Charged Particle Beam Processing System

Abstract

The present invention provides a computer, a program, and a charged particle beam processing system, with which it is possible to reduce adjustment and setting work of conditions for observation or machining by an operator in an FIB-SEM composite device. This computer comprises: an information acquisition unit that acquires information relating to a recipe to be executed by a charged particle beam device provided with a charged particle irradiation optical system; and an information management unit that generates recipe management information on the basis of the information acquired by the information acquisition unit and stores the recipe management information in a storage unit.

Description

Technical Field

[0001] The present invention relates to a computer, a program, and a charged particle beam processing system.

Background Art

[0002] A FIB-SEM composite type charged particle beam apparatus capable of irradiating a charged particle beam (hereinafter also referred to as a FIB-SEM composite apparatus) is known (see, for example, Patent Document 1). In the FIB-SEM composite apparatus, for example, it is possible to irradiate one or both of two types of charged particle beams such as a focused ion beam (FIB) and an electron beam (EB). In the FIB-SEM composite apparatus, for example, cross-section forming processing (etching processing) is performed using a focused ion beam (FIB), and an electron beam (EB) is scanned by a scanning electron microscope (SEM) to obtain a cross-sectional image of a sample.

[0003] In the FIB-SEM composite apparatus, a sample piece produced by irradiating a sample with a charged particle beam composed of electrons or ions is extracted, and the sample piece is processed into a shape suitable for various processes such as observation, analysis, and measurement using a transmission electron microscope (TEM). In such a FIB-SEM composite apparatus, when observation is performed using a transmission electron microscope, after taking out a fine thin film sample piece from the sample that is the observation object, the thin film sample piece is fixed to a holder (sample piece holder) to produce a TEM sample, so-called micro-sampling (MS) is performed.

Prior Art Documents

Patent Documents

[0004]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0005] However, in the production of samples such as thin-film samples for TEM observation using a FIB-SEM composite device, in order to use appropriate observation conditions and processing conditions in each step of the production, the operator had to pre-adjust and set the necessary conditions.

[0006] For example, even when the same observation and processing are performed with multiple FIB-SEM composite devices, there are problems such as the lack of a mechanism for sharing settings such as observation conditions and processing conditions between devices, and the problem of device differences (mechanical differences). Therefore, the operator needs to perform adjustment and setting operations for each device, which has been a burden on the operator. Furthermore, the accuracy of such adjustments and settings, or the time required for the work, varies depending on the operator's proficiency, and such differences have affected the quality of the samples and the yield of sample production.

[0007] The present invention has been made in consideration of such circumstances, and an object of the present invention is to provide a charged particle beam processing system that can reduce the work of adjusting and setting the conditions for observation or processing by an operator in a FIB-SEM composite device.

[0008] Another object of the present invention is to provide a charged particle beam processing system that enables cooperation between a plurality of FIB-SEM composite devices.

Means for Solving the Problems

[0009] As one configuration example, a charged particle beam processing system including a charged particle beam device equipped with a charged particle irradiation optical system and a computer, the charged particle beam processing system including two or more of the charged particle beam devices including a first charged particle beam device which is a first model and a second charged particle beam device which is a second model different from the first model, the computer includes an information acquisition unit which acquires information regarding a recipe executed in the charged particle beam device, an information management unit which generates recipe management information based on the information acquired by the information acquisition unit and stores the recipe management information in a storage unit, an information selection unit which selects information based on the recipe management information, and a recipe allocation unit which allocates a recipe to a predetermined target based on the information selected by the information selection unit, the charged particle beam device includes a recipe execution unit which executes processing of the recipe allocated by the computer, and the charged particle beam processing system includes a system in which the two or more charged particle beam devices work together to perform an assembly line, and in the assembly line, the first charged particle beam device performs an assembly line for a sample, and the charged particle beam processing system includes a system in which ... assigned to the first charged particle beam device by the recipe assignment unit After the first recipe is executed, the second charged particle beam device is assigned to the second charged particle beam device by the recipe assignment unit a processing step of executing a second recipe, the first charged particle beam device notifying the computer of first information regarding the processing after executing the processing of the first recipe, the computer determining second information to be notified to the second charged particle beam device based on the first information notified from the first charged particle beam device and notifying the second charged particle beam device of the determined second information, the first information including predetermined information regarding the sample attached to a pillar in the processing of the first recipe of the first charged particle beam device, the second information being information capable of determining a position for performing the processing of the second recipe, which is a subsequent processing of the first recipe, and the second charged particle beam device determining the position based on the second information notified from the computer and performing processing or observation processing as the processing of the second recipe. As a configuration example, a charged particle beam processing system including a charged particle beam apparatus equipped with a charged particle irradiation optical system and a computer, comprising two or more of the charged particle beam apparatuses including a first charged particle beam apparatus of a first model and a second charged particle beam apparatus of a second model different from the first model. The computer includes an information acquisition unit that acquires information regarding a recipe executed by the charged particle beam apparatus, an information management unit that generates recipe management information based on the information acquired by the information acquisition unit and stores the recipe management information in a storage unit, an information selection unit that selects information based on the recipe management information, and a recipe assignment unit that assigns a recipe to a predetermined target based on the information selected by the information selection unit. The charged particle beam apparatus includes a recipe execution unit that executes the processing of the recipe assigned by the computer. The charged particle beam processing system is configured such that these two or more charged particle beam apparatuses cooperate to perform a flow operation. In the flow operation, after the first charged particle beam apparatus executes the processing of the first recipe, the second charged particle beam apparatus executes the processing of the second recipe on the processed sample. The first charged particle beam apparatus notifies the computer of first information regarding the processing after executing the processing of the first recipe. The computer determines second information to be notified to the second charged particle beam apparatus based on the first information notified from the first charged particle beam apparatus, and notifies the determined second information to the second charged particle beam apparatus. When the first information notified from the first charged particle beam apparatus is not directly applicable to the second charged particle beam apparatus, the information is converted into other information applicable to the second charged particle beam apparatus and the converted information is notified to the second charged particle beam apparatus. assigned to the first charged particle beam device by the recipe assignment unit After the first charged particle beam apparatus executes the processing of the first recipe, the second charged particle beam apparatus executes the processing of the second recipe on the processed sample. assigned to the second charged particle beam device by the recipe assignment unit After the first charged particle beam apparatus executes the processing of the first recipe, it notifies the computer of first information regarding the processing. The computer determines second information to be notified to the second charged particle beam apparatus based on the first information notified from the first charged particle beam apparatus, and notifies the determined second information to the second charged particle beam apparatus. When the first information notified from the first charged particle beam apparatus is not directly applicable to the second charged particle beam apparatus, the information is converted into other information applicable to the second charged particle beam apparatus and the converted information is notified to the second charged particle beam apparatus. and in this case, the second charged particle beam device executes the processing of the second recipe based on the converted information This is a charged particle beam processing system.

[0010]

[0011]

Advantages of the Invention

[0012] According to the charged particle beam processing system of the present invention, in a FIB-SEM composite apparatus, it is possible to reduce the work of adjusting and setting the observation or processing conditions by an operator.

[0013] Further, according to the charged particle beam processing system of the present invention, it is possible to enable the cooperation of a plurality of FIB-SEM composite apparatuses.

Brief Description of the Drawings

[0014]

Figure 1

Figure 2

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Modes for Carrying Out the Invention

[0015] Hereinafter, embodiments of the present invention will be described with reference to the drawings.

[0016] (First Embodiment) [Charged Particle Beam Processing System] FIG. 1 is a diagram showing a schematic configuration of a charged particle beam processing system 1 according to an embodiment (first embodiment) of the present invention. The outline of the charged particle beam processing system 1 will be described.

[0017] The charged particle beam processing system 1 includes N (N is an integer of 1 or more) charged particle beam devices 10-1 to 10-N and one management computer 30. Each of the charged particle beam devices 10-1 to 10-N includes its own control computers 22-1 to 22-N.

[0018] The management computer 30 and the control computers 22-1 to 22-N of the respective charged particle beam devices 10-1 to 10-N are communicably connected. The management computer 30 has a communication interface for communicating with the control computers 22-1 to 22-N of the respective charged particle beam devices 10-1 to 10-N. Each of the control computers 22-1 to 22-N of the charged particle beam devices 10-1 to 10-N has a communication interface for communicating with the management computer 30. In this embodiment, this communication is performed via a wired line, but as another configuration example, it may be performed via a wireless line.

[0019] In this embodiment, each of the charged particle beam devices 10-1 to 10-N and the management computer 30 are operated by an operator 31.

[0020] Here, in the example of FIG. 1, a state in which three or more charged particle beam devices 10-1 to 10-N are provided in the charged particle beam processing system 1 is shown, but the number of charged particle beam devices 10-1 to 10-N provided in the charged particle beam processing system 1 may be one, or may be two. As described above, in this embodiment, for one or a plurality of charged particle beam apparatuses 10-1 to 10-N, a management computer 30 network-connected to the charged particle beam apparatuses 10-1 to 10-N serves as a higher-level computer. In this embodiment, a case where the management computer 30 is composed of one computer is shown. However, as another configuration example, the management computer 30 may be configured by combining a plurality of computers.

