Method of operating a charged particle gun, charged particle gun, and charged particle beam device

Abstract

To provide a method of operating a charged particle gun (102).SOLUTION: A method of operating a charged particle gun includes: preparing an emitter (122) at a first emitter potential within a charged particle gun and preparing a trapping electrode (142) at a first electrode potential within the charged particle gun, the first emitter potential and the first electrode potential being provided to have an electrical field of essentially zero at the emitter and at the trapping electrode; switching the trapping electrode from the first electrode potential to a second electrode potential different from the first electrode potential to generate an electrostatic trapping field at the trapping electrode; and after switching the trapping electrode from the first electrode potential to the second electrode potential, switching on an electrostatic emission field at the emitter.SELECTED DRAWING: Figure 1A

Description

[Technical field]

[0001] The embodiments of the present disclosure relate to particle traps in charged particle beam devices, particularly particle traps in ultra-high vacuum (UHV) gun chambers. Additionally, the embodiments relate to charged particle guns or gun chambers and charged particle beam devices. The embodiments further relate to cleaning of charged particle beam devices, for example cleaning of charged particle guns or gun chambers of charged particle beam devices. The embodiments particularly relate to methods of operating charged particle guns, charged particle guns, and charged particle beam devices. [Background technology]

[0002] Charged particle beam devices have many roles in multiple industrial fields, including but not limited to electron beam inspection (EBI), critical dimension (CD) measurement of semiconductor devices in production, defect review (DR) of semiconductor devices in production, lithography exposure systems, detection devices, and test systems. Therefore, there is a high demand for structuring, testing, and inspection of samples in the micrometer and nanometer scale. Process control, inspection, or structuring in the micrometer and nanometer scale can be performed using charged particle beams, e.g., electron beams, generated and focused in charged particle beam devices such as electron microscopes. Charged particle beams offer superior spatial resolution compared to, e.g., photon beams, due to their short wavelengths.

[0003] In the operation of charged particle beam devices in the field, i.e. according to industrial standards, system start-up and system maintenance must be taken into account. In particular, the overall throughput of the system is affected by downtime. As a result, a fast and reliable start-up of the system's operation is beneficial. After the initial start-up or maintenance, even after careful cleaning, dust particles may remain in the charged particle beam device, e.g., in the gun chamber. In particular, in the gun chamber, the particles may cause arcing and destruction of the emitter.

[0004] Now, a lengthy cleaning is performed and several attempts to bias the emitter may be made. After arcing, the gun chamber can be reopened and re-inspected to find and remove any remaining particles.

[0005] In view of the above, an improved method of operating a charged particle gun or gun chamber of a charged particle beam device, as well as an improved charged particle gun and an improved charged particle beam device, would be beneficial. Summary of the Invention

[0006] In light of the above, a method for operating a charged particle gun, a charged particle gun and a charged particle beam device are provided according to the independent claims. Further aspects, advantages and features are apparent from the dependent claims, the description and the accompanying drawings.

[0007] According to one embodiment, there is provided a method of operating a charged particle gun, the method including providing an emitter in the charged particle gun at a first emitter potential and a trapping electrode in the charged particle gun at a first electrode potential, the first emitter potential and the first electrode potential being applied to have essentially zero electric fields at the emitter and trapping electrodes, switching the trapping electrode from the first electrode potential to a second electrode potential different from the first electrode potential to generate an electrostatic trapping field at the trapping electrode, and switching on the electrostatic emission field at the emitter after switching the trapping electrode from the first electrode potential to the second electrode potential.

[0008] According to one embodiment, a charged particle gun for a charged particle beam device is provided that includes a gun housing, an emitter disposed within the gun housing, the emitter configured to emit a charged particle beam along an axis, an emitter power supply connected to the emitter, a trapping electrode disposed within the gun housing, the trapping electrode at least partially surrounding the axis, a trapping power supply connected to the trapping electrode, and a shielding element for shielding an electrostatic field of the trapping electrode from the axis during operation of the gun housing.

[0009] According to one embodiment, there is provided a charged particle beam device including a charged particle gun according to any of the embodiments described herein and a charged particle beam column for directing charged particles onto a sample.

[0010] The embodiments also relate to apparatus for carrying out the disclosed methods, including apparatus parts for carrying out each described method aspect. These method aspects may be carried out by hardware components, by a computer programmed with appropriate software, by any combination of the two, or in any other manner. Moreover, the embodiments according to the present disclosure also relate to methods for operating the described apparatus, including method aspects for carrying out any function of the apparatus.

