Hydrogen gas supply device and hydrogen gas supply system

Abstract

To supply hydrogen gas from which impurities such as moisture and oxygen have been suitably removed to a supply target requiring high-purity hydrogen gas. [Solution] The device is equipped with solenoid valves 7a, 7b which adjust the oxygen detection processing position by the oxygen detection unit 8 and the flow rate of hydrogen gas Gh to the storage unit 20 according to the control of a control unit 9, and the "removal processing unit (gas-liquid separation tank 3, hollow fiber membrane filter 4, oxygen removal filter 5 and moisture removal filter 6)" and the oxygen detection unit 8 are contained within a housing 10, and is configured so that the hydrogen gas Gh which has passed through the detection processing position is released into the housing 10, and the hollow fiber membrane filter 4 is arranged so as to be able to release moisture separated from the hydrogen gas Gh into the housing 10, and when the hydrogen purity of the hydrogen gas Gh determined based on the detection results by the oxygen detection unit 8 reaches a predetermined allowable supply purity, the control unit 9 controls the solenoid valves 7a, 7b to supply high-purity hydrogen gas Gh to the storage unit 20.

Description

[Technical field]

[0001] The present invention relates to a hydrogen gas supply device configured to be capable of supplying high-purity hydrogen gas from which impurities contained in the hydrogen gas have been removed to a supply target, and a hydrogen gas supply system including such a hydrogen gas supply device and an electrolysis treatment device that produces hydrogen gas by electrolysis treatment. [Background technology]

[0002] For example, the following patent document discloses a hydrogen generation system that generates high-pressure hydrogen by electrolyzing pure water generated from city water (public tap water) by a pure water supply device, and stores the generated hydrogen (hydrogen gas) in a hydrogen tank or the like so that it can be supplied to a fuel cell vehicle or the like. This hydrogen generation system includes a water electrolysis device that generates hydrogen gas from pure water, a gas-liquid separator that removes moisture contained in the hydrogen gas generated by the water electrolysis device, a water adsorption device that adsorbs and removes moisture contained in the hydrogen gas passed through the gas-liquid separator, and a hydrogen tank that can store the hydrogen gas passed through the water adsorption device. In this case, in this hydrogen generation system, the gas-liquid separator and water adsorption device are disposed in the hydrogen gas flow path from the water electrolysis device to the hydrogen tank, thereby preventing a situation in which hydrogen gas containing a large amount of moisture flows into the hydrogen tank.

[0003] It is also known that in the water electrolysis device (electrolysis treatment device) used in this type of system, immediately after the start of the hydrogen gas generation process (electrolysis process), the hydrogen gas generated contains a large amount of impurities such as oxygen, resulting in a low purity state of hydrogen gas. Therefore, in this hydrogen generation system, a back pressure valve mechanism is provided at an upstream portion of the flow path of the hydrogen gas generated in the water electrolysis device, and a configuration is adopted in which the back pressure valve mechanism discharges the hydrogen gas through a hydrogen discharge path in a "state in which the pressure of the hydrogen gas in the flow path has not reached a predetermined pressure" immediately after the start of the generation process. In addition, this hydrogen generation system is also configured to allow the flow of hydrogen gas toward the hydrogen tank when the pressure of the hydrogen gas in the flow path reaches or exceeds a predetermined pressure some time after the start of the generation process.

[0004] In addition, in this hydrogen generation system, an oxygen concentration meter that detects the oxygen contained in the hydrogen gas (specifies the oxygen concentration of the hydrogen gas) is disposed between the water electrolysis device and the gas-liquid separator in the hydrogen gas flow path, and in addition to the pressure conditions of the hydrogen gas in the flow path described above, a configuration is adopted in which when the oxygen concentration specified by the oxygen concentration meter becomes an oxygen concentration that can be used in the polymer electrolyte fuel cell, the back pressure valve mechanism allows the hydrogen gas to flow toward the hydrogen tank. With these configurations, this hydrogen generation system aims to avoid a situation in which "hydrogen gas containing a large amount of impurities such as oxygen (low purity hydrogen gas)" generated immediately after the start of the generation process by the water electrolysis device flows into the hydrogen tank. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] JP 2010-053378 A (pages 4-7, figures 1-4) Summary of the Invention [Problem to be solved by the invention]

[0006] However, the hydrogen generation system disclosed in the above-mentioned patent document has the following problems to be solved. Specifically, as described above, this hydrogen generation system attempts to prevent hydrogen gas containing a large amount of impurities such as oxygen from flowing into the hydrogen tank by regulating the flow of hydrogen gas toward the hydrogen tank until the oxygen concentration of the hydrogen gas generated by the water electrolysis device becomes equal to or lower than a predetermined concentration and the pressure of the hydrogen gas becomes equal to or higher than a predetermined pressure.

[0007] In this case, in the hydrogen generation system disclosed in the above patent document, an oxygen concentration meter for detecting the oxygen concentration is disposed between the water electrolysis device and the gas-liquid separator. Therefore, in this hydrogen generation system, the oxygen concentration meter detects the oxygen concentration of "hydrogen gas containing a large amount of moisture" after it is discharged from the water electrolysis device and before the moisture is separated in the gas-liquid separator. Therefore, in this hydrogen generation system, there is a risk that a large amount of moisture will adhere to the oxygen concentration meter, and in such a state, it will be difficult to accurately detect the amount of oxygen contained in the hydrogen gas. As a result, in this hydrogen generation system, there is a risk that the amount of oxygen contained in the hydrogen gas will be erroneously detected, and hydrogen gas with an insufficient amount of oxygen will flow into the hydrogen tank.

[0008] Here, in a fuel cell vehicle (fuel cell) or the like assumed as a supply target of the hydrogen gas generated in this hydrogen generation system, even if hydrogen gas containing a certain amount of impurities such as oxygen and moisture is supplied, the purpose (such as power generation using hydrogen gas) can be achieved. However, for example, hydrogen gas intended for use as a carrier gas in a gas chromatograph and as a reducing gas for photolithography and CVD processes of semiconductor devices must have a sufficiently higher hydrogen purity (a state in which the content of impurities such as moisture and oxygen is sufficiently low) than hydrogen gas used as a fuel gas in a fuel cell. For this reason, as described above, in the above hydrogen generation system in which there is a risk of oxygen-containing hydrogen gas flowing into the hydrogen tank, there is a problem in that it is difficult to supply hydrogen gas to a supply target that requires high-purity hydrogen gas, such as a gas chromatograph.

