Multi-station process tool with precursor distribution system

Abstract

Examples of precursor distribution systems and their operating methods for multi-station process tools are disclosed. One example provides a multi-station process tool comprising two or more process stations, a precursor source, and a dose-diverter valve assembly operable to selectively direct a precursor flow received from the precursor source between a dose path and a divert path. The dose-diverter valve assembly includes a precursor inlet for receiving a precursor flow from the precursor source, a dose valve operable to selectively provide the precursor flow to a dose path, and a divert valve operable to selectively provide the precursor flow to a divert path. The multi-station process tool further comprises a dose line having two or more branches. The dose line is connected to the dose valve and each branch of the dose line so as to be fluidly coupled to the corresponding process station.

Description

Background Art

[0001] The semiconductor device fabrication process involves many steps of material deposition, patterning, and removal to form an integrated circuit on a substrate. Various methods can be used to deposit a film of material on the substrate. As an example, atomic layer deposition (ALD) forms a film using one or more deposition cycles. In the dose stage of an ALD cycle, a film precursor is adsorbed onto the surface of a substrate placed in a processing chamber. Excess film precursor is purged from the processing chamber. And in the conversion stage of the ALD cycle, the adsorbed film precursor is chemically converted into a film on the substrate, for example, by oxidation. A highly conformal film of a target thickness can be grown using one or more ALD cycles.

Summary of the Invention

Problems to be Solved by the Invention

[0002] This summary is provided to introduce, in a simplified form, a selection of concepts that are further described in the detailed description below. This summary is not intended to identify key features or essential features of the claimed subject matter, nor is it intended to be used to limit the scope of the claimed subject matter. Further, the claimed subject matter is not limited to implementations that solve any or all of the disadvantages described in any part of this disclosure.

Means for Solving the Problems

[0003] Disclosed are dose divert valve assemblies for precursor distribution systems for multi-station process tools, and examples relating to multi-station process tools having such dose divert valve assemblies. One example provides a multi-station process tool comprising two or more process stations. The multi-station process tool further comprises a precursor source. The multi-station process tool further comprises a dose divert valve assembly operable to selectively guide a precursor flow received from the precursor source between a dose path and a divert path. The dose divert valve assembly includes a precursor inlet for receiving the precursor flow from the precursor source. The dose divert valve assembly further comprises a dose valve operable to selectively provide the precursor flow to a dose path. The dose divert valve assembly further comprises a divert valve operable to selectively provide the precursor flow to a divert path. The multi-station process tool further comprises a dose line comprising two or more branches. The dose line is connected to a dose valve. Each branch of the dose line fluidly couples a precursor source to a corresponding process station among the two or more process stations.

[0004] In some such examples, the dose divert valve assembly is a first dose divert valve assembly. The dose path comprises a dose manifold to which the first dose divert valve assembly is coupled. The precursor source is a first precursor source. The multi-station process tool further comprises a second precursor source and a second dose divert valve assembly. The second precursor source is fluidly coupled to the second precursor source and the dose manifold.

[0005] Additionally or alternatively, in some such examples, the Dose manifold further includes a purge gas inlet for receiving purge gas from a purge gas source.

[0006] Additionally or alternatively, in some such examples, the divert path comprises a divert manifold to which a first dose divert valve assembly and a second dose divert valve assembly are fluid-coupled. The multi-station process tool further comprises a divert line connected to the divert manifold.

[0007] Additionally or alternatively, in some such examples, a multi-station process tool has four or more process stations, and a Dose line has four or more branches.

[0008] Additionally or alternatively, in some such examples, two or more branches project radially outward from the upstream segment of the Dawes line.

[0009] Additionally or alternatively, in some such examples, two or more process stations are housed in the same processing chamber.

[0010] Additionally or alternatively, in some such examples, the first of two or more process stations is housed in a first processing chamber, and the second of two or more process stations is housed in a second processing chamber.

[0011] Additionally or alternatively, in some such examples, the multi-station process tool further includes a controller. The controller is configured to control the opening and closing timing of dose valves, as well as the opening and closing timing of divert valves.

[0012] Another example provides a precursor distribution system for a multi-station process tool. The system comprises a dose-diverter valve assembly operable to selectively direct a precursor flow received from a precursor source between a dose path and a divert path. The dose-diverter valve assembly includes a precursor inlet for receiving the precursor flow from the precursor source. The dose-diverter valve assembly further includes a dose valve operable to selectively supply the precursor flow to a dose path. The dose-diverter valve assembly further includes a divert valve operable to selectively supply the precursor flow to a divert path. The system further comprises a dose line having two or more branches, the dose line configured to connect to a dose valve. Each branch of the dose line is configured to be fluidly coupled to a corresponding process station among two or more process stations of a multi-station process tool.

[0013] In some such examples, the dose divert valve assembly is a first dose divert valve assembly, and the precursor source is a first precursor source. The system further comprises a second dose divert valve assembly operable to selectively guide a second precursor flow received from a second precursor source between a second dose path and a second divert path. The second dose divert valve assembly includes a second precursor inlet for receiving a second precursor flow from the second precursor source. The second dose divert valve assembly further comprises a second dose valve operable to selectively provide a second precursor flow from the second precursor source to a second dose path. The second dose divert valve assembly further comprises a second divert valve operable to selectively provide a second precursor flow from the second precursor source to a second divert path.

[0014] Additionally or alternatively, in some such examples, the dose path of a first dose divert valve assembly and the second dose path of a second dose divert valve assembly comprise a dose manifold into which the first dose divert valve assembly and the second dose divert valve assembly are fluid-coupled.

[0015] Additionally or alternatively, in some such examples, the Dose manifold further includes a purge gas inlet for receiving purge gas from a purge gas source.

[0016] In addition or alternatively, in some such examples, the system comprises a divert manifold into which a first dose divert valve assembly and a second dose divert valve assembly are fluid-coupled. The system further comprises divert lines configured to connect to the divert manifold.

[0017] Additionally or alternatively, in some such examples, the divert path of the first dose divert valve assembly and the second divert path of the second dose divert valve assembly comprise a divert manifold.