[0011] So that the above-recited features of the present disclosure can be understood in detail, a more particular description of the present disclosure briefly summarized above can be had by reference to the embodiments. The accompanying drawings relate to embodiments of the present disclosure and are described below. [Brief description of the drawings]

[0012] [Figure 1A] 1 is a schematic diagram of a portion of a charged particle beam device including an electrode for trapping particles according to embodiments described herein. [Figure 1B] 1B is a cross-sectional view of a portion of the charged particle beam device shown in FIG. 1A. [Figure 2A-2C]4 is a schematic diagram of a portion of a charged particle beam device illustrating operations for trapping a particle according to a further embodiment described herein. [Diagram 3] 1 is a schematic diagram of a charged particle beam device including a particle trap according to an embodiment of the present disclosure. [Figure 4] 1 is a flow diagram of a method of operating a portion of a charged particle beam device according to an embodiment of the present disclosure. [Diagram 5] 1 is a schematic diagram of a portion of a charged particle beam device including an electrode for trapping particles and a further trapping electrode according to embodiments described herein. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0013] Reference will now be made in detail to various embodiments of the present disclosure, one or more examples of which are illustrated in the figures. Within the following description of the drawings, like reference numerals refer to like components. Only the differences with respect to the individual embodiments will be described. Each example is provided for the purpose of illustrating the disclosure and is not meant as a limitation of the disclosure. Furthermore, features illustrated or described as part of one embodiment can be used on or in conjunction with other embodiments to yield yet further embodiments. It is intended that the description include such modifications and variations.

[0014] Without limiting the scope of protection of the present application, in the following the charged particle beam device or a component thereof will be exemplarily referred to as a charged particle beam device using electrons as charged particles. However, other types of primary charged particles, e.g. ions, can be used. Irradiating a specimen or sample with a charged particle beam (also called "primary charged particle beam") creates signal charged particles such as secondary electrons (SEs), which can carry information about the topography, chemical composition, and / or electrostatic potential of the sample. The secondary electrons can include at least one of backscattered electrons, secondary electrons, and Auger electrons.

[0015] Charged particle beam devices are operated under high vacuum. In particular, charged particle guns, including emitters, can be operated at ultra-high vacuum (UHV) pressures. In operation of the emitter, a high voltage is applied while the gun housing is at ultra-high vacuum pressure. Various cleaning procedures are applied before and during evacuation of the gun housing. After the initial pump-down of the gun housing, i.e., the UHV chamber of the charged particle gun, particles such as dust particles may remain in the chamber or housing of the charged particle gun.

[0016] The tip of the emitter emits charged particles, e.g. electrons. According to some embodiments, which can be combined with other embodiments described herein, the charged particles emitted by the emitter can be electrons or ions. In the following, reference will be made to charged particles being electrons. For example, the charged particle beam device can be a scanning electron microscope with a single beam or with multiple beamlets. However, similar embodiments can be provided for charged particles being ions. It should be noted that the embodiments describing the potentials of an electron beam device will utilize potentials of different polarities in the case of an ion beam device.

[0017] Particles that may remain in the gun housing of the charged particle gun may attach to the tip of the emitter, especially when the emitter voltage is switched on. This small radius of curvature of the emitter tip results in a high electric field strength at the emitter, which may further increase the possibility of particles attaching to the emitter. For example, particles such as dust particles may be electrostatically attracted to the negatively biased emitter. Furthermore, particles at the emitter tip may lead to arcing and even destruction of the emitter. Arcing at the emitter may be triggered by an even further increase in the electric field strength of particles such as dust particles attached to the emitter. Therefore, as soon as arcing is detected during the start-up of the charged particle gun, i.e., especially during the application of the operating potential to the emitter, the start-up of the system may be stopped and further cleaning measures may be applied. The start-up of the charged particle gun and the attempt of additional cleaning rounds may take a lot of time, for example during the installation of a new system or after maintenance of an existing system.

[0018] Embodiments of the present disclosure provide a particle trap for particles, such as dust particles, in a vacuum chamber, such as a gun housing of a charged particle gun that contains an emitter, particularly a UHV chamber, that can reduce or avoid arcing in a UHV charge splitter gun, for example an electron gun, particularly a UHV electron gun.

[0019] According to some embodiments of the present disclosure, an electrode is provided in the gun housing, a voltage is applied to the electrode, and then an emitter arranged in the gun housing is switched on. As a result, particles remaining in the gun housing, for example dust particles dispersed in the UHV chamber of the charged particle gun, i.e. the gun housing, are electrostatically attracted to the electrode. The particles remain attracted to the electrode. Only then is the operating voltage of the charged particle gun, in particular the operating voltage of the emitter, applied.

[0020] In light of the above, embodiments of the present disclosure enable faster start-up of a charged particle gun. Additionally or alternatively, the risk of arcing and emitter destruction during start-up of the charged particle gun is reduced.

