Method and system for vacuum vapor deposition of functional materials in space

Abstract

A method and system for vacuum vapor deposition of deposition material to form functional materials such as coatings, thin film materials, thick film materials, etc. on substrates in space utilizes: a substrate support structure associated with a space platform; a deposition device for the deposition material; and a movable elongated arm associated with the space platform that provides relative movement between the substrate and the deposition device.

Description

[Technical Field]

[0001] 1. Related Applications This application claims the benefit of, and the benefit of priority to, U.S. Patent Application No. 62 / 829,464, filed April 4, 2019, entitled "Method and System for Vacuum Vapor Deposition of Functional Thin Film Coatings in Space," the disclosure and contents of which are incorporated herein by reference in their entirety.

[0002] 2. Field of the Disclosure FIELD OF THE DISCLOSURE The present disclosure relates generally to the field of vacuum vapor deposition of functional materials onto substrates in space environments. [Background technology]

[0003] 3. Description of Related Technology The NASA-funded Wake Shield Facility (WSF) program was a free-flying fabrication facility on a saucer-shaped spacecraft deployed from the Space Shuttle in low Earth orbit (LEO) to grow epitaxial semiconductor thin films in the vacuum of space. (Patent Document 1) The leading edge of the WSF disk redirected the residual atmosphere and other particles from LEO around both sides of the disk, leaving behind an "ultra-vacuum" in its wake. It was in this vacuum wake region that the first ever crystalline semiconductor films were grown. These films included the deposition of gallium arsenide (GaAs) and aluminum gallium arsenide (AlGaAs). [Patent Document 1] U.S. Patent No. 4,723,734 Summary of the Invention

[0004] The following presents a simplified summary of the disclosed subject matter in order to provide a basic understanding of some aspects of the subject matter disclosed herein. This summary is not an exhaustive summary of the technology disclosed herein, and it is not intended to identify key or critical elements of the invention or to delineate the scope of the invention. Its sole purpose is to present some concepts in a simplified form as a prelude to the more detailed description that is discussed later.

[0005] In one exemplary embodiment, a system for vacuum vapor deposition of a deposition material onto a substrate in a space environment may include: a substrate support structure associated with a space platform in the space environment; a deposition device for the deposition material; an energy source associated with the deposition device for exciting the deposition material to form a vapor of the deposition material; and a movable elongated member associated with the deposition device for moving the deposition device over the substrate such that the vapor of the deposition material from the deposition device flows over and onto the substrate to coat the substrate with the deposition material.

[0006] In another exemplary embodiment, a method for vacuum vapor deposition of a deposition material onto a substrate in a space environment to form a functional material on the substrate may include: placing the substrate on a substrate support structure associated with a space platform in the space environment; providing a deposition apparatus for the deposition material; providing an energy source associated with the deposition apparatus for exciting the deposition material to form a vapor of the deposition material; providing a movable elongated member associated with the deposition apparatus; and moving the deposition apparatus and the elongated member to pass over the substrate and cause the vapor of the deposition material to flow to the substrate to form the functional material on the substrate. [Brief explanation of the drawings]

[0007] The present method and system for vacuum vapor deposition of functional materials in space will be understood by reference to the following description taken in conjunction with the accompanying drawings.

[0008] [Figure 1]FIG. 1 is a perspective view of a system for vacuum vapor deposition of a deposition material onto a substrate in a space environment in accordance with an exemplary embodiment of the present invention; [Figure 2] FIG. 2 is a perspective view of a portion of the vacuum vapor deposition system of FIG. 1; [Figure 3] 3 is a perspective view of a portion of another embodiment of the vacuum vapor deposition system of FIG. 1; [Figure 4] 4 is a perspective view of another embodiment of a portion of the vacuum vapor deposition system of FIG. 1; [Figure 5] FIG. 5 is a perspective view of a system for vacuum vapor deposition according to another exemplary embodiment of the present invention; [Figure 6] FIG. 6 is a perspective view of the system of FIG. 1 including an overspray shielding device associated with a substrate; [Figure 7] 7 is a perspective view of a portion of another embodiment of the vacuum vapor deposition system of FIG. 1; [Figure 8] 8 is a front view of the system of FIG. 7 as viewed in the direction of arrow 8 in FIG. 7; [Figure 9] 9 is a side view of the system of FIG. 7 as viewed in the direction of arrow 9 in FIG. 7; [Figure 10] 10 is a perspective view of another embodiment of the vacuum deposition system of FIG. 1, wherein the substrate is a linear component; [Figure 11] 11 is a perspective view of another embodiment of the vacuum deposition system of FIG. 1, wherein the substrate is a joint between two structural components; [Figure 12] FIG. 12 is a perspective view of external components for use with the system of FIG. 11; [Figure 13] FIG. 13 is a perspective view of another embodiment of the component of FIG. Modes for carrying out the invention

[0009] While particular embodiments of the present method and system for vacuum vapor deposition of functional materials in space will be described with reference to the exemplary embodiments set forth herein, it will be understood that it is not intended to limit the invention to those embodiments. On the contrary, it is intended to cover all alternatives, modifications, and equivalents that may be included within the spirit and scope of the invention as defined by the appended claims. In drawings that are not to scale, the same reference numerals are used in the present specification and drawings for parts and components having the same structure, and reference numerals with a prime are used for parts and components having similar function and structure to those parts and components having the same reference numerals without the prime.

