Method for filtering liquids or gases for electronics manufacturing - Patents.com

Abstract

A method for filtering a feed containing a liquid or gas for or during the production of electronics, nanosystems, or ultrapure water includes filtering the feed with at least one filter assembly, the at least one filter assembly including at least one isoporous block copolymer filtration membrane.

Description

[Technical field]

[0001] (CROSS REFERENCE TO RELATED APPLICATIONS) This application claims the benefit of U.S. Provisional Application No. 62 / 742,077, filed October 5, 2019, the entire contents of which are incorporated herein by reference. [Background technology]

[0002] With technological advances in the microelectronics and semiconductor industry, the minimum feature size of a node is constantly shrinking. Current technology already supports sub-10 nm nodes, such as 7 nm, with 5 nm node technology already under development. As a result of these nanoscopic features, extremely stringent purity is required for the environment, water, chemicals, and gases involved in the manufacturing of various electronics. Even a few nanoscale particles or contaminants on a wafer are not suitable for many electronics applications.

[0003] To address stringent purity requirements for electronics manufacturing, one of the most common approaches to purify environments, water, chemicals, and process gases is filtration. It is very difficult to remove particles with nanoscale dimensions, and even more so when removing more than 99.9% of nanoparticles, as required by the electronics industry. As the pore size of a membrane becomes smaller, flow through it becomes more restricted, making it more difficult to maintain high flow rates through the filter. In part, this is exacerbated by limitations of current filter technology; namely, current commercial technologies do not produce membranes with uniform nanoscale pore sizes and high pore densities that would allow higher flow rates while maintaining very high nanoparticle removal. Thus, one approach to improve membrane flow rates are larger pore membranes that operate by depth filtration, where particles are trapped within the thickness of the membrane in dead ends or small channels, rather than being rejected by an array of uniform pores smaller than the particle. Although these depth filters are widely used, they still contain many paths for small particles to pass through the filter, especially once all small particle paths are clogged with particles. Thus, these filters, which have pores larger than the particles targeted for removal, are not very effective at the complete nanoparticle rejection required by modern advanced electronics manufacturing. [Brief description of the drawings]

[0004] [Figure 1] FIG. 1 is a general schematic diagram of a process in which air is filtered through an isoporous block copolymer filtration membrane, such as cleanroom air filtration or process gas filtration. [Diagram 2]FIG. 1 is a general schematic diagram of a process in which a liquid is filtered through an isoporous block copolymer filtration membrane in a cross-flow configuration. Filtration is driven by a pump, and the retentate is circulated back to the feed through the retentate outlet. The filter assembly also has a vent. [Diagram 3] 1 is a general schematic diagram of a process in which a liquid is filtered through an isoporous block copolymer filtration membrane in a normal flow configuration. The filtration is driven by a pump. The filter assembly also has a vent. [Figure 4] 1 is a general schematic diagram of a process in which a liquid is filtered through an isoporous block copolymer filtration membrane in a normal flow configuration, where the filtration is driven by a compressed gas. [Diagram 5] 1 is a schematic diagram of a process in which a liquid is filtered through an isoporous block copolymer filtration membrane in a normal flow configuration, where the filtration is driven by a pump. [Figure 6] 1 is a schematic diagram of a process in which a large volume of liquid is filtered through an isoporous block copolymer filtration membrane in a normal flow configuration into a reservoir, the filtration being driven by compressed gas. [Figure 7] Schematic of a process in which a slurry is filtered through an isoporous block copolymer filtration membrane in a typical flow configuration for point of use in a chemical mechanical planarization step. The filtration is driven by a pump, which dispenses the filtered slurry onto a rotating polishing pad in contact with a wafer that is rotated by a wafer holder. [Figure 8] Schematic of a process in which liquid is filtered through an isoporous block copolymer filtration membrane in a typical flow configuration for point of use in a photolithography step, where the filtration is driven by a pump to dispense a spray of filtered liquid onto a wafer. [Figure 9]Schematic of a process in which large volumes of water are filtered through an isoporous block copolymer filtration membrane in a normal flow configuration into a reservoir for ultrapure water. Filtration is driven by a pressurized water source, and the reservoir feeds multiple faucets / dispensers. [Figure 10] Schematic of a process in which water is filtered through an isoporous block copolymer filtration membrane in a normal flow configuration for point of use ultrapure water. Filtration is driven by a pressurized water source and filtered ultrapure water is delivered to a faucet / dispenser. [Figure 11] Schematic of a process in which liquid is filtered through an isoporous block copolymer filtration membrane in a normal flow configuration for point of use in wet etching and cleaning steps. Filtration is driven by compressed gas to dispense filtered liquid into a liquid bath. [Figure 12] 1 is a schematic diagram of a process in which liquid is filtered through an isoporous block copolymer filtration membrane in a normal flow configuration for point of use in wet etching and cleaning steps. The filtration is driven by a pump, which distributes the filtered liquid to a liquid bath. The process further includes a drain that feeds a pump that can drive the bath liquid through a second isoporous block copolymer filter and feeds back to the bath liquid through a bath recirculation fill. [Figure 13] Schematic of a process in which liquid is filtered through an isoporous block copolymer filtration membrane in a normal flow configuration for point of use in wet etching and cleaning steps. The filtration is driven by a pump, which distributes the filtered liquid into a liquid reservoir. [Figure 14] Schematic of a process in which gas is filtered through an isoporous block copolymer filtration membrane in a normal flow configuration into a storage vessel, where the filtration is driven by a compressed gas cylinder and the filtered gas is collected / stored in a storage vessel that feeds multiple outlet valves.

[0005] Each of Figures 1-14 shows one or more of an air source 10, a fan 20, a filter assembly inlet 30, a filter assembly housing 40, an isoporous block copolymer film 50, a filter outlet 60, a filter assembly 70, a filter assembly retentate outlet 80, a filter assembly vent 90, a pump 100, a liquid supply 110, a compressed gas cylinder 120, a collection / storage vessel 130, a slurry supply inlet 135, a slurry dispensing outlet 140, a rotating wafer holder 150, a wafer 160, a rotating polishing pad 170, a liquid spray outlet 180, a pressurized water supply 190, a faucet / dispenser 200, a tank filler 210, a liquid tank 220, a tank drain 230, a tank recirculation filler 240, and an outlet valve 250. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0006] The following description of the embodiments is merely exemplary in nature and is in no way intended to limit the subject matter of the present disclosure, their application, or uses.

[0007] As used throughout, ranges are used as a shorthand for describing all values ​​within a range. Any value within the range can be selected as the end points of the range.

[0008] For the purposes of this specification and the appended claims, unless otherwise indicated, all numbers expressing quantities, percentages or ratios, and other numerical values ​​used in the specification and claims should be understood in all instances to be modified by the term "about". The use of the term "about" applies to all numerical values, whether or not they are explicitly stated. This term generally refers to a range of numbers that one of ordinary skill in the art would consider as a reasonable amount of deviation from the stated numerical values ​​(i.e., having an equivalent function or result). For example, this term can be interpreted to include a deviation of ±10 percent from a given numerical value, or a deviation of ±5 percent, or a deviation of ±1 percent, provided that such deviations do not alter the final function or value result. Thus, unless indicated to the contrary, the numerical parameters set forth in this specification and the appended claims are approximations that may vary depending on the desired properties sought to be obtained by the present invention.

[0009] It should be noted that as used in this specification and the appended claims, the singular forms "a," "an," and "the" include plural references unless expressly and unambiguously limited to one reference. As used herein, the term "include" and its grammatical variations are intended to be open-ended, such that the recitation of items in a list does not exclude other similar items that may be substituted for or added to the listed items. For example, as used herein and in the claims that follow, the terms "comprise" (and forms such as "comprising" and "comprises," derivatives, or variations thereof), "include" (and forms such as "including" and "include," derivatives, or variations thereof) and "has" (and forms such as "having" and "has," derivatives, or variations thereof) are inclusive (i.e., open-ended) and do not exclude additional elements or steps. Thus, these terms not only cover the recited element(s) or step(s), but may also include other elements or steps not expressly recited. Additionally, as used herein, the use of the terms "a" or "an" when used with an element may mean "one," but is also consistent with the meanings of "one or more," "at least one," and "one or more." Thus, an element preceded by "a" or "an" does not, without further constraints, preclude the existence of additional identical elements.

