Cleaning equipment and vacuum cooling equipment

Abstract

To provide a technology capable of properly washing a vacuum pipe.SOLUTION: A cleaning device 100 of a vacuum cooling device 10 is equipped with a treatment tank 12 that has an inner space in which a cooling object is disposed, and a vacuum device that sucks gas in the inner space through a vacuum pipe. The cleaning device is equipped with a circulation pump 110 circulating a washing liquid in a circulation path including at least a part of the vacuum pipe.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The present disclosure relates to a cleaning device and a vacuum cooling device. [Background technology]

[0002] A vacuum cooling device sucks air from a processing tank, reduces the internal pressure, vaporizes the moisture in the objects in the processing tank, and rapidly cools the objects using the heat of vaporization. Patent Document 1 describes a device that improves the efficiency of sucking air from the processing tank by installing a heat exchanger midway through a vacuum tube and condensing the vaporized moisture (steam) using the heat exchanger. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Japanese Patent Application Laid-Open No. 2001-221546 Summary of the Invention [Problem to be solved by the invention]

[0004] In a vacuum cooling system, air from the treatment tank flows into a vacuum pipe (suction piping) that is connected to the treatment tank and sucks in air. In a vacuum cooling system, liquids and substances that move along with the air in the treatment tank can adhere to the vacuum pipe. Cleaning the inside of the vacuum pipe by hand is a complicated process. Also, there are parts that cannot be cleaned by hand.

[0005] The present disclosure aims to provide a technique for properly cleaning vacuum tubes. [Means for solving the problem]

[0006] According to the present disclosure, there is provided a cleaning device for a vacuum cooling device comprising a processing tank having an internal space in which a cooling object is placed, and a vacuum device that sucks gas from the internal space through a vacuum tube, the cleaning device comprising a circulation pump that circulates a cleaning liquid in a circulation path that includes at least a portion of the vacuum tube. [Effects of the Invention]

[0007] The present disclosure provides a technique for properly cleaning vacuum tubes. [Brief explanation of the drawings]

[0008] [Figure 1] FIG. 1 is a diagram schematically illustrating a vacuum cooling device according to an embodiment. [Figure 2] FIG. 2 is a diagram for explaining the cooling process of the vacuum cooling device according to the embodiment. [Figure 3] FIG. 3 is a diagram for explaining cleaning of the vacuum cooling device according to the embodiment. [Figure 4] FIG. 4 is a diagram showing a schematic diagram of a modification of the cleaning device. [Figure 5] FIG. 5 is a diagram schematically showing a vacuum cooling device according to another embodiment. [Figure 6] FIG. 6 is a diagram illustrating an example of a CIP tank according to the embodiment. [Figure 7] FIG. 7 is a perspective view showing the structure of the bottom of the CIP tank according to the embodiment. DETAILED DESCRIPTION OF THE INVENTION

[0009] Hereinafter, embodiments of the present disclosure will be described with reference to the drawings, but the present disclosure is not limited to the embodiments. The components of the embodiments described below can be combined as appropriate. In addition, some components may not be used.

[0010] [Vacuum cooling device overview] FIG. 1 is a schematic diagram of a vacuum cooling apparatus according to an embodiment. The vacuum cooling apparatus 10 shown in FIG. 1 includes a processing tank 12, a decompression unit 14, a pressure recovery unit 16, and a cleaning device 100. The vacuum cooling apparatus 10 places a cooling target, such as food, in the processing tank 12, seals the processing tank 12, and decompresses the processing tank 12 by sucking and discharging the fluid inside the processing tank 12 to the outside using the decompression unit 14. The cooling target placed in the processing tank 12 is decompressed, causing moisture in the processing target to evaporate. The temperature of the cooling target decreases due to the heat of vaporization of the moisture. After decompressing the processing tank 12, the vacuum cooling apparatus 10 introduces outside air into the processing tank 12 using the pressure recovery unit 16 to achieve approximately the same pressure as the outside air, allowing the cooling target to be removed from the processing tank 12. The cleaning device 100 cleans the decompression unit 14.

[0011] The treatment tank 12 is a hollow container that can withstand reduced pressure inside, and can be opened and closed with a door (not shown). The treatment tank 12 is typically formed in a roughly rectangular box shape, and the opening at the front can be opened and closed with a door. By opening the door, food F can be put in and taken out of the treatment tank 12, and by closing the door, the opening of the treatment tank 12 can be closed airtight. Doors may be provided on both the front and back of the treatment tank 12.

[0012] The decompression unit 14 sucks fluid (mainly gas, specifically air or steam) from the internal space of the treatment tank 12 and discharges it to the outside of the treatment tank 12, thereby reducing the pressure inside the treatment tank 12. The decompression unit 14 is equipped with an exhaust path (vacuum pipe) 20 connected to the treatment tank 12. The decompression unit 14 has an ejector 22, a heat exchanger 24 for steam condensation, a vacuum valve 26, and a vacuum pump 28 (vacuum device) arranged in this order on the exhaust path 20. An exhaust path 30 is connected to the downstream end of the exhaust path 20 via the vacuum pump 28. The exhaust path 30 branches at a branch point 32 into an exhaust pipe 34 and a drainage pipe 36.