[0018] Additionally or alternatively, in some such examples, the Dose line has four or more branches for four or more process stations.

[0019] Additionally or alternatively, in some such examples, two or more branches are configured to project radially outward from the upstream segment of the Dause line.

[0020] Additionally or alternatively, in some such examples, the dose valve and divert valve can operate independently.

[0021] Another example provides a method of operating a precursor delivery system for a multi-station process tool. The method includes controlling a dose valve of a dose divert valve assembly to open over a target dose duration prior to a dose stage of two or more process stations to provide a precursor flow to a dose path. The method further includes controlling the dose valve to close at the end of the target dose duration. The method further includes controlling a divert valve of the dose divert valve assembly to open at a target divert timing associated with the end of the target dose duration to provide the precursor flow to a divert path.

[0022] In some such examples, the method further includes providing the precursor flow to the dose divert valve assembly as a fill volume at a target pressure differential above a chamber pressure within one or more process chambers housing two or more process stations prior to the dose valve being controlled to open. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] [Figure 1] FIG. 1 schematically shows an example of a multi-station process tool for performing atomic layer deposition. [Figure 2A] FIG. 2 schematically shows an exemplary configuration of the multi-station process tool of FIG. 1. [Figure 2B] FIG. 3 schematically shows an exemplary configuration of the multi-station process tool of FIG. 1. [Figure 2C] FIG. 4 schematically shows an exemplary configuration of the multi-station process tool of FIG. 1. [Figure 2D] FIG. 5 schematically shows an exemplary configuration of the multi-station process tool of FIG. 1. [Figure 2E] FIG. 6 schematically shows an exemplary configuration of the multi-station process tool of FIG. 1. [Figure 2F] FIG. 7 schematically shows an exemplary configuration of the multi-station process tool of FIG. 1. [Figure 2G] FIG. 1 schematically shows an exemplary configuration of a multi-station process tool. [Figure 2H] FIG. 1 schematically shows an exemplary configuration of a multi-station process tool. [Figure 3] FIG. 1 schematically shows an exemplary configuration of a precursor distribution system of a multi-station process tool. [Figure 4] FIG. 4 shows an example of a portion of a precursor distribution system according to the configuration in which various components are integrated with the manifold body. [Figure 5] FIG. 14 is a flowchart showing an exemplary method of operating a dose divert valve assembly in an ALD tool. [Figure 6] FIG. 17 schematically shows an exemplary computing system DETAILED DESCRIPTION OF THE INVENTION

[0024] The term "assembly" generally refers to an aggregation of two or more objects or components. The term "dose and divert valve assembly" generally refers to an assembly comprising a dose valve and a divert valve.

[0025] The term "atomic layer deposition" (ALD) generally refers to a process of forming a film on a substrate with one or more individual layers by conformally and sequentially adsorbing precursors onto the substrate and reacting the adsorbed precursors to form a film layer. Examples of ALD processes include plasma enhanced ALD (PEALD) and thermal ALD (TALD). PEALD and TALD utilize a plasma and heat of a reactive gas, respectively, to facilitate the chemical conversion of the precursors adsorbed on the substrate into a film on the substrate. The terms "growth" and "deposition", as well as their variants, can also be used to refer to film formation.

[0026] The term "divert" generally refers to the act or function of directing a material or object away from a different path.

[0027] The term "diverter valve" generally refers to a machine configured to selectively divert fluid flow to a diverted path.

[0028] The term "dose" generally refers to exposing a substrate to a precursor over a certain period of time.

[0029] The term "Dose valve" generally refers to a machine configured to selectively direct fluid flow into a Dause path.

[0030] The term "fluid communication" generally refers to a structural configuration that allows a fluid substance, such as a liquid or gas, to flow from one location to another.

[0031] The term "manifold" generally refers to a machine or structure that connects or combines multiple inputs or outputs.

[0032] The term "plasma" generally refers to a gas containing cations and free electrons. Plasma can be used to generate reactive chemical species from precursor molecules introduced into it.

[0033] The term "plasma generator" generally refers to hardware configured to form plasma for processing substrates within a processing chamber.

[0034] The term "precursor" generally refers to a chemical compound that participates in a chemical reaction to produce a product.

[0035] The term "processing chamber" generally refers to an enclosure in which chemical and / or physical processes are carried out on a substrate. The pressure, temperature, and atmospheric composition within the processing chamber are controllable to perform the chemical and / or physical processes.

[0036] The term "process station" generally refers to a station within a substrate process tool that performs one or more process techniques on a substrate. A process tool may have multiple process stations within a processing chamber. Alternatively or additionally, a process tool may have multiple different process stations within different processing chambers.

[0037] The term "process tool" generally refers to a machine comprising a processing chamber and other hardware configured to perform substrate processing.

[0038] The term "purging" and its variations refer to the process of removing species from a processing chamber.

[0039] The term "showerhead" generally refers to a process chemical outlet containing multiple pores distributed across an area.

[0040] The term "valve" generally refers to a machine configured to control, regulate, and / or guide the flow of fluid.

[0041] As briefly introduced above, atomic layer deposition (ALD) allows for the growth of a film on a substrate layer by layer using one or more ALD cycles. Each ALD cycle forms one layer of the film. In an ALD cycle, the substrate in the processing chamber is first exposed to a precursor during the dose phase of the ALD cycle. The precursor adsorbs onto the substrate in a self-limiting reaction. The processing chamber is then purged of excess precursor, and the adsorbed precursor is chemically converted into a film on the substrate during the conversion phase of the ALD process.

[0042] The precursor flow can be controlled at the ALD tool's process station using a dose valve and a divert valve. During the dose phase of the ALD cycle, the dose valve associated with the process station is opened to deliver the precursor flow to the substrate. When not in the dose phase, the dose valve is closed and the divert valve is opened to divert the precursor flow to the exhaust system. This maintains a stable precursor flow that can be quickly supplied to the process station when needed.

