Substrate transport system and substrate transport method

Abstract

This system enables the optimization of the hand pitch according to the arrangement of the circuit boards. [Solution] The substrate processing apparatus (1) comprises a substrate transport mechanism (IR) equipped with a plurality of hands and a hand pitch adjustment unit that adjusts the hand pitch, which is the pitch between the plurality of hands, and a control unit (71). The control unit controls the hand pitch adjustment unit so that the plurality of hands enter the plurality of hand entry positions calculated based on the arrangement state of the substrate.

Description

Technical Field

[0004] , , , ,

[0005] , ,

[0001] The present invention relates to a substrate transfer system and a method for transferring a substrate in the system.

Background Art

[0002] Conventionally, in a processing step such as a semiconductor, a substrate holding device that takes out and transfers these substrates from a transfer container in which substrates such as silicon wafers are stored so as to be arranged at a predetermined pitch in the thickness direction of the substrate is known. As such a substrate holding device, a substrate holding device including a plurality of substrate holders capable of holding substrates may be used. In this case, it may be necessary to adjust the interval between the substrate holders according to the arrangement state of the plurality of substrates. Patent Document 1 discloses a substrate holding device provided with a support mechanism for changing the pitch of a plurality of substrate holders. The support mechanism includes the same number of supports as the substrate holders, a pair of guide rails, a rotating member, and a pitch change drive unit.

Prior Art Documents

Patent Documents

[0003]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0004] However, in the substrate holding device disclosed in Patent Document 1, the plurality of substrate holders are always arranged at equal intervals. Therefore, when the optimal pitch according to the arrangement state of the plurality of substrates is not constant, the pitch cannot be sufficiently optimized.

[0005] ] One aspect of the present invention aims to realize a substrate transfer system or the like that can optimize the pitch of a hand according to the arrangement state of a plurality of substrates.

Means for Solving the Problems

[0006] To solve the above problems, a substrate transport system according to one aspect of the present invention comprises a substrate transport mechanism equipped with a plurality of hands for taking out substrates from a transport container that transports a plurality of substrates stored in a shelf-like manner, and a hand pitch adjustment unit for adjusting the hand pitch, which is the pitch between the plurality of hands; a substrate detection unit for detecting the arrangement state of substrates in the transport container; and a control unit, wherein the substrate transport system takes out the substrates from the transport container and transports them using the substrate transport mechanism, and the control unit calculates the hand entry positions into which the hands should enter based on the arrangement state of the plurality of substrates detected by the substrate detection unit, and controls the hand pitch adjustment unit so that the plurality of hands equipped with the substrate transport mechanism enter each of the plurality of hand entry positions.

[0007] Furthermore, a substrate transport system according to one aspect of the present invention further comprises a hand-to-hand pitch measuring unit for measuring the hand-to-hand pitch in the substrate transport mechanism, and the control unit calculates the difference between the hand-to-hand entry position pitch, which is the pitch between a plurality of hand entry positions into which each of the plurality of hands provided in the substrate transport mechanism should be inserted, and the hand-to-hand pitch adjustment unit, and controls the hand-to-hand pitch adjustment unit so that all of the differences are below a predetermined threshold.

[0008] Furthermore, in a substrate transport system according to one aspect of the present invention, the hand-to-hand pitch measurement unit is a linear encoder, and the control unit controls the hand-to-hand pitch adjustment unit based on the output from the linear encoder.

[0009] Furthermore, a substrate transport system according to one aspect of the present invention further comprises an optical measurement unit for optically measuring the pitch between the hands, and the control unit corrects the measurement output value of the linear encoder based on the measurement result of the optical measurement unit.

[0010] Furthermore, in a substrate transport system according to one aspect of the present invention, the control unit determines which of the multiple substrates in the transport container will be transported together in one go by the multiple hands provided by the substrate transport mechanism, and after each transport operation is completed, switches the substrate to be transported and repeats the transport operation to transport all of the substrates in the transport container.

[0011] Furthermore, in a substrate transport system according to one aspect of the present invention, when the transport operation is repeated, the control unit controls the hand pitch adjustment unit so that, at the timing of switching the transport operation, the hand pitch is not returned to its initial value, and each of the multiple hands provided by the substrate transport mechanism enters the hand entry position for the next transport operation.

[0012] Furthermore, a substrate transport method according to one aspect of the present invention is a substrate transport method in a substrate transport system comprising: a substrate transport mechanism equipped with a plurality of hands for taking out substrates from a transport container that transports a plurality of substrates stored in a shelf-like manner, and a hand pitch adjustment unit for adjusting the hand pitch, which is the pitch between the plurality of hands; and a substrate detection unit for detecting the arrangement state of substrates in the transport container, wherein the substrate transport mechanism takes out the substrates from the transport container and transports them, wherein the hand pitch adjustment unit is controlled so that the plurality of hands provided by the substrate transport mechanism enter the respective hand entry positions based on the arrangement state of the plurality of substrates detected by the substrate detection unit. [Effects of the Invention]

[0013] According to one aspect of the present invention, a substrate transport system can be realized that can optimize the pitch of the handle according to the arrangement of multiple substrates. [Brief explanation of the drawing]

[0014] [Figure 1] This is a plan view showing a substrate processing apparatus according to an embodiment. [Figure 2] It is a cross-sectional view of the carrier. [Figure 3] It is a front view of the carrier. [Figure 4] It is a longitudinal sectional view showing a substrate processing apparatus according to an embodiment. [Figure 5] It is a side view showing the lid attaching / detaching part. [Figure 6] It is a plan view showing the mapping sensor located at the standby position. [Figure 7] It is a plan view showing the mapping sensor located at the detection position. [Figure 8] It is a side view of the hand. [Figure 9] It is a front view of the inter-hand pitch adjustment part. [Figure 10] It is a side view of the inter-hand pitch adjustment part. [Figure 11] It is a diagram showing an example of a method for calculating the hand entry position. [Figure 12] It is a diagram showing an example of the operation of the transfer robot. [Figure 13] It is a flowchart showing an example of a substrate transfer method. [Figure 14] It is a flowchart showing an example of the calibration process.

