Vibration control devices and reaction force management systems

Abstract

To provide a vibration suppression device which can deal with an actuator which utilizes magnetic force.SOLUTION: A vibration suppression device (100) has: a base part (101) which is fastened to an object member (304); a damping member (102) provided at the base part; a housing (103) which is provided at the base part and formed with a suction port (107) which may supply a fluid; a support member (104) which is provided at the damping member at the opposite side of the base part; an elastic member (105) which connects the housing with the support member and changes rigidity according to a pressure of the fluid; a mass body (106) which is provided at the support member at the opposite side of the damping member; and a control unit (500) which controls the pressure of the fluid.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] The present invention relates to a vibration damping device and a reaction force processing system. [Background technology]

[0002] Exposure apparatuses have stages (wafer stage and reticle stage) that move and position a wafer or reticle at high speed, but when the stage is driven, a reaction force is generated due to the inertial force that accompanies acceleration and deceleration, and when this reaction force is transmitted to the base, it causes the base or floor to shake or vibrate. Therefore, Patent Document 1 discloses an optical lithography apparatus (reaction force processing system) that generates a compensating force that is equal in magnitude to and in the opposite direction to the generated reaction force.

[0003] On the other hand, a dynamic vibration absorber is known that includes a spring and a mass body whose natural frequency is the same as the problematic frequency, and the mass body absorbs the vibration of the object and vibrates instead, thereby reducing the vibration of the object. However, when there are multiple problematic frequencies, it is not possible to reduce the vibration of the object. Therefore, Patent Document 2 discloses a vibration isolation device that uses a magnetic elastomer to change the natural frequency. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Japanese Patent Application Publication No. 5-121294 [Patent Document 2] JP 2017-133639 A Summary of the Invention [Problem to be solved by the invention]

[0005] In the optical lithography apparatus disclosed in Patent Document 1, if the natural frequency of the apparatus that generates the compensation force is close to the frequency of the compensation force, vibrations will increase and the performance of the optical lithography apparatus may deteriorate. On the other hand, the vibration isolation device disclosed in Patent Document 2 changes the rigidity of the rubber by controlling the strength of the magnetic field, and therefore cannot be used with structures that generate magnetic flux, such as linear motors (actuators that use magnetic force).

[0006] SUMMARY OF THE PRESENT DISCLOSURE In view of the above, an object of the present invention is to provide a vibration suppression device, a reaction force processing system, a stage device, an exposure apparatus, a substrate processing apparatus, and a method for manufacturing an article, which are compatible with an actuator that utilizes magnetic force. [Means for solving the problem]

[0007] A vibration damping device according to one aspect of the present invention comprises: A vibration damping device for damping a target member, comprising: a mass body; , The above Target material arrangement A base portion to be attached to the base portion. a support member disposed on the support member and supporting the mass; The above A support member is disposed on the base so as to surround the support member. Housing and ,before Case The support member is disposed so as to form a space therein and applies a force to the support member. Elastic member Based on the vibration state of the target member, a fluid is supplied to the space, thereby and a control unit for controlling the pressure of the fluid.

[0008] Other objects and features of the present invention will be described in the following embodiments. Effect of the Invention

[0009] According to the present invention, it is possible to provide a vibration suppression device, a reaction force processing system, a stage apparatus, an exposure apparatus, a substrate processing apparatus, and a method for manufacturing an article, which are compatible with an actuator that utilizes magnetic force. [Brief description of the drawings]

[0010] [Figure 1] 1 is a cross-sectional view of a vibration damping device according to a first embodiment. [Diagram 2] FIG. 1 is an explanatory diagram of a vibration damping device according to a first embodiment. [Diagram 3] FIG. 2 is a configuration diagram of a reaction force processing system in each embodiment. [Figure 4] FIG. 4 is a block diagram of a control unit in each embodiment. [Diagram 5] FIG. 4 is a cross-sectional view of a vibration damping device according to a second embodiment. [Figure 6] FIG. 2 is a configuration diagram of an exposure apparatus equipped with a vibration damping device in each embodiment. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0011] Hereinafter, an embodiment of the present invention will be described in detail with reference to the drawings.

