b. Regions IN2a and IN2b are each provided on a flat portion IN1a and do not overlap with the convex portion IN1b. The convex portion IN1b is provided through an opening region KR2 provided in the insulating layer IN2.

[0058] An insulating layer IN3 is provided, covering the protrusions IN1b of insulating layer IN1 and insulating layer IN2 (regions IN2a and IN2b).

[0059] Insulating layers IN1, IN2, and IN3 are formed of translucent insulating materials with different refractive indices. The refractive indices of insulating layers IN1, IN2, and IN3 are denoted as refractive index n1, refractive index n2, and refractive index n3, respectively. In Embodiment 1, refractive indices n1, n2, and n3 are assumed to be decreasing in this order (n1>n2>n3). In other words, refractive index n3 is smaller than refractive index n1 and refractive index n2, and refractive index n2 is smaller than refractive index n1.

[0060] Examples of materials for insulating layer IN1, insulating layer IN2, and insulating layer IN3 include magnesium fluoride (MgF2), silicone resin, epoxy resin, aluminum oxide (Al2O3), silicon nitride (SiN), zirconium oxide (ZrO2), and titanium oxide (TiO2).

[0061] The refractive index of magnesium fluoride (MgF2) is 1.38. The refractive index of silicone resin is between 1.40 and 1.42. The refractive index of epoxy resin is between 1.55 and 1.65. The refractive index of aluminum oxide (Al2O3) is 1.60. The refractive index of silicon nitride (SiN) is 1.9. The refractive index of zirconium oxide (ZrO2) is 2.05. The refractive index of titanium oxide (TiO2) is between 2.30 and 2.55.

[0062] The insulating layers IN1, IN2, and IN3 should be formed using the above materials such that the relative magnitudes of the refractive indices n1, n2, and n3 decrease in this order (n1 > n2 > n3).

[0063] Figure 6 shows the light emission of the display device shown in Figure 5. The light LT emitted from the light-emitting layer of the organic EL layer ELY is incident on the flat portion IN1a of the insulating layer IN1. The light LT can be incident from the flat portion IN1a to the convex portion IN1b of the insulating layer IN1, or it can reach the boundary between the insulating layer IN1 (flat portion IN1a) and the insulating layer IN2 from the flat portion IN1a.

[0064] When light LT enters the convex portion IN1b from the flat portion IN1a, the light LT is emitted upward from the convex portion IN1b.

[0065] As described above, the refractive index n2 of insulating layer IN2 is lower than the refractive index n1 of insulating layer IN1. When light LT reaches the boundary between insulating layer IN1 (flat portion IN1a) and insulating layer IN2, light LT does not enter insulating layer IN2, but is reflected at the boundary between insulating layer IN1 and insulating layer IN2 and returns to insulating layer IN1 (flat portion IN1a). The reflected light LT then propagates toward the convex portion IN1b through repeated reflections.

[0066] When the light LT propagating toward the convex portion IN1b reaches the convex portion IN1b, the light LT passes through the convex portion IN1b and is emitted upward.

[0067] In the display device DSP of Embodiment 1, the amount of light LT propagating while reflecting within the insulating layer IN1 can be increased. This makes it possible to obtain a display device DSP with improved light extraction efficiency.

[0068] Furthermore, in the DSP display device of Embodiment 1, external light is not reflected by the insulating layer IN3. The DSP display device has an anti-reflection effect.

[0069] Figures 7, 8, 9, and 10 are plan views showing an example of a schematic configuration of a display device. Figure 7 shows the planar structure of a pixel unit PXU that includes a red-emitting pixel PXR, a green-emitting pixel PXG, and a blue-emitting pixel PXB. In Embodiment 1, pixels PX (pixels PXR, PXG, and PXB) are sometimes referred to as sub-pixels, and the pixel unit PXU, which includes pixels PXR, PXG, and PXB, is sometimes referred to as a pixel.

[0070] Figure 8 shows the planar structure of insulating layer IN1. Figure 9 shows the planar structure of insulating layer IN2. Figure 10 shows the planar structure of insulating layer IN3. In Figures 7, 8, and 9, the dashed line indicates the end of the protrusion IN1b of insulating layer IN1, and simultaneously the end of the opening region KR2 of insulating layer IN2. Details are explained below.

