Vacuum Pumps and Exhaust Systems

Abstract

To provide a vacuum pump and an exhaust system which can improve workability at a site related to a piping structure part, a connector part, an interface panel, or a nameplate.SOLUTION: A vacuum pump 100 which has a pump main body 300 for sucking gas from an intake port 101 by the rotation of a rotating body 103, and a control device 200 for controlling the pump main body 300, and in which the pump main body 300 and the control device 200 are integrated with each other has: a piping structure part arranged at a casing 310 for rotatably accommodating the rotating body 103; a connector part arranged at the control device 200; an interface panel 210; and a nameplate 340 including a description related to the vacuum pump 100. A plurality of at least one of the piping structure part, the connector part, the interface panel 210, and the nameplate 340 have the same function at different phases with a rotating axis X of the rotating body 103 as a center are arranged.SELECTED DRAWING: Figure 5

Description

[Technical Field]

[0001] The present invention relates to vacuum pumps and evacuation systems. [Background technology]

[0002] It is necessary to create a high degree of vacuum inside semiconductor manufacturing equipment, liquid crystal manufacturing equipment, electron microscopes, surface analysis equipment, microfabrication equipment, etc. Vacuum pumps are used to create a high degree of vacuum inside these devices.

[0003] A vacuum pump has a pump body that draws gas through an intake port, a control device that controls the pump body, and a piping structure that connects to the piping of the factory equipment. The control device is generally provided with an interface panel that contains connectors for connecting communication cables and power cables for communicating with external devices. When installing a new vacuum pump or removing and installing it during an overhaul, workers need to access the piping structure and interface panel to perform their work.

[0004] In manufacturing facilities that use vacuum pumps, multiple vacuum pumps may be installed in each chamber of each manufacturing device. In such cases, the manufacturing devices are positioned with consideration given to the ease of transporting workpieces between devices and space saving, which can result in different phases (positions in the direction of rotation) that are easiest for workers to access depending on the vacuum pump. For this reason, multiple specifications are required in advance, with the phases of the vacuum pump's piping structure, interface panel, etc. changed to suit each chamber.

[0005] For this reason, for example, Patent Document 1 discloses a structure that allows the mounting phase of the power supply device relative to the pump body to be changed. By using the pump disclosed in Patent Document 1, the power supply device can be placed in a position that is easy to work with. [Prior art documents] [Patent documents]

[0006] [Patent Document 1] Patent No. 5353838 specification Summary of the Invention [Problem to be solved by the invention]

[0007] If a vacuum pump is provided with a structure that allows the mounting phase of the power supply unit relative to the pump body to be changed, the power supply unit must be detached from the pump body on-site, which is not practical as the work must be done in a limited space.

[0008] The present invention has been made to solve the above-mentioned problems, and aims to provide a vacuum pump and an exhaust system that can improve on-site workability related to piping structure parts, connector parts, interface panels, or nameplates. [Means for solving the problem]

[0009] One aspect of the vacuum pump according to the present invention that achieves the above object is a vacuum pump comprising a pump body that draws gas from an intake port by rotation of a rotor, and a control device that controls the pump body, the pump body and the control device being integrated together, the vacuum pump comprising a piping structure section disposed in a casing that rotatably houses the rotor, a connector section disposed in the control device, an interface panel, and a nameplate containing information related to the vacuum pump. ,before At least one of the connector section, the interface panel, and the nameplate is characterized in that a plurality of the connector sections, the interface panel, and the nameplate are arranged at different phases around the rotation axis of the rotating body, and have the same function. [Effects of the Invention]

[0010] One aspect of the vacuum pump configured as above is ,KoAt least one of the connector, interface panel, and nameplate is arranged with the same function in different phases, so that any of the configurations with the same function can be selected and used according to the available working space and the position of the connection object. ,Ko This improves on-site workability for connectors, interface panels, or nameplates.

[0011] before At least one of the connector portion, the interface panel, and the nameplate may be arranged in a point-symmetrical manner when viewed from the direction along the rotation axis of the rotating body. ,Ko At least one of the connector part, interface panel, and nameplate is efficiently spaced apart in different phases. Therefore, multiple components having the same function and arranged symmetrically about a point are efficiently distributed and arranged in different phases. Therefore, it is easy to find one component in a desired position from multiple components having the same function and arranged symmetrically about a point.

[0012] before At least one of the connector unit, the interface panel, and the nameplate may be arranged in a rotationally symmetrical manner when viewed along the rotation axis of the rotating body. This allows the multiple components having the same function to be arranged at equal intervals in the circumferential direction around the rotation axis. This makes it easier to find one of the multiple components having the same function in a desired position more effectively.

