Method for making a relief pattern and a relief pattern made by this method
The method of etching, UV exposure, and thermoforming in transparent films creates three-dimensional, illuminated patterns with high contrast and flexibility, addressing the limitations of existing films by enabling both raised and illuminated designs with low energy consumption.
Patent Information
- Application Number
- JP2025533199
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2022-12-08
- Filing Date
- 2023-11-28
- Publication Date
- 2026-01-06
AI Technical Summary
Existing transparent films for guiding light lack the ability to create both raised and illuminated patterns effectively, limiting their decorative and signaling capabilities.
A method involving etching patterns into a transparent film, exposing it to ultraviolet radiation for polymerization, and forming a raised pattern through thermoforming, allowing for both three-dimensional and illuminated designs with high contrast and low energy consumption.
The method enables the creation of three-dimensional, illuminated structures with high contrast and flexibility, maintaining low energy consumption, and allows for multiple patterns with different colors using multiple light sources.
Smart Images
Figure 2026500197000001_ABST
Abstract
Description
[Technical Field]
[0001] The technical field of the invention is that of signalling and lighting.
[0002] The present invention relates to a method for producing a relief pattern in a transparent film suitable for guiding light. Another subject of the present invention is a relief pattern produced in a transparent film suitable for guiding light. The present invention also relates to a decorative structure comprising a relief pattern and a transparent film suitable for guiding light. [Background technology]
[0003] Transparent films suitable for guiding light are used in the fields of signaling and lighting.
[0004] Figure 1a shows an example of a transparent film used as a display screen according to the prior art. Such a device comprises a transparent film with a thickness of several tens of micrometers, a light source attached to one of the sides of the transparent film, and one or more microstructured patterns etched into the top surface of the transparent film. Light emitted by the light source propagates within the transparent film by total internal reflection. The microstructured patterns allow the light to be extracted and made visible from the outside. Figure 1b illustrates one of the advantages of these devices, namely their flexibility and small size.
[0005] Other known advantages of lighting and signalling devices based on transparent films are their brightness and low energy consumption. These devices allow for high contrast even in daylight.
[0006] It is desired to create a raised pattern in a transparent film suitable for directing light. Summary of the Invention [Problem to be solved by the invention]
[0007] The present invention provides a solution to the above-mentioned problems by featuring a method for creating a raised pattern in a transparent film suitable for directing light. [Means for solving the problem]
[0008] One aspect of the invention is a method for creating a raised pattern in a transparent film suitable for directing light, the transparent film comprising a first layer of a first transparent material, the method comprising: - etching a pattern into the first layer of transparent material suitable for extracting light guided in the transparent film; - exposing and / or polymerizing the transparent film using ultraviolet radiation; - forming a raised pattern in an area of the transparent film; The present invention relates to a method comprising:
[0009] The present invention makes it possible to combine etched patterns (specifically patterns illuminated by light guided within a transparent film) with raised patterns, in other words, the present invention makes it possible to obtain both raised and illuminated patterns.
[0010] The invention makes it possible to obtain logos, decorative structures and light signatures that are not only three-dimensional and raised, but also illuminated.
[0011] A transparent film suitable for guiding light is understood to mean a film that makes it possible to confine light by total internal reflection.
[0012] Etching a pattern into the first layer of transparent material suitable for extracting light guided in the transparent film is understood to mean forming a structured pattern on the top surface of the transparent film, which may be done, for example, by photolithography.
[0013] Exposure of a transparent film with ultraviolet radiation is understood to mean illuminating the film so as to fix the pattern to be etched, with the purpose of printing the pattern.
[0014] Forming a relief pattern is understood to mean deforming a transparent film suitable for guiding light in order to obtain the desired relief pattern, which is possible thanks to the high flexibility of the transparent film used for guiding light (which allows the film to adhere to a mold during the formation of the relief pattern, for example by thermoforming).
