X-ray scattering device

Abstract

The present invention relates to a method for analyzing a sample (17) by X-ray scattering, comprising: a sample holder (16) for aligning and / or orienting a sample (17) to be analyzed by X-ray scattering; a first X-ray beam delivery system (12) arranged upstream of the sample holder (16) for generating and directing a first X-ray beam (22) along a beam path in a propagation direction (Y) towards the sample holder (16), the first X-ray source (18) and a first monochromator (20); and a first X-ray beam delivery system (12) arranged downstream of the sample holder (16) for detecting the first X-ray beam (22) and X-rays scattered from the sample (17) at different scattering angles. and a distal X-ray detector (14) movable, particularly in a motorized manner, along the propagation direction (Y), wherein the first X-ray beam delivery system (12) focuses the first X-ray beam (22) to a focal point on or near the distal X-ray detector (14) or generates a parallel beam when positioned at a maximum distance from the sample holder (16), and the X-ray scattering device (10) further comprises a second X-ray beam delivery system (28) that focuses the second X-ray beam (42) to a focal point on or near the sample holder (16).

Description

[Technical field]

[0001] The present invention relates to an X-ray scattering device. [Background technology]

[0002] Typically, X-ray scattering and X-ray diffraction equipment includes: 1) Source 2) Wavelength selector (monochromator) 3) Collimation section (defines the beam direction and removes residual background scattering or divergence) 4) Sample Area 5) Detector area. Since the adoption of X-ray analysis, there has been tremendous development of individual components, driven by the need for faster measurements and better data quality, providing characterization answers for an ever-increasing group of structured and semi-structured samples.

[0003] Additionally, for example, a variety of highly specialized diffraction and scattering geometries have been developed to extract more specific information. 1) Powder X-ray diffraction a, Bragg-Brentano reflection b. Guinier Transmission 2) Single crystal diffraction (transmission) 3) Backward reflection Laue 4) Grazing incidence X-ray diffraction 5)X-ray reflectance 6) Texture 7) Small-angle X-ray scattering (transmission) 8) Wide-angle X-ray scattering (transmission) 9) Bonse-Hart Ultra Smart Angle Scattering

[0004] To make the most of the investment in the instrument, some X-ray scattering instruments allow easy switching between different configurations, for example switching wavelengths by changing the source anode material, Xenocs dual source SAXS, or switching techniques by changing the collimation components. Thus, with only a small additional cost, the instrument can be reoptimized for entirely new scattering or diffraction applications. In materials science and development, the characterization of large structures is necessary to study the influence of hierarchical structures on material functionality. Complex materials exhibit more or less structured entities depending on the length scale. Furthermore, the development of new materials requires in situ characterization or structural characterization during operation depending on external parameters. Nanostructured materials, typically with structures on the length scale of 1-150 nm, are characterized by the presence of two phases with sufficient electron density contrast by analyzing the intensity of an X-ray beam elastically scattered by the sample. This technique is widely used for the characterization of soft matter, in the fields of polymers, colloids or proteins in solution.

[0005] Characterization of new materials requires combining with wide-angle X-ray scattering (WAXS) to characterize crystalline structures, and most SAXS characterization instruments combine SAXS / WAXS with USAXS (ultra-small angle X-ray scattering) to measure the scattering profile in only one direction, e.g., using the USAXS Bonse-Hart configuration to probe structures typically from 1Å to a few microns. In other words, wide-angle X-ray scattering (WAXS) typically gives access to information about the crystallinity and crystalline phase of the sample being analyzed, whereas small-angle X-ray scattering (SAXS) typically gives access to information about the sample structure at the nanoscale level (nanostructure). Because both the crystalline phase and the nanostructure affect the material properties, there is interest in performing both SAXS and WAXS on the same sample and with the same instrument.

[0006] However, while most of the X-ray techniques of interest above can be optimally configured with fairly compact instruments suitable for tabletop applications, or at best small laboratory instruments with a footprint of less than 2m x 2m, this is not the case for SAXS instruments, where longer instruments (3m to 10mm) consistently provide a better combination of resolution and intensity. Shorter instruments provide less intensity at the highest resolution desired in SAXS, and as a result the instruments remain longer. Nevertheless, recent developments have started to combine conventional SAXS with other configurations such as Bonse-Hart ultra-small angle X-ray scattering, grazing incidence diffraction, wide angle X-ray scattering, and powder and texture analysis.

[0007] To perform SAXS and WAXS measurements on the same sample and equipment, the X-ray scattering apparatus includes: - a sample holder for aligning and / or orienting the sample to be analyzed by X-ray scattering; - a first X-ray beam delivery system including a first X-ray source and a first monochromator, the first X-ray beam delivery system being positioned upstream of the sample holder for generating and directing a first X-ray beam in a propagation direction along a beam path towards the sample holder; - a distal X-ray detector arranged downstream of the sample holder and movable along the propagation direction, in particular in a motorized manner, to detect the first X-ray beam and X-rays scattered from the sample at different scattering angles; wherein the first X-ray beam delivery system is configured to focus the first X-ray beam to a focal point on or near the distal X-ray detector when arranged at a maximum distance from the sample holder, or to generate a parallel beam, and is commercially available from the applicant under the name "Xeuss3.0".

[0008] The first X-ray beam delivery system of this conventional X-ray scattering apparatus comprises a first X-ray source, e.g., a source with a Cu or Mo anode for generating X-rays, and an optical and collimation system including a first monochromator for directing and conditioning the generated first X-ray beam along an essentially horizontal propagation direction towards a sample holder, and other conventional sample stage apparatus known in the art of X-ray scattering that may be located within a vacuum chamber.