[0013] Another aspect of the vacuum pump according to the present invention that achieves the above object is a vacuum pump having a pump body that sucks gas from an intake port by rotation of a rotor, and further comprising a piping structure portion disposed in a casing that rotatably houses the rotor, the piping structure portion comprising an exhaust port that exhausts the gas from the pump body, a water intake port that takes in cooling water into the pump body, and a purge port that supplies purge gas to the pump body, and at least two of the exhaust port, the water intake port, and the purge port are disposed in multiple locations at different phases around the rotation axis of the rotor, and have the same function. You can select one from the multiple items that are placed and use it.It is characterized by the following.

[0014] Another aspect of the vacuum pump configured as above is At least two exhaust, intake, or purge ports However, since they are arranged with the same function in different phases, any of the configurations with the same function can be selected and used according to the available working space and the position of the connection object. Exhaust, intake, or purge port This can improve on-site workability.

[0015] The exhaust system according to the present invention, which achieves the above-mentioned object, is an exhaust system in which a plurality of the vacuum pumps are arranged and which has a back pump that assists the vacuum pump in exhausting from atmospheric pressure, and which is characterized by having a collecting section where pipes from the piping structure sections of the plurality of vacuum pumps are collected, and a booster pump that takes in air from the collecting section.

[0016] The exhaust system configured as described above can reduce the exhaust pipes at the end of the booster pump by including a booster pump, thereby saving space. Also, because each vacuum pump has multiple piping structures arranged at different phases around the rotation axis of the rotor, it is possible to select an appropriate piping structure for connecting each vacuum pump to the booster pump, making it easy to configure the system to exhaust from multiple vacuum pumps to a common booster pump. [Brief explanation of the drawings]

[0017] [Figure 1] FIG. 2 is a vertical cross-sectional view of a vacuum pump. [Figure 2] FIG. 2 is a circuit diagram of an amplifier circuit. [Figure 3] 10 is a time chart showing control when a current command value is larger than a detection value. [Figure 4] 10 is a time chart showing control when a current command value is smaller than a detection value. [Figure 5] FIG. 1 is a front view of a vacuum pump according to an embodiment. [Figure 6] FIG. 2 is a bottom view of the vacuum pump according to the embodiment. [Figure 7] FIG. 1 is a front view showing a manufacturing facility equipped with multiple vacuum pumps. [Figure 8] FIG. 8 is a bottom view of the vacuum pump of the manufacturing equipment shown in FIG. 7, viewed from below. [Figure 9] FIG. 10 is a front view showing another example of a manufacturing facility equipped with a plurality of vacuum pumps. [Figure 10] FIG. 10 is a vertical cross-sectional view showing a modified example of the vacuum pump. [Figure 11] FIG. 10 is a bottom view showing a modified example of the vacuum pump. DETAILED DESCRIPTION OF THE INVENTION

[0018] Hereinafter, embodiments of the present invention will be described with reference to the drawings. Note that dimensions in the drawings may be exaggerated for convenience of explanation and may differ from actual dimensions. Furthermore, in this specification and drawings, components having substantially the same functional configurations are designated by the same reference numerals, and redundant explanations will be omitted.

[0019] A vacuum pump 100 according to an embodiment of the present invention is a turbomolecular pump that exhausts gas by ejecting gas molecules with rotating blades of a rotor that rotates at high speed. The turbomolecular pump 100 is used to suck and exhaust gas from a chamber of, for example, a semiconductor manufacturing device. First, the basic configuration of the turbomolecular pump 100 will be described.

[0020] A longitudinal cross-sectional view of this turbomolecular pump 100 is shown in FIG. 1. In FIG. 1, the turbomolecular pump 100 has an intake port 101 formed at the upper end of a cylindrical outer cylinder 127. Inside the outer cylinder 127 is provided a rotor 103 having a plurality of rotors 102 (102a, 102b, 102c, etc.), which are turbine blades for sucking in and exhausting gas, formed radially and in multiple stages around its periphery. A rotor shaft 113 is attached to the center of this rotor 103, and this rotor shaft 113 is levitated and supported in the air and its position is controlled by, for example, a five-axis controlled magnetic bearing. The rotor 103 is generally made of metal such as aluminum or an aluminum alloy.

[0021] The upper radial electromagnets 104 are arranged in pairs on the X-axis and the Y-axis. Four upper radial sensors 107 are provided adjacent to the upper radial electromagnets 104 and corresponding to each upper radial electromagnet 104. The upper radial sensors 107 are, for example, inductance sensors or eddy current sensors having conductive windings, and detect the position of the rotor shaft 113 based on changes in the inductance of the conductive windings, which change according to the position of the rotor shaft 113. The upper radial sensors 107 are configured to detect the radial displacement of the rotor shaft 113, i.e., the rotating body 103 fixed thereto, and send the detected displacement to the control device 200.