[0021] Also, in the example of FIG. 1, for convenience of explanation, a case where the operator 31 operates the control computers 22-1 to 22-N of all the charged particle beam apparatuses 10-1 to 10-N is shown. However, each of the control computers 22-1 to 22-N may be operated by the same operator 31, or may be operated by different operators. Also, in the example of FIG. 1, for convenience of explanation, a case where the operator 31 controls the control computers 22-1 to 22-N of the charged particle beam apparatuses 10-1 to 10-N and the management computer 30 is shown. However, for example, there may be another dedicated person (another operator) who controls the management computer 30.

[0022] [Charged Particle Beam Apparatus] In this embodiment, each of the charged particle beam apparatuses 10-1 to 10-N is a FIB-SEM composite apparatus, and a case where they have the same configuration will be described. Therefore, the configuration of the charged particle beam apparatuses 10-1 to 10-N will be described by taking the charged particle beam apparatus 10-1 as a representative.

[0023] FIG. 2 is a diagram showing a schematic configuration of a charged particle beam apparatus 10-1 according to an embodiment (the first embodiment) of the present invention. In FIG. 2, for convenience of explanation, the XYZ axes, which are three-dimensional orthogonal coordinate axes, are shown. The outline of the charged particle beam apparatus 10-1 will be described.

[0024] The charged particle beam apparatus 10-1 includes a sample chamber 11, a sample stage 12, a stage drive mechanism 13, a focused ion beam irradiation optical system 14, an electron beam irradiation optical system 15, a detector 16, a gas supply unit 17, a needle 18, a needle drive mechanism 19, an absorption current detector 20, a display device 21, a control computer 22-1, and an input device 23.

[0025] The sample chamber 11 maintains a vacuum inside. The sample stage 12 fixes the sample S and the sample piece holder P inside the sample chamber 11. Here, the sample stage 12 includes a holder fixing base 12a that holds the sample piece holder P. This holder fixing base 12a may have a structure capable of mounting a plurality of sample piece holders P.

[0026] The stage drive mechanism 13 drives the sample stage 12. Here, the stage drive mechanism 13 is housed inside the sample chamber 11 while being connected to the sample stage 12, and displaces the sample stage 12 with respect to a predetermined axis in response to a control signal output from the control computer 22-1. The stage drive mechanism 13 includes a movement mechanism 13a that moves the sample stage 12 parallel along at least the X-axis and the Y-axis that are parallel to each other and orthogonal to each other in the horizontal plane, and the Z-axis in the vertical direction that is orthogonal to the X-axis and the Y-axis. The stage drive mechanism 13 includes an inclination mechanism 13b that inclines the sample stage 12 around the X-axis or the Y-axis, and a rotation mechanism 13c that rotates the sample stage 12 around the Z-axis.

[0027] The focused ion beam irradiation optical system 14 irradiates a focused ion beam (FIB) onto an irradiation target within a predetermined irradiation region (i.e., scanning range) inside the sample chamber 11. Here, the focused ion beam irradiation optical system 14 irradiates a focused ion beam downward from above in the vertical direction onto irradiation targets such as the sample S placed on the sample stage 12, the sample piece Q, and the needle 18 existing within the irradiation region.

[0028] The focused ion beam irradiation optical system 14 includes an ion source 14a that generates ions, and an ion optical system 14b that focuses and deflects the ions drawn from the ion source 14a. The ion source 14a and the ion optical system 14b are controlled according to a control signal output from the control computer 22-1, and the irradiation position and irradiation conditions of the focused ion beam are controlled by the control computer 22-1.

[0029] The electron beam irradiation optical system 15 irradiates an object to be irradiated within a predetermined irradiation region inside the sample chamber 11 with an electron beam (EB). Here, the electron beam irradiation optical system 15 can irradiate an object to be irradiated, such as a sample S fixed to the sample stage 12, a sample piece Q, and a needle 18 existing within the irradiation region, with an electron beam from above downward in an inclined direction inclined at a predetermined angle (for example, 60°) with respect to the vertical direction.

[0030] The electron beam irradiation optical system 15 includes an electron source 15a that generates electrons, and an electron optical system 15b that focuses and deflects the electrons emitted from the electron source 15a. The electron source 15a and the electron optical system 15b are controlled according to a control signal output from the control computer 22-1, and the irradiation position and irradiation conditions of the electron beam are controlled by the control computer 22-1.

[0031] Note that the arrangement of the electron beam irradiation optical system 15 and the focused ion beam irradiation optical system 14 may be interchanged, with the electron beam irradiation optical system 15 arranged in the vertical direction and the focused ion beam irradiation optical system 14 arranged in an inclined direction inclined at a predetermined angle in the vertical direction.

[0032] The detector 16 detects secondary charged particles (secondary electrons, secondary ions) R generated from the object to be irradiated by the irradiation of the focused ion beam or the electron beam. The gas supply unit 17 supplies a gas G to the surface of the object to be irradiated. The gas supply unit 17 has a nozzle 17a at its tip. The needle 18 takes out a minute sample piece Q from a sample S fixed to the sample stage 12, holds the sample piece Q, and transfers it to the sample piece holder P. The needle drive mechanism 19 drives the needle 18 to convey the sample piece Q.

[0033] The absorption current detector 20 detects the inflow current (also referred to as the absorption current) of the charged particle beam flowing into the needle 18, and outputs the detected result as an inflow current signal to the control computer 22-1.

[0034] The control computer 22-1 controls at least the stage drive mechanism 13, the focused ion beam irradiation optical system 14, the electron beam irradiation optical system 15, the gas supply unit 17, and the needle drive mechanism 19. The control computer 22-1 is arranged outside the sample chamber 11, and is connected to a display device 21 and an input device 23 such as a mouse and a keyboard that outputs signals according to the input operations of an operator (in this embodiment, the operator 31). The control computer 22-1 integrally controls the operation of the charged particle beam apparatus 10-1 by signals output from the input device 23 or signals generated by a preset automatic operation control process.

[0035] In the charged particle beam apparatus 10-1, by scanning and irradiating the surface of the irradiation target with a focused ion beam, imaging of the irradiation target and various processes by sputtering (for example, drilling, trimming processing, etc.) and formation of a deposition film can be performed.

[0036] [Specific example of recipe] In each of the charged particle beam apparatuses 10-1 to 10-N, observation and processing of the sample are performed based on a recipe that defines various conditions such as observation conditions and processing conditions. A specific example of the recipe will be described.

[0037] As a higher-level recipe, there is an integrated recipe. For the integrated recipe, there are lower-level recipes. The integrated recipe is a combination of a plurality of lower-level recipes. As lower-level recipes, for example, there are recipes for automatic MS, processing recipes, alignment recipes, recipes for user centric adjustment, and user input items.

[0038] The recipe for automatic MS is a recipe regarding the extraction of micro samples in automatic micro sampling (automatic MS). The processing recipe is a recipe regarding the processing conditions for producing micro samples. The contents of the processing recipe include, for example, processing flow, beam conditions, and matching conditions. The alignment recipe is a recipe regarding alignment for correcting the inclination or wafer deflection that occurs when a chip or wafer is attached to a fixing part such as a holder (in the example of Fig. 2, the sample piece holder P). The contents of the alignment recipe include, for example, matching position and matching conditions. The alignment recipe is used to accurately identify the processing position.

[0039] The recipe for user centric adjustment is a recipe regarding user centric adjustment. The contents of the recipe for user centric adjustment include, for example, the setting of whether to produce a target by processing or use an existing pattern, and the matching conditions of the target. Here, the purpose of performing user centric adjustment is to correct the situation where the stage inclination causes the observation target to deviate from the field of view when the stage height is incorrect. Note that since the appropriate stage height varies depending on the thickness of the chip or wafer and the way of attaching the carbon tape or silver paste during attachment, basically, user centric adjustment needs to be executed every time the observation target is changed. However, when the thickness of the chip or wafer is appropriately set as a user input item by the operator 31 and the error during attachment is also sufficiently small, it is also possible to set not to execute user centric adjustment to shorten the processing time. The outline of the procedure for eucentric adjustment is as follows: determine an appropriate target, tilt the stage, obtain the deviation amount by matching the position of the target, and then repeat the change of the tilt amount of the stage and the acquisition of the deviation amount multiple times. Finally, calculate the appropriate height of the stage from the deviation amount due to the tilt of the stage.

[0040] The user input items are items input by the user (in this embodiment, the operator 31) in the management computer 30 separately from the recipe information output from each of the charged particle beam apparatuses 10-1 to 10-N. Examples of the content of the user input items include information about the chip or wafer (such as thickness, material, etc.), processing position (such as information specified in a coordinate system with a specific position within the chip or wafer as the origin instead of stage coordinates), attachment destination of the micro sample (such as the position of the holder for attaching the TEM mesh, the position of the mesh, the pillar position, etc.), defect information (such as type, size, position, etc.), or other information. Examples of the other information include information indicating whether eucentric is to be executed or information on the setting content regarding recovery processing in case of processing failure.