[0010] The present disclosure relates to water, chemical or gas filtration processes in the manufacture of electronics or nanosystems using at least one isoporous block copolymer filtration membrane. In the context of the present disclosure, "isoporous" means having a substantially narrow pore diameter distribution. Electronics manufacturing includes, for example, the manufacture of microelectronics, semiconductor electronics, electronic displays, flexible electronics, quantum electronics, integrated circuits, and lithography. Nanosystems include microfluidics and nanoparticle manufacturing.

[0011] For example, the inventors have found that newer filter technology, isoporous block copolymer films, such as those disclosed in US9527041B2, incorporated herein by reference, can be used in water, chemical or gas filtration processes in the manufacture of electronics or nanosystems. These block copolymer films are one solution to the challenging filtration required by current electronics manufacturers. Block copolymers are copolymers (polymers) that have two or more distinct "blocks" that differ in their chemical nature. Block copolymers can be processed into filtration membranes, where the copolymers self-assemble with a selective layer that contains pores with diameters of 5-100 nm. The self-assembly process allows for highly uniform pore sizes with high pore density at the nanoscale. The highly uniform nanopores can completely exclude nanoparticles smaller than the pores, and the high pore density allows for high flow rates despite the extremely small pores. Conventional filter technologies cannot achieve the combination of filter resolution and flow rates compared to these isoporous block copolymer filtration membranes. Isoporous block copolymer filtration membranes enable the extremely pure environments, chemicals, water, and gases required for current and future advanced electronics manufacturing

[0012] The isoporous block copolymer filtration membranes used in the inventive method of the present disclosure have mesopores, and these mesopores have a diameter of about 5 nm to about 100 nm. In at least one embodiment, the mesopore diameter is in the range of about 5 nm to about 100 nm. In at least one embodiment, the mesopore diameter is in the range of about 5 nm to about 75 nm. In at least one embodiment, the mesopore diameter is in the range of about 5 nm to about 50 nm. In at least one embodiment, the mesopore diameter is in the range of about 10 nm to about 100 nm. In at least one embodiment, the mesopore diameter is in the range of about 10 nm to about 75 nm. In at least one embodiment, the mesopore diameter is in the range of about 10 nm to about 50 nm. It is noted that the mesopores are typically the most selective pores of isoporous block copolymer filtration membranes, and the mesopore diameter largely determines the rejection characteristics of a given solute. For example, a mesopore diameter of about 20 nm tends to exclude solutes and particles larger than about 20 nm.

[0013] Block copolymers may contain multiple different chemistries in different sections called "blocks". In the context of isoporous block copolymer filtration membranes, the blocks and their relative positions in the copolymer can be designed to impart desired functionality in the filtration membrane. For example, the size, composition, and topology of the block copolymers in an isoporous block copolymer filtration membrane can all be designed to impart characteristic properties of the final filtration membrane and the filter assembly in which the membrane is incorporated. In addition, the manufacturing conditions of the filtration membrane affect the membrane properties, including parameters such as the concentration of the casting solution, the composition of the casting solution, the evaporation time, the relative humidity, and the composition and temperature of the coagulation bath. Thus, filtration membranes can be designed to have, for example, specific pore sizes, specific surface and / or interior chemistries through a combination of block copolymer composition and processing conditions. This versatility allows for control of the properties and functionality of the filtration membrane, and suitable filters can be produced for a given application. For example, isoporous block copolymer filtration membranes can be produced that are chemically resistant to the surface chemistry, allowing for use in harsh environments such as strong organic solvents, acids, or bases commonly used in electronics manufacturing. Additionally, either alone or in combination with another functionality, isoporous block copolymer filtration membranes can be designed to include thermally stable polymer chemistries that allow high temperature stability, allowing filtration at high temperatures, which are also commonly used in electronics manufacturing. Because of these multiple block chemistries, more than one functionality can be designed into the same isoporous block copolymer filtration membrane, e.g., a chemically and thermally resistant membrane.

[0014] In some embodiments, isoporous block copolymer filtration membranes containing multiple functionalities are used to filter gases or liquids in electronics manufacturing. Additionally, a functionality or multiple functionalities can be imparted to the isoporous block copolymer filtration membrane after it is formed. For example, chemical reactions after the filtration membrane is formed can impart chemical resistance, or antifouling properties to the membrane surface or bulk. Another example is the physical deposition of a functional conformal coating onto the membrane after it is formed. Any particular functionality can be designed or tailored by the extent of reaction or coating, and can be controlled, for example, by the amount of reagents or temperature. Varying the functionality allows the isoporous block copolymer to be incorporated into the various filtrations required for liquids and gases in electronics manufacturing. For example, an isoporous block copolymer filtration membrane for aqueous separations is likely to be hydrophilic to facilitate filtration of aqueous feed streams, an isoporous block copolymer filtration membrane for hydrophobic solvent feed streams is likely to be hydrophobic and solvent stable to facilitate filtration, and an isoporous block copolymer filtration membrane for high temperature liquids is likely to be high temperature stable to facilitate filtration.

[0015] A variety of multiblock copolymers can be used to prepare isoporous block copolymer filtration membranes. For example, the multiblock copolymer can be a diblock copolymer, a triblock copolymer, or a higher multiblock copolymer. In various embodiments, the multiblock copolymer is a triblock terpolymer with a structure of the form ABC or ACB, or other variable arrangements, or a triblock terpolymer with blocks of different chemical composition. In other embodiments, the additional structure is a higher multiblock copolymer system of the form ABCB, or ABCD, or ABCBA, or ABCDE, or other variable arrangements of these higher systems. The multiblock copolymer can be synthesized by methods known in the art. For example, the copolymer can be synthesized using anionic polymerization, atom transfer radical polymerization (ATPR), or other suitable polymerization techniques. The multiblock copolymer can also be commercially available.

[0016] The polymer blocks can have a wide range of molecular weights. For example, the blocks can range from 1×10 3 From 1×10 6 It has a number average molecular weight (Mn) of g / mol, including all values ​​up to and including ranges therebetween of 10 g / mol.

[0017] In some examples, the multiblock copolymer can have at least one hydrogen-bonding block. The hydrogen-bonding block can self-assemble with another structurally different polymer block (e.g., a hydrophobic block) of the multiblock copolymer. The hydrogen-bonding block has an acceptor or donor group that can participate in intramolecular hydrogen bonding. The hydrogen-bonding block can be a hydrophilic block. Examples of suitable hydrogen-bonding blocks include poly(methacrylates), such as poly((4-vinyl)pyridine), poly((2-vinyl)pyridine), poly(ethylene oxide), poly(methacrylates), poly(methyl methacrylate), and poly(dimethylethylaminoethyl methacrylate), poly(acrylic acid), and poly(hydroxystyrene). According to one embodiment, the hydrophilic block is poly((4-vinyl)pyridine).

[0018] Multiblock copolymers generally have one or more blocks that are hydrophobic blocks. The hydrophobic blocks form the matrix of the resulting isoporous block copolymer filtration membrane. For example, the multiblock copolymer can have one or two hydrophobic blocks in addition to the hydrogen-bonding block(s). Examples of suitable hydrophobic blocks include poly(styrene), such as poly(styrene) and poly(α-methylstyrene), polyethylene, polypropylene, polyvinyl chloride, and polytetrafluoroethylene.

[0019] In some embodiments, at least one of the additional hydrophobic blocks has a low glass transition temperature (T g ) block. Low T g Blocking means that the block is below T 25°C. g The multiblock copolymer has multiple low T g Can have a block. Suitable low T gExamples of blocks include poly(isoprene), poly(butadiene), poly(butylene), and poly(isobutylene). In one embodiment, the multiblock copolymer has a low T g The polymer block includes a poly(styrene) block, and a poly((4-vinyl)pyridine) block.

