Display device manufacturing method, light emitting element and display device

Abstract

This production method includes a step for forming a red sacrificial layer (34R) on a hole transport layer (22), a step for exposing the hole transport layer (22) by removing portions of the red sacrificial layer (34R), a step for forming red light-emitting layer (44R) including red quantum dots (40R) and red ligands (42R) on the red sacrificial layer (34R) and hole transport layer (22), and a step for patterning the red light-emitting layer (44R) by removing the red sacrificial layer (34R) using a red stripping liquid (54R) including red additive ligands (52R).

Description

[Technical field]

[0001] The present invention relates to a manufacturing method for a display device and a display device. [Background technology]

[0002] Quantum dot light emitting diodes (QLEDs) are becoming more popular.

[0003] Cited Document 1 discloses a method of forming a light-emitting layer by applying and curing a coating liquid for forming a light-emitting layer, which contains quantum dots to which a silane coupling agent is disposed, and patterning the light-emitting layer by a lift-off method. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Japanese Patent Publication No. 2009-87760 Summary of the Invention [Problem to be solved by the invention]

[0005] The main object of Patent Document 1 is to provide a method for producing an electroluminescent device having a light-emitting layer containing quantum dots, which light-emitting layer can be stably patterned by a lift-off method, and which has good life characteristics.

[0006] However, in the method disclosed in Patent Document 1, a silane coupling agent is used as a ligand arranged around the quantum dot, making it difficult to inject carriers into the quantum dot. Patent Document 1 also describes the confirmation of light emission at a high voltage of 10 V.

[0007] In addition, the silane coupling agent is difficult to coordinate to the quantum dots, because the silane coupling agent is generally thought to coordinate to the hydroxyl group and the quantum dot surface does not have a hydroxyl group. Here, the surface of the quantum dot is the surface of the shell when the quantum dot is a core-shell type.

[0008] In addition, the method disclosed in Patent Document 1 requires hydrolysis of the silane coupling agent, which raises concerns about damage to the quantum dots and accelerated hardening of the photoresist layer due to high-temperature treatment, which is likely to cause lift-off failure of the light-emitting layer. [Means for solving the problem]

[0009] A manufacturing method for a display device according to one embodiment of the present invention includes the steps of forming a first sacrificial layer on a charge functional layer, removing a portion of the first sacrificial layer to expose the charge functional layer, forming a first light-emitting layer including first quantum dots and a first ligand on the first sacrificial layer and the charge functional layer, and patterning the first light-emitting layer by removing the first sacrificial layer using a first stripping solution including a second ligand. Effect of the Invention

[0010] One embodiment of the present disclosure can provide a display device that has a light-emitting layer containing quantum dots, which is different from that of Patent Document 1, and has good life characteristics. [Brief description of the drawings]

[0011] [Figure 1] 1 is a plan view illustrating an example of a schematic configuration of a display device according to an embodiment of the present disclosure. [Diagram 2] 2 is a cross-sectional view showing an example of a schematic configuration of a display area shown in FIG. [Diagram 3] FIG. 2 is a schematic flow diagram illustrating an example of a method for manufacturing a display device according to an embodiment of the present disclosure. [Figure 4] FIG. 2 is a schematic flow diagram showing an example of a process for forming a light-emitting layer according to an embodiment of the present disclosure. [Diagram 5] 4 is a schematic cross-sectional view illustrating an example of a process for forming a light-emitting layer according to an embodiment of the present disclosure. FIG. [Figure 6] 4 is a schematic cross-sectional view illustrating an example of a process for forming a light-emitting layer according to an embodiment of the present disclosure. FIG. [Figure 7] 4 is a schematic cross-sectional view illustrating an example of a process for forming a light-emitting layer according to an embodiment of the present disclosure. FIG. [Figure 8] 4 is a schematic cross-sectional view illustrating an example of a process for forming a light-emitting layer according to an embodiment of the present disclosure. FIG. [Figure 9] 4 is a schematic cross-sectional view illustrating an example of a process for forming a light-emitting layer according to an embodiment of the present disclosure. FIG. [Figure 10] 4 is a schematic cross-sectional view illustrating an example of a process for forming a light-emitting layer according to an embodiment of the present disclosure. FIG. [Figure 11] 4 is a schematic cross-sectional view illustrating an example of a process for forming a light-emitting layer according to an embodiment of the present disclosure. FIG. [Figure 12] 4 is a schematic cross-sectional view illustrating an example of a process for forming a light-emitting layer according to an embodiment of the present disclosure. FIG. [Figure 13] 4 is a schematic cross-sectional view illustrating an example of a process for forming a light-emitting layer according to an embodiment of the present disclosure. FIG. [Figure 14] 4 is a schematic cross-sectional view illustrating an example of a process for forming a light-emitting layer according to an embodiment of the present disclosure. FIG. [Figure 15] 4 is a schematic cross-sectional view illustrating an example of a process for forming a light-emitting layer according to an embodiment of the present disclosure. FIG. [Figure 16] 2 is a schematic cross-sectional view showing an example of a process for forming the light-emitting layer 24 according to an embodiment of the present disclosure. [Figure 17] FIG. 11 is a graph showing the change over time in fluorescence intensity of display devices according to examples and comparative examples of the present disclosure. [Figure 18] 4 is a schematic cross-sectional view illustrating an example of a process for forming a light-emitting layer according to an embodiment of the present disclosure. FIG. [Figure 19] 1 is a cross-sectional view illustrating an example of a schematic configuration of a display area of ​​a display device according to an embodiment of the present disclosure. [Figure 20] 4 is a schematic flow diagram showing an example of a manufacturing method for the display device 2 according to an embodiment of the present disclosure. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0012] [Embodiment 1] In the following, "same layer" means that it is formed in the same process (film formation process), "lower layer" means that it is formed in an earlier process than the layer being compared, and "upper layer" means that it is formed in a later process than the layer being compared.

[0013] <Display device overview> FIG. 1 is a plan view showing an example of a schematic configuration of a display device 2 according to an embodiment of the present disclosure.

[0014] 1, the display device 2 according to the present disclosure includes a display area DA that performs display by extracting light emitted from each light-emitting element described below, and a frame area NA that surrounds the periphery of the display area DA. In the frame area NA, terminals T are formed to which signals for driving each light-emitting element of the display device 2 are input.

[0015] Fig. 2 is a cross-sectional view showing an example of a schematic configuration of the display area DA shown in Fig. 1. Fig. 2 corresponds to a cross-sectional view taken along line AB in Fig. 1.

[0016] In the display region DA, the display device 2 according to this embodiment includes a plurality of electroluminescent elements. Fig. 2 shows a red light emitting element 6R, a green light emitting element 6G, and a blue light emitting element 6B among the plurality of electroluminescent elements included in the display device 2. Unless otherwise specified in this disclosure, the "light emitting element" refers to any one of the red light emitting element 6R, the green light emitting element 6G, and the blue light emitting element 6B.

[0017] As shown in FIG. 2, the display device 2 includes a substrate 4, a light emitting element layer 6 on the substrate 4, and a sealing layer 8 that covers the light emitting element layer 6.

[0018] <Substrate> The substrate 4 includes a support substrate. The substrate 4 includes a thin film transistor layer (TFT layer) in which circuit elements such as thin film transistors (TFTs) are provided on the support substrate. The substrate 4 may further include additional components such as a barrier layer. The barrier layer reduces the intrusion of moisture, oxygen, and the like into the light emitting element layer 6 from outside the support substrate.

[0019] The support substrate may be a non-flexible substrate made of quartz or glass, or a flexible substrate made of a resin film or a resin sheet. Quartz substrates and glass substrates are preferable because they have high light transmittance and high gas shielding properties. In addition, in terms of light transmittance and gas shielding properties, the material of the resin film is preferably methacrylic resins such as polyethylene methacrylate (PMMA), polyester resins such as polyethylene terephthalate (PET), polyethylene naphthalate (PEN), and polybutylene naphthalate (PBN), and polycarbonate resins.

[0020] <Light emitting element layer> The light emitting element layer 6 is a layer in which light emitting elements are provided.

[0021] The light-emitting element layer 6 according to this embodiment includes an anode 10 (first electrode) on the substrate 4, a cathode 16 (second electrode) facing the anode 10, a bank 12, and an active layer 14 provided between the anode 10 and the cathode 16. The active layer 14 includes, in order from the anode 10 side, a hole injection layer 20 (charge functional layer), a hole transport layer 22 (charge functional layer), a light-emitting layer 24, and an electron transport layer 26. The active layer 14 is also referred to as an electroluminescent layer (EL layer).

[0022] In this disclosure, the direction from the light emitting layer 24 of the light emitting element layer 6 to the substrate 4 is described as the "downward direction" or "down", and the direction from the light emitting layer 24 to the sealing layer 8 is described as the "upward direction" or "up".

[0023] Here, the anode 10 is formed individually for each light-emitting element. The anode 10 is provided in an island shape for each light-emitting element, that is, for each subpixel, and is also called a "pixel electrode." The anode 10 includes an anode 10R for the red light-emitting element 6R, an anode 10G for the green light-emitting element 6G, and an anode 10B for the blue light-emitting element 6B. Meanwhile, the hole injection layer 20, the hole transport layer 22, the electron transport layer 26, and the cathode 16 are each formed in common for a plurality of light-emitting elements. The cathode 16 is also called a "common electrode."

[0024] Bank 12 may be formed individually for each light-emitting element, but is preferably formed integrally with respect to a plurality of light-emitting elements in order to achieve high definition in display device 2. Bank 12 is formed such that at least a portion of bank 12 is adjacent to anode 10 or adjacent but at a distance, or disposed above anode 10 in top view. In the present disclosure, "adjacent" refers to both adjacent and in contact, and "adjacent" refers not only to contact but also to adjacent but at a distance.

[0025] The bank 12 is a protrusion formed on the periphery of the light-emitting element, and is not limited in function. The bank 12 may be formed partially on the periphery of the light-emitting element. The bank 12 may perform any function other than providing unevenness, either in cooperation with other components or alone.

[0026] For example, the banks 12 are preferably formed between adjacent light-emitting elements as partitions that electrically insulate the light-emitting elements. In this case, the banks 12 are insulating, and the light-emitting element layer 6 is divided by the banks 12 into red light-emitting elements 6R, green light-emitting elements 6G, and blue light-emitting elements 6B.

[0027] For example, the bank 12 is preferably formed as an edge cover that covers the edge of the anode 10. Specifically, it is preferable that at least a part of the bank 12 is formed so as to contact the end face of the anode 10 or to be disposed on the end face of the anode 10 when viewed from above. For the sake of simplicity, the following description will be given with illustrations of only the case where a part of the bank 12 is disposed on the anode 10. Those skilled in the art will easily understand the case where a part of the bank 12 is adjacent to or adjacent to the anode 10 based on this description.

[0028] The light-emitting layer 24 includes a red light-emitting layer 24R that emits red light, a green light-emitting layer 24G that emits green light, and a blue light-emitting layer 24B that emits blue light. The light-emitting layer 24 may be formed individually for each light-emitting element, or may be formed in common for multiple light-emitting elements of the same color.

[0029] The light-emitting layer 24 is formed so as to cover at least the corresponding anode 10 exposed from the opening 12A of the bank 12. When the hole transport layer 22 and the electron transport layer 26 come into contact with each other on or near the exposed region of the anode 10, a reactive current that does not contribute to the emission of the light-emitting layer 24 flows through the contact site. For this reason, it is preferable that the light-emitting layer 24 further covers a part of the side surface of the bank 12 (specifically, a part close to the outline of the corresponding opening 12A).

[0030] In the present disclosure, "blue light" refers to light having a central emission wavelength in a wavelength band of, for example, 400 nm or more and 500 nm or less. "Green light" refers to light having a central emission wavelength in a wavelength band of, for example, more than 500 nm and less than 600 nm. "Red light" refers to light having a central emission wavelength in a wavelength band of, for example, more than 600 nm and less than 780 nm.

[0031] The light-emitting element layer 6 according to this embodiment is not limited to the above configuration, and may further include an additional layer between the anode 10 and the cathode 16. For example, the light-emitting element layer 6 may further include an electron injection layer between the electron transport layer 26 and the cathode 16. The light-emitting layer 24 may emit light of two or less colors, or may emit light of four or more colors.