[0009] The present invention has been made in consideration of the problems to be solved, and its main object is to provide a hydrogen gas supply device and a hydrogen gas supply system that can supply hydrogen gas from which impurities such as moisture and oxygen have been suitably removed to a supply target that requires high-purity hydrogen gas. [Means for solving the problem]

[0010] In order to achieve the above object, the hydrogen gas supply device according to claim 1 is a hydrogen gas supply device including an impurity removal processing unit capable of performing an impurity removal process for removing impurities contained in hydrogen gas supplied from a supply source from the hydrogen gas, and configured to be capable of supplying the hydrogen gas after the impurity removal process to a supply target, the hydrogen gas supply device including an oxygen detection unit that detects oxygen in the hydrogen gas after the impurity removal process, a control unit that controls the supply state of the hydrogen gas to the supply target in accordance with a detection result by the oxygen detection unit, a housing that houses at least the removal processing unit and the oxygen detection unit, and a flow rate adjustment unit that adjusts the position of the oxygen detection process by the oxygen detection unit and the flow rate of the hydrogen gas to the supply target in accordance with the control of the control unit, the removal processing unit including a first removal processing unit having a gas-liquid separation tank that separates and removes moisture as an impurity contained in the hydrogen gas supplied from the supply source, and the hydrogen gas passed through the third removal processing unit has an oxygen removal filter that removes oxygen, as an impurity, from the hydrogen gas by a catalytic reaction; and a fourth removal processing unit has a moisture removal filter that adsorbs moisture, as an impurity, contained in the hydrogen gas passed through the third removal processing unit and removes it from the hydrogen gas, wherein the hydrogen gas passed through the detection processing position is configured to be released into the housing, and the second removal processing unit is arranged so that the hollow fiber membrane filter can release the moisture separated from the hydrogen gas into the housing, and the control unit determines the hydrogen purity of the hydrogen gas based on the detection result by the oxygen detection unit, and when the determined hydrogen purity reaches a predetermined supply allowable purity, controls the flow rate adjustment unit to supply the high-purity hydrogen gas to the supply target.

[0011] The hydrogen gas supply device of claim 2 is the hydrogen gas supply device of claim 1, wherein the control unit executes a purity notification process to notify purity information capable of identifying the hydrogen purity when a predetermined notification condition is satisfied.

[0012] A hydrogen gas supply device according to a third aspect of the present invention is the hydrogen gas supply device according to the first aspect, wherein the fourth removal processing section includes at least activated alumina as an adsorbent, and the moisture removal filter is configured accordingly.

[0013] A hydrogen gas supply system according to a fourth aspect of the present invention includes the hydrogen gas supply device according to any one of the first to third aspects of the present invention, and an electrolysis treatment device as the supply source that electrolyzes raw water to produce the hydrogen gas.

[0014] The hydrogen gas supply system of claim 5 is the hydrogen gas supply system of claim 4, further comprising a water tank capable of storing the raw water, the water tank and the electrolytic treatment device being housed within the housing, and the oxygen generated during the production of the hydrogen gas in the electrolytic treatment device being discharged to the outside of the housing via the water tank. Effect of the Invention

[0015] The hydrogen gas supply device according to claim 1 includes an oxygen detection unit that detects oxygen in hydrogen gas after an impurity removal process that removes impurities contained in hydrogen gas supplied from a supply source from the hydrogen gas, a control unit that controls the supply state of hydrogen gas to the supply target in accordance with the detection result by the oxygen detection unit, a housing that houses at least the removal processing unit that performs the impurity removal process and the oxygen detection unit, and a flow rate adjustment unit that adjusts the position of the oxygen detection process by the oxygen detection unit and the flow rate of hydrogen gas to the supply target in accordance with the control of the control unit, and the removal processing unit includes a first removal processing unit having a gas-liquid separation tank that separates and removes moisture as an impurity contained in the hydrogen gas supplied from the supply source, and a hollow fiber membrane that separates and removes moisture as an impurity contained in the hydrogen gas that has passed through the first removal processing unit. The apparatus is equipped with a second removal processing unit having a filter, a third removal processing unit having an oxygen removal filter that removes oxygen, an impurity contained in the hydrogen gas passed through the second removal processing unit, from the hydrogen gas by a catalytic reaction, and a fourth removal processing unit having a moisture removal filter that adsorbs moisture, an impurity contained in the hydrogen gas passed through the third removal processing unit, and removes it from the hydrogen gas. The apparatus is configured so that the hydrogen gas passed through the detection processing position is released into the housing, and the second removal processing unit is provided with a hollow fiber membrane filter so that it can release moisture separated from the hydrogen gas into the housing. The control unit determines the hydrogen purity of the hydrogen gas based on the detection result by the oxygen detection unit, and when the determined hydrogen purity reaches a predetermined allowable supply purity, controls the flow rate adjustment unit to supply high-purity hydrogen gas to the supply target.

[0016] Therefore, according to the hydrogen gas supply device of claim 1, by adopting a configuration in which the oxygen detection unit detects oxygen contained in hydrogen gas from which moisture has been removed by the removal processing unit (first removal processing unit, second removal processing unit, and fourth removal processing unit), it is possible to avoid a situation in which hydrogen gas containing a large amount of moisture flows into the position where oxygen is detected by the oxygen detection unit, and thus it is possible to correctly detect whether or not oxygen is contained in the hydrogen gas and how much oxygen is contained. In addition, by adopting a configuration in which hydrogen gas from which oxygen detection by the oxygen detection unit has been completed, i.e., hydrogen gas from which moisture has been removed by the removal processing unit, is discharged into the housing in which the second removal processing unit is housed, it is possible to sufficiently reduce the water vapor partial pressure outside the hollow fiber membrane filter in the second removal processing unit, and it is possible to suitably release moisture contained in the hydrogen gas passed through the inside of the hollow fiber membrane filter to the periphery of the hollow fiber membrane filter (second removal processing unit) (a mixture of the atmosphere and hydrogen gas in the housing). This sufficiently improves the moisture removal capability of the second removal processing unit, allowing the moisture contained in the hydrogen gas to be suitably removed in the second removal processing unit, and preventing moisture from adhering to the third removal processing unit, thereby maintaining the oxygen removal capability of the third removal processing unit in a suitable state. Furthermore, by adopting a configuration in which hydrogen gas is supplied to the supply target when the hydrogen purity specified based on the detection result by the oxygen detection unit reaches the supply allowable purity, it is possible to reliably avoid a situation in which low-purity hydrogen gas containing a large amount of oxygen is supplied.

[0017] In the hydrogen gas supply device of claim 2, the control unit executes a purity notification process to notify purity information capable of identifying the hydrogen purity when a predetermined notification condition is satisfied. Therefore, the hydrogen gas supply device of claim 2 allows a user to reliably and easily recognize whether high-purity hydrogen gas that has reached the allowable supply purity is being supplied to a supply target.