[0020] Examples of diblock copolymers suitable for the preparation of isoporous block copolymer filtration membranes include b-poly(styrene)-b-poly((4-vinyl)pyridine), poly(styrene)-b-poly((2-vinyl)pyridine), poly(styrene)-b-poly(ethylene oxide), poly(styrene)-b-poly(methyl methacrylate), poly(styrene)-b-poly(acrylic acid), poly(styrene)-b-poly(dimethylaminoethyl methacrylate), poly(styrene)-b-poly(ethylene oxide ... poly(hydroxystyrene), poly(α-methylstyrene)-b-poly(((4-vinyl)pyridine), poly(α-methylstyrene)-b-poly(((2-vinyl)pyridine), poly(α-methylstyrene)-b-poly(ethylene oxide), poly(α-methylstyrene)-b-poly(methyl methacrylate), poly(α-methylstyrene)-b-poly(acrylic acid), poly(α-methylstyrene)-b-poly(dimethylethylaminoethyl methacrylate), poly(α- methylstyrene)-b-poly(hydroxystyrene), poly(isoprene)-b-poly(((4-vinyl)pyridine), poly(isoprene)-b-poly(((2-vinyl)pyridine), poly(isoprene)-b-poly(ethylene oxide), poly(isoprene)-b-poly(methyl methacrylate), poly(isoprene)-b-poly(acrylic acid), poly(isoprene)-b-poly(dimethylaminoethyl methacrylate), poly(isoprene)-b-poly(hydroxy styrene), poly(butadiene)-b-poly(((4-vinyl)pyridine), poly(butadiene)-b-poly(((2-vinyl)pyridine)), poly(butadiene)-b-poly(ethylene oxide), poly(butadiene)-b-poly(methyl methacrylate), poly(butadiene)-b-poly(acrylic acid), poly(butadiene)-b-poly(dimethylethylaminoethyl methacrylate), and poly(butadiene)-b-poly(hydroxystyrene).

[0021] Examples of triblock copolymers suitable for the preparation of isoporous block copolymer filtration membranes include poly(isoprene-b-styrene-b-4-vinylpyridine), poly(isoprene)-b-poly(styrene)-b-poly((4-vinyl)pyridine), poly(isoprene)-b-poly(styrene)-b-poly((2-vinyl)pyridine), poly(isoprene)-b-poly(styrene)-b-poly(ethylene oxide), poly(isoprene)-b-poly(styrene)-b-poly(methyl methacrylate), poly(isoprene)-b-poly(styrene)-b-poly(acrylic acid). acid), poly(isoprene)-b-poly(styrene)-b-poly(dimethylethylaminoethyl methacrylate), poly(isoprene)-b-poly(styrene)-b-poly(hydroxystyrene), poly(isoprene)-b-poly(α-methylstyrene)-b-poly((4-vinyl)pyridine), poly(isoprene)-b-poly(α-methylstyrene)-b-poly((2-vinyl)pyridine), poly(isoprene)-b-poly(α-methylstyrene)-b-poly(ethylene oxide), poly(isoprene)-b-poly(α-methylstyrene)-b-poly(methy) poly(isoprene)-b-poly(α-methylstyrene)-b-poly(acrylic acid), poly(isoprene)-b-poly(α-methylstyrene)-b-poly(dimethylaminoethyl methacrylate), poly(butadiene)-b-poly(styrene)-b-poly(((4-vinyl)pyridine), poly(butadiene)-b-poly(styrene)-b-poly(((2-vinyl)pyridine), poly(butadiene)-b-poly(styrene)-b-poly(ethylene oxide), poly(butadiene)-b-poly(styrene)-b-poly(methyl methacrylate) ), poly(butadiene)-b-poly(styrene)-b-poly(acrylic acid), poly(butadiene)-b-poly(styrene)-b-poly(dimethylethylaminoethyl methacrylate), poly(butadiene)-b-poly(styrene)-b-poly(hydroxystyrene), poly(butadiene)-b-poly(α-methylstyrene)-b-poly(((4-vinyl)pyridine), poly(butadiene)-b-poly(α-methylstyrene)-b-poly(((2-vinyl)pyridine), poly(butadiene)-b-poly(α-methylstyrene)-b-poly(ethylene oxide),Poly(butadiene)-b-poly(α-methylstyrene)-b-poly(methyl methacrylate), poly(butadiene)-b-poly(α-methylstyrene)-b-poly(acrylic acid), poly(butadiene)-b-poly(α-methylstyrene)-b-poly(dimethylethylaminoethyl methacrylate), and poly(butadiene)-b-poly(styrene)-b-poly(hydroxystyrene).

[0022] The total molar mass of the multiblock copolymer can be such that the multiblock copolymer self-organizes (i.e., microphase separates). It is desirable to form a defect-free surface during the formation of mesoporous and macroporous structures. For example, the total molar mass of the multiblock copolymer can be 5×10 3 ~5×10 5 g / mol, including all values ​​up to and including 10 g / mol and ranges therebetween.

[0023] Multiblock copolymers are characterized by a range of polydispersities (M w / M n For example, the multiblock copolymer can have a polydispersity index (PDI) of 1.0 to 2.0, including all values ​​up to 0.1 and ranges therebetween. In some cases, it may be desirable for the multiblock copolymer to have a PDI of 1 to 1.4.

[0024] Equiporous block copolymer filtration membranes can have a variety of shapes. Filtration membranes can also have a wide range of sizes (e.g., membrane thickness and membrane area). For example, filters can have thicknesses from 5 microns to 500 microns, including all values ​​up to and including the micron range. Depending on the application, filters can be as thick as tens of centimeters. 2 From several tens (hundreds) of meters 2 The area may range from 0.01 to 0.05 mm.

[0025] The isoporous block copolymer filtration membrane can have desired properties. For example, the filtration membrane can have desired mechanical properties (e.g., toughness) and permeability. The mechanical properties of the filtration membrane can be tailored by using a selected multiblock copolymer. For example, the toughness of the filtration membrane can be improved by using a low T g An improvement can be achieved by using poly(isoprene) blocks.

[0026] The structural and performance properties of filtration membranes can include both stimuli responsive permeation and separation. The structure of the copolymers can be modified so that filters formed therefrom can allow logical control and transport of various liquids, solids and gases. For example, the pore size of the filtration membrane can be adjusted (e.g., increased or decreased) by hybridization of the membrane by incorporating homopolymers or small molecules in the deposition solution, or by exposing the membrane to a specific pH solution (e.g., by exposing the filter to a feed solution having a desired pH).

[0027] In some examples, an isoporous block copolymer filtration membrane according to the present disclosure can have a surface layer and a bulk layer. The surface layer can have a range of thicknesses. For example, the surface layer can have a thickness of 20 nm to 500 nm, including all values ​​up to nm and ranges therebetween. The surface layer can have a plurality of pores extending through the depth of the surface layer. The pores can have various morphologies, such as cylindrical and gyroid morphologies. The pores can have a size (e.g., diameter) of 5 nm to 100 nm, including all values ​​up to nm and ranges therebetween. The surface layer can have a range of pore densities. For example, the pore density of the surface layer can be 1×10 14 Pores / m 2 ~1×10 15 Pore / m 2 and 10 pores / m 2In some examples, the density of surface pores of a membrane as described herein is at least 10 14 Pore / m 2 The surface layer can be equiporous. By "equiporous" is meant that the pores have a narrow pore size distribution. For example, a narrow pore size distribution (ratio of the largest pore size to the smallest pore size (d max / d min ) can be 1 to 3, including all values ​​up to 0.1 and ranges therebetween. In various examples, (d max / d min ) is 1, 1.5, 2, 2.5, or 3. For example, the film includes a surface layer having vertically aligned, nearly monodisperse mesopores. In one embodiment, the equiporous surface layer has at least 1×10 14 Pore / m 2 and pore size distribution (d max / d min ).

[0028] The bulk layer can be a supporting sub-structure layer. The bulk layer can have a range of thicknesses. For example, the thickness of the bulk layer can be from 5 microns to 500 microns, including all values ​​up to microns and ranges therebetween. The pores in the bulk layer can be of a size (e.g., diameter) from 10 nm to 100 microns, including all values ​​up to nm and ranges therebetween. The bulk layer can have an asymmetric structure. For example, the bulk layer can have a sponge-like or finger-like structure. Moving from the top of the layer (e.g., the surface in contact with the surface layer) to the bottom of the layer (e.g., the free surface or surface in contact with the substrate), the pores increase in size. For example, the bulk layer can have pores with a size of 10 nm at the top of the bulk layer (the layer in contact with the surface layer), and the pores increase in size to 100 μm at the bottom of the bulk layer. The increase in pore size moving through the depth of the membrane (e.g., from the surface of the bulk film in contact with the surface layer to the surface of the bulk layer opposite the surface layer) provides an asymmetric structure. This bulk layer can be formed as a result of contacting (e.g., immersing) the block copolymer in a non-solvent bath (e.g., NIPS process).