[0032] The anode 10 and the cathode 16 include a conductive material, and at least one of them is a transparent electrode. When the display device 2 has a single-sided display, the electrode of the anode 10 and the cathode 16 closer to the display surface is a transparent electrode, and the electrode farther from the display surface is a reflective electrode. When the display device 2 has a double-sided display, both the anode 10 and the cathode 16 are transparent electrodes. The transparent electrode can be made of a light-transmitting conductive material. The reflective electrode can be made of a light-reflective conductive material, and can be made of a laminate of a light-transmitting conductive material and a light-reflective conductive material.

[0033] The light-transmitting conductive material includes indium tin oxide (ITO), indium zinc oxide (IZO), tin oxide (SnO2), fluorine-doped tin oxide (FTO), etc. These materials have high visible light transmittance, which improves the light-emitting efficiency of the light-emitting device. The light-reflective conductive material can be aluminum (Al), silver (Ag), copper (Cu), gold (Au), or silver alloys such as MgAg. These materials have high visible light reflectance, which improves the light-emitting efficiency of the light-emitting device. By forming the light-reflective conductive material thin, it is possible to use it as a light-transmitting conductive material that has light transmittance. In addition, by forming the light-reflective conductive material into nanowires (NWs) and arranging the NWs in a net shape, it is possible to use it as a light-transmitting conductive material that has light transmittance.

[0034] The anode 10 supplies holes to the light-emitting layer 24, and the cathode 16 supplies electrons to the light-emitting layer 24. The anode 10 is disposed opposite the cathode 16.

[0035] The hole injection layer 20 contains a material having a hole transport property, and has a function of injecting holes from the anode 10 to the hole transport layer 22 or the light emitting layer 24. The hole transport layer 22 contains a material having a hole transport property, and has a function of transporting holes from the hole injection layer 20 or the anode 10 to the light emitting layer 24. It is preferable that at least one of the hole injection layer 20 and the hole transport layer 22 has a function of inhibiting transport of electrons from the light emitting layer 24 to the anode 10.

[0036] The hole transport material can be appropriately selected from materials generally used in this field.

[0037] Examples of organic hole transport materials include poly(styrenesulfonic acid)-doped polyethylenedioxythiophene (PEDOT:PSS), 4,4',4''-tris(9-carbazoyl)triphenylamine (TCTA), 4,4'-bis[N-(1-naphthyl)-N-phenyl-amino]-biphenyl (NPB), zinc phthalocyanine (ZnPC), di[4-(N,N-ditolylamino)phenyl]cyclohexane (TAPC), 4,4'-bis(carbazole) Examples of materials that can be used include 2,3,6,7,10,11-hexacyano-1,4,5,8,9,12-hexaazatriphenylene (HATCN), poly(N-vinylcarbazole) (PVK), poly(2,7-(9,9-di-n-octylfluorene))-(1,4-phenylene-(4-sec-butylphenyl)imino)-1,4-phenylene (TFB), and poly(triphenylamine) derivatives (Poly-TPD).

[0038] Examples of inorganic hole transport materials include materials containing one or more selected from the group consisting of metal compounds containing at least one of Zn, Cr, Ni, Ti, Nb, Al, Si, Mg, Ta, Hf, Zr, Y, La, Sr, and W, and containing at least one of oxygen atoms, hydroxyl groups, carbon atoms, and nitrogen atoms. Among them, inorganic hole transport materials are preferably oxides containing at least one of Zn, Cr, Ni, Ti, Nb, Al, Si, Mg, Ta, Hf, Zr, Y, La, and Sr. In addition, suitable inorganic hole transport materials include materials such as CuSCN in which a CN group, an SCN group, and a SeCN group are bonded to a metal. These inorganic hole transport materials may be nanoparticles (NPs).

[0039] In the present disclosure, other metal oxides similarly include not only the individual metal oxides but also mixtures thereof that are commercially produced and / or used.

[0040] In the present disclosure, "nanoparticles" refers to particles having a maximum width of the nano-order (less than 1000 nm). The shape of the nanoparticles is not particularly limited as long as it satisfies the above maximum width, and is not limited to a spherical three-dimensional shape (circular cross-sectional shape). For example, it may be a polygonal cross-sectional shape, a rod-shaped three-dimensional shape, a branch-shaped three-dimensional shape, a three-dimensional shape with unevenness on the surface, or a combination thereof.

[0041] Inorganic materials have higher chemical stability than organic materials, and can contribute to the long life and improved reliability of products such as light-emitting elements or displays that include light-emitting elements. For this reason, the hole injection layer 20 and the hole transport layer 22 preferably contain an inorganic hole transport material. Furthermore, the inorganic hole transport material is preferably a metal oxide, in which case it has higher chemical stability. In this way, the fact that inorganic materials are preferable and metal oxides are more preferable is common to all elements, materials, or layers that constitute the active layer 14. In addition, it is preferable that the inorganic material or metal oxide is nanoparticle-shaped. This is because the surface area is increased in the nanoparticle state compared to the bulk or evaporated film state, and the electrochemical activity that depends on the surface area is improved.

[0042] The hole injection layer 20 preferably contains nickel oxide as a hole transport material. This is because nickel oxide has high alkali resistance. Therefore, when an alkaline developer is used for patterning the light emitting layer 24, deterioration of the hole injection layer 20 can be reduced.

[0043] In the present disclosure, "nickel oxide" refers to a compound containing nickel and oxygen. That is, nickel oxide is, for example, Ni 2 O 3 Elemental, NiO elemental and Ni 2 Not only O alone, but also Ni with different valences 2 O 3 ,NiO,Ni 2 O, Ni 2 O 3 , NiO and Ni 2 Mixtures containing nickel compounds other than oxides in addition to one or more of O, or Ni 2 O 3 , NiO and Ni 2 In addition to one or more of O, the term "nickel oxide" as used herein also includes mixtures that contain metal compounds other than nickel compounds. In the present disclosure, "nickel oxide" includes mixtures that are industrially produced and / or used as nickel oxide.

[0044] When the hole transport material used in the hole injection layer 20 is a metal oxide, it is preferable to provide a monomolecular film on the surface of the hole injection layer 20 (i.e., between the hole injection layer 20 and the hole transport layer 22). The monomolecular film may contain only one type of molecule, or may contain two or more types of molecules. The monomolecular film is preferably a self-assembled monolayer (SAM).

[0045] The self-organizing molecules are R-SH, RS-SR', R-RSCN, R-SeH, R-TeH, RSe-SeR', R-NC, R-NCO, and R-SiH, where R and R' are the functional groups of the molecules. 3 ,R-Si(CH 3 )2 H,R-Si(CH 3 ) 3 ,R-COOH,dye-COOH,R-PO 3 H 2 ,RO-PO 3 H 2 ,R-SiX 2 [X=Cl,OCH 3 ,OC 2 H 5 ],R-NH 2 ,R-OH,[RC(O)O] 2 ,R-CH=CH 2 ,RC≡CH,R-MgBr 2 ,R-Li,Ar-N 2 + X - [X=Cl,OCH 3 ,OC 2 H 5 ] and R-BrR-CH=CH 2 The molecule may include at least one molecule selected from the following:

[0046] Here, H represents hydrogen, S represents sulfur, C represents carbon, N represents nitrogen, Si represents silicon, Cl represents chlorine, Se represents selenium, Te represents tellurium, Mg represents magnesium, Br represents bromine, Li represents lithium, Ar represents an aryl group, and X represents Cl, OCH 3 , and O.C. 2 H 5 Indicates either:

[0047] As the self-organizing molecule, 2PACz, MeO-2PACz, and FOPA are particularly preferred.

[0048] The electron transport layer 26 contains a material having electron transport properties, and functions to transport electrons from the cathode 16 to the light-emitting layer 24. The electron transport layer 26 preferably has a function of inhibiting the transport of holes from the light-emitting layer 24 to the cathode 16.

[0049] Examples of organic electron transport materials suitable for the electron transport layer 26 include compounds and complexes containing one or more nitrogen-containing heterocycles such as oxadiazole rings, triazole rings, triazine rings, quinoline rings, phenanthroline rings, pyrimidine rings, pyridine rings, imidazole rings, carbazole rings, etc. Specific examples include 1,10-phenanthroline derivatives such as bathocuproine and bathophenanthroline, benzimidazole derivatives such as 1,3,5-tris(N-phenylbenzimidazol-2-yl)benzene (TPBI), metal complexes such as tris(8-quinolinolato)aluminum complex (Alq3), bis(10-benzoquinolinolato)beryllium complex, 8-hydroxyquinoline Al complex, and bis(2-methyl-8-quinolinato)-4-phenylphenolate aluminum, and 4,4'-biscarbazole biphenyl. Other examples include aromatic boron compounds, aromatic silane compounds, aromatic phosphine compounds such as phenyldi(1-pyrenyl)phosphine, and nitrogen-containing heterocyclic compounds such as bathophenanthroline, bathocuproine, 2,2',2''-(1,3,5-benzenetriyl)-tris(1-phenyl-1-H-benzimidazole) (TPBI), and triazine derivatives.

[0050] Additionally, examples of organic electron transport materials suitable for the electron transport layer 26 include compounds having a paraphenylenevinylene skeleton. Specific examples include polyparaphenylenevinylene (PPV)-based compounds such as poly(2-2'-ethyl-hexoxy)-5-methoxy-1,4-phenylenevinylene (POPh-PPV).

[0051] In addition, examples of inorganic electron transport materials suitable for the electron transport layer 26 include oxides containing one or more of Zn, Ni, Cr, Mg, Li, Ti, W, Mo, In, and Ga. Among them, oxides that tend to have a deviation toward the oxygen deficiency side based on the stoichiometric composition are preferable. Examples include zinc oxide (ZnO), zinc magnesium oxide (MgZnO), titanium oxide (TiO2), and strontium oxide (SrTiO3). These materials may be nanoparticles.

[0052] As described above, inorganic materials have higher chemical stability than organic materials, and can improve the reliability of products. For this reason, the electron transport layer 26 preferably contains an inorganic electron transport material. Furthermore, the inorganic electron transport material is preferably a metal oxide, which provides higher chemical stability. Moreover, zinc oxide-based materials are most preferable. In addition, it is preferable that the inorganic material or metal oxide is nanoparticle-formed.

[0053] The transparent electrode, the hole injection layer 20, the hole transport layer 22, and the electron transport layer 26 transmit light in the wavelength band used for displaying in the display device 2.

[0054] The light-emitting layer 24 is a layer that emits light when a light emitter is excited by recombination of holes from the anode 10 and electrons from the cathode 16, and the excited light emitter returns to the ground state. Recombination occurs in the light-emitting layer 24 by applying a voltage or current between the anode 10 and the cathode 16, and light is emitted. The light-emitting layer 24 contains quantum dots as light emitters and ligands that coordinate to the quantum dots.

[0055] In this disclosure, "ligand" refers to a molecule or ion that can bind to a quantum dot. More specifically, "ligand" includes molecules or ions that are currently bound to a quantum dot, as well as molecules or ions that can bind to a quantum dot but are not bound to the quantum dot.

[0056] The quantum dot means a dot having a maximum width of 100 nm or less. The shape of the quantum dot may be within a range that satisfies the above maximum width, and is not particularly limited, and is not limited to a spherical three-dimensional shape (circular cross-sectional shape). For example, it may be a polygonal cross-sectional shape, a rod-like three-dimensional shape, a branch-like three-dimensional shape, a three-dimensional shape having an uneven surface, or a combination thereof. In this embodiment, the quantum dot is, for example, a semiconductor fine particle having a particle size of 100 nm or less, and may have a crystal of a II-VI group semiconductor compound such as MgS, MgSe, MgTe, CaS, CaSe, CaTe, SrS, SrSe, SrTe, BaS, BaSe, BaTe, ZnS, ZnSe, ZnTe, CdS, CdSe, CdTe, HgS, HgSe, HgTe, and / or a crystal of a III-V group semiconductor compound such as GaAs, GaP, InN, InAs, InP, InSb, and / or a crystal of a IV group semiconductor compound such as Si or Ge. The quantum dot may have a core / shell structure in which the semiconductor crystal is used as a core and the core is overcoated with a shell material having a large band gap. The shell does not necessarily have to completely cover the core, and may be formed on at least a part of the core.

