Refining device

JP7639936B2Active Publication Date: 2025-03-05SHIMADZU SEISAKUSHO LTD
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Patent Information

Application Number
JP2023561483
Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Priority Date
2021-11-16
Filing Date
2022-10-25
Publication Date
2025-03-05
Estimated Expiration
2042-10-25

AI Technical Summary

Benefits of technology

【0009】 本開示による精製装置によれば、容器において分離対象の成分を取り除かれた重液は、第1配管により排出され、第2配管に設けられたフィルタユニットにより夾雑物が除かれたのち、重液リザーバに貯留される。よって、比重分離のための重液を効率的に用いることが可能である。

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Abstract

A heavy liquid is stored in a heavy liquid reservoir (120). In a container (50), a sample is separated according to the difference in specific gravity by using the heavy liquid supplied from the heavy liquid reservoir (120). A waste liquid is discharged from the container (50) through a first pipe (14). The heavy liquid from the first pipe (14) is delivered to the heavy liquid reservoir (120) through a second pipe (10). A filter unit (F1, F2) is provided on the second pipe (10) and in the filter unit, contaminants are removed from the heavy liquid discharged from the first pipe (14).
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Description

[Technical field]

[0001] The present invention relates to a purification apparatus. Place Regarding. [Background technology]

[0002] In order to recover the target components, a mixed sample containing the components is purified. Non-Patent Document 1 discloses a purification device that recovers microplastics contained in a mixed sample collected from the sea by gravity separation using a heavy liquid. [Prior art documents] [Non-patent literature]

[0003] [Non-Patent Document 1] Hannes K. Imhof et al.,"A novel, highly efficient method for the separation and quantification of plastic particles in sediments of aquatic environments",LIMNOLOGY and OCEANOGRAPHY:METHODS,Volume10,Issue7,pp.524-537,17 July 2012,https: / / doi.org / 10.4319 / lom.2012.10.524 Summary of the Invention [Problem to be solved by the invention]

[0004] The present disclosure provides a purification device that can efficiently use heavy liquid for gravity separation. [Means for solving the problem]

[0005] A purification device according to a first aspect of the present disclosure is a purification device for purifying a sample, and includes a heavy liquid reservoir, a container, a first pipe, a second pipe, and a filter unit. The heavy liquid reservoir stores a heavy liquid. The container separates the sample based on a specific gravity difference using the heavy liquid supplied from the heavy liquid reservoir. The first pipe discharges waste liquid from the container. The second pipe delivers the heavy liquid from the first pipe to the heavy liquid reservoir. The filter unit is provided in the second pipe and removes impurities from the heavy liquid discharged from the first pipe.

[0006] A purification device according to a second aspect of the present disclosure includes a container, a first pipe, a mesh member, a sensor, an agitator, and a computer. The container separates samples by difference in specific gravity using a heavy liquid. The first pipe discharges waste liquid from the container. The mesh member is provided between the container and the first pipe. The sensor detects the discharge of waste liquid from the container to the first pipe. The agitator agitates the sample in the container. The computer compares the amount of waste liquid discharged detected by the sensor with a threshold value, and when the computer determines that the amount of discharge is smaller than the threshold value, the agitator agitates the container.

[0007] A control method according to a third aspect of the present disclosure is a control method executed by a computer included in a purification apparatus that purifies a sample in a container to which a heavy liquid from a heavy liquid reservoir is supplied. The control method includes the steps of discharging waste liquid from the container, introducing the heavy liquid discharged from the container into a filter unit to remove impurities from the heavy liquid, and returning the heavy liquid that has passed through the filter unit to the heavy liquid reservoir.

[0008] A control method according to a fourth aspect of the present disclosure is a control method executed by a computer in a purification device. The purification device includes a container, a first pipe, a mesh member, a sensor, an agitation unit, and a computer. The container separates a sample by using a heavy liquid to separate the sample based on a specific gravity difference. The first pipe discharges waste liquid from the container. The mesh member is provided between the container and the first pipe. The sensor detects the discharge of the waste liquid from the container to the first pipe. The agitation unit agitates the sample in the container. The control method includes a step of discharging the waste liquid from the container through the mesh member to the first pipe after purifying the sample, a step of detecting the amount of waste liquid discharged from the container to the first pipe by the sensor, and a step of comparing the amount of waste liquid discharged detected by the sensor with a threshold value, and agitating the inside of the container when it is determined that the amount of discharged is smaller than the threshold value. Effect of the Invention

[0009] According to the purification apparatus of the present disclosure, the heavy liquid from which the components to be separated have been removed in the container is discharged through the first pipe, and after impurities are removed by the filter unit provided in the second pipe, the heavy liquid is stored in the heavy liquid reservoir. This makes it possible to efficiently use the heavy liquid for gravity separation. [Brief description of the drawings]

[0010] [Figure 1] FIG. 1 is a schematic diagram showing the configuration of a refining device 1 according to a first embodiment. [Diagram 2] FIG. 2 illustrates an example of a hardware configuration of a computer. [Diagram 3] 1 is a flowchart showing a process for filtering a heavy liquid. [Figure 4] FIG. 1 is a schematic diagram showing the configuration of a refining device 1A according to a first modified example. [Diagram 5] 10 is a flowchart showing a process for detecting and reducing clogging of a discharge mesh in a refining apparatus according to a second embodiment. [Figure 6] FIG. 11 is a schematic diagram showing the configuration of a refining device 1B according to a second modified example. [Figure 7] FIG. 11 is a schematic diagram showing the configuration of a refining apparatus 1C according to a third embodiment. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0011] The present embodiment will be described in detail with reference to the drawings. In the drawings, the same or corresponding parts are designated by the same reference numerals, and their description will not be repeated in principle.

[0012] [Embodiment 1] [1. Refining equipment configuration] 1 is a schematic diagram of a purification device 1 according to the present embodiment. The purification device 1 according to the present embodiment executes a process of purifying a mixed sample and recovering components to be recovered contained in the mixed sample. "Purification" includes converting a mixture into a pure substance, and in this embodiment, includes obtaining the pure substance (component) to be recovered from a collected mixed sample.

[0013] The "mixed sample" to be refined by the refining device 1 may be any sample containing the components to be recovered. For example, the "mixed sample" may be seawater and sand collected from the sea or the coast, or processed products such as food and cosmetics. In this embodiment, the "mixed sample" is exemplified by seawater and sand collected from the sea or the coast. In the following, the "mixed sample" may also be simply referred to as a "sample."

[0014] The "components" to be collected by the refining apparatus 1 may be any components that can be collected by the refining apparatus 1 according to this embodiment, and an example of the "component" is microplastics. Microplastics are fine plastic particles with lengths of, for example, about 0.1 to 5 mm. In this embodiment, the "components" are exemplified by microplastics contained in seawater and sand collected from the ocean or coast.

[0015] Referring to FIG. 1, the purification device 1 includes a purifier 100 for purifying a sample, and a computer 500 for controlling the purifier 100.

[0016] The refiner 100 includes a container 50, a plurality of pipes 10 to 15, a plurality of pumps 30 to 34, a plurality of ports 61 to 64, a switching valve 41, a thermostatic stirrer 71, a discharge pipe 25, a detection mesh 21, an oxidant reservoir 110, a heavy liquid reservoir 120, a rinsing liquid reservoir 130, waste liquid reservoirs 140, 150, a supernatant liquid reservoir 210, a heavy liquid sensor S1, liquid level sensors S23, S3B, filters F1, F2, and a discharge mesh M1.