[0010] DETAILED DESCRIPTION OF ILLUSTRATIVE EMBODIMENTS While the following provides exemplary implementations of one or more exemplary embodiments, it should be understood that various specific exemplary embodiments can be implemented using any number of techniques known to those skilled in the art. The present disclosure is in no way limited to the exemplary embodiments, drawings, and / or techniques illustrated below, e.g., the exemplary designs and implementations shown and described herein. Moreover, the present disclosure may be modified within the scope of the appended claims, together with equivalents to the fullest extent of those claims.

[0011] Future space-based Earth observation, communications, astrophysics, and other space missions will demand more sophisticated and functional payloads and sensors, which will require more global Space-based assets provide the world's remote communications infrastructure and reliable Earth surveillance. As a result, there is a continuing need to manufacture increasingly large antennas, radars, reflectors, and solar power systems for space-based assets, with a focus on affordability and system resilience. Historically, space hardware has been designed near the payload capacity limits of the spacecraft being launched, limiting its ability to accommodate larger antennas, reflectors, radars, and solar power systems. Manufacturing these size-critical hardware components in space offers the potential to utilize the naturally occurring vacuum of space to build these hardware components and systems in orbit using vacuum vapor deposition. These components and systems would be repairable and expandable in space to meet changing requirements and demands. Manufacturing very large antennas, reflectors, radars, reflective surfaces, and solar power systems in orbit could enable virtually unlimited aperture sizes and extremely low areal densities for space-based assets.

[0012] Vacuum vapor deposition is a terrestrial manufacturing process used to produce reflective, emissive, and absorbent functional coatings for a variety of products, including crystalline thin-film devices such as solar cells and transistors. This process has been proposed for use in space environments, including free space; low Earth orbit (LEO); sun-synchronous orbit (SSO); medium Earth orbit (MEO); geostationary, or geosynchronous, orbit (GEO); other Earth orbits; and cis-lunar space, as well as the surface of the Moon, other moons, asteroids, other planets, and other planetary bodies with reduced atmospheres, such as Mercury and Mars.

[0013] Vacuum vapor deposition processes may utilize the natural vacuum of the space environment to deposit atomically layered materials in the creation of a wide variety of functional coatings, thin film materials, and thick film materials to fabricate functional hardware, such as space phased array antennas, antenna reflectors, synthetic aperture radar antennas, radars, other reflectors, solar cells, and power lines, of ultra-large dimensions and quality, which can be integrated with space assets to perform various space missions.

[0014] Given that ground-manufactured deployable space-based technologies are reaching their practical limits with the advent of the James Webb Space Telescope's deployable 6.5 m (21.4 ft) segmented primary mirror system, the present method and system are proposed to fabricate very large components in the space environment. Fabricating antennas, reflectors, and solar power systems in the vacuum of space offers the opportunity for nearly unlimited aperture sizes at extremely low areal densities for space-based assets, offering vast new possibilities for space users.

[0015] The present methods and systems for vacuum vapor deposition of functional coatings, thin film materials, and thick film materials enable the fabrication of functional materials in space and are believed to be applicable to the fabrication of very large objects greater than 50 meters in diameter, as well as components for spacecraft, satellites, and other space assets. The present methods and systems are directly applicable to space-based assets, including: in-space fabrication of phased arrays / antennas, antenna reflectors, reflector antennas, synthetic aperture radar, radar reflectors, mirrors, solar cells, power cables, and wiring; fabrication of interconnected dipole antennas and mirror reflective surfaces; fabrication of antenna reflectors for remote sensing, astrophysics, and communications missions; and in-space asset maintenance for in-orbit repair of functional coatings, restoration of functional materials, and upgrades of space assets. Manufacturing space-manufactured antennas offers significant advantages over Earth-manufactured space systems because it allows mission planners to: a) improve the performance, robustness, and stability of space assets; b) eliminate design limitations (size, volume, durability) imposed on the launch of ground-manufactured antennas; c) develop new designs using a wider variety of materials; d) continually scale up, upgrade, and repair space-manufactured components; and e) enable more efficient supply chain architectures for manufacturing and operating parts from space.

[0016] The methods and systems can fabricate, repair, restore, and upgrade space assets, such as coatings on space assets, and thin and thick film materials. The methods and systems also have the ability to fabricate or recoat luminescent coatings, light absorbing coatings, reflective coatings, and other functional materials, fabricate and restore photovoltaic ("PV") systems and other functional materials, and continually upgrade space assets.

[0017] Substrates for functional coatings can be fabricated in space using additive manufacturing due to the flexible nature of vacuum vapor deposition in the vacuum environment of space, or they can be fabricated on the ground, launched, and robotically assembled and deployed in orbit for use in the space vacuum vapor deposition process. Vacuum vapor deposition involves depositing elemental vapors over an area, one atomic layer at a time. Vacuum vapor deposition builds functional materials by layering specific elements in unique configurations at the atomic level, thus creating advanced thin-film functional materials. As an example, the fabrication of large antennas and reflective surfaces may be achieved by depositing the following materials to create reflective surface coatings and antennas: Ag, Al, Au, Be, Ca, Mg, and Ti, among others.