[0018] In the hydrogen gas supply device according to claim 3, the fourth removal processing section is provided with at least activated alumina as an adsorbent to form a moisture removal filter. Therefore, according to the hydrogen gas supply device according to claim 3, not only moisture, which is the main object of removal, but also carbon dioxide contained in the hydrogen gas can be suitably removed in the fourth removal processing section. This makes it possible to supply hydrogen gas of even higher purity to the supply target.

[0019] The hydrogen gas supply system according to claim 4 includes the above-mentioned hydrogen gas supply device and an electrolysis treatment device as a supply source that electrolyzes raw water to generate hydrogen gas. Therefore, unlike a generation device (supply source) that generates hydrogen gas by reforming fossil fuels or the like or by pyrolysis of biomass, the hydrogen gas supply system according to claim 4 can easily generate hydrogen gas by an electrolysis treatment device having a relatively simple configuration and supply it to a supply target. This allows the hydrogen gas supply system to be made compact, making it easy to store and carry.

[0020] The hydrogen gas supply system according to claim 5 includes a water tank capable of storing raw water, the water tank and the electrolysis treatment device are housed in a housing, and oxygen generated during hydrogen gas generation in the electrolysis treatment device is discharged to the outside of the housing via the water tank. Therefore, the hydrogen gas supply system according to claim 5 can discharge oxygen to the outside of the housing from a water supply port to the water tank without providing a dedicated exhaust port for discharging oxygen discharged from the electrolysis treatment device housed in the housing to the outside of the housing, and can preferably prevent the hydrogen gas discharged into the housing after the oxygen detection unit has completed detection of oxygen and the oxygen discharged from the electrolysis treatment device from being mixed in the housing. [Brief description of the drawings]

[0021] [Figure 1] FIG. 1 is a diagram showing the configuration of a hydrogen gas supply system 100. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0022] Hereinafter, embodiments of a hydrogen gas supply device and a hydrogen gas supply system will be described with reference to the accompanying drawings.

[0023] First, the configuration of a hydrogen gas supply system 100 will be described with reference to the accompanying drawings.

[0024] The hydrogen gas supply system 100 shown in Fig. 1 is an example of a "hydrogen gas supply system" and is configured to be capable of generating hydrogen gas Gh, removing impurities from the generated hydrogen gas Gh, and supplying the high-purity hydrogen gas Gh from which the impurities have been removed to a storage unit 20 (a hydrogen gas tank: hydrogen gas canister, which is an example of a "supply target"), as described below. Note that, in the hydrogen gas supply system 100 of this example, as an example, a configuration is adopted in which hydrogen gas Gh can be supplied to a detachable storage unit 20, but instead of the storage unit 20, a configuration can also be adopted in which hydrogen gas Gh is directly supplied to "various devices requiring high-purity hydrogen gas (another example of a "supply target")" such as a gas chromatograph.

[0025] This hydrogen gas supply system 100 includes a raw water tank 1, an electrolysis treatment device 2, a gas-liquid separation tank 3, a hollow fiber membrane filter 4, an oxygen removal filter 5, a moisture removal filter 6, solenoid valves 7a, 7b, an oxygen detection unit 8, and a control unit 9, and these components 1 to 9 are housed and packaged in a housing 10. In this example, the components 3 to 10 excluding the raw water tank 1 and the electrolysis treatment device 2 constitute a "hydrogen gas supply device." In this example, the gas-liquid separation tank 3, the hollow fiber membrane filter 4, the oxygen removal filter 5, and the moisture removal filter 6 work together to constitute a "removal treatment unit capable of performing an impurity removal process for removing impurities contained in hydrogen gas supplied from a supply source from the hydrogen gas."

[0026] The raw water tank 1 is an example of a "water tank" and is configured to store raw water W (an example of "raw water") that does not contain impurities and is generated by a pure water generating device (water purifier) ​​(not shown) or the like. In this case, in the hydrogen gas supply system 100 of this example, a water supply port (not shown) that can supply raw water W to the raw water tank 1 contained in the housing 10 is opened in the housing 10, and a configuration is adopted in which air is sucked in from this water supply port as the raw water W in the raw water tank 1 decreases, and oxygen Go that is discharged from the electrolysis treatment device 2 and guided to the raw water tank 1 is discharged as described later. Note that instead of such a configuration, an air vent for sucking air into the raw water tank 1 and discharging oxygen Go from the raw water tank 1 can be provided separately from the water supply port.

[0027] The electrolytic treatment device 2 is an example of an "electrolytic treatment device as a supply source" and is configured to electrolyze the raw water W stored in the raw water tank 1 to generate hydrogen gas Gh under the control of the control unit 9. In this case, in this type of "electrolytic treatment device", oxygen Go is generated along with the hydrogen gas Gh when hydrogen gas Gh is generated by electrolysis, and a small amount of raw water W is discharged together with the hydrogen gas Gh and the oxygen Go. Therefore, in the hydrogen gas supply system 100 of this example, as described below, the raw water W discharged together with the hydrogen gas Gh is separated from the hydrogen gas Gh in the gas-liquid separation tank 3, and the separated raw water W is allowed to flow into the raw water tank 1, and the raw water W discharged together with the oxygen Go is allowed to flow into the raw water tank 1 together with the oxygen Go, thereby effectively utilizing the raw water W as the raw water W used in the electrolytic treatment in the electrolytic treatment device 2.

[0028] The gas-liquid separation tank 3 is an example of a "gas-liquid separation tank" constituting the "first removal processing unit", and is configured to separate and remove the raw water W (water droplets) discharged together with the hydrogen gas Gh from the electrolysis treatment device 2 as described above, from the hydrogen gas Gh, and to store the removed raw water W. In this case, in the hydrogen gas supply system 100 of this example, an electromagnetic valve 3a is disposed in the water supply pipe from the gas-liquid separation tank 3 to the raw water tank 1, and a configuration is adopted in which the control unit 9 sends the raw water W in the gas-liquid separation tank 3 to the raw water tank 1 when it determines that a specified amount of raw water W has been stored in the gas-liquid separation tank 3 based on a sensor signal from a water level sensor (not shown).

[0029] The hollow fiber membrane filter 4 is an example of a "hollow fiber membrane filter" constituting the "second removal processing unit", and separates and removes moisture (water vapor) contained in the hydrogen gas Gh from which the raw water W (water droplets) has been removed when passing through the gas-liquid separation tank 3. Specifically, in the hollow fiber membrane filter 4 of this example, when the hydrogen gas Gh passed through the gas-liquid separation tank 3 passes through a tubular portion made of a non-porous hollow fiber membrane, due to the difference between the water vapor partial pressure of the hydrogen gas Gh in the tubular portion and the water vapor partial pressure of the atmosphere, etc. in the housing 10, moisture is moved from the inside of the tubular portion to the outside of the tubular portion, where the water vapor partial pressure is low, and is released around the tubular portion (inside the housing 10), thereby removing moisture from the hydrogen gas Gh in the tubular portion.