[0041] In this embodiment, for convenience of explanation, the information related to the recipe will be referred to as recipe information. The recipe information may include, for example, information specifying all the recipes included in the integrated recipe, or may include information specifying one or more of the individual recipes subordinate to the integrated recipe, or may also include information on some elements included in the integrated recipe or the subordinate recipes, and may also include the conditions when the recipe is used (such as defect information, chip information or wafer information, etc.). In addition, in the present embodiment, the recipe information includes information on the execution result of the recipe after the execution of the recipe specified by the recipe information. That is, the execution result of the recipe specified by the recipe information is fed back to the recipe information. Thus, in the present embodiment, the recipe information includes information necessary for the execution of the recipe before the start of the execution of the recipe specified by the recipe information, and information on the execution result of the recipe is added to the recipe information after the execution of the recipe. In addition, in the present embodiment, for convenience of explanation, information regarding the recipe managed in the management computer 30 will be referred to as management recipe information. The management recipe information may include, for example, information similar to the recipe information, and may further include information for managing such information.

[0042] As a specific example, the recipe information and the recipe management information may each include information on all subordinate recipes included in the integrated recipe, or may include information on some subordinate recipes included in the integrated recipe. In addition, the recipe information and the recipe management information may each include, for example, a correspondence between key information (Input information) and information related to the key (Output information).

[0043] [Control computer] FIG. 3 is a diagram showing a configuration of a functional block of the control computer 22-1 according to an embodiment (first embodiment) of the present invention. The functional block of the control computer 22-1 will be described.

[0044] The control computer 22-1 includes an input unit 111, an output unit 112, a communication unit 113, a storage unit 114, and a control unit 115. The control unit 115 includes a recipe execution unit 151, an information notification unit 152, and an information acquisition unit 153.

[0045] The input unit 111 has a function of inputting information from the outside. In this embodiment, the input unit 111 inputs the information output from the input device 23. Note that the input unit 111 may have a function of inputting information from, for example, an external storage medium or the like.

[0046] The output unit 112 has a function of outputting information to the outside. In this embodiment, the output unit 112 outputs the information to be displayed to the display device 21. Note that the output unit 112 may have a function of outputting information to, for example, an external storage medium or the like.

[0047] The communication unit 113 has a function of communicating with the outside. In this embodiment, the communication unit 113 has a function of communicating with the management computer 30.

[0048] The storage unit 114 has a function of storing information. In this embodiment, the storage unit 114 stores recipe information 131, device information 132, and the like. Here, the recipe information 131 includes information on the recipe of the process executed in the charged particle beam device 10-1 provided with the control computer 22-1 or the recipe of the executed process, and after the execution of the recipe, includes information on the execution result of the recipe. Further, the device information 132 is information on the individual of the charged particle beam device 10-1 provided with the control computer 22-1, and includes information on the device difference (mechanical difference) peculiar to the individual.

[0049] The control unit 115 has a function of performing various processes and controls. In this embodiment, the control unit 115 has a processor such as a CPU (Central Processing Unit), and performs various processes and controls by executing a predetermined control program. The control program may be stored in the storage unit 114, for example.

[0050] The recipe execution unit 151 controls the operation of the charged particle beam apparatus 10-1 based on a predetermined recipe. In the present embodiment, the recipe is a recipe specified by recipe information 131 stored in the storage unit 114.

[0051] The information notification unit 152 notifies the management computer 30 of the information to be notified by transmitting the information to the management computer 30 through the communication unit 113. The information acquisition unit 153 acquires predetermined information. The information is, for example, information input by the input unit 111, information received from the management computer 30 by the communication unit 113, or information stored in the storage unit 114.

[0052] [Management computer] FIG. 4 is a diagram showing the configuration of the functional blocks of the management computer 30 according to an embodiment (first embodiment) of the present invention. The functional blocks of the management computer 30 will be described.

[0053] The management computer 30 includes an input unit 211, an output unit 212, a communication unit 213, a storage unit 214, and a control unit 215. The control unit 215 includes an information acquisition unit 251, an information management unit 252, an information selection unit 253, and a recipe allocation unit 254.

[0054] The input unit 211 has a function of inputting information from the outside. In the present embodiment, the input unit 211 has an input device including a mouse and a keyboard, and inputs the information received by operating the input device by an operator (in the present embodiment, the operator 31). Note that the input unit 211 may have a function of inputting information from, for example, an external storage medium or the like.

[0055] The output unit 212 has a function of outputting information to the outside. In the present embodiment, the output unit 212 has a display device, and outputs the information to be displayed to the display device. Note that the output unit 212 may have a function of outputting information to, for example, an external storage medium or the like.

[0056] The communication unit 213 has a function of communicating with the outside. In the present embodiment, the communication unit 213 has a function of communicating with the control computers 22-1 to 22-N of the respective charged particle beam apparatuses 10-1 to 10-N.

[0057] The storage unit 214 has a function of storing information. In the present embodiment, the storage unit 214 stores recipe management information 231 and the like. Here, the recipe management information 231 includes information regarding the recipe of the processes executed in the respective charged particle beam apparatuses 10-1 to 10-N or the recipe of the processes to be executed, and also includes information on the execution results of the recipes after the execution of the recipes. In the present embodiment, the recipe management information 231 includes recipe information 131a which is the same information as the recipe information 131.

[0058] The control unit 215 has a function of performing various processes and controls. In the present embodiment, the control unit 215 has a processor such as a CPU, and performs various processes and controls by executing a predetermined control program. The control program may be stored in the storage unit 214, for example.

[0059] The information acquisition unit 251 acquires predetermined information. The information is, for example, information input by the input unit 211, information received from the control computers 22-1 to 22-N of the respective charged particle beam apparatuses 10-1 to 10-N by the communication unit 213, or information stored in the storage unit 214. The information management unit 252 manages information regarding the recipe, and in the present embodiment, manages the recipe management information 231.

[0060] The information selection unit 253 has a function of selecting information related to the key information. In the present embodiment, this information is information related to recipes, and the information selection unit 253 selects information based on the recipe management information 231. Here, for example, when the key information and the related information are in a one-to-one correspondence, the information selection unit 253 may automatically select the related information from the key information. Also, for example, when the key information and the related information are in a one-to-many correspondence, the information selection unit 253 displays these multiple related information as candidates and presents them to the operator 31, and selects the information specified by the operation of the operator 31 from among these multiple related information.

[0061] The recipe assignment unit 254 has a function of assigning a recipe to a sample (which may be called a sample piece or a sample, etc.). Then, the recipe assignment unit 254 transmits information related to the assignment of the recipe to the control computers 22-1 to 22-N of the charged particle beam apparatuses 10-1 to 10-N to be notified as the information to be notified by the communication unit 213, thereby notifying the control computers 22-1 to 22-N of the information.

[0062] [Example of Recipe Management in Charged Particle Beam Processing System] An example of recipe management in the charged particle beam processing system 1 will be described. First, in each of the charged particle beam apparatuses 10-1 to 10-N, a process (the process of the recipe) according to the recipe manually set by the operator 31 is executed. Specifically, in the control computers 22-1 to 22-N of each of the charged particle beam apparatuses 10-1 to 10-N, the information acquisition unit 153 acquires the information input by the operator 31, and based on the acquired information, generates a recipe including observation conditions, processing conditions, etc. collectively. Then, the recipe execution unit 151 executes the process of the recipe. In addition, the control computers 22-1 to 22-N store and save the information specifying the recipe in the recipe information 131.

[0063] In addition, the information notification unit 152 transmits the recipe information 131 to the management computer 30 for notification. This notification may be performed, for example, every time the recipe process is executed, or may be performed at regular intervals determined in advance.

[0064] In the management computer 30, the information acquisition unit 251 acquires the recipe information 131 received from the control computers 22-1 to 22-N of the respective charged particle beam apparatuses 10-1 to 10-N, and the information management unit 252 stores and manages the recipe management information 231 based on the recipe information 131.

[0065] Here, the information management unit 252 can manage, for example, a plurality of recipe information 131 received from the control computers 22-1 to 22-N of a plurality of different charged particle beam apparatuses 10-1 to 10-N, and can also manage a plurality of recipe information 131 received a plurality of times from the control computers 22-1 to 22-N of the same charged particle beam apparatuses 10-1 to 10-N.

[0066] The information management unit 252 may perform a process of browsing or editing the recipe management information 231. For example, the information management unit 252 performs a process of making the information included in the recipe management information 231 viewable by the operator 31 by displaying the information on the display device based on an operation performed by the operator 31. In addition, the information management unit 252 performs a process of editing the recipe management information 231 based on an operation performed by the operator 31.

[0067] In this embodiment, in the management computer 30, the information management unit 252 manages various types of information such as defect information, processing size, processing conditions, and observation conditions as a library. In this embodiment, these types of information may be included in the recipe management information 231.

[0068] Here, in the management computer 30, when editing a recipe, if the information selection unit 253 is specified with the information of an item registered in the library as input (for example, defect information, etc.), the information of other items related to the said item (for example, information such as processing size or processing conditions) is selected. In this embodiment, the information selection unit 253 may automatically select information based on, for example, a preset rule. Also, when there is a plurality of information that can be selected as candidates, the information selection unit 253 may display these multiple pieces of information and present them to the operator 31, and select the information specified by the operation of the operator 31.

[0069] In the management computer 30, the recipe assignment unit 254 assigns a recipe to each processing target. The recipe assignment unit 254 may perform recipe assignment using, for example, the information selected by the information selection unit 253. Also, the recipe assignment unit 254 may perform recipe assignment by referring to, for example, the recipe management information 231.