[0029] In some examples, the isoporous block copolymer membrane according to the present disclosure can be a hybrid membrane. The hybrid membrane can further include a homopolymer or small molecule additive. The homopolymer or small molecule is blended into the block copolymer prior to the production of the filtration membrane. The homopolymer or small molecule can be blended (mixed) into the hydrogen-bonding block or hydrophobic block of the multiblock copolymer. The homopolymer or small molecule preferentially binds to one of the blocks of the block copolymer and is located near that block. For example, poly(phenylene oxide) can be mixed with the poly(styrene) block of the block copolymer. For example, poly(butadiene) can be mixed with the poly(isoprene) block of the block copolymer.

[0030] Any homopolymer having the same chemical composition as or capable of hydrogen bonding with at least one block (e.g., hydrogen-bonding block) of the block copolymer can be used. The homopolymer can have a hydrogen-bonding donor or a hydrogen-bonding acceptor. Examples of suitable homopolymers include poly((4-vinyl)pyridine), poly(acrylic acid), and poly(hydroxystyrene). It is desirable for the homopolymer or small molecule to have a low or negative Chi parameter in the hydrogen-bonding block (e.g., poly(4-vinyl)pyridine). A range of block copolymer to homopolymer ratios can be used. For example, the molar ratio of block copolymer to homopolymer can be from 1:0.05 to 1:10, including all ranges therebetween. The homopolymer can have a range of molecular weights. For example, the molecular weight of the homopolymer can be 5×10 2 g / mol~5×10 4 g / mol.

[0031] Any small molecule capable of hydrogen bonding to at least one block of the block copolymer can be used. The small molecule can have a hydrogen bond donor or a hydrogen bond acceptor. Examples of suitable small molecules include pentadecylphenol, dodecylphenol, 2-4'-(hydroxybenzeneazo)benzoic acid (HABA).1,8-naphthalene-dimethanol, 3-hydroxy-2-naphthoic acid, and 6-hydroxy-2-naphthoic acid. A range of block copolymer to small molecule ratios can be used. For example, the molar ratio of block copolymer to small molecule can be from 1:1 to 1:1000, including all integer ratios therebetween.

[0032] In some examples, the film further comprises an inorganic material. The inorganic material is disposed on at least a portion of the film (e.g., the top, the self-assembled surface layer surface, the pore surface of the surface layer, and the pore surface of the graded substructure). For example, the inorganic material can be in the form of nanoparticles. The nanoparticles can be, for example, 1-200 nm in diameter, including all values ​​up to nanometers and ranges therebetween. Examples of suitable inorganic materials include metals, metal oxides (e.g., silver oxide and copper oxide), and semiconductors (e.g., semiconductor nanoparticles such as CdS nanoparticles). For example, the inorganic material can be disposed on at least 50%, at least 60%, at least 70%, at least 80%, at least 90%, at least 95%, at least 99% of the surface of the film. In one example, the inorganic material is disposed on 100% of the surface of the film.

[0033] For example, the film further comprises a plurality of metal nanoparticles. The inorganic metal nanoparticles are disposed on at least a portion of the film (e.g., on the top, on the surface of the self-assembled surface layer, on the pore surface of the surface layer, and on the pore surface of the graded substructure). The nanoparticles can form complexes (e.g., via weak intramolecular forces) with the multiblock copolymers on the surface of the film. The nanoparticles can be, for example, 1-200 nm in diameter, including all values ​​up to nanometers and ranges therebetween. Examples of metals suitable for the metal nanoparticles include gold, silver, platinum, palladium, cobalt, copper, nickel, iron, zinc, chromium, ruthenium, titanium, zirconium, molybdenum, aluminum, and cadmium. The nanoparticles can be a mixture of different nanoparticles. For example, the metal nanoparticles can be disposed on at least 50%, at least 60%, at least 70%, at least 80%, at least 90%, at least 95%, at least 99% of the surface of the film. In one example, the metal nanoparticles are disposed on 100% of the surface of the film. A film having silver nanoparticles can exhibit antibacterial behavior.

[0034] The inorganic material can be deposited onto the film by methods known in the art, for example, the inorganic material can be deposited by electroless deposition.

[0035] In some embodiments, the isoporous block copolymer filtration membranes according to the present disclosure are used to filter particles or particulates from liquid or gas feeds. The particles or particulates to be removed are generally undesirable contaminants that can adversely affect the properties of a process or product. The particles or particulates can be, for example, nanoparticles, insoluble salts, dirt, dust, fibers, polymer particles, resin particles, metal ions, bacteria, or viruses. One or more suitable isoporous block copolymer filtration membranes can be selected for a particular application depending on the feed properties, such as composition, temperature, and concentration, as well as the properties of the potential contaminants, such as size and chemistry.

[0036] In some embodiments, at least one gas used in electronics manufacturing is filtered through at least one isoporous block copolymer filtration membrane (FIGS. 1 and 14). For example, gases that can be filtered are inert, such as nitrogen, argon, or krypton. Other examples include filtering gases that are hazardous, reactive, or corrosive, such as chlorine, ethylene oxide, silane, hydrogen chloride, hydrogen fluoride, or hydrogen sulfide. Filtration membranes and filter assemblies incorporating the membranes can be used to filter air, such as in clean room air purification. In at least one embodiment, the gas being filtered is a process gas during electronics manufacturing, such as silane or hydrogen fluoride.

[0037] In some embodiments, at least one liquid used in electronics manufacturing is filtered through at least one isoporous block copolymer filtration membrane (FIGS. 2-6, 8-13). For example, in some examples, the liquid to be filtered is aqueous, i.e., includes water. In some embodiments, the liquid to be filtered is aqueous and is used to produce or recycle ultrapure water (UPW) (FIGS. 9 and 10). Other examples include aqueous feeds that include an acid, such as hydrochloric acid or hydrofluoric acid. In other examples, the aqueous feeds further include a base, such as sodium hydroxide or potassium hydroxide. The feeds can include inorganic or organic chemicals. In at least one embodiment, the feed is a slurry (FIG. 7).

[0038] In at least one embodiment, water, gas, or liquid chemicals are filtered through bulk isoporous block copolymer filtration membranes (FIGS. 6 and 9). For example, 100 gallons of chemicals in a storage tank are filtered through an isoporous block copolymer filtration membrane and stored in another storage tank until ready for use. The isoporous block copolymer filtration membranes can be used to bulk filter liquids, which can be aqueous or non-aqueous. In at least one embodiment, the isoporous block copolymer filtration membranes are used to bulk filter liquids, which can include both aqueous and non-aqueous component liquids. In at least one embodiment, the isoporous block copolymer filtration membranes are used to bulk filter gases or gases.

[0039] In at least one embodiment, filtration is performed as a point of use (FIGS. 8 and 10-13). For example, an etchant chemical is filtered through an isoporous block copolymer filtration membrane just prior to being dispensed onto the wafer. For example, a photoresist removal solvent can be filtered before it is sprayed onto the wafer. Additionally, components of the photoresist removal solvent can be filtered during the process of manufacturing the photoresist removal solvent that will ultimately be used during the wafer processing step.

[0040] In at least one embodiment, filtration is performed in a recycling step (Figure 12) by, for example, spraying the wafer with a photoresist removal solvent and collecting the excess solvent and filtering it through an isoporous block copolymer filtration membrane, allowing the solvent to be reused.

[0041] In at least one embodiment, filtration is performed as part of an electronics manufacturer's equipment. For example, filtration can be performed on air as part of a clean room air filter. Another example is filtration of water for ultrapure water used in electronics manufacturing facilities.

[0042] In some embodiments, the isoporous block copolymer filtration membrane is housed in a filter assembly having an inlet, an outlet, an optional vent, and an optional retention outlet (FIGS. 1-14). In at least one embodiment, the filter assembly has one layer of isoporous block copolymer filtration membrane. In at least one embodiment, the filter assembly has two layers of isoporous block copolymer filtration membrane, where the two membrane layers are made of the same or different block copolymers. In at least one embodiment, the filter assembly includes three layers of isoporous block copolymer filtration membrane, where the three membrane layers are made of the same or different block copolymers. In some embodiments, when there is more than one layer of isoporous block copolymer filtration membrane, the layers are oriented with the most selective sides facing in the same direction. In some embodiments, when there is more than one layer of isoporous block copolymer filtration membrane, the layers are oriented with the most selective sides facing in different directions. In some embodiments, when more than one layer of isoporous block copolymer filtration membrane is present, the different filter layers can be of the same type of material, e.g., isoporous block copolymers having the same pore size, chemical composition, etc. In some embodiments, when more than one layer of isoporous block copolymer filtration membrane is present, the different filter layers can be of different types of material, e.g., isoporous block copolymers having different pore size, chemical composition, etc.