[0013] The ejector 22 is provided in the exhaust path 20 and is connected to a steam supply path 40. When steam is supplied from the steam supply path 40 from the upstream side to the downstream side of the exhaust path 20, the ejector 22 sucks in fluid on the treatment tank 12 (upstream side) side of the exhaust path 20 by the ejector effect and discharges it together with steam to the downstream side of the exhaust path 20. A steam supply valve 42 is provided in the steam supply path 40. By operating the steam supply valve 42 to open or close, the supply of steam to the ejector 22 can be controlled, and the ejector 22 can be switched between operating and not operating.

[0014] The heat exchanger 24 is disposed in the exhaust path 20 and performs heat exchange between the steam flowing through the exhaust path 20 and the coolant, thereby cooling the steam. The supply of the coolant will be described later. The heat exchanger 24 is an indirect heat exchanger that exchanges heat between the fluid in the exhaust path 20 and the coolant without mixing them. The steam in the exhaust path 20 is cooled and condensed by the heat exchanger 24.

[0015] The vacuum valve 26 is disposed between the heat exchanger 24 and the vacuum pump 28 in the exhaust path 20 (at a third portion of the vacuum pipe). The vacuum valve 26 is an on-off valve that controls the opening and closing of the exhaust path 20.

[0016] The vacuum pump 28 is a water-sealed type and is operated while being supplied with water called seal water. Water is supplied to the vacuum pump 28 via a seal water supply channel 50. A seal water shutoff valve 52 and a seal water control valve 54 are provided in the seal water supply channel 50. Seal water can be supplied to the vacuum pump 28 by opening the seal water shutoff valve 52. The seal water control valve 54 controls the flow rate of the seal water flowing through the seal water supply channel 50. When the vacuum pump 28 is operated with the seal water shutoff valve 52 and the seal water control valve 54 open, the vacuum pump 28 draws in fluid from the exhaust channel 20 and exhausts and drains the fluid to the discharge path 30. The gas and liquid of the fluid discharged to the discharge path 30 are branched at the branching section 32, with the gas being discharged through the exhaust pipe 34 and the liquid being drained through the drain pipe 36. The vacuum pump 28 may be on / off controlled or inverter controlled.

[0017] The water supply system to the heat exchanger 24 and the vacuum pump 28 will now be described. The heat exchanger 24 and the vacuum pump 28 can be supplied with either room temperature water or cold water by switching between them. Cold water is water that has been cooled to a predetermined temperature by a chiller or the like. Room temperature water is water that has not passed through a cooling device such as a chiller.

[0018] The room temperature water supply channel 56 supplies room temperature water. The room temperature water supply channel 56 includes a feed water pump 57, a room temperature water control valve 58, and a check valve 60. The feed water pump 57 sends room temperature water toward the heat exchanger 24 and the vacuum pump 28. The room temperature water control valve 58 switches between supplying and stopping room temperature water by switching it on and off, and controls the amount of room temperature water supplied by adjusting its opening. The check valve 60 prevents room temperature water from flowing back from the heat exchanger 24 and vacuum pump 28 toward the supply source. The cold water supply channel 62 supplies cold water. The cold water supply channel 62 is connected to the room temperature water supply channel 56 downstream of the check valve 60. The flow path downstream of the point where the room temperature water supply channel 56 and the cold water supply channel 62 join becomes a common water supply channel 64. The common water supply passage 64 is connected to the heat exchanger water supply passage 66 and the seal water supply passage 50, and supplies cold water and room temperature water as coolant to the heat exchanger 24 and the vacuum pump 28. The pressure reducing unit 14 can control the temperature and flow rate of the coolant supplied to the heat exchanger 24 and the vacuum pump 28 by controlling the amount of cold water and room temperature water supplied.

[0019] The heat exchanger supply channel 66 connects the channel through which steam from the heat exchanger 24 passes to a channel that performs indirect heat exchange. The heat exchanger supply channel 66 supplies coolant to the heat exchanger 24 and discharges the coolant that has been heat exchanged. The coolant discharged from the heat exchanger 24 is discharged to a drain channel 68 or a cold water discharge channel 74. The drain channel 68 or the cold water discharge channel 74 is connected to the heat exchanger supply channel 66 downstream of the heat exchanger 24.

[0020] The drainage channel 68 discharges the discharged coolant to the outside. A drainage shutoff valve 70 and a drainage control valve 72 are arranged in the drainage channel 68. The drainage shutoff valve 70 is switched between open and closed to switch whether or not to discharge the coolant from the drainage channel 68. The drainage control valve 72 has an adjustable opening degree to control the flow rate of the coolant discharged from the drainage channel 68.

[0021] Chilled water discharge path 74 returns the coolant discharged from heat exchanger 24 to the chilled water tank (the chiller's water supply source). A chilled water control valve 76 is arranged in chilled water discharge path 74. Chilled water control valve 76 is adjustable in opening / closing and opening degree to control the flow rate of the coolant discharged from chilled water discharge path 74. By adjusting the opening / closing and opening degrees of drain shutoff valve 70, drain control valve 72, and chilled water control valve 76, decompression unit 14 can control whether the coolant discharged from heat exchanger 24 is discharged to the outside, returned to the chiller, or stopped from circulating, for example.