[0057] The ligand can be appropriately selected from materials commonly used in the relevant field.

[0058] Examples of organic ligands include alkylthiols, alkylamines, alkylcarboxylic acids, alkyl phosphorous, etc. Examples of inorganic ligands include halide ions such as fluoride, chloride, bromide, and iodide.

[0059] When the bank 12 is insulating, the bank 12 may include an insulating material. The bank 12 may include, for example, polyimide resins, acrylic resins, novolac resins, fluorene resins, etc. The bank 12 may be formed by patterning a photosensitive resin material using, for example, a photolithography technique. The photosensitive resin may be either negative or positive.

[0060] The sealing layer 8 covers the light-emitting element layer 6 and seals each light-emitting element included in the display device 2. The sealing layer 8 reduces the penetration of moisture, oxygen, and the like from the outside of the sealing layer 8 side of the display device 2 into the light-emitting element layer 6 and the like. The sealing layer 8 may have a laminated structure of, for example, an inorganic sealing film made of an inorganic material and an organic sealing film made of an organic material. The inorganic sealing film is formed, for example, by CVD, and is composed of a silicon oxide film, a silicon nitride film, a silicon oxynitride film, or a laminated film thereof. The organic sealing film is composed, for example, of a coatable resin material including polyimide or the like.

[0061] <Display Device Manufacturing Method> FIG. 3 is a schematic flow diagram showing an example of a method for manufacturing the display device 2 according to this embodiment.

[0062] In the manufacturing method of the display device 2 according to this embodiment, first, the substrate 4 is formed (step S2). The substrate 4 may be formed, for example, by forming a film substrate and a TFT on the film substrate on a rigid glass substrate, and then peeling the glass substrate from the film substrate. The above-mentioned peeling of the glass substrate may be performed after forming the light emitting element layer 6 and the sealing layer 8 described later. Alternatively, the substrate 4 may be formed, for example, by forming a TFT directly on a rigid glass substrate.

[0063] Next, the anode 10 is formed on the substrate 4 (step S4). The anode 10 may be formed, for example, by forming a thin film of a metal material by a sputtering method, a vacuum deposition method, or the like, and then patterning the thin film by dry etching or wet etching using a photoresist. As a result, the anode 10R, the anode 10G, and the anode 10B are formed in an island shape for each subpixel on the substrate 4.

[0064] Next, the bank 12 is formed (step S6). In step S6, the bank 12 is formed by photolithography of a positive photosensitive resin. Specifically, for example, a positive photosensitive resin, which is the material of the bank 12, is applied to the upper surface of the substrate 4 and the anode 10. Next, a photomask having a light-transmitting portion is placed above the applied photosensitive resin at positions corresponding to each subpixel, and ultraviolet light or the like is irradiated through the photomask. Next, the photosensitive resin irradiated with ultraviolet light is washed with an appropriate developer. As a result, the bank 12 is formed between the positions corresponding to each subpixel on the substrate 4.

[0065] Next, the hole injection layer 20 is formed (step S8). In forming the hole injection layer 20, for example, a hole transporting material is dissolved in a solvent to obtain a material solution, and the material solution is applied and solidified on the anode 10 and the bank 12. The hole injection layer 20 may be formed by other methods such as a vacuum deposition method or a sputtering method.

[0066] Next, the hole transport layer 22 is formed (step S10). In forming the hole transport layer 22, for example, a hole transport material is dissolved in a solvent to obtain a material solution, and the material solution is applied and solidified on the hole injection layer 20. The hole transport layer 22 may be formed by other methods such as a vacuum deposition method or a sputtering method.

[0067] Next, the light-emitting layer 24 is formed (step S12). The formation of the light-emitting layer 24 will be described in detail later.

[0068] Next, the electron transport layer 26 is formed (step S14). For example, the electron transport layer 26 is formed by dissolving an electron transporting material in a solvent to obtain a material solution, and applying and solidifying the material solution on the light-emitting layer 24 and the hole transport layer 22. The electron transport layer 26 may be formed by other methods such as a vacuum deposition method or a sputtering method.

[0069] Next, the cathode 16 is formed (step S16). The cathode 16 may be formed by, for example, forming a thin film of a metal material commonly to each sub-pixel by vacuum deposition or sputtering, etc. In this way, the formation of the light emitting element layer 6 is completed.

[0070] Next, the sealing layer 8 is formed (step S18). When the sealing layer 8 includes an organic sealing film, the organic sealing film may be formed by applying an organic sealing material. When the sealing layer 8 includes an inorganic sealing film, the inorganic sealing film may be formed by a CVD method or the like. In this way, the sealing layer 8 that seals the light emitting element layer 6 is formed.

[0071] Then, as necessary, the glass substrate is peeled off, a functional film is attached, and the like, thereby completing the manufacture of the display device 2. The functional film includes, for example, a polarizing plate film, a sensor film having a touch sensor panel function, a protective film, and an anti-reflection film.

[0072] <Formation of the light-emitting layer> FIG. 4 is a schematic flow diagram showing an example of the process (step S12) of forming the light-emitting layer 24 according to this embodiment.

[0073] 5 to 15 are schematic cross-sectional views showing an example of the step (step S12) of forming the light-emitting layer 24 according to this embodiment.

[0074] For simplicity of explanation, hereinafter, only the case where the red light-emitting layer 24R (first light-emitting layer), the green light-emitting layer 24G (second light-emitting layer), and the blue light-emitting layer 24B (third light-emitting layer) are formed in this order, separately from each other, by the lift-off method will be illustrated and explained.

[0075] Those skilled in the art will easily understand other cases based on the following explanation.

[0076] (Formation of red light emitting layer) 4 and 5, in step S12, first, a red protective layer 30R (protective layer) is formed on the hole transport layer 22 (step S22), and a red photoresist layer 32R (resist layer) is formed on the red protective layer 30R (step S24). As a result of steps S22 and S24, a red sacrificial layer 34R (first sacrificial layer) including the red protective layer 30R and the red photoresist layer 32R is formed.

[0077] Examples of the material for the red protective layer 30R include acrylic resin, polyvinylpyrrolidone (PVP) resin, polyvinyl alcohol (PVA) resin, polyethylene oxide (PEO) resin, etc. Examples of the material for the red photoresist layer 32R include photosensitive acrylic resin, photosensitive novolac resin, etc.

[0078] When the material of the red photoresist layer 32R comes into contact with the hole transport layer 22, it deteriorates the hole transport layer 22. For this reason, in order to prevent the red photoresist layer 32R from coming into contact with the hole transport layer 22, a red protective layer 30R is provided to cover the hole transport layer 22.

[0079] 4 and 6, the red photoresist layer 32R is then patterned using a photolithography technique to remove a portion of the red photoresist layer 32R (step S26). Specifically, at least a portion of the red photoresist layer 32R corresponding to the anode 10R of the red light emitting element 6R is removed. In step S26, the red photoresist layer 32R is exposed to light using a photomask and developed using a developer.

[0080] Next, the red protective layer 30R is patterned by etching using the red photoresist layer 32R as a protective mask so as to remove a portion of the red photoresist layer 32R (step S28). Specifically, at least the portion of the red photoresist layer 32R corresponding to the anode 10R of the red light emitting element 6R is removed. The etching in step S28 may be wet etching or dry etching. In order to reduce the cost and number of steps required for manufacturing, the etching in step S28 is preferably wet etching using the developer in step S26.

[0081] As a result of steps S26 and S28, a portion of the red sacrificial layer 34R is removed, exposing the hole transport layer 22 corresponding to the anode 10R of the red light emitting element 6R. Specifically, at least the portion of the red photoresist layer 32R corresponding to the anode 10R is removed.

[0082] Next, a red light-emitting layer 44R (first light-emitting layer) is formed on the red photoresist layer 32R and the hole transport layer 22 (step S30). The red light-emitting layer 44R includes red quantum dots 40R (first quantum dots) that emit red light and red ligands 42R (first ligands) that coordinate to the red quantum dots 40R.

[0083] The red quantum dots 40R deteriorate when they come into contact with the material of the red photoresist layer 32R. The portion of the red light-emitting layer 44R that remains as the red light-emitting layer 24R after patterning is formed on the hole transport layer 22, and the portion of the red light-emitting layer 44R that is removed by patterning is formed on the red photoresist layer 32R. In this way, the red quantum dots 40R included in the patterned red light-emitting layer 24R do not come into contact with the red photoresist layer 32R.

[0084] The red ligand 42R covers the surface of the red quantum dot 40R to protect the surface of the red quantum dot 40R.

[0085] Next, the red sacrificial layer 34R is removed using a red remover liquid 54R (first remover liquid) according to the present embodiment, thereby patterning the red light-emitting layer 44R (step S32).

[0086] As shown in Fig. 4 and Fig. 7, in step S32, first, the red stripping solution 54R according to this embodiment is supplied to the red light-emitting layer 44R (step S320). In step S320, for example, the red stripping solution 54R is applied or dropped onto the red light-emitting layer 44R. The red stripping solution 54R according to this embodiment is a solution in which a red additive ligand 52R (second ligand) different from the red ligand 42R is added to the conventional stripping solution 50R. It is preferable that the red additive ligand 52R is capable of coordinating with the red quantum dots 40R.

[0087] The conventional stripping solution 50R is a solution that can permeate the red light-emitting layer 44R and dissolve the red sacrificial layer 34R. The conventional stripping solution 50R is, for example, an organic solvent containing acetone, PGMEA, PGME, DMSO, etc. Therefore, the red stripping solution 54R according to this embodiment can also permeate the red light-emitting layer 44R and dissolve the red sacrificial layer 34R.

[0088] Here, if only the conventional stripping solution 50R is supplied to the red light-emitting layer 44R, the red ligand 42R is likely to dissolve from the red light-emitting layer 44R into the conventional stripping solution 50R. This is because the concentration of the red ligand 42R in the red light-emitting layer 44R is greater than the concentration of the red ligand 42R in the conventional stripping solution 50R. The concentration of the red ligand 42R in the conventional stripping solution 50R is 0 or almost 0. Then, the red ligand 42R in the red light-emitting layer 44R decreases, and the surface of the red quantum dots 40R is exposed. In particular, since the red ligand 42R dissolves from the upper surface 48R and side surfaces of the red light-emitting layer 44R, the upper surface 48R and side surfaces of the red light-emitting layer 44R and the surfaces of the red quantum dots 40R located in the vicinity thereof are exposed.

[0089] On the other hand, when the red stripping solution 54R according to this embodiment is supplied to the red light-emitting layer 44R, the red added ligand 52R in the red stripping solution 54R reduces the elution of the red ligand 42R. Therefore, the surface of the red quantum dot 40R is covered with the red ligand 42R and sufficiently protected. Conversely, the red added ligand 52R according to this embodiment is selected so as to reduce the elution of the red ligand 42R from the red light-emitting layer 44R into the red stripping solution 54R.

[0090] For example, when the red ligand 42R is an organic molecule or an organic ion having a coordinating functional group capable of coordinating with the red quantum dot 40R, the red additive ligand 52R is selected from the group consisting of organic molecules or organic ions having the same coordinating functional group as the red quantum dot 40R. The coordinating functional group is, for example, a hydroxyl group, an aldehyde group, a carboxyl group, a carbonyl group, an ether group, an amino group, a thiol group, or a phosphine group.

[0091] For example, if the red ligand 42R is an inorganic ion containing a halogen element, the red doping ligand 52R is selected from an inorganic ion containing another halogen element, including fluorine (F), chlorine (Cl), bromine (Br), and iodine (I).

[0092] For example, if the red ligand 42R is an inorganic ion containing a chalcogen element, the red doping ligand 52R is selected from an inorganic ion containing another chalcogen element, including oxygen (O), sulfur (S), selenium (Se), tellurium (Te), and polonium (Po).

[0093] In addition, if the red additive ligand 52R can coordinate to the red quantum dot 40R, the red additive ligand 52R can bind to the surface of the red quantum dot 40R instead of the red ligand 42R, so that the surface of the red quantum dot 40R is covered by the red ligand 42R and / or the red additive ligand 52R and is more fully protected.

