Electronic device, radio frequency module and radio frequency device

Abstract

To provide acoustic wave devices and filters, and methods and structures for controlling a temperature coefficient of bandwidth in them.SOLUTION: An electronic device (surface acoustic wave resonator 10) includes a multi-layer piezoelectric substrate including a carrier substrate 22, a piezoelectric material film 12 disposed on a front side of the carrier substrate, and a back-side material layer disposed on a back side of the carrier substrate, and one or more acoustic wave devices disposed on a front side of the multi-layer piezoelectric substrate. The back-side material layer has a coefficient of thermal expansion different from a coefficient of thermal expansion of the carrier substrate. The one or more acoustic wave devices exhibit a smaller difference in the temperature coefficient of frequency at each of resonant and antiresonant frequencies than in a substantially similar device lacking the back-side material layer.SELECTED DRAWING: Figure 2

Description

[Technical Field]

[0001] SUMMARY OF THE DISCLOSURE Embodiments of the present disclosure relate to acoustic wave devices and filters, and to methods and structures for controlling the temperature coefficient of bandwidth therein. [Background technology]

[0002] Acoustic wave devices, such as surface acoustic wave (SAW) and bulk acoustic wave (BAW) devices, can be used as filter components in radio frequency electronic systems. For example, a filter in the radio frequency front end of a mobile phone may include an acoustic wave filter. Two acoustic wave filters can be arranged as a duplexer or a diplexer. Summary of the Invention

[0003] According to one aspect, an electronic device is provided that includes a multilayer piezoelectric substrate including a carrier substrate, a piezoelectric material layer disposed on a front side of the carrier substrate, and a backside material layer disposed on a backside of the carrier substrate, and one or more acoustic wave devices disposed on the front side of the multilayer piezoelectric substrate, the backside material layer having a thermal expansion coefficient that differs from a thermal expansion coefficient of the carrier substrate, and the one or more acoustic wave devices exhibiting a smaller difference in temperature coefficient of frequency at each of a resonant frequency and an anti-resonant frequency than a substantially similar device lacking the backside material layer.

[0004] In some embodiments, one or more acoustic wave devices are included in an acoustic wave filter.

[0005] In some embodiments, one or more acoustic wave devices form a radio frequency filter.

[0006] In some embodiments, the filter has a near-zero temperature coefficient of bandwidth.

[0007] In some embodiments, a frequency temperature coefficient at a resonant frequency of one or more acoustic wave devices is substantially equal to a frequency temperature coefficient at an anti-resonant frequency of the one or more acoustic wave devices.

[0008] In some embodiments, one or more of the acoustic wave devices are surface acoustic wave devices. One or more of the acoustic wave devices may be temperature compensated surface acoustic wave devices.

[0009] In some embodiments, one or more of the acoustic wave devices are bulk acoustic wave devices.

[0010] In some embodiments, the backside material layer has a frequency temperature coefficient that is higher than the frequency temperature coefficient of the carrier substrate.

[0011] In some embodiments, the backside material layer has a frequency temperature coefficient that is lower than the frequency temperature coefficient of the carrier substrate.

[0012] In some embodiments, the backside material layer comprises one of a dielectric or a metal.

[0013] In some embodiments, the backing material layer comprises a piezoelectric material.

[0014] In some embodiments, the backing material layer and the piezoelectric material layer comprise the same piezoelectric material.

[0015] In some embodiments, the backing material layer and the piezoelectric material layer have substantially the same thickness.

[0016] In some embodiments, one or more acoustic wave devices have a near-zero delta frequency temperature coefficient.

[0017] In some embodiments, the electronic device is included in a radio frequency device module.

[0018] In some embodiments, the radio frequency device module is included in a radio frequency device.

[0019] According to another aspect, a method of forming an electronic device is provided, the method including forming a piezoelectric material layer on a top surface of a carrier substrate, forming a backside material layer on a bottom surface of the carrier substrate, and forming one or more acoustic wave devices including portions of the piezoelectric material layer, the backside material layer having a thermal expansion coefficient different from a thermal expansion coefficient of the carrier substrate, the backside material layer causing the one or more acoustic wave devices to exhibit near-zero difference in temperature coefficient of frequency at each of a resonant frequency and an anti-resonant frequency.

