Organic fertilizer manufacturing method, plant cultivation method, soil improvement method, and organic fertilizer manufacturing device

Abstract

To provide a manufacturing method of an organic fertilizer with intensified nitrogen component and a manufacturing unit.SOLUTION: A method of manufacturing an organic fertilizer having an intensified nitrogen content, including a step of treating the organic fertilizer with a nitrogen plasma. A method of cultivating a plant including a step of producing an organic fertilizer having a nitrogen content intensified by the above described method, and a step of cultivating the plant in the soil fertilized with the organic fertilizer. A method of improving the soil including a step of producing an organic fertilizer having a nitrogen content intensified by the above described method, and applying the organic fertilizer to the soil. And a method of manufacturing the organic fertilizer with intensified nitrogen component, provided with a plasma generating portion, a nitrogen gas supply portion for supplying the nitrogen gas to the plasma generating portion, and irradiating the nitrogen plasma generated by the plasma generator on the organic fertilizer held by the organic fertilizer holding portion.SELECTED DRAWING: Figure 3

Description

[Technical Field]

[0001] The present invention relates to a method for producing organic fertilizer, a method for cultivating plants, a method for improving soil, and an apparatus for producing organic fertilizer. [Background technology]

[0002] In recent years, there has been growing interest in organic farming as a form of agriculture with a low environmental impact. In organic farming, organic fertilizers are used instead of chemical fertilizers. It has been reported that inorganic nitrogen in organic fertilizers is released into the environment over time (Non-Patent Document 1). As a result, organic fertilizers may lack nitrogen, resulting in insufficient crop growth.

[0003] Traditionally, the Haber-Bosch process has been used as a method for nitrogen fixation. In this process, methane is reacted with water and oxygen to synthesize hydrogen, and this hydrogen is then reacted with nitrogen to synthesize ammonia. The Haber-Bosch process uses methane contained in natural gas and other sources, and the reaction is carried out under high-temperature, high-pressure conditions, consuming large amounts of fossil fuels. As a result, the Haber-Bosch process has the problem of having a high environmental impact. Furthermore, if chemical fertilizers are added to organic fertilizers to increase the nitrogen content, this would amount to the use of chemical fertilizers, and would therefore no longer fall under the definition of organic farming.

[0004] A method of nitrogen fixation that does not use the Haber-Bosch process has been proposed, which involves irradiating water with nitrogen plasma. For example, Patent Document 1 proposes irradiating water with nitrogen plasma to produce a nutrient solution containing a nitrogen source, which can then be used in a plant cultivation system. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] Japanese Patent Application Publication No. 2017-228423 [Non-patent literature]

[0006] [Non-Patent Document 1] Jana E Compton and Richard D. Boone, Soil nitrogen transformation and the role of light fraction organic mater in forest soils. Soil Biology and Biochemistry 34(7):933-943. Summary of the Invention [Problem to be solved by the invention]

[0007] The plant cultivation system in Patent Document 1 is a hydroponic cultivation system and cannot be applied to organic agriculture. To be used in organic agriculture, it is necessary to improve the component composition of organic fertilizer without adding chemical fertilizers.

[0008] Therefore, an object of the present invention is to provide a method and an apparatus for producing an organic fertilizer with increased nitrogen content, which can increase the nitrogen content of the organic fertilizer without using chemical fertilizers. Another object of the present invention is to provide a method for cultivating plants and a method for improving soil using the organic fertilizer produced by the method or apparatus. [Means for solving the problem]

[0009] The present invention includes the following aspects. [1] A method for producing an organic fertilizer with enhanced nitrogen content, comprising a step of treating the organic fertilizer with nitrogen plasma. [2] The method according to [1], wherein the nitrogen content to be increased is at least one selected from the group consisting of ammonia, nitric acid, nitrous acid, urea, and ions thereof. [3] The method according to [1] or [2], wherein the organic fertilizer contains vegetable compost. [4] A method for cultivating plants, comprising: a step of producing an organic fertilizer having an increased nitrogen content by the production method described in any one of [1] to [3]; and a step of cultivating plants in soil to which the organic fertilizer having an increased nitrogen content has been applied. [5] A method for improving soil, comprising: a step of producing an organic fertilizer having an increased nitrogen content by the production method according to any one of [1] to [3]; and a step of applying the organic fertilizer having an increased nitrogen content to soil. [6] a plasma generator; The apparatus for producing an organic fertilizer with an increased nitrogen content comprises a nitrogen-containing gas supply unit that supplies a nitrogen-containing gas to the plasma generation space of the plasma generator, and an organic fertilizer holding unit that holds organic fertilizer, wherein the nitrogen plasma generated by the plasma generator is irradiated onto the organic fertilizer held by the organic fertilizer holding unit. [7] The apparatus for producing an organic fertilizer having an increased nitrogen content according to [6], further comprising a mixing mechanism for mixing the organic fertilizer. [Effects of the Invention]

[0010] According to the present invention, there are provided a method and an apparatus for producing an organic fertilizer with increased nitrogen content, which can increase the nitrogen content of the organic fertilizer without using chemical fertilizers. Also provided are a method for cultivating plants and a method for improving soil using the organic fertilizer produced by the method or the apparatus. [Brief explanation of the drawings]

[0011] [Figure 1] FIG. 1 is a schematic diagram showing an example of an apparatus for producing an organic fertilizer having an increased nitrogen content. [Figure 2] FIG. 10 is a schematic diagram showing a modified example of an apparatus for producing an organic fertilizer having an increased nitrogen content. [Figure 3] FIG. 10 is a schematic diagram showing a modified example of an apparatus for producing an organic fertilizer having an increased nitrogen content. [Figure 4] 1 shows a schematic diagram of an organic fertilizer production apparatus used in Example 1. [Figure 5] 1 shows a schematic diagram of an organic fertilizer production apparatus used in Example 2. [Figure 6] Figure 5 shows a diagram illustrating the principle of the organic fertilizer manufacturing device. [Figure 7] The results of the cultivation test of radish sprouts in the example are shown. DETAILED DESCRIPTION OF THE INVENTION

[0012] Hereinafter, embodiments of the present invention will be described in detail, with reference to the drawings where necessary. In the drawings, identical or corresponding parts are designated by identical or corresponding reference numerals, and duplicate explanations will be omitted. The dimensional ratios in each drawing may be exaggerated for the purpose of explanation and do not necessarily correspond to the actual dimensional ratios.

