Method for reducing the concentration of iron ions in trivalent chromium electroplating baths

Abstract

The present invention provides a method for reducing the concentration of iron ions in a trivalent chromium electroplating bath, comprising the steps of: (i) providing a trivalent chromium electroplating bath comprising (a) trivalent chromium ions, and (b) iron ions; (ii) subjecting at least a portion of the trivalent chromium electroplating bath to air agitation to obtain at least an air-agitated portion of the trivalent chromium electroplating bath; (iii) contacting the air-agitated portion of the trivalent chromium electroplating bath with an ion exchange resin to obtain a resin-treated portion of the trivalent chromium electroplating bath; and (iv) returning the resin-treated portion of the trivalent chromium electroplating bath to the trivalent chromium electroplating bath; 2 and applying a cathodic current density of at least 100 mg / L to electrodeposit a chromium layer on at least one substrate, with the proviso that: - after step (iii), the iron ions in the resin-treated portion of the trivalent chromium electroplating bath have a lower concentration than in the air-agitated portion of the trivalent chromium electroplating bath; and - after step (iv), the iron ions in the trivalent chromium electroplating bath have a concentration of less than 50 mg / L, based on the total volume of the trivalent chromium electroplating bath.

Description

[Technical Field]

[0001] The present invention relates to a method for reducing the concentration of iron ions in trivalent chromium electroplating baths. In particular, the trivalent chromium electroplating baths subjected to the method of the present invention allow for the electrolytic deposition of a functional chromium layer, also referred to as a hard chromium layer, on a substrate, particularly an iron-based substrate, and most particularly an iron-based substrate coated with nickel or a nickel alloy. [Background technology]

[0002] Functional chromium layers usually have a much higher average layer thickness, typically at least 1 μm up to several hundred micrometers, compared to decorative chromium layers, which are typically significantly below 1 μm (even below 500 nm), and are characterized by excellent hardness and wear resistance.

[0003] Functional chromium layers obtained from electroplating baths containing hexavalent chromium are known in the art and are a well-established standard.

[0004] Over the last few decades, chromium deposition methods relying on hexavalent chromium have increasingly been replaced by deposition methods relying on trivalent chromium, which are much more health and environmentally friendly.

[0005] WO2015 / 110627A1 refers to an electroplating bath for depositing chromium and a method for depositing chromium on a substrate using said electroplating bath.

[0006] US 2,748,069 relates to a chromium electroplating solution that allows very quickly obtaining a chromium coating with very good physical and mechanical properties. The chromium plating solution can be used in special electrolytic methods, such as those known as spot, plugging, or penciling electroforming. In such special methods, the substrate is typically not immersed in the respective electroplating solution.

[0007] WO2018 / 185154A1 discloses a method for electrolytically depositing a chromium or chromium alloy layer on a substrate.

[0008] EP 0 455 403 B1 discloses a method for regenerating a trivalent chromium bath and further teaches maintaining a desired amount of ferric cations in the bath of 50 ppm to 100 ppm.

[0009] Typically, deposition methods relying on trivalent chromium are used to electrolytically deposit chromium layers onto iron-based substrates, particularly iron-based substrates coated with nickel or nickel alloys, and often equipment parts made from iron and / or containing copper are typically used during the deposition method, for example to hold the substrate.

[0010] Typically, a trivalent chromium electroplating bath is usually used multiple times to deposit chromium layers onto multiple ferrous substrates, thereby increasing process efficiency and allowing for significant cost savings.

[0011] However, it has often been observed that after multiple uses of trivalent chromium electroplating baths with ferrous substrates, particularly those coated with nickel or nickel alloys, and with iron-containing equipment parts, the concentration of iron ions in such trivalent chromium electroplating baths consistently increases. Such an increase in the concentration of iron ions may be due to partial dissolution of the ferrous substrates and / or the respective equipment parts in the trivalent chromium electroplating baths.

[0012] Increased concentrations of iron ions in trivalent chromium electroplating baths often result in undesirable darkening of the substrate and can also significantly impair the process of depositing a chromium layer on a substrate, for example, by changing the quality of the deposited chromium layer, by reducing the hardness of the deposited chromium layer, and / or by inhibiting or at least severely inhibiting the chromium deposition process itself.

[0013] Furthermore, it has also been observed that after multiple uses of such trivalent chromium electroplating baths, in some cases, the concentrations of copper and nickel ions in the trivalent chromium electroplating baths increase, resulting in adverse effects on the chromium deposition process onto the substrate, such as undesirable blackening. [Prior art documents] [Patent documents]

[0014] [Patent Document 1] WO2015 / 110627A1 [Patent Document 2] US2,748,069 [Patent Document 3] WO2018 / 185154A1 [Patent Document 4] EP0455403B1 Summary of the Invention [Problem to be solved by the invention]

[0015] It was therefore an object of the present invention to provide a method for reducing the concentration of contaminating iron ions in trivalent chromium electroplating baths, in particular for electrodepositing chromium layers, in particular functional chromium layers. Advantageously, the concentration of interfering iron ions is reduced together with the concentration of copper and / or nickel ions. Such a method ensures that the respective trivalent chromium electroplating bath can be used for a long time, most preferably over its entire lifespan, without deteriorating the quality of the functional chromium layer (e.g., in terms of hardness and wear resistance). [Means for solving the problem]

[0016] The object of the above is to provide a method for reducing the concentration of iron ions in a trivalent chromium electroplating bath, comprising: (i)(a) trivalent chromium ions, and (b) Iron ions providing a trivalent chromium electroplating bath comprising: (ii) subjecting at least a portion of the trivalent chromium electroplating bath to air agitation to obtain at least an air-agitated portion of the trivalent chromium electroplating bath; (iii) contacting the air-agitated portion of the trivalent chromium electroplating bath with an ion exchange resin to obtain a resin-treated portion of the trivalent chromium electroplating bath; and (iv) returning the resin-treated portion of the trivalent chromium electroplating bath to the trivalent chromium electroplating bath. Including, - the trivalent chromium electroplating bath prepared in step (i) has a current density of 18 A / dm 2 is or is utilized to electrodeposit a chromium layer on at least one substrate by applying a cathodic current density of at least - after step (iii), the iron ions in the resin-treated portion of the trivalent chromium electroplating bath have a lower concentration than in the air-agitated portion of the trivalent chromium electroplating bath; - after step (iv), the iron ions in the trivalent chromium electroplating bath have a concentration of less than 50 mg / L based on the total volume of the trivalent chromium electroplating bath; This is resolved by a method that requires the following:

[0017] By contacting the trivalent chromium electroplating bath with the ion exchange resin (e.g., step (iii) of the method of the present invention), the ion exchange resin binds to cations, particularly iron ions, that have accumulated in the trivalent chromium electroplating bath over time, thereby reducing the concentration of iron ions in the trivalent chromium electroplating bath.