[0022] The pressure recovery unit 16 introduces outside air into the depressurized treatment tank 12 to restore the pressure inside the treatment tank 12. In this embodiment, the pressure recovery unit 16 includes an air intake path 80, an air intake control valve 82, a check valve 86, an air filter 87, and a manual release valve 88. The air intake path 80 is connected to the treatment tank 12, and has the air intake control valve 82 and air filter 87 disposed therein. The air intake control valve 82 is adjustable in opening and closing and its opening degree, and controls the flow rate of outside air flowing through the air intake path 80 and supplied to the treatment tank 12.

[0023] The check valve 86 is connected to the treatment tank 12. The check valve 86 is a valve that allows gas to flow in the direction in which it is discharged from the treatment tank 12 to the outside air, but does not allow gas to flow in the direction from the outside air toward the treatment tank 12. The check valve 86 discharges gas inside the treatment tank 12 to the outside when the pressure inside the treatment tank 12 becomes higher than the outside air. The manual release valve 88 is connected to the treatment tank 12. The manual release valve 88 is a valve that can be manually switched on and off by an operator. The manual release valve 88 opens to supply outside air into the treatment tank 12 when, for example, the air supply control valve 82 malfunctions.

[0024] [Cleaning device overview] The cleaning device 100 cleans the upstream side (treatment tank 12 side) of the exhaust path 20 of the decompression unit 14 between the heat exchanger 24 and the vacuum valve 26. The cleaning device 100 includes a cleaning water supply path 102, a cleaning water supply valve 104, a CIP tank (tank) 106, a connecting pipe 108, a circulation pump 110, a circulation control valve 112, a recovery mechanism 114, a cleaning steam supply path 130, a cleaning steam supply valve 132, a drainage path (drainage pipe) 134, a drainage control valve (drainage valve) 136, and an overflow path 138.

[0025] One end of the cleaning water supply line 102 is connected to the room temperature water supply line 56, and the other end is connected to the CIP tank 106. The cleaning water supply line 102 supplies room temperature water to the CIP tank 106. A cleaning water supply valve 104 is provided in the cleaning water supply line 102. The cleaning water supply valve 104 is capable of opening and closing and adjusting its opening degree, and controls the flow rate of room temperature water that flows through the cleaning water supply line 102 and is supplied to the CIP tank 106.

[0026] The CIP tank 106 is a tank that stores the cleaning liquid that circulates during cleaning. The connecting pipe 108 connects the CIP tank 106 to the exhaust path 20. The connecting pipe 108 is connected to the bottom of the CIP tank 106. The connecting pipe 108 is connected to the exhaust path 20 between the heat exchanger 24 and the vacuum valve 26 (the second portion of the vacuum pipe, the specified portion of the vacuum pipe). The circulation pump 110 is disposed on the connecting pipe 108. The circulation pump 110 transports the cleaning liquid stored in the CIP tank 106 from the CIP tank 106 toward the exhaust path 20. The circulation control valve 112 is disposed on the connecting pipe 108 closer to the exhaust path 20 than the circulation pump 110. The circulation control valve 112 is adjustable in opening / closing and opening degree, and controls the flow rate of the cleaning liquid that flows through the connecting pipe 108 and is supplied to the exhaust path 20. Furthermore, by closing the circulation control valve 112, the fluid flowing through the exhaust path 20 does not flow toward the CIP tank 106 when the decompression unit 14 is operating.

[0027] The recovery mechanism 114 forms part of a circulation path for the cleaning liquid that circulates during cleaning. The recovery mechanism 114 recovers the cleaning liquid discharged from the end of the exhaust path 20 on the treatment tank 12 side (the first part of the vacuum tube) and supplies it to the CIP tank 106. The recovery mechanism 114 includes a recovery path 116, a receiving unit (attachment) 118, and a check valve 120. The recovery path 116 is part of the circulation path, and is connected to the receiving unit 118 at one end and to the CIP tank 106 at the other end. The receiving unit 118 recovers the cleaning liquid discharged from the end of the exhaust path 20 on the treatment tank 12 side. The receiving unit 118 is disposed vertically below the end of the exhaust path 20 on the treatment tank 12 side. The shape of the receiving unit 118 is not particularly limited as long as it can recover the cleaning liquid and allow it to flow into the recovery path 116. For example, a container with an open top can be used. It is preferable that the receiving part 118 is detachable from the processing tank 12. This allows the receiving part 118 to be positioned facing the exhaust path 20 only when it is used for cleaning. A check valve 120 is disposed in the recovery path 116. The check valve 120 allows the cleaning liquid to flow from the receiving part 118 to the CIP tank 106 and prevents the cleaning liquid from flowing from the CIP tank 106 to the receiving part 118.

[0028] The drainage channel 134 is connected to the connecting pipe 108 between the CIP tank 106 and the circulation pump 110. The drainage channel 134 discharges the cleaning liquid in the CIP tank 106 to the outside. The drainage control valve 136 is capable of opening and closing and adjusting its opening degree, and controls the flow rate of the cleaning liquid that flows through the drainage channel 134 and is discharged to the outside.

[0029] The overflow path 138 is located at a position a predetermined distance above the bottom surface of the CIP tank 106. When the water level in the CIP tank 106 becomes higher than the connected position, the cleaning liquid in the CIP tank 106 flows into the overflow path 138. The overflow path 138 discharges the flowing cleaning liquid to the outside. The overflow path 138 is connected to the drainage path 134, and discharges the flowing cleaning liquid to the outside.

