Inductor component

Abstract

To provide an inductor component capable of improving acquisition efficiency while suppressing variations of inductance.SOLUTION: An inductor component 1 comprises: an element assembly 10; a coil 20 which is provided within the element assembly 10 and wound helically in a coil axis direction; and first and second external electrodes 30a and 30b which are electrically connected to one end of the coil 20. A first coil wiring part 21aa extends so as to spread from the side of a top face 12a to the side of a bottom face 12b of the element assembly 10. An inner peripheral edge of the first coil wiring part 21aa consists of a first inner circular arc 41aa, and the first inner circular arc 41aa defines the inside of the inner peripheral edge of coil wiring as a center position Ea and has at least one curvature radius. An outer peripheral edge of the first coil wiring part 21aa consists of a first outer circular arc 42aa which is positioned closer to a surface of the element assembly 10 than the first inner circular arc 41aa, and the first outer circular arc 42aa defines the inside of the inner peripheral edge of the coil wiring as a center position Fa and has at least one curvature radius.SELECTED DRAWING: Figure 2

Description

Technical Field

[0001] The present invention relates to an inductor component.

Background Art

[0002] Patent Document 1 discloses an electronic component including a laminate, a spiral coil provided in the laminate, a plurality of coil conductor layers that overlap each other in a plan view from the lamination direction to form an annular orbit, and a plurality of via hole conductors that connect the plurality of coil conductor layers. The annular orbit has a plurality of first corners protruding outward and a plurality of second corners protruding inward, and all the via hole conductors are provided at the first corners.

[0003] Patent Document 2 discloses a method for manufacturing an inductor component, including steps of preparing a photosensitive insulating paste and a conductive paste containing a filler material made of quartz, a glass material, and a resin material, applying the insulating paste to form a first insulating layer, exposing the first insulating layer in a state where a first portion of the first insulating layer is shielded from light by a mask, removing the first portion of the first insulating layer to form a groove having a groove depth larger than a groove width at a position corresponding to the first portion, applying the conductive paste in the groove to form a coil conductor layer in the groove, and applying the insulating paste on the first insulating layer and the coil conductor layer to form a second insulating layer.

[0004] Patent Document 3 discloses an inductor including a main body formed by laminating a plurality of insulating layers in which coil patterns are arranged, and first and second external electrodes disposed outside the main body. The plurality of coil patterns are connected to each other via coil connection portions, and both ends thereof form a coil connected to the first and second external electrodes via coil lead-out portions. The plurality of coil patterns are composed of an outermost coil pattern and a plurality of coil patterns disposed inside the outermost coil pattern. The thickness of each of all the coil patterns disposed inside is larger than the thickness of the outermost coil pattern. The inductor further includes dummy electrodes formed at positions corresponding to the first and second external electrodes in the plurality of insulating layers.

Prior Art Documents

Patent Documents

[0005]

Patent Document 1

Patent Document 2

Patent Document 3

Summary of the Invention

Problems to be Solved by the Invention

[0006] In FIGS. 2 and 6 of Patent Document 1 and FIG. 1 of Patent Document 2, regarding the shape of the coil conductor layer, the coil conductor layer is longer on the top surface side than on the mounting surface side, and the coil conductor layers on the top surface side and the mounting surface side are shown to be connected by a linear or curved coil conductor layer.

[0007] However, as a result of the inventor's study, as in Patent Document 1 and Patent Document 2, when attempting to make the coil conductor layer longer on the top surface side than on the mounting surface side and connect these coil conductor layers on the top surface side and the mounting surface side with a linear or curved coil conductor layer, it was found that the coil conductor layer on the top surface side and the linear or curved coil conductor layer had to be connected at an acute angle or a right angle and with a small radius of curvature. Then, when the inventor formed the coil conductor layer by the method described in Patent Document 1 and Patent Document 2, that is, the photolithography method using a photosensitive conductive paste, so as to connect the coil conductor layer on the top surface side and the linear or curved coil conductor layer at an acute angle or a right angle and with a small radius of curvature, when performing development processing in the process of forming the connection portion between the coil conductor layer on the top surface side and the linear or curved coil conductor layer, development residues (here, residues of the conductive paste) occurred due to insufficient circulation of the developer, or overdevelopment occurred due to insufficient circulation of the rinse liquid for washing away the developer, and as a result, it was found that the width of the above-mentioned connection portion varied. As a result of the inventor's study as described above, in the electronic component described in Patent Document 1 and the inductor component described in Patent Document 2, there is a problem that it is difficult to reduce the variation in inductance because the width of the connection portion between the coil conductor layer on the top surface side and the linear or curved coil conductor layer varies.

[0008] As a method for avoiding the above problem, as shown in FIGS. 1 and 2 of Patent Document 3, it is conceivable to make the shape of the coil conductor layer such that the lengths of the coil conductor layers on the top surface side and the mounting surface side are substantially equal, and these coil conductor layers on the top surface side and the mounting surface side are connected by an arc-shaped coil conductor layer. More specifically, as in Patent Document 3, when attempting to connect the coil conductor layers on the top surface side and the mounting surface side with an arc-shaped coil conductor layer while making the lengths of the coil conductor layers on the top surface side and the mounting surface side substantially equal, the coil conductor layers on the top surface side and the mounting surface side and the arc-shaped coil conductor layer can be connected at an obtuse angle and with a large radius of curvature. Therefore, it is considered that insufficient circulation of the developer and the rinse liquid is eliminated when performing development processing in the process of forming the connection portion between the coil conductor layers on the top surface side and the mounting surface side and the arc-shaped coil conductor layer.

[0009] However, as a result of the inventor's study, when attempting to connect the coil conductor layers on the top surface side and the mounting surface side with an arcuate coil conductor layer while making the lengths of the coil conductor layers on the top surface side and the mounting surface side substantially equal as in Patent Document 3, it was found that the blank area between the coil conductor layer and the external electrode becomes large because it is necessary to arrange the coil conductor layer so as to avoid the external electrode. As a result of the inventor's study as described above, it was found that the inductor described in Patent Document 3 has a problem that the acquisition efficiency of inductance decreases because the blank area between the coil conductor layer and the external electrode becomes large.

[0010] The present invention has been made to solve the above problems, and an object thereof is to provide an inductor component capable of suppressing variations in inductance and increasing the acquisition efficiency of inductance.

Means for Solving the Problems

[0011] The inductor component of the present invention includes a base body, a coil provided inside the base body and wound in a spiral shape along the coil axis direction, a first external electrode electrically connected to one end of the coil, and a second external electrode electrically connected to the other end of the coil. The base body includes an insulator, and the surface of the base body includes a bottom surface parallel to the coil axis direction and a top surface facing the bottom surface in the height direction perpendicular to the coil axis direction. The first external electrode and the second external electrode are each exposed at least on the bottom surface of the base body. The coil is formed by electrically connecting a plurality of coil wirings laminated in the coil axis direction. At least one of the coil wirings includes, in order along the direction in which the coil wiring extends, a first coil wiring portion, a second coil wiring portion adjacent to the first coil wiring portion, and a third coil wiring portion adjacent to the second coil wiring portion. The first coil wiring portion extends from the top surface side to the bottom surface side of the base body. When viewed from the coil axis direction, the inner peripheral edge of the first coil wiring portion is formed by a first inner arc, the first inner arc has a center position inside the inner peripheral edge of the coil wiring and has at least one radius of curvature. When viewed from the coil axis direction, the outer peripheral edge of the first coil wiring portion is formed by a first outer arc located closer to the surface side of the base body than the first inner arc, the first outer arc has a center position inside the inner peripheral edge of the coil wiring and has at least one radius of curvature. The second coil wiring portion extends so as to be located closer to the bottom surface side of the base body than the first coil wiring portion. When viewed from the coil axis direction, the inner peripheral edge of the second coil wiring portion is formed by a second outer arc, the second outer arc has a center position outside the outer peripheral edge of the coil wiring and has at least one radius of curvature. When viewed from the coil axis direction, the outer peripheral edge of the second coil wiring portion is formed by a second inner arc located closer to the surface side of the base body than the second outer arc, the second inner arc has a center position outside the outer peripheral edge of the coil wiring and has at least one radius of curvature. The third coil wiring portion protrudes toward the bottom surface side of the base body with respect to the second coil wiring portion.

[0012] In the inductor component of the present invention, the inside of the inner peripheral edge of the coil wiring means a position other than the coil wiring when viewed from the coil axis direction, and the shortest distance from the inner peripheral edge of the coil wiring is smaller than the shortest distance from the outer peripheral edge of the coil wiring.

[0013] In the inductor component of the present invention, the outside of the outer peripheral edge of the coil wiring means a position other than the coil wiring when viewed from the coil axis direction, and the shortest distance from the outer peripheral edge of the coil wiring is smaller than the shortest distance from the inner peripheral edge of the coil wiring.

Advantages of the Invention

[0014] According to the present invention, it is possible to provide an inductor component capable of increasing the acquisition efficiency of inductance while suppressing variations in inductance.

Brief Description of the Drawings

[0015]

Figure 1

Figure 2

Figure 3

Figure 4

Figure 5

Figure 6

Embodiments for Carrying Out the Invention

[0016] Hereinafter, the inductor component of the present invention will be described. Note that the present invention is not limited to the following configuration and may be appropriately modified without departing from the gist of the present invention. Also, a combination of a plurality of the individual preferred configurations described below is also within the scope of the present invention.

[0017] The drawings shown below are schematic diagrams, and their dimensions, scales of aspect ratios, etc. may differ from those of actual products.

[0018] In this specification, terms indicating the relationship between elements (e.g., "parallel", "perpendicular", "orthogonal", etc.) and terms indicating the shape of elements do not only mean a strictly literal aspect, but also mean a substantially equivalent range, for example, a range including a difference of about several percent.