[0009] This conventional X-ray scattering instrument comprises at least one X-ray detector positioned downstream of the sample holder, i.e. on the side of the sample holder opposite to the side of the first X-ray beam delivery system: the distal X-ray detector is typically mounted on a detector stage, allowing it to move along the propagation direction of the direct beam at large horizontal distances (usually ranging from 50 mm to 1000 mm or more) from the sample holder up to 5000 mm. Depending on the location details of the distal X-ray detector and the size of its sensor, it is typically able to detect X-rays scattered from the sample at scattering angles relative to the direct X-ray beam as small as about 2θ=0.05° and magnitudes of 60° to 70°. Thus, distal X-ray detectors are suitable for small angle X-ray scattering (SAXS), which provides information about the sample structure at the nanoscale level, and for wide angle X-ray scattering (WAXS), which provides information about the crystallinity of the sample. [Prior art documents] [Patent documents]

[0010] [Patent Document 1] International Publication No. 2017 / 198736 Summary of the Invention [Problem to be solved by the invention]

[0011] However, the optimal SAXS X-ray optical schemes do not provide the best conditions for WAXS measurements. For example, long collimations provide a less divergent beam and are sometimes planned to focus at typical SAXS distances of 3-8 meters from the first X-ray source, which corresponds to 1-5 meters from the sample. But for WAXS, the detector is much closer and is essentially unfocused, so there is a larger beam than the focus. Moreover, even for a focused beam, the focus size SF follows the lens equation SF=M*S,M=P2 / P1, where M is the magnification, S is the size of the source, P1 is the distance between the source and the optics or monochromator, and P2 is the distance between the optics and the focus. For long SAXS, collimations M are typically >10, making it impossible to achieve small spot sizes unless the aperture is very small, resulting in a significant drop in intensity. Similar problems arise with collimating mirrors, which typically use beam sizes of the order of 0.5-1 mm2 to achieve sufficient intensity and resolution in SAXS.

[0012] Similar problems exist for scattering applications that require a small exposed area of ​​the sample while tolerating lower resolution, such as applications where the sample is scanned or where the sample environment requires a small amount of sample, such as within the channels of a microfluidic chip. Here again, the long collimation lengths and lens equations place an insufficient lower limit on the beam size that can be achieved without cutting off most of the intensity at the aperture.

[0013] Mechanically and manually reconfiguring the X-ray scattering instrument to change components and their relative distances, such as moving the primary X-ray source closer to the sample, is problematic given the time required to reconfigure and realign the system. The object of the present invention is therefore to propose an improved X-ray scattering instrument of the type described above, making it possible to provide optimal conditions for SAXS and WAXS measurements, respectively.

[0014] According to the invention, this object is achieved by a conventional X-ray scattering apparatus as described above, characterized in that the X-ray scattering apparatus further comprises a second X-ray beam delivery system configured to focus a second X-ray beam at a focal point on or near the sample holder. The first X-ray beam generated by the first X-ray beam delivery system is used for SAXS measurements, whereas the second X-ray beam acquired by the second X-ray beam delivery system is used for WAXS measurements or high resolution WAXS measurements or small sample exposure area scattering applications (hereinafter referred to as high spatial resolution applications) such as:

[0015] If the distal X-ray detector is placed close to the sample, WAXS measurements can be performed up to a certain maximum scattering angle, but the distal detector needs to be moved along the propagation direction (Y). For applications requiring simultaneous SAXS and WAXS measurements, such as in situ measurements, or WAXS applications requiring measurements at very wide angles up to 90°, the X-ray scattering device according to the invention preferably further comprises a proximal X-ray detector placed downstream of the sample holder, such as passing the first X-ray beam and detecting the X-rays scattered from the sample. The proximal X-ray detector is either a fixed detector fixed at a distance of about 80-150 mm along the first X-ray beam propagation direction (Y), or a motorized detector, such that the detector can be moved along the surface of the Ewald sphere to measure the scattering pattern scattered at wide angles either in the plane of incidence (YZ) or in the transverse direction. If motorized, the proximal X-ray detector can also be equipped with an additional rotation stage to keep its surface perpendicular to the incident beam direction.

[0016] In a first embodiment of the invention, the second X-ray beam delivery system includes a second X-ray source and a second monochromator, which allow for the generation of a second X-ray beam that is completely independent from the first X-ray beam and for it to be focused on or near the sample holder. In a preferred example of this first embodiment, the X-ray scattering apparatus further includes an insertion module configured to move the second X-ray beam delivery system into the first X-ray beam at a position upstream of the sample holder, which then enables computer-controlled movement of the second X-ray beam delivery system, avoiding manual interaction by a user.

[0017] In this case, the X-ray scattering device preferably further includes a main collimation tube extending along the beam path from a position downstream of the first X-ray beam delivery system to a position upstream of the sample holder, and the insertion module includes a motorized platform configured. Alternatively, a second X-ray beam delivery system or collimation tube extension is placed in the beam path at a position between the main collimation tube and the sample holder. For SAXS measurements, the collimation tube extension is placed in the beam path to allow the first X-ray beam to function as a direct beam impinging on the sample mounted in the sample holder. However, for WAXS or high spatial resolution scattering measurements, the second X-ray beam delivery system is placed in the beam path by the motorized platform. The control system of the X-ray scattering device then activates a shutter of the first X-ray beam delivery system to block the first X-ray beam and activates a shutter of the second X-ray beam delivery system to focus the second X-ray-light beam on or near the sample holder by the second monochromator.