[0021] FIG. 1A shows a portion of a charged particle beam device 100. The charged particle beam device 100 includes a charged particle gun 102. The charged particle beam device further includes a charged particle source 120. The charged particle source 120 includes an emitter 122 and an emitter power supply 124. A voltage for biasing the emitter 122 can be provided by a power supply using a conductor 121. For example, a high voltage can be provided to the vacuum chamber 110 of the charged particle gun 102 using a conductor 128 supported by an insulator 126. The charged particle gun 102 includes a vacuum chamber 110 provided by a gun housing 111. The emitter 122 is provided within the gun housing 111, i.e., within the vacuum chamber 110. To control the electron beam generated by the charged particle source, the emitter voltage of the emitter 122 can be controlled by the emitter power supply 124. The electron beam can be further controlled by the suppressor electrode 125 , the extractor 132 , and the anode 152 .

[0022] The extractor potential of the extractor 132 can be controlled by an extractor power supply 134. The anode potential of the anode 152 can be controlled by an anode power supply 154. For example, the anode 152 can be provided between the vacuum chamber 110 and the further vacuum chamber 112 of the column of the charged particle beam device 100. According to some embodiments, the anode can be at least partially provided within the gun housing 111.

[0023] According to embodiments of the present disclosure, a trapping electrode 142 is provided within the gun housing 111. A trapping power supply 144 is connected to the trapping electrode for biasing the trapping electrode. The electron beam emitted from the emitter 122 travels essentially along an axis 123. According to some embodiments, which may be combined with other embodiments described herein, the trapping electrode at least partially surrounds the axis 123.

[0024] According to one embodiment, a charged particle gun for a charged particle beam device is provided. The charged particle gun 102 includes a gun housing and an emitter disposed within the gun housing. The emitter can be configured to emit a charged particle beam along an axis 123. The charged particle gun 102 further includes an emitter power supply connected to the emitter. A trapping electrode is disposed within the gun housing, the trapping electrode at least partially surrounding the axis. A trapping power supply is connected to the trapping electrode. The charged particle gun 102 further includes a shielding element for shielding a potential provided from the trapping power supply to the trapping electrode from the axis during operation of the gun chamber.

[0025] According to some embodiments, which may be combined with other embodiments described herein, the emitter may be a field emitter, e.g., a thermal field emitter (TFE), such as a Schottky emitter, or a cold field emitter (CFE). Embodiments of the present disclosure may be particularly advantageous for CFEs, as CFEs may be much more sensitive to arcing that may result in destruction of the emitter.

[0026] In the exemplary embodiment of Figure 1A, the shielding element may be provided by anode 152. This can also be seen in the cross-sectional schematic of Figure 1B. Figure 1B shows a cross-sectional view showing gun housing 111, trapping electrode 142, and anode 152. Trapping electrode 142 surrounds anode 152. Anode 152 shields the potential of trapping electrode 142 from the center of the rotationally symmetric configuration shown in Figure 1B.

[0027] According to an embodiment of the present disclosure, the shielding element reduces or avoids the influence of the potential of the trapping electrode on the electron beam traveling along the axis 123. According to a further additional or alternative variant, the trapping electrode may be rotationally symmetric, in particular ring-shaped. For example, the rotational symmetry may be provided around the axis 123. As a result, any potential remaining influence of the trapping electrode potential on the electron beam may occur symmetrically. According to a further optional implementation, the charged particle gun may further include an extractor electrode in the gun housing, a suppressor electrode in the gun housing, and an anode at least partially within the gun housing, as shown in FIG. 1A.

[0028] According to some embodiments, which may be combined with other embodiments described herein, the charged particle gun 102 and / or the charged particle beam device 100 may include a controller 190. As shown in FIG. 1A, the controller 190 may be connected to the emitter power supply 124, the extractor power supply 134, the trap power supply 144, and the anode power supply 154. According to some embodiments, which may be combined with other embodiments described herein, the controller 190 may be connected to one or more of the power supplies of the charged particle beam device and / or the power supplies of the charged particle gun to control the operation of the charged particle beam.

[0029] According to some embodiments, which may be combined with other embodiments described herein, a charged particle gun includes a controller having a processor and a memory storing instructions that, when executed by the processor, cause the apparatus to perform a method according to any of the embodiments of the present disclosure.

[0030] According to some embodiments, which can be combined with other embodiments described herein, the charged particle beam device can further include a substrate support (not shown in FIG. 1A), in particular a substrate support connected to a power supply for supplying a sample voltage during operation of the charged particle beam device. The controller 190 can also control the sample potential. As a result, the incident energy of the electrons on the sample can be controlled by the potential difference between the sample and the emitter 122.

