Display panel and manufacturing method thereof

The display panel addresses high optimization costs by using multiple optical layers with varied refractive indices and light extraction layers to enhance display effects and reduce material costs in OLED panels.

JP7764457B2Active Publication Date: 2025-11-05SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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Patent Information

Application Number
JP2023216242
Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Priority Date
2022-12-22
Filing Date
2023-12-21
Publication Date
2025-11-05
Estimated Expiration
2043-12-21

AI Technical Summary

Technical Problem

The high optimization costs for pixels with different light-emitting colors in OLED display panels due to the use of single-component TCO films with uniform properties and thicknesses.

Method used

A display panel design with an optical adjustment layer comprising multiple optical layers of varying refractive indices, formed using magnetron sputtering with adjusted oxygen content and crystal morphology, to adapt to the optical needs of light-emitting units with different colors, and a light extraction layer with varying refractive indices to enhance display effects.

Benefits of technology

The solution improves the display effects of pixels with different light-emitting colors by optimizing the optical path and extraction efficiency, reducing material costs through adjusted refractive indices and crystal morphology.

✦ Generated by Eureka AI based on patent content.

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Abstract

To improve display effect of pixels of different light emission colors adaptively to optical needs of light emission units of different light emission colors.SOLUTION: There are disclosed a display panel and a method of manufacturing the same, and the display panel includes a substrate, a light emitting function layer, a first electrode layer, and an optical adjusting layer. The light emitting function layer includes a plurality of light emission units of different light emission colors, and the optical adjusting layer includes semiconductor oxide, and also includes at least a first optical layer and a second optical layer, wherein corresponding light emission units of the first optical layer and second optical layer differ in light emission color, and the refractive index of at least one film layer of the first optical layer is different from that of at least one film layer of the second optical layer. According to the present invention, when film deposition by magnetron sputtering is performed, the content of oxygen by a process gas is adjusted, the crystal form of a semiconductor material is adjusted, and the refractive indexes of the film layers of the optical adjusting layer are adjusted.SELECTED DRAWING: Figure 1
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Description

[Technical Field]

[0001] The present invention relates to the display field, and more particularly to a display panel and a manufacturing method thereof. [Background technology]

[0002] In recent years, OLED (Organic Light Emitting Diode) display panels have become popular with consumers due to their wide color gamut, fast response, high contrast, simple structure, and thinness. In OLED structures, TCO (Transparent Conductive Oxide) materials are widely used in OLED display panels due to their high conductivity, high transmittance, and suitable work function, which help to smooth the topography, protect the electrode metal, and compensate for optical thickness. The most common deposition method for TCO materials is magnetron sputtering, and different TCO films with different properties or types generally require the use of multiple machines. Therefore, the TCO film applied to the reflective electrode is usually a single component, and the TCO film properties and film thickness corresponding to each color light-emitting unit are the same. The optimization costs for pixels with different light-emitting colors are high.

[0003] Therefore, there is an urgent need for a display panel and a manufacturing method thereof to solve the above technical problems. Summary of the Invention [Problem to be solved by the invention]

[0004] The present invention provides a display panel and a manufacturing method thereof, which can alleviate the current technical problem of high optimization costs for pixels with different light-emitting colors. [Means for solving the problem]

[0005] The display panel provided by the present invention comprises: A substrate; a first electrode layer disposed on the substrate; an optical adjustment layer located on the first electrode layer, the optical adjustment layer comprising a semiconductor oxide; a light-emitting functional layer located on the optical adjustment layer, the light-emitting functional layer including a plurality of light-emitting units with different emission colors; Here, the optical adjustment layer includes at least a first optical layer and a second optical layer, the first optical layer corresponds to the light-emitting unit of one light-emitting color, and the second optical layer corresponds to the light-emitting unit of another light-emitting color, and the refractive index of at least one film layer of the first optical layer is different from the refractive index of at least one film layer of the second optical layer.

[0006] In some embodiments, at least one of the first optical layers includes a first sublayer and a second sublayer disposed adjacent to each other, the second sublayer being located between the first sublayer and the light-emitting functional layer, and wherein the refractive index of the second sublayer is greater than the refractive index of the first sublayer.

[0007] In some embodiments, the light-emitting functional layer includes at least a first organic sublayer, the first organic sublayer being located on a surface of the second sublayer away from one side of the substrate, and the refractive index of the second sublayer being greater than the refractive index of the first organic sublayer.

[0008] In some embodiments, at least one of the first optical layers includes a first sublayer, a second sublayer located on one side of the first sublayer closer to the light-emitting functional layer, and a third sublayer located between the second sublayer and the light-emitting functional layer, wherein the refractive index of the second sublayer is smaller than the refractive index of the first sublayer, and the refractive index of the second sublayer is smaller than the refractive index of the third sublayer.

[0009] In some embodiments, the light-emitting functional layer includes at least a first organic sublayer, the first organic sublayer being located on a surface of the third sublayer away from one side of the substrate, and the refractive index of the third sublayer being greater than the refractive index of the first organic sublayer.

[0010] In some embodiments, the number of film layers in the first optical layer is greater than the number of film layers in the second optical layer, and the wavelength of the corresponding color light of the first optical layer is longer than the wavelength of the corresponding color light of the second optical layer.

[0011] In some embodiments, the thickness of the first optical layers is greater than the thickness of the second optical layers.

[0012] In some embodiments, the display panel further includes a second electrode layer located on one side of the light-emitting functional layer away from the first electrode layer, and a light extraction layer located on one side of the second electrode layer away from the light-emitting functional layer, the light extraction layer including a semiconductor oxide, wherein the light extraction layer includes at least a first extraction layer and a second extraction layer, the first extraction layer corresponds to the light-emitting units of one light-emitting color and the second extraction layer corresponds to the light-emitting units of another light-emitting color, and the refractive index of at least one film layer of the first extraction layer is different from the refractive index of at least one film layer of the second extraction layer.

[0013] In some embodiments, at least one of the first extraction layers includes at least a first extraction sublayer and a second extraction sublayer, the first extraction sublayer being the film layer of the first extraction layer that is farthest from the light-emitting unit, and the second extraction sublayer being provided on one side surface of the first extraction sublayer that is closer to the second electrode layer, wherein the refractive index of the first extraction sublayer is greater than the refractive index of the second extraction sublayer.