[0013] [Manufacturing method of organic fertilizer] In one embodiment, the present invention provides a method for producing a nitrogen-enriched organic fertilizer, comprising the step of treating the organic fertilizer with nitrogen plasma.

[0014] <Nitrogen plasma treatment process> "Organic fertilizer" refers to fertilizers made from organic materials. Examples of organic fertilizers include organic fertilizers and sludge composts specified in the official specifications of the Fertilizer Control Act, special fertilizers specified in the Fertilizer Control Act that are made from organic materials, and fertilizers produced by farmers using organic materials such as agricultural waste and livestock waste. Specific examples of organic fertilizers include, but are not limited to, fish fertilizers such as fish meal powder, coarse fish meal powder, dried fish fertilizer powder, and boiled fish residue; oil cakes such as rapeseed oil cake and soybean oil cake; bone meal made from crushed animal bones after fat, gelatin, etc. are removed; dried bacterial fertilizer; poultry manure fertilizers such as cow manure compost, pig manure compost, chicken manure compost, fermented chicken manure, and dried chicken manure; methane fermentation residue; vegetable composts such as rice husk compost, pruning branch compost, rice straw compost, percussion compost, and leaf mold; sludge compost, and food waste compost.

[0015] It is preferable to use organic fertilizers with a low nitrogen content compared to other nutrients (phosphorus, potassium). For example, vegetable compost is preferable, and leaf mold is more preferable. "Vegetable compost" refers to compost made from plant-derived organic materials. "Compost" refers to fertilizer made from liquid-decomposable organic matter decomposed by microorganisms. "Leaf mold" refers to compost made from fallen leaves and branches.

[0016] "Nitrogen plasma treatment" refers to contacting the object to be treated with nitrogen plasma. "Plasma" refers to a group of particles (ionized gas) that are nearly electrically neutral as a whole, including a group of charged particles in which the molecules that make up the gas are split into positive (cations) and negative (electrons) due to ionization. "Nitrogen plasma" refers to plasma generated by ionizing nitrogen gas (N2).

[0017] Nitrogen plasma can be generated by applying a voltage to a nitrogen-containing gas. The nitrogen plasma may be generated under atmospheric pressure (atmospheric pressure plasma) or under a pressure lower than atmospheric pressure (low pressure plasma).

[0018] The method for generating atmospheric pressure plasma is not particularly limited, and known methods can be used, such as dielectric barrier discharge (DBD), inductively coupled plasma discharge (ICP), capacitively coupled plasma discharge (CCP), hollow cathode discharge, corona discharge, streamer discharge, glow discharge, and arc discharge.

[0019] The gas to which the voltage is applied may be any gas containing nitrogen (nitrogen-containing gas). The nitrogen-containing gas may be nitrogen gas or a mixed gas of nitrogen gas and other gases. The mixed gas may be, for example, a mixed gas of nitrogen and oxygen. The volume fraction of nitrogen in the mixed gas of nitrogen and oxygen is preferably 70 to 90%. Air may also be used as the nitrogen-containing gas.

[0020] The supply rate of the nitrogen-containing gas is not particularly limited, but is preferably 0.1 to 1000 mL / min, more preferably 1 to 500 mL / min, and even more preferably 10 to 100 mL / min, for example.

[0021] To generate nitrogen plasma, known plasma generators can be used without any particular limitations. In known plasma generators, nitrogen plasma can be generated by using a nitrogen-containing gas as the gas to which a voltage is applied. The voltage application conditions are not particularly limited and can be selected depending on the type of plasma generator. For example, in the case of low-pressure plasma, the atmospheric pressure can be 20 to 200 Pa, the frequency can be 50 to 500,000 kHz, and the power can be 10 W to 100 W. For example, in the case of atmospheric-pressure plasma, the frequency can be 5 to 20,000 kHz, and the voltage can be 5 to 20 kV.

[0022] The method for contacting the organic fertilizer with nitrogen plasma is not particularly limited, and examples thereof include a method of blowing a plasma jet of nitrogen plasma onto the organic fertilizer, and a method of placing the organic fertilizer in a chamber equipped with electrodes, applying a voltage while supplying a nitrogen-containing gas, and generating nitrogen plasma in the chamber.

[0023] The treatment time for organic fertilizer with nitrogen plasma is not particularly limited and may be adjusted appropriately depending on the type of plasma generator, the nitrogen concentration in the nitrogen-containing gas, the type and amount of organic fertilizer to be treated, etc. For example, when treating 1 to 200 g of organic fertilizer (e.g., leaf mold) with nitrogen plasma generated by low-pressure plasma, the treatment time may be 1 to 30 minutes, 2 to 15 minutes, 2 to 10 minutes, or 3 to 5 minutes. Furthermore, when treating 1 to 10 g of organic fertilizer (e.g., leaf mold) with nitrogen plasma generated by DBD plasma, the treatment time may be 1 to 30 minutes, 2 to 20 minutes, 3 to 15 minutes, or 5 to 10 minutes.