[0022] In this control device 200, for example, a compensation circuit having a PID adjustment function generates an excitation control command signal for the upper radial electromagnet 104 based on a position signal detected by the upper radial sensor 107, and an amplifier circuit 150 (described later) shown in Figure 2 controls the excitation of the upper radial electromagnet 104 based on this excitation control command signal, thereby adjusting the upper radial position of the rotor shaft 113.

[0023] The rotor shaft 113 is made of a high magnetic permeability material (iron, stainless steel, etc.) and is attracted by the magnetic force of the upper radial electromagnets 104. Such adjustment is performed independently in the X-axis direction and the Y-axis direction. The lower radial electromagnets 105 and the lower radial sensors 108 are arranged in the same manner as the upper radial electromagnets 104 and the upper radial sensors 107, and adjust the radial position of the lower side of the rotor shaft 113 in the same manner as the radial position of the upper side.

[0024] Furthermore, axial electromagnets 106A and 106B are arranged above and below a circular metal disk 111 provided at the bottom of rotor shaft 113. Metal disk 111 is made of a highly magnetic permeable material such as iron. An axial sensor 109 is provided to detect the axial displacement of rotor shaft 113, and an axial position signal is sent to control device 200.

[0025] In the control device 200, a compensation circuit having, for example, a PID adjustment function generates excitation control command signals for the axial electromagnet 106A and the axial electromagnet 106B based on the axial position signal detected by the axial sensor 109, and the amplifier circuit 150 controls the excitation of the axial electromagnet 106A and the axial electromagnet 106B based on these excitation control command signals, so that the axial electromagnet 106A attracts the metal disc 111 upward by magnetic force, and the axial electromagnet 106B attracts the metal disc 111 downward, thereby adjusting the axial position of the rotor shaft 113.

[0026] In this way, the control device 200 appropriately adjusts the magnetic forces that the axial electromagnets 106A and 106B exert on the metal disk 111, magnetically levitating the rotor shaft 113 in the axial direction and holding it in space without contact. The amplifier circuit 150 that controls the excitation of the upper radial electromagnet 104, the lower radial electromagnet 105, and the axial electromagnets 106A and 106B will be described later.

[0027] Meanwhile, motor 121 has a plurality of magnetic poles arranged circumferentially so as to surround rotor shaft 113. Each magnetic pole is controlled by control device 200 so as to rotate rotor shaft 113 via electromagnetic force acting between the magnetic pole and rotor shaft 113. Motor 121 also incorporates a rotational speed sensor (not shown), such as a Hall element, resolver, or encoder, and the rotational speed of rotor shaft 113 is detected by the detection signal of this rotational speed sensor.

[0028] Furthermore, a phase sensor (not shown) is attached, for example, near the lower radial sensor 108, to detect the phase of rotation of the rotor shaft 113. The control device 200 uses the detection signals of both this phase sensor and the rotational speed sensor to detect the position of the magnetic pole.

[0029] A plurality of fixed blades 123 (123a, 123b, 123c...) are arranged at small gaps from the rotating blades 102 (102a, 102b, 102c...). Each of the rotating blades 102 (102a, 102b, 102c...) is formed at an angle of a predetermined degree from a plane perpendicular to the axis of the rotor shaft 113 in order to transport exhaust gas molecules downward through collision. The fixed blades 123 (123a, 123b, 123c...) are made of metal such as aluminum, iron, stainless steel, copper, or an alloy containing any of these metals as an ingredient.

[0030] Similarly, the fixed blades 123 are formed at a predetermined angle from a plane perpendicular to the axis of the rotor shaft 113, and are arranged in a staggered manner with the rows of rotor blades 102 toward the inside of the outer cylinder 127. The outer peripheral ends of the fixed blades 123 are supported by being inserted between a plurality of stacked rows of fixed blade spacers 125 (125a, 125b, 125c, etc.).

[0031] The fixed vane spacer 125 is a ring-shaped member made of a metal such as aluminum, iron, stainless steel, or copper, or an alloy containing any of these metals. An outer cylinder 127 is fixed to the outer periphery of the fixed vane spacer 125 with a small gap between them. A base portion 129 is disposed at the bottom of the outer cylinder 127. An exhaust port 133 is formed in the base portion 129 and communicates with the outside. Exhaust gas that enters the intake port 101 from the chamber (vacuum chamber) side and is transferred to the base portion 129 is sent to the exhaust port 133.

[0032] Furthermore, depending on the application of the turbomolecular pump 100, a threaded stator 131 (stator) is disposed between the lower part of the fixed vane spacer 125 and the base portion 129. The threaded stator 131 is a cylindrical member made of a metal such as aluminum, copper, stainless steel, iron, or an alloy containing any of these metals, and has a plurality of spiral thread grooves 131a engraved on its inner peripheral surface. The spiral direction of the thread grooves 131a corresponds to the direction in which exhaust gas molecules are transported toward the exhaust port 133 when they move in the rotation direction of the rotor 103. A cylindrical portion 102d hangs down from the lowest part of the rotor 103, adjacent to the rotor vanes 102 (102a, 102b, 102c, etc.). The outer peripheral surface of this cylindrical portion 102d is cylindrical and protrudes toward the inner peripheral surface of the threaded stator 131, and is located in close proximity to the inner peripheral surface of the threaded stator 131 with a predetermined gap therebetween. The exhaust gas transferred to the screw groove 131a by the rotor 102 and the fixed blade 123 is sent to the base portion 129 while being guided by the screw groove 131a.