[0031] The controller 190 includes a central processing unit (CPU), memory, and, for example, support circuits. To facilitate control of the charged particle beam device and / or the charged particle gun, the CPU can be one of any form of general-purpose computer processor that can be used in an industrial environment to control various chambers and sub-processors. The memory is coupled to the CPU. The memory, or computer-readable medium, can be one or more readily available memory devices, such as random access memory, read-only memory, floppy disks, hard disks, or any other form of digital storage, either local or remote. The support circuits can be coupled to the CPU to support the processor in a conventional manner. These circuits include cache, power supplies, clock circuits, input / output circuits, and associated subsystems, etc. The imaging process instructions and / or instructions for operating and cleaning the charged particle beam device (or, respectively, the charged particle gun) are typically stored in the memory as software routines commonly known as recipes. The software routines may also be stored and / or implemented by a second CPU (not shown) located remotely from the hardware being controlled by the CPU. The software routines, when implemented by the CPU, transform a general-purpose computer into a dedicated computer (controller) for controlling device operations, such as, among others, for controlling one or more power supplies of a charged particle beam device and / or a charged particle gun. Although the methods and / or processes of the present disclosure are discussed as being implemented as software routines, some of the method steps disclosed herein may be performed in hardware as well as by a software controller. Thus, the embodiments may be implemented in software implemented on a computer system and in hardware as an application specific integrated circuit or other type of hardware implementation, or in a combination of software and hardware. The controller may implement or execute the method of operating a charged particle gun or the method of operating a charged particle beam device according to the embodiments of the present disclosure.

[0032] The embodiments allow arc protection of electron guns, e.g., electron guns of scanning electron microscopes (SEMs). Particle traps can reduce the need for further particle contamination reduction. Furthermore, the risk of arcing can be reduced when operating emitters in UHV environments, e.g., after maintenance of the electron gun.

[0033] According to an embodiment of the present disclosure, the trapping electrode comprises an additional electrode in the gun housing 111, i.e. an electrode is introduced in addition to the electrode serving to guide or influence the charged particle beam. The electrode serving to guide the charged particle beam can be selected from the group consisting of suppressors, extractors, anodes, electrodes of lenses, electrodes of deflectors for the charged particle beam, and electrodes of beam aberration correction elements. For example, the additional electrode or trapping electrode can be a ring electrode. According to some embodiments, which can be combined with other embodiments described herein, the trapping electrode can be provided at the bottom of the vacuum chamber 110 or the gun housing 111, respectively, or in the immediate vicinity of the emitter.

[0034] To operate the charged particle gun or charged particle beam device, respectively, the trapping electrode is biased to a positive or negative potential, e.g., plus or minus several hundred volts to several kV, to attract the contaminant particles. An electrostatic trapping field is generated at the trapping electrode. The trapping electrode is switched to a potential before switching on the high voltage to operate the emitter or gun, respectively. Then, in a second step, the other voltage of the charged particle gun is switched on. After the electrostatic trapping field is generated, the electrostatic emission field of the emitter is generated. According to some embodiments, which can be combined with other embodiments described herein, the direction of the electrostatic trapping field remains the same for the trapped electrons when switching on the electrostatic emission field. Particles absorbed at the trapping electrode remain at the trapping electrode. The risk of arcing is reduced.

[0035] According to some embodiments, which can be combined with other embodiments described herein, after maintenance or before start-up of the charged particle gun, there is no electric field in the emitter and / or the charged particle gun. The electric field is essentially zero. The first electric or electrostatic field provided to the charged particle gun, e.g., in the gun housing and / or adjacent to the emitter, is an electrostatic trapping field. Only afterwards is a further electrostatic field, such as an electrostatic ejection field, provided to the charged particle gun or gun housing, respectively. The direction of the electrostatic trapping field at the trapping electrode persists upon addition of the further electrostatic field. As a result, the particles remain in the trapping electrode.

[0036] 2A-2C show the charged particle gun 102 during the operation of the method of operating the charged particle gun shown in the flow chart shown in FIG. 4. In operation 602, the voltage in the charged particle gun 102 is at a non-operational value. For example, the electric field is essentially zero at the emitter and trap electrodes. The non-operational value can be, for example, the same value during maintenance or pump-down of the vacuum chamber 110. For example, the emitter 122, the extractor 132, the anode 152, and the trap electrode 142 can be at ground potential. In the example shown in FIGS. 2A-2C, furthermore, the charged particle beam column is at ground potential as indicated by reference 214. The emitter power supply 124, the extractor power supply 134, the anode power supply 154, and the trap power supply 144 can be switched off, for example. After cleaning the gun housing, i.e., the vacuum chamber of the charged particle gun 102 to reduce contamination inside the gun housing, particles 202 may remain in the vacuum chamber.