[0014] In some embodiments, the optical adjustment layer further includes a third optical layer, and the refractive index of at least one film layer of the first optical layer, the refractive index of at least one film layer of the second optical layer, and the refractive index of at least one film layer of the third optical layer are different from each other, and the emission colors of the light-emitting units corresponding to the first optical layer, the second optical layer, and the third optical layer are different from each other.

[0015] In some embodiments, the thickness of the first optical layer is thicker than the thickness of the second optical layer, the thickness of the second optical layer is thicker than the thickness of the third optical layer, the number of film layers of the first optical layer is greater than the number of film layers of the second optical layer, the number of film layers of the second optical layer is greater than the number of film layers of the third optical layer, the wavelength of the corresponding color light of the first optical layer is longer than the wavelength of the corresponding color light of the second optical layer, and the wavelength of the corresponding color light of the second optical layer is longer than the wavelength of the corresponding color light of the third optical layer.

[0016] The method for manufacturing a display panel provided by the present invention includes the steps of: providing a first electrode layer; Using a magnetron sputtering technique, adding oxygen into a process gas, and forming at least a first optical layer and a second optical layer on the first electrode layer using a semiconductor oxide material, wherein the refractive index of at least one film layer of the first optical layer is different from the refractive index of at least one film layer of the second optical layer to form an optical adjustment layer; and forming a plurality of light-emitting units of different light-emitting colors on one side of the optical adjustment layer away from the first electrode layer, so as to form a light-emitting functional layer, wherein the first optical layer corresponds to the light-emitting units of one light-emitting color and the second optical layer corresponds to the light-emitting units of another light-emitting color. [Effects of the Invention]

[0017] The beneficial effects of the present invention are as follows: the present invention adjusts the refractive index of the film layer in the optical adjustment layer by adjusting the oxygen content in the process gas and adjusting the crystal morphology of the semiconductor material during film formation by magnetron sputtering, thereby adapting to the optical needs of light-emitting units with different light-emitting colors and improving the display effects of pixels with different light-emitting colors. [Brief explanation of the drawings]

[0018] In order to more clearly explain the technical solutions in the embodiments of the present invention, the following briefly introduces the drawings that are required to be used in describing the embodiments. Of course, the drawings described below are only a part of the embodiments of the present invention, and those skilled in the art can obtain other drawings based on the structures shown in these drawings without any creative efforts. [Figure 1] 1 is a structural schematic diagram of a display panel provided by an embodiment of the present invention; [Figure 2] 2 is a first enlarged schematic view of area A in FIG. 1. FIG. [Figure 3] FIG. 2 is a second enlarged schematic view of area A in FIG. [Figure 4] FIG. 2 is a third enlarged schematic view of area A in FIG. [Figure 5] FIG. 2 is a fourth enlarged schematic view of area A in FIG. [Figure 6] FIG. 2 is an enlarged schematic view of area C in FIG. [Figure 7] FIG. 2 is an enlarged schematic view of area D in FIG. [Figure 8] FIG. 2 is an enlarged schematic view of area E in FIG. [Figure 9] 2 is a flowchart illustrating steps of a method for manufacturing a display panel according to an embodiment of the present invention. [Figure 10A] 2 is a flowchart of a method for manufacturing a display panel provided by an embodiment of the present invention. [Figure 10B] 2 is a flowchart of a method for manufacturing a display panel provided by an embodiment of the present invention. [Figure 10C] 2 is a flowchart of a method for manufacturing a display panel provided by an embodiment of the present invention. [Figure 11] 1 is a structural schematic diagram of a display device provided by an embodiment of the present invention; DETAILED DESCRIPTION OF THE INVENTION

[0019] Hereinafter, the technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the drawings in the embodiments of the present invention. Obviously, the described embodiments are not all embodiments, but only some of the embodiments of the present invention. All other embodiments obtained by those skilled in the art based on the embodiments of the present invention without any creative work are within the scope of protection of the present invention. It should also be understood that the specific embodiments described herein are used only to explain and interpret the present invention, and do not limit the present invention. In the present invention, unless otherwise specified, the directional words "up" and "down" used generally refer to the up and down of the device in its actual use or operating state, specifically the drawing direction in the drawings, and "inside" and "outside" refer to the contour of the device.

[0020] In recent years, OLED (Organic Light Emitting Diode) display panels have become popular with consumers due to their wide color gamut, fast response, high contrast, simple structure, and thinness. In OLED structures, TCO (Transparent Conductive Oxide) materials are widely used in OLED display panels due to their high conductivity, high transmittance, and suitable work function, which help to smooth the topography, protect the electrode metal, and compensate for optical thickness. The most common deposition method for TCO materials is magnetron sputtering, and different TCO films with different properties or types generally require the use of multiple machines. Therefore, the TCO film applied to the reflective electrode is usually a single component, and the TCO film properties and film thickness corresponding to each color light-emitting unit are the same. The optimization costs for pixels with different light-emitting colors are high.

[0021] 1 to 8, a display panel 100 provided according to an embodiment of the present invention includes: Substrate 110 and a first electrode layer 200 located on the substrate 110; an optical adjustment layer 400 located on the first electrode layer 200, the optical adjustment layer 400 including a semiconductor oxide; a light-emitting functional layer (300) located on the optical adjustment layer (400), the light-emitting functional layer (300) including a plurality of light-emitting units (310) with different light emission colors; Here, the optical adjustment layer 400 includes at least a first optical layer 410 and a second optical layer 420, the first optical layer 410 corresponds to the light-emitting unit 310 of one light-emitting color, the second optical layer 420 corresponds to the light-emitting unit 310 of another light-emitting color, and the refractive index of at least one film layer of the first optical layer 410 is different from the refractive index of at least one film layer of the second optical layer 420.

[0022] The present invention adjusts the refractive index of the film layer in the optical adjustment layer by adjusting the oxygen content in the process gas and adjusting the crystal morphology of the semiconductor material during film formation by magnetron sputtering, thereby adapting to the optical needs of light-emitting units with different light colors and improving the display effect of pixels with different light colors.

[0023] The following describes the technical solution of the present invention in combination with specific examples.

