Exposure Equipment

Abstract

To prevent changes in a line width and a thickness of a transferred pattern between an overlap part and a non-overlap part.SOLUTION: An exposure device includes: an optical system which includes a flyeye lens including a plurality of lens elements, and a light reducing member for light reducing at least a part of incident light into the flyeye lens, and irradiates a substrate with light from the flyeye lens; and a holding part for changing the number of the plurality of lens elements whose center in the first direction is overlapped on the light reducing member by moving in a second direction orthogonal to the first direction, the light reducing member which is formed so that overlap in a first direction between at least one of the plurality of lens elements and the light reducing member is changed to a desired size, and in which the overlap is adjusted to a desired size.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] The present invention relates to an exposure device. Place Regarding. [Background technology]

[0002] As an apparatus for exposing and transferring the pattern original on a mask to a large substrate, a scanning type exposure apparatus is known that performs exposure by scanning the mask and the substrate relative to the projection optical system. By scanning exposure, the exposure field is expanded in the scanning direction (scanning direction), but in order to further expand the exposure field in a direction intersecting the scanning direction (non-scanning direction), there is also known an exposure apparatus that performs multiple scanning exposures with the exposure fields overlapping in the non-scanning direction. Furthermore, a method is also known in which multiple projection optical systems are arranged in parallel in the non-scanning direction, and exposure is performed while overlapping a portion of the exposure field exposed by the multiple projection optical systems, thereby exposing and transferring an electronic circuit onto a substrate in a single scan (for example, Patent Document 1). [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Japanese Patent Publication No. 2016-54230 Summary of the Invention

[0004] According to a first aspect, an exposure apparatus includes: An exposure apparatus that exposes a substrate while moving the substrate in a scanning direction, the exposure apparatus including: an illumination optical system that illuminates a mask; and a projection optical system that irradiates the substrate with light from the mask, the illumination optical system including: A fly-eye lens including a plurality of lens elements and the fly-eye lens The fly-eye lens is overlapped with a part of the fly-eye lens in the optical axis direction on the incident surface side of the fly-eye lens. a light-attenuating member for attenuating at least a portion of light incident on the A holder for holding the light reducing member; Including, The holding portion is oriented in a direction optically corresponding to the scanning direction on the substrate with respect to the incident surface of the fly-eye lens. In the second direction , the light reducing member By moving it, Among the plurality of lens elements, The center in the first direction overlaps with the light reducing member. Rure Change the number of lenses The light reducing member is capable of changing a size of an overlap with the fly-eye lens in the first direction to a desired size, and each of the first direction and the second direction is a direction intersecting the optical axis direction. . According to a second aspect, an exposure apparatus includes: An exposure apparatus that exposes a substrate while moving the substrate in a scanning direction, the exposure apparatus including: an illumination optical system that illuminates a mask; and a projection optical system that irradiates the substrate with light from the mask, the illumination optical system including:A fly-eye lens including a plurality of lens elements and the fly-eye lens The fly-eye lens is overlapped with a part of the fly-eye lens in the optical axis direction on the incident surface side of the fly-eye lens. a light-attenuating member for attenuating at least a portion of light incident on the A holder for holding the light reducing member; Including, the attenuating member includes a first attenuating member and a second attenuating member overlapping each other, The holding portion is By moving the light attenuating member in a second direction that is a direction optically corresponding to the scanning direction on the substrate with respect to the incident surface of the fly-eye lens, the number of lens elements whose centers in a first direction perpendicular to the second direction overlap with the light attenuating member is changed among the plurality of lens elements, and an overlap between the first light attenuating member and the second light attenuating member in the first direction is changed. One of the first light-attenuating member and the second light-attenuating member is moved in the first direction relative to the other. and each of the first direction and the second direction is a direction intersecting the optical axis direction. . According to a third aspect, an exposure apparatus includes: An exposure apparatus that exposes a substrate while moving the substrate in a scanning direction, the exposure apparatus including: an illumination optical system that illuminates a mask; and a projection optical system that irradiates the substrate with light from the mask, the illumination optical system including: A fly-eye lens including a plurality of lens elements and the fly-eye lens The fly-eye lens is overlapped with a part of the fly-eye lens in the optical axis direction on the incident surface side of the fly-eye lens. a light-attenuating member for attenuating at least a portion of light incident on the A holder for holding the light reducing member; Including, before The memory unit includes: moving the light reducing member in a second direction that is a direction optically corresponding to the scanning direction on the substrate with respect to an incident surface of the fly-eye lens, thereby changing the number of lens elements whose centers in a first direction perpendicular to the second direction overlap with the light reducing member among the plurality of lens elements; The light reducing member and the fly-eye lens are moved in accordance with a signal transmitted to the holding unit. In the optical axis direction The light reducing member is moved so that the interval changes. , each of the first direction and the second direction is a direction intersecting the optical axis direction. . According to a fourth aspect, an exposure apparatus includes: An exposure apparatus that exposes a substrate while moving the substrate in a scanning direction, the exposure apparatus including: an illumination optical system that illuminates a mask; and a projection optical system that irradiates the substrate with light from the mask, the illumination optical system including: A fly-eye lens including a plurality of lens elements and the fly-eye lens The fly-eye lens is overlapped with a part of the fly-eye lens in the optical axis direction on the incident surface side of the fly-eye lens. a light-attenuating member for attenuating at least a portion of light incident on the a holder that holds the light attenuating member and moves the light attenuating member in a second direction that is a direction optically corresponding to the scanning direction on the substrate with respect to an incident surface of the fly-eye lens, thereby changing the number of lens elements whose centers in a first direction perpendicular to the second direction overlap with the light attenuating member among the plurality of lens elements; Includes ,before The light-attenuating member includes a first light-attenuating member and a second light-attenuating member having different widths in the first direction, and the holding portion selectively moves the first light-attenuating member and the second light-attenuating member in the second direction so that the number of the lens elements overlapping the first light-attenuating member changes, or so that the number of the lens elements overlapping the second light-attenuating member changes. , each of the first direction and the second direction is a direction intersecting the optical axis direction. . According to a fifth aspect, an exposure apparatus includes: An exposure apparatus that exposes a substrate while moving the substrate in a scanning direction, the exposure apparatus including: an illumination optical system that illuminates a mask; a projection optical system that irradiates the substrate with light from the mask; and a stage that moves the substrate in the scanning direction, the illumination optical system including: A fly-eye lens including a plurality of lens elements and the fly-eye lens The fly-eye lens is overlapped with a part of the fly-eye lens in the optical axis direction on the incident surface side of the fly-eye lens. a light-attenuating member for attenuating at least a portion of light incident on the a holder that holds the light attenuating member and moves the light attenuating member in a second direction that is a direction optically corresponding to the scanning direction on the substrate with respect to an incident surface of the fly-eye lens, thereby changing the number of lens elements whose centers in a first direction perpendicular to the second direction overlap with the light attenuating member among the plurality of lens elements; Including, before Note illumination optical system or the projection optical system a diaphragm for setting an illumination area on the substrate by the attenuated light; , at a position optically conjugate with the mask.the irradiation area includes an end area including an end of the irradiation area in a non-scanning direction perpendicular to the scanning direction, and a central area including a center of the irradiation area in the non-scanning direction, The entrance surfaces of the lens elements are located at positions optically conjugate with the substrate, The plurality of lens elements home At least one Lens element The incident surface includes a first region corresponding to the edge region and a second region corresponding to the central region, the stage moves the substrate so that an exposure region on the substrate is exposed a plurality of times by the edge region, and the holder is a light-reducing member. In front a first state in which the first region overlaps with the second region; and In front a first state in which the light-attenuating member does not overlap with the first region and overlaps with the second region, The first direction and the second direction each intersect with the optical axis direction. . [Brief description of the drawings]

