Light source device, exposure device, and method for manufacturing articles

Abstract

To provide a light source device that is advantageous for increasing the illuminance of the light source. [Solution] A light source device used in an exposure apparatus for projecting an image of a pattern from a master plate onto a substrate, comprising: a first group of LEDs that emit light of a first wavelength; a second group of LEDs that emit light of a second wavelength different from the first wavelength; and a dichroic mirror that combines the light from the first group of LEDs and the light from the second group of LEDs, wherein when the light combined by the dichroic mirror is irradiated onto the master plate, the illuminance per unit area at the imaging surface between the dichroic mirror and the master plate is 1000 mW / cm². 2 That's all.

Description

[Technical Field]

[0001] The present invention relates to a light source device, an exposure device, and a method for manufacturing articles. [Background technology]

[0002] An exposure apparatus is a device used in the lithography process, a manufacturing process for semiconductor devices and liquid crystal display devices, to transfer the pattern from a master plate (reticle or mask) onto a photosensitive substrate (such as a wafer or glass plate with a resist layer formed on its surface) via a projection optical system. For example, in projection exposure apparatuses used to transfer patterns onto liquid crystal display devices, there has recently been a demand to expose larger area patterns on the mask onto the substrate in a single exposure. To meet this demand, a step-and-scan scanning projection exposure apparatus has been proposed that can achieve high resolution and expose large screens. This scanning exposure apparatus transfers a pattern illuminated by a slit light beam onto the substrate via a scanning operation through a projection optical system.

[0003] While mercury lamps, for example, are used as light sources in exposure equipment, in recent years there has been a growing expectation to replace them with solid-state light-emitting diodes (LEDs). LEDs have the advantage of being energy-efficient and having a long lifespan because the time it takes for the light output to stabilize after current is applied to the substrate circuit that controls the light emission is short, and they do not need to be constantly emitting light like mercury lamps. Patent Document 1 discloses information regarding LED light sources used in exposure equipment. [Prior art documents] [Patent Documents]

[0004] [Patent Document 1] Japanese Patent Publication No. 2021-056259 [Overview of the project] [Problems that the invention aims to solve]

[0005] In exposure systems, a high output light source is desirable to improve throughput. However, increasing the output of the light source can lead to challenges in terms of increasing the size of the light source itself. This challenge is particularly pronounced with LED light sources.

[0006] Therefore, the present invention aims to provide a light source device that is advantageous for increasing the illuminance of the light source. [Means for solving the problem]

[0007] To achieve the above objective, a light source device as one aspect of the present invention is a light source device used in an exposure apparatus for projecting an image of a pattern on a substrate, comprising: a first group of LEDs that emit light of a first wavelength; a second group of LEDs that emit light of a second wavelength different from the first wavelength; and a dichroic mirror that combines the light from the first group of LEDs and the light from the second group of LEDs, wherein when the light combined by the dichroic mirror is irradiated onto the original plate, the illuminance per unit area at the imaging surface between the dichroic mirror and the original plate is 1000 mW / cm². 2 The above is the characteristic feature. [Effects of the Invention]

[0008] According to the present invention, it is possible to provide a light source device that is advantageous for increasing the illuminance of the light source. [Brief explanation of the drawing]

[0009] [Figure 1] This is a schematic diagram showing the configuration of the exposure apparatus. [Figure 2] This diagram shows the configuration of the illumination optical system. [Figure 3] This is a cross-sectional view of the light source device. [Figure 4] This is a top view of the light source device. [Figure 5] This is a diagram showing the circuit of an LED board. [Figure 6] This is a diagram showing multiple LED substrates. [Figure 7]It is a cross-sectional view of a light source device. [Figure 8] It is a diagram showing the circuit of an LED substrate. [Figure 9] It is a perspective view of a light source device. [Figure 10] It is a flowchart of a method for manufacturing an article.

Embodiments for Carrying Out the Invention

[0010] Hereinafter, preferred embodiments of the present invention will be described in detail based on the accompanying drawings. In each figure, the same members are denoted by the same reference numerals, and duplicate explanations are omitted.

[0011] <First Embodiment> FIG. 1 is a diagram showing the configuration of an exposure apparatus in this embodiment. The exposure apparatus 100 includes an illumination optical system 8 that illuminates a mask 7 (original plate), which is an irradiated surface, with light, and a projection optical system 101 that projects an image of a pattern formed on the mask 7 onto a substrate 5 disposed on an irradiated surface 4 that is optically conjugate with the mask 7.