[0037] According to some embodiments, which may be combined with other embodiments described herein, the particles 202 may be dust particles or other contaminant particles that, when not trapped, may adhere to the tip of the emitter 122.

[0038] In operation 604, the trapping electrode is switched on. Supplying a voltage to the trapping electrode 142 by the trapping power supply 144 creates an electrostatic trapping field, which attracts the particles 202 towards the trapping electrode 142. This is shown in FIG. 2B. For example, in an electron beam gun, the voltage applied to the trapping electrode 142 can be plus or minus several hundred volts to kilovolts, e.g., 100V to 9 kV, or -100V to -9 kV, e.g., about -6 kV. One or more of the other components of the charged particle gun have not yet been switched to an operating voltage for trapping the particles. The electrostatic trapping field is the only electric field in the gun chamber. In particular, the emitter and / or extractor are not yet at an operating voltage and can be biased, for example, to ground potential. Switching the trapping electrode causes particles in the gun housing to be attracted to the trapping electrode and away from the emitter. Additionally or alternatively, switching the trapping electrode attracts particles to the trapping electrode and away from other components of the gun chamber, particularly other components that may increase arcing when particles become attached, such as other electrodes or beam directing elements, such as the anode, suppressor, lens electrodes, or components of the gun housing.

[0039] During operation of the charged particle gun or charged particle beam device, one or more components can be biased to ground potential even though an electrostatic emission field is supplied to the emitter. Furthermore, during maintenance, multiple components can be biased to ground potential. As a result, there may be an overlap between the maintenance voltage and the operating voltage, e.g., a component that is biased to ground potential during operation may also be at ground potential during operation 604, i.e., when the trapping electrode is switched on. According to some embodiments of the present disclosure, no electric field is supplied to the emitter and / or the charged particle gun. The electric field can be essentially zero. The first electric or electrostatic field supplied to the charged particle gun, e.g., in the gun housing and / or adjacent to the emitter, is the electrostatic trapping field. Only afterwards is a further electrostatic field, such as an electrostatic emission field, supplied to the charged particle gun or gun housing, respectively. According to some embodiments, which can be combined with other embodiments described herein, the trapping electrode 142 is switched to a second electrode potential to trap particles, but not all other components, or most of the components, are at the operating voltage. In particular, the trapping electrode can be switched to a second electrode potential to generate an electrostatic trapping potential for trapping the particle, but only one further component of the charged particle gun can potentially be at the operating voltage of the one further component (e.g., ground), and the further electric field is not supplied at the operating potential (e.g., ground). More particularly, the operating voltage of the one further component can be at ground potential.

[0040] In operation 606, one or more of the remaining components, in particular the emitter 122, are switched to an operating voltage. For example, the emitter can be biased to +8 kV to +12 kV by the emitter power supply 124. Additionally, the extractor 132 can be biased to -3 kV to -7 kV by the extractor power supply 134, and the anode 152 can be biased to a potential close to ground potential. According to some embodiments, which can be combined with other embodiments described herein, the anode power supply 154 can be omitted in embodiments where the anode 152 remains grounded at all times. The trapping electrode 142 remains biased, for example, to +3 kV to +9 kV. The particle 202 remains trapped in the trapping electrode. The electric field of the trapping electrode remains negative at the surface of the trapping electrode even when other voltages of the gun are switched on.

[0041] According to some embodiments, which can be combined with other embodiments described herein, the relative potentials of the charged particle gun can be provided as follows: the operating emitter potential is -0.3 kV to -2 kV, the extractor electrode potential is +5 kV to +10 kV, the operating anode potential is +10 kV to +100 kV, the suppressor electrode potential is -0.6 kV to -2.3 kV, and the sample potential is ground, and the relative potentials can be generally, in particular, shifted by about -15 kV to -45 kV.

[0042] According to one embodiment, a method of operating a charged particle gun is provided. The method includes providing an emitter in the charged particle gun at a first emitter potential and providing a trapping electrode in the charged particle gun at a first electrode potential, where the first emitter potential and the first electrode potential are provided to have essentially zero electric fields at the emitter and trapping electrodes (see, e.g., operation 602). The method further includes switching the trapping electrode from the first electrode potential to a second electrode potential different from the first electrode potential to generate an electrostatic trapping field at the trapping electrode (see, e.g., operation 602). After switching the trapping electrode from the first electrode potential to the second electrode potential, an electrostatic emission field of the emitter is switched on (see, e.g., operation 606).