[0018] The methods and systems may be used to fabricate antennas, reflectors, radar, solar power systems, other functional materials, and other light-absorbing, reflective, and light-emitting coatings in space by depositing materials directly onto substrates in the vacuum of space.

[0019] Vacuum vapor deposition may be used to deposit functional materials onto substrates in the vacuum of space to create antennas, reflectors, radar, solar power systems, and other functional materials. The deposition process may be thermal evaporation, ion beam evaporation / sputtering, electron beam evaporation, laser evaporation, or other more complex physical vapor deposition techniques. The deposition process may also be chemical vapor deposition, including chemical vapor deposition, metal / organic chemical vapor deposition, metal organic deposition, or other chemical vapor deposition processes. While the fabrication processes for antennas and reflectors are similar, different deposition techniques may be used to optimize the fabrication process.

[0020] As an example, fabricating thin-film microwave or radar antennas in space requires fabricating interconnected antenna components that are deposited directly onto a substrate to form large-area antenna arrays via metal thin-film deposition. These antennas can accommodate required spacings from 1 mm to greater than 10 m, based on application requirements. The present methods and systems can fabricate such antenna arrays and interconnected power lines in space using a variety of metallic materials, e.g., Ag, Al, Ca, Cu, Mg, and alloys, depending on the specific conductive properties required. As a further example, fabricating reflective surfaces, such as mirrors, in space requires thin metal coatings on substrates using thin-film deposition. Mirror coatings typically require gold, aluminum, silver, or other reflective coatings ranging in thickness from a few nanometers to over 1000 nm. The present methods and systems deposit reflective coatings using a variety of materials, e.g., Ag, Al, Au, Be, Mg, Ti, and alloys, depending on the specific optical properties required. Additionally, these coatings can utilize different elements to create a variety of different surfaces for space assets. It can be layered.

[0021] The present methods and systems for manufacturing antennas, radars, reflectors, and solar power systems may use elongated members or arms in space, which may be used for satellites, Satellite bus (hereinafter sometimes referred to as "spaceship bus") The vacuum vapor deposition system may be a system of robotic members or arms associated with an elongated member, another spacecraft, space station, or other space platform to assemble or prepare a substrate and manipulate or move a vacuum vapor deposition system over the substrate or to manipulate or move the substrate over the vacuum vapor deposition system to coat the substrate. The substrate and vacuum vapor deposition fabrication system are designed to be integrated with and manipulated by a system of elongated members or robotic arms, which also provides the necessary power and equipment to these fabrication systems. The length of the elongated member or robotic arm system determines the maximum size of the object that can be fabricated, and the power available for the arms and vacuum vapor deposition system from the energy source for the system determines the deposition rate in the vacuum vapor deposition process.

[0022] In addition to a robotic arm or elongated member or arm, a robotic grapple may be used to manipulate the object to be manufactured while it is being fabricated. Both the robotic arm and grapple may include robotic software for autonomous or remote controlled robots to control the fabrication process.

[0023] Referring to FIG. 1 , a system 100 for vacuum vapor deposition of a coating, thin film material, or thick film material onto a substrate in a space environment is shown according to an exemplary embodiment. The deposition system 100 generally includes: a substrate 250; a substrate support structure 260 having an associated space platform 400; a vacuum vapor deposition apparatus, or deposition device, 110 for the material to be deposited; and a movable elongated member, or arm, 200, having associated therewith the deposition device 110. The system 100 may be used in a space environment, such as free space, LEO, SSO, GEO, other Earth orbit, cis-lunar space, the Moon, or other planetary body, all as described above. The space platform 400 may include a space station, such as the International Space Station, and preferably, the space platform 400 is a satellite bus, or spacecraft bus, 401.

[0024] Deposition apparatus 110 may be any device or equipment capable of depositing material onto a substrate by vacuum vapor deposition or any other deposition process described herein. The term "elongate member," when used, is intended to include and describe not only any structural component, such as single arm 200 of FIG. 1 , that is generally longer than it is wide, but also any other structural component or combination of structural components having the requisite characteristics to be used in the methods disclosed herein in connection with substrate 250 and deposition apparatus 110, such as articulated arm 200, or a rigid arm, or multiple articulated and / or rigid arms, as shown and described herein.

[0025] The deposition device 110 of the system 100 includes a power source 111 that delivers energy to the deposition device 110 through an elongated member 200 or robotic arm 204, which, as described below in connection with FIGS. 2-4 , is associated with the deposition device 110 to provide energy to the deposition device 110, which excites the deposition material disposed therein to form a vapor of the deposition material. The substrate 250 may be any surface on which a coating, thin film, or thick film can be deposited by vacuum vapor deposition, as known in the art, including the substrates described above. The substrate 250 may be formed from any material as described above and may have any shape, including, but not limited to, a square configuration, a rectangular configuration, a circular configuration, or any other desired configuration. The substrate Material 250 may be flat, planar, or may be curved, such as convex or concave, if desired.