[0017] The oxidizer reservoir 110 stores an oxidizer for treating impurities. The "impurities" are foreign matter other than the components to be collected in the mixed sample. In this embodiment, the "impurities" are exemplified by organic impurities having organic properties. The "oxidizer" may be any substance that treats impurities. In this embodiment, the "oxidizer" decomposes organic impurities. For example, the "oxidizer" may be hydrogen peroxide (H2O2), a mixture of hydrogen peroxide (H2O2) and iron oxide (II) (FeO), etc. When the "mixed sample" is seawater and sand, the "organic impurities" may be wood chips and plankton mixed in the seawater or sand, etc.

[0018] The pipe 11 is connected to an oxidizer reservoir 110 and a port 61 provided on the outer periphery of the container 50. The oxidizer stored in the oxidizer reservoir 110 is introduced into the container 50 through the pipe 11 by driving a pump 31 disposed in the pipe 11. The pump 31 is controlled by a computer 500.

[0019] A mesh (not shown) is provided inside the port 61 so that components contained in the sample are not discharged to the outside. The mesh has a mesh size that can trap the microplastics to be collected. Specific examples of the mesh are SUS (stainless steel) wire mesh or PTFE (Teflon (registered trademark)) membrane filters. When using PTFE, it is desirable that it does not leak out as plastic. The mesh size is, for example, about 0.1 mm. (When targeting microplastics, it is necessary that the size is such that particles of 0.1 to 5 mm do not pass through.) Note that ports 62 and 63 are configured in the same way, and the description will not be repeated.

[0020] The rinse liquid reservoir 130 stores a rinse liquid for cleaning the inside of the container 50. The "rinse liquid" may be any liquid that can clean the inside of the container 50, and an example of the "rinse liquid" is water. In this embodiment, the "rinse liquid" introduced through the pipe 13 has a role of diluting the oxidizing agent introduced into the container 50, in addition to cleaning the inside of the container 50.

[0021] The pipe 13 is connected to a rinse liquid reservoir 130 and a port 63 provided on the outer periphery of the container 50. The rinse liquid stored in the rinse liquid reservoir 130 is introduced into the container 50 through the pipe 13 by driving a pump 33 disposed on the pipe 13. The pump 33 is controlled by a computer 500.

[0022] The heavy liquid reservoir 120 stores a heavy liquid for separating samples by difference in specific gravity. The "heavy liquid" may be any liquid that separates samples by difference in specific gravity. In this embodiment, the "heavy liquid" causes inorganic impurities having inorganic properties to settle by difference in specific gravity. For example, the "heavy liquid" may be sodium chloride (NaCl), sodium iodide (Nal), zinc chloride (ZnCl), or the like. l2) and the like. When the "mixed sample" is seawater and sand, the "inorganic impurities" include sand, glass, and stones. The specific gravity of the "heavy liquid" is set to be greater than the specific gravity of the "components" to be collected by the refining device 1, and smaller than the specific gravity of the "inorganic impurities". For example, when the "components" to be collected by the refining device 1 are microplastics, and the "inorganic impurities" are sand, glass, stones, and the like, the specific gravity of the "heavy liquid" may be set to be greater than the specific gravity of microplastics, and smaller than the specific gravity of sand, glass, stones, and the like. Specifically, the specific gravity of the "heavy liquid" may be set to be about 1.5 to about 1.7.

[0023] The piping 12 is connected to a heavy liquid reservoir 120 and a port 62 provided on the outer periphery of the container 50. The heavy liquid stored in the heavy liquid reservoir 120 is introduced into the container 50 through the piping 12 by driving a pump 32 disposed on the piping 12. The pump 32 is controlled by a computer 500.

[0024] The container 50 treats impurities using an oxidizing agent supplied from an oxidizing agent reservoir 110. The container 50 cleans the inside of the container 50 using a rinsing liquid supplied from a rinsing liquid reservoir 130. The container 50 separates the mixed sample based on the difference in specific gravity using a heavy liquid supplied from a heavy liquid reservoir 120.

[0025] The container 50 is placed on the thermostatic stirrer 71. The thermostatic stirrer 71 includes a stirrer bar and a heater (not shown). The thermostatic stirrer 71 is controlled by the computer 500, and stirs the sample contained in the container 50 by rotating the stirrer bar. The thermostatic stirrer 71 corresponds to one embodiment of the "stirring unit".

[0026] The discharge pipe 25 is connected to the discharge port 20 provided at the top of the container 50, and discharges the supernatant liquid of the sample that overflows from the container 50 to the outside. The detection mesh 21 filters the supernatant liquid of the sample discharged from the discharge pipe 25, thereby recovering the components to be recovered that are contained in the supernatant liquid. The supernatant liquid that has passed through the detection mesh 21 is recovered by the supernatant liquid reservoir 210. In a preferred embodiment, the detection mesh 21 is a mesh having meshes large enough to trap the microplastics to be recovered. Specific examples of the mesh are SUS (stainless steel) wire mesh or PTFE (Teflon (registered trademark)) membrane filters. The mesh size of the detection mesh 21 is, for example, about 0.1 mm.

[0027] The port 64 is formed on the outer periphery of the container 50 and is an outlet for discharging the liquid in the container 50. Inside the port 64, a discharge mesh M1 is provided so that components contained in the sample are not discharged outside the container 50. The discharge mesh M1 corresponds to one embodiment of the "mesh member". The discharge mesh M1 may be located between the pipe 14 and the container 50. Preferably, the discharge mesh M1 is a mesh having a mesh size that can trap the microplastics to be collected. Specific examples of the mesh are SUS (stainless steel) wire mesh or PTFE (Teflon (registered trademark)) membrane filters. The mesh size of the discharge mesh M1 is, for example, about 0.1 mm.

[0028] A pipe 14 is connected to the port 64. The pipe 14 discharges the heavy liquid discharged as waste liquid from the container 50 through the port 64 provided in the container 50 to a waste liquid reservoir 140. The pipe 14 corresponds to one embodiment of a “first pipe” in the present disclosure.

[0029] The pump 34 is provided in the piping 14 and operates under the control of the computer 500 to suck in the waste liquid in the container 50 and discharge it from the port 64 toward the waste liquid reservoir 140 or the waste liquid reservoir 150 .

[0030] The switching valve 41 is provided in the piping 14. More specifically, the switching valve 41 is controlled by the computer 500, and switches the path connected to the container 50 to one of the path connected to the waste liquid reservoir 140 and the path connected to the waste liquid reservoir 150. In other words, the switching valve 41 switches whether the waste liquid discharged from the container 50 is introduced into the waste liquid reservoir 140 or the waste liquid reservoir 150.

[0031] The waste liquid reservoir 140 stores the heavy liquid discharged from the container 50 as waste liquid. The piping 15 is connected to one side of the switching valve 41. side The pipe 15 discharges the oxidizing agent and the rinse liquid discharged as waste liquid from the container 50 to the waste liquid reservoir 150. In the example of FIG. 1, the pipe 15 also discharges the waste liquid containing seawater in the mixed sample discharged from the container 50 to the waste liquid reservoir 150.

[0032] The waste liquid reservoir 150 stores the waste liquid discharged from the container 50, which includes the oxidizing agent, the rinse liquid, and the seawater in the mixed sample.

[0033] The pipe 10 delivers the heavy liquid from the pipe 14 to a heavy liquid reservoir 120. A pump 30 and filters F1 and F2 are provided in the pipe 10. The pipe 10 corresponds to one embodiment of a "second pipe" in this disclosure.

[0034] The pump 30 is controlled by the computer 500 and sends the heavy liquid contained in the waste liquid reservoir 140 toward the heavy liquid reservoir 120. However, the driving force for sending the heavy liquid from the pipe 14 to the heavy liquid reservoir 120 is not necessarily limited to a pump, and the purifier 100 may be configured so that the heavy liquid is sent by its own weight, for example. In this case, an opening and closing valve is required instead of a pump.