[0005] [Figure 1] FIG. 1 is a side view showing the configuration of an exposure apparatus according to a first embodiment. [Diagram 2] FIG. 2 is a perspective view showing a portion of the exposure apparatus of the first embodiment. [Diagram 3] FIG. 2 is an enlarged perspective view showing from the fly's eye lens to the mask of the exposure apparatus of the first embodiment. [Figure 4] 4(a1), 4(a2), and 4(a3) are diagrams showing the relationship between the field of view on the mask and the field of view on the substrate in the exposure apparatus of the first embodiment, respectively showing the field of view on the mask in the projection optical system 19c in Fig. 1, the field stop in the projection optical system, and the field of view on the substrate, and Fig. 4(b1), 4(b2), and 4(b3) are diagrams showing the field of view on the mask in the projection optical system 19b in Fig. 1, the field stop in the projection optical system, and the field of view on the substrate, respectively. [Diagram 5]5(a) shows an example of the exposure energy irradiated onto a substrate and the effective photosensitivity of a photosensitive material when the exposure apparatus of the first embodiment performs scanning exposure on the substrate, and FIG. 5(b) shows an example of the exposure field on the substrate of each projection optical system, FIG. 5(b) shows an exposure area formed on the substrate 22, FIG. 5(c) shows an example of the exposure dose irradiated onto the substrate, and FIG. 5(d) shows another example of the exposure dose irradiated onto the substrate. [Figure 6] 3 is a diagram showing the fly-eye lens, the light attenuating member, and the light attenuating member holder of the exposure apparatus of the first embodiment, as viewed from the input lens side. [Figure 7] 7A and 7B are diagrams showing an example of the exposure energy irradiated onto a substrate and the effective photosensitivity in a photosensitive material when the exposure apparatus of the first embodiment performs scanning exposure on the substrate, respectively. Fig. 7A shows the exposure field on the substrate of each projection optical system, Fig. 7B shows an example of the exposure dose irradiated onto the substrate, and Fig. 7C shows an example of the effective photosensitivity in the photosensitive material. [Figure 8] FIG. 13 is a diagram showing the distribution of the exposure amount in an overlapping portion. [Figure 9] FIG. 11 is a diagram showing the light attenuation member and the light attenuation member holding portion of the first modification example, as viewed from the input lens side. [Figure 10] Fig. 10(a) is a top view of the light attenuation member and the light attenuation member holder of the second modification, as viewed from the input lens side; Fig. 10(b) is a side view of the light attenuation member and the light attenuation member holder of the second modification; [Figure 11] FIG. 11 is a diagram showing a light attenuation member and a light attenuation member holding portion of the third modification example, as viewed from the input lens side. [Figure 12] FIG. 13 is a diagram showing a light attenuation member and a light attenuation member holding portion of the fourth modification example, as viewed from the input lens side. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0006] (First embodiment of exposure apparatus) Fig. 1 is a side view showing an exposure apparatus 100 of the first embodiment. As will be described later, exposure apparatus 100 is equipped with five projection optical systems 19a to 19e, however, only two of these, projection optical systems 19a and 19b, are shown in Fig. 1. The projection optical systems 19a-19e are optical systems that form erect images with a projection magnification (lateral magnification) of +1, and transfer the pattern drawn on the mask 15 by exposure to a photosensitive material formed on the upper surface of the substrate 22. The substrate 22 on which the photosensitive material is formed can be considered as an exposed substrate.

[0007] The substrate 22 is held by a substrate stage 27 via a substrate holder (not shown). The substrate stage 27 scans in the X direction on a substrate stage base 28 by a linear motor (not shown) or the like, and is movable in the Y direction. The position of the substrate stage 27 in the X direction is measured by a laser interferometer 25 via the position of a movable mirror 24 attached to the substrate stage 27. Similarly, the position of the substrate stage 27 in the Y direction is measured by a laser interferometer (not shown). The position detection optical system 23 detects the position of an existing pattern such as an alignment mark formed on the substrate 22 .

[0008] The mask 15 is held by a mask stage 16. The mask stage 16 scans in the X direction on a mask stage base 17 and is movable in the Y direction by a linear motor (not shown) or the like. The position of the mask stage 16 in the X direction is measured by a laser interferometer 14 via the position of a movable mirror 13 attached to the mask stage 16. Similarly, the position of the mask stage 16 in the Y direction is measured by a laser interferometer (not shown).

[0009] A control system (not shown) controls linear motors (not shown) and the like based on measurement values ​​from laser interferometers 14, 25, etc., to control the XY positions of mask stage 16 and substrate stage 27. When exposing substrate 22 with the mask pattern, the control system (not shown) scans mask 15 and substrate 22 at approximately the same speed in the X direction relative to projection optical systems 19a-19e while maintaining the imaging relationship formed by projection optical systems 19a-19e. In this specification, the direction in which the substrate 22 is scanned during exposure (X direction) is also referred to as the "scanning direction". In addition, the direction (Y direction) that is included in the plane of the substrate 22 and perpendicular to the X direction is also referred to as the "non-scanning direction". The Z direction is the direction perpendicular to the X direction and the Y direction. In addition, the X, Y, and Z directions indicated by arrows in FIG. 1 and the following figures are positive directions.

[0010] 2 is a perspective view that shows a portion from the downstream part of illumination optical systems ILa-ILe of exposure apparatus 100 of the first embodiment to substrate 22. Below, the explanation will continue with reference to FIG. 2, of the five projection optical systems 19a to 19e, three projection optical systems 19a, 19c, and 19e (hereinafter collectively or individually referred to as "first row projection optical system 19F") are arranged side by side in the Y direction. And two projection optical systems 19b and 19d (hereinafter collectively or individually referred to as "second row projection optical system 19R") are arranged side by side in the Y direction on the +X side of the first row projection optical system 19F. The projection optical systems in the first row 19F are arranged such that their optical axes are spaced apart at a predetermined interval in the Y direction. The projection optical systems in the second row 19R are arranged similarly to the projection optical systems 19F in the first row. Moreover, the projection optical system 19b is arranged such that the position of its optical axis in the Y direction coincides with approximately the center of a line connecting the optical axes of the projection optical systems 19a and 19c. Moreover, the projection optical system 19d is arranged similarly to the projection optical system 19b.

[0011] The exposure apparatus 100 of the first embodiment includes a plurality of illumination optical systems ILa to ILe corresponding to each of the projection optical systems 19a to 19e. As an example, as shown in FIG. 1, the illumination optical system ILa corresponding to the projection optical system 19a includes an input lens 8a, a fly-eye lens 11a, and a condenser lens 12a along the optical axis IXa. Similarly, the other illumination optical systems ILb to ILe include input lenses 8b to 8e, fly-eye lenses 11b to 11e, and condenser lenses 12b to 12e. As described above, FIG. 2 shows only the fly-eye lenses 11a to 11e and the condenser lenses 12a to 12e of the illumination optical systems ILa to ILe. 1, which is a side view, projection optical systems 19c to 19e are not shown because their positions in the X direction overlap with those of projection optical systems 19a and 19b. Similarly, illumination optical systems ILc to ILe are not shown because their positions in the X direction overlap with those of illumination optical systems ILa and ILb.

[0012] Illumination light supplied from a light source 1 such as a lamp is supplied to each of the illumination optical systems ILa to ILe via a light guide optical system including an elliptical mirror 2, a bending mirror 3, a relay lens 4, a bending mirror 5, a relay lens 6, and an optical fiber 7. The optical fiber 7 splits the illumination light incident on one entrance side 71 into approximately equal parts and outputs them to five exit sides 72a to 72e. The illumination light output from each of the five exit sides 72a to 72e of the optical fiber 7 enters input lenses 8a to 8e in each of the illumination optical systems ILa to ILe. The illumination light then passes through fly-eye lenses 11a to 11e and condenser lenses 12a to 12e, and is irradiated onto each of the illumination regions MIa to MIe on the mask 15.

[0013] The fly's eye lenses 11a to 11e are positioned so that their incident sides (the surfaces facing the input lenses 8b to 8e) coincide with or are located near the conjugate plane CP, which is conjugate (in an imaging relationship) with the upper surface of the substrate 22 (the upper surface of the substrate holder on which the substrate 22 is placed or near it) via the projection optical systems 19a to 19e, the condenser lenses 12a to 12e and the fly's eye lenses 11a to 11e.

[0014] FIG. 3 is an enlarged perspective view of a fly-eye lens 11c and a condenser lens 12c included in the illumination optical system ILc, and an illumination area MIc on the mask 15, as an example. The fly-eye lens 11c is formed by arranging a plurality of lens elements 110 in the X and Y directions, each having a rectangular cross-sectional shape (shape in the XY plane) elongated in the Y direction, similar to the illumination area MIc. The entrance surface of each lens element 110 (the upper surface in FIG. 3, i.e., the surface on the +Z side) is a conjugate plane CP with respect to the illumination area MIc on the mask 15 (the upper surface of the mask stage on which the mask 15 is placed or in its vicinity) by an optical system consisting of each lens element 110 and the condenser lens 12c. Therefore, it is also a conjugate plane CP with respect to the exposure field PIc on the substrate 22. The illumination light irradiated to the entrance surface of each lens element 110 is irradiated to the illumination area MIc on the mask 15 in a superimposed manner. This makes the illuminance of the illumination light in the illumination area MIc approximately uniform.

[0015] The configurations of the illumination optical systems ILa to ILe other than the illumination optical system ILc are similar to the configuration shown in FIG. The fly-eye lenses 11a to 11e are an example of an optical integrator that irradiates the illumination areas MIa to MIe with superimposed illumination light. Light reducing members 10a to 10e, which will be described later, are held by light reducing member holding portions 9a to 9e and disposed on the entrance surface side (the input lenses 8a to 8e side) of the fly-eye lenses 11a to 11e.

[0016] Each of the projection optical systems 19a-19e is configured, for example, by a double imaging type optical system in order to form an erect image. In this case, an intermediate image of the pattern of the mask 15 is formed on an intermediate image plane 20 located near the middle in the direction of the optical axes PAXa-PAXe of each of the projection optical systems 19a-19e (Z direction) by an optical system that constitutes the upper half of each of the projection optical systems 19a-19e. The intermediate image is focused again by an optical system that constitutes the lower half of each of the projection optical systems 19a-19e, and an image of the pattern of the mask 15 is formed on the substrate 22.

[0017] Since the intermediate image plane 20 is conjugate with the substrate 22, by placing field stops 21a-21e at the intermediate image plane 20 in each projection optical system 19a-19e, respectively, it is possible to define exposure fields PIa-PIe on the substrate 22 by each projection optical system 19a-19e.