[0018] Preferably, the downstream end of the main collimation tube and the upstream end of the collimation tube extension are provided with respective connection elements for a vacuum-tight connection, so that the beam path from the first X-ray beam delivery system to the sample holder can be kept essentially under vacuum when the collimation tube extension is placed in the beam path during a SAXS measurement.

[0019] Preferably, the collimation tube extension is equipped with a contraction / expansion mechanism. The collimation tube extension can then be retracted and extended, for example, by a telescopic mechanism. In the contracted state, the collimation tube extension can be easily inserted between the main collimation tube and the sample holder by reducing friction and contact with mechanical elements that come into contact during the movement of the motorized platform that holds the collimation tube extension. As soon as the collimation tube extension reaches its final position in the beam path, it can be expanded until it comes into contact with the vacuum chamber in which the main collimation tube and / or the sample holder are located or with other optical components provided upstream of the vacuum chamber.

[0020] In a second embodiment of the invention, the second X-ray beam delivery system comprises an optical module and a positioning module configured to position the optical module in the first X-ray beam at a position upstream of the sample holder. Here, the optical module is configured to convert the first X-ray beam into a second X-ray beam focused at a focal point on or near the sample holder. On the other hand, in the first embodiment of the invention, when using the second X-ray beam delivery system, the first X-ray beam is essentially blocked by a shutter of the first X-ray beam delivery system. The second embodiment of the invention converts the first X-ray beam into a second X-ray beam having a different focal point, i.e., a focal point on or near the sample holder.

[0021] In a preferred example of the second embodiment, the positioning module comprises a vacuum compatible motorized holder configured to hold the optical module, such that the positioning module can essentially be positioned within a main collimation tube extending from the first X-ray beam delivery system. In a particularly versatile version of this preferred example, the positioning module is configured to alternately position the optical module or the channel cut monochromator in the first X-ray beam at a position upstream of the sample holder. The channel cut monochromator can be part of a Bonse-Hart module that further includes an additional channel cut analyzer located downstream of the sample holder.

[0022] In a preferred example of the first or second embodiment, the X-ray scattering device according to the invention further comprises a first and a second slit module arranged upstream of the sample holder, the second slit module arranged downstream of the second X-ray, and the distance between the second slit module and the second X-ray beam delivery system is 5 cm or less. The first and second slit modules can be used in combination to shape the first X-ray beam. The second slit module can further be used to shape the second X-ray beam. A preferred embodiment of an X-ray scattering device according to the present invention will now be described with reference to the accompanying drawings, in which: [Brief description of the drawings]

[0023] [Figure 1] 1A shows a schematic top view of a first embodiment of an X-ray scattering device according to the invention in a configuration for SAXS measurements, and FIG. 1B shows a schematic top view of the X-ray scattering device of FIG. 1A in a configuration for WAXS measurements. [Diagram 2] 1(a) shows a perspective view of a portion of the X-ray scattering apparatus of FIG. 1(a) upstream of the sample holder, and FIG. 1(b) shows a perspective view of a portion of the X-ray scattering apparatus of FIG. 1(b) upstream of the sample holder. [Diagram 3] (a) shows a top view of the X-ray scattering device in Fig. 2(a), and (b) shows a top view of the X-ray scattering device in Fig. 2(b). [Figure 4] 1(a) shows an enlarged perspective view of a second X-ray beam delivery system of the X-ray scattering device of FIG. 1(a), and (b) shows an enlarged perspective view of a second X-ray beam delivery system of the X-ray scattering device of FIG. 1(b). [Diagram 5] FIG. 4 shows a schematic diagram of a first monochromator and an optical module used in a second embodiment of the present invention. [Figure 6] FIG. 4 shows a schematic side view of a positioning module used in a second embodiment of the invention. [Figure 7] 1 shows a schematic top view of another example of the present invention using an additional X-ray mirror. [Figure 8] FIG. 2 shows a top view of a modification of the first embodiment with two secondary X-ray sources. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0024] Figure 1(a) shows a schematic top view of a first embodiment of an X-ray scattering apparatus 10 according to the invention in a configuration for SAXS measurements. The X-ray scattering apparatus 10 is shown from an upstream end of a first X-ray beam delivery system 12 to a downstream end of a distal X-ray detector 14. Figure 2(a) shows a perspective view of a portion of the X-ray scattering apparatus 10 upstream of a sample holder 16. Figure 3(a) shows a top view of the X-ray scattering apparatus 10 of Figure 2(a).

[0025] Figures 1(b), 2(b) and 3(b) show respective views of a first embodiment of an X-ray scattering apparatus 10 when placed in its configuration for WAXS measurements, which is used in particular for high-resolution WAXS measurements, but also for high spatial resolution SAXS measurements. In all top views shown in the figures, the upstream end of the X-ray scattering device 10 is on the left and the downstream end is on the right. Thus, the propagation direction Y of the first and second X-ray beams is from left to right. Furthermore, the propagation direction Y is assumed to be horizontal in the laboratory system, and the horizontal direction perpendicular to Y is referred to as the X direction, and the vertical direction perpendicular to X and Y is referred to as the Z direction.