[0043] In multi-station process tools, station-specific dose valves and divert valves can be used. The use of station-specific dose valves and divert valves allows them to be placed near the process chemical inlet at each process station. However, the use of separate dose valves and divert valves for each process station can be expensive. Furthermore, each dose valve and divert valve requires separate maintenance.

[0044] Accordingly, an example of a precursor distribution system for a multi-station process tool is disclosed, in which the same dose valve and the same divert valve are used to control the precursor flow to multiple process stations. The term “dose divert valve assembly” is used to refer to an assembly containing a dose valve and a divert valve. In one example, the precursor distribution system comprises a dose divert valve assembly operable to selectively direct a precursor flow received from a precursor source between a dose path and a divert path. The dose divert valve assembly includes a precursor inlet for receiving a precursor from the precursor source. The dose divert valve assembly further includes a dose valve operable to selectively provide a precursor flow to a dose path. The dose divert valve assembly further includes a divert valve operable to selectively provide a precursor flow to a divert path. The precursor distribution system further comprises a dose line having two or more branches. The dose line is connected to a dose valve. Each branch of the dose line is fluid-coupled to a corresponding process station.

[0045] The disclosed precursor distribution system has fewer valves compared to a precursor distribution system having station-specific dose valves and divert valves. Furthermore, the disclosed precursor distribution system can simplify the precursor flow control hardware by eliminating the need for separate valves to control the precursor flow from separate precursor sources to a common dose line.

[0046] Placing the dose divert valve assembly of the disclosed precursor distribution system upstream of the station branch in the dose line may increase the delay between the opening of the dose valve and the delivery of the precursor to the process station compared to a precursor distribution system with station-specific dose valves and divert valves. This delay in the precursor flow can be addressed by advancing the timing of the opening of the dose valve relative to the dose stage. Alternatively or additionally, this delay in the precursor flow can be addressed by increasing the pressure difference between the precursor flow and the chamber pressure in the processing chamber. Alternatively or additionally, this delay in the precursor flow can also be addressed by reducing the cross-sectional area of ​​the dose line compared to current precursor distribution systems for multi-station process tools.

[0047] Figure 1 schematically shows an example of a multi-station tool 100 for performing atomic layer deposition. The process tool 100 comprises one or more processing chambers. A first processing chamber 102-1 is shown in Figure 1. Processing chamber 102-1 comprises a first process station 104-1. Process station 104-1 comprises a pedestal 106 for supporting a substrate 108. The pedestal 106 includes a substrate heater 110 configured to heat the substrate 108.

[0048] The process station 104-1 further comprises a process gas outlet 112. In the illustrated example, the process gas outlet 112 comprises a showerhead for directing the process gas over an area of ​​the substrate 108. In other examples, the process station 104-1 may optionally or additionally comprise a nozzle or other outlet structure.

[0049] In the example shown in Figure 1, the process gas outlet 112 is fluidly connected to a remote plasma generator (RPG) 114. The RPG 114 is configured to generate radical species from a gas-phase or vapor-based precursor. Alternatively or additionally, in some examples, the process gas outlet 112 and / or pedestal 106 can be configured as electrodes for generating a capacitively coupled plasma for generating reactive species within the processing chamber 102-1. Furthermore, in some examples, the RPG 114 can be omitted.

[0050] Figure 1 schematically shows additional process stations of the multi-station process tool 100, including a second process station 104-2 through an optional nth process station 104-N. The term "N" as used in various examples herein refers to any one or more instances beyond the last numbered instance of the referenced structure. Some or all of the second process stations 104-2 through the nth process station 104-N may be located within the processing chamber 102-1 of the process tool 100, as will be further described with reference to Figures 2A–2C. In some examples, some of the second process stations 104-2 through the nth process station 104-N may be located within one or more other processing chambers of the process tool 100, as will be further described with reference to Figures 2D–2G. Each of the process stations 104-2 through 104-N may include a substrate holder, a substrate heater, a process gas outlet, a plasma generator, and / or other hardware for processing the substrate.

[0051] The process tool 100 may further comprise one or more precursor sources. The precursor sources can take various forms. In some examples, the precursor source may include a compressed gas. In other examples, the precursor source may include a condensed phase precursor that is vaporized for delivery to a process station. Figure 1 shows an exemplary precursor source in the form of an ampoule 116 configured to hold a condensed phase precursor. The ampoule 116 comprises a flow-over vapor (FOV) gas inlet 122 for flowing a carrier gas from a carrier gas source 124 into the ampoule 116. The FOV gas inlet 122 may include a mass flow controller for controlling the flow of the carrier gas. The ampoule 116 further comprises an FOV gas outlet 126. As the carrier gas flows through the ampoule 116, the carrier gas flows over the surface of the precursor and draws the vapor of the precursor through the FOV gas outlet 126. Exemplary carrier gases include nitrogen and argon. Further exemplary carrier gases include helium, neon, krypton, and xenon.

[0052] The multi-station process tool 100 further comprises a precursor distribution system 120 that distributes a precursor stream received from one or more precursor sources (e.g., precursor source 118) to each of the process stations 104-1 to 104-N or to the exhaust system 131.

[0053] For example, a portion of the gas from the precursor distribution system 120 flows to process station 104-1 and then flows onto the substrate through process gas outlet 112. Another portion of the gas from the precursor distribution system 120 flows into each of the second process station 104-2 through the Nth process station 104-N.

[0054] As will be further described with reference to Figure 3, the precursor distribution system 120 includes one or more dose divert valve assemblies 130. Each dose divert valve assembly 130 is operable to selectively guide the precursor flow received from a precursor source (e.g., 118) between dose paths fluid-coupled to two or more process stations (e.g., 104-1 to 104-N) or divert paths fluid-coupled to the exhaust system 131.

[0055] The precursor distribution system 120 can further receive purge gas from the purge gas source 138 and guide the purge gas to each of the process stations 104-1 to 104-N. For example, a portion of the purge gas from the precursor distribution system 120 flows to process station 104-1 through the process gas outlet 112. Another portion of the purge gas from the precursor distribution system 120 flows into each of the second process station 104-2 through the nth process station 104-N.