[0024] In this embodiment, referring to FIGS. 1 and 2, the display panel 100 includes a substrate 110, a first electrode layer 200, a light-emitting functional layer 300, and an optical adjustment layer 400 located between the light-emitting functional layer 300 and the first electrode layer 200, the light-emitting functional layer 300 includes a plurality of light-emitting units 310 with different emission colors, the first electrode layer 200 is located on the light-emitting side away from the light-emitting functional layer 300, the optical adjustment layer 400 includes a semiconductor oxide, and the optical adjustment layer 400 includes at least a first optical layer 410 and a second optical layer 420, and the first The refractive index of at least one film layer of the optical layer 410 is different from the refractive index of at least one film layer of the second optical layer 420, and the first optical layer 410 is located between the light-emitting unit 310 of one light-emitting color and the first electrode layer 200, and the second optical layer 420 is located between the light-emitting unit 310 of another light-emitting color and the first electrode layer 200. For example, the first optical layer 410 corresponds to the light-emitting unit 310 that emits red light, and the second optical layer 420 corresponds to the light-emitting unit 310 that emits green light. In the figure, the red light-emitting unit 310 is designated by R, the green light-emitting unit 310 is designated by G, and the blue light-emitting unit 310 is designated by B.

[0025] The display panel 100 further includes a second electrode layer 500 located on one side of the light-emitting functional layer 300, away from the first electrode layer 200. A cavity is formed between the first electrode layer 200 and the second electrode layer 500, and the light extraction efficiency and light color purity can be improved by utilizing the microcavity effect. For example, since the wavelength of red light is longer than the wavelength of green light, the optical path of the red light needs to be longer than the optical path of the green light in order to improve the microcavity effect of the red light. When forming a film by magnetron sputtering, oxygen can be added to the process gas. In addition, by adjusting the oxygen content and adjusting the crystalline form of the semiconductor material, the refractive index of the film layer in the optical adjustment layer 400 can be adjusted, thereby adapting to the optical needs of the light-emitting units 310 of different light colors and improving the display effect of the pixels of different light colors. By utilizing the principle of the positive correlation between the optical path and the refractive index of the film layer, for example, the refractive index of the film layer of the optical adjustment layer 400 of the light-emitting unit 310 corresponding to red light can be increased, thereby lengthening the optical path of the red light and improving the micro-cavity effect of the red light, and improving the light extraction efficiency and light color purity.

[0026] In some embodiments, the light-emitting functional layer 300 can further adjust the length of the microcavities.

[0027] In some embodiments, the first electrode layer 200 is located on the light-emitting side away from the light-emitting functional layer 300, and the material of the first electrode layer 200 has a reflective function and a conductive function. The first electrode layer 200 includes one or more combinations of Ag, Al, Pt, Mo, Ti, Cu, and Mg, and the thickness of the first electrode layer 200 is 100 nm to 1000 nm.

[0028] In some embodiments, the light-emitting functional layer 300 includes at least a light-emitting material layer, and may further include a hole-injection layer, a hole-transport layer, an electron-transport layer and an electron-injection layer, an electron-blocking layer between the hole-transport layer and the light-emitting material layer, and a hole-blocking layer between the light-emitting material layer and the electron-transport layer, and the light-emitting functional layer 300 may be fabricated by one or more of vacuum deposition, spin-coating, printing, physical deposition, and chemical deposition methods.

[0029] In some embodiments, referring to FIGS. 1, 3, and 4, at least one of the first optical layers 410 includes at least two film layers, and the refractive indices of the at least two film layers of the first optical layer 410 are different.

[0030] The first optical layer 410 includes at least two film layers, and the at least two film layers of the first optical layer 410 have different refractive indices. The two film layers with different refractive indices are used to change the optical properties of the first optical layer 410 according to different optical needs, thereby achieving different optical effects and improving the display effect.

[0031] In some embodiments, referring to Figures 1, 3, and 4, at least one of the first optical layers 410 includes adjacent first and second sublayers 411 and 412, and the refractive index of the first sublayer 411 is different from the refractive index of the second sublayer 412.

[0032] The first sub-layer 411 and the second sub-layer 412 with different refractive indexes are arranged adjacent to each other, and their action on light rays is more direct, reducing the complex effect of the multi-layer film layer on light rays and the amount of calculation required to design the refractive index of the film layer. This is advantageous for modifying the optical properties of the first optical layer 410 according to different optical needs, thereby achieving different optical effects and improving the display effect.

[0033] In some embodiments, referring to Figures 1, 3 and 4, the second sublayer 412 is located between the first sublayer 411 and the light-emitting functional layer 300, and the refractive index of the second sublayer 412 is greater than the refractive index of the first sublayer 411.

[0034] The direction from the first sub-layer 411 to the second sub-layer 412 is the direction in which light rays exit the display panel 100, and the first sub-layer 411 and the second sub-layer 412 form a relatively low-high refractive index, which can increase the convergence of light rays, improve the light extraction efficiency, and improve the display effect.

[0035] 1 and 6 (b), in some embodiments, the light-emitting functional layer 300 includes at least a first organic sub-layer 301, the first organic sub-layer 301 being located on one surface of the second sub-layer 412 away from the substrate 110, the second sub-layer 412 having a refractive index greater than that of the first organic sub-layer 301, and the refractive index of the second sub-layer 412 being greater than that of a film layer closest to the second sub-layer 412 in the light-emitting functional layer 300. The first sub-layer 411-second sub-layer 412-first organic sub-layer 301 form a relative low-high-low refractive index. Utilizing the principle of optical waveguide, light can undergo multi-pass movement in the second sub-layer 412, thereby lengthening the optical path of the light ray and combining the microcavity effect to improve light extraction efficiency and light color purity. The optical path lengthening allows the thickness of the film layer to be reduced, thereby reducing material costs.

[0036] In some embodiments, when the light-emitting functional layer 300 comprises a light-emitting material layer, the first organic sub-layer 301 is a light-emitting material layer; when the light-emitting functional layer 300 comprises a light-emitting material layer and an electron blocking layer, the first organic sub-layer 301 is an electron blocking layer; when the light-emitting functional layer 300 comprises a light-emitting material layer, an electron blocking layer and a hole transport layer, the first organic sub-layer 301 is a hole transport layer; and when the light-emitting functional layer 300 comprises a light-emitting material layer, an electron blocking layer, a hole transport layer and a hole injection layer, the first organic sub-layer 301 is a hole injection layer.

[0037] In some embodiments, according to different display needs, the difference between the refractive index of the second sub-layer 412 and the refractive index of the first sub-layer 411, and the difference between the refractive index of the second sub-layer 412 and the refractive index of the film layer closest to the second sub-layer 412 in the light-emitting functional layer 300 are adjusted, thereby achieving different optical effects and improving the display effect.

