A novel one-pot homogeneous process for the large-scale production of 2-substituted benzimidazoles

Abstract

2-substituted benzimidazoles and methods for preparing the same are disclosed. The composition may include a compound or salt thereof, an acid, and a polar aprotic solvent. The composition may be used to inhibit corrosion of metal surfaces in contact with aqueous systems, and provides enhanced protection against corrosion of metals in aqueous systems. Formula (I).

Description

[Technical Field]

[0001] This disclosure relates generally to the synthesis of 2-substituted benzimidazoles and compositions thereof. More specifically, this disclosure relates to a homogeneous process for synthesizing 2-substituted benzimidazoles and their use, for example, as corrosion inhibitors. [Background technology]

[0002] Benzimidazoles can be made using different synthetic routes. One common route is the acid-catalyzed condensation reaction between a diamine and a carboxylic acid. This route primarily focuses on obtaining solid benzimidazoles as isolated end products in moderate to good yields. Summary of the Invention [Problem to be solved by the invention]

[0003] These benzimidazoles are mostly synthesized with mineral acids, and the final product is precipitated by adjusting the pH to 7 or 8 using a base. The precipitated product is isolated by filtration and oven-dried. Prior art synthesis methods suffer from several drawbacks, including: 1) low throughput per batch due to long reaction and processing times; 2) yield loss from testing and separation steps; 3) the separation and subsequent drying steps require the installation of specialized equipment, resulting in significant capital investment; 4) handling of the solid product as both a wet cake and a dry powder involves significant material handling challenges and causes yield loss; and 5) the final solid product needs to be dried before being redissolved in a solvent for use in certain applications, such as corrosion protection.

[0004] Other uses of benzimidazoles include pharmaceutical and pesticide applications. Polybenzimidazoles are known for their high strength and high temperature performance. They are used in semiconductors, contact seals, wafer carriers, insulator bushings, thermal insulation, light-emitting diodes, solar cells, fuel cells, and high-performance protective clothing. Other uses include the petrochemical and aerospace industries. [Means for solving the problem]

[0005] In some embodiments, a composition is disclosed that includes a compound of formula (I) or a salt thereof, an acid, and a polar aprotic solvent; [ka] wherein X is independently hydrogen, halogen, or substituted or unsubstituted C 1~5 is an alkyl group, m is 1, 2, 3, or 4, and R 1 is hydrogen, substituted or unsubstituted C1-C 12 alkyl group, or a substituted or unsubstituted C4-C6 aryl group, R 2 is absent, hydrogen, substituted or unsubstituted C1-C 12 alkyl group, or a substituted or unsubstituted C4-C6 aryl group, R 3 is a bond or CHR 4 and R 4 is hydrogen, halogen, NR 5 R 6 , or OR 5 where R 5 and R 6 are each independently hydrogen, substituted or unsubstituted C1-C 12 an alkyl group, or a substituted or unsubstituted C4-C6 aryl group; Z is independently nitrogen, CX, or N + R 5 is.

[0006] In some embodiments, the composition may include water.

[0007] In some embodiments, the composition may be a homogeneous liquid.

[0008] In some embodiments, X is independently hydrogen or halogen, and R 1 is hydrogen and R 2 does not exist, R 3 is CHR 4 is.

[0009] In some embodiments, at least one Z is nitrogen.

[0010] In some embodiments, R 3 is a bond and at least one Z is nitrogen.

[0011] In some embodiments, the compound or salt thereof is of formula (II): [ka] wherein Y is independently hydrogen, halogen, or C 1~5 is an alkyl group, and n is 1, 2, 3, 4, or 5.

[0012] In some embodiments, the acid can be a strong inorganic acid, a strong organic acid, or any combination thereof.

[0013] In some embodiments, the acid may be selected from sulfuric acid, hydrochloric acid, nitric acid, methanesulfonic acid, phosphoric acid, sulfamic acid, aminomethylphosphonic acid, p-toluenesulfonic acid, and any combination thereof.

[0014] In some embodiments, the polar aprotic solvent may be selected from acetonitrile, N,N-dimethylformamide, acetone, dimethyl sulfoxide, sulfolane, N-methylpyrrolidinone, methylsulfonylmethane, chlorobenzene, o-dichlorobenzene, nitromethane, ionic liquids, and any combination thereof.

[0015] In some embodiments, the composition may include a high temperature stable phase transfer catalyst.

[0016] In some embodiments, the high temperature stable phase transfer catalyst may be selected from the group consisting of alkylguanidinium salts, arylguanidinium salts, alkylphosphonium salts, arylphosphonium salts, peralkylated phosphazenium salts, and any combination thereof.

[0017] In another embodiment, a method for making a compound of formula (V) or a salt thereof is disclosed. [ka]

[0018] The method may comprise heating a mixture comprising a compound of formula (III) or a salt thereof, a compound of formula (IV) or a salt thereof, an acid, a polar aprotic solvent, and a high-temperature stable phase transfer catalyst; [ka] wherein X is independently hydrogen, halogen, or C 1~5 is an alkyl group, m is 1, 2, 3, or 4, and R 1 is hydrogen, substituted or unsubstituted C1-C 12 alkyl group, substituted or unsubstituted C4-C6 aryl group, R 2 is absent, hydrogen, substituted or unsubstituted C1-C 12 alkyl group, substituted or unsubstituted C4-C6 aryl group, R 4 is hydrogen, halogen, NR 5 R 6 , or OR 5 where R 5 and R 6 are each independently hydrogen, substituted or unsubstituted C1-C 12 alkyl group, or a substituted or unsubstituted C4-C6 aryl group, R 8 is hydrogen, halogen, substituted or unsubstituted C1-C 12an alkyl group, a substituted or unsubstituted C5-C6 heteroaryl group, a substituted or unsubstituted C4-C6 aryl group, or a substituted or unsubstituted C3-C 12 It is a cycloalkyl group.

[0019] In some embodiments, the mixture can be heated to a temperature of from about 80°C to about 160°C.

[0020] In some embodiments, the mixture may be heated for a period ranging from about 30 minutes to about 12 hours.

[0021] In some embodiments, the mixture may contain an active agent concentration of about 1 to about 50% by weight.

[0022] In some embodiments, the method can include adding a carboxylic acid to the mixture.

[0023] In certain embodiments, the use of any of the compositions disclosed herein to inhibit corrosion is disclosed.

[0024] In certain embodiments, disclosed are compositions that can be prepared according to any of the methods disclosed herein.