[0018] FIG. 4 is a diagram showing the relationship between illumination fields MIa to MIe on the mask 15, field stops 21a to 21e, and exposure fields PIa to PIe. FIG. 4(a1) is a diagram showing an illumination area MIc on the mask 15 corresponding to the projection optical system 19c, and the illumination area MIc has a rectangular shape similar to the cross-sectional shape of the lens element 110 of the fly's eye lens 11c.

[0019] 4(a2) is a diagram showing the field stop 21c in the projection optical system 19c and the illumination light MIc2 irradiated thereto. The field stop 21c is irradiated with the illumination light MIc2 indicated by the dashed line, which is an intermediate image of the illumination area MIc on the mask 15. Of the illumination light MIc2, the illumination light irradiated to the light-shielding portion (the portion indicated by diagonal lines) of the field stop 21c is blocked by the field stop 21c. On the other hand, the illumination light transmitted through the opening 21co of the field stop 21c is imaged again on the substrate 22 by the optical system that constitutes the lower half of the projection optical system 19c, forming an exposure field PIc on the substrate 22.

[0020] FIG. 4( a 3 ) shows the exposure field PIc on the substrate 22 . As an example, when the projection optical systems 19c to 19e are all refractive optical systems, the intermediate image, illumination light MIc2, is an inverted normal image (an image in which both the X and Y directions of the image are inverted and not a mirror image) relative to the illumination area MIc, and the exposure field PIc is an inverted normal image relative to the field stop 21c. Therefore, as shown in Figures 4(a2) and 4(a3), the shape of the opening 21co of the field stop 21c and the shape of the exposure field PIc are mutually rotated 180 degrees around the Z axis.

[0021] As an example, the exposure field PIc is a trapezoid with two sides parallel to the Y direction, the shorter side on the +X side and the longer side on the -X side. Here, the rectangular region of the exposure field PIc enclosed by the entire short side on the +X side and part of the long side on the -X side is called the central region PIcc. Meanwhile, the end of the exposure field PIc in the +Y direction that is not included in the central region PIcc is called the left edge region PIcl, and the end of the exposure field PIc in the -Y direction that is not included in the central region PIcc is called the right edge region PIcr. The length (width) in the Y direction of the central region PIcc is called width Ws, and the lengths (widths) in the Y direction of the left edge region PIcl and the right edge region PIcr are equal and called width Wo.

[0022] On the other hand, Fig. 4(b1) to Fig. 4(b3) are diagrams showing the illumination area MIb on the mask 15, the field stop 21b, and the exposure field PIb, which correspond to the projection optical system 19b, respectively. As shown in Fig. 4(b2), in the projection optical system 19b, the shape of the opening 21bo of the field stop 21b is the inverse in the X direction of the shape of the opening 21co of the field stop 21c of the projection optical system 19c. As a result, as shown in Fig. 4(b3), the shape of the exposure field PIb of the projection optical system 19b is the inverse in the X direction of the shape of the exposure field PIc of the projection optical system 19c.

[0023] As with the above-mentioned exposure field PIc, the rectangular region of the exposure field PIb bounded by the entire short side on the -X side and part of the long side on the +X side is called the central region PIbc. The end of the exposure field PIb in the +Y direction that is not included in the central region PIbc is called the left edge region PIbl, and the end of the exposure field PIb in the -Y direction that is not included in the central region PIbc is called the right edge region PIbr.

[0024] 5(a) is a diagram showing the exposure fields PIa-PIe of the five projection optical systems 19a-19e on the substrate 22. The exposure fields PIa and PIe of the projection optical systems 19a and 19e, which are the projection optical systems 19F in the first row, are trapezoids with the shorter side of the two sides parallel to the Y direction on the +X side and the longer side on the -X side, similar to the exposure field PIc of the projection optical system 19c described above. On the other hand, the exposure field PId of the projection optical system 19d, which is the projection optical system 19R in the second row, is a trapezoid with the shorter side of the two sides parallel to the Y direction on the -X side and the longer side on the +X side, similar to the exposure field PIb of the projection optical system 19b described above.

[0025] Similarly to the above-mentioned exposure fields PIb and PIc, the exposure fields PIa, PId, and PIe of the projection optical systems 19a, 19d, and 19e can be defined as follows: central regions PIac, PIdc, and PIec; left end regions PIal, PIdl, and PIel; and right end regions PIar, PIdr, and PIer. However, the exposure field PIa arranged at the end in the -Y direction does not have a right end region PIar because the field stop 21a blocks the illumination light so that the end in the -Y direction is parallel to the X direction. Also, the exposure field PIe arranged at the end in the +Y direction does not have a left end region PIel because the field stop 21a blocks the illumination light so that the end in the +Y direction is parallel to the X direction. Note that the shapes of the field stops 21a and 21e may be made different from the shape of the field stop 21c, or a different member may be used to block the illumination light so that the right end region PIar does not exist in the exposure field PIa.

[0026] The length in the Y direction of each of the central regions PIac-PIec of each of the exposure fields PIa-PIe is equal to the width Ws, and the lengths of the left edge regions PIal-PIdl and right edge regions PIbr-PIer are equal to the width Wo. In two of the exposure fields PIa-PIe that are adjacent in the Y direction, the positions in the Y direction of the adjacent left edge regions PIal-PIdl and right edge regions PIbr-PIer coincide with each other. The shapes and positions of the exposure fields PIa to PIe are set by setting the positions of the projection optical systems 19a to 19e and the shapes and positions of the openings 21ao to 21eo of the field stops 21a to 21e.

[0027] Fig. 5(b) is a diagram showing an exposure area formed on the substrate 22 when the substrate 22 is scanned in the X direction by the substrate stage 27 and exposed by the exposure fields PIa-PIe shown in Fig. 5(a). Scanning exposure fields SIa-SIe exposed by the respective exposure fields PIa-PIe through scanning exposure are formed on the substrate 22. In Fig. 5(b), the scanning exposure fields SIa, SIc, and SIe formed by the first row of projection optical systems 19a, 19c, and 19e are indicated by two-dot chain lines, and the scanning exposure fields SIb and SId formed by the second row of projection optical systems 19b and 19d are indicated by one-dot chain lines.

[0028] These scanning exposure fields SIa-SIe are the exposure fields PIa-PIe extended in the X direction by scanning exposure in the X direction. The ends of the scanning exposure fields SIa-SIe in the Y direction (non-scanning direction) overlap with the ends of the adjacent scanning exposure fields SIa-SIe in the non-scanning direction. For example, the exposure area by the left edge region PIal and the exposure area by the right edge region PIbr coincide with each other. The same applies to the other exposure fields, so a description thereof will be omitted.

[0029] In the following, the portions in the Y direction exposed by one of the scanning exposure fields SIa to SIe are also referred to as non-overlapping portions Sa to Se, and the portions exposed by overlapping two of the scanning exposure fields SIa to SIe are also referred to as overlapping portions Oa to Od. Of the exposure fields PIa to PIe, the left end areas PIal to PIdl and the right end areas PIbr to PIer are exposure fields corresponding to the overlapping portions Oa to Od, and the central areas PIac to PIec are exposure fields corresponding to the non-overlapping portions Sa to Se.

[0030] Fig. 5(c) is a graph showing the exposure amount E exposed on the substrate 22 by scanning exposure in the X direction. The vertical axis of the graph represents the exposure amount, and the horizontal axis represents the coordinate in the Y direction. As shown in Fig. 5(a), the value obtained by integrating each of the exposure fields PIa-PIe in the X direction in each small section in the Y direction is equal, and the illuminance in each of the exposure fields PIa-PIe is uniform due to the action of the fly's eye lens 11, etc., so the exposure amount E on the substrate 22 is a constant value E1. That is, in the Y direction, the amount of exposure E in the non-overlapping portions Sa to Se and the amount of exposure E in the overlapping portions Oa to Od both have a value of E1 and are equal to each other.

[0031] In photosensitive materials such as photoresists used in the manufacturing process of electronic devices, the effective amount of photosensitivity (hereinafter referred to as "effective photosensitivity") is proportional to the amount of exposure. In other words, if the amount of exposure is the same, the effective amount of photosensitivity of the photosensitive material does not change whether the exposure is performed continuously or divided into several parts. Therefore, if the amount of exposure is constant, the effective amount of exposure to a photosensitive material such as a photoresist is also constant.

[0032] However, for some photosensitive materials, the effective photosensitivity of the photosensitive material changes when the exposure is performed continuously in time and when the exposure is performed divided into several parts in time, even if the exposure amount is the same. Specifically, when the exposure is performed divided into several parts in time, the effective photosensitivity is lower than when the exposure is performed continuously in time.

[0033] FIG. 5(d) is a graph showing the effective photosensitivity EE of some of such photosensitive materials (hereinafter also referred to as "non-additive photosensitive materials") when the non-additive photosensitive materials are subjected to scanning exposure in the X direction using the exposure fields PIa to PIe shown in FIG. 5(a). The overlapping parts Oa-Od, which are exposed by overlapping two of the scanning exposure fields SIa-SIe, are first exposed by the first row of projection optical systems 19a, 19c, and 19e, and then by the second row of projection optical systems 19b and 19d, so that the exposure is performed in a time-divisionally divided manner. In other words, the overlapping parts Oa-Od are exposed in a time-divisionally discrete manner. Therefore, the effective photosensitivity EE of the overlapping parts Oa-Od is lower than the effective photosensitivity EE of the non-overlapping parts Sa-Se, which are exposed continuously without being divided in time by one of the scanning exposure fields SIa-SIe. Specifically, the effective photosensitivity EE of the non-overlapping parts Sa-Se is EE1, while the effective photosensitivity EE of the overlapping parts Oa-Od is smaller than EE1.