[0012] (First embodiment) First, the configuration of a vibration damping device (variable stiffness vibration damping device) 100 in a first embodiment of the present invention will be described with reference to Figures 1(a) and (b). Figure 1(a) is a cross-sectional view of the vibration damping device 100 in this embodiment. Figure 1(b) is a cross-sectional view taken along line AA in Figure 1(a), and shows a view seen from the vertical direction (Z direction in Figure 1(a)).

[0013] In the vibration damping device 100, the base 101 is fastened to a vibrating member to be damped (symmetric member). The base 101 is attached with a damping member 102. A support member 104 is provided on the damping member 102 on the side of the damping member 102 opposite to the base 101. A mass body 106 is provided on the other end of the support member 104 (the side of the support member 104 opposite to the damping member 102). The base 101 is fastened with a housing 103. One end of an elastic member 105 such as a diaphragm or bellofram is attached to the end of the support member 104 on the damping member 102 side. The other end of the elastic member 105 is attached to the housing 103. A hole 109 is formed in the housing 103, and an intake port 107 is provided for sucking compressed air into a space 110 formed by the elastic member 105 and the housing 103. A piping member 108 is inserted into the suction port 107 , and compressed air with controlled pressure can be supplied to a space 110 formed by the elastic member 105 and the housing 103 .

[0014] In this embodiment, the elastic member 105 connects the housing 103 and the support member 104, and its rigidity changes according to the pressure of the compressed air. The support member 104 is disposed between the elastic member 105 and the mass body 106 in the vertical direction, and its movement in the vertical direction is limited by the damping member 102.

[0015] 1(b), a circular hole 111 is formed in the housing 103. The support member 104 has a cylindrical shape (having a circular cross section when viewed from the vertical direction) and is disposed inside the hole 111. With this configuration, it is possible to prevent the effect of the vibration damping device 100 from having anisotropy.

[0016] Next, the operation of the vibration damping device 100 will be described with reference to Fig. 2. Fig. 2(a) and (b) are explanatory diagrams of the vibration damping device 100, with Fig. 2(a) showing a case where the support member 104 is located at the center and Fig. 2(b) showing a case where the support member 104 is located off-center.

[0017] It is known that the elastic member 105 has an automatic centripetal action. As shown in FIG. 2(a), when the support member 104 is located at the center, the elastic member 105 is in contact with the support member 104 on average (the depth of the groove formed by the elastic member 105 is constant). On the other hand, as shown in FIG. 2(b), when the mass body 106 and the support member 104 vibrate, the depth of the groove formed by the elastic member 105 becomes deeper when the width becomes narrower, and becomes shallower when the width becomes wider. At this time, a restoring force acts from the narrow side to the wide side of the groove, and the support member 104 is returned to the position of the center (center line C). The magnitude of this restoring force is proportional to the pressure of the gas (compressed air) supplied and the eccentricity of the support member 104, so the rigidity of the vibration damping device 100 can be controlled by controlling the pressure of the gas supplied.

[0018] The natural frequency (natural vibration frequency) of the vibration damping device 100 is determined based on the mass body 106 and the rigidity. For this reason, it is possible to control the natural frequency of the vibration damping device 100 by controlling the rigidity. This makes it possible to reduce the vibration of the object by having the mass body 106 absorb the vibration of the object and vibrate it instead.

[0019] Next, a reaction force processing system 310 equipped with the vibration damping device 100 in this embodiment will be described with reference to Figures 3(a) and (b). Figure 3(a) is a configuration diagram of an exposure apparatus 300 equipped with the reaction force processing system 310. Figure 3(b) is a detailed diagram of the reaction force processing system 310.