[0025] In another embodiment, a method for preparing polybenzimidazole is disclosed. The method may include heating a mixture comprising diphenyl isophthalate, 3,3',4,4'-tetraaminodiphenyl, an acid, a polar aprotic solvent, and a high-temperature stable phase transfer catalyst.

[0026] In another embodiment, a method of inhibiting corrosion is disclosed that can include adding any of the compositions disclosed herein to an industrial water system that includes a metal surface.

[0027] The foregoing has outlined rather broadly the features and technical advantages of the present disclosure in order that the detailed description of the invention that follows may be better understood. Additional features and advantages of the present disclosure will be described hereinafter, which form the subject of the claims of this application. It should be appreciated by those skilled in the art that the conception and specific embodiments disclosed may be readily utilized as a basis for modifying or designing other embodiments for carrying out the same purposes of the present disclosure. It should also be realized by those skilled in the art that such equivalent embodiments do not depart from the spirit and scope of the present disclosure as set forth in the appended claims. DETAILED DESCRIPTION OF THE INVENTION

[0028] Various embodiments are described below. The relationships and functions of the various elements of the embodiments can be better understood by reference to the detailed description below. However, the embodiments are not limited to those illustrated below. In certain instances, details that are not necessary for understanding the embodiments disclosed herein may be omitted.

[0029] "Alkyl" refers to a straight or branched chain alkyl substituent. Examples of such substituents include methyl, ethyl, propyl, isopropyl, n-butyl, sec-butyl, isobutyl, tert-butyl, pentyl, isoamyl, hexyl, and the like.

[0030] "Aryl," as generally understood in the art, refers to an unsubstituted or substituted aromatic carbocyclic substituent, including "C6-C 10 The term "aryl" includes phenyl and naphthyl. The term aryl is understood to apply to cyclic substituents that are planar and contain 4n+2n electrons according to Huckel's rule.

[0031] "Cycloalkyl" refers to a cyclic alkyl substituent containing, for example, about 3 to about 8 carbon atoms, preferably about 4 to about 7 carbon atoms, and more preferably about 4 to about 6 carbon atoms. Examples of such substituents include cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, and the like. Cyclic alkyl groups can be unsubstituted or further substituted with alkyl groups such as methyl groups, ethyl groups, and the like.

[0032] "Halogen" or "halo" refers to F, Cl, Br, and I.

[0033] "Heteroaryl" refers to a monocyclic or bicyclic 5- or 6-membered ring system, wherein the heteroaryl group is unsaturated and satisfies Huckel's rule. Non-limiting examples of heteroaryl groups include furanyl, thiophenyl, pyrrolyl, pyrazolyl, imidazolyl, 1,2,3-triazolyl, 1,2,4-triazolyl, isoxazolyl, oxazolyl, isothiazolyl, thiazolyl, 1,3,4-oxadiazol-2-yl, 1,2,4-oxadiazol-2-yl, 5-methyl-1,3,4-oxadiazole, 3-methyl-1,2,4-oxadiazole, pyridinyl, pyrimidinyl, pyrazinyl, triazinyl, benzofuranyl, benzothiophenyl, indolyl, quinolinyl, isoquinolinyl, benzimidazolyl, benzoxazolinyl, benzothiazolinyl, quinazolinyl, and the like.

[0034] "Oxo" refers to an oxygen atom double bonded to a carbon atom.

[0035] The compounds of the present disclosure may be substituted with suitable substituents. As used herein, the term "suitable substituent" is intended to mean a chemically acceptable functional group, preferably a moiety that does not negate the activity of the compound. Such suitable substituents include, but are not limited to, halo groups, perfluoroalkyl groups, perfluoroalkoxy groups, alkyl groups, alkenyl groups, alkynyl groups, hydroxy groups, oxo groups, mercapto groups, alkylthio groups, alkoxy groups, aryl or heteroaryl groups, aryloxy or heteroaryloxy groups, aralkyl or heteroaralkyl groups, aralkoxy or heteroaralkoxy groups, HO-(C=O)- groups, heterocyclic groups, cycloalkyl groups, amino groups, alkyl and dialkylamino groups, carbamoyl groups, alkylcarbonyl groups, alkoxycarbonyl groups, alkylaminocarbonyl groups, dialkylaminocarbonyl groups, arylcarbonyl groups, aryloxycarbonyl groups, alkylsulfonyl groups, and arylsulfonyl groups. In some embodiments, suitable substituents include halogen, unsubstituted C1-C 12 alkyl group, unsubstituted C4-C6 aryl group, or unsubstituted C1-C 10 Those skilled in the art will recognize that many substituents may be substituted with additional substituents.

[0036] In some embodiments, a composition is disclosed that can include a compound of formula (I) or a salt thereof, an acid, and a polar aprotic solvent. The compound of formula (I) has the formula shown below: [ka]

[0037] In some embodiments, X is independently hydrogen, halogen, or substituted or unsubstituted C 1~5 is an alkyl group, and m can be 1, 2, 3, or 4. In some embodiments, R 1 is hydrogen, substituted or unsubstituted C1-C 12It can be an alkyl group, or a substituted or unsubstituted C4-C6 aryl group. In some embodiments, R 2 is absent, hydrogen, substituted or unsubstituted C1-C 12 It can be an alkyl group, or a substituted or unsubstituted C4-C6 aryl group. In some embodiments, R 3 is a bond or CHR 4 In some embodiments, R 4 is hydrogen, halogen, NR 5 R 6 , or OR 5 In some embodiments, R 5 and R 6 are each independently hydrogen, substituted or unsubstituted C1-C 12 It is an alkyl group, or a substituted or unsubstituted C4 to C6 aryl group.

[0038] The X substituent or substituents can occupy any available position on the benzimidazole ring. Thus, in certain embodiments, the X substituent or substituents can be located at the 4-, 5-, 6-, and / or 7-position of the benzimidazole. In certain embodiments, the X substituent is at the 5-position.

[0039] The number m of X substituents can be 1, 2, 3, or 4. When m is 2, 3, or 4, the X substituents can occupy any open position and can be arranged ortho, meta, or para to each other.

[0040] In certain embodiments, the salt of the compound of Formula (I) can be any salt, such as chloride, bromide, iodide, sulfate, fluoride, perchlorate, acetate, trifluoroacetate, phosphate, nitrate, carbonate, bicarbonate, formate, chlorate, bromate, chlorite, thiosulfate, oxalate, cyanide, cyanate, tetrafluoroborate, etc. In some embodiments, the salt of the compound of Formula (I) can be a hydrochloride or sulfate salt.