[0026] The first X-ray beam delivery system 12 includes a first X-ray source 18 and a first monochromator 20. As shown by the dotted line in FIG. 1(a), the first monochromator 20 is selected and set to collect X-rays generated by the first X-ray source 18 and focus them as a first X-ray beam 22 to a focal point on or near the distal X-ray detector 14 when the distal X-ray detector 14 is positioned at a maximum distance in the Y direction from the sample holder 16. In this context, "close" means that the distance between the focal point of the first X-ray beam 22 and the distal X-ray detector 14 is about 20% of the distance P2 (indicated by the double arrow in FIG. 1(a)) between the focal point and the first monochromator 20. The focal point can be before (i.e., upstream) or after (i.e., downstream) the distal X-ray detector 14. Alternatively, it is also possible for the first monochromator 22 to generate an essentially parallel beam.

[0027] The first X-ray source 18 is preferably a point focus source, and the first monochromator 20 is preferably a point focus monochromator. The beam shape can be further defined by a slit module 24, which is preferably of the "scatter-free" or "non-scattering" type. Two such slit modules 24 are shown in FIG. 1(a). The first module is immediately downstream of the first monochromator 20, and the second module is immediately upstream of a vacuum chamber 26. This vacuum chamber 26 houses a sample holder 16, which may include a motorized translation and / or rotation stage, and other typical sample stage devices known in the art of X-ray scattering.

[0028] Upstream and near the second slit module 24, the X-ray scattering device 10 comprises a second X-ray beam delivery system 28 including a second X-ray source 30 and an associated second monochromator 32 as well as a collimation tube extension 34. The distance between the second slit module 24 and the second X-ray beam delivery system 28 typically amounts to a few centimeters, preferably 5 centimeters or less. The second X-ray source 30, the second monochromator 32 and the collimation tube extension 34 are mounted on an insertion module having a motorized platform 36, which is shown diagrammatically in dashed lines in FIG. 1(a).

[0029] In the SAXS configuration of the first embodiment of the X-ray scattering device 10, as shown in Figures 1 and 2. In Figures 1(a), 2(a) and 3(a), the motorized platform 36 is moved to a position such that the collimation tube extension 34 is aligned with the main collimation tube 38 extending downstream of the first slit module 24. The first X-ray beam 22 then propagates along the Y direction through the main collimation tube 38 and the subsequent collimation tube extension 34, both of which can be ejected as known in the art of X-ray scattering. The first X-ray beam 22 enters the vacuum chamber 26, preferably in the same vacuum environment as the main collimation tube 38, where it strikes a sample mounted on the sample holder 16. The first X-ray beam 22 transmitted as a direct beam, as well as the SAXS signal generated by the sample, exit the vacuum chamber 26 through a corresponding exit port and are detected by the distal X-ray detector 14, located near the distal end of the tube 40 further evacuated downstream of the vacuum chamber 26.

[0030] To be able to measure sample structures larger than 200 nm in size, the distal X-ray detector 14 is typically positioned at a distance of at least 1 m from the sample holder 16, preferably greater than 1.5 m up to 4 or 6 meters. The first monochromator 20 is typically a multi-layer X-ray monochromator, preferably adapted to adjust the beam in two directions to focus the beam at a long distance at the furthest position of the distal X-ray detector 14 when placed at the SAXS measurement position, thereby providing the highest resolution, i.e., to measure the largest characteristic dimension or to detect the smallest scattering angle. Alternatively, the first monochromator 20 focuses to a much longer distance, so that the divergence is very small, or the beam is parallel (equivalent to focusing to infinity), i.e., the residual divergence is less than 0.2 mradians. The first monochromator 20 is shaped to generate a 2D beam adjustment, i.e., it is shaped as a spheroid (if it focuses the beam) or a spheroid (if it collimates the beam), or is made of two 1D mirrors cross-coupled in a so-called Montell mirror configuration. Alternatively, if the X-ray source 18 is a line focus source, the first monochromator 20 is a mirror curved in one direction to generate a 1D beam adjustment.

[0031] In the top view of Fig. 1(a), it can be seen that the first monochromator 20 is curved as an ellipse in the XY plane in order to focus this plane of the beam onto the distal X-ray detector 14 when placed in its SAXS measurement position at the maximum sample-to-detector distance, which can be greater than 1 meter and as much as 6-8 meters. The X-ray beam thus conditioned by the first monochromator 20 is further collimated by two scattering-free slit modules 24 that remove parasitic scattering and attenuate the beam edge intensity to achieve a well-controlled beam size at the distal X-ray detector 14. To prevent the occurrence of parasitic slit scattering, each slit module 24 has blades made of crystalline material (Si for copper Ka radiation, Ge or GaAs for MoKa radiation or higher energies). The two slit modules 24 are placed a large distance apart, typically at a distance ranging from 80 cm to 1 or 2 meters, depending on the maximum sample-to-detector distance of the system.

[0032] Furthermore, in this configuration, some WAXS signals can also be measured by moving the distal X-ray detector 14 in the vacuum chamber 26 closer to the sample holder 16 along the Y direction. On the other hand, in the dedicated WAXS configuration of the first embodiment of the X-ray scattering apparatus 10, as shown in Figures 1(b), 2(b) and 3(b), the motorized platform 36 is moved to a position such that the second X-ray source 30 and associated second monochromator 32 are aligned with the main collimation tube 38.