[0020] In the exposure apparatus 300, a projection optical system 301 is mounted on an upper frame 302. The upper frame 302 is connected to a lower frame 304 via pillar members 303. A base 401 having a running surface for a stage device 400 is mounted on the lower frame 304. The stage device 400 is placed so as to be movable on the running surface. A substrate 600 to be exposed is held by a chuck (not shown) provided on the stage device 400. In this configuration, the stage device 400 is moved in steps, and the pattern of an original (not shown) is exposed onto a plurality of exposure regions on the substrate via a projection optical system 301. In the exposure device 300, a vibration isolation table 306 is installed between a lower frame 304 and the floor so that external vibrations are not transmitted from the floor to the stage device 400.

[0021] The reaction force handling system 310 of the exposure apparatus 300 is attached to a base 305 fixed to the floor, and the other end is fixed to a base plate 401 via a linear motor (a thrust generating device that generates magnetism) described below. As shown in FIG. 3(b), the reaction force handling system 310 has a housing 311 fixed to a frame extending from the base 305, and a coil (not shown) is provided inside the housing 311. A magnet 312 is provided with a gap between the housing 311 and the housing 311. The magnet 312 is attached to the base plate 401 via a frame 313. The housing 311 and the magnet 312 that constitute the linear motor are not in mechanical contact with each other, and are configured so that vibrations of the floor are not transmitted to the lower frame 304 via the reaction force handling system 310.

[0022] The reaction force processing system 310 generates a compensation force that offsets the reaction force generated when the stage device 400 moves step by step. In this embodiment, the housing 311 equipped with the coil is attached to the base 305, and the magnet 312 is attached to the base 401, but this is not limited to the above, and the reverse configuration is also possible. In this embodiment, the reaction force processing system 310 is attached to the base 401, but it may be attached to the lower frame 304 or the pillar member 303.

[0023] In the reaction force processing system 310, the vibration damping device 100 is disposed on a structure fastened to a base plate 401. A piping member 108 is attached to the vibration damping device 100, and the piping member 108 is connected to a control unit 500. The control unit 500 controls (adjusts) the pressure of the compressed air.

[0024] Next, the control unit 500 of the vibration damping device 100 will be described with reference to Fig. 4. Fig. 4 is a block diagram of the control unit 500. The control unit 500 has a storage unit 501, a calculation unit 502, and a pressure adjustment unit 503. Note that in Fig. 4, the control unit 500 is shown as being provided separately from the vibration damping device 100, but the control unit 500 may constitute a part of the vibration damping device 100.

[0025] The memory unit 501 stores the position of the stage device 400 and a frequency map of the compensation force at each position. The calculation unit 502 determines the natural frequency (target frequency) of the vibration control device 100 based on the frequency map stored in the memory unit 501, and determines the supply pressure of the compressed air based on the target frequency. The pressure adjustment unit 503 controls the pressure of the compressed air and supplies it into the vibration control device 100 through the intake port 107. This makes it possible to match the natural frequency of the vibration control device 100 to the vibration frequency of the reaction force handling system 310 of the exposure apparatus 300, and to effectively attenuate the vibration of the reaction force handling system 310. As a result, it is possible to suppress the vibration of the lower frame 304 of the exposure apparatus 300 and improve the exposure performance.

[0026] That is, in this embodiment, preferably, the control unit 500 controls the pressure of the compressed air so as to change the natural frequency of the vibration damping device 100. More preferably, the control unit 500 determines the natural frequency of the vibration damping device 100 based on the frequency of the compensation force that cancels out the reaction force, and controls the pressure of the compressed air based on the natural frequency. More preferably, the control unit 500 determines the natural frequency of the vibration damping device 100 based on a frequency map of the compensation force stored in the storage unit 501.

[0027] In this embodiment, the fluid supplied to the vibration damping device 100 is compressed air, but is not limited thereto, and other fluids such as water and oil may be supplied through the suction port 107. In this embodiment, one vibration damping device 100 is mounted on one reaction force processing system 310, but is not limited thereto. A plurality of vibration damping devices 100 may be mounted on one reaction force processing system. In this case, by changing the frequency of each vibration damping device, the vibration components of each frequency can be reduced, which is more effective.