[0030] The cleaning steam supply line 130 connects the steam supply line 40 upstream of the steam supply valve 42 to the exhaust line 20 between the heat exchanger 24 and the vacuum valve 26. The cleaning steam supply line 130 supplies steam for sterilization treatment to the exhaust line 20. The cleaning steam supply valve 132 is arranged in the cleaning steam supply line 130. The cleaning steam supply valve 132 is adjustable in opening and closing and its opening degree, and controls the flow rate of steam that flows through the cleaning steam supply line 130 and is supplied to the exhaust line 20.

[0031] In this embodiment, the recovery path 116 serves as a first circulation pipe, and the connecting pipe 108 serves as a second circulation pipe.

[0032] [Various sensors] The vacuum cooling device 10 is equipped with sensors for detecting temperature and pressure in various parts. The pressure sensor 202 detects the pressure inside the treatment tank 12. The condensed water temperature sensor 204 is disposed between the heat exchanger 24 and the vacuum pump 28 in the exhaust path 20 and detects the temperature of the fluid cooled and condensed by the heat exchanger 24. The seal water temperature sensor 206 is disposed in the vacuum pump 28 and detects the temperature of the seal water supplied to the vacuum pump 28. The feed water temperature sensor 208 is disposed in the room temperature water supply path 56 and detects the temperature of the room temperature water flowing through the room temperature water supply path 56. The feed water pressure sensor 210 is disposed in the room temperature water supply path 56 and detects the pressure of the room temperature water flowing through the room temperature water supply path 56. The temperature sensor 220 is disposed in the ejector 22 and detects the temperature of the fluid passing through the ejector 22. The heat exchanger outlet temperature sensor 230 is disposed downstream of the heat exchanger 24 in the heat exchanger supply water path 66. The heat exchange outlet temperature sensor 230 detects the temperature of the coolant that has exchanged heat with the steam in the heat exchanger 24 .

[0033] [Cooling method of vacuum cooling device 10] Next, the operation of the vacuum cooling device 10 will be described. Figure 2 is a diagram for explaining the cooling process of the vacuum cooling device according to the embodiment. During the cooling process, the receiving part 118 of the vacuum cooling device 10 is removed from the processing tank 12. The vacuum cooling device 10 places the object to be processed in the processing tank 12 and closes the door. The object to be processed may be food to be cooled, for example.

[0034] Next, the vacuum cooling device 10 opens the steam supply valve 42 to supply steam from the steam supply path 40 to the ejector 22. The vacuum valve 26 is also opened, and the vacuum pump 28 is operated to create a fluid flow in the exhaust path 20 from the treatment tank 12 toward the heat exchanger 24. Coolant is also supplied to the heat exchanger 24 from the room-temperature water supply path 56 and the cold water supply path 62 via the common water supply path 64 and the heat exchanger water supply path 66. Based on the detection results of the feedwater temperature sensor 208, the feedwater pressure sensor 210, and the heat exchanger outlet temperature sensor 230, the vacuum cooling device 10 controls various valves and pumps to adjust the flow rates of room-temperature water and cold water, thereby adjusting the amount and temperature of the coolant supplied to the heat exchanger 24. The coolant that has passed through the heat exchanger 24 is recovered to the cold water supply section via the cold water discharge path 74 or discharged to the outside via the drainage path 68.

[0035] The vacuum cooling device 10 supplies steam from the steam supply path 40 to the ejector 22, thereby drawing the fluid in the treatment tank 12 into the exhaust path 20 by the ejector effect. The fluid flowing through the exhaust path 20 is pushed by the force of the steam, sucked by the vacuum pump 28, and flows toward the heat exchanger 24. The fluid flowing through the exhaust path 20 is cooled by the heat exchanger 24, whereby at least a portion of the fluid is liquefied and its volume is reduced. This can further increase the effect of the ejector 22 in drawing gas from the treatment tank 12. Furthermore, the reduced volume of the fluid after passing through the heat exchanger 24 can increase the effect of the vacuum pump 28 in drawing the fluid in the exhaust path 20.

[0036] The vacuum cooling device 10 sucks the fluid in the treatment tank 12, reduces the pressure inside the treatment tank 12, evaporates the moisture contained in the treatment object, and cools the treatment object with the heat of vaporization generated during evaporation. After cooling of the treatment object is completed, the vacuum cooling device 10 stops the supply of steam and opens the air supply control valve 82 of the pressure recovery unit 16 to make the pressure inside the treatment tank 12 approximately the same as the outside air, then opens the door of the treatment tank 12 and removes the treatment object.

[0037] [Method for cleaning the vacuum cooling device 10] Next, a method for cleaning the vacuum cooling device 10 will be described. Fig. 3 is a diagram for explaining cleaning of the vacuum cooling device according to the embodiment. The vacuum cooling device 10 sucks air from inside the treatment tank 12 through the exhaust path 20, so that parts of the treatment object and substances that cause contamination flow into the exhaust path 20 along with the air from inside the treatment tank 12. The cleaning device 100 cleans the exhaust path 20, specifically, the area of ​​the exhaust path 20 from the connection part with the treatment tank 12 to where the ejector 22 and heat exchanger 24 are located.