[0071] Apertures OPR, OPG, and OPB are provided corresponding to pixels PXR, PXG, and PXB, respectively. Inside the aperture OP (apertures OPR, OPG, and OPB), a protrusion IN1b of the insulating layer IN1 is provided.

[0072] The protrusions IN1b provided inside openings OPR, OPG, and OPB are denoted as protrusions IN1bR, IN1bG, and IN1bB, respectively. The ends of the protrusions IN1b (protrusions IN1bR, IN1bG, and IN1bB) are indicated by dashed lines as described above. In other words, the area enclosed by the dashed lines is the area inside the protrusions IN1b.

[0073] The size of the protrusion IN1b is smaller than the size of the opening OP. Preferably, the size of the protrusion IN1b is between 1 / 2 and 2 / 3 of the size of the opening OP.

[0074] The flat portion IN1a of the insulating layer IN1 is provided across the entire pixel unit PXU. The flat portion IN1a can be a so-called solid film.

[0075] The insulating layer IN2 is provided throughout the entire pixel unit PXU, but it is not provided inside the apertures OPR, OPG, and OPB. In other words, it can be said to be a solid film having multiple aperture regions KR2. The edges of the aperture regions KR2 are indicated by dashed lines as described above. In other words, the area inside the region enclosed by the dashed lines is the aperture region KR2. The aperture regions KR2 corresponding to pixels PXR, PXG, and PXB are designated as aperture region KR2R, aperture region KR2G, and aperture region KR2B, respectively.

[0076] The insulating layer IN3 is provided throughout the entire pixel unit PXU. The insulating layer IN3 can be a so-called solid film.

[0077] Figures 11, 12, 13, 14, 15, 16, and 17 are cross-sectional views showing the manufacturing process of the display device according to Embodiment 1.

[0078] After manufacturing the backplane BPS, the anode AD is formed. The bank BK is formed adjacent to the end of the anode AD. The organic EL layer ELY and cathode CD are formed covering the anode AD and bank BK. The insulating layer SEY1 is formed covering the cathode CD (see Figure 11).

[0079] Insulating layer SEY2 is formed by covering insulating layer SEY1 (see Figure 12). As described above, insulating layer SEY2 has a planarization function. The upper surface of insulating layer SEY2 is planarized.

[0080] A flat portion IN1a is formed by covering the upper surface of the flattened insulating layer SEY2 with the material of insulating layer IN1 (see Figure 13). Insulating layer IN2 is then provided, covering the flat portion IN1a (see Figure 14).

[0081] By photoetching, the region above the opening OP in the insulating layer IN2 is removed. This removed region is the opening region KR2 (see Figure 15). In Figure 15, the insulating layer IN2 is divided into region IN2a and region IN2b. However, as shown in Figure 9, region IN2a and region IN2b are formed as a single unit.

[0082] The insulating layer IN1c is formed by covering the insulating layer IN2 and filling the opening region KR2 (see Figure 16). The insulating layer IN1c is formed from the same material as the insulating layer IN1, i.e., the same material as the flat portion IN1a. As a result, the already formed flat portion IN1a and the newly formed insulating layer IN1c become one.

[0083] Photoetching removes the insulating layer IN1c on regions IN2a and IN2b (see Figure 17). As a result, the material of insulating layer IN1c (insulating layer IN1) remains in the opening region KR2 of insulating layer IN2. The remaining portion of insulating layer IN1c becomes the protrusion IN1b. In addition, the upper surfaces of insulating layer IN2 (regions IN2a and IN2b) and protrusion IN1b are flattened.

[0084] An insulating layer IN3 is provided, covering the insulating layer IN2 and the protrusion IN1b (see Figure 5). In this way, the insulating layers IN (insulating layer IN1, insulating layer IN2, and insulating layer IN3) are formed.

[0085] An insulating layer OCI is provided on the insulating layer IN. However, if the insulating layer IN3 is formed of the same material as the insulating layer OCI, then the insulating layer OCI does not need to be provided.

[0086] By providing a circular polarizing plate CPP on the insulating layer OCI, or on the insulating layer IN if the insulating layer OCI is not provided, the display device DSP shown in Figure 3 is formed. By providing a light-shielding layer LS and a color filter CF, etc., on the insulating layer OCI, or on the insulating layer IN if the insulating layer OCI is not provided, the display device DSP shown in Figure 4 is formed.

