Cost-effective powder production

Abstract

A method for producing particulate materials by atomization (CA) is disclosed. The method is suitable for obtaining fine spherical powders with excellent morphological quality and very low or no content of non-spherical particles and internal voids. A cost-effective method suitable for producing large batches of powders of metals, alloys, intermetallic compounds, metal matrix composites or metal-like materials on an industrial scale is also disclosed. The atomization technique can be extended beyond centrifugal atomization using rotating body technology.

Description

[Technical Field]

[0001] This invention relates to a method for producing metal-based alloy powders or particulate materials using centrifugal atomization, primarily using rotating disk atomization technology. The invention is designed to produce rapidly solidified metal powders. Additionally, the invention enables the cost-effective production of fine or ultrafine, highly spherical powders with narrow particle size distributions. Furthermore, the invention can produce spherical powders or particulate materials with very little or no sausage-shaped, teardrop-shaped, ellipsoidal, broken spheres, or other non-spherical particles, intra-sphere voids, or hollow spheres, which have previously been unavoidable in centrifugal atomization of ultrafine powders. The invention also enables the production of difficult-to-handle alloy powders (e.g., alloys with very high melting points or containing elements that react strongly with oxygen) using atomization. [Background technology]

[0002] overview Atomization is the primary method for producing pre-alloyed powders from low-melting-point solder alloys, aluminum, copper, iron, low-alloy steel, stainless steel, tool steel, titanium, and superalloys. While various manufacturing methods exist, atomization processes and techniques, particularly water and gas atomization, have remained the dominant method for producing high-melting-point metal powders. While both techniques are relatively simple to implement, they also suffer from well-known characteristics of the resulting powders, including irregular shape, poor surface quality, relatively high internal porosity, and a relatively wide particle size distribution (high geometric standard deviation σ_”g”, approximately 2.0–2.3). These techniques also pose additional challenges when attempting to obtain powders containing elements that react strongly with oxygen, such as lithium and scandium. Atomization using high-purity gases increases costs and results in losses of these reactive elements. Lithium is expensive, and scandium is even more expensive. For aluminum alloys containing approximately 0.5 wt% scandium, the typical requirement is to add four times as much scandium to the melt pool. This loss of this alloying element can potentially increase the cost of the metal powder by as much as €60 / kg. In the case of lithium, magnesium-lithium alloys with lithium contents exceeding 10 wt% are virtually impossible to process. Under certain process conditions, other techniques, such as centrifugal atomization (CA), offer greater energy efficiency. However, these processes are often more technically complex than the aforementioned techniques. When the process is controlled, high-quality powders can be obtained with a low percentage of nonspherical irregular particles. These particles increase with the production of smaller particles and are often impossible to separate, especially when very fine particles are included. Despite their small percentage, the presence of these nonspherical particles jeopardizes the overall usefulness of the powder in many applications.

[0003] There are two main types of centrifugal atomization: rotating electrode and rotating disk. Centrifugal atomization using a rotating electrode involves rotating an electrode of the metal, alloy, intermetallic compound, or metal matrix composite to be produced at extremely high speed and melting it at its tip using a high-power laser, electron beam, or focused plasma. Centrifugal atomization of molten metal using a rotating body is a physical method of producing powder from liquid metal. A liquid stream of molten metal (also called liquid metal) is passed through a rotating disk or other device, where it is broken down and dispersed into extremely fine powder by the action of centrifugal force, and then solidifies upon contact with the air.

[0004] Rotating electrodes using plasma, electron beam and laser melting are well-established technologies for producing very high quality spherical powders, but existing solutions are very costly.

[0005] Centrifugal molten atomization of metals by a rotating body is established for the production of less finely divided low melting point solder alloys.

[0006] In PCT / EP2015 / 051632, a method of centrifugal atomization using a rotating disk is described that can be used successfully to atomize fine powders of some difficult alloys, as well as those and other alloys. However, the application does not describe any specific measures to eliminate the fraction of non-spherical particles that occurs in all centrifugal atomization methods unless very specific measures are taken to counteract this effect.

[0007] Traditionally, tool steel powders have been produced by gas or water atomization. Water-atomized tool steel powders generally exhibit irregular particles, favoring higher theoretical densities for die compaction and sintering. Gas-atomized tool steel powders have spherical or nearly spherical particles with high bulk densities, but may require consolidation by hot or cold isostatic pressing. The key to powder metallurgy for tool steel is primarily the uniform structure and greater homogeneity of its chemical composition obtained compared to wrought or conventional products. These conditions, for example, lead to superior toughness values ​​and reduced distortion during heat treatment, resulting in improved tool life. Recently, systems utilizing the direct reduction of titanium dioxide powders have been developed, but similar results are also true for most metal alloy powders.

[0008] The general concept of centrifugal atomization using a rotating body was developed quite some time ago, and many different scientific teams have worked on this technology at different times and places. It is therefore generally accepted in the scientific community that the technology has unavoidable physical limitations. These limitations have largely prevented its expansion beyond its current use for the production of somewhat coarse, low-melting-point metal or metal-like powders.

[0009] Two major limitations of this technology, based on well-studied physical principles of operation, are the exponential relationship between the achievable average particle size and the rotational speed of the liquid dispersing rotor. That is, at low rotational speeds, small increases in rotational speed result in large decreases in the average particle size of the atomized powder. However, this effect diminishes until very high rotational speed increments are required for irrelevant particle size reduction (Figure 1). In fact, considering the rotational speeds achievable within the next 20 years, there is a theoretically achievable minimum size with this technology, but this depends on the chemistry of the powder being produced. In fact, if achievable rotational speeds were to increase 10-fold over the next 20 years, the minimum achievable average particle size would remain almost unchanged using this technology.

[0010] The average particle size and the amplitude of the particle size distribution are crucial because they make the difference between a rare technology that is evaluated at scientific conferences and one with potential for industrial application. This is because these two factors have a very direct impact on the manufacturing cost of the resulting powder. Fine or very fine powders with large average particle sizes and very wide particle size distributions can be obtained. However, in these cases, only a small portion of the powder produced is micronized, which is very costly and only suitable for scientific research. On the other hand, technologies that provide fine or very fine average particle sizes and narrow particle size distributions result in the majority of the powder being micronized.

[0011] Another major limitation of this technology is the production of high-melting-point alloys. In fact, powders of alloys with melting points above 700 K have been produced on a laboratory scale, recognizing that they cannot be scaled up on an industrial scale. Laboratory-scale atomization has also been performed on powders with melting points above 1300 K, and even on Ni-, Ti-, and Fe-based alloys. However, only very small amounts can be atomized on a laboratory scale. This makes scaling up this technology to an industrial scale impractical. Attempts to increase production volumes are known to result in a deterioration in the morphological quality of the resulting powder. Alloys containing elements highly reactive with oxygen are even more difficult to handle and are even more impractical.

[0012] In summary, due to the twofold limitation of centrifugal atomization using a rotating body, there are two problems that the present invention aims to solve: The possibility of micronization It is possible to produce highly reactive and difficult alloys.

[0013] In both cases, the expected technical effect is to obtain spherical powders or particulate materials with very little or no intra-sphere voids or hollow spheres, which are unavoidable in centrifugal atomization of sausage-shaped, teardrop-shaped, and other non-spherical particles, as well as ultrafine powders. One of the major challenges is achieving this at a practically relevant cost and without any significant loss of morphological quality. The inventors have found that, in some applications, the present invention is suitable for obtaining surprisingly narrow particle size distributions of fine, spherical powders with exceptional morphological quality. Furthermore, the present invention is suitable for producing powders with a higher metallic character, which is suitable for several end-user applications. The disclosed powder production method is also suitable for producing particulate materials that are substantially completely free of particles containing thick oxide crusts and have exceptionally little or no internal voids. The inventors have also found that, in some applications, the method disclosed herein enables the production of fine powders at surprisingly lower costs than those observed with methods disclosed in the prior art. Powder flowability is directly related to inter-particle friction. The disclosed method is also suitable for obtaining fine and spherical powder particle size distributions with excellent flow properties. Furthermore, when the present invention is followed, the level of microsegregation in the atomized powder is surprisingly lower than expected.

[0014] While existing models are typically incomplete when it comes to the average particle size achieved by centrifugal atomization of large batches, the inventors discovered, quite surprisingly, that they ignored a combination of variables that appeared to be more relevant than almost all other variables considered in the models. The inventors discovered a way to obtain a much finer powder than PCT / EP2015 / 051632. More importantly, the powder is virtually free of non-spherical particles and void powder, which is crucial to limit given the difficulty of separating small amounts of fine powder and the obstacles it poses in certain applications. After all rational selections were made, random combinations of process variables were tested. At the point of almost giving up, the inventors were fortunate enough to find a combination of variables that solved the problem.

[0015] Background technology The following paragraphs briefly review the current state of atomization technology and relevant aspects, although excellent comprehensive literature reviews exist [Metal Powder Industry, ISBN-13: 978-187895415, 1992; Oxford University Press, ISBN-13: 978-0198562580, 1994; ASM International, ISBN-13: 978-0871703873, 1998; Metal Powder Industry, ISBN-13: 978-0976205715, 2005]. Melt atomization involves converting a large volume of liquid into a spray of droplets in the ambient atmosphere. This liquid volume is formed by melting a solid substance under normal conditions of pressure and temperature (20°C and 1 atm). After the atomization stage and cooling, the final product is a powder. Metal atomization is the most common method, capable of producing metal powders with a wide range of compositions and particle sizes. Centrifugal atomization of melts using a rotating body (also known as rotating disk, rotating cup, or rotary atomization) is defined as a physical method in which a liquid stream of molten metal is passed through a rotating disk (SDA) or other rotating medium, and the centrifugal force of the rotating medium breaks it up into droplets, flakes, dust, or other droplets that solidify on contact with the air, thereby obtaining a powder [ASM International, ISBN-13: 978-0871703873, pp. 35-52, 1998].

[0016] Figure 1 shows that the achievable average particle size depends on the material being processed and, in particular, the rotational speed of the atomizer. However, the speed dependence is exponential and exhibits a saturation effect. The hydraulic pressure, the amount of material processed per unit time, and other variables also play a role. However, their contribution to particle size is almost negligible compared to the two variables shown (the nature of the atomizing fluid and the rotational speed), especially when maintained at levels meaningful for industrial production. This figure clearly shows that the cost-effectiveness of producing fine and ultrafine powders using centrifugal atomization with a rotating body is negligible. Furthermore, centrifugal atomization of spherical powders always contains small to medium amounts of non-spherical powder. However, for fine, medium, and coarse powders, these can be separated and are not considered important because they only have a negative impact on yield. However, for ultrafine powders, separation becomes extremely difficult or impossible. Because such ultrafine powders cannot theoretically be achieved by centrifugal atomization (see Figure 1), this fraction has not been given much thought or even mentioned. US 2002 / 0094297 describes small laboratory batches of powder. The disks are directly cooled with water (quenched disks), and the minimum particle size achievable is 177 microns. Furthermore, spherical powders cannot be obtained, and there is no mention of methods for removing non-spherical particles such as sausage-shaped particles, satellites, and splats, or of removing voids or hollow particles. Among other things, there is no mention of a method for controlling the pressure depending on the disk rotation speed.

[0017] US 4,374,074 describes a method for producing coarse fibers and particles (approximately 400 microns - as can be seen in the diagram of the achievable size of spherical particles) typical of older products produced by foundries, such as blast furnace slag, steel shot, and molten flux. Because a disk without protrusions is used, spherical powder cannot be obtained, and there is no mention of a method for removing non-spherical particles such as sausage-shaped particles, satellites, and splats, or of removing voids or hollow particles within particles. In particular, there is no mention of a method for controlling the pressure depending on the disk rotation speed. When processing high-temperature materials, the disk rotation speed is quite limited.

[0018] US 2,356,599 describes a method for producing metal powder by grinding a material with several blades on a rotating disk. Spherical powder cannot be obtained, and there is no mention of a method for removing non-spherical particles such as sausage-shaped particles, satellite particles, and splats, or of removing voids or hollow particles. In particular, there is no mention of a method for controlling the pressure depending on the rotation speed of the disk. This method uses a cooling liquid that directly contacts the ground material.

[0019] US 4,731,517 describes a method for producing fine spherical powder. The disks used in this method have no protrusions. There is no mention of a method for removing non-spherical particles such as sausage-shaped particles, satellites, or splats, or a method for removing voids or hollow particles. Some photographs of the produced powder are also shown.

[0020] US 2,305,172 describes a method for producing fairly coarse metal powder (approximately 300 microns) by grinding the material with several blades on a rotating disk. It is not possible to obtain spherical powder, and there is no mention of a method for removing non-spherical particles such as sausage-shaped particles, satellite particles, and splats, or of removing voids or hollow particles. In particular, there is no mention of a method for controlling the pressure depending on the rotation speed of the disk. In this method, a refrigerating liquid is used to cool the disk.

[0021] PCT / EP2015 / 051632 discloses a method for producing fine powders of high-melting-point alloys at high productivity rates by centrifugal atomization. However, PCT / EP2015 / 051632 does not mention how to obtain very fine powders with an extremely low fraction of non-spherical particles or even the absence of non-spherical particles. It also does not mention how to produce very fine powders of alloys containing elements that are highly reactive with oxygen.