[0038] In preparation for the cleaning process, the worker sets up the receiving section 118. Next, the steam supply valve 42 and the vacuum valve 26 are closed. The drain control valve 136 is also closed. Next, the cleaning water supply valve 104 is opened, and cleaning liquid is supplied from the cleaning water supply path 102 to the CIP tank 106. Note that cleaning liquid may be stored in the CIP tank 106 in advance. The cleaning liquid is room temperature water. Also, cleaning detergent may be supplied to the CIP tank 106 or the path through which the cleaning liquid passes.

[0039] Once a certain amount of cleaning liquid has been stored in the CIP tank 106, the circulation pump 110 is operated, the circulation control valve 112 is opened, and the cleaning liquid is supplied from the connecting pipe 108 to the exhaust path 20. The cleaning liquid supplied to the exhaust path 20 passes through the heat exchanger 24, then the ejector 22, and is discharged from the end on the treatment tank 12 side. The insides of the heat exchanger 24 and the ejector 22 are cleaned as the cleaning liquid passes through them.

[0040] The cleaning liquid discharged from the exhaust path 20 into the treatment tank 12 is collected in the receiver 118 and supplied to the CIP tank 106 via the recovery path 116. This allows the cleaning liquid to circulate along the path indicated by arrows 304, 306, and 308. The path from the CIP tank 106, the connecting pipe 108, the exhaust path 20, the receiver 118, and the recovery path 116, then back to the CIP tank 106, forms the circulation path through which the cleaning liquid circulates. The cleaning liquid fills the exhaust path 20 between the vacuum valve 26 and the end of the treatment tank 12. The cleaning water supply valve 104 switches between on and off based on the amount of circulating cleaning liquid. The supply of cleaning liquid from the cleaning water supply path 102 may be stopped during circulation or may be supplied intermittently at a predetermined flow rate. Circulation can begin before the CIP tank 106 is fully filled with cleaning liquid, improving cleanability and shortening the cleaning time.

[0041] The cleaning device 100 detects the temperature of the cleaning liquid using the temperature sensor 220, and if it is necessary to increase the temperature of the cleaning liquid, it opens the cleaning steam supply valve 132 and supplies steam from the cleaning steam supply path 130 to the exhaust path 20 to heat the cleaning liquid.

[0042] After circulating the cleaning liquid for a predetermined time, the cleaning device 100 stops the circulation pump 110, opens the drain control valve 136, and discharges the cleaning liquid stored in the CIP tank .

[0043] Thereafter, the drain control valve 136 is closed, the cleaning water supply valve 104 is opened, and the cleaning liquid is supplied to the CIP tank 106. The circulation pump 110 is then driven to circulate the liquid again. During this cleaning, the cleaning liquid is circulated without adding detergent to the cleaning liquid, resulting in a rinsing process. After circulating the cleaning liquid during the rinsing process, the cleaning device 100 drains the water from the CIP tank 106 as described above and discharges the circulated cleaning liquid. By performing the rinsing process a predetermined number of times, the inside of the exhaust path 20 is cleaned while suppressing the residue of detergent.

[0044] After performing the rinsing process a predetermined number of times, the cleaning device 100 removes the receiving part 118. After completing the circulating cleaning with the cleaning liquid, the cleaning device 100 may supply steam from the cleaning steam supply line 130 to heat and sterilize the exhaust line 20 with the steam.

[0045] The cleaning device 100 connects a connecting pipe 108 between the vacuum valve 26 and the heat exchanger 24 of the exhaust path 20, collects the cleaning liquid discharged from the end of the exhaust path 20 on the treatment tank 12 side, and circulates the cleaning liquid within the exhaust path 20. This allows the cleaning liquid to be filled and circulated upstream of the vacuum valve 26 (on the treatment tank 12 side), and the inside of the exhaust path 20, including the ejector 22 and the heat exchanger 24, can be cleaned. This allows residues inside the exhaust path 20 to be removed.

[0046] Furthermore, the cleaning device 100 can automatically perform processing after the receiving part 118 is installed. Furthermore, since cleaning can be performed by circulating the cleaning liquid, there is no need for an operator to access and clean the wall surface of the exhaust path 20, including the end of the exhaust path 20 on the processing tank 12 side. This reduces the workload.

[0047] Furthermore, by forming a circulation path and circulating the supplied cleaning liquid, the amount of water used for cleaning can be reduced.

[0048] Furthermore, the cleaning device 100 circulates the cleaning liquid from the vacuum valve 26 to the treatment tank 12, i.e., by circulating the cleaning liquid in the opposite direction to the fluid flow during the cooling process, it is possible to move contaminants to the treatment tank 12, and perform cleaning while preventing contaminants from flowing into areas that the contaminants have not yet reached. Furthermore, the cleaning device 100 stores the cleaning liquid in the CIP tank 106, which serves as a buffer for the circulating cleaning liquid and allows the cleaning liquid to be suitably circulated within the exhaust path 20. Furthermore, by providing the cleaning device 100 with a detachable receiving portion 118, it is possible to provide a mechanism for cleaning up to the end of the exhaust path 20 without reducing the functionality of the vacuum cooling device 10.