[0033] The base portion 129 is a disk-shaped member that forms the base of the turbomolecular pump 100, and is generally made of metal such as iron, aluminum, stainless steel, etc. The base portion 129 not only physically holds the turbomolecular pump 100, but also functions as a heat conduction path, so it is desirable to use a metal that is rigid and has high thermal conductivity, such as iron, aluminum, or copper.

[0034] In this configuration, when the rotor 102 is rotated together with the rotor shaft 113 by the motor 121, the action of the rotor 102 and the stator 123 draws exhaust gas from the chamber through the intake port 101. The rotational speed of the rotor 102 is typically 20,000 rpm to 90,000 rpm, and the peripheral speed at the tip of the rotor 102 reaches 200 m / s to 400 m / s. The exhaust gas drawn in through the intake port 101 passes between the rotor 102 and the stator 123 and is transported to the base 129. At this time, the temperature of the rotor 102 rises due to frictional heat generated when the exhaust gas comes into contact with the rotor 102 and conduction of heat generated by the motor 121, but this heat is transferred to the stator 123 side by radiation or conduction through gas molecules of the exhaust gas.

[0035] The stator spacers 125 are joined together at their outer peripheries and transmit to the outside heat received by the stator 123 from the rotor 102 and frictional heat generated when exhaust gas comes into contact with the stator 123.

[0036] In the above description, the thread groove stator 131 is disposed on the outer periphery of the cylindrical portion 102d of the rotor 103, and the thread groove 131a is formed on the inner circumferential surface of the thread groove stator 131. However, conversely, there are also cases where a thread groove is formed on the outer circumferential surface of the cylindrical portion 102d, and a spacer having a cylindrical inner circumferential surface is disposed around the thread groove stator 131.

[0037] Depending on the application of the turbomolecular pump 100, the electrical equipment section may be surrounded by a stator column 122 to prevent the gas sucked in from the intake port 101 from entering the electrical equipment section, which is composed of the upper radial electromagnet 104, the upper radial sensor 107, the motor 121, the lower radial electromagnet 105, the lower radial sensor 108, the axial electromagnets 106A and 106B, the axial sensor 109, etc., and the interior of this stator column 122 may be kept at a predetermined pressure by purge gas.

[0038] In this case, piping (not shown) is provided in the base portion 129, and purge gas is introduced through this piping. The introduced purge gas is sent to the exhaust port 133 through gaps between the protective bearing 120 and the rotor shaft 113, between the rotor and stator of the motor 121, and between the stator column 122 and the inner cylindrical portion of the rotor blades 102.

[0039] Here, the turbomolecular pump 100 requires control based on specific parameters (e.g., various characteristics corresponding to the model) that have been individually adjusted and identified for the model. To store these control parameters, the turbomolecular pump 100 is provided with an electronic circuit section 141 within its body. The electronic circuit section 141 is composed of a semiconductor memory such as an EEPROM, electronic components such as semiconductor elements for accessing the memory, and a substrate 143 for mounting these components. The electronic circuit section 141 is housed below a rotational speed sensor (not shown) near the center of a base section 129 that constitutes the lower part of the turbomolecular pump 100, and is closed by an airtight bottom lid 145.

[0040] In the semiconductor manufacturing process, some process gases introduced into a chamber have the property of solidifying when their pressure exceeds a predetermined value or their temperature falls below a predetermined value. Inside the turbomolecular pump 100, the pressure of the exhaust gas is lowest at the inlet port 101 and highest at the outlet port 133. If the pressure of the process gas exceeds a predetermined value or the temperature falls below a predetermined value while the process gas is being transferred from the inlet port 101 to the outlet port 133, the process gas solidifies and adheres to and accumulates inside the turbomolecular pump 100.

[0041] For example, when SiCl4 is used as the process gas in an Al etching system, the low vacuum (760 [torr] to 10 -2The vapor pressure curve shows that at low pressures (approximately 20°C) and pressures of 100[torr], solid products (e.g., AlCl3) precipitate and adhere to and accumulate inside the turbomolecular pump 100. When process gas deposits accumulate inside the turbomolecular pump 100, these deposits narrow the pump flow path, causing a decrease in the performance of the turbomolecular pump 100. The aforementioned products tend to solidify and adhere to high-pressure areas near the exhaust port 133 and the grooved stator 131.