[0018] However, it has been observed that subjecting the trivalent chromium electroplating bath to air agitation (such as step (ii) of the method of the present invention) and then carrying out contact with the iron ion exchange resin can significantly increase the efficiency of reducing the concentration of iron ions in the trivalent chromium electroplating bath.

[0019] As a result, the method of the present invention combines both beneficial steps and synergistically increases the efficiency of reducing the concentration of iron ions, which helps to extend the life of the trivalent chromium electroplating bath and ensure a consistent quality of the electrodeposited chromium layer over time, thus minimizing waste and wastewater, respectively.

[0020] In step (iv), the resin-treated portion of the trivalent chromium electroplating bath is returned to the trivalent chromium electroplating bath, thereby providing a preferably continuous or at least discontinuous (semi-continuous) flow circle, which ensures continuous treatment during the method, and thereby ensures a high quality electroplated chromium layer over time that is well comparable to a freshly installed trivalent chromium electroplating bath.

[0021] In step (i), the trivalent chromium electroplating bath is (c) copper ions and / or (d) Nickel ions further comprising (i.e., in addition to iron ions), - after step (iii), the copper ions and / or nickel ions in the resin-treated portion of the trivalent chromium electroplating bath each have a lower concentration than in the air-agitated portion of the trivalent chromium electroplating bath, preferably the copper ions and / or nickel ions in the resin-treated portion of the trivalent chromium electroplating bath each have a concentration of 50 mg / L or less. The method of the present invention is preferred, provided that:

[0022] Thus, by utilizing the method of the present invention, in addition to reducing the concentration of iron ions in a trivalent chromium electroplating bath, the concentration of nickel and / or copper ions can also be effectively reduced (and thereby maintained at relatively low concentrations).

[0023] Brief description of the table Table 1 outlines the correlation between the concentration of iron ions and the resulting optical appearance of the electrodeposited chromium layer. Further details are provided in the "Examples" section below in this document. DETAILED DESCRIPTION OF THE INVENTION

[0024] In the context of the present invention, the terms "at least one" or "one or more" refer to (and are interchangeable with) "one, two, three or more" and "one, two, three or more than three," respectively. Furthermore, "trivalent chromium" refers to chromium in the +3 oxidation state. The term "trivalent chromium ion" refers to Cr in free or complexed form. 3+ Similarly, "hexavalent chromium" refers to chromium in the +6 oxidation state, and related compounds containing hexavalent chromium ions.

[0025] No hexavalent chromium is intentionally added to the trivalent chromium electroplating bath prepared in step (i) and utilized to electrodeposit or be utilized to electrodeposit a chromium layer on at least one substrate. Thus, the trivalent chromium electroplating bath prepared in step (i) is substantially free or devoid of hexavalent chromium (except for very small amounts that may form on the anode).

[0026] The ion exchange resin utilized in step (iii) has low selectivity for trivalent chromium ions such that the concentration of trivalent chromium ions is not significantly reduced in the resin-treated portion of the trivalent chromium electroplating bath compared to the air-agitated portion of the trivalent chromium electroplating bath. In contrast, the ion exchange resin utilized in step (iii) is substantially selective to exchange iron ions, and preferably is also selective for copper and / or nickel and / or zinc ions.

[0027] The method of the present invention comprises steps (i), (ii), (iii) and (iv), preferably in the order of (i), then (ii), then (iii), then (iv). When the method refers to a closed-loop cycle, after step (iv), step (i) is again carried out, followed by step (ii) again, followed by step (iii) again, followed by step (iv) again. Preferably, the method of the present invention comprises multiple repetitions of steps (i), (ii), (iii) and (iv).

[0028] Preferably, the trivalent chromium electroplating bath is an aqueous trivalent chromium electroplating bath containing trivalent chromium ions and iron ions. In some cases, but less preferably, the trivalent chromium electroplating bath contains a solvent other than water, preferably an organic solvent. Most preferably, water is the only solvent.

[0029] The present invention relies on the discovery that subjecting at least a portion of the trivalent chromium electroplating bath to air agitation and then contacting the air-agitated portion of the trivalent chromium electroplating bath with an ion exchange resin, which then at least partially removes iron ions from the air-agitated portion of the trivalent chromium electroplating bath, thereby reducing the concentration of iron ions in the trivalent chromium electroplating bath.

[0030] The trivalent chromium electroplating bath is preferably used more than once, preferably in a continuous process, preferably to deposit chromium layers on a plurality of different substrates. Preferably, the trivalent chromium electroplating bath is repeatedly utilized during electroplating, preferably for utilization of at least 100 Ah per liter of trivalent chromium electroplating bath, preferably at least 150 Ah per liter, more preferably at least 200 Ah per liter, and most preferably at least 300 Ah per liter.

[0031] Because trivalent chromium electroplating baths are preferably used to deposit chromium layers on multiple substrates, particularly ferrous substrates, iron ions from the substrates, particularly from ferrous substrates, may dissolve from the substrates and accumulate in the trivalent chromium electroplating bath over time, thereby constantly increasing the concentration of iron ions in the trivalent chromium electroplating bath. By reducing the concentration of iron ions in the trivalent chromium electroplating bath by practicing the method of the present invention, the dissolution of iron ions from the substrates can be balanced during electroplating, thereby maintaining the concentration of iron ions in the trivalent chromium electroplating bath below an acceptable limit.

[0032] The method of the present invention allows for maintaining a high quality chromium layer comparable to that of a freshly installed trivalent chromium electroplating bath.

[0033] A further important finding was that the efficiency of iron ion removal by ion exchange resins can be significantly increased when air agitation is utilized.

[0034] Preferably, the air-agitated portion of the trivalent chromium electroplating bath after air agitation is immediately contacted with the ion exchange resin. Preferably, after air agitation, the air-agitated portion of the trivalent chromium electroplating bath is transferred to the ion exchange resin without interruption or delay. This ensures that a large amount of oxygen is present in the air-agitated portion of the trivalent chromium electroplating bath, particularly before contacting the air-agitated portion of the trivalent chromium electroplating bath with the ion exchange resin, thereby increasing the iron ion removal efficiency. Preferably, in step (ii), the trivalent chromium electroplating bath is subjected to air agitation for at least 5 minutes.

[0035] Another important finding of the present invention is that 2 The use of high current electroplating processes with these cathodic current densities resulted in a substantial reduction in the concentration of iron ions in the trivalent chromium electroplating bath.

[0036] The specific concentration of iron ions in trivalent chromium electroplating baths is typically 15 A / dm 2 This is controllable (and may even be desirable for decorative applications) when using low current electroplating processes with cathode current densities of 18 A / dm 2 This is not the case with the above-mentioned high-current electroplating processes with cathode current densities of 0.1 to 1.5, in which the relatively high iron ion concentrations in the trivalent chromium electroplating baths can cause iron to be incorporated into the deposited chromium layer during electroplating, thereby impairing the corrosion resistance at the corresponding locations and further resulting in undesirable blackening of the deposited chromium layer.

[0037] Therefore, such high current electroplating process, i.e. 18A / dm 2 When using these cathodic current densities, it is essential to maintain the iron ion concentration in the trivalent chromium electroplating bath below the 50 mg / L limit.