[0012] The illumination optical system 8 may have, for example, an imaging optical system (an optical system that forms an image of a slit surface illumination light distribution on a mask surface illumination light distribution) having a magnification of 2 times the projection magnification. In the case of having this imaging optical system, the ability to perform batch exposure of a larger area is improved. The projection optical system 101 is a reflection optical system that reflects light in the order of mirrors 1, 2, 3, 2, 1, and projects an image of the pattern on the mask 7 onto the substrate 5 disposed on the irradiated surface 4. Since the projection optical system 101 shown in FIG. 1 is a reflection optical system, it is an optical system in which chromatic aberration of light from the light source 1 is smaller than that of a refractive optical system, and is suitable for broadband illumination. The substrate 5 is supported by a movable stage 6. The projection optical system 10不限于反射光学系,也可以是反射折射光学系或折射光学系,但在这种情况下,需要考虑对使用波长的色差进行校正。另外,在图1中,投影光学系101是一个投影光学系,但也可以是配置有多个投影光学系101的形式。

[0013] FIG. 2 is a diagram showing the configuration of the illumination optical system 8 surrounded by the light-shielding housing 9. The illumination optical system 8 includes a light source unit 10 (light source device) that combines an LED array light source 11 and a dichroic mirror 16.

[0014] The LED array light source 11 is composed of, for example, two different LED array light sources 11a and 11b. The LED array light source 11a includes a plurality of first LED elements having a first wavelength characteristic λ1, and the LED array light source 11b includes a plurality of second LED elements having a second wavelength characteristic λ2 different from the first wavelength characteristic. The first LED element having the first wavelength characteristic λ1 is, for example, an LED element that emits light with a peak wavelength of 365 nm, and the second LED element having the second wavelength characteristic λ2 is, for example, an LED element that emits light with a peak wavelength of 405 nm. The light emitted from the first LED element includes a wavelength of 365 nm. The light emitted from the second LED element includes a wavelength of 405 nm.

[0015] In this embodiment, the LED array light source 11a is also referred to as the first LED group. Also, the LED array light source 11b is also referred to as the second LED group. When the difference in wavelength is not distinguished, both are simply referred to as the LED array light source.

[0016] Light having different wavelength characteristics emitted from each LED array light source is combined by the wavelength combining unit 16 and guided to the condenser lens 12. The wavelength combining unit 16 is, for example, a dichroic mirror, and is a glass substrate formed with an optical thin film that reflects a large amount of light with a wavelength of 365 nm and transmits a large amount of light with a wavelength of 405 nm.

[0017] In the above, the case where the LED array light source 11a is mounted with an LED having a single wavelength of 365 nm as an example has been described. However, as long as it has an emission wavelength that reflects the dichroic mirror, a plurality of LEDs having different emission wavelengths may be mixed and mounted on the LED array light source 11a. Similarly, as long as the LED array light source 11b has an emission wavelength that transmits through the dichroic mirror, a plurality of LEDs having different emission wavelengths may be mixed and mounted on the LED array light source 11b.

[0018] Furthermore, it is desirable that the LED array light source 11a, which includes short wavelengths, be located in the xy plane (a plane perpendicular to gravity) in Figure 2. Light in the short wavelength range causes significant damage to the holding member, so it is desirable to hold it over a wide area relative to gravity. Also, in many cases, the reflective film characteristics of a dichroic mirror are more efficient at utilizing light when it reflects short wavelengths and transmits long wavelengths. For these reasons, it is desirable that the wavelength of the LED array light source 11a placed in the xy plane is shorter than the wavelength of the LED array light source 11b placed in the xz plane. However, this is not a mandatory condition, and changes can be made within the scope of the present invention.

[0019] In terms of positional relationship, it is desirable to configure the system so that the emission surfaces of the LED array light sources 11a and 11b are located near the front focal position of the condenser lens 12, and the incident surface of the optical integrator 13 is located near the rear focal position of the condenser lens 12.

[0020] Here, the emission surfaces of the LED array light sources 11a and 11b and the incident surface of the optical integrator 13 do not need to perfectly coincide with the focal position of the condenser lens 12; for example, even if they are positioned at a point shifted by ±10% of the focal length, the effect will not be impaired.