[0024] By treating organic fertilizer with nitrogen plasma, ionized nitrogen molecules react with water (HO) in the organic fertilizer to produce nitrogen compounds such as inorganic nitrogen compounds (ammonia, nitrate, nitrite, and their ions, etc.) and organic nitrogen compounds (urea and its ions, etc.). Therefore, an organic fertilizer with enhanced nitrogen content can be obtained. "Nitrogen-enhanced organic fertilizer" refers to an organic fertilizer with an increased nitrogen content compared to untreated organic fertilizer. The enhanced nitrogen content is typically inorganic nitrogen compounds and urea. Examples of inorganic nitrogen compounds include ammonia, nitrate, nitrite, and their ions. The increase in nitrogen content can be adjusted by the nitrogen plasma treatment time. The nitrogen-enhanced organic fertilizer may contain, for example, 1.1 times or more, 1.2 times or more, 1.3 times or more, 1.4 times or more, or 1.5 times or more of nitrate and nitrate ions in molar concentration compared to untreated organic fertilizer. Furthermore, the nitrogen-enriched organic fertilizer may contain, for example, 1.1 times or more, 1.2 times or more, 1.3 times or more, 1.4 times or more, 1.5 times or more, 1.6 times or more, 1.8 times or more, 2 times or more, or 2.3 times or more of the molar concentration of nitrite and nitrite ions of the untreated organic fertilizer.

[0025] In the production method of this embodiment, water in the organic fertilizer reacts with nitrogen plasma to produce inorganic nitrogen compounds and nitrogen compounds such as urea. Therefore, it is preferable that the organic fertilizer contains water. The water content in the organic fertilizer to be subjected to nitrogen plasma treatment is, for example, preferably 1 to 5000 mg / g, more preferably 1 to 2000 mg / g, and even more preferably 1 to 1000 mg / g. When the organic fertilizer has a low water content, water may be added to the organic fertilizer before the plasma treatment.

[0026] After the nitrogen plasma treatment, the organic fertilizer may be mixed or stirred so that the nitrogen content in the organic fertilizer becomes uniform.

[0027] According to the manufacturing method of this embodiment, an organic fertilizer with an increased nitrogen content can be obtained in a simple manner without using chemical fertilizers. The obtained organic fertilizer can be used in organic agriculture, and the increased nitrogen content allows crops to grow well.

[0028] [How to grow plants] In one embodiment, the present invention provides a method for cultivating a plant, comprising: a step of producing an organic fertilizer having an increased nitrogen content by the production method (hereinafter also referred to as "step A1"); and a step of cultivating a plant in soil to which the nitrogen-enriched organic fertilizer has been applied (hereinafter also referred to as "step B1").

[0029] <Step for producing organic fertilizer with increased nitrogen content: Step A1> Step A1 is the same as in the above-mentioned production method. By step A1, an organic fertilizer with an increased nitrogen content can be obtained.

[0030] <Plant cultivation process: Process B1> In step B1, plants are cultivated in soil fertilized with the nitrogen-enriched organic fertilizer produced in step A1. The soil to which the organic fertilizer is applied is not particularly limited. The soil may be a paddy field, a field, an orchard, or horticultural soil. The fertilization method is not particularly limited and can be carried out in the same manner as for ordinary organic fertilizers. The timing of applying the organic fertilizer is also not particularly limited. Fertilization can be done as appropriate depending on the type of plant, growth status, soil condition, etc.

[0031] The plants to be grown in soil fertilized with organic fertilizer are not particularly limited. They may be selected appropriately depending on the type of soil. Examples of plants include, but are not limited to, grains, vegetables, fruit trees, and ornamental plants. Plants can be grown using known methods depending on the type of plant.

[0032] In the plant cultivation method of the present embodiment, plants are cultivated using an organic fertilizer with increased nitrogen content, which results in good plant growth. Furthermore, since no chemical fertilizer is used, the method can be applied to organic agriculture.

[0033] [Soil improvement methods] In one embodiment, the present invention provides a soil improvement method comprising the steps of: producing an organic fertilizer having an increased nitrogen content by the production method (hereinafter also referred to as "Step A2"); and applying the organic fertilizer having an increased nitrogen content to soil (hereinafter also referred to as "Step B2").

[0034] <Step of producing nitrogen-enriched organic fertilizer: Step A2> Step A2 is the same as in the above-mentioned production method. By step A2, an organic fertilizer with an increased nitrogen content can be obtained.

[0035] <Process of applying fertilizer to the soil: Process B2> In step B2, the nitrogen-enriched organic fertilizer produced in step A2 is applied to soil. The soil is not particularly limited as long as it is soil for plant cultivation, and may be paddy field, field, orchard, or horticultural soil. The fertilization method is not particularly limited, and can be carried out in the same manner as for ordinary organic fertilizers.

[0036] In the soil improvement method of this embodiment, the nitrogen-enriched organic fertilizer is used, so that an appropriate amount of nitrogen can be supplied to the soil along with other nutrients contained in the organic fertilizer, thereby preparing soil that is favorable for plant growth.

[0037] In the above-mentioned plant cultivation method or soil improvement method, the nitrogen content in the organic fertilizer produced in step A1 or step A2 is released from the organic fertilizer over time, resulting in a decrease in the nitrogen content of the organic fertilizer. Therefore, it is preferable to shorten the time until the fertilizer is applied to the soil after step A1 or step A2. The time until the fertilizer is applied to the soil after step A1 or step A2 is, for example, preferably within 10 days, more preferably within 5 days, even more preferably within 3 days, and particularly preferably within 1 day. In order to shorten the time until the fertilizer is applied to the soil after step A1 or step A2, it is preferable to perform step A1 or step A2 near the soil to be fertilized. For example, step A1 or step A2 can be performed on the same farm premises as the soil to be fertilized.

