Wafer mounting table

JP7780062B1Active Publication Date: 2025-12-03NGK CORP
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Patent Information

Application Number
JP2025548240
Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Priority Date
2024-11-06
Filing Date
2025-05-30
Publication Date
2025-12-03
Estimated Expiration
2045-05-30

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Abstract

The wafer mounting table 10 has a wafer mounting surface 21 and a focus ring mounting surface 26 located more outer than the wafer mounting surface 21. The wafer mounting surface 21 includes a ceramic body 20 incorporating a first electrode 22, a conductive focus ring 60 mounted on the FR mounting surface 26, a peripheral plug mounting hole 25 located below the focus ring 60 and penetrating the ceramic body 20, and a peripheral plug 55 disposed in the peripheral plug mounting hole 25 and allowing gas to pass through. The focus ring 60 has a gas reservoir recess 63 on its bottom surface 62b facing the peripheral plug 55. The top surface 55a of the peripheral plug 55 is located within the recess 63 and is higher than the bottom surface 62b of the focus ring 60.
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Citation Information

Patent Citations

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  • Substrate processing apparatus and substrate processing method

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    JP2021077752A

  • Substrate support base, plasma treatment system, and edge ring placement method

    JP2021168370A

  • Substrate supporter, substrate processing device, and electrostatic attraction method

    JP2023048449A