[0041] In some embodiments, Z is independently nitrogen, CX, or N+ R 5 is.

[0042] In some embodiments, Z is CX.

[0043] In some embodiments, X is hydrogen and m is 4.

[0044] In some embodiments, R 1 is hydrogen.

[0045] In some embodiments, R 2 does not exist.

[0046] In some embodiments, R 3 is a bond.

[0047] In some embodiments, R 3 is CHR 4 is.

[0048] In some embodiments, R 4 is hydrogen.

[0049] In some embodiments, R 4 is a halogen.

[0050] In some embodiments, R 4 is NR 5 R 6 is.

[0051] In some embodiments, R 4 is OR 5 is.

[0052] In some embodiments, R 5 is substituted or unsubstituted C1 to C 12 It is an alkyl group.

[0053] In some embodiments, R 5 is hydrogen.

[0054] In some embodiments, R 5 is a substituted or unsubstituted C4 to C6 aryl group.

[0055] In some embodiments, one Z is nitrogen and the rest are CX.

[0056] In some embodiments, at least two Z's are nitrogen and the remainder are CX.

[0057] In some embodiments, R 3 is a bond and at least one Z is nitrogen.

[0058] In some embodiments, X is independently hydrogen or halogen, and R 1 is hydrogen and R 2 does not exist, R 3 is CHR 4 is.

[0059] In some embodiments, the compound of formula (I) or salt thereof is: [ka]

[0060] In some embodiments, the compound of formula (I) or salt thereof is: [ka]

[0061] In some embodiments, the compound of formula (I) or salt thereof is: [ka]

[0062] In some embodiments, the compound of formula (I) or salt thereof is: [ka]

[0063] In some embodiments, the compound of formula (I) or salt thereof is: [ka]

[0064] In some embodiments, the compound of formula (I) or salt thereof is: [ka]

[0065] In some embodiments, the compound of formula (I) or salt thereof is: [ka]

[0066] In some embodiments, the compound of formula (I) or salt thereof is: [ka]

[0067] In some embodiments, the compound of formula (I) or salt thereof is: [ka]

[0068] In some embodiments, the compound of formula (I) or salt thereof is: [ka]

[0069] In some embodiments, the compound of formula (I) or salt thereof is: [ka]

[0070] In some embodiments, the compound of formula (I) or salt thereof is: [ka]

[0071] In some embodiments, the composition may include a compound of formula (Ia) or a salt thereof: [ka] wherein X is independently hydrogen, halogen, or substituted or unsubstituted C 1~5 is an alkyl group, m is 1, 2, 3, or 4, and R 1 is hydrogen, substituted or unsubstituted C1-C 12 alkyl group, or a substituted or unsubstituted C4-C6 aryl group, R 2 is absent, hydrogen, substituted or unsubstituted C1-C 12 alkyl group, or a substituted or unsubstituted C4-C6 aryl group, R 3 is a bond or CHR 4 is.

[0072] In some embodiments, the compound or salt thereof is of formula (II): [ka] In the formula, X, m, and R 3 X is independently hydrogen, halogen, or substituted or unsubstituted C 1~5 is an alkyl group, m is 1, 2, 3, or 4, and R 3 is a bond or CHR 4 and Y is independently hydrogen, halogen, or C 1~5 is an alkyl group, and n is 1, 2, 3, 4, or 5.

[0073] In some embodiments, Y is hydrogen.

[0074] In some embodiments, Y is independently hydrogen and halogen.

[0075] As described herein, m can be 1, 2, 3, or 4. When m is 2, 3, or 4, the X substituents can occupy any open positions and can be positioned ortho, meta, or para to each other. The number n of Y substituents can be 1, 2, 3, or 4. When n is 2, 3, or 4, the Y substituents can occupy any open positions and can be positioned ortho, meta, or para to each other.

[0076] In some embodiments, the concentration of the compound of Formula (I), Formula (Ia), or Formula (II) or a salt thereof in the composition can be in the range of about 1% to about 50% by weight, about 5% to about 50% by weight, about 10% to about 50% by weight, about 15% to about 50% by weight, about 20% to about 50% by weight, about 20% to about 45% by weight, about 25% to about 45% by weight, or about 25% to about 40% by weight.

[0077] In some embodiments, the acid may be a strong inorganic acid, a strong organic acid, or any combination thereof. In some embodiments, the acid may be a strong inorganic acid. In some embodiments, the acid may be a strong organic acid. As used herein, "strong" refers to an acid having a pKa of less than about 1. In some embodiments, the acid may be selected from sulfuric acid, hydrochloric acid, nitric acid, methanesulfonic acid, phosphoric acid, sulfamic acid, aminomethylphosphonic acid, p-toluenesulfonic acid, and any combination thereof.

[0078] In some embodiments, the acid can be sulfuric acid.

[0079] In some embodiments, the acid can be hydrochloric acid.

[0080] In some embodiments, the acid can be nitric acid.

[0081] In some embodiments, the acid can be methanesulfonic acid.

[0082] In some embodiments, the acid can be phosphoric acid.

[0083] In some embodiments, the acid can be sulfamic acid.

[0084] In some embodiments, the acid can be aminomethylphosphonic acid.

[0085] In some embodiments, the acid can be p-toluenesulfonic acid.

[0086] In some embodiments, the polar aprotic solvent may be selected from acetonitrile, N,N-dimethylformamide, acetone, dimethyl sulfoxide, sulfolane, N-methylpyrrolidinone, methylsulfonylmethane, chlorobenzene, o-dichlorobenzene, nitromethane, ionic liquids, and any combination thereof.

[0087] In some embodiments, the polar aprotic solvent can be acetonitrile.

[0088] In some embodiments, the polar aprotic solvent can be N,N-dimethylformamide.

[0089] In some embodiments, the polar aprotic solvent can be acetone.

[0090] In some embodiments, the polar aprotic solvent can be dimethyl sulfoxide.

[0091] In some embodiments, the polar aprotic solvent can be sulfolane.

[0092] In some embodiments, the polar aprotic solvent can be N-methylpyrrolidinone.

[0093] In some embodiments, the polar aprotic solvent can be methylsulfonylmethane.

[0094] In some embodiments, the polar aprotic solvent can be chlorobenzene.

[0095] In some embodiments, the polar aprotic solvent can be o-dichlorobenzene.

