Gas Delivery Cup and Gas Manifold Assembly

Abstract

The present invention relates to a gas distribution cup (1) that is removably mounted to a fixed gas manifold structure (2) of an atomic layer deposition apparatus. The gas distribution cup (1) comprises a cup bottom (10); and a cup wall (20) that surrounds the cup bottom (10). The cup bottom (10) comprises a gas distribution channel (13) that extends through the cup bottom (10) from an outer surface (11) of the cup bottom to an inner surface (12) of the cup bottom on the other side of the cup bottom (10). The cup wall (20) extends transversely to the cup bottom (10) on the inner surface side of the cup bottom (10) in a direction away from the cup bottom (10) such that a gas distribution space (30) is formed by the cup wall (20) and the cup bottom inner surface (12).

Description

[Technical field]

[0001] FIELD OF THEINVENTION The present invention relates to a gas distribution cup, more particularly to a gas distribution cup as defined in the preamble of independent claim 1.

[0002] The invention further relates to a gas manifold assembly, more particularly to a gas manifold assembly as defined in the preamble of independent claim 10. [Background technology]

[0003] 2. Background of the Invention The present invention relates to an atomic layer deposition (ALD) apparatus in which a film is grown on a substrate by exposing the substrate surface to alternating gaseous precursors during atomic layer deposition. When these gaseous precursors are exposed to the surface, they react and form a film on the surface. The parts on which the film is grown must be removed and cleaned frequently. The growth of the film starts at a mixing point where the gases come into contact with each other (or meet) and mix. This point can be, for example, a mixing tube or other part in the atomic layer deposition apparatus. This part and other parts from this mixing point to the pump line must be removed for cleaning. Such parts are generally difficult to remove, and the entire apparatus must be cooled to allow workers to open connections and reach the parts to be cleaned. Slow cooling and heating of an apparatus of this size takes time outside of production hours. Summary of the Invention

[0004] Summary of the Invention It is an object of the present invention to provide an easily accessible and removable mixing point where the gaseous precursors first come into contact.

[0005] The object of the invention is achieved by a gas distribution cup and gas manifold assembly, which are characterized in that they are stated in the independent claims. Preferred embodiments of the invention are disclosed in the dependent claims.

[0006] The present invention is based on the idea of ​​providing a removable and compact mixing section, where the precursor gases first come into contact, that can be removed from the atomic layer deposition apparatus and replaced with a clean one in order to save process time and minimize maintenance time of the atomic layer deposition apparatus.

[0007] The gas supply cup according to the present invention is removably mounted on a fixed gas manifold structure of an atomic layer deposition apparatus. The fixed gas manifold structure provides a plurality of gas channels from a gas source of the atomic layer deposition apparatus. The gas supply cup is provided in communication with the fixed gas manifold structure before a reaction chamber to which gas is supplied. The gas supply cup comprises a cup bottom and a cup wall. The cup bottom comprises gas supply channels extending from an outer surface of the cup bottom, through the cup bottom, to an inner surface of the cup bottom and the cup wall on the other side of the cup bottom. The cup wall surrounds the cup bottom and extends laterally relative to the cup bottom in a direction away from the cup bottom on the inner surface side of the cup bottom, and the cup wall and the inner surface of the cup bottom form a gas supply space. Furthermore, the cup wall extends at least partially away from the cup bottom on the outer surface side of the cup bottom, and a flange is formed on the side of the cup bottom opposite the gas supply space.

[0008] The gas distribution cup is preferably a circumferential cup having a cylindrical outer surface, the flange having additional features or the cylindrical surface may be missing a portion to provide a mounting structure to a fixed gas manifold structure.

[0009] According to the invention, at least one gas supply channel forms a conical shape through the cup bottom such that the inlet opening of the gas supply channel at the outer surface of the cup bottom is smaller than the outlet opening of the gas supply channel at the inner surface of the cup bottom. The gas supply channel having a conical shape is preferably provided in the middle section of the cup bottom or in the center of the cup bottom.