[0021] The optical integrator 13 is, for example, a fly-eye lens and is composed of numerous lens elements. The optical integrator 13 wavefront-splits the light on the incident surface and forms multiple light source images of the LED array light sources 11a and 11b at its exit surface. In other words, an optical image of the LED array light source 11 is formed on the exit surface of each of the numerous lens elements that make up the optical integrator 13, and this becomes a secondary light source.

[0022] The aperture diaphragm 14 (aperture), positioned near the emission surface of the optical integrator 13, controls the angular distribution of light illuminating the mask 7. By providing, for example, an annular or quadrupole-shaped transmission region in this aperture diaphragm 14, it is possible to form deformed illumination such as annular or quadrupole.

[0023] Then, the second condenser lens 15 focuses the light that has passed through the aperture diaphragm 14 and illuminates the mask 7 with this light. The aperture diaphragm 14 may be configured to allow selection of one aperture from multiple apertures.

[0024] Next, the configuration of the LED array light source 11 in this embodiment will be described with reference to Figures 3 and 4. The configurations of the LED array light sources 11a and 11b may be the same except that their wavelength characteristics differ as described above. Compared to high-pressure mercury lamps commonly used in exposure equipment, LED array light sources have a lower radiant intensity per light source (per LED chip), so it is necessary to use multiple units (tens to thousands) to obtain sufficient radiant intensity.

[0025] Figure 3 shows an LED array light source 11 with multiple LED elements 18 mounted on a substrate 17. Figure 4 is a top view of Figure 3, showing how the LED elements 18 are arranged two-dimensionally on the substrate 17. In Figure 3, the light emitted from the LED elements has an emission angle of 60 to 70 degrees in half-angles, which is a very large angular distribution considering that the numerical aperture NA of a typical projection optical system for FPDs is around 0.1 (around 5.7 degrees in half-angles). Therefore, in order to reduce the emission angle of the light emitted from the LED elements, a focusing lens 19 is provided directly above each LED element 18 to make the radiated light beam approximately parallel. Multiple focusing lenses are sometimes collectively called a microlens array. The microlens array allows more of the radiated light beam from the LED elements to be captured by the downstream optical system. In this embodiment, the microlens array that focuses the light from the first group of LEDs is also called the first microlens array, and the microlens array that focuses the light from the second group of LEDs is also called the second microlens array. Furthermore, the first microlens array has a first lens and a second lens arranged in the order through which light from the first group of LEDs passes. In the second microlens array, the third lens and a fourth lens are arranged spaced apart in the direction in which light from the second group of LEDs passes, in the order through which light from the second group of LEDs passes. Furthermore, the surface of the first lens closest to the first group of LEDs is flat, and the surface of the third lens closest to the second group of LEDs is flat.

[0026] Figure 4 shows LED elements arranged in a square grid, but this is just one example; other arrangements, such as a staggered arrangement, are also possible. To optimize light utilization efficiency, it is desirable that the optical axis 20 of the focusing lens correspond to the center of each individual LED element 18. By configuring the light-emitting surface 21 of the LED element 18 to be located near the front focal position of the focusing lens 19, a distribution obtained by the Fourier transform of the ray information on the light-emitting surface 21 of the LED element 18 is formed near the rear focal position of the focusing lens 19. If this rear focal position of the focusing lens 19 is configured to be located near the front focal position of the condenser lens 12, the light-emitting surface 21 of the LED element 18 and the incident surface of the optical integrator 13 become optically conjugate.

[0027] By configuring all LED elements 18 similarly, the light-emitting surfaces of all LED elements 18 and the incident surface of the optical integrator 13 become optically conjugate. In other words, the optical images of the light-emitting surfaces 21 of all LED elements 18 are superimposed and projected onto the incident surface of the optical integrator. This becomes the intensity distribution at the pupil of the illumination optical system. For the sake of simplicity, the depiction of the lens array 19, which is paired with each individual LED, is omitted in Figures 5, 6, 7, and 8.

[0028] Figure 5 shows a top view of an LED substrate 22, an example of an LED array light source 11. This example features multiple LED elements 18 connected by wiring 23, and multiple series circuits 24, 25, and 26 mounted on it. Power is supplied from a power supply 29 to the LED substrate 22 via connectors 27 and 28. As explained above, such a configuration is possible because the number of LEDs used in an exposure apparatus is very large.