[0028] Second Embodiment Next, the configuration of a vibration damping device (variable stiffness vibration damping device) 200 according to a second embodiment of the present invention will be described with reference to Fig. 5. Fig. 5 is a cross-sectional view of the vibration damping device 200 according to this embodiment.

[0029] The vibration damping device 200 of this embodiment differs from the vibration damping device 100 of the first embodiment in that it has a second elastic member 209. Other configurations are similar to those of the first embodiment, so configurations having the same functions are denoted by the same reference numerals and their description will be omitted.

[0030] The second elastic member 209 connects the support member 104 and the housing 103. With this configuration, it is possible to connect the support member 104 and the housing 103 using not only the elastic member 105 but also an elastic member provided in parallel with the elastic member 105. For example, by configuring the second elastic member 209 with a spring member (spring element) such as a metal leaf spring, it is possible to improve reliability such as performance and durability.

[0031] <Substrate processing equipment> A substrate processing apparatus according to an embodiment of the present invention will be described. In this embodiment, an exposure apparatus that exposes a substrate to light to form a pattern on the substrate will be described as an example of the substrate processing apparatus, but the present invention is not limited thereto. For example, the present invention can be applied to substrate processing apparatuses such as an imprinting apparatus that uses a mold to form a pattern of an imprint material on a substrate, and a drawing apparatus that irradiates a substrate with a charged particle beam to form a pattern on the substrate. The present invention can also be applied to substrate processing apparatuses such as a coating apparatus that coats a photosensitive medium on the surface of a substrate, and a developing apparatus that develops the photosensitive medium to which a pattern has been transferred. The present invention can also be applied to substrate processing apparatuses such as a film forming apparatus (CVD apparatus, etc.), a processing apparatus (laser processing apparatus, etc.), an inspection apparatus (overlay inspection apparatus, etc.), and a measurement apparatus (mark measurement apparatus, etc.).

[0032] 6 is a diagram showing the configuration of an exposure apparatus 10. The exposure apparatus 10 is an exposure apparatus that projects an image of a pattern of a mask M onto a substrate W via a projection optical system 14 to expose the substrate W. The exposure apparatus 10 and substrate W in FIG. 6 correspond to the exposure apparatus 300 and substrate 600 in FIG. 3, respectively. Here, the direction parallel to the optical axis of the projection optical system 14 is defined as the Z-axis direction, and two directions perpendicular to each other in a plane perpendicular to the Z-axis direction are defined as the X-axis direction and the Y-axis direction. Furthermore, the rotation around the X-axis, the rotation around the Y-axis, and the rotation around the Z-axis are defined as θX, θY, and θZ, respectively.

[0033] The exposure apparatus 10 also includes a light source 11, an illumination optical system 12, a mask stage 13, a projection optical system 14, a substrate stage 15, and a main controller 16. The exposure apparatus 10 also includes a first driver 21 for driving the mask stage 13, a second driver 22 for driving an optical element (lens) 14a of the projection optical system 14, and a third driver 51 for driving the substrate stage 15. The first driver 21, the second driver 22, and the third driver 51 are mechanisms for performing at least a part of the process of forming a pattern on the substrate W, and are controlled by a mask stage controller 31, a projection controller 32, and a substrate stage controller 41, respectively. The main controller 16 also includes, for example, a CPU (processor) and a storage device, and controls the entire exposure apparatus 10 (each part of the exposure apparatus 10) by controlling the mask stage controller 31, the projection controller 32, and the substrate stage controller 41.