[0038] In some embodiments, the second sub-layer 412 is located between the first sub-layer 411 and the light-emitting functional layer 300, wherein the refractive index of the second sub-layer 412 is less than that of the first sub-layer 411, and the first sub-layer 411 and the second sub-layer 412 form a relative high-low refractive index, which has the effect of diverging light rays and can further improve the display viewing angle of light rays.

[0039] In some embodiments, referring to Figures 1 and 5, at least one of the first optical layers 410 includes a first sublayer 411, a second sublayer 412 located on one side of the first sublayer 411 closer to the light-emitting functional layer 300, and a third sublayer 413 located between the second sublayer 412 and the light-emitting functional layer 300, wherein the refractive index of the second sublayer 412 is smaller than the refractive index of the first sublayer 411, and the refractive index of the second sublayer 412 is smaller than the refractive index of the third sublayer 413.

[0040] The first sub-layer 411-the second sub-layer 412-the third sub-layer 413 form a relative high-low-high refractive index, and the light passes through the second sub-layer 412 and the third sub-layer 413, and then the light passes through the low refractive index and heads toward the high refractive index film layer, which can increase the convergence of the light, improve the light extraction efficiency, and improve the display effect.

[0041] 1 and 6 (c), in some embodiments, the light-emitting functional layer 300 includes at least a first organic sub-layer 301, the first organic sub-layer 301 being located on one surface of the third sub-layer 413 away from the substrate 110, the third sub-layer 413 having a refractive index greater than that of the first organic sub-layer 301, and the refractive index of the third sub-layer 413 being greater than that of a film layer closest to the third sub-layer 413 in the light-emitting functional layer 300. The second sub-layer 412-third sub-layer 413-first organic sub-layer 301 form a relative low-high-low refractive index. Utilizing the principle of optical waveguide, light can undergo multi-pass movement in the third sub-layer 413, thereby lengthening the optical path of the light ray and combining the microcavity effect to improve light extraction efficiency and light color purity. The optical path lengthening allows the thickness of the film layer to be reduced, thereby reducing material costs.

[0042] In some embodiments, the refractive index of the first sub-layer 411 is different from the refractive index of the third sub-layer 413. According to different optical needs, the difference between the refractive index of the first sub-layer 411 and the refractive index of the third sub-layer 413 can be adjusted to achieve different optical effects and improve the display effect.

[0043] For example, the refractive index of the third sub-layer 413 is greater than that of the first sub-layer 411, which can increase the convergence of light rays and improve the light extraction efficiency; for example, the refractive index of the third sub-layer 413 is less than that of the first sub-layer 411, which can increase the scattering degree of light rays and increase the starting angle.

[0044] In some embodiments, referring to Figures 1 and 2, the first optical layer 410 may include one film layer, for example, a first sub-layer 411, and the refractive index of the film layer may be set to be large within a suitable range in order to increase the convergence of light rays and improve light extraction efficiency. Also, referring to diagram (a) in Figure 6, the first electrode layer 200-first sub-layer 411-second electrode layer 500 form a relative low-high-low refractive index, and by utilizing the principle of optical waveguide, the light rays can undergo multi-pass movement in the first sub-layer 411, thereby lengthening the optical path of the light rays and combining the microcavity effect to improve light extraction efficiency and light color purity. The optical path of the light rays can be lengthened while reducing the thickness of the film layer, thereby reducing material costs.

[0045] In some embodiments, with reference to FIGS. 1, 3, and 5, the number of film layers in first optical layers 410 is different from the number of film layers in second optical layers 420.

[0046] According to the wavelength of different color light, different numbers of film layers are combined to improve the optical performance of different color light.

[0047] In some embodiments, referring to Figures 1, 3, and 5, the number of film layers in the first optical layer 410 is greater than the number of film layers in the second optical layer 420, and the wavelength of the corresponding color light in the first optical layer 410 is longer than the wavelength of the corresponding color light in the second optical layer 420.

[0048] In order to improve the microcavity effect and increase the light extraction efficiency and light color purity, color light with a relatively long wavelength needs to be combined with film layers with a relatively long optical path, and the number of film layers is positively correlated with the thickness of the film layers, which in turn is positively correlated with the optical path. In addition, increasing the number of film layers can also improve the diversity of the optical improvement direction and adapt to different optical needs.

[0049] 1, 3, and 5, in some embodiments, the thickness of the first optical layer 410 is greater than the thickness of the second optical layer 420. The wavelength of the corresponding color light of the first optical layer 410 is longer than the wavelength of the corresponding color light of the second optical layer 420. Within an appropriate film layer thickness range, color light with a longer wavelength needs to be combined with a film layer with a longer optical path. The more film layers there are, the thicker the film layer will be and the longer the optical path of the film layer will be, which can improve the microcavity effect and enhance the light extraction efficiency and light color purity.

[0050] In some embodiments, referring to Figures 1, 3 and 5, the optical adjustment layer 400 further includes a third optical layer 430, and the third optical layer 430 corresponds to a light-emitting unit 310 of one light-emitting color, and the light-emitting colors of the light-emitting units 310 corresponding to the first optical layer 410, the second optical layer 420 and the third optical layer 430 are different from each other.

[0051] In some embodiments, the refractive index of at least one film layer of the first optical layer 410, the refractive index of at least one film layer of the second optical layer 420, and the refractive index of at least one film layer of the third optical layer 430 are different from each other.

[0052] In some embodiments, the refractive index of at least one film layer of the first optical layer 410 is different from the refractive index of at least one film layer of the third optical layer 430, and the refractive index of at least one film layer of the second optical layer 420 is different from the refractive index of at least one film layer of the third optical layer 430.

[0053] In some embodiments, referring to Figures 1 and 3, the light beams of the light-emitting units 310 of the light-emitting functional layer 300 may be any of red, green, and blue, and it can be understood that the first optical layer 410 may correspond to the red light-emitting unit 310, the second optical layer 420 may correspond to the green light-emitting unit 310, and the third optical layer 430 may correspond to the blue light-emitting unit 310.

[0054] In some embodiments, the structures of the second optical layer 420 and the third optical layer 430 may refer to any of the structures of the first optical layer 410 described above, and are adjusted based on different color lights, and the description thereof will be omitted here.