[0029] Due to manufacturing size limitations, the maximum number of LEDs that can be mounted on a single substrate 22 is also limited. Furthermore, increasing the number of LEDs by narrowing the spacing between them on a single substrate can increase heat generation and degrade the efficiency of light utilization from the LEDs. Therefore, simply increasing the number of LEDs is not sufficient; the configuration must consider light utilization efficiency and incorporate measures to mitigate heat generation. This is not something that can be easily determined even by those involved in the technology; it can only be understood after prototyping and evaluating performance. Moreover, for practical use, a compact design is necessary to avoid increasing the size of the device. Compactness is a trade-off with high illuminance. No concrete example has been shown of a configuration that achieves both high illuminance and compactness, where the illuminance per unit area (amount of light received) after combining the luminous flux L2 from a first LED group consisting of N1 LEDs and a second LED group consisting of N2 LEDs is K × (N1 + N2), and K > 7. K is the unit of illuminance, mW / cm². 2 Therefore, the illuminance is 7 × (N1 + N2) mW / cm². 2No example has been shown that exceeds the above. In this embodiment, the illuminance may be the illuminance at the position of the slit surface 41 shown in Figure 2. In this embodiment, the illuminance may be the image-forming surface between the dichroic mirror and the original plate. Alternatively, the illuminance in this embodiment may be the illuminance at the position of the surface of the mask 7.

[0030] As mentioned above, if the illumination optical system 8 has, for example, an imaging optical system (an optical system that images the slit surface illumination light distribution onto the mask surface illumination light distribution) with a magnification of 2x projection, then the illuminance after multiplexing is the illuminance before it is incident on the imaging optical system having the aforementioned magnification. Figure 2 shows the magnification optical system 43, but the magnification optical system 43 is not an essential component. The magnification optical system 43 may include a transmission optical element or a reflection optical element. The magnification is not limited to 2x. The magnification optical system 43 magnifies the light intensity distribution on the surface of the original plate to 1x or more relative to the light intensity distribution on the pupil surface.

[0031] When using LED elements for exposure equipment, as mentioned above, high illumination is required to improve the productivity of the equipment. To achieve the required high illumination, it is necessary to arrange multiple LED substrates 22 at a high density to create a large area. Figure 7 shows an example of a large-area LED array light source 30. This large-area LED array light source 30 is used as the LED array light sources 11a and 11b in Figure 2.

[0032] The LED array light source 11a has a configuration in which multiple substrates (10 in Figure 6) equipped with multiple LEDs are arranged, as shown in the large-area LED array light source 30. The total number of LEDs mounted on the 10 substrates is preferably 70 or more, and more preferably 100 or more. In each case, the total number of LEDs for LED array light sources 11a and 11b will be 140 or more and 200 or more, respectively. The spacing 115 of the LEDs arranged in the array is preferably 3 mm or more and 15 mm or less. The LED chip size 117 is preferably 3.0 mm or less. More preferably, the LED chip size 117 is 1.8 mm or less. The LED array light source 11 preferably has two layers of microlens arrays 19, and the spacing 116, which is the distance between the top surface of the LED 21 and the bottom surface of the microlens array 19, is close, specifically preferably 0.1 mm or more and 1.0 mm or less.

[0033] To obtain higher illumination, the desired shape of the microlens array is as shown in Figure 7, where the lower surface 111 of the lens closest to the first layer LED is flat, and the radius of curvature of the upper surface 112 is smaller than the radius of curvature of the lower surface 113 of the second layer LED, which will be described later. More preferably, the upper surface 112 is aspherical. The radius of curvature of the lower surface 113 of the second layer LED is between 9 mm and 12 mm, and the upper surface 114 of the second layer LED is preferably flat. As mentioned above, it is preferable that the wavelength of the LED array light source 11a arranged in the xy plane is shorter than the wavelength of the LED array light source 11b arranged in the xz plane.