[0015] The invention makes it possible to obtain three-dimensional structures that are illuminated with high contrast and brightness even in the daytime, while at the same time maintaining low energy consumption. It is possible to obtain
[0016] The invention makes it possible to obtain a structure that is not only flexible but also lightweight.
[0017] Advantageously, the step of forming the relief pattern is a step of three-dimensionally shaping the transparent film.
[0018] Advantageously, the step of forming the relief pattern is a step of thermoforming a transparent film; thermoforming makes it possible to produce three-dimensional patterns in a simple and reproducible manner.
[0019] The step of forming the embossed pattern is carried out by pressing onto the transparent film; forming under pressure has the advantage of allowing greater precision in molding details.
[0020] The raised pattern is advantageously a logo, or a light signature, or a decorative pattern.
[0021] Advantageously, the step of exposing the transparent film with ultraviolet radiation includes a step of polymerizing the transparent film; the polymerization of the transparent film makes it possible to fix in place a pattern suitable for extracting light.
[0022] Advantageously, the method according to the invention further comprises a step of producing reference marks in the transparent film, which are suitable for positioning a pattern suitable for extracting light relative to the relief pattern; the reference marks make it possible to precisely position the illuminated pattern relative to the three-dimensional pattern so as to obtain the desired effect.
[0023] The transparent film comprises an integer number N of layers of transparent material greater than or equal to 1 superimposed on a first layer of a first transparent material, and the method advantageously comprises, prior to the step of exposing the transparent film, a step of etching at least one pattern into at least one of the N layers of transparent material that is different from the first layer; this step makes it possible to obtain multiple patterns that are illuminated by light.
[0024] A second aspect of the invention relates to a relief pattern obtained by a method having at least one of the above characteristics.
[0025] A third aspect of the invention is a decorative structure that can be illuminated, comprising: 1. A relief pattern obtained by a method having at least one of the above characteristics; 2. A light guide having a first layer of transparent material; 3. A light source for illuminating the light guide; Equipped with the light guide is positioned to direct light rays generated by the light source into the first layer of transparent material to illuminate the etched pattern; It concerns decorative structures.
[0026] According to one embodiment, the decorative structure comprises: 1. N separate light guides; 2. N separate light sources for illuminating the N light guides, respectively, wherein the N light sources emit light in different spectral regions; The N distinct light guides are positioned to direct light rays from one of the N distinct illumination sources into a corresponding one of the N layers of transparent material to illuminate at least one distinct pattern.
[0027] These features make it possible to obtain multiple illuminated patterns, each pattern having a different color.
[0028] The invention and its various applications will be more clearly understood from a reading of the following description and a study of the accompanying drawings, in which:
[0029] The drawings are presented as representations and do not limit the invention in any way. [Brief explanation of the drawings]
[0030] [Figure 1a] 1A and 1B show examples of display screens according to the prior art. [Figure 1b] 1A and 1B show examples of display screens according to the prior art. [Figure 2] 1A-1C illustrate a method for creating a raised pattern according to the present invention. [Figure 3] 1A and 1B are diagrams showing examples of embossed patterns according to the present invention. [Figure 4] 1A-1C illustrate examples of transparent films suitable for directing light, comprising multiple layers of transparent material. DETAILED DESCRIPTION OF THE INVENTION
[0031] The drawings are presented as representations and do not limit the invention in any way.
[0032] Figures 1a and 1b show examples of display screens with transparent films suitable for directing light according to the prior art. Figures 1a and 1b have been described with respect to the prior art.
[0033] 2 illustrates a method 200 for creating a relief pattern in a transparent film suitable for directing light, according to the present invention. The transparent film comprises a first layer of a first transparent material.
[0034] The method 200 according to the invention comprises a step 201 of etching into a first layer of transparent material a pattern suitable for extracting light guided inside the transparent film. This step makes it possible to define the shape of the pattern illuminated by light propagating inside the transparent film. According to one embodiment, the etching step 201 is a micro-etching step.