[0030] In this case, the hydrogen gas Gh passed through the gas-liquid separation tank 3 contains only a small amount of moisture, but when this small amount of moisture reaches the oxygen removal filter 5, not only does it become difficult to properly remove oxygen in the oxygen removal filter 5, but it may also lead to a situation in which the "oxygen removal ability" of the oxygen removal filter 5 decreases in a short period of time. For this reason, in the hydrogen gas supply system 100 of this example, a hollow fiber membrane filter 4 is disposed between the gas-liquid separation tank 3 and the oxygen removal filter 5 in order to sufficiently reduce the amount of moisture contained in the hydrogen gas Gh passed through the gas-liquid separation tank 3 that reaches the oxygen removal filter 5.

[0031] The oxygen removal filter 5 is an example of an "oxygen removal filter" constituting the "third removal processing unit", and removes oxygen contained in the hydrogen gas Gh passed through the hollow fiber membrane filter 4 from the hydrogen gas Gh by a catalytic reaction. In this case, in the oxygen removal filter 5 that removes oxygen from the hydrogen gas Gh by a catalytic reaction, a small amount of moisture is generated by the reaction between the oxygen to be removed and the hydrogen gas Gh.

[0032] The moisture removal filter 6 is an example of a "moisture removal filter" constituting the "fourth removal processing section", and adsorbs moisture (mainly moisture generated by a catalytic reaction in the oxygen removal filter 5) contained in the hydrogen gas Gh passed through the oxygen removal filter 5, and removes it from the hydrogen gas Gh. In this case, in the hydrogen gas supply system 100 of this example, as an example, two adsorption sections are provided in this order along the flow direction of the hydrogen gas Gh: an adsorption section filled with activated alumina granules (an example of "activated alumina") as a moisture adsorbent, and an adsorption section filled with synthetic zeolite (molecular sieve) granules as a moisture adsorbent. Note that the above-mentioned adsorbents are not limited to granules, and various shapes such as powder, rod, and plate can be adopted.

[0033] The solenoid valves 7a and 7b are an example of a "flow rate adjustment unit", and the solenoid valve 7a, in accordance with the control of the control unit 9, allows / restricts the flow of hydrogen gas Gh that has passed through the moisture removal filter 6 to the "oxygen detection processing position by the oxygen detection unit 8", and the solenoid valve 7b, in accordance with the control of the control unit 9, allows / restricts the flow (supply) of the hydrogen gas Gh that has passed through the moisture removal filter 6 to the storage unit 20.

[0034] In this case, in the hydrogen gas supply system 100 of this example, the solenoid valve 7a is shifted to an open state, and the solenoid valve 7b is shifted to a closed state, so that the entire amount of hydrogen gas Gh passed through the moisture removal filter 6 flows toward the "position of oxygen detection processing by the oxygen detection unit 8", and the solenoid valve 7a is shifted to a closed state, and the solenoid valve 7b is shifted to an open state, so that the entire amount of hydrogen gas Gh passed through the moisture removal filter 6 flows toward the storage unit 20 (an example of adjusting the "detection processing position and the flow rate of hydrogen gas to the supply target"). Instead of such a configuration, for example, instead of the solenoid valve 7a which is an opening / closing valve, a flow rate adjustment valve whose opening can be adjusted is disposed to configure the "flow rate adjustment unit", and by arbitrarily changing the opening of the flow rate adjustment valve while shifting the solenoid valve 7b to an open state, a part of the hydrogen gas Gh passed through the moisture removal filter 6 can flow toward the storage unit 20, while another part of the hydrogen gas Gh passed through the moisture removal filter 6 can flow toward the "position of oxygen detection processing by the oxygen detection unit 8".

[0035] The oxygen detection unit 8 is an example of an "oxygen detection unit that detects oxygen in hydrogen gas after impurity removal processing", and in the hydrogen gas supply system 100 of this example, the oxygen detection unit 8 is configured to include, as an example, a galvanic battery-type oxygen sensor. In this case, in the hydrogen gas supply system 100 of this example, a flow path for the hydrogen gas Gh is formed so that the hydrogen gas Gh that has been passed through the moisture removal filter 6 and has completed oxygen detection by the oxygen detection unit 8 (hydrogen gas Gh that has been passed through the oxygen detection processing position) is released into the housing 10.

[0036] The control unit 9 is an example of a "control unit" and controls the hydrogen gas supply system 100 in an overall manner. Specifically, the control unit 9 controls the electrolysis treatment device 2 to generate hydrogen gas Gh, and determines the hydrogen purity of the hydrogen gas Gh based on the detection result by the oxygen detection unit 8 for the hydrogen gas Gh generated by the electrolysis treatment device 2 and passed through the "removal treatment unit". In addition, when the determined hydrogen purity does not reach a predetermined allowable supply purity, the control unit 9 restricts the supply of the hydrogen gas Gh to the storage unit 20, and when the determined hydrogen purity reaches the predetermined allowable supply purity, the control unit 9 allows the supply of the hydrogen gas Gh to the storage unit 20 (an example of the process of "controlling the supply mode of hydrogen gas to the supply target according to the detection result by the oxygen detection unit").

[0037] In practice, a configuration is adopted in which the amount of moisture contained in the hydrogen gas Gh that has passed through the above-mentioned "removal processing unit" is identified, and the supply of hydrogen gas Gh to the storage unit 20 is permitted when the moisture amount is below a predetermined value. However, in order to facilitate understanding of the configurations of the "hydrogen gas supply device" and the "hydrogen gas supply system", an explanation of the identification of this moisture amount and the permission / restriction of the supply of hydrogen gas Gh to the storage unit 20 based on the identified results will be omitted.

[0038] In addition, when the hydrogen purity of the hydrogen gas Gh determined based on the detection result by the oxygen detection unit 8 does not reach the allowable supply purity (an example of "when a predefined notification condition is satisfied"), the control unit 9 executes a "purity notification process" in which the determined hydrogen purity (a numerical value indicating the purity, for example) is sequentially displayed on a display unit (not shown). In addition, when the hydrogen purity of the determined hydrogen gas Gh reaches the allowable supply purity and the control unit 9 permits the supply of the hydrogen gas Gh to the storage unit 20, the control unit 9 executes a "purity notification process" in which the oxygen detection unit 8 detects oxygen contained in the hydrogen gas Gh at predefined time intervals (another example of "when a predefined notification condition is satisfied") and the hydrogen purity is determined based on the detection result and displayed on the display unit.