[0035] The filters F1 and F2 remove impurities from the heavy liquid discharged from the pipe 14. In the example of FIG. 1, the filters F1 and F2 are filtration filters that filter out impurities. Desirably, the filters F1 and F2 have a smaller pore size than the meshes provided in the ports 61 to 64. The filters F1 and F2 are provided in the pipe 10 so as to pass the heavy liquid in the order of the pore size. That is, the pore size of the filter F2 is smaller than that of the filter F1. For example, the pore size of the filter F1 is about 0.05 mm, and the pore size of the filter F2 is about 0.01 mm. In this configuration, after the larger impurities (about 0.05 mm or more) are removed by the filter F1, the smaller impurities (less than about 0.05 mm and about 0.01 mm or more) are removed by the filter F2. The filters F1 and F2 correspond to an embodiment of the "first filter" and the "second filter", respectively.

[0036] The number of filters provided in the pipe 10 may be one or more as exemplified above. However, providing multiple filters has the advantage that smaller impurities can also be removed compared to using a single filter F1 with a large pore size. Also, compared to using a single filter F2 with a small pore size, there is the advantage that clogging with impurities is less likely to occur, reducing the frequency of filter replacement. A specific example of the filter is a membrane filter made of PTFE (Teflon (registered trademark)).

[0037] The liquid amount sensor S23 is provided near the waste liquid reservoir 140 in order to detect the amount of waste liquid stored in the waste liquid reservoir 140. The liquid amount sensor S23 is, for example, a weight sensor that detects the weight of the waste liquid stored in the waste liquid reservoir 140, and is provided below the waste liquid reservoir 140. The weight sensor is, for example, a load cell.

[0038] The detection value of the liquid volume sensor S23 is transmitted to the computer 500. The computer 500 detects the volume of the heavy liquid stored in the waste liquid reservoir 140 based on the detection value of the liquid volume sensor S23. When the liquid volume becomes equal to or less than a threshold value, the computer 500 determines that filtration of the heavy liquid is completed, and stops the pump 30 to stop the filtration. The liquid volume sensor S23 corresponds to an example of a "second sensor" in this disclosure.

[0039] The liquid amount sensor S23 may be another sensor that measures the amount of waste liquid stored in the waste liquid reservoir 140, and may be, for example, a liquid level detection sensor that uses ultrasonic waves, a laser, or the like.

[0040] Furthermore, the liquid volume sensor S23 may be, for example, a flow rate sensor provided in the pipe 14, as long as it is a sensor that can detect the completion of filtration of the heavy liquid in the pipe 14. In this case, the flow rate sensor detects the flow rate of the heavy liquid in the pipe 14. With this configuration, the computer 500 can determine that filtration of the heavy liquid is completed when the flow rate becomes equal to or less than a threshold value, and can stop the pump 30 to stop the filtration.

[0041] The liquid volume sensor S3B is provided near the waste liquid reservoir 150 to detect the volume of the waste liquid (including at least one of an oxidizing agent and a rinsing liquid) stored in the waste liquid reservoir 150. The liquid volume sensor S3B is, for example, a weight sensor that detects the weight of the waste liquid stored in the waste liquid reservoir 150, and is provided below the waste liquid reservoir 150. The weight sensor is, for example, a load cell. The detection value of the liquid volume sensor S3B is transmitted to the computer 500. The computer 500 detects the volume of the waste liquid stored in the waste liquid reservoir 150 based on the detection value of the liquid volume sensor S3B.

[0042] The liquid amount sensor S3B may be another sensor that measures the amount of waste liquid stored in the waste liquid reservoir 150, and may be, for example, a liquid level detection sensor that uses ultrasonic waves, a laser, or the like.

[0043] The heavy liquid sensor S1 is a sensor for detecting whether the heavy liquid that has passed through the filters F1 and F2 maintains a quality sufficient for reuse in purifying samples. The heavy liquid sensor S1 detects at least one of the turbidity and concentration of the heavy liquid after passing through the filters F1 and F2. The heavy liquid sensor S1 corresponds to an example of a "first sensor" in the present disclosure.

[0044] 1, the heavy liquid sensor S1 is a turbidity sensor provided in the heavy liquid reservoir 120. The heavy liquid sensor S1 detects the turbidity of the heavy liquid in the heavy liquid reservoir 120, and sends the detected value to the computer 500. If the heavy liquid sensor S1 is a concentration sensor, the heavy liquid sensor S1 detects the concentration of the heavy liquid in the heavy liquid reservoir 120, and sends the detected value to the computer 500. With this configuration, the computer 500 can determine, based on the detection value of the heavy liquid sensor S1, whether the heavy liquid stored in the heavy liquid reservoir 120 maintains a quality that allows it to be used again for sample purification.

[0045] Moreover, the heavy liquid sensor S1 may be provided in a portion of the pipe 10 between the filter F2 and the heavy liquid reservoir 120 to detect the turbidity and concentration of the heavy liquid recovered after passing through the filters F1 and F2.

[0046] Computer 500 may be realized by a general-purpose computer, or may be realized by a computer dedicated to controlling refiner 100. Computer 500 receives detection values ​​of liquid level sensors S23, S3B and heavy liquid sensor S1, and controls refiner 100 based on each detection value.

[0047] [2. Hardware configuration] 2 is a diagram showing an example of a hardware configuration of a computer. The computer 500 includes a controller 5000, a display 55, and an operation unit 56. The computer 500 controls the operation of the refiner 100. The computer 500 is also configured to process a detection signal transmitted from the refiner 100 and display results based on the analysis of the signal on the display 55.

[0048] A display 55 and an operation unit 56 are connected to the controller 5000. The display 55 is configured, for example, by a liquid crystal panel capable of displaying images. The operation unit 56 accepts operation inputs by a user to the refiner 100. The operation unit 56 is typically configured by a touch panel, a keyboard, a mouse, and the like.

[0049] The controller 5000 has, as its main components, a processor 51, a memory 52, a communication interface (I / F) 53, and an input / output I / F 54. These components are connected to each other via a bus so as to be able to communicate with each other.

[0050] The processor 51 is typically an arithmetic processing unit such as a CPU (Central Processing Unit) or an MPU (Micro Processing Unit). The processor 51 controls the operation of the refining device 1 by reading and executing a program stored in the memory 52.

[0051] The memory 52 is realized by a non-volatile memory such as a random access memory (RAM), a read only memory (ROM), a flash memory, etc. The memory 52 stores a program executed by the processor 51, data used by the processor 51, etc.

[0052] The input / output I / F 54 is an interface for transmitting various types of data between the processor 51 and the display 55 and operation unit 56 .

[0053] The communication I / F 53 is a communication interface for exchanging various data with the refiner 100, and is realized by an adapter, a connector, etc. The communication method may be a wireless communication method using a wireless LAN (Local Area Network) or the like, or a wired communication method using a USB (Universal Serial Bus) or the like.

[0054] [4. Sample purification method] Next, a method for purifying a sample using the purification device 1 will be described.

[0055] First, the user introduces a sample into the container 50 of the purification device 1. For example, the user puts the sample into the container 50 from an inlet (not shown). After that, the user performs a start operation using the operation unit 56 of the computer 500, thereby starting control of the purification device 100 by the computer 500.

[0056] The sample contained in the container 50 contains waste liquid such as seawater. When control by the computer 500 is started, the computer 500 controls the pump 34 and the switching valve 41 to discharge the waste liquid in the container 50 to the waste liquid reservoir 150 via the port 64 and the pipes 14 and 15. On the other hand, microplastics and the like to be collected that are contained in the sample are not discharged to the outside by the discharge mesh M1 included in the port 64, and remain in the container 50.