[0038] [Nitrogen-enriched organic fertilizer manufacturing equipment] In one embodiment, the present invention provides an apparatus for producing an organic fertilizer with an increased nitrogen content (hereinafter also referred to as "organic fertilizer production apparatus"), comprising: a plasma generating unit; a nitrogen gas supplying unit that supplies nitrogen gas to the plasma generating unit; and an organic fertilizer holding unit that holds organic fertilizer, wherein the nitrogen plasma generated by the plasma generating unit is irradiated onto the organic fertilizer held by the organic fertilizer holding unit.

[0039] The organic fertilizer production apparatus of this embodiment will be described with reference to Fig. 1. Fig. 1 shows an example of the organic fertilizer production apparatus of this embodiment. The organic fertilizer production apparatus 100 shown in FIG. 1 includes a plasma generating electrode 110, an upper belt conveyor 120, a lower belt conveyor 130, and a bucket conveyor 140 in a housing 101.

[0040] The plasma generating electrode 110 is connected to a power supply outside the housing 101 (not shown) and constitutes a plasma generating device together with the power supply. Any known plasma generating device can be used without any particular restrictions. For example, if the plasma generating device is a low-pressure plasma generating device, a known plasma electrode made of copper, tungsten, or the like can be used as the plasma generating electrode 110, and a pulse power supply or a high-frequency power supply can be used as the power supply. If the plasma generating device is an atmospheric pressure plasma generating device, a known dielectric for DBD plasma can be used as the plasma generating electrode 110, and a high-voltage power supply can be used as the power supply. A nitrogen-containing gas is supplied into the casing 101 from a nitrogen-containing gas supply unit configured by a nitrogen-containing gas supply path (not shown), and the nitrogen-containing gas is supplied to the plasma generation space P. When a voltage is applied to the plasma generating electrode 110 in this state, nitrogen plasma is generated in the plasma generation space P. The organic fertilizer production apparatus 100 may be provided with an exhaust device for discharging gas from the casing 101 and adjusting the air pressure inside the casing 101.

[0041] The upper belt conveyor 120 is installed below the plasma generation space P of the plasma generator. The upper belt conveyor 120 is composed of an endless belt 121 and rollers 122 and 123. The portion of the upper belt conveyor 120 facing the plasma generating electrode 110 constitutes an organic fertilizer holding section H. The upper belt conveyor 120 transports the organic fertilizer F in the direction of the outlined arrow in the figure. The organic fertilizer F transported to the organic fertilizer holding section H is irradiated with nitrogen plasma generated in the plasma generation space P. The organic fertilizer F irradiated with the nitrogen plasma is transported to the end of the upper belt conveyor 120 (the right end in the figure) and dropped onto the lower belt conveyor 130.

[0042] The lower belt conveyor 130 is installed below the upper belt conveyor 120. The lower belt conveyor 130 is composed of an endless belt 131 and rollers 132 and 133. The lower belt conveyor 130 is positioned so that the end of the upper belt conveyor 120 (the right end in the figure) onto which the organic fertilizer F falls is positioned above the belt of the lower belt conveyor 130, so that the organic fertilizer F falling from the end of the upper belt conveyor 120 can be received. The lower belt conveyor 130 transports the organic fertilizer F in the direction of the outline arrow in the figure. The organic fertilizer F is transported to the end of the lower belt conveyor 130 (the left end in the figure) and transferred into buckets 142 of the bucket conveyor 140.

[0043] The bucket conveyor 140 is installed to the side of the upper belt conveyor 120 and the lower belt conveyor 130. The bucket conveyor 140 is composed of a plurality of buckets 142 and an endless belt 141 that transports the buckets 142. The bucket conveyor 140 receives the organic fertilizer F that drops from the end (left end in the figure) of the lower belt conveyor 130 in the buckets 142, transports it upward, and drops the organic fertilizer F onto the endless belt 121 of the upper belt conveyor 120.

[0044] An example of the operation of the organic fertilizer production apparatus 100 having the above-described configuration will be described.

[0045] First, organic fertilizer F is introduced into the housing 101 through an organic fertilizer introduction port (not shown). The organic fertilizer F may be introduced so as to be placed on the endless belt 121 or the endless belt 131 of the upper belt conveyor 120 or the lower belt conveyor 130, or may be introduced into a plurality of buckets 142 of the lower belt conveyor 130.

[0046] Next, a nitrogen-containing gas is supplied into the housing 101 from a nitrogen-containing gas supply channel (not shown). At this time, the gas inside the housing 101 may be discharged by an exhaust device (not shown) to adjust the air pressure inside the housing 101. For example, when the plasma generating device including the plasma generating electrode 110 and the power supply is a low-pressure plasma device, the air pressure inside the housing 101 is preferably adjusted to 20 to 200 Pa. Furthermore, when the plasma generating device is an atmospheric-pressure plasma device, the air pressure inside the housing 101 is preferably adjusted to atmospheric pressure.

[0047] Next, the upper belt conveyor 120 is operated to transport the organic fertilizer F placed on the endless belt 121 of the upper belt conveyor 120 to the organic fertilizer holding section H. Here, when the plasma generating electrode 110 is energized, nitrogen plasma is generated in the plasma generation space P and is irradiated onto the organic fertilizer F present in the organic fertilizer holding section H. At this time, ionized nitrogen molecules in the nitrogen plasma react with water (HO) in the organic fertilizer F to generate nitrogen compounds such as inorganic nitrogen compounds (ammonia, nitric acid, nitrous acid, and their ions, etc.) and organic nitrogen compounds (urea and its ions, etc.). The generated nitrogen compounds remain in the organic fertilizer F, increasing the nitrogen content of the organic fertilizer F.