[0038] Corresponding to the terminology used in the method of the present invention, preferably before step (i), - 18A / dm 2 Electrodepositing a chromium layer onto at least one substrate by applying a cathodic current density of at least Preferably, the method of the present invention comprises:

[0039] This is a preferred corresponding wording of the first condition defined above in the context of the present invention, and can preferably replace the first condition. Preferably, iron ions accumulate in the trivalent chromium electroplating bath during electroplating. Preferably, after an undesired amount of iron ions is reached, the electroplating bath is subjected to steps (i) to (iv) of the method of the present invention.

[0040] The method of the present invention is preferred, wherein in step (i), the iron ions in the trivalent chromium electroplating bath have a concentration of 40 mg / L or less, preferably 30 mg / L or less, more preferably 20 mg / L or less, even more preferably 15 mg / L or less, and most preferably 11 mg / L or less, based on the total volume of the trivalent chromium electroplating bath.

[0041] Preferred is the method of the present invention, wherein after step (iv), the iron ions in the trivalent chromium electroplating bath have a concentration of 35 mg / L or less, preferably 25 mg / L or less, more preferably 18 mg / L or less, even more preferably 13 mg / L or less, and most preferably 10 mg / L or less, based on the total volume of the trivalent chromium electroplating bath.

[0042] The method of the present invention is preferred wherein the iron ions in the trivalent chromium electroplating bath in step (i) have a concentration of greater than 40 mg / L and the iron ions in the trivalent chromium electroplating bath after step (iv) have a concentration of 40 mg / L or less, preferably the iron ions in the trivalent chromium electroplating bath in step (i) have a concentration of greater than 30 mg / L and the iron ions in the trivalent chromium electroplating bath after step (iv) have a concentration of 30 mg / L or less, and more preferably the iron ions in the trivalent chromium electroplating bath in step (i) have a concentration of greater than 20 mg / L and the iron ions in the trivalent chromium electroplating bath after step (iv) have a concentration of 20 mg / L or less, each based on the total volume of the trivalent chromium electroplating bath.

[0043] The method of the present invention is preferred, wherein the iron ions in the trivalent chromium electroplating bath in step (i) have a concentration of more than 10 mg / L, and the iron ions in the trivalent chromium electroplating bath after step (iv) have a concentration of 10 mg / L or less, each based on the total volume of the trivalent chromium electroplating bath.

[0044] The method of the present invention is preferred, wherein in step (iii), the iron ions in the resin-treated portion of the trivalent chromium electroplating bath have a concentration of 9 mg / L or less, preferably 8 mg / L or less, more preferably 7 mg / L or less, even more preferably 6 mg / L or less, still more preferably 5 mg / L or less, and most preferably 4 mg / L or less, based on the total volume of the resin-treated portion of the trivalent chromium electroplating bath.

[0045] By reducing the concentration of iron ions in the trivalent chromium electroplating bath in step (iii) to a concentration of less than 50 mg / L, particularly to a concentration of 35 mg / L or less, 25 mg / L or less, 18 mg / L or less, 13 mg / L or less, 10 mg / L or less, or even less than 10 mg / L, the quality of the trivalent chromium electroplating bath is typically maintained, allowing for the deposition of a high quality chromium layer on a substrate that is comparable to that obtained from a freshly installed trivalent chromium electroplating bath.

[0046] In particular, the high iron ion removal efficiency of the ion exchange resin can be maintained both when the initial iron ion concentration, i.e., in step (i), the iron ion concentration in the trivalent chromium electroplating is higher than 40 mg / L (including concentrations much higher than 40 mg / L), and when the initial iron ion concentration, i.e., in step (i), the iron ion concentration in the trivalent chromium electroplating is 40 mg / L or less, 30 mg / L or less, 20 mg / L or less, preferably 15 mg / L or less, or even 11 mg / L.

[0047] In step (i), the trivalent chromium electroplating bath is (c) copper ions and / or (d) Nickel ions Further comprising: - after step (iii), the copper ions and / or nickel ions in the resin-treated portion of the trivalent chromium electroplating bath have a lower concentration than in the air-agitated portion of the trivalent chromium electroplating bath, respectively; The method of the present invention is preferred, provided that:

[0048] Due to the advantageous cation binding properties of the ion exchange resin, the ion exchange resin can not only remove iron ions from the trivalent chromium electroplating bath in step (iii), but also copper ions and / or nickel ions.

[0049] Therefore, the method of the present invention is preferred in which the ion exchange resin has an affinity for iron ions and trivalent chromium ions, and the affinity for iron ions is higher than the affinity for trivalent chromium ions.The method of the present invention is more preferred in which the ion exchange resin has an affinity for iron ions, copper ions, nickel ions, and trivalent chromium ions, and the affinity for iron ions, copper ions, and nickel ions is higher than the affinity for trivalent chromium ions.

[0050] During electroplating, equipment parts are typically used which may dissolve to a certain extent from said equipment parts, and therefore the concentration of copper ions in the trivalent chromium electroplating baths may also increase over time, similar to the concentration of iron ions in the trivalent chromium electroplating baths.

[0051] Furthermore, because trivalent chromium electroplating is typically used to deposit a chromium layer on a nickel or nickel alloy coated substrate during electroplating, nickel may also be dissolved from the nickel or nickel alloy coated substrate, and therefore the concentration of nickel ions in the trivalent chromium electroplating bath may also increase over time, similar to the concentration of iron ions and / or copper ions in the trivalent chromium electroplating bath.

[0052] When such trivalent chromium electroplating baths are used during electroplating, the relatively high concentrations of copper and / or nickel ions can in some cases adversely affect the electrodeposition of the chromium layer. Therefore, it would also be beneficial to reduce the concentrations of copper and / or nickel ions in the trivalent chromium electroplating bath to enable the deposition of a high-quality chromium layer on the substrate.

[0053] - after step (iv), the copper ions in the trivalent chromium electroplating bath have a concentration of 50 mg / L or less, preferably 40 mg / L or less, more preferably 30 mg / L or less, even more preferably 20 mg / L or less, and even more preferably 10 mg / L or less, and most preferably 5 mg / L or less, based on the total volume of the trivalent chromium electroplating bath. The method of the present invention is preferred, provided that:

[0054] Preferred is the method of the present invention, wherein in step (i) the copper ions in the trivalent chromium electroplating bath have a concentration greater than 10 mg / L, and after step (iv) the copper ions in the trivalent chromium electroplating bath have a concentration of 10 mg / L or less.

[0055] - after step (iv), the nickel ions in the trivalent chromium electroplating bath have a concentration of 50 mg / L or less, preferably 40 mg / L or less, more preferably 30 mg / L or less, even more preferably 20 mg / L or less, and most preferably 10 mg / L or less, based on the total volume of the trivalent chromium electroplating bath; The method of the present invention is preferred, provided that:

[0056] Preferred is the method of the present invention, wherein in step (i) the nickel ions in the trivalent chromium electroplating bath have a concentration greater than 20 mg / L, and after step (iv) the nickel ions in the trivalent chromium electroplating bath have a concentration of 20 mg / L or less.