[0087] <Configuration Example 1 of Embodiment 1> Figure 18 is a cross-sectional view showing another configuration example of the display device in Embodiment 1. The configuration example shown in Figure 18 differs from the configuration example shown in Figure 5 in that a protrusion of the insulating layer IN1 is also provided in the insulating layer IN3.

[0088] In the DSP display device shown in Figure 18, the insulating layer IN1 has a flat portion IN1a, a convex portion IN1b, and a convex portion IN1d. The flat portion IN1a and the convex portion IN1b are the same as in Figure 5. The length of the convex portion IN1b along the first direction X is denoted as length Db1. Length Db1 can also be said to be the length of the opening region KR2 along the first direction X.

[0089] A protrusion IN1d is provided, projecting upward from the protrusion IN1b. The protrusion IN1d projects upward through an opening region KR3 provided in the insulating layer IN3. The flat portion IN1a, the protrusion IN1b, and the protrusion IN1d constitute an integrally formed insulating layer IN1. The length of the protrusion IN1d along the first direction X is denoted as length Dd1. Length Dd1 can also be said to be the length of the opening region KR3 along the first direction X. Length Db1 is longer than length Dd1 (Db1 > Dd1).

[0090] It can also be said that the insulating layer IN1 has two convex portions (convex portion IN1b and convex portion IN1d) that extend from the flat portion IN1a through the insulating layers IN2 and IN3. Configuration Example 1 also achieves the same effects as Embodiment 1.

[0091] <Example 2 of the configuration of Embodiment 1> Figure 19 is a cross-sectional view showing another configuration example of the display device in Embodiment 1. The configuration example shown in Figure 19 differs from the configuration example shown in Figure 18 in that the length of the protrusions provided in the insulating layer IN2 and the length of the protrusions provided in the insulating layer IN3 are the same.

[0092] In the display device DSP shown in Figure 19, the insulating layer IN1 has a flat portion IN1a, a convex portion IN1b, and a convex portion IN1d, similar to Figure 18. The flat portion IN1a and the convex portion IN1b are the same as in Figure 5. The length of the convex portion IN1b along the first direction X is denoted as length Db2. Length Db2 is also the length of the opening region KR2 along the first direction X.

[0093] In Figure 19, as in Figure 18, a protrusion IN1d is provided, projecting upward from the protrusion IN1b. The protrusion IN1d projects upward through the opening region KR3 provided in the insulating layer IN3. The flat portion IN1a, the protrusion IN1d1, the protrusion IN1b, and the protrusion IN1d2 constitute the integrally formed insulating layer IN1. The length of the protrusion IN1d along the first direction X is denoted as length Dd2. Length Dd2 is also the length of the opening region KR3 along the first direction X. Length Db2 is the same as length Dd2 (Db2 = Dd2).

[0094] It can also be said that the insulating layer IN1 has a single protrusion (protrusion IN1b and protrusion IN1d) that penetrates the insulating layers IN2 and IN3 from the flat portion IN1a. Configuration Example 2 also achieves the same effects as Embodiment 1.

[0095] <Configuration Example 3 of Embodiment 1> Figure 20 is a cross-sectional view showing another configuration example of the display device in Embodiment 1. The configuration example shown in Figure 20 differs from the configuration example shown in Figure 18 in that a layer of the same material as insulating layer IN3 is provided between insulating layer SEY2 and insulating layer IN1, and insulating layer IN1 has three stages of protrusions that penetrate the lower insulating layer IN3, insulating layer IN2, and upper insulating layer IN3.

[0096] The display device DSP shown in Figure 20 has the same configuration from the backplane BPS to the insulating layer SEY2 as in Figure 5. A flat portion IN1a of the insulating layer IN1 is provided on the insulating layer SEY2.

[0097] An insulating layer IN31 is provided on the flat portion IN1a. The insulating layer IN31 is made of the same material as the insulating layer IN3 described above. That is, the refractive index of the insulating layer IN31 is refractive index n3. The insulating layer IN31 can also be said to be the underlying insulating layer IN3.

[0098] A convex portion IN1d1 is provided, protruding upward from the flat portion IN1a and penetrating the opening region KR31 provided in the insulating layer IN31. The length of the convex portion IN1d1 along the first direction X is denoted as length Dd31. Length Dd31 can also be said to be the length of the opening region KR31 along the first direction X.