[0035] The method 200 according to the invention further comprises a step 202 of exposing the transparent film with ultraviolet radiation, which makes it possible to fix in place the pattern etched in step 201. According to one embodiment, the exposure step 202 further comprises a step of polymerizing the transparent film.
[0036] According to one embodiment, the method 200 according to the invention further comprises a step 203 of creating fiducial marks in the transparent film, the fiducial marks being configured to position a pattern suitable for extracting light relative to the relief pattern, which allows for precise alignment of the relief and illuminated patterns to achieve the desired effect.
[0037] The method 200 according to the present invention further comprises the step 204 of forming a raised pattern in an area of the transparent film.
[0038] According to one embodiment, forming the relief pattern 204 is a step of thermoforming a transparent film, which, due to its flexibility, can adhere to the mold during the thermoforming step.
[0039] According to another embodiment, step 204 of forming the raised pattern is performed by pressing onto a transparent film.
[0040] According to one embodiment of the method 200 according to the invention, the transparent film comprises an integer number N of layers of transparent material that are superimposed with a first layer of a first transparent material, the method 200 then comprising, prior to the step of exposing the transparent film, a step 201N of etching at least one further pattern into at least one of the N layers of transparent material.
[0041] This embodiment makes it possible to obtain a raised pattern with several independent illuminated patterns.
[0042] 3 shows an example of a decorative structure 300 with a raised pattern 301. The decorative structure 300 further comprises a transparent film or light guide 302.
[0043] The device 300 according to the invention further comprises a light source 303 suitable for introducing light into the waveguide 302 .
[0044] The light guide 302 comprises a first layer of transparent material in which one or more patterns 304 are etched. The patterns 304 are suitable for extracting light propagating within the guide 302. For this reason, the patterns 304 are illuminated when the device 300 is illuminated.
[0045] In the example shown in FIG. 3, an etched pattern 304 surrounds a raised pattern 301 .
[0046] According to another embodiment of the decorative structure 300, the decorative structure further comprises N further light guides and N further light sources, Figure 4 shows the case where N=3.
[0047] 4, which illustrates another exemplary embodiment of a decorative structure 300. In this case, the decorative structure 300 comprises a first light source S1, a second light source S2, and a third light source S3. The structure 300 further comprises a first light guide G1, a second light guide G2, and a third light guide G3. For example, the first light guide G1, the second light guide G2, and the third light guide G3 have a parallelepiped shape.
[0048] The transparent film 302 has a multi-layer structure, has a front surface and a rear surface, and includes a first layer C1, a second layer C2, and a third layer C3. The first layer C1, the second layer C2, and the third layer C3 are superimposed. The front surface and the rear surface are substantially parallel. The transparent film 302 is flexible. Typically, the thickness of the first layer C1, the second layer C2, and the third layer C3 is about 50 microns.
[0049] The first layer C1 includes first microetched portions that form a first pattern M1. The second layer C2 includes second microetched portions that form a second pattern that is different from the first pattern M1. The third layer C3 includes third microetched portions that form a third pattern that is different from both the first pattern M1 and the second pattern M2. The second and third patterns are not shown in FIG. 4.
[0050] Typically, the first microetch, the second microetch, and the third microetch are etched (using an ultraviolet radiation printing method) into the first layer C1, the second layer C2, and the third layer C3, respectively.
[0051] According to one embodiment, each of the N light guides has a different etched pattern, thus allowing each etched pattern to be independently illuminated with a different wavelength.
[0052] Each light source is suitable for introducing light into one of the light guides. According to an embodiment, the N light sources may emit in different spectral regions.
[0053] When light enters the first layer C1, only the portions of the first layer C1 with the first micro-etchings will diffuse the light, or in other words, be illuminated. When light enters the second layer C2, only the portions of the second layer C2 with the second micro-etchings will diffuse the light, or in other words, be illuminated. When light enters the third layer C3, only the portions of the third layer C3 with the third micro-etchings will diffuse the light, or in other words, be illuminated.