Mode for Carrying Out the Invention

[0015] Hereinafter, Example 1 of the present invention will be described with reference to the drawings. FIG. 1 is a plan view showing a substrate processing apparatus 1 (substrate transfer system) according to an embodiment; FIG. 2 is a cross-sectional view of a carrier C; FIG. 3 is a front view of the carrier C; FIG. 4 is a longitudinal sectional view showing a substrate processing apparatus according to an embodiment; FIG. 5 is a side view showing the lid attaching / detaching part; FIG. 6 is a plan view showing a mapping sensor located at the standby position; FIG. 7 is a plan view showing a mapping sensor located at the detection position; FIG. 8 is a side view of a hand 41; FIG. 9 is a front view of an inter-hand pitch adjustment part 49; FIG. 10 is a side view of the inter-hand pitch adjustment part 49.

[0016] <1. Configuration of Substrate Processing Apparatus> Refer to Figure 1. The substrate processing apparatus 1 processes the substrate W. The substrate processing apparatus 1 comprises an indexer block 2 and a processing block 3.

[0017] The horizontal direction in which the indexer block 2 and processing block 3 are positioned is called the front-to-back direction (X direction). The direction from processing block 3 towards indexer block 2 is forward, and the opposite direction is backward. The horizontal direction perpendicular to the front-to-back direction is called the width direction (Y direction). The direction perpendicular to both the front-to-back direction and the width direction is called the up-and-down direction (Z direction).

[0018] <1-1. Indexer Block> The indexer block 2 comprises at least one (three in Figure 1) load port (opener) 5, a housing 7, and a transport robot IR (substrate transport mechanism). The load port 5 is used for loading and unloading substrates W. Each load port 5 is equipped with a stage 9 and a lid attachment / detachment section 11 (see Figure 4). A carrier C (transport container) is placed on the stage 9.

[0019] Load port 5 is further equipped with a load sensor (not shown) that detects when carrier C is placed on stage 9. Indexer block 2 detects that carrier C is placed on stage 9 using the load sensor and uses the transport robot IR to remove the substrate W from carrier C and transport it.

[0020] Carrier C transports multiple substrates W in a shelf-like arrangement. By design, carrier C stores multiple substrates W (e.g., 25) in a horizontal orientation, aligned vertically (Z-direction) at a predetermined pitch (e.g., 10 mm pitch). The substrates W are formed, for example, in a disc shape. A Front Opening Unify Pod (FOUP) is used as carrier C, but is not limited to this. For example, the carrier may be a cassette (open cassette) without a lid 17 (described later) that closes the opening 14 (described later).

[0021] Refer to Figures 2 and 3. The carrier C comprises a container (carrier body) 13, an opening 14, multiple pairs (e.g., 25 pairs) of shelves 15, 16, and a lid 17. The container 13 houses multiple substrates W. The opening 14 is provided on the front of the container 13. Each of the multiple substrates W is removed from and placed back into the carrier C through the opening 14. When the carrier C is being transported, the lid 17 that closes the opening 14 is attached to the container 13. When removing the substrates W from the carrier C, the lid 17 is removed from the container 13.

[0022] Multiple pairs of shelves 15, 16 are provided vertically within the container 13. In the vertical direction, the multiple pairs of shelves 15, 16 are arranged at a predetermined pitch (for example, a 10 mm pitch) according to the design. One substrate W is placed horizontally on each pair of shelves 15, 16. As shown in Figure 3, for example, 25 shelves 15 are provided on the left inner wall 13A of the container 13, and 25 shelves 16 are provided on the right inner wall 13B of the container 13.

[0023] Furthermore, within the carrier C, for example, the space between two pairs of vertically adjacent shelf sections 15 and 16 that accommodates one circuit board W is called a slot. Therefore, the carrier C is equipped with multiple (for example, 25) slots SL1 to SL25, each accommodating multiple (for example, 25) circuit boards W. The 25 slots SL1 to SL25 are arranged in order from bottom to top. Slot SL1 is the lowest slot, and slot SL25 is the highest slot.

[0024] Multiple load ports 5 are arranged in the width direction (Y direction). Multiple load ports 5 are located at the front of the indexer block 2. Specifically, two load ports 5 are located on the outside of the housing 7, in the front wall portion 7A of the housing 7. The wall portion 7A is provided with a passage opening 7B corresponding to the opening 14 of the carrier C placed on the stage 9 of each load port 5. For example, the transport robot IR removes the substrate W from the carrier C placed on the stage 9 through the passage opening 7B. For simplicity, in Figure 1, only one stage 9 is indicated by a reference numeral for the corresponding passage opening 7B.

[0025] The lid attachment / detachment section 11 of the load port 5 includes a shutter section 19, a shutter forward / backward section 21, a shutter lifting / lowering section 23, and a rotary encoder (height sensor) 25. The shutter section 19 opens and closes the corresponding passage opening 7B. The shutter section 19 can also hold the lid section 17 of the carrier C. Therefore, the shutter section 19 can remove the lid section 17 from the carrier C or attach the lid section 17 to the carrier C.