[0034] The LED array light sources 11a and 11b are held by a support base. To reduce weight, it is desirable that this support base has a cutout portion of 5% or more of its area. The size of the dichroic mirror 16 shown in Figure 2 is a trade-off: a large size is desirable for achieving high illuminance, while a small size is desirable for achieving compactness. A solution that achieves both high illuminance and compactness is a rectangular mirror with a long side of 500 mm or more and an area of ​​200,000 mm². 2 The above is desirable. With this configuration, 1000 mW / cm² is achievable. 2It is possible to obtain such high output power. Furthermore, with this configuration, 1500 mW / cm² can be achieved. 2 It is also possible to achieve high output power. This corresponds to the illuminance after combining the luminous flux L2 from a first LED group consisting of N1 LEDs and a second LED group consisting of N2 LEDs satisfying K × (N1 + N2), where K > 7. Finding a configuration that satisfies K > 7 is difficult due to the trade-off with miniaturization, and to the best of the inventor's knowledge, no example of a configuration that satisfies K > 7 has been disclosed.

[0035] Furthermore, the inventors discovered that a configuration where V is between 2V and 6V, and I is between 220mA and 3000mA, is desirable, given that V is the voltage applied to each LED and I is the current flowing through each LED. This range was discovered by the inventors in terms of illuminance and heat generation.

[0036] <Second Embodiment> The large-area LED array light source 30 in Figure 6 requires high power to produce high illumination, resulting in significant heat generation. Therefore, the LED substrate needs to be in close contact with the cooler (cooling unit) to dissipate heat. Generally, the brightness of an LED decreases as its temperature rises. To efficiently cool the heated LED, it is desirable to improve heat dissipation by fixing the substrate on which the LEDs are mounted to the cooler with screws to create close contact. Methods for close fixing include screws, bolts, and fixing plates, and require a sufficient amount of space on the substrate surface. Below, we will explain using the case of fixing with screws as a representative example.

[0037] Figure 8 shows a top view of the LED substrate 31 with screws 32, 33, 34, and 35 arranged on it. Figure 9 shows the LED substrate 31 fixed to the cooler 36 using screws 32, 33, 34, and 35. The cooler is configured to dissipate heat from the LEDs by having a refrigerant controlled to a constant temperature by a chiller flow through the cooling channel 37. Figure 9 shows an example in which the LED substrate 31 fixed to the cooler 36 is used as the LED array light sources 11a and 11b in Figure 2. In Figure 2, for the LED array light source 11b mounted in the direction of gravity, it is desirable that the refrigerant flows in the cooling channel 37 shown in Figure 9 in the direction of +Z in Figure 2 (opposite to gravity). The effect of the refrigerant flowing upward against gravity has the effect of making it less likely for bubbles to form in the cooling channel 37.

[0038] <Embodiment for manufacturing an article> The method for manufacturing articles according to embodiments of the present invention is suitable for manufacturing articles such as flat panel displays (FPDs), semiconductor devices, sensors, and optical elements. Figure 10 is a flowchart of the method for manufacturing articles according to this embodiment. The method for manufacturing articles according to this embodiment includes a step of forming a latent image pattern on a photosensitive material coated on a substrate by exposure using the above-mentioned exposure apparatus 100 to obtain an exposed substrate (exposure step, step S11). It also includes a step of developing the substrate exposed in this step to obtain a developed substrate (development step, step S12). Furthermore, this manufacturing method includes other well-known steps (oxidation, film formation, vapor deposition, doping, planarization, etching, resist stripping, dicing, bonding, packaging, etc.) (processing step, step S13). The method for manufacturing articles according to this embodiment is advantageous compared to conventional methods in at least one of the performance, quality, productivity, and production cost of the articles.

[0039] Although preferred embodiments of the present invention have been described above, it goes without saying that the present invention is not limited to these embodiments, and various modifications and changes are possible within the scope of its essence.

[0040] The disclosures herein include at least the following light source devices, exposure devices, and methods for manufacturing articles.

[0041] (Item 1) A light source device used in an exposure apparatus that projects an image of the pattern of the original plate onto a substrate, A first group of LEDs that emit light of a first wavelength, A second group of LEDs that emits light of a second wavelength different from the first wavelength, A dichroic mirror that combines the light from the first group of LEDs and the light from the second group of LEDs, It has, When the light synthesized by the dichroic mirror is irradiated onto the original plate, the illuminance per unit area of ​​the original plate is 1000 mW / cm². 2 A light source device characterized by the above.

[0042] (Item 2) The first wavelength is shorter than the second wavelength. The light source device according to item 1, characterized in that the first group of LEDs is arranged perpendicular to the direction of gravity, and the second group of LEDs is arranged along the direction of gravity.

[0043] (Item 3) The light source device according to item 1 or 2, characterized in that the first wavelength includes 365 nm.