[0096] In some embodiments, the polar aprotic solvent can be nitromethane.

[0097] In some embodiments, the polar aprotic solvent can be an ionic liquid.

[0098] In some embodiments, the composition may include a high temperature stable phase transfer catalyst.

[0099] In some embodiments, the high-temperature stable phase transfer catalyst is selected from the group consisting of alkylguanidinium salts, arylguanidinium salts, alkylphosphonium salts, arylphosphonium salts, peralkylated phosphazenium salts, and any combination thereof. Examples of high-temperature stable phase transfer catalysts include, but are not limited to, hexaethylguanidinium chloride, tetraphenylphosphonium bromide, hexaalkylphosphonium salts, hexadecyltributylphosphonium bromide, or any combination thereof.

[0100] In some embodiments, the composition may include water.

[0101] In some embodiments, the composition can be a homogeneous mixture, hi some embodiments, the composition can be a solution.

[0102] In some embodiments, the composition may include a phenylenediamine compound. In some embodiments, the composition may include a phenylenediamine compound. When the composition includes a phenylenediamine compound, it is present in the composition in an amount of about 0.0001% to about 0.1% by weight. In some embodiments, the amount of the phenylenediamine compound in the composition may be less than about 0.1% by weight. In some embodiments, the amount of the phenylenediamine compound in the composition may be less than about 0.9%, about 0.8%, about 0.7%, about 0.6%, about 0.5%, about 0.4%, or about 0.3% by weight.

[0103] In another embodiment, a method for making a compound of formula (V) or a salt thereof is disclosed. [ka]

[0104] The method may include heating a mixture comprising a compound of formula (III) or a salt thereof, a compound of formula (IV) or a salt thereof, an acid, a polar aprotic solvent, and a high-temperature stable phase transfer catalyst. [ka]

[0105] In formulas (III-V), X is independently hydrogen, halogen, or substituted or unsubstituted C 1~5 is an alkyl group, m is 1, 2, 3, or 4, and R 1 is hydrogen, substituted or unsubstituted C1-C 12 alkyl group, or a substituted or unsubstituted C4-C6 aryl group, R 2 is absent, hydrogen, substituted or unsubstituted C1-C 12 alkyl group, or a substituted or unsubstituted C4-C6 aryl group, R 4 is hydrogen, halogen, NR 5 R 6 , or OR 5 and R 8is hydrogen, halogen, substituted or unsubstituted C1-C 12 an alkyl group, a substituted or unsubstituted C5-C6 heteroaryl group, a substituted or unsubstituted C4-C6 aryl group, or a substituted or unsubstituted C3-C 12 R can be a cycloalkyl group. 5 and R 6 are each independently hydrogen, substituted or unsubstituted C1-C 12 It is an alkyl group, or a substituted or unsubstituted C4 to C6 aryl group.

[0106] In some embodiments, R 8 is a substituted or unsubstituted C5-C6 heteroaryl group.

[0107] In some embodiments, R 8 is a substituted or unsubstituted C5 to C6 heteroaryl group, or a substituted or unsubstituted C4 to C6 aryl group.

[0108] In some embodiments, R 8 is a substituted or unsubstituted C4 to C6 aryl group.

[0109] In some embodiments, R 8 is a substituted or unsubstituted C6 heteroaryl group.

[0110] In some embodiments, R 8 is a substituted or unsubstituted C6 aryl group.

[0111] In some embodiments, the reaction product of compounds of formula (III) and (IV) is R 1 For R, a substituent other than hydrogen is 2 can be further reacted in a post-modification step to add substituents.

[0112] The synthesis methods disclosed herein have many advantages over the prior art. Compared to conventional synthesis methods, the final product can be obtained in higher yields. The final product can also be in a homogeneous liquid form, thereby facilitating product transfer and formulation while minimizing yield loss. Because the final product can be in a homogeneous liquid form, solids separation methods and equipment are unnecessary, resulting in significant cost savings.

[0113] In certain embodiments, methods for making a compound of formula (I) or a salt thereof are disclosed. [ka]

[0114] The method may include heating a mixture comprising a compound of formula (III) or a salt thereof, a compound of formula (VI) or a salt thereof, an acid, a polar aprotic solvent, and a high-temperature stable phase transfer catalyst. [ka]

[0115] In formulas (I), (III), and (VI), X is independently hydrogen, halogen, or substituted or unsubstituted C 1~5 is an alkyl group, m is 1, 2, 3, or 4, and R 1 is hydrogen, substituted or unsubstituted C1-C 12 alkyl group, or a substituted or unsubstituted C4-C6 aryl group, R 2 is absent, hydrogen, substituted or unsubstituted C1-C 12 alkyl group, or a substituted or unsubstituted C4-C6 aryl group, R 3 is a bond or CHR 4 and R 4 is hydrogen, halogen, NR 5 R 6 , or OR 5 where R 5 and R 6 are each independently hydrogen, substituted or unsubstituted C1-C 12an alkyl group, or a substituted or unsubstituted C4-C6 aryl group; Z is independently nitrogen, CX, or N + R 5 In some embodiments, R 7 is oxo or COOH.

[0116] In some embodiments, R 7 is COOH.

[0117] In some embodiments, R 7 is oxo.

[0118] Any acid and any equivalent described in this disclosure can be used in the methods of making the compounds or salts of formulas (I) and (V).

[0119] In some embodiments, the concentration of the acid in the mixture or composition can range from about 1% to about 70% by weight, or from about 1% to about 60% by weight, from about 1% to about 50% by weight, from about 1% to about 40% by weight, from about 1% to about 30% by weight, from about 5% to about 60% by weight, from about 5% to about 50% by weight, from about 5% to about 40% by weight, or from about 5% to about 30% by weight.

[0120] Any of the polar aprotic solvents described in this disclosure and any equivalents may be used in the methods of making the compounds or salts of formula (I) and (V).

[0121] In some embodiments, the concentration of the polar aprotic solvent in the mixture or composition can range from about 0.001% to about 30% by weight. In some embodiments, the concentration of the polar aprotic solvent in the mixture can range from about 0.001% to about 25% by weight, about 0.001% to about 20% by weight, about 0.01% to about 25% by weight, about 0.1% to about 25% by weight, about 0.5% to about 25% by weight, about 1% to about 25% by weight, about 1% to about 20% by weight, or about 1% to about 25% by weight. In some embodiments, the concentration of the polar aprotic solvent in the mixture can be 1%, 5%, or 10% by weight.