[0048] The organic fertilizer F irradiated with nitrogen plasma in the organic fertilizer holding section H is transported to the end of the upper belt conveyor 120 (the right end in the figure), and then dropped onto the endless belt 131 of the lower belt conveyor 130. The organic fertilizer F that has dropped onto the lower belt conveyor 130 is transported to the end of the lower belt conveyor 130 (the left end in the figure), and then dropped into multiple buckets 142 of the bucket conveyor 140. When receiving the organic fertilizer F from the lower belt conveyor 130, the bucket conveyor 140 may be temporarily stopped until a certain amount of organic fertilizer F has accumulated in the buckets 142. The bucket conveyor 140 may be controlled by a contact sensor or the like installed in the bucket 142. Alternatively, it may be configured to stop and start repeatedly at regular intervals.

[0049] The bucket 142 that has received the organic fertilizer F is transported upward by the bucket conveyor 140, and when it reaches the upper belt conveyor 120, it releases the organic fertilizer F onto the endless belt 121. The organic fertilizer F released onto the endless belt 121 is transported again to the organic fertilizer holding section H and is irradiated with nitrogen plasma.

[0050] In the organic fertilizer production apparatus 100, the upper belt conveyor 120, the lower belt conveyor 130, and the bucket conveyor 140 constitute an organic fertilizer transport unit. The organic fertilizer transport unit, which is composed of the upper belt conveyor 120, the lower belt conveyor 130, and the bucket conveyor 140, forms a circulation path, through which the organic fertilizer F circulates. The organic fertilizer F is irradiated with nitrogen plasma as it passes through the organic fertilizer holding unit H on the circulation path, thereby enhancing its nitrogen content. Furthermore, since the organic fertilizer F is mixed during circulation, the concentration of the nitrogen compounds generated in the organic fertilizer holding unit H becomes uniform. Therefore, the upper belt conveyor 120, the lower belt conveyor 130, and the bucket conveyor 140 constitute a mixing mechanism for mixing the organic fertilizer F. The number of times the organic fertilizer F is circulated is not particularly limited and can be set appropriately depending on the amount of organic fertilizer and the desired amount of nitrogen enhancement. The number of times the organic fertilizer F is circulated can be, for example, approximately 1 to 20 times.

[0051] After circulating the organic fertilizer F a desired number of times, the organic fertilizer is taken out from an organic fertilizer outlet (not shown), whereby an organic fertilizer with an increased nitrogen content can be obtained.

[0052] <Variation 1> FIG. 2 shows a modified example of the organic fertilizer manufacturing apparatus of this embodiment. The organic fertilizer production apparatus 200 shown in FIG. 2 includes a plasma generating electrode 210, a rotor 220, a flight conveyor 230, and a tank 240 in a housing 201.

[0053] The plasma generating electrode 210 is connected to a power supply outside the housing 201 (not shown), and together with the power supply constitutes a plasma generating device. The plasma generating device is the same as the plasma generating device in the organic fertilizer production apparatus 100. In Fig. 2, three plasma generating electrodes 210 are shown, but the number is not limited to three and any number can be installed. A nitrogen-containing gas is supplied into the casing 201 from a nitrogen-containing gas supply unit configured by a nitrogen-containing gas supply path (not shown), and the nitrogen-containing gas is supplied to the plasma generation space P. When a voltage is applied to the plasma generating electrode 210 in this state, nitrogen plasma is generated in the plasma generation space P. The organic fertilizer production apparatus 200 may be provided with an exhaust device for discharging gas from the casing 201 and adjusting the air pressure inside the casing 201.

[0054] The rotating body 220 is installed so as to face the plasma generating electrode 210. The rotating body 220 has a plurality of plates 221, and the plates 221 can hold the organic fertilizer F. The portion of the rotating body 220 facing the plasma generating electrode 210 constitutes an organic fertilizer holding section H. The rotating body 220 rotates counterclockwise, receives the organic fertilizer F discharged from an opening 241 of the tank 240, and transports it to the organic fertilizer holding section H. The organic fertilizer F transported to the organic fertilizer holding section H is irradiated with nitrogen plasma generated in the plasma generation space P. The organic fertilizer F irradiated with the nitrogen plasma is transported downward by the rotation of the rotating body 220 and drops onto the flight conveyor 230.

[0055] The flight conveyor 230 receives the organic fertilizer F that falls from the rotating body 220 and transports it to the tank 240. The flight conveyor 230 is composed of an endless belt 231, rollers 232 and 233, and multiple flights 234. The flight conveyor 230 has a horizontal transport section that receives the organic fertilizer F that falls from the rotating body 220 and transports it horizontally, and a vertical transport section that transports the organic fertilizer F vertically to the tank 240 installed above the rotating body 220. The flights 234 are bent so that their tips face upward in the vertical transport section, allowing the organic fertilizer to be sufficiently held in the vertical transport section. The flight conveyor 230 transports the organic fertilizer F in the direction of the outline arrow in the figure. The flight conveyor 230 receives the organic fertilizer F that falls from the rotating body 220 and transports it to the tank 240, where it releases the organic fertilizer F into the tank 240.

[0056] The tank 240 is located above the rotor 220 and has an opening 241 at its bottom. The bottom of the tank 240 is inclined toward the opening 241. The organic fertilizer F released into the tank 240 from the flight conveyor 230 moves by its own weight along the inclination of the bottom of the tank 240 toward the opening 241, and is released from the opening 241 onto the rotor 220. The tank 240 may be provided with an opening / closing plate that can open and close the opening 241, and the opening 241 may be opened to release the organic fertilizer F onto the rotor 220 when a certain amount of organic fertilizer has been stored in the tank 240.

[0057] An example of the operation of the organic fertilizer production apparatus 200 having the above-described configuration will be described.

[0058] First, organic fertilizer F is introduced into the housing 201 through an organic fertilizer introduction port (not shown). The organic fertilizer F is preferably introduced into the tank 240. When introducing the organic fertilizer F, the opening 241 of the tank 240 may be closed by an opening / closing plate (not shown).

[0059] Next, a nitrogen-containing gas is supplied from a nitrogen-containing gas supply path (not shown) into the housing 201. At this time, similar to the organic fertilizer manufacturing apparatus 100, the gas inside the housing 201 may be exhausted by an exhaust device (not shown) to adjust the air pressure inside the housing 201.