[0043] According to an embodiment, a method of operating a charged particle gun is provided. The method includes providing an emitter in the charged particle gun at a first emitter potential and providing a trapping electrode in a gun housing at a first electrode potential (see, e.g., operation 602). The method further includes switching the trapping electrode from the first electrode potential to a second electrode potential different from the first electrode potential (see, e.g., operation 602). After switching the trapping electrode, the method further includes switching the emitter to an operating emitter potential of the charged particle gun, the operating potential being different from the first emitter potential. According to further optional variations and implementations, other components of the charged particle gun 102 with similar switching behavior may be included. For example, the method may include providing an anode at a first anode potential and providing a gun housing of the charged particle gun at a first housing potential. After switching the trapping electrode, the anode may be switched to an operating anode potential of the charged particle gun, the operating anode potential being different from the first anode potential.

[0044] According to some embodiments, which may be combined with other embodiments described herein, the first emitter potential, the first electrode potential, the first anode potential, and the first gun housing potential may correspond to respective potentials during maintenance.

[0045] Returning to Figures 1A and 1B, the anode 152 is provided between the trapping electrode 142 and the axis 123. The electron beam travels along the axis 123. As a result, the anode shields the electron beam from the electric field provided by the trapping electrode. According to some embodiments, which can be combined with other embodiments described herein, the trapping electrode geometry and / or trapping electrode design are chosen to reduce or avoid affecting the portion of the electrons in the beam path, i.e., the electron beam traveling essentially along the axis. According to some embodiments, which can be combined with other embodiments described herein, a rotationally symmetric design of the trapping electrode is advantageous. Any potential remaining effects on the electrons will be rotationally symmetric.

[0046] According to some embodiments, which may be combined with other embodiments described herein, a shielding element may be provided to shield the electrostatic field of the trapping electrode. As mentioned above, the anode or another beam directing element may function as the shielding element. Furthermore, further shielding elements may be provided.

[0047] 5 shows an embodiment according to the present disclosure in which a shielding element 712 is provided to shield electrons along the beam path. Further, a trapping electrode 142 is provided, i.e. a first trapping electrode and a second trapping electrode is provided. The trapping electrode 142 and the further trapping electrode 742 can be positioned at different positions along the axis 123. According to further additional or alternative embodiments, the further trapping electrode 742 can have a different outer diameter than the trapping electrode 142, can have a different inner diameter than the trapping electrode 142, and / or can have a different cross-sectional shape.

[0048] According to some embodiments, which may be combined with other embodiments described herein, the design and / or location of the trapping electrode or electrodes may be selected such that the electric field remains negative at the surface of the trapping electrode or electrodes even when other voltages of the charged particle gun 102 are switched on.

[0049] Even though other voltages are switched on for the operation of the charged particle gun to trap the contaminant particles in the one or more trap electrodes, the one or more trap electrodes can have a curved surface in a cross section parallel to the axis 123, for example, the cross section shown in FIG. 5, in particular, the cross section of one side of the ring-shaped trap electrode. For example, the one or more trap electrodes can be shaped so that the electric field remains the same polarity for different voltages of the emitter during maintenance, start-up, and operation. According to some embodiments, which can be combined with other embodiments described herein, the trap electrodes can have a radius of curvature of 20 mm or less, in particular 10 mm. The radius of curvature affects the electric field strength of the electrostatic trapping field. As a result, the smaller the radius of curvature, the smaller the second electrode potential that generates the electrostatic trapping field can be. With respect to the maximum radius of curvature, it is understood that the radius of curvature of a flat surface or line can be infinitely large, in particular much larger than 20 mm.

[0050] 3 shows a schematic diagram of a charged particle beam device 100 according to an embodiment described herein. The charged particle beam device 100 may be an electron microscope, such as a scanning electron microscope (SEM). The charged particle beam device 100 includes a charged particle gun according to an embodiment of the present disclosure. The charged particle beam device 100 further includes a column 302 for directing the electron beam onto a sample 324. The sample 324 may be supported on a sample table 322.

[0051] The charged particle beam device 100 includes a charged particle source 120 configured to emit a (primary) charged particle beam, and a trapping electrode 142 as described herein. A controller 190 can control the voltages during start-up and operation of the charged particle gun 102. As mentioned above, before the charged particle source 120 is operated, a trapping potential is supplied to the trapping electrode 142 by a trapping power supply 144.

[0052] The charged particle beam device may include a condenser lens arrangement 304 and an alignment deflector 306 for aligning the charged particle beam to an axis 123. According to some embodiments, which may be combined with other embodiments described herein, the axis 123 may be an optical axis of an objective lens 310.

[0053] 3 shows a straight vision system. The alignment deflector 306 may also be utilized to provide a non-straight vision system. For example, a first deflector may be utilized to generate a tilt of the charged particle beam, and a second deflector may be utilized to redirect the beam perpendicular to the surface of the sample 324. In particular, a magnetic second deflector may provide separation between the primary electron beam and the signal beam.