[0070] In this embodiment, individual holders are used as individual processing targets. Information for identifying the said holder (holder unique information) is set in each individual holder. In the management computer 30 and each charged particle beam apparatus 10-1 to 10-N, it is possible to identify each holder based on the holder unique information.

[0071] Here, in this embodiment, the case of assigning a recipe to each holder for fixing a sample will be described as an example, but the target for which a recipe is assigned may be arbitrary. For example, as a fixing part such as a holder for fixing a sample, instead of the holder, another object capable of transporting the sample may be used. As an example, when a sample having the shape of a wafer is handled, the wafer may be transported by a cassette.

[0072] The recipe assignment unit 254 transmits and notifies the information of the recipe to the control computer of the charged particle beam apparatus (one or more corresponding ones among the control computers 22-1 to 22-N of the charged particle beam apparatuses 10-1 to 10-N) in which the processing of the holder to which the recipe is assigned is performed. This notification may be performed in advance, for example, before the processing of the corresponding holder is performed, or may be performed in response to a request from the control computers 22-1 to 22-N when the processing of the corresponding holder is performed.

[0073] In the control computers 22-1 to 22-N of the charged particle beam apparatuses 10-1 to 10-N, the information acquisition unit 153 acquires the information of the recipe notified from the management computer 30, and stores the information in the recipe information 131 after including the information.

[0074] In each of the charged particle beam apparatuses 10-1 to 10-N, when the holder to which the recipe is assigned is Loaded (transported), the recipe execution unit 151 sets the conditions (for example, observation conditions and processing conditions) specified by the recipe, makes adjustments as necessary to satisfy the conditions, and executes the processing of the recipe.

[0075] Here, in the present embodiment, in each of the charged particle beam apparatuses 10-1 to 10-N, the processing of the recipe assigned by the management computer 30 is automatically performed by the recipe execution unit 151. In the present embodiment, the preparation and transportation (loading and unloading) of the holder are manually performed by the operator 31. However, as another configuration example, some or all of these may be automatically performed by the charged particle beam apparatuses 10-1 to 10-N.

[0076] In each of the charged particle beam apparatuses 10-1 to 10-N, the information notification unit 152 may transmit and notify information such as the execution result and progress of the recipe to the management computer 30.

[0077] Here, the recipe may have a group of information (first parameter) that does not depend on the apparatus (in this embodiment, the charged particle beam apparatuses 10-1 to 10-N) and a group of information (second parameter) that depends on the apparatus. In this case, when the control computers 22-1 to 22-N of the respective charged particle beam apparatuses 10-1 to 10-N execute the processing of the recipe, for the first parameter, the information acquired from the management computer 30 is used as it is, and for the second parameter, the information held by each apparatus is replaced, or after being converted into information optimal for each apparatus, it is used. Such replacement or conversion of the information regarding the second parameter may be performed based on the apparatus information 132.

[0078] Note that the first parameter may be, for example, information regarding a sample. Also, the second parameter may be, for example, information for compensating for individual differences (for example, manufacturing errors or adjustment errors, etc.) that may exist even in apparatuses of the same model, and as another example, information for compensating for model differences that may exist in apparatuses of different models.

[0079] [Specific Examples of Manual Input Items and Automatic Input Items in the Management Computer 30] Specific examples of manual input items and automatic input items (Input-Output) in the management computer 30 are shown.

[0080] <Specific Example 1> In the management computer 30, based on the recipe information 131 acquired from each of the charged particle beam apparatuses 10-1 to 10-N, in the recipe management information 231, information on manual input items (Input) (in this example, defect information) and information on automatic input items (Output) (in this example, recipe information, etc.) are associated with each other. When the recipe is assigned, in the management computer 30, the operator 31 inputs defect information (such as type, size, position, etc.) as information of the manual input items. Accordingly, in the management computer 30, as information of the automatic input items corresponding to the input information of the manual input items, one or more of the automatic MS recipe corresponding to the manual input items, the processing recipe corresponding to the manual input items, and the processing position information corresponding to the manual input items are automatically set (set input). This setting may be performed by, for example, the information selection unit 253. Then, the recipe assignment unit 254 assigns a recipe including the conditions specified by the information of the automatic input items corresponding to the input information of the manual input items.

[0081] <Specific Example 2> In the management computer 30, based on the recipe information 131 acquired from each of the charged particle beam apparatuses 10-1 to 10-N, the recipe management information 231 associates the information of the manual input items (Input) (in this example, chip information or wafer information) with the information of the automatic input items (Output) (in this example, recipe information, etc.). When the recipe is assigned, in the management computer 30, the operator 31 inputs chip information or wafer information as information of the manual input items. Accordingly, in the management computer 30, as information of the automatic input items corresponding to the input information of the manual input items, the alignment recipe corresponding to the automatic input items is automatically set (set input). This setting may be performed by, for example, the information selection unit 253. Then, the recipe assignment unit 254 assigns a recipe including the conditions specified by the information of the automatic input items corresponding to the input information of the manual input items.

[0082] Here, in this embodiment, although the case where manual input items are directly input from the operator 31 to the management computer 30 has been shown, as another configuration example, the management computer 30 may be configured to receive and input information on manual input items input in another device (for example, charged particle beam devices 10-1 to 10-N) from the other device.

[0083] [Example of processing procedure in charged particle beam device] FIG. 5 is a diagram showing an example of the procedure of processing performed in charged particle beam devices 10-1 to 10-N according to an embodiment (first embodiment) of the present invention. In this embodiment, since the processing procedures performed in each of the charged particle beam devices 10-1 to 10-N are the same, the charged particle beam device 10-1 will be described as a representative. Also, in this example, the case where a recipe is set for each holder will be described. In the processing procedure shown in FIG. 5, information on the recipe set by the operator 31 is notified from the charged particle beam device 10-1 to the management computer 30.

[0084] (Step S1) In the charged particle beam device 10-1, for a predetermined holder, the processing of the recipe set by the operator 31 is executed. Then, in the charged particle beam device 10-1, the process proceeds to the process of step S2.

[0085] (Step S2) In the charged particle beam device 10-1, the information on the executed recipe is stored and saved in the storage unit 114 as recipe information 131. Then, in the charged particle beam device 10-1, the process proceeds to the process of step S3.

[0086] (Step S3) In the charged particle beam device 10-1, information on one or more executed recipes is notified to the management computer 30 with respect to the recipe information 131. Then, in the charged particle beam device 10-1, the processing of this flow is terminated.

[0087] As a specific example, in the charged particle beam device 10-1, when the operator 31 sets the observation conditions and processing conditions for the production of a sample (for example, a TEM sample) and confirms that the sample can be produced without problems by executing the processing of a recipe having the set conditions, the operator 31 performs an operation to notify the management computer 30 from the charged particle beam device 10-1 of the recipe information summarizing the conditions. In this case, in the charged particle beam device 10-1, the processing in step S2 and the processing in step S3 may be executed, for example, in response to a predetermined operation by the operator 31 after the operator 31 confirms that the sample can be produced without problems by the processing in step S1.

[0088] Here, in the present embodiment, the case where the recipe information 131 is notified from each of the charged particle beam devices 10-1 to 10-N to the management computer 30 has been shown. As another example, the information on the recipes executed in each of the charged particle beam devices 10-1 to 10-N may be directly input to the management computer 30 by the operation of the operator 31.

[0089] [Example of processing procedure in management computer] FIG. 6 is a diagram showing an example of the procedure of processing performed in the management computer 30 according to an embodiment (first embodiment) of the present invention. In the processing procedure shown in FIG. 6, the management computer 30 generates (generates newly or generates updated information by updating existing information) the recipe management information 231 based on the information received from the charged particle beam devices 10-1 to 10-N.

[0090] (Step S21) In the management computer 30, the management computer 30 receives the recipe information 131 transmitted from each of the charged particle beam devices 10-1 to 10-N to the management computer 30 and acquires the recipe information 131. Then, the management computer 30 proceeds to the process of step S22.

[0091] (Step S22) Based on the acquired information, the management computer 30 generates recipe management information 231 (generates it newly or generates updated information by updating existing information), and stores the generated recipe management information 231 in the storage unit 214. Then, the management computer 30 ends the process of this flow.

[0092] Here, the recipe management information 231 may directly include part or all of the recipe information 131 notified from the charged particle beam apparatuses 10-1 to 10-N to the management computer 30, or may include other information generated based on part or all of the recipe information 131 notified from the charged particle beam apparatuses 10-1 to 10-N to the management computer 30. In this embodiment, the recipe management information 231 includes the recipe information 131a.

[0093] FIG. 7 is a diagram showing an example of the procedure of the process performed in the management computer 30 according to an embodiment (the first embodiment) of the present invention. In this example, the case where a recipe is set for each holder will be described. In the procedure shown in FIG. 7, the management computer 30 assigns a recipe to the holders used in the processes in the charged particle beam apparatuses 10-1 to 10-N.

[0094] (Step S41) The management computer 30 acquires information on the manually input items (for example, defect information or chip information, etc.) input by the operator 31 for the holder to which the recipe is to be assigned. Then, the management computer 30 proceeds to the process of step S42.