[0057] Next, the computer 500 stops the discharge pump 34 and controls the pump 31 to introduce the oxidizer from the oxidizer reservoir 110 into the container 50 via the pipe 11 and the port 61 .

[0058] Next, the computer 500 controls the thermostatic stirrer 71 to rotate the stirrer provided in the container 50 while applying a constant heat to the container 50. The temperature of the container 50 and the rotation speed and rotation time of the stirrer are preset by the user. By stirring the sample in this manner, an oxidation process is performed by the oxidizing agent, and organic impurities contained in the sample are decomposed. Note that, while heating is not necessarily required when stirring the sample, maintaining the temperature of the sample at a constant temperature by heating facilitates decomposition by oxidation process.

[0059] Next, computer 500 controls pump 34 and switching valve 41 to discharge the waste liquid contained in container 50, which is the sample after the organic contaminants have been decomposed, into waste liquid reservoir 150 via port 64 and pipes 14 and 15. Meanwhile, microplastics and the like contained in the sample to be recovered remain in container 50 without being discharged to the outside by the discharge mesh M1 included in port 64.

[0060] Next, the computer 500 stops the pump 34 on the discharge side, and controls the pump 33 to introduce the rinsing liquid from the rinsing liquid reservoir 130 into the container 50 via the pipe 13 and the port 63, thereby cleaning the inside of the container 50. At this time, the computer 500 controls the suction amount of the pump 33 to introduce the amount of rinsing liquid preset by the user into the container 50.

[0061] Next, computer 500 controls pump 34 and switching valve 41 to discharge the waste liquid in container 50 after the rinsing liquid has been introduced into waste liquid reservoir 150 via port 64 and pipes 14 and 15. This causes the inside of container 50 to be cleaned with the rinsing liquid. Meanwhile, microplastics and the like contained in the sample and to be collected remain in container 50 without being discharged to the outside by the discharge mesh M1 included in port 64.

[0062] Thereafter, the computer 500 dries the sample by leaving it as it is for a predetermined time (for example, one day). Next, the computer 500 controls the pump 32 to introduce the heavy liquid from the heavy liquid reservoir 120 into the container 50 via the piping 12 and the port 62. At this time, the computer 500 controls the suction amount of the pump 32 to introduce the amount of heavy liquid preset by the user into the container 50.

[0063] When the heavy liquid is introduced into the sample in this manner, inorganic impurities contained in the sample settle near the bottom of container 50 due to the difference in specific gravity. Meanwhile, the liquid level of the gravity-separated sample gradually rises within container 50, and the supernatant liquid of the sample eventually reaches outlet 20 of container 50. The supernatant liquid of the sample is then discharged to the outside via outlet 20 and discharge pipe 25.

[0064] The supernatant of the sample discharged through the discharge pipe 25 is filtered by the detection mesh 21, and only the waste liquid is collected by the supernatant reservoir 210. Microplastics, which are components with a lower specific gravity than the heavy liquid, remain in the detection mesh 21. This specific gravity separation takes about one day, and during that time the computer 500 controls the introduction of the heavy liquid to the sample.

[0065] After the microplastics are collected by refining the sample, the container 50 is washed by post-processing. Specifically, the computer 500 controls the pump 34 and the switching valve 41 to discharge the heavy liquid in the container 50 after the microplastics are collected as waste liquid to the waste liquid reservoir 140 via the port 64 and the piping 14. Next, the computer 500 introduces the rinse liquid contained in the rinse liquid reservoir 130 into the container 50, and discharges the waste liquid in the container 50 after the introduction into the waste liquid reservoir 150. This causes the inside of the container 50 to be washed with the rinse liquid.

[0066] [5. Filtration method for heavy liquid] Conventionally, a mixed sample is gravity-separated using a purifier or the like to recover the components to be recovered. In such sample purification, the heavy liquid remaining after the recovery of the components to be recovered contains impurities different from the components to be recovered. If the impurities can be removed from the heavy liquid after such purification, the heavy liquid can be reused for sample purification, which has the advantage of reducing the amount of heavy liquid discarded.

[0067] Therefore, in the purification device 1 according to this embodiment, the heavy liquid stored in the heavy liquid reservoir 120 is used to purify the sample in the container 50, and after removing the components to be recovered, the heavy liquid is introduced into the pipe 10 and passed through the filters F1 and F2. This allows impurities to be removed from the purified heavy liquid and it can be stored again in the heavy liquid reservoir 120. In other words, the purified heavy liquid can be reused.

[0068] Specifically, when the purification of the sample is completed, the computer 500 drives the pump 30 to introduce the heavy liquid in the waste liquid reservoir 140 into the piping 10, and returns it to the heavy liquid reservoir 120 via the filters F1 and F2. This filters the heavy liquid after purification of the sample. When the amount of liquid in the waste liquid reservoir 140 detected by the liquid amount sensor S23 falls below a predetermined threshold, the computer 500 determines that the filtration of the heavy liquid is completed, and stops the pump 30.

[0069] After the filtration of the heavy liquid is completed, the computer 500 judges whether the heavy liquid maintains a quality that allows it to be used again for refining a sample based on the detection value of the heavy liquid sensor S1. Specifically, when the detection value (turbidity or concentration) of the heavy liquid sensor S1 is equal to or less than a predetermined reference value, the computer 500 judges that the heavy liquid maintains a quality that allows it to be used again for refining a sample. On the other hand, when the detection value of the heavy liquid sensor S1 is greater than the predetermined reference value, the computer 500 judges that the heavy liquid does not maintain a quality that allows it to be used again for refining a sample. In this case, the computer 500 notifies the user of an error and prompts the user to replace the heavy liquid in the heavy liquid reservoir 120. The error is notified, for example, visually using the display 55 or a lamp (not shown), or audibly using a speaker (not shown).

[0070] [6. Heavy liquid filtration process flow] FIG. 3 is a flow chart showing a process for filtering a heavy liquid.

[0071] 3, in step (hereinafter, step will be abbreviated as ST) 02, processor 51 of computer 500 performs gravity separation of the sample in container 50 of purification device 1 using heavy liquid supplied from heavy liquid reservoir 120, and recovers the components to be recovered. In ST04, processor 51 discharges waste liquid from container 50 and stores it in waste liquid reservoir 140.

[0072] In ST06, the processor 51 determines whether the amount of liquid in the waste liquid reservoir 140 is equal to or greater than the threshold value T1. If the amount of liquid is less than the threshold value T1 (NO in ST06), the processor 51 determines that the amount of liquid is insufficient for filtration and ends the process. If the amount of liquid is equal to or greater than the threshold value T1 (YES in ST06), the processor 51 determines that the amount of liquid is sufficient for filtration and proceeds to ST08. In ST08, the processor 51 drives the pump 30 to introduce the heavy liquid into the filters F1 and F2 in the pipe 10 and remove impurities from the heavy liquid. The heavy liquid that has passed through the filters F1 and F2 is returned to the heavy liquid reservoir 120.

[0073] In ST10, the processor 51 determines whether the amount of liquid in the waste liquid reservoir 140 is equal to or less than a threshold value T2. The threshold value T2 is smaller than the threshold value T1 (T1>T2). If the amount of liquid is greater than the threshold value T2 (NO in ST10), the processor 51 determines that filtration is not complete, and returns the process to ST10 to continue filtering the heavy liquid through the filters F1 and F2. If the amount of liquid is equal to or less than the threshold value T2 (YES in ST10), the processor 51 determines that filtration is complete, and in ST12, stops the pump 30 to stop the introduction of the heavy liquid into the filters F1 and F2.