[0054] As shown in Fig. 3, an objective lens 310 focuses the electron beam onto a sample 324. One or more scanning deflectors 312, located within or upstream of the objective lens, can scan the electron beam across the sample for image generation. Signal particles generated when the primary electron beam strikes the sample can be detected by a detector 308. As shown in Fig. 3, the detector can be an on-axis detector. Additionally or alternatively, an off-axis detector can be included.

[0055] According to some embodiments, which can be combined with other embodiments described herein, the objective lens 310 can be a composite electrostatic-magnetic lens, and in particular can have an electrostatic lens that reduces the energy in the column from high energies in the column to low incident energies.

[0056] 3 shows a single beam scanning electron microscope. According to further embodiments, which can be combined with other embodiments described herein, the disclosed embodiments including trapping electrodes can also be utilized in a multi-beam scanning electron microscope or a multi-beam lithography system. The multi-beam charged particle beam device or multi-beam system can include a magnetic lens, an electrostatic magnetic compound lens, or an electrostatic lens with individual lens apertures for the individual beamlets of the multi-beam system.

[0057] According to one embodiment, a charged particle beam device is provided, the charged particle beam device including a charged particle gun according to any of the embodiments of the present disclosure and a charged particle beam column for directing charged particles onto a sample.

[0058] In light of the above, several embodiments can be provided, among others as follows: EMBODIMENT 1 1. A method of operating a charged particle gun, comprising: providing an emitter in the charged particle gun at a first emitter potential, and providing a trapping electrode in the charged particle gun at a first electrode potential, the first emitter potential and the first electrode potential being applied to have essentially zero electric fields at the emitter and trapping electrodes; switching the trapping electrode from the first electrode potential to a second electrode potential different from the first electrode potential to generate an electrostatic trapping field at the trapping electrode; and switching on the electrostatic emission field at the emitter after switching the trapping electrode from the first electrode potential to the second electrode potential.

[0059] EMBODIMENT 2 2. The method of embodiment 1, wherein switching on the electrostatic emission field includes switching the emitter from a first emitter potential to an operational emitter potential.

[0060] EMBODIMENT 3 3. The method of embodiment 2, further comprising: preparing an anode at a first anode potential; preparing a gun housing of the charged particle gun at the first housing potential; and switching the anode to an operating anode potential of the charged particle gun after switching the trapping electrodes, the operating anode potential being different from the first anode potential.

[0061] EMBODIMENT 4 4. The method of embodiment 3, wherein the first emitter potential, the first electrode potential, the first anode potential, and the first housing potential correspond to respective potentials during maintenance.

[0062] EMBODIMENT 5 5. The method of any of the preceding claims, wherein switching of the trapping electrode causes particles in the gun housing to be attracted to the trapping electrode and away from the emitter or other components in the gun chamber.

[0063] EMBODIMENT 6 6. The method according to any of the preceding embodiments, wherein the second electrode potential provides an electric field strength to the trapping electrode for trapping the particle in the trapping electrode after switching the emitter to the working emitter potential.

[0064] EMBODIMENT 7 7. The method according to any of the preceding claims, wherein the electrostatic trapping field has a first direction before switching on the electrostatic emission field at the emitter and after switching on the electrostatic emission field at the emitter.

[0065] EMBODIMENT 8 The method according to any one of the first to seventh embodiments, wherein the relative potentials of the charged particle gun can be arranged as follows: the operating emitter potential is -0.3 kV to -2 kV, the extractor electrode potential is +5 kV to +10 kV, the operating anode potential is +10 kV to +100 kV, the suppressor electrode potential is -0.6 kV to -2.3 kV, and the sample potential is grounded, and the relative potentials can be generally, in particular, shifted by about -15 kV to -45 kV.

[0066] EMBODIMENT 9 1. A charged particle gun for a charged particle beam device, comprising: a gun housing; an emitter disposed within the gun housing, the emitter configured to emit a charged particle beam along an axis; an emitter power supply connected to the emitter; a trap electrode disposed within the gun housing, the trap electrode at least partially surrounding the axis; a trap power supply connected to the trap electrode; and a shielding element for shielding an electrostatic field of the trap electrode from the axis during operation of the gun housing.

[0067] EMBODIMENT 10 10. The charged particle gun of embodiment 9, further comprising an extractor electrode in the gun housing, a suppressor electrode in the gun housing, and an anode at least partially within the gun housing.

[0068] EMBODIMENT 11 11. The charged particle gun of embodiment 10, wherein the shielding element is provided by an anode disposed at least partially between the trapping electrode and the axis.