[0019] The inductor component of the present invention includes a base body, a coil provided inside the base body and wound spirally along the coil axis direction, a first external electrode electrically connected to one end of the coil, and a second external electrode electrically connected to the other end of the coil. The base body includes an insulator. The surface of the base body includes a bottom surface parallel to the coil axis direction and a top surface opposite to the bottom surface in the height direction perpendicular to the coil axis direction. The first external electrode and the second external electrode are each exposed at least on the bottom surface of the base body. The coil is formed by electrically connecting a plurality of coil wirings laminated in the coil axis direction. At least one of the coil wirings includes, in order along the direction in which the coil wiring extends, a first coil wiring portion, a second coil wiring portion adjacent to the first coil wiring portion, and a third coil wiring portion adjacent to the second coil wiring portion. The first coil wiring portion extends from the top surface side to the bottom surface side of the base body. When viewed from the coil axis direction, the inner peripheral edge of the first coil wiring portion is formed by a first inner arc. The first inner arc has a center position inside the inner peripheral edge of the coil wiring and has at least one radius of curvature. When viewed from the coil axis direction, the outer peripheral edge of the first coil wiring portion is formed by a first outer arc located on the surface side of the base body relative to the first inner arc. The first outer arc has a center position inside the inner peripheral edge of the coil wiring and has at least one radius of curvature. The second coil wiring portion extends so as to be located on the bottom surface side of the base body relative to the first coil wiring portion. When viewed from the coil axis direction, the inner peripheral edge of the second coil wiring portion is formed by a second outer arc. The second outer arc has a center position outside the outer peripheral edge of the coil wiring and has at least one radius of curvature. When viewed from the coil axis direction, the outer peripheral edge of the second coil wiring portion is formed by a second inner arc located on the surface side of the base body relative to the second outer arc. The second inner arc has a center position outside the outer peripheral edge of the coil wiring and has at least one radius of curvature. The third coil wiring portion protrudes on the bottom surface side of the base body with respect to the second coil wiring portion.

[0020] FIG. 1 is a perspective schematic view showing an example of an inductor component of the present invention.

[0021] The inductor component 1 shown in FIG. 1 has a body 10, a coil 20, a first external electrode 30a, and a second external electrode 30b.

[0022] In this specification, the length direction, the height direction, and the width direction are defined as the directions indicated by L, T, and W, respectively, as shown in FIG. 1 and the like. Here, the length direction L, the height direction T, and the width direction W are orthogonal to each other.

[0023] As shown in FIG. 1, the surface of the body 10 includes end faces 11a and 11b opposite to each other in the length direction L, top faces 12a and bottom faces 12b opposite to each other in the height direction T, and side faces 13a and 13b opposite to each other in the width direction W. In the example shown in FIG. 1, the width direction W is parallel to the coil axis direction of the coil 20. That is, the surface of the body 10 includes a bottom face 12b parallel to the coil axis direction and a top face 12a opposite to the bottom face 12b in the height direction T orthogonal to the coil axis direction.

[0024] Hereinafter, unless otherwise specified, the coil axis direction is taken as a direction parallel to the width direction W.

[0025] The bottom face 12b of the body 10 is a mounting surface. More specifically, the bottom face 12b of the body 10 is a mounting surface that faces a mounting object (for example, a substrate) when the inductor component 1 is mounted. Therefore, in the inductor component 1, the mounting surface of the body 10, that is, the bottom face 12b of the body 10 is parallel to the coil axis direction.

[0026] Marking for easily identifying each face may be provided on at least one of the surfaces of the body 10, that is, at least one of the end faces 11a, 11b, top faces 12a, bottom faces 12b, side faces 13a, and side faces 13b.

[0027] The end faces 11a and 11b of the base body 10 do not necessarily strictly intersect the length direction L at right angles. Also, the top face 12a and the bottom face 12b of the base body 10 do not necessarily strictly intersect the height direction T at right angles. Furthermore, the side faces 13a and 13b of the base body 10 do not necessarily strictly intersect the width direction W at right angles.

[0028] As shown in FIG. 1, the base body 10 is, for example, in the shape of a rectangular parallelepiped.

[0029] In this specification, the shape of a rectangular parallelepiped only needs to be a shape that can be said to be substantially rectangular parallelepiped, and includes, for example, a substantially rectangular parallelepiped with rounded corners and edges as described later.

[0030] It is preferable that the base body 10 has rounded corners and edges. The corners of the base body 10 are the portions where three faces of the base body 10 intersect. The edges of the base body 10 are the portions where two faces of the base body 10 intersect.

[0031] The base body 10 includes an insulator. In the example shown in FIG. 1, the insulator is formed by laminating a plurality of insulating layers in the coil axis direction.

[0032] In the example shown in FIG. 1, the plurality of insulating layers include an insulating layer 15a, an insulating layer 15b, an insulating layer 15c, and an insulating layer 15d.

[0033] Although not shown in FIG. 1, there is at least one insulating layer between the insulating layer 15b and the insulating layer 15c in the coil axis direction.

[0034] In FIG. 1, for convenience of explanation, the boundaries between the plurality of insulating layers are shown, but actually these boundaries do not clearly appear.

[0035] Examples of the insulating material constituting the insulator (insulating layer) include glass materials mainly composed of borosilicate glass, ceramic materials, organic materials such as epoxy resins, fluororesins, and polymer resins, and composite materials such as glass epoxy resins. As the insulating material, in particular, materials with low dielectric constant and dielectric loss are preferable.

[0036] The insulating materials that make up the plurality of insulating layers may be the same as each other, different from each other, or partially different from each other.

[0037] The dimensions of the plurality of insulating layers in the coil axis direction may be the same as each other, different from each other, or partially different from each other.

[0038] As shown in FIG. 1, the coil 20 is provided inside the base body 10 and is wound spirally along the coil axis direction.

[0039] The coil axis direction of the coil 20 is the direction in which the coil axis C of the coil 20 extends and is parallel to the bottom surface 12b which is the mounting surface of the base body 10 as described above.

[0040] As shown in FIG. 1, the coil 20 is formed by electrically connecting a plurality of coil wirings laminated in the coil axis direction.

[0041] In the example shown in FIG. 1, the plurality of coil wirings include a first coil wiring 21a and a second coil wiring 21b.

[0042] The first coil wiring 21a is located at the outermost position on the side of the side surface 13a of the base body 10 in the coil axis direction among the plurality of coil wirings.

[0043] The first coil wiring 21a may have a single-layer structure or a multi-layer structure.

[0044] The second coil wiring 21b is located at the outermost position on the side of the side surface 13b of the base body 10 in the coil axis direction among the plurality of coil wirings.

[0045] The second coil wiring 21b may have a single-layer structure or a multi-layer structure.

[0046] Although not shown in FIG. 1, there is at least one coil wiring between the first coil wiring 21a and the second coil wiring 21b in the coil axis direction.

[0047] Examples of the conductive material constituting the coil wiring include Ag, Au, Cu, Pd, Ni, Al, alloys containing at least one of these metals, and the like.

[0048] The conductive materials constituting the plurality of coil wirings may be the same as each other, may be different from each other, or may be partially different.

[0049] The dimensions of the plurality of coil wirings in the coil axis direction may be the same as each other, may be different from each other, or may be partially different.

[0050] Regarding the plurality of coil wirings, the dimensions in the direction orthogonal to the direction in which the coil wiring extends when viewed from the coil axis direction, that is, the widths when viewed from the coil axis direction, may be the same as each other, may be different from each other, or may be partially different.

[0051] Among the plurality of coil wirings, the coil wirings adjacent to each other in the coil axis direction may be electrically connected via a connection conductor that penetrates the insulating layer between the adjacent coil wirings in the coil axis direction. That is, the coil 20 may be formed by electrically connecting a plurality of coil wirings laminated in the coil axis direction via a connection conductor.

[0052] The connection conductor may have a single-layer structure or a multi-layer structure.

[0053] Examples of the conductive material constituting the connection conductor include Ag, Au, Cu, Pd, Ni, Al, alloys containing at least one of these metals, and the like.

[0054] Note that, as described above, in the example shown in FIG. 1, the coil 20 is configured with three or more coil wirings in which at least one coil wiring is added to the first coil wiring 21a and the second coil wiring 21b. However, by adjusting the position of the connection conductor, it is possible to configure the coil 20 with only the first coil wiring 21a and the second coil wiring 21b.

[0055] As shown in FIG. 1, the first external electrode 30a is electrically connected to one end of the coil 20. More specifically, as shown in FIG. 1, the first coil wiring 21a that constitutes the coil 20 is electrically connected to the first external electrode 30a via the first lead wiring 22a.

[0056] The first lead wiring 22a may have a single-layer structure or a multi-layer structure.

[0057] As shown in FIG. 1, the second external electrode 30b is electrically connected to the other end of the coil 20. More specifically, as shown in FIG. 1, the second coil wiring 21b that constitutes the coil 20 is electrically connected to the second external electrode 30b via the second lead wiring 22b.

[0058] The second lead wiring 22b may have a single-layer structure or a multi-layer structure.

[0059] Examples of the conductive material constituting the lead wiring include Ag, Au, Cu, Pd, Ni, Al, alloys containing at least one of these metals, and the like.

[0060] The conductive materials constituting the first lead wiring 22a and the second lead wiring 22b may be the same as each other or different from each other.

[0061] In this specification, when viewed from the coil axis direction, in the path where the coil wiring is connected to the external electrode, a wiring that extends toward the external electrode while inclining with respect to the linear portion of the coil wiring is defined as a lead wiring (for example, the example shown in FIG. 1). In this case, when viewed from the coil axis direction, the coil wiring and the lead wiring do not exist on the same straight line with the connection portion between the two as the boundary. In addition, when viewed from the coil axis direction, if no wiring corresponding to the lead wiring defined as above is found, a wiring that does not overlap the coil (protrudes from the coil) when viewed from the coil axis direction is defined as the lead wiring (for example, an example different from FIG. 1).

[0062] As shown in FIG. 1, the first external electrode 30a is exposed at least on the bottom surface 12b of the element body 10.

[0063] In the example shown in FIG. 1, the first external electrode 30a extends from a part of the bottom surface 12b of the element body 10 to a part of the end surface 11a. That is, in the example shown in FIG. 1, the first external electrode 30a is exposed not only on a part of the bottom surface 12b of the element body 10 but also on a part of the end surface 11a of the element body 10.