[0010] According to the present invention, the flange comprises an alignment section arranged to connect to a counter section of the fixed gas manifold structure for aligning the gas supply cup so that its gas supply channels are aligned with the respective gas supply channels of the fixed gas manifold structure.

[0011] The alignment section is preferably provided as a protrusion on the flange, forming a discontinuity in an otherwise symmetrical flange, or the flange is not symmetrical and the alignment section forms an alignment portion that properly locates the supply cup on the fixed gas manifold structure.

[0012] According to the invention, the gas distribution cup comprises a gas homogenization surface arranged in the gas distribution space, said gas homogenization surface arranged at a distance from and at least partially parallel to the inner surface of the cup bottom to form a gas homogenization zone between the inner surface of the cup bottom and the gas homogenization surface.

[0013] The gas homogenization surface is preferably provided at least partially opposite the gas supply channel arranged in the cup bottom. The gas homogenization surface may be a plate connected to the cup wall or the cup bottom. The plate may be in the shape of an arc providing a gas flow path in the center of the gas supply cup. Alternatively, the plate may be provided parallel to the cup bottom in the center of the gas supply space and provide a gas flow path between the edge of the plate and the cup wall. Alternatively, the gas homogenization surface may provide a gas flow path between the cup wall and the homogenization surface and in the center of the gas supply space.

[0014] According to the invention, the gas homogenization surface comprises passages from the gas homogenization zone through the homogenization surface to the gas supply space outside the gas homogenization zone for allowing gas to flow from the gas supply channel through the gas homogenization zone to the gas supply space outside the gas homogenization zone. The passages in the gas homogenization surface provide a flow path for the gas.

[0015] According to the invention, the gas supply cup further comprises a gas mixing cone arranged in the gas supply space, the gas mixing cone being arranged at a distance from the inner surface of the cup bottom to form a gas mixing cone between the inner surface of the cup bottom and the gas mixing cone. The gas mixing cone may be connected to the cup bottom or the cup wall.

[0016] According to the present invention, the gas mixing cone is positioned in the gas supply space such that the apex of the gas mixing cone is furthest from the inner surface of the cup bottom. Also, a gas flow zone is provided between the gas mixing cone and the cup wall by positioning the gas mixing cone at a distance from the cup wall to provide a flow path from the gas mixing zone to the gas supply space outside the gas mixing zone. Alternatively, the gas mixing cone may include an opening at the top of the cone to provide a gas flow path from the gas mixing zone to the gas supply space outside the gas mixing zone.

[0017] According to the invention, the gas supply cup further comprises a gas mixing zone arranged in the gas supply space, said gas mixing cone being arranged at a distance from the gas homogenization surface to form a gas mixing cone between the gas homogenization surface and the gas mixing cone, which may be connected to the gas homogenization surface, alternatively or additionally to the cup wall, alternatively or additionally to the cup bottom.

[0018] In accordance with the present invention, the gas mixing cone is positioned in the gas supply volume such that the apex of the gas mixing cone is furthest from the gas homogenization surface, and a gas flow zone is provided between the gas mixing cone and the cup wall by positioning the gas mixing cone at a distance from the cup wall to provide a flow path from the gas mixing zone to the gas supply volume outside of the gas mixing zone.

[0019] In accordance with an alternative embodiment of the present invention, the gas mixing cone is positioned in the gas supply space such that the apex of the gas mixing cone is closest to the gas homogenization surface, and a gas flow path zone is provided between the gas mixing cone and the cup wall by positioning the gas mixing cone at a distance from the cup wall to provide a flow path from the gas mixing zone to the gas supply space outside of the gas mixing zone.

[0020] According to the invention, the gas mixing cone may be replaced by a gas mixing concave surface or a gas mixing curved surface.