[0069] EMBODIMENT 12 A charged particle gun as described in any one of embodiments 9 to 11, further comprising a controller including a processor and a memory storing instructions that, when executed by the processor, cause the charged particle gun to perform a method as described in any one of embodiments 1 to 6.

[0070] EMBODIMENT 13 13. The charged particle gun according to any one of embodiments 9 to 12, wherein the trapping electrode is rotationally symmetric, in particular ring-shaped.

[0071] EMBODIMENT 14 14. The charged particle gun according to any one of embodiments 9 to 13, wherein the trap electrode has a curved surface in a cross section parallel to the axis.

[0072] EMBODIMENT 15 15. The charged particle gun according to any of embodiments 9 to 14, wherein the trapping electrode is shaped such that the electrostatic field remains of the same polarity for different voltages on the emitter during maintenance, start-up and operation.

[0073] EMBODIMENT 16 16. The charged particle gun according to any one of embodiments 9 to 15, wherein the trap electrode has a radius of curvature of 20 mm or less.

[0074] EMBODIMENT 17 In particular, the charged particle gun according to any one of embodiments 9 to 16 further comprises a further trapping electrode at a different position to the trapping electrode along the axis.

[0075] EMBODIMENT 18 18. The charged particle gun according to any one of embodiments 9 to 17, wherein the emitter is a field emitter.

[0076] EMBODIMENT 19 A charged particle beam device comprising the charged particle gun according to any one of embodiments 9 to 16, and a charged particle beam column for directing charged particles onto a sample.

[0077] In light of the above, one or more of the following advantages may be provided: Arcing during start-up of the charged particle gun may be reduced. As a result, the risk of destruction of the emitters, in particular the field emitters, may be reduced. Furthermore, the cleaning effort for start-up of the charged particle gun may be reduced. Thus, maintenance may be accelerated and / or the uptime of the system may be increased. As a result, the overall throughput of the charged particle beam device may be improved.

[0078] While the forgoing is directed to embodiments of the present disclosure, other and further embodiments of the disclosure may be devised without departing from the basic scope thereof, which scope is determined by the appended claims.

Claims

1. A charged particle gun (102) for a charged particle beam device (100), comprising: A gun housing (111); an emitter (122) disposed within the gun housing, the emitter configured to emit a charged particle beam along an axis; an emitter power supply (124) connected to the emitter (122); a trapping electrode (142) provided in the gun housing (111), the trapping electrode (142) at least partially surrounding the axis (123), the trapping electrode (142) configured to attract contaminant particles and to reduce or avoid affecting a portion of the electrons in the beam path; a trap power supply (144) connected to the trap electrode; a shielding element for shielding the electrostatic field of the trapping electrode from the shaft during operation of the gun housing; Including, A charged particle gun, wherein the trapping electrode (142) is shaped such that the electrostatic field remains the same polarity for different voltages on the emitter during maintenance, start-up and operation.

2. an extractor electrode in the gun housing (111); a suppressor electrode (125) within the gun housing; an anode (152) at least partially within the gun housing; The charged particle gun of claim 1 further comprising:

3. 3. The charged particle gun of claim 2, wherein the shielding element is provided by the anode disposed at least partially between the trapping electrode and the shaft.

4. A controller (190) including a processor and a memory for storing instructions; When executed by the processor, the instructions providing a first emitter potential to the emitter (122) and a first electrode potential to the trapping electrode (142), the first emitter potential and the first electrode potential being provided to have essentially zero electric field at the emitter and the trapping electrode; switching the trapping electrode from the first electrode potential to a second electrode potential different from the first electrode potential to generate an electrostatic trapping field at the trapping electrode; switching on an electrostatic emission field at the emitter after switching the trapping electrode from the first electrode potential to the second electrode potential; causing the charged particle gun to execute 4. The charged particle gun according to claim 1.

5. The charged particle gun of any one of claims 1 to 3, wherein the trapping electrode (142) is rotationally symmetric.

6. The charged particle gun according to any one of claims 1 to 3, wherein the trap electrode (142) has a curved surface in a cross section parallel to the axis.

7. The charged particle gun of any one of claims 1 to 3, wherein the trapping electrode (142) has a radius of curvature of 20 mm or less.

8. A further trapping electrode at a different position along the axis from the trapping electrode (142). The charged particle gun according to any one of claims 1 to 3, further comprising:

9. The charged particle gun according to any one of claims 1 to 3, wherein the emitter is a field emitter.

10. A charged particle gun (102) for a charged particle beam device according to any one of claims 1 to 3, a charged particle beam column for directing the charged particles onto the sample; A charged particle beam device (100) comprising:

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