[0095] (Step S42) In the management computer 30, based on the recipe management information 231, using the acquired information as a key, related information corresponding to the key (for example, information such as a recipe corresponding to the key) is selected. Here, when one piece of information is specified, that information is selected, or when there are multiple candidate pieces of information, these multiple candidates are presented to the operator 31 and one piece of information is selected based on the designation from the operator 31. Then, the management computer 30 proceeds to the process of step S43.

[0096] (Step S43) In the management computer 30, based on the selection result of the information, a recipe is assigned to the target holder. Also, in the management computer 30, for example, information regarding the recipe is stored including it in the recipe management information 231. Also, in the management computer 30, information regarding the recipe is notified to a predetermined charged particle beam device (one or more of the charged particle beam devices 10-1 to 10-N). The predetermined charged particle beam device may be, for example, all of the charged particle beam devices 10-1 to 10-N, or may be a part of the charged particle beam devices 10-1 to 10-N. The part may be, for example, a charged particle beam device that executes the process of the holder to which the recipe is assigned among the charged particle beam devices 10-1 to 10-N. Then, the management computer 30 ends the process of this flow.

[0097] Here, the notification of information regarding the recipe from the management computer 30 to each of the charged particle beam devices 10-1 to 10-N may be performed independently for each of the charged particle beam devices 10-1 to 10-N, or may be performed synchronously for two or more of the charged particle beam devices 10-1 to 10-N.

[0098] For example, when the recipe process is executed independently by each of the charged particle beam devices 10-1 to 10-N, the management computer 30 notifies each of the charged particle beam devices 10-1 to 10-N of information regarding the recipe independently. On the other hand, it is possible that two or more of the charged particle beam devices 10-1 to 10-N perform a flow operation in cooperation. In this case, the management computer 30 may notify the two or more charged particle beam devices of information regarding the recipe in synchronization with the progress of the flow operation. As a specific example, after the first charged particle beam device in the flow operation executes the process, it notifies the management computer 30 of information regarding the process, and the management computer 30 determines the information to be notified to the second charged particle beam device based on the information of the first device, and then notifies the determined information to the second charged particle beam device. Such an operation may be performed.

[0099] Also, the information notified from the management computer 30 to each of the charged particle beam devices 10-1 to 10-N does not necessarily have to be information that specifies all of the recipe, and may be information that specifies a part of the recipe. When the control computers 22-1 to 22-N of each of the charged particle beam devices 10-1 to 10-N receive information that specifies a part of the recipe from the management computer 30, they generate information that specifies all of the recipe using the received information, and execute the recipe process based on the generated information. In this case, the control computers 22-1 to 22-N may determine information that specifies other parts of the recipe based on information input by, for example, the operation of the operator 31, or may determine it based on information included in the recipe information 131 stored in the storage unit 114.

[0100] Also, when the control computers 22-1 to 22-N of the respective charged particle beam apparatuses 10-1 to 10-N execute the recipe process based on the information notified from the management computer 30, they may replace the recipe with a recipe suitable for their own apparatus based on the apparatus information 132 stored in the storage unit 114, and then execute the process of the replaced recipe. Thereby, when the recipe process is executed, the apparatus differences (mechanical differences) of the respective charged particle beam apparatuses 10-1 to 10-N can be compensated.

[0101] [Automatic Execution of Recipe Process in Charged Particle Beam Apparatus] In addition, in this embodiment, since the procedure of the process performed in each of the charged particle beam apparatuses 10-1 to 10-N is the same, the charged particle beam apparatus 10-1 will be described as a representative. Also, in this example, the case where a recipe is set for each holder will be described. A procedure for automatically executing the recipe process based on the information notified from the management computer 30 in the charged particle beam apparatus 10-1 will be described.

[0102] In this embodiment, the charged particle beam apparatus 10-1 has an SEM column for observing a sample, an FIB column for processing the sample, a function for identifying each holder, a function for communicating with the management computer 30, a function for transmitting information regarding the recipe to the management computer 30, and a function for executing observation and processing as specified in the recipe.

[0103] First, in the charged particle beam apparatus 10-1, the operator 31 selects an appropriate holder to which the recipe is assigned and acquires the holder-specific information of the holder. Next, the operator 31 checks how to attach the sample to the selected holder. In the present embodiment, when a recipe is assigned to the holder, the control computer 22-1 of the charged particle beam apparatus 10-1 displays on the screen of the display device 21 how to attach the sample to the holder. At this time, the control computer 22-1 may identify the holder selected based on the holder-specific information according to, for example, the operation of the operator 31, and display how to attach the sample to the identified holder.

[0104] Next, the operator 31 attaches the sample to the holder according to the displayed content and transports the sample. Then, the control computer 22-1 of the charged particle beam apparatus 10-1 starts producing the sample (for example, a thin slice sample for TEM observation) according to the recipe assigned to the holder.

[0105] After all the processes of the recipe to be executed are completed, the operator 31 removes the produced sample. Here, although a recipe for producing a sample (for example, a thin slice sample for TEM observation) is described as an example, the present invention is not limited thereto, and any processing recipe may be used. For example, the operator 31 can also use a recipe including arbitrary processing conditions.

[0106] <Cooperation by Charged Particle Beam Apparatuses of the Same Model> Here, a case where a plurality of charged particle beam apparatuses 10-1 to 10-N connected to the management computer 30 are of the same model and execute the same process is shown. In this case, the management computer 30 can execute the processes of the same recipe in parallel by causing two or more charged particle beam apparatuses 10-1 to 10-N to execute the processes of the same recipe.

[0107] For example, the recipe assignment unit 254 can assign the same recipe for executing processes in parallel by a plurality of charged particle beam apparatuses 10-1 to 10-N of the same model. Also, for example, the information management unit 252 can manage information regarding the same recipe for executing processes in parallel by a plurality of charged particle beam apparatuses 10-1 to 10-N of the same model, for these plurality of charged particle beam apparatuses 10-1 to 10-N.

[0108] Here, in the management computer 30, for example, part or all of the information regarding the recipe executed by one of the charged particle beam apparatuses 10-1 to 10-N (for example, the information acquired by the information acquisition unit 251, etc.) can be used as information regarding the recipe to be executed by the other charged particle beam apparatuses 10-1 to 10-N.

[0109] [Regarding the First Embodiment] As described above, in the charged particle beam processing system 1 according to the present embodiment, in the management computer 30, a recipe used in the charged particle beam apparatuses 10-1 to 10-N can be constructed. Also, in the management computer 30, the recipe can be managed and the recipe can be notified to the charged particle beam apparatuses 10-1 to 10-N. For example, when a plurality of charged particle beam apparatuses 10-1 to 10-N exist below the management computer 30, by the management computer 30 managing these recipes, it is possible to share the recipes in these plurality of charged particle beam apparatuses 10-1 to 10-N.

[0110] In this way, in the present embodiment, in the FIB-SEM composite apparatus (in the present embodiment, the charged particle beam apparatuses 10-1 to 10-N), the work of adjusting and setting the observation or processing conditions by the operator 31 can be reduced.

[0111] For example, in the charged particle beam processing system 1 according to the present embodiment, information necessary for observation or processing is automatically set after considering the device differences (mechanical differences) between the devices of the charged particle beam devices 10-1 to 10-N. By adopting such a configuration, the operator 31 can be relieved from the need to adjust or set the conditions for each of the charged particle beam devices 10-1 to 10-N every time. Accordingly, in the charged particle beam processing system 1 according to the present embodiment, the load on the operator 31 can be reduced, the variation in the quality of the sample due to the skill level of the operator 31 can be reduced, and the reduction in the yield can be reduced.

[0112] In the charged particle beam processing system 1 according to the present embodiment, it is possible to assign the same recipe for executing the processing in parallel by a plurality of charged particle beam devices 10-1 to 10-N of the same model. Therefore, in the charged particle beam processing system 1 according to the present embodiment, it is possible to enable the cooperation of a plurality of FIB-SEM composite devices (horizontal cooperation between devices of the same model).

[0113] Here, in the present embodiment, the case where the combination of the plurality of charged particle beam devices 10-1 to 10-N connected to the management computer 30 is fixed has been described. However, for example, for one or more of the plurality of charged particle beam devices 10-1 to 10-N, hardware replacement or software replacement may be performed. In this case, in the management computer 30, for example, the recipe management information 231 may be changed (rewritten) so as to conform to the states of the plurality of charged particle beam devices 10-1 to 10-N after the replacement.

[0114] (Second Embodiment) In the present embodiment, points different from the first embodiment will be described in detail, and detailed descriptions of points similar to the first embodiment will be omitted. In the present embodiment, for the sake of convenience of explanation, the components shown in FIGS. 1 to 4 according to the first embodiment will be described using the same reference numerals.

[0115] [Processing in Charged Particle Beam Apparatus] In this embodiment, since the procedure of the processing performed in each of the charged particle beam apparatuses 10-1 to 10-N is the same, the charged particle beam apparatus 10-1 will be described as a representative.