[0034] As a result, when a pattern is exposed and transferred using a non-additive photosensitive material, the effective photosensitivity EE differs between the overlapping portions Oa-Od and the non-overlapping portions Sa-Se, resulting in changes in the line width and thickness of the transferred pattern. The non-overlapping portions Sa-Se, which are exposed continuously in time, can be interpreted as a first region, while the overlapping portions Oa-Od, which are exposed discretely in time, can be interpreted as a second region.

[0035] Therefore, in the exposure apparatus 100 of the first embodiment, light attenuating members 10a-10e, which are an example of an illuminance changing member, are provided on the entrance surface side of each of the fly-eye lenses 11a-11e of the illumination optical systems ILa-ILe, that is, at positions between the input lenses 8a-8e and the fly-eye lenses 11a-11e and in the vicinity of the entrance surfaces of the fly-eye lenses 11a-11e. The positions of the light attenuating members 10a-10e are controlled by control signals SigA-SigE from the control unit 50.

[0036] Fig. 6 is a diagram showing the fly-eye lens 11c, the light-reducing member 10c (10c1a, 10c1b, 10c2a, 10c2b), and the light-reducing member holder 9c (9c1, 9c2) provided in the illumination optical system ILc, as viewed from the input lens 8c side. Hereinafter, the light-reducing member 10c and the light-reducing member holder 9c provided in the illumination optical system ILc will be described with reference to Fig. 6, but the same applies to the light-reducing members 10a-10e and the light-reducing member holders 9a-9e provided in the other illumination optical systems ILa-ILe.

[0037] The fly-eye lens 11c has a lens block in which a plurality of lens elements 110, each of which has a rectangular cross section elongated in the Y direction, are arranged in the X direction, and the lens block is arranged in the Y direction. As described above, FIG. 6 is a view of the fly-eye lens 11c as seen from the input lens 8c side, which is the incident surface side. The incident side surface of each lens element 110 is a conjugate plane CP with respect to the exposure field PIc formed on the substrate 22. Therefore, in FIG. 6, an exposure field corresponding area IPIc, which is an area corresponding to the exposure field PIc, is shown by a dashed line in each lens element 110. Note that the lateral magnification of the exposure field corresponding area IPIc with respect to the exposure field PIc is β times, and the width IWs in the Y direction of a portion of the exposure field corresponding area IPIc corresponding to the central area PIcc of the exposure field PIc is β×Ws.

[0038] Of the dimming member 10c, dimming members 10c1a and 10c1b, whose width in the Y direction is width W1, are held by a slider 9c10 that is a part of dimming member holding unit 9c1 and are movable in the X and Z directions. The positions of dimming members 10c1a and 10c1b in the X direction (insertion amount into fly-eye lens 11c) and the Z direction are controlled according to a control signal Sigc1 transmitted from control unit 50 to dimming member holding unit 9c1.

[0039] Light reducing members 10c2a and 10c2b, whose width in the Y direction is width W2, are held by a slider 9c20 that is a part of light reducing member holding unit 9c2, and are movable in the X direction and Z direction independently of light reducing members 10c1a and 10c1b. The positions of light reducing members 10c2a and 10c2b in the X direction and the Z direction are controlled according to a control signal Sigc2 transmitted from control unit 50 to light reducing member holding unit 9c2. The relative positional relationship between the slider 9c10 and the main body of light reducing member holding unit 9c1, and the relative positional relationship between the slider 9c20 and the main body of light reducing member holding unit 9c2 are measured by an encoder or the like.

[0040] As an example, the width W1 of the light-reducing members 10c1a and 10c1b is slightly larger than the above-mentioned width IWs, and the width W2 is slightly smaller than the above-mentioned width IWs, but the widths W1 and W2 are approximately the same as the width IWs. Therefore, by disposing the light-reducing members 10c1a and 10c1b to cover a portion corresponding to the central region PIcc of the exposure field PIc in the exposure field corresponding region IPIc of some lens elements 110, the amount of exposure of the non-overlapped portion Sc on the substrate 22 can be reduced.

[0041] Moreover, by moving slider 9c10 in the X direction, it is possible to change the number of lens elements 110 covered by light reducing members 10c1a, 10c1b and the ratio of the light-shielded portion within one lens element 110. This makes it possible to variably reduce the illuminance of the central region PIcc of the exposure field of view PIc substantially continuously relative to the illuminance of the left edge region PIcl and the right edge region PIcr. The same effect can be obtained by moving the slider 9c20 in the X direction and thereby moving the light reducing members 10c2a and 10c2b in the X direction.

[0042] Therefore, light reducing members 10c (10c1a, 10c1b, 10c2a, 10c2b) can be interpreted as illuminance changing members that reduce the amount of exposure light to non-overlapping portions Sc on substrate 22 relative to the amount of exposure light to overlapping portions. The light-reducing member 10c may be a thin metal plate or a light-shielding film formed of a light-reducing member on a transparent glass plate. The light-reducing member 10c is not limited to a member that completely blocks the illumination light, such as a metal plate, and may be a member that blocks or transmits only a part of the illumination light. In other words, the light-reducing member 10c may be an illuminance changing member that changes the illuminance. The light attenuating members 10a to 10e and light attenuating member holders 9a to 9e included in the other illumination optical systems ILa to ILe have the same structures as the light attenuating member 10c and light attenuating member holder 9c described above.

[0043] FIG. 7 is a diagram for explaining the result when a pattern is exposed and transferred using a non-additive photosensitive material in the exposure apparatus 100 of the first embodiment equipped with light reducing members 10c to 10e. FIG. 7(a) shows each of the exposure fields PIa to PIe on the substrate 22, similar to FIG. 5(a). Fig. 7(b) is a graph showing the exposure amount E exposed on the substrate 22 by scanning exposure in the X direction, similar to Fig. 5(c). In the case shown in Fig. 7(b), the light attenuating members 10a-10e are inserted into the entrance planes of the fly-eye lenses 11a-11e by the light attenuating member holding members 9a-9e. Therefore, the exposure amount E2 of the non-overlapping portions Sa-Se exposed by one of the scanning exposure fields SIa-SIe is smaller than the exposure amount E3 at the center position in the Y direction of the overlapping portions Oa-Od exposed by two of the scanning exposure fields SIa-SIe overlapping each other.

[0044] Fig. 7(c) is a graph showing the effective photosensitivity EE generated in the non-additive photosensitive material by the exposure shown in Fig. 7(b). By reducing the exposure amount E2 of the non-overlapping parts Sa-Se that are exposed without being divided in time, compared with the exposure amount E3 of the overlapping parts Oa-Od that are exposed in a divided manner in time, the non-additive characteristic of the non-additive photosensitive material is offset, and the effective photosensitivity EE can be made to be a substantially constant value EE2. This makes it possible to prevent changes in the line width and thickness of the transferred pattern between the overlapping portions Oa-Od and the non-overlapping portions Sa-Se, even when a pattern is exposed and transferred using a non-additive photosensitive material.

[0045] Since the light attenuating member 10c is disposed at a position a predetermined distance away from the incident surface of the fly-eye lens 11c in the Z direction, the edges of the light attenuating member 10c in the XY direction are projected in a blurred manner on the incident surface of the fly-eye lens 11c. In other words, how far the light attenuating member 10c should be disposed from the incident surface of the fly-eye lens 11c in the Z direction can be determined based on the lateral magnification between the incident surface of the fly-eye lens 11c and the substrate 22, which are parameters that determine the amount of penumbra of the edge of the light attenuating member 10c on the substrate 22, and the numerical aperture of the illumination light on the incident surface of the fly-eye lens 11c.

[0046] As an example, when the width of the overlapping portions Oa to Od in the Y direction is DW, the lateral magnification of the substrate 22 with respect to the incident surface of the fly-eye lens 11c is β, and the numerical aperture of the illumination light at the incident surface of the fly-eye lens 11c is NA, the distance D of the light reducing member 10c in the Z direction from the incident surface of the fly-eye lens 11c is It is recommended to set 0 ≦ D ≦ 1.2 × DW / (β NA) (1). When the distance D satisfies the formula (1), the influence of the change in the amount of exposure (unevenness in the amount of exposure) on the substrate 22 caused by the edge of the light reducing member 10c can be further reduced, and the amount of exposure in the overlapping portions Oa to Od can be prevented from decreasing more than necessary.

[0047] The non-additive characteristics of the non-additive photosensitive material are specific to each non-additive photosensitive material, and also vary depending on the time since the non-additive photosensitive material was formed on the substrate 22. Therefore, in order to accurately offset the non-additive characteristics of the non-additive photosensitive material to be exposed, it is necessary to accurately control the distribution of the exposure amount in the overlapping portions Oa to Od in accordance with the non-additive characteristics.