[0033] The second monochromator 32 is selected and configured to focus the X-rays generated by the second X-ray source 30 as a second X-ray beam 42 to a focal point on or near the sample holder 16. The WAXS signal scattered or diffracted from the sample is then detected by a proximal X-ray detector 44 located inside the vacuum chamber 26. In an embodiment of the invention, the WAXS signal scattered or diffracted from the sample may be collected by the distal X-ray detector 14 when positioned near the sample after traveling along the propagation direction (Y).

[0034] In many cases, the position of the sample holder 16 in the WAXS configuration will be the same as in the SAXS configuration. However, this is not essential, as the present invention only requires that the second X-ray beam 42 be focused to a focal point on or near the sample holder 16, and also covers the situation where the sample holder 16 is moved within the vacuum chamber 26 between the SAXS and WAXS positions. Such movement of the sample holder 16 may be essentially along the Y direction, but may also have X and / or Z components.

[0035] The second X-ray source 30 may be a point focus source and the second monochromator 32 may be adapted to focus the second X-ray beam 42 in two directions to produce a small spot on or near the sample. Close proximity typically means a distance of 100 mm or less in the Y direction from the sample, in front of or behind the sample, preferably less than 50 mm in front of or behind the sample, more preferably less than 25 mm in front of or behind the sample.

[0036] The second X-ray beam delivery system 28 is arranged close to the sample just before the last (scatter-free) slit module 24, and is therefore adapted to generate a small spot on the sample. By way of example, the second X-ray source 30 can be arranged at a distance (P'1+P'2) of less than 700 mm from the sample, where P'1 is the distance from the second X-ray source 30 to the second monochromator 32. P'2 is the distance from the second monochromator 32 to the focal spot generated by the second X-ray beam 42 on or near the sample holder 16. P'1 and P'2 are indicated by respective arrows in FIG. 1(b). This arrangement allows the arrangement of a secondary multilayer optical system with a small magnification, where the magnification is given by the factor P'2 / P'1. By doing so it is possible to achieve spot sizes in the sub-200 micron range at intensities orders of magnitude higher compared to those achievable with the first monochromator 20 when using a microfocus sealed tube source.

[0037] With this collinear SAXS / WAXS configuration of the X-ray scattering apparatus 10 according to the invention, the second X-ray beam delivery system 28 generates a second X-ray beam 42 aligned with the beam path of the first X-ray beam 22. This provides the advantage of having the same propagation direction towards the sample, allowing the same distal X-ray detector 14 or detector configuration to be used with the distal X-ray detector 14 and the proximal X-ray detector 44 without the need to orient the detectors in a goniometer or motorized arm. The same sample orientation can also be used for 2D applications where a specific scattering direction is investigated if a tensile stage is used in the vacuum chamber 26 to stretch the sample without the need to have a second rotation stage on the sample. Furthermore, maintaining the same tilt ensures a comparable X-ray beam footprint on the sample, which is important in mapping and small spot applications, e.g., microfluidics, since an additional tilt of the sample stage and orientation of the distal X-ray detector 14 would otherwise be required to ensure that the direct beam hits the distal X-ray detector 14 when measuring with a focused beam.

[0038] The collinear SAXS / WAXS design is also more advantageous when different sample positions are used in the apparatus 10 for scattering measurements, i.e. when changing the sample to detector distance is done in part by moving the sample. This keeps the insertion module simpler, with only the translation required to insert the second X-ray beam delivery system 28, without the need to synchronize the translation with the sample movement. In any case, it is preferable to realize the change in sample to detector distance by moving the distal X-ray detector 14, so that the sample position is predefined and fixed for every experiment.

[0039] Furthermore, by using a collinear SAXS / WAXS setup, a second slit module 24 can also be used in the beam path of the first X-ray beam to adjust the divergence of the focused second X-ray beam 42 generated by the second X-ray beam delivery system 28. This second slit module 24 can also be used together with the distal X-ray detector 14 to control the intensity when switching from one configuration to another and to detect the potential need for realignment. A 1D scan of the slit module 24 parallel to the translation direction can also be used to realign the slit module 24 and redefine the center of the beam path of the second X-ray beam 42 in order to realign the beam line for focusing measurements.

[0040] In some cases, the main collimation tube 38 may include a BonseHart monochromator module including a motorized holder for positioning the channel-cut monochromator in and out of the X-ray beam when performing USAXS or SAXS measurements, respectively. This motorized BonseHart monochromator is associated with a Bonse Hart analyzer with a channel-cut monochromator positioned after the sample, and is positioned in and out of the beam when performing USAXS or SAXS measurements, respectively. The BonseHart monochromator module may be positioned upstream of the second X-ray beam delivery system 28 to ensure that the second X-ray beam delivery system 28 is closest to the second slit module 24.

[0041] Figure 4(a) shows an enlarged perspective view of the second X-ray beam delivery system 28 of the X-ray scattering apparatus 10 according to the present invention in the SAXS configuration of Figures 1(a), 2(a) and 3(a), in which the first X-ray beam 22 propagates through the main collimation tube 38 and the collimation tube extension 34 before reaching the second slit module 24.

[0042] Figure 4(b) shows an enlarged perspective view of the second X-ray beam delivery system 28 in the WAXS configuration of Figures 1(b), 2(b) and 3(b). In this WAXS configuration, a motorized platform 36 has a second X-ray beam delivery system 28, including a second X-ray source 30 and a second monochromator 32, positioned in the beam path downstream of the main collimation tube 38 and upstream of the second slit module 24. The second X-ray beam delivery system 28 is active, i.e., it generates a second X-ray beam 42 that is focused to a focal spot on or near the sample holder 16.