[0022] However, centrifugal atomization using a rotor is difficult to operate under industrial conditions when applied to refractory metals. Furthermore, premature solidification of the liquid (skull) on the rotor, imbalance forces, erosion, thermal fatigue, and material compatibility issues result in a very short rotor assembly lifespan and consequently high rotor assembly maintenance costs. This has led to this method being envisioned only on a laboratory scale for demonstration purposes and always associated with the production of very small batches. To address this issue, many methods have employed water cooling. However, this not only affects the powder morphology but also the surface oxidation, making it unacceptable for most applications involving extremely fine powders with little or no nonspherical particle fraction, much less for alloys with phases or elements that react strongly with oxygen. One example of this is the rapid condensation rate process (RSR), developed by Pratt & Whitney-United Technologies (US Pat. No. 4,078,873 A and US Pat. No. 4,343,750 A) to produce superalloy powders. This technology is one of the most recognized centrifugal atomization techniques using rotating disks for refractory alloys. () The largest RSR facilities have atomization chambers with diameters of approximately 5 m and closed-loop recirculation systems, capable of processing batches of up to 900 kg. Production rates for Ni-base superalloys reach 1100 kg / h. The large amount of helium used in this process is another drawback, as it significantly contributes to costs. The biggest drawback is the need for water cooling of the disk, which has a significant negative impact on powder quality for many alloy systems. Due to these drawbacks, water atomization and gas atomization are the dominant methods for producing refractory metal powders.

[0023] Surprisingly, centrifugal atomization using rotating bodies has not progressed as technologically as expected due to the high cost of the powders produced. The very limited success of this type of technology applied to high-melting-point materials can be attributed to the technical and economic difficulties related to the quality and properties of the produced powders. These relate to morphology, surface quality, microstructure (at different levels; nano- and femto-), small-scale production, productivity ratio (yield), cost, etc. These also likely result from the conclusions drawn from existing models for the production of ultrafine powders, as depicted in Figure 1.

[0024] Melt atomization has many applications and advantages in the production of metal powders. The main difficulty in the development of this technology has been the lack of suitable materials and methods for handling molten metals. At the same time, some of its most attractive advantages relate to the high flexibility of alloying and the control of impurities, making it the only method for producing pre-alloyed powders. Several atomization techniques have been developed to produce metal powders and pre-alloyed powders from ferrous and non-ferrous alloys. Some of these techniques have been widely developed and applied to large-scale production (over 95% of the world's atomization capacity), including two-fluid atomization, such as gas atomization, water atomization, oil atomization, vacuum atomization, and rotating electrode atomization.

[0025] Finally, it is worth noting that centrifugal or rotary atomization is much more energy efficient than water or gas atomization and produces much narrower particle size distributions, with geometric standard deviations in the range of 1.2-1.4. This technology produces particle sizes up to 1.0-10 5 It can be operated at a high cooling rate of ℃ / s. In a simple model, droplet formation requires a balance of forces between the acceleration force due to rotation and the surface tension of the liquid. Therefore, the average particle diameter of centrifugal atomized particles (D 50 ) has been established to be governed and controlled by, in order of importance, angular velocity, diameter of the rotor, metal surface tension to density ratio, molten metal feed rate, and viscosity.

[0026] Despite the above advantages, centrifugal atomization, especially centrifugal disk atomization, has not been used for industrial-scale powder production due to several technical limitations. Some researchers argue that the full realization of centrifugal atomization for industrial applications is also hindered by the lack of a deep scientific understanding of the process and a reliable design. [Modelling Simul. Mater. Sci. Eng. Vol. 12, pp. 959-971, 2004, Powder Metall., Vol. 47, pp. 168-172, 2004; Proc. of Int. Conf. on Spray Deposition and Melt Forming, Bremen Universitaet, pp. 1-6, 2006] Changes in atomization technique not only result in obvious changes in the morphology, surface quality, particle size distribution, and composition of the produced powder, but also promote significant differences in the powder's microstructural characteristics. It is well known that the structure of atomized powders is controlled by the relationship between the solidification rate, thermal gradient, and cooling rate, and is also influenced by the process operating conditions and the physical properties of the atomized metal. The formation of the resulting microstructure (planar, cellular, dendritic, or dendrite-like microstructure) strongly depends on the combination of these and other variables that are not well understood.

[0027] PCT / EP2015 / 051632 describes some of the conditions necessary to obtain fine and ultrafine powders. It also describes the combination of properties required to obtain powders with a very small or no non-spherical particle fraction, which is very important for ultrafine powder applications (especially in cases like 3D printing). However, it does not provide insight into obtaining atomized powders that are difficult to obtain due to low melting points, lightness, or extreme reactivity. It also does not mention the solutions presented herein regarding the rotating body system and the interaction between the liquid and the atmosphere.

[0028] However, contrary to what has been said and observed so far, the inventors have discovered that, by taking certain precautions, centrifugal atomization using a rotating body is suitable for the mass production of fine and ultrafine powders. Furthermore, this method allows for the mass production of powders of materials with very low melting points or highly reactive materials, and is the most cost-effective and environmentally friendly way to powder steel, saving a great deal of energy. Surprisingly, it is possible to technically exceed the theoretical limit for the minimum powder size, and, most notably, the fraction of non-spherical particles in the powder is extremely small or non-existent. [Brief explanation of the drawings]

[0029] [Figure 1] The effect of rotational angular velocity on particle size in centrifugal atomization of different pure metals. Example of the effect of molten metal properties (surface tension, density, etc.) on particle size under the same processing conditions. [Figure 2] 1. Ceramic disk with vane-like protrusions. 2. Support cage. 3. Insertion direction and point of the metal liquid to be sprayed. 4. Contact point between the gauge and the disk, which applies a horizontal compressive load to the disk. 5. Contact point between the gauge and the disk, which applies a vertical compressive load to the disk. [Figure 3] Scanning electron micrographs (SEM) of atomized powders produced by the atomization process described herein: (a) aluminum-based alloy; (b) tin-based alloy; (c) iron-based alloy; (d) tool steel surface topography details (dendritic microstructure). [Figure 4] Cross-sections of several rotary atomizers: (a) a concave disk with different parts made of different materials; (b) a one-piece disk and shaft with a coating; (c) a ceramic atomizer with vanes and different parts (support cage, disk, shaft) made of different materials. [Figure 5] Scanning electron micrograph of the atomized iron-based alloy powder shown in Example 2. The figure shows the appearance of the atomized particles, with the presence of non-spherical particles being evident. DETAILED DESCRIPTION OF THE INVENTION

[0030] In one embodiment, the inventors have discovered that centrifugal atomization in an atomization chamber comprising an atomizing rotor (also referred to in some embodiments as spinning, spinning disk, spinning disk atomization, atomizing disk, rotor, rotating disk, or disk) can produce spherical, ultrafine powder or particulate material of a metal-based alloy.

[0031] In one embodiment, a method for producing a metal-based alloy powder or particulate material by centrifugal atomization in a closed chamber comprises providing a mixture containing at least one metal, melting the mixture, and atomizing the molten metal by centrifugal or rotary atomization.

[0032] In one embodiment, the atmosphere within the closed atomization chamber is pressurized or cooled.

[0033] The inventors have discovered that the production of ultrafine spherical powders with very little or no non-spherical particles and very little or no spherical powder particles containing voids or hollow spheres requires the employment of a suitable combination of production parameters, with very surprising values. The inventors have also discovered, surprisingly, that atomization chambers using gas pressurized above atmospheric pressure can be used to produce highly spherical, non-deformed particles, provided that certain precautions are taken regarding the flow of metal to the disk, the metal superheat temperature, the nature of the disk, the shape of the disk, the material being atomized, the chamber atmosphere, and the disk speed.

[0034] In some embodiments, a suitable combination of the rotational speed of the disk, the effective diameter of the disk, and the pressure of the atmosphere in the atomization chamber is sufficient. In one embodiment, the inventors have found PA1 to be a consideration. PA1=r * N 2* d 2 where: r is the density of the spray liquid at the melting point under 1 bar absolute pressure in kilograms per cubic meter [kg / m 3], N is the rotational speed of the disk in radians per second [rad / s], and d is the diameter of the disk in meters. The parameter PA1 has units of kilograms per meter squared [kg / (m s 2 ) ). In one embodiment, the atomizing liquid refers to the molten composition atomized in step c). Here, K1 and K2 are constants that depend on the properties of the material being processed and the atmosphere in the chamber, and P is the absolute pressure in the atomizing chamber in Pascals [Pa]. The inventors have defined two critical parameters, namely PA2 and PA3, as defined below: PA2=K1 * PA1+K2 * P PA3=PA1 / P.

[0035] In some applications, generalized values ​​(same for all types of alloys atomized) can be applied. In one embodiment, for aluminum-based alloys, K1 = 0.01 and K2 = 20. In one embodiment, for magnesium-based alloys, K1 = 0.015 and K2 = 22. In one embodiment, for iron-based alloys, K1 = 0.0033 and K2 = 20. In one embodiment, for nickel-, copper-, or cobalt-based alloys, K1 = 0.0033 and K2 = 21. In one embodiment, for any alloy, K1 = 0.0033 and K2 = 22. In one embodiment, for titanium-based alloys, K1 = 0.006 and K2 = 20. K1 and K2 have the appropriate units so that PA2 is dimensionless (1 / Pa). It has been found that a precise value is necessary for PA2, but a small value is sufficient for PA3. In some embodiments, PA2 is greater than 4,500,000. In some other embodiments, PA2 is greater than 5,000,000. In some other embodiments, PA2 is greater than 6,000,000. In some other embodiments, PA2 is greater than 7,000,000. In some other embodiments, PA2 is less than 70,000,000. In some other embodiments, PA2 is less than 40,000,000. In some other embodiments, PA2 is less than 30,000,000. In some other embodiments, PA2 is less than 20,000,000. In some other embodiments, PA3 is less than 10,000. In some other embodiments, PA3 is less than 7,000. In some other embodiments, PA3 is less than 6,000. In some other embodiments, PA3 is less than 5,000. In some other embodiments, PA3 is less than 1000. All of the above embodiments may be combined with each other, provided they are not mutually exclusive. For example, PA2 is greater than 4,500,000 and less than 70,000,000, or PA2 is greater than 4,500,000 and less than 40,000,000, or PA2 is greater than 4,500,000 and less than 30,000,000, etc. The inventors have found that in some applications, surprisingly narrow particle size distributions of fine and spherical powders with excellent morphological quality can be obtained when the appropriate combination of manufacturing parameters is employed.Furthermore, the powders have a higher metallic tone that is preferred by end users in some applications. Furthermore, powders can be produced that are substantially completely free of particles containing thick oxide crusts and have exceptionally low or no internal porosity. The inventors have also found that by using an appropriate combination of manufacturing parameters, fine powders can be produced at surprisingly lower costs than those observed with the methods disclosed in the Background section of this specification. In some applications, the appropriate combination of manufacturing parameters can also produce fine powders with excellent flow characteristics and spherical powder size distributions. In some applications, the atomized powders have surprisingly lower levels of microsegregation than expected when the appropriate combination of manufacturing parameters is employed. In addition to the appropriate values ​​of PA2 and PA3, the inventors have found that a pressurized chamber is preferred in some embodiments. In some applications, pressures above atmospheric pressure are particularly interesting for contributing to the desired morphology. The inventors have found that in some embodiments, supercooling must be avoided to maintain the morphological quality of the produced powder or particulate material. This means that special measures must be taken, for example by selecting appropriate values ​​for PA2 and PA3, to ensure that pressurization in the chamber does not lead to overcooling. In one embodiment, an overpressure of at least 0.12 bar relative to atmospheric pressure is preferred. In one embodiment, the absolute pressure in the spray chamber is greater than 1.2 bar. In another embodiment, the absolute pressure in the spray chamber is greater than 1.6 bar. In another embodiment, the absolute pressure in the spray chamber is greater than 2.4 bar. In another embodiment, the absolute pressure in the spray chamber is greater than 2.6 bar. In another embodiment, the absolute pressure in the spray chamber is greater than 2.8 bar. In another embodiment, the absolute pressure in the spray chamber is greater than 3.1 bar. In another embodiment, the absolute pressure in the spray chamber is greater than 4.3 bar. In another embodiment, the absolute pressure in the spray chamber is greater than 5.7 bar. In some applications, even higher absolute pressure levels in the spray chamber are preferred. In one embodiment, the absolute pressure in the atomizing chamber is greater than 6.1 bar. In another embodiment, the absolute pressure in the atomizing chamber is greater than 7.3 bar. In another embodiment, the absolute pressure in the atomizing chamber is greater than 8.2 bar.In another embodiment, the absolute pressure in the atomizing chamber is greater than 9.1 bar. In another embodiment, the absolute pressure in the atomizing chamber is greater than 9.8 bar. In some specific applications, atomization can occur at atmospheric or subatmospheric pressure, depending on the alloy being atomized and the form of the powder or particulate. In one embodiment, the absolute pressure in the atomizing chamber is greater than 0.001 bar. In another embodiment, the absolute pressure in the atomizing chamber is greater than 0.1 bar. In another embodiment, the absolute pressure in the atomizing chamber is greater than 0.26 bar. In another embodiment, the absolute pressure in the atomizing chamber is greater than 0.52 bar. In another embodiment, the absolute pressure in the atomizing chamber is greater than 0.92 bar. In other applications, the inventors have found that the values ​​of PA2 and PA3 disclosed above can be reached if the pressure in the atomizing chamber is maintained at or below a certain value. In one embodiment, the absolute pressure in the atomizing chamber is less than 999.4 bar. In another embodiment, the absolute pressure in the spray chamber is less than 99.2 bar. In another embodiment, the absolute pressure in the spray chamber is less than 29.6 bar. In another embodiment, the absolute pressure in the spray chamber is less than 19.2 bar. In another embodiment, the absolute pressure in the spray chamber is less than 14.3 bar. In another embodiment, the absolute pressure in the spray chamber is less than 9.4 bar. In some applications, even lower levels of absolute pressure in the spray chamber are preferred. In one embodiment, the absolute pressure in the spray chamber is less than 6.1 bar. In another embodiment, the absolute pressure in the spray chamber is less than 4.2 bar. In another embodiment, the absolute pressure in the spray chamber is less than 2.9 bar. In another embodiment, the absolute pressure in the spray chamber is less than 1.4 bar. In another embodiment, the absolute pressure in the spray chamber is less than 1.2 bar. All of the above-mentioned embodiments may be combined with each other, provided they are not mutually exclusive. Other combinations are possible, such as an absolute pressure in the atomization chamber greater than 1.2 bar and less than 999.4 bar, or an absolute pressure in the atomization chamber greater than 2.6 bar and less than 29.6 bar, or an absolute pressure in the atomization chamber greater than 2.8 bar and less than 19.2 bar. In some specific applications, the present inventors have found that in some embodiments, it is preferable that the composition to be atomized (the composition provided in step a) is melted and superheated. In one embodiment, the composition to be atomized is superheated to a temperature 10° C. above its melting point.In some other embodiments, the composition to be atomized is superheated to a temperature 52°C above its melting point. In some embodiments, the composition to be atomized is superheated to a temperature 106°C above its melting point. In some embodiments, the composition to be atomized is superheated to a temperature 159°C above its melting point. In some embodiments, the composition to be atomized is superheated to a temperature 212°C above its melting point. In some embodiments, the composition to be atomized is superheated to a temperature 256°C above its melting point. In some embodiments, the composition to be atomized is superheated to a temperature 306°C above its melting point. In other applications, small superheating of the composition to be atomized is preferred. In some embodiments, the superheating temperature is less than 396°C + Tm, where Tm is the melting point of the composition to be atomized in degrees Celsius (°C). In another embodiment, the temperature of superheating is less than 294°C + Tm, where Tm is the melting point of the composition to be atomized in degrees Celsius (°C). In another embodiment, the temperature of superheating is less than 144°C + Tm, where Tm is the melting point of the composition to be atomized in degrees Celsius (°C). In another embodiment, the temperature of superheating is less than 96°C + Tm, where Tm is the melting point of the composition to be atomized in degrees Celsius (°C). In another embodiment, the temperature of superheating is less than 47°C + Tm, where Tm is the melting point of the composition to be atomized in degrees Celsius (°C). Melting point refers to the absolute temperature at which the first liquid is formed in equilibrium. In one embodiment, the composition to be atomized is the composition obtained in step a).