[0026] 1 , substrate 250 is associated with satellite 400 using any suitable substrate support structure 260, whereby substrate 250 may be associated with or attached to space platform 400. A movable elongate member or arm 200 has first and second ends 201, 202, with first end 201 of member 200 attached to deposition apparatus 110 in any suitable manner, such as by welding, threaded connection, adjustable ball joint, or ball and socket. Second end 202 of member 200 is associated with space platform 400, but may also be associated with a satellite, spacecraft, or space station (not shown) if desired. Preferably, member 200 is a robotic arm system 204, and the operation and movement of robotic arm or member system 204 may be remotely controlled to move in any suitable manner, as described below. The member 200, or system of robotic arms 204, preferably includes a plurality of pivotable, hinged, and / or rotatable connectors or joints 203, which allow the member 200, or system of robotic arms 204, to be articulated into any desired configuration to position the deposition apparatus 110 at any desired position relative to the substrate 250.

[0027] The member 200, or robotic arm 204, is controlled to maintain the substrate 250 in a stationary position relative to the space platform 400 while moving the deposition device 110 an appropriate distance over the outer surface 251 of the substrate 250 so that the deposition device 110 passes over the entire surface of the substrate 250 and causes vapor of the deposition material from the deposition device 110 to flow or exit onto the substrate 250 to coat the outer surface 251 of the substrate with the deposition material. The deposition device 110 moves to cover all areas of the outer surface 251 of the substrate 250 with the deposition material, providing a uniform or non-uniform coating, thin or thick film of material on the substrate 250. 1 , the deposition apparatus 110 may be passed over the substrate 250 in the direction of arrow 275, as well as in the direction illustrated by arrow 270, so that the deposition apparatus 110 passes over the substrate 250 in a raster fashion, i.e., from one side of the substrate 250 to the other and from top to bottom. The deposition apparatus 110 may also be moved over any path over the substrate 250 to coat the substrate 250 with a film or coating of a desired thickness and uniformity. If desired, the substrate 250 may have an overspray shielding device 255 ( FIG. 6 ) attached to or mounted around the substrate 250 to prevent or minimize coating of the exterior surface of the space platform 400. The shielding device 255 may be oriented in any direction to best prevent overspray from falling on the exterior surface of the space platform 400. As shown in FIG. 6, the shielding device 255 is a panel 256 attached to the periphery of the substrate 250, which may be angled inward toward the center of the substrate 250.

[0028] 1 , substrate 250 is maintained stationary relative to space platform 400, with deposition apparatus 110 and member 200 moving relative to substrate 250, if desired, an alternative embodiment, as shown in FIG. 5 , places or mounts deposition apparatus 110 in a stationary location associated with space platform 400, with member 200 potentially associated with substrate 250, preferably by attaching first end 201 of member 200 to backside 252 of substrate 250. In this embodiment, substrate 250 may be moved by member 200, or robotic arm 204, relative to fixed or stationary deposition apparatus 110 associated with space platform 400 in any desired or specified manner, for example, in a raster fashion, to coat exterior surface 251 of substrate 250 with a coating or film of desired thickness and uniformity. do.

[0029] 1 and 5 for vacuum vapor deposition of deposition material onto substrate 250 may utilize different vacuum vapor deposition processes as known in the art. The vapor of the deposition material may be formed by a deposition process such as thermal evaporation, ion beam evaporation, electron beam evaporation, laser evaporation, or other physical vacuum vapor deposition process. The deposition may also be encompassed by chemical vapor deposition, including chemical vapor deposition, metalorganic chemical vapor deposition, metalorganic vapor deposition, or other chemical vapor deposition processes.

[0030] Referring to FIG. 2, the system 100 of FIGS. 1 and 5 for vacuum vapor deposition of deposition material may utilize a thermal evaporation process. In FIG. 2, deposition apparatus 110 includes a boat, or container, shown schematically at 112, disposed within the deposition apparatus, which is nominally inert to the coating or deposition material and holds the deposition material. Deposition apparatus 110 also includes an energy source, shown schematically at 113 in FIG. 2, disposed within the deposition apparatus to heat the container 112 to form a vapor of the deposition material. Energy source 113 may be a resistive heat source that provides Joule or resistive heating to the housing or boat 112. Energy source 113 may also be a laser or microwave heat source, or other heating technology capable of heating the boat or container 112 to evaporate or vaporize the deposition material to provide the desired vapor of the deposition material to be deposited on substrate 250. 1 and 2, energy source 113 may receive its essential power requirements from power source 111. For system 100 of FIG. 5, the energy source for deposition apparatus 110 mounted on space platform 400 may receive its essential power directly from space platform 400, or from power source 111 associated with member 200 or robotic arm 204.

[0031] The deposition apparatus 110 may include a device 120 for measuring the vapor flow, or flux, of the deposition material from a vessel, or boat, 112, within the deposition apparatus 110. A camera 140 may be associated with the deposition apparatus 110 to monitor the vapor flow of the deposition material to the substrate 250 and to monitor the movement of the deposition apparatus 110 and the member 200 or robotic arm 204 relative to the substrate 250. A vacuum environment measurement gauge 130 may also be associated with the deposition apparatus 110 to measure the vacuum level of the space environment proximate to the system 100. The system 100 may also include a coating or material performance characteristic measurement device 135 associated with the deposition apparatus 110. For example, the device 135 may be a reflectometer to measure the reflective properties of a reflective coating as it is being formed.