[0116] In the control computer 22-1 of the charged particle beam apparatus 10-1, the information on the execution result of the processing of the recipe is included in the recipe information 131 and stored in association with the information on the executed recipe. Then, when the information notification unit 152 notifies the management computer 30 of the information on one or more executed recipes, the information on the execution result of the processing of each of these recipes is also notified to the management computer 30. Here, the execution result of the recipe processing includes, for example, information indicating whether the processing has succeeded or failed, and may further include other information. The other information may be, for example, information indicating the cause of failure.

[0117] [Example of Processing Procedure in Management Computer] FIG. 8 is a diagram showing an example of the processing procedure performed in the management computer 30 according to an embodiment (second embodiment) of the present invention. In the processing procedure shown in FIG. 8, the management computer 30 generates a recipe by machine learning based on the information received from the charged particle beam apparatuses 10-1 to 10-N.

[0118] (Step S61) In the management computer 30, the information on the recipe (recipe information 131) transmitted from each of the charged particle beam apparatuses 10-1 to 10-N to the management computer 30 is received and the information is acquired. Then, the management computer 30 proceeds to the processing of step S62.

[0119] (Step S62) In the management computer 30, learning is performed based on the acquired information. Here, as the learning algorithm, any algorithm may be used. For example, an algorithm may be used such that the weighting when the execution result of the recipe process is successful is larger than the weighting when the execution result of the recipe process is a failure. These weightings may be, for example, 1 (success) vs. 0 (failure), or other ratios. Then, the management computer 30 proceeds to the process of step S63.

[0120] (Step S63) The management computer 30 generates recipe management information 231 based on the learning result. Then, the management computer 30 ends the process of this flow.

[0121] [Regarding the Second Embodiment] In the charged particle beam processing system 1 according to the present embodiment, by using machine learning in the management computer 30, a recipe suitable for defect information, chip information, etc. can be learned. And in the present embodiment, similar to the first embodiment, in the FIB-SEM composite device (in the present embodiment, charged particle beam devices 10-1 to 10-N), the work of adjusting and setting the observation or processing conditions by the operator 31 can be reduced.

[0122] (Third Embodiment) [Charged Particle Beam Processing System] FIG. 9 is a diagram showing a schematic configuration of a charged particle beam processing system 301 according to an embodiment (third embodiment) of the present invention. The outline of the charged particle beam processing system 301 will be described. In the present embodiment, the differences from the first embodiment or the second embodiment will be described in detail, and detailed descriptions of the same points as the first embodiment or the second embodiment will be omitted.

[0123] The charged particle beam processing system 301 includes N (where N is an integer of 1 or more) charged particle beam devices 10-1 to 10-N, M (where M is an integer of 1 or more) charged particle beam devices 310-1 to 310-M, and one management computer 330. Each of the charged particle beam devices 10-1 to 10-N includes its own control computer 22-1 to 22-N. Each of the charged particle beam devices 310-1 to 310-M includes its own control computer 322-1 to 322-M.

[0124] The management computer 330 is communicably connected to the control computers 22-1 to 22-N of the respective charged particle beam devices 10-1 to 10-N. The management computer 330 has a communication interface for communicating with the control computers 22-1 to 22-N of the respective charged particle beam devices 10-1 to 10-N. Each of the control computers 22-1 to 22-N of the respective charged particle beam devices 10-1 to 10-N has a communication interface for communicating with the management computer 30. In this embodiment, this communication is performed via a wired line, but as another configuration example, it may be performed via a wireless line.

[0125] The management computer 330 is communicably connected to the control computers 322-1 to 322-M of the respective charged particle beam devices 310-1 to 310-M. The management computer 330 has a communication interface for communicating with the control computers 322-1 to 322-M of the respective charged particle beam devices 310-1 to 310-M. Each of the control computers 322-1 to 322-M of the respective charged particle beam devices 310-1 to 310-M has a communication interface for communicating with the management computer 330. In this embodiment, this communication is performed via a wired line, but as another configuration example, it may be performed via a wireless line.

[0126] In this embodiment, each of the charged particle beam devices 10-1 to 10-N, 310-1 to 310-M and the management computer 330 is operated by an operator 331.

[0127] Here, in the example of FIG. 9, a state in which three or more charged particle beam devices 10-1 to 10-N are provided in the charged particle beam processing system 301 is shown. However, the number of charged particle beam devices 10-1 to 10-N provided in the charged particle beam processing system 301 may be one, or may be two. Also, in the example of FIG. 9, a state in which three or more charged particle beam devices 310-1 to 310-M are provided in the charged particle beam processing system 301 is shown. However, the number of charged particle beam devices 310-1 to 310-M provided in the charged particle beam processing system 301 may be one, or may be two.

[0128] As described above, in this embodiment, for one or more charged particle beam devices 10-1 to 10-N and one or more charged particle beam devices 310-1 to 310-M, a management computer 330 network-connected to these charged particle beam devices 10-1 to 10-N, 310-1 to 310-M serves as a higher-level computer. Note that, in this embodiment, a case where the management computer 330 is composed of one computer is shown. However, as another configuration example, the management computer 330 may be configured by combining a plurality of computers.

[0129] Also, in the example of FIG. 9, for convenience of explanation, a case where an operator 331 operates the control computers 22-1 to 22-N, 322-1 to 322-M of all the charged particle beam devices 10-1 to 10-N, 310-1 to 310-M is shown. However, each of the control computers 22-1 to 22-N, 322-1 to 322-M may be operated by the same operator 331, or may be operated by different operators. Also, in the example of FIG. 9, for the sake of convenience of explanation, the case where the operator 331 controls the control computers 22-1 to 22-N and 322-1 to 322-M of the charged particle beam apparatuses 10-1 to 10-N and 310-1 to 310-M and the management computer 330 is shown. However, for example, there may be other dedicated persons (other operators) who control the management computer 330.

[0130] <Cooperation by Charged Particle Beam Apparatuses of Different Models> In the present embodiment, the charged particle beam apparatuses 10-1 to 10-N connected to the management computer 330 are the same as the charged particle beam apparatuses 10-1 to 10-N shown in FIG. 1, are of the same model, and perform the same processing. Also, in the present embodiment, the charged particle beam apparatuses 310-1 to 310-M connected to the management computer 330 are of a different model from the charged particle beam apparatuses 10-1 to 10-N, and the case where the charged particle beam apparatuses 310-1 to 310-M perform the same processing is shown.

[0131] The management computer 330 has the same functions as the management computer 30 shown in FIG. 1, except that it controls the charged particle beam apparatuses 10-1 to 10-N and 310-1 to 310-M of a plurality of models. Also, the charged particle beam apparatuses 10-1 to 10-N and the charged particle beam apparatuses 310-1 to 310-M differ in configuration and operation in terms of having different models. Similarly, the control computers 22-1 to 22-N and the control computers 322-1 to 322-M differ in configuration and operation in terms of having different models.

[0132] The management computer 330 can cause a certain charged particle beam device 310-j (where j is any integer from 1 to M) to perform the processing of the second recipe on the processed sample after causing a certain charged particle beam device 10-i (where i is any integer from 1 to N) to perform the processing of the first recipe on a predetermined sample. In this case, when the processing of the first recipe on the sample is completed, the sample (the sample on which the processing of the first recipe has been performed) is moved from the charged particle beam device 10-i that has performed the processing of the first recipe to the charged particle beam device 310-j that will perform the processing of the second recipe. The movement of the sample may be performed, for example, together with a holder that holds the sample.

[0133] For example, the charged particle beam device 10-1 is of the first model, and the charged particle beam device 310-1 is of the second model. Here, the first model and the second model represent different models. As a specific example, the first model may be a model of a type such as "A001", and the second model may be a model of a type different from the first model such as "A002". Note that "A001" and "A002" are not necessarily actual numbers but are numbers for the purpose of the explanation here.

[0134] In such a case, for example, a sample automatically microsampled by a first model charged particle beam apparatus 10-1 having a large stage capable of mounting a semiconductor wafer is mounted on a holder for a second model having a small stage, and the sample is introduced into a charged particle beam apparatus 310-1 of the second model. Alignment is performed based on information including information on the execution result of processing in the first model (the execution result of processing of a recipe), and further, fine finishing processing continued from the sample production processing performed by the charged particle beam apparatus 10-1 of the first model according to the recipe is performed by the charged particle beam apparatus 310-1 of the second model. At this time, the management computer 330 notifies the charged particle beam apparatus 310-1 of the second model of information regarding the first recipe (information including the execution result information of the processing of the first recipe). Thereby, in the charged particle beam apparatus 310-1 of the second model, processing (processing of the second recipe) using information regarding the first recipe (information including the execution result information of the processing of the first recipe) becomes possible.

[0135] Referring to FIG. 9, a specific example is shown. First, the charged particle beam apparatus 10-1 of the first model executes the process of automatic MS. At this time, in the charged particle beam apparatus 10-1 of the first model, a process of placing the produced microsample (sample) on a holder 401 used in the charged particle beam apparatus 310-1 of the second model is performed. Also, in the charged particle beam apparatus 10-1 of the first model, predetermined information (for example, coordinate information and image information) is acquired regarding the microsamples attached to the respective columnar portions (pillars) provided on the holder 401.