[0057] - the trivalent chromium electroplating bath prepared in step (i) has a current density of 20 A / dm 2 More than 24A / dm, preferably 2 More than 28A / dm is preferable. 2 More than 32A / dm, even more preferably 2 More than 36A / dm 2 or more, and even more preferably 39 A / dm 2 Above 42A / dm, most preferably 2 and is used to electrodeposit a chromium layer on at least one substrate by applying a cathodic current density of at least The method of the present invention is preferred, provided that:

[0058] The word "for" in the phrase "is or is utilized to electrodeposit a chromium layer" is preferably interpreted as "in," and may therefore be read as "is or is utilized in electrodepositing a chromium layer." In either case, in the context of the present invention, electrodeposition is or has been performed, and the specified current density is or has been actually applied to the electroplating bath. This applies generally to the method of the present invention.

[0059] Preferably, the trivalent chromium electroplating bath prepared in step (i) has been or is used for electrodeposition by applying direct current (DC).

[0060] Preferably, the direct current (DC) is a direct current without interruptions, more preferably the direct current is not pulsed (non-pulsed DC). Furthermore, the direct current preferably does not include reverse pulses.

[0061] - the trivalent chromium electroplating bath prepared in step (i) has a current density of 18 A / dm 2~75A / dm 2 , preferably 24A / dm 2 ~71A / dm 2 , more preferably 28A / dm 2 ~68A / dm 2 , and even more preferably 32 A / dm 2 ~65A / dm 2 , and even more preferably 36 A / dm 2 ~61A / dm 2 , or even more preferably 39 A / dm 2 ~58A / dm 2 , most preferably 42 A / dm 2 ~55A / dm 2 and applying a cathodic current density in the range of The method of the present invention is preferred, provided that:

[0062] Preferred is a method of the present invention, wherein the chromium layer has a thickness of 0.5 μm or more, preferably 0.75 μm or more, more preferably 0.9 μm or more, even more preferably 1.0 μm or more, still even more preferably 1.5 μm or more, and most preferably 2.0 μm or more.

[0063] In some cases, the method of the present invention is preferred, wherein the chromium layer has a thickness in the range of 1.1 μm to 500 μm, preferably 2 μm to 450 μm, more preferably 4 μm to 400 μm, even more preferably 6 μm to 350 μm, still even more preferably 8 μm to 300 μm, and most preferably 10 μm to 250 μm.

[0064] In some further cases, the method of the invention is preferred, wherein the chromium layer has a thickness of 15 μm or more, preferably 20 μm or more.

[0065] As already mentioned above, when depositing a chromium layer during electroplating, it is preferable to obtain a chromium layer with excellent functional characteristics, which is often referred to as a hard chromium layer, and preferably not a decorative chromium layer.

[0066] Preferably, 18A / dm 2 A trivalent chromium electroplating bath utilized to electrodeposit a chromium layer on at least one substrate by applying a cathode current density equal to or greater than (preferably using the cathode current densities described above) is utilized / located in the electroplating section.

[0067] The process of the present invention is preferred, wherein the trivalent chromium electroplating bath is located in the electroplating section and steps (ii) and / or (iii) are carried out in a treatment section that is separate from but fluidly connected to the electroplating section.

[0068] Therefore, the method of the present invention is preferably utilized in a processing section that is preferably separate from the electroplating section, most preferably the electroplating section being a plating bath.

[0069] The method of the present invention is preferred in which the electroplating section and the treatment section are fluidly connected to each other by one or more conduits.

[0070] The process of the present invention, wherein steps (i), (ii), (iii) and (iv) are carried out continuously or discontinuously, is preferred.

[0071] In some cases, it is preferred that the method of the present invention is carried out continuously, and even more preferably in a closed loop, which preferably generally means that the preparation of the trivalent chromium electroplating bath in step (i) is followed by the air agitation carried out in step (ii), which is then followed by the resin treatment carried out in step (iii), which is then followed by returning the resin-treated portion of the trivalent chromium electroplating bath defined in step (iv), where step (iv) is followed by step (i) again, which is then followed by steps (ii), (iii), and (iv), respectively, and so on.

[0072] Such continuous implementation of steps (i), (ii), (iii) and (iv), preferably in a closed loop, allows for very efficient control of the concentration of iron ions, preferably also copper and / or nickel ions.

[0073] However, in other cases, it is preferable that this sequence be temporarily shut off, most preferably after step (iv), and be carried out discontinuously or semi-continuously. This is particularly true when the iron ions have a concentration that rises slowly and reaches the critical concentration only after a relatively long time. Under such circumstances, the method of the present invention is preferably carried out temporarily, more preferably repeatedly, until the iron ions reach the desired concentration in the trivalent chromium electroplating bath (preferably less than 10 mg / L). Thereafter, the method of the present invention is shut off / stopped until the iron ions reach the critical concentration again. In this way, resources and energy are better conserved.

[0074] Preferably, in step (i) of the method of the present invention, at least a portion of the trivalent chromium electroplating bath is prepared in a first compartment of the treatment section, preferably an overflow compartment. In this first compartment, a portion of the trivalent chromium electroplating bath is preferably subjected to air agitation, preferably for a period of time specified throughout the document, thereby obtaining an air-agitated portion of the trivalent chromium electroplating bath (step (ii)). In a second compartment of the treatment section, step (iii) of the method of the present invention is preferably carried out. Preferably, the second compartment is a column packed with an ion exchange resin, and a portion of the trivalent chromium electroplating bath is contacted with the ion exchange resin at a flow rate, preferably a constant flow rate. After step (iii) is carried out, a resin-treated portion of the trivalent chromium electroplating bath is obtained, which is returned as defined in step (iv) of the method of the present invention. Most preferably, a portion of the trivalent chromium electroplating bath is pumped from the first compartment to the second compartment by at least one pump and returned to the trivalent chromium electroplating bath. At this point, the method of the present invention can be carried out continuously or discontinuously (as described above). In each case, this allows the electrodeposition of the chromium layer onto at least one substrate in the electroplating section to occur continuously, i.e., without interrupting the electrodeposition. In other words, the method of the present invention is carried out simultaneously, i.e., while the electrodeposition is also occurring. However, in some cases, it is preferred that the electrodeposition in the electroplating section is interrupted while the method of the present invention is carried out, but the method of the present invention is carried out in the treatment section.

[0075] Therefore, in step (iii), the method of the present invention is preferred, wherein the ion exchange resin is provided in an ion exchange column through which the air-agitated portion of the trivalent chromium electroplating bath passes. The ion exchange column defines an enclosed space for the ion exchange resin so that the exchange, regeneration and / or modification can be carried out independently from the electroplating section and / or the first compartment of the treatment section.