[0054] Each of the first layer C1, the second layer C2, and the third layer C3 can be made of polycarbonate, PMMA, PET (polyethylene terephthalate), or TPU (thermoplastic polyurethane). For example, the first layer C1, the second layer C2, and the third layer C3 can be parts manufactured by Azumo™. These parts have a transparency of over 97%, a light extraction efficiency of between 25 and 80% when illuminated, and a light intensity of 100 to 1000 cd / m when illuminated by a luminous flux source. 2 The brightness can range from .gtoreq..gtoreq.1.
[0055] The transparent film 302 has a light incident surface 305. The light incident surface 305 is substantially perpendicular to the front and rear surfaces. For example, the light incident surface 305 is formed by one of the two side edges of the transparent film 302.
[0056] Referring to the example of Figure 4, a first light guide G1, a second light guide G2, and a third light guide G3 are stacked on top of each other. The first light guide G1, the second light guide G2, and the third light guide G3 are also adjacent to the light incident surface 6 to ensure optical coupling with the light incident surface 6. The first light guide G1 is juxtaposed with the first layer C1. The second light guide G2 is juxtaposed with the second layer C2. The third light guide G3 is juxtaposed with the third layer C3.
[0057] The first light source S1 is configured to emit a first light beam and is positioned so that the first beam illuminates the first light guide G1, for example, facing one end of the first light guide G1.
[0058] The second light source S2 is configured to emit a second light beam and is positioned so that the second beam illuminates the second light guide G2, for example, facing one end of the second light guide G2.
[0059] The third light source S3 is configured to emit a third light beam and is positioned so that the third light beam illuminates the third light guide G3, for example, facing one end of the third light guide G3.
Claims
1. A method (200) for creating a raised pattern in a transparent film suitable for guiding light, said transparent film comprising a first layer of a first transparent material, said method (200) comprising: - etching (201) into the first layer of transparent material a pattern suitable for extracting light guided in the transparent film; forming (204) said relief pattern in an area of said transparent film; The method (200) comprises:
2. The method (200) of the preceding claim, wherein the raised pattern is a logo.
3. 10. The method (200) according to any of the preceding claims, wherein the step of forming (204) a raised pattern is a step of three-dimensionally shaping the transparent film.
4. The method (200) according to the preceding claim, characterized in that the step of three-dimensionally shaping the transparent film is a thermoforming step.
5. The method (200) of claim 1, wherein forming the raised pattern (204) is performed by pressing onto the transparent film.
6. 10. The method (200) according to any one of the preceding claims, further comprising a step (203) of creating reference marks in the transparent film, the reference marks being configured to position a pattern suitable for extracting the light relative to the embossed pattern.
7. 10. A method (200) according to any one of the preceding claims, characterized in that the transparent film comprises an integer number N of layers of transparent material that is greater than or equal to one and that are superimposed on the first layer of the first transparent material, the method comprising a step of etching at least one further pattern into at least one of the N layers of transparent material and also comprising a step of exposing and / or polymerizing the film.
8. A raised pattern produced by the method according to any one of the preceding claims.
9. A decorative structure (300) that can be illuminated, comprising: - a raised pattern (301) according to claim 8, and a light guide (302) comprising a first layer of transparent material; a light source (303) for illuminating said light guide; Equipped with - said light guide is positioned to direct light rays originating from said light source into said first layer of transparent material to illuminate the etched pattern (304); Decorative structure (300).
10. 10. The decorative structure of claim 9, wherein the raised pattern is produced by the method of claim 7, N further light guides, - N further light sources for illuminating each of the N light guides, the N light sources emitting in different spectral regions, the N further light guides positioned to direct light rays from one of the N further light sources into a corresponding one of the N layers of transparent material to illuminate at least one further pattern.