[0043] In some embodiments, isoporous block copolymer filtration membranes according to the present disclosure are operated in a normal flow configuration, also known as a dead end, where a feed liquid or gas is exposed to the filter inlet, then filtered, and then exits through the filter outlet (Figures 1 and 3-14).

[0044] In some embodiments, the isoporous block copolymer filtration membrane according to the present disclosure comprises: It is operated in a cross-flow configuration, also known as tangential flow, where the feed liquid or gas is exposed to the filter inlet and flows tangentially to the filter surface, with the filtered exiting through the filter outlet and the unfiltered feed passing through the retentate outlet and being recycled to the feed or feed reservoir (Figure 2).

[0045] The isoporous block copolymer filtration membrane according to the present disclosure can be used in various configurations. For example, the isoporous block copolymer filtration membrane can be used in flat sheet form, hollow fiber configuration, spiral wound configuration, cross-flow cassette, or pleated cartridge configuration. In some embodiments, the housing is, for example, a plastic capsule or point-of-use housing. In some embodiments, more than one configuration can be used.

[0046] In some embodiments, the isoporous block copolymer filtration membranes according to the present disclosure can be used for filtration at ambient temperatures, about 20-25°C.

[0047] In some embodiments, the isoporous block copolymer filtration membranes can be used for filtration at elevated temperatures, above 20-25° C. In at least one embodiment, the elevated temperature ranges from about 30° C. to about 200° C. In at least one embodiment, the elevated temperature ranges from about 50° C. to about 200° C. In at least one embodiment, the elevated temperature ranges from about 70° C. to about 200° C.

[0048] In some embodiments, the isoporous block copolymer filtration membranes can be used for filtration at temperatures below 20-25° C. In at least one embodiment, the low temperature is in the range of about 0° C. to about 20° C. In at least one embodiment, the low temperature is in the range of about 5° C. to about 20° C. In at least one embodiment, the low temperature is in the range of about 10° C. to about 20° C.

[0049] In some embodiments, an isoporous block copolymer filtration membrane according to the present disclosure can be used to filter gases or liquids during wet etching and cleaning processes (FIGS. 11-13). In at least one embodiment, an isoporous block copolymer filtration membrane can be used to filter gases during wet etching and cleaning processes. In at least one embodiment, an isoporous block copolymer filtration membrane can be used to filter liquids during wet etching and cleaning processes. In at least one embodiment, an isoporous block copolymer filtration membrane can be used to filter organic liquids during wet etching and cleaning processes. In at least one embodiment, an isoporous block copolymer filtration membrane can be used to filter aqueous liquids during wet etching and cleaning processes. In at least one embodiment, an isoporous block copolymer filtration membrane can be used to filter aqueous liquids during wet etching and cleaning processes, the liquids comprising a strong base. In at least one embodiment, an isoporous block copolymer filtration membrane can be used to filter aqueous liquids during wet etching and cleaning processes, the liquids comprising a dilute base. In at least one embodiment, the isoporous block copolymer filtration membrane can be used to filter aqueous liquids during wet etching and cleaning processes, the liquids comprising strong acids. In at least one embodiment, the isoporous block copolymer filtration membrane can be used to filter aqueous liquids during wet etching and cleaning processes, the liquids comprising dilute acids. In at least one embodiment, the isoporous block copolymer filtration membrane can be used to filter non-aqueous liquids during wet etching and cleaning processes, the liquids comprising organic solvents.

[0050] In at least one embodiment, an isoporous block copolymer filtration membrane can be used to filter liquids during wet etching and cleaning processes, where the liquid is at an elevated temperature, for example, about 75-80°C. In at least one embodiment, an isoporous block copolymer filtration membrane can be used to filter liquids during wet etching and cleaning processes, where the liquid is at an elevated temperature, for example, about 80-100°C. In at least one embodiment, an isoporous block copolymer filtration membrane can be used to filter liquids during wet etching and cleaning processes, where the liquid is at an elevated temperature, for example, about 100-105°C. In at least one embodiment, an isoporous block copolymer filtration membrane can be used to filter liquids during wet etching and cleaning processes, where the liquid is at an elevated temperature, for example, about 105-175°C. In at least one embodiment, an isoporous block copolymer filtration membrane can be used to filter liquids during wet etching and cleaning processes, where the liquid is at an elevated temperature, for example, about 175-180°C. In at least one embodiment, an isoporous block copolymer filtration membrane can be used to filter liquids during wet etching and cleaning processes, where the liquid is at an elevated temperature, e.g., about 180-190° C. In at least one embodiment, an isoporous block copolymer filtration membrane can be used to filter liquids during wet etching and cleaning processes, where the liquid is at an elevated temperature, e.g., about 190-200° C.

[0051] In at least one embodiment, an isoporous block copolymer filtration membrane according to the present disclosure can be used to filter liquids or gases in the manufacture of semiconductor electronics.

[0052] In at least one embodiment, an isoporous block copolymer filtration membrane according to the present disclosure can be used to filter liquids or gases in the manufacture of data storage materials.

[0053] In at least one embodiment, an isoporous block copolymer filtration membrane according to the present disclosure can be used to filter liquids or gases in the manufacture of electronic displays.

[0054] In at least one embodiment, an isoporous block copolymer filtration membrane according to the present disclosure can be used to filter liquids or gases in the manufacture of flexible electronics.

[0055] In at least one embodiment, an isoporous block copolymer filtration membrane according to the present disclosure can be used to filter liquids or gases in the production of nanoparticles.

[0056] In at least one embodiment, an isoporous block copolymer filtration membrane according to the present disclosure can be used to filter liquids or gases in the manufacture of microfluidics.

[0057] In at least one embodiment, an isoporous block copolymer filtration membrane according to the present disclosure can be used to filter liquids or gases in the manufacture of solid-state lighting.

[0058] In at least one embodiment, the isoporous block copolymer filtration membranes according to the present disclosure can be used to filter liquids or gases in the production of photovoltaics.

[0059] In at least one embodiment, an isoporous block copolymer filtration membrane according to the present disclosure can be used to filter air as an equipment-integrated cleanroom filter within a cleanroom facility.

[0060] In at least one embodiment, an isoporous block copolymer filtration membrane according to the present disclosure can be used to filter liquids during wafer dicing in the manufacture of semiconductor electronics.

[0061] In at least one embodiment, an isoporous block copolymer filtration membrane according to the present disclosure can be used to filter liquids during wet etching and cleaning processes, the liquids being at ambient temperature, for example, about 20-25° C. Some examples of chemicals and solutions that can be filtered for wet etching and cleaning processes include: water; ammonium hydroxide; hydrofluoric acid; trimethylammonium hydroxide; ammonium fluoride; chelating agents; anionic surfactants such as alkyl sulfates, alkyl bicarboxylates, aryl sulfates, alkoxy bisulfates, and alkyl polyacrylic acids; nonionic surfactants such as alkylphenoxy polyethylene oxide alcohols, alkylphenoxy polyglycidols, acetylene alcohols; zwitterionic surfactants such as betaines, sultaines, phosphatidylserines, and sphingomyelins; hydrocarbon surfactants; fluorocarbon surfactants such as fluorinated alkyl sulfonates; cationic surfactants such as alkyl sulfonium halides, alkyl ammonium halides, alkyl quaternary ammonium halides, alkyl benzyl alkonium halides, and alkyl phosphonium halides; sulfuric acid; hydrogen peroxide; phosphoric acid; nitric acid; and hydrochloric acid. These chemicals can be present in aqueous or non-aqueous solutions in a variety of concentrations and mixtures.