[0020] In some embodiments, the method further includes forming a radio frequency filter from the one or more acoustic wave devices.

[0021] In some embodiments, the method further includes forming a radio frequency device module including the radio frequency filter.

[0022] In some embodiments, the method further includes forming a radio frequency electronic device including the radio frequency device. [Brief explanation of the drawings]

[0023] Several embodiments of the present disclosure are described below by way of non-limiting examples with reference to the accompanying drawings.

[0024] [Figure 1A] FIG. 1 is a simplified plan view of an example of a surface acoustic wave resonator. [Figure 1B] FIG. 10 is a simplified plan view of another example of a surface acoustic wave resonator. [Figure 1C] FIG. 10 is a simplified plan view of another example of a surface acoustic wave resonator. [Figure 2] 1 is a cross-sectional view of a portion of a temperature-compensated surface acoustic wave resonator having a multilayer piezoelectric substrate. [Figure 3] 1 is a simplified cross-sectional view of a thin film bulk acoustic wave resonator. [Figure 4] FIG. 1 is a simplified cross-sectional view of a Lamb wave resonator. [Figure 5] FIG. 1 is a simplified cross-sectional view of a solid-mounted resonator. [Figure 6] FIG. 1 is a schematic diagram of a radio frequency ladder filter. [Figure 7] 1 illustrates an example of a multilayer piezoelectric substrate for an acoustic wave device. [Figure 8] 1 shows the strain in a multilayer piezoelectric substrate with different backside layers at operating temperature. [Figure 9] FIG. 1 is a block diagram of an example of a filter module that may include one or more electronic devices according to aspects of the present disclosure. [Figure 10] FIG. 1 is a block diagram of an example of a front-end module that may include one or more filter modules according to aspects of the present disclosure. [Figure 11] 11 is a block diagram of an example of a wireless device including the front-end module of FIG. 10. DETAILED DESCRIPTION OF THE INVENTION

[0025] The following description of certain embodiments represents various descriptions of particular embodiments. However, the innovations described herein may be embodied in many different forms, as defined and covered, for example, by the claims. In this description, reference is made to the drawings, in which like reference numbers may indicate identical or functionally similar elements. It is understood that the elements depicted in the drawings are not necessarily drawn to scale. It is further understood that a given embodiment may include more elements than shown in the drawings and / or may include a subset of the elements depicted in the drawings. Furthermore, some embodiments may incorporate any suitable combination of features from two or more drawings.

[0026] FIG. 1A is a plan view of a surface acoustic wave (SAW) resonator 10 such as may be used in SAW filters, duplexers, baluns, and the like.

[0027] Acoustic wave resonator 10 is formed from a piezoelectric substrate, such as lithium tantalate (LiTaO) or lithium niobate (LiNbO) substrate 12, and includes an interdigital transducer (IDT) electrode 14 and a reflector electrode 16. In use, IDT electrode 14 excites a primary acoustic wave having a wavelength λ along the surface of piezoelectric substrate 12. Reflector electrodes 16 sandwich IDT electrode 14 and reflect the primary acoustic wave back and forth through IDT electrode 14. The primary acoustic wave in the device travels perpendicular to the length of the IDT electrodes.

[0028] The IDT electrode 14 includes a first busbar electrode 18A and a second busbar electrode 18B facing the first busbar electrode 18A. The busbar electrodes 18A and 18B may be collectively referred to herein as busbar electrodes 18. The IDT electrode 14 further includes first electrode fingers 20A extending from the first busbar electrode 18A toward the second busbar electrode 18B, and second electrode fingers 20B extending from the second busbar electrode 18B toward the first busbar electrode 18A.

[0029] Each of the reflector electrodes 16 (also referred to as a reflector grating) includes a first reflector busbar electrode 24A and a second reflector busbar electrode 24B (collectively referred to as reflector busbar electrodes 24) and reflector fingers 26 extending between and electrically coupled to the first busbar electrode 24A and the second busbar electrode 24B.

[0030] In other embodiments disclosed herein, as shown in FIG. 1B, reflector busbar electrodes 24A, 24B may be omitted, and reflector fingers 26 may not be electrically connected. Furthermore, as shown in FIG. 1C, an acoustic wave resonator disclosed herein may include dummy electrode fingers 20C aligned with each of electrode fingers 20A, 20B. Each dummy electrode finger 20C extends from the busbar electrode 18A, 18B opposite the aligned electrode finger 20A, 20B, respectively.