[0099] In Figure 20, the convex portion IN1d1 is shown with the insulating layer IN31a on the left side of the paper and region IN31b on the right side. However, regions IN31a and IN31b are formed as a single unit.

[0100] An insulating layer IN2 is provided on the insulating layer IN31. A protrusion IN1b is provided, projecting upward from a protrusion IN1d1 and penetrating an opening region KR2 provided in the insulating layer IN2. The length of the protrusion IN1b along the first direction X is denoted as length Db3. Length Db3 can also be said to be the length of the opening region KR2 along the first direction X.

[0101] An insulating layer IN32 is provided on the insulating layer IN2. The insulating layer IN32 is formed of the same material as the above-described insulating layer IN3. That is, the refractive index of the insulating layer IN32 is the refractive index n3. The insulating layer IN32 can also be said to be the upper insulating layer IN3. The insulating layer IN32 shown in FIG. 20 corresponds to the insulating layer IN3 shown in FIG. 18.

[0102] A convex portion IN1d2 is provided so as to protrude upward from the convex portion IN1b and penetrate an opening region KR32 provided in the insulating layer IN32. The flat portion IN1a, the convex portion IN1d1, the convex portion IN1b, and the convex portion IN1d2 constitute an integrally formed insulating layer IN1. Let the length along the first direction X of the convex portion IN1d2 be the length Dd32. The length Dd32 can also be said to be the length along the first direction X of the opening region KR32. The lengths Dd32, Db3, and Dd31 are long in this order (Dd32 < Db3 < Dd31). In other words, the length Dd31 is longer than the lengths Dd32 and Db3, and the length Db3 is longer than the length Dd32.

[0103] It can also be said that the insulating layer IN1 has three-stage convex portions (the convex portion IN1d1, the convex portion IN1b, and the convex portion IN1d2) that penetrate the insulating layer IN31, the insulating layer IN2, and the insulating layer IN32 from the flat portion IN1a. In Configuration Example 3 as well, the same effects as those in Embodiment 1 are achieved.

[0104] <Configuration Example 4 of Embodiment 1> FIG. 21 is a cross-sectional view showing another configuration example of the display device in Embodiment 1. In the configuration example shown in FIG. 21, it is different in that the lengths of the convex portion IN1d1 and the convex portion IN1d2 are the same compared to the configuration example shown in FIG. 20.

[0105] The display device DSP shown in FIG. 21, similar to FIG. 20, has an insulating layer IN1 having a flat portion IN1a, a convex portion IN1d1, a convex portion IN1b, and a convex portion IN1d2. Let the length along the first direction X of the convex portion IN1d1 be the length Dd41. The length Dd41 is also the length along the first direction X of the opening region KR31 of the insulating layer IN31.

[0106] In Figure 21, as in Figure 20, a protrusion IN1b is provided, projecting upward from the protrusion IN1d1. The protrusion IN1b projects upward through the opening region KR2 provided in the insulating layer IN2. The flat portion IN1a, the protrusion IN1d1, the protrusion IN1b, and the protrusion IN1d2 constitute the integrally formed insulating layer IN1. The length of the protrusion IN1b along the first direction X is denoted as length Db4. Length Db4 is also the length of the opening region KR2 of the insulating layer IN2 along the first direction X.

[0107] In Figure 21, as in Figure 20, a protrusion IN1d2 is provided, projecting upward from the protrusion IN1b. The protrusion IN1d2 projects upward through the opening region KR32 provided in the insulating layer IN32. The length of the protrusion IN1d2 along the first direction X is denoted as length Dd42. Length Dd42 is also the length of the opening region KR32 of the insulating layer IN32 along the first direction X. Length Dd41 is the same as length Dd42 (Dd41 = Dd42).

[0108] The insulating layer IN1 can also be described as having three stages of protrusions (protrusions IN1d1, IN1b, and IN1d2) that penetrate from the flat portion IN1a through the insulating layers IN31, IN2, and IN32. Configuration Example 4 also achieves the same effects as Embodiment 1.

[0109] <Example 5 of the configuration of Embodiment 1> Figure 22 is a cross-sectional view showing another configuration example of the display device in Embodiment 1. The configuration example shown in Figure 22 differs from the configuration example shown in Figure 18 in that the length of the protrusion IN1d is longer than the length of the protrusion IN1b.

