Substrate support device

Abstract

The present invention provides a substrate support apparatus having a spin chuck and a number of alignment pins. The spin chuck is configured to support and rotate a substrate and has a support surface. The alignment pins are disposed on a periphery of the support surface to limit horizontal displacement of the substrate. The support surface defines a first annular region. The first annular region is divided into a number of pin regions and a number of non-pin regions. The pin regions and non-pin regions are arranged alternately in a circumferential direction of the first annular region. Each pin region corresponds to one alignment pin. A number of Bernoulli holes are provided in the first annular region, the Bernoulli holes having a non-uniform configuration in the first annular region to provide a stronger airflow to the pin regions than to the non-pin regions.

Description

[Technical field]

[0001] The present invention relates generally to a substrate support apparatus, and more particularly to a substrate support apparatus for supporting a substrate according to Bernoulli's principle that can prevent processing of the bottom surface and edges of the substrate. [Background technology]

[0002] Bernoulli chucks are typically used to support a substrate by suction without contact, especially in substrate backside processing. This reduces contamination of the substrate by the chuck. In this process, a processing liquid is sprayed on the backside of the substrate to process the front side of the substrate. The processing liquid is sprayed so as not to process the front side and edges of the substrate. However, the processing liquid tends to flow to the front side of the substrate along a number of positioning pins that are used to limit the horizontal displacement of the substrate during processing. This results in so-called pin marks occurring near the positioning pins on the front side of the substrate.

[0003] Such problems are addressed and solved in U.S. Pat. No. 6,328,846 B1, which discloses that each locating pin is associated with a nozzle through which gas is injected from below into the area of ​​the locating pin, the nozzles being spaced apart from the Bernoulli nozzles that provide gas to form a gas cushion to suspend the substrate, thereby blowing off the processing fluid before it reaches the area adjacent to the locating pin. However, the nozzles associated with each locating pin are controlled separately from the Bernoulli nozzles, which can make the construction and operation of the Bernoulli chuck more complicated. Summary of the Invention

[0004] The present invention provides a substrate support device that solves the problem of pin marks described in the prior art. In one embodiment of the present invention, the substrate support device includes a spin chuck for supporting and rotating a substrate, a plurality of positioning pins for restricting the horizontal displacement of the substrate, and a plurality of Bernoulli holes for supplying gas to the substrate from below to form a cushion and for floating and sucking the substrate by the Bernoulli effect. A support surface is provided on the spin chuck, which defines a first annular region. The first annular region is divided into a plurality of pin regions and a plurality of non-pin regions. The pin regions and the non-pin regions are alternately arranged in the circumferential direction of the first annular region. Each pin region corresponds to one positioning pin. In the first annular region, the Bernoulli holes have a non-uniform configuration so as to supply a stronger airflow to the pin regions than to the non-pin regions. Specifically, the diameter or density of the Bernoulli holes near the positioning pins is larger than the diameter or density of the Bernoulli holes in other regions, so that the airflow supplied to the vicinity of the positioning pins is greater than that in the other regions. As a result, the air flow around the locating pins is strengthened, preventing the processing liquid from flowing along the locating pins to the edge or underside of the substrate. To prevent the underside of the substrate from being further processed, a convex ring is configured at the periphery of the spin chuck, forming a recess above the support surface. The convex ring not only changes the flow path of the processing liquid to prevent it from splashing onto any side of the substrate, but also forms a gap between the inner wall of the convex ring and the edge of the substrate held in the recess, strengthening the protective gas. All these configurations have the advantage of reducing the risk of processing liquid flowing to the underside of the substrate and unwanted contamination of the substrate. [Brief description of the drawings]