[0064] Note that the first external electrode 30a may be exposed only on the bottom surface 12b of the element body 10.

[0065] As shown in FIG. 1, the second external electrode 30b is exposed at least on the bottom surface 12b of the element body 10.

[0066] In the example shown in FIG. 1, the second external electrode 30b extends from a part of the bottom surface 12b of the element body 10 to a part of the end surface 11b. That is, in the example shown in FIG. 1, the second external electrode 30b is exposed not only on a part of the bottom surface 12b of the element body 10 but also on a part of the end surface 11b of the element body 10.

[0067] Note that the second external electrode 30b may be exposed only on the bottom surface 12b of the element body 10.

[0068] As described above, the first external electrode 30a and the second external electrode 30b are provided so as to be separated from each other in a direction orthogonal to the coil axis direction (here, the length direction L).

[0069] Further, when the first external electrode 30a and the second external electrode 30b are each exposed on the bottom surface 12b of the element body 10 which is the mounting surface, the mountability of the inductor component 1 is likely to be improved.

[0070] In the example shown in FIG. 1, the dimension of the first external electrode 30a in the coil axis direction is smaller than the dimension of the element body 10 in the coil axis direction.

[0071] Note that the dimension of the first external electrode 30a in the coil axis direction may be the same as the dimension of the element body 10 in the coil axis direction.

[0072] In the example shown in FIG. 1, the dimension of the second external electrode 30b in the coil axis direction is smaller than the dimension of the element body 10 in the coil axis direction.

[0073] Note that the dimension of the second external electrode 30b in the coil axis direction may be the same as the dimension of the element body 10 in the coil axis direction.

[0074] The first external electrode 30a may have a single-layer structure or a multi-layer structure.

[0075] The second external electrode 30b may have a single-layer structure or a multi-layer structure.

[0076] Examples of the conductive material constituting the external electrode include Ag, Au, Cu, Pd, Ni, Al, and alloys containing at least one of these metals.

[0077] The first external electrode 30a may have, in order from the coil 20 side, a base electrode containing the above-described conductive material (for example, Ag), a Ni-plated electrode, and a Sn-plated electrode. In this case, in the first external electrode 30a, the base electrode forms a surface integral with the surface of the element body 10 (in FIG. 1, the end face 11a and the bottom face 12b of the element body 10), and the Ni-plated electrode and the Sn-plated electrode may bulge from the surface of the element body 10 (in FIG. 1, the end face 11a and the bottom face 12b of the element body 10) so as to cover the base electrode.

[0078] The second external electrode 30b may have, in order from the coil 20 side, a base electrode containing the above-described conductive material (for example, Ag), a Ni-plated electrode, and a Sn-plated electrode. In this case, in the second external electrode 30b, the base electrode forms a surface integral with the surface of the element body 10 (in FIG. 1, the end face 11b and the bottom face 12b of the element body 10), and the Ni-plated electrode and the Sn-plated electrode may bulge from the surface of the element body 10 (in FIG. 1, the end face 11b and the bottom face 12b of the element body 10) so as to cover the base electrode.

[0079] The conductive materials constituting the first external electrode 30a and the second external electrode 30b may be the same as each other or different from each other.

[0080] FIG. 2 is a schematic cross-sectional view showing an example of a cross-section along the line segment a1 - a2 of the inductor component shown in FIG. 1. More specifically, FIG. 2 shows a cross-section including the first coil wiring 21a and the first lead wiring 22a among the cross-sections along the length direction L and the height direction T of the inductor component 1 shown in FIG. 1.

[0081] FIG. 3 is a schematic cross-sectional view showing a state in which auxiliary lines for explaining the shape of the first coil wiring are added to FIG. 2.

[0082] As shown in FIGS. 2 and 3, the first coil wiring 21a includes, in order along the direction in which the first coil wiring 21a extends, a first coil wiring portion 21aa, a second coil wiring portion 21ab adjacent to the first coil wiring portion 21aa, and a third coil wiring portion 21ac adjacent to the second coil wiring portion 21ab.

[0083] As shown in FIGS. 2 and 3, the first coil wiring portion 21aa extends from the top surface 12a side to the bottom surface 12b side of the base body 10.

[0084] As shown in FIGS. 2 and 3, when viewed from the coil axis direction, the inner peripheral edge of the first coil wiring portion 21aa is constituted by a first inner arc 41aa.

[0085] The first inner arc 41aa has a central position inside the inner peripheral edge of the first coil wiring 21a and has at least one radius of curvature.

[0086] In the example shown in FIGS. 2 and 3, the first inner arc 41aa has a central position Ea inside the inner peripheral edge of the first coil wiring 21a and has one radius of curvature.

[0087] When the first inner arc 41aa has a plurality of radii of curvature, the first inner arc 41aa includes a plurality of arcs corresponding to the respective radii of curvature, provided that the central positions of all of these plurality of arcs are inside the inner peripheral edge of the first coil wiring 21a.

[0088] In this specification, "inside the inner peripheral edge of the coil wiring" means a position other than the coil wiring when viewed from the coil axis direction, and the shortest distance from the inner peripheral edge of the coil wiring is smaller than the shortest distance from the outer peripheral edge of the coil wiring.

[0089] When the first inner arc 41aa has a plurality of radii of curvature, the first inner arc 41aa includes a plurality of arcs corresponding to the respective radii of curvature, and these plurality of arcs may be connected to each other via a line segment (including a tangent line), may be directly connected to each other without a line segment, or may be connected via a line segment in some regions while being directly connected without a line segment in other regions.

[0090] As shown in FIGS. 2 and 3, when viewed from the coil axis direction, the outer peripheral edge of the first coil wiring portion 21aa is constituted by a first outer arc 42aa located on the surface side of the base body 10 rather than the first inner arc 41aa.

[0091] The first outer arc 42aa has a central position inside the inner peripheral edge of the first coil wiring 21a and has at least one radius of curvature.

[0092] In the example shown in FIGS. 2 and 3, the first outer arc 42aa has a central position Fa inside the inner peripheral edge of the first coil wiring 21a and has one radius of curvature.

[0093] In the example shown in FIGS. 2 and 3, the central position Ea of the first inner arc 41aa and the central position Fa of the first outer arc 42aa are the same as each other.

[0094] Note that the central position Ea of the first inner arc 41aa and the central position Fa of the first outer arc 42aa may be different from each other.

[0095] When the first outer arc 42aa has a plurality of radii of curvature, the first outer arc 42aa includes a plurality of arcs corresponding to the respective radii of curvature. However, it is sufficient that the central positions of all these plurality of arcs are inside the inner peripheral edge of the first coil wiring 21a.

[0096] When the first outer arc 42aa has a plurality of radii of curvature, the first outer arc 42aa includes a plurality of arcs corresponding to the respective radii of curvature. These plurality of arcs may be connected to each other via a line segment (including a tangent line), may be directly connected to each other without passing through a line segment, or may be connected via a line segment in some regions while being directly connected without passing through a line segment in other regions.

[0097] In the first coil wiring 21a, since the first coil wiring portion 21aa extending from the top surface 12a side to the bottom surface 12b side of the element body 10 has the above-described shape, when performing development processing in the process of forming the connection portion between the coil wiring portion on the top surface 12a side of the element body 10 and the first coil wiring portion 21aa, and the connection portion between the coil wiring portion on the bottom surface 12b side of the element body 10 and the first coil wiring portion 21aa, the developing solution and the rinsing solution can easily circulate, so that development residues and overdevelopment are less likely to occur. Therefore, in the inductor component 1, the variation in the width when viewed from the coil axis direction of the connection portion in the first coil wiring 21a is suppressed, and as a result, the variation in inductance is suppressed. Further, according to the inductor component 1, since the variation in inductance is suppressed, the yield indicating the acquisition rate of the inductor component having a normal inductance is improved.

[0098] As shown in FIGS. 2 and 3, the second coil wiring portion 21ab extends so as to be located on the bottom surface 12b side of the element body 10 rather than the first coil wiring portion 21aa.

[0099] As shown in FIGS. 2 and 3, when viewed from the coil axis direction, the inner peripheral edge of the second coil wiring portion 21ab is constituted by a second outer arc 42ab.

[0100] The second outer arc 42ab has a center position outside the outer peripheral edge of the first coil wiring 21a and has at least one radius of curvature.

[0101] In the example shown in FIGS. 2 and 3, the second outer arc 42ab has a center position Fb outside the outer peripheral edge of the first coil wiring 21a and has one radius of curvature.

[0102] In the example shown in FIGS. 2 and 3, the center position Fb of the second outer arc 42ab is outside the outer peripheral edge of the first coil wiring 21a and is inside the element body 10.

[0103] Note that the center position Fb of the second outer arc 42ab may be outside the element body 10.

[0104] In addition, when the second outer arc 42ab has a plurality of radii of curvature, the second outer arc 42ab will include a plurality of arcs corresponding to the respective radii of curvature, provided that the center positions of all of these plurality of arcs are outside the outer peripheral edge of the first coil wiring 21a.

[0105] In this specification, "outside the outer peripheral edge of the coil wiring" means a position other than the coil wiring when viewed from the coil axis direction, and where the shortest distance from the outer peripheral edge of the coil wiring is smaller than the shortest distance from the inner peripheral edge of the coil wiring.

[0106] When the second outer arc 42ab has a plurality of radii of curvature, the second outer arc 42ab will include a plurality of arcs corresponding to the respective radii of curvature. These plurality of arcs may be connected to each other via a line segment (including a tangent line), may be directly connected to each other without a line segment, or may be connected via a line segment in some regions and directly connected without a line segment in other regions.

[0107] As shown in FIGS. 2 and 3, when viewed from the coil axis direction, the outer peripheral edge of the second coil wiring portion 21ab is constituted by a second inner arc 41ab located closer to the surface side of the base body 10 than the second outer arc 42ab.

[0108] The second inner arc 41ab has a center position outside the outer peripheral edge of the first coil wiring 21a and has at least one radius of curvature.