[0122] Any of the high temperature stable phase transfer catalysts described in this disclosure and any equivalents may be used in the process of making the compounds or salts of formula (I) and (V).

[0123] In some embodiments, the concentration of the high-temperature stable phase transfer catalyst in the mixture or composition can range from about 0.001% to about 30% by weight. In some embodiments, the concentration of the high-temperature stable phase transfer catalyst in the mixture or composition can range from about 0.001% to about 25% by weight, about 0.001% to about 20% by weight, about 0.01% to about 25% by weight, about 0.1% to about 25% by weight, about 0.5% to about 25% by weight, about 1% to about 25% by weight, about 1% to about 20% by weight, or about 1% to about 25% by weight. In some embodiments, the concentration of the polar aprotic solvent in the mixture can be 1%, 5%, or 10% by weight.

[0124] In some embodiments, the method of making a compound of Formula (I) or (V) or a salt thereof can include heating a mixture to a temperature of about 80°C to about 160°C. In some embodiments, the mixture can be heated to a temperature of about 80°C to about 120°C, about 90°C to about 120°C, or about 90°C to about 110°C. The mixture can be heated using any means suitable for raising the temperature to a suitable level. The heating system can be fuel-based, electric-based, or steam-based. For example, steam can be passed through a tube that contacts the mixture.

[0125] In some embodiments, the mixture may be heated for a period ranging from about 30 minutes to about 12 hours, hi some embodiments, the mixture may be heated for a period ranging from about 1 hour to about 12 hours, from about 2 hours to about 12 hours, from about 2 hours to about 10 hours, from about 4 hours to about 10 hours, or from 5 hours to about 10 hours.

[0126] In some embodiments, the mixture can have an active agent concentration of about 1 to about 50% by weight, where "active agent concentration" refers to the concentration of the compounds of Formula (III) and Formula (IV) or the compounds of Formula (III) and Formula (VI). In some embodiments, the mixture can have an active agent concentration of about 10% to about 50% by weight, about 20% to about 50% by weight, about 20% to about 45% by weight, about 25% to about 45% by weight, or about 25% to about 40% by weight.

[0127] In some embodiments, the methods described herein may include adding a carboxylic acid to the mixture after the heating step. As used herein, "carboxylic acid" refers to an organic compound containing a carboxyl group. In some embodiments, the carboxylic acid may be a substituted or unsubstituted C1-C 32 The carboxylic acid may be an alkyl carboxylic acid. In some embodiments, the carboxylic acid reacts with the unreacted compound of Formula (III). In certain embodiments, the carboxylic acid may be acetic acid or formic acid. Other carboxylic acids that may be used include, but are not limited to, butanoic acid, carbonic acid, propionic acid, pentanoic acid, hexanoic acid, heptanoic acid, octanoic acid, nonanoic acid, glycolic acid, and the like. The amount of carboxylic acid added to the mixture may be about 0.01% to about 10% by weight. In some embodiments, the amount of carboxylic acid added to the mixture may be about 0.1% to about 5% by weight, about 1% to about 5% by weight, or about 1% to about 4% by weight. In some embodiments, the amount of carboxylic acid added to the mixture may be about 1%, about 2%, about 3%, about 4%, about 5%, about 6%, about 7%, about 8%, about 9%, or about 10% by weight.

[0128] In some embodiments, compositions prepared according to the methods described in this disclosure are disclosed. The methods of making compounds or salts of formula (I) or (V) can produce homogeneous compositions that can be used for corrosion inhibition without further purification.

[0129] In some embodiments, the compositions of the present disclosure may be used in pharmaceuticals, in some embodiments, the compositions of the present disclosure may be used in agricultural chemicals, in some embodiments, the compositions of the present disclosure may be used to inhibit corrosion.

[0130] In some embodiments, a method for inhibiting corrosion is disclosed.

[0131] The present disclosure provides methods for using heterocyclic compounds and formulations containing heterocyclic compounds that are particularly useful for inhibiting corrosion of metal components in industrial water systems. In addition to aqueous systems, benzimidazoles capable of chelating with metals provide excellent corrosion resistance for metals. In particular, the addition of 2-pyridyl or benzyl alcohol-substituted benzimidazoles to aqueous systems in contact with metal surfaces provides excellent corrosion inhibition for metals such as copper. Furthermore, while benzotriazoles and benzimidazoles are generally unstable in the presence of oxidizing halide compounds, compounds of the present disclosure can 1,2-chelate with metals to provide exemplary protection for metals in the presence of oxidizing halide compounds. In particular, 2-(2-pyridyl)benzimidazole provides better corrosion protection in the presence of oxidizing halide compounds than benzimidazole, 2-phenylbenzimidazole, and tolyltriazole. Without wishing to be bound by any particular theory, it is believed that the compounds of the present disclosure form a protective film that is essentially impenetrable by common oxyhalogen compounds through bidentate chelation of the corrosion inhibitor with the metal surface. Thus, in certain embodiments, the methods of the present disclosure provide protection against metal corrosion in aqueous systems using oxyhalogen compounds as biocides.

[0132] In some embodiments, the present disclosure provides a method for inhibiting corrosion of a metal surface in contact with an aqueous system. The method can include adding any of the compositions described in the present disclosure to the aqueous system. For example, the composition can include a compound of Formula (I), an acid, and a polar aprotic solvent.

[0133] "Industrial water system" means any system that circulates water as its primary component. Non-limiting examples of "industrial water systems" include cooling systems, boiler systems, heating systems, membrane systems, papermaking systems, or other systems that circulate water.

[0134] The compounds of Formulas (I), (Ia), and (II) can provide corrosion protection for any metal or metal alloy, including, but not limited to, copper, iron, silver, steel (e.g., galvanized steel), and aluminum. In certain embodiments, a compound of Formula (I), (Ia), or (II) is added to an aqueous system in contact with a metal surface containing copper to inhibit metal corrosion. In certain embodiments, a compound of Formula (I), (Ia), or (II) is added to an aqueous system in contact with a metal surface containing a copper alloy to inhibit metal corrosion. In certain embodiments, copper forms a complex with one or more heteroatoms in the compound of Formula (I), (Ia), or (II). In certain embodiments, copper forms a complex with one or more heteroatoms in the compound of Formula (I), (Ia), or (II). Copper has a wide range of uses, including use as copper piping and copper tubing in plumbing and industrial machinery. Copper and copper alloys are well known for their use in cooling water and boiler water systems.