[0036] Surface tension is an intrinsic property, and therefore, it can be measured inaccurately only by different measurement methods producing different results. The technique used to measure an intrinsic property is not important, as long as the measurement is performed correctly. In one embodiment, for the purpose of measuring wetting angle and surface tension, both are conveniently measured using the same apparatus using the sessile drop method. In one embodiment, the measurement of contact angle to determine wettability is as described in ISIJ Int. (by CJ Xuan, H. Shibata, Z. Zhao, PG Joensson, and K. Nakajima) starting on page 1642. In another alternative embodiment, surface tension can be calculated using the contour fitting method described in Surface Tension, Part II: The Measurement of Surface Tension; in Surface and Colloid Science, vol. 1, edited by E. Matijevic, Clarkson College of Technology, NY, (1969) (by JF Paddy) starting on page 108. In another alternative embodiment, the Adams-Bashfors method can be used. The type of alloy and substrate being measured must match those used in the application, and the substrate must match the disk material, molten metal, and atomized alloy. In one embodiment, the roughness (Ra) of the substrate being measured matches the average roughness of the disk surface in contact with the molten metal when the disk is new. In one embodiment, the substrate roughness is controlled to Ra = 5 microns. In one embodiment, the temperature is adjusted to be 20 K above the liquidus temperature. In another alternative embodiment, the test temperature is adjusted to the liquidus temperature. The liquidus temperature is the absolute temperature at which the material is completely liquid. In one embodiment, the cooling rate after the maintenance period is adjusted to 20 K / min. In one embodiment, the oxygen partial pressure at the entrance is 10 -20 In one embodiment, the average oxygen partial pressure in the measurement chamber during measurement is adjusted to 10 -21In one embodiment, the measurement is performed in an argon atmosphere below 99.999 atmospheres. -8 The measurements are performed under vacuum at atmospheric pressure. In some embodiments, the measurements are performed in an atmosphere of 99.99 H2. In most embodiments, the value to be adopted is the stable value. In some embodiments, the stable value (applies to both contact angle and surface tension) is the value 500 seconds after the moment of complete melting. In some embodiments, the stabilized value is the value obtained in the first measurement, which undergoes a variation of less than a threshold value (1 degree for contact angle and 50 mN / m for surface tension) within 100 seconds after recording. In some embodiments, the value to be used is the initial value within 2 seconds of complete melting.

[0037] In some applications, generalized rules for contact angle and surface tension (meaning they apply to all alloys that can be atomized) can be applied. Furthermore, in many cases (with some exceptions), the surface tension and contact angle rules do not work in isolation and must be applied in conjunction with other rules herein to solve the problem. In some embodiments, the surface tension and contact angle rules must be applied in conjunction with parameters that take into account the chamber pressure and disk rotation speed. In some embodiments, the surface tension and contact angle rules must be applied in conjunction with constraints on the chemical composition of the alloy being melted.

[0038] In one embodiment, the inventors have found that the method disclosed herein is particularly suitable for producing powdered or particulate aluminum-based alloys. In one embodiment, the composition comprising at least one metal obtained in step a) refers to a composition comprising an aluminum-based alloy. It has been found that for aluminum and aluminum-based alloys, many physical and mechanical properties, such as coefficient of thermal expansion, thermal conductivity, fracture toughness, density, and mechanical strength, are considered to determine their potential as disc material candidates. While some nominal properties tend to deteriorate, many are highly robust in the presence of the processed molten alloy, which is paramount for the durability of the disc, which determines its economic viability. It should also be noted that the mechanical loads on the disc are highly exceptional and incomparable to those experienced in existing melting processes. Surprisingly, it has been found that by noting some rules governing properties that are susceptible to change in the presence of molten metal, these appear to function under certain processing conditions. For some applications, it has been found that ensuring the contact angle is within a certain range of values ​​defined by a maximum and minimum value is sufficient. In one embodiment, the maximum contact angle is set to 168°. In another embodiment, the maximum contact angle is 158°. In another embodiment, the maximum contact angle is 148°. In another embodiment, the maximum contact angle is 138°. In another embodiment, the minimum contact angle is 76°. In another embodiment, the minimum contact angle is 96°. In another embodiment, the minimum contact angle is 126°. In another embodiment, the minimum contact angle is 106°. In another embodiment, the minimum contact angle is 136°. All of the above embodiments may be combined with each other, provided they are not mutually exclusive. For example, a contact angle of 76° or greater and 168° or less is possible. The contact angle (also known as Young's angle) is an intrinsic property of solid-liquid-gas systems. This value quantifies the ability of a non-reactive liquid to spread over a flat, non-deforming, perfectly smooth, and chemically homogeneous solid surface. The contact angle is one of the most common parameters for measuring the wettability of a surface.Wettability generally refers to how a liquid spreads when deposited on a solid substrate, or the ability of the liquid to form an interface with the solid state. A perfectly wettable substrate has a contact angle of zero. Thus, a non-wetting liquid will have a contact angle between 90° and 180° with a solid surface. It has been found that for some applications, it is desirable not only for the contact angle to be within a certain range of values ​​at least at the melting point, but also for it to have a specific behavior with increasing temperature above the melting point; i.e., the disk material and its preparation must be selected accordingly. If Tm is the melting point, then T is the temperature above the melting point, but T is below 500°C above the melting point. In some embodiments, the contact angle, measured in degrees, is preferably between Cs and Ci, where Cs = 185° - 0.2°. * (T-Tm) and Ci=120°-0.2 *(T-Tm), where T and Tm are expressed in degrees Celsius (°C). In one embodiment, the contact angle decreases by 2.5% or more for every 100°C increase in temperature above the melting point with a maximum superheat of 500°C. In another embodiment, the contact angle decreases by 7.5% or more for every 200°C increase in temperature above the melting point with a maximum superheat of 500°C. It has been found that in some applications, the disk material should be selected depending on the material to be atomized, taking into account the very specific desired behavior of the surface tension between the two materials. In some applications, it has been found sufficient to ensure that the surface tension value between the molten material and the disk material falls within a certain range of values ​​defined by a maximum and minimum value. In one embodiment, the maximum surface tension value is preferably 1750 mN / m. In another embodiment, the maximum surface tension value is preferably 1550 mN / m. In another embodiment, the maximum surface tension value is preferably 1450 mN / m. In another embodiment, the maximum surface tension is preferably 1250 mN / m. In another embodiment, the minimum surface tension is preferably 680 mN / m. In another embodiment, the minimum surface tension is preferably 780 mN / m. In another embodiment, the minimum surface tension is preferably 820 mN / m. In another embodiment, the minimum surface tension is preferably 960 mN / m. In another embodiment, the minimum surface tension is preferably 1080 mN / m. All of the above embodiments may be combined with each other, provided they are not mutually exclusive. For example, a surface tension of 680 mN / m or more and 1750 mN / m or less may be used. It has been found that in some applications, a specific method should be selected to ensure a decrease in surface tension between the working surface of the disk and the material being atomized that decreases with increasing temperature. If Tm is the melting point, then T is the temperature above the melting point, provided that T is no more than 500°C above the melting point. In one embodiment, the surface tension is preferably between ST and STi, where STs = 1450 - 0.8 * (T-Tm), STi=820-0.7 *(T-Tm), where in each case the surface tension is measured in mN / m and T and Tm are in degrees Celsius (°C). In one embodiment, the surface tension decreases by 1.3% or more for every 100°C increase in temperature above the melting point with a maximum superheat of 500°C. In another embodiment, the surface tension decreases by 6.1% or more for every 200°C increase in temperature above the melting point with a maximum superheat of 500°C. It has been found that morphological quality can be affected by the composition of the alloy being melted. In this regard, several elements have similar effects in some applications and configurations of the present invention and are classified into Group I and Group II. In one embodiment, the Group I elements must be 0.3 wt% or more. In another embodiment, the Group I elements must be 2.2 wt% or more. In another embodiment, the Group I elements must be 3.1 wt% or more. In another embodiment, the Group I elements must be 4.2 wt% or greater. In another embodiment, the Group I elements must be 4.6 wt% or greater. In another embodiment, the Group I elements must be 5.2 wt% or greater. In another embodiment, the Group I elements must be 7.3 wt% or greater. In one embodiment, the Group I elements can be 9.8 wt% or less. In another embodiment, the Group I elements can be 6.8 wt% or less. In another embodiment, the Group I elements can be 3.8 wt% or less. In another embodiment, the Group I elements can be 2.8 wt% or less. In another embodiment, the Group I elements can be 1.8 wt% or less. In another embodiment, the Group I elements can be 0.9 wt% or less. In one embodiment, the Group II elements must be 0.002 wt% or greater. In another embodiment, the Group II elements must be greater than or equal to 0.02 wt%. In another embodiment, the Group II elements must be greater than or equal to 0.2 wt%. In another embodiment, the Group II elements must be greater than or equal to 1.1 wt%. In another embodiment, the Group II elements must be greater than or equal to 1.8 wt%. In another embodiment, the Group II elements must be greater than or equal to 2.2 wt%. In one embodiment, the Group II elements can be less than or equal to 5.9 wt%. In another embodiment, the Group II elements can be less than or equal to 3.9 wt%. In another embodiment, the Group II elements can be less than or equal to 2.4 wt%.In another embodiment, the Group II elements may be 1.4 wt% or less. In another embodiment, the Group II elements may be 0.9 wt% or less. In another embodiment, the Group II elements may be 0.09 wt% or less. In some embodiments, at least one element from Group I and at least one element from Group II must be present. In some embodiments, at least one element from Group I and at least two elements from Group II must be present. At least one element from Group I and at least three elements from Group II must be present. In some embodiments, at least two elements from Group I and at least one element from Group II must be present. In some embodiments, at least two elements from Group I and at least two elements from Group II must be present. In some embodiments, at least two elements from Group I and at least three elements from Group II must be present. In some embodiments, magnesium is a Group I element. In some embodiments, silicon is a Group I element. In one embodiment, zinc is a Group I element. In one embodiment, scandium is a Group II element. In one embodiment, copper is a Group II element. In one embodiment, manganese is a Group II element. In one embodiment, iron is a Group II element. In one embodiment, scandium is a Group II element. In some applications, some elements must be maintained below certain levels for some configurations of the present invention. These elements promote intra-sphere voids and also the appearance of non-spherical particles. In one embodiment, K-type elements must be kept below 94 ppm by weight. In another embodiment, K-type elements must be kept below 48 ppm by weight. In another embodiment, K-type elements must be kept below 24 ppm by weight. In another embodiment, K-type elements must be kept below 9 ppm by weight. In another embodiment, K-type elements must be kept below 0.8 ppm by weight. In some embodiments, the absence of K-type elements is desirable. In some embodiments, potassium is a K-type element. In some embodiments, phosphate is a K-type element. In some embodiments, chromium is a K-type element. In some embodiments, S-type elements should be kept below 0.8 ppm by weight.In another embodiment, S-type elements should be limited to less than 0.08 ppm by weight. In another embodiment, S-type elements should be limited to less than 0.04 ppm by weight. In another embodiment, S-type elements should be limited to less than 0.008 ppm by weight. In one embodiment, it is preferred that no S-type elements are present. In one embodiment, antimony is an S-type element. In one embodiment, lithium is an S-type element. In one embodiment, N-type elements should be limited to less than 590 ppm by weight. In another embodiment, N-type elements should be limited to less than 190 ppm by weight. In another embodiment, N-type elements should be limited to less than 90 ppm by weight. In another embodiment, N-type elements should be limited to less than 20 ppm by weight. In another embodiment, N-type elements should be limited to less than 9 ppm by weight. In one embodiment, it is preferred that no N-type elements are present. In one embodiment, sodium is an N-type element. In one embodiment, gallium is an N-type element. In one embodiment, calcium is an N-type element. In one embodiment, %Sr can be present in an aluminum-based alloy, but if so, it must be limited to less than 1.9 wt% by weight. As discussed below, in some other embodiments of the present invention, some of these elements, such as gallium and lithium, can be controlled to produce difficult-to-manufacture powders or particulate materials, even when present in very high amounts. In the initial ceramic material screening, several titanates were considered as good candidates for disk materials, given their low thermal expansion coefficients and thermal shock resistance. Unfortunately, in this invention, due to the very high mechanical loads, their thermal shock resistance was insufficient to be evaluated as a good alloy casting material for this invention. The mechanical strength requirement cannot be evaluated based on short-term mechanical properties, as molten alloys tend to deteriorate quite quickly in the atomized state. Titanium is one example. Barium titanate has fallen into disrepair as a disc material due to the publication of "Effect of Grain Boundary Cracking on the Corrosion Behavior of Aluminum Titanate Ceramics in Molten Aluminum Alloy Metal" (Makoto Tanaka, Kazumi Kashiwagi, Naoki Kawashima, Satoshi Kitaoka, Osamu Sakurada, and Yutaka Ohya, in Corrosion Science, volume 54, January 2012, pages 90-96). In fact, many ceramics, often used as casting ceramics with good mechanical properties, unfortunately suffer from liquid metal embrittlement in molten aluminum. Surprisingly, during initial trials with powder ceramics under the specific conditions of the present invention, the inventors found that barium titanate exhibited unexpectedly high durability and could be effectively used as a disc material. Subsequent investigations indicated that barium could also be at least partially replaced by strontium, which had the same effect. In one embodiment, the disc material described in this paragraph is applied as a thick coating onto a metal material. In some embodiments, the atomizing rotor may be coated or uncoated, or may be partially coated or multi-coated. In some applications, a multi-layer coating is preferred. In one embodiment, the coating comprises at least two layers. In another embodiment, it comprises at least three layers. In some applications, to improve wetting, the atomizing disc may be preferably coated with a material similar to the alloy being atomized, or a stable component thereof, or a similar material. This should be particularly considered in some applications where greater wetting is preferred. The inventors have found that, regardless of the substrate material, the coating layer can be applied using different materials and can be effectively used as a coating material in some applications. In one embodiment, the atomizing disc is at least partially coated with two or more coating layers of different compositions.For some applications, a multilayer coating consisting of a ceramic coating layer and a metallic coating layer is preferred, while for other applications, a multilayer coating consisting of a metallic coating layer and a ceramic coating layer is preferred. In another embodiment, the first coating layer applied to the atomization disk is a metallic coating layer. Several coating techniques are suitable, including high velocity oxygen flame (HVOF), chemical vapor deposition (CVD), physical vapor deposition (PVD), plasma spraying, thermal spraying or projection, low temperature gas spraying, cladding, fluidized bed, chemical or electrochemical techniques, and many others. In one embodiment, the coating thickness is 2.1 microns or greater. In another embodiment, the coating thickness is 8.1 microns or greater. In another embodiment, the coating thickness is 22.1 microns or greater. In another embodiment, the coating thickness is 72.1 microns or greater. In another embodiment, the coating thickness is 103 microns or greater. In another embodiment, the coating thickness is 160 microns or greater. In another embodiment, the coating thickness is 280 microns or greater. In another embodiment, the coating thickness is 370 microns or greater. In another embodiment, the coating thickness is 560 microns or greater. In another embodiment, the coating thickness is greater than 1.06 mm. In some applications, a coating thickness less than a certain value is desirable. In one embodiment, the coating thickness is 1.9 mm. In another embodiment, the coating thickness is less than 990 microns. In another embodiment, the coating thickness is less than 490 microns. In another embodiment, the coating thickness is less than 390 microns. In another embodiment, the coating thickness is less than 240 microns. In another embodiment, the coating thickness is less than 106 microns. In another embodiment, the coating thickness is less than 84 microns. In another embodiment, the coating thickness is less than 62 microns. In another embodiment, the coating thickness is less than 48 microns. All of the above embodiments may be combined with each other, provided they are not mutually exclusive. For example, other combinations exist, such as a coating thickness of 2.1 microns or greater and 990 microns or less.In some embodiments, if the coating comprises two or more layers, the disclosed thickness values ​​refer to the thickness of each coating layer. In some embodiments, the disk material to which the coating is applied comprises an intermetallic compound. In some embodiments, the aforementioned rules for aluminum-based alloys can be extended to magnesium-based alloys. In some embodiments, the aforementioned rules for aluminum-based alloys can be extended to lithium-based alloys. In some embodiments, the aforementioned rules for aluminum-based alloys can be extended to copper-based alloys. In some embodiments, the aforementioned rules for aluminum-based alloys can be extended to germanium-based alloys. In some embodiments, the aforementioned rules for aluminum-based alloys can be extended to lithium-based alloys. In some embodiments, the aforementioned rules for aluminum-based alloys can be extended to silver-based alloys. In some embodiments, the aforementioned rules for aluminum-based alloys can be extended to gold-based alloys. Another surprise was that it overturned short-term identified benefits and also cited "Mechanical Properties of Densely Sintered Bodies of High-Purity Titanium Diboride in an Aluminum Molten Environment" (H.R. Baumgartner; July 1984), which cited avoiding the use of TiB2 (titanium diboride) due to its association with reduced durability due to embrittlement cracking in mechanically highly loaded systems such as those described herein. Quite surprisingly, in some embodiments of the present invention, it performed very well with very long durability. In one embodiment, the disk blank is comprised of titanium diboride. In one embodiment, the disk blank is comprised of titanium diboride with deviations from stoichiometry. In one embodiment, titanium diboride is incorporated into the disk blank as a coating.