[0136] Next, in the charged particle beam apparatus 310-j of the second model, after the holder 401 on which the microsample has been placed by the charged particle beam apparatus 10-1 of the first model is Loaded (transported), the position (the position for performing subsequent processing according to the recipe) is determined using the predetermined information (for example, coordinate information and image information) acquired in the charged particle beam apparatus 10-1 of the first model. Then, in the charged particle beam apparatus 310-1 of the second model, subsequent processing that follows the processing performed by the first model is executed according to the recipe. Here, the subsequent processing may be, for example, subsequent processing or observation. In this way, it is possible to create a sample using the charged particle beam apparatus 10-1 of the first model and perform subsequent processing of the sample using the charged particle beam apparatus 310-1 of the second model.

[0137] Here, the management computer 330 notifies the charged particle beam apparatus 310-1 of the second model of information regarding the recipe based on, for example, recipe management information (information similar to the recipe management information 231 shown in FIG. 3) generated using information acquired from the charged particle beam apparatus 10-1 of the first model. In this example, the management computer 330 notifies the charged particle beam apparatus 310-1 of the second model of predetermined information regarding the micro sample acquired in the charged particle beam apparatus 10-1 of the first model (for example, information including coordinate information and image information). The information includes information on the execution result of the processing in the charged particle beam apparatus 10-1 of the first model.

[0138] When the information regarding the recipe in the charged particle beam apparatus 10-1 of the first model is not directly applicable to the charged particle beam apparatus 310-1 of the second model, the management computer 330 may convert the information into other information applicable to the charged particle beam apparatus 310-1 of the second model and then notify the charged particle beam apparatus 310-1 of the second model of the converted information.

[0139] Here, the case where the charged particle beam apparatus 10-1 of the first model and the charged particle beam apparatus 310-1 of the second model are coordinated is shown. However, for example, the management computer 330 may cause a plurality of charged particle beam apparatuses 10-1 to 10-N of the first model to execute the processing of the same recipe in parallel, and cause each of the plurality of charged particle beam apparatuses 310-1 to 310-M of the second model to execute the subsequent recipe processing of the processing by each of the charged particle beam apparatuses 10-1 to 10-N in parallel.

[0140] For example, a recipe allocation unit (a functional unit similar to the recipe allocation unit 254 shown in FIG. 4) can use part or all of the information obtained by an information acquisition unit (a functional unit similar to the information acquisition unit 251 shown in FIG. 4) regarding the recipe executed in one charged particle beam device 10-i as information regarding the recipe to be executed in another charged particle beam device 310-j. For example, the recipe allocation unit allocates a first recipe to a charged particle beam device 10-i of a first model, and allocates a second recipe that is a continuation of the first recipe to a charged particle beam device 310-j of a second model different from the first model. Also, an information management unit (a functional unit similar to the information management unit 252 shown in FIG. 4) manages information regarding the first recipe for the charged particle beam device 10-i of the first model, and manages information regarding the second recipe for the charged particle beam device 310-j of the second model.

[0141] In addition, as the number of types of charged particle beam devices that are not of the same model included in the plurality of charged particle beam devices 10-1 to 10-N and 310-1 to 310-M connected to the management computer 330, not only a configuration including two types of charged particle beam devices, but also a configuration including three or more types of charged particle beam devices may be used. In this case, the management computer 330 may sequentially execute the processing of each recipe in cooperation with the charged particle beam devices of three or more types in order.

[0142] [Regarding the Third Embodiment] In the charged particle beam processing system 301 according to the present embodiment, even when the plurality of charged particle beam devices 10-1 to 10-N and 310-1 to 310-M include two or more different models, in the FIB-SEM composite device (in this embodiment, the charged particle beam devices 10-1 to 10-N and 310-1 to 310-M), the work of adjusting and setting the conditions for observation or processing by the operator 331 can be reduced.

[0143] In the charged particle beam processing system 301 according to this embodiment, it is possible to assign a first recipe to the charged particle beam apparatuses 10-1 to 10-N of the first model, and assign a second recipe that is a continuation of the first recipe to the charged particle beam apparatuses 310-1 to 310-M of a second model different from the first model. In the charged particle beam processing system 301 according to this embodiment, it is possible to manage information regarding the first recipe for the charged particle beam apparatuses 10-1 to 10-N of the first model, and manage information regarding the second recipe that is a continuation of the first recipe for the charged particle beam apparatuses 310-1 to 310-M of a second model different from the first model. In the charged particle beam processing system 301 according to this embodiment, it is possible to use part or all of the information regarding the recipe executed by one of the charged particle beam apparatuses 10-1 to 10-N as information regarding the recipe to be executed by other charged particle beam apparatuses 310-1 to 310-M.

[0144] Thus, in the charged particle beam processing system 301 according to this embodiment, it is possible to enable cooperation (vertical cooperation between different models) of a plurality of FIB-SEM composite apparatuses. For example, in the charged particle beam processing system 301 according to this embodiment, a series of processing flows such as producing a micro-sample by the charged particle beam apparatuses 10-1 to 10-N of the first model and processing and observing the produced micro-sample by the charged particle beam apparatuses 310-1 to 310-M of the second model can be created and executed as a recipe.

[0145] (Regarding the above embodiments) <Configuration example> As one configuration example, an information acquisition unit (in the embodiment, the information acquisition unit 251) that acquires information regarding a recipe executed in a charged particle beam apparatus (in the embodiment, the charged particle beam apparatuses 10-1 to 10-N) including a charged particle irradiation optical system, and an information management unit (in the embodiment, the information management unit 252) that generates recipe management information (in the embodiment, the recipe management information 231) based on the information acquired by the information acquisition unit and stores the recipe management information in a storage unit (in the embodiment, the storage unit 214). The computer (in the embodiment, the management computer 30) includes these components.

[0146] As one configuration example, in a computer, an information selection unit (in the embodiment, the information selection unit 253) that selects information based on recipe management information, and a recipe assignment unit (in the embodiment, the recipe assignment unit 254) that assigns a recipe to a predetermined target (in the embodiment, a holder or the like) based on the information selected by the information selection unit are provided.

[0147] As one configuration example, in a computer, the information selection unit selects corresponding information (for example, information of an automatic input item) from key information (for example, information of a manual input item) based on the recipe management information. As one configuration example, in a computer, the recipe assignment unit assigns a recipe to each sample holder as a predetermined target. As one configuration example, in a computer, the information management unit performs learning based on the information acquired by the information acquisition unit and generates recipe management information based on the result of the learning (for example, the example in FIG. 8).

[0148] As one configuration example, in a computer, the information management unit manages recipe management information regarding recipes executed in a plurality of charged particle beam apparatuses. As one configuration example, in a computer, the plurality of charged particle beam apparatuses include different models.

[0149] As one configuration example, in a computer, part or all of the information regarding a recipe executed in one charged particle beam apparatus is used as information regarding a recipe executed in another charged particle beam apparatus. As one configuration example, in a computer, a recipe allocation unit allocates the same recipe for executing processing in parallel by a plurality of charged particle beam apparatuses of the same model. As one configuration example, in a computer, a recipe allocation unit allocates a first recipe to a charged particle beam apparatus of a first model, and allocates a second recipe, which is a continuation of the first recipe, to a charged particle beam apparatus of a second model different from the first model.

[0150] As one configuration example, in a computer, a charged particle irradiation optical system includes one or both of a focused ion beam irradiation optical system (in the embodiment, the focused ion beam irradiation optical system 14) and an electron beam irradiation optical system (in the embodiment, the electron beam irradiation optical system 15).

[0151] As one configuration example, a first process (in the example of FIG. 6, the process of step S21) for acquiring information regarding a recipe executed by a charged particle beam apparatus including a charged particle irradiation optical system, and a second process (in the example of FIG. 6, the process of step S22) for generating recipe management information based on the information acquired by the first process and storing the recipe management information in a storage unit, are programs (in the embodiment, programs executed in the management computer 30) for causing a computer to execute.

[0152] As one configuration example, a charged particle beam processing system (in the embodiment, the charged particle beam processing system 1) including a charged particle beam apparatus including a charged particle irradiation optical system and a computer, wherein the computer includes an information acquisition unit for acquiring information regarding a recipe executed by the charged particle beam apparatus, an information management unit for generating recipe management information based on the information acquired by the information acquisition unit and storing the recipe management information in a storage unit, an information selection unit for selecting information based on the recipe management information, and a recipe allocation unit for allocating a recipe to a predetermined target based on the information selected by the information selection unit, and the charged particle beam apparatus includes a recipe execution unit (in the embodiment, the recipe execution unit 151) for executing the processing of the recipe allocated by the computer.

[0153] Here, a program for realizing any function in any device (for example, the management computer 30, the control computers 22-1 to 22-N) according to the above-described embodiments may be recorded (stored) on a computer-readable recording medium, and the program recorded on this recording medium may be read into a computer system and executed to perform processing. Note that the "computer system" as referred to here may include an operating system (OS) or hardware such as peripheral devices. Also, the "computer-readable recording medium" refers to a flexible disk, a magneto-optical disk, a ROM (Read Only Memory), a writable non-volatile memory such as a flash memory, a portable medium such as a DVD (Digital Versatile Disc), a storage device such as a hard disk built into a computer system, and the like. Also, the computer-readable recording medium is, for example, a non-temporary recording medium.