[0135] Compounds of formula (I), (Ia), and (II) can be used to protect any copper alloy, including bronze and brass. Bronze typically contains copper and tin but may contain other elements, including aluminum, manganese, silicon, arsenic, and phosphorus. Brass contains copper and zinc and is commonly used in the piping of water boiler systems. In certain embodiments, compounds of formula (I), (Ia), or (II) are added to aqueous systems in contact with metal surfaces containing bronze to inhibit metal corrosion. In certain embodiments, compounds of formula (I), (Ia), or (II) are added to aqueous systems in contact with metal surfaces containing brass, such as Admiralty brass, to inhibit metal corrosion. In certain embodiments, compounds of formula (I), (Ia), or (II) are added to aqueous systems in contact with metal surfaces containing copper-nickel alloys to inhibit metal corrosion.

[0136] In certain embodiments, compounds of Formula (I), (Ia), or (II) inhibit the corrosion of mild steel. In certain embodiments, compounds of Formula (I), (Ia), or (II) inhibit the corrosion of metal alloys, including, but not limited to, galvanized steel, stainless steel, cast iron, nickel, and combinations thereof. While not wishing to be bound by any particular theory, it is hypothesized that compounds of Formula (I), (Ia), and (II) inactivate Cu(II) in solution, preventing the formation of a galvanic cell on the steel surface. Thus, in certain embodiments, compounds of Formula (I), (Ia), or (II) inhibit the corrosion of mild steel.

[0137] The compounds of Formula (I), (Ia), and (II) can be added to the aqueous system at any dosage rate, but typically are added to the aqueous system at a dosage rate of about 0.01 ppm to about 500 ppm. In certain embodiments, the compounds of Formula (I), (Ia), or (II) are added to the aqueous system at a dosage of about 0.01 ppm to about 100 ppm. In certain embodiments, the compound of Formula (I), (Ia), or (II) is present at a concentration of from about 0.01 ppm to about 100 ppm, from about 0.01 ppm to about 75 ppm, from about 0.01 ppm to about 50 ppm, from about 0.01 ppm to about 25 ppm, from about 0.01 ppm to about 10 ppm, from about 0.01 ppm to about 5 ppm, from about 0.1 ppm to about 100 ppm, from about 0.1 ppm to about 75 ppm, from about 0.1 ppm to about 50 ppm, or from about 0.1 ppm to about 25 ppm. m, about 0.1 ppm to about 10 ppm, about 0.1 ppm to about 5 ppm, about 1 ppm to about 100 ppm, about 1 ppm to about 75 ppm, about 1 ppm to about 50 ppm, about 1 ppm to about 25 ppm, about 1 ppm to about 10 ppm, about 5 ppm to about 100 ppm, about 10 ppm to about 100 ppm, about 25 ppm to about 100 ppm, about 50 ppm to about 100 ppm, or about 80 ppm to about 100 ppm.

[0138] In certain embodiments, the aqueous system is a cooling water system. The cooling water system can be a closed-loop cooling water system or an open-loop cooling water system. In certain embodiments, a compound of Formula (I), (Ia), or (II) is added to a closed-loop cooling water system at a dosage rate of about 0.01 ppm to about 200 ppm. In certain embodiments, a compound of Formula (I), (Ia), or (II) is added to an open-loop cooling water system at a dosage rate of about 0.01 ppm to about 20 ppm.

[0139] The compounds of Formula (I), (Ia), and (II) are contacted with the metal surface by any suitable method. In certain embodiments, the solution of the compound of Formula (I), (Ia), or (II) is contacted with the metal surface by dipping, spraying, or other coating techniques. In certain embodiments, the solution of the compound of Formula (I), (Ia), or (II) is introduced into the water of the aqueous system by any conventional method and fed to the aqueous system on a periodic or continuous basis.

[0140] In some embodiments, the compositions disclosed herein may include a fluorescent organic compound. In certain embodiments, the fluorescent organic compound may be selected from rhodamine or a derivative thereof, an acridine dye, fluorescein or a derivative thereof, and combinations thereof. In certain embodiments, the compositions disclosed herein may include a fluorescently tagged polymer.

[0141] Those skilled in the art will understand that compounds of Formula (I), (Ia), or (II) can be added to aqueous systems alone or in combination with other corrosion inhibitors or treatment chemicals. Multiple corrosion inhibitors, including two or more compounds of Formula (I), (Ia), and / or Formula (II), can be administered as a combined corrosion inhibitor formulation, or each corrosion inhibitor can be added individually. Furthermore, compounds of Formula (I), (Ia), or (II) can be added to aqueous systems in combination with various additional corrosion inhibitors, including, but not limited to, triazoles, benzotriazoles (e.g., benzotriazole or tolyltriazole), benzimidazoles, orthophosphates, polyphosphates, phosphonates, molybdates, silicates, oximes, and nitrites. The compounds of formula (I), (Ia), and (II) may also be added to aqueous systems in combination with a variety of additional additives, such as treatment polymers, antimicrobial agents, antiscaling agents, colorants, fillers, buffers, surfactants, viscosity modifiers, chelating agents, dispersants, deodorizers, masking agents, oxygen scavengers, and indicator dyes.

[0142] In other embodiments, a method for making polybenzimidazole may include heating a mixture having diphenyl isophthalate, 3,3',4,4'-tetraaminodiphenyl, an acid, a polar aprotic solvent, and a high-temperature stable phase transfer catalyst, wherein the acid, polar aprotic solvent, and high-temperature stable phase transfer catalyst are as described herein.

[0143] Polybenzimidazoles are known for their high strength and high temperature performance. Polybenzimidazoles synthesized according to the methods disclosed herein can be used, for example, in semiconductors, contact seals, wafer carriers, insulator bushings, thermal insulation, light-emitting diodes, solar cells, fuel cells, and high-performance protective clothing. Other applications include those in the petrochemical and aerospace industries. [Example]

[0144] Example 1

[0145] Several condensation reactions between 1,2-phenylenediamine (OPD) and DL-mandelic acid to produce (1H-benzo[d]imidazol-2-yl)(phenyl)methanol were carried out at 100-110 °C for approximately 6-8 hours at approximately 30-35 wt% active material. The effects of various additives, such as high-temperature stable catalysts and cosolvents, on the uniformity of the reactions were investigated and are shown in Table 1. [Table 1]

[0146] Example 2

[0147] Several experiments were performed using approximately 5 wt. % sulfolane and approximately 3 wt. % acetic acid in the workup step. The HPLC analysis results are shown in Table 2. The results clearly show that the residual OPD concentration decreased by less than approximately 0.1 wt. %, making the resulting material compliant. Active matter refers to the weight percent concentrations of OPD and DL-mandelic acid at the start of the reaction.