[0039] In one embodiment, the inventors have found that the method disclosed herein is particularly suitable for producing powdered or particulate iron or iron-based alloys. In one embodiment, the composition comprising at least one metal obtained in step a) refers to a composition comprising an iron-based alloy. It has been found that for iron or iron-based alloys, many physical or mechanical properties, such as coefficient of thermal expansion, thermal conductivity, fracture toughness, density, and mechanical strength, are considered to determine their potential as disc material candidates. While some nominal properties tend to deteriorate, many are highly robust in the presence of the processed molten alloy, which is paramount for the durability of the disc, which determines its economic viability. It should also be noted that the mechanical loads on the disc are highly exceptional and incomparable to those of existing melting processes. Surprisingly, it has been found that, by noting some rules governing properties that are susceptible to change in the presence of molten metal, these appear to function under certain processing conditions. For some applications, it has been found that it is sufficient to ensure that the contact angle is within a certain range of values ​​defined by a maximum and minimum value. In one embodiment, the maximum contact angle is 172°. In another embodiment, the maximum contact angle is 156°. In another embodiment, the maximum contact angle is 148°. In another embodiment, the maximum contact angle is 139°. In another embodiment, the minimum contact angle is 76°. In another embodiment, the minimum contact angle is 98°. In another embodiment, the minimum contact angle is 104°. In another embodiment, the minimum contact angle is 116°. In another embodiment, the minimum contact angle is 132°. All of the above embodiments may be combined with each other, provided they are not mutually exclusive. For example, a contact angle of 76° or more and 172° or less may be used. It has been found that in some applications, it is desirable not only for the contact angle to be within a certain range of values ​​at least at the melting point, but also for it to have a specific behavior with increasing temperature above the melting point; i.e., the disk material and its preparation must be selected accordingly. If Tm is the melting point, T is the temperature above the melting point, provided that T is 500°C below the melting point.In one embodiment, the contact angle measured in degrees is preferably between Cs and C1, where Cs=185°-0.2. * (T-Tm) and Ci=120-0.2 *(T-Tm), where T and Tm are expressed in degrees Celsius (°C). In one embodiment, the contact angle decreases by 1.5% or more for every 100°C increase in temperature above the melting point with a maximum superheat of 500°C. In another embodiment, the contact angle decreases by 5.5% or more for every 200°C increase in temperature above the melting point with a maximum superheat of 500°C. It has been found that in some applications, the disk material should be selected depending on the material to be atomized, taking into account the very specific desired behavior of the surface tension between the two materials. In some applications, it has been found sufficient to ensure that the surface tension value between the molten material and the disk material falls within a certain range of values ​​defined by a maximum and minimum value. In one embodiment, a maximum surface tension value of 2190 mN / m is desirable. In another embodiment, a maximum surface tension value of 1990 mN / m is desirable. In another embodiment, a maximum surface tension value of 1690 mN / m is desirable. In another embodiment, the maximum surface tension is preferably 1590 mN / m. In another embodiment, the minimum surface tension is preferably 810 mN / m. In another embodiment, the minimum surface tension is preferably 910 mN / m. In another embodiment, the minimum surface tension is preferably 1010 mN / m. In another embodiment, the minimum surface tension is preferably 1110 mN / m. In another embodiment, the minimum surface tension is preferably 1510 mN / m. All of the above embodiments may be combined with each other, provided they are not mutually exclusive. For example, a surface tension of 810 mN / m or greater and 2190 mN / m or less may be used. It has been found that in some applications, a temperature should be selected to ensure a decrease in surface tension between the disk working surface and the material being atomized that decreases with increasing temperature in a particular manner. If Tm is the melting point, T is the temperature above the melting point. where T is the melting point to 500°C or less of superheat. In one embodiment, the surface tension is preferably between ST and STi, where STs=1700-0.8 * (T-Tm), STi=1100-0.9 *(T-Tm), where in each case the surface tension is measured in mN / m and T and Tm are in degrees Celsius (°C). In one embodiment, the surface tension decreases by at least 1.1% for every 100°C increase in temperature above the melting point with a maximum superheat of 500°C. In another embodiment, the surface tension decreases by at least 5.1% for every 200°C increase in temperature above the melting point with a maximum superheat of 500°C. The inventors have found that some alloying elements in the liquid affect the surface tension and contact angle, and also affect the breakup of the liquid during atomization, tending to result in finer or coarser powders. One such element is sulfur (S), which has been found to be operable in some embodiments to promote the formation of ultrafine powders. In one embodiment, it is desirable for the %S to be greater than 25 ppm by weight. In another embodiment, it is desirable for the %S to be greater than 55 ppm by weight. In another embodiment, it is desirable for the %S to be greater than 115 ppm by weight. In another embodiment, it is desirable for the %S to be greater than 550 ppm by weight. In another embodiment, it is desirable for the %S to be greater than 750 ppm by weight. In another embodiment, it is desirable for the %S to be greater than 0.12 wt%. In one embodiment, it has been found that in such cases special care needs to be taken to ensure a sufficiently low level of %S, as %S will ruin everything and give powders with intra-sphere voids inside. In one embodiment, it is desirable for the %S to be less than 400 ppm by weight. In another embodiment, it is desirable for the %S to be less than 90 ppm by weight. In another embodiment, it is desirable for the %S to be less than 39 ppm by weight. In another embodiment, it is desirable for the %S to be less than 19 ppm by weight. In another embodiment, it is desirable for the %S to be less than 9 ppm by weight. In another embodiment, it is desirable for the %S to be less than 4 ppm by weight. In certain embodiments, the absence of %S is desirable. In some embodiments, the same effect as %S, albeit to a lesser extent, has been observed with %P. In some embodiments, %P greater than 55 ppm by weight is desirable. In other embodiments, %P greater than 115 ppm by weight is desirable. In other embodiments, %P greater than 550 ppm by weight is desirable.In another embodiment, it is desirable for the %P to be greater than 750 ppm by weight. In another embodiment, it is desirable for the %P to be greater than 0.12 wt%. In some embodiments, it has been found that %P ruins everything and gives powders with internal intra-sphere voids, so in these cases special care needs to be taken to ensure a sufficiently low level of %P. In one embodiment, it is desirable for the %P to be less than 400 ppm by weight. In another embodiment, it is desirable for the %P to be less than 90 ppm by weight. In another embodiment, it is desirable for the %P to be less than 39 ppm by weight. In another embodiment, it is desirable for the %P to be less than 29 ppm by weight. In another embodiment, it is desirable for the %P to be less than 19 ppm by weight. In another embodiment, it is desirable for the %P to be less than 9 ppm by weight. In some embodiments, the absence of %P is desirable. The inventors have found that in some cases %B (boron) can also achieve this effect. In one embodiment, it is desirable for %B to be greater than 6 ppm by weight. In another embodiment, it is desirable for %B to be greater than 11 ppm by weight. In another embodiment, it is desirable for %B to be greater than 25 ppm by weight. In another embodiment, it is desirable for %B to be greater than 45 ppm by weight. In another embodiment, it is desirable for %B to be greater than 0.12 wt%. In one embodiment, it has been found that %B ruins everything and gives powders with intra-sphere voids inside, so in these cases special care needs to be taken to ensure a sufficiently low level of %B. In one embodiment, it is desirable for %B to be less than 400 ppm by weight. In another embodiment, it is desirable for %B to be less than 90 ppm by weight. In another embodiment, it is desirable for %B to be less than 39 ppm by weight. In another embodiment, it is desirable for %B to be less than 29 ppm by weight. In another embodiment, it is desirable for %B to be less than 19 ppm by weight. In other embodiments, it is desirable for %B to be less than 9 ppm by weight. In some embodiments, the absence of %B is desirable. In some applications, %C should be kept at a moderate level, as it promotes the formation of intra-sphere voids in the powder in some compositions. In some embodiments, %C should be kept below 4.9 wt%.In another embodiment, %C must be kept below 3.4 wt%. In another embodiment, %C must be kept below 1.9 wt%. In another embodiment, %C must be kept below 0.9 wt%. In one embodiment, if the sum of %Mo + %Cr + %W + %V + %Si + %Mn is greater than 10.5 wt%, %C must be kept below 1.9 wt%. In one embodiment, if the sum of %Cr + %Ta + %Hf is greater than 10 wt%, %C must be kept below 1.9 wt%. The inventors have found that the oxygen content in the molten metal being atomized is often a very important variable to control, and therefore, particular care must be taken in the deoxidation method. In the case of steels, particularly tool steels, and in one embodiment stainless steels, those usable as tool steels, it is important to closely control %Si, %Ti, or %Al. In one embodiment, %Si should not be used as a deoxidizing element, and in fact, the residual amount of %Si must be strictly controlled, since it has been demonstrated that the specific manner in which oxidation occurs with this element significantly affects the usability of the powder. In one embodiment, %Si is preferably less than 0.29 wt%. In another embodiment, %Si is preferably less than 0.19 wt%. In another embodiment, %Si is preferably less than 0.09 wt%. In another embodiment, %Si is preferably less than 0.04 wt%. In another embodiment, %Si is preferably less than 0.009 wt%. In one embodiment, it is preferred that %Si is absent. In one embodiment, %Si is a critical alloying element, and the amount added is determined by the final application. In one embodiment, %Al has been demonstrated to significantly affect the usability of the powder, due to the specific manner in which oxidation occurs with this element. In one embodiment, %Al should not be used as a deoxidizing element, and in fact, the residual amount must be strictly controlled, next to %Si. In one embodiment, %Al must be less than 0.09 wt%. In another embodiment, %Al must be less than 0.04 wt%. In another embodiment, %Al must be less than 0.009 wt%. In another embodiment, %Al must be less than 0.004 wt%.In another embodiment, %Al should be less than 0.0009 wt%. In some embodiments, the absence of %Al is desirable. In some embodiments, %Al is a critical alloying element, with the final application determining the amount added. In some embodiments, Ti is a suitable element for deoxidation, and in some embodiments, Ti is a suitable element for alloying by deoxidation. Therefore, residual %Ti at more than trace levels is desirable. Steels with moderate or even high %C content can benefit from %Ti deoxidation, especially in materials with fairly low %C content. However, the residual %Ti content must be controlled to ensure it is not excessive. In one embodiment, %Ti must be greater than 0.0012 wt%. In another embodiment, %Ti must be greater than 0.0012 wt%. In another embodiment, %Ti must be greater than 0.012 wt%. In another embodiment, %Ti must be greater than 0.052 wt%. In another embodiment, %Ti must be greater than 0.32 wt%. In one embodiment, %Ti has been shown to significantly affect powder usability by reacting with %C in a specific way to form brittle, large, irregular primary carbides; therefore, %Ti should not be employed as a deoxidizing element; in fact, residual amounts must be strictly controlled. In one embodiment, %Ti must be less than 0.09 wt%. In another embodiment, %Ti must be less than 0.04 wt%. In another embodiment, %Ti must be less than 0.009 wt%. In another embodiment, %Ti must be less than 0.004 wt%. In another embodiment, %Ti must be less than 0.0009 wt%. In one embodiment, the absence of %Ti is desired. In one embodiment, %Ti is a critical alloying element, with the end application determining the amount added. In some embodiments, the aforementioned rules for %Si, %Al, and %Ti for steels can be extended to iron-based alloys. In some embodiments, the aforementioned rules for %Si, %Al, and %Ti for steels can be extended to nickel-based alloys. In some embodiments, deoxidization with Si, %Al, or %Ti is not preferred, but more expensive deoxidizing elements, such as %Sc or %Zr, can be employed if the amount of oxygen in the atomized melt must be strictly controlled. Considering thermal shock resistance, the inventors have found that alumina (Al2O3) can be a suitable disk material in certain embodiments. For applications involving highly superheated melts poured onto fairly cold disks, aluminum nitride (AlN) can also be considered.In some embodiments, it may be considered to construct the disk from a highly stable oxide such as magnesium oxide (MgO). In some embodiments, the disk is preferably comprised of an oxide in which the metal portion operates at an oxidation state of III or higher. In some embodiments, the disk is preferably comprised of a majority oxide in which the metal portion operates at an oxidation state of III or higher. In some embodiments, the disk is preferably comprised of an oxide in which the metal portion operates at an oxidation state of IV or higher. In some embodiments, the disk is preferably comprised of a majority oxide in which the metal portion operates at an oxidation state of IV or higher. The most surprising observation was made with titanium oxide. This reacts with most alloys that would not be candidates for the disk material in the embodiments described herein. However, it was surprisingly found that this behavior can be mitigated by controlling the oxygen content in both the disk material and the optimized alloy. In some embodiments, the oxygen content of the dominant phase, identified as titanium oxide (%Ti > 50 wt%), is preferably greater than 26 wt%. In another embodiment, the oxygen content of the predominant phase identified as titanium oxide (%Ti > 50 wt%) is preferably greater than 31 wt%. In another embodiment, the oxygen content of the predominant phase identified as titanium oxide (%Ti > 50 wt%) is preferably less than 39 wt%. In another embodiment, the oxygen content of the predominant phase identified as titanium oxide (%Ti > 50 wt%) is preferably less than 36 wt%. In another embodiment, the oxygen content of the predominant phase identified as titanium oxide (%Ti > 50 wt%) is preferably less than 34 wt%. In one embodiment, the oxygen content of the liquid to be atomized is preferably 790 ppm by weight or less. In another embodiment, the oxygen content of the liquid to be atomized is preferably 180 ppm by weight or less. In another embodiment, the oxygen content of the liquid to be atomized is preferably 40 ppm by weight or less. In another embodiment, the oxygen content of the atomizing liquid is preferably 14 ppm by weight or less. In one embodiment, the absence of oxygen in the atomizing liquid is preferred. In one embodiment, TiN is preferably used as the disk material when the nitrogen content of the atomizing liquid material is 1500 ppm by weight or less.In another embodiment, TiN is preferably used as the disk material when the nitrogen content of the liquid material being atomized is 190 ppm by weight or less. In another embodiment, TiN is preferably used as the disk material when the nitrogen content of the liquid material being atomized is 49 ppm by weight or less. In one embodiment, the disk material described in this paragraph is applied as a thick coating on a metallic material. In some embodiments, the atomizing rotor may be coated or uncoated, partially coated, or multi-coated. For some applications, a multi-layer coating is preferred. In one embodiment, the coating comprises at least two layers. In another embodiment, the coating comprises at least three layers. For some applications, to improve wetting, the atomizing disk may be preferably coated with a material similar to the alloy being atomized, or a stable component thereof, or a similar material. This should be particularly considered for some applications where greater wetting is preferred. The inventors have found that, regardless of the substrate material, the coating layer can be applied using different materials and can be effectively used as a coating material in some applications. In one embodiment, the atomization disk is at least partially coated with two or more coating layers of different compositions. For some applications, a multilayer coating consisting of a ceramic coating layer and a metallic coating layer is preferred, while for other applications, a multilayer coating consisting of a metallic coating layer and a ceramic coating layer is preferred. In another embodiment, the first coating layer applied to the atomization disk is a metallic coating layer. Several coating techniques are suitable, including high-velocity oxygen flame spraying (HVOF), chemical vapor deposition (CVD), physical vapor deposition (PVD), plasma spraying, thermal spraying or projection, low-temperature gas spraying, cladding, fluidized bed, chemical or electrochemical techniques, and many others. In one embodiment, the coating thickness is 2.1 microns or greater. In another embodiment, the coating thickness is 8.1 microns or greater. In another embodiment, the coating thickness is 22.1 microns or greater. In another embodiment, the coating thickness is greater than or equal to 72.1 microns.In another embodiment, the coating thickness is 103 microns or greater. In another embodiment, the coating thickness is 160 microns or greater. In another embodiment, the coating thickness is 280 microns or greater. In another embodiment, the coating thickness is 370 microns or greater. In another embodiment, the coating thickness is 560 microns or greater. In another embodiment, the coating thickness is greater than 1.06 mm. In some applications, a coating thickness less than a certain value is desirable. In one embodiment, the coating thickness is less than 1.9 mm. In another embodiment, the coating thickness is less than 990 microns. In another embodiment, the coating thickness is less than 490 microns. In another embodiment, the coating thickness is less than 390 microns. In another embodiment, the coating thickness is less than 240 microns. In another embodiment, the coating thickness is less than 106 microns. In another embodiment, the coating thickness is less than 84 microns. In another embodiment, the coating thickness is less than 62 microns. In another embodiment, the coating thickness is less than 48 microns. All of the above embodiments may be combined with each other, provided they are not mutually exclusive. For example, other combinations exist, such as a coating thickness of 2.1 microns or greater and 990 microns or less. In an embodiment, if the coating consists of two or more layers, the disclosed thickness values ​​refer to the thickness of each coating layer. In some embodiments, the above rules for iron-based alloys may be extended to magnesium-based alloys. In some embodiments, the above rules for iron-based alloys may be extended to lithium-based alloys. In some embodiments, the above rules for iron-based alloys may be extended to copper-based alloys. In some embodiments, the above rules for iron-based alloys may be extended to nickel-based alloys. In some embodiments, the above rules for iron-based alloys may be extended to cobalt-based alloys. In some embodiments, the above rules for iron-based alloys may be extended to titanium-based alloys. In some embodiments, the above rules for iron-based alloys may be extended to bronze-based alloys.In some embodiments, the aforementioned rules for iron-based alloys can be extended to metal-based alloys. In some embodiments, the aforementioned rules for iron-based alloys can be extended to non-magnetic metal-based alloys. In some embodiments, the method is also suitable for processing master alloys. The inventors have discovered that if such master alloys are produced at exceptionally low cost, with exceptionally low levels of microsegregation and exceptionally low levels of gas content (such as oxygen and nitrogen), it is possible to produce these alloys.