[0074] In ST14, the processor 51 determines whether the turbidity of the heavy liquid stored in the heavy liquid reservoir 120 is equal to or less than the reference value T3. If the turbidity of the heavy liquid is equal to or less than the reference value T3 (YES in ST14), the processor 51 determines that the heavy liquid stored in the heavy liquid reservoir 120 maintains a quality that allows it to be used again for sample purification, and ends the process. On the other hand, if the turbidity of the heavy liquid is greater than the reference value T3 (NO in ST14), the processor 51 determines that the heavy liquid stored in the heavy liquid reservoir 120 cannot be used again for sample purification, and proceeds to ST16. In ST16, the processor 51 notifies the user on the display 55 of the need to replace the heavy liquid in the heavy liquid reservoir 120, and ends the process.

[0075] As described above, according to the purification device 1 of the first embodiment, after the heavy liquid in the heavy liquid reservoir 120 is used to purify a sample, the heavy liquid discharged as waste liquid can be filtered by the filters F1 and F2 and returned to the heavy liquid reservoir 120. In other words, the heavy liquid can be reused.

[0076] (Variation 1) In the refining apparatus 1 according to the first embodiment, the liquid amount sensor of the waste liquid reservoir 140 may be configured to detect the total liquid amount of the waste liquid reservoirs 140 and 150, for example.

[0077] 4 is a schematic diagram showing the configuration of a refinery apparatus 1A according to Modification 1. The refinery apparatus 1A includes a liquid quantity sensor S23B instead of the liquid quantity sensors S23 and S3B of the refinery apparatus 1.

[0078] The liquid amount sensor S23B detects the total amount of waste liquid contained in each of the waste liquid reservoirs 140, 150. The liquid amount sensor S23B is, for example, a weight sensor that detects the total weight of the waste liquid reservoirs 140, 150. The weight sensor is, for example, a load cell. The detection value of the liquid amount sensor S23B is transmitted to the computer 500.

[0079] Next, a method for determining the completion of filtration from the detection value of the liquid volume sensor S23B by the computer 500 will be described. The computer 500 stores the detection value of the liquid volume sensor S23B immediately before the heavy liquid is discharged from the container 50 during purification of the sample, and the detection value of the liquid volume sensor S23B immediately after the discharge of the heavy liquid from the container 50 is completed, and calculates the liquid volume corresponding to each detection value. Next, the computer 500 subtracts the liquid volume corresponding to the immediately preceding detection value from the liquid volume corresponding to the immediately following detection value to calculate the liquid volume of the waste liquid stored in the waste liquid reservoir 140. After that, if the liquid volume is equal to or greater than the threshold value T1, the computer 500 drives the pump 30 to perform filtration. Then, when the liquid volume becomes equal to or less than the threshold value T2, the computer 500 determines that filtration is completed, and stops the pump 30 to stop filtration. Thus, the liquid volume sensor S23B corresponds to one embodiment of a "second sensor" that detects the completion of filtration of the heavy liquid in the pipe 10.

[0080] As described above, the purification apparatus 1A according to Modification 1 can also detect the completion of filtration of the heavy liquid. Therefore, the purification apparatus 1A can also reuse the heavy liquid after purification of the sample, similarly to the purification apparatus 1 according to Embodiment 1.

[0081] [Embodiment 2] In order to filter and reuse the heavy liquid after purification of the sample, it is necessary to properly discharge the heavy liquid from the container 50 after purification of the sample in the first place.

[0082] However, if the discharge mesh M1 becomes clogged with impurities while the oxidizing agent and / or the rinsing liquid is being discharged from the container 50, there is a risk that some of the oxidizing agent and / or the rinsing liquid will remain in the container 50. In this case, there is a risk that the remaining oxidizing agent and / or the rinsing liquid will be mixed with the heavy liquid introduced from the heavy liquid reservoir 120 in the container 50.

[0083] Furthermore, if the discharge mesh M1 becomes clogged with foreign matter while the heavy liquid is being discharged from the container 50, some of the heavy liquid may remain in the container 50 and may not be able to be reused.

[0084] In this case, the concentration of the heavy liquid discharged from the container 50 will be lower than the concentration when it was stored in the heavy liquid reservoir 120, and it may not be possible to maintain a quality sufficient for reuse. In addition, if the oxidizing agent and the heavy liquid are mixed, a chemical reaction may occur between the oxidizing agent and the heavy liquid, which may change the chemical properties of the heavy liquid and make it impossible to reuse the heavy liquid.

[0085] Therefore, in the refining apparatus according to the second embodiment, a method is implemented for detecting and reducing clogging of the discharge mesh M1 when the waste liquid is discharged from the container 50. Thus, in the refining apparatus, the possibility that a part of the waste liquid will remain in the container 50 due to clogging of the discharge mesh M1 and the heavy liquid will not be able to be reused is reduced.

[0086] The configuration of the refining apparatus according to the second embodiment is the same as the configuration of the refining apparatus 1 according to the first embodiment shown in FIG.

[0087] In the second embodiment, the liquid level sensor S23 is also used to detect the discharge of waste liquid (heavy liquid) from the container 50 to the pipe 14. That is, in the second embodiment, the liquid level sensor S23 corresponds to one example of the "second sensor" and also to one example of the "third sensor".

[0088] The liquid level sensor S3B is used to detect the discharge of the waste liquid (oxidizing agent or rinsing liquid) from the container 50 to the pipe 14. That is, the liquid level sensor S3B corresponds to one embodiment of the "third sensor".

[0089] Specifically, the computer 500 calculates a change rate Wp, which is the amount of change in the liquid volume of the waste liquid reservoirs 140 and 150 per unit time when the waste liquid is being discharged normally with the discharge mesh M1 installed, based on the specifications of the pump 34 used for discharging the waste liquid from the container 50. On the other hand, the computer 500 calculates a change rate Wm, which is the amount of change in the liquid volume of the waste liquid reservoirs 140 and 150 per unit time, from the detection values of the liquid volume sensors S23 and S3B received every predetermined time (for example, 1 second). The change rate Wp and the change rate Wm are positive real numbers, and the unit is, for example, g / second.

[0090] When clogging occurs in the discharge mesh M1 and an abnormality occurs in the discharge of the waste liquid, the numerical value of the change rate Wm becomes significantly smaller compared to the change rate Wp.

[0091] In view of such a situation, when the value of the change rate Wm drops below a predetermined ratio R with respect to the change rate Wp (when Wm ≤ Wp × R), the computer 500 determines that an abnormality has occurred in the discharge of the waste liquid, that is, there may be clogging in the discharge mesh M1. R is a real number between 0 and 1, and is set to an appropriate value by the user, for example.

[0092] When it is determined that there may be clogging in the discharge mesh M1, the computer 500 causes the stirring unit to stir the inside of the container 50. As a result, contaminants and the like that were the cause of the clogging may be separated from the discharge mesh M1 to the container 50 side by the water flow generated by the stirring, and the clogging may be reduced. The stirring is performed at a predetermined rotational speed for a predetermined time. The rotational speed of the stirring is preferably higher than the rotational speed of the stirring performed during normal purification. After performing the stirring, if Wm > Wp × R, it is determined that the clogging of the discharge mesh M1 has been reduced.

[0093] Preferably, during the stirring, the pump 34 is stopped to stop the discharge of the waste liquid from the container 50. With this configuration, the force with which the impurities causing the clogging of the discharge mesh M1 are sucked into the discharge mesh M1 side is weakened, and the impurities are easily separated into the container 50 side. After stirring, the pump 34 is started again, and a determination is made as to whether the discharge mesh M1 is clogged.

[0094] Also, in consideration of the case where Wm≦Wp×R even after one stirring is performed, a configuration may be adopted in which stirring is performed a predetermined number of times until Wm>Wp×R is achieved.