[0032] 2 , vapor of deposition material formed by heating a boat or vessel 112 within deposition apparatus 110 escapes deposition apparatus 110 through an opening or slot 114 formed in the top of deposition apparatus 110. Deposition apparatus 110 may have a shutter or plate member 150 that is movable from a first open position, in which deposition material vapor can flow from vessel or boat 112 within deposition apparatus 110 to substrate 250, to a second closed position, in which shutter 150 blocks the flow of vapor from deposition apparatus 110 to substrate 250. Shutter 150 may be associated with a shutter control arm or control system 155, the rotation of which moves shutter 150 between the first and second positions. 2, shutter 150 is in a closed second position, as indicated by reference numeral 151, where shutter 150 blocks the flow of vapor of deposition material from deposition apparatus 110. A first, open position of the shutter is also shown in FIG. 2, where shutter 150 is indicated by reference numeral 152. System 100 also includes suitable energy sources for controlling and providing energy for energy source 113, as well as for camera 140, shutter 150, and vacuum environment measurement gauge 130. It may also include electronic equipment.

[0033] Referring to FIG. 3, the deposition apparatus 110′ of the system 100 utilizes an ion beam deposition process to form a vapor of deposition material. This ion beam or sputter deposition process utilizes a sputter source 170 associated with the deposition apparatus 110′ to provide a vapor of deposition material that is deposited on the substrate 250. The deposition apparatus 110′ may include a vacuum gauge 120, a camera 140, a vacuum environment measurement gauge 130, and a performance characteristic measurement device 135, as described above in connection with the deposition apparatus 110 of FIG. 2. If desired, a shutter 150 (FIG. 2) may also be utilized with the deposition apparatus 110′ of FIG. 3. An energy source, shown schematically at 113′, located within the deposition apparatus 110′ may receive its required power in the same manner as described in connection with the energy source 113 of FIG. 2.

[0034] Referring to FIG. 4, an electron beam evaporation process may be used with evaporation apparatus 110″ of system 100 to form a vapor of evaporation material to be deposited on substrate 250. Evaporation apparatus 110″ includes an electron gun housing 180 for an electron gun that forms an electron beam that evaporates the evaporation material. The electron beam is directed to a spittoon, shown schematically at 160, within evaporation apparatus 110″. Evaporation apparatus 110″ of FIG. 4 may also include other components previously described, such as vacuum gauge 120, camera 140, vacuum environment measurement gauge 130, and coating performance characteristic measurement device 135. Similarly, evaporation apparatus 110″ may include shutter 150 of evaporation apparatus 110 of FIG. 2. An energy source, shown schematically at 113″ within evaporation apparatus 110″ may receive its required power in the same manner as described in connection with energy source 113 of FIG. 2.

[0035] 7-9, a chemical vapor deposition process may be used in conjunction with a vapor deposition apparatus 110''' to form a vapor of a deposition material that will be deposited on a substrate 250. Generally, the vapor deposition apparatus 110''' vaporizes a mixture of precursor gases, typically oxygen, and a carrier gas, and distributes the resulting vapor over a heated substrate to form a desired coating, thin film, or thick film on the substrate.

[0036] The deposition apparatus 110''' may include: a gas storage system 501; a gas flow delivery module 502; a precursor storage system 503; a precursor delivery system 504; an evaporator 505; a vapor distributor or distribution system 506; and a heating system 507, all as described below.

[0037] The gas storage system 501 stores a gas, typically oxygen, and a carrier gas, such as nitrogen, which is subsequently vaporized along with the precursor. The gas storage system 501 may preferably be a gas storage tank 508; although a cylindrical tank is shown, any shape of tank that fits within the deposition apparatus 110''' may be used. The gas flow delivery module 502 is in fluid communication with the tank 508 via appropriate piping 509, and the module 502 controls the flow of gas to the precursor delivery system 504 via appropriate piping 510. Other carrier gases may be utilized depending on the desired coating, thin film, or thick film to be formed on the substrate 250. For example, nitrous oxide may be used as a carrier gas to form an oxide or dielectric layer on the substrate 250 when used with an appropriate organometallic precursor. Examples of other carrier gases include, but are not limited to, argon, nitrogen, helium, and other gases known to those skilled in the art of chemical vapor deposition processes.

[0038] 7-9, the precursor storage system 503 for the desired precursor is also in fluid communication with a precursor delivery system 504 by appropriate piping 511. The delivery system 504 preferably includes a liquid injector that injects precise amounts of precursor and gas into the vaporizer 505; or an injector nozzle. Alternatively, if desired, the precursor storage system 503 can be placed in fluid communication with a gas flow delivery module 502, which can control the flow of precursors and gases to the precursor delivery system 504. The precursors that flow into the precursor delivery system 504 are liquid precursors that are originally in liquid form, but may also be initially provided in power or solid form, which is combined with a suitable solvent to dissolve it into a liquid, as is known in the art.