[0031] 2 is a partial cross-sectional view of a portion of acoustic wave resonator 10 of any of FIGS. 1A-1C showing some of IDT electrodes 14 disposed on substrate 12. In some embodiments, the acoustic wave resonator may include a multilayer piezoelectric substrate including piezoelectric substrate 12 and a carrier substrate 22 on which the piezoelectric substrate is disposed. Carrier substrate 22 may be formed, for example, from silicon or a dielectric material such as silicon dioxide, aluminum oxide, or sapphire. Carrier substrate 22 is typically thicker than piezoelectric substrate 12, providing the acoustic wave resonator with increased mechanical strength.

[0032] The IDT electrode 14 is formed from a metal or metal alloy, such as aluminum. In some embodiments, the IDT electrode 14 may include multiple layers of different metals, such as molybdenum and aluminum. A dielectric material 24, such as silicon dioxide (SiO), may be disposed on top of the IDT electrode 14 and substrate 12. The dielectric material can advantageously reduce the effect of temperature changes on the operating characteristics of the acoustic wave resonator 10 and also protect the IDT electrode 14 and the surface of the substrate 12. For example, SiO has a negative thermal expansion coefficient, while materials typically used for the piezoelectric substrate 12 in SAW devices have a positive thermal expansion coefficient. The SiO layer 24 can therefore resist dimensional changes in the piezoelectric substrate 12 with temperature changes that would occur in the absence of the SiO layer 24. A SAW device including a SiO layer, as shown in FIG. 2, may be referred to as a temperature-compensated SAW device, often abbreviated as a TC-SAW device.

[0033] Aspects and embodiments disclosed herein are also applicable to bulk acoustic wave (BAW) resonators. Thin film bulk acoustic wave resonators (FBARs), Lamb wave resonators, and solid-mount resonators are examples of BAW resonators.

[0034] 3 is a simplified cross-sectional view of a thin film bulk acoustic wave resonator (FBAR) 30. The FBAR 30 includes a piezoelectric material layer 32, a top electrode 34 on an upper surface of the piezoelectric material layer 32, and a bottom electrode 36 on a lower surface of the piezoelectric material layer 32. The piezoelectric material layer 32 may be a thin film. The piezoelectric material layer 32 may be an aluminum nitride layer. In other examples, the piezoelectric material layer 32 may be any suitable piezoelectric material layer. The piezoelectric material layer 32 is disposed on a substrate 39, defining a cavity 38 between the lower surface of the piezoelectric material layer 32 and the substrate 39. The bottom electrode 36 is disposed within the cavity 38. The cavity 38 may be filled with air or other gas, or in other embodiments, may be evacuated to form a vacuum cavity.

[0035] FIG. 4 is a simplified cross-sectional view of a Lamb wave resonator 40. The Lamb wave resonator 40 includes features of a SAW resonator and an FBAR. As shown, the Lamb wave resonator 40 includes a piezoelectric material layer 42, an interdigital transducer electrode (IDT) 44 on the upper surface of the piezoelectric material layer 42, and a lower electrode 46 disposed on the lower surface of the piezoelectric material layer 42. The piezoelectric material layer 42 may be a thin film. The piezoelectric material layer 42 may be an aluminum nitride layer. In other examples, the piezoelectric material layer 42 may be any suitable piezoelectric layer. The frequency of the Lamb wave resonator may be based on the geometry of the IDT 44. The electrode 46 may be grounded in certain examples. In some examples, the electrode 46 may be floating. An air cavity 48 is disposed between the electrode 46 and a substrate 49. Instead of the air cavity 48, any suitable cavity, such as a vacuum cavity or a cavity filled with a different gas, may be implemented.

[0036] FIG. 5 is a simplified cross-sectional view of a solid-mounted resonator (SMR) 50. As shown, the SMR 50 includes a piezoelectric material layer 52, an upper electrode 54 disposed on top of the piezoelectric material layer 52, and a lower electrode 56 disposed on a lower surface of the piezoelectric material layer 52. The piezoelectric material layer 52 may be an aluminum nitride layer. In other examples, the piezoelectric material layer 52 may be any suitable piezoelectric material layer. The lower electrode 56 may be grounded in certain examples. In some examples, the lower electrode 56 may be floating. A Bragg reflector 58 is disposed between the lower electrode 56 and a semiconductor substrate 59. Any suitable Bragg reflector may be implemented. For example, the Bragg reflector may be SiO2 / W.