[0095] However, there may be cases where the clogging of the discharge mesh M1 is not reduced by stirring. In consideration of this case, the computer 500 notifies an error if the discharge amount detected by the liquid volume sensors S23 and S3B is smaller than the threshold even after stirring is performed a predetermined number of times. The error includes a content that urges the user to reduce the clogging of the discharge mesh M1 by a "method other than stirring." The error is notified, for example, visually using the display 55 or a lamp (not shown), or audibly using a speaker (not shown).

[0096] An example of the "method other than stirring" is when a user opens the container 50 and removes the clogged part of the discharge mesh M1 from inside the container 50 using a device such as a brush. Another example of the "method other than stirring" is when a waste liquid is caused to flow backward from the pipe 14 to the discharge mesh M1. This method is performed by a device included in the purifier 100, for example.

[0097] When calculating the amount of waste liquid discharged from the container 50 based on the liquid amounts in the waste liquid reservoirs 140, 150 detected by the liquid amount sensors S23, S3B, respectively, it is preferable that the liquid amounts in the waste liquid reservoirs 140, 150 do not fluctuate due to factors other than the discharge of waste liquid from the container 50. That is, in the second embodiment, it is preferable that the pump 30 is stopped while the waste liquid is being discharged from the container 50, and is controlled so that the waste liquid in the waste liquid reservoir 140 is not introduced into the piping 10. Then, it is preferable that the pump 30 is driven to introduce the waste liquid in the waste liquid reservoir 140 into the piping 10 after it is confirmed that the discharge of the waste liquid from the container 50 has been completed.

[0098] FIG. 5 is a flow chart showing a process for detecting and reducing clogging of the discharge mesh M1 in the refining apparatus according to the second embodiment.

[0099] 5, in ST30, the processor 51 drives the pump 34 to start discharging the waste liquid from the container 50 through the discharge mesh M1 to the pipe 14. In ST32, the processor 51 initializes the number of mixing times N1 to 0.

[0100] In ST33, the processor 51 determines whether or not the discharge of the waste liquid from the container 50 is complete. Specifically, for example, based on the detection value of a liquid level sensor of the container 50 (not shown), when the amount of the waste liquid in the container 50 is equal to or less than a threshold value T4, the processor 51 determines that the discharge of the waste liquid from the container 50 is complete. In this case, the processor 51 stops the pump 34 to stop the discharge of the waste liquid from the container 50, and ends the process.

[0101] In ST34, the processor 51 detects the amount of waste liquid discharged from the container 50 to the pipe 14 using the liquid volume sensors S23, S3B. Specifically, the processor 51 calculates the rate of change Wm based on the detection values ​​of the liquid volume sensors S23, S3B. In ST36, the processor 51 determines whether the amount of waste liquid discharged is smaller than a threshold value. Specifically, the processor 51 determines whether Wm≦Wp×R. If Wm>Wp×R (NO in ST36), the processor 51 returns the process to ST33 while continuing the discharge of the waste liquid.

[0102] If Wm≦Wp×R (YES in ST36), in ST38, the processor 51 stops the pump 34 to stop the discharge of the waste liquid from the container 50. In ST40, the processor 51 determines whether the number of mixing times N1 is equal to a predetermined number of times N2. N2 is a positive integer equal to or greater than 1.

[0103] If the number of stirring times N1 is smaller than the predetermined number of stirring times N2 (NO in ST40), in ST42, processor 51 stirs inside container 50 at a predetermined rotation speed for a predetermined time. In ST44, processor 51 increments the value of the number of stirring times N1 by 1. In ST46, processor 51 drives pump 34 to resume discharge of waste liquid, and returns the process to ST34.

[0104] On the other hand, if the number of stirring times N1 is equal to the predetermined number of times N2 (YES in ST40), in ST48, the processor 51 suspends the purification process in the purification device 1. In ST50, the processor 51 notifies the user of an error and ends the process. The error includes a message urging the user to reduce clogging of the discharge mesh M1 by "a method other than stirring."

[0105] In addition, samples that are expected to be purified by the purification device 1 include environmental samples such as seabed mud, but in this case, the sample is often unique. In other words, when the purification device 1 stops due to clogging of the discharge mesh M1, it is difficult to obtain the same sample again if all the liquid containing the sample in the container 50 is discarded and the clogging is cleared. Therefore, even if additional processing such as stirring and removing the clogging of the discharge mesh M1 by a "method other than stirring" is performed, the advantage of being able to complete purification without losing the sample is greater.

[0106] In view of this situation, the number of stirring times N1 may be configured to be initialized to 0 when the discharge of waste liquid after stirring satisfies Wm>Wp×R for a predetermined time. With this configuration, even if clogging of the discharge mesh M1 occurs once, if the clogging is reduced by stirring, stirring can be performed when clogging of the discharge mesh M1 occurs after the predetermined time has passed.

[0107] In the second embodiment, it is sufficient to have a sensor capable of detecting the amount of waste liquid discharged from the container 50 to the pipe 14. Therefore, for example, the liquid volume sensor S23B described in the first modified example of the first embodiment may be used instead of the liquid volume sensors S23 and S3B. That is, the liquid volume sensor S23 corresponds to one example of the "third sensor".

[0108] As described above, the purification apparatus according to the second embodiment not only enables reuse of the heavy liquid by filtration like the purification apparatus 1 according to the first embodiment, but also makes it possible to reduce clogging in the discharge mesh M1 when the waste liquid (heavy liquid, oxidizing agent, rinse liquid) is discharged from the container 50.

[0109] In addition, in the purification device, even if clogging occurs in the discharge mesh M1 when discharging other waste liquids (such as seawater contained in a sample), the clogging can be detected in a similar manner and reduced by stirring.

[0110] This reduces the possibility that waste liquid other than the heavy liquid remaining in the container 50 will mix with the heavy liquid introduced from the heavy liquid reservoir 120, making it impossible to reuse the heavy liquid. It also reduces the possibility that the heavy liquid will remain in the container 50. This makes it easier to reuse the heavy liquid in the purification device.

[0111] (Variation 2) In the second modification, an example will be described in which a flow rate sensor provided in the pipe 14 is used as a sensor capable of detecting the amount of waste liquid discharged from the container 50 to the pipe 14.

[0112] 6 is a schematic diagram showing the configuration of a purification apparatus 1B according to Modification 2. In addition to the configuration of the purification apparatus 1, the purification apparatus 1B includes a flow sensor S3A provided in the pipe 14. The flow sensor S3A detects the flow rate of the waste liquid in the pipe 14. The flow sensor S3A corresponds to one embodiment of the "third sensor." A detection value of the flow sensor S3A is sent to the computer 500.

[0113] When the detection value of the flow rate sensor S3A is equal to or lower than a predetermined threshold value, the computer 500 determines that an abnormality has occurred in the discharge of waste liquid from the container 50, that is, that there is a possibility that the discharge mesh M1 is clogged. When a blockage of the discharge mesh M1 is detected, the inside of the container 50 is stirred as in the second embodiment, thereby reducing the blockage of the discharge mesh M1.

[0114] As described above, in the refining apparatus 1B according to the second modification, in addition to detecting the completion of filtration of the heavy liquid, clogging of the discharge mesh M1 when the waste liquid is discharged from the container 50 can be reduced.

[0115] [Embodiment 3] The method for removing the clogging of the discharge mesh M1 included in the refining device according to the second embodiment and the second modification is the same as that of the refining device 1, 1 according to the first embodiment and the first modification. A The method of recycling the heavy liquid by filtration, which is included in common with the above, can be carried out independently.