[0042] Therefore, in order to solve this problem, conventionally, a heater (not shown) or a circular water-cooled pipe 149 is wrapped around the outer periphery of the base portion 129, etc., and a temperature sensor (e.g., a thermistor) (not shown) is embedded in the base portion 129, and the heating of the heater and the cooling by the water-cooled pipe 149 are controlled based on the signal from this temperature sensor to maintain the temperature of the base portion 129 at a constant high temperature (set temperature) (hereinafter referred to as TMS; Temperature Management System).

[0043] Next, a description will be given of the amplifier circuit 150 that controls excitation of the upper radial electromagnets 104, the lower radial electromagnets 105, and the axial electromagnets 106A and 106B in the turbomolecular pump 100. A circuit diagram of this amplifier circuit 150 is shown in FIG.

[0044] 2, one end of the electromagnet winding 151 constituting the upper radial electromagnet 104 etc. is connected to a positive electrode 171a of a power supply 171 via a transistor 161, and the other end is connected to a negative electrode 171b of the power supply 171 via a current detection circuit 181 and a transistor 162. The transistors 161 and 162 are so-called power MOSFETs, and have a structure in which a diode is connected between the source and drain.

[0045] At this time, the transistor 161 has a diode cathode terminal 161a connected to the positive electrode 171a and an anode terminal 161b connected to one end of the electromagnet winding 151. The transistor 162 has a diode cathode terminal 162a connected to the current detection circuit 181 and an anode terminal 162b connected to the negative electrode 171b.

[0046] Meanwhile, current regeneration diode 165 has its cathode terminal 165a connected to one end of electromagnet winding 151 and its anode terminal 165b connected to negative electrode 171b. Similarly, current regeneration diode 166 has its cathode terminal 166a connected to positive electrode 171a and its anode terminal 166b connected to the other end of electromagnet winding 151 via current detection circuit 181. Current detection circuit 181 is configured, for example, with a Hall sensor type current sensor or an electrical resistance element.

[0047] The amplifier circuit 150 configured as above corresponds to one electromagnet. Therefore, if the magnetic bearing is controlled in five axes and there are a total of ten electromagnets 104, 105, 106A, and 106B, a similar amplifier circuit 150 is configured for each electromagnet, and the ten amplifier circuits 150 are connected in parallel to the power supply 171.

[0048] Furthermore, the amplifier control circuit 191 is configured, for example, by a digital signal processor section (hereinafter referred to as a DSP section) not shown in the figure of the control device 200, and this amplifier control circuit 191 is configured to switch the transistors 161 and 162 on / off.

[0049] The amplifier control circuit 191 compares the current value detected by the current detection circuit 181 (a signal reflecting this current value is called a current detection signal 191c) with a predetermined current command value. Based on the comparison result, the amplifier control circuit 191 determines the size of the pulse width (pulse width times Tp1 and Tp2) to be generated within a control cycle Ts, which is one period under PWM control. As a result, gate drive signals 191a and 191b having these pulse widths are output from the amplifier control circuit 191 to the gate terminals of the transistors 161 and 162.

[0050] It is necessary to control the position of rotor 103 at high speed and with strong force when, for example, the rotor 103 passes through a resonance point during acceleration of its rotational speed or when a disturbance occurs during constant-speed operation. For this reason, a high voltage of, for example, about 50 V is used as power supply 171 so that the current flowing through electromagnet winding 151 can be rapidly increased (or decreased). In addition, a capacitor (not shown) is usually connected between positive electrode 171a and negative electrode 171b of power supply 171 to stabilize power supply 171.

[0051] In this configuration, when both transistors 161 and 162 are turned on, the current flowing through the electromagnet winding 151 (hereinafter referred to as electromagnet current iL) increases, and when both are turned off, the electromagnet current iL decreases.

[0052] Furthermore, when one of the transistors 161 and 162 is turned on and the other is turned off, a so-called flywheel current is maintained. By passing a flywheel current through the amplifier circuit 150 in this manner, hysteresis loss in the amplifier circuit 150 can be reduced, and the power consumption of the entire circuit can be kept low. Furthermore, by controlling the transistors 161 and 162 in this manner, high-frequency noise such as harmonics generated in the turbomolecular pump 100 can be reduced. Furthermore, by measuring this flywheel current with the current detection circuit 181, the electromagnet current iL flowing through the electromagnet winding 151 can be detected.

[0053] That is, when the detected current value is smaller than the current command value, both transistors 161 and 162 are turned on for a time period corresponding to pulse width time Tp1 only once in a control cycle Ts (for example, 100 μs), as shown in Fig. 3. Therefore, during this period, the electromagnet current iL increases toward a current value iLmax (not shown) that can flow from the positive electrode 171a to the negative electrode 171b via the transistors 161 and 162.