[0037] Substrates 39, 49, 59 in Figures 3-5 are shown as being silicon, but may alternatively be formed from other materials, for example silicon dioxide, aluminum oxide or dielectric materials such as sapphire.

[0038] It should be noted that the acoustic wave resonators shown in FIGS. 1A-5 , as well as those shown in the other figures herein, are shown in highly simplified form. The relative dimensions of different features are not shown to scale. For example, a typical surface acoustic wave resonator generally includes a significantly larger number of electrode fingers and / or reflector fingers than are shown. Acoustic wave resonators may be configured differently from those shown in some examples. For example, in some embodiments, a surface acoustic wave resonator may include dummy electrode fingers, electrode fingers with different or non-uniform length or width dimensions, electrode fingers or reflector fingers with different or non-uniform spacing, or electrode fingers that include curved or angled portions. A typical surface acoustic wave resonator or filter element may also include multiple IDT electrodes sandwiched between reflector electrodes.

[0039] Multiple acoustic wave resonators disclosed herein may be electrically coupled to form an acoustic wave filter, such as a radio frequency (RF) acoustic wave filter. One example of a filter architecture is a ladder filter. An example of an RF ladder filter is shown schematically in FIG. 6 . The RF ladder filter includes multiple series resonators R1, R3, R5, R7, and R9 and multiple parallel (or shunt) resonators R2, R4, R6, and R8. As shown, the multiple series resonators R1, R3, R5, R7, and R9 are connected in series between the input and output of the RF ladder filter, and the multiple parallel resonators R2, R4, R6, and R8 are each connected in a shunt configuration between a series resonator and ground. Other filter structures and other circuit structures known in the art that may include acoustic wave devices or resonators, such as duplexers, baluns, etc., can also be formed to include multiple examples of the acoustic wave resonators disclosed herein.

[0040] The acoustic wave resonator has a resonant frequency (f r ) at the anti-resonance frequency (f a ) often have a different temperature coefficient of frequency (TCF) than the temperature coefficient of frequency (TCF) at f. This difference in TCF is referred to herein as delta TCF (ΔTCF), which is typically measured in ppm / °C. r and f a Since the frequency separation between the sine wave and the frequency domain is a major factor in determining the bandwidth of a filter formed from acoustic wave resonators, ΔTCF can be regarded as the temperature coefficient of the bandwidth for a filter formed from acoustic wave resonators. r and f aVariations in the isolation between the filter and the filter also cause changes in filter impedance, potentially degrading the voltage standing wave ratio (VSWR) or affecting the interaction of the filter with other adjacent RF components in an RF system (e.g., a power amplifier or low-noise amplifier). In acoustic wave filters that include multilayer piezoelectric substrate (MPS) acoustic wave resonators, ΔTCF values ​​can be particularly large and problematic. It is desirable to provide acoustic wave resonators and filters with low or zero ΔTCF values, so that the operating characteristics of the resonators or filters, such as resonant and antiresonant frequencies or bandwidths, are not significantly affected by changes in operating temperature.

[0041] A major contributor to ΔTCF in MPS resonators and filters formed from them (MPS filters) is temperature-dependent stress in the piezoelectric material film of the MPS resonator. The temperature-dependent stress is caused by a mismatch in the coefficient of thermal expansion (CTE) between the piezoelectric material film and its underlying carrier substrate, e.g., between piezoelectric material film 12 and carrier substrate 22 in Figure 2, and between piezoelectric material films 32, 42, and 52 and their corresponding carrier substrates 39, 49, and 59 in Figures 3-5.