[0056] The process tool 100 further comprises an RPG gas manifold 132 and an RPG gas distribution system 134. The RPG gas manifold 132 is fluidly connected to one or more RPG gas sources 136 and / or purge gas sources 138. The gas from the RPG gas manifold 132 is led to the RPG gas distribution system 134. The RPG gas distribution system 134 is configured to distribute gas between RPGs for different process stations (e.g., RPG 114, and RPGs for the second process station 104-2 through the Nth process station 104-N). Furthermore, as described above, some examples may omit the remote plasma generator.

[0057] The process tool 100 further comprises a high-frequency power supply 144 electrically connected to the RPG 114. The process tool 100 further comprises a matching network 146 for impedance matching of the high-frequency power supply 144. The RPG 114 may, for example, comprise a capacitively coupled plasma generator or an inductively coupled plasma generator. In other examples, the RPG may comprise a microwave plasma generator.

[0058] The controller 148 is operably coupled to controllable components of the process tool 100. For example, the controller 148 is operably coupled to the substrate heater 110, RPG 114, precursor source 118, dose divert valve assembly of the precursor distribution system 120 (e.g., 130), exhaust system 131, RPG gas manifold 132, and high-frequency power supply 144, as well as the matching network 146. The controller 148 can be further operably coupled to any other suitable controllable components of the process tool 100. The controller 148 is configured to control various functions of the process tool 100 in order to perform the ALD process.

[0059] Figures 2A to 2H schematically illustrate exemplary configurations of the multi-station process tool 100 of Figure 1. In Figures 2A to 2H, the same numbering is used for corresponding parts of each configuration. Figure 2A schematically illustrates an exemplary configuration of the multi-station process tool 100 that includes two process stations 104-1 and 104-2 housed in a processing chamber 102-1. In this example, the dose line 210 comprises two branches 212-1 and 212-2 that fluidly couple a precursor source 118 to process stations 104-1 and 104-2. Branch 212-1 fluidly couples the precursor source 118 to process station 104-1. Branch 212-2 fluidly couples the precursor source 118 to process station 104-2.

[0060] Figure 2B schematically shows an exemplary configuration including three process stations 104-1, 104-2, and 104-3, in which a multi-station process tool is housed within a processing chamber 102-1. In this example, the dose line 210 comprises three branches 212-1, 212-2, and 212-3 that fluidly couple a precursor source 118 to process stations 104-1, 104-2, and 104-3. Branch 212-1 fluidly couples the precursor source 118 to process station 104-1. Branch 212-2 fluidly couples the precursor source 118 to process station 104-2. Branch 212-3 fluidly couples the precursor source 118 to process station 104-3.

[0061] Figure 2C schematically shows an exemplary configuration including four process stations 104-1, 104-2, 104-3, and 104-4, in which a multi-station process tool is housed within a processing chamber 102-1. In this example, the dose line 210 comprises four branches 212-1, 212-2, 212-3, and 212-4 that fluid-couple a precursor source 118 to process stations 104-1, 104-2, 104-3, and 104-4. Branch 212-1 fluid-couples the precursor source 118 to process station 104-1. Branch 212-2 fluid-couples the precursor source 118 to process station 104-2. Branch 212-3 fluid-couples the precursor source 118 to process station 104-3. Branch 212-4 fluid-couples the precursor source 118 to process station 104-4.

[0062] Figure 2D schematically shows an exemplary configuration in which the multi-station process tool includes two process stations 104-1 and 104-2, each housed in a corresponding process chamber of a set of two process chambers 102-1 and 102-2. In this example, the dose line 210 comprises two branches 212-1 and 212-2 that fluidly couple a precursor source 118 to process stations 104-1 and 104-2. Branch 212-1 fluidly couples the precursor source 118 to process station 104-1, which is housed in process chamber 102-1. Branch 212-2 fluidly couples the precursor source 118 to process station 104-2, which is housed in process chamber 102-2.

[0063] Figure 2E schematically shows an exemplary configuration in which the multi-station process tool includes three process stations 104-1, 104-2, and 104-3, each housed in a corresponding process chamber of a set of three process chambers 102-1, 102-2, and 102-3. In this example, the dose line 210 comprises three branches 212-1, 212-2, and 212-3 that fluidly couple a precursor source 118 to process stations 104-1, 104-2, and 104-3. Branch 212-1 fluidly couples the precursor source 118 to process station 104-1 housed in process chamber 102-1. Branch 212-2 fluidly couples the precursor source 118 to process station 104-2 housed in process chamber 102-2. Branch 212-3 fluidly couples the precursor source 118 to process station 104-3 housed in process chamber 102-3.

[0064] Figure 2F schematically shows an exemplary configuration in which the multi-station process tool includes four process stations 104-1, 104-2, 104-3, and 104-4, each housed in a corresponding process chamber of a set of four process chambers 102-1, 102-2, 102-3, and 102-4. In this example, the dose line 210 comprises four branches 212-1, 212-2, 212-3, and 212-4 that fluidly couple a precursor source 118 to process stations 104-1, 104-2, 104-3, and 104-4. Branch 212-1 fluidly couples the precursor source 118 to process station 104-1 housed in process chamber 102-1. Branch 212-2 fluidly couples the precursor source 118 to process station 104-2 housed in process chamber 102-2. Branch 212-3 fluidly connects the precursor source 118 to the process station 104-3, which is housed in the processing chamber 102-3. Branch 212-4 fluidly connects the precursor source 118 to the process station 104-4, which is housed in the processing chamber 102-4.

[0065] Figure 2G schematically shows an exemplary configuration in which a multi-station process tool includes multiple processing chambers, each processing chamber housing multiple process stations. For example, a first subset of process stations, including process stations 104-1 and 104-2, is housed in processing chamber 102-1. A second subset of process stations, including process stations 104-3 and 104-4, is housed in processing chamber 102-2. It will be understood that two or more processing chambers of the multi-station process tool 100 can each have any appropriate number of process stations housed therein, including one, two, three, four, or more process stations. In this example, the dose line 210 comprises four branches 212-1, 212-2, 212-3, and 212-4 that fluidly couple the precursor source 118 to process stations 104-1, 104-2, 104-3, and 104-4. Branch 212-1 fluid-couples the precursor source 118 to process station 104-1 housed in processing chamber 102-1. Branch 212-2 fluid-couples the precursor source 118 to process station 104-2 housed in processing chamber 102-1. Branch 212-3 fluid-couples the precursor source 118 to process station 104-3 housed in processing chamber 102-2. Branch 212-4 fluid-couples the precursor source 118 to process station 104-4 housed in processing chamber 102-2.