[0094] 4 and 8, next, a wait is performed so that the red stripping solution 54R permeates the red light-emitting layer 44R and dissolves the red sacrificial layer 34R (step S322). In step S322, for example, a wait time of 30 seconds or more is preferable so that the red stripping solution 54R permeates sufficiently. In step S322, for example, a wait time of 300 seconds or less is preferable so as to prevent the red stripping solution 54R from adversely affecting any one or more of the red light-emitting layer 24R, the hole transport layer 22, and the hole injection layer 20.

[0095] In step S322, the red remover 54R dissolves the red sacrificial layer 34R. As a result, the portion of the red light-emitting layer 44R formed on the red sacrificial layer 34R is peeled off. Then, the portion of the red light-emitting layer 44R formed on the hole transport layer 22 remains as the red light-emitting layer 24R. Meanwhile, the dissolved material of the red sacrificial layer 34R and the peeled material of the red light-emitting layer 44R are liberated in the red remover 54R. The dissolved material of the red sacrificial layer 34R includes the material 31R of the red protective layer 30R and the material 33R of the red photoresist layer 32R.

[0096] If only the conventional stripping solution 50R is supplied to the red light-emitting layer 44R, the surface of the red quantum dots 40R is exposed as described above, so that the material 33R of the red photoresist layer 32R is likely to come into contact with the red quantum dots 40R, and the red quantum dots 40R included in the red light-emitting layer 24R are likely to deteriorate.

[0097] On the other hand, when the red stripping solution 54R according to this embodiment is supplied to the red light-emitting layer 44R, as described above, the surface of the red quantum dots 40R is covered with the red ligand 42R and / or the red-added ligand 52R. Therefore, the material 33R of the red photoresist layer 32R is unlikely to come into contact with the red quantum dots 40R, and the red quantum dots 40R are unlikely to deteriorate.

[0098] 4 and 9, the red remover 54R is then removed (step S324). Together with the red remover 54R, the dissolved material of the red sacrificial layer 34R and the peeled material of the red light-emitting layer 44R are removed.

[0099] As described above, the red light-emitting layer 44R is patterned to form a patterned red light-emitting layer 24R (first light-emitting layer) on the hole transport layer 22. The patterned red light-emitting layer 24R includes red quantum dots 40R and red ligands 42R. In addition, when the red additive ligand 52R is a ligand capable of coordinating with the red quantum dots 40R, the patterned red light-emitting layer 24R may further include a red additive ligand 52R.

[0100] In step S32, the red ligand 42R moves from the surface of the red light-emitting layer 44R or the red light-emitting layer 24R to the red stripping solution 54R. Therefore, when the distribution of the red ligand 42R in the red light-emitting layer 24R is uneven, the concentration of the red ligand 42R is higher at the lower surface 46R (interface on the first electrode side) of the red light-emitting layer 24R and its vicinity than at the upper surface 48R (interface on the second electrode side) of the red light-emitting layer 24R and its vicinity. On the other hand, the red additive ligand 52R penetrates into the red light-emitting layer 44R or the red light-emitting layer 24R from the surface of the red light-emitting layer 44R or the red light-emitting layer 24R in step S32. Therefore, when the distribution of the red additive ligand 52R in the red light-emitting layer 24R is uneven, the concentration of the red additive ligand 52R is lower at the lower surface 46R of the red light-emitting layer 24R and its vicinity than at the upper surface 48R of the red light-emitting layer 24R and its vicinity.

[0101] 4, following step S32, it is determined whether or not the formation of the entire light-emitting layer 24 is complete (step S34). Since it is not complete (No), a series of steps including steps S22 to S34 are repeated.

[0102] (Formation of green light-emitting layer) 4 and 10, following step S34, a green protective layer 30G is formed on the red light-emitting layer 24R and the hole transport layer 22 (step S22), and a green photoresist layer 32G is formed on the green protective layer 30G (step S24). As a result of steps S22 and S24, a green sacrificial layer 34G (second sacrificial layer) including the green protective layer 30G and the green photoresist layer 32G is formed. The green sacrificial layer 34G includes an overlapping region 36G (first region) that overlaps with the red light-emitting layer 24R, and a non-overlapping region 38G (second region) that does not overlap with the red light-emitting layer 24R.

[0103] Examples of the material of the green protective layer 30G include acrylic resin, polyvinylpyrrolidone (PVP) resin, polyvinyl alcohol (PVA) resin, and polyethylene oxide (PEO) resin. The material of the green protective layer 30G may be the same as or different from the material of the red protective layer 30R. Examples of the material of the green photoresist layer 32G include photosensitive acrylic resin and photosensitive novolac resin. The material of the green photoresist layer 32G may be the same as or different from the material of the red photoresist layer 32R.

[0104] When the material of the green photoresist layer 32G comes into contact with the red quantum dots 40R and / or the hole transport layer 22, it deteriorates the red quantum dots 40R and / or the hole transport layer 22. For this reason, in order to prevent the green photoresist layer 32G from coming into contact with the red quantum dots 40R and the hole transport layer 22, a green protective layer 30G is provided to cover the red light-emitting layer 24R and the hole transport layer 22.

[0105] Next, the green photoresist layer 32G is patterned using a photolithography technique so as to remove at least a portion of the green photoresist layer 32G (step S26). Specifically, at least a portion of the green photoresist layer 32G corresponding to the anode 10G of the green light emitting element 6G is removed. In step S26, the green photoresist layer 32G is exposed using a photomask and developed using a developer.

[0106] Next, the green protective layer 30G is patterned by etching using the green photoresist layer 32G as a protective mask to remove at least a portion of the green photoresist layer 32G (step S28). Specifically, at least a portion of the green photoresist layer 32G corresponding to the anode 10G of the green light emitting element 6G is removed. The etching in step S28 may be wet etching or dry etching. In order to reduce the cost and number of steps required for manufacturing, the etching in step S28 is preferably wet etching using the developer of step S26.

[0107] As a result of steps S26 and S28, at least a portion of the non-overlapping region 38G of the green sacrificial layer 34G is removed, exposing the hole transport layer 22 corresponding to the anode 10G of the green light emitting element 6G. Specifically, at least the portion of the non-overlapping region 38G of the green sacrificial layer 34G corresponding to the anode 10G of the green light emitting element 6G is removed.

[0108] Next, a green light-emitting layer 44G (second light-emitting layer) is formed on the green photoresist layer 32G and the hole transport layer 22 (Step S30). The green light-emitting layer 44G includes green quantum dots 40G (second quantum dots) that emit green light and green ligands 42G that coordinate to the green quantum dots 40G.

[0109] The green quantum dots 40G deteriorate when they come into contact with the material of the green photoresist layer 32G. The portion of the green light-emitting layer 44G that remains as the green light-emitting layer 24G after patterning is formed on the hole transport layer 22, and the portion of the green light-emitting layer 44G that is removed by patterning is formed on the green photoresist layer 32G. In this way, the green quantum dots 40G included in the patterned green light-emitting layer 24G do not come into contact with the green photoresist layer 32G.

[0110] The green ligand 42G covers the surface of the green quantum dot 40G to protect the surface of the green quantum dot 40G.

[0111] Next, the green sacrificial layer 34G is removed using a green stripping solution 54G (second stripping solution) according to the present embodiment, thereby patterning the green light-emitting layer 44G (step S32).

[0112] In step S32, first, the green stripping solution 54G according to this embodiment is supplied to the green light-emitting layer 44G (step S320). In step S320, for example, the green stripping solution 54G is applied or dropped onto the green light-emitting layer 44G. The green stripping solution 54G according to this embodiment is a solution obtained by adding a green additive ligand 52G (third ligand) different from the green ligand 42G to a conventional stripping solution 50G. The green additive ligand 52G is preferably a ligand capable of coordinating with the green quantum dots 40G. Additionally or alternatively, the green additive ligand 52G may be a ligand capable of coordinating with the red quantum dots 40R.

[0113] The conventional stripping solution 50G is a solution that can permeate the green light-emitting layer 44G and dissolve the green sacrificial layer 34G. The conventional stripping solution 50G is, for example, an organic solvent including acetone, PGMEA, PGME, DMSO, etc. The conventional stripping solution 50G may be the same as or different from the conventional stripping solution 50R. Therefore, the green stripping solution 54G according to this embodiment can also permeate the green light-emitting layer 44G and dissolve the green sacrificial layer 34G.

[0114] Here, if only the conventional stripping solution 50G is supplied to the green light-emitting layer 44G, the green ligand 42G is likely to dissolve from the green light-emitting layer 44G into the conventional stripping solution 50G. This is because the concentration of the green ligand 42G in the green light-emitting layer 44G is greater than the concentration of the green ligand 42G in the conventional stripping solution 50G. The concentration of the green ligand 42G in the conventional stripping solution 50G is 0 or almost 0. The green ligand 42G in the green light-emitting layer 44G is reduced, and the surface of the green quantum dots 40G is exposed. In particular, the green ligand 42G dissolves from the top surface 48G and side surfaces of the green light-emitting layer 44G, and the surfaces of the green quantum dots 40G located in the vicinity thereof are exposed.

[0115] On the other hand, when the green stripping solution 54G according to this embodiment is supplied to the green light-emitting layer 44G, the green additive ligand 52G in the green stripping solution 54G reduces the elution of the green ligand 42G. Therefore, the surface of the green quantum dot 40G is covered by the green ligand 42G and is sufficiently protected. In other words, the green additive ligand 52G according to this embodiment is selected to reduce the elution of the green ligand 42G from the green light-emitting layer 44G to the green stripping solution 54G. In addition, if the green additive ligand 52G can be coordinated to the green quantum dot 40G, the green additive ligand 52G can bind to the surface of the green quantum dot 40G instead of the green ligand 42G. Therefore, the surface of the green quantum dot 40G is covered by the green ligand 42G and / or the green additive ligand 52G and is more sufficiently protected.

[0116] 4 and 11, next, a wait is performed so that the green stripping solution 54G permeates the green light-emitting layer 44G and dissolves the green sacrificial layer 34G (step S322). For example, in step S322, a wait time of 30 seconds or more is preferable so that the green stripping solution 54G permeates sufficiently. For example, in step S322, a wait time of 300 seconds or less is preferable to prevent the green stripping solution 54G from adversely affecting any one or more of the red light-emitting layer 24R, the green light-emitting layer 24G, the hole transport layer 22, and the hole injection layer 20.

[0117] In step S322, the green stripping liquid 54G dissolves the green sacrificial layer 34G. As a result, the portion of the green light-emitting layer 44G formed on the green sacrificial layer 34G is stripped. Then, the dissolved material of the green sacrificial layer 34G and the stripped material of the green light-emitting layer 44G are liberated in the green stripping liquid 54G. The dissolved material of the green sacrificial layer 34G includes the material 31G of the green protective layer 30G and the material 33G of the green photoresist layer 32G.

[0118] If only the conventional stripping solution 50G is supplied to the green light-emitting layer 44G, the surface of the green quantum dots 40G is exposed as described above, and therefore the material 33G of the green photoresist layer 32G is likely to come into contact with the green quantum dots 40G, and the green quantum dots 40G contained in the green light-emitting layer 44G are likely to deteriorate.

[0119] On the other hand, when the green stripping solution 54G according to the present embodiment is supplied to the green light-emitting layer 44G, as described above, the surface of the green quantum dots 40G is covered with the green ligands 42G and / or the green additive ligands 52G, so that the material 33G of the green photoresist layer 32G is unlikely to come into contact with the green quantum dots 40G, and the green quantum dots 40G are unlikely to deteriorate.

[0120] 4 and 12, the green stripping liquid 54G is then removed (step S324). Together with the green stripping liquid 54G, the dissolved material of the green sacrificial layer 34G and the stripped material of the green light-emitting layer 44G are removed.

[0121] As described above, the green light-emitting layer 44G is patterned to form a patterned green light-emitting layer 24G on the hole transport layer 22. The patterned green light-emitting layer 24G includes green quantum dots 40G and green ligands 42G. In addition, when the green additive ligands 52G are ligands capable of coordinating with the green quantum dots 40G, the patterned green light-emitting layer 24G may further include green additive ligands 52G.