[0039] Regarding the display (notification) of the hydrogen purity, instead of a configuration in which the hydrogen purity is specified each time, a configuration in which the specified hydrogen purity is displayed when the specified hydrogen purity falls below a specified purity (another example of "when a predefined notification condition is satisfied"), or when the specified hydrogen purity reaches a specified purity (another example of "when a predefined notification condition is satisfied"), can be adopted. Also, instead of (or in addition to) the "purity notification process at predefined time intervals" in a state in which the supply of hydrogen gas Gh to the storage unit 20 is permitted, the hydrogen purity specified based on the detection result by the oxygen detection unit 8 can be displayed when a purity display switch (not shown) is operated (another example of "when a predefined notification condition is satisfied").

[0040] Next, the operating principle of the hydrogen gas supply system 100 will be described with reference to the accompanying drawings.

[0041] When the hydrogen gas Gh is generated by the hydrogen gas supply system 100 and supplied (filled) to the storage unit 20, first, raw water W is supplied from the above-mentioned water supply port to store a sufficient amount of raw water W in the raw water tank 1. In this state, when a process start switch of an operation unit (not shown) is operated, the control unit 9 controls the electrolysis processing device 2 to start the electrolysis process (the process of generating hydrogen gas Gh). Since the process of generating hydrogen gas Gh (the electrolysis process) by the electrolysis processing device 2 is well known, a detailed description is omitted. In this case, at this time point of the start of the process, the control unit 9 shifts the solenoid valve 7b to a closed state and the solenoid valve 7a to an open state. As a result, the hydrogen gas Gh generated by the electrolysis processing device 2 passes through the gas-liquid separation tank 3, the hollow fiber membrane filter 4, the oxygen removal filter 5, the moisture removal filter 6, and the solenoid valve 7a in this order, and oxygen is detected at the oxygen detection process position by the oxygen detection unit 8, and then a flow path is formed through which the hydrogen gas Gh is released into the housing 10.

[0042] In this case, as described above, during the electrolysis process (the process of generating hydrogen gas Gh) by the electrolysis treatment device 2, oxygen Go is generated along with hydrogen gas Gh, and a small amount of raw water W is discharged from the electrolysis treatment device 2 together with the hydrogen gas Gh and oxygen Go. At this time, the oxygen Go discharged from the electrolysis treatment device 2 containing the raw water W is caused to flow into the raw water tank 1, so that the raw water W discharged together with the oxygen Go mixes with the raw water W stored in the raw water tank 1 and is reused as the raw water W for the electrolysis treatment in the electrolysis treatment device 2. This allows the effective use of expensive raw water W generated by a pure water generator or the like.

[0043] Furthermore, the oxygen Go that has flowed into the raw water tank 1 together with the raw water W is exhausted to the outside of the housing 10 from a water supply port (or a vent port for taking in air, etc.) provided in the raw water tank 1. This makes it possible to suitably avoid a state in which the oxygen Go discharged from the electrolytic treatment device 2 and the hydrogen gas Gh discharged into the housing 10 after the oxygen detection unit 8 detects oxygen being mixed in the housing 10 (a state in which the oxygen Go and the hydrogen gas Gh may react in the housing 10) without providing a dedicated exhaust port for exhausting the oxygen Go discharged from the electrolytic treatment device 2 to the outside of the housing 10.

[0044] On the other hand, when the hydrogen gas Gh discharged from the electrolytic treatment device 2 containing the raw water W is passed through the gas-liquid separation tank 3, the raw water W (water droplets) is separated and removed. The separated raw water W is stored in the gas-liquid separation tank 3, and when the amount of water stored in the gas-liquid separation tank 3 reaches a specified amount, the solenoid valve 3a is opened by the control unit 9, so that the raw water W flows from the gas-liquid separation tank 3 into the raw water tank 1. As a result, most of the water discharged from the electrolytic treatment device 2 together with the hydrogen gas Gh is also reused as raw water W for the electrolytic treatment in the electrolytic treatment device 2, and as a result, the expensive raw water W is effectively utilized.

[0045] Furthermore, the hydrogen gas Gh passed through the gas-liquid separation tank 3 has moisture removed when it is passed through the hollow fiber membrane filter 4, oxygen removed when it is passed through the oxygen removal filter 5, and moisture generated in the oxygen removal filter 5 is removed when it is passed through the moisture removal filter 6. As a result, unlike the configuration in which the oxygen concentration is detected by an oxygen concentration meter for "hydrogen gas containing a large amount of moisture" before the moisture is separated in the gas-liquid separator as in the above-mentioned hydrogen generation system, the hydrogen gas Gh from which moisture has been suitably removed reaches the oxygen detection processing position by the oxygen detection unit 8, making it possible to accurately detect the oxygen contained in this hydrogen gas Gh.

[0046] In this case, the moisture removal filter 6 employed in the hydrogen gas supply system 100 of this example is configured to have an adsorption section filled with activated alumina granules as an "adsorbent" for moisture, as described above. It has been confirmed that the activated alumina employed in this adsorption section not only has the ability to adsorb and remove moisture, but also has the ability to suitably adsorb and remove carbon dioxide contained in the hydrogen gas Gh. Therefore, the hydrogen gas Gh that has been passed through the moisture removal filter 6 is made to have a reduced amount of carbon dioxide, which is an "impurity," by passing through the adsorption section of the activated alumina granules.

[0047] In addition, the hydrogen gas Gh that has completed the detection of oxygen at the detection processing position is discharged into the housing 10 as described above. At this time, in this hydrogen gas supply system 100, the hollow fiber membrane filter 4 that removes moisture contained in the hydrogen gas Gh that has been passed through the gas-liquid separation tank 3 is disposed in the housing 10. Therefore, the hydrogen gas Gh from which moisture has been sufficiently removed when passing through the gas-liquid separation tank 3, the hollow fiber membrane filter 4, and the moisture removal filter 6 is discharged into the housing 10 after the detection of oxygen at the detection processing position, so that the relative humidity of the "mixture of air and hydrogen gas Gh" around the hollow fiber membrane filter 4 decreases, and the water vapor partial pressure in the housing 10 becomes sufficiently lower than the water vapor partial pressure of the hydrogen gas Gh that is being passed through the hollow fiber membrane filter 4. Therefore, the moisture can be suitably separated from the hydrogen gas Gh that is being passed through the hollow fiber membrane filter 4 and suitably discharged to the "mixture" in the housing 10 (around the hollow fiber membrane filter 4). As a result, the removal of moisture from the hydrogen gas Gh in the hollow fiber membrane filter 4 is more effectively performed. This sufficiently reduces the amount of moisture that reaches the oxygen removal filter 5 together with the hydrogen gas Gh, making it possible to accurately detect whether or not the hydrogen gas Gh contains oxygen and how much oxygen is contained.