[0066] In each of the examples in Figures 2A to 2G, the multiple branches of the dose line 210 project radially outward from the upstream segment of the dose line located centrally between the multiple process stations, or extend in other manner. This configuration allows the multiple branches to provide similar flow paths from the precursor distribution system 120 to each process station. By providing similar flow paths between each of the multiple branches, the delivery of precursor or purge gas by the multiple branches to the multiple process stations can be time-coordinated using an upstream dose divert valve assembly shared by the multiple process stations.

[0067] In other examples, the branches of the dose line 210 may have configurations other than the radial configuration of Figures 2A to 2G. Figure 2H schematically shows an exemplary configuration in which, in contrast to the radial configuration of Figures 2A to 2G, the multi-station process tool includes a plurality of stations 104-1 to 104-N having a substantially linear arrangement. In this example, the dose line 210 comprises N branches 212-1 to 212-N that fluidly couple a precursor source 118 to process stations 104-1 to 104-N. Branch 212-1 fluidly couples the precursor source 118 to process station 104-1. Branch 212-2 fluidly couples the precursor source 118 to process station 104-2. Branch 212-N fluidly couples the precursor source 118 to process station 104-N. Each of stations 104-1 to 104-N may be housed in a separate processing chamber or in a common processing chamber.

[0068] Referring again briefly to Figure 1, the precursor distribution system 120 includes one or more dose divert valve assemblies 130. Each dose divert valve assembly 130 is operable to selectively guide the precursor flow received from the precursor source between a dose path fluid-coupled to two or more process stations and a divert path fluid-coupled to the exhaust system 131.

[0069] Figure 3 is a schematic diagram illustrating an exemplary configuration of the precursor distribution system 120 of Figure 1. The dose divert valve assemblies 130-1 to 130-N include precursor inlets 310-1 to 310-N. Each precursor inlet 310-1 to 310-N is configured to receive a precursor flow from its respective precursor source 118-1 to 118-N. Here, dose divert valve assembly 130-1 receives a first precursor flow 330-1 from a first precursor source 118-1 via precursor inlet 310-1. Dose divert valve assembly 130-2 receives a second precursor flow 330-2 from a second precursor source 118-2 via precursor inlet 310-2. Dose divert valve assembly 130-N receives an Nth precursor flow 330-N from an Nth precursor source 118-N via precursor inlet 310-N. In this example, precursor sources 118-1 to 118-N contain different precursors.

[0070] Each of the dose divert valve assemblies 130-1 to 130-N includes a dose valve that can be operated to selectively provide a precursor flow received through a precursor inlet to a dose path. For example, the dose valve 314-1 of dose divert valve assembly 130-1 is operable to selectively provide a precursor flow 330-1 received through a precursor inlet 310-1 to a dose path 316-1. The dose valve 314-1 of dose divert valve assembly 130-2 is operable to selectively provide a precursor flow 330-2 received through a precursor inlet 310-2 to a dose path 316-2. The dose valve 314-N of dose divert valve assembly 130-N is operable to selectively provide a precursor flow 330-N received through a precursor inlet 310-N to a dose path 316-N.

[0071] Each of the dose divert valve assemblies 130-1 to 130-N includes a divert valve that can be operated to selectively provide a precursor flow received through a precursor inlet to a divert path. For example, the divert valve 318-1 of dose divert valve assembly 130-1 is operable to selectively provide a precursor flow 330-1 received through a precursor inlet 310-1 to a divert path 320-1. The divert valve 318-2 of dose divert valve assembly 130-2 is operable to selectively provide a precursor flow 330-2 received through a precursor inlet 310-2 to a divert path 320-2. The divert valve 318-N of dose divert valve assembly 130-N is operable to selectively provide a precursor flow 330-N received through a precursor inlet 310-N to a divert path 320-N.

[0072] The dose valve 314-1 and divert valve 318-1 of valve assembly 130-1 are independently operable. For example, controller 148 can control the opening and closing of dose valve 314-1 independently of divert valve 318-1. Similarly, the dose valves and divert valves of valve assemblies 130-2 to 130-N are independently operable. Thus, each of the dose-diverter valve assemblies 130-1 to 130-N is operable to selectively direct the respective precursor flow received from its respective precursor source between the dose path and the divert path of the valve assembly. For example, dose-diverter valve assembly 130-1 is operable to selectively direct the precursor flow 330-1 received from precursor source 118-1 to dose path 316-1 by opening dose valve 314-1 and closing divert valve 318-1. The dose divert valve assembly 130-1 can be operated to selectively direct the precursor flow 330-1 received from the precursor source 118-1 to the divert path 320-1 by closing the dose valve 314-1 and opening the divert valve 318-1. Dose divert valve assemblies 130-2 to 130-N can similarly be operated to direct the respective precursor flows between the dose path or divert path of the valve assembly.

[0073] The precursor distribution system 120 further comprises a dose line 210 having two or more branches 212-1 to 212-N. Branch N represents one or more branches of any choice in addition to branches 212-1 and 212-2. Exemplary configurations of the dose line 210 are described with reference to Figures 2A to 2H. The dose line 210 is connected to each of the dose valves 314-1 to 314-N of the dose divert valve assemblies 130-1 to 130-N. For example, the dose line 210 is fluid-coupled to each of the dose paths 316-1 to 316-N by the dose manifold 340 of the precursor distribution system 120. In this example, the dose paths 316-1 to 316-N collectively constitute or form part of the dose manifold 340 to which each dose divert valve assembly 130-1 to 130-N is fluid-coupled. For example, the first dose divert valve assembly 130-1, the second dose divert valve assembly 130-2, and the nth dose divert valve assembly 130-N are fluidly coupled to the dose line 210 by the dose manifold 340.