[0122] In step S32, the green ligand 42G moves from the surface of the green light-emitting layer 44G or the green light-emitting layer 24G to the green stripping solution 54G. Therefore, if the distribution of the green ligand 42G in the green light-emitting layer 24G is uneven, the concentration of the green ligand 42G at and near the lower surface 46G of the green light-emitting layer 24G is greater than the concentration at and near the upper surface 48G of the green light-emitting layer 24G. On the other hand, the green additive ligand 52G penetrates into the green light-emitting layer 44G or the green light-emitting layer 24G from the surface of the green light-emitting layer 44G or the green light-emitting layer 24G in step S32. Therefore, if the distribution of the green additive ligand 52G in the green light-emitting layer 24G is uneven, the concentration of the green additive ligand 52G at and near the lower surface 46G of the green light-emitting layer 24G is smaller than the concentration at and near the upper surface 48G of the green light-emitting layer 24G.

[0123] In addition, when the green additive ligand 52G is a ligand capable of coordinating with the red quantum dot 40R, the red light-emitting layer 24R after removing the green sacrificial layer 34G may further include the green additive ligand 52G. In step S32, the green additive ligand 52G penetrates into the red light-emitting layer 24R from the surface of the red light-emitting layer 24R. Therefore, when the distribution of the green additive ligand 52G in the red light-emitting layer 24R is uneven, the concentration of the green additive ligand 52G at and near the lower surface 46R of the red light-emitting layer 24R is smaller than the concentration at and near the upper surface 48R of the red light-emitting layer 24R.

[0124] 4, following step S32, it is determined whether or not the formation of the entire light-emitting layer 24 is complete (step S34). Since it is not complete (No), a series of steps including steps S22 to S34 are repeated.

[0125] (Formation of blue light-emitting layer) As shown in Fig. 4 and Fig. 13, following step S34, a blue protective layer 30B is formed on the green light-emitting layer 24G, the red light-emitting layer 24R, and the hole transport layer 22 (step S22), and a blue photoresist layer 32B is formed on the blue protective layer 30B (step S24). As a result of steps S22 and S24, a blue sacrificial layer 34B (third sacrificial layer) including the blue protective layer 30B and the blue photoresist layer 32B is formed. The blue sacrificial layer 34B includes an overlapping region 36B (third region) that overlaps with at least one of the red light-emitting layer 24R and the green light-emitting layer 24G, and a non-overlapping region 38B (fourth region) that does not overlap with either the red light-emitting layer 24R or the green light-emitting layer 24G.

[0126] Examples of the material of the blue protective layer 30B include acrylic resin, polyvinylpyrrolidone (PVP) resin, polyvinyl alcohol (PVA) resin, polyethylene oxide (PEO) resin, etc. The material of the blue protective layer 30B may be the same as or different from the material of the green protective layer 30G and / or the red protective layer 30R. Examples of the material of the blue photoresist layer 32B include photosensitive acrylic resin, photosensitive novolac resin, etc. The material of the blue photoresist layer 32B may be the same as or different from the material of the green photoresist layer 32G and / or the red photoresist layer 32R.

[0127] When the material of the blue photoresist layer 32B comes into contact with the green quantum dots 40G, the red quantum dots 40R, and / or the hole transport layer 22, it deteriorates the green quantum dots 40G, the red quantum dots 40R, and / or the hole transport layer 22. For this reason, in order to prevent the blue photoresist layer 32B from coming into contact with the green quantum dots 40G, the red quantum dots 40R, and the hole transport layer 22, a blue protective layer 30B is provided to cover the red light-emitting layer 24R, the green light-emitting layer 24G, and the hole transport layer 22.

[0128] Next, the blue photoresist layer 32B is patterned using a photolithography technique so as to remove a portion of the blue photoresist layer 32B (step S26). Specifically, at least a portion of the blue photoresist layer 32B corresponding to the anode 10B of the blue light-emitting element 6B is removed. In step S26, the blue photoresist layer 32B is exposed using a photomask and developed using a developer.

[0129] Next, the blue protective layer 30B is patterned by etching using the blue photoresist layer 32B as a protective mask to remove a portion of the blue photoresist layer 32B (step S28). Specifically, at least the portion of the blue photoresist layer 32B corresponding to the anode 10B of the blue light emitting element 6B is removed. The etching in step S28 may be wet etching or dry etching. In order to reduce the cost and number of steps required for manufacturing, the etching in step S28 is preferably wet etching using the developer of step S26.

[0130] As a result of steps S26 and S28, at least a portion of the non-overlapping region 38B of the blue sacrificial layer 34B is removed, exposing the hole transport layer 22 corresponding to the anode 10B of the blue light emitting element 6B. Specifically, at least the portion of the non-overlapping region 38B of the blue sacrificial layer 34B that corresponds to the anode 10B of the blue light emitting element 6B is removed.

[0131] Next, a blue light-emitting layer 44B (third light-emitting layer) is formed (Step S30) on the blue photoresist layer 32B and the hole transport layer 22. The blue light-emitting layer 44B includes blue quantum dots 40B (third quantum dots) that emit blue light and blue ligands 42B that are coordinated to the blue quantum dots 40B.

[0132] The blue quantum dots 40B deteriorate when they come into contact with the material of the blue photoresist layer 32B. The portion of the blue light-emitting layer 44B that remains as the blue light-emitting layer 24B after patterning is formed on the hole transport layer 22, and the portion of the blue light-emitting layer 44B that is removed by patterning is formed on the blue photoresist layer 32B. In this way, the blue quantum dots 40B included in the patterned blue light-emitting layer 24B do not come into contact with the blue photoresist layer 32B.

[0133] Blue ligand 42B covers the surface of blue quantum dot 40B to protect the surface of blue quantum dot 40B.

[0134] Next, the blue sacrificial layer 34B is removed using a blue stripping solution 54B (third stripping solution) according to the present embodiment, thereby patterning the blue light-emitting layer 44B (step S32).

[0135] In step S32, first, the blue stripping solution 54B according to the present embodiment is supplied to the blue light-emitting layer 44B (step S320). In step S320, for example, the blue stripping solution 54B is applied or dropped onto the blue light-emitting layer 44B. The blue stripping solution 54B according to the present embodiment is a solution obtained by adding a blue-added ligand 52B (fourth ligand) different from the blue ligand 42B to the conventional stripping solution 50B. The blue-added ligand 52B is preferably a ligand capable of coordinating with the blue quantum dots 40B. Additionally or alternatively, the blue-added ligand 52B may be a ligand capable of coordinating with one or more of the red quantum dots 40R and the green quantum dots 40G.

[0136] The conventional stripping solution 50B is a solution that can permeate the blue light-emitting layer 44B and dissolve the blue sacrificial layer 34B. The conventional stripping solution 50B is, for example, an organic solvent including acetone, PGMEA, PGME, DMSO, etc. The conventional stripping solution 50B may be the same as or different from the conventional stripping solutions 50R and 50G. Therefore, the blue stripping solution 54B according to this embodiment can also permeate the blue light-emitting layer 44B and dissolve the blue sacrificial layer 34B.

[0137] Here, if the conventional stripping solution 50B is supplied to the blue light-emitting layer 44B, the blue ligand 42B is likely to dissolve from the blue light-emitting layer 44B into the conventional stripping solution 50B. This is because the concentration of the blue ligand 42B in the blue light-emitting layer 44B is greater than the concentration of the blue ligand 42B in the conventional stripping solution 50B. The concentration of the blue ligand 42B in the conventional stripping solution 50B is 0 or almost 0. Then, the blue ligand 42B in the blue light-emitting layer 44B decreases, and the surfaces of the blue quantum dots 40B are exposed. In particular, the blue ligand 42B dissolves from the top surface 48B and side surfaces of the blue light-emitting layer 44B, exposing the top surface 48B and side surfaces of the blue light-emitting layer 44B and the surfaces of the blue quantum dots 40B located in the vicinity thereof.

[0138] On the other hand, when the blue peeling solution 54B according to this embodiment is supplied to the blue light-emitting layer 44B, the blue additive ligand 52B in the blue peeling solution 54B reduces the elution of the blue ligand 42B. Therefore, the surface of the blue quantum dot 40B is covered by the blue ligand 42B and is sufficiently protected. Conversely, the green additive ligand 52G according to this embodiment is selected to reduce the elution of the blue ligand 42B from the blue light-emitting layer 44B to the blue peeling solution 54B. In addition, if the blue additive ligand 52B can be coordinated to the blue quantum dot 40B, the blue additive ligand 52B can be bound to the surface of the blue quantum dot 40B instead of the blue ligand 42B. Therefore, the surface of the blue quantum dot 40B is covered by the blue ligand 42B and / or the blue additive ligand 52B and is more sufficiently protected.

[0139] 4 and 14, next, a wait is performed so that blue stripping solution 54B permeates blue light-emitting layer 44B and dissolves blue sacrificial layer 34B (step S322). For example, in step S322, a wait time of 30 seconds or more is preferable so that blue stripping solution 54B permeates sufficiently. For example, in step S322, a wait time of 300 seconds or less is preferable to prevent blue stripping solution 54B from adversely affecting any one or more of red light-emitting layer 24R, green light-emitting layer 24G, blue light-emitting layer 24B, hole transport layer 22, and hole injection layer 20.

[0140] In step S322, the blue stripping liquid 54B dissolves the blue sacrificial layer 34B. As a result, the portion of the blue light-emitting layer 44B formed on the blue sacrificial layer 34B is peeled off. Then, the dissolved material of the blue sacrificial layer 34B and the peeled material of the blue light-emitting layer 44B are liberated in the blue stripping liquid 54B. The dissolved material of the blue sacrificial layer 34B includes the material 31B of the blue protective layer 30B and the material 33B of the blue photoresist layer 32B.

[0141] If the conventional stripping solution 50B is supplied to the blue light-emitting layer 44B, the surfaces of the blue quantum dots 40B are exposed as described above, and therefore the material 33B of the blue photoresist layer 32B is likely to come into contact with the blue quantum dots 40B, and the blue quantum dots 40B contained in the blue light-emitting layer 44B are likely to deteriorate.

[0142] On the other hand, when the blue stripping solution 54B according to this embodiment is supplied to the blue light-emitting layer 44B, as described above, the surfaces of the blue quantum dots 40B are covered with the blue ligands 42B and / or the blue-added ligands 52B. Therefore, the material 33B of the blue photoresist layer 32B is unlikely to come into contact with the blue quantum dots 40B, and the blue quantum dots 40B are unlikely to deteriorate.

[0143] 4 and 15, blue stripping liquid 54B is then removed (step S324). The dissolved material of blue sacrificial layer 34B and the peeled material of blue light-emitting layer 44B are removed together with blue stripping liquid 54B.

[0144] As described above, blue light-emitting layer 44B is patterned to form patterned blue light-emitting layer 24B on hole transport layer 22. Patterned blue light-emitting layer 24B includes blue quantum dots 40B and blue ligands 42B. In addition, when blue additive ligand 52B is a ligand capable of coordinating with blue quantum dots 40B, patterned blue light-emitting layer 24B may further include blue additive ligand 52B.

[0145] In step S32, the blue ligand 42B migrates from the surface of the blue light-emitting layer 44B or the blue light-emitting layer 24B to the blue stripping solution 54B. Therefore, if the distribution of the blue ligand 42B in the blue light-emitting layer 24B is uneven, the concentration of the blue ligand 42B at and near the lower surface 46B of the blue light-emitting layer 24B is greater than the concentration at and near the upper surface 48B of the blue light-emitting layer 24B. On the other hand, the blue-additive ligand 52B penetrates from the surface of the blue light-emitting layer 44B or the blue light-emitting layer 24B into the blue light-emitting layer 44B or the blue light-emitting layer 24B in step S32. Therefore, if the distribution of the blue-additive ligand 52B in the blue light-emitting layer 24B is uneven, the concentration of the blue-additive ligand 52B at and near the lower surface 46B of the blue light-emitting layer 24B is smaller than the concentration at and near the upper surface 48B of the blue light-emitting layer 24B.

[0146] In addition, when the blue additive ligand 52B is a ligand capable of coordinating with the red quantum dot 40R, the red light-emitting layer 24R after removing the blue sacrificial layer 34B may further include the blue additive ligand 52B. Similarly, when the blue additive ligand 52B is a ligand capable of coordinating with the green quantum dot 40G, the green light-emitting layer 24G after removing the blue sacrificial layer 34B may further include the blue additive ligand 52B. In step S32, the blue additive ligand 52B penetrates from the surface of the red light-emitting layer 24R and / or the green light-emitting layer 24G to the inside. Therefore, when the distribution of the blue additive ligand 52B in the red light-emitting layer 24R and / or the green light-emitting layer 24G is biased, the concentration of the blue additive ligand 52B at and near the lower surface 46R, 46G of the red light-emitting layer 24R and / or the green light-emitting layer 24G is smaller than the concentration at and near the upper surface 48R, 48G of the red light-emitting layer 24R and / or the green light-emitting layer 24G.