[0026] The shutter advancement / retraction mechanism 21 moves the shutter unit 19 forward and backward in the front-rear direction (X direction). The shutter advancement / retraction mechanism 21 comprises, for example, an electric motor 21A, a screw shaft 21B, a slider 21C, and a guide rail 21D. Alternatively, the shutter advancement / retraction mechanism 21 may be equipped with an air cylinder instead of the electric motor 21A and screw shaft 21B. The slider 21C supports the shutter unit 19.

[0027] The shutter lifting unit 23 moves the shutter unit 19, two light-emitting units 27A, 28A (described later), two light-receiving units 27B, 28B (described later), and sensor support member 31 (described later) in the vertical direction (Z direction). The shutter lifting unit 23 includes, for example, an electric motor 23A, two pulleys 23B, 23C, a timing belt 23D, a slider 23E, and a guide rail 23F.

[0028] Two pulleys 23B and 23C are arranged vertically. The two pulleys 23B and 23C are rotatably supported around two horizontal axes AX1 and AX2, respectively. The two horizontal axes AX1 and AX2 each extend, for example, in the width direction (Y direction). A ring-shaped timing belt 23D is wrapped around the two pulleys 23B and 23C. A slider 23E is attached (fixed) to the timing belt 23D. A guide rail 23F is arranged to extend vertically. The slider 23E is guided vertically by the guide rail 23F. The slider 23E supports the shutter advance / return section 21.

[0029] The rotating output shaft of the electric motor 23A is connected, for example, to the lower pulley 23B. The electric motor 23A rotates the pulley 23B around the horizontal axis AX1. When the lower pulley 23B is rotated, the timing belt 23D rotates the upper pulley 23C around the horizontal axis AX2. When the electric motor 23A rotates the pulley 23B in the forward direction, the slider 23E, the shutter advance / retract section 21, the shutter section 19, the two light-emitting sections 27A, 28A, and the two light-receiving sections 27B, 28B rise along with the movement of the timing belt 23D. Conversely, when the electric motor 23A rotates the pulley 23B in the reverse direction, the slider 23E, the two light-emitting sections 27A, 28A, and the two light-receiving sections 27B, 28B, etc., descend along with the movement of the timing belt 23D.

[0030] The rotary encoder 25 measures the height position of the shutter unit 19 and the two mapping sensors 27, 28 (light-emitting units 27A, 28A and light-receiving units 27B, 28B). The rotary encoder 25 is connected, for example, to the upper pulley 23C. The rotary encoder 25 detects the amount of mechanical displacement of the rotation of the pulley 23C and outputs it as a pulse (pulse signal). By counting the number of pulses from the rotary encoder 25, the vertical movement of, for example, the shutter unit 19, the light-emitting units 27A, 28A and the light-receiving units 27B, 28B can be obtained. Furthermore, the height position of the shutter unit 19, the light-emitting units 27A, 28A and the light-receiving units 27B, 28B from their reference positions can be obtained.

[0031] The rotary output shaft of the electric motor 23A may be connected to the upper pulley 23C instead of the lower pulley 23B. The rotary encoder 25 may also be connected to the lower pulley 23B instead of the upper pulley 23C to detect the mechanical displacement of the lower pulley 23B. Furthermore, if the rotary output shaft of the electric motor 23A is connected to the lower pulley 23B, the rotary encoder 25 may also be connected to the lower pulley 23B. Additionally, a linear encoder may be provided as a height sensor instead of the rotary encoder 25.

[0032] Refer to Figures 6 and 7. The load port 5 further includes two mapping sensors 27 and 28 (substrate detection unit) and a sensor movement unit 29.

[0033] The first mapping sensor 27 and the second mapping sensor 28 are used to detect the arrangement state of the substrate W within the carrier C. The first mapping sensor 27 comprises a light-emitting unit 27A and a light-receiving unit 27B. Similarly, the second mapping sensor 28 comprises a light-emitting unit 28A and a light-receiving unit 28B.

[0034] For example, through-type fiber sensors are used as the mapping sensors 27 and 28. For example, the first mapping sensor 27 further includes a light-emitting element (e.g., an LED: light-emitting diode), a light-receiving element, a first optical fiber, and a second optical fiber. The first optical fiber sends light from the light-emitting element to the light-emitting unit 27A. The second optical fiber sends the light received by the light-receiving unit 27B to the light-receiving element. The light-receiving element converts the received light into an electrical signal. The first mapping sensor 27 outputs a signal corresponding to the amount of light (received intensity) of the light received by the light-receiving unit 27B. The second mapping sensor 28 is configured similarly to the first mapping sensor 27.

[0035] The light-emitting units 27A, 28A and the light-receiving units 27B, 28B are provided, for example, on the upper surface of the shutter unit 19 via a sensor movement unit 29. The sensor movement unit 29 includes a sensor support member 31. The sensor support member 31 is formed, for example, in a C-shape in plan view. The sensor support member 31 supports two mapping sensors 27, 28 (two light-emitting units 27A, 28A and two light-receiving units 28A, 28B).

[0036] The two light-emitting units 27A and 28A are provided at the first end of the C-shaped sensor support member 31. The two light-receiving units 27B and 28B are provided at the second end of the sensor support member 31. The light-emitting units 27A and 28A and the light-receiving units 27B and 28B are positioned at the same height relative to each other.