[0048] On the other hand, the control unit 9 specifies the amount of oxygen contained in the hydrogen gas Gh passed through the moisture removal filter 6 based on the oxygen detection result by the oxygen detection unit 8, and specifies the hydrogen purity of the hydrogen gas Gh based on the specified amount of oxygen, and displays the hydrogen purity on a display unit (not shown). In this case, immediately after the start of the generation process by the electrolysis treatment device 2, the amount of oxygen contained in the hydrogen gas Gh discharged from the electrolysis treatment device 2 is large, so that this oxygen cannot be sufficiently removed by the oxygen removal filter 5, and the hydrogen purity of the hydrogen gas Gh passed through the moisture removal filter 6 becomes low. Therefore, immediately after the start of the generation process by the electrolysis treatment device 2, the low purity hydrogen purity specified by the control unit 9 is displayed on the display unit one by one. As a result, a person who sees this display can reliably and easily recognize that high purity hydrogen gas Gh is not being generated.

[0049] In addition, when a certain time has elapsed since the start of the generation process by the electrolytic processing device 2 and the hydrogen gas Gh containing a sufficiently reduced amount of oxygen can be generated, the oxygen contained in the hydrogen gas Gh can be suitably removed by the oxygen removal filter 5, and the amount of oxygen detected by the oxygen detection unit 8 is sufficiently reduced. At this time, the control unit 9 displays the hydrogen purity determined based on the detection result by the oxygen detection unit 8 on the display unit, and when the determined hydrogen purity reaches the supply allowable purity, the control unit 9 switches the solenoid valve 7a to a closed state and switches the solenoid valve 7b to an open state. As a result, the hydrogen gas Gh generated by the electrolytic processing device 2 passes through the gas-liquid separation tank 3, the hollow fiber membrane filter 4, the oxygen removal filter 5, the moisture removal filter 6, and the solenoid valve 7b in this order, forming a flow path for discharging (supplying) the hydrogen gas from the hydrogen gas supply system 100 to the storage unit 20.

[0050] As a result, high-purity hydrogen gas Gh, from which moisture has been removed by the gas-liquid separation tank 3, hollow fiber membrane filter 4, and moisture removal filter 6, and oxygen has been removed by the oxygen removal filter 5, is supplied to and stored in the storage unit 20. Furthermore, a person looking at the hydrogen purity displayed on the display unit can reliably and easily recognize that high-purity hydrogen gas Gh has been produced and stored in the storage unit 20.

[0051] As described above, in a state where hydrogen gas Gh is supplied from the hydrogen gas supply system 100 to the storage unit 20 and stored therein, the control unit 9 causes the oxygen detection unit 8 to detect oxygen contained in the hydrogen gas Gh at a predetermined time interval, and determines the hydrogen purity based on the detection result and displays it on the display unit. Specifically, when a specified time has elapsed since the time when the determination of the previous hydrogen purity is completed and the solenoid valve 7a is shifted to a closed state and the solenoid valve 7b is shifted to an open state (the time when the supply of hydrogen gas Gh to the storage unit 20 is started), the control unit 9 shifts the solenoid valve 7b to a closed state and shifts the solenoid valve 7a to an open state, and supplies the hydrogen gas Gh passed through the moisture removal filter 6 to a detection processing position of the oxygen detection unit 8 to cause the oxygen detection unit 8 to detect oxygen, and determines the hydrogen purity of the hydrogen gas Gh based on the detection result of the oxygen detection unit 8, and displays the determined hydrogen purity on the display unit.

[0052] At this time, when the identified hydrogen purity is below the allowable supply purity, i.e., when the oxygen concentration contained in the hydrogen gas Gh passed through the moisture removal filter 6 is high and the hydrogen gas Gh has a low purity, the control unit 9 maintains the state in which the solenoid valve 7b is switched to the closed state and the solenoid valve 7a is switched to the open state, and repeatedly executes the identification of the hydrogen purity of the hydrogen gas Gh based on the oxygen detection result by the oxygen detection unit 8. This prevents a situation in which low-purity hydrogen gas Gh that does not reach the allowable supply purity is supplied to and stored in the storage unit 20, and a person who sees the hydrogen purity displayed on the display unit can reliably and easily recognize that the state is not in which high-purity hydrogen gas Gh is generated.

[0053] On the other hand, when the specified hydrogen purity reaches the supply allowable purity, that is, when the oxygen concentration contained in the hydrogen gas Gh passed through the moisture removal filter 6 is low and the hydrogen gas Gh is of high purity, the control unit 9 transitions the solenoid valve 7a to a closed state and transitions the solenoid valve 7b to an open state. This resumes the state in which high-purity hydrogen gas Gh is supplied from the hydrogen gas supply system 100 to the storage unit 20 and stored therein, and a person who sees the hydrogen purity displayed on the display unit can reliably and easily recognize that high-purity hydrogen gas Gh is being generated.

[0054] Thereafter, when a sufficient amount of hydrogen gas Gh is stored in the storage unit 20 connected to the hydrogen gas supply system 100, the control unit 9 stops the generation of hydrogen gas Gh by the electrolysis treatment device 2, transitions the solenoid valve 7b to a closed state, and lights up a "filling completion indicator" (not shown) to notify that storage of hydrogen gas Gh in the storage unit 20 is completed. In this case, the hydrogen gas supply system 100 of this example employs, as an example, a configuration in which it is determined that a sufficient amount of hydrogen gas Gh has been stored in the storage unit 20 (storage of hydrogen gas Gh in the storage unit 20 has been completed) when the pressure of the hydrogen gas Gh in the storage unit 20 reaches a predetermined pressure. Instead of such a configuration, it is also possible to employ a configuration in which it is determined that storage of hydrogen gas Gh in the storage unit 20 has been completed when the pressure of the hydrogen gas Gh in the storage unit 20 is maintained at or above a predetermined pressure at a time point when a predetermined time has elapsed since the supply of hydrogen gas Gh to the storage unit 20 was stopped.