[0074] Branches 212-1 to 212-N of the Dose line 210 are fluid-coupled to the corresponding process stations 104-1 to 104-N of the multi-station process tool 100. For example, branch 212-1 is fluid-coupled to process station 104-1 by process gas outlet 112-1. Branch 212-2 is fluid-coupled to process station 104-2 by process gas outlet 112-2. Branch 212-N is fluid-coupled to process station 104-N by process gas outlet 112-N.

[0075] The dose manifold 340 further includes a purge gas inlet 342 for receiving purge gas from the purge gas source 138. As an example, the purge gas inlet 342 may be located upstream of the fluid connection of the dose manifold 340 to the respective dose valves 314-1 to 314-N of the dose divert valve assemblies 130-1 to 130-N.

[0076] Diverter paths 320-1 to 320-N collectively constitute, or form part of, a diverter manifold 344 to which the Dose diverter valve assemblies 130-1 to 130-N are fluid-coupled. In this example, the multi-station process tool 100 further comprises a diverter line 346 connected to the diverter manifold 344. The diverter line 346, for example, fluid-couples the diverter manifold 344 to the exhaust system 131.

[0077] The configuration shown in Figure 3 offers advantages over the use of station-specific dose valves and station-specific divert valves. For example, a process system with four process stations uses four dose valves and four divert valves, with station-specific dose-divert valves being used. In contrast, the precursor distribution system 120 can serve four process stations having a dose-divert valve assembly 130-1 including dose valve 314-1 and divert valve 318-1. In this example, the precursor distribution system 120 utilizes two valves compared to the eight valves of other multi-station process tools.

[0078] Furthermore, in other multi-station process tools that include station-specific dose valves and divert valves, multiple precursor sources can share a common supply line used to deliver precursors to each of the station-specific dose valves and divert valves. In this configuration, a precursor flow control valve can be used for each precursor source. In contrast, the precursor distribution system 120 avoids the use of separate precursor flow control valves because dose divert valve assemblies 130-1 to 130-N isolate each precursor source from the other precursor sources. In the case of a multi-station process tool with two precursor sources and four stations utilizing station-specific dose divert valve assemblies, a total of four dose valves, four divert valves, and two precursor source valves are used. In contrast, in the case of a multi-station process tool using a single dose divert valve assembly for each precursor source, a total of two dose valves and two divert valves can be used.

[0079] The arrangement of dose divert valve assemblies 130-1 to 130-N upstream of the branch in dose line 210 may result in a delay between the opening of dose valves 314-1 to 314-N and the delivery of precursor to process stations 104-1 to 104-N, compared to the use of station-specific dose divert valves. Such a delay in the precursor flow can be addressed by advancing the opening timing of the dose valves relative to the dose stage. Additionally or alternatively, such a delay in the precursor flow can be addressed by increasing the pressure difference between the precursor flow and the chamber pressure in the processing chamber. Additionally or alternatively, such a delay in the precursor flow can be addressed by reducing the cross-sectional area of ​​dose line 210 and its branches 212-1 to 212-N. Control of the opening timing of the dose valves and the pressure difference of the precursor flow will be described in further detail with reference to method 500 in Figure 5.

[0080] Figure 4 shows an example of a portion of the precursor distribution system 120 according to the configuration of Figure 3, in which various components are integrated with the manifold body 400. The manifold body 400 includes internal passages defining the dose manifold 340 and divert manifold 344, as described above with reference to Figure 3. In this example, the manifold body 400 supports the distribution of two precursors received from two precursor sources. It will be understood that the manifold body 400 can support the distribution of precursors received from any appropriate number of precursor sources (e.g., 118-1 to 118-N).

[0081] The dose valve 314-1 and the divert valve 318-1 are mounted on the manifold body 400. Furthermore, in this example, dose valves 314-2 and the divert valve 318-2 are also mounted on the manifold body 400. The manifold body 400 further provides openings for the precursor inlets 310-1 and 310-2 of the dose divert valve assemblies 130-1 and 130-2. In this example, the openings for the precursor inlets 310-1 and 310-2 are located along the rear side of the manifold body 400 and are schematically shown in Figure 4 using dashed lines. The manifold body 400 includes a purge gas inlet 342 that can receive purge gas. The manifold body 400 includes a dose outlet 410 that can fluidly couple the dose manifold 340 to the dose line 210 in Figure 3. In this example, the dose outlet 410 is located along the rear side of the manifold body 400 and is schematically shown in Figure 4 using dashed lines. The manifold body 400 further includes a divert outlet 412 to which the divert manifold 344 is fluidly coupled with the divert line 346 in Figure 3.

[0082] Figure 5 is a flowchart illustrating an exemplary method 500 for operating a precursor delivery system for a multi-station process tool. For example, method 500 can be performed by a controller 148 in any of the dose divert valve assemblies 130-1 to 130-N shown in Figure 3. The dose divert valve assembly is operable to selectively guide the precursor flow received from a precursor source between fluid-coupled dose paths or divert paths to two or more process stations of a multi-station process tool. As previously mentioned with reference to Figure 3, the dose divert valve assembly includes a dose valve and a divert valve.

[0083] In 510, the method includes the step of obtaining dose-stage timing values ​​that indicate target dose-stage timings for delivering a precursor flow of a precursor source to two or more processing chambers. For example, the controller 148 can obtain dose-stage timing values ​​from an ALD recipe stored in the controller's memory.

[0084] In 512, the method includes the step of obtaining a dose duration value that indicates a target dose duration for opening the dose valve of a dose divert valve assembly. For example, the controller 148 may obtain the dose duration value from an ALD recipe stored in the controller's memory. In some examples, the target dose duration may be based on the pressure difference between the chamber pressure in the processing chamber through which the precursor flow is delivered and a target pressure difference of the precursor flow above the chamber pressure.