[0034] The light source 11 emits exposure light. The illumination optical system 12 illuminates the mask M using the light emitted from the light source 11. The mask stage 13 holds the mask M and can be configured to be movable, for example, within a plane perpendicular to the optical axis of the projection optical system 14, i.e., within the XY plane, by a first drive unit 21. The projection optical system 14 projects an image of the pattern of the mask M illuminated by the illumination optical system 12 onto the substrate. The projection optical system 14 includes an optical element 14a that can be moved, for example, in the X-axis direction, by a second drive unit 22. The substrate stage 15 holds the substrate W and can be configured to be movable, for example, within the XY plane and rotatable θZ by a third drive unit 51.

[0035] <Production method> The method for manufacturing an article according to an embodiment of the present invention is suitable for manufacturing articles such as, for example, microdevices such as semiconductor devices, elements having a fine structure, and flat panel displays. The method for manufacturing an article according to this embodiment includes a step of processing a substrate using the above-mentioned substrate processing apparatus, and a step of manufacturing an article from the substrate processed in this step. Furthermore, this manufacturing method may include well-known steps (exposure, oxidation, film formation, deposition, doping, planarization, etching, resist stripping, dicing, bonding, packaging, etc.). The method for manufacturing an article according to this embodiment is advantageous in at least one of the performance, quality, productivity, and production cost of the article, compared to conventional methods.

[0036] According to each embodiment, it is possible to provide a vibration suppression device, a reaction force processing system, a stage apparatus, an exposure apparatus, a substrate processing apparatus, and a method for manufacturing an article, which are compatible with an actuator that utilizes magnetic force.

[0037] Although the preferred embodiments of the present invention have been described above, the present invention is not limited to these embodiments, and various modifications and changes are possible within the scope of the gist of the present invention. [Explanation of symbols]

[0038] 100, 200 Vibration control device 101 Base 102 Damping member 103 Case 104 Support member 105 Elastic member 106 mass body 107 Intake port

Claims

1. A vibration damping device for damping vibration of a target member, comprising: A mass body; A base portion disposed on the target member; a support member disposed on the base and supporting the mass; a housing disposed on the base so as to surround the support member; an elastic member disposed in the housing so as to form a space therein and configured to apply a force to the support member; a control unit that controls a pressure of the fluid in the space by supplying a fluid to the space based on a vibration state of the target member.

2. The support member has a cylindrical shape, The housing has a circular hole, The support member is disposed within the hole, 2. The vibration damping device according to claim 1, wherein the elastic member connects a side surface of the hole and a side surface of the support member.

3. A vibration control device as described in claim 2, characterized in that it has a damping member that limits axial movement of the cylinder.

4. 4. The vibration damping device according to claim 1, wherein the elastic member is a diaphragm or a bellows.

5. 5. The vibration damping device according to claim 1, wherein the control unit controls the pressure so as to change a natural frequency of the vibration damping device.

6. The target member is included in a system that generates a force, The vibration damping device according to claim 5, wherein the control unit determines the natural frequency of the vibration damping device based on a frequency of the force generated by the system, and controls the pressure based on the natural frequency.

7. The vibration damping device according to claim 6 , wherein the control unit determines the natural frequency of the vibration damping device based on a frequency map of the forces stored in a memory unit.

8. 8. The vibration damping device according to claim 1, further comprising a second elastic member connecting the housing and the support member.

9. 9. The vibration damping device according to claim 1, wherein the fluid is compressed air.

10. 9. The vibration damping device according to claim 1, wherein the fluid is water.

11. 9. The vibration damping device according to claim 1, wherein the fluid is oil.

12. A vibration damping device according to any one of claims 1 to 11; A coil and A reaction force processing system comprising: a magnet.

13. Stage and A stage apparatus comprising: a vibration damping device according to claim 1 .

14. A projection optical system; An exposure apparatus comprising: a vibration damping device according to any one of claims 1 to 11.

15. A substrate processing apparatus for processing a substrate, a stage for holding the substrate; A substrate processing apparatus comprising: a vibration damping device for damping vibration of the stage according to claim 1 .

16. Processing a substrate using the substrate processing apparatus according to claim 15; and producing an article from the processed substrate.

Images