[0049] The recovery path 116 may be fixed to the treatment tank 12, or may be installed in the treatment tank 12 together with the receiving part 118 only during cleaning. For example, the recovery path 116 may be a path that passes through the door of the treatment tank 12. The receiving part 118 is detachable from the recovery path 116, but the receiving part 118 may be disposed within the treatment tank 12 and moved to a position facing the exhaust path 20 only during use. In this case, the recovery path 116 is preferably a pipe connected to the treatment tank 12. The cleaning device 100 may also be detachable from the vacuum cooling device 10. In this case, a connector for connecting to the cleaning device 100 is disposed on each pipe of the vacuum cooling device 10.

[0050] Furthermore, although the vacuum cooling device 10 of this embodiment has a structure including the ejector 22, the vacuum cooling device 10 may not include the ejector 22.

[0051] Figure 4 is a diagram showing a schematic diagram of a modified example of the cleaning device. The vacuum cooling device 10a shown in Figure 4 is equipped with a cleaning device 100a. Compared to the cleaning device 100, the cleaning device 100a does not have a CIP tank 106 and has a different structure for the recovery mechanism 114. The structure unique to the cleaning device 100a will be described below. The cleaning device 100a is equipped with a recovery mechanism 114a.

[0052] The recovery mechanism 114a includes an on-off valve 170, a recovery path 172, an on-off valve 174, a check valve 176, and a check valve 178. The on-off valve 170 is disposed between the end of the exhaust path 20 on the treatment tank 12 side and the ejector 22. The recovery path 172 connects the exhaust path 20 between the ejector 22 and the on-off valve 172 (a first portion of the vacuum tube) and the cleaning water supply path 102. The on-off valve 174 is disposed in the recovery path 172. The check valve 176 is disposed in the recovery path 172 and prevents fluid from flowing from the recovery path 172 toward the cleaning water supply path 102 and from flowing in the reverse direction. The check valve 178 is disposed in the cleaning water supply path 102 and prevents fluid from flowing from the cleaning water supply path 102 toward the connecting pipe 108 and from flowing in the reverse direction. In this modification, the recovery mechanism 114a has the recovery path 172 as part of a circulation path. The collection path 172, the portion of the cleaning supply path 102 downstream of the connection portion with the collection path 172, and the connection pipe 108 form a circulation pipe.

[0053] During the cooling process, the recovery mechanism 114a opens the on-off valve 170 and closes the on-off valve 174 to connect the ejector 22 and the treatment tank 12. During the cleaning process and when the cleaning liquid is circulated through the circulation path, the recovery mechanism 114a closes the on-off valve 170 and opens the on-off valve 174. This causes the cleaning liquid to flow from the exhaust path 20 into the recovery pipe 172, and then through the cleaning water supply path 102, the connecting pipe 108, and the exhaust path 20 in this order. The recovery mechanism 114a is also provided with a check valve 176, which can prevent water supplied from the room-temperature water supply path 56 from flowing into the treatment tank 12. The recovery mechanism 114a is also provided with a check valve 178, which can prevent the circulating cleaning liquid from flowing upstream of the check valve 178 into the cleaning water supply path 102. At the start of cleaning, the cleaning device 100a supplies cleaning liquid from the room temperature water supply channel 56 via the cleaning water supply channel 102. The detergent component may be introduced from a branch pipe provided in the circulation path.

[0054] The cleaning device 100a does not have a receiving part (attachment) 118, but has a collection path 172 connected to the exhaust path 20, so that an operator can start cleaning by simply opening and closing a valve without installing the receiving part 118. This simplifies the work. Also, there is no need to provide a place to store the receiving part 118.

[0055] In this embodiment, the on-off valve 170 is used, but a removable plug that closes the end of the treatment tank 12 of the exhaust path 20 may be used instead of the on-off valve 170. In this way, the area in contact with the plug can be additionally cleaned, thereby cleaning the entire target area of ​​the exhaust path 20.

[0056] Furthermore, the recovery mechanism 114a may be configured without the on-off valve 174 of the recovery path 172. The check valve 178 prevents a flow from the recovery pipe 172 toward the exhaust pipe 20, thereby preventing air or liquid from flowing in from the recovery path 172 during the cooling process. Furthermore, although the present embodiment is configured without the CIP tank 106, the recovery mechanism 114a may be configured with the CIP tank 106 and the recovery mechanism 114a. In this case, the recovery path 172 of the recovery mechanism 114a is connected to the CIP tank 106 instead of the cleaning water supply path 102.

[0057] Furthermore, cleaning device 100a can circulate cleaning liquid even when it is configured without CIP tank 106. Note that cleaning device 100a preferably has a valve for venting air in the circulation path. This allows cleaning liquid to be properly filled in the circulation path. When the CIP tank 106 is not configured, a receiving section 118 may be provided and used as a buffer for the cleaning liquid and an air vent for the circulation path.

[0058] [Other embodiments] Fig. 5 is a diagram schematically illustrating a vacuum cooling device according to another embodiment. The cleaning device 100b of the vacuum cooling device 10b shown in Fig. 5 includes a hot water supply passage 402 (bypass pipe) and a hot water control valve 404 (on / off valve) in addition to the configuration of the cleaning device 100 of the vacuum cooling device 10 shown in Fig. 1.