[0021] A gas manifold assembly for an atomic layer deposition apparatus according to the present invention comprises a gas manifold structure, a gas supply cup removably arranged in connection with the gas manifold structure, and a gas guide structure connected to the gas manifold structure. The gas manifold structure is provided in the atomic layer deposition apparatus as a fixed part of the atomic layer deposition apparatus. The gas manifold structure comprises a plurality of gas supply channels extending from a gas source to a manifold surface. The gas supply cup has a cup bottom and comprises a plurality of gas supply channels extending through the cup bottom from an outer surface of the cup bottom to an inner surface of the cup bottom opposite the cup bottom. The gas supply cup is arranged in releasable connection with the gas manifold structure such that the outer surface of the cup bottom is disposed against the manifold surface. The gas supply channels of the gas supply cup are aligned with the respective gas supply channels of the gas manifold structure to form a continuous gas supply channel. The gas guide structure extends between the gas manifold structure and a reaction chamber of the atomic layer deposition apparatus. The gas directing structure is positioned to direct gas from the gas source through the gas supply channels of the gas manifold structure and further through the gas supply channels of the gas distribution cup to a reaction chamber of the atomic layer deposition apparatus.

[0022] According to the present invention, the gas distribution cup is positioned on the gas manifold structure using gravity. The gas distribution channels of the gas distribution cup are aligned with the gas distribution channels of the gas manifold structure by the alignment structure. The gas distribution cup is positioned in connection with the gas manifold structure and is connected to the gas manifold structure by gravity without any other components. When the gas distribution cup is to be removed for cleaning, it is only necessary to lift the gas distribution cup from the gas manifold structure.

[0023] According to the present invention, the alignment structure comprises an alignment section of a gas supply cup arranged to connect to an opposing section of a fixed gas manifold structure for aligning gas supply channels of the gas supply cup with respective gas supply channels of the gas manifold structure.

[0024] In accordance with the present invention, the alignment section is disposed in communication with a flange of the gas distribution cup.

[0025] In accordance with the present invention, the gas distribution cups described in the various embodiments may be used in the gas manifold assemblies described above.

[0026] An advantage of the present invention is that film growth of reactive precursor gases is easily restricted to only the gas distribution cup. The gas distribution cup can be removed from the atomic layer deposition apparatus for each run. The gas distribution cup is positioned on a fixed gas manifold structure. The position of the gas distribution cup is locked such that the gas distribution channels of the gas distribution cup and the gas manifold structure abut (or meet) each other. The gas distribution cup is locked via the cup structure and / or the gas manifold structure without the need for additional components or locking parts.

[0027] A further advantage of the present invention is that the walls of the gas supply cup can be as thin as possible since the gas supply channel is provided at the bottom of the cup, which is advantageous since the weight is reduced since the diameter of the gas supply cup can be about 150 mm to 300 mm and the weight can be about 10 to 20 kg.

[0028] The cup is gravity-held and can be removed by simply lifting it through the maintenance door of the atomic layer deposition tool.

[0029] The gas distribution cup of the present invention solves an important cleaning problem by allowing cleaning to be performed without cooling the reactor of the atomic layer deposition system.

[0030] The present invention will now be described in detail with reference to specific embodiments with reference to the accompanying drawings. [Brief description of the drawings]