[0005] The present invention will become apparent to those skilled in the art by reference to the accompanying drawings and the following description of the preferred embodiments. [Figure 1] FIG. 1 is a cross-sectional view illustrating a substrate support apparatus according to an exemplary embodiment of the present invention. [Diagram 2]FIG. 2 is a top view showing an example of a spin chuck. [Diagram 3] FIG. 3 is a top view showing another example of the spin chuck. [Figure 4] FIG. 4 is a top view showing another example of the spin chuck. [Diagram 5] FIG. 5 is a top view showing another example of the spin chuck. [Figure 6] FIG. 6 is a top view illustrating an example of a spin chuck of another substrate support apparatus according to an exemplary embodiment of the present invention. [Figure 7] FIG. 7 is a cross-sectional view showing the substrate supporting apparatus. [Figure 8] FIG. 8 is another cross-sectional view showing the substrate supporting apparatus. [Figure 9] FIG. 9 is a cross-sectional view showing the substrate slightly elevated. [Figure 10] FIG. 10 is a cross-sectional view illustrating yet another substrate support apparatus according to an exemplary embodiment of the present invention. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0006] Referring to FIG. 1, a substrate support apparatus according to an exemplary embodiment of the present invention is shown. The substrate support apparatus includes a spin chuck 100 for supporting and rotating a substrate. The spin chuck 100 has a support surface 110 for supporting a substrate 001. A number of positioning pins 130 are arranged on the periphery of the support surface 110 and engage with the edge of the substrate 001 to limit the horizontal displacement of the substrate 001. The support surface 110 is the upper surface of the spin chuck 100 and is surrounded by the number of positioning pins 130. At least one nozzle 003 is used to dispense various processing liquids, such as SC-1, SC-2, SPM, HF, DIW, etc., onto the surface of the substrate 001 located above the support surface 110 of the spin chuck 100.

[0007] 1 and 2, a first annular region 150 is defined in the support surface 110 of the spin chuck 100. A plurality of Bernoulli holes 160 are provided in the first annular region 150. Each Bernoulli hole 160 is inclined with respect to the central axis of the spin chuck 100 and is suitable for supplying gas to the underside of the substrate 001 to form a cushion and generate the Bernoulli effect so that the substrate 001 can be sucked without contacting the support surface 110 and float above the support surface 110 of the spin chuck 100. The Bernoulli holes 160 are circular, and an inert gas or nitrogen is supplied to them all at once from a single gas supply pipe.

[0008] In general, the spin chuck 100 is mounted on a rotating spindle, and the rotating spindle is connected to a driving mechanism that drives the spin chuck 100 and the rotating spindle to rotate simultaneously, and at least one gas supply pipe is configured to supply gas to holes, such as Bernoulli holes 160, defined in the spin chuck 100. The above features are obvious to those skilled in the art, and therefore will not be repeated in the present invention or illustrated in the following drawings.

[0009] 2, the first annular region 150 is divided into a plurality of pin regions 151 and a plurality of non-pin regions 152 according to the distance from the positioning pin 130. Each pin region 151 corresponds to one positioning pin 130. The plurality of Bernoulli holes 160 are divided into a plurality of first groups of Bernoulli holes 161 and a plurality of second groups of Bernoulli holes 162. Each of the first groups of Bernoulli holes 161 corresponds to one pin region 151, and each of the second groups of Bernoulli holes 162 corresponds to one non-pin region 152. Each of the first groups of Bernoulli holes 161 is closer to the positioning pin 130 than each of the second groups of Bernoulli holes 162. The pin regions 151 and the non-pin regions 152 are alternately arranged and symmetrical in the circumferential direction of the first annular region 150. The central angle θ of each pin region 151 is 5° to 10°. It is noteworthy that each locating pin 130 is located on a line connecting the center of the corresponding pin region 151 and the center of the first annular region 150. In the present invention, the configuration of the plurality of Bernoulli holes 160 in the first annular region 150 is non-uniform, so that the airflow provided by the first group of Bernoulli holes 161 in the pin region 151 is stronger than the airflow provided by the second group of Bernoulli holes 162 in the non-pin region 152.