[0059] The hot water supply path 402 connects the portion (outlet pipe) of the heat exchanger supply path 66 downstream of the heat exchanger 24 to the cleaning water supply path 102 connected to the CIP tank 106. The hot water supply path 402 supplies the cooling liquid from the heat exchanger supply path 66 to the cleaning water supply path 102. The cooling liquid supplied to the hot water supply path 402 is supplied to the CIP tank 106 via the cleaning water supply path 102. A hot water control valve 404 is provided in the hot water supply path 402. The hot water control valve 404 is adjustable in opening / closing and opening degree, and controls the flow rate of the cooling liquid flowing through the hot water supply path 402 and supplied to the cleaning water supply path 102. The hot water supply path 402 may be provided with a check valve so that the cooling liquid flows only in the direction in which the cooling liquid from the heat exchanger supply path 66 is supplied to the cleaning water supply path 102.

[0060] In the cleaning device 100b shown in FIG. 5, when cooling water is generated and determined to be discharged from the drainage channel 68 after passing through the heat exchanger 24 during cooling processing in the vacuum cooling device 10b, the cleaning device 100b opens the hot water control valve 404 without opening the drainage shutoff valve 70 and the drainage control valve 72, and supplies the cooling water that has passed through the heat exchanger 24 to the CIP tank 106 via the hot water supply channel 402 and the cleaning water supply channel 102. For example, when the temperature of the object to be vacuum-cooled is high, high vacuum is not required, so room temperature water is supplied. As the temperature of the outlet cooling water rises, the hot water control valve 404 is opened. On the other hand, when the temperature of the object to be vacuum-cooled is low, high vacuum is required, so the water is switched to cold water. When the temperature of the outlet cooling water drops, the cold water control valve 76 is opened to circulate and reuse the water. Here, the cleaning device 100b can control the opening and closing of the hot water control valve 404 based on the detection result of the heat exchanger outlet temperature sensor (temperature sensor) 230. For example, the cleaning device 100b opens the hot water control valve 404 when the coolant temperature detected by the heat exchanger outlet temperature sensor 230 is equal to or higher than a specified value (upper limit temperature), and closes the hot water control valve 404 when the coolant temperature detected by the heat exchanger outlet temperature sensor 230 is lower than a specified value (lower limit temperature). The upper and lower limit specified values ​​may be the same or different.

[0061] This allows the cooling liquid that would have been discharged to the outside to be used for cleaning the cleaning device 100b, thereby reducing the amount of water used. Also, since the CIP tank 106 is equipped with an overflow path 138, even if more cooling liquid (cleaning liquid) than the CIP tank 106 can store is supplied, it can be discharged.

[0062] Furthermore, by supplying the cooling liquid that has passed through the heat exchanger 24 to the CIP tank 106, water that is warmer than room temperature water can be supplied to the CIP tank 106. This allows hotter water to be used for cleaning, thereby increasing the efficiency of cleaning.

[0063] [Example of a CIP tank] Fig. 6 is a diagram showing an example of a CIP tank according to an embodiment. Fig. 7 is a perspective view showing the structure of the bottom of a CIP tank according to an embodiment. The CIP tank 106 shown in Fig. 6 has a recess 504 provided on the bottom surface of the tank body 502. The recess 504 is connected to the connecting pipe 108. In other words, the CIP tank 106 has the recess 504 at the connection portion with the connecting pipe 108, which discharges the stored cleaning liquid. The connection portion of the recess 504 with the connecting pipe 108 serves as an outlet. The outlet in this embodiment is circular.

[0064] The recess 504 is a depression formed vertically below the bottom surface of the tank body 502, and is the area where the cleaning liquid stored in the CIP tank 106 first collects. The recess 504 in this embodiment has a circular opening and a cylindrical area for storing the cleaning liquid, with a depth A and a diameter d.

[0065] A vortex suppression member 510 is disposed in the recess 504. The vortex suppression member 510 is made up of two plates 512. Each plate 512 is inserted into the recess 504 with its thickness direction oriented horizontally and intersects with the other plate 512. In other words, the vortex suppression member 510 includes a first plate 512 extending in a first direction parallel to the bottom surface and a second plate 512 extending in a second direction on the bottom surface that is perpendicular to the first direction, and the centers of the first and second plates are fixed together.

[0066] CIP tank 106 has recess 504 at the connection part with connecting pipe 108, and by storing the cleaning liquid in recess 504, it is possible to apply a head pressure equivalent to depth A to drainage channel 134. Recess 504 has a diameter of d and a smaller cross-sectional area than tank body 502, so that less water is required to create a head pressure of depth A.

[0067] Here, it is preferable that the opening area of ​​the upper end of the recess 504 of the CIP tank 106 is smaller than the diameter of the bottom surface of the tank body 502 and is at least twice the diameter (caliber) of the outlet. This reduces the amount of water required to ensure the hydraulic head pressure. Furthermore, by making the opening area at least twice the diameter of the outlet, the flow of the cleaning liquid in the recess 504 can be appropriately controlled, and a decrease in the hydraulic head pressure can be suppressed.

[0068] Furthermore, by providing the vortex suppression member 510 to the CIP tank 106, it is possible to suppress the generation of vertical vortices inside the recess 504, and ensure the flow rate flowing from the CIP tank 106 to the connecting pipe 108. As an example, by providing the vortex suppression member 510, it is possible to more than double the amount of cleaning liquid flowing into the connecting pipe 108 compared to when the vortex suppression member 510 is not provided.