[0116] 7 is a schematic diagram showing the configuration of a refinery apparatus 1C according to embodiment 3. The refinery apparatus 1C is obtained by removing the pipe 10, the pump 30, the filters F1 and F2, and the heavy liquid sensor S1, which are parts used for filtering the heavy liquid, from the refinery apparatus 1. Even in this refinery apparatus 1C, clogging of the discharge mesh M1 can be eliminated.

[0117] In the purification apparatus 1C, by eliminating clogging of the discharge mesh M1, the waste liquid (heavy liquid, oxidizing agent, or rinse liquid) can be properly discharged from the container 50 to the pipe 14. That is, the possibility that the heavy liquid remains in the container 50 or that the heavy liquid mixes with the remaining oxidizing agent or rinse liquid in the container 50 is reduced, so that the possibility that the heavy liquid can be properly discharged to the waste liquid reservoir 140 is increased. This makes it easier to filter the heavy liquid stored in the waste liquid reservoir 140 and reuse it for sample purification.

[0118] [Aspects] It will be appreciated by those skilled in the art that the exemplary embodiments described above are examples of the following aspects.

[0119] (Item 1) A purification device according to one embodiment is a purification device for purifying a sample, and may include a heavy liquid reservoir, a container, a first pipe, a second pipe, and a filter unit. The heavy liquid reservoir stores a heavy liquid. The container 50 separates the sample based on the difference in specific gravity using the heavy liquid supplied from the heavy liquid reservoir. The first pipe discharges waste liquid from the container. The second pipe delivers the heavy liquid from the first pipe to the heavy liquid reservoir. The filter unit is provided in the second pipe and removes impurities from the heavy liquid discharged from the first pipe.

[0120] According to the purification device described in the first aspect, the heavy liquid from which the components to be separated have been removed in the container is discharged through the first pipe, and after impurities are removed by the filter unit provided in the second pipe, the heavy liquid is stored in the heavy liquid reservoir. Therefore, the heavy liquid for gravity separation can be used efficiently.

[0121] (Item 2) The purification apparatus according to item 1 may further include a first sensor for detecting at least one of the turbidity and the concentration of the heavy liquid after passing through the filter unit.

[0122] According to the purification device described in the second aspect, the computer can determine, based on the detection value of the first sensor, whether the heavy liquid that has passed through the filter unit maintains a quality that allows it to be used again for purification of a sample.

[0123] (Item 3) In the purification apparatus described in item 1 or 2, the filter unit may have a first filter and a second filter disposed between the first filter and the heavy liquid reservoir, and the pore size of the second filter may be smaller than the pore size of the first filter.

[0124] The purification device described in paragraph 3 has the advantage that smaller impurities can be removed as well, compared to using a first filter with a large pore size alone. Also, compared to using a second filter with a small pore size alone, it has the advantage that clogging due to impurities is less likely to occur, reducing the frequency of filter replacement.

[0125] (Item 4) The purification apparatus according to any one of Items 1 to 3 may further include a pump provided in the second pipe for introducing the heavy liquid into the heavy liquid reservoir.

[0126] According to the purification device described in item 4, the heavy liquid can be introduced from the waste liquid reservoir to the heavy liquid reservoir using a pump.

[0127] (Item 5) The purification apparatus according to any one of Items 1 to 4 may further include a waste liquid reservoir provided between the first pipe and the second pipe for storing the heavy liquid discharged from the first pipe.

[0128] According to the purification device described in the fifth aspect, the heavy liquid discharged from the container can be temporarily stored in the waste liquid reservoir before being introduced into the second pipe for filtering the heavy liquid. Then, after the discharge of the heavy liquid from the container is completed, the filtration of the heavy liquid discharged from the container can be started.

[0129] (Item 6) The purification apparatus according to any one of Items 1 to 5 may further include a second sensor for detecting completion of filtration of the heavy liquid in the second pipe.

[0130] According to the purification device described in item 6, the completion of filtration can be detected, the pump can be stopped, and filtration can be stopped.

[0131] (Item 7) The purification apparatus according to item 1 may further include a waste liquid reservoir for storing the heavy liquid discharged from the first pipe, and a mesh member provided between the container and the first pipe.

[0132] According to the purification device described in item 7, the heavy liquid discharged from the container can be temporarily stored in the waste liquid reservoir before being introduced into the second pipe for filtering the heavy liquid. Then, after the discharge of the heavy liquid from the container is completed, the filtration of the heavy liquid discharged from the container can be started. Also, according to the purification device, the mesh member prevents components contained in the sample from being discharged from the container into the first pipe.

[0133] (Item 8) The purification apparatus described in item 7 may further include a third sensor for detecting the discharge of waste liquid from the container to the first piping, a stirring unit for stirring the sample in the container, and a computer, and the computer may compare the amount of discharge of waste liquid detected by the third sensor with a threshold value, and when it determines that the amount of discharge is smaller than the threshold value, may cause the stirring unit to stir the sample in the container.

[0134] According to the purification device described in paragraph 8, when the amount of waste liquid discharged is less than the threshold value, i.e., when there is a possibility that the mesh member is clogged, the computer stirs the inside of the container, thereby separating impurities and the like that are causing the clogging of the mesh member from the mesh member and reducing the clogging.

[0135] (Item 9) In the purification device according to item 8, the third sensor may include at least one of a liquid volume sensor and a flow rate sensor.

[0136] According to the refining device described in item 9, it is possible to detect whether the amount of discharged waste liquid is less than the threshold value based on the detection value of at least one of the liquid volume sensor and the flow rate sensor.

[0137] (Item 10) In the refining apparatus according to item 8 or 9, the computer is configured to detect whether the discharge amount detected by the third sensor is greater than the threshold value even after stirring is performed by the stirring unit. still If it is small, stirring may be carried out again.

[0138] According to the refining device described in the tenth aspect, stirring can be repeated until clogging of the mesh member is eliminated.

[0139] (Item 11) In the refining apparatus described in any one of Items 8 to 10, the computer may notify an error when the discharge amount detected by the third sensor is smaller than the threshold even after the stirring unit has performed a predetermined number of stirrings.

[0140] According to the refining device described in paragraph 11, if the clogging of the mesh member is not cleared by stirring, an error is notified to the user, thereby encouraging the user to reduce the clogging of the mesh member by a "method other than stirring."

[0141] (Item 12) In the purification device described in any one of Items 8 to 11, an oxidizing agent for treating some of the impurities contained in the sample, or a rinsing liquid for cleaning the inside of the container may be supplied into the container of the purification device, and the waste liquid discharged from the container to the first piping may contain a heavy liquid, an oxidizing agent, or a rinsing liquid.

[0142] According to the purification apparatus described in item 12, even if clogging occurs in the mesh member when the heavy liquid, the oxidizing agent or the rinsing liquid is discharged from the container, clogging can be reduced by stirring or a method other than stirring.

[0143] (Item 13) A purification device according to one embodiment may include a container, a first pipe, a mesh member, a sensor, an agitator, and a computer. The container separates samples based on differences in specific gravity using a heavy liquid. The first pipe discharges waste liquid from the container. The mesh member is provided between the container and the first pipe. The sensor detects the discharge of waste liquid from the container to the first pipe. The agitator agitates the sample in the container. The computer compares the amount of waste liquid discharged detected by the sensor with a threshold, and when it determines that the amount of waste liquid discharged is less than the threshold, causes the agitator to agitate the container.

[0144] According to the refining device described in paragraph 13, when the amount of waste liquid discharged is less than the threshold value, i.e., when there is a possibility that the mesh member is clogged, the computer stirs the inside of the container, thereby separating impurities and the like that were causing the clogging of the mesh member from the mesh member and reducing clogging.