[0109] In the example shown in FIGS. 2 and 3, the second inner arc 41ab has a center position Eb outside the outer peripheral edge of the first coil wiring 21a and has one radius of curvature.

[0110] In the example shown in FIGS. 2 and 3, the center position Eb of the second inner arc 41ab is outside the outer peripheral edge of the first coil wiring 21a and is inside the base body 10.

[0111] Note that the center position Eb of the second inner arc 41ab may be outside the base body 10.

[0112] In the examples shown in FIGS. 2 and 3, the center position Eb of the second inner arc 41ab and the center position Fb of the second outer arc 42ab are the same as each other.

[0113] Note that the center position Eb of the second inner arc 41ab and the center position Fb of the second outer arc 42ab may be different from each other.

[0114] When the second inner arc 41ab has a plurality of radii of curvature, the second inner arc 41ab will include a plurality of arcs corresponding to the respective radii of curvature, but it is sufficient that the center positions of all of these plurality of arcs are outside the outer peripheral edge of the first coil wiring 21a.

[0115] When the second inner arc 41ab has a plurality of radii of curvature, the second inner arc 41ab will include a plurality of arcs corresponding to the respective radii of curvature, and these plurality of arcs may be connected to each other via a line segment (including a tangent line), or may be directly connected to each other without a line segment, or may be connected via a line segment in some regions while being directly connected without a line segment in other regions.

[0116] From the above, as shown in FIGS. 2 and 3, the inner peripheral edge of the first coil wiring 21a includes the first inner arc 41aa and the second outer arc 42ab adjacent to the first inner arc 41aa on the bottom surface 12b side of the base body 10. Further, as shown in FIGS. 2 and 3, the outer peripheral edge of the first coil wiring 21a includes the first outer arc 42aa and the second inner arc 41ab adjacent to the first outer arc 42aa on the bottom surface 12b side of the base body 10.

[0117] Since the inner peripheral edge and the outer peripheral edge of the first coil wiring 21a have the above-described shapes, reflection of high-frequency signals is suppressed.

[0118] As shown in FIGS. 2 and 3, the third coil wiring portion 21ac protrudes toward the bottom surface 12b side of the element body 10 with respect to the second coil wiring portion 21ab. More specifically, the third coil wiring portion 21ac protrudes toward the bottom surface 12b side of the element body 10 with respect to the second coil wiring portion 21ab so as to go between the first external electrode 30a and the second external electrode 30b each exposed on the bottom surface 12b of the element body 10.

[0119] Since the third coil wiring portion 21ac protrudes toward the bottom surface 12b side of the element body 10 with respect to the second coil wiring portion 21ab, the inner diameter of the first coil wiring 21a increases, and the margin areas between the first coil wiring 21a and the first external electrode 30a and between the first coil wiring 21a and the second external electrode 30b become smaller. Therefore, in the inductor component 1, the acquisition efficiency of the inductance is improved.

[0120] From the above, according to the inductor component 1, it is possible to realize an inductor component capable of increasing the acquisition efficiency of the inductance while suppressing the variation in the inductance.

[0121] According to the inductor component 1, it is possible to suppress the variation in the inductance and increase the acquisition efficiency of the inductance. Moreover, the inductance can be further adjusted by parameters such as the width of the coil wiring when viewed from the coil axis direction, the shortest distance in the length direction L between the end face 11a of the element body 10 and the coil 20, the shortest distance in the length direction L between the end face 11b of the element body 10 and the coil 20, the number of turns of the coil 20, the dimension of the coil wiring in the coil axis direction, and the dimension of the insulating layer between adjacent coil wirings in the coil axis direction.

[0122] As shown in FIG. 3, it is preferable that the radius of curvature of the first inner arc 41aa is larger than the radius of curvature of the second inner arc 41ab.

[0123] Since the radius of curvature of the first inner arc 41aa is larger than that of the second inner arc 41ab, the radius of curvature of the first coil wiring portion 21aa existing in the dead-end region surrounded by the coil wiring portion on the top surface 12a side and the coil wiring portion on the bottom surface 12b side of the base body 10 becomes larger. Therefore, when performing development processing in the process of forming the first coil wiring portion 21aa, the developing solution and the rinsing solution are more likely to circulate. As a result, development residues and overdevelopment are less likely to occur. Therefore, when the inductor component 1 is in the above-described mode, the variation in the width when viewed from the coil axis direction of the first coil wiring 21a is more suppressed. As a result, the variation in inductance is more suppressed. Further, when the inductor component 1 is in the above-described mode, since the variation in inductance is more suppressed, the yield indicating the acquisition rate of inductor components having a normal inductance is further improved.

[0124] On the other hand, unlike the first coil wiring portion 21aa, the second coil wiring portion 21ab exists in an open region rather than a dead-end region with respect to the circulation (flow) of the developing solution and the rinsing solution. Therefore, even if the radius of curvature of the second inner arc 41ab is smaller than the radius of curvature of the first inner arc 41aa, when performing development processing in the process of forming the second coil wiring portion 21ab, the developing solution and the rinsing solution are less likely to stay. As a result, development residues and overdevelopment are less likely to occur.

[0125] In addition, when both the first inner arc 41aa and the second inner arc 41ab have a plurality of radii of curvature, it is preferable that the minimum value of the radius of curvature of the first inner arc 41aa is larger than the maximum value of the radius of curvature of the second inner arc 41ab.

[0126] Further, the radius of curvature of the first inner arc 41aa may be equal to or less than the radius of curvature of the second inner arc 41ab. That is, the radius of curvature of the first inner arc 41aa may be the same as the radius of curvature of the second inner arc 41ab, or may be smaller than the radius of curvature of the second inner arc 41ab.

[0127] In addition, when both the first inner arc 41aa and the second inner arc 41ab have a plurality of radii of curvature, the maximum value of the radius of curvature of the first inner arc 41aa may be equal to or less than the minimum value of the radius of curvature of the second inner arc 41ab. That is, the maximum value of the radius of curvature of the first inner arc 41aa may be the same as the minimum value of the radius of curvature of the second inner arc 41ab, or may be smaller than the minimum value of the radius of curvature of the second inner arc 41ab.

[0128] The radius of curvature of the arc constituting the peripheral edge (inner peripheral edge or outer peripheral edge) of the coil wiring portion is defined as the radius of a circle approximated from any three points on the peripheral edge of the target coil wiring portion. However, when selecting any three points on the peripheral edge of the target coil wiring portion, minute unevenness, distortion, etc. of the peripheral edge of the coil wiring portion should be avoided. In addition, when it is determined that the value of the radius of curvature approximated by the above method includes an approximation error due to minute unevenness, distortion, etc. of the peripheral edge of the coil wiring portion, a value obtained by ignoring the approximation error is defined as the radius of curvature.

[0129] As shown in FIG. 3, it is preferable that both the center position Ea of the first inner arc 41aa and the center position Fa of the first outer arc 42aa are located on the top surface 12a side of the base body 10 rather than the center position G in the height direction T of the base body 10.

[0130] Since both the center position Ea of the first inner arc 41aa and the center position Fa of the first outer arc 42aa are located on the top surface 12a side of the base body 10 rather than the center position G in the height direction T of the base body 10, the radius of curvature of the first coil wiring portion 21aa can be further increased. Therefore, when performing development processing in the process of forming the first coil wiring portion 21aa, the developing solution and the rinsing solution can circulate more easily, and as a result, development residues and overdevelopment are less likely to occur. Therefore, when the inductor component 1 is in the above-described mode, the variation in the width when viewed from the coil axis direction of the first coil wiring 21a is further suppressed, and as a result, the variation in inductance is further suppressed. Further, when the inductor component 1 is in the above-described mode, the yield indicating the acquisition rate of inductor components having a normal inductance is further improved because the variation in inductance is further suppressed.

[0131] In addition, when both the first inner arc 41aa and the first outer arc 42aa have a plurality of radii of curvature, it is preferable that all the center positions of the plurality of arcs constituting the first inner arc 41aa and all the center positions of the plurality of arcs constituting the first outer arc 42aa are both on the top surface 12a side of the base body 10 rather than the center position G in the height direction T of the base body 10.

[0132] The radius of curvature of the first inner arc 41aa is preferably 15% or more of the dimension in the height direction T of the base body 10.

[0133] Since the radius of curvature of the first inner arc 41aa is 15% or more of the dimension in the height direction T of the base body 10, the radius of curvature of the first coil wiring portion 21aa can be further increased. Therefore, when performing development processing in the process of forming the first coil wiring portion 21aa, the developing solution and the rinsing solution can circulate more easily, and as a result, development residues and overdevelopment are less likely to occur. Accordingly, when the inductor component 1 is in the above-described manner, the variation in the width when viewed from the coil axis direction of the first coil wiring 21a is further suppressed, and as a result, the variation in inductance is further suppressed. Further, when the inductor component 1 is in the above-described manner, since the variation in inductance is further suppressed, the yield indicating the acquisition rate of the inductor component having a normal inductance is further improved.

[0134] The radius of curvature of the first inner arc 41aa is preferably 35% or less of the dimension in the height direction T of the base body 10.

[0135] Since the radius of curvature of the first inner arc 41aa is 35% or less of the dimension in the height direction T of the base body 10, it becomes easier to secure the arrangement region of the first coil wiring portion 21aa without making the first coil wiring portion 21aa thinner, and further, without reducing the insulation region between the first coil wiring portion 21aa and the surface of the base body 10. That is, since the radius of curvature of the first inner arc 41aa is 35% or less of the dimension in the height direction T of the base body 10, when securing the arrangement region of the first coil wiring portion 21aa, an increase in resistance caused by the first coil wiring portion 21aa becoming thinner is suppressed, and further, a decrease in reliability caused by the insulation region between the first coil wiring portion 21aa and the surface of the base body 10 becoming smaller is suppressed.

[0136] As described above, it is preferable that the radius of curvature of the first inner arc 41aa is 15% or more and 35% or less of the dimension in the height direction T of the base body 10.