[0037] The light-emitting section 27A and light-receiving section 27B of the first mapping sensor 27 are arranged in the width direction (Y direction). Similarly, the light-emitting section 28A and light-receiving section 28B of the second mapping sensor 28 are arranged in the width direction. The width direction is a horizontal direction perpendicular to the insertion / removal direction TD (Figures 6 and 7) in which multiple substrates W are inserted into and removed from the carrier C through the opening 14 of the carrier C.

[0038] The light-emitting section 27A and the light-receiving section 27B of the first mapping sensor 27 face each other. When there are no obstacles blocking the light, the light emitted from the light-emitting section 27A is received by the light-receiving section 27B. The optical axis LT1 connecting the light-emitting section 27A and the light-receiving section 27B extends in the width direction (Y direction).

[0039] Similarly, the light-emitting section 28A and the light-receiving section 28B of the second mapping sensor 28 face each other. When there are no obstacles blocking the light, the light emitted from the light-emitting section 28A is received by the light-receiving section 28B. The optical axis LT2 connecting the light-emitting section 28A and the light-receiving section 28B extends in the width direction.

[0040] The sensor movement unit 29 further includes, for example, an electric motor, a screw shaft, a guide rail, and a slider. Alternatively, the sensor movement unit 29 may be equipped with an air cylinder instead. The sensor movement unit 29 moves the two light-emitting units 27A, 28A, the two light-receiving units 27B, 28B, and the sensor support member 31 linearly in the front-rear direction (X direction). Normally, the light-emitting units 27A, 28A and the light-receiving units 27B, 28B are in standby positions (see Figure 6). When mapping is performed, the sensor movement unit 29 moves the light-emitting units 27A, 28A and the light-receiving units 27B, 28B into the carrier C placed on the stage 9 (see Figure 7).

[0041] When the light-emitting units 27A, 28A and light-receiving units 27B, 28B are located in the detection position, they are arranged as follows: The light-emitting unit 27A and light-receiving unit 27B of the first mapping sensor 27 are arranged in a plan view on a straight line LNE, facing each other via a first measurement point MP1 set between the center CT and the edge ED of the substrate W1. The light-emitting unit 28A and light-receiving unit 28B of the second mapping sensor 28 are arranged in a plan view on a straight line LNE, facing each other via a second measurement point MP2 set between the first measurement point MP1 and the edge ED. The distance between the edge ED and the second measurement point MP2 is, for example, 5 mm. The distance between the edge ED and the first measurement point MP1 is, for example, 30 mm to 50 mm.

[0042] As shown in Figure 7, the linear LNE is a straight line extending from the center CT of substrate W1(W), one of the multiple substrates W housed in the carrier C, along the insertion / removal direction TD towards the aperture 14. The optical axis LT2, extending from the light-emitting section 28A to the light-receiving section 28B, intersects the peripheral edge of the substrate W in a plan view. The optical axis LT1 also intersects the substrate W in a plan view, but closer to the center CT than the optical axis LT2.

[0043] Note that the load port 5, or the load port 5 and the transport robot IR, correspond to the substrate transport device of the present invention. The shutter lifting unit 23 corresponds to the lifting unit of the present invention. The first mapping sensor 27 corresponds to the first mapping sensor of the present invention. The second mapping sensor 28 corresponds to the second mapping sensor of the present invention. The light emitting unit 27A corresponds to the first light emitting unit of the present invention, and the light emitting unit 28A corresponds to the second light emitting unit of the present invention. Also, the light receiving unit 27B corresponds to the first light receiving unit of the present invention, and the light receiving unit 28B corresponds to the second light receiving unit of the present invention. Optical axis LT1 corresponds to the first optical axis. Optical axis LT2 corresponds to the second optical axis.

[0044] The substrate processing apparatus 1 may detect the arrangement state of the substrate W within the carrier C using a method other than mapping using the first mapping sensor 27 and the second mapping sensor 28. For example, the substrate processing apparatus 1 may detect the arrangement state of the substrate W within the carrier C using a camera that captures images of the substrate W.

[0045] Refer to Figures 1, 4, and 8. Next, the transport robot IR will be described. The transport robot IR is located inside the housing 7. The transport robot IR transports the substrate W between the three carriers C of the three load ports 5 and the substrate mounting section PS (described later). For example, a horizontal articulated robot is used as the transport robot IR. The transport robot IR is equipped with multiple hands 41, articulated arms 43, a lifting platform 45, and a height sensor 47.

[0046] The hand 41 is the part used to remove the substrate W from the carrier C. The hand 41 holds the substrate W in a horizontal position. The transport robot IR uses the hand 41 to remove the substrate W from the carrier C placed on the stage 9 and to store the substrate W back into the carrier C.

[0047] The hand 41 is connected to the tip of the articulated arm 43. The base of the articulated arm 43 is connected to a lifting platform 45 so as to be rotatable around a vertical axis. The articulated arm 43 moves the hand 41 horizontally (XY direction). The articulated arm 43 can also change the orientation of the hand 41. The lifting platform 45 moves the hand 41 and the articulated arm 43 vertically (Z direction). The articulated arm 43 and the lifting platform 45 are each equipped with electric motors. A height sensor 47 measures the height position of the hand 41. The height sensor 47 is equipped with, for example, a rotary encoder or a linear encoder.

[0048] In Figure 8, the transport robot IR is equipped with four hands 411, 412, 413, and 414 as hands 41. However, the number of hands 41 equipped with the transport robot IR may be three or less, or five or more.

[0049] The lifting platform 45 moves the hands 411-414 as a single unit. In other words, the pitch of the hands 411-414 does not change when moving using the lifting platform 45.