[0043] As can be seen from Figures 1 and 2, the downstream end of the main collimation tube 38 and the upstream end of the collimation tube extension 34 are equipped with respective connection elements for a vacuum-tight connection, as shown in Figures 4(a) and 4(b). These connection elements consist of slide plates with vacuum-tight O-rings. The same applies to the downstream end of the collimation tube extension 34, which allows a vacuum-tight connection to the second slit module 24. This setup ensures that the inside of the collimation tube extension 34 is in the same vacuum environment as the inside of the main collimation tube 38 when the first X-ray beam delivery system 12 or the second X-ray beam delivery system 28 are active or during a change of configuration.

[0044] FIG. 4(a) shows a sliding plate 362 which makes the connection between the downstream end of the collimation tube extension 34 and the second slit module 24 via a connection part 364 while ensuring a vacuum-tight connection. This sliding plate 362 also makes the connection between the second X-ray beam delivery system 28 and the second slit module 24 via the connection part 364, also under a vacuum-tight connection. The vacuum-tight connection is ensured by sliding seals 366, 368 which slide along the flat and smooth surfaces of the connection part 364, ensuring that a vacuum is maintained inside the collimation tube extension 34 and inside the second beam delivery system 28 at all times. The sliding seals 366, 368 can include a superposition of an O-ring and a flat gasket, for example a spring-loaded O-ring pressing a low-friction gasket against the connection part 364.

[0045] The connection between the two connection parts 364 shown in Figures 4(a) and 4(b), i.e. the first connection part 364 at the downstream end of the main collimation tube 38 and the second connection part 364 at the downstream end of the collimation tube extension 34, is made with a certain flexibility to allow the respective sliding plates 362 to move without friction while maintaining the rigidity of the connection between the elements. For this purpose, the collimation tube extension 34 may be a rigid tube or a more flexible system combining bellows with more rigid parts. Alternatively, the collimation tube extension 34 may be provided with a contraction / expansion mechanism, which allows the collimation tube extension 34 or parts thereof to be contracted and expanded to facilitate changing the configuration.

[0046] In an alternative embodiment of the invention in which the second X-ray beam delivery system 28 includes a second X-ray source 30 and a second monochromator 32, the second X-ray beam delivery system 28 may alternatively be arranged such that the entrance to the vacuum chamber 26 preferably focuses the second X-ray source 30 in the same horizontal plane XY as the first X-ray source 18. Such a configuration would typically require tilting of the second X-ray source 30 and the second monochromator 32 with respect to the direction of the first X-ray beam 22 along the Y direction. Such an embodiment of the invention would be adapted for high-resolution WAXS measurements using a proximal X-ray detector 44 positioned to collect the X-ray beam scattered from the sample at a wide angle. This dedicated measurement would be advantageous if the proximal X-ray detector 44 is a motorized detector that can be moved along the surface of the Ewald sphere to measure the scattering pattern scattered at wide angles in either the plane of incidence (YZ) or the transverse direction.

[0047] The setups shown in Figures 1(b), 2(b) and 3(b) are suitable for WAXS measurements, including high-resolution WAXS measurements, but also for high spatial resolution SAXS measurements. 5 shows a schematic diagram of a second embodiment of an X-ray scattering apparatus 10 according to the invention. In this second embodiment, the apparatus 10 uses only a single X-ray source, namely the first X-ray source 18, and the second X-ray beam delivery system 28 comprises an optical module and a positioning module configured to position the optical module in the first X-ray beam 22 at a position upstream of the sample holder 16. The optical module is configured to collect the first X-ray beam 22 and convert it into a second X-ray beam 42 that is focused to a focal spot on or near the sample holder 16.

[0048] 6 shows a schematic side view of a positioning module 46 and an optical module 48 used in a second embodiment of the invention. The optical module 48 may be a multi-layer module, for example a multi-layer mirror. The positioning module 46 includes a vacuum-compatible motorized holder 50 that holds the optical module 48. The motorized holder 50 can be moved up and down along the vertical Z direction, as indicated by the dashed double arrow in FIG. 6. In its bottommost position, the first X-ray beam 22 is not influenced by the positioning module 46, the optical module 48, or other components of the second X-ray beam delivery system 28 and reaches the sample as shown in FIGS. 1(a), 2(a) and 3(b). The bottommost position of the motorized holder 50 thus corresponds to the SAXS configuration of the X-ray scattering apparatus 10.

[0049] As the motorized holder 50 is moved upwards along the vertical Z-direction, it reaches a position where the optical module 48 intercepts the first X-ray beam 22. The optical module 48 is selected and set to convert the first X-ray beam 22 into a second X-ray beam 42, for example by reflection or Bragg diffraction, and focus it to a focal point on or near the sample. This is shown diagrammatically in FIG. 5. If the first monochromator 20 has a spheroidal shape, the optical module 48 can be shaped as a spheroid with the ellipsoid and the hyperboloid sharing one of their foci, the second focal point of the hyperboloid being at the sample position, and the first focal point of the ellipsoid being at the position of the first X-ray source 18.