[0044] (Item 4) The light source device according to any one of items 1 to 3, characterized in that the second wavelength includes 405 nm.

[0045] (Item 5) The light source device according to any one of items 1 to 4, characterized in that the distance between the first LED group and the second LED group is 3 mm or more and 15 mm or less.

[0046] (Item 6) The light source device according to any one of items 1 to 5, characterized in that the sum of the number of LEDs in the first LED group and the number of LEDs in the second LED group is 140 or more.

[0047] (Item 7) The system further includes a support base for holding the first LED group or the second LED group, The light source device according to any one of items 1 to 6, characterized in that the support base has a cutout portion with an area ratio of 5% or more.

[0048] (Item 8) The aforementioned dichroic mirror has a long side of 500 mm or more and an area of ​​200,000 mm². 2 A light source device according to any one of items 1 to 7, characterized in that it is as described above.

[0049] (Item 9) The light source device according to any one of items 1 to 8, characterized in that the first group of LEDs or the second group of LEDs are in contact with a cooling section through which cooled refrigerant flows.

[0050] (Item 10) The light source device according to item 9, characterized in that the refrigerant in the cooling section flows in the direction opposite to the direction of gravity at the position corresponding to the first LED group or the second LED group.

[0051] (Item 11) A first microlens array that focuses light from the first group of LEDs, It comprises a second microlens array that focuses light from the second group of LEDs, The distance between the first LED group and the first microlens array is 0.1 mm or more and 1.0 mm or less. The distance between the second LED group and the second microlens array is between 0.1 mm and 1.0 mm. A light source device according to any one of items 1 to 10, characterized by the features described herein.

[0052] (Item 12) In the first microlens array, the first lens and the second lens are arranged in the order through which the light from the first LED group passes, spaced apart in the direction in which the light from the first LED group travels in a straight line. In the second microlens array, a third lens and a fourth lens are arranged at intervals in the direction in which the light from the second LED group travels straight, in the order in which the light from the second LED group passes through. In the first lens, the surface close to the first LED group is a flat surface. In the third lens, the surface close to the second LED group is a flat surface. The light source device according to item 11, characterized in that.

[0053] (Item 13) The voltage applied to each LED in the first LED group or the second LED group is 2V or more and 6V or less. The current flowing through each LED in the first LED group or the second LED group is 220mA or more and 3000mA or less. The light source device according to any one of items 1 to 12, characterized in that.

[0054] (Item 14) A light source device used in an exposure device that projects an image of an original pattern onto a substrate, A first LED group that emits light of a first wavelength, A second LED group that emits light of a second wavelength different from the first wavelength, A dichroic mirror that combines the light from the first LED group and the light from the second LED group, Having, When the number of LEDs in the first LED group is N1 and the number of LEDs in the second LED group is N2, when the light synthesized by the dichroic mirror irradiates the original plate, the illuminance per unit area on the original plate is 7×(N1 + N2) mW / cm 2 The light source device is characterized in that it is above.

[0055] (Item 15) The light source device according to any one of items 1 to 14, An illumination optical system that illuminates an original plate with light from the light source device, A projection optical system that projects an image of the pattern of the original plate onto a substrate, An exposure apparatus characterized by having the following features.

[0056] (Item 16) The illumination optical system has an aperture positioned at the pupil plane of the illumination optical system, The exposure apparatus according to item 15, characterized in that the aperture is configured to allow selection of one aperture from a plurality of apertures.

[0057] (Item 17) The exposure apparatus according to item 15 or 16, characterized in that the illumination optical system includes a magnification optical system that magnifies the light intensity distribution on the surface of the original plate by an equal or greater ratio with respect to the light intensity distribution on the pupil surface.

[0058] (Item 18) An exposure step of exposing a substrate using an exposure apparatus described in any one of items 15 to 17 to obtain an exposed substrate, The process includes developing the aforementioned photopolymer substrate to obtain a developed substrate, A method for manufacturing an article, characterized by manufacturing an article from the aforementioned developing substrate. [Explanation of Symbols]

[0059] 5 circuit boards 7 Mask (original version) 10. Light source unit (light source device) 11a LED array light source (first LED group) 11b LED array light source (2nd LED group) 16 Dichroic Mirrors 100 Exposure equipment

Claims

1. A light source device used in an exposure apparatus that projects an image of the pattern of the original plate onto a substrate, A first group of LEDs that emit light of a first wavelength, A second group of LEDs that emits light of a second wavelength different from the first wavelength, A dichroic mirror that combines the light from the first group of LEDs and the light from the second group of LEDs, It has, When the light synthesized by the dichroic mirror is irradiated onto the original plate, the illuminance per unit area at the imaging surface between the dichroic mirror and the original plate is 1000 mW / cm². ２ A light source device characterized by the above.