[0040] In some embodiments, direct contact of the liquid with the powder being produced, the liquid being atomized, etc., during all stages of atomization is highly detrimental because it promotes the formation of intra-sphere voids, undesirable surface modifications, and in some embodiments, the formation of undesirable microstructures. In some embodiments, any kind of direct contact between the material being atomized (during all stages, including the liquid before atomization and the already atomized powder) and water or water-based fluids must be avoided. In some embodiments, any kind of direct contact between the material being atomized (during all stages of atomization) and any liquid must be avoided. In some embodiments, any kind of direct contact between the material being atomized (during all stages of atomization) and any contained liquid (such as mist) must be avoided. In some embodiments, contact of cooling liquids, mists, or other contained liquids with the rotating body must be avoided if they may come into contact with the material being atomized. In some embodiments, contact of the material being atomized with cooling gas must be avoided when large amounts of cooling gas are used due to adverse environmental effects. In some embodiments, a circulating gas is introduced into the spray chamber. In one embodiment, 990 m 3The introduction of any kind of circulating gas (introduced circulating gas is gas that is injected into the atomizing chamber during the atomization process, even if it is in a closed circuit with, for example, a refrigeration or compression stage outside the chamber. The movement of gas contained in the chamber is not considered as circulating gas in this aspect of the specification, even if it is done in an efficient way to reduce the temperature in the chamber using some heat exchange system) with a flow rate of 98 m / min or more must be avoided. 3 The introduction of any type of circulating gas with a flow rate of more than 48 m / min must be avoided. 3 The introduction of any type of circulating gas with a flow rate of more than 9 m / min must be avoided. 3 The introduction of any type of circulating gas with a flow rate of more than 4 m / min must be avoided. 3 The introduction of any type of circulating gas with a flow rate of more than 0.9 m / min must be avoided. 3The introduction of any type of circulating gas with a flow rate of more than 1 / min must be avoided. In some embodiments, the circulating gas introduced into the atomization chamber is a cooling gas. In some applications, an inert gas is suitable as the cooling gas. In some embodiments, certain configurations herein allow for the use of a cooling gas curtain. However, for environmental reasons, efficient circulation of a protective atmosphere gas within the chamber, allowing for cooling via contact with a cold wall or heat exchanger, is preferred. In one embodiment, some of the gas within the chamber must contact a cooling element (wall or any type of heat exchange system) that reduces the temperature of this portion of the gas within the chamber by at least 2°C (the rotating body itself acting as an impeller, or convection generated by localized heating or cooling of the gas may be sufficient). In one embodiment, some of the gas within the chamber contacts a cooling element that reduces the temperature of this portion of the gas within the chamber by at least 6°C. In another embodiment, some of the gas within the chamber contacts a cooling element that reduces the temperature of this portion of the gas within the chamber by at least 12°C. In another embodiment, a portion of the gas in the chamber contacts a cooling element that reduces the temperature of the portion of the gas in the chamber by at least 22° C. In another embodiment, a portion of the gas in the chamber contacts a cooling element that reduces the temperature of the portion of the gas in the chamber by at least 52° C. In another embodiment, a portion of the gas in the chamber contacts a cooling element that reduces the temperature of the portion of the gas in the chamber by at least 122° C. In one embodiment, the gas contacts a cooling element that reduces the temperature of the portion of the gas in the chamber by at least 1.2 m 3 In another embodiment, the gas contacts a cooling element to reduce its temperature by at least 12 min. 3 In another embodiment, the gas contacts a cooling element to reduce its temperature by at least 120 m / min. 3 In another embodiment, the gas contacts a cooling element to reduce its temperature by at least 1200 m / min. 3 In another embodiment, the gas contacts a cooling element to reduce its temperature by at least 12,000 m / min. 3 / min. In one embodiment, the gas that inevitably comes into contact with the cooling element is an inert gas. In one set of embodiments, it may be considered to introduce a small amount of gas into the chamber to cool certain elements. In one set of embodiments, it may be considered to combine this gas with a liquid and a mist. In one set of embodiments, if the elements being addressed with the mist are bearings or other elements that benefit from lubrication, it is interesting for the fine particles in the mist to comprise lubricating fluids or particles (oil, graphite microflakes, grease, etc.). In one embodiment, the lubricant is oil. In one embodiment, the cooled element comprises a bearing of a rotating element that causes atomization of the atomized material. In one embodiment, the cooled element comprises a bearing closest to the atomization disk of the rotating element that causes atomization of the atomized material. In one embodiment, the cooled element comprises the shaft of the main rotating element that causes atomization of the atomized material. In one embodiment, the cooled element comprises the disk of the rotating element that causes atomization of the atomized material. In certain applications, the atomizing rotor may be cooled externally. In one embodiment, the amount of gas introduced for localized freezing of the atomizing device is 0.012 m 3 In another embodiment, the amount of gas introduced for localized freezing of the nebulizer is 0.12 m / min or more. 3 In another embodiment, the amount of gas introduced for localized freezing of the nebulizer is 0.52 m / min or more. 3 In another embodiment, the amount of gas introduced for localized freezing of the nebulizer is 1.2 m / min or more. 3 In another embodiment, the amount of gas introduced for localized freezing of the nebulizer is 2.6 m / min or more. 3 In another embodiment, the amount of gas introduced for localized freezing of the nebulizer is 6.6 m / min or more. 3 In another embodiment, the amount of gas introduced for localized freezing of the nebulizer is 12 m / min or more. 3 In one embodiment, the amount of gas introduced for localized freezing of the atomizing device is 98 m 3In another embodiment, the amount of gas introduced for localized freezing of the atomizer is 48 m / min or less. 3 In another embodiment, the amount of gas introduced for localized freezing of the atomizing device is 28 m 3 In another embodiment, the amount of gas introduced for localized freezing of the atomizing device is 9 m / min or less. 3 In another embodiment, the amount of gas introduced for localized freezing of the atomizing device is 4 m / min or less. 3 In another embodiment, the amount of gas introduced for localized freezing of the atomizing device is 1.9 m / min or less. 3 In another embodiment, the amount of gas introduced for localized freezing of the spray device is 0.9 m / min or less. 3 In one embodiment, the inventors have found that in order to obtain very fine spherical powders or particulate matter, it is preferable in some applications to carry out centrifugal atomization in an atomization chamber comprising an atomizing rotor in which the atmosphere within the chamber is cooled.