[0076] In some cases, the method of the present invention is preferably carried out in the electroplating section. Under such circumstances, the electroplating of the chromium layer is preferably shut off and temporarily suspended. A trivalent chromium electroplating bath is prepared in the electroplating section (step (i)). Further, a step of subjecting the bath to air agitation (step (ii)) is carried out in the electroplating section. Step (iii) is carried out in the electroplating section by adding an ion exchange resin for a specified period of time. Thereafter, the resin is removed (or alternatively, the trivalent chromium electroplating bath is transferred to another plating tank), which means that the resin-treated trivalent chromium electroplating bath is essentially returned to the trivalent chromium electroplating bath. However, such a batch approach is less preferred because removing the ion exchange resin is technically difficult and, in many cases, it is not possible to completely separate the resin from the resin-treated trivalent chromium electroplating bath.

[0077] In some cases, it is preferred in the process of the present invention that the ion exchange resin is provided as a bed through which the air-agitated portion of the trivalent chromium electroplating bath passes. Such a bed allows for an increased contact area between the air-agitated portion of the trivalent chromium electroplating bath and the ion exchange resin.

[0078] the trivalent chromium electroplating bath prepared in step (i) is utilized for said electrodeposition while steps (ii), (iii), and (iv) are carried out; or The trivalent chromium electroplating bath prepared in step (i) is the same as that used for the electrodeposition prior to steps (ii), (iii), and (iv). The method of the present invention is preferred.

[0079] This means that in some cases, the method of the present invention is preferably preferred, in which a trivalent chromium electroplating bath is used in parallel with the electroplating, e.g., at the same time that the method of the present invention is carried out.

[0080] However, in some other cases, it is preferred that the respective trivalent chromium electroplating bath is not used any further until electroplating has already been completed and the method of the present invention is performed, which preferably even includes transferring the electroplating bath to perform the method of the present invention.

[0081] After the method of the present invention is carried out, it is preferred that the electrodeposition be continued. 2 Preferably, the method of the present invention applies a cathodic current density equal to or greater than 1000 kJ / cm (preferably a cathodic current density defined as preferred throughout this document) and is utilized to electrodeposit a chromium layer onto at least one substrate (preferably a plurality of substrates), which is then prepared in a further step (i), preferably in step (i) of a second or more sequences of the method of the present invention.

[0082] Typically, after a certain length of time, the ion exchange resin becomes saturated with ions, thereby beginning to reduce the affinity of the ion exchange resin. Therefore, preferably after repeated runs of the method of the present invention, the ion exchange resin is preferably cleaned and regenerated. This means that (a) the iron ions, and preferably also the nickel and copper ions, are stripped from the resin, and (b) the ion exchange resin is reconditioned so that it can be preferably utilized in a further sequence of the method of the present invention.

[0083] (v) contacting the ion exchange resin with an acidic and / or alkaline regeneration solution after step (iii), preferably by periodically contacting the ion exchange resin with an acidic regeneration solution during the regeneration interval and subsequently contacting the ion exchange resin with an alkaline regeneration solution after the regeneration interval. Preferably, the method of the present invention further comprises:

[0084] In step (v), the ion exchange resin is contacted with an acidic and / or alkaline regenerating solution to strip the bound ions from the ion exchange resin.

[0085] Preferably, in step (v), the ion exchange resin is contacted with the acidic regeneration solution more frequently than with the alkaline regeneration solution, and in the few cases, the ion exchange resin is preferably contacted only with the acidic regeneration solution.

[0086] More preferably, step (v) is carried out after step (iii) by contacting the ion exchange resin with an acidic regeneration solution and an alkaline regeneration solution. Most preferably, step (v) is carried out after step (iii) by contacting the ion exchange resin with an acidic regeneration solution a first time and then with an alkaline regeneration solution a second time, the first time being greater than the second time. Alternatively, less preferably, contact with the alkaline regeneration solution is carried out before contact with the acidic regeneration solution.

[0087] The process of the present invention is preferred wherein the ion exchange resin comprises one or more cation exchange resins. Preferably, the one or more cation exchange resins are utilised in hydrogen-loaded form in step (iii) of the process of the present invention.

[0088] The process of the present invention is preferred in which the ion exchange resin comprises a polystyrene polymer. Cation exchange resins, preferably resins comprising a polystyrene polymer, typically provide a high affinity for iron ions, and preferably also for copper and / or nickel ions.

[0089] The process of the present invention is preferred in which the ion exchange resin is macroporous.

[0090] Preferably, the one or more cation exchange resins comprise two or more different cation exchange resins which are differently selective for various cations, preferably iron ions, nickel ions and copper ions.

[0091] In some cases, it is preferred that the two or more cation exchange resins form at least a double bed.

[0092] The process of the present invention is preferred, wherein the ion exchange resin (preferably as described above as preferred) comprises acidic functional groups, which preferably comprise one or more groups selected from carboxyl groups, phosphonic acid groups and sulfonic acid groups.

[0093] In some cases, ion exchange resins containing phosphonic acid groups and sulfonic acid groups are highly preferred, with the ion exchange resin Purolite S-957 being most preferred. Ion exchange resins in which the phosphonic acid groups contain aminophosphonic acid groups are preferred.

[0094] In other cases, ion exchange resins containing carboxylic acid groups, more preferably containing acetate groups, and most preferably containing iminodiacetic acid groups are highly preferred, the most preferred ion exchange resins being Lewatit TP 207 and / or Purolite S-930.

[0095] By utilizing the preferred ion exchange resins described above, step (iii) of the method of the present invention is carried out very well.

[0096] Preferably, the electroplating section includes at least one anode independently selected from the group consisting of graphite anodes and mixed metal oxide anodes (MMO), preferably selected from the group consisting of graphite anodes and mixed metal oxide anodes on titanium. Such anodes have been shown to be sufficiently resistant in the electroplating baths utilized. Preferably, the at least one anode is free of lead and chromium.

[0097] The electrodeposited chromium layer is preferably a chromium alloy layer containing alloying elements. Preferred alloying elements are carbon, nitrogen, and oxygen, preferably carbon and oxygen. Carbon is typically present in the chromium layer due to organic compounds commonly present in trivalent chromium electroplating baths. Preferably, the chromium layer does not contain one or more or all elements selected from the group consisting of sulfur, nickel, copper, aluminum, tin, and iron. More preferably, the only alloying elements are carbon, nitrogen, and / or oxygen, more preferably carbon and / or oxygen, and most preferably carbon and oxygen. Preferably, the chromium layer contains 90 weight percent or more, more preferably 95 weight percent or more, of chromium based on the total weight of the chromium layer.

[0098] In step (i), the method of the present invention is preferred in which the trivalent chromium electroplating bath is essentially free of or free of boric acid, preferably essentially free of or free of boron-containing compounds. Boron-containing compounds are undesirable due to environmental concerns. When boron-containing compounds (including boric acid) are contained, wastewater treatment is expensive and time-consuming. Furthermore, boric acid typically exhibits low solubility and thus tends to form precipitates. Such precipitates can be solubilized by heating, but during this time the respective trivalent chromium electroplating bath cannot be utilized for electroplating. There is a significant risk that such precipitates will promote a reduction in the quality of the chromium layer.