[0031] [Figure 1]FIG. 1 shows a gas distribution cup according to the present invention. [Diagram 2] FIG. 2 shows a gas distribution cup according to the present invention as viewed from the bottom side. [Diagram 3] FIG. 3 illustrates a gas manifold assembly according to the present invention. [Figure 4] FIG. 4 illustrates a fixed gas manifold structure of a gas manifold assembly according to the present invention. [Diagram 5] FIG. 5 illustrates a gas manifold assembly according to the present invention. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0032] Detailed Description of the Invention 1 shows a gas distribution cup 1 according to the present invention, which includes a cup bottom 10 and a cup wall 20 surrounding the cup bottom 10. The cup bottom 10 has a cup bottom outer surface 11, a cup bottom inner surface 12, and a number of gas distribution channels 13 extending through the cup bottom 10 from the cup bottom outer surface 11 to the cup bottom inner surface 12. The cup bottom outer surface 11 is surrounded by a flange 40 that protrudes from the cup bottom outer surface 11. The cup bottom outer surface 11 is shown in dashed lines because the cup bottom outer surface 11 is not actually shown from this perspective. Although FIG. 1 shows the cup wall 20 extending from the cup bottom outer surface 11 as a flange 40, a flange may also be provided on the cup bottom outer surface 11 such that the cup wall 20 and the flange 40 are separated without forming a continuous outer surface of the gas distribution cup 1. The flange 40 together with the outer surface 11 of the cup bottom form a contact space of the fixed gas manifold structure 2. The contact space 40a of the gas distribution cup 1 is arranged to receive the manifold base 22 of the fixed gas manifold structure 2 to which the gas distribution cup 1 is gravity connected. The manifold base 22 has a manifold surface 21 that contacts the outer surface 11 of the cup bottom. Also shown in Figure 1 is the gas distribution space 30 formed by the cup wall 20 and the inner surface 12 of the cup bottom. The gas distribution space 30 forms a platform for initial contact of the precursor gases supplied from the gas distribution channels 13.

[0033] FIG. 2 shows a gas distribution cup 1 according to the invention from the bottom side. The figure shows the outer surface 11 of the cup bottom with the inlet openings 13a to the gas distribution channels 13. The cup wall 20 extends beyond the cup bottom 10 such that a flange 40 is formed around the outer surface 11 of the cup bottom. The flange 40 comprises an alignment section 41 arranged to connect to an opposite section of the fixed gas manifold structure 2 in order to align the gas distribution cup 1 such that the gas distribution channels 13 align with the respective gas distribution channels of the fixed gas manifold structure 2. In the present embodiment shown in FIG. 2, the alignment section 41 is a protruding portion from the flange 40 towards the contact space 40a. However, the alignment portion 41 may have another shape suitable for orienting the outer surface 11 of the cup bottom of the gas distribution cup in the correct direction relative to the manifold surface 21 of the fixed gas manifold structure 2.

[0034] 3 shows an embodiment in which the gas supply space 30 comprises a gas homogenization surface 31 and a gas mixing cone 33. The gas homogenization surface 31 is arranged at a distance from and at least partially parallel to the cup bottom inner surface 12 in order to form a gas homogenization zone 32 between the cup bottom inner surface 12 and the gas homogenization surface 31. The gas homogenization surface 31 is provided at least partially facing the gas supply channels 13 or facing at least some of the gas supply channels 13. The shape of the gas homogenization surface 31 is arbitrary. In FIG. 3, an embodiment is shown in which the gas homogenization surface 31 is a plate arranged in a circumferential arc according to the cup wall 20 so as to leave an opening in the middle.

[0035] Also shown in FIG. 3 is a gas mixing cone 33 disposed in the gas supply space 30 and connected to a plate forming the gas homogenization surface 31. The gas mixing cone 33 is disposed at a distance from the gas homogenization surface 31 to form a gas mixing zone 34 between the gas homogenization surface 31 and the gas mixing cone 33. The gas mixing cone 33 has an apex 35 facing the opening of the gas supply cup 1, which faces the inner surface 12 of the cup bottom and is surrounded by the cup wall 20. The gas mixing cone 33 forms a gas mixing zone 34 between the inner surface 11 of the cup bottom and the gas mixing cone 33, or between the gas homogenization surface 31 and the gas mixing cone 33, if the gas homogenization surface 31 is not present.

[0036] In the gas homogenization zone 32, the gas from the gas supply channels 13 is homogenized, and in the gas mixing zone 36, the gas is mixed before exiting the gas supply cup 1. The mixing cone 33 and the cup wall 20 provide a flow path for the gas to flow from the mixing zone 32 to the gas supply space 30 and then exit the gas supply cup 1. The gas mixing cone 33 is therefore spaced apart from the cup wall 20 to provide a flow path from the gas mixing zone 34 to the gas supply space 30 outside the gas mixing zone 34.