[0041] The inventors have noted that in some embodiments herein, it is important to take an unconventional approach when designing the spray rotor (referred to herein as the disk). In these embodiments, when performing a finite element simulation (FES), only centrifugal forces are considered, and all other forces acting on the disk are ignored. Stresses acting on all points on the disk are calculated using polar coordinates, with only radial components considered. Within the radial components, only tensile stresses (and not compressive stresses) are considered. Stresses acting on all points on the disk are calculated using polar coordinates, with only radial components considered. Within the radial components, only tensile stresses (and not compressive stresses) are considered. In one embodiment, the design is modified to have all radial tensile stresses on the disk due to centrifugal forces only less than 290 MPa. In another embodiment, the design is modified to have all radial tensile stresses on the disk due to centrifugal forces only less than 190 MPa. In another embodiment, the design is modified to have all radial tensile stresses on the disks due to centrifugal force alone less than 140 MPa. In another embodiment, the design is modified to have all radial tensile stresses on the disks due to centrifugal force alone less than 90 MPa. In another embodiment, the design is modified to have all radial tensile stresses on the disks due to centrifugal force alone less than 49 MPa. In another embodiment, the design is modified to have all radial tensile stresses on the disks due to centrifugal force alone less than 190 MPa. In another embodiment, the design is modified to have all radial tensile stresses on the disks due to centrifugal force alone less than 190 MPa. Interestingly, in some embodiments, to obtain non-porous particles with a narrow particle size distribution, the tensile stress due to the maximum radial FES should not be too low. In one embodiment, the design is modified to have a maximum value for the radial tensile stress on the disks due to centrifugal force alone greater than 14 MPa. In another embodiment, the design is modified to have a maximum radial tensile stress on the disk due to centrifugal force alone above 24 MPa. In another embodiment, the design is modified to have a maximum radial tensile stress on the disk due to centrifugal force alone above 44 MPa.In another embodiment, the design is modified so that the radial tensile stress on the disk due to centrifugal force alone exceeds 84 MPa. In some applications, the inventors have found it preferable to use a special configuration. This configuration uses a metal structure around a ceramic disk (also known in some embodiments as a spinning, spinning disk, spinning disk atomization, atomizing disk, rotor, rotating disk, or disk). The special feature is that the metal structure exerts a compressive load on the ceramic disk at working conditions. In one embodiment, the compressive load is achieved by selecting a metal material for the structure with a lower thermal expansion coefficient than the material of the disk, with at least a portion of the compressive load occurring due to a thermal expansion coefficient mismatch when the temperature rises to a steady state. Figure 2 shows an example of a possible configuration of the disk and metal structure that exerts a compressive load when working conditions are achieved. Point 1 depicts an example of a ceramic disk with blade-like protrusions. Point 2 depicts a support cage. Point 3 depicts the insertion direction and point of the metal liquid to be atomized. Point 4 illustrates an example in which the contact points between the cage and the disks provide a horizontal compressive load to the disks. In one embodiment, the cage is made of a material that elongates at break. In one embodiment, the gauge is made of a material that has an elongation at break of 0.8% or greater at the processing temperature. In one embodiment, the elongation at break is measured at the processing temperature in accordance with ASTM E21-17 (Standard Test Method for High-Temperature Tensile Testing of Metallic Materials). In one embodiment, the cage is made of a metal. In one embodiment, the cage is a metallic structure. In one embodiment, there are contact points that provide a compressive load to the disks at least at the horizontal processing temperature. In one embodiment, there are contact points that provide a compressive load to the disks at least at the vertical processing temperature. In one embodiment, the ceramic material and the metal structure material have similar thermal expansion coefficients, and the compressive load is achieved by mechanical interference when assembling the disks of the metal structure. If there is mechanical interference, the disks can be forcefully inserted into the structure.More often, however, the assembly is performed with a temperature differential between the disk and the hotter metal structure, such that when both materials reach room temperature (defined herein as 23±2°C), the required mechanical interference is reached. In one embodiment, the stress in the ceramic disk between the ceramic disk and the metal structure is LFC. * σ creeep Less than, LSC * σ creeep In another embodiment, LFC is 1. In another embodiment, LFC is 0.8. In another embodiment, LFC is 0.6. In another embodiment, LFC is 1.2. In another embodiment, LFC is 0.4. In another embodiment, LFC is 0.7. In another embodiment, LFC is 0.5. In another embodiment, LFC is 0.3. In another embodiment, LFC is 0.1. In another embodiment, LFC is 0.01. In an embodiment, σ creep is the 10-hour creep resistance of the metallic material at the steady-state processing temperature. creep is the 1000 hour creep resistance of the metallic material at the steady-state processing temperature. creep is the 10,000 hour creep resistance of the metallic material at the steady-state processing temperature. creep is the creep resistance of a metallic material at 800°C for 10 hours. creep is the creep resistance of a metallic material at 800°C for 1000 hours. creep is the creep resistance of a metallic material at 1000°C for 10 hours. creep is the creep resistance of a metallic material at 1000°C for 1000 hours. creep is the creep resistance of a metallic material at 1200°C for 10 hours. creep is the creep resistance of a metallic material at 1200°C for 1000 hours. creep is the creep resistance of a metallic material at 1400°C for 10 hours. creepis the creep resistance of a metallic material at 1400°C for 1000 hours. creep is the creep resistance of a metallic material at 1600°C for 10 hours. creep is the creep resistance of a metallic material at 1600°C for 1000 hours. In one embodiment, the creep resistance (σ creep ) is measured according to ASTM E139-11(2018). In another embodiment, the creep resistance (σ creep ) is measured according to ISO 204:2018(en). In one embodiment, σ at the processing temperature creep In another embodiment, a material having a σ of 12 MPa or more at the processing temperature is used. creep In another embodiment, a material having a σ of 26 MPa or more at the processing temperature is used. creep In another embodiment, a material having a σ of 52 MPa or more at the processing temperature is used. creep In another embodiment, a material having a σ of 72 MPa or more at the processing temperature is used. creep In another embodiment, a material having a σ of 110 MPa or more at the processing temperature is used. creep In another embodiment, a material having a σ of 280 MPa or more at the processing temperature is used. creep A material having a thermal stress of 620 MPa or greater is employed. In one embodiment, a FEM simulation is used to determine the stress in the ceramic disc at the interface between the ceramic disc and the metal structure. In one embodiment, a FEM simulation is used to determine the steady-state processing temperature of the interface between the ceramic disc and the metal structure. In some embodiments, the stress at the interface between the ceramic disc and the metal structure is determined as follows: [e0+(a ceramic -a metal ) * (T work -295) * (E ceramic +E metal ) / 2] where: a ceramic Ceramic room temperature to T work Average thermal expansion coefficient up to a metal From room temperature to Twork Average thermal expansion coefficient up to T work Steady state beam processing temperature in Kelvin E ceramic Room temperature to T work Average elastic modulus of ceramics up to E metal Room temperature to T work Average elastic modulus of metals up to In one embodiment, the modulus of elasticity of metals is measured using ASTM E8 / E8M-16a (Standard Test Method for Tensile Testing of Metallic Materials) and high temperature (T work ) is measured at room temperature according to ASTM E21-17.

[0042] In one embodiment, the elastic modulus of the ceramic is determined according to ASTM C1161-18 (Standard Test Method for Flexural Strength of Fine Ceramics at Ambient Temperature) and High Temperature (T work ) is measured at room temperature in accordance with ASTM C1211-18 (Standard Test Method for High-Temperature Bending Strength of Fine Ceramics).

[0043] In one embodiment, the coefficient of thermal expansion is measured according to ASTM E831-14 (Standard Test Method for Linear Thermal Expansion of Solid Materials by Thermomechanical Analysis).