[0055] As described above, the "hydrogen gas supply device" in this hydrogen gas supply system 100 includes an oxygen detection unit 8 that detects oxygen in hydrogen gas Gh after an "impurity removal process" for removing impurities contained in hydrogen gas Gh supplied from a "supply source (in this example, the electrolysis treatment device 2)" from the hydrogen gas Gh, a control unit 9 that controls the supply state of hydrogen gas Gh to a "supply target (as an example, the storage unit 20)" in accordance with the detection result by the oxygen detection unit 8, a housing 10 that houses a "removal treatment unit (in this example, the gas-liquid separation tank 3, the hollow fiber membrane filter 4, the oxygen removal filter 5, and the moisture removal filter 6)" that performs the "impurity removal process" and the oxygen detection unit 8, and solenoid valves 7a, 7b that adjust the position of the oxygen detection process by the oxygen detection unit 8 and the flow rate of hydrogen gas Gh to the "supply target" in accordance with the control of the control unit 9. The system is equipped with a liquid separation tank 3, a hollow fiber membrane filter 4 which separates and removes moisture as an impurity contained in the hydrogen gas Gh which has been passed through the gas-liquid separation tank 3 from the hydrogen gas Gh, an oxygen removal filter 5 which removes oxygen as an impurity contained in the hydrogen gas Gh which has been passed through the hollow fiber membrane filter 4 from the hydrogen gas Gh by a catalytic reaction, and a moisture removal filter 6 which adsorbs moisture as an impurity contained in the hydrogen gas Gh which has been passed through the oxygen removal filter 5 and removes it from the hydrogen gas Gh, and is configured so that the hydrogen gas Gh which has been passed through the above-mentioned detection processing position is released into a housing 10, and the hollow fiber membrane filter 4 is arranged so that the moisture separated from the hydrogen gas Gh can be released into the housing 10, and a control unit 9 specifies the hydrogen purity of the hydrogen gas Gh based on the detection result by the oxygen detection unit 8, and when the specified hydrogen purity reaches a predetermined supply allowable purity, controls solenoid valves 7a, 7b to supply high-purity hydrogen gas Gh to the "supply target".

[0056] Therefore, according to the "hydrogen gas supply device", the oxygen detection unit 8 detects the oxygen contained in the hydrogen gas Gh from which moisture has been removed by the "removal treatment unit (gas-liquid separation tank 3, hollow fiber membrane filter 4, and moisture removal filter 6)". This makes it possible to avoid a situation in which hydrogen gas Gh containing a large amount of moisture flows into the oxygen detection treatment position by the oxygen detection unit 8, and thus makes it possible to correctly detect whether or not the hydrogen gas Gh contains oxygen and how much oxygen it contains. In addition, by adopting a configuration in which the hydrogen gas Gh from which oxygen detection by the oxygen detection unit 8 has been completed, i.e., the hydrogen gas Gh from which moisture has been removed by the "removal treatment unit", is discharged into the housing 10 in which the hollow fiber membrane filter 4 is housed, it is possible to sufficiently reduce the water vapor partial pressure outside the hollow fiber membrane in the hollow fiber membrane filter 4, and the moisture contained in the hydrogen gas Gh that is passed through the inside of the hollow fiber membrane can be suitably discharged to the periphery of the hollow fiber membrane (hollow fiber membrane filter 4) (the mixture of the atmosphere and hydrogen gas Gh in the housing 10). This can sufficiently improve the moisture removal ability of the hollow fiber membrane filter 4, so that the moisture contained in the hydrogen gas Gh can be suitably removed in the hollow fiber membrane filter 4, and adhesion of moisture to the oxygen removal filter 5 can be avoided, thereby maintaining an appropriate oxygen removal ability of the oxygen removal filter 5. Furthermore, by adopting a configuration in which the hydrogen gas Gh is supplied to a "supply target" such as the storage unit 20 when the hydrogen purity specified based on the detection result by the oxygen detection unit 8 reaches the allowable supply purity, it is possible to reliably avoid a situation in which low-purity hydrogen gas Gh containing a large amount of oxygen is supplied.

[0057] Furthermore, in the "hydrogen gas supply device" in this hydrogen gas supply system 100, the control unit 9 executes a "purity notification process" that notifies purity information that can identify the hydrogen purity when a predefined "notification condition" is satisfied. Therefore, this "hydrogen gas supply device" allows the user to reliably and easily recognize whether high-purity hydrogen gas Gh that has reached the allowable supply purity is being supplied to a "supply target" such as the storage unit 20.

[0058] Furthermore, in the "hydrogen gas supply device" in this hydrogen gas supply system 100, the moisture removal filter 6 is configured to include at least activated alumina (in this example, activated alumina granules are used as an example) as an adsorbent. Therefore, according to this "hydrogen gas supply device", not only the moisture, which is the main object to be removed, but also the carbon dioxide contained in the hydrogen gas Gh can be suitably removed by the moisture removal filter 6. This makes it possible to supply hydrogen gas Gh of even higher purity to the "object to be supplied" such as the storage unit 20.

[0059] The hydrogen gas supply system 100 also includes the above-mentioned "hydrogen gas supply device" and an electrolytic treatment device 2 as a "supply source" that generates hydrogen gas Gh by electrolyzing raw water W. Therefore, unlike a generation device (supply source) that generates hydrogen gas Gh by reforming fossil fuels or the like or by pyrolysis of biomass, the hydrogen gas supply system 100 can easily generate hydrogen gas Gh by the electrolytic treatment device 2 having a relatively simple configuration and supply it to a "supply target" such as the storage unit 20. This allows the hydrogen gas supply system 100 to be made compact, making it easy to store and carry.

[0060] The hydrogen gas supply system 100 is also provided with a raw water tank 1 capable of storing raw water W, and the raw water tank 1 and the electrolytic treatment device 2 are housed in a housing 10, and oxygen Go generated during the generation of hydrogen gas Gh in the electrolytic treatment device 2 is discharged to the outside of the housing 10 via the raw water tank 1. Therefore, according to the hydrogen gas supply system 100, it is possible to discharge oxygen Go to the outside of the housing 10 from a water supply port to the raw water tank 1 without providing a dedicated exhaust port or the like for discharging oxygen Go discharged from the electrolytic treatment device 2 housed in the housing 10 to the outside of the housing 10, and it is possible to suitably prevent the hydrogen gas Gh discharged into the housing 10 after the oxygen detection by the oxygen detection unit 8 is completed and the oxygen Go discharged from the electrolytic treatment device 2 from being mixed in the housing 10.

[0061] The configurations of the "hydrogen gas supply device" and the "hydrogen gas supply system" are not limited to the example configuration of the hydrogen gas supply system 100 described above.

[0062] For example, the fourth removal processing unit is provided with a moisture removal filter 6 having two adsorption units, an adsorption unit having activated alumina (activated alumina granules as an example) as an adsorption material and an adsorption unit having synthetic zeolite (synthetic zeolite granules as an example) as an adsorption material. However, the fourth removal processing unit may be provided with only one of the activated alumina adsorption unit and the synthetic zeolite adsorption unit, or the fourth removal processing unit may be provided by combining one or both of the activated alumina adsorption unit and the synthetic zeolite adsorption unit with an adsorption unit having an adsorption material other than activated alumina or synthetic zeolite. In this case, by adopting an adsorption material suitable for removing impurities to be removed as an adsorption material other than activated alumina or synthetic zeolite, it is possible to supply high-purity hydrogen gas Gh from which impurities other than moisture, oxygen, and carbon dioxide have been suitably removed.