[0048] In the exposure apparatus 100 according to the first embodiment, as shown in FIG. 6, it includes two types of light attenuation members 10c1a and 10c1b having different widths in the Y direction, and light attenuation members 10c2a and 10c2b. Then, the control signals SigC1 and SigC2 from the control unit 50 control the positions in the X direction (the insertion amounts into the fly-eye lens 11c) of the light attenuation members 10c1a and 10c1b with width W1 and the light attenuation members 10c2a and 10c2b with width W2. Thereby, the distribution of the exposure amount in the overlap portions Oa to Od can be accurately controlled.

[0049] FIG. 8 is a diagram showing the exposure amount distributions Ea and Eb in the overlap portion Oc in the exposure apparatus 100 according to the first embodiment. The exposure amount distribution Ea shows the exposure amount in the overlap portion Oc when the light attenuation members 10c1a and 10c1b with width W1 are inserted on the incident surface side of the fly-eye lens 11c of the illumination optical system ILc and the fly-eye lens 11d of the illumination optical system ILd. The exposure amount distribution Eb shows the exposure amount in the overlap portion Oc when the light attenuation members 10c2a and 10c2b with width W2 are inserted on the incident surface side of the fly-eye lens 11c of the illumination optical system ILc and the fly-eye lens 11d of the illumination optical system ILd. Note that the +X direction ends of the light attenuation members 10c1a and 10c1b with width W1 are on the +X side relative to the +X direction ends of the light attenuation members 10c2a and 10c2b with width W2.

[0050] The light attenuation members 10c1a and 10c1b with width W1 (>W2) not only attenuate the exposure amount in the non-overlap portions Sc and Sd to the exposure amount E4, but also attenuate the exposure amounts at both ends of the overlap portion Oc. On the other hand, the light attenuation members 10c2a and 10c2b with width W2 (<W1) attenuate the exposure amount in the non-overlap portions Sc and Sd to the exposure amount E5, but do not attenuate the exposure amount in the overlap portion Oc. However, even when the light attenuation members 10c1a, 10c1b, 10c2a, and 10c2b are inserted, the exposure amount in the non-overlap portions Sc and Sd is attenuated, but the distribution of the exposure amount in the non-scanning direction is not changed. Therefore, in the exposure dose distribution Ea, the half-width Wa of the exposure dose increase Da in the overlap portion Oc is narrower than the half-width Wb of the exposure dose increase Db in the overlap portion Oc of the exposure dose distribution Eb.

[0051] The exposure distribution Ea shown in Fig. 8 is the exposure distribution when only the light attenuating members 10c1a and 10c1b of width W1 are inserted, and the exposure distribution Eb is the exposure distribution when only the light attenuating members 10c2a and 10c2b of width W2 are inserted. In practice, the light attenuating members 10c1a and 10c1b of width W1 and the light attenuating members 10c2a and 10c2b of width W2 can be inserted into the incident side of the fly-eye lenses 11c and 11d by any length. This allows the exposure apparatus 100 of the first embodiment to form a light amount distribution with a high degree of freedom in the overlapping portion Oc, which is obtained by interpolating or extrapolating the exposure distributions Ea and Eb.

[0052] In other words, in the above-described first embodiment, it can be interpreted that the effective width of the dimming member 10 in the Y direction is changed by controlling the insertion amount (position in the X direction) of the multiple dimming members 10c1a, 10c1b, 10c2a, and 10c2b having different widths (W1, W2) into the incident side surface of the fly-eye lens 11.

[0053] As described above, the amount of blurring of the edge of the light-reducing member 10c in the XY direction on the entrance surface of the fly-eye lens 11c can also be changed by moving the light-reducing member 10c in the direction of the optical axis IXc of the illumination optical systems ILc and ILd (the optical axis direction). When the distance (distance in the optical axis direction) between the light-reducing member 10c and the entrance surface of the fly-eye lens 11c in the Z direction is widened, the half-width of the increase in the amount of exposure Da in the overlapping portion O is widened, and when the distance is narrowed, the half-width can be narrowed. Therefore, the distribution of the amount of exposure in the overlapping portion Oc can also be adjusted by controlling the Z-direction positions (positions in the optical axis direction) of the light-reducing members 10c1a, 10c1b and the light-reducing members 10c2a, 10c2b in the illumination optical systems ILc and ILd. The positions of the light-reducing members 10c1a, 10c1b and the light-reducing members 10c2a, 10c2b in the optical axis direction can be controlled by the control signals SigC and SigD from the control unit 50, respectively. 8, in the exposure distribution Eb in which only the attenuating members 10c2a and 10c2b of width W2 are inserted, the half-width Wb can be made closer to the half-width Wa by narrowing the Z-directional interval between the attenuating members 10c2a and 10c2b and the fly-eye lens 11c. This makes it possible to change the half-width Wb so as to be closer to the half-width Wa without changing the exposure in the overlapping portion O. Similarly, in the exposure distribution Ea in which only the attenuating members 10c1a and 10c1b of width W1 are inserted, the half-width Wa can be made closer to the half-width Wb by widening the Z-directional interval between the attenuating members 10c1a and 10c1b and the fly-eye lens 11c.

[0054] As described above, it has been explained that the amount of blurring of the edges of the light-reducing members 10c in the XY directions on the entrance surface of the fly-eye lens 11c can be changed by controlling the positions of the light-reducing members 10c1a, 10c1b and the light-reducing members 10c2a, 10c2b in the optical axis direction by the control signals SigC and SigD from the control unit 50. In this way, if the Z-directional interval of the light-reducing members 10c on the entrance surface of the fly-eye lens 11c is changed, the amount of exposure of the non-scanning direction ends of the non-overlapped parts Sc and Sd in the non-overlapped parts Sc and Sd may not be approximately equal to the amount of exposure near the center due to the amount of blurring. In this case, by changing the width of the light-reducing members 10c and 10d, the amount of exposure of the non-scanning direction ends of the non-overlapped parts Sc and Sd can be made approximately equal to the amount of exposure near the center.

[0055] The relationship between the effective photosensitivity and the cumulative exposure of the non-additive photosensitive material for the exposure divided in time varies depending on each non-additive photosensitive material. Therefore, before performing actual exposure on a specific non-additive photosensitive material, it is recommended to perform test exposure under multiple conditions in which the insertion amount (position in the X direction) of the light-reducing members 10c1a, 10c1b and the light-reducing members 10c2a, 10c2b is set to several different levels. Then, it is recommended to determine the optimal insertion amount of the light-reducing members 10c1a, 10c1b and the light-reducing members 10c2a, 10c2b from the results of the test exposure. Furthermore, when determining the insertion amount of the light reducing member 10c, it is advisable to use the illuminance sensor 26 provided on the substrate stage 27 while measuring the illuminance in the central area PIcc, the left edge area PIcl, and the right edge area PIcr within the exposure field of view PIc.

[0056] 6, the ends in the +X direction of the two light-reducing members 10c1a and 10c1b with the width W1 are shifted by half the pitch PX of the arrangement of the lens elements 110 of the fly-eye lens 11c in the X direction. The same is true for the two light-reducing members 10c2a and 10c2b with the width W2. As described above, in each lens element 110, there is an exposure field corresponding area IPIcw corresponding to the exposure field PIc, but the exposure field corresponding area IPIcw does not extend over the entire surface of the lens element 110 in the X direction. In other words, both ends in the X direction of the lens element 110 do not correspond to the exposure field PIc on the substrate 22, but are projected onto the field stop 21c in the projection optical system 19c and are blocked by the field stop 21c.

[0057] Therefore, for example, if the +X-direction ends of light attenuating member 10c1a are near both ends of lens element 110 in the X direction, the amount of exposure on substrate 22 cannot be changed even if light attenuating member 10c1a is moved in the X direction. Therefore, in the first embodiment, the +X direction ends of the two light reducing members 10c1a and 10c1b and the two light reducing members 10c2a and 10c2b are shifted by half the pitch PX of the arrangement of the lens elements 110 in the X direction.

[0058] With this arrangement, when the +X direction end of one of the two attenuating members 10c1a, 10c1b is located near both ends of the lens element 110 in the X direction, the +X direction end of the other is located near the center of the lens element 110 in the X direction. Therefore, by moving both of the two attenuating members 10c1a, 10c1b in the X direction, the exposure amount on the substrate 22 can be constantly changed. Note that the two attenuating members 10c1a, 10c1b may be configured to be moved independently in the X direction. The same applies to the two attenuating members 10c2a, 10c2b.

[0059] The number of light-reducing members 10c1a and 10c1b is not limited to two, but may be three or more, and each may be arranged in a different lens block. Even in this case, if the number of light-reducing members is m (m is a natural number of 2 or more), it is preferable that the end of each light-reducing member in the +X direction is shifted by PX / m with respect to the pitch PX.

[0060] Although the light-reducing members 10c (10c1a, 10c1b, 10c2a, 10c2b) are arranged at a position a predetermined distance away from the incident surface of the fly-eye lens 11c in the Z direction, this is not limiting. The light-reducing members 10c may be provided on the incident surface of the fly-eye lens 11c, that is, on the conjugate plane CP with respect to the upper surface of the substrate 22. If the light-reducing members 10c completely block the illumination light, there is a risk that the exposure amount of the overlapping parts Oa to Od and the exposure amount of the non-overlapping parts Sa to Se will change discontinuously when the light-reducing members 10c are arranged in agreement with the conjugate plane CP. Therefore, in this case, it is preferable that the light-reducing members 10c are deformed in shape or are such that the light-blocking rate of the illumination light changes continuously according to the position in the Y direction as in a filter.