[0110] In the display device DSP shown in Figure 22, similar to Figure 18, the insulating layer IN1 has a flat portion IN1a, a convex portion IN1b, and a convex portion IN1d. The flat portion IN1a, the convex portion IN1b, and the convex portion IN1d constitute the integrally formed insulating layer IN1. The length of the convex portion IN1b along the first direction X is denoted as length Db5. The length of the convex portion IN1d along the first direction X is denoted as length Dd5. Length Dd5 is longer than length Db5 (Dd5 > Db5).

[0111] It can also be said that the insulating layer IN1 has two stages of protrusions (protrusions IN1b and IN1d2) that penetrate the insulating layers IN2 and IN3 from the flat portion IN1a. Configuration Example 5 also achieves the same effects as Embodiment 1.

[0112] <Configuration Example 6 of Embodiment 1> Figure 23 is a cross-sectional view showing another configuration example of the display device in Embodiment 1. The configuration example shown in Figure 23 differs from the configuration example shown in Figure 20 in that no protrusions are provided on the upper insulating layer IN3.

[0113] The display device DSP shown in Figure 23 has the same configuration as in Figure 20, from the backplane BPS to the insulating layer IN2 and the protrusion IN1b. The flat portion IN1a, the protrusion IN1d1, and the protrusion IN1b constitute the integrally formed insulating layer IN1. The length of the protrusion IN1d1 shown in Figure 23 along the first direction X is denoted as length Dd61. The length of the protrusion IN1b along the first direction X is denoted as length Db6. Length Dd61 is longer than length Db6 (Dd61 > Db6).

[0114] An insulating layer IN32 is provided, covering the insulating layer IN2 and the protrusion IN1b. The insulating layer IN32 does not have any openings. The insulating layer IN32 is a so-called solid film.

[0115] It can also be said that the insulating layer IN1 has two stages of protrusions (protrusions IN1d1 and IN1b) that penetrate the insulating layers IN31 and IN2 from the flat portion IN1a. Configuration Example 6 also achieves the same effects as Embodiment 1.

[0116] <Example 7 of the configuration of Embodiment 1> Figure 24 is a cross-sectional view showing another configuration example of the display device in Embodiment 1. The configuration example shown in Figure 24 differs from the configuration example shown in Figure 23 in that the length of the protrusion IN1d1 is shorter than the length of the protrusion IN1b.

[0117] The flat portion IN1a, the convex portion IN1d1, and the convex portion IN1b constitute an integrally formed insulating layer IN1.

[0118] In the display device DSP shown in Figure 24, the length of the protrusion IN1d1 along the first direction X is defined as length Dd71. The length of the protrusion IN1b along the first direction X is defined as length Db7. Length Dd71 is longer than length Db7 (Dd71 <Db7)。

[0119] It can also be said that the insulating layer IN1 has two stages of protrusions (protrusions IN1d1 and IN1b) that penetrate the insulating layers IN31 and IN2 from the flat portion IN1a. Configuration Example 7 also achieves the same effects as Embodiment 1.

[0120] <Configuration Example 8 of Embodiment 1> Figure 25 is a cross-sectional view showing another configuration example of the display device in Embodiment 1. The configuration example shown in Figure 25 differs from the configuration example shown in Figure 20 in that the lengths of the protrusions IN1d1, IN1b, and IN1d2 are longer in that order.

[0121] The flat portion IN1a, the convex portion IN1d1, the convex portion IN1b, and the convex portion IN1d2 constitute an integrally formed insulating layer IN1.

[0122] In the display device DSP shown in FIG. 25, the length of the convex portion IN1d1 along the first direction X is defined as length Dd81. The length of the convex portion IN1b along the first direction X is defined as length Db8. The length of the convex portion IN1d2 along the first direction X is defined as length Dd82. The lengths Dd81, Db8, and Dd82 are in this order from long to short (Dd81 < Db8 < Dd82). In other words, the length Dd82 is longer than the lengths Dd81 and Db8, and the length Db8 is longer than Dd81.

[0123] It can also be said that the insulating layer IN1 has three-stage convex portions (convex portion IN1d1, convex portion IN1b, and convex portion IN1d2) penetrating the insulating layer IN31, the insulating layer IN2, and the insulating layer IN32 from the flat portion IN1a. In Configuration Example 8 as well, the same effects as those of Embodiment 1 are achieved.