[0099] In step (i), the method of the present invention is preferred in which the trivalent chromium electroplating bath is essentially free of or free of organic compounds containing divalent sulfur, preferably essentially free of or free of sulfur-containing compounds having sulfur atoms with an oxidation state of less than +6. 2 When sulfur is incorporated into the chromium layer at cathodic current densities above 1000 kJ / L, undesirable discoloration is observed. However, this does not exclude sulfate ions. Preferably, the trivalent chromium electroplating bath contains a total amount of sulfate ions, preferably in the range of 50 g / L to 250 g / L, in some cases based on the total volume of the trivalent chromium electroplating bath.

[0100] The elimination of divalent sulfur-containing organic compounds from trivalent chromium electroplating baths is particularly beneficial when the trivalent chromium electroplating baths are utilized to deposit hard, functional chromium layers.

[0101] The term "free" indicates that the respective compound and / or material is not intentionally added to, for example, a trivalent chromium electroplating bath. This does not exclude such compounds from being introduced as impurities of other chemicals. However, typically, the total amount of such compounds and materials is below the detection range and therefore not significant during the method of the present invention.

[0102] In step (i), the trivalent chromium electroplating bath is one or more halide ions, preferably bromide ions, one or more alkali metal cations, preferably sodium and / or potassium, one or more organic complexing compounds, preferably aliphatic monocarboxylic organic acids and / or salts thereof, - sulfate ions, and - Ammonium ion Preferred are methods of the present invention further comprising one or more compounds selected from the group consisting of:

[0103] Preferably, in step (i), the trivalent chromium electroplating bath comprises one or more types of halide ions, preferably bromide ions, in a concentration of at least 0.06 mol / L, more preferably at least 0.1 mol / L, and even more preferably at least 0.15 mol / L, based on the total volume of the trivalent chromium electroplating bath. In particular, bromide anions effectively suppress the formation of hexavalent chromium species at the at least one anode.

[0104] Preferably, in step (i), the trivalent chromium electroplating bath contains one or more alkali metal cations, preferably sodium and / or potassium, in a total concentration ranging from 0 mol / L to 0.5 mol / L, more preferably from 0 mol / L to 0.3 mol / L, even more preferably from 0 mol / L to 0.1 mol / L, and most preferably from 0 mol / L to 0.08 mol / L, based on the total volume of the trivalent chromium electroplating bath. Typically, rubidium, francium, and cesium ions are not utilized in trivalent chromium electroplating baths. Thus, in most cases, the total amount of alkali metal cations includes metal cations of lithium, sodium, and potassium, most preferably sodium and / or potassium.

[0105] The trivalent chromium electroplating bath preferably further comprises one or more organic complexing compounds for complexing the trivalent chromium ions. Preferably, the one or more organic complexing compounds (and preferred variants thereof) have 1 to 10 carbon atoms, preferably 1 to 5 carbon atoms, and even more preferably 1 to 3 carbon atoms. The complexing compounds form complexes primarily with the trivalent chromium ions in the trivalent chromium electroplating bath, enhancing the stability of the bath. Preferably, the trivalent chromium ions and the one or more organic complexing compounds form a molar ratio in the range of 1:0.5 to 1:10.

[0106] The ammonium ions are preferably provided exclusively by NH4OH and / or NH3.

[0107] Preferred is the process of the present invention, wherein the trivalent chromium electroplating bath utilized to electrodeposit a chromium layer on at least one substrate (and preferably further provided in step (i) of the process of the present invention) has a pH in the range of 4.1 to 7.0, preferably 4.6 to 6.8, more preferably 5.1 to 6.5, even more preferably 5.2 to 6.2, still even more preferably 5.3 to 6.0, and most preferably 5.4 to 5.9.

[0108] The method of the present invention is preferred, wherein in step (i), the trivalent chromium electroplating bath contains trivalent chromium ions at a concentration in the range of 10 g / L to 30 g / L, preferably 14 g / L to 27 g / L, and more preferably 17 g / L to 24 g / L, based on the total volume of the trivalent chromium electroplating bath.

[0109] In the preferred method of the present invention, in step (i), the trivalent chromium ions in the trivalent chromium electroplating bath are obtained from a source containing soluble trivalent chromium ions, typically a water-soluble salt containing said trivalent chromium ions. Preferably, the source containing soluble trivalent chromium ions comprises or is chromium sulfate, more preferably acid chromium sulfate, even more preferably chromium sulfate having the general formula Cr(SO) and a molecular weight of 392 g / mol. In other cases, a source containing soluble trivalent chromium ions is preferred, wherein the source contains an organic anion, preferably an organic carboxylate anion, most preferably an aliphatic monocarboxylate anion, preferably having 10 or fewer carbon atoms (preferably 5 or fewer carbon atoms), as a counterion to the trivalent chromium ions.

[0110] When the total amount of trivalent chromium ions is significantly below 10 g / L, insufficient deposition of the chromium layer is often observed, and the deposited chromium layer is usually of poor quality. When the total amount is significantly above 30 g / L, the electroplating bath is often no longer stable, including the formation of undesirable precipitates.

[0111] In a preferred method of the present invention, the trivalent chromium electroplating bath utilized to electrodeposit a chromium layer on at least one substrate has a temperature ranging from 20°C to 90°C, preferably 30°C to 70°C, more preferably 40°C to 60°C, and most preferably 45°C to 60°C. Within the preferred temperature range, optimal electrodeposition can be achieved. If the temperature significantly exceeds 90°C, undesirable evaporation can occur, which can adversely affect the concentration of bath components. Furthermore, undesirable anodic formation of hexavalent chromium is significantly less suppressed. If the temperature is significantly below 20°C, deposition is often insufficient.

[0112] Preferred is the process of the present invention, wherein at least one substrate comprises a metal or metal alloy, preferably comprises one or more metals selected from the group consisting of copper, iron, nickel and aluminium, more preferably comprises one or more metals selected from the group consisting of copper, iron and nickel, most preferably comprises at least iron.

[0113] The method of the present invention is preferred in which at least one substrate comprises iron, preferably exposed iron on at least one surface of said substrate. However, substrates, particularly those comprising exposed iron on at least one surface, exhibit a tendency for iron ions to dissolve in the trivalent chromium electroplating bath and begin to accumulate over time.

[0114] Preferred is the method of the present invention, wherein in step (i) the source of iron ions is at least one substrate and / or means for positioning at least one substrate in the electroplating section.

[0115] The method of the present invention is preferred in which a chromium layer is electrodeposited on the surface of said at least one substrate, the surface comprising nickel or a nickel alloy (a substrate coated with nickel or a nickel alloy, preferably an iron-based substrate coated with nickel or a nickel alloy). However, under such circumstances, such substrates exhibit a particular tendency for nickel ions to dissolve in the trivalent chromium electroplating bath and begin to accumulate over time.