[0062] In some embodiments, the isoporous block copolymer filtration membrane according to the present disclosure can be used to filter liquids before and / or during the photolithography process (FIG. 8). In at least one embodiment, various chemicals used during photolithography for cleaning, deposition, development, etching are filtered by the isoporous block copolymer filtration membrane before any process step. In some embodiments, the isoporous block copolymer filtration membrane can be used to filter aqueous liquids, such as water, during the photolithography process. In at least one embodiment, the isoporous block copolymer filtration membrane can be used to filter non-aqueous liquids, including organic solvents, during the photolithography process. In at least one embodiment, the isoporous block copolymer filtration membrane can be used to filter mixtures of liquids, such as water mixed with one or more organic solvents, during the photolithography process. In at least one embodiment, the isoporous block copolymer filtration membrane can be used to filter mixtures of liquids, such as two or more organic solvents, during the photolithography process.Some examples of chemicals that can be filtered by the isoporous block copolymer filtration membranes are, for example: alcohols such as ethanol, methanol, isopropanol, butanol, hexanol, heptanol, octanol, decanol, benzyl alcohol; amides such as N,N-dimethylacetamide, N,N-dimethylformamide, N-methyl-2-pyrrolidone; amines such as piperidine, morpholine, pyridine, diethylenetriamine, pyrrolidone; ethers such as methoxyethane, tetrahydrofuran, dioxane, dimethoxyethane; n-butyl acetate, methyl acetate, ethyl acetate, propyl acetate, pentyl acetate, amyl acetate, propylene glycol monomethyl ether acetate, methyl formate, ethyl formate, propyl formate, butyl formate, lactic acid. esters such as ethyl, propyl lactate; glycols such as ethylene glycol, propylene glycol, triethylene glycol; glycol ethers such as ethylene glycol monomethyl ether, propylene glycol monomethyl ether, triethylene glycol monomethyl ether; halocarbons such as chloroform; hydrocarbons such as hexane, decane, octane, cyclohexane, pentane, toluene, xylene, benzene; ketones such as methyl ethyl ketone, octanone, nonanone, acetone, heptanone, hexanone, diisobutyl ketone, phenylacetone, cyclohexanone, acetylacetone, propylene carbonate; nitriles such as acetonitrile; sulfones such as sulfolane; and sulfoxides such as dimethyl sulfoxide.

[0063] In some embodiments, the isoporous block copolymer filtration membrane can be used to filter a slurry during a chemical mechanical planarization process (FIG. 7). In at least one embodiment, the isoporous block copolymer filtration membrane can be used to filter a slurry in bulk for a chemical mechanical planarization process. In at least one embodiment, the isoporous block copolymer filtration membrane can be used to filter a slurry as a point of use during a chemical mechanical planarization process. Some examples of chemicals, materials, and solutions that may be present in the slurry and filtered for the chemical mechanical planarization process are: water; bases such as sodium hydroxide, potassium hydroxide, polyethyleneimine, ammonia, tetramethylammonium hydroxide, or ammonium hydroxide; acids such as nitric acid, hydrochloric acid, chloroacetic acid, sulfuric acid, succinic acid, citric acid, acetic acid, para-toluenesulfonic acid, benzenesulfonic acid, and sulfonic acids; colloidal oxides such as alumina, ceria, silica, titania, zirconia; alkylphenoxy polyethylene oxide alcohols, alkylphenoxy polyglycidols, acetylenic alcohols, propylene glycol, polyethylene glycol alkyl ethers, ethoxylated alcohols, polyethylene glycol octylphenyl ethers, glycerol alkyl esters, nonionic surfactants such as sorbitan alkyl esters, polyethylene glycol copolymers; fluorinated surfactants such as fluorinated alkyl sulfonates; zwitterionic surfactants such as betaines, sultanes, phosphatidylserines, sphingomyelins; anionic surfactants such as alkyl sulfates, alkyl bicarboxylates, aryl sulfates, alkoxy bisulfates, alkyl polyacrylates; cationic surfactants such as alkyl sulfonium halides, alkyl ammonium halides, alkyl quaternary ammonium halides, alkyl benzyl alkonium halides, alkyl phosphonium halides; corrosion inhibitors such as benzotriazoles, triazoles, pyrazoles, imidazoles, benzimidazoles; oxidizing agents such as percarbonates, hydrogen peroxide, peracids, permanganates, periodic acid, nitric acid, etc.

[0064] In some embodiments, isoporous block copolymer filtration membranes can be used to filter water for ultrapure water (FIGS. 9 and 10). In at least one embodiment, isoporous block copolymer filtration membranes can be used to filter water for ultrapure water where the filtration membrane is integrated into the production facility, i.e., permanent piping. In at least one embodiment, isoporous block copolymer filtration membranes can be used to filter water for ultrapure water where the filtration membrane is located at or near the point of use, i.e., on the manufacturing equipment where the ultrapure water is dispensed.

[0065] In some embodiments, the feed is a liquid and the pressure difference across the isoporous block copolymer filtration membrane is caused by a gas pressurizing the feed (FIGS. 1, 4, 6, 11, 14). In some embodiments, the feed is a liquid and the pressure difference across the isoporous block copolymer filtration membrane is caused by a pump pressurizing the feed (FIGS. 2, 3, 5, 7, 8, 12, 13). In some embodiments, the feed is a gas and the pressure difference across the isoporous block copolymer filtration membrane is caused by a pressurized source, e.g., a pressurized gas cylinder. In some embodiments, the feed is a gas and the pressure difference across the isoporous block copolymer filtration membrane is caused by a fan. In some embodiments, the feed is water and the pressure difference is caused by a pressurized source, e.g., a building water inlet (FIGS. 9 and 10). In some embodiments, the pressure difference across the isoporous block copolymer filtration membrane is constant. In some embodiments, the pressure difference across the isoporous block copolymer filtration membrane is variable, e.g., the pressure difference is increased during the process. In some embodiments, the pressure difference across the isoporous block copolymer filtration membrane is about 1 bar to about 20 bar. In at least one embodiment, the pressure difference across the isoporous block copolymer filtration membrane is about 1 bar to about 10 bar. In at least one embodiment, the pressure difference across the isoporous block copolymer filtration membrane is about 1 bar to about 7 bar. In at least one embodiment, the pressure difference across the isoporous block copolymer filtration membrane is about 1 bar. In at least one embodiment, the pressure difference across the isoporous block copolymer filtration membrane is about 2 bar. In at least one embodiment, the pressure difference across the isoporous block copolymer filtration membrane is about 3 bar. In at least one embodiment, the pressure difference across the isoporous block copolymer filtration membrane is about 4 bar. In at least one embodiment, the pressure difference across the isoporous block copolymer filtration membrane is about 5 bar. In at least one embodiment, the pressure difference across the isoporous block copolymer filtration membrane is about 6 bar. In at least one embodiment, the pressure difference across the isoporous block copolymer filtration membrane is about 7 bar.In at least one embodiment, the pressure differential across the isoporous block copolymer filtration membrane is about 10 bar.

[0066] In various embodiments, the flux of the filtration membrane may vary depending on the filter pore size, solute removal rating, feed chemical composition, process pressure differential, etc. In at least one embodiment, the flux of the filtration membrane in a liquid filtration process is about 80 LMH / bar (liters per cubic meter). 2 / h / bar) to about 3000 LMH / bar. In at least one embodiment, the flux of the membrane in the liquid filtration process is between about 80 LMH / bar and about 100 LMH / bar. In at least one embodiment, the flux of the membrane in the liquid filtration process is between about 100 LMH / bar and about 300 LMH / bar. In at least one embodiment, the flux of the membrane in the liquid filtration process is between about 100 LMH / bar and about 200 LMH / bar. In at least one embodiment, the flux of the membrane in the liquid filtration process is between about 200 LMH / bar and about 1000 LMH / bar. In at least one embodiment, the flux of the membrane in the liquid filtration process is between about 1000 LMH / bar and about 3000 LMH / bar. In at least one embodiment, the flux of the membrane in the liquid filtration process is between about 1000 LMH / bar and about 2000 LMH / bar. It should be noted that flux characteristics depend on many factors, including temperature, pressure, feed stream composition and purity, filtration membrane pore size, filter assembly configuration, and the like.