[0044] In one embodiment, the processing temperature is the temperature of the molten composition. In one embodiment, the processing temperature is the temperature of the molten composition in contact with the spraying rotor. In one embodiment, the processing temperature is the temperature of the spraying rotor. In one embodiment, the temperature of the spraying rotor is measured directly. In another embodiment, the temperature of the spraying rotor is calculated using FEM. In another embodiment, the temperature of the spraying rotor is calculated by measuring the temperatures of multiple points on the rotor surface in contact with the molten composition and averaging the average or arithmetic mean value. In another embodiment, the temperature of the spraying rotor is calculated by measuring the temperatures of multiple points on the rotor surface in contact with the molten composition and averaging the maximum value. In another embodiment, the processing temperature refers to Tm, Tm-25, Tm-60, Tm-100, Tm-160, Tm-200, Tm-270, Tm-350, or Tm-470, where Tm is the melting point of the composition to be sprayed in degrees Celsius. In another embodiment, the processing temperature refers to Tm+40, Tm+120, Tm+160, Tm+220, or Tm+300, where Tm is the melting point of the composition being sprayed in degrees Celsius (°C). In one embodiment, the steady-state processing temperature is the temperature of the atomizing rotor in a steady-state operating mode. In one embodiment, the steady-state processing temperature is the temperature of the molten composition. In one embodiment, the steady-state processing temperature is the temperature of the molten composition in contact with the atomizing rotor. In one embodiment, the steady-state processing temperature of the atomizing rotor is measured directly. In another embodiment, the steady-state processing temperature of the atomizing rotor is calculated using FEM. In another embodiment, the temperature of the atomizing rotor is calculated by measuring the temperature at multiple points on the rotor surface and averaging the measured values ​​using an average or arithmetic mean value. In another embodiment, the temperature of the atomizing rotor is calculated using FEM. In another embodiment, the steady-state processing temperature of the spraying rotor is calculated by measuring the temperatures at multiple points on the rotor surface in contact with the molten composition and averaging the average or arithmetic mean value thereof. In another embodiment, the temperature of the spraying rotor is calculated by measuring the temperatures at multiple points on the rotor surface in contact with the molten composition and averaging the maximum value thereof.In some other embodiments, the steady-state processing temperature refers to Tm, Tm-25, Tm-60, Tm-100, Tm-160, Tm-200, Tm-270, Tm-350, or Tm-470, where Tm is the melting point of the composition being sprayed in degrees Celsius (°C). In other embodiments, the steady-state processing temperature refers to Tm+40, Tm+120, Tm+160, Tm+220, or Tm+300, where Tm is the melting point of the composition being sprayed in degrees Celsius (°C).

[0045] The atomizing rotor is an element for atomizing the molten composition (also called a melt). In one embodiment, the molten composition refers to a molten material, a molten alloy, or a molten metal. The inventors have found that in some embodiments, the molten composition can include a solid fraction. In one embodiment, the inventors have found that a solid fraction of the molten composition of less than 79 wt% is desirable. In another embodiment, a low solid fraction of the molten composition is preferred. In one embodiment, the solid fraction of the molten composition is less than 39 wt%. In another embodiment, the solid fraction of the molten composition is less than 19 wt%. In another embodiment, the solid fraction of the molten composition is less than 9 wt%. In another embodiment, the solid fraction of the molten composition is less than 4 wt%. In another embodiment, the solid fraction of the molten composition is less than 0.4 wt%. In contrast, in some applications, it is desirable to minimize the solid fraction of the molten composition. In one embodiment, the solid fraction of the molten composition is greater than 0.01 wt%. In another embodiment, the solid fraction of the molten composition is greater than 0.1 wt%. In another embodiment, the solid fraction of the molten composition is greater than 1.2 wt%. In another embodiment, the solid fraction of the molten composition is greater than 6 wt%. In another embodiment, the solid fraction of the molten composition is greater than 10.6 wt%. In some instances, the atomizing rotor is referred to as a rotating disk, atomizing disk, spinning, spinning disk, spinning disk atomizer, disk section, or rotor, but any other atomizing rotor shape is also included. Examples include flat disks, cups, cones, inverted cones, and other suitable shapes. In some applications, the inventors have found that it is desirable for the atomizing rotor to be a single, integrally molded bulk disk. In other applications, the atomizing rotor includes different sections made of different materials. In some applications, the inventors have found that a specific configuration is required for operation. In this setting, for some applications it is desirable for the metal atomizing disc and main shaft to be manufactured as a single unit (monolithic metal atomizing disc and main shaft) (an example is shown in Figure 4(b)).Regarding the assembly of the atomizing rotor, the inventors have found that some embodiments using a monolithic atomizing disk setup offer additional advantages for metal powder production. In some applications, the atomizing section can be mounted integrally, resulting in a lighter atomizing section. Furthermore, in some applications, the process of dynamically balancing the atomizing section has been found to be simpler and less costly. The inventors have found that such a configuration can, in some cases, effectively produce metal powder, with the resulting powder exhibiting smaller particle size and improved morphology in terms of sphericity. Furthermore, in some applications, the inventors also emphasize the lower cost and greater feasibility of such a configuration. Regarding materials, in another embodiment, ceramic or metal, among other materials, is desirable for the atomizing rotor. As mentioned above, in some embodiments, the atomizing rotor may be coated, uncoated, or partially coated. In another embodiment, the coating is desirable to be metal or ceramic, among other materials. In some embodiments, it is advantageous to have protrusions, such as vanes, ridges, or projections, on the surface of the atomizing rotor, which has a constant cross-sectional area and a predetermined extrusion path through which the liquid metal can flow, forming a channel or guide. Regarding the distribution of the protrusions on the surface of the atomizing rotor, the inventors have found that in some embodiments, it is preferable that at least some of the protrusions are axially asymmetric. In some embodiments, the protrusions are vanes. The distribution of vanes on the atomizing rotor can affect the performance of the atomizing rotor. The inventors have found that radially distributed vanes are preferable in some embodiments. On the other hand, in some embodiments, non-radially distributed vanes are preferable. In some embodiments, a minimum diameter of the atomizing rotor (spray disk) is preferable. In one embodiment, the diameter of the spray disk is 36 mm or greater. In another embodiment, the diameter of the spray disk is 46 mm or greater. In another embodiment, the diameter of the spray disk is 56 mm or greater. In another embodiment, the diameter of the spray disk is 76 mm or greater. In another embodiment, the diameter of the spray disc is 86 mm or greater.In another embodiment, the spray disk diameter is 106 mm or greater. In another embodiment, the spray disk diameter is 202 mm or greater. In another embodiment, the spray disk diameter is 216 mm or greater. In another embodiment, the spray disk diameter is 306 mm or greater. The inventors have found that in various applications, a spray disk that is too large can produce surprisingly unfavorable results in terms of powder morphology quality, particularly when examining the interior of the powder. In one embodiment, the spray disk diameter is preferably less than 690 mm. In another embodiment, the spray disk diameter is preferably less than 490 mm. In another embodiment, the spray disk diameter is preferably less than 290 mm. In another embodiment, the spray disk diameter is preferably less than 190 mm. In another embodiment, regardless of the shape of the spray disk, which is preferably less than 90 mm in diameter, or even in some applications where the thickness profile varies, liquid metal distribution is enhanced by the action of a number of vanes with an involute or involute-type variable shape. The vanes can exhibit single or double curvature, and their geometric configuration can be any suitable for atomization purposes. The inventors have found that in some applications, straight protrusions or vanes are preferred. In one embodiment, the vanes are straight radial vanes. In other applications, curved vanes are preferred. In other embodiments, the vanes are preferably backward curved, more preferably radially curved, and more preferably forward curved. Additionally, it has been found that in some applications, better atomization results are obtained when the cross section of the vane does not have straight edges or segments. This is particularly worthy of consideration in some applications, preferably when the number of vanes is six or more, and when the vanes are straight radial vanes. In another embodiment, variable shape and variable cross-sectional shapes are preferred. In other embodiments, the cross section of the vane is particularly preferred to have straight edges or segments, such as triangular, square, trapezoidal, etc. Additionally, in some applications, providing a serrated edge on the outer periphery of the atomizing rotor is desirable to promote a more uniform droplet size distribution and improve the quality of the atomization process.This must be clearly distinguished from completely different existing methods that employ blades, cutters, windows, or other types of protrusions to implement a grinding effect for material grinding. In one embodiment, the primary effect of the protrusions is velocity impartation to the metal liquid, not a grinding effect.

[0046] A thorough literature review conducted by the inventors revealed that centrifugal atomization using atomization disks of refractory metals appears incompatible with mass production, likely due to the expected degradation of powder morphology. This appears to be exacerbated when using asymmetric vanes on the atomization disk. The inventors were surprised to find that mass production of sonomorphic quality for refractory metals and alloys is possible. Even more surprising was the discovery that this is possible with large-scale atomization disks incorporating asymmetric protrusions or vanes. In one embodiment, the mass production batch is 6 kg or greater. In another embodiment, the mass production batch is 12 kg or greater. In another embodiment, the mass production batch is 60 kg or greater. In another embodiment, the mass production batch is 120 kg or greater. In another embodiment, the mass production batch is 600 kg or greater. In another embodiment, the mass production batch is 1200 kg or greater. In fact, and surprisingly, when processed under the optimized conditions described herein, very large scale production can be achieved while maintaining sound morphological quality of the atomized powder. In one embodiment, the mass production batch is 2100 kg or greater. In another embodiment, the mass production batch is 6000 kg or greater. In another embodiment, the mass production batch is 16000 kg or greater. In another embodiment, the mass production batch is 21000 kg or greater. In another embodiment, the mass production batch is 80000 kg or greater. In one embodiment, a refractory metal or alloy refers to a metal or alloy that exhibits a melting point of 660°C or greater. In another embodiment, a refractory metal or alloy refers to a metal or alloy that exhibits a melting point of 1020°C or greater. In another embodiment, a refractory metal or alloy refers to a metal or alloy that exhibits a melting point of 1210°C or greater. In another embodiment, a refractory metal or alloy refers to a metal or alloy that exhibits a melting point of 1450°C or greater. In one embodiment, the term "large scale spray disc" refers to a spray disc having a diameter of 36 mm or greater. In another embodiment, the term "large scale spray disc" refers to a spray disc having a diameter of 46 mm or greater. In another embodiment, the term "large scale spray disc" refers to a spray disc having a diameter of 56 mm or greater. In another embodiment, the term "large scale spray disc" refers to a spray disc having a diameter of 76 mm or greater.In another embodiment, the term "large scale spray disc" herein refers to a spray disc having a diameter of 106 mm or greater. In another embodiment, the term "large scale spray disc" herein refers to a spray disc having a diameter of 202 mm or greater. In another embodiment, the term "large scale spray disc" herein refers to a spray disc having a diameter of 216 mm or greater. In another embodiment, the term "large scale spray disc" herein refers to a spray disc having a diameter of 306 mm or greater. The inventors have found that in many applications, excessively large discs can produce surprisingly undesirable results in terms of the morphological quality of the powder, particularly when the powder is internally inspected. In one embodiment, the diameter of the spray disc is desired to be less than 990 mm. In another embodiment, the diameter of the spray disc is desired to be less than 690 mm. In another embodiment, the diameter of the spray disc is desired to be less than 490 mm. In another embodiment, the diameter of the spray disc is desired to be less than 290 mm. In another embodiment, the diameter of the spray disk is preferably less than 190 mm. In another embodiment, the diameter of the spray disk is preferably less than 90 mm. Often, from an economic perspective, productivity is more relevant than production batch size. However, literature indicates that this is at least as difficult as with high-melting-point alloys. The literature describes different processes that are often required for different alloys, combined to achieve unexpectedly high batch productivity. In one embodiment, the large batch productivity is 32 kg / h or greater. In another embodiment, the large batch productivity is 89 kg / h or greater. In another embodiment, the large batch productivity is 102 kg / h or greater. In another embodiment, the large batch productivity is 322 kg / h or greater. In another embodiment, the large batch productivity is 512 kg / h or greater. In another embodiment, the large batch productivity is 1020 kg / h or greater. In another embodiment, the large batch productivity is 2680 kg / h or greater. In another embodiment, the large-scale batch productivity is 3200 kg / h or greater. In some applications, the maximum large-scale batch productivity is limited. In one embodiment, the large-scale batch productivity is 19400 kg / h or less.In another embodiment, the large scale batch productivity is 6940 kg / h or less. In another embodiment, the large scale batch productivity is 4490 kg / h or less. In another embodiment, the large scale batch productivity is 2440 kg / h or less. In another embodiment, the large scale batch productivity is 1440 kg / h or less.

[0047] One of the most interesting and unexpected observations made by the inventors is the effect of wetting of the atomized liquid on the spray disk surface. In this regard, the inventors made several observations in selecting different disk materials, different coatings, and different methods of texturing the engineered surface of the atomization disk, or at least a portion thereof. In one embodiment, at least a portion of the disk surface is textured to alter the wetting of the atomized liquid on the spray disk. In one embodiment, the surface modification increases the wetting. In one embodiment, the surface modification provides superhydrophilicity. In one embodiment, the surface modification results in a contact angle between the molten metal and the modified surface of less than 89°. In another embodiment, the surface modification results in a contact angle between the molten metal and the modified surface of less than 64°. In another embodiment, the surface modification results in a contact angle between the molten metal and the modified surface of less than 38°. In another embodiment, the surface modification results in a contact angle between the molten metal and the modified surface of less than 22°. In another embodiment, the surface modification results in a contact angle between the molten metal and the modified surface of less than 9°. In another embodiment, the surface modification results in a contact angle between the molten metal and the modified surface of less than 4°. In one embodiment, the surface modification provides hydrophobicity. In one embodiment, the surface modification provides superhydrophobicity. In one embodiment, the surface modification provides a contact angle between the molten metal and the modified surface of 95°. In another embodiment, the surface modification provides a contact angle between the molten metal and the modified surface of 105°. In another embodiment, the surface modification provides a contact angle between the molten metal and the modified surface of 145°. In another embodiment, the surface modification provides a contact angle between the molten metal and the modified surface of 155°. In another embodiment, the surface modification provides a contact angle between the molten metal and the modified surface of 165°. In another embodiment, the surface modification provides a contact angle between the molten metal and the modified surface of 175°. In some embodiments, the surface modification results in a contact angle hysteresis between the molten metal and the modified surface of less than 25°. In some embodiments, the surface modification results in a contact angle hysteresis between the molten metal and the modified surface of less than 15°. In some embodiments, the surface modification results in a contact angle hysteresis between the molten metal and the modified surface of less than 9°. In some embodiments, the surface modification results in a contact angle hysteresis between the molten metal and the modified surface of less than 4°.In one embodiment, the surface modification results in a contact angle hysteresis between the molten metal and the modified surface of less than 0.9°. In this paragraph and elsewhere herein, unless otherwise noted, wettability values ​​are quantified by the internal contact angle between the liquid and the solid surface. In one embodiment, the texturing is performed by die engraving. In one embodiment, the texturing is performed by repetitive die engraving. In one embodiment, the texturing is performed by random die engraving. In one embodiment, the texturing is performed by etching. In one embodiment, the texturing is performed by painting. In one embodiment, the texturing is performed by a laser light source. In one embodiment, the texturing is performed by an electron beam source. In one embodiment, the texturing is performed by laser engraving.