[0039] 7-9, the precursor and gas mixture is vaporized in a vaporizer 505 in a conventional manner, as known in the art. The vaporizer 505 is in fluid communication with a vapor distributor system 506 via suitable piping 512, which is preferably a manifold 513 and may include multiple tubes or fluid conduits 514, 515. Vaporized precursor and gas streams may flow from the vaporizer 505 through the manifold 513 to the vapor distribution system 506. The vapor distribution system 506 may include multiple outlets, nozzles, or ports, which may function similarly to those of a showerhead, through which vapors of deposition material, or precursors, and gases may be directed toward the substrate 250. The vapor distributor system 506 may be an elongated housing 516 formed by a top panel or wall 517, an end panel or wall 518, a side wall or panel 519, and a bottom panel or wall 520, which has a plurality of outlets, nozzles, or ports 521 (FIG. 7) formed therein.

[0040] 7-9 , a heating system 507 may be disposed within the deposition apparatus 110′″ in a location capable of directing heat or radiation toward the substrate 250 to heat the substrate 250. Preferably, the heating system 507 may include an energy source 525, such as a plurality of quartz halogen lamps, infrared lamps, or high-power laser diodes 526, which may be positioned in a spaced-apart relationship to the substrate 250 and the housing 516 of the vapor distribution system 506. The diodes or lamps 526 may be positioned substantially parallel to a sidewall 519 of the housing 516. A cooled reflector shroud, or shielding device, 550, may be provided to reflect energy or heat from the diodes or lamps 526 toward the substrate 250. The vapor distribution system 506 uniformly distributes and flows precursor and gas vapors across a portion of the substrate 250. The precursor and gas vapors escaping nozzle 521 of housing 516 react under the influence of energy source 525, which heats the substrate, and a desired coating, thin film, or thick film, such as an oxide or dielectric layer, is formed on substrate 250.

[0041] Deposition apparatus 110'" preferably includes an arm, or elongated member, 200, or robotic arm 204, as described above in connection with FIGS. 1 and 5, which system 204 can provide power to and communicate with deposition apparatus 110'". Robotic arm 204 can move deposition apparatus 110'" across and over substrate 250 to provide a film or coating on substrate 250 of a desired thickness and uniformity thereover, as described above in connection with FIG. 1.

[0042] Referring to FIG. 10, deposition system 100 is shown coating a substrate 250', which is a linear element, such as a truss or I-beam structural element 257, with a coating of vapor, or flux, 258, of deposition material by deposition apparatus 110, as previously described. Deposition apparatus 110 may be any of deposition apparatuses 110, 110', 110", or 110"' described herein. A substrate support structure (not shown) associated with space platform 400 (FIG. 1) supports substrate 250' relative to space platform 400. As previously described, a movable elongated arm or member 258 may be used to support substrate 250'. 1. The arm 200 has a deposition apparatus 110 associated at its first end 201 with the arm 200, which moves the deposition apparatus 100 relative to the substrate 250′ to coat whatever portion of the substrate is desired to be coated. The arm 200 may be a robotic arm system 204, as described above. The deposition apparatus 110 may be moved by the arm 200, or robotic arm system 204, along the longitudinal axis of the linear component 257, as well as around the substrate 250′, to completely coat the linear component 257 or to coat a desired portion of the linear component. Multiple deposition apparatuses 110 could be associated with the arm system 204, if desired.

[0043] 11 , another system 100 for vacuum vapor deposition of a coating, thin film, or thick film onto a substrate 250 in a space environment is shown according to an illustrative embodiment. The deposition system 100 generally includes: a deposition apparatus 110 for deposition material; a power and deposition material management module 601; an arm or elongated member 200, or robotic arm, or system of robotic arms 204, as described above; and a power or energy source 111 ( FIG. 1 ) associated with the robotic arm 204, as described above. The deposition apparatus 110 can be any of the deposition apparatuses 110, 110′, 110″, or 110′″ described previously herein. Power and deposition apparatus material management module 601: supports deposition apparatus 110; contains deposition material that is vacuum-evaporated into deposition material flux, or vapor, 602, as indicated by arrow 603; controls the power supplied to deposition apparatus 110 from energy source 111 (FIG. 1) via robotic arm 204; and manages and controls the operation of deposition apparatus 110 from electronic data communications received via robotic arm system 204. One end 201 of robotic arm system 204 is attached to module 601 by any suitable connector 605, such as a ball-and-socket connector or coupling, 606, and at its other end, robotic arm system 204 is attached to space platform 400, as previously described.

[0044] 11 , substrate 250 is a joint, or joint area 610 surrounding a joint, as indicated by arrow 610′ between two structural components 615, 616. A substrate support structure (not shown) associated with space platform 400 ( FIG. 1 ) supports substrate 250 and structural components 615, 616 relative to space platform 400. Component 615 could be a section or length of a solid rod member 617, as shown in FIG. 11 , or a section or length of a tube member. Structural member 616 could be a section of a tube member 618 having a crimped end 619, providing an enlarged diameter, or female end, 621, to accept end 620 of structural component 615. Alternatively, component 616 could be a solid rod member with a crimped connector at end 619. Structural components 615, 616 could have other shapes and cross-sectional configurations as desired.