[0054] On the other hand, if the detected current value is greater than the current command value, both transistors 161 and 162 are turned off for a time period corresponding to pulse width time Tp2 only once during the control cycle Ts, as shown in Fig. 4. Therefore, the electromagnet current iL during this period decreases toward a current value iLmin (not shown) that can be regenerated from the negative pole 171b to the positive pole 171a via diodes 165 and 166.

[0055] In either case, after the pulse width times Tp1 and Tp2 have elapsed, one of the transistors 161 and 162 is turned on. Therefore, a flywheel current is maintained in the amplifier circuit 150 during this period.

[0056] Next, the vacuum pump 100 according to this embodiment will be described. As shown in Figures 5 and 6, the vacuum pump 100 has a pump body 300 that draws gas from the intake port 101 by rotating a rotor 103, and a control device 200 that controls the pump body 300, and the pump body 300 and the control device 200 are integrated.

[0057] The pump body 300 has a casing 310 that rotatably houses the rotor 103, and is provided with the following piping structures in the casing 310: an exhaust port 133, a cooling water port 320 that circulates cooling water to the water-cooled pipe 149, a purge port (not shown) that supplies purge gas into the stator column 122, and a nameplate 340 that includes information related to the vacuum pump 100. The nameplate 340 lists, for example, the product name, model, year of manufacture, manufacturer, serial number, operating information such as voltage, rotation speed, and pressure, usage instructions, and caution information. The nameplate 340 may be provided in the control device 200.

[0058] Four exhaust ports 133 are provided at different phases around the rotation axis X of the rotor 103. The four exhaust ports 133 are arranged with point symmetry and rotational symmetry when viewed along the rotation axis X. The four exhaust ports 133 are preferably arranged evenly in the circumferential direction around the rotation axis X, but this is not limitative. The four exhaust ports 133 are arranged at the same position (the same height) along the rotation axis X, but may be arranged with a deviation along the rotation axis X. The four exhaust ports 133 are connected inside the casing 310 and have the same function of discharging gas. Therefore, if one exhaust port 133 is functional, the other exhaust ports 133 may not function and be closed. The number of exhaust ports 133 arranged at different phases around the rotation axis X is not limited to four.

[0059] Two cooling water ports 320 are provided at different phases around the rotation axis X of the rotor 103. The two cooling water ports 320 are arranged with point symmetry and rotational symmetry when viewed along the rotation axis X. The two cooling water ports 320 are preferably arranged evenly in the circumferential direction around the rotation axis X, but this is not limitative. The two cooling water ports 320 are arranged at the same position along the rotation axis X, but may be arranged offset along the rotation axis X. Each cooling water port 320 has an intake port 321 for taking in cooling water and an outlet port 322 for discharging cooling water, and has the same function. Therefore, if one cooling water port 320 is functional, the other cooling water port 320 may be closed by short-circuiting the intake port 321 and the outlet port 322 with a short pipe 323 (see FIG. 8 ). The number of cooling water ports 320 arranged at different phases around the rotation axis X is not limited to two.

[0060] Also, two or more purge ports and nameplates 340 may be provided at different phases around the rotation axis X of the rotor 103, but only one may be provided.

[0061] The control device 200 has a plurality of interface panels 210. The interface panels 210 are panels on which various connectors, switches, lamps, etc. are arranged. Each interface panel 210 is arranged with, for example, a power connector 211 (connector portion) to which a power cable can be connected, a communication connector 212 (connector portion) to which a cable for communicating with an external device (e.g., a computer, a monitor, etc.) can be connected, a power switch 213 to switch the power on and off, and notification lamps 214 to notify various operating conditions. Note that some of these functions (e.g., the connector portion) may be arranged in a position other than the interface panel 210.

[0062] Two interface panels 210 are provided at different phases around the rotation axis X of the rotating body 103. The two interface panels 210 are arranged with point symmetry and rotational symmetry when viewed along the rotation axis X. The two interface panels 210 are preferably arranged evenly in the circumferential direction around the rotation axis X, but this is not limitative. The two interface panels 210 are arranged at the same position along the rotation axis X, but may be arranged with a deviation in the direction along the rotation axis X. Each interface panel 210 has the same function. Therefore, as long as one interface panel 210 is functional, the other interface panel 210 does not need to be used. The unused interface panel 210 may be set to off so that it cannot be used.

[0063] Next, an example of using a plurality of vacuum pumps 100 according to this embodiment will be described. For example, as shown in the example arrangements in Figures 7 and 8, in one manufacturing facility, two vacuum pumps 100 having a common structure according to this embodiment are each connected to a chamber 400 of a different device. Each vacuum pump 100 is connected to the chamber 400 by an intake flange 350 provided with an intake port 101.

