Semiconductor equipment
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- SEMICON ENERGY LAB CO LTD
- Filing Date
- 2026-02-19
- Publication Date
- 2026-06-09
AI Technical Summary
【0031】 酸化物半導体層を用いたトランジスタにおいて、該酸化物半導体層の少なくとも一表面側 に該表面と垂直な方向にc軸成長し、該表面に平行なa-b面を有する針状結晶群を有し 、該針状結晶群以外の部分は非晶質又は非晶質と微結晶とが混在している構成とすること によって、電気特性が良好で信頼性の高い半導体装置を作製することができる。
Smart Images

Figure 2026094216000001_ABST
Abstract
Claims
[Claim 1] A gate electrode layer is placed on the insulating surface, A gate insulating layer is provided on the gate electrode layer, An oxide semiconductor layer is provided on the gate insulating layer, A source electrode layer and a drain electrode layer overlapping a portion of the oxide semiconductor layer are provided on the gate insulating layer. The source electrode layer and the drain electrode layer have an oxide insulating layer in contact with the oxide semiconductor layer, The oxide semiconductor layer has at least one surface side that has needle-shaped crystal groups that grow along the c axis in a direction perpendicular to the surface and have a-b planes parallel to the surface. In the group of needle-shaped crystals, the length in the c-axis direction is 5 times or more than the length in the a-axis direction or the b-axis direction. A semiconductor device wherein the region other than the group of needle-shaped crystals is amorphous or a region in which amorphous and microcrystalline materials are mixed.