[0010] In the present invention, the non-uniform configuration of the Bernoulli holes 160 in the first annular region 150 is mainly realized as a change in diameter or density of the Bernoulli holes 160 in different regions (e.g., pin region 151 or non-pin region 152) in the circumferential direction of the first annular region 150. If the total amount of gas supplied to the non-uniformly configured Bernoulli holes 160 in the present invention is equal to the total amount of gas supplied to the uniformly configured Bernoulli holes in a conventional spin chuck, the configuration of the present invention makes the airflow near the positioning pin 130 stronger by changing the diameter or density of the Bernoulli holes 160 adjacent to the positioning pin 130 of the present invention. That is, by supplying more airflow near the positioning pin 130 without changing the gas supply amount, the gas force acts locally stronger in the region near the positioning pin 130. This makes it possible to prevent etching of the edge and underside of the substrate 001 by the processing liquid over the entire circumference, especially in the portion adjacent to the positioning pin 130. Below, some specific examples of spin chucks having Bernoulli holes with non-uniform configurations will be introduced.

[0011] 2 illustrates an exemplary spin chuck 100 for supporting a substrate having a non-uniform configuration of Bernoulli holes 160 disposed in a first annular region 150 of the spin chuck 100. A first group of Bernoulli holes 161 has a higher density in the pinned region 151 than a second group of Bernoulli holes 162 in the non-pinned region 152. As illustrated in FIG. 2, the density of the first group of Bernoulli holes 161 is the same among the pinned regions 151. The density of the second group of Bernoulli holes 162 is also the same among the non-pinned regions 152, but is less than the density of the first group of Bernoulli holes 161 in the pinned region 151. Preferably, the density of each first group of Bernoulli holes 161 can be designed to gradually increase as the distance between the Bernoulli holes 161 and the corresponding positioning pins 130 decreases, and the density of the second group of Bernoulli holes 162 in the non-pin region 152 is set to a value less than the minimum density of the first group of Bernoulli holes 161 in the pin region 151.

[0012] 3 illustrates another exemplary spin chuck 200 for supporting a substrate having a non-uniform configuration of Bernoulli holes 260 disposed in a first annular region 250 of the spin chuck 200. A first group of Bernoulli holes 261 in the pinned region 251 has a larger diameter than a second group of Bernoulli holes 262 in the non-pinned region 252. As illustrated in FIG. 3, the diameter of the first group of Bernoulli holes 261 is the same among the pinned regions 251. The diameter of the second group of Bernoulli holes 262 is also the same among the non-pinned regions 252, but is smaller than the diameter of the first group of Bernoulli holes 261 in the pinned region 251. Preferably, the diameter of each of the first group of Bernoulli holes 261 in the pin region 251 can be designed to gradually increase as the distance between the Bernoulli hole 261 and the corresponding positioning pin decreases, and the diameter of the second group of Bernoulli holes 262 in the non-pin region 252 is set to a value less than the smallest diameter of the first group of Bernoulli holes 261 in the pin region 251.

[0013] 4 illustrates another exemplary spin chuck 300 for supporting a substrate having a non-uniform configuration of Bernoulli holes 360 disposed in a first annular region 350 of the spin chuck 300. As indicated by the arrows in FIG. 4, the diameter of the Bernoulli holes 360 in the first annular region 350 gradually increases as the distance between the Bernoulli holes 360 and the alignment pins 330 decreases.

[0014] 5 illustrates another exemplary spin chuck 400 for supporting a substrate having a non-uniform configuration of Bernoulli holes 460 disposed in a first annular region 450 of the spin chuck 400. As indicated by the arrows in FIG. 5, the density of the Bernoulli holes 460 in the first annular region 450 gradually increases as the distance between the Bernoulli holes 460 and the alignment pins 430 decreases.

[0015] As discussed above, whether the diameter or density of the Bernoulli holes in the pin areas is larger than the diameter or density of the Bernoulli holes in the non-pin areas, or whether the diameter or density of the Bernoulli holes gradually increases as one approaches the corresponding locator pin, the goal to be achieved is to increase the airflow supplied to the areas near the locator pins relative to the airflow supplied to other areas, so that the airflow and gas forces act more strongly on the areas near the locator pins, thereby preventing processing liquid from migrating from the top surface to the edge or even the bottom surface of the substrate and forming undesirable pin marks.