[0116] The coated substrate is preferably a substrate coated with a semi-bright nickel coating. A steel substrate coated with a nickel or nickel alloy layer, preferably a semi-bright coating, is particularly preferred. However, preferably, other coatings are present alternatively or additionally. In many cases, such coatings significantly increase corrosion resistance compared to a metal substrate without such a coating. However, in some cases, at least one substrate is less susceptible to corrosion due to a corrosion-inert environment (e.g., in an oil bath). In such cases, a coating, preferably a nickel or nickel alloy layer, is not necessarily required.

[0117] The method of the present invention is preferred in which step (ii) is carried out for at least 5 minutes, more preferably 10 minutes, even more preferably 15 minutes, and most preferably 20 minutes. Independent experiments have shown that periods (significantly) less than 5 minutes often do not significantly improve step (iii) of the method of the present invention. However, using a period of at least 5 minutes in step (ii) provides sufficient efficiency in step (iii).

[0118] Preferred is a method of the invention in which step (ii) is carried out for a maximum of 120 minutes or less, preferably 100 minutes or less, more preferably 70 minutes or less, even more preferably 50 minutes or less, and most preferably 40 minutes or less. Independent experiments have shown that further extending the duration of step (iii) does not result in any additional efficiency.

[0119] The air agitation defined in step (ii) of the method of the present invention is preferably a strong blowing of ambient air, i.e. strong air agitation, which is preferably stronger than the gentle air agitation conventionally used, in order to achieve constant bath movement during electroplating.

[0120] The invention will now be described in more detail by the following non-limiting examples. [Example]

[0121] 1. Preparation of trivalent chromium electroplating bath: Test trivalent chromium electroplating baths (A) (volume 1 L) and (B) (volume 500 L) were prepared, each containing 10 g / L to 30 g / L of trivalent chromium ion (source: basic chromium sulfate), 50 g / L to 250 g / L of sulfate ion, at least one organic complexing compound (aliphatic monocarboxylic organic acid), ammonium ion, and bromide ion. The electroplating baths did not contain boric acid, boron-containing compounds, or organic compounds containing divalent sulfur. The pH ranged from 5.4 to 5.9.

[0122] The initial concentrations of iron ions before steps (ii) and (iii) of the method of the present invention were as follows for each test bath: (A) 100 mg / L, (B) 20 mg / L.

[0123] Prior to steps (ii) and (iii), each test trivalent chromium electroplating bath was utilized, and the plating was conducted at 50°C and 40 A / dm 2 A cathodic current density of 0.015 μm was applied to electrodeposit chromium layers on mild steel rod substrates with diameters of 10 mm to 30 mm, where electrodeposition was carried out for 15 minutes in test bath (A) and for at least 120 minutes in test bath (B). In each case, the electrodeposited chromium layer had a thickness of at least 1 μm, and in most cases at least 5 μm. After electrodeposition, the substrates were visually inspected and rated.

[0124] After electrodeposition, the test bath (A) was subjected to vigorous air agitation (with ambient air) of step (ii) for the following lengths of time: 1 minute (A-1), 5 minutes (A-5), 15 minutes (A-15), 30 minutes (A-30), 60 minutes (A-60), and 180 minutes (A-180), to obtain individual air-agitated test trivalent chromium electroplating baths (A-1), (A-5), etc.

[0125] In comparative test bath (Ac0), no air agitation was applied after step (i) and step (iii) was immediately carried out (i.e., after 0 hours). In the further comparative test baths, each bath was left with agitation after step (i) for a specified time (3 hours, 6 hours, and 12 hours) before step (iii) was carried out. Thus, step (ii) was not carried out in each comparative test bath. Thus, the following corresponding further comparative test baths were obtained: (Ac3), (Ac6), and (Ac12).

[0126] The test bath (B) was subjected to strong air agitation with ambient air for 15 minutes in step (ii) to obtain the respective air-agitated test bath (B-15). The comparative test bath was not subjected to air agitation, and step (iii) was carried out immediately after step (i) (i.e., after 0 hours of standing), to obtain the comparative test bath (Bc0).

[0127] In step (iii) of the method of the present invention, the test baths (A-1), (A-5), (A-15), (A-30), (A-60), (A-180), (Ac0), (Ac3), (Ac6), (Ac12), (Bc0) and (B-15) were contacted with an ion exchange resin (Lewatit TP207, Lanxess, macroporous, iminodiacetic acid functional group, bead size: 0.4-1.25 mm) to obtain the respective resin-treated test baths.

[0128] Test baths (A), i.e., (A-1), (A-5), etc., were contacted with the resin by adding 40 ml of resin to each of the test baths and gently agitating for 60 minutes, after which the resin was allowed to settle and the supernatant was decanted and analyzed for iron ion concentration.

[0129] Test bath (B), i.e., (B-15) and (Bc0), was contacted with the resin by pumping the test bath through a column containing 25 L of resin at a flow rate of approximately 175 L / hour for 9 hours, and then returned to the test bath, after which the iron ion concentration was determined.

[0130] The results are summarized in Table 1.

[0131] [Table 1]

[0132] The experimental results clearly demonstrate that the method of the present invention can significantly reduce the iron ion concentration, particularly to below 10 mg / L. Example (Ac0) demonstrates that step (ii) substantially increases the efficiency of reducing the iron ion concentration to obtain acceptable electrodeposition results. Examples (A-1) and (A-5), which are essentially comparative examples, demonstrate that 50 mg / L is the acceptable limit. Therefore, step (ii) is performed for a sufficient time to at least reduce the acceptable limit. Above 50 mg / L, completely unacceptable electrodeposition results are typically obtained. Although slightly below 50 mg / L (Example (A-5)), electrodeposition results improve, undesirable discoloration is frequently observed. Examples (A-15) through (A-180) clearly demonstrate that excellent electrodeposition results are obtained when the iron ion concentration is less than 10 mg / L. When iron ion contamination is present in each trivalent chromium electroplating bath, 10 mg / L appears to be the acceptable limit. This is confirmed in the test baths (B), especially (B-15). The deposits from (Bc0) are slightly better than (B), but in a few cases slight discoloration is observed with (Bc0). Such discoloration is no longer observed with (B-15).

[0133] In additional test runs (data not shown), the removal of nickel and copper ions was investigated. The concentrations of nickel and copper ions were significantly reduced in these test runs (Cu: 20 mg / L to less than 10 mg / L, Ni: 43 mg / L to less than 20 mg / L, and even less than 10 mg / L).

[0134] In further test experiments, alternative resins were tested, including (i) S-950, Purolite, macroporous, aminophosphonic acid functional group, bead size: approximately 1.2 mm; (ii) S-957, Purolite, macroporous, phosphonic acid and sulfonic acid functional group, bead size: approximately 0.55-0.75 mm; and (iii) S-930, Purolite, macroporous, iminodiacetic acid functional group, bead size: approximately 0.6 mm-0.85 mm. Similar results were obtained with the alternative resins for iron ion removal, as well as nickel and copper ion removal (data not shown).