[0148] Methanesulfonic acid, sulfolane, and water were charged to a round-bottom flask equipped with a magnetic stirrer, reflux condenser, and temperature probe. To this, DL-mandelic acid (1 equivalent) and 1,2-phenylenediamine (1 equivalent) were added, and the contents of the flask were refluxed at approximately 100-110°C for approximately 6-8 hours. After completion of the reaction, glacial acetic acid (3 wt%) was added, and reflux was maintained for an additional 1-3 hours. After workup, additional water was added to adjust the active material to approximately 20 wt%. Purity and residual OPD analysis were performed using NMR and HPLC. [Table 2]

[0149] Example 3: Synthesis of (1H-benzo[d]imidazol-2-yl)(phenyl)methanol [ka]

[0150] Methanesulfonic acid, sulfolane, and water were charged to a flask equipped with a magnetic stirrer, a reflux condenser, and a temperature probe. To this was added o-phenylenediamine (approximately 12.96 g, 1 equivalent) and DL-mandelic acid (approximately 19.15 g, 1.05 equivalents), and the contents of the flask were refluxed at approximately 110° C. After approximately 8 hours of reflux, approximately 3 g of acetic acid was added, and reflux was maintained for an additional approximately 3 hours to provide the title compound in approximately 97% yield.

[0151] Example 4: Synthesis of (5-chloro-1H-benzo[d]imidazol-2-yl)(phenyl)methanol [ka]

[0152] Methanesulfonic acid, sulfolane, and water were charged to a flask equipped with a magnetic stirrer, a reflux condenser, and a temperature probe. To this was added 4-chlorobenzene-1,2-diamine (21.85 g, 1 equivalent) and DL-mandelic acid (24.45 g, 1.05 equivalents), and the contents of the flask were refluxed at about 110° C. After about 8 hours of reflux, about 3 g of acetic acid was added, and reflux was maintained for about an additional 3 hours to provide the title compound in about 93% yield.

[0153] Example 5: (5-Bromo-1H-benzo[d]imidazol-2-yl)(phenyl)methanol [ka]

[0154] Methanesulfonic acid, sulfolane, and water were charged to a flask equipped with a magnetic stirrer, a reflux condenser, and a temperature probe. To this was added 4-bromobenzene-1,2-diamine (22.08 g, 1 equivalent) and DL-mandelic acid (19.15 g, 1.05 equivalents), and the contents of the flask were refluxed at about 110° C. After about 8 hours of reflux, about 3 g of acetic acid was added, and reflux was maintained for about an additional 3 hours to provide the title compound in about 94% yield.

[0155] Example 6: (5-methyl-1H-benzo[d]imidazol-2-yl)(phenyl)methanol [ka]

[0156] Methanesulfonic acid, sulfolane, and water were charged to a flask equipped with a magnetic stirrer, a reflux condenser, and a temperature probe. To this was added o-toluenediamine (18.3 g, 1 equivalent) and DL-mandelic acid (23.94 g, 1.05 equivalents), and the contents of the flask were refluxed at about 110° C. After about 8 hours of reflux, about 3 g of acetic acid was added, and reflux was maintained for about an additional 3 hours to provide the title compound in about 95% yield.

[0157] Prophetic Example 1: 2-(pyridin-2-yl)-1H-benzo[d]imidazole [ka]

[0158] Methanesulfonic acid, sulfolane, and water are charged to a flask equipped with a magnetic stirrer, a reflux condenser, and a temperature probe. To this, o-phenylenediamine (12.96 g, 1 equivalent) and picolinic acid (15.5 g, 1.05 equivalents) are added, and the contents of the flask are refluxed at approximately 110° C. After 8 hours of refluxing, acetic acid (2 g) is added, and reflux is maintained for an additional 3 hours to provide the title compound.

[0159] Prophetic Example 2: 2-Pentyl-1H-benzo[d]imidazole [ka]

[0160] Methanesulfonic acid, sulfolane, and water are charged to a flask equipped with a magnetic stirrer, reflux condenser, and temperature probe. To this, o-phenylenediamine (12.96 g, 1 equivalent) and hexanoic acid (15, 1.05 equivalents) are added, and the contents of the flask are refluxed at approximately 110° C. After 8 hours of refluxing, acetic acid (2 g) is added, and reflux is maintained for approximately another 3 hours to provide the title compound.

[0161] Prophetic Example 3: 2-Phenyl-1H-benzo[d]imidazole [ka]

[0162] Methanesulfonic acid, sulfolane, and water are charged to a flask equipped with a magnetic stirrer, a reflux condenser, and a temperature probe. To this, o-phenylenediamine (15.66 g, 1 equivalent) and benzoic acid (19 g, 1.05 equivalents) are added, and the contents of the flask are refluxed at approximately 110° C. After 8 hours of refluxing, acetic acid (2 g) is added, and reflux is maintained for approximately another 3 hours to provide the title compound.

[0163] The structures and chemical names of the compounds were prepared and determined using ChemDraw Professional version 15.1.

[0164] Any composition disclosed herein can comprise, consist of, or consist essentially of any of the compounds / components disclosed herein. In accordance with the present disclosure, phrases such as "consist essentially of," "consists essentially of," "consisting essentially of," and the like limit the scope of a claim to particular materials or steps, and to materials or steps that do not materially affect the basic and novel feature(s) of the claimed invention.

[0165] As used herein, the term "about" refers to a cited value that is within error resulting from the standard deviation found in their respective testing measurements; where such error cannot be determined, "about" refers to within 10% of the cited value.

[0166] All of the compositions and methods disclosed and claimed herein can be made and executed without undue experimentation in light of the present disclosure. The present invention may be embodied in many different forms, and certain preferred embodiments of the present invention are described in detail herein. The present disclosure is an exemplification of the principles of the present invention and is not intended to limit the invention to the specific embodiments illustrated. Additionally, unless expressly stated to the contrary, use of the term "a" is intended to include "at least one" or "one or more." For example, "a compound" is intended to include "at least one compound" or "one or more compounds."