[0147] 4, following step S32, it is determined whether or not formation of the entire light-emitting layer 24 is complete (step S34). Since it is complete (Yes), step S12 is ended.

[0148] As described above, according to the method and configuration of the present embodiment, the red light-emitting layer 24R, the green light-emitting layer 24G, and the blue light-emitting layer 24B are protected from degradation due to lack of ligands and resist materials, thereby improving the life and reliability of the display device 2.

[0149] <Ligand> When the red ligand 42R, the green ligand 42G, the blue ligand 42B, the red additive ligand 52R, the green additive ligand 52G, and the blue additive ligand 52B are organic ligands, they each preferably contain an alkyl group in order to maintain a dispersed state in the solvent. Specifically, each preferably contains at least one of alkylthiol, alkylamine, alkylcarboxylic acid, and alkylated phosphorus.

[0150] When the red ligand 42R, the green ligand 42G, the blue ligand 42B, the red additive ligand 52R, the green additive ligand 52G, and the blue additive ligand 52B are inorganic ligands, they each preferably contain a halide ion in order to improve the coordination power (ease of coordination) to the quantum dots. Specifically, each of them contains a tetrabutylammonium halide such as TBAF, TBACl, TBABr, or TBAI, and a ZnF 2 , ZnCl 2 , ZnBr 2 , ZnI 2 It is preferable that the zinc halide is at least one of the zinc halides.

[0151] Here, TBA represents tetrabutylammonium, Zn represents zinc, F represents fluorine, Cl represents chlorine, Br represents bromine, and I represents iodine.

[0152] As described above, in this embodiment, the red additive ligand 52R is different from the red ligand 42R. This means that the substance constituting the red ligand 42R is different from the substance constituting the red additive ligand 52R. Similarly, the green additive ligand 52G is different from the green ligand 42G. This means that the substance constituting the green ligand 42G is different from the substance constituting the green additive ligand 52G. Similarly, the blue additive ligand 52B is different from the blue ligand 42B. This means that the substance constituting the blue ligand 42B is different from the substance constituting the blue additive ligand 52B. For example, when the red ligand 42R is dodecanethiol, the red additive ligand 52R is not dodecanethiol.

[0153] In this embodiment, the red ligand 42R, the green ligand 42G, and the blue ligand 42B may be the same as or different from each other. The red additive ligand 52R, the green additive ligand 52G, and the blue additive ligand 52B may be the same as or different from each other. The red ligand 42R may be the same as or different from the green additive ligand 52G and / or the blue additive ligand 52B. The green ligand 42G may be the same as or different from the red additive ligand 52R and / or the blue additive ligand 52B. The blue ligand 42B may be the same as or different from the red additive ligand 52R and / or the green additive ligand 52G.

[0154] When the red additive ligand 52R can be coordinated to the red quantum dot 40R, it is preferable that the electron transport property of the red additive ligand 52R is lower than that of the red ligand 42R. Specifically, it is preferable that the red additive ligand 52R has a longer chain shape than the red ligand 42R. As described above, the concentration of the red additive ligand 52R is higher at and near the upper surface 48R of the red light-emitting layer 24R than at and near the lower surface 46R of the red light-emitting layer 24R. In this embodiment, the lower surface 46R is the anode 10 side, and the upper surface 48R is the cathode 16 side. In addition, light-emitting elements usually tend to operate in an excess of electrons. Therefore, in this case, the carrier balance of the red light-emitting element 6R can be adjusted by reducing the electron injection from the cathode 16 to the red light-emitting layer 24R.

[0155] In the present disclosure, "X has a longer chain shape than Y" means that each of the substances constituting X and Y has a long chain structure such as an alkyl group, and the molecular length of the substance constituting X is longer than the molecular length of the substance constituting Y.

[0156] Similarly, when the green additive ligand 52G can be coordinated to the red quantum dot 40R and / or the green quantum dot 40G, it is preferable that the electron transport property of the green additive ligand 52G is lower than that of the red ligand 42R and / or the green ligand 42G. Specifically, it is preferable that the green additive ligand 52G has a longer chain shape than that of the red ligand 42R and / or the green ligand 42G. This reduces the electron injection from the cathode 16 to the red light-emitting layer 24R and / or the green light-emitting layer 24G, thereby adjusting the carrier balance of the red light-emitting element 6R and / or the green light-emitting element 6G.

[0157] Similarly, when the blue-additive ligand 52B can be coordinated to the red quantum dot 40R, the green quantum dot 40G, and / or the blue quantum dot 40B, it is preferable that the electron transport property of the blue-additive ligand 52B is lower than that of the red ligand 42R, the green ligand 42G, and / or the blue ligand 42B. Specifically, it is preferable that the blue-additive ligand 52B has a longer chain shape than that of the red ligand 42R, the green ligand 42G, and / or the blue ligand 42B. This reduces the electron injection from the cathode 16 to the red light-emitting layer 24R, the green light-emitting layer 24G, and / or the blue light-emitting layer 24B, thereby adjusting the carrier balance of the red light-emitting element 6R, the green light-emitting element 6G, and / or the blue light-emitting element 6B.

[0158] <Ligand bias> As described above, the distribution of the ligands in the light-emitting layer 24 may be biased. The presence or absence and the degree of this bias can be clarified by various means. For the sake of simplicity, the red light-emitting layer 24R in which the red additive ligand 52R can be coordinated to the red quantum dot 40R will be taken as an example.

[0159] For example, when the appearances of the red ligand 42R and the red additive ligand 52R are different in SEM observation, and when the appearances of the red quantum dots 40R coordinated with the red ligand 42R are different from those of the red quantum dots 40R coordinated with the red additive ligand 52R are different, the cross section of the red light-emitting layer 24R is imaged or observed using an SEM.

[0160] Also, for example, if the red ligand 42R is easily adsorbed by a certain adsorbent and the red-additive ligand 52R is not easily adsorbed by the adsorbent, a sample collected from the vicinity of the lower surface 46R of the red light-emitting layer 24R (hereinafter, "upper sample") and a sample collected from the vicinity of the upper surface 48R of the red light-emitting layer 24R (hereinafter, "lower sample") are analyzed using column chromatography filled with the adsorbent. Specifically, the upper sample and the lower sample of the red light-emitting layer 24R are dissolved in a solvent, each solution is poured into a column, the solution coming out of the column is collected, and the concentration of the red-additive ligand 52R in each collected solution is measured and compared.

[0161] Also, for example, if the red ligand 42R is poorly soluble in a certain solvent and the red additive ligand 52R is poorly soluble in the same solvent, an upper sample and a lower sample of the red light-emitting layer 24R are dissolved in the solvent and filtered, and the concentrations of the red additive ligand 52R in each filtrate are measured and compared.

[0162] For example, when the substance constituting the red ligand 42R does not contain a certain element or a certain functional group, but the substance constituting the red-added ligand 52R contains the element or the functional group, the upper and lower samples of the red light-emitting layer 24R are analyzed using an X-ray analyzer. Specifically, the magnitude of the peak frequency corresponding to the element or the functional group in each sample is measured and compared.

[0163] Furthermore, for example, when there is a difference between the mass number of the substance constituting the red ligand 42R and the mass number of the substance constituting the red added ligand 52R, the upper and lower samples of the red light-emitting layer 24R are analyzed using a mass spectrometer (MS).

[0164] [Embodiment 2] Other embodiments of the present invention will be described below. For ease of explanation, the same reference numerals are given to members having the same functions as those described in the above embodiment, and the description thereof will not be repeated.

[0165] The green additive ligand 52G according to this embodiment is different from the red ligand 42R contained in the red light-emitting layer 24R and is selected so as to reduce the elution of the red ligand 42R from the red light-emitting layer 24R into the green stripping solution 54G. In addition, the green additive ligand 52G according to this embodiment is preferably capable of coordinating with the red quantum dots 40R. The green additive ligand 52G according to this embodiment may be the same as or different from the green ligand 42G contained in the green light-emitting layer 44G.

[0166] Similarly, the blue additive ligand 52B according to this embodiment is characterized in that (1) it is different from the red ligand 42R contained in the red light-emitting layer 24R and is selected so as to reduce the elution of the red ligand 42R from the red light-emitting layer 24R to the blue stripping solution 54B, and / or (2) it is different from the green ligand 42G contained in the green light-emitting layer 24G and is selected so as to reduce the elution of the green ligand 42G from the green light-emitting layer 24G to the blue stripping solution 54B. In addition, the blue additive ligand 52B according to this embodiment is preferably capable of coordinating with the red quantum dots 40R and / or the green quantum dots 40G. The blue additive ligand 52B according to this embodiment may be the same as or different from the blue ligand 42B contained in the blue light-emitting layer 44B.

[0167] The method according to this embodiment is similar to the method according to the above-described first embodiment except for the points mentioned above.

[0168] <Formation of the light-emitting layer> For the sake of simplicity, only the case in which the blue-doped ligand 52B satisfies both of the above (1) and (2) will be described below with reference to the drawings.

[0169] 11, in step S322 in step S12 for forming the green light-emitting layer 24G, the green stripping liquid 54G dissolves the green sacrificial layer 34G. Then, the material 33G of the green photoresist layer 32G is liberated in the green stripping liquid 54G, and the green stripping liquid 54G is in direct contact with the red light-emitting layer 24R.

[0170] Here, if only the conventional stripping solution 50G is supplied to the green light-emitting layer 44G, the red ligand 42R is likely to dissolve from the red light-emitting layer 24R into the conventional stripping solution 50G. This is because the concentration of the red ligand 42R in the red light-emitting layer 24R is greater than the concentration of the red ligand 42R in the conventional stripping solution 50G. The concentration of the red ligand 42R in the conventional stripping solution 50G is 0 or almost 0. The red ligand 42R in the red light-emitting layer 24R is reduced, and the surface of the red quantum dots 40R is exposed. In particular, the red ligand 42R is dissolved from the upper surface 48R and the side surface of the red light-emitting layer 24R, so that the upper surface 48R and the side surface of the red light-emitting layer 24R and the surface of the red quantum dots 40R located in the vicinity thereof are exposed. For this reason, the material 33G of the green photoresist layer 32G is likely to come into contact with the red quantum dots 40R, and the red quantum dots 40R contained in the red light-emitting layer 24R are likely to deteriorate.

[0171] On the other hand, when the green stripping solution 54G according to this embodiment is supplied to the green light-emitting layer 44G, the green additive ligand 52G reduces the elution of the red ligand 42R. Therefore, the surface of the red quantum dot 40R is covered by the red ligand 42R and sufficiently protected. In addition, when the green additive ligand 52G can be coordinated to the red quantum dot 40R, the green additive ligand 52G can bind to the surface of the red quantum dot 40R instead of the red ligand 42R. Therefore, the surface of the red quantum dot 40R is covered by the red ligand 42R and / or the green additive ligand 52G and is more sufficiently protected. Therefore, the material 33G of the green photoresist layer 32G is unlikely to come into contact with the red quantum dot 40R, and the red quantum dot 40R is unlikely to deteriorate.

[0172] 14, in step S322 in step S12 for forming blue light-emitting layer 24B, blue stripping liquid 54B dissolves blue sacrificial layer 34B. Then, material 33B of blue photoresist layer 32B is liberated in blue stripping liquid 54B, and blue stripping liquid 54B is in direct contact with red light-emitting layer 24R and green light-emitting layer 24G.

[0173] Similarly, if only the conventional stripping solution 50B is supplied to the blue light-emitting layer 44B, the red quantum dots 40R contained in the red light-emitting layer 24R and the green quantum dots 40G contained in the green light-emitting layer 24G are likely to deteriorate. On the other hand, if the blue stripping solution 54B according to this embodiment is supplied to the blue light-emitting layer 44B, the red quantum dots 40R contained in the red light-emitting layer 24R and the green quantum dots 40G contained in the green light-emitting layer 24G are unlikely to deteriorate.