[0050] Each of the hands 41 has a contact portion 42 that contacts the substrate W when holding the substrate W. The contact portion 42 has an anti-slip function to prevent the substrate W held by the hand 41 from slipping off.

[0051] The transport robot IR further comprises a plurality of brackets 44 that support each of the hands 41, and a linear guide 46 that supports the brackets 44 so as to be movable in the vertical direction. The linear guide 46 includes an inter-hand pitch measuring unit 48 that measures the inter-hand pitch, which is the pitch between the hands 41.

[0052] The hand-to-hand pitch measuring unit 48 may be, for example, a linear encoder. In this case, the hand-to-hand pitch measuring unit 48 can measure the displacement of each of the multiple hands 41 from a set origin height. Since the pitch of the origin heights of the multiple hands 41 is known, the hand-to-hand pitch measuring unit 48 can also measure the hand-to-hand pitch by measuring the displacement from the origin height. In the following description, it is assumed that the hand-to-hand pitch measuring unit 48 is a linear encoder. However, the hand-to-hand pitch measuring unit 48 is not limited to a linear encoder.

[0053] Refer to Figures 9 and 10. The transport robot IR further comprises multiple inter-hand pitch adjustment units 49, each corresponding to one of the multiple hands 41. In Figures 9 and 10, HS1 is the origin height of hand 411, and HS2 is the origin height of hand 412. For simplicity, some hands 41 are omitted in Figures 9 and 10. Also, the linear guide 46 is omitted in Figure 10.

[0054] The hand pitch adjustment unit 49 adjusts the hand pitch, which is the pitch between the hands 41. In Figure 9, two hand pitch adjustment units 49 correspond to one hand 41, but the number of hand pitch adjustment units 49 corresponding to one hand 41 may be one or three or more. The hand pitch adjustment unit 49 comprises a cylinder 49A, a drive shaft 49B, and a driven shaft 49C.

[0055] The cylinder 49A is a cylindrical member having a piston 49D that can move inside. The cylinder 49A is arranged such that the direction of movement of the piston 49D is in the front-rear direction. The drive shaft 49B is an axis parallel to the front-rear direction that moves integrally with the piston 49D. The driven shaft 49C is an axis parallel to the up-down direction that moves in conjunction with the movement of the drive shaft 49B.

[0056] The driven shaft 49C is fixed in position in the horizontal direction. The driven shaft 49C also has an inclined groove 49E that is inclined with respect to the horizontal plane. The drive shaft 49B has a pin 49F that is fitted into the inclined groove 49E and is displaceable along the inclined groove 49E. Therefore, as the piston 49D and drive shaft 49B move in the front-rear direction, the driven shaft 49C moves in the up-down direction.

[0057] The driven shaft 49C is attached to the bracket 44. Therefore, by moving the piston 49D in the forward and backward direction within the cylinder 49A, the height of the hand 41, which is supported by the bracket 44, can be changed.

[0058] Air may be supplied to cylinder 49A via a proportional control valve (not shown). The proportional control valve is a solenoid valve in which the air flow rate changes in proportion to the current. The amount of movement of bracket 44 is expressed by the pulse count of the hand-to-hand pitch measuring unit 48, which is a linear encoder. By inputting a current corresponding to the target value of the pulse count to the proportional control valve, it is possible to control the flow of air into or out of cylinder 49A, thereby moving piston 49D and bracket 44 by the target value. This allows for separate adjustment of the displacement of hand 411 from its origin height HS1 and the displacement of hand 412 from its origin height HS2.

[0059] The hand-to-hand pitch adjustment unit 49 does not necessarily have to include a cylinder 49A; for example, it may be equipped with an electric actuator instead. In this case, the driven shaft 49C can be moved by the electric actuator to adjust the displacement of each hand 41 from its origin height.

[0060] <1-2. Processing Block> Refer to Figure 1. Processing block 3 comprises at least one processing unit 51, a center robot CR, and a substrate mounting section (shelf) PS. The substrate mounting section PS is located between the transport robot IR and the center robot CR. The substrate mounting section PS can hold one or more substrates W.

[0061] The processing unit 51 performs a pre-configured process on the substrate W. For example, the processing unit 51 performs at least one of the following processes: coating a processing solution such as a resist, developing, washing, and polishing (grinding).

[0062] Furthermore, if the processing unit 51 performs a cleaning process, it may be equipped with a brush. Also, if the processing unit 51 performs a polishing (grinding) process, it may be equipped with a polishing tool. In addition, the processing unit 51 may perform a dry etching process, an ashing process, or a film formation process.

[0063] The center robot CR is configured similarly to the transport robot IR. Briefly, the center robot CR is equipped with a hand 61 that holds a substrate W in a horizontal position. The center robot CR moves the hand 61 that holds the substrate W in the horizontal direction (XY direction) and the vertical direction (Z direction). The center robot CR also changes the orientation of the hand 61 around the vertical axis. The center robot CR transports the substrate W between at least one processing unit 51 and the substrate mounting section PS. Note that at least one of the center robot CR and the transport robot IR may have a reciprocating mechanism having, for example, a screw shaft and a guide rail instead of a multi-joint arm. This reciprocating mechanism moves the hand forward and backward.