[0124] [Embodiment 2] FIG. 26 is a cross-sectional view showing a configuration example of a display device in Embodiment 2. In the configuration example shown in FIG. 26, compared with the configuration example shown in FIG. 6, the refractive index n1 of the insulating layer IN1, the refractive index n2 of the insulating layer IN2, and the refractive index n3 of the insulating layer IN3 are different in that they are in this order from large to small (n1 < n2 < n3).

[0125] The insulating layer IN1, the insulating layer IN2, and the insulating layer IN3 of Embodiment 2 are formed of the above-described translucent insulating material. However, the magnitude relationship of the respective refractive indices is different from that of Embodiment 1.

[0126] In the example shown in FIG. 26, an anode AD, an organic EL layer ELY, and a cathode CD are laminated in the opening OP. Light LT is emitted upward from the light-emitting layer of the organic EL layer ELY. By providing the insulating layer IN1, the insulating layer IN2, and the insulating layer IN3 having different refractive indices above the opening OP, it is possible to refract the light LT and widen the viewing angle.

[0127] As shown in FIG. 26, there are cases where the optical LT passes through the insulating layer IN1, the insulating layer IN2, and the insulating layer IN3, and cases where it passes through the insulating layer IN1 and the insulating layer IN3. When the optical LT passes through the insulating layer IN1, the insulating layer IN2, and the insulating layer IN3, it includes cases where it passes through the flat portion IN1a where the convex portion IN1b is not provided, the insulating layer IN2, and the insulating layer IN3, and cases where it passes through the side surface of the convex portion IN1b, the insulating layer IN2, and the insulating layer IN3.

[0128] Since the refractive index n1, the refractive index n2, and the refractive index n3 are in this order of magnitude, each time the optical LT passes through the insulating layer IN1, the insulating layer IN2, and the insulating layer IN3, it is refracted outward.

[0129] When the optical LT passes through the insulating layer IN1 and the insulating layer IN3, it includes cases where it passes through the upper surface of the convex portion IN1b and the insulating layer IN3. Each time the optical LT passes through the insulating layer IN1 and the insulating layer IN3, it is refracted outward.

[0130] Regarding the display device DSP shown in Embodiment 2, the configuration examples 1 to 8 of Embodiment 1, that is, the configuration examples shown in FIGS. 18 to 25, can be applied. Even in these cases, the refractive index n1 of the insulating layer IN1, the refractive index n2 of the insulating layer IN2, and the refractive index n3 of the insulating layer IN3 are in this order of magnitude (n1 < n2 < n3). In other words, the refractive index n3 is greater than the refractive index n1 and the refractive index n2, and the refractive index n2 is greater than the refractive index n1.

[0131] In the present disclosure, the insulating layer SEY1 and the insulating layer SEY2 are referred to as the first insulating layer and the second insulating layer, respectively. In FIGS. 5, 18, 19, 22, and 26, the insulating layer IN1, the insulating layer IN2, and the insulating layer IN3 are also referred to as the third insulating layer, the fourth insulating layer, and the fifth insulating layer, respectively. In FIGS. 20, 21, 23, 24, and 25, the insulating layer IN1, the insulating layer IN31, the insulating layer IN2, and the insulating layer IN32 are also referred to as the third insulating layer, the sixth insulating layer, the fourth insulating layer, and the fifth insulating layer, respectively.

[0132] The refractive index n1 of insulating layer IN1, the refractive index n2 of insulating layer IN2, and the refractive index n3 of insulating layer IN3 are also called the first refractive index, second refractive index, and third refractive index, respectively. The refractive index n3 of insulating layer IN31 and insulating layer IN32 is the third refractive index.

[0133] In Figures 5 and 26, the protrusion IN1b is defined as the protrusion, and the opening region KR2 is defined as the first opening region. In Figures 18, 19, and 22, the protrusion IN1b and the protrusion IN1d are defined as the first and second protrusions, respectively. In Figures 18, 19, and 22, the opening region KR2 and the opening region KR3 are defined as the first and second opening regions, respectively. In Figure 18, lengths Db1 and Dd1 are defined as the first and second lengths, respectively. In Figure 19, lengths Db2 and Dd2 are defined as the first and second lengths, respectively. In Figure 22, lengths Db5 and Dd5 are defined as the first and second lengths, respectively.