[0060] Next, the organic fertilizer F is released onto the rotor 220 through the opening 241. The rotor 220 is then rotated to transport the organic fertilizer F to the organic fertilizer holding section H. Here, when the plasma generating electrode 210 is energized, nitrogen plasma is generated in the plasma generation space P, and is irradiated onto the organic fertilizer F present in the organic fertilizer holding section H. At this time, ionized nitrogen molecules in the nitrogen plasma react with water (HO) in the organic fertilizer F, generating nitrogen compounds such as inorganic nitrogen compounds (ammonia, nitric acid, nitrous acid, and their ions, etc.) and organic nitrogen compounds (urea and its ions, etc.). The generated nitrogen compounds remain in the organic fertilizer F, increasing the nitrogen content of the organic fertilizer F.

[0061] The organic fertilizer F irradiated with nitrogen plasma in the organic fertilizer holding section H is transported to the bottom of the rotating body 220 and then dropped onto the flight conveyor 230. The organic fertilizer F that has dropped onto the flight conveyor 230 is transported by the flight conveyor 230 to the tank 240 and released into the tank 240 again.

[0062] In the organic fertilizer production apparatus 200, the rotor 220, the flight conveyor 230, and the tank 240 constitute an organic fertilizer transport unit. The organic fertilizer transport unit, which is composed of the rotor 220, the flight conveyor 230, and the tank 240, forms a circulation path, through which the organic fertilizer F circulates. The organic fertilizer F is irradiated with nitrogen plasma as it passes through the organic fertilizer holding unit H on the circulation path, thereby enhancing its nitrogen content. Furthermore, the organic fertilizer F is mixed during circulation, so that the concentration of the nitrogen compounds generated in the organic fertilizer holding unit H becomes uniform. Therefore, the rotor 220, the flight conveyor 230, and the tank 240 constitute a mixing mechanism for mixing the organic fertilizer F. The number of times the organic fertilizer F is circulated is not particularly limited and can be set appropriately depending on the amount of organic fertilizer and the desired amount of nitrogen enhancement. The number of times the organic fertilizer F is circulated can be, for example, approximately 1 to 20 times.

[0063] After circulating the organic fertilizer F a desired number of times, the organic fertilizer F can be taken out from an organic fertilizer outlet (not shown) to obtain an organic fertilizer with an increased nitrogen content.

[0064] <Variation 2> FIG. 3 shows another modified example of the organic fertilizer manufacturing apparatus of this embodiment. 3 includes a plasma generating electrode 310, stirring fins 320, and a stirring baffle plate 330 in a housing 301 equipped with a lid 302. An exhaust pipe 360 ​​and a supply pipe 370 are provided so as to pass through the lid 302.

[0065] The housing 301 is provided with a lid 302 and is capable of holding the organic fertilizer F inside. In the organic fertilizer production device 300, the housing 301 constitutes the organic fertilizer holding section H. The organic fertilizer F can be added and removed with the lid 302 open. The housing 301 may be provided with a lift or the like (not shown) to facilitate the addition and removal of the organic fertilizer F.

[0066] The plasma generating electrode 310 is installed on the lid 302. The plasma generating electrode 310 is connected to a power supply outside the housing 301 (not shown) via an electric wire 311, and the power supply and the electric wire 311 together form a plasma generating device. The plasma generating device is the same as the plasma generating device in the organic fertilizer production apparatus 100. In FIG. 3 , two plasma generating electrodes 310 are shown, but this is not limitative and any number of plasma generating electrodes 310 can be installed. The electric wire 311 is inserted into the housing 301 from an electric wire insertion portion 312 provided on the lid 302 and connected to the plasma generating electrode 310.

[0067] The supply pipe 370 is connected to a nitrogen-containing gas supply source (not shown) and supplies the nitrogen-containing gas into the housing 301. In the organic fertilizer production apparatus 300, the supply pipe 370 constitutes a nitrogen-containing gas supply unit. The nitrogen-containing gas supplied from the supply pipe 370 into the housing 301 also reaches the plasma generation space P near the plasma generating electrode 310, and the nitrogen-containing gas is supplied to the plasma generation space P. When voltage is applied to the plasma generating electrode 310 in this state, nitrogen plasma is generated in the plasma generation space P. The supply pipe 370 may be connected to a moisture supply source (not shown) to supply moisture into the housing 301 as necessary.

[0068] The exhaust pipe 360 ​​exhausts gas from the housing 301 and adjusts the air pressure inside the housing 301. The exhaust pipe 360 ​​is provided with a pressure adjustment valve 340. The amount of exhaust gas from the exhaust pipe 360 ​​is adjusted by the pressure adjustment valve 340.

[0069] The agitating fins 320 are connected to a rotary motor 321 via a rotary shaft 322. When the rotary motor 321 operates, rotation is transmitted to the agitating fins 320 via the rotary shaft 322, causing the agitating fins 320 to rotate. Although two agitating fins 320 are shown in the figure, this is not limitative and any number of agitating fins can be installed. The agitating fins 320, the rotary shaft 322, and the rotary motor 321, together with the baffle plate 330, constitute a mixing mechanism that mixes the organic fertilizer F.

[0070] Baffle plates 330 are installed on the inner wall of the housing 301. The baffle plates 330 improve the efficiency of stirring the organic fertilizer F by the stirring fins 320. Although two baffle plates 330 are shown in the figure, the number is not limited to this and any number of baffle plates can be installed.

[0071] An example of the operation of the organic fertilizer production apparatus 300 having the above-described configuration will be described.

[0072] First, the lid 302 is opened and the organic fertilizer F is poured into the housing 301. After the fertilizer F is poured in, the lid 302 is closed and the housing 301 is sealed.