[0045] After the structural components 615, 616 are connected together as shown in FIG. 11 , the deposition apparatus 110 may be operated or actuated to form vapors or fluxes 602, 603 of deposition material; the deposition apparatus 110 is then moved by the robotic arm system 204 under and around the joint areas 610, 610′ to deposit a coating, thin film, or thick film of deposition material over the joint areas 610, 610′. Preferably, a thick film of deposition material is formed and deposited over the joints 610, 610′. The deposited thick film can join or bond the two structural components 615, 616 or can stiffen the joints 610, 610′. If desired, the system 100 and deposition apparatus 110 of FIG. 11 can also be used to repair structures in space or to replace various materials used in space. The deposition device 110 may utilize any number of deposition or joining materials, such as indium, cadmium, zinc, burr, etc. Examples include, but are not limited to, lead, magnesium, titanium, and alloys of multiple materials.

[0046] As described above, after two structural components have been spliced or stiffened, the joint 610 may be disassembled or split, if desired, by heating the joint region 610, 610′ to remove or melt the thickening from the joint region 610, 610′, allowing the spliced structural components 615, 616 to disassemble or separate from one another. Referring to FIG. 12 , a heating system 700 is associated with the robotic arm system 204, as described above. The heating system 700 may be moved by the robotic arm 204 into proximity of the joint region 610 between the structural components 615, 616, and may heat, melt, and / or remove the joint 610 once the heating system 700 is activated and operated. The heating system 700 may include at least one, and preferably multiple, energy sources 701 capable of generating and focusing heat at the joint region 610. The energy source 701 is disposed within a heating system housing, or shroud, 702, which is attached by any suitable connector to the first end 201 of the robotic arm 204, as previously described. The energy source may preferably be a plurality of halogen lamps, quartz halogen lamps, infrared lamps, electron beam, or any other suitable heat source 703 disposed within the housing 702. The robotic arm system 204 is attached to a power source, or energy source, 111 (FIG. 1), as previously described, which provides the energy necessary to operate the lamps 703. The other end of the robotic arm system 204 is attached to the space platform 400 (FIG. 1), as previously described.

[0047] If desired, the interior wall surface 704 of the housing 702 may comprise or be coated with a highly reflective and / or protective material, such as silver, gold, aluminum, or other material, to maximize the reflectivity of the interior wall surface 704 of the housing 702 and help focus the thermal energy from the lamps 703 onto the fitting 610. If desired, the housing 702 may be cooled by supplying a cooling fluid or gas medium to the housing 702 via the robotic arm system 204. If desired, the heating system 700 of FIG. 12 may be made from multiple sections, as shown in FIG. 13, where a heating system 700′ is formed from multiple heating sections 710 disposed within a modified housing 702′, thereby allowing a larger portion of the fitting 610, 610′ to be irradiated or heated by the heating system 700′. Each heating section 710 includes a plurality of lamps and / or other heat sources 703, and each heating section 710 is disposed at an angle from its adjacent section 710. Preferably, the housing 702' conforms to the arrangement of the heating sections 710 with respect to angle.

[0048] At least one embodiment is disclosed, and variations, combinations, and / or modifications of the embodiments and / or of the features of the embodiments made by those skilled in the art are within the scope of the present disclosure. Alternative embodiments resulting from combining, integrating, and / or omitting features of the embodiments are also within the scope of the present disclosure. When numerical ranges or limits are explicitly stated, such explicit ranges or limits may be understood to include iterative ranges or limits of comparable magnitude that fall within the explicitly stated range or limit (e.g., about 1 to about 10 includes 2, 3, 4, etc.; greater than 0.10 includes 0.11, 0.12, 0.13, etc.). The use of the term "about" means ±10% of the following number unless otherwise specified.

[0049] When the term "optionally" is used with respect to any element of a claim, it means that the element is required, or alternatively, that the element is not required, and both alternatives are within the scope of the claim. If any of the above terms is used, it may be understood to support narrower terms such as "consisting of," "consisting essentially of," "comprised substantially of," etc. The scope of protection is therefore not limited by the above description, but is defined by the claims, which scope includes all equivalents of the subject matter of the claims. Each and every claim is incorporated into this specification as further disclosure, and the claims are embodiments of the present disclosure.

[0050] While this disclosure has provided several exemplary embodiments, it will be understood that the disclosed embodiments may be embodied in many other specific forms without departing from the spirit or scope of this disclosure and the appended claims. The examples of the present invention are to be considered illustrative and not restrictive, and are not intended to be limited to the details provided herein. For example, various components or parts may be combined or integrated into another system, or certain features may be omitted or not implemented.

[0051] Additionally, various exemplary embodiments described and illustrated as separate or separate in various embodiments may be combined or integrated with other systems, modules, techniques, or methods without departing from the scope of the present disclosure. Other items shown or discussed as being coupled or directly coupled or in communication with each other may also be indirectly coupled or in communication through some interface, device, or intermediate component, whether electrical, mechanical, or otherwise. Other examples of changes, substitutions, and alterations will be ascertainable by those skilled in the art, and may be made without departing from the spirit and scope disclosed herein.