[0137] When the first inner arc 41aa has a plurality of radii of curvature, it is preferable that the minimum value of the radius of curvature of the first inner arc 41aa is 15% or more of the dimension in the height direction T of the base body 10. Also, when the first inner arc 41aa has a plurality of radii of curvature, it is preferable that the maximum value of the radius of curvature of the first inner arc 41aa is 35% or less of the dimension in the height direction T of the base body 10.

[0138] It is preferable that the radius of curvature of the first inner arc 41aa is 30 μm or more. The above range of the radius of curvature of the first inner arc 41aa is particularly preferable when the arrangement region of the coil wiring of the inductor component 1 is narrow, for example, when the inductor component 1 has a small size such as 0402 (0.4 mm × 0.2 mm × 0.2 mm) size.

[0139] Since the radius of curvature of the first inner arc 41aa is 30 μm or more, the radius of curvature of the first coil wiring portion 21aa can be further increased. Therefore, when performing development processing in the process of forming the first coil wiring portion 21aa, the developer and the rinse liquid can circulate more easily, and as a result, development residues and overdevelopment are less likely to occur. Therefore, when the inductor component 1 is in the above-described mode, the variation in the width when viewed from the coil axis direction of the first coil wiring 21a is further suppressed, and as a result, the variation in inductance is further suppressed. Further, when the inductor component 1 is in the above-described mode, since the variation in inductance is further suppressed, the yield indicating the acquisition rate of the inductor component having a normal inductance is further improved.

[0140] The radius of curvature of the first inner arc 41aa is preferably 70 μm or less. The above range of the radius of curvature of the first inner arc 41aa is particularly preferable when the arrangement region of the coil wiring of the inductor component 1 is narrow, for example, when the inductor component 1 has a small size such as 0402 (0.4 mm × 0.2 mm × 0.2 mm).

[0141] As described above, the radius of curvature of the first inner arc 41aa is preferably 30 μm or more and 70 μm or less.

[0142] In addition, when the first inner arc 41aa has a plurality of radii of curvature, the minimum value of the radius of curvature of the first inner arc 41aa is preferably 30 μm or more. Further, when the first inner arc 41aa has a plurality of radii of curvature, the maximum value of the radius of curvature of the first inner arc 41aa is preferably 70 μm or less.

[0143] The radius of curvature of the first outer arc 42aa is preferably 60 μm or more and 85 μm or less. The above range of the radius of curvature of the first outer arc 42aa is particularly preferable when the arrangement region of the coil wiring of the inductor component 1 is narrow, for example, when the inductor component 1 has a small size such as 0402 (0.4 mm × 0.2 mm × 0.2 mm).

[0144] FIG. 4 is a schematic cross-sectional view showing an example of an enlarged state in the vicinity of the first coil wiring portion and the second coil wiring portion shown in FIG. 3.

[0145] As shown in FIG. 4, the first inner arc 41aa and the second outer arc 42ab may be connected via a tangent line J1 common to both of them. Further, as shown in FIG. 4, the first outer arc 42aa and the second inner arc 41ab may be connected via a tangent line J2 common to both of them.

[0146] When the first inner arc 41aa and the second outer arc 42ab are connected via the tangent line J1 common to both of them, and further, the first outer arc 42aa and the second inner arc 41ab are connected via the tangent line J2 common to both of them, the first coil wiring portion 21aa and the second coil wiring portion 21ab are smoothly connected. Therefore, when the inductor component 1 is in the above-described mode, reflection of high-frequency signals is likely to be suppressed. Also, when the inductor component 1 is in the above-described mode, the inner diameter of the first coil wiring 21a is likely to be large, so the acquisition efficiency of inductance is likely to be improved.

[0147] In this specification, in the mode in which two arcs are connected via a tangent line common to both of them, as long as the two arcs do not intersect, not only the mode in which the two arcs are connected via a straight line completely parallel to the tangent directions of both of them, but also the mode in which the two arcs are connected via a straight line substantially parallel to the tangent directions of both of them is included.

[0148] FIG. 5 is a schematic cross-sectional view showing another example of an enlarged state in the vicinity of the first coil wiring portion and the second coil wiring portion shown in FIG. 3.

[0149] Both the first inner arc 41aa and the first outer arc 42aa may have a plurality of radii of curvature.

[0150] When the first inner arc 41aa has a plurality of radii of curvature, as shown in FIG. 5, the arc 41aaa having the minimum radius of curvature among the first inner arcs 41aa and the second outer arc 42ab may be connected via a tangent line J1 common to both. That is, the arc 41aaa having the minimum radius of curvature in the first inner arc 41aa may be connected to the second outer arc 42ab via a tangent line J1 common to the second outer arc 42ab while being located closest to the second outer arc 42ab side among the first inner arcs 41aa.

[0151] When the first outer arc 42aa has a plurality of radii of curvature, as shown in FIG. 5, the arc 42aaa having the minimum radius of curvature among the first outer arcs 42aa and the second inner arc 41ab may be connected via a tangent line J2 common to both. That is, the arc 42aaa having the minimum radius of curvature in the first outer arc 42aa may be connected to the second inner arc 41ab via a tangent line J2 common to the second inner arc 41ab while being located closest to the second inner arc 41ab side among the first outer arcs 42aa.

[0152] When both the first inner arc 41aa and the first outer arc 42aa have a plurality of radii of curvature, the arc 41aaa having the minimum radius of curvature among the first inner arcs 41aa and the second outer arc 42ab are connected via a tangent line J1 common to both, and further, the arc 42aaa having the minimum radius of curvature among the first outer arcs 42aa and the second inner arc 41ab are connected via a tangent line J2 common to both, whereby the first coil wiring portion 21aa and the second coil wiring portion 21ab are smoothly connected. Therefore, when the inductor component 1 is in the above-described mode, reflection of high-frequency signals is likely to be suppressed. Further, when the inductor component 1 is in the above-described mode, the inner diameter of the first coil wiring 21a is likely to be increased, so that the acquisition efficiency of inductance is likely to be improved.

[0153] FIG. 6 is a cross-sectional schematic view showing still another example of an enlarged state of the vicinity of the first coil wiring portion and the second coil wiring portion shown in FIG. 3.

[0154] As shown in FIG. 6, the first inner arc 41aa and the second outer arc 42ab may be connected via a contact point K1 common to both. Further, as shown in FIG. 6, the first outer arc 42aa and the second inner arc 41ab may be connected via a contact point K2 common to both.

[0155] When the first inner arc 41aa and the second outer arc 42ab are connected via the contact point K1 common to both, and further, when the first outer arc 42aa and the second inner arc 41ab are connected via the contact point K2 common to both, the first coil wiring portion 21aa and the second coil wiring portion 21ab will be smoothly connected. Therefore, when the inductor component 1 is in the above-described mode, reflection of high-frequency signals is likely to be suppressed. Also, when the inductor component 1 is in the above-described mode, since the inner diameter of the first coil wiring 21a is likely to be large, the acquisition efficiency of inductance is likely to be improved.

[0156] The radius of curvature of the second inner arc 41ab is preferably 10 μm or more and 30 μm or less. The above range of the radius of curvature of the second inner arc 41ab is particularly preferable when the arrangement area of the coil wiring of the inductor component 1 is narrow, for example, when the inductor component 1 is a small size such as 0402 (0.4 mm × 0.2 mm × 0.2 mm).

[0157] Since the radius of curvature of the second inner arc 41ab is 10 μm or more and 30 μm or less, a state where the radius of curvature of the first inner arc 41aa is larger than the radius of curvature of the second inner arc 41ab is likely to be realized. As a result, when performing development processing in the process of forming the first coil wiring portion 21aa, the developing solution and the rinsing solution are likely to circulate, and as a result, development residues and overdevelopment are less likely to occur. Further, when performing development processing in the process of forming the second coil wiring portion 21ab, the developing solution and the rinsing solution are less likely to stay, and as a result, development residues and overdevelopment are less likely to occur. Therefore, when the inductor component 1 is in the above-described mode, the variation in the width when viewed from the coil axis direction of the first coil wiring 21a is suppressed, and as a result, the variation in inductance is suppressed. Further, when the inductor component 1 is in the above-described mode, since the variation in inductance is suppressed, the yield indicating the acquisition rate of the inductor component having a normal inductance is improved.

[0158] In addition, when the second inner arc 41ab has a plurality of radii of curvature, the maximum value of the radius of curvature of the second inner arc 41ab is preferably 10 μm or more and 30 μm or less.

[0159] The radius of curvature of the second inner arc 41ab is preferably 10% or less of the dimension in the height direction T of the base body 10.

[0160] Since the radius of curvature of the second inner arc 41ab is 10% or less of the dimension in the height direction T of the base body 10, a state where the radius of curvature of the first inner arc 41aa is larger than the radius of curvature of the second inner arc 41ab is likely to be realized. As a result, when performing development processing in the process of forming the first coil wiring portion 21aa, the developing solution and the rinsing solution are likely to circulate, and as a result, development residues and overdevelopment are less likely to occur. Further, when performing development processing in the process of forming the second coil wiring portion 21ab, the developing solution and the rinsing solution are less likely to stay, and as a result, development residues and overdevelopment are less likely to occur. Therefore, when the inductor component 1 is in the above-described aspect, the variation in the width when viewed from the coil axis direction of the first coil wiring 21a is suppressed, and as a result, the variation in inductance is suppressed. Further, when the inductor component 1 is in the above-described aspect, since the variation in inductance is suppressed, the yield indicating the acquisition rate of inductor components having a normal inductance is improved.

[0161] The radius of curvature of the second inner arc 41ab is preferably 5% or more of the dimension in the height direction T of the base body 10.

[0162] Since the radius of curvature of the second inner arc 41ab is 5% or more of the dimension in the height direction T of the base body 10, it becomes easier to form the second coil wiring portion 21ab.

[0163] As described above, the radius of curvature of the second inner arc 41ab is preferably 5% or more and 10% or less of the dimension in the height direction T of the base body 10.