[0064] Each vacuum pump 100 has one exhaust port 133 connected to an exhaust pipe 401. The exhaust pipe 401 is connected to a back pump 402 that assists the vacuum pump 100 in exhausting from atmospheric pressure. The back pump 402 is, for example, a dry pump that does not use oil for airtightness. The vacuum pump 100 is surrounded by a removable wall panel 403, and the wall panel 403 is removed only when access to the vacuum pump 100 is required.

[0065] When installing or overhauling a vacuum pump 100, the space where workers work and the locations of the pipes, cables, etc. to be connected often differ depending on the vacuum pump 100. Each vacuum pump 100 has a common structure and has multiple exhaust ports 133, so that it is possible to select and use an exhaust port 133 that is easy to connect to the exhaust pipe 401 or that is easy to access from the available work space. An exhaust port 133 that is not connected to the exhaust pipe 401 and is not used is closed, as shown by the two-dot chain line in Figures 7 and 8.

[0066] Furthermore, since each vacuum pump 100 has multiple cooling water ports 320, it is possible to select and use a cooling water port 320 that is easy to connect to a cooling water pipe or that is easy to access from the available work space. An unused cooling water port 320 can be essentially closed by short-circuiting the water intake port 321 and the discharge port 322 with a short pipe 323, as shown by the two-dot chain line in Figure 8.

[0067] Furthermore, each vacuum pump 100 can select and use an interface panel 210 from the multiple interface panels 210 that is easy to connect to cables and the like, or that is easy to access from the available work space. An interface panel 210 that is not in use is turned off, as indicated by the two-dot chain line in FIG. 8 . It is also possible to use multiple interface panels 210 in combination. For example, some of the functions of the power connector 211, communication connector 212, power switch 213, and notification lamp 214 may be used on one interface panel 210, and the remaining functions may be used on the other interface panel 210. Alternatively, some of the functions may be available on both interface panels 210.

[0068] Furthermore, when a plurality of purge ports and nameplates 340 are provided, the purge ports and nameplates 340 in the appropriate phase for each vacuum pump 100 can be selected and used.

[0069] The vacuum pump 100 is capable of adjusting the phase of the intake flange 350 attached to the chamber 400. Therefore, if there are two or more piping structures (exhaust port 133, cooling water port 320, or purge port), connectors (power connector 211 or communication connector 212), interface panel 210, and / or nameplate 340 at different phases, adjusting them to match the phase of the intake flange 350 will enable the vacuum pump 100 to adequately accommodate a variety of situations.

[0070] FIG. 9 shows another example of an arrangement of multiple vacuum pumps 100 in a single manufacturing facility. This arrangement of the exhaust system includes a junction 410 where exhaust pipes 401 from each vacuum pump 100 converge, and a booster pump 411 that draws air from this junction 410. The booster pump 411 increases the exhaust speed. By providing the booster pump 411, the number of terminal exhaust pipes 412 from the booster pump 411 to the back pump 402 and the back pump 402 can be reduced by consolidating them into a single pipe. Therefore, by including the booster pump 411, this exhaust system can reduce the number of terminal exhaust pipes 412 and back pumps 402, thereby saving space. Furthermore, each vacuum pump 100 has multiple exhaust ports 133 (piping structure) that are arranged at different phases around the rotation axis X of the rotor 103. This allows each vacuum pump 100 to select the appropriate exhaust port 133, facilitating a configuration in which the vacuum pump 100 exhausts air to a common booster pump 411.

[0071] As described above, the vacuum pump 100 according to this embodiment includes a pump main body 300 that draws gas from the intake port 101 by the rotation of the rotor 103, and a control device 200 that controls the pump main body 300. The vacuum pump 100 is an integrated unit of the pump main body 300 and the control device 200, and includes a piping structure disposed in a casing 310 that rotatably houses the rotor 103, a connector disposed in the control device 200, an interface panel 210, and a nameplate 340 that includes information related to the vacuum pump 100. At least one of the piping structure, connector, interface panel 210, or nameplate 340 is arranged in multiple locations with the same function and at different phases around the rotation axis X of the rotor 103. As a result, at least one of the piping structure, connector, interface panel 210, or nameplate 340 is arranged in multiple locations with the same function and at different phases, allowing any of the configurations with the same function to be selected and used depending on the available space and the position of the object to be connected. Therefore, the vacuum pump 100 can improve on-site workability for the piping structure, connector, interface panel 210, or nameplate 340. Furthermore, since a single specification vacuum pump 100 can be used in a variety of situations, inventory can be reduced.

[0072] Furthermore, at least one of the piping structure unit, the connector unit, the interface panel 210, or the nameplate 340 is arranged in a point-symmetric manner when viewed from the direction along the rotation axis X of the rotating body 103. As a result, at least one of the piping structure unit, the connector unit, the interface panel 210, or the nameplate 340 is efficiently distributed and arranged in different phases. Therefore, multiple components having the same function arranged in point symmetry are efficiently spaced apart and arranged in different phases. Therefore, it is easy to find one component in a desired position from multiple components having the same function arranged in point symmetry. Note that the multiple piping structure units, the connector units, the interface panel 210, and the nameplate 340 do not necessarily have to be arranged in point symmetry.