[0042] Several aspects and embodiments disclosed herein include MPS acoustic wave resonators and filters with near-zero ΔTCF, for example, within ±2 ppm / °C. The resonators of the MPS filters include a backside layer with a CTE different from that of the primary carrier substrate. The CTE mismatch between the primary carrier substrate and the backside layer induces strain in the acoustic wave resonator. This strain causes the carrier substrate to deflect upward (convex) or downward (concave) depending on whether the CTE of the backside layer is smaller or larger than that of the primary carrier substrate. The convex or concave strain induced by the backside layer imparts tensile or compressive stress, respectively, to the piezoelectric film on the surface (top) side of the resonator. As temperature changes, the stress changes proportionally. The direction of the induced (tensile or compressive) stress is determined by the magnitude of the CTE of the backside layer compared to that of the primary carrier substrate, and the sensitivity of the change is determined by the degree of CTE mismatch, the Young's modulus of the carrier substrate and backside materials, and the relative thicknesses of the backside layer and carrier substrate. Since the film thickness can be controlled very easily using modern fabrication techniques, this provides a very simple degree of freedom to fabricate acoustic wave resonators or to have zero or near-zero ΔTCF.

[0043] FIG. 7 is a schematic diagram illustrating a cross-section of material layers of an acoustic wave resonator 700 having a zero or near-zero ΔTCF as disclosed herein. The acoustic wave resonator includes a piezoelectric material layer 705 on or within which are formed or included any of the electrodes or other features of the acoustic wave resonators shown in FIGS. 1A-5 or other acoustic wave resonators known in the art. These may be covered, in whole or in part, by one or more overlying dielectric layers, as shown, for example, in FIG. 2. The piezoelectric material layer 705 is disposed on the front or upper surface of a carrier substrate 710, which may correspond to carrier substrate 22, 39, 49, or 59 of the acoustic wave resonators shown in FIGS. 1A-5 or other acoustic wave resonators known in the art. A backside layer 715 having a CTE different from that of the carrier substrate 710 is disposed on the back or lower side of the carrier substrate 710 opposite the front side of the carrier substrate 710 on which the piezoelectric material layer 705 is disposed. The backside layer may be formed from one or more layers of material and may include multiple layers of different materials. In some embodiments, the backside layer 715 has a higher CTE than the carrier substrate 710. If the carrier substrate 710 is formed of silicon, for example, with a CTE of about 2.6 ppm / °C, the backside layer may be formed of one or more of a piezoelectric material (e.g., lithium niobate (CTE of about 7.5 ppm / °C to about 15.4 ppm / °C depending on crystal orientation), lithium tantalate (CTE of about 2 ppm / °C to about 16 ppm / °C depending on crystal orientation), or aluminum nitride (CTE of about 4.6 ppm / °C)), a dielectric (e.g., aluminum oxide (CTE of about 4.5 ppm / °C), sapphire (CTE of about 5.3 ppm / °C), or silicon carbide (CTE of about 2.8 ppm / °C)), or a metal (e.g., copper (CTE of about 17 ppm / °C) or aluminum (CTE of about 23 ppm / °C)). In some embodiments, the backside layer 715 may be formed of the same material and have substantially the same thickness as the piezoelectric material layer 705. In another embodiment, the backside layer 715 has a lower CTE than the carrier substrate 710 .If the carrier substrate 710 is formed of silicon, for example, with a CTE of about 2.6 ppm / °C, the backside layer may be formed of one or more of silicon nitride (CTE of about 1.4 ppm / °C), diamond (CTE of about 1 ppm / °C), or silicon dioxide (CTE of about 0.65 ppm / °C). In some embodiments, the backside layer may be formed of or include copper or SiN in a thickness range of 1% to 20% of the thickness of the main carrier substrate. For carrier substrates with thicknesses in the range of 50-250 μm, the backside layer thickness may be in the range of 0.5 μm to 50 μm, for example.

[0044] The backside layer 715 may be deposited directly onto the backside or underside of the carrier substrate 710 using a suitable chemical vapor deposition or physical vapor deposition process (e.g., evaporation or sputtering). In other embodiments, the backside layer 715 may be adhered to the backside or underside of the carrier substrate 710 using a suitable adhesion layer, for example, using one or more of silicon dioxide, chromium, platinum, titanium, titanium dioxide, gold, or any other suitable dielectric or metallic adhesion layer material. In other embodiments, the metal backside layer may be formed by electroplating.