[0164] In addition, when the second inner arc 41ab has a plurality of radii of curvature, the maximum value of the radius of curvature of the second inner arc 41ab is preferably 10% or less of the dimension in the height direction T of the base body 10. Further, when the second inner arc 41ab has a plurality of radii of curvature, the minimum value of the radius of curvature of the second inner arc 41ab is preferably 5% or more of the dimension in the height direction T of the base body 10.

[0165] The inner peripheral edge of the second coil wiring portion 21ab (i.e., the second outer arc 42ab) and the inner peripheral edge of the third coil wiring portion 21ac are preferably connected via a fillet.

[0166] The outer peripheral edge of the second coil wiring portion 21ab (i.e., the second inner arc 41ab) and the outer peripheral edge of the third coil wiring portion 21ac are preferably connected via a fillet.

[0167] The radius of the fillet connecting the inner peripheral edge of the second coil wiring portion 21ab and the inner peripheral edge of the third coil wiring portion 21ac, and the radius of the fillet connecting the outer peripheral edge of the second coil wiring portion 21ab and the outer peripheral edge of the third coil wiring portion 21ac are each preferably 10 μm or more. Note that the radius of these fillets may each be smaller than 10 μm.

[0168] The radius of the fillet connecting the inner peripheral edge of the second coil wiring portion 21ab and the inner peripheral edge of the third coil wiring portion 21ac is preferably smaller than the radius of the fillet connecting the outer peripheral edge of the second coil wiring portion 21ab and the outer peripheral edge of the third coil wiring portion 21ac. In this case, the radius of the fillet connecting the outer peripheral edge of the second coil wiring portion 21ab and the outer peripheral edge of the third coil wiring portion 21ac is preferably the sum of the radius of the fillet connecting the inner peripheral edge of the second coil wiring portion 21ab and the inner peripheral edge of the third coil wiring portion 21ac and the width of the first coil wiring 21a.

[0169] In this specification, a fillet refers to a portion that is curved without a distinct corner at the portion where an arc or a straight line is connected to each other. Also, the radius of a fillet refers to the radius of curvature of the curve constituting the fillet.

[0170] As shown in FIGS. 2 and 3, the first coil wiring 21a may further include, in the direction in which the first coil wiring 21a extends, a fifth coil wiring portion 21ab' adjacent to the third coil wiring portion 21ac and a fourth coil wiring portion 21aa' adjacent to the fifth coil wiring portion 21ab' in order from the third coil wiring portion 21ac toward the end of the first coil wiring 21a on the side opposite to the first external electrode 30a.

[0171] As shown in FIGS. 2 and 3, the fifth coil wiring portion 21ab' extends so as to be located on the top surface 12a side of the element body 10 rather than the third coil wiring portion 21ac.

[0172] As shown in FIGS. 2 and 3, when viewed from the coil axis direction, the inner peripheral edge of the fifth coil wiring portion 21ab' is formed by a fifth outer arc 42ab'.

[0173] The fifth outer arc 42ab' has a center position outside the outer peripheral edge of the first coil wiring 21a and has at least one radius of curvature.

[0174] In the example shown in FIGS. 2 and 3, the fifth outer arc 42ab' has a center position Fb' outside the outer peripheral edge of the first coil wiring 21a and has one radius of curvature.

[0175] In the example shown in FIGS. 2 and 3, the center position Fb' of the fifth outer arc 42ab' is outside the outer peripheral edge of the first coil wiring 21a and inside the element body 10.

[0176] As shown in FIGS. 2 and 3, when viewed from the coil axis direction, the outer peripheral edge of the fifth coil wiring portion 21ab' is formed by a fifth inner arc 41ab' located closer to the surface side of the element body 10 than the fifth outer arc 42ab'.

[0177] The fifth inner arc 41ab' has a center position outside the outer peripheral edge of the first coil wiring 21a and has at least one radius of curvature.

[0178] In the examples shown in FIGS. 2 and 3, the fifth inner arc 41ab' has a center position Eb' outside the outer peripheral edge of the first coil wiring 21a and has one radius of curvature.

[0179] In the examples shown in FIGS. 2 and 3, the center position Eb' of the fifth inner arc 41ab' is outside the outer peripheral edge of the first coil wiring 21a and is inside the base body 10.

[0180] As shown in FIGS. 2 and 3, the fourth coil wiring portion 21aa' extends so as to be located closer to the top surface 12a side of the base body 10 than the fifth coil wiring portion 21ab'.

[0181] As shown in FIGS. 2 and 3, when viewed from the coil axis direction, the inner peripheral edge of the fourth coil wiring portion 21aa' is formed by the fourth inner arc 41aa'.

[0182] The fourth inner arc 41aa' has a center position inside the inner peripheral edge of the first coil wiring 21a and has at least one radius of curvature.

[0183] In the examples shown in FIGS. 2 and 3, the fourth inner arc 41aa' has a center position Ea' inside the inner peripheral edge of the first coil wiring 21a and has one radius of curvature.

[0184] As shown in FIGS. 2 and 3, when viewed from the coil axis direction, the outer peripheral edge of the fourth coil wiring portion 21aa' is formed by a fourth outer arc 42aa' located closer to the surface side of the base body 10 than the fourth inner arc 41aa'.

[0185] The fourth outer arc 42aa' has a center position inside the inner peripheral edge of the first coil wiring 21a and has at least one radius of curvature.

[0186] In the examples shown in FIGS. 2 and 3, the fourth outer arc 42aa' has a center position Fa' inside the inner peripheral edge of the first coil wiring 21a and has one radius of curvature.

[0187] From the above, as shown in FIGS. 2 and 3, in addition to the inner peripheral edge of the first coil wiring 21a including the first inner arc 41aa and the second outer arc 42ab adjacent to the first inner arc 41aa on the bottom surface 12b side of the element body 10, it further includes the fifth outer arc 42ab' and the fourth inner arc 41aa' adjacent to the fifth outer arc 42ab' on the top surface 12a side of the element body 10. Further, as shown in FIGS. 2 and 3, in addition to the outer peripheral edge of the first coil wiring 21a including the first outer arc 42aa and the second inner arc 41ab adjacent to the first outer arc 42aa on the bottom surface 12b side of the element body 10, it further includes the fifth inner arc 41ab' and the fourth outer arc 42aa' adjacent to the fifth inner arc 41ab' on the top surface 12a side of the element body 10.

[0188] Since the inner peripheral edge and the outer peripheral edge of the first coil wiring 21a have the above-described shapes, the reflection of the high-frequency signal is further suppressed.

[0189] It is preferable that other aspects of the fourth inner arc 41aa', the fourth outer arc 42aa', the fifth inner arc 41ab', and the fifth outer arc 42ab' are the same as the aspects of the first inner arc 41aa, the first outer arc 42aa, the second inner arc 41ab, and the second outer arc 42ab described above, respectively.

[0190] It is preferable that the inner peripheral edge of the first lead wiring 22a and the inner peripheral edge of the first external electrode 30a are connected via a fillet.

[0191] It is preferable that the outer peripheral edge of the first lead wiring 22a and the outer peripheral edge of the first external electrode 30a are connected via a fillet.

[0192] The radius of the fillet connecting the inner peripheral edge of the first lead wiring 22a and the inner peripheral edge of the first external electrode 30a, and the radius of the fillet connecting the outer peripheral edge of the first lead wiring 22a and the outer peripheral edge of the first external electrode 30a are each preferably 10 μm or more. Note that the radii of these fillets may each be smaller than 10 μm.

[0193] The radius of the fillet connecting the inner peripheral edge of the first lead wiring 22a and the inner peripheral edge of the first external electrode 30a is preferably larger than the radius of the fillet connecting the outer peripheral edge of the first lead wiring 22a and the outer peripheral edge of the first external electrode 30a.

[0194] Hereinafter, the preferable ranges of various dimensions shown in FIG. 2 will be described. The ranges of the various dimensions shown below are particularly preferable when the arrangement region of the coil wiring of the inductor component 1 is narrow, for example, when the inductor component 1 is a small size such as 0402 (0.4 mm × 0.2 mm × 0.2 mm).

[0195] The width M when viewed from the coil axis direction of the first coil wiring 21a is preferably 15 μm or more and 40 μm or less.

[0196] The shortest distance N1 in the length direction L between the end face 11a of the element body 10 and the coil 20 (here, the first coil wiring 21a) is preferably 20 μm or more and 75 μm or less. The shortest distance N2 in the length direction L between the end face 11b of the element body 10 and the coil 20 (here, the first coil wiring 21a) is preferably 20 μm or more and 75 μm or less.

[0197] The shortest distance P1 in the height direction T between the top face 12a of the element body 10 and the coil 20 (here, the first coil wiring 21a) is preferably 10 μm or more and 30 μm or less. The shortest distance P2 in the height direction T between the bottom face 12b of the element body 10 and the coil 20 (here, the first coil wiring 21a) is preferably 10 μm or more and 30 μm or less.

[0198] The shortest distance Q1 in the height direction T between the coil 20 (here, the first coil wiring 21a) and the first external electrode 30a is preferably 10 μm or more and 30 μm or less. The shortest distance Q2 in the height direction T between the coil 20 (here, the first coil wiring 21a) and the second external electrode 30b is preferably 10 μm or more and 30 μm or less.

[0199] When viewed from the coil axis direction, the width R1 of the first external electrode 30a is preferably 10 μm or more and 25 μm or less. When viewed from the coil axis direction, the width R2 of the second external electrode 30b is preferably 10 μm or more and 25 μm or less.

[0200] The dimension S1 in the length direction L of the first external electrode 30a exposed on the bottom surface 12b of the element body 10 is preferably 60 μm or more and 150 μm or less. The dimension S2 in the length direction L of the second external electrode 30b exposed on the bottom surface 12b of the element body 10 is preferably 60 μm or more and 150 μm or less.

[0201] In the above, in the inductor component 1, the aspect mainly based on the shape of the first coil wiring 21a constituting the coil 20 has been described, but it is preferable that the same also applies to the aspect of the second coil wiring 21b constituting the coil 20.