[0050] Alternatively, as shown in FIG. 5, if the first monochromator 20 has the shape of a first paraboloid of revolution for generating a parallel or low divergence beam, the optical module 48 can have the shape of a second paraboloid of revolution for collecting and converting this parallel beam into a focused beam. The second X-ray beam 42 generates a spot size F2 with dimensions given by the ratio M2=(P″2 / P1)*S1, where P″2 is the distance between the center of the optical module 48 and the focus of the second paraboloid that defines the shape of the optical module 48, P1 is the distance between the first monochromator 20 and the focus of the first parabola that defines its shape, and S1 is the size of the first X-ray source placed at the focus of the first parabola. Taking into account the dimensions of the slit module 24 and the position of the sample holder 16 in the vacuum chamber 26, the optical module 48 can have a different focal length than the first monochromator 20, as highlighted in FIG. 5. The spot size F2 in the representation plane F2x is larger than the X-ray source size S1x. In a preferred embodiment of the present invention, the X-ray scattering apparatus 10 achieves a fairly short distance between the optical module 48 and the sample, typically in the range of 30 to 40 cm or less. This ensures a magnification M2 in the maximum range of 3 or 4, thus providing a spot size of less than 200 microns when the first X-ray source 18 is a microfocus sealed tube source taking into account optical aberrations.

[0051] To facilitate alignment of the optical module 48, the positioning module 46 may include, in addition to the motorized holder 50, an additional rotation stage for Bragg angle alignment and / or an additional rotation or horizontal translation stage for optical alignment. However, the positioning module 46 is designed such that the movement of the motorized holder to select a configuration with or without the optical module 48 does not affect the optical alignment settings of the optical module 48, which are typically only performed during installation or during routine maintenance verification of the optical alignment.

[0052] 6, the positioning module 46 further supports the channel cut entrance monochromator 52 portion of a Bonse-Hart USAXS module. The positioning module 46 is configured to position either the optics module 48 or the channel cut entrance monochromator 52 in the incoming first x-ray beam 22. Positioning the channel cut entrance monochromator 52 in the first x-ray beam 22 requires further upward movement of the motorized holder 50.

[0053] In a preferred embodiment of the present invention, the motorized holder 50 is vacuum adapted and the second X-ray beam delivery system 28 according to this second embodiment of the present invention can be fully contained within the main collimation tube 38 and then fully extended between the two slit modules 24. FIG. 7 shows a schematic side view of another example of the invention, where the X-ray scattering device 10 further comprises an additional X-ray mirror, namely a deflection mirror 54 provided upstream of the sample holder 16. This mirror 54 is preferably a plane X-ray mirror that deflects the first X-ray beam 22 by an angular deviation 2θ, where the angle θ is the angle of incidence on the mirror 54, so as to reach the surface of the sample 17 to be analyzed under grazing incidence in GISAXS, while keeping the surface of the sample 17 horizontal. This is particularly advantageous when the sample to be analyzed during grazing is a liquid. If the mirror 54 is used in a total reflection geometry, adjustment of the incidence control on the sample 17 is possible with a resolution given by the divergence of the incident beam. The range of this incidence angle control can be between >0° and up to 0.4° in the case of a copper wire for changing the incidence angle during the experiment or for setting a specific angle. In a preferred embodiment of the invention, this deflection mirror 54 may be part of the motorized holder 50 as an additional optional optical scheme.

[0054] 8 shows a top view of a variation of the first embodiment with a third X-ray beam delivery system consisting of an imaging X-ray source 55 coupled to a primary slit module 56 located on the motorized platform 36 to generate an additional X-ray beam adapted for phase contrast imaging of the sample. Phase contrast X-ray imaging is particularly advantageous for imaging fine density differences in soft materials and overcoming the contrast limitations of conventional absorption X-ray imaging.

[0055] To perform phase contrast imaging, the imaging X-ray source 55 is a point focus source generating a polychromatic beam, coupled to a primary slit module 56 to generate a cone-shaped X-ray beam in the direction of the sample holder 56, allowing both samples to be irradiated, and the randomly structured object 57 is typically positioned immediately before the sample. The imaging X-ray source 55 may typically be a source with a tungsten or molybdenum anode excited up to 50 kV, or even up to 70 kV, depending on the material to be analyzed, with a small focal spot size, i.e., 50 microns or less, preferably 10 microns or less. Alternatively, the imaging X-ray source 55 may include a copper anode. The imaging characterization step typically involves measuring the speckle pattern created by the randomly structured object 57 on a distant detector 14 placed at a long distance with the sample not positioned to interfere with the propagated X-ray beam 58, and performing additional exposures with the sample and the randomly structured object 57 positioned in position to record a sample-induced distortion image of the speckle pattern on the distant detector 14 maintained at the same distance. By correlation analysis of the speckle pattern with and without the sample, a two-dimensional phase map of the sample can be obtained with a resolution that depends on the size of the speckles, i.e. the resolution of the features of the randomly structured object 57, but also on the 14 pixel size of the distal detector and the distance to the sample. The randomly structured object 57 is a sample made of random structures with small features and high X-ray intensity contrast, which may be, for example, sandpaper or cardboard. An alternative characterization sequence of this speckle X-ray imaging may include scanning the speckle pattern with different lateral positions of the randomly structured object 57 with a translation step smaller than the speckle size to increase the spatial resolution.