[0061] (Variation 1) 9 is a view of the dimming member 10c and dimming member holding portion 9c of the modified example 1 as viewed from the input lens 8c side. The dimming member 10c and dimming member holding portion 9c of the modified example 1 are almost similar to the dimming member 10c and dimming member holding portion 9c in the above-mentioned first embodiment. Therefore, the same members are given the same reference numerals, and only the differences will be described below.

[0062] In the first modified example, of the dimming members 10c (10c1a, 10c1b, 10c2a, 10c2b), dimming members 10c1a and 10c1b are disposed on the -X side of the fly-eye lens 11c, and dimming members 10c2a and 10c2b are disposed on the +X side of the fly-eye lens 11c. Accordingly, dimming member holder 9c1 is also disposed on the -X side of the fly-eye lens 11c, and dimming member holder 9c2 is disposed on the +X side of the fly-eye lens 11c.

[0063] If only lens element 110 arranged near the end of fly-eye lens 11c on the -X side is dimmed by dimming members 10c1a and 10c1b, there is a risk of variation in the so-called illumination telecenter (the direction of the center of gravity of the light amount of the incident illumination light) on substrate 22. In Modification 1, lens element 110 near the end of fly-eye lens 11c on the -X side is dimmed by dimming members 10c1a and 10c1b, while lens element 110 near the end on the +X side is dimmed by dimming members 10c2a and 10c2b. This balances the light amount distribution in the X direction of the illumination light on the incident surface of the fly-eye lens 11c, making it possible to suppress fluctuations in the illumination telecentricity.

[0064] (Variation 2) Fig. 10(a) is a diagram (top view) of the dimming member 10c (10c3a, 10c4a, 10c3b, 10c4b) and dimming member holding portion 9c (9c3, 9c4) of the modified example 2, as viewed from the input lens side 8c. Fig. 10(b) is a side view of the dimming member 10c and dimming member holding portion 9c of the modified example 2. In the following, the same members as those in the above-mentioned first embodiment are given the same reference numerals, and only the differences will be described below.

[0065] The light-attenuating member 10c of the second modification includes a set of two light-attenuating members 10c3a and 10c4a, and a set of two light-attenuating members 10c3b and 10c4b, whose Y-direction ends are arranged overlapping in the Z direction (the direction of the optical axis IXc of the illumination optical system IL9). The light-attenuating members 10c3a and 10c3b are held by a light-attenuating member holder 9c3 via a slider 9c30 so as to be movable in the X, Z, and Y directions. Similarly, the light-attenuating members 10c4a and 10c4b are held by a light-attenuating member holder 9c4 via a slider 9c40 so as to be movable in the X, Z, and Y directions.

[0066] 10(b), the width W3 in the Y direction of the pair of two attenuation members 10c3a and 10c4a as a whole increases when the slider 9c30 that holds them moves in the +Y direction and the slider 9c40 moves in the -Y direction. On the other hand, the width W3 decreases when the slider 9c30 moves in the -Y direction and the slider 9c40 moves in the +Y direction. Therefore, in the light attenuating member 10c of the second modification, the substantial width W3 (effective width) in the Y direction can be made variable. This makes it possible to control the distribution of the exposure amount in the overlapping parts Oa to Od. The width W3 can be set by controlling the light attenuating member holding parts 9c3 and 9c4 with the control signals SigC3 and SigC4 from the control unit 50.

[0067] In the second modification, the control unit 50 can also control the light reducing member 10c in the Z direction via the positions of the slider 9c30 and the slider 9c40. Control unit 50 controls the positions of sliders 9c30 and 9c40 in the X direction so that the positions of the ends of dimming members 10c3a and 10c4a in the +X direction coincide with each other, and so that the positions of the ends of dimming members 10c3b and 10c4b in the +X direction coincide with each other.

[0068] (Variation 3) 11 is a view of the dimming member 10c and the dimming member holding portion 9c of the modified example 3 as viewed from the input lens side 8c. The dimming member 10c and the dimming member holding portion 9c of the modified example 3 are almost similar to the dimming member 10c and the dimming member holding portion 9c of the modified example 1 described above. Therefore, the same members are given the same reference numerals, and only the differences will be described below. Note that Figure 11 shows only the members corresponding to dimming members 10c1a and 10c1b and dimming member holding part 9c1, which are arranged on the -X side of fly-eye lens 11c, among dimming member 10c and dimming member holding part 9c of variant example 3 shown in Figure 9.

[0069] In the third modification, the width W10 in the Y direction of the light reducing members 10c1a and 10c1b varies depending on the position in the X direction within the light reducing members 10c1a and 10c1b. As an example, the width W10 monotonically decreases depending on the position in the X direction. Therefore, when dimming members 10c1a and 10c1b cover multiple lens elements 110 arranged in the X direction in fly-eye lens 11c, the width in the Y direction of the dimmed portion differs for each lens element 110. Moreover, even within one lens element 110, the width in the Y direction of the dimmed portion differs between the +X direction end and the -X direction end.

[0070] As a result, the amount of penumbra blur caused by the edges in the Y direction of the light-reducing members 10c1a and 10c1b on the substrate 22 that has been scan-exposed in the X direction can be further increased, and the change in the amount of exposure caused by the penumbra blur can be made gentler. The width W10 of the light reducing members 10c1a and 10c1b in the Y direction may increase monotonically depending on the position in the X direction.

[0071] In addition, in the third modification, the Y-direction widths of the light attenuating members 10c2a and 10c2b arranged on the +X side of the fly-eye lens 11c in the first modification shown in Fig. 9 may also be changed according to the X-direction position within the light attenuating members 10c2a and 10c2b. Furthermore, the rate of change in the Y-direction width relative to the change in the X-direction position may be made different between the light attenuating members 10c2a and 10c2b and the light attenuating members 10c2a and 10c2b. Also, in the light reducing members 10c3a, 10c4a, 10c3b, and 10c4b of the above-described second modification, the width in the W direction may change depending on the position in the X direction.

[0072] (Variation 4) 12 is a view of the dimming member 10c (10c1a, 10c1b) and dimming member holding portion 9c of Modification 4 as viewed from the input lens side 8c. The dimming member 10c and dimming member holding portion 9c of Modification 4 are almost similar to the dimming member 10c and dimming member holding portion 9c of Modification 3 described above. Therefore, the same members are denoted by the same reference numerals, and only the differences will be described below.

[0073] The light attenuating members 10c1a and 10c1b of the fourth modification have their Y-direction widths W20 increased or decreased according to the X-direction positions within the light attenuating members 10c1a and 10c1b. Therefore, similar to the third modification described above, the amount of penumbra blur caused by the Y-direction edges of the light attenuating members 10c1a and 10c1b on the substrate 22 subjected to scanning exposure in the X direction can be further increased, and the change in the amount of exposure caused by the penumbra blur can be made gentler.

[0074] The increase or decrease in the Y-direction width W20 according to the position in the X-direction within the light-reducing members 10c1a and 10c1b may be changed periodically according to a period P1, for example. Moreover, the period P1 may be shorter than the pitch PX of the arrangement of the lens elements 110 of the fly-eye lens 11c in the X-direction. The light reducing members 10c1a and 10c1b of the fourth modification, whose width W20 in the Y direction increases and decreases depending on the position in the X direction, may be applied to the light reducing members 10a to 10e of the second or third modification described above.

[0075] In the above first embodiment and each modified example, the exposure apparatus 100 has five projection optical systems 19a to 19e, but the number of projection optical systems is not limited to five and may be any number, such as three or eight. In addition, in the above first embodiment and each modified example, there are multiple projection optical systems 19a-19e, and by scanning once in the X direction, multiple scanning exposure fields SIa-SIe formed by each projection optical system overlap each other in the Y direction.

[0076] However, there may be only one projection optical system 19, and scanning exposure of the substrate 22 in the X direction may be performed multiple times while moving the substrate 22 and the mask 15 in the Y direction, so that multiple exposure fields formed by each scanning exposure overlap each other in the Y direction. Even in this case, it is preferable that the illumination optical system IL corresponding to one projection optical system 19 has a configuration similar to that of the above-mentioned illumination optical systems ILa to ILe. Incidentally, an apparatus having a plurality of projection optical systems 19a to 19e as in the first embodiment described above can expose a larger area on the substrate 22 in one scanning exposure, and has excellent processing capacity.

[0077] In the above first embodiment and each of the modified examples, the plurality of projection optical systems 19a to 19e are all-refractive optical systems, but the present invention is not limited to this, and it is also possible to adopt catadioptric systems or all-reflection optical systems. Furthermore, in the above first embodiment and each of the modified examples, the shape of the exposure fields PIa to PIe is a trapezoid, but this is not limited to a trapezoid, and for example, the shape of the part corresponding to the central portion may be an arc, and the field may have triangular right and left end regions at both ends of the arc.