[0055] 1 and 5 , in some embodiments, the thickness of the first optical layer 410 is greater than the thickness of the second optical layer 420, and the thickness of the second optical layer 420 is greater than the thickness of the third optical layer 430. The number of film layers in the first optical layer 410 is greater than the number of film layers in the second optical layer 420, and the number of film layers in the second optical layer 420 is greater than the number of film layers in the third optical layer 430. The wavelengths of the corresponding color lights of the first optical layer 410 are longer than the wavelengths of the corresponding color lights of the second optical layer 420. The wavelengths of the corresponding color lights of the second optical layer 420 are longer than the wavelengths of the corresponding color lights of the third optical layer 430.

[0056] Within the appropriate range of film layer thickness, color light with a relatively long wavelength needs to be combined with a film layer with a relatively long optical path. The more film layers there are, the thicker the film layer will be and the longer the optical path of the film layer will be, which can improve the microcavity effect and increase the light extraction efficiency and light color purity.

[0057] In some embodiments, the refractive index of any one of the optical adjustment layers 400 is 1.8 to 2.5, the material is one or more semiconductor oxides such as IZO, ITO, AZO, IGZO, etc., and the thickness of the optical adjustment layer 400 is 30 nm to 3000 nm. Here, the number of film layers in the optical adjustment layer 400 may be 1 to 6, and preferably 2 to 3.

[0058] In some embodiments, the display panel 100 further includes an auxiliary adjusting layer located on either one or both sides of the optical adjusting layer 400, the auxiliary adjusting layer including an organic material, and the high refractive index of the optical adjusting layer 400 allows the amount of organic material in the auxiliary adjusting layer to be reduced, thereby saving materials and reducing costs.

[0059] In some embodiments, referring to Figures 1 and 7, the display panel 100 further includes a second electrode layer 500 located on one side of the light-emitting functional layer 300 away from the first electrode layer 200, and a light extraction layer 600 located on one side of the second electrode layer 500 away from the light-emitting functional layer 300, wherein the light extraction layer 600 includes a semiconductor oxide, and the light extraction layer 600 includes at least a first extraction layer 610 and a second extraction layer 620, wherein the first extraction layer 610 corresponds to the light-emitting units 310 of one emission color and the second extraction layer 620 corresponds to the light-emitting units 310 of another emission color, and the refractive index of at least one film layer of the first extraction layer 610 is different from the refractive index of at least one film layer of the second extraction layer 620.

[0060] During film formation by magnetron sputtering, oxygen is added to the process gas to adjust the oxygen content and the crystal morphology of the semiconductor material, thereby adjusting the refractive index of the film layer in the light extraction layer 600, thereby adapting to the optical needs of the light-emitting units 310 of different light colors, improving the optical performance, and improving the display effect of pixels of different light colors.

[0061] In some embodiments, the second electrode layer 500 is a film having a single-layer or multi-layer composite structure, and the material includes one or more combinations of Ag, Al, Pt, Mo, Ti, Cu, and Mg, and the thickness of the second electrode layer 500 is 1 nm to 100 nm.

[0062] In some embodiments, referring to Figure 1 and Figure 8, diagram (b), at least one of the first extraction layers 610 includes at least a first extraction sublayer 611 and a second extraction sublayer 612, wherein the first extraction sublayer 611 is the film layer of the first extraction layer 610 that is farthest from the light-emitting unit 310, and the second extraction sublayer 612 is provided on one side surface of the first extraction sublayer 611 that is closer to the second electrode layer 500, and wherein the refractive index of the first extraction sublayer 611 is greater than the refractive index of the second extraction sublayer 612.

[0063] The refractive index of the film layer farthest from the light emitting unit 310 in the first extraction layer 610 is relatively high, which can improve the focusing effect of the first extraction layer 610 and the light extraction efficiency.

[0064] In some embodiments, referring to Figure 1 and Figure 8, diagram (c), the first extraction layer 610 includes a first extraction sublayer 611, a second extraction sublayer 612, and a third extraction layer 630, wherein the first extraction sublayer 611 is the film layer of the first extraction layer 610 that is farthest from the light-emitting unit 310, the second extraction sublayer 612 is provided on one side surface of the first extraction sublayer 611 that is closer to the second electrode layer 500, and the third extraction organic sublayer 613 is provided on one side surface of the second extraction sublayer 612 that is closer to the second electrode layer 500, wherein the refractive index of the first extraction sublayer 611 is greater than the refractive index of the second extraction sublayer 612, and the refractive index of the third extraction organic sublayer 613 is greater than the refractive index of the second extraction sublayer 612.

[0065] In some embodiments, referring to FIG. 1 and FIG. 8 (a), the first extraction layer 610 may include one film layer, for example, a first extraction sub-layer 611, and the refractive index of the film layer may be set to be large within a suitable range in order to increase the convergence of light rays and improve the light extraction efficiency.

[0066] In some embodiments, the refractive index of any one of the light extraction layers 600 is 1.8 to 2.5, the material includes one or more semiconductor oxides such as IZO, ITO, AZO, and IGZO, and the thickness of the light extraction layer 600 is 30 nm to 3000 nm.

[0067] In some embodiments, light extraction layer 600 further comprises an organic material with a molecular weight of 100-800.

[0068] In some embodiments, the number of film layers in light extraction layer 600 may be 1 to 6, and preferably 2 to 3.

[0069] In some embodiments, referring to Figures 1 and 7, the light extraction layer 600 further includes a third extraction layer 630, and the third extraction layer 630 corresponds to a light-emitting unit 310 of one emission color, and the emission colors of the light-emitting units 310 corresponding to the first extraction layer 610, the second extraction layer 620, and the third extraction layer 630 are different from each other.

[0070] In some embodiments, as can be understood with reference to Figures 1 and 7, the first outcoupling layer 610 may correspond to the red light-emitting unit 310, the second outcoupling layer 620 may correspond to the green light-emitting unit 310, and the third outcoupling layer 630 may correspond to the blue light-emitting unit 310.

[0071] In some embodiments, the structures of the second extraction layer 620 and the third extraction layer 630 may refer to any of the structures of the first extraction layer 610 described above, and are adjusted based on different color light, and the description here is omitted.

[0072] In some embodiments, the display panel 100 further includes a diffusion layer located on one side of the light extraction layer 600 away from the first electrode layer 200, where the refractive index of the film layer of the diffusion layer closest to the light extraction layer 600 is smaller than the refractive index of the film layer of the light extraction layer 600 closest to the diffusion layer. The effect of using the diffusion layer to diverge light can further improve the display viewing angle of light.