[0045] As shown in FIG. 8 , the CTE mismatch between the primary carrier substrate and the backside layer induces strain in the device, causing it to bend upward (convex) or downward (concave), depending on whether the CTE of the backside layer is smaller or larger than that of the primary carrier substrate. The convex or concave strain induced by the backside layer imparts tensile or compressive stress, respectively, to the piezoelectric film on the front (top) side of the device. As temperature changes, the stress changes proportionally. The direction of the induced stress (tensile or compressive) is determined by the magnitude of the CTE of the backside layer compared to that of the primary carrier substrate, and the sensitivity of the change is determined by the degree of CTE mismatch, the elastic moduli of the carrier substrate and backside material, and the relative thickness of the backside layer compared to the carrier substrate, and, to a lesser extent, the composition and thickness of the piezoelectric material layer. Because the film thickness of the backside layer can be easily and precisely controlled using modern deposition processes, this provides a readily controllable method for providing the acoustic wave resonators or filters disclosed herein with zero or near-zero ΔTCF.

[0046] As described above, embodiments of the acoustic wave devices disclosed herein can be configured or used in, for example, filters. Embodiments of the acoustic wave devices disclosed herein can be configured, for example, as ladder filters having known structures and configurations. Acoustic wave filters using one or more acoustic wave devices can then be assembled into and packaged as modules that can ultimately be used in electronic devices, such as wireless communication devices. FIG. 9 is a block diagram of an example module 800 including an acoustic wave filter 810. The filter 810 can be implemented on one or more dies 820 that include one or more connection pads 822. For example, the filter 810 can include connection pads 822 that correspond to input contacts for the filter and other connection pads 822 that correspond to output contacts for the filter. The packaged module 800 includes a package substrate 830 configured to receive multiple components, including the die 820. A plurality of connection pads 832 can be disposed on the package substrate 830, and the various connection pads 822 of the filter die 820 can be connected to the connection pads 832 on the package substrate 830 via electrical connectors 834. The electrical connectors 834 can be, for example, solder bumps or wire bonds to allow various signals to pass to and from the filter 810. The module 800 can also optionally include other circuit die 840, such as one or more additional filters, amplifiers, switches, pre-filters, modulators, demodulators, downconverters, etc., as would be known to those skilled in the art of semiconductor fabrication in view of the disclosure herein. In some embodiments, the module 800 can also include one or more packaging structures, for example, to provide protection for the module 800 and facilitate easy handling. Such packaging structures can include an overmold formed over the package substrate 830 and dimensioned to substantially encapsulate the various circuits and components.

[0047] Various examples and embodiments of filter 810 can be used in a wide variety of electronic devices. For example, filter 810 can be used in an antenna duplexer, which itself can be incorporated into a variety of electronic devices, such as RF front-end modules and communication devices.

[0048] 10, a block diagram of an example front-end module 900 that can be used in an electronic device such as a wireless communication device (e.g., a mobile phone) is illustrated. The front-end module 900 includes an antenna duplexer 910 having a common node 902, an input node 904, and an output node 906. An antenna 1010 is connected to the common node 902.

[0049] The antenna duplexer 910 may include one or more transmit filters 912 connected between the input node 904 and a common node 902, and one or more receive filters 914 connected between the common node 902 and an output node 906. The passband of the transmit filters is different from the passband of the receive filters. Multiple instances of the filter 810 may be used to form the transmit filters 912 and / or the receive filters 914. An inductor or other matching or phasing component 920 may be connected to the common node 902.

[0050] The front-end module 900 further includes a transmitter circuit 932 coupled to the input node 904 of the duplexer 910 and a receiver circuit 934 coupled to the output node 906 of the duplexer 910. The transmitter circuit 932 can generate a signal for transmission via the antenna 1010, and the receiver circuit 934 can receive and process the signal via the antenna 1010. In some embodiments, the receiver circuit and the transmitter circuit are implemented as separate components as shown in FIG. 10 , although in other embodiments, these components may be integrated into a common transceiver circuit or module. Those skilled in the art will appreciate that the front-end module 900 may include other components not illustrated in FIG. 10 , including, but not limited to, switches, electromagnetic couplers, amplifiers, processors, etc.