2. The first wavelength is shorter than the second wavelength. The light source device according to claim 1, characterized in that the first group of LEDs is arranged perpendicular to the direction of gravity, and the second group of LEDs is arranged along the direction of gravity.

3. The light source device according to claim 1, characterized in that the first wavelength includes 365 nm.

4. The light source device according to claim 1, characterized in that the second wavelength includes 405 nm.

5. The light source device according to claim 1, characterized in that the distance between the first LED group and the second LED group is 3 mm or more and 15 mm or less.

6. The light source device according to claim 1, characterized in that the sum of the number of LEDs in the first LED group and the number of LEDs in the second LED group is 140 or more.

7. The system further includes a support base for holding the first group of LEDs or the second group of LEDs, The light source device according to claim 1, characterized in that the support base has a cutout portion with an area ratio of 5% or more.

8. The aforementioned dichroic mirror has a long side of 500 mm or more and an area of ​​200,000 mm². ２ The light source device according to claim 1, characterized in that it is as described above.

9. The light source device according to claim 1, characterized in that the first group of LEDs or the second group of LEDs are in contact with a cooling section through which cooled refrigerant flows.

10. The light source device according to claim 9, characterized in that the refrigerant in the cooling section flows in a direction opposite to the direction of gravity at a position corresponding to the first LED group or the second LED group.

11. A first microlens array that focuses light from the first group of LEDs, It comprises a second microlens array that focuses light from the second group of LEDs, The distance between the first LED group and the first microlens array is 0.1 mm or more and 1.0 mm or less. The distance between the second LED group and the second microlens array is 0.1 mm or more and 1.0 mm or less. The light source device according to feature 1.

12. In the first microlens array, the first lens and the second lens are arranged in the order through which the light from the first LED group passes, spaced apart in the direction in which the light from the first LED group travels in a straight line. In the second microlens array, a third lens and a fourth lens are arranged in the order through which the light from the second LED group passes, spaced apart in the direction in which the light from the second LED group travels in a straight line. In the first lens, the surface closest to the first LED group is planar, In the third lens, the surface closest to the second LED group is planar. The light source device according to feature 11.

13. The voltage applied to each LED in the first LED group or the second LED group is 2V or more and 6V or less. The current flowing through each LED in the first LED group or the second LED group is 220 mA or more and 3000 mA or less. The light source device according to feature 1.

14. A light source device used in an exposure apparatus that projects an image of the pattern of the original plate onto a substrate, A first group of LEDs that emit light of a first wavelength, A second group of LEDs that emits light of a second wavelength different from the first wavelength, A dichroic mirror that combines the light from the first group of LEDs and the light from the second group of LEDs, It has, When the number of LEDs in the first LED group is N1 and the number of LEDs in the second LED group is N2, when the light synthesized by the dichroic mirror is irradiated onto the original plate, the illuminance per unit area on the imaging surface between the dichroic mirror and the original plate is 7 × (N1 + N2) mW / cm². ２ A light source device characterized by the above.

15. The light source device according to claim 1, An illumination optical system for illuminating the original plate with light from the aforementioned light source device, A projection optical system for projecting an image of the pattern of the aforementioned master plate onto a substrate, An exposure apparatus characterized by having the following features.

16. The illumination optical system has an aperture positioned at the pupil plane of the illumination optical system, The exposure apparatus according to claim 15, characterized in that the aperture is configured to allow selection of one aperture from a plurality of apertures.

17. The exposure apparatus according to claim 15, characterized in that the illumination optical system includes a magnification optical system that magnifies the light intensity distribution on the surface of the original plate by an equal or greater magnitude with respect to the light intensity distribution on the pupil surface.

18. An exposure step of exposing a substrate using an exposure apparatus according to any one of claims 15 to 17 to obtain an exposed substrate, The process includes developing the aforementioned photopolymer substrate to obtain a developed substrate, A method for manufacturing an article, characterized by manufacturing an article from the aforementioned developing substrate.

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