[0174] As described above, according to the method and configuration of the present embodiment, the red light-emitting layer 24R and the green light-emitting layer 24G are protected from degradation due to lack of ligands and resist materials, thereby improving the life and reliability of the display device 2.

[0175] <Ligand> As described above, in this embodiment, the green additive ligand 52G is different from the red ligand 42R. This means that the substance constituting the red ligand 42R is different from the substance constituting the green additive ligand 52G. Similarly, the blue additive ligand 52B is different from at least one of the red ligand 42R and the green ligand 42G. This means that the substance constituting at least one of the red ligand 42R and the green ligand 42G is different from the substance constituting the blue additive ligand 52B. For example, when the red ligand 42R is oleic acid, the green additive ligand 52G is not oleic acid.

[0176] In this embodiment, the red ligand 42R, the green ligand 42G, and the blue ligand 42B may be the same as or different from each other. The red additive ligand 52R, the green additive ligand 52G, and the blue additive ligand 52B may be the same as or different from each other. The red ligand 42R may be the same as or different from the red additive ligand 52R. The green ligand 42G may be the same as or different from the red additive ligand 52R and / or the green additive ligand 52G. The blue ligand 42B may be the same as or different from the red additive ligand 52R, the green additive ligand 52G, and / or the blue additive ligand 52B.

[0177] [Embodiment 3] Other embodiments of the present invention will be described below. For ease of explanation, the same reference numerals are given to members having the same functions as those described in the above embodiment, and the description thereof will not be repeated.

[0178] FIG. 16 is a schematic cross-sectional view showing an example of the step (step S12) of forming the light-emitting layer 24 according to this embodiment.

[0179] The red stripping solution 54R according to this embodiment is a solution obtained by adding a red ligand 42R to a conventional stripping solution 50R. The red ligand 42R in the red stripping solution 54R reduces the elution of the red ligand 42R from the red light-emitting layer 44R and the red light-emitting layer 24R into the red stripping solution 54R. In addition, the red ligand 42R in the red stripping solution 54R can coordinate to the red quantum dots 40R.

[0180] The green stripping solution 54G according to this embodiment is a solution obtained by adding a green ligand 42G to a conventional stripping solution 50G. The green ligand 42G in the green stripping solution 54G reduces the elution of the green ligand 42G from the green light-emitting layer 44G and the green light-emitting layer 24G into the green stripping solution 54G. The green ligand 42G in the green stripping solution 54G can be coordinated to the green quantum dots 40G. In addition, the green ligand 42G in the green stripping solution 54G may be coordinated to the red quantum dots 40R.

[0181] The blue stripping solution 54B according to this embodiment is a solution obtained by adding blue ligand 42B to a conventional stripping solution 50B. The blue ligand 42B in the blue stripping solution 54B reduces the elution of blue ligand 42B from the blue light-emitting layer 44B and the blue light-emitting layer 24B into the blue stripping solution 54B. The blue ligand 42B in the blue stripping solution 54B can be coordinated to the blue quantum dots 40B. In addition, the blue ligand 42B in the blue stripping solution 54B can be coordinated to the red quantum dots 40R and / or the green quantum dots 40G.

[0182] Except for the above, the method according to this embodiment is similar to the method according to the above-described embodiment 1. Therefore, the method and configuration according to this embodiment have the same effects as the method and configuration according to the above-described embodiment 1.

[0183] As shown in FIG. 16, the red light-emitting layer 24R according to this embodiment includes red quantum dots 40R and red ligands 42R. In addition, when the green ligand 42G is a ligand capable of coordinating with the red quantum dots 40R, the red light-emitting layer 24R after removing the green sacrificial layer 34G may further include the green ligand 42G. In addition, when the blue ligand 42B is a ligand capable of coordinating with the red quantum dots 40R, the red light-emitting layer 24R after removing the blue sacrificial layer 34B may further include the blue ligand 42B. In step S32, the green ligand 42G and / or the blue ligand 42B penetrate into the red light-emitting layer 24R from the surface. Therefore, when the distribution of the green ligand 42G and / or the blue ligand 42B in the red light-emitting layer 24R is biased, the concentration of the green ligand 42G and / or the blue ligand 42B is smaller at the lower surface of the red light-emitting layer 24R and its vicinity than at the upper surface of the red light-emitting layer 24R and its vicinity.

[0184] The green light-emitting layer 24G according to this embodiment includes green quantum dots 40G and green ligands 42G. In addition, when the blue ligands 42B are ligands capable of coordinating with the green quantum dots 40G, the green light-emitting layer 24G after removing the blue sacrificial layer 34B may further include the blue ligands 42B. The blue ligands 42B penetrate from the surface of the green light-emitting layer 24G to the inside in step S32. Therefore, when the distribution of the blue ligands 42B in the green light-emitting layer 24G is uneven, the concentration of the blue ligands 42B is smaller at the lower surface of the green light-emitting layer 24G and in its vicinity than at the upper surface of the green light-emitting layer 24G and in its vicinity.

[0185] The blue light-emitting layer 24B according to this embodiment includes blue quantum dots 40B and blue ligands 42B.

[0186] Example 1 An example of the third embodiment of the present disclosure will be described below.

[0187] Steps S2 to S18 (see FIG. 3) were executed in order.

[0188] In step S12, a series of steps including steps S22 to S32 (see FIG. 4) was executed only once.

[0189] In step S22, on the hole transport layer 22, a red protective layer 30R containing an acrylic resin was formed.

[0190] In step S24, a red photoresist layer 32R including a photosensitive acrylic resin layer was formed on the red protective layer 30R.

[0191] In step S30, a red light-emitting layer 44R including red quantum dots 40R and red ligands 42R was formed on the hole transport layer 22 and the red photoresist layer 32R. The red quantum dots 40R were of an InP / ZnS core-shell type. The red quantum dots 40R could absorb light with a wavelength of about 365 nm and emit light with a wavelength of about 640 nm unless deteriorated. The red ligand 42R was dodecanethiol.

[0192] In step S32, a red stripping solution 54R obtained by adding dodecanethiol to the conventional stripping solution 50R was supplied to the red light-emitting layer 44R. The conventional stripping solution 50R was PGME. The concentration of dodecanethiol in the red stripping solution 54R was 0.3 mol / L.

[0193] In this manner, the display device 2 according to the first embodiment was formed.

[0194] Example 2 The display device 2 according to the second embodiment was formed in the same manner as the display device 2 according to the first embodiment.

[0195] Comparative Example 1 In step S32, a conventional stripping solution 50R not containing the red ligand 42R was supplied to the red light-emitting layer 44R.

[0196] The display device 2 according to Comparative Example 1 was formed in the same manner as the display device 2 according to Example 1 except for the above points.

[0197] Comparative Example 2 The display device 2 according to the second comparative example was formed in the same manner as the display device 2 according to the first comparative example.

[0198] (Fluorescence lifetime measurement) FIG. 17 is a graph showing the change over time in the fluorescence intensity of the display devices 2 according to Examples 1 and 2 and Comparative Examples 1 and 2. In FIG.

[0199] The display areas DA of the display devices 2 according to Examples 1 and 2 and Comparative Examples 1 and 2 were irradiated with light having a wavelength of about 365 nm at a constant intensity, and the intensity of light having a wavelength of about 640 nm emitted from the display area DA was measured.

[0200] As shown in FIG. 17, the changes in fluorescence intensity over time in Examples 1 and 2 are approximately the same as each other, and the changes in fluorescence intensity over time in Comparative Examples 1 and 2 are approximately the same as each other. On the other hand, the changes in fluorescence intensity over time in Examples 1 and 2 are clearly different from the changes in fluorescence intensity over time in Comparative Examples 1 and 2. This indicates that the difference between Examples 1 and 2 and Comparative Examples 1 and 2 is not due to manufacturing errors. Therefore, a significant performance difference can be obtained by adding a ligand to the stripper solution.

[0201] After about 18 ns, the fluorescence intensity in Examples 1 and 2 decays more slowly than that in Comparative Examples 1 and 2, and the fluorescence intensity in Examples 1 and 2 is greater than that in Comparative Examples 1 and 2. This indicates that the fluorescence lifetime of the red quantum dots 40R in Examples 1 and 2 is longer than that of the red quantum dots 40R in Comparative Examples 1 and 2. Therefore, by adding a ligand to the stripping solution, the lifetime and reliability of the light-emitting element can be improved, and therefore the lifetime and reliability of the display device 2 can be improved.

[0202] [Embodiment 4] Other embodiments of the present invention will be described below. For ease of explanation, the same reference numerals are given to members having the same functions as those described in the above embodiment, and the description thereof will not be repeated.

[0203] FIG. 18 is a schematic cross-sectional view showing an example of the step (step S12) of forming the light-emitting layer 24 according to this embodiment.

[0204] The green stripping solution 54G according to this embodiment is a solution obtained by adding a red ligand 42R to a conventional stripping solution 50G. The red ligand 42R in the green stripping solution 54G reduces the elution of the red ligand 42R from the red light-emitting layer 24R into the green stripping solution 54G. The red ligand 42R in the green stripping solution 54G can be coordinated to the red quantum dots 40R. In addition, the red quantum dots 40R in the green stripping solution 54G may be coordinated to the green quantum dots 40G.

[0205] The blue peeling solution 54B according to this embodiment is a solution obtained by adding the red ligand 42R and / or the green ligand 42G to the conventional peeling solution 50B. The red ligand 42R in the blue peeling solution 54B reduces the elution of the red ligand 42R from the red light-emitting layer 24R to the blue peeling solution 54B. The red ligand 42R in the blue peeling solution 54B can be coordinated to the red quantum dots 40R. In addition, the red ligand 42R in the blue peeling solution 54B may be coordinated to the green quantum dots 40G and / or the blue quantum dots 40B. Similarly, the green ligand 42G in the blue peeling solution 54B reduces the elution of the green ligand 42G from the green light-emitting layer 24G to the blue peeling solution 54B. The green ligand 42G in the blue peeling solution 54B can be coordinated to the green quantum dots 40G. In addition, the green ligand 42G in the blue peeling solution 54B may be coordinated to the red quantum dots 40R and / or the blue quantum dots 40B.

[0206] Except for the above, the method according to this embodiment is similar to the method according to the above-described embodiment 2. Therefore, the method and configuration according to this embodiment have the same effects as the method and configuration according to the above-described embodiment 2.

[0207] 18, the red light-emitting layer 24R according to this embodiment includes red quantum dots 40R and red ligands 42R. In addition, when the green ligands 42G are ligands capable of coordinating with the red quantum dots 40R and the blue stripping solution 54B includes the green ligands 42G, the red light-emitting layer 24R after removing the blue sacrificial layer 34B may further include the green ligands 42G. The green ligands 42G penetrate from the surface of the red light-emitting layer 24R to the inside in step S32. Therefore, when the distribution of the green ligands 42G in the red light-emitting layer 24R is biased, the concentration of the green ligands 42G is lower at the lower surface of the red light-emitting layer 24R and in the vicinity thereof than at the upper surface of the red light-emitting layer 24R and in the vicinity thereof.

[0208] The green light-emitting layer 24G according to this embodiment includes green quantum dots 40G and green ligands 42G. In addition, when the red ligand 42R is a ligand capable of coordinating with the green quantum dots 40G and the blue stripping solution 54B includes the red ligand 42R, the green light-emitting layer 24G after the blue sacrificial layer 34B is removed may further include the red ligand 42R. The red ligand 42R penetrates from the surface of the green light-emitting layer 24G to the inside in step S32. Therefore, when the distribution of the red ligand 42R in the green light-emitting layer 24G is biased, the concentration of the red ligand 42R is smaller at the lower surface of the green light-emitting layer 24G and in its vicinity than at the upper surface of the green light-emitting layer 24G and in its vicinity.

[0209] The blue light-emitting layer 24B according to this embodiment includes blue quantum dots 40B and blue ligands 42B. In addition, when the green ligand 42G is a ligand capable of coordinating with the blue quantum dots 40B and the blue stripping solution 54B includes the green ligand 42G, the patterned blue light-emitting layer 24B may further include the green ligand 42G. In addition, when the red ligand 42R is a ligand capable of coordinating with the blue quantum dots 40B and the blue stripping solution 54B includes the red ligand 42R, the patterned blue light-emitting layer 24B may further include the red ligand 42R. When the distribution of the red ligand 42R and / or the green ligand 42G in the blue light-emitting layer 24B is biased, the concentration of the red ligand 42R and / or the green ligand 42G is lower at the lower surface of the blue light-emitting layer 24B and its vicinity than at the upper surface of the blue light-emitting layer 24B and its vicinity.