[0051] FIG. 11 is a block diagram of an example of a wireless device 1000 including the antenna duplexer 910 shown in FIG. 10 . The wireless device 1000 may be a cellular phone, a smartphone, a tablet, a modem, a communications network, or any other portable or non-portable device configured for voice or data communications. The wireless device 1000 can receive and transmit signals from an antenna 1010. The wireless device includes an embodiment of a front-end module 900 similar to that described above with reference to FIG. 10 . The front-end module 900 includes the duplexer 910 described above. In the example shown in FIG. 11 , the front-end module 900 further includes an antenna switch 940. The antenna switch 940 can be configured to switch between different frequency bands or modes, such as a transmit mode and a receive mode. In the example shown in FIG. 11 , the antenna switch 940 is positioned between the duplexer 910 and the antenna 1010, although in other examples, the duplexer 910 may be positioned between the antenna switch 940 and the antenna 1010. In another example, the antenna switch 940 and the duplexer 910 can be integrated into one component.

[0052] The front-end module 900 includes a transceiver 930 configured to generate a signal for transmission or to process a received signal. The transceiver 930 may include a transmitter circuit 932 that may be coupled to the input node 904 of the duplexer 910 and a receiver circuit 934 that may be coupled to the output node 906 of the duplexer 910, as shown in the example of FIG.

[0053] Signals generated for transmission by the transmitter circuitry 932 are received by a power amplifier (PA) module 950, which amplifies the generated signals from the transceiver 930. The power amplifier module 950 may include one or more power amplifiers. The power amplifier module 950 can be used to amplify transmit signals in various RF or other frequency bands. For example, the power amplifier module 950 can receive an enable signal used to pulse the output of the power amplifier to facilitate the transmission of a wireless local area network (WLAN) signal or any other suitable pulsed signal. The power amplifier module 950 can be configured to amplify any of a variety of types of signals, including, for example, Global System for Mobile (GSM) signals, code division multiple access (CDMA) signals, Wideband-CDMA signals, Long Term Evolution (LTE) signals, New Radio (NR) signals, or EDGE signals. In certain embodiments, the power amplifier module 950 and associated components, including switches and the like, can be fabricated on a gallium arsenide (GaAs) substrate using, for example, high electron mobility transistors (pHEMTs) or insulated gate bipolar transistors (BiFETs), or on a silicon substrate using complementary metal oxide semiconductor (CMOS) field effect transistors.

[0054] 11, the front-end module 900 may further include a low-noise amplifier module 960, which amplifies the received signal from the antenna 1010 and provides the amplified signal to the receiver circuitry 934 of the transceiver 930.

[0055] The wireless device 1000 of FIG. 11 further includes a power management subsystem 1020 coupled to the transceiver 930 to manage power for operation of the wireless device 1000. The power management system 1020 may also control operation of the baseband subsystem 1030 and various other components of the wireless device 1000. The power management system 1020 may include or be coupled to a battery (not shown) that provides power for the various components of the wireless device 1000. The power management system 1020 may further include one or more processors or controllers that may, for example, control the transmission of signals. In one embodiment, the baseband subsystem 1030 is coupled to a user interface 1040 that facilitates various inputs and outputs of voice and / or data to or from a user. The baseband subsystem 1030 may also be coupled to a memory 1050 configured to store data and / or instructions that facilitate operation of the wireless device and / or provide information storage for the user. Any of the above-described embodiments may be implemented in connection with a mobile device, such as a cellular handset. The principles and advantages of the embodiments can be used by any system or apparatus, such as any uplink wireless communication device, that can benefit from any of the embodiments described herein. The teachings herein are applicable to a variety of systems. Although the present disclosure includes several example embodiments, the teachings described herein can be applied to a variety of architectures. Any of the principles and advantages described herein can be implemented in connection with RF circuitry configured to process signals in the range of approximately 30 kHz to 300 GHz, such as the range of approximately 450 MHz to 6 GHz.

[0056] Aspects of the present disclosure can be implemented in various electronic devices. Examples of electronic devices include, but are not limited to, consumer electronic products, components of consumer electronic products such as packaged radio frequency modules, uplink wireless communication devices, wireless communication infrastructure, electronic test equipment, etc. Examples of electronic devices include, but are not limited to, mobile telephones such as smartphones, wearable computing devices such as smart watches or earpieces, telephones, televisions, computer monitors, computers, modems, handheld computers, laptop computers, tablet computers, microwave ovens, refrigerators, in-vehicle electronic systems such as automotive electronic systems, stereo systems, digital music players, radios, cameras such as digital cameras, portable memory chips, washing machines, dryers, washer / dryer machines, copiers, facsimile machines, scanners, multifunction peripheral devices, watches, clocks, etc. Additionally, electronic devices may include unfinished products.