[0067] The retention rating of a filtration membrane can be defined as a rejection percentage (e.g., 100 x (solute concentration in the permeate) / (solute concentration in the feed)). This can alternatively be expressed as a log rejection value (LRV) of the solute, e.g., 1 LRV = 90% rejection of the solute = 1 log rejection value, 2 LRV = 99% rejection of the solute, 3 LRV = 99.9% rejection of the solute, etc. In some embodiments, the retention rating of the isoporous block copolymer filtration membrane in the filter assembly for separation is between about 90% rejection (1 LRV) and 99.99999999% rejection (10 LRV). In at least one embodiment, the retention rating of the isoporous block copolymer filtration membrane in the filter assembly for separation is between about 90% rejection (1 LRV) and 99.9% rejection (3 LRV). In at least one embodiment, the retention rating of the isoporous block copolymer filtration membrane in the filter assembly for separation is between about 90% rejection (1 LRV) and 99.9% rejection (3 LRV). In at least one embodiment, the retention rating of the isoporous block copolymer filtration membrane in the filter assembly for separation is between about 99.9% rejection (3 LRV) and 99.9999% rejection (6 LRV). In at least one embodiment, the retention rating of the isoporous block copolymer filtration membrane in the filter assembly for separation is between about 99.9999% rejection (6 LRV) and 99.99999999% rejection (10 LRV). It should be noted that the rejection characteristics depend on several factors, including temperature, pressure, feed stream composition and purity, filtration membrane pore size, filter assembly configuration, etc.

[0068] Each of Figures 1-14 shows one or more of the following elements: air source 10, fan 20, filter assembly inlet 30, filter assembly housing 40, isoporous block copolymer film 50, filter outlet 60, filter assembly 70, filter assembly retentate outlet 80, filter assembly vent 90, pump 100, liquid source 110, compressed gas cylinder 120, collection / storage vessel 130, slurry supply 135, slurry dispensing outlet 140, rotating wafer holder 150, wafer 160, rotating polishing pad 170, liquid spray outlet 180, pressurized water supply 190, faucet / dispenser 200, tank fill 210, liquid tank 220, tank drain 230, tank recirculation fill 240, and outlet valve 250. Features shown in the figures may be present in various configurations within the same or different embodiments.For example, the air sources 10 may vary in purity, pressure, composition, etc.; the fans 20 may vary in material, power, size, air flux, etc.; the filter inlets 30 may vary in material, diameter, location, etc.; the filter housings 40 may vary in material, size, shape, etc.; the porous block copolymer filtration membrane materials 50 may vary in composition, polymer size, number of polymer blocks, number of layers, pore size, surface chemistry, chemical compatibility, thermal compatibility, hydrophilicity, thickness, flux, etc.; the filter outlets 60 may vary in material, diameter, location, etc.; the filter assemblies 70 may vary in material, size, shape, number of filter layers, etc.; the filter retentate outlets 80 may vary in material, diameter, location, etc. the filter vent 90 may vary in material, diameter, location, etc.; the pumps 100 may vary in material, type, size, power, liquid compatibility; the liquid supply 110 may vary in chemical composition, concentration, temperature, purity, viscosity, density, etc.; the compressed gas cylinders 120 may vary in gas stored therein, size, pressure, material, etc.; the collection / storage vessels 130 may vary in material, size, pressure rating, configuration, etc.; the slurry supply 135 may vary in chemical composition, concentration, temperature, purity, viscosity, density, etc.; the slurry dispensing outlets 140 may vary in material, diameter, location, etc.; the liquid spray outlets 180 may vary in material, diameter, location, liquid velocity rating, etc. pressurized water supply 190 may vary in pressure, configuration, pressure, water source, etc.; faucet / dispenser 200 may vary in material, diameter, location, liquid velocity rating, etc.; tank fill 220 may vary in material, diameter, location, liquid velocity rating, etc.; liquid tank 220 may vary in material, size, configuration, etc.; tank drain 230 may vary in material, diameter, location, etc.; tank recirculation fill 240 may vary in material, diameter, location, etc.; outlet valve 250 may vary in material, diameter, location, etc.

[0069] example

[0070] Example 1. In this example, a wet etch clean bath filtration and recirculation process is performed (see FIG. 12). The feed composition to be filtered is an aqueous solution containing 30 vol.% hydrogen peroxide and 30 vol.% ammonia. The filtration assembly is in the form of a capsule and operates in a normal flow, in-line configuration, where the feed enters the filtration assembly from the liquid bath and the filtered product re-enters the bath via a recirculation fill. The filtration assembly includes a single layer isoporous block copolymer filtration membrane that is hydrophilic, thermally stable, and chemically resistant to alkali and oxidizing agents, with an average pore size of about 10 nm and a flux of about 1500 LMH / bar. The most selective side of the membrane faces the feed inlet from the liquid bath. The filtration process is performed at 80° C. with a partial pressure of about 2 bar applied across the filtration membrane. The filtration membrane removes particulates having a diameter of about 10 nm or greater at an LRV of about 3.

[0071] Example 2. In this example, a wet etch clean bath filtration and recirculation process is performed (see FIG. 12). The feed composition to be filtered is an aqueous solution containing 2 vol% hydrofluoric acid. The filtration assembly is in the form of a capsule and operates in a normal flow, in-line configuration, where the feed enters the filtration assembly from the liquid bath and the filtered output re-enters the bath via a recirculation packing. The filtration assembly includes a single layer isoporous block copolymer filtration membrane that is chemically resistant to acid and has an average pore size of about 20 nm and a flux of about 2000 LMH / bar. The most selective side of the membrane faces the feed inlet from the liquid bath. The filtration process is performed at 25° C. with a partial pressure of about 2 bar applied across the filtration membrane. The filtration membrane removes particulates having a diameter of about 20 nm or greater at an LRV of about 4.

[0072] Example 3. In this example, photolithography solvent filtration is performed (see FIG. 8). The feed composition to be filtered is propylene glycol methyl ether acetate (PGMEA). The filtration assembly is in the form of a capsule and operates in a normal flow, in-line configuration, where the feed enters the filtration assembly from a liquid source and the filtered output leaves the filtration assembly via the filter assembly outlet to a liquid spray outlet. The filtration assembly includes a single layer isoporous block copolymer filtration membrane that is chemically resistant to the solvent and has an average pore size of about 15 nm and a flux of about 300 LMH / bar. The most selective side of the membrane faces the feed inlet from the liquid source. The filtration process is performed at 25° C. with a partial pressure of about 2 bar applied across the filtration membrane. The filtration membrane removes particles in the form of polymer particles and gels with a diameter of about 20 nm or greater at an LRV of about 4.

[0073] Example 4. In this example, bulk filtration is performed (see Figures 6 and 9). The feed composition to be filtered is isopropanol. The filtration assembly is in the form of a capsule and operates in a normal flow, in-line configuration, where the feed enters the filtration assembly from a liquid source and the filtered output leaves the filtration assembly via the filtration assembly outlet to a storage vessel. The filtration assembly includes a single layer isoporous block copolymer filtration membrane that is hydrophilic and chemically resistant to solvents, has an average pore size of about 15 nm and a flux of about 600 LMH / bar. The most selective side of the membrane faces the feed inlet from the liquid source. The filtration process is performed at 25°C with a partial pressure of about 4 bar applied across the filtration membrane. The filtration membrane removes particulates having a diameter of about 20 nm or greater at an LRV of about 6.

[0074] Example 5. In this example, photolithography solvent filtration is performed (see FIG. 8). The feed composition to be filtered is a mixture of ethyl acetate and n-butyl acetate. The filtration assembly is in the form of a capsule and operates in a normal flow, in-line configuration, where the feed enters the filtration assembly from a liquid source and the filtered output leaves the filtration assembly via the filter assembly outlet to a liquid spray outlet. The filtration assembly includes a single layer isoporous block copolymer filtration membrane that is chemically resistant to the solvent and has an average pore size of about 15 nm and a flux of about 150 LMH / bar. The most selective side of the membrane faces the feed inlet from the liquid source. The filtration process is performed at 25° C. with a partial pressure of about 2 bar applied across the filtration membrane. The filtration membrane removes particles, including polymer particles and gels, having a diameter of about 15 nm or greater at an LRV of about 4.

[0075] Example 6. In this example, chemical mechanical planarization slurry filtration is performed (see FIG. 7). The feed composition to be filtered is an aqueous slurry having an inorganic abrasive and a base. A point-of-use filtration assembly is used, operating in a normal flow configuration where the feed enters the filtration assembly from a slurry source and the filtered output leaves the filtration assembly via a filter assembly outlet to a slurry distribution outlet. The filtration assembly includes a single layer isoporous block copolymer filtration membrane that is chemically resistant to the base and has an average pore size of about 15 nm and a flux of about 80 LMH / bar. The most selective side of the membrane faces the filter assembly outlet. The filtration process is performed at 25° C. with a partial pressure of about 4 bar applied across the filtration membrane. The filtration membrane removes particles having a diameter of about 100 nm or greater at an LRV of about 2.