[0048] With regard to the number of protrusions such as vanes, the inventors have found it advantageous to have two vanes, more preferably two vanes, more preferably three vanes, and even more preferably five vanes in a radial geometric arrangement or other suitable arrangement suitable for atomization purposes. The inventors have found that in some applications it is preferable for the number of vanes on the atomizing rotor to be at least five, more preferably at least seven, and even more preferably at least 15. In some applications using linear radial vanes, better results are obtained when the number of vanes is more than six, preferably more than nine, more preferably more than 11, and even more preferably more than 15. The above-described embodiments of the vanes are applicable to all protrusions.

[0049] The inventors have discovered that metal powders can also be produced by atomizing a liquid metal onto a superhydrophobic surface. By adjusting the texture and properties of the material through which the liquid flow is interrupted, the pressure, the liquid's heating, the atmosphere, and other factors, the morphology of the resulting powder, such as particle size and sphericity, can be effectively controlled. While other process variables also play a role, the specific morphology and size distribution described are often sufficient. The previously described values ​​for contact angle and contact angle hysteresis can also be employed in this case. In many cases, the pitch of the texture features has been found to be important, as it determines the average particle size achieved in the atomization process. In this case, the pitch is the critical distance of the features. In one embodiment, the critical distance of the features is the minimum distance between two adjacent topological relative extrema (two maxima or minima) of the same sign. In another embodiment, the critical distance of the features is the minimum distance between two adjacent topological relative extrema (two maxima and minima) of opposite signs. In one embodiment, the critical distance of a regular mold is the smallest distance between two identical points in the mold. In one embodiment, the pitch is preferably 9 mm or less. In one embodiment, the pitch is preferably 0.9 mm or less. In one embodiment, the pitch is preferably 740 microns or less. In one embodiment, the pitch is preferably 450 microns or less. For the production of very fine powders, and when all other relevant properties, especially those affecting surface tension, are considered, very small pitch values ​​have proven very effective. In one embodiment, the pitch is preferably 190 microns or less. In another embodiment, the pitch is preferably 90 microns or less. In another embodiment, the pitch is preferably 40 microns or less. In another embodiment, the pitch is preferably 19 microns or less. In another embodiment, the pitch is preferably 9 microns or less. In another embodiment, the pitch is preferably 4 microns or less. Even submicron pitches should be considered. In another embodiment, the pitch is preferably 900 nanometers or less. In another embodiment, a pitch of 690 nanometers or less is desirable.In another embodiment, a pitch of 390 nanometers or less is desirable. In another embodiment, a pitch of 90 nanometers or less is desirable.

[0050] The inventors have surprisingly found that the nature of the bearing configuration that allows the disk to rotate relative to the structure supporting it in the desired position has a significant impact on the quality of the powder produced, particularly its morphology, especially in large batches. The inventors have found that, in some embodiments, using the aforementioned limitations can reduce powder production costs by increasing the useful life of the atomization system. While numerous configurations can achieve the desired rotational speed and load characteristics, surprisingly few can consistently produce consistent morphological quality in large batches. In some instances, the design configuration is the most critical. In one embodiment, the aforementioned limitations apply to all bearings on the main shaft (the shaft that carries the disk at one end and rotates the disk while maintaining the desired position). In one embodiment, the aforementioned limitations apply to the two bearings on the main shaft closest to the disk. In one embodiment, the aforementioned limitations apply to the main shaft bearing closest to the disk. In one embodiment, the aforementioned limitations apply to all bearings on the main shaft that are 990 mm or less away from the atomization disk. In another embodiment, the aforementioned limitations apply to all main shaft bearings that are 490 mm or less away from the spray disk. In another embodiment, the aforementioned limitations apply to all main shaft bearings that are 290 mm or less away from the spray disk. In another embodiment, the aforementioned limitations apply to all main shaft bearings that are 190 mm or less away from the spray disk. In another embodiment, the aforementioned limitations apply to all main shaft bearings that are 90 mm or less away from the spray disk. In another embodiment, the aforementioned limitations apply to all main shaft bearings that are 38 mm or less away from the spray disk.

[0051] In one embodiment, the bearing to which the restriction applies is a bearing with angular contact. In one embodiment, the bearing to which the restriction applies is a bearing with angular contact with a contact angle of 12° or greater. In another embodiment, the bearing to which the restriction applies is a bearing with angular contact with a contact angle of 15.5° or greater. In another embodiment, the bearing to which the restriction applies is a bearing with angular contact with a contact angle of 16.5° or greater. In another embodiment, the bearing to which the restriction applies is a bearing with angular contact with a contact angle of 18° or greater. In another embodiment, the bearing to which the restriction applies is a bearing with angular contact with a contact angle of 21° or greater. In one embodiment, the bearing to which the restriction applies is a bearing with angular contact with a contact angle of 34° or less. In another embodiment, the bearing to which the restriction applies is a bearing with angular contact with a contact angle of 29° or less. In one embodiment, the bearing to which the restriction applies is a bearing with angular contact with a contact angle of 25.5° or less. In one embodiment, the limit applies to bearings with angular contact with a contact angle of 19° or less. In one embodiment, the limit applies to bearings with gradual angular contact that allows for a reduction in space (e.g., due to shaft expansion) between the outer ring (referred to herein as a ring) and the outer diameter of the inner ring. The reduction in space is achieved by relative radial displacement between the inner and outer raceways, which still allows the bearing to operate. In one embodiment, the available space between the outer ring and the outer diameter of the inner ring can be reduced by 0.06 mm or more. In another embodiment, the available space between the outer ring and the outer diameter of the inner ring can be reduced by 0.12 mm or more. In another embodiment, the available space between the outer ring and the outer diameter of the inner ring can be reduced by 0.26 mm or more. In another embodiment, the available space between the outer ring and the outer diameter of the inner ring can be reduced by 0.6 mm or more. In another embodiment, the available space between the outer ring and the outer diameter of the inner ring can be reduced by 1.2 mm or more. In one embodiment, the relative radial offset between the inner and outer rings can be 3 mm or greater.In another embodiment, the relative radial deviation between the inner ring and the outer ring may be 1.2 mm or more. In another embodiment, the relative radial deviation between the inner ring and the outer ring may be 2.1 mm or more. In another embodiment, the relative radial deviation between the inner ring and the outer ring may be 5.2 mm or more. In one embodiment, the bearing to which the limit applies is a bearing with a cylindrical rotating body. In one embodiment, the bearing to which the limit applies is a bearing with a ball rotating body. In one embodiment, the bearing to which the limit applies is a bearing with a ceramic rotating body. In one embodiment, the bearing to which the limit applies is a bearing with high-temperature performance metal rings (both the inner ring and the outer ring contact the rotating body bearing). In one embodiment, the bearing to which the limit applies is a bearing with a high-temperature resistant metal outer ring. In one embodiment, a high-temperature resistant metal material refers to a metal material or alloy that maintains high hardness at room temperature even when exposed to high temperatures for a long period of time. In one embodiment, a high-temperature resistant metallic material is a metallic material or alloy that maintains high-temperature hardness even after prolonged exposure to such high temperatures. In one embodiment, the high hardness is 54 HRc or greater. In another embodiment, the high hardness is 58 HRc or greater. In another embodiment, the high hardness is 62 HRc or greater. In another embodiment, the high hardness is 64 HRc or greater. In another embodiment, the high hardness is 67 HRc or greater. In one embodiment, the room temperature hardness is measured according to ASTM E18-18a (Standard Test Method for Rockwell Hardness of Metallic Materials). In one embodiment, the prolonged exposure is 35 minutes or greater. In another embodiment, the prolonged exposure is 1.2 hours or greater. In another embodiment, the prolonged exposure is 5.2 hours or greater. In another embodiment, the prolonged exposure is 12 hours or greater. In another embodiment, the prolonged exposure is 22 hours or greater. In another embodiment, the long-term exposure is 110 hours or more. In some applications, it is desirable to limit the exposure time to a certain amount of time or less. In one embodiment, the long-term exposure is 220 hours or less. In another embodiment, the long-term exposure is 90 hours or less. In another embodiment, the long-term exposure is 28 hours or less. In one embodiment, the high exposure temperature is 85°C or more. In another embodiment, the high exposure temperature is 105°C or more. In another embodiment, the high exposure temperature is 155°C or more.In another embodiment, the high exposure temperature is 255°C or greater. In another embodiment, the high exposure temperature is 375°C or greater. In another embodiment, the high exposure temperature is 485°C or greater. In one embodiment, it is desirable to limit the high exposure temperature to a certain value or less. In one embodiment, the high exposure temperature is 840°C or less. In another embodiment, the high exposure temperature is 585°C or less. In another embodiment, the high exposure temperature is 245°C or less. In some applications, it has been found that using a high exposure temperature resistant lubricant in the restricted bearing is effective. In one embodiment, the restricted bearing is comprised of a lubricant with a high maximum operating temperature. In one embodiment, the lubricant is continuously applied to the bearing. In one embodiment, the continuity of lubricant application consists of pulses of application and a period of time elapsed without the application of new lubricant. In one embodiment, the maximum operating temperature of the lubricant is 86°C or greater. In another embodiment, the maximum operating temperature of the lubricant is 112°C or higher. In another embodiment, the maximum operating temperature of the lubricant is 186°C or higher. In another embodiment, the maximum operating temperature of the lubricant is 256°C or higher. In another embodiment, the maximum operating temperature of the lubricant is 306°C or higher. In one embodiment, the outer ring of the bearing to which the restriction applies is flexible. In one embodiment, the inner ring of the bearing to which the restriction applies is outside the processing tolerance range at room temperature but is within the processing tolerance range at the processing temperature. In one embodiment, the shaft and disk connecting at least a portion of the bearing to which the restriction applies are made of a low thermal conductive material. In one embodiment, the low thermal conductivity material is made of a metal or metal alloy. In one embodiment, the low thermal conductivity is 90 W / mK or lower. In another embodiment, the low thermal conductivity is 34 W / mK or lower. In another embodiment, the low thermal conductivity is 24 W / mK or lower. In another embodiment, the low thermal conductivity is 19 W / mK or less. In another embodiment, the low thermal conductivity is 9 W / mK or less. In one embodiment, the thermal conductivity refers to the thermal conductivity measured at room temperature (as elsewhere in this specification unless otherwise specified). In one embodiment, the thermal conductivity is measured according to ASTM E1461-13 (Standard Test Method for Thermal Diffusivity by Flash Method). This method can be used to measure thermal conductivity at room temperature and at nominal use temperatures.This method can be used to measure thermal conductivity at room temperature and at reference operating temperatures. In one embodiment, some cooling is applied around at least one of the bearings to which the restriction applies. In one embodiment, some cooling is applied around at least one of the bearings to which the restriction applies. In one embodiment, the cooling is applied directly to the shaft on which the bearing is mounted. In one embodiment, the cooling medium is comprised of a phase that changes upon contact with the hot surface to be cooled. In one embodiment, the phase change comprises evaporation. In one embodiment, the phase change comprises sublimation.

[0052] In one embodiment, the reference processing temperature is the theoretical temperature of the atomizing rotor. In one embodiment, the reference processing temperature is the temperature of the molten composition. In one embodiment, the reference processing temperature is the temperature of the molten composition in contact with the atomizing rotor. In one embodiment, the reference processing temperature is the temperature of the atomizing rotor. In one embodiment, the reference processing temperature of the atomizing rotor is calculated using FEM. In another embodiment, the reference processing temperature of the atomizing rotor is calculated as the average or arithmetic mean value of the temperatures over several points on the surface of the rotor in contact with the molten composition. In another embodiment, the reference processing temperature of the atomizing rotor is calculated as the maximum value of the temperatures over several points on the surface of the rotor in contact with the molten composition. The reference processing temperature refers to the melting temperature of the composition to be sprayed. In another embodiment, the reference processing temperature refers to Tm, Tm-25, Tm-60, Tm-100, Tm-160, Tm-200, Tm-270, Tm-350, or Tm-470, where Tm is the melting temperature of the composition being sprayed in degrees Celsius. In another embodiment, the reference processing temperature refers to Tm+40, Tm+120, Tm+160, Tm+220, or even Tm+300, where Tm is the melting temperature of the composition being sprayed in degrees Celsius (°C).

[0053] Using the techniques described herein, it is possible to incorporate surprisingly low levels of certain elements that