[0016] Another example of a substrate support device in the present invention is shown below. As shown in Fig. 6 and Fig. 7, the substrate support device includes a spin chuck 500 having a support surface 510 for supporting a substrate 001, and a plurality of Bernoulli holes 551 provided in a first annular region 550 defined in the support surface 510. The Bernoulli holes 551 of non-uniform configuration are the same as those described above (e.g., Bernoulli holes of non-uniform configuration in the spin chucks (100, 200, 300, 400, etc.)), and will not be repeated here. Similarly, a plurality of positioning pins 530 are arranged around the periphery of the support surface 510, and position the substrate 001 by moving radially inward, and release the substrate 001 by moving radially outward. Each positioning pin 530 is arranged in a corresponding positioning slot 531 in the spin chuck 500, and is configured to connect to a driving device 532 such as a motor or a cylinder for driving the positioning pin 530 to move along the radial direction of the support surface 510.

[0017] 6 and 7 again, the substrate support device of this embodiment further includes a convex ring 570 protruding upward from the periphery of the support surface 510, and a plurality of lifting holes 561 provided in a second annular region 560 defined in the support surface 510. The plurality of lifting holes 561 are uniformly distributed in the second annular region 560. The second annular region 560 is concentric with the first annular region 550 and is located inside the first annular region 550. The lifting holes 561 are used to supply gas to lift the substrate 001 and adjust the height between the substrate 001 and the support surface 510.

[0018] Since the convex ring 570 can be detachably attached to the support surface 510 of the spin chuck 500, by replacing it with a convex ring of an appropriate size, the substrate support device can be adapted to various substrates of different sizes, such as 200 mm, 300 mm, etc. Of course, the convex ring 570 and the spin chuck 500 can also be integrally molded as shown in FIG.

[0019] 8, an upper surface 571 of the convex ring 570 is higher than the support surface 510, thereby forming a recess 580. The support surface 510 functions as the bottom surface of the recess 580. When the substrate 001 is held in the recess 580 of the spin chuck 500, two gaps are formed between the substrate 001 and the spin chuck 500. That is, a first gap 591 is formed between the inner wall 572 of the convex ring 570 and the edge of the substrate 001, and a second gap 592 is formed between the support surface 510 and the lower surface of the substrate 001.

[0020] Typically, the shield 002 is configured to surround the spin chuck 500 to prevent the processing liquid from splashing to the surroundings. As shown in FIG. 1, if a convex ring is not configured around the periphery of the support surface 110, a part of the processing liquid splashed onto the shield 002 may bounce directly onto the support surface 110 and bounce onto the lower surface of the substrate 001 through the gap between the substrate 001 and the support surface 110, resulting in contamination of the lower surface of the substrate 001. Therefore, one of the functions of the convex ring 570 is to change the flow path of the processing liquid splashed onto the shield 002 to prevent the processing liquid from splashing onto the lower surface of the substrate 001. Referring to FIG. 8, after the processing liquid splashes onto the shield 002, it first bounces onto the upper surface 571 of the convex ring 570 and then bounces upward without coming into contact with any surface of the substrate 001, thereby preventing the processing liquid from contaminating the surface of the substrate 001 that is not to be processed.

[0021] 10 shows another exemplary convex ring 670 in the spin chuck 600. The outer edge of the upper surface 671 of the convex ring 670 is chamfered. In other words, the outer edge of the upper surface 671 of the convex ring 670 has a bevel 672 on the radially outer side. After the processing liquid from the shield 002 splashes onto the bevel 672, the processing liquid is splashed back to the shield 002 and discharged.

[0022] Please refer to Figures 7 to 9. Since the inner diameter of the convex ring 570 increases from the bottom to the top of the concave portion 580, the first gap 591 can be changed by adjusting the height between the substrate 001 and the support surface 510. In particular, the inner wall 572 of the convex ring 570 has an arc shape such as a circular arc or an elliptical arc, and is also useful for guiding the gas sprayed from the Bernoulli hole 551 and the lifting hole 561 to the outside of the first gap 591.

[0023] 9, when the substrate 001 rises, the first gap 591 between the edge of the substrate 001 and the inner wall 572 of the convex ring 570 widens, so that the airflow discharged from the annular first gap 591 increases, and the gas protects the entire circumference of the substrate 001 better.

[0024] A method for holding a substrate by the substrate support apparatus in an embodiment will be described below.