[0069] Here, it is preferable that the height difference between the upper opening of the recess and the suction port of the circulation pump 110 of the cleaning device 100 is equal to or greater than the effective suction head, and that the lower end surface of the recess is positioned below the effective suction head. This allows the cleaning liquid to be supplied appropriately from the CIP tank 106 to the circulation pump 110.

[0070] Furthermore, by using it in a CIP tank 106 as in this embodiment, cleaning can be performed suitably using the cleaning device 100, but it is not limited to this, and it can be suitably used as a tank structure that is a mechanism for circulating circulating liquid within a path and serves as a buffer for supplying circulating liquid to a circulating pump. [Explanation of symbols]

[0071] 10, 10a, 10b... vacuum cooling device, 12... treatment tank, 14... pressure reduction unit, 16... pressure recovery unit, 20... exhaust path (vacuum tube), 22... ejector, 24... heat exchanger, 26... vacuum valve, 28... vacuum pump, 30... exhaust path, 32... branching section, 34... exhaust piping, 36... drainage piping, 40... steam supply path, 42... steam supply valve, 50... seal water supply path, 52... seal water shutoff valve, 54... seal water Control valve, 56... room temperature water supply line, 57... water supply pump, 58... room temperature water control valve, 60... check valve, 62... cold water supply line, 64... common water supply line, 66... ​​heat exchanger water supply line, 68... drain line, 70... drain shutoff valve, 72... drain control valve, 74... cold water discharge line, 76... cold water control valve, 80... air supply line, 82... air supply control valve, 86... check valve, 87... air filter, 88... manual release valve, 100, 100a , 100b... cleaning device, 102... cleaning water supply line, 104... cleaning water supply valve, 106... CIP tank, 108... connecting pipe, 110... circulation pump, 112... circulation control valve, 114, 114a... recovery mechanism, 116, 172... recovery path, 118... receiving part, 120, 176, 178... check valve, 130... cleaning steam supply line, 132... cleaning steam supply valve, 134... drainage line, 136... drainage control Control valve, 138...overflow path, 170...opening / closing valve, 202...pressure sensor, 204...condensate water temperature sensor, 206...sealing water temperature sensor, 208...supply water temperature sensor, 210...supply water pressure sensor, 220...temperature sensor, 230...heat exchanger outlet temperature sensor, 402...hot water supply path, 404...hot water control valve, 502...tank body, 504...recess, 510...vortex suppression member, 512...plate.

Claims

1. A cleaning device for a vacuum cooling device, comprising: a processing tank having an internal space in which a cooling target is placed; and a vacuum device that sucks gas from the internal space through a vacuum tube, a circulation pump that circulates the cleaning liquid through a circulation path that includes at least a portion of the vacuum tube; a circulation pipe connecting a first portion of the vacuum tube and a second portion of the vacuum tube that is closer to the vacuum device than the first portion, The circulation path includes the circulation pipe. Cleaning equipment.

2. the vacuum cooling device includes a heat exchanger that cools the gas sucked from the internal space, the heat exchanger is disposed between the processing tank and the vacuum device; At least a portion of the vacuum tube is disposed in the heat exchanger. The cleaning device according to claim 1 .

3. The circulation pump circulates the cleaning liquid so that the cleaning liquid flows from the heat exchanger toward the treatment tank. The cleaning device according to claim 2 .

4. an attachment disposed in the internal space and facing an opening of the vacuum tube facing the internal space; the first portion includes an opening of the vacuum tube; The circulation pipe is connected to the attachment. The cleaning device according to any one of claims 1 to 3.

5. A tank for storing cleaning liquid is provided. the circulation path includes the tank, The circulation pipe includes a first circulation pipe connecting the first portion and the tank, and a second circulation pipe connecting the tank and the second portion; The cleaning device according to any one of claims 1 to 4.

6. A tank disposed in the circulation path, The tank is The bottom and a recess provided in a part of the bottom surface; an outlet provided in the recess The cleaning device according to any one of claims 1 to 4.

7. a drain pipe branching from the circulation pipe; a drain valve that opens and closes the drain pipe, After the circulation of the cleaning liquid is completed, the drain pipe is opened by the drain valve. The cleaning device according to any one of claims 1 to 6.

8. an on-off valve disposed at a third portion of the vacuum tube closer to the vacuum device than the second portion; the vacuum tube is closed by the on-off valve while the cleaning liquid is circulating; The cleaning device according to any one of claims 1 to 7.

9. A cleaning device for a vacuum cooling device, comprising: a processing tank having an internal space in which a cooling object is placed; and a vacuum device that sucks gas from the internal space through a vacuum tube, a circulation pump that circulates the cleaning liquid through a circulation path that includes at least a part of the vacuum tube; the vacuum cooling device includes a heat exchanger that cools the gas sucked from the internal space, the heat exchanger is disposed between the processing tank and the vacuum device; At least a portion of the vacuum tube is disposed in the heat exchanger; The circulation pump circulates the cleaning liquid so that the cleaning liquid flows from the heat exchanger toward the treatment tank. Cleaning equipment.

10. A tank disposed in the circulation path, The tank is The bottom and a recess provided in a part of the bottom surface; an outlet provided in the recess The cleaning device according to claim 9.

11. a processing tank having an internal space in which a cooling target is placed; a vacuum device that sucks gas from the internal space through a vacuum tube; and the cleaning device according to any one of claims 1 to 10. Vacuum cooling device.

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