[0064] <1-3. Control> The substrate processing apparatus 1 further comprises a control unit 71 and a storage unit 73. The control unit 71 controls each component of the substrate processing apparatus 1. The control unit 71 comprises one or more processors, such as a central processing unit (CPU). Based on the arrangement state of the multiple substrates W detected by the first mapping sensor 27 and the second mapping sensor 28, the control unit 71 calculates the hand entry position IH (see Figure 11) into which the hand 41 should enter. The control unit 71 also controls the hand pitch adjustment unit 49 so that the multiple hands 41 of the transport robot IR enter each of the multiple hand entry positions IH. This allows the substrate processing apparatus 1 to optimize the pitch of the hand 41 according to the arrangement state of the substrates W.

[0065] Specifically, the control unit 71 calculates the difference between the hand entry position pitch, which is the pitch between the hand entry positions IH, and the hand pitch measured by the hand pitch measurement unit 48. Furthermore, the control unit 71 controls the hand pitch adjustment unit 49 so that all the calculated differences are below a predetermined threshold.

[0066] Figure 11 shows an example of a method for calculating the hand entry position IH. The hand entry position IH is the height position considering the curvature of the substrate W. Figure 11 is a diagram illustrating the method for calculating the hand entry position IH of the hand 41 inserted between two vertically adjacent substrates WC and WD. In Figure 11, the substrates WC and WD are curved such that the center is lower than the outer edge. The point on the hand 41 that contacts the substrate WC when the substrate WC is removed is called the contact point HP. The height position of the substrate WC at the position where the contact point HP contacts the substrate WC is called the curvature height position HR. In Figure 11, the symbol H0 indicates a height position of 0 (zero). The control unit 71 calculates the hand entry position IH of the hand 41 between the substrate WC and the substrate WD using the following equation (1).

[0067] Hand entry position IH = (Warp height position HR of board WC + Height position TF of the top surface of board WD) ÷ 2 …(1) The clearance between each of the substrates WC and WD and the hand 41 is maximized at the hand entry position IH calculated by equation (1). Here, clearance refers to the distance between the substrate WC or WD closest to the hand 41 and the hand 41. In other words, the clearance is maximized when the smaller of the distance between substrate WC and the hand 41, and the distance between substrate WD and the hand 41, is maximized.

[0068] The control unit 71 controls the hand-to-hand pitch adjustment unit 49 so that the hand 41 enters the hand entry position IH. Therefore, the substrate processing device 1 can optimize the pitch of the hand 41 according to the arrangement of the substrate W.

[0069] (Repeated transport operation) In the example shown in Figure 3, there are 25 substrates W housed in carrier C. In contrast, in the example shown in Figure 4, the number of hands 41 equipped on the transport robot IR is 4. However, generally speaking, in a substrate processing apparatus 1, the number of hands 41 equipped on the transport robot IR is often less than the number of substrates W housed in carrier C when they are placed on stage 9.

[0070] The control unit 71 determines which of the multiple substrates W in the carrier C will be transported in one go by the multiple hands 41 of the transport robot IR. Furthermore, after each transport operation is completed, the control unit 71 switches the substrate W to be transported and repeats the transport operation to transport all the substrates W in the carrier C. In this way, the control unit 71 can transport all the substrates W in the carrier C sequentially.

[0071] The arrangement state of the substrates W detected by the control unit 71 using the first mapping sensor 27 and the second mapping sensor 28 includes the number of substrates W in the carrier C. Based on the number of substrates W in the carrier C and the number of substrates W transported in one transport operation, the control unit 71 can determine whether or not substrates W are present in the carrier C after the transport operation is completed. If substrates W are present in the carrier C after the transport operation is completed, the control unit 71 repeats the transport operation.

[0072] When transport operations are performed repeatedly, even if the hand-to-hand pitch is returned to its initial value after the transport operation is completed, it may be necessary to adjust the hand-to-hand pitch again for the next transport operation. In that case, the adjustment to return the hand-to-hand pitch to its initial value after the transport operation may be wasted.

[0073] Therefore, when repeating a transport operation, the control unit 71 may control the hand pitch adjustment unit 49 so that, at the timing of switching between transport operations, the hand pitch is not returned to its initial value, and instead the multiple hands 41 of the transport robot IR each enter the hand entry position for the next transport operation. This allows the control unit 71 to omit potentially wasted hand pitch adjustments and quickly perform the next transport operation.

[0074] The storage unit 73 includes, for example, at least one of ROM (Read-Only Memory), RAM (Random-Access Memory), and a hard disk. The storage unit 73 stores computer programs necessary to control each component of the board processing device 1. The storage unit 73 also stores various operations (for example, steps S1 to S15 and S151 to S157 described later). The board processing device 1 does not necessarily have to include the storage unit 73, and may be connected to an external storage device that stores the above-mentioned information in a communicative manner.

[0075] Figure 12 shows an example of the operation of the transport robot IR. In Figure 12, five circuit boards W1 to W5 are arranged from top to bottom. The following describes an example in which the transport robot IR uses four hands 411 to 414 to pick up four of these circuit boards W1 to W4.

[0076] First, the control unit 71 measures the position and thickness of each of the substrates W1 to W5. Next, the control unit 71 calculates the optimal hand entry positions IH1 to IH4 for inserting the hand 41 to remove each of the substrates W1 to W4.

[0077] The control unit 71 calculates the pitches PA1 to PA3 between adjacent hands among the hand entry positions IH1 to IH4. The control unit 71 also calculates the pitches PB1 to PB3 between adjacent hands among the hands 411 to 414. Then, the control unit 71 individually adjusts the heights of hands 411 to 414 using the hand pitch adjustment unit 49 so that the difference between pitch PA1 and pitch PB1, the difference between pitch PA2 and pitch PB2, and the difference between pitch PA3 and pitch PB3 are all below a threshold. The threshold may be set considering the pitch of the substrate W in the design of the carrier C, and the thickness of the substrate W, for example, 0.1 mm or 0.05 mm.