[0085] In 514, the method includes the step of providing a dose divert valve assembly with a precursor flow as a filling volume at a target pressure difference above the chamber pressure in one or more processing chambers housing two or more process stations, before the dose valve is controlled to open.

[0086] In 516, the method includes the step of controlling a dose valve of a dose divert valve assembly to open for a target dose duration prior to the dose stage of two or more process stations in order to provide a precursor flow to the dose path.

[0087] In 518, the method includes the step of controlling a divert valve to close for at least a portion of the time that the dose valve is controlled to open. In some examples, the divert valve is kept closed for the time that the dose valve is controlled to open.

[0088] In 520, the method includes the step of controlling a dose valve to close at the end of the target dose duration.

[0089] In 522, the method includes controlling a divert valve of a dose divert valve assembly to open at a target divert timing related to the end of a target dose duration in order to provide a precursor flow to the divert path.

[0090] Method 500 can be performed for each of multiple precursor sources using a dose divert valve assembly corresponding to the precursor source. Furthermore, it will be understood that Method 500 can be repeatedly performed over multiple ALD cycles.

[0091] Figure 6 schematically shows an exemplary computing system 600 capable of performing one or more of the methods, processes, and other control operations described herein. The computing system 600 is shown in a simplified form. The computing system 600 may take the form of one or more personal computers, workstations, computers integrated with board processing tools, and / or network-accessible server computers.

[0092] The computing system 600 includes a logical subsystem 602 and a storage subsystem 604. The computing system 600 may optionally include a display subsystem 606, an input subsystem 608, a communication subsystem 610, and / or other components not shown in Figure 6. The controller 148 in Figure 1 is an example of the computing system 600.

[0093] The logical subsystem 602 includes one or more physical devices configured to execute instructions. For example, the logical subsystem may be configured to execute instructions that are part of one or more applications, services, programs, routines, libraries, objects, components, data structures, or other logical structures. Such instructions may be implemented to perform tasks, implement data types, transform the state of one or more components, achieve technical effects, or reach desired results.

[0094] A logical subsystem may include one or more processors configured to execute software instructions. Additionally or alternatively, a logical subsystem may include one or more hardware or firmware logical subsystems configured to execute hardware or firmware instructions. The processors of a logical subsystem may be single-core or multi-core, and the instructions executed on them may be configured for sequential, parallel, and / or distributed processing. Individual components of a logical subsystem may optionally be distributed across two or more separate devices, which may be remotely located and / or configured for collaborative processing. Embodiments of a logical subsystem may be virtualized and executed by remotely accessible network computing devices configured in a cloud computing configuration.

[0095] The storage subsystem 604 includes one or more physical devices configured to hold instructions 612 that can be executed by the logical subsystem to perform the methods, processes, and other control operations described herein. When such methods, processes, and control operations are performed, the state of the storage subsystem 604 can be transformed, for example, to hold different data.

[0096] The storage subsystem 604 may include removable and / or built-in devices. The storage subsystem 604 may include optical memory (e.g., CD, DVD, HD-DVD, Blu-ray disc, etc.), semiconductor memory (e.g., RAM, EPROM, EEPROM, etc.), and / or magnetic memory (e.g., hard disk drive, floppy disk drive, tape drive, MRAM, etc.). The storage subsystem 604 may include volatile, non-volatile, dynamic, static, read / write, read-only, random access, sequential access, position-addressable, file-addressable, and / or content-addressable devices.

[0097] It will be understood that the memory subsystem 604 includes one or more physical devices. However, the instruction modes described herein may alternatively be propagated by a communication medium (e.g., electromagnetic signals, optical signals, etc.) that is not held by a physical device for a finite period of time.

[0098] Embodiments of the logic subsystem 602 and the storage subsystem 604 may be integrated into one or more hardware logic components. Such hardware logic components may include, for example, field-programmable gate arrays (FPGAs), programmable and application-specific integrated circuits (PASICs / ASICs), programmable and application-specific standard products (PSSPs / ASSPs), systems on a chip (SOCs), and composite programmable logic devices (CPLDs).

[0099] If included, the display subsystem 606 can be used to present a visual representation of the data held by the storage subsystem 604. This visual representation may take the form of a graphical user interface (GUI). Since the methods, processes, and other control operations described herein modify the data held by the storage subsystem and thus transform the state of the storage subsystem, the state of the display subsystem 606 can also be transformed to visually represent the changes in the underlying data. The display subsystem 606 may include one or more display devices utilizing substantially any kind of technology. Such display devices may be combined with the logical subsystem 602 and / or the storage subsystem 604 in a shared enclosure, or such display devices may be peripheral display devices.

[0100] If included, the input subsystem 608 may include or interface with one or more user input devices, such as a keyboard, mouse, or touchscreen. In some examples, the input subsystem may include or interface with selected natural user input (NUI) components. Such components may be integrated or peripheral, and the conversion and / or processing of input behavior may be handled onboard or offboard. Exemplary NUI components may include microphones for speech and / or speech recognition, as well as infrared, color, stereoscopic, and / or depth cameras for machine vision and / or gesture recognition.

[0101] If included, the communication subsystem 610 may be configured to enable communication between the computing system 600 and one or more other computing devices. The communication subsystem 610 may include wired and / or wireless communication devices that support one or more different communication protocols. In a non-limiting example, the communication subsystem may be configured to communicate using a wireless telephone network, or a wired or wireless local area network or wide area network. In some examples, the communication subsystem may enable the computing system 600 to send and / or receive messages to and from other devices using a network such as the Internet.

[0102] It will be understood that the configurations and / or techniques described herein are essentially illustrative and numerous variations are possible, and therefore these particular examples or examples should not be considered in an restrictive sense. The specific routines or methods described herein may represent one or more of any number of processing strategies. Thus, the various operations illustrated and / or described may be performed in the order illustrated and / or described, in other orders, in parallel, or omitted. Similarly, the order of the processes described above is modifiable.