[0210] [Embodiment 5] Other embodiments of the present invention will be described below. For ease of explanation, the same reference numerals are given to members having the same functions as those described in the above embodiment, and the description thereof will not be repeated.

[0211] FIG. 19 is a cross-sectional view showing an example of a schematic configuration of a display area DA of a display device 2 according to this embodiment.

[0212] FIG. 20 is a schematic flow diagram showing an example of a method for manufacturing the display device 2 according to this embodiment.

[0213] As shown in FIG. 19, the light-emitting element layer 6 of this embodiment includes a cathode 116 (first electrode) on a substrate 4, an anode 110 (second electrode) facing the cathode 116, a bank 12, and an active layer 14 provided between the anode 110 and the cathode 116.

[0214] Here, the cathode 116 is formed individually for each light-emitting element. The cathode 116 is provided in an island shape for each light-emitting element, that is, for each subpixel, and is also referred to as a "pixel electrode." The cathode 116 includes a cathode 116R for the red light-emitting element 6R, a cathode 116G for the green light-emitting element 6G, and a cathode 116 for the blue light-emitting element 6B. Meanwhile, the hole injection layer 20, the hole transport layer 22, the electron transport layer 26, and the anode 110 are each formed in common for a plurality of light-emitting elements. The anode 110 is also referred to as a "common electrode."

[0215] As shown in FIG. 20, in the manufacturing method of the display device 2 according to the present embodiment, first, the substrate 4 is formed (step S2), the cathode 116 is formed (step S16), and the bank 12 is formed (step S6). Then, the electron transport layer 26 is formed (step S14), the light-emitting layer 24 is formed (step S12), the hole transport layer 22 is formed (step S10), and the hole injection layer 20 is formed (step S8). Next, the anode 110 is formed (step S4), and the sealing layer 8 is formed (step S18). Then, as necessary, the glass substrate is peeled off, and a functional film is attached, and the manufacturing of the display device 2 is completed.

[0216] Therefore, the display device 2 according to this embodiment differs from the display device 2 according to the above-described embodiment 1 in that the stacking order of the light-emitting element layers 6 is reversed. Accordingly, the manufacturing method for the display device 2 according to this embodiment differs from that for the display device 2 according to the above-described embodiment 1 in the order of steps between step S2 and step S18. In other respects, the method and configuration according to this embodiment are similar to the method and configuration according to the above-described embodiment 1.

[0217] Therefore, the method and configuration according to this embodiment have the same effects as the method and configuration according to the first embodiment described above.

[0218] <Ligand> When the red additive ligand 52R can be coordinated to the red quantum dot 40R, it is preferable that the hole transport property of the red additive ligand 52R is higher than that of the red ligand 42R. Specifically, it is preferable that the red ligand 42R has a longer chain shape than the red additive ligand 52R. As described above, the concentration of the red additive ligand 52R is higher at the upper surface and its vicinity of the red light-emitting layer 24R than at the lower surface and its vicinity of the red light-emitting layer 24R. In this embodiment, the lower surface is the cathode 116 side, and the upper surface is the anode 110 side. In addition, the light-emitting element usually tends to operate in a state of excess electrons. Therefore, in this case, the carrier balance of the red light-emitting element 6R can be adjusted by increasing the hole injection from the anode 110 to the red light-emitting layer 24R.

[0219] Similarly, when the green additive ligand 52G can be coordinated to the red quantum dot 40R and / or the green quantum dot 40G, it is preferable that the hole transport property of the green additive ligand 52G is higher than that of the red ligand 42R and / or the green ligand 42G. Specifically, it is preferable that the red ligand 42R and / or the green ligand 42G have a longer chain shape than the green additive ligand 52G. This increases the hole injection from the anode 110 to the red light-emitting layer 24R and / or the green light-emitting layer 24G, thereby adjusting the carrier balance of the red light-emitting element 6R and / or the green light-emitting element 6G.

[0220] Similarly, when the blue-additive ligand 52B can be coordinated to the red quantum dot 40R, the green quantum dot 40G, and / or the blue quantum dot 40B, it is preferable that the hole transport property of the blue-additive ligand 52B is higher than that of the red ligand 42R, the green ligand 42G, and / or the blue ligand 42B. Specifically, it is preferable that the red ligand 42R, the green ligand 42G, and / or the blue ligand 42B have a longer chain shape than the blue-additive ligand 52B. This increases the hole injection from the anode 110 to the red light-emitting layer 24R, the green light-emitting layer 24G, and / or the blue light-emitting layer 24B, thereby adjusting the carrier balance of the red light-emitting element 6R, the green light-emitting element 6G, and / or the blue light-emitting element 6B.

[0221] The present invention is not limited to the above-described embodiments, and various modifications are possible within the scope of the claims. The technical scope of the present invention also includes embodiments obtained by appropriately combining the technical means disclosed in the different embodiments. Furthermore, new technical features can be formed by combining the technical means disclosed in the respective embodiments.

[0222] The stripping solution according to the present disclosure includes a stripping solution to which a ligand has been added.

[0223] The manufacturing method according to the present disclosure includes a method of patterning at least one of the layers included in the light-emitting layer 24 by a lift-off method using a stripper solution to which a ligand has been added. In other words, the scope of the present disclosure includes a manufacturing method in which a series of steps including a step of forming a sacrificial layer on the charge functional layer (and on the light-emitting layer if a light-emitting layer has already been formed), a step of removing a part of the sacrificial layer to expose the charge functional layer, a step of forming a light-emitting layer on the sacrificial layer and the charge functional layer, and a step of removing the sacrificial layer using the stripper solution according to this embodiment to pattern the light-emitting layer are performed at least once.

[0224] The display device according to the present disclosure includes a display device in which at least one of the layers included in the light-emitting layer 24 is patterned by a lift-off method using a stripping solution to which a ligand has been added.

[0225] For example, any two or more of the embodiments 1 to 4 may be combined. For example, in the embodiments 2 to 4, the stacking order of the light emitting element layers 6 may be reversed as in the embodiment 5. For example, any two or more of the embodiments 2 to 4 and the embodiment 5 in which the stacking order of the light emitting element layers 6 is reversed may be combined. [Explanation of symbols]

[0226] 10 Anode (first electrode) 16 Cathode (second electrode) 20 Hole injection layer (charge functional layer) 22 Hole transport layer (charge functional layer) 24R Red light-emitting layer (first light-emitting layer) 30R red protective layer (protective layer) 32R Red photoresist layer (resist layer) 34R Red sacrificial layer 34G (first sacrificial layer) 34G Green sacrificial layer 34G (second sacrificial layer) 34B Blue sacrificial layer 34G (third sacrificial layer) 36G Overlapped area (first area) 36B Overlapping area (third area) 38G Non-overlapping area (second area) 38B Non-overlapping area (4th area) 40R Red quantum dot (first quantum dot) 40G Green Quantum Dot (Second Quantum Dot) 40B Blue quantum dots (third quantum dots) 42R Red Ligand (First Ligand) 44R Red light-emitting layer (first light-emitting layer) 44G Green light-emitting layer (second light-emitting layer) 44B Blue light-emitting layer (third light-emitting layer) 52R Red additive ligand (second ligand) 52G Green additive ligand (third ligand) 52B Blue-additive ligand (quaternary ligand) 54R Red Stripper (First Stripper, Stripper) 54G Green Stripper (Second Stripper, Stripper) 54B Blue Stripper (Third Stripper, Stripper) 110 Anode (second electrode) 116 Cathode (first electrode)

Claims

1. forming a first sacrificial layer over the charge functional layer; removing a portion of the first sacrificial layer to expose the charge functional layer; forming a first light-emitting layer over the first sacrificial layer and the charge functional layer, the first light-emitting layer including first quantum dots and a first ligand; removing the first sacrificial layer using a first stripper solution containing a second ligand, thereby patterning the first light-emitting layer; the second ligand is capable of coordinating to the first quantum dot; A method for manufacturing a display device.

2. The method for manufacturing a display device according to claim 1 , wherein the first light-emitting layer contains the second ligand after the first sacrificial layer is removed.

3. The method for manufacturing a display device according to claim 1 , wherein a substance constituting the first ligand is different from a substance constituting the second ligand.

4. 3. The method for manufacturing a display device according to claim 1, wherein the substance constituting the first ligand and the substance constituting the second ligand are the same.

5. the first ligand is comprised of at least one of an alkylthiol, an alkylamine, an alkylcarboxylic acid, and an alkylated phosphorus; 5. The method for manufacturing a display device according to claim 1, wherein the second ligand is composed of at least one of an alkylthiol, an alkylamine, an alkylcarboxylic acid, and an alkylated phosphorus.

6. the first ligand is composed of at least one of tetrabutylammonium halide and zinc halide; 5. The method for manufacturing a display device according to claim 1, wherein the second ligand is composed of at least one of tetrabutylammonium halide and zinc halide.

7. The method for manufacturing a display device according to claim 1 , wherein the first sacrificial layer includes a protective layer on the charge functional layer and a resist layer on the protective layer.

8. forming a second sacrificial layer including a first region overlapping the first light-emitting layer and a second region not overlapping the first light-emitting layer; removing at least a portion of the second region to expose the charge functional layer; forming a second light-emitting layer including second quantum dots on the second sacrificial layer and the charge functional layer; 8. The method for manufacturing a display device according to claim 1, further comprising: a step of patterning the second light-emitting layer by removing the second sacrificial layer using a second stripping solution containing a third ligand.

9. forming a patterned first light-emitting layer over the charge functional layer, the first light-emitting layer including first quantum dots and a first ligand; forming a second sacrificial layer including a first region overlapping the first light-emitting layer and a second region not overlapping the first light-emitting layer; removing at least a portion of the second region to expose the charge functional layer; forming a second light-emitting layer including second quantum dots on the second sacrificial layer and the charge functional layer; removing the second sacrificial layer using a second stripper solution containing a third ligand, thereby patterning the second light-emitting layer; the third ligand is capable of coordinating to the first quantum dot; A method for manufacturing a display device.

10. The method for manufacturing a display device according to claim 8 , wherein the first light-emitting layer contains the third ligand after the second sacrificial layer is removed.

11. 11. The method for manufacturing a display device according to claim 8, wherein a substance constituting the first ligand is different from a substance constituting the third ligand.

12. 11. The method for manufacturing a display device according to claim 8, wherein a substance constituting the first ligand and a substance constituting the third ligand are the same.

13. the first ligand is comprised of at least one of an alkylthiol, an alkylamine, an alkylcarboxylic acid, and an alkylated phosphorus; The method for manufacturing a display device according to any one of claims 8 to 12, wherein the third ligand is composed of at least one of an alkylthiol, an alkylamine, an alkylcarboxylic acid, and an alkylated phosphorus.

14. the first ligand is composed of at least one of tetrabutylammonium halide and zinc halide; 13. The method for manufacturing a display device according to claim 8, wherein the third ligand is composed of at least one of tetrabutylammonium halide and zinc halide.

15. The method for manufacturing a display device according to any one of claims 8 to 14, wherein the second quantum dots emit green or blue light.

16. forming a third sacrificial layer including a third region overlapping with at least one of the first light-emitting layer and the second light-emitting layer, and a fourth region overlapping neither the first light-emitting layer nor the second light-emitting layer; removing at least a portion of the fourth region to expose the charge functional layer; forming a third light-emitting layer including third quantum dots on the third sacrificial layer and on the charge functional layer; The method for manufacturing a display device according to any one of claims 8 to 15, further comprising: a step of removing the third sacrificial layer using a stripping solution containing a fourth ligand, thereby patterning the third light-emitting layer.

17. The method for manufacturing a display device according to any one of claims 1 to 16, wherein the charge functional layer contains a metal oxide in the form of nanoparticles.

18. The method for manufacturing a display device according to claim 17 , wherein the charge functional layer includes a hole injection layer, and the metal oxide included in the hole injection layer is nickel oxide.

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