[0056] X-ray speckle imaging is a particularly advantageous phase contrast imaging method since it does not require a complex analyzer structure and reduces the requirements for spatial coherence of the source used. By using an imaging X-ray source 55 with an inter-insertion module as used in the second beam delivery system 28, the X-ray scattering device described in FIG. 8 can achieve SAXS and X-ray imaging with the same detection scheme, i.e., using a distal X-ray detector 14 adapted for easy and preferentially motorized change of the sample-to-detector distance over long distances. In general, X-ray imaging requires smaller pixel detectors than hybrid pixel photon counting detectors used in SAXS, which typically have pixel sizes in the range of 75 pm for the smallest pixel size, or 172 pm to accommodate both detector size requirements, high count rates (to be able to measure direct beam or high dynamic range signals), and low noise. The setup according to the invention achieves a high image magnification given by the ratio S2 / (S1), where S1 is the source-to-object distance and S2 is the source-to-image detector distance, which is typically higher than a factor of 10. In another embodiment of the invention where the X-ray scattering apparatus 10 includes phase contrast imaging capabilities, the imaging X-ray source 55 and the primary slit module 56 are mounted on the sample chamber wall which in turn is fixed to an additional incident beam port located, for example, above or below the port for the incident beam path of the primary incident beam line in order to achieve higher intensity and even larger imaging magnification at a shorter distance to the sample. In this case, changing the measurement configuration from SAXS to phase contrast imaging includes changing the position of the sample along the Z direction combined with an equivalent change of the X-ray distal detector if necessary. Alternatively, since the X-ray detectors used for SAXS are large detectors (>70×70 mm2 and sometimes as large as >150×150 mm2), it may not be necessary to move the detector vertically.

[0057] Combining SAXS and / or USAXS with phase contrast imaging is particularly useful for inhomogeneous soft materials such as clays, fibers, and inhomogeneous nanocomposites, where inhomogeneities can be first detected with the phase contrast imaging measurements described here, achieving resolutions on the order of tens or even a few microns, and then the nanostructure of the inhomogeneities is further probed with SAXS or USAXS measurements.

[0058] The X-ray generators used in the first X-ray source 18 and the second X-ray source 30 may include a sealed tube X-ray source, preferably a microfocus sealed tube source, or a rotating anode, preferably with a point focus, or a liquid jet anode. The "focal point" as used throughout the description and claims does not necessarily have to be point-like, and can also be linear or generally of 2D or 3D shape depending on the particular sample and the desired X-ray scattering analysis.

Claims

1. a sample holder (16) for aligning and / or orienting a sample (17) to be analyzed by X-ray scattering; a first X-ray beam delivery system (12) including a first X-ray source (18) and a first monochromator (20) and disposed upstream of the sample holder (16) for generating and directing a first X-ray beam (22) along a beam path in a propagation direction (Y) towards the sample holder (16); a distal X-ray detector (14) disposed downstream of the sample holder (16) and movable along a propagation direction (Y) to detect the first X-ray beam (22) and X-rays scattered from the sample (17) at different scattering angles; Equipped with the first X-ray beam delivery system (12) focuses the first X-ray beam (22) to a focal point on or near the distal X-ray detector (14) or generates a collimated beam when positioned at a maximum distance from the sample holder (16); a second X-ray beam delivery system (28) for focusing a second X-ray beam (42) to a focal spot on or near the sample holder (16); the second X-ray beam delivery system (28) includes a second X-ray source (30) and a second monochromator (32); X-ray scattering device (10).

2. a proximal X-ray detector (44) disposed downstream of the sample holder (16) to pass the first X-ray beam (22) and detect X-rays scattered from the sample (17).

2. The X-ray scattering device (10) of claim 1.

3. an insertion module (36) for moving the second X-ray beam delivery system (28) into the first X-ray beam (22) at a position upstream of the sample holder (16).

3. An X-ray scattering device (10) according to claim 1 or 2.

4. a main collimation tube (38) extending along a beam path from a location downstream of the first X-ray beam delivery system (12) to a location upstream of the sample holder (16); the insertion module (36) includes a motorized platform (36) for alternately positioning the second X-ray beam delivery system (28) or collimation tube extension (34) in the beam path at a position between a main collimation tube (38) and the sample holder (16).

4. An X-ray scattering device (10) according to claim 3.

5. the connection of the second X-ray beam delivery system (28) to the beam path includes connection elements (362, 364, 366, 368) for a vacuum-tight connection; 5. An X-ray scattering device (10) according to claim 4.

6. the downstream end of the main collimation tube (38) and the upstream end of the collimation tube extension (34) are provided with respective connection elements (362, 364, 366, 368) for a vacuum-tight connection; An X-ray scattering device (10) according to claim 4 or 5.

7. The collimation tube extension (34) is provided with a contraction / expansion mechanism. An X-ray scattering device (10) according to any one of claims 4 to 6.

8. the second X-ray beam delivery system (28) includes an optical module (48) and a positioning module (46) for positioning the optical module (48) in the first X-ray beam (22) at a location upstream of the sample holder (16); the optical module (48) is configured to convert the first X-ray beam (22) into the second X-ray beam (42) focused to a focal point on or near the sample holder (16); 3. An X-ray scattering device (10) according to claim 1 or 2.

9. The positioning module (46) includes a vacuum-compatible motorized holder (50) configured to hold the optical module (48).

9. An X-ray scattering device (10) according to claim 8.

10. the positioning module (46) is configured to alternately position the optical module (48) or the channel-cut monochromator (52) in the first X-ray beam (22) at a position upstream of the sample holder (16); An X-ray scattering device (10) according to claim 8 or 9.

11. and first and second slit modules (24) disposed upstream of the sample holder (16) that are used in combination to shape the first X-ray beam (22); the second slit module (24) is disposed downstream of the second X-ray beam delivery system (28) and further shapes the second X-ray beam (42); the distance between the second slit module (24) and the second X-ray beam delivery system (28) is 5 cm or less; An X-ray scattering device (10) according to any one of the preceding claims.

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