[0037] Further, in Fig. 3, a gas manifold assembly according to the present invention is shown. The gas distribution cup 1 is connected to the gas manifold structure 2 by gravity. This means that there are no connecting parts connecting the gas distribution cup 1 and the gas manifold structure 2 together. The gas distribution cup 1 is mounted on the gas manifold structure 2 such that the outer surface 11 of the cup bottom is placed on the manifold surface 21 of the gas manifold structure 2. The gas distribution channels 13 of the gas distribution cup 1 are aligned with the respective gas distribution channels 23 of the gas manifold structure 2 to form a continuous gas distribution channel that runs from a gas supply source (not shown), through the gas manifold structure 2, via the gas manifold surface 21 and the outer surface 11 of the cup bottom of the gas distribution cup 1, through the gas distribution channels 13 of the gas distribution cup 1, and finally to the gas distribution space 30 in the cup wall 20 of the gas distribution cup, and is supplied to the reactor of the atomic layer deposition device. The cup wall 20 is surrounded by the gas manifold structure 2, thereby providing a space between the cup wall 20 and the gas manifold structure 2. In the embodiment shown in FIG. 3, one of the gas supply channels 13 forms a cone shape through the cup bottom 10 such that the inlet opening 13a of the gas supply channel 13 at the outer surface 11 of the cup bottom is smaller than the outlet opening 13b of the gas supply channel 13 at the inner surface 12 of the cup bottom. Also shown in FIG. 3 is a homogenization surface 31 provided in the gas supply space 30. The homogenization surface 31 is formed in connection with the cup wall 20. A central portion of the gas supply space 30 is left open to allow gas to flow from the homogenization zone 32 to the gas mixing zone 34. The gas mixing zone 34 is formed by a gas mixing cone 33. In this embodiment, the gas mixing cone 33 is connected to the homogenization surface 31. Also, the gas mixing cone 33 surrounds the open central portion of the homogenization surface 31. This allows gas flowing through the opening to enter the gas mixing cone 33.

[0038] The cup bottom 10 is preferably at least three times thicker than the cup wall 20. A thick cup bottom 10 provides the advantage that the precursor gases from the gas supply channels 13 form a gas barrier flow that prevents the penetration of the deposited film into the gas supply channels 13. This prevents the deposition of a film on the outer surface 11 of the cup bottom.

[0039] FIG. 3 also shows that a manifold base 22 having a manifold surface 21 is positioned in contact with the outer surface 11 of the cup bottom so that the gas supply channels 13 of the gas supply cup 1 are aligned with the respective gas supply channels 23 of the gas manifold structure 2 to form continuous gas supply channels.

[0040] 4 shows a fixed gas manifold structure 2 of the gas manifold assembly according to the present invention. The fixed gas manifold structure 2 further comprises a sealing flange 24 connected to the fixed gas manifold structure 2. The sealing flange 24 is arranged to form a coaxial opening between the outer wall of the gas distribution cup 1 and the inner wall 24a of the sealing flange 24 together with the cup wall 20 of the gas distribution cup 1. The coaxial opening is used to supply an inert gas, so that there is a gas barrier to prevent film growth on the outside of the gas distribution cup 1. This provides the advantage that the gas distribution cup 1 is the only part where film growth occurs when the precursor gases first come into contact, and can be easily removed from the atomic layer deposition apparatus.

[0041] 4 also shows manifold surface 21 on which gas distribution cup 1 is positioned. Cup bottom exterior surface 11 is positioned relative to manifold surface 21 such that gas distribution channels 3 of gas distribution cup 1 are aligned with respective gas distribution channels 23 of gas manifold structure 2. Also shown in FIG. 4 is alignment section 25 of gas manifold structure 2 provided on gas manifold base 22 that corresponds to alignment section 41 of gas distribution cup 1.