[0025] In step 1, a robot holds a substrate above a spin chuck and aligns the center of the substrate with the center of the support surface.

[0026] In step 2, gas at a first pressure is supplied to the lifting hole to lift the substrate to a first position above the support surface, and the robot is moved away. When the substrate is disposed at the first position, the height between the lower surface of the substrate and the support surface does not exceed the height of the recess. The height of the first position can be adjusted by varying the first pressure.

[0027] In step 3, before the gas supplied to the lifting holes is shut off, gas at a second pressure is supplied to the Bernoulli holes to form a cushion under the substrate to lift the substrate. Since the second pressure is lower than the first pressure, the substrate moves slightly downward after switching the gas.

[0028] In step 4, once the substrate is stably positioned at a predetermined height, the positioning pins are driven radially inward to engage with the edge of the substrate to restrict horizontal displacement of the substrate.

[0029] After the above step, at least one nozzle moves above the substrate and sprays the processing liquid onto the surface of the substrate. Meanwhile, during processing, the protective gas always surrounds the entire circumference of the substrate. In particular, the protective gas is stronger near the positioning pins because the diameter or density of the Bernoulli holes is larger than other regions. This can effectively prevent the processing liquid from flowing from the top surface of the substrate to the edge and bottom surface of the substrate.

[0030] The foregoing description of the invention has been presented for purposes of illustration and description. It is not intended to be limiting or exhaustive as a precise disclosure of the invention, and it is understood that many modifications and variations are possible in light of the above teachings. Modifications and variations obvious to those skilled in the art are within the scope of the invention, as defined in the appended claims.

Claims

1. a spin chuck configured to support and rotate a substrate, the spin chuck having a support surface defining a first annular region for supporting the substrate; a plurality of positioning pins disposed on a periphery of a support surface of the spin chuck for limiting horizontal displacement of the substrate; the first annular region is divided into a plurality of pin regions and a plurality of non-pin regions, the plurality of pin regions and the plurality of non-pin regions are alternately arranged in a circumferential direction of the first annular region, and each of the pin regions corresponds to one positioning pin; 1. A substrate support apparatus comprising: a plurality of Bernoulli holes provided in the first annular region; a gas is supplied to the substrate through the plurality of Bernoulli holes, and the substrate is sucked in by the Bernoulli effect; and the plurality of Bernoulli holes have a non-uniform configuration in the first annular region so as to supply a stronger airflow to the plurality of pin regions than to the plurality of non-pin regions.

2. The substrate support apparatus of claim 1, wherein the central angle θ of the pin region is between 5° and 10°.

3. 2. The substrate support apparatus of claim 1, wherein a density or diameter of the Bernoulli holes in the pin regions is greater than a density or diameter of the Bernoulli holes in the non-pin regions.

4. 4. The substrate support apparatus of claim 3, wherein a density or a diameter of the plurality of Bernoulli holes in the pin region gradually increases as a distance between the plurality of Bernoulli holes and the corresponding positioning pin decreases.

5. 2. The substrate support device of claim 1, wherein a diameter or density of the plurality of Bernoulli holes formed in the first annular region gradually increases as a distance between the plurality of Bernoulli holes and the plurality of positioning pins decreases.

6. a convex ring protruding upward from a periphery of a support surface of the spin chuck; a recess for receiving the substrate, the recess being defined by the protruding ring and a support surface of the spin chuck; a second annular region defined on a support surface of the spin chuck and positioned inwardly of the first annular region; 2. The substrate support apparatus of claim 1, further comprising: a plurality of lift holes evenly distributed in the second annular region for adjusting a height between a support surface of the spin chuck and the substrate.

7. 7. The substrate support device according to claim 6, wherein an inner diameter of the convex ring increases from the bottom to the top of the recess.

8. 8. The substrate support device according to claim 7, wherein an inner wall of the convex ring is an arcuate surface.

9. 7. The substrate supporting apparatus according to claim 6, wherein the convex ring and the spin chuck are detachably or integrally fixed to each other.

10. 7. The substrate support apparatus of claim 6, wherein an outer edge of an upper surface of the convex ring is chamfered.

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