[0135] 2. Ion exchange resin cleaning / regeneration: After Example (B-0), it was necessary to clean and regenerate the ion exchange resin by repeatedly contacting the resin with a series of acidic (HCl) and alkaline (NaOH) solutions. This was an intense cleaning / regeneration that is typically not immediately required when step (ii) of the method of the present invention is performed for the first time. For example, after Example (B-15), the ion exchange resin was reused for at least a second step (ii) before cleaning with an acidic solution (HCl). The cleaned resin was then reused. This was repeated multiple times, after which a series of alkaline solutions (NaOH) followed by an acidic solution (HCl) was required. Thus, the method of the present invention (i.e., step (ii)) has a positive effect on the cleaning / regeneration of ion exchange resins.

Claims

1. 1. A method for reducing the concentration of iron ions in a trivalent chromium electroplating bath, comprising: (i) (a) trivalent chromium ions, and (b) iron ions providing a trivalent chromium electroplating bath comprising: (ii) subjecting at least a portion of the trivalent chromium electroplating bath to air agitation to obtain at least an air-agitated portion of the trivalent chromium electroplating bath; (iii) contacting the air-agitated portion of the trivalent chromium electroplating bath with an ion exchange resin to obtain a resin-treated portion of the trivalent chromium electroplating bath; and (iv) returning the resin-treated portion of the trivalent chromium electroplating bath to the trivalent chromium electroplating bath Including, - the trivalent chromium electroplating bath prepared in step (i) has a current density of 18 A / dm ２ is or is utilized to electrodeposit a chromium layer on at least one substrate by applying a cathodic current density of at least - after step (iii), the iron ions in the resin-treated portion of the trivalent chromium electroplating bath have a lower concentration than in the air-agitated portion of the trivalent chromium electroplating bath; - after step (iv), the iron ions in the trivalent chromium electroplating bath have a concentration of less than 50 mg / L based on the total volume of the trivalent chromium electroplating bath. A method, provided that:

2. 2. The method of claim 1, wherein in step (i), the iron ions in the trivalent chromium electroplating bath have a concentration of 40 mg / L or less, based on the total volume of the trivalent chromium electroplating bath.

3. The method described in claim 2, wherein in step (i), the iron ions in the trivalent chromium electroplating bath have a concentration of 11 mg / L or less based on the total volume of the trivalent chromium electroplating bath.

4. 4. The method of claim 1, wherein after step (iv), the iron ions in the trivalent chromium electroplating bath have a concentration of 35 mg / L or less, based on the total volume of the trivalent chromium electroplating bath.

5. The method described in claim 4, wherein after step (iv), the iron ions in the trivalent chromium electroplating bath have a concentration of 10 mg / L or less based on the total volume of the trivalent chromium electroplating bath.

6. 6. The method of any one of claims 1 to 5, wherein in step (i) the iron ions in the trivalent chromium electroplating bath have a concentration greater than 10 mg / L, and after step (iv) the iron ions in the trivalent chromium electroplating bath have a concentration of 10 mg / L or less, each based on the total volume of the trivalent chromium electroplating bath.

7. 7. The method according to any one of claims 1 to 6, wherein in step (iii), the iron ions in the resin-treated portion of the trivalent chromium electroplating bath have a concentration of 9 mg / L or less, based on the total volume of the resin-treated portion of the trivalent chromium electroplating bath.

8. The method described in claim 7, wherein in step (iii), the iron ions in the resin-treated portion of the trivalent chromium electroplating bath have a concentration of 4 mg / L or less based on the total volume of the resin-treated portion of the trivalent chromium electroplating bath.

9. In step (i), the trivalent chromium electroplating bath comprises: (c) copper ions and / or (d) nickel ions Further comprising: - after step (iii), the copper ions and / or nickel ions in the resin-treated portion of the trivalent chromium electroplating bath have a lower concentration than in the air-agitated portion of the trivalent chromium electroplating bath, respectively.

9. The method of any one of claims 1 to 8, wherein:

10. - the trivalent chromium electroplating bath prepared in step (i) has a current density of 20 A / dm ２ 10. The method of any one of claims 1 to 9, wherein the method is or is utilized to apply a cathodic current density of at least 100 .mu.m or greater to electrodeposit a chromium layer on at least one substrate.

11. The method according to claim 10, wherein the trivalent chromium electroplating bath prepared in step (i) has been or will be used to electrodeposit a chromium layer onto at least one substrate by applying a cathodic current density of 42 A / dm 2 or more.

12. 12. The method according to any one of claims 1 to 11, wherein the chromium layer has a thickness of 0.5 μm or more.

13. The method of claim 12, wherein the chromium layer has a thickness of 2.0 μm or more.

14. 14. The method according to any one of claims 1 to 13, wherein steps (i), (ii), (iii) and (iv) are carried out continuously or discontinuously.

15. the trivalent chromium electroplating bath prepared in step (i) is utilized for said electrodeposition while steps (ii), (iii), and (iv) are carried out; or 15. The method of any one of claims 1 to 14, wherein the trivalent chromium electroplating bath provided in step (i) is the one utilized for the electrodeposition prior to steps (ii), (iii), and (iv).

16. 16. The method of any one of claims 1 to 15, wherein the trivalent chromium electroplating bath is located in an electroplating section and steps (ii) and / or (iii) are carried out in a treatment section separate from but fluidly connected to the electroplating section.

17. (v) contacting the ion exchange resin with an acidic and / or alkaline regeneration solution after step (iii).

17. The method of any one of claims 1 to 16, further comprising:

18. The method of claim 17, wherein in step (v), the ion exchange resin is periodically contacted with an acidic regeneration solution during the regeneration interval, and subsequently the ion exchange resin is contacted with an alkaline regeneration solution after the regeneration interval.

19. 19. The method of any one of claims 1 to 18, wherein the ion exchange resin comprises acidic functional groups.

20. The method of claim 19, wherein the acidic functional group comprises one or more groups selected from a carboxyl group, a phosphonic acid group, and a sulfonic acid group.

21. In step (i), the trivalent chromium electroplating bath comprises: one or more halogen ions, one or more alkali metal cations, one or more organic complexing compounds, - sulfate ions, and - ammonium ion 21. The method of any one of claims 1 to 20, further comprising one or more compounds selected from the group consisting of:

22. The one or more types of halogen ions are bromide ions, the one or more alkali metal cations are sodium and / or potassium; 22. The method of claim 21, wherein the one or more organic complexing compounds are aliphatic monocarboxylic organic acids and / or salts thereof.

23. 23. The method of any one of claims 1 to 22, wherein the trivalent chromium electroplating bath utilized to electrodeposit the chromium layer on the at least one substrate has a pH in the range of 4.1 to 7.

0.

24. The method of claim 23, wherein the trivalent chromium electroplating bath utilized to electrodeposit the chromium layer on the at least one substrate has a pH in the range of 5.4 to 5.9.

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