[0073] Next, nitrogen-containing gas is supplied into the housing 301 through the supply pipe 370. If the moisture content of the organic fertilizer F is low, moisture may be supplied through the supply pipe 370. At this time, the gas inside the housing 301 is exhausted through the exhaust pipe 360 ​​while adjusting the exhaust rate using the pressure adjustment valve 340 as necessary. This adjusts the air pressure inside the housing 301 to a desired level.

[0074] Next, the rotary motor 321 is driven to rotate the stirring fins 320, thereby stirring the organic fertilizer F. When a voltage is applied to the plasma generating electrode 310, nitrogen plasma is generated in the plasma generation space P and irradiated onto the organic fertilizer F. At this time, ionized nitrogen molecules in the nitrogen plasma react with water (HO) in the organic fertilizer F, generating nitrogen compounds such as inorganic nitrogen compounds (ammonia, nitric acid, nitrous acid, and their ions, etc.) and organic nitrogen compounds (urea, and its ions, etc.). The generated nitrogen compounds remain in the organic fertilizer F, increasing the nitrogen content of the organic fertilizer F. By stirring and mixing the organic fertilizer F with the stirring fins 320, the concentration of nitrogen compounds in the organic fertilizer F becomes uniform.

[0075] The application time of the voltage to the plasma generating electrode 310 is not particularly limited and may be set appropriately depending on the types of organic fertilizer F and plasma generating electrode 310. Alternatively, the nitrogen content of the organic fertilizer F may be monitored over time, and the application of the voltage to the plasma generating electrode 310 may be stopped when the nitrogen content reaches an appropriate level. When the application of the voltage to the plasma generating electrode 310 is stopped, or after a desired time has elapsed since the application was stopped, the rotary motor 321 is stopped, and the rotation of the stirring fins 320 is stopped.

[0076] Next, the lid 302 is opened and the organic fertilizer F is taken out, thereby obtaining an organic fertilizer with an increased nitrogen content.

[0077] The organic fertilizer production apparatus of this embodiment can be suitably used in the method for producing an organic fertilizer having an increased nitrogen content according to the above-described embodiment. By using the organic fertilizer production apparatus of this embodiment, an organic fertilizer having an increased nitrogen content can be easily produced.

[0078] Although the embodiments of the present invention have been described above in detail with reference to the drawings, the specific configuration is not limited to this embodiment, and the present invention also includes designs within the scope of the gist of the present invention. [Example]

[0079] The present invention will be described below with reference to examples, but the present invention is not limited to the following examples.

[0080] [Manufacturing organic fertilizer] Example 1 Nitrogen plasma treatment of organic fertilizer was performed using an organic fertilizer production device 400 (custom-made, with a homemade plasma source installed in a reaction vessel manufactured by Kenix Co., Ltd.) equipped with a low-pressure plasma generator, as shown in Figure 4. Leaf mold was used as the organic fertilizer. 4 g of leaf mold was placed in the chamber of the plasma generator, and plasma was generated while supplying nitrogen gas. The nitrogen gas supply rate was 0.5 mL / min. The plasma generation conditions were an air pressure of 200 Pa, a frequency of 143,000 kHz, and a power of 40 W. The nitrogen plasma treatment time was 3 minutes.

[0081] The organic fertilizer production apparatus 400 includes, within a housing 401, a plasma generating electrode 410 connected to a power source 430, and an organic fertilizer holding container 420. The apparatus also includes an exhaust pipe 460, a pressure regulating valve 440, and an exhaust rotary pump 450 for exhausting gas from within the housing 401 and maintaining the pressure at low. A pulse power source or a high-frequency power source was used for the power source 430. Nitrogen gas was supplied from a nitrogen supply path (not shown) while being applied to the plasma generating electrode 410 to generate nitrogen plasma P, which was then irradiated onto the organic fertilizer F in the organic fertilizer holding container 420.

[0082] <Example 2> Nitrogen plasma treatment of organic fertilizer was performed using an organic fertilizer production device 500 (homemade) equipped with a dielectric barrier discharge (DBD) plasma generator, as shown in Figure 5. Leaf mold was used as the organic fertilizer. 4 g of leaf mold to which 4 g of pure water had been added was placed in the chamber of the plasma generator, and plasma was generated while supplying nitrogen gas. Irradiation was performed in an air gas atmosphere. The plasma generation conditions were atmospheric pressure, a frequency of 14 kHz, and a voltage of 7 kV. The nitrogen plasma treatment time was 10 minutes.

[0083] The organic fertilizer production apparatus 500 includes a plasma generating electrode 510 connected to a power source 530, and an organic fertilizer holding container 520. A high-voltage power supply was used as the power source 530. A principle diagram of the organic fertilizer production apparatus 500 is shown in FIG. 6. The plasma generating electrode 510 is composed of a pair of dielectrics 511, 512. Nitrogen gas was supplied from a nitrogen supply path (not shown) and applied to the dielectrics 511, 512 to generate a plasma generation space P, which was then irradiated onto the organic fertilizer F in the organic fertilizer holding container 520.

[0084] Example 3 The organic fertilizer was subjected to nitrogen plasma treatment in the same manner as in Example 1, except that the plasma irradiation time was set to 10 minutes.

[0085] <Comparative Example 1> Leaf mold that had not been subjected to plasma treatment was used as the organic fertilizer in Comparative Example 1.

[0086] [Measurement of nitrogen compounds] Nitrate in leaf mold (NO3 - ) concentration and nitrite (NO2 - The concentration of the soluble solids was measured by the following method. Approximately 1g of the organic fertilizer treated in each of the above examples was collected and approximately 1cc of water was added. The organic fertilizer was squeezed to collect the solution, and small particles were removed using a filter. The concentrations of nitrate and nitrite were measured using the NO2 / NO3 Assay Kit-C II (DOJINDO).