[0078] When the difference between each of the pitches PA1 to PA4 and each of the pitches PB1 to PB4 falls below a threshold, the control unit 71 moves the hands 411 to 414 together using the lifting platform 45 so that the position HH of the hand 411 aligns with the hand entry position IH1. As a result, the hands 412 to 414 also move to the hand entry positions IH2 to IH4, respectively.

[0079] (Teaching and calibration process) As described above, the linear guide 46 is equipped with a hand-to-hand pitch measuring unit 48 that can measure the displacement of each of the multiple hands 41 from the origin height. Therefore, in order to measure the hand-to-hand pitch using the hand-to-hand pitch measuring unit 48, it is necessary to teach the origin height of each of the multiple hands 41 to the hand-to-hand pitch measuring unit 48 before starting to use the transport robot IR.

[0080] An optical measurement unit 65 is used for teaching the origin height. The optical measurement unit 65 optically measures the hand-to-handle pitch. As shown in Figure 1, the optical measurement unit 65 is positioned, for example, above the substrate mounting unit PS. The optical measurement unit 65 comprises a light-emitting unit 65A and a light-receiving unit 65B.

[0081] The light-emitting unit 65A emits light L toward the light-receiving unit 65B. Light L is a band of light whose width is in the vertical direction, that is, the direction perpendicular to the plane of the paper in Figure 1. The light-receiving unit 65B receives the light L emitted from the light-emitting unit 65A.

[0082] During teaching, the control unit 71 inserts multiple hands 41 between the light-emitting unit 65A and the light-receiving unit 65B. At this time, at the height where each of the multiple hands 41 is located, the light L is not received by the light-receiving unit 65B. Therefore, the control unit 71 can measure the height of each of the multiple hands 41 by the height at which the light L was not received by the light-receiving unit 65B.

[0083] The control unit 71 inserts each of the multiple hands 41 between the light-emitting unit 65A and the light-receiving unit 65B so as to measure the height at two points in the horizontal direction. For example, as shown in Figure 8, the positions of the two contact points 42 in the front-rear direction are designated as the first position PM1 and the second position PM2. The control unit 71 controls the transport robot IR so that the first position PM1 and the second position PM2 are positioned between the light-emitting unit 65A and the light-receiving unit 65B in that order. For each of the multiple hands 41, the control unit 71 sets the average of the heights at two points in the horizontal direction as the height of that hand 41. The control unit 71 may also insert each of the multiple hands 41 between the light-emitting unit 65A and the light-receiving unit 65B so as to measure the height at three or more points in the horizontal direction.

[0084] The control unit 71 corrects the measurement output value from the hand-to-hand pitch measurement unit 48 based on the measurement results from the optical measurement unit 65. Specifically, during teaching, the control unit 71 adjusts the difference between the average pitch of the heights of each hand 411 to 414 and a predetermined pitch (e.g., 10 mm) so that it is all below a threshold (e.g., 0.1 mm or 0.05 mm). The control unit 71 adjusts the pitch between the hands 41 using the hand-to-hand pitch adjustment unit 49, referring to the pulse count of the hand-to-hand pitch measurement unit 48, which is a linear encoder. As a result, the control unit 71 can measure the hand-to-hand pitch for each of the multiple hands 41 by measuring the displacement amount using the hand-to-hand pitch measurement unit 48, with the adjusted height as the origin.

[0085] Furthermore, even if teaching is performed before the start of use of the transport robot IR, the origin height of the hand 41 in the hand-to-hand pitch measurement unit 48 may change due to deterioration associated with the use of the transport robot IR. For this reason, the control unit 71 may perform a calibration process for the origin height in the same manner as teaching under certain conditions after the start of use of the transport robot IR. Examples of certain conditions include transporting a certain number of substrates W in a certain lot or a certain number of units, or the passage of a certain period of time.

[0086] (Substrate transport method) Figure 13 is a flowchart showing an example of a substrate transport method in the substrate processing apparatus 1. When a carrier C is placed on the stage 9 of any of the load ports 5, the control unit 71 detects this using a load sensor provided on the stage 9 (S1). Upon detecting that a carrier C has been placed on the stage 9, the control unit 71 detects the arrangement of the substrates W within the carrier C using the first mapping sensor 27 and the second mapping sensor 28 (S2). Furthermore, based on the arrangement of the substrates W, the control unit 71 calculates the hand entry position in which the hand 41 should be inserted to pick up each of the substrates W (S3).

[0087] Furthermore, the control unit 71 determines which substrate W to be picked up in a single operation of the transport robot IR from among the substrates W housed in the carrier C (S4). The control unit 71 calculates the pitch for multiple hands 41 (S5), and also calculates the pitch between the hand entry positions corresponding to the substrate W to be picked up (S6).

[0088] The control unit 71 calculates the difference between the pitch of the hand 41 and the pitch between the hand entry positions corresponding to the substrate W to be picked up (S7). Furthermore, the control unit 71 determines whether all of the pitch differences calculated in step S7 are below a threshold (S8). If one or more of the pitch differences calculated in step S7 are not below the threshold (NO in S8), the control unit 71 controls the hand-to-hand pitch adjustment unit 49 to adjust the height of the hand 41 so that the difference becomes below the threshold (S9). In other words, the control unit 71 controls the hand-to-hand pitch adjustment unit 49 so that each of the multiple hands 41 provided by the transport robot IR enters the hand entry position. After that, the control unit 71 repeats the process from step S5.