Claims

1. 1. A system for vacuum vapor deposition of a deposition material onto a substrate in a space environment, comprising: a substrate support structure attached to a space platform in a space environment; a deposition device for the deposition material; an energy source for exciting the deposition material to form a vapor of the deposition material; a movable elongated member attached to the deposition apparatus for providing power to the energy source of the deposition apparatus for excitation of the deposition material and for moving the deposition apparatus over the substrate, the elongated member being a robotic arm with multiple joints that are pivotable, hinged, and / or rotatable, whereby the movable elongated member is configured to articulate and position the deposition apparatus in a desired configuration with different positions relative to the substrate, whereby vapor of the deposition material flows onto the substrate and coats the substrate with the deposition material at different positions on the deposition apparatus; A system comprising:

2. 10. The system of claim 1, wherein the elongated member has first and second ends, the first end attached to the deposition device and the second end attached to the space platform.

3. A system as described in claim 1, wherein a shutter is attached to the vapor deposition device and is movable from a first position to a second position relative to the vapor deposition device, wherein vapor of the vapor deposition material may flow from the vapor deposition device to the substrate, and the shutter blocks the flow of the vapor from the vapor deposition device to the substrate.

4. The system of claim 1 , comprising a heating system capable of heating the substrate to remove the deposition material.

5. The system of claim 1 , wherein the deposition apparatus includes a precursor storage system and a heating system for heating the substrate.

6. The system of claim 1 , wherein the space platform is a satellite bus.

7. A deposition material is vapor-deposited on a substrate in a space environment, and a functional material is deposited on the substrate.

1. A method of forming: placing the substrate on a substrate support structure attached to a space platform in a space environment; providing a deposition apparatus for the deposition material; providing an energy source for exciting the deposition material to form a vapor of the deposition material; providing a movable elongated member attached to the deposition apparatus for providing power to the energy source of the deposition apparatus to excite the deposition material and for moving the deposition apparatus over the substrate, the elongated member being a robotic arm having a plurality of pivotable, hinged, and / or rotatable joints, whereby the movable elongated member is configured to articulate and position the deposition apparatus in different desired configurations relative to the substrate; moving the vapor deposition device and the elongated member to pass over the entire substrate, so that vapor of the vapor deposition material flows onto the substrate at the different positions of the vapor deposition device, thereby forming a functional material on the substrate; A method comprising:

8. The method of claim 7 , wherein the elongated member has first and second ends, the first end attached to the deposition apparatus and the second end attached to the space platform.

9. 8. The method of claim 7, comprising providing a shutter for the deposition apparatus that is movable from a first position relative to the deposition apparatus that allows vapor of the deposition material to flow from the deposition apparatus to the substrate, to a second position that prevents the flow of the vapor from the deposition apparatus to the substrate.

10. The method of claim 7 , comprising providing a precursor storage system and a heating system for the deposition apparatus, the heating system being capable of heating the substrate.

11. The method of claim 7 , wherein the space platform is a satellite bus.

12. 1. A method for joining a first structural component to a second structural component by vacuum vapor deposition of a deposition material onto a substrate in a space environment, the method comprising: placing a substrate on a substrate support structure attached to a space platform in a space environment, the substrate being a joint between the first and second structural members; providing a deposition apparatus for the deposition material; providing an energy source attached to the deposition apparatus to excite the deposition material to form a vapor of the deposition material; providing a movable elongated member attached to the deposition apparatus for providing power to the energy source of the deposition apparatus for exciting the deposition material and for moving the deposition apparatus over the substrate, the elongated member being a robotic arm having a plurality of pivotable, hinged, and / or rotatable joints, whereby the movable elongated member is configured to articulate and position the deposition apparatus in different desired configurations relative to the substrate; moving the deposition apparatus and the elongated member over the substrate so that vapor of the deposition material flows to the substrate at the different locations of the deposition apparatus to join the first and second structural components together; A method comprising:

13. The elongated member has first and second ends, and the first end is attached to the deposition device. and attaching the second end to the space platform.

14. The method of claim 12 , wherein the elongate member is a system of robotic arms.

15. The method of claim 12 , wherein the space platform is a satellite bus.

16. 13. The method of claim 12, comprising providing a heating system to heat the substrate to remove the deposition material and separate the first and second structural components.

17. The system described in claim 2, wherein the robotic arm is pivotable, hinged, and rotatable and has three or more degrees of freedom.

18. The system of claim 1, wherein a vacuum gauge is attached to the deposition apparatus to measure the vapor flow of the deposition material from the deposition apparatus.

19. The system described in claim 1, wherein the energy source is a resistive heat source, a laser, an electron beam, and / or an ion beam.

20. A system as described in claim 1, including a functional material performance characteristic measuring device.

21. The system described in claim 1, wherein the substrate includes at least one overspray shielding device.

22. The method described in claim 8, wherein the elongated member is a system of robotic arms.

23. The method of claim 7, wherein a vacuum gauge is associated with the deposition apparatus to measure the vapor flow of the deposition material from the deposition apparatus.

24. The method of claim 7, wherein a vacuum environment measurement gauge is associated with the deposition apparatus to measure the vacuum in a space environment proximate to the system.

25. The method of claim 7, comprising utilizing a resistive heat source as the energy source, comprising utilizing a laser as the energy source, comprising utilizing an electron beam as the energy source, and / or comprising utilizing an ion beam as the heat source.

26. The method of claim 7, comprising providing a coating performance characteristic measuring device and measuring the performance characteristics of the functional material.

Images