[0167] Any range given in either absolute or approximate terms is intended to encompass both, and any definitions used herein are intended to be illustrative, not limiting. Notwithstanding that the numerical ranges and parameters setting forth the broad scope of the invention are approximations, the numerical values ​​set forth in the specific examples are reported as precisely as possible. However, any numerical value inherently contains certain errors necessarily resulting from the standard deviation found in their respective testing measurements. Furthermore, all ranges disclosed herein should be understood to encompass all subranges subsumed therein, including all fractional and whole values.

[0168] Furthermore, the present invention encompasses all possible combinations of any or all of the various embodiments described herein. It should also be understood that various changes and modifications to the preferred embodiments of the present invention described herein will be apparent to those skilled in the art. Such changes and modifications can be made without departing from the spirit and scope of the present invention and without diminishing its intended advantages. Accordingly, it is intended that such changes and modifications be covered by the appended claims. The following items [1] to

[29] list examples of embodiments of the present invention. [1] A composition comprising a compound of formula (I) or a salt thereof, an acid, and a polar aprotic solvent,

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[10] 10. The composition according to any one of items 1 to 9, wherein the composition is a homogeneous liquid.

[11] 11. The composition according to any one of items 1 to 10, further comprising a high-temperature stable phase transfer catalyst.

[12] Item 12. The composition of item 11, wherein the high-temperature stable phase transfer catalyst is selected from the group consisting of alkylguanidinium salts, arylguanidinium salts, alkylphosphonium salts, arylphosphonium salts, peralkylated phosphazenium salts, and any combination thereof.

[13] A process for making a compound of formula (V) or a salt thereof, comprising:

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[14] Item 14. The method of item 13, wherein the acid is a strong inorganic acid, a strong organic acid, or any combination thereof.

[15] 15. The method according to item 13 or 14, wherein the acid is selected from sulfuric acid, hydrochloric acid, nitric acid, methanesulfonic acid, phosphoric acid, hydrobromic acid, formic acid, acetic acid, propionic acid, oxalic acid, malic acid, citric acid, aminomethylphosphonic acid, p-toluenesulfonic acid, sulfamic acid, and any combination thereof.

[16] 16. The method according to any one of items 13 to 15, wherein the polar aprotic solvent is selected from acetonitrile, N,N-dimethylformamide, acetone, dimethyl sulfoxide, sulfolane, N-methylpyrrolidinone, methylsulfonylmethane, chlorobenzene, o-dichlorobenzene, nitromethane, an ionic liquid, and any combination thereof.

[17] 17. The method according to any one of items 13 to 16, wherein the high-temperature stable phase transfer catalyst is selected from the group consisting of alkylguanidinium salts, arylguanidinium salts, alkylphosphonium salts, arylphosphonium salts, peralkylated phosphazenium salts, and any combination thereof.

[18] 18. The method according to any one of items 13 to 17, wherein the mixture is heated to a temperature of about 80°C to about 160°C.

[19] 19. The method according to any one of items 13 to 18, wherein the mixture is heated for a period ranging from about 30 minutes to about 12 hours.

[20] 20. The method according to any one of items 13 to 19, wherein the active substance concentration of the mixture is about 1 to about 50% by weight.

[21] 21. The method according to any one of items 13 to 20, further comprising adding a carboxylic acid to the mixture.

[22] 13. Use of a composition according to any one of items 1 to 12 for inhibiting corrosion.

[23] A composition prepared according to the method of any one of items 13 to 21.

[24] A method for preparing polybenzimidazole, comprising heating a mixture comprising diphenyl isophthalate, 3,3',4,4'-tetraaminodiphenyl, an acid, a polar aprotic solvent, and a high-temperature stable phase transfer catalyst.

[25] 25. The method of claim 24, wherein the acid is a strong inorganic acid, a strong organic acid, or any combination thereof.

[26] 26. The method of claim 24, wherein the acid is selected from sulfuric acid, hydrochloric acid, nitric acid, methanesulfonic acid, phosphoric acid, hydrobromic acid, formic acid, acetic acid, propionic acid, oxalic acid, malic acid, citric acid, aminomethylphosphonic acid, sulfamic acid, p-toluenesulfonic acid, and any combination thereof.

[27] 27. The method according to any one of items 24 to 26, wherein the polar aprotic solvent is selected from acetonitrile, N,N-dimethylformamide, acetone, dimethyl sulfoxide, sulfolane, N-methylpyrrolidinone, methylsulfonylmethane, chlorobenzene, o-dichlorobenzene, nitromethane, an ionic liquid, and any combination thereof.

[28] 28. The method according to any one of items 24 to 27, wherein the high-temperature stable phase transfer catalyst is selected from the group consisting of alkylguanidinium salts, arylguanidinium salts, alkylphosphonium salts, arylphosphonium salts, peralkylated phosphazenium salts, and any combination thereof.

[29] 13. A method for inhibiting corrosion, comprising adding the composition according to any one of items 1 to 12 to an industrial water system containing a metal surface.

Claims

1. A composition comprising a compound of formula (I) or a salt thereof, methanesulfonic acid, and sulfolane, 【Chemical 1】 During the ceremony, X is independently hydrogen, halogen, or substituted or unsubstituted C １～５ alkyl group, and m is 1, 2, 3, or 4; R １ is hydrogen, substituted or unsubstituted C １ ~C １２ an alkyl group, or a substituted or unsubstituted C ６ is an aryl group, R ２ does not exist, R ３ is a bond or —CH(OH)—, Z is independently nitrogen or CX; the concentration of the compound of formula (I) or its salt in the composition is 1% by weight to 50% by weight; the concentration of the methanesulfonic acid in the composition is 5% by weight to 60% by weight; the concentration of the sulfolane in the composition is 0.001% by weight to 30% by weight; The composition is a homogeneous liquid.

2. The composition of claim 1 further comprising water.

3. X is independently hydrogen or halogen; R １ is hydrogen, R ２ does not exist, R ３ The composition according to claim 1 or 2, wherein is —CH(OH)—.

4. The composition of any one of claims 1 to 3, wherein at least one Z is nitrogen.

5. R ３ The composition of any one of claims 1 to 4, wherein is a bond and at least one Z is nitrogen.

6. 2. The composition of claim 1, wherein the compound or salt thereof is of formula (II): 【Chemistry 2】 During the ceremony, Y is independently hydrogen, halogen, or C １～５ an alkyl group and n is 1, 2, 3, 4, or 5.

7. Use of a composition according to any one of claims 1 to 6 for inhibiting corrosion.

8. A method for inhibiting corrosion comprising adding the composition of any one of claims 1 to 6 to an industrial water system containing a metal surface.

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