[0154] Furthermore, the "computer-readable recording medium" also includes a volatile memory (for example, DRAM (Dynamic Random Access Memory)) inside a computer system that becomes a server or a client when a program is transmitted via a network such as the Internet or a communication line such as a telephone line, and that holds the program for a certain period of time. Also, the above program may be transmitted from a computer system storing the program in a storage device or the like to another computer system via a transmission medium or by a transmission wave in the transmission medium. Here, the "transmission medium" for transmitting the program refers to a medium having a function of transmitting information, such as a network (communication network) such as the Internet or a communication line (communication wire) such as a telephone line. Also, the above program may be for realizing a part of the functions described above. Further, the above program may be a so-called difference file (difference program) that can be realized in combination with a program already recorded in the computer system for realizing the functions described above.

[0155] The functions of any component in any of the devices described above (for example, the management computer 30, the control computers 22-1 to 22-N) may be realized by a processor. For example, each process in the present embodiment may be realized by a processor that operates based on information such as a program and a computer-readable recording medium that stores information such as a program. Here, the processor may be configured such that the functions of each part are realized by individual hardware, or the functions of each part are realized by integrated hardware. For example, the processor includes hardware, and the hardware may include at least one of a circuit that processes digital signals and a circuit that processes analog signals. For example, the processor may be configured using one or both of one or more circuit devices mounted on a circuit board or one or more circuit elements. As the circuit device, an IC (Integrated Circuit) or the like may be used, and as the circuit element, a resistor or a capacitor or the like may be used.

[0156] Here, the processor may be, for example, a CPU. However, the processor is not limited to the CPU, and various processors such as, for example, a GPU (Graphics Processing Unit) or a DSP (Digital Signal Processor) may be used. Also, the processor may be, for example, a hardware circuit by an ASIC (Application Specific Integrated Circuit). Also, the processor may be configured by, for example, a plurality of CPUs, or may be configured by a hardware circuit by a plurality of ASICs. Also, the processor may be configured by a combination of, for example, a plurality of CPUs and a hardware circuit by a plurality of ASICs. Also, the processor may include, for example, one or more of an amplifier circuit or a filter circuit that processes analog signals.

[0157] As described above, the embodiments of the present invention have been described in detail with reference to the drawings. However, the specific configuration is not limited to this embodiment, and design changes and the like within the scope not departing from the gist of the present invention are also included.

Explanation of Reference Numerals

[0158] 1. 301... Charged particle beam processing system, 10-1 to 10-N, 310-1 to 310-M... Charged particle beam apparatus, 11... Specimen chamber, 12... Specimen stage, 12a... Holder fixing base, 13... Stage drive mechanism, 13a... Moving mechanism, 13b... Tilt mechanism, 13c... Rotation mechanism, 14... Focused ion beam irradiation optical system, 14a... Ion source, 14b... Ion optical system, 15... Electron beam irradiation optical system, 15a... Electron source, 15b... Electron optical system, 16... Detector, 17... Gas supply unit, 17a... Nozzle, 18... Needle, 19... Needle drive mechanism, 20... Absorption current detector, 21... Display device, 22-1 to 22-N, 322-1 to 322-M... Control computers, 23... Input device, 30, 330... Management computers, 31, 331... Operators, 111, 211... Input parts, 112, 212... Output parts, 113, 213... Communication parts, 114, 214... Memory parts, 115, 215... Control parts, 131, 131a... Recipe information, 132... Apparatus information, 151... Recipe execution part, 152... Information notification part, 153, 251... Information acquisition parts, 231... Recipe management information, 252... Information management part, 253... Information selection part, 254... Recipe allocation part, 401... Holder, FIB... Focused ion beam, EB... Electron beam, G... Gas, P... Specimen piece holder, Q... Specimen piece, R... Secondary charged particle, S... Specimen

Claims

1. A charged particle beam processing system comprising a charged particle beam apparatus having a charged particle irradiation optical system and a computer, comprising two or more of the charged particle beam apparatuses including a first charged particle beam apparatus of a first model and a second charged particle beam apparatus of a second model different from the first model, wherein the computer comprises an information acquisition unit that acquires information regarding a recipe executed by the charged particle beam apparatus, and an information management unit that generates recipe management information based on the information acquired by the information acquisition unit and stores the recipe management information in a storage unit, an information selection unit that selects information based on the recipe management information, and a recipe assignment unit that assigns a recipe to a predetermined target based on the information selected by the information selection unit, wherein the charged particle beam apparatus comprises a recipe execution unit that executes processing of the recipe assigned by the computer, wherein the charged particle beam processing system has these two or more charged particle beam apparatuses cooperate to perform a flow operation, in the flow operation, after the first charged particle beam apparatus executes processing of a first recipe assigned to the first charged particle beam apparatus by the recipe assignment unit on a sample, the second charged particle beam apparatus executes processing of a second recipe assigned to the second charged particle beam apparatus by the recipe assignment unit on the processed sample, wherein the first charged particle beam apparatus, after executing the processing of the first recipe, notifies the computer of first information regarding the processing, wherein the computer determines second information to be notified to the second charged particle beam apparatus based on the first information notified from the first charged particle beam apparatus, and notifies the determined second information to the second charged particle beam apparatus, wherein the first information includes predetermined information regarding the sample attached to the pillar in the processing of the first recipe of the first charged particle beam apparatus, wherein the second information is information capable of determining a position for performing the processing of the second recipe, which is the subsequent processing of the first recipe, and wherein the second charged particle beam apparatus determines the position based on the second information notified from the computer and performs processing of processing or observation as the processing of the second recipe, a charged particle beam processing system.

2. The first charged particle beam device notifies the computer of success / failure information indicating whether or not the process has been successful as a result of the execution of the process of the first recipe. The charged particle beam processing system according to claim 1.

3. The process of the first recipe is a process of automatically micro-sampling the sample. The process of the second recipe is a process of finishing the sample. The charged particle beam processing system according to claim 1 or claim 2.

4. When each of the charged particle beam devices executes the process of the recipe based on the information notified from the computer, after replacing the recipe with a recipe suitable for its own device, it executes the process of the replaced recipe. The charged particle beam processing system according to any one of claims 1 to 3.

5. The information management unit performs learning based on the information acquired by the information acquisition unit, and generates the recipe management information based on the result of the learning. The charged particle beam processing system according to any one of claims 1 to 4.

6. The recipe allocation unit allocates the recipe for each holder of the sample as the predetermined target. The charged particle beam processing system according to any one of claims 1 to 5.

7. The recipe management information includes information of all or some of the lower-level recipes included in a higher-level integrated recipe that is a combination of a plurality of lower-level recipes, and information of manual input items related to the recipe as key information, and correspondence between the key information and information related to automatic input items related to the recipe. When the information serving as the key is input by an operator, the information selection unit selects information related to the key based on the recipe management information. Based on the information selected by the information selection unit, the recipe allocation unit allocates a recipe including the conditions specified by the information to the predetermined target. The charged particle beam processing system according to any one of claims 1 to 6.

8. The information serving as the key is defect information. The information related to the key is one or more of a recipe for automatic MS, a processing recipe, and processing position information. The charged particle beam processing system according to claim 7.

9. The information serving as the key is chip information or wafer information. The information related to the key is an alignment recipe. The charged particle beam processing system according to claim 7.

10. The charged particle irradiation optical system includes one or both of a focused ion beam irradiation optical system and an electron beam irradiation optical system. The charged particle beam processing system according to any one of claims 1 to 9.

11. A charged particle beam processing system including a charged particle beam apparatus having a charged particle irradiation optical system and a computer, including two or more of the charged particle beam apparatuses including a first charged particle beam apparatus of a first model and a second charged particle beam apparatus of a second model different from the first model, The computer, an information acquisition unit that acquires information regarding a recipe executed by the charged particle beam apparatus, and an information management unit that generates recipe management information based on the information acquired by the information acquisition unit and stores the recipe management information in a storage unit, an information selection unit that selects information based on the recipe management information, and a recipe assignment unit that assigns a recipe to a predetermined target based on the information selected by the information selection unit. The charged particle beam apparatus includes a recipe execution unit that executes the processing of the recipe assigned by the computer. The charged particle beam processing system, wherein these two or more charged particle beam apparatuses cooperate to perform a flow operation, in the flow operation, after the first charged particle beam apparatus executes the processing of a first recipe assigned to the first charged particle beam apparatus by the recipe assignment unit on a sample, the second charged particle beam apparatus executes the processing of a second recipe assigned to the second charged particle beam apparatus by the recipe assignment unit on the processed sample, the first charged particle beam apparatus notifies the computer of first information regarding the processing after executing the processing of the first recipe, the computer determines second information to be notified to the second charged particle beam apparatus based on the first information notified from the first charged particle beam apparatus, notifies the determined second information to the second charged particle beam apparatus, and when the first information notified from the first charged particle beam apparatus is not directly applicable to the second charged particle beam apparatus, converts it to other information applicable to the second charged particle beam apparatus and then notifies the converted information to the second charged particle beam apparatus. In this case, the second charged particle beam apparatus executes the processing of the second recipe based on the converted information. Charged particle beam processing system.

12. The information management unit performs learning based on the information acquired by the information acquisition unit, and generates the recipe management information based on the result of the learning. The charged particle beam processing system according to claim 11.

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