[0042] 5 shows a gas manifold assembly according to the present invention. The gas manifold assembly comprises a gas manifold structure 2 provided in the atomic layer deposition apparatus as a fixed part of the atomic layer deposition apparatus, a gas supply cup 2 provided in connection with the gas manifold structure 2, and a gas guide structure 50 connected with the gas manifold structure and extending to a reaction chamber 50 of the atomic layer deposition apparatus. The gas manifold structure 2 comprises gas supply channels 23 extending from a gas source to a manifold surface 21 and further to gas supply channels 13 of the gas supply cup 1 provided in the cup bottom 10. The gas supply channels 13 extend through the cup bottom 10. The gas supply cup 1 is removably arranged in connection with the gas manifold structure 2, whereby the outer surface 11 of the cup bottom is arranged against the manifold surface 21 and positioned on the gas manifold surface 21. The gas supply channels 13 of the gas supply cup 1 are aligned with the respective gas supply channels 23 of the gas manifold structure 2 to form a continuous gas supply channel. To guide gases from the gas distribution cup to the reaction chamber, the gas manifold assembly includes a gas directing structure 5 extending between the gas manifold structure 2 and a reaction chamber 50 of the atomic layer deposition apparatus. The gas distribution cup 1 is mounted within a sealing flange 24 of the gas manifold structure 2, which is connected to the gas directing structure 5.

[0043] The present invention has been described above with reference to the illustrated embodiment. However, the present invention is not limited to the above embodiment and may be modified in various ways within the scope of the claims.

Claims

1. A gas distribution cup (1) of an atomic layer deposition apparatus, the gas distribution cup (1) comprising: A gas manifold structure (2) of an atomic layer deposition apparatus is removably mounted to the fixed gas manifold structure (2); a cup bottom (10) comprising a plurality of gas supply channels (13) extending through the cup bottom (10) from an outer surface (11) of the cup bottom to an inner surface (12) of the cup bottom opposite the cup bottom (10); and A cup wall (20) that surrounds the cup bottom (10) and extends transversely to the cup bottom (10) in a direction away from the cup bottom (10) so that a gas supply space (30) is formed by the cup wall (20) and the inner surface (12) of the cup bottom on the inner surface side of the cup bottom (10). Equipped with The cup wall (20) extends at least partially further in a direction away from the cup bottom (10) on the outer surface side of the cup bottom (10) so that a flange (40) is formed outside the cup bottom (10) relative to the gas supply space (30). A gas supply cup (1).

2. 2. The gas supply cup (1) according to claim 1, characterized in that at least one of the gas supply channels (13) forms a conical shape through the cup bottom (10) such that an inlet opening (13a) of the gas supply channel (13) at an outer surface (11) of the cup bottom is smaller than an outlet opening (13b) of the gas supply channel (13) at an inner surface (12) of the cup bottom.

3. 3. The gas distribution cup (1) of claim 1 or 2, characterized in that the flange (40) comprises an alignment section (41) arranged to connect to an opposing section of the fixed gas manifold structure (2) for alignment with the gas distribution cup (1), whereby the gas distribution channels (13) are aligned with the respective gas distribution channels of the fixed gas manifold structure (2).

4. 4. The gas supply cup (1) according to claim 1, characterized in that the gas supply cup (1) comprises a gas homogenization surface (31) arranged in the gas supply space (30), the gas homogenization surface (31) being arranged at a distance from the inner surface (12) of the cup bottom and at least partially parallel to the inner surface (12) of the cup bottom, forming a gas homogenization zone (32) between the inner surface (12) of the cup bottom and the gas homogenization surface (31).

5. 5. The gas supply cup (1) according to claim 4, characterized in that the gas homogenization surface (31) comprises a passage (31a) through the homogenization surface (31) from the gas homogenization zone (32) to the gas supply space (30) outside the gas homogenization zone (32) for flowing gas from the gas supply channel (13) via the gas homogenization zone (32) to the gas supply space (30) outside the gas homogenization zone (32).