[0073] In some embodiments, referring to FIG. 1, the display panel 100 further includes a substrate 110 and an array substrate 120 located between the substrate 110 and the first electrode layer 200 .

[0074] In some embodiments, the array substrate 120 includes an active layer located on the substrate 110, a first insulating layer located on the active layer, a gate layer located on the first insulating layer, a second insulating layer located on the gate layer, a source / drain electrode layer located on the second insulating layer, and a third insulating layer located on the source / drain electrode layer.

[0075] In some embodiments, the substrate 110 may be a rigid substrate 110 or a flexible substrate 110, and materials for the rigid substrate 110 include, but are not limited to, glass, ceramic, metal, alloy, silicon wafer, etc., and materials for the flexible substrate 110 include, but are not limited to, polyethylene, polystyrene, polyvinyl chloride, polyamide, polyimide, polyethylene naphthalate, polyethylene terephthalate, and homologs, isomers, and polymers having hydrocarbon groups, aromatic rings, or heterocyclic groups with 1 to 16 carbon atoms, 1 to 9 nitrogen atoms, and 1 to 5 oxygen atoms.

[0076] The present invention adjusts the refractive index of the film layer in the optical adjustment layer by adjusting the oxygen content in the process gas and adjusting the crystal morphology of the semiconductor material during film formation by magnetron sputtering, thereby adapting to the optical needs of light-emitting units with different light colors and improving the display effect of pixels with different light colors.

[0077] Referring to FIG. 9, a manufacturing method of the display panel 100 provided according to an embodiment of the present invention includes: Step S100 of providing a first electrode layer 200; Step S200: using magnetron sputtering technology, adding oxygen into process gas, and using semiconductor oxide material to form at least a first optical layer 410 and a second optical layer 420 on the first electrode layer 200, and the refractive index of at least one film layer of the first optical layer 410 is different from the refractive index of at least one film layer of the second optical layer 420, so as to form an optical adjustment layer 400; and step S300, in which a plurality of light-emitting units 310 with different light-emitting colors are formed on one side of the optical adjustment layer 400 away from the first electrode layer 200, so as to form a light-emitting functional layer 300, in which the first optical layer 410 corresponds to the light-emitting units 310 with one light-emitting color and the second optical layer 420 corresponds to the light-emitting units 310 with another light-emitting color.

[0078] The present invention adjusts the refractive index of the film layer in the optical adjustment layer by adjusting the oxygen content in the process gas and adjusting the crystal morphology of the semiconductor material during film formation by magnetron sputtering, thereby adapting to the optical needs of light-emitting units with different light colors and improving the display effect of pixels with different light colors.

[0079] The following describes the technical solution of the present invention in combination with specific examples.

[0080] In this embodiment, the manufacturing method of the display panel 100 includes steps S100 to S300.

[0081] In S100, referring to FIG. 10A, a first electrode layer 200 is provided.

[0082] In some embodiments, the first electrode layer 200 is located on the light-emitting side away from the light-emitting functional layer 300, and the material of the first electrode layer 200 has a reflective function and a conductive function. The first electrode layer 200 includes one or more combinations of Ag, Al, Pt, Mo, Ti, Cu, and Mg, and the thickness of the first electrode layer 200 is 100 nm to 1000 nm.

[0083] In S200, referring to FIG. 10B, using a magnetron sputtering technique, oxygen is added into the process gas, and at least a first optical layer 410 and a second optical layer 420 are formed on the first electrode layer 200 using a semiconductor oxide material, and the refractive index of at least one film layer of the first optical layer 410 is different from the refractive index of at least one film layer of the second optical layer 420 to form an optical adjustment layer 400.

[0084] In some embodiments, step S200 includes: The method includes a step S210 of using a magnetron sputtering technique to add oxygen into a process gas, and using a semiconductor oxide material to form at least a first optical layer 410, a second optical layer 420, and a third optical layer 430 on the first electrode layer 200, wherein the refractive index of at least one film layer of the first optical layer 410, the refractive index of at least one film layer of the second optical layer 420, and the refractive index of at least one film layer of the third optical layer 430 are different from each other, thereby forming an optical adjustment layer 400.

[0085] In some embodiments, the refractive index of at least one film layer in the first optical layer 410 differs from the refractive index of at least one film layer in the third optical layer 430, and the refractive index of at least one film layer in the second optical layer 420 differs from the refractive index of at least one film layer in the third optical layer 430.

[0086] In some embodiments, referring to Figures 1, 3 and 5, the optical adjustment layer 400 further includes a third optical layer 430, and the third optical layer 430 corresponds to a light-emitting unit 310 of one light-emitting color, and the light-emitting colors of the light-emitting units 310 corresponding to the first optical layer 410, the second optical layer 420 and the third optical layer 430 are different from each other.

[0087] 1 and 5 , in some embodiments, the thickness of the first optical layer 410 is greater than the thickness of the second optical layer 420, and the thickness of the second optical layer 420 is greater than the thickness of the third optical layer 430. The number of film layers in the first optical layer 410 is greater than the number of film layers in the second optical layer 420, and the number of film layers in the second optical layer 420 is greater than the number of film layers in the third optical layer 430. The wavelengths of the corresponding color lights of the first optical layer 410 are longer than the wavelengths of the corresponding color lights of the second optical layer 420. The wavelengths of the corresponding color lights of the second optical layer 420 are longer than the wavelengths of the corresponding color lights of the third optical layer 430.

[0088] In some embodiments, referring to Figures 1 and 3, the light beams of the light-emitting units 310 of the light-emitting functional layer 300 may be any of red, green, and blue, and it can be understood that the first optical layer 410 may correspond to the red light-emitting unit 310, the second optical layer 420 may correspond to the green light-emitting unit 310, and the third optical layer 430 may correspond to the blue light-emitting unit 310.

[0089] In some embodiments, the structures of the second optical layer 420 and the third optical layer 430 may refer to any of the structures of the first optical layer 410 described above, and are adjusted based on different color lights, and the description thereof will be omitted here.

[0090] In some embodiments, the process gas further comprises an inert gas and / or nitrogen gas, which may be argon gas. The refractive index of the film can be adjusted by adjusting the content of oxygen gas in the process gas to adjust the crystalline morphology of the semiconductor material, eliminating the need to replace or increase the target or magnetron sputtering device, thereby reducing material and equipment costs. Here, the oxygen content in the process gas is 0% to 50%, preferably 0.01% to 20%, and the refractive index of the film can be adjusted in the range of 1.8 to 2.5.