[0202] The first coil wiring portion 21aa, the second coil wiring portion 21ab, and the third coil wiring portion 21ac, which are essential components of the inductor component 1, may exist in at least one of the plurality of coil wirings constituting the coil 20. For example, the first coil wiring portion 21aa, the second coil wiring portion 21ab, and the third coil wiring portion 21ac may exist only in the first coil wiring 21a, may exist only in the second coil wiring 21b, may exist in both the first coil wiring 21a and the second coil wiring 21b, or may exist in a coil wiring other than the first coil wiring 21a and the second coil wiring 21b. It is particularly preferable that the first coil wiring portion 21aa, the second coil wiring portion 21ab, and the third coil wiring portion 21ac exist in all the coil wirings constituting the coil 20.

[0203] The inductor component 1 is manufactured, for example, by the following method.

[0204] <Step of manufacturing a mother laminate> First, for example, an insulating paste containing a glass material mainly composed of borosilicate glass is repeatedly applied by screen printing or the like to form an insulating paste layer. The insulating paste layer formed here will later become the insulating layer 15a.

[0205] Next, for example, a photosensitive conductive paste mainly composed of a metal such as Ag is applied by screen printing or the like to form a photosensitive conductive paste layer on the insulating paste layer. Further, after irradiating the photosensitive conductive paste layer with ultraviolet rays or the like through a photomask, development is performed with an alkaline solution or the like to form a coil conductor layer, an external conductor layer, and a lead-out conductor layer connected to the coil conductor layer and the external conductor layer on the insulating paste layer. In the above manner, the coil conductor layer, the lead-out conductor layer, and the external conductor layer are formed at a plurality of locations by the photolithography method. The coil conductor layer formed here will later become the first coil wiring 21a. The lead-out conductor layer formed here will later become the first lead-out wiring 22a that connects the first coil wiring 21a and the first external electrode 30a. The external conductor layer formed here will later become a part of each of the first external electrode 30a and the second external electrode 30b.

[0206] When forming the coil conductor layer, for example, by using a photomask on which a pattern of the coil wiring according to the inductor component of the present invention (for example, the pattern of the first coil wiring 21a shown in FIG. 1) is drawn, in the inductor component 1 obtained later, the pattern of the coil wiring according to the inductor component of the present invention can be realized.

[0207] Note that when forming the coil conductor layer, the lead-out conductor layer, and the external conductor layer, instead of exposure using a photomask, for example, DI exposure (also called direct image exposure or direct drawing) without using a photomask may be performed.

[0208] Next, for example, by applying a photosensitive insulating paste by screen printing or the like, a new insulating paste layer is formed on the already formed insulating paste layer. Further, after irradiating the newly formed insulating paste layer with ultraviolet rays or the like through a photomask, development is performed with an alkaline solution or the like to form via holes and openings in the insulating paste layer. In the above-described manner, an insulating paste layer provided with via holes and openings at a plurality of locations is formed by photolithography. The insulating paste layer formed here includes an insulating paste layer that will later become the insulating layer 15b. The via holes formed here overlap a part of the already formed coil conductor layer. The openings formed here overlap the already formed external conductor layer.

[0209] Note that when forming the insulating paste layer provided with via holes and openings, instead of exposure using a photomask, for example, DI exposure without using a photomask may be performed.

[0210] Next, for example, by applying a photosensitive conductive paste containing Ag or the like as a main metal component by screen printing or the like, a new photosensitive conductive paste layer is formed inside the via holes and openings while being formed on the already formed insulating paste layer. Further, after irradiating the photosensitive conductive paste layer with ultraviolet rays or the like through a photomask, development is performed with an alkaline solution or the like to form a connection conductor layer inside the via holes, and while forming a new coil conductor layer connected to the connection conductor layer on the insulating paste layer, and further forming a new external conductor layer connected to the already formed external conductor layer inside the openings, and forming a further new external conductor layer on this external conductor layer. In the above-described manner, a coil conductor layer, a connection conductor layer, and an external conductor layer are formed by photolithography. The connection conductor layer formed here will later become a connection conductor that connects adjacent coil wirings in the coil axis direction.

[0211] Note that when forming the coil conductor layer, the connection conductor layer, and the external conductor layer, instead of exposure using a photomask, for example, DI exposure without using a photomask may be performed.

[0212] Thereafter, by repeating the above steps, an insulating paste layer, a coil conductor layer, a connection conductor layer, and an external conductor layer are formed so as to have a predetermined laminated structure. For example, the coil conductor layer formed here includes a coil conductor layer that will later become the second coil wiring 21b.

[0213] When forming the coil conductor layer that will later become the second coil wiring 21b and the external conductor layer of the same layer as the coil conductor layer, a lead-out conductor layer connected to the coil conductor layer and the external conductor layer is also formed. The lead-out conductor layer formed here will later become the second lead-out wiring 22b.

[0214] Finally, for example, by repeatedly applying an insulating paste containing a glass material mainly composed of borosilicate glass or the like by screen printing or the like, a new insulating paste layer is formed. The insulating paste layer formed here includes an insulating paste layer that will later become the insulating layer 15c and the insulating layer 15d.

[0215] Thus, a mother laminate is manufactured.

[0216] The method of forming the conductor patterns of the coil conductor layer, the lead-out conductor layer, the connection conductor layer, and the external conductor layer is not limited to the photolithography method described above. For example, it may be a method of printing and laminating a conductive paste using a screen printing plate provided with an opening in the shape of the conductor pattern, or a method of forming a conductor film by sputtering, vapor deposition, a method of crimping a foil, etc., and then etching the conductor film so as to have the shape of the conductor pattern. It may also be a method of forming a negative pattern by a semi-additive method, then forming a plating film, and then removing unnecessary portions of the plating film by etching or the like so as to have the shape of the conductor pattern.

[0217] When forming the conductor patterns of the coil conductor layer, lead-out conductor layer, connection conductor layer, and external conductor layer, by forming the conductor patterns in multiple layers to achieve a high aspect ratio, the loss due to resistance at high frequencies can be reduced. The method of forming the conductor patterns in multiple layers is not particularly limited. For example, it may be a method of repeatedly stacking the conductor patterns by repeating the process using the photolithography method as described above, or a method of repeatedly stacking the conductor patterns formed by the semi-additive method, or a method of stacking, in any order, the conductor pattern formed by the semi-additive method and the conductor pattern formed by etching a separately electroplated and grown plating film, or a method of further electroplating and growing the plating film formed by the semi-additive method.

[0218] The conductive material constituting the conductor patterns of the coil conductor layer, lead-out conductor layer, connection conductor layer, and external conductor layer is not limited to the photosensitive conductive paste containing Ag or the like as the main metal component described above. For example, it may be a conductor containing metals such as Ag, Au, and Cu formed by sputtering, vapor deposition, a method of crimping a foil, electroplating, or the like.

[0219] The method of forming the insulating paste layer is not limited to the photolithography method described above. For example, it may be a method of crimping a sheet made of an insulating material, a method of spin-coating an insulating material, or a method of spray-coating an insulating material.

[0220] The method of forming the insulating paste layer provided with via holes and openings is not limited to the photolithography method described above. For example, after forming an insulating film by methods such as crimping a sheet made of an insulating material, spin-coating an insulating material, or spray-coating an insulating material, via holes and openings may be provided by performing laser processing, drilling, or the like on the insulating film.

[0221] The insulating material constituting the insulating paste layer is not limited to the glass material mainly composed of the above-mentioned borosilicate glass. For example, it may be a ceramic material, an organic material such as an epoxy resin, a fluororesin, a polymer resin, a composite material such as a glass epoxy resin, etc. As the insulating material, a material having particularly small dielectric constant and dielectric loss is preferable.

[0222] <Process of forming a substrate, a coil, and external electrodes> First, the mother laminate is cut by dicing or the like to be separated into a plurality of unfired laminates.

[0223] The unfired laminate has an insulating paste laminated portion where an insulating paste layer is laminated, a coil conductor laminated portion where coil conductor layers are laminated such that adjacent coil conductor layers are electrically connected via a connection conductor layer, and an external conductor laminated portion where an external conductor layer is laminated.

[0224] When separating the unfired laminate into individual pieces, the external conductor laminated portion is exposed at two locations on at least the bottom surface of the insulating paste laminated portion included in the cut surface of the unfired laminate.

[0225] Next, the unfired laminate is fired to produce a laminate.

[0226] When the unfired laminate is fired, the insulating paste layer becomes an insulating layer, and thus the insulating paste laminated portion becomes the substrate 10. Also, when the unfired laminate is fired, the coil conductor layer becomes a coil wiring, and thus the coil conductor laminated portion becomes the coil 20. Further, when the unfired laminate is fired, one of the two external conductor laminated portions becomes a part of the first external electrode 30a, and the other becomes a part of the second external electrode 30b.

[0227] Next, for the obtained laminate, for example, a barrel polishing process may be performed to round the corner portions and ridge line portions of the substrate 10.

[0228] Finally, using the two external conductor laminated portions after firing as base electrodes, an Ni-plated electrode and an Sn-plated electrode are sequentially formed on the surface of each base electrode by plating. The thicknesses of the Ni-plated electrode and the Sn-plated electrode are, for example, 2 μm or more and 10 μm or less, respectively.

[0229] In this way, a first external electrode 30a and a second external electrode 30b having a base electrode, an Ni-plated electrode, and an Sn-plated electrode in this order from the surface side of the element body 10 are formed.

[0230] The method of forming the external electrode is not limited to the method of performing plating on the external conductor laminated portion exposed on the cut surface (at least the bottom surface of the insulating paste laminated portion) of the unfired laminate as described above. For example, after exposing the external conductor laminated portion on the cut surface (at least the bottom surface of the insulating paste laminated portion) of the unfired laminate as described above, the exposed portion of the external conductor laminated portion may be immersed (dipped) in a conductive paste, or a conductive paste may be formed on the exposed portion of the external conductor laminated portion by sputtering, and then plating may be performed.

[0231] Thus, the inductor component 1 is manufactured.

[0232] The inductor component 1 is manufactured, for example, in a 0402 (0.4 mm × 0.2 mm × 0.2 mm) size. The size of the inductor component 1 is not limited to the 0402 (0.4 mm × 0.2 mm × 0.2 mm) size.