[0103] The subject matter of this disclosure includes all novel and non-obvious combinations and partial combinations thereof of the various processes, systems and configurations disclosed herein, as well as other features, functions, operations, and / or characteristics, and all their equivalents. [Explanation of Symbols]

[0104] 100 Multi-Station Process Tools 102 Process Chamber 104 Process Station 106 Pedestal 108 circuit boards 110 Circuit board heater 112 Process gas outlet 114 Remote Plasma Generator (RPG) 116 ampoules 118 Precursor Source 120 Precursor Distribution System 122 Flow-over vapor (FOV) gas inlet 124 Carrier gas sources 126 FOV gas outlet 130 Dose Divert Valve Assembly 131 Exhaust System 132 RPG Gas Manifold 134 RPG Gas Distribution System 136 RPG gas source 138 Purge gas source 144 High frequency power supply 146. Unified Network 148 controllers 210 Dose Line 212 branches 310 Precursor entrance 314 Doze valve 316 Dose pathways 318 Divert Valve 320 Divert Route 330 Precursor flow 340 Dose Manifold 342 Purge gas inlet 344 Divert Manifold 346 Divert Line 400 Manifold Body 410 Daws Exit 412 Divert Exit 600 Computing Systems 602 Logical subsystem 604 Memory subsystem 606 Display subsystem 608 Input subsystem 610 Communication Subsystem 612 command

Claims

1. Two or more process stations, Precursor source, A dose divert valve assembly that can operate to selectively guide a precursor flow received from the precursor source between a dose path and a divert path, A precursor inlet for receiving the precursor flow from the precursor source, A dose valve that can be operated to selectively supply the precursor flow to the dose path, A divert valve that can be operated to selectively supply the precursor flow to the divert path, Including a dose divert valve assembly, A dose line having two or more branches, wherein the dose line is connected to the dose valve, and each branch of the dose line is fluidly coupled to a corresponding process station among the two or more process stations, and A multi-station processing tool equipped with the following features.

2. The dose divert valve assembly is a first dose divert valve assembly, the dose path comprises a dose manifold to which the first dose divert valve assembly is fluid-coupled, the precursor source is a first precursor source, and the multi-station process tool is A second precursor source, The second precursor source and the second dose divert valve assembly fluidly coupled to the dose manifold, The multi-station process tool according to claim 1, further comprising:

3. The multi-station process tool according to claim 2, wherein the dose manifold further includes a purge gas inlet for receiving purge gas from a purge gas source.

4. The divert path comprises a divert manifold to which the first dose divert valve assembly and the second dose divert valve assembly are fluid-coupled, and the multi-station process tool is Diverter line connected to the aforementioned diverter manifold The multi-station process tool according to claim 2, further comprising:

5. The multi-station process tool according to claim 1, wherein the multi-station process tool comprises four or more process stations, and the dose line comprises four or more branches.

6. The multi-station process tool according to claim 1, wherein the two or more branches project radially outward from the upstream segment of the dose line.

7. The multi-station process tool according to claim 1, wherein the two or more process stations are housed in the same processing chamber.

8. The multi-station process tool according to claim 1, wherein the first process station among the two or more process stations is housed in a first processing chamber, and the second process station among the two or more process stations is housed in a second processing chamber.

9. The multi-station process tool according to claim 1, further comprising a controller configured to control the opening and closing timing of the dose valve and the opening and closing timing of the divert valve.

10. A precursor distribution system for a multi-station process tool, wherein the system is A dose divert valve assembly capable of selectively guiding a precursor flow received from a precursor source between a dose path and a divert path, wherein the dose divert valve assembly is A precursor inlet for receiving the precursor flow from the precursor source, A dose valve that can be operated to selectively supply the precursor flow to the dose path, A divert valve that can be operated to selectively supply the precursor flow to the divert path, Including a dose divert valve assembly, A dose line comprising two or more branches, wherein the dose line is configured to be connected to a dose valve, and each branch of the dose line is configured to be fluidly coupled to a corresponding process station among two or more process stations of the multi-station process tool, and A system equipped with these features.

11. The dose divert valve assembly is a first dose divert valve assembly, the precursor source is a first precursor source, and the system is A second dose divert valve assembly that can operate to selectively guide a second precursor flow received from a second precursor source between a second dose path and a second divert path. The second dose divert valve assembly further comprises, A second precursor inlet for receiving the second precursor flow from the second precursor source, A second dose valve operable to selectively supply the second precursor flow from the second precursor source to the second dose path, A second divert valve operable to selectively supply the second precursor flow from the second precursor source to the second divert path, and The system according to claim 10, including the following:

12. The system according to claim 11, wherein the dose path of the first dose divert valve assembly comprises a dose manifold to which the first dose divert valve assembly and the second dose divert valve assembly are coupled.

13. The system according to claim 12, wherein the dose manifold further includes a purge gas inlet for receiving purge gas from a purge gas source.

14. The system according to claim 11, further comprising a divert manifold to which the first dose divert valve assembly and the second dose divert valve assembly are fluid-coupled, the system further comprising a divert line configured to be connected to the divert manifold.

15. The system according to claim 14, wherein the divert path of the first dose divert valve assembly and the second divert path of the second dose divert valve assembly comprise the divert manifold.

16. The system according to claim 10, wherein the dose line comprises four or more branches for four or more corresponding process stations.

17. The system according to claim 10, wherein the two or more branches project radially outward from the upstream segment of the dose line.

18. The system according to claim 10, wherein the dose valve and the divert valve are operable independently.

19. A method for operating a precursor delivery system for a multi-station process tool, the method being: The steps include controlling the dose valve of a dose divert valve assembly to open for a target dose duration before the dose stage of two or more process stations in order to provide a precursor flow to the dose path, The steps include controlling the dose valve to close at the end of the target dose duration, The steps include controlling the divert valve of the dose divert valve assembly to open at a target divert timing related to the end of the target dose duration in order to provide the precursor flow to the divert path, and Methods that include...

20. The step of providing the precursor flow to the dose divert valve assembly as a filling volume with a target pressure difference exceeding the chamber pressure in one or more processing chambers housing the two or more process stations, before the dose valve is controlled to open. The method according to claim 19, further comprising:

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