6. 6. The gas distribution cup (1) according to claim 1, further comprising a gas mixing cone (33) arranged in the gas distribution space (30), the gas mixing cone (33) being arranged at a distance from the inner surface (12) of the cup bottom to form a gas mixing zone (34) between the inner surface (12) of the cup bottom and the gas mixing cone (33).

7. 7. The gas supply cup (1) of claim 6, characterized in that the gas mixing cone (33) is positioned in the gas supply space (30) such that an apex (35) of the gas mixing cone (33) is furthest from the inner surface (12) of the cup bottom, and a gas flow zone (36) is provided between the gas mixing cone (33) and the cup wall (20) by positioning the gas mixing cone (33) at a distance from the cup wall (20) to provide a flow path from the gas mixing zone (34) to the gas supply space (30) outside the gas mixing zone (34).

8. 6. The gas supply cup (1) according to claim 4 or 5, characterized in that the gas supply cup (1) further comprises a gas mixing cone (33) arranged in the gas supply space (30), the gas mixing cone (33) being arranged at a distance from the gas homogenization surface (31) to form a gas mixing zone (34) between the gas homogenization surface (31) and the gas mixing cone (33).

9. 9. The gas supply cup (1) according to claim 8, characterized in that the gas mixing cone (33) is arranged in the gas supply space (30) such that the apex (35) of the gas mixing cone (33) is furthest from the gas homogenization surface (31), and a gas flow zone (36) is provided between the gas mixing cone (33) and the cup wall (20) by arranging the gas mixing cone (33) at a distance from the cup wall to provide a flow path from the gas mixing zone (34) to the gas supply space (30) outside the gas mixing zone (34).

10. 1. A gas manifold assembly for an atomic layer deposition apparatus, comprising: A gas manifold structure (2) provided in the atomic layer deposition apparatus as a fixed part of the atomic layer deposition apparatus; a gas distribution cup (1) having a cup bottom (10) with a plurality of gas distribution channels (13) extending through the cup bottom (10) from an outer surface (11) of the cup bottom to an inner surface (12) of the cup bottom on the other side of the cup bottom (10); and A gas guide structure (5) connected to the gas manifold structure (2) Equipped with The gas manifold structure (2) comprises a plurality of gas supply channels (23) extending from a gas source to a manifold surface (21); a gas distribution cup (1) removably disposed in connection with the gas manifold structure (2) such that an outer surface (11) of the cup bottom is disposed against the manifold surface (2), and the gas distribution channels (13) of the gas distribution cup (1) are aligned with respective gas distribution channels (23) of the gas manifold structure (2) to form continuous gas distribution channels; A gas directing structure (5) extends between the gas manifold structure (2) and the reaction chamber of the atomic layer deposition apparatus, the gas directing structure (5) being arranged to direct gas from a gas source through the gas supply channels (23) of the gas manifold structure (2), further through the gas supply channels (13) of the gas supply cup (1) and to the reaction chamber of the atomic layer deposition apparatus. A gas manifold assembly comprising:

11. 11. The gas manifold assembly of claim 10, wherein the gas supply cup (1) is positioned on the gas manifold structure (2) using gravity, and the gas supply channels (13) of the gas supply cup (1) are aligned with the gas supply channels (23) of the gas manifold structure (2) by an alignment structure.

12. 12. The gas manifold assembly of claim 11, characterized in that the alignment structure comprises an alignment section (41) of the gas supply cup (1) arranged to connect to an opposing section in the fixed gas manifold structure (2) for aligning the gas supply channels (13) of the gas supply cup (1) with the respective gas supply channels (23) of the gas manifold structure (2).

13. 13. The gas manifold assembly according to claim 12, characterized in that the alignment section (41) is arranged in connection with a flange (40) of the gas distribution cup (1).

14. Gas manifold assembly according to any of claims 10 to 13, characterized in that the gas supply cup (1) is as claimed in any of claims 1 to 9.

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