[0073] Furthermore, at least one of the piping structure unit, connector unit, interface panel 210, and nameplate 340 is arranged in a rotationally symmetrical manner when viewed from the direction along the rotation axis X of the rotating body 103. As a result, the multiple components having the same function are arranged at equal intervals in the circumferential direction around the rotation axis X. Therefore, by selecting one of the multiple components having the same function, it is easier to more effectively find a compatible configuration within the available work space. Note that the multiple piping structure units, connector units, interface panel 210, and nameplate 340 do not necessarily have to be arranged in a rotationally symmetrical manner.

[0074] 9 is an exhaust system in which a plurality of vacuum pumps 100 are arranged and which includes a back pump 402 that assists the vacuum pumps 100 in exhausting from atmospheric pressure, and which includes a collecting section 410 where pipes from the piping structures of the plurality of vacuum pumps 100 are collected, and a booster pump 411 that takes in air from the collecting section 410. By including the booster pump 411, the exhaust system can reduce the number of exhaust pipes 412 distal to the booster pump 411, thereby saving space. Furthermore, each vacuum pump 100 has a plurality of exhaust ports 133 (piping structure) that are arranged at different phases around the rotation axis X of the rotor 103, so that an appropriate exhaust port 133 can be selected for connection from each vacuum pump 100 to the booster pump 411, making it easy to configure the plurality of vacuum pumps 100 to exhaust air to a common booster pump 411.

[0075] The present invention is not limited to the above-described embodiment, and various modifications may be made by those skilled in the art within the technical spirit of the present invention. For example, as in the modified examples shown in Figures 10 and 11, the pump body 300 may be separate from the control device. In this pump body 300, three exhaust ports 133 are provided at different phases around the rotation axis X of the rotor 103, and two cooling water ports 320 are provided at different phases around the rotation axis X of the rotor 103. Only one purge port 330 is provided, but multiple purge ports 330 may be provided at different phases around the rotation axis X of the rotor 103.

[0076] Furthermore, the mounting position of the vacuum pump 100 relative to the chamber 400 is not particularly limited, and for example, the vacuum pump 100 may be mounted on the side or above the chamber 400 rather than below it. Furthermore, the form of the vacuum pump 100 is not particularly limited, and may be, for example, a compound vane turbomolecular pump, a full vane turbomolecular pump, a drag pump, a centrifugal pump, or the like. [Explanation of symbols]

[0077] 100 Turbomolecular pump (vacuum pump) 101 Air intake 103 Rotating Body 133 Exhaust port (piping structure) 200 control device 210 Interface Panel 211 Power connector (connector part) 212 Communication connector (connector part) 213 Power Switch 214 Notification light 300 Pump body 310 Casing 320 Cooling water port (piping structure) 330 Purge port (piping structure) 340 Nameplate 350 intake flange 400 Chamber 401 Exhaust pipe 402 Back Pump 410 Assembly area 411 Booster Pump 412 End exhaust pipe X rotation axis

Claims

1. a pump body that draws gas through an intake port by rotation of a rotor; a control device for controlling the pump body, wherein the pump body and the control device are integrated into a vacuum pump, a piping structure portion disposed in a casing that rotatably accommodates the rotating body; a connector portion disposed in the control device; The interface panel and a nameplate containing inscriptions relating to the vacuum pump; a plurality of connector portions, interface panels, and nameplates, each of which has the same function, arranged at different phases around the rotation axis of the rotating body;

2. A vacuum pump as described in Claim 1, characterized in that at least one of the connector portion, the interface panel, or the nameplate is arranged in multiple points of symmetry when viewed from a direction along the rotation axis of the rotating body.

3. A vacuum pump as described in claim 1, characterized in that at least one of the connector portion, the interface panel, or the nameplate is arranged in multiple rotational symmetry when viewed from a direction along the rotation axis of the rotating body.

4. A vacuum pump having a pump body that draws gas from an intake port by rotation of a rotor, a piping structure portion disposed in a casing that rotatably accommodates the rotating body, The piping structure portion includes: an exhaust port for exhausting the gas from the pump body; a water intake port for introducing cooling water into the pump body; a purge port for supplying a purge gas to the pump body; At least two of the exhaust port, the water intake port, or the purge port are arranged in multiple locations at different phases around the rotation axis of the rotor, have the same function, and can be used by selecting one of the multiple arranged ports.

5. A plurality of the vacuum pumps according to claim 1 or 4 are arranged, An exhaust system having a back pump that assists the vacuum pump in exhausting from atmospheric pressure, a collecting section where pipes from the piping structure sections of the plurality of vacuum pumps are collected; and a booster pump that draws air from the collecting section.

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