[0063] Furthermore, although the configuration in which all of the components 1 to 9 are housed and packaged in the housing 10 has been described as an example, it is also possible to house only the other components 3 to 8 in the housing and package them without housing the raw water tank 1, the electrolysis treatment device 2, the control unit 9, etc. in the "housing" (not shown). Furthermore, although the configuration in which the raw water tank 1 capable of storing the raw water W used in the electrolysis treatment by the electrolysis treatment device 2 is provided as an example, it is also possible to adopt a configuration in which, instead of a "water tank" such as the raw water tank 1, a supply pipe for "raw water" capable of producing high-purity hydrogen gas Gh is directly connected to the electrolysis treatment device 2, and the "raw water" supplied through the supply pipe is electrolyzed to produce hydrogen gas Gh (not shown).

[0064] Furthermore, the above description uses an example of a configuration that includes an electrolytic treatment device 2 capable of producing hydrogen gas Gh by electrolytic treatment, and uses the electrolytic treatment device 2 as a "supply source" to remove impurities such as moisture and oxygen contained in the supplied hydrogen gas Gh; however, it is also possible to configure the system without including an "electrolytic treatment device" such as the electrolytic treatment device 2, and instead use an "electrolytic treatment device" as an external device, or a "storage unit: hydrogen gas canister" in which the hydrogen gas Gh produced in the external device is stored as a "supply source" connected to an "removal treatment unit (the gas-liquid separation tank 3, hollow fiber membrane filter 4, oxygen removal filter 5, and moisture removal filter 6 in the hydrogen gas supply system 100)" to remove "impurities" such as moisture and oxygen contained in the hydrogen gas Gh supplied from the "supply source" in the "removal treatment unit", thereby enabling high-purity hydrogen gas Gh to be supplied to a "supply target" such as the storage unit 20 (not shown).

[0065] In addition, an example has been described in which hydrogen gas Gh passed through the moisture removal filter 6 (hydrogen gas Gh from which various impurities have been removed by the "removal processing unit") is directly supplied to the storage unit 20 as the "supply target". However, instead of such a configuration, a "storage unit" other than the storage unit 20 capable of storing hydrogen gas Gh from which various impurities have been removed by the "removal processing unit" can be provided as a component of the "hydrogen gas supply device" or "hydrogen gas supply system", and the hydrogen gas Gh stored in this "storage unit" can be supplied to various "supply targets (including "storage units" such as the storage unit 20 in the above example)" (not shown).

[0066] Furthermore, while an example has been described in which a configuration is performed in which a numerical value indicating the hydrogen purity of hydrogen gas Gh determined based on the detection result of oxygen detection unit 8 is displayed on the display unit, instead of (or in addition to) such a configuration, a configuration can be adopted in which at least one of an indicator that is turned on when the determined hydrogen purity reaches the allowable supply purity and an indicator that is turned on when the determined hydrogen purity does not reach the allowable supply purity is provided, and a "purity notification process" is performed in which the determined hydrogen purity is notified by turning on / off the indicator, etc. Also, a configuration can be adopted in which a "purity notification process" is performed in which an alarm sound is emitted in accordance with the determined hydrogen purity, or the determined hydrogen purity is notified by voice. [Explanation of symbols]

[0067] 100 Hydrogen gas supply system 1 Raw water tank 2. Electrolysis treatment equipment 3 Gas-liquid separation tank 3a, 7a, 7b Solenoid valves 4. Hollow fiber membrane filter 5. Oxygen removal filter 6. Moisture removal filter 8 Oxygen detector 9. Control Unit 10. Chassis 20 Storage Gh Hydrogen gas Go Oxygen W raw water

Claims

1. A hydrogen gas supply device including an impurity removal processing unit capable of performing an impurity removal process for removing impurities contained in hydrogen gas supplied from a supply source from the hydrogen gas, and configured to be capable of supplying the hydrogen gas after the impurity removal process to a supply target, an oxygen detection unit that detects oxygen in the hydrogen gas after the impurity removal treatment; a control unit that controls a supply state of the hydrogen gas to the supply target in response to a detection result by the oxygen detection unit; a housing that accommodates at least the removal processing unit and the oxygen detection unit; a flow rate adjusting unit that adjusts the oxygen detection processing position by the oxygen detection unit and the flow rate of the hydrogen gas to the supply target under the control of the control unit, The removal processing unit includes: a first removal treatment unit having a gas-liquid separation tank for separating and removing moisture as the impurity contained in the hydrogen gas supplied from the supply source from the hydrogen gas; a second removal treatment unit having a hollow fiber membrane filter that separates and removes moisture as the impurity contained in the hydrogen gas that has passed through the first removal treatment unit from the hydrogen gas; a third removal treatment unit having an oxygen removal filter that removes oxygen as the impurity contained in the hydrogen gas that has passed through the second removal treatment unit from the hydrogen gas by a catalytic reaction; a fourth removal processing unit having a moisture removal filter that adsorbs moisture as the impurity contained in the hydrogen gas that has passed through the third removal processing unit and removes it from the hydrogen gas, The hydrogen gas that has passed through the detection processing position is discharged into the housing, the second removal processing unit is provided with the hollow fiber membrane filter so as to be able to release moisture separated from the hydrogen gas into the housing; The control unit determines the hydrogen purity of the hydrogen gas based on the detection results by the oxygen detection unit, and when the determined hydrogen purity reaches a predetermined allowable supply purity, controls the flow rate adjustment unit to supply high-purity hydrogen gas to the supply target.

2. 2 . The hydrogen gas supply device according to claim 1 , wherein the control unit executes a purity notification process for notifying purity information capable of identifying the hydrogen purity when a predetermined notification condition is satisfied.

3. 2. The hydrogen gas supply device according to claim 1, wherein the fourth removal processing section has a moisture removal filter including at least activated alumina as an adsorbent.

4. A hydrogen gas supply device according to any one of claims 1 to 3, A hydrogen gas supply system comprising an electrolysis treatment device as the supply source for electrolyzing raw water to generate the hydrogen gas.

5. The hydrogen gas supply system of claim 4, further comprising a water tank capable of storing the raw water, the water tank and the electrolytic treatment device being housed within the housing, and oxygen generated during the production of the hydrogen gas in the electrolytic treatment device being discharged to the outside of the housing through the water tank.

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