[0057] Throughout this specification and claims, unless the context clearly requires otherwise, words such as "comprise," "comprise," "include," and the like, shall generally be construed in an inclusive sense, i.e., "including, but not limited to," as opposed to an exclusive or exhaustive sense. The word "coupled," as generally used herein, refers to two or more elements that may be either directly connected or connected via one or more intermediate elements. Similarly, the word "connected," as generally used herein, refers to two or more elements that may be either directly connected or connected via one or more intermediate elements. In addition, the words "here," "above," "below," and words of similar import, when used in this application, refer to this application as a whole and not to any specific portion of this application. Where the context permits, terms in the above Detailed Description using the singular or plural number may also include the plural or singular number, respectively. The words "or" and "or," referring to a list of two or more items, cover all of the following interpretations of that word: any item in that list, all items in that list, and any combination of items in that list.

[0058] Furthermore, conditional language used herein, such as "can," "could," "may," "might," "for example," "such as," and the like, among others, is generally intended to convey that certain embodiments include certain features, elements, and / or conditions, while other embodiments do not, unless specifically stated otherwise or understood otherwise from the context of use. That is, such conditional language is not generally intended to imply that features, elements, and / or conditions are in any necessary manner for one or more embodiments, or that one or more embodiments necessarily include logic that determines, with or without author input or prompting, whether or not these features, elements, and / or conditions are included in or performed in any specific embodiment.

[0059] While certain embodiments have been described, these embodiments are presented by way of example only and are not intended to limit the scope of the present disclosure. Indeed, the novel methods, apparatuses, and systems described herein may be embodied in a variety of other forms. Furthermore, various omissions, substitutions, and changes in the form of the methods and systems described herein may be made without departing from the spirit of the present disclosure. For example, while several blocks are presented in a given arrangement, alternative embodiments may perform similar functions with different components and / or circuit topologies, and some blocks may be deleted, moved, added, subdivided, combined, and / or modified. Each of these blocks may be implemented in a variety of different ways. Any suitable combination of elements and steps of the various embodiments described above may be combined to provide further embodiments. The accompanying claims and their equivalents are intended to cover such forms or modifications as fall within the scope and spirit of the present disclosure.

Claims

1. 1. An electronic device comprising: a multilayer piezoelectric substrate including a carrier substrate, a piezoelectric material layer disposed on a front side of the carrier substrate, and a backside material layer disposed on a backside of the carrier substrate; one or more acoustic wave devices disposed on a front side of the multilayer piezoelectric substrate; Including, the backside material layer is the bottom layer of the multilayer piezoelectric substrate; the backside material layer is formed from one or more of aluminum oxide or a metal; An electronic device, wherein the one or more acoustic wave devices exhibit a smaller difference in frequency temperature coefficient at each of a resonant frequency and an anti-resonant frequency than a substantially similar device lacking the backside material layer.

2. The electronic device of claim 1 , wherein the one or more acoustic wave devices are included in an acoustic wave filter.

3. The electronic device of claim 1 , wherein the one or more acoustic wave devices form a radio frequency filter.

4. The electronic device of claim 2 , wherein the acoustic wave filter has a near-zero temperature coefficient of bandwidth.

5. The electronic device of claim 1 , wherein a frequency temperature coefficient at a resonant frequency of the one or more acoustic wave devices is substantially equal to a frequency temperature coefficient at an anti-resonant frequency of the one or more acoustic wave devices.

6. The electronic device of claim 1 , wherein the one or more acoustic wave devices are surface acoustic wave devices.

7. The electronic device of claim 6 , wherein the one or more acoustic wave devices are temperature compensated surface acoustic wave devices.

8. The electronic device of claim 1 , wherein the one or more acoustic wave devices are bulk acoustic wave devices.

9. The electronic device of claim 1 , wherein the backside material layer comprises a metal.

10. The electronic device of claim 1 , wherein the one or more acoustic wave devices have a near-zero delta frequency temperature coefficient.

11. A radio frequency module comprising an electronic device according to any one of claims 1 to 10.

12. A radio frequency device comprising the radio frequency module of claim 11.

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