[0078] In the above first embodiment and each of the modified examples, the optical axes PAXa to PAXe of the projection optical systems 19a to 19e and the optical axes IXa to IXe of the illumination optical systems ILa to ILe are basically set parallel to the Z direction. However, if a bending mirror is used in any of the optical systems, the orientation of the optical axis will not be parallel to the Z direction. Furthermore, if a bending mirror is used in any of the optical systems, the movement direction of the light-reducing members 10a-10e will also be different from the scanning direction (X direction) of the substrate 22. However, even in this case, the light-reducing members 10a-10e only need to be movable in a direction (first direction) optically corresponding to the scanning direction of the substrate 22 based on the conjugate relationship between the substrate 22 including the bending mirror and the fly-eye lenses 11a-11e. Furthermore, the light-reducing members 10a-10e only need to be movable in a total of three directions, namely, the direction of the optical axis IX of the illumination optical system IL and a direction perpendicular to the first direction and the direction of the optical axis IX.

[0079] In addition, in the above embodiment, each of the projection optical systems 19a to 19e is arranged in two rows in the X direction, that is, the first row of projection optical system 19F and the second row of projection optical system 19R. However, this is not limited to two rows, and three or more rows of optical systems may be arranged in the X direction.

[0080] As the optical integrator, a rod integrator can be used instead of the above-mentioned fly-eye lens 11. When a rod integrator is used, the conjugate plane CP between the substrate 22 and the mask 15 is on the exit side (the mask 15 side) of the rod integrator, so the light-reducing member 10 is also placed near the exit side of the rod integrator. Then, the configuration is such that the vicinity of one end on the X side of the exit surface of the rod integrator is partially attenuated.

[0081] Instead of arranging the light-attenuating members 10a-10e inside the illumination optical systems ILa-ILe, they may be arranged near the intermediate image plane 20 of the projection optical systems 19a-19e. In this case as well, the light-attenuating members are configured to attenuate the portions corresponding to the central regions PIac-PIec of the exposure fields PIa-PIe in the vicinity of the intermediate image plane 20.

[0082] Instead of placing field stops 21a-21e in the projection optical systems 19a-19e, an intermediate image plane (a conjugate plane with respect to the mask 15) may be provided inside the illumination optical systems ILa-ILe, and a field stop that determines the shape of the exposure fields PIa-PIe on the substrate 22 may be provided at the intermediate image plane in the illumination optical systems ILa-ILe.

[0083] In the above embodiment, the projection optical systems 19a-19e and the illumination optical systems ILa-ILe are fixed, and the substrate 22 is moved by the substrate stage 27. Alternatively, however, the projection optical systems 19a-19e and the illumination optical systems ILa-ILe may be provided on the substrate stage and scanned relative to the substrate 22. Furthermore, the mask 15 is not limited to a mask in which a pattern is formed on a glass substrate, but may be a variable shaping mask made of a digital multi-mirror device or a liquid crystal device.

[0084] The exposure apparatus 100 can be used as an exposure apparatus for liquid crystals that transfers a liquid crystal display element pattern onto a glass plate, and can also be used as an exposure apparatus for manufacturing organic EL (Electro-Luminescence) panels, for example. The exposure apparatus can also be used as an exposure apparatus that transfers a circuit pattern onto a glass substrate or silicon wafer to manufacture masks or reticles used in light exposure apparatuses, EUV exposure apparatuses, X-ray exposure apparatuses, electron beam exposure apparatuses, and the like, in addition to microdevices such as semiconductor elements. The substrate (glass plate or the like) exposed by the exposure apparatus 100 is developed by a developing apparatus (not shown), and, if necessary, etching or the like is performed based on the pattern of the photosensitive material formed by the exposure and development processes.

[0085] Moreover, the object to be exposed is not limited to a glass substrate, but may be other objects such as a wafer, a ceramic substrate, a film member, or a mask blank. When the object to be exposed is a substrate for a flat panel display, the thickness of the substrate is not particularly limited, and may be, for example, a film-like member (a flexible sheet-like member). The exposure apparatus of this embodiment is particularly effective when the object to be exposed is a substrate having a side length or a diagonal length of 500 mm or more. When the substrate to be exposed is a flexible sheet-like member, the sheet may be formed in a roll shape.

[0086] According to the above-described first embodiment and the modified example, the following advantageous effects can be obtained. (1) The exposure apparatus 100 of the first embodiment or the modified example performs a first exposure to expose first exposure areas SIa, SIc, and SIe on the exposed substrate 22 in a first time while moving the exposed substrate 22 in the scanning direction (X direction), and a second exposure to expose second exposure areas SIb and SId on the exposed substrate 22 in a second time different from the first time while moving the exposed substrate 22 in the scanning direction. In this exposure apparatus, the illumination light includes fly-eye lenses 11a to 11e having a plurality of lens elements 110. The projection optical system includes optical systems ILa-ILe, projection optical systems 19a-19e, and illuminance changing members 10a-10d that cover the area through which the illumination light that exposes the first area passes on the incident side of the fly's eye lens so that the illuminance of the illumination light that exposes the first area (non-overlapping areas Sa--Se), which is the area other than the first exposure area and the second exposure area, is relatively lower than the illuminance of the illumination light that exposes the second area (overlapping areas Oa--Od) where a portion of the first exposure area and the second exposure area overlap. Furthermore, a control unit 50 is provided which controls the relative movement of the illuminance changing members 10a-10d with respect to the multiple lens elements 110, and the relative movement changes the area covered by the illuminance changing members 10a-10e, and the relative movement changes the exposure dose distribution of the second area in the non-scanning direction (Y direction) perpendicular to the scanning direction while maintaining the exposure dose distribution of the first area in the non-scanning direction. With this configuration, even when a pattern is exposed and transferred using a non-additive photosensitive material in which the effective amount of light exposure is lower when exposure is divided into multiple parts over time compared to when exposure is performed continuously over time, it is possible to prevent changes in the line width and thickness of the transferred pattern between the second region (overlap portions Oa- to Od) and the first region (non-overlap portions Sa to Se).

[0087] (2) The exposure apparatus 100 of the first embodiment or the modified example includes illumination optical systems ILa-ILe having fly-eye lenses 11a-11e each having a plurality of lens elements 110 and supplying illumination light, projection optical systems 19a-19e, a substrate stage 27 which moves the exposed substrate 22 relatively to the projection optical system in the scanning direction (X direction) so that a predetermined pattern is exposed on the exposed substrate 22, illuminance changing members 10a-10e which cover an area through which illumination light exposing a second area passes on the incident side of the fly-eye lens so that an exposure amount in a first area (non-overlap portions Sa--Se) on the exposed substrate 22 which is exposed continuously in time by the scanning exposure fields SIa--SIe of the projection optical system is smaller than an exposure amount in a second area (overlap portions Oa--Od) on the exposed substrate which is exposed discretely in time by the scanning exposure fields, and a control unit 50 which controls the relative movement of the illuminance changing member with respect to the plurality of lens elements 110. The relative movement changes the area covered by the illuminance changing member, and the relative movement changes the exposure dose distribution of the second area (overlap area Oa- to Od) in the non-scanning direction (Y direction) perpendicular to the scanning direction, while maintaining the exposure dose distribution of the first area (non-overlap area Sa- to Se) in the non-scanning direction. With this configuration, even when a pattern is exposed and transferred using a non-additive photosensitive material in which the effective amount of light exposure is lower when exposure is divided into multiple parts over time compared to when exposure is performed continuously over time, it is possible to prevent changes in the line width and thickness of the transferred pattern between the second region (overlap portions Oa- to Od) and the first region (non-overlap portions Sa to Se).

[0088] (3) By arranging the illuminance changing members 10a-10e at or near the conjugate plane CP of the exposed substrate 22 in the illumination optical systems ILa-ILe, the exposure amount of the first region (non-overlap portions Sa-Se) and the exposure amount of the second region (overlap portions Oa-Od) can be accurately controlled. (4) The control unit 50 controls the effective width of the illuminance changing members 10a-10 in the first direction and in the second direction perpendicular to the optical axis direction of the illumination optical system, and changes the size of the area covered, thereby enabling the exposure dose distribution in the non-scanning direction of the second area to be controlled with high precision.

[0089] Although various embodiments and modifications have been described above, the present invention is not limited to these. Each embodiment and modification may be applied alone or in combination. Other aspects that are conceivable within the scope of the technical concept of the present invention are also included in the scope of the present invention.

[0090] The disclosures of the following priority applications are incorporated herein by reference: Japan Patent Application No. 2019-069149 (filed March 29, 2019) [Explanation of symbols]

[0091] 100: exposure apparatus, 1: light source, ILa to ILe: illumination optical system, 10a to 10e: light attenuation member (illuminance changing member), 11a to 11e: fly-eye lens, 12a to 12e: condenser lens, 15: mask, MIa to MIe: illumination field, 19a to 19e: projection optical system, 21a to 21e: field stop, 22: substrate, SIa to SIe: scanning exposure field, Sa to Se: non-overlap portion (first region), Oa to Od: overlap portion (second region), 50: control unit

Claims

1. An exposure apparatus that exposes a substrate while moving the substrate in a scanning direction, comprising: an illumination optical system for illuminating the mask; a projection optical system that irradiates the substrate with light from the mask, The illumination optical system includes: a fly-eye lens including a plurality of lens elements; a light-attenuating member that overlaps with a portion of the fly-eye lens in the optical axis direction on the incident surface side of the fly-eye lens and attenuates at least a portion of the light incident on the fly-eye lens; a holder for holding the light reducing member; the holding unit moves the light attenuation member in a second direction that is a direction optically corresponding to the scanning direction on the substrate with respect to an incident surface of the fly-eye lens, thereby changing the number of lens elements whose centers in a first direction perpendicular to the second direction overlap with the light attenuation member, among the plurality of lens elements; the light reducing member is capable of changing a size of an overlap with the fly's eye lens in the first direction to a desired size, Each of the first direction and the second direction intersects with the optical axis direction. Exposure equipment.