[0134] In Figures 20, 21, and 25, the protrusions IN1b, IN1d2, and IN1d1 are designated as the first protrusion, second protrusion, and third protrusion, respectively. In Figures 20, 21, and 25, the opening regions KR2, KR32, and KR31 are designated as the first opening region, second opening region, and third opening region, respectively. In Figure 20, lengths Db3, Dd32, and Dd31 are designated as the first length, second length, and third length, respectively. In Figure 21, lengths Db4, Dd42, and Dd41 are designated as the first length, second length, and third length, respectively. In Figure 25, lengths Db8, Dd82, and Dd81 are designated as the first length, second length, and third length, respectively.

[0135] In Figures 23 and 24, protrusions IN1b and IN1d1 are designated as the first and second protrusions, respectively. In Figures 23 and 24, opening regions KR2 and KR31 are designated as the first and second opening regions, respectively. In Figure 23, lengths Db6 and Dd61 are designated as the first and second lengths, respectively. In Figure 24, lengths Db7 and Dd71 are designated as the first and second lengths, respectively.

[0136] While several embodiments of the present invention have been described, these embodiments are presented as examples only and are not intended to limit the scope of the invention. These novel embodiments can be carried out in a variety of other forms, and various omissions, substitutions, and modifications can be made without departing from the spirit of the invention. These embodiments and their variations are included in the scope and spirit of the invention, as well as in the claims of the invention and its equivalents. [Explanation of Symbols]

[0137] AD...anode, BK...bank, BPS...backplane, CF...color filter, CPP...circular polarizer, DSP...display device, ELY...organic EL layer, IN...insulating layer, IN1...insulating layer, IN1a...flat part, IN1b...convex part, IN1c...insulating layer, IN1d...convex part, IN1d1...convex part, IN1d2...convex part, IN2...insulating layer, IN2a...region, IN2b...region, IN3...insulating layer, IN31...insulating layer, IN31a...region, IN31b...region, IN32...insulating layer, KR2...aperture region, KR3...aperture region, KR31...aperture region, KR32...aperture region, LT...light, OP...aperture, PX...pixel, SEY1...insulating layer, SEY2...insulating layer.

Claims

1. A backplane containing multiple transistors, Multiple banks are provided on the aforementioned backplane, An anode and, provided in the opening between adjacent banks, An organic EL layer is provided on the anode, A cathode is provided on the aforementioned organic EL layer, A first insulating layer is provided covering the cathode, A second insulating layer is provided covering the first insulating layer, A third insulating layer is provided on the second insulating layer and has a flat portion and a first convex portion, A fourth insulating layer is provided on the third insulating layer, A fifth insulating layer is provided on the fourth insulating layer, Equipped with, The first protrusion of the third insulating layer is provided penetrating the first opening region provided in the fourth insulating layer, The third insulating layer, the fourth insulating layer, and the fifth insulating layer each have a first refractive index, a second refractive index, and a third refractive index, respectively. A display device in which the third refractive index is smaller than the first and second refractive indices, and the second refractive index is smaller than the first refractive index.

2. The third insulating layer is provided on the first protrusion and has a second protrusion that is integrally formed with the first protrusion. The display device according to claim 1, wherein the second protrusion is provided in the fifth insulating layer and penetrates the second opening region.

3. The lengths of the first and second protrusions are defined as the first length and the second length, respectively. The display device according to claim 2, wherein the first length is longer than the second length.

4. The lengths of the first and second protrusions are defined as the first length and the second length, respectively. The display device according to claim 2, wherein the first length and the second length are the same.

5. The lengths of the first and second protrusions are defined as the first length and the second length, respectively. The display device according to claim 2, wherein the second length is longer than the first length.

6. Between the third insulating layer and the fourth insulating layer, there is further a sixth insulating layer having the third refractive index, The third insulating layer has a second protrusion provided on the first protrusion and integrally formed with the first protrusion, and a third protrusion provided between the first protrusion and the flat portion and integrally formed with the first protrusion, The second protrusion is provided in the fifth insulating layer, and penetrates the second opening region. The display device according to claim 1, wherein the third protrusion is provided in the sixth insulating layer and penetrates the third opening region.

7. The lengths of the first protrusion, the second protrusion, and the third protrusion are defined as the first length, the second length, and the third length, respectively. The display device according to claim 6, wherein the third length is longer than the second length and the first length, and the first length is longer than the second length.

