Semiconductor equipment
By dividing and electrically connecting gate electrodes of transistors with distinct conductive films, the semiconductor devices mitigate electrostatic discharge risks, ensuring efficient current supply and maintaining yield in larger panel sizes.
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- SEMICON ENERGY LAB CO LTD
- Filing Date
- 2026-02-24
- Publication Date
- 2026-05-25
AI Technical Summary
The increase in panel size of semiconductor displays using transistors with amorphous silicon or oxide semiconductors leads to larger transistors, increasing the likelihood of electrostatic discharge due to the antenna effect, which reduces yield and requires larger current supply capacity, leading to layout constraints and electrostatic discharge damage.
The gate electrodes of transistors are divided into multiple conductive films, electrically connected by a distinct conductive film, reducing the surface area and minimizing charge accumulation during manufacturing processes, thereby preventing electrostatic discharge.
This configuration reduces the risk of electrostatic discharge, maintaining yield and enabling efficient current supply capacity without increasing transistor size, thus addressing the challenges of larger panel sizes.
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