[0076] Example 7. In this example, ultrapure water production / filtration is performed (see Figures 9 and 10). The feed composition to be filtered is water. The filtration assembly is in the form of a capsule and operates in a normal flow, in-line configuration where the feed enters the filtration assembly from a liquid source and the filtered output exits the filtration assembly via the filter assembly outlet to either 1) a storage container or 2) a faucet / dispenser. The filtration assembly includes a single layer isoporous block copolymer filtration membrane that is hydrophilic and has an average pore size of about 5 nm and a flux of about 3000 LMH / bar. The most selective side of the membrane faces the filter assembly inlet. The filtration process is performed at 25°C with a partial pressure of about 4 bar applied across the filtration membrane. The filtration membrane removes particles having a diameter of about 5 nm or greater at an LRV of about 5.

[0077] Example 8. In this example, bulk filtration is performed (see Figures 6 and 9). The feed composition to be filtered is isopropanol. A point-of-use filtration assembly is used, operating in a cross-flow configuration using a cross-flow filter housing cartridge, where the feed enters the filtration assembly from a liquid source and the filtered output leaves the filtration assembly via the filtration assembly outlet to a storage vessel. The filtration assembly includes a single layer isoporous block copolymer filtration membrane that is hydrophilic and chemically resistant to solvents and has an average pore size of about 5 nm and a flux of about 200 LMH / bar. The most selective side of the membrane faces the feed inlet from the liquid source. The filtration process is performed at 25°C with a partial pressure of about 2 bar applied across the filtration membrane. The filtration membrane removes particulates having a diameter of about 5 nm or greater at an LRV of about 4.

[0078] Example 9. In this example, photolithography solvent filtration is performed (see FIG. 8). The feed composition to be filtered is N-methylpyrrolidone (NMP). The filtration assembly is in the form of a capsule and operates in a normal flow, in-line configuration, where the feed enters the filtration assembly from a liquid source and the filtered output leaves the filtration assembly via the filter assembly outlet to a liquid spray outlet. The filtration assembly includes two layers of isoporous block copolymer filtration membranes that are chemically resistant to the solvent and have an average pore size of about 10 nm and a flux of about 100 LMH / bar. The most selective side of the membrane faces the filter assembly outlet. The filtration process is performed at 25° C. with a partial pressure of about 4 bar applied across the filtration membrane. The filtration membrane removes particles, including polymer particles and gels, having a diameter of about 10 nm or greater at an LRV of about 8.

[0079] Example 10. In this example, gas filtration is performed (see Figures 6 and 9). The feed composition to be filtered is argon gas. The filtration assembly is in the form of a capsule and operates in a normal flow, in-line configuration, where the feed enters the filtration assembly from a compressed gas source and the filtered output exits the filtration assembly via the filter assembly outlet to a containment vessel or downstream use conditions. The filtration assembly includes a single layer isoporous block copolymer filtration membrane having an average pore size of about 100 nm. The most selective side of the membrane faces the feed inlet from the compressed gas source. The filtration process is performed at 25°C with a partial pressure of about 7 bar applied across the filtration membrane. The filtration membrane removes particles having a diameter of about 100 nm or greater at an LRV of about 6.

Claims

1. 1. A method of filtering a liquid-containing feed for or during electronics manufacturing, comprising: filtering the feed with at least one filter assembly, the at least one filter assembly having at least one isoporous block copolymer filtration membrane, the at least one isoporous block copolymer filtration membrane having a log rejection value (LRV) of 3 to 6 for particles 20 nm or larger; The at least one isoporous block copolymer filtration membrane comprises: (i) a hydrogen-bonding block selected from the group consisting of poly((4-vinyl)pyridine), poly((2-vinyl)pyridine), poly(ethylene oxide), poly(methacrylate), poly(methyl methacrylate), poly(dimethylethylaminoethyl methacrylate), poly(acrylic acid), and poly(hydroxystyrene); (ii) a hydrophobic block selected from the group consisting of poly(styrene), poly(α-methylstyrene), polyethylene, polypropylene, polyvinyl chloride, and polytetrafluoroethylene; and (iii) a low glass transition temperature (T) polymer selected from the group consisting of poly(isoprene), poly(butadiene), poly(butylene), and poly(isobutylene); ｇ )block; Including, method.

2. The liquid is water for use as ultrapure water, The method of claim 1.

3. The liquid is an aqueous solution. The method of claim 1.

4. the liquid is a non-aqueous solution, the non-aqueous solution comprising at least one organic solvent; The method of claim 1.

5. The liquid is used in wet etching and cleaning steps in electronics manufacturing. The method of claim 1.

6. The liquid is used in photolithography steps of electronics manufacturing. The method of claim 1.

7. The liquid is sprayed onto the wafer for the photolithography step. The method according to claim 6.

8. the feed is a slurry containing solids, the slurry being used in a chemical mechanical planarization step of electronics manufacturing; The method of claim 1.

9. The slurry is dispensed onto a polishing pad for the chemical mechanical planarization step. The method according to claim 8.

10. the filter assembly is operated in a normal flow configuration consisting of an in-line arrangement of the at least one isoporous block copolymer filtration membrane between a filter inlet and a filter outlet; The method of claim 1.

11. The filter assembly operates in a cross-flow configuration. The method of claim 1.

12. The filter assembly includes a filter inlet, an isoporous block copolymer filter, a filter outlet, a vent, and a retentate outlet. The method of claim 1.

13. The liquid is filled into a bath for the wet etching and cleaning steps. The method according to claim 5.

14. a pressure differential across the filter assembly is induced by a pump; The method of claim 1.

15. a pressure differential across the filter assembly is caused by compressed gas; The method of claim 1.

16. a pressure differential across the filter assembly is caused by a pressurized water source; The method of claim 1.

17. The at least one isoporous block copolymer filtration membrane has pores with diameters ranging from 5 nm to 100 nm. The method of claim 1.

18. 1. A method of filtering a gas-containing feed for or during electronics manufacturing, comprising: filtering the gas with at least one filter assembly, the at least one filter assembly comprising at least one isoporous block copolymer filtration membrane, the at least one isoporous block copolymer filtration membrane having a log rejection value (LRV) of 3 to 6 for particles 20 nm or larger; The at least one isoporous block copolymer filtration membrane comprises: (i) a hydrogen-bonding block selected from the group consisting of poly((4-vinyl)pyridine), poly((2-vinyl)pyridine), poly(ethylene oxide), poly(methacrylate), poly(methyl methacrylate), poly(dimethylethylaminoethyl methacrylate), poly(acrylic acid), and poly(hydroxystyrene); (ii) a hydrophobic block selected from the group consisting of poly(styrene), poly(α-methylstyrene), polyethylene, polypropylene, polyvinyl chloride, and polytetrafluoroethylene; and (iii) a low glass transition temperature (T) polymer selected from the group consisting of poly(isoprene), poly(butadiene), poly(butylene), and poly(isobutylene); ｇ )block. Including, method.

19. The gas is air.

20. The method of claim 18.

20. 1. A method of filtering a liquid-containing feed for or during microfluidics, nanoparticle production, comprising filtering the feed with at least one filter assembly, the at least one filter assembly comprising at least one isoporous block copolymer filtration membrane, the at least one isoporous block copolymer filtration membrane having a log rejection value (LRV) of 3 to 6 for particles 20 nm or larger; The at least one isoporous block copolymer filtration membrane comprises: (i) a hydrogen-bonding block selected from the group consisting of poly((4-vinyl)pyridine), poly((2-vinyl)pyridine), poly(ethylene oxide), poly(methacrylate), poly(methyl methacrylate), poly(dimethylethylaminoethyl methacrylate), poly(acrylic acid), and poly(hydroxystyrene); (ii) a hydrophobic block selected from the group consisting of poly(styrene), poly(α-methylstyrene), polyethylene, polypropylene, polyvinyl chloride, and polytetrafluoroethylene; and (iii) a low glass transition temperature (T) polymer selected from the group consisting of poly(isoprene), poly(butadiene), poly(butylene), and poly(isobutylene); ｇ )block. Including, method.

Images