[0091] In S300, referring to FIG. 10C, a plurality of light-emitting units 310 with different light-emitting colors are formed on one side of the optical adjustment layer 400 away from the first electrode layer 200, so as to form a light-emitting functional layer 300, the first optical layer 410 corresponds to the light-emitting units 310 of one light-emitting color, and the second optical layer 420 corresponds to the light-emitting units 310 of another light-emitting color.

[0092] In some embodiments, referring to Figures 1 and 5, the optical adjustment layer 400 further includes a third optical layer 430, and the third optical layer 430 corresponds to a light-emitting unit 310 of one light-emitting color, and the light-emitting colors of the light-emitting units 310 corresponding to the first optical layer 410, the second optical layer 420, and the third optical layer 430 are different from each other.

[0093] In some embodiments, referring to Figures 1 and 5, the light beams of the light-emitting units 310 of the light-emitting functional layer 300 may be any of red, green, and blue, and it can be understood that the first optical layer 410 may correspond to the red light-emitting unit 310, the second optical layer 420 may correspond to the green light-emitting unit 310, and the third optical layer 430 may correspond to the blue light-emitting unit 310.

[0094] In some embodiments, the method for manufacturing the display panel 100 further includes steps S400 to S500.

[0095] In S400, referring to FIG. 1, a second electrode layer 500 is formed on one side of the light-emitting functional layer 300 that is away from the first electrode layer 200.

[0096] In some embodiments, the second electrode layer 500 is a film having a single-layer or multi-layer composite structure, and the material includes one or more combinations of Ag, Al, Pt, Mo, Ti, Cu, and Mg, and the thickness of the second electrode layer 500 is 1 nm to 100 nm.

[0097] In S500, referring to FIG. 1 , using a magnetron sputtering technique, oxygen is added into the process gas, and a semiconductor oxide material is used to form at least a first light extraction layer 610 and a second light extraction layer 620 on the second electrode layer 500, and the refractive index of at least one film layer of the first light extraction layer 610 is different from the refractive index of at least one film layer of the second light extraction layer 620, thereby forming a light extraction layer 600.

[0098] In some embodiments, referring to Figures 1 and 7, the light extraction layer 600 further includes a third extraction layer 630, and the third extraction layer 630 corresponds to a light-emitting unit 310 of one emission color, and the emission colors of the light-emitting units 310 corresponding to the first extraction layer 610, the second extraction layer 620, and the third extraction layer 630 are different from each other.

[0099] In some embodiments, as can be understood with reference to Figures 1 and 7, the first outcoupling layer 610 may correspond to the red light-emitting unit 310, the second outcoupling layer 620 may correspond to the green light-emitting unit 310, and the third outcoupling layer 630 may correspond to the blue light-emitting unit 310.

[0100] The present invention adjusts the refractive index of the film layer in the optical adjustment layer by adjusting the oxygen content in the process gas and adjusting the crystal morphology of the semiconductor material during film formation by magnetron sputtering, thereby adapting to the optical needs of light-emitting units with different light colors and improving the display effect of pixels with different light colors.

[0101] Referring to FIG. 11, an embodiment of the present invention further provides a display device 10, which includes any of the above-mentioned display panels 100 and a device body 20, wherein the device body 20 is integrally combined with the display panel 100.

[0102] The specific structure of the display panel 100 can be referred to any of the above embodiments and drawings of the display panel 100, and the description thereof will be omitted here.

[0103] In this embodiment, the device body 20 may include a middle frame, a sticker, etc., and the display device 10 may be a display terminal such as a mobile phone, a tablet, or a television, and is not limited thereto.

[0104] An embodiment of the present invention discloses a display panel and a manufacturing method thereof, the display panel comprising: a substrate, a light-emitting functional layer, a first electrode layer and an optical adjustment layer, the light-emitting functional layer comprising a plurality of light-emitting units with different emission colors, the optical adjustment layer comprising a semiconductor oxide, the optical adjustment layer comprising at least a first optical layer and a second optical layer, the light-emitting units of the first optical layer and the second optical layer having different emission colors, and the refractive index of at least one film layer of the first optical layer being different from the refractive index of at least one film layer of the second optical layer, the present invention adapts to the optical needs of the light-emitting units with different emission colors by adjusting the oxygen content of the process gas, adjusting the crystalline form of the semiconductor material, and adjusting the refractive index of the film layer in the optical adjustment layer during film deposition by magnetron sputtering, thereby improving the display effect of pixels with different emission colors.

[0105] The above has described in detail the display panel and the manufacturing method thereof provided by the embodiments of the present invention, and this specification describes the principles and embodiments of the present invention by applying specific individual examples. The explanation of the above examples is intended to help understand the method of the present invention and its core idea. Furthermore, those skilled in the art may make changes to the specific embodiments and application scope based on the idea of ​​the present invention. As described above, the contents of this specification should not be construed as limiting the present invention.

Claims

1. A substrate; a first electrode layer disposed on the substrate; an optical adjustment layer located on the first electrode layer, the optical adjustment layer including a semiconductor oxide; a light-emitting functional layer located on the optical adjustment layer, the light-emitting functional layer including a plurality of light-emitting units having different light-emitting colors; a second electrode layer located on one side of the light-emitting functional layer away from the first electrode layer, a cavity is formed between the first electrode layer and the second electrode layer; the optical adjustment layer includes at least a first optical layer and a second optical layer, the first optical layer is disposed to face the light-emitting units of one light-emitting color, the second optical layer is disposed to face the light-emitting units of another light-emitting color, the refractive index of at least one film layer of the first optical layer is different from the refractive index of at least one film layer of the second optical layer, the number of film layers of the first optical layer is greater than the number of film layers of the second optical layer, and the wavelength of the corresponding color light of the first optical layer is longer than the wavelength of the corresponding color light of the second optical layer; At least one of the first optical layers includes a first sub-layer and a second sub-layer adjacent to each other, the second sub-layer being located between the first sub-layer and the light-emitting functional layer, and the refractive index of the second sub-layer being greater than the refractive index of the first sub-layer; A display panel characterized in that the light-emitting functional layer includes at least a first organic sub-layer, the first organic sub-layer is located on a surface of the second sub-layer away from one side of the substrate, and the refractive index of the second sub-layer is greater than the refractive index of the first organic sub-layer.