[0087] The measurement results for nitric acid are shown in Table 1. The measurement results for nitrous acid are shown in Table 2.

[0088] [Table 1]

[0089] [Table 2]

[0090] From the results shown in Tables 1 and 2, it was confirmed that the nitrate concentration and nitrite concentration increased in Examples 1 and 2 compared to Comparative Example 1. These results demonstrated that nitrogen plasma treatment can produce an organic fertilizer with increased nitrogen content.

[0091] [Germination test] 42 g of the organic fertilizer of Example 1 or Comparative Example 1 was applied to a 1 L cultivation pot. Next, 2.1 g of radish sprout seeds were uniformly sown in the cultivation pot. The number of cultivation pots was three for each organic fertilizer. The cultivation temperature was controlled at 25°C, and the seeds were watered twice a day. Five days after sowing, the number of germinated seeds was counted, and the germination rate was calculated.

[0092] The germination rate was 85 to 95% in the cultivation pots fertilized with the organic fertilizer of Example 1. On the other hand, the germination rate was 50 to 65% in the cultivation pots fertilized with the organic fertilizer of Comparative Example 1. These results demonstrate that the germination rate is improved by using nitrogen plasma-treated organic fertilizer.

[0093] [Radish sprouts cultivation test] Radish sprouts were cultivated using the organic fertilizers of Examples 1 and 3, and Comparative Example 1. Radish sprouts were sown and cultivated in the same manner as in the germination test, except that the organic fertilizers of Examples 1 and 3, or Comparative Example 1, were used. The number of cultivation pots was two in Example 1 (Examples 1-1 and 1-2), one in Example 3, and two in Comparative Example 1 (Comparative Examples 1-1 and 1-2). Five days after sowing, the length of the sprouts was measured. The sprouts with lengths of 2 cm (1.5 cm or more but less than 2.5 cm), 3 cm (2.5 cm or more but less than 3.5 cm), 4 cm (3.5 cm or more but less than 4.5 cm), 5 cm (4.5 cm or more but less than 5.5 cm), 6 cm (5.5 cm or more but less than 6.5 cm), and 7 cm (6.5 cm or more but less than 7.5 cm) were counted, and the results are shown in FIG. 7.

[0094] As shown in Figure 7, the number of counts was higher overall in the cultivation pots fertilized with the organic fertilizer of the Example compared to the cultivation pots fertilized with the organic fertilizer of the Comparative Example. This is thought to be because the germination rate was improved in the cultivation pots fertilized with the organic fertilizer of the Example. The length of the sprouts tended to be longer with the organic fertilizer of the Example than with the organic fertilizer of the Comparative Example. Furthermore, between Example 1 and Example 3, the length of the sprouts tended to be longer with Example 1. These results show that the use of nitrogen plasma-treated organic fertilizer improves plant growth. [Industrial Applicability]

[0095] According to the present invention, there are provided a method and an apparatus for producing an organic fertilizer having an increased nitrogen content, a method for cultivating plants using the organic fertilizer produced by the method, and a method for improving soil. [Explanation of symbols]

[0096] 100, 200, 300, 400, 500... Organic fertilizer manufacturing apparatus, 101, 201, 301, 401... Housing, 110, 210, 310, 410, 510... Plasma generating electrode, 120... Upper belt conveyor, 121, 131, 141, 231... Endless belt, 130... Lower belt conveyor, 122, 123, 132, 133, 232, 233... Roller, 140... Bucket conveyor, 142... Bucket, 220... Rotating body, 221... Plate, 23 0...flight conveyor, 234...flight, 240...tank, 241...opening, 302...lid, 311...electric wire, 312...electric wire insertion part, 320...agitating fin, 321...rotating motor, 322...rotating shaft, 330...baffle plate, 370...supply pipe, 371...exhaust port, 420, 520...organic fertilizer holding container, 430, 530...power source, 340, 440...pressure adjustment valve, 450...exhaust rotary pump, 360, 460...exhaust pipe, 511, 512...dielectric.

Claims

1. A method for producing an organic fertilizer with increased nitrogen content, comprising a step of nitrogen plasma treatment of one or more solid organic fertilizers selected from the group consisting of fish fertilizer, oil cakes, bone meal, dried bacterial fertilizer, cow manure compost, swine manure compost, poultry manure fertilizer, methane fermentation residue, vegetable compost, sludge compost, and food waste compost.

2. 2. The method according to claim 1, wherein the nitrogen content to be increased is at least one selected from the group consisting of ammonia, nitrate, nitrite, urea, and ions thereof.

3. The method according to claim 1 or 2, wherein the organic fertilizer comprises vegetable compost.

4. A step of producing an organic fertilizer having an enhanced nitrogen content by the production method according to any one of claims 1 to 3; Cultivating plants in soil fertilized with the nitrogen-enriched organic fertilizer; A method for growing plants, including:

5. A step of producing an organic fertilizer having an enhanced nitrogen content by the production method according to any one of claims 1 to 3; applying the nitrogen-enriched organic fertilizer to soil; A method for improving soil, including:

6. a plasma generator; a nitrogen-containing gas supply unit that supplies a nitrogen-containing gas to a plasma generation space of the plasma generator; an organic fertilizer holding section for holding one or more solid organic fertilizers selected from the group consisting of fish fertilizer, oil cakes, bone meal, dried bacterial fertilizer, cow manure compost, swine manure compost, poultry manure fertilizer, methane fermentation residue, vegetable compost, sludge compost, and food waste compost; The nitrogen plasma generated by the plasma generator is irradiated onto the organic fertilizer held by the organic fertilizer holding unit. Equipment for producing organic fertilizer with increased nitrogen content.

7. Further provided is a mixing mechanism for mixing the organic fertilizer. The apparatus for producing the nitrogen-enriched organic fertilizer according to claim 6.

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