2. A stage that moves the substrate in the scanning direction, the illumination optical system or the projection optical system includes a stop that sets an illumination area on the substrate by the attenuated light, at a position optically conjugate with the mask; the irradiation area includes an end area including an end of the irradiation area in a non-scanning direction perpendicular to the scanning direction, and a central area including a center of the irradiation area in the non-scanning direction, the stage moves the substrate such that the edge region exposes the exposure region on the substrate multiple times; 2. The exposure apparatus according to claim 1.

3. The entrance surfaces of the lens elements are located at positions optically conjugate with the substrate, the entrance surface of at least one lens element of the plurality of lens elements includes a first region corresponding to the end region and a second region corresponding to the central region; The holding unit controls the light reducing member so that a size of an overlap between the first region and the light reducing member in the first direction is changed. The exposure apparatus according to claim 2 .

4. The control changes the illuminance distribution or the exposure amount distribution in the edge region.

4. The exposure apparatus according to claim 3.

5. The entrance surface of the fly-eye lens is located at a position optically conjugate with the substrate.

2. The exposure apparatus according to claim 1.

6. The illumination optical system includes: an aperture that sets an illumination area on the substrate by the attenuated light and is located at a position conjugate with the mask.

2. The exposure apparatus according to claim 1.

7. the attenuating member includes a first attenuating member and a second attenuating member overlapping each other, the holding portion moves one of the first light attenuating member and the second light attenuating member relative to the other such that an overlap between the first light attenuating member and the second light attenuating member in the first direction changes. The exposure apparatus according to any one of claims 1 to 6.

8. the holding unit moves the light reducing member in accordance with a signal transmitted to the holding unit so that a distance between the light reducing member and the fly's eye lens in the optical axis direction changes. The exposure apparatus according to any one of claims 1 to 6.

9. the light-attenuating member includes a first light-attenuating member and a second light-attenuating member having different widths in the first direction, the holding portion selectively moves the first light attenuating member and the second light attenuating member in the second direction so that the number of the plurality of lens elements overlapping with the first light attenuating member changes, or so that the number of the plurality of lens elements overlapping with the second light attenuating member changes. The exposure apparatus according to any one of claims 1 to 6.

10. The holding unit includes a first holding member that moves the first light attenuating member in the second direction in accordance with a first control signal, and a second holding member that moves the second light attenuating member in the second direction in accordance with a second control signal different from the first control signal. The exposure apparatus according to claim 9.

11. The first light-attenuating member and the second light-attenuating member are aligned in the first direction. The exposure apparatus according to claim 9.

12. The first light-attenuating member and the second light-attenuating member are aligned in the second direction. The exposure apparatus according to claim 9.

13. An exposure apparatus for exposing a substrate to light while moving the substrate in a scanning direction, comprising: an illumination optical system for illuminating the mask; a projection optical system that irradiates the substrate with light from the mask, The illumination optical system includes: a fly-eye lens including a plurality of lens elements; a light-attenuating member that overlaps with a portion of the fly-eye lens in the optical axis direction on the incident surface side of the fly-eye lens and attenuates at least a portion of the light incident on the fly-eye lens; a holder for holding the light reducing member; the attenuating member includes a first attenuating member and a second attenuating member overlapping each other, the holding unit moves the light attenuating member in a second direction that is a direction optically corresponding to the scanning direction on the substrate with respect to an incident surface of the fly's eye lens to change the number of lens elements, among the plurality of lens elements, whose centers in a first direction perpendicular to the second direction overlap with the light attenuating member, and moves one of the first light attenuating member and the second light attenuating member in the first direction relative to the other so as to change an overlap between the first light attenuating member and the second light attenuating member in the first direction; Each of the first direction and the second direction intersects with the optical axis direction. Exposure equipment.

14. An exposure apparatus for exposing a substrate to light while moving the substrate in a scanning direction, comprising: an illumination optical system for illuminating the mask; a projection optical system that irradiates the substrate with light from the mask, The illumination optical system includes: a fly-eye lens including a plurality of lens elements; a light-attenuating member that overlaps with a portion of the fly-eye lens in the optical axis direction on the incident surface side of the fly-eye lens and attenuates at least a portion of the light incident on the fly-eye lens; a holder for holding the light reducing member; the holding unit moves the light attenuating member in a second direction that is a direction optically corresponding to the scanning direction on the substrate with respect to an incident surface of the fly's eye lens, thereby changing the number of lens elements whose centers in a first direction perpendicular to the second direction overlap with the light attenuating member, among the plurality of lens elements; and moves the light attenuating member in accordance with a signal transmitted to the holding unit so as to change a distance between the light attenuating member and the fly's eye lens in the optical axis direction; Each of the first direction and the second direction intersects with the optical axis direction. Exposure equipment.

15. An exposure apparatus for exposing a substrate to light while moving the substrate in a scanning direction, comprising: an illumination optical system for illuminating the mask; a projection optical system that irradiates the substrate with light from the mask, The illumination optical system includes: a fly-eye lens including a plurality of lens elements; a light-attenuating member that overlaps with a portion of the fly-eye lens in the optical axis direction on the incident surface side of the fly-eye lens and attenuates at least a portion of the light incident on the fly-eye lens; a holder that holds the light attenuating member and moves the light attenuating member in a second direction that is a direction optically corresponding to the scanning direction on the substrate with respect to an incident surface of the fly's eye lens, thereby changing the number of lens elements whose centers in a first direction perpendicular to the second direction overlap with the light attenuating member, among the plurality of lens elements; the light-attenuating member includes a first light-attenuating member and a second light-attenuating member having different widths in the first direction, the holding portion selectively moves the first light attenuating member and the second light attenuating member in the second direction so that a number of the plurality of lens elements overlapping the first light attenuating member changes, or so that a number of the plurality of lens elements overlapping the second light attenuating member changes, Each of the first direction and the second direction intersects with the optical axis direction. Exposure equipment.

16. A stage that moves the substrate in the scanning direction, the illumination optical system or the projection optical system includes a stop that sets an illumination area on the substrate by the attenuated light, at a position optically conjugate with the mask; the irradiation area includes an end area including an end of the irradiation area in a non-scanning direction perpendicular to the scanning direction, and a central area including a center of the irradiation area in the non-scanning direction, the stage moves the substrate such that the edge region exposes the exposure region on the substrate multiple times; The exposure apparatus according to any one of claims 13 to 15.

17. The entrance surfaces of the lens elements are located at positions optically conjugate with the substrate, the entrance surface of at least one lens element of the plurality of lens elements includes a first region corresponding to the end region and a second region corresponding to the central region; The holding unit controls the light reducing member so that a size of an overlap between the first region and the light reducing member in the first direction is changed. The exposure apparatus according to claim 16.

18. The control changes the illuminance distribution or the exposure amount distribution in the edge region. The exposure apparatus according to claim 17.

19. The entrance surface of the fly-eye lens is located at a position optically conjugate with the substrate. The exposure apparatus according to any one of claims 13 to 15.

20. The illumination optical system includes: an aperture that sets an illumination area on the substrate by the attenuated light and is located at a position conjugate with the mask, The exposure apparatus according to any one of claims 13 to 15.

21. An exposure apparatus for exposing a substrate to light while moving the substrate in a scanning direction, comprising: an illumination optical system for illuminating the mask; a projection optical system that irradiates the substrate with light from the mask; a stage that moves the substrate in the scanning direction; The illumination optical system includes: a fly-eye lens including a plurality of lens elements; a light-attenuating member that overlaps with a portion of the fly-eye lens in the optical axis direction on the incident surface side of the fly-eye lens and attenuates at least a portion of the light incident on the fly-eye lens; a holder that holds the light attenuating member and moves the light attenuating member in a second direction that is a direction optically corresponding to the scanning direction on the substrate with respect to an incident surface of the fly's eye lens, thereby changing the number of lens elements whose centers in a first direction perpendicular to the second direction overlap with the light attenuating member, among the plurality of lens elements; the illumination optical system or the projection optical system includes a stop that sets an illumination area on the substrate by the attenuated light, at a position optically conjugate with the mask; the irradiation area includes an end area including an end of the irradiation area in a non-scanning direction perpendicular to the scanning direction, and a central area including a center of the irradiation area in the non-scanning direction, The entrance surfaces of the lens elements are located at positions optically conjugate with the substrate, the entrance surface of at least one lens element of the plurality of lens elements includes a first region corresponding to the end region and a second region corresponding to the central region; the stage moves the substrate such that an exposure area on the substrate is exposed multiple times by the edge area; the holding unit controls the light reducing member to be in either a first state in which the light reducing member overlaps the first region and the second region, or a second state in which the light reducing member does not overlap the first region but overlaps the second region, Each of the first direction and the second direction intersects with the optical axis direction. Exposure equipment.

22. The diaphragm is located in the illumination optical system. The exposure apparatus according to claim 21.

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