8. The lengths of the first protrusion, the second protrusion, and the third protrusion are defined as the first length, the second length, and the third length, respectively. The second length and the third length are longer than the first length. The display device according to claim 6, wherein the second length and the third length are the same.

9. The lengths of the first protrusion, the second protrusion, and the third protrusion are defined as the first length, the second length, and the third length, respectively. The display device according to claim 6, wherein the second length is longer than the third length and the first length, and the first length is longer than the third length.

10. Between the third insulating layer and the fourth insulating layer, there is further a sixth insulating layer having the third refractive index, The third insulating layer is provided on the first protrusion and has a second protrusion that is integrally formed with the first protrusion. The display device according to claim 1, wherein the second protrusion is provided in the sixth insulating layer and penetrates the second opening region.

11. The lengths of the first and second protrusions are defined as the first length and the second length, respectively. The display device according to claim 10, wherein the second length is longer than the first length.

12. The lengths of the first and second protrusions are defined as the first length and the second length, respectively. The display device according to claim 10, wherein the first length is longer than the second length.

13. A backplane containing multiple transistors, Multiple banks are provided on the aforementioned backplane, An anode and, provided in the opening between adjacent banks, An organic EL layer is provided on the anode, A cathode is provided on the aforementioned organic EL layer, A first insulating layer is provided covering the cathode, A second insulating layer is provided covering the first insulating layer, A third insulating layer is provided on the second insulating layer and has a flat portion and a first convex portion, A fourth insulating layer is provided on the third insulating layer, A fifth insulating layer is provided on the fourth insulating layer, Equipped with, The first protrusion of the third insulating layer is provided penetrating the first opening region provided in the fourth insulating layer, The third insulating layer, the fourth insulating layer, and the fifth insulating layer each have a first refractive index, a second refractive index, and a third refractive index, respectively. A display device in which the third refractive index is greater than the first and second refractive indices, and the second refractive index is greater than the first refractive index.

14. The third insulating layer is provided on the first protrusion and has a second protrusion that is integrally formed with the first protrusion. The display device according to claim 13, wherein the second protrusion is provided in the fifth insulating layer and penetrates the second opening region.

15. The lengths of the first and second protrusions are defined as the first length and the second length, respectively. The display device according to claim 14, wherein the first length is longer than the second length.

16. The lengths of the first and second protrusions are defined as the first length and the second length, respectively. The display device according to claim 14, wherein the first length and the second length are the same.

17. The lengths of the first and second protrusions are defined as the first length and the second length, respectively. The display device according to claim 14, wherein the second length is longer than the first length.

18. Between the third insulating layer and the fourth insulating layer, there is further a sixth insulating layer having the third refractive index, The third insulating layer has a second protrusion provided on the first protrusion and integrally formed with the first protrusion, and a third protrusion provided between the first protrusion and the flat portion and integrally formed with the first protrusion, The second protrusion is provided in the fifth insulating layer, and penetrates the second opening region. The display device according to claim 13, wherein the third protrusion is provided in the sixth insulating layer and penetrates the third opening region.

19. The lengths of the first protrusion, the second protrusion, and the third protrusion are defined as the first length, the second length, and the third length, respectively. The display device according to claim 18, wherein the third length is longer than the second length and the first length, and the first length is longer than the second length.

20. The lengths of the first protrusion, the second protrusion, and the third protrusion are defined as the first length, the second length, and the third length, respectively. The second length and the third length are longer than the first length. The display device according to claim 18, wherein the second length and the third length are the same.

21. The lengths of the first protrusion, the second protrusion, and the third protrusion are defined as the first length, the second length, and the third length, respectively. The display device according to claim 18, wherein the second length is longer than the third length and the first length, and the first length is longer than the third length.

22. Between the third insulating layer and the fourth insulating layer, there is further a sixth insulating layer having the third refractive index, The third insulating layer is provided on the first protrusion and has a second protrusion that is integrally formed with the first protrusion. The display device according to claim 13, wherein the second protrusion is provided in the sixth insulating layer and penetrates the second opening region.

23. The lengths of the first and second protrusions are defined as the first length and the second length, respectively. The display device according to claim 22, wherein the second length is longer than the first length.

24. The lengths of the first and second protrusions are defined as the first length and the second length, respectively. The display device according to claim 22, wherein the first length is longer than the second length.

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