The application discloses a method for obtaining a graphitized in-situ antenna by
ablation of
a diamond surface and application thereof, and aims at solving problems of a current
microwave antenna, such as great interference from external factors and poor
system integration. The method for obtaining the graphitized in-situ antenna comprises the following steps: firstly, cleaning
a diamond substrate; secondly, spin-
coating a
photoresist on the surface of the cleaned
diamond substrate, performing photoetching according to an antenna pattern, and then immersing the
photoresist in a developing solution to form a
mask; opening a
radio frequency power supply to input energy of 50-100 W to ignite
plasma, and then opening a baffle to deposit a
transition metal film; and finally, placing the
diamond substrate into a
quartz glass tube to perform vacuum sealing, and performing high-temperature heating treatment. The application further relates to a method for obtaining a graphitized in-situ antenna by
laser ablation. The application obtains a graphitized antenna pattern by using a
transition metal high-temperature catalytic
etching or
laser ablation on the surface of the
diamond, and the antenna can better reduce interference from external factors and improve integration.