Ceramic substrates, semiconductor device packages, electrostatic chucks, substrate fixing devices
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- SHINKO ELECTRIC IND CO LTD
- Filing Date
- 2024-12-12
- Publication Date
- 2026-06-24
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Figure 2026103223000001_ABST
Abstract
Claims
1. A ceramic substrate made of aluminum oxide, The substrate has a conductive layer in contact with it, The aforementioned conductive layer is The first layer is a sintered body mainly composed of metal and containing aluminum oxide, A second layer is laminated on the first layer, and is a fired body mainly composed of metal and free of aluminum oxide. A ceramic substrate comprising a third layer, which is a fired body mainly composed of metal and containing aluminum oxide, laminated on the second layer.
2. The ceramic substrate according to claim 1, wherein the metal is tungsten or molybdenum.
3. The ceramic substrate according to claim 1, wherein the substrate has a purity of 99.5% or more of the aluminum oxide.
4. The ceramic substrate according to claim 3, wherein the substrate has a relative density of 97% or more with respect to aluminum oxide.
5. The ceramic substrate according to claim 3, wherein the substrate has an average particle size of aluminum oxide of 1.0 μm or more and 3.0 μm or less.
6. A semiconductor device package having a ceramic substrate according to any one of claims 1 to 5.
7. An electrostatic chuck comprising an RF electrode in the conductive layer, in a ceramic substrate according to any one of claims 1 to 5.
8. base plate and A substrate fixing device having an electrostatic chuck according to claim 7 mounted on one side of the base plate.