[0145] (Item 14) A control method according to one aspect is a control method executed by a computer included in a purification device that purifies a sample in a container to which a heavy liquid from a heavy liquid reservoir is supplied. The control method may include a step of discharging waste liquid from the container, a step of introducing the heavy liquid discharged from the container into a filter unit to remove impurities from the heavy liquid, and a step of returning the heavy liquid that has passed through the filter unit to the heavy liquid reservoir.

[0146] According to the control method described in paragraph 14, the heavy liquid from which the components to be separated have been removed in the container is discharged as waste liquid, and after impurities are removed by the filter unit, it is stored in the heavy liquid reservoir. Therefore, it is possible to efficiently use the heavy liquid for specific gravity separation.

[0147] (Item 15) The purification apparatus described in item 14 may further include a first pipe for discharging waste liquid from the container, a mesh member provided between the container and the first pipe, a sensor for detecting the discharge of waste liquid from the container to the first pipe, and a stirring unit for stirring the sample in the container, and the step of discharging waste liquid from the container may include a step of discharging the waste liquid from the container through the mesh member into the first pipe, and may further include a step of detecting the amount of waste liquid discharged from the container to the first pipe by the sensor, and a step of comparing the amount of waste liquid discharged detected by the sensor with a threshold value, and stirring the container when it is determined that the amount of discharged is smaller than the threshold value.

[0148] According to the control method described in paragraph 15, when the amount of waste liquid discharged is less than a threshold value, i.e., when there is a possibility that the mesh member is clogged, the computer stirs the container to separate impurities, etc. that were causing the clogging of the mesh member from the mesh member, thereby reducing the clogging.

[0149] (Item 16) A control method according to one embodiment is a control method executed by a computer in a purification apparatus including a container for separating a sample based on differences in specific gravity using a heavy liquid, a first pipe for discharging waste liquid from the container, a mesh member provided between the container and the first pipe, a sensor for detecting the discharge of waste liquid from the container to the first pipe, a stirring unit for stirring the sample in the container, and a computer, and may include the steps of: after purifying the sample, passing the waste liquid from the container through the mesh member and discharging it into the first pipe; detecting the amount of waste liquid discharged from the container to the first pipe by the sensor; and comparing the amount of waste liquid discharged detected by the sensor with a threshold value, and stirring the container when it is determined that the amount of waste liquid discharged is less than the threshold value.

[0150] According to the control method described in paragraph 16, when the amount of waste liquid discharged is less than a threshold value, i.e., when there is a possibility that the mesh member is clogged, the computer stirs the inside of the container, thereby separating impurities and the like that were causing the clogging of the mesh member from the mesh member and reducing the clogging.

[0151] The embodiments disclosed herein should be considered to be illustrative and not restrictive in all respects. The scope of the present invention is defined by the claims, not the above description, and is intended to include all modifications within the meaning and scope of the claims. [Explanation of symbols]

[0152] 1, 1A-1C purification device, 10-15 piping, 20 discharge port, 21 detection mesh, 25 discharge pipe, 30-34 pump, 41 switching valve, 50 container, 51 processor, 52 memory, 55 display, 56 operation unit, 61-64 port, 71 thermostatic stirrer, 100 purification device, 110 oxidizer reservoir, 120 heavy liquid reservoir, 130 rinse liquid reservoir, 140, 150 waste liquid reservoir, 210 supernatant liquid reservoir, 500 computer, 5000 controller, F1, F2 filter, 53 communication I / F, 54 input / output I / F, M1 discharge mesh, S1 heavy liquid sensor, S3A flow rate sensor, S3B, S23, S23B liquid volume sensor.

Claims

1. A purification device for purifying a sample, comprising: A heavy liquid reservoir for storing a heavy liquid; a container for separating a sample based on a specific gravity difference using the heavy liquid supplied from the heavy liquid reservoir; a discharge pipe for discharging a supernatant of the sample in the container; a first pipe provided below the discharge pipe for discharging waste liquid from the container; a second pipe for transferring the heavy liquid from the first pipe to the heavy liquid reservoir; a filter unit provided in the second pipe for removing impurities from the heavy liquid discharged from the first pipe.

2. The purification apparatus of claim 1 , further comprising a first sensor for detecting at least one of a turbidity and a concentration of the heavy liquid after passing through the filter unit.

3. the filter unit includes a first filter and a second filter provided between the first filter and the heavy liquid reservoir; The purification device of claim 1 , wherein the pore size of the second filter is smaller than the pore size of the first filter.

4. The purification apparatus according to claim 1 , further comprising a pump provided in the second pipe for introducing a heavy liquid into the heavy liquid reservoir.

5. The purification apparatus according to claim 1 , further comprising a waste liquid reservoir provided between the first pipe and the second pipe for storing the heavy liquid discharged from the first pipe.

6. The purification apparatus according to claim 1 , further comprising a second sensor for detecting completion of filtration of the heavy liquid in the second pipe.

7. a waste liquid reservoir for storing the heavy liquid discharged from the first pipe; The purification device according to claim 1 , further comprising a mesh member provided between the container and the first pipe.

8. a third sensor for detecting discharge of waste liquid from the container to the first pipe; A stirring unit that stirs the sample in the container; and a computer.

8. The refining apparatus according to claim 7, wherein the computer compares the amount of waste liquid discharged detected by the third sensor with a threshold value, and when the computer determines that the amount of waste liquid discharged is smaller than the threshold value, the computer causes the agitation unit to agitate the inside of the container.

9. The purification apparatus of claim 8 , wherein the third sensor includes at least one of a liquid level sensor and a flow rate sensor.

10. 9. The refining apparatus according to claim 8, wherein the computer performs stirring again when the discharge amount detected by the third sensor is still smaller than the threshold value even after stirring by the stirring unit is performed.

11. 9. The refining apparatus according to claim 8, wherein the computer notifies an error when the discharge amount detected by the third sensor is smaller than a threshold value even after the stirring unit has performed a predetermined number of stirring operations.

12. An oxidizing agent for treating a part of impurities contained in the sample or a rinse liquid for cleaning the inside of the container may be supplied to the container of the purification device. The purification apparatus according to claim 8 , wherein the waste liquid discharged from the container to the first pipe contains a heavy liquid, an oxidizing agent, or a rinse liquid.

13. A container for separating a sample based on its specific gravity difference using a heavy liquid; A first pipe for discharging waste liquid from the container; a mesh member provided between the container and the first pipe; a sensor for detecting discharge of waste liquid from the container to the first pipe; A stirring unit that stirs the sample in the container; a computer; The computer compares the amount of waste liquid discharged detected by the sensor with a threshold value, and when it determines that the amount of waste liquid discharged is smaller than the threshold value, causes the agitation unit to agitate the inside of the container.

14. A purification apparatus for purifying a sample, comprising: A heavy liquid reservoir for storing a heavy liquid; a container for separating a sample based on a specific gravity difference using the heavy liquid supplied from the heavy liquid reservoir; A first pipe for discharging waste liquid from the container; a second pipe for transferring the heavy liquid from the first pipe to the heavy liquid reservoir; a filter unit provided in the second pipe for removing impurities from the heavy liquid discharged from the first pipe; The purification apparatus further comprises a first sensor for detecting at least one of the turbidity and the concentration of the heavy liquid after passing through the filter unit.

15. A purification apparatus for purifying a sample, comprising: A heavy liquid reservoir for storing a heavy liquid; a container for separating a sample based on a specific gravity difference using the heavy liquid supplied from the heavy liquid reservoir; A first pipe for discharging waste liquid from the container; a second pipe for transferring the heavy liquid from the first pipe to the heavy liquid reservoir; a filter unit provided in the second pipe for removing impurities from the heavy liquid discharged from the first pipe; and a second sensor for detecting completion of filtration of the heavy liquid in the second pipe.

Citation Information

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