[0089] If all the pitch differences calculated in step S7 are below the threshold (YES in S8), the control unit 71 moves the hand 41 to the hand entry position corresponding to the substrate W to be removed (S10) and removes the substrate W from the carrier C (S11). Furthermore, the control unit 71 transfers the substrate W removed from the carrier C by the hand 41 to the substrate mounting unit PS (S12).

[0090] After step S12, the control unit 71 determines whether or not a substrate W is present in the carrier C (S13). If a substrate W is present in the carrier C (YES in S13), the control unit 71 repeats the process from step S4. If a substrate W is not present in the carrier C (NO in S13), the control unit 71 determines whether or not a certain number of substrates W have been transported (S14). If a certain number of substrates W have been transported (YES in S14), the control unit 71 performs a calibration process for the origin height in the hand-to-hand pitch measurement unit 48 (S15). The details of the calibration process will be described later. After the calibration process, the control unit 71 terminates the process. If a certain number of substrates W have not been transported (NO in S14), the control unit 71 skips the calibration process and terminates the process.

[0091] Figure 14 is a flowchart illustrating an example of the calibration process. In the calibration process, the control unit 71 moves the hand 41 to the optical measurement unit 65 (S151). The control unit 71 measures the height of the first position PM1 of each hand 41 (S152), and then measures the height of the second position PM2 (S153). Based on this, the control unit 71 calculates the average of the heights of the first position PM1 and the second position PM2 for each hand 41 (S154).

[0092] The control unit 71 determines whether the difference between the average pitch of the heights of each hand 41 and a predetermined pitch is below a threshold (S155). If there is a difference between the average pitch of the heights of each hand 41 and the predetermined pitch that is not below the threshold (NO in S155), the control unit 71 adjusts the height of the hand 41 so that the difference in that pitch is below the threshold (S156), and then repeats the process from step S152. If the difference between the average pitch of the heights of each hand 41 and the predetermined pitch is below the threshold (YES in S155), the control unit 71 calibrates the height of each hand 41 to the origin height of the inter-hand pitch measurement unit 48 corresponding to that hand 41 (S157). The calibration process is then completed. [Explanation of Symbols]

[0093] 1. Substrate processing equipment (substrate transport system) 27. First mapping sensor (substrate detection unit) 28. Second mapping sensor (substrate detection unit) 41, 411, 412, 413, 414 Hand 48. Inter-hand pitch measurement unit (linear encoder) 49 Hand-to-hand pitch adjustment section 65 Optical Measurement Section 71 Control Unit IR transport robot (substrate transport mechanism)

Claims

1. A substrate transport mechanism comprising: multiple hands for removing substrates from a transport container that transports multiple substrates in a shelf-like arrangement; and a hand pitch adjustment unit for adjusting the hand pitch, which is the pitch between the multiple hands; A substrate detection unit for detecting the arrangement of substrates within the transport container, A substrate transport system comprising a control unit and a substrate transport mechanism that removes and transports the substrate from the transport container, The control unit, Based on the arrangement of the multiple substrates detected by the substrate detection unit, the hand entry position into which the hand should be inserted is calculated. A substrate transport system that controls the inter-hand pitch adjustment unit so that multiple hands provided by the substrate transport mechanism enter each of the multiple hand entry positions.

2. The substrate transport mechanism further includes a hand-to-hand pitch measuring unit for measuring the hand-to-hand pitch, The substrate transport system according to claim 1, wherein the control unit calculates the difference between the hand entry position pitch, which is the pitch between a plurality of hand entry positions into which each of the plurality of hands provided in the substrate transport mechanism should be inserted, and the hand pitch, and controls the hand pitch adjustment unit so that all of the differences are less than or equal to a predetermined threshold.

3. The aforementioned hand-to-hand pitch measurement unit is a linear encoder, The substrate transport system according to claim 2, wherein the control unit controls the hand-to-hand pitch adjustment unit based on the output from the linear encoder.

4. The system further includes an optical measuring unit for optically measuring the pitch between the hands, The substrate transport system according to claim 3, wherein the control unit corrects the measurement output value from the linear encoder based on the measurement result from the optical measurement unit.

5. The substrate transport system according to claim 1, wherein the control unit determines, from among the plurality of substrates in the transport container, the substrate to be transported all at once by the plurality of hands provided by the substrate transport mechanism, and after each transport operation is completed, switches the substrate to be transported and repeats the transport operation to transport all the substrates in the transport container.

6. The substrate transport system according to claim 5, wherein the control unit controls the hand-to-hand pitch adjustment unit so that, when the transport operation is repeated, the hand-to-hand pitch is not returned to its initial value at the timing of the switchover of the transport operation, and the plurality of hands provided by the substrate transport mechanism each enter the hand entry position in the next transport operation.

7. A substrate transport system comprising a substrate transport mechanism having multiple hands for removing substrates from a transport container that transports multiple substrates in a shelf-like arrangement, and a hand pitch adjustment unit for adjusting the hand pitch, which is the pitch between the multiple hands, and a substrate detection unit for detecting the arrangement of substrates in the transport container, wherein the substrate transport mechanism removes the substrates from the transport container and transports them, and a substrate transport method in the substrate transport system, Based on the arrangement of the multiple substrates detected by the substrate detection unit, the hand entry position into which the hand should be inserted is calculated. A substrate transport method comprising controlling the inter-hand pitch adjustment unit so that multiple hands provided by the substrate transport mechanism enter each of the multiple hand entry positions.

Images