[0233] As described above, examples of the mold used when forming the coil conductor layer (subsequent coil wiring) include a photomask (for example, when performing exposure by photolithography), a design drawing (when performing DI exposure), etc. However, when the pattern of the coil wiring according to the inductor component of the present invention (for example, the pattern of the first coil wiring 21a shown in FIG. 1) is drawn on these molds, the pattern of the coil wiring according to the inductor component of the present invention can be realized. Therefore, a mold (for example, a photomask, a design drawing, etc.) on which the pattern of the coil wiring according to the inductor component of the present invention is drawn is also one of the present inventions.

[0234] The following content is disclosed in this specification.

[0235] <1> A base body, A coil provided inside the base body and wound spirally along the coil axis direction, A first external electrode electrically connected to one end of the coil, A second external electrode electrically connected to the other end of the coil, and The base body includes an insulator, The surface of the base body includes a bottom surface parallel to the coil axis direction and a top surface opposite to the bottom surface in the height direction perpendicular to the coil axis direction, The first external electrode and the second external electrode are each exposed at least on the bottom surface of the base body, The coil is formed by electrically connecting a plurality of coil wirings laminated in the coil axis direction, At least one of the coil wirings includes, in order along the direction in which the coil wiring extends, a first coil wiring portion, a second coil wiring portion adjacent to the first coil wiring portion, and a third coil wiring portion adjacent to the second coil wiring portion, The first coil wiring portion extends from the top surface side to the bottom surface side of the base body, When viewed from the coil axis direction, the inner peripheral edge of the first coil wiring portion is formed by a first inner arc, The first inner arc has a center position inside the inner peripheral edge of the coil wiring and has at least one radius of curvature, When viewed from the coil axis direction, the outer peripheral edge of the first coil wiring portion is formed by a first outer arc located on the surface side of the base body with respect to the first inner arc, The first outer arc has a center position inside the inner peripheral edge of the coil wiring and has at least one radius of curvature, The second coil wiring portion extends so as to be located on the bottom surface side of the base body with respect to the first coil wiring portion, When viewed from the coil axis direction, the inner peripheral edge of the second coil wiring portion is composed of a second outer arc, The second outer arc has a center position outside the outer peripheral edge of the coil wiring and has at least one radius of curvature, When viewed from the coil axis direction, the outer peripheral edge of the second coil wiring portion is composed of a second inner arc located on the surface side of the base body with respect to the second outer arc, The second inner arc has a center position outside the outer peripheral edge of the coil wiring and has at least one radius of curvature, The third coil wiring portion protrudes toward the bottom surface side of the base body with respect to the second coil wiring portion. The inductor component is characterized by this.

[0236] <2> The inductor component according to <1>, wherein the radius of curvature of the first inner arc is larger than the radius of curvature of the second inner arc.

[0237] <3> The inductor component according to <2>, wherein both the center position of the first inner arc and the center position of the first outer arc are present on the top surface side of the base body with respect to the center position in the height direction of the base body.

[0238] <4> The inductor component according to <3>, wherein the radius of curvature of the first inner arc is 15% or more of the dimension in the height direction of the base body.

[0239] <5> The inductor component according to <3> or <4>, wherein the radius of curvature of the first inner arc is 30 μm or more.

[0240] <6> The first inner arc and the second outer arc are connected via a tangent line common to both, The inductor component according to any one of <2> to <5>, wherein the first outer arc and the second inner arc are connected via a tangent line common to both.

[0241] <7> Both the first inner arc and the first outer arc have a plurality of radii of curvature. The arc having the minimum radius of curvature among the first inner arcs and the second outer arc are connected via a tangent line common to both. The inductor component according to <6>, wherein the arc having the minimum radius of curvature among the first outer arcs and the second inner arc are connected via a tangent line common to both.

[0242] <8> The first inner arc and the second outer arc are connected via a contact point common to both. The inductor component according to any one of <2> to <5>, wherein the first outer arc and the second inner arc are connected via a contact point common to both.

[0243] <9> The inductor component according to any one of <6> to <8>, wherein the radius of curvature of the second inner arc is 10 μm or more and 30 μm or less.

[0244] <10> The inductor component according to any one of <6> to <9>, wherein the radius of curvature of the second inner arc is 10% or less of the dimension of the base body in the height direction.

Explanation of Signs

[0245] 1 Inductor component 10 Base body 11a, 11b End faces of the base body 12a Top surface of the base body 12b Bottom surface of the base body 13a, 13b Side surfaces of the base body 15a, 15b, 15c, 15d Insulating layer 20 Coil 21a First coil wiring 21aa First coil wiring portion 21ab Second coil wiring portion 21ac Third coil wiring portion 21aa’ Fourth coil wiring portion 21ab’ 5th Coil Wiring Section 21b 2nd Coil Wiring 22a 1st Lead Wiring 22b 2nd Lead Wiring 30a 1st External Electrode 30b 2nd External Electrode 41aa 1st Inner Arc 41aaa Arc with the Minimum Curvature Radius among the 1st Inner Arcs 41ab 2nd Inner Arc 41aa’ 4th Inner Arc 41ab’ 5th Inner Arc 42aa 1st Outer Arc 42aaa Arc with the Minimum Curvature Radius among the 1st Outer Arcs 42ab 2nd Outer Arc 42aa’ 4th Outer Arc 42ab’ 5th Outer Arc C Coil Axis Ea, Ea’ Center Positions of the 1st Inner Arc Eb, Eb’ Center Positions of the 2nd Inner Arc Fa, Fa’ Center Positions of the 1st Outer Arc Fb, Fb’ Center Positions of the 2nd Outer Arc G Center Position in the Height Direction of the Element Body J1, J2 Tangent Lines K1, K2 Contact Points L Length Direction M Width as Seen from the Coil Axis Direction of the 1st Coil Wiring N1, N2 Shortest Distances in the Length Direction between the End Faces of the Element Body and the Coil P1 Shortest Distance in the Height Direction between the Top Face of the Element Body and the Coil P2 Shortest Distance in the Height Direction between the Bottom Face of the Element Body and the Coil Q1 Shortest Distance in the Height Direction between the Coil and the 1st External Electrode Q2 Shortest Distance in the Height Direction between the Coil and the 2nd External Electrode R1 Width as Seen from the Coil Axis Direction of the 1st External Electrode R2 Width as Seen from the Coil Axis Direction of the 2nd External Electrode Dimension in the length direction of the first external electrode exposed on the bottom surface of the substrate body Dimension in the length direction of the second external electrode exposed on the bottom surface of the substrate body Height direction Width direction

Claims

1. A rectangular parallelepiped-shaped body, a coil provided inside the body and wound spirally along the coil axis direction, a first external electrode electrically connected to one end of the coil, a second external electrode electrically connected to the other end of the coil, and the body includes an insulator, the surface of the body includes a bottom surface parallel to the coil axis direction and a top surface opposite to the bottom surface in the height direction perpendicular to the coil axis direction, the first external electrode and the second external electrode are each exposed at least on the bottom surface of the body, the coil is formed by electrically connecting a plurality of coil wirings laminated in the coil axis direction, at least one of the coil wirings includes, in order along the direction in which the coil wiring extends, a first coil wiring portion, a second coil wiring portion adjacent to the first coil wiring portion, and a third coil wiring portion adjacent to the second coil wiring portion, the first coil wiring portion extends from the top surface side of the body to the bottom surface side, approaches the end surface of the body facing the first coil wiring portion, and then moves away from the end surface, when viewed from the coil axis direction, the inner peripheral edge of the first coil wiring portion is composed of a first inner arc, the first inner arc has a center position inside the inner peripheral edge of the coil wiring and has at least one radius of curvature, when viewed from the coil axis direction, the outer peripheral edge of the first coil wiring portion is composed of a first outer arc located closer to the surface side of the body than the first inner arc, the first outer arc has a center position inside the inner peripheral edge of the coil wiring and has at least one radius of curvature, the second coil wiring portion extends so as to be located closer to the bottom surface side of the body than the first coil wiring portion, when viewed from the coil axis direction, the inner peripheral edge of the second coil wiring portion is composed of a second outer arc, the second outer arc has a center position outside the outer peripheral edge of the coil wiring and has at least one radius of curvature, when viewed from the coil axis direction, the outer peripheral edge of the second coil wiring portion is composed of a second inner arc located closer to the surface side of the body than the second outer arc, the second inner arc has a center position outside the outer peripheral edge of the coil wiring and has at least one radius of curvature, the third coil wiring portion protrudes toward the bottom surface side of the body with respect to the second coil wiring portion. An inductor component characterized by this.

2. The inductor component according to claim 1, wherein the radius of curvature of the first inner arc is larger than the radius of curvature of the second inner arc.

3. The inductor component according to claim 2, wherein both the center position of the first inner arc and the center position of the first outer arc are located on the top surface side of the base body rather than at the center position of the base body in the height direction.

4. The inductor component according to claim 3, wherein the radius of curvature of the first inner arc is 15% or more of the dimension of the base body in the height direction.

5. The inductor component according to claim 3, wherein the radius of curvature of the first inner arc is 30 μm or more.

6. The first inner arc and the second outer arc are connected via a tangent line common to both. The inductor component according to claim 2, wherein the first outer arc and the second inner arc are connected via a tangent line common to both.

7. Both the first inner arc and the first outer arc have a plurality of radii of curvature. The arc having the minimum radius of curvature among the first inner arcs and the second outer arc are connected via a tangent line common to both. The inductor component according to claim 6, wherein the arc having the minimum radius of curvature among the first outer arcs and the second inner arc are connected via a tangent line common to both.

8. The first inner arc and the second outer arc are connected via a contact point common to both. The inductor component according to claim 2, wherein the first outer arc and the second inner arc are connected via a contact point common to both.

9. The inductor component according to any one of claims 6 to 8, wherein the radius of curvature of the second inner arc is 10 μm or more and 30 μm or less.

10. The inductor component according to any one of claims 6 to 8, wherein the radius of curvature of the second inner arc is 10% or less of the dimension of the base body in the height direction.

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