2. A substrate; a first electrode layer disposed on the substrate; an optical adjustment layer located on the first electrode layer, the optical adjustment layer including a semiconductor oxide; a light-emitting functional layer located on the optical adjustment layer, the light-emitting functional layer including a plurality of light-emitting units having different light-emitting colors; a second electrode layer located on one side of the light-emitting functional layer away from the first electrode layer, a cavity is formed between the first electrode layer and the second electrode layer; the optical adjustment layer includes at least a first optical layer and a second optical layer, the first optical layer is disposed to face the light-emitting units of one light-emitting color, the second optical layer is disposed to face the light-emitting units of another light-emitting color, the refractive index of at least one film layer of the first optical layer is different from the refractive index of at least one film layer of the second optical layer, the number of film layers of the first optical layer is greater than the number of film layers of the second optical layer, and the wavelength of the corresponding color light of the first optical layer is longer than the wavelength of the corresponding color light of the second optical layer; At least one of the first optical layers includes a first sublayer, a second sublayer located on one side of the first sublayer close to the light-emitting functional layer, and a third sublayer located between the second sublayer and the light-emitting functional layer, wherein the refractive index of the second sublayer is smaller than the refractive index of the first sublayer, and the refractive index of the second sublayer is smaller than the refractive index of the third sublayer; A display panel characterized in that the light-emitting functional layer includes at least a first organic sub-layer, the first organic sub-layer is located on a surface of the third sub-layer away from one side of the substrate, and the refractive index of the third sub-layer is greater than the refractive index of the first organic sub-layer.

3. 2. The display panel according to claim 1, wherein the thickness of the first optical layer is greater than the thickness of the second optical layer.

4. The display panel further comprises: a light extraction layer located on one side of the second electrode layer away from the light emitting functional layer, the light extraction layer further including a semiconductor oxide; Here, the light extraction layer includes at least a first extraction layer and a second extraction layer, the first extraction layer corresponds to the light-emitting unit of one emission color, and the second extraction layer corresponds to the light-emitting unit of another emission color, and the refractive index of at least one film layer of the first extraction layer is different from the refractive index of at least one film layer of the second extraction layer.

5. At least one of the first extraction layers includes at least a first extraction sublayer and a second extraction sublayer, the first extraction sublayer being a film layer farthest from the light-emitting unit among the first extraction layers, and the second extraction sublayer being provided on one surface of the first extraction sublayer close to the second electrode layer; 5. The display panel of claim 4, wherein the refractive index of the first outcoupling sub-layer is greater than the refractive index of the second outcoupling sub-layer.

6. 2. The display panel of claim 1, wherein the optical adjustment layer further includes a third optical layer, wherein the refractive index of at least one film layer of the first optical layer, the refractive index of at least one film layer of the second optical layer, and the refractive index of at least one film layer of the third optical layer are different from each other, and the emission colors of the light-emitting units corresponding to the first optical layer, the second optical layer, and the third optical layer are different from each other.

7. the thickness of the first optical layer is greater than the thickness of the second optical layer, and the thickness of the second optical layer is greater than the thickness of the third optical layer; the number of film layers in the second optical layer is greater than the number of film layers in the third optical layer; 7. The display panel of claim 6, wherein the wavelengths of the corresponding color lights of the first optical layer are longer than the wavelengths of the corresponding color lights of the second optical layer, and the wavelengths of the corresponding color lights of the second optical layer are longer than the wavelengths of the corresponding color lights of the third optical layer.

8. providing a first electrode layer; using magnetron sputtering technology, adding oxygen into process gas, and forming at least a first optical layer and a second optical layer on the first electrode layer using a semiconductor oxide material, and making the refractive index of at least one film layer of the first optical layer different from the refractive index of at least one film layer of the second optical layer to form an optical adjustment layer, at least one of the first optical layers including a first sub-layer and a second sub-layer provided adjacent to each other, the second sub-layer being located on one side of the first sub-layer away from the first electrode layer, the refractive index of the second sub-layer being greater than the refractive index of the first sub-layer, the number of film layers of the first optical layer being greater than the number of film layers of the second optical layer, and the wavelength of the corresponding color light of the first optical layer being longer than the wavelength of the corresponding color light of the second optical layer; forming a plurality of light-emitting units of different luminescent colors on one side of the optical adjustment layer away from the first electrode layer, and disposing the first optical layer facing the light-emitting units of one luminescent color and the second optical layer facing the light-emitting units of another luminescent color to form a light-emitting functional layer; forming a second electrode layer on one side of the light-emitting functional layer away from the first electrode layer, and forming a cavity between the first electrode layer and the second electrode layer; A method for manufacturing a display panel, characterized in that the light-emitting functional layer includes at least a first organic sub-layer, the first organic sub-layer is located on a surface of the second sub-layer away from one side of the substrate, and the refractive index of the second sub-layer is greater than the refractive index of the first organic sub-layer.

9. Providing a first electrode layer; using magnetron sputtering technology, adding oxygen into process gas, and forming at least a first optical layer and a second optical layer on the first electrode layer using a semiconductor oxide material, and making the refractive index of at least one film layer of the first optical layer different from the refractive index of at least one film layer of the second optical layer to form an optical adjustment layer, at least one of the first optical layers including a first sublayer, a second sublayer located on one side of the first sublayer away from the first electrode layer, and a third sublayer located on one side of the second sublayer away from the first electrode layer, the refractive index of the second sublayer being smaller than the refractive index of the first sublayer, and the refractive index of the second sublayer being smaller than the refractive index of the third sublayer, the number of film layers of the first optical layer being greater than the number of film layers of the second optical layer, and the wavelength of the corresponding color light of the first optical layer being longer than the wavelength of the corresponding color light of the second optical layer; forming a plurality of light-emitting units of different luminescent colors on one side of the optical adjustment layer away from the first electrode layer, and disposing the first optical layer facing the light-emitting units of one luminescent color and the second optical layer facing the light-emitting units of another luminescent color to form a light-emitting functional layer; forming a second electrode layer on one side of the light-emitting functional layer away from the first electrode layer, and forming a cavity between the first electrode layer and the second electrode layer; A method for manufacturing a display panel, characterized in that the light-emitting functional layer includes at least a first organic sub-layer, the first organic sub-layer is located on a surface of the third sub-layer away from one side of the substrate, and the refractive index of the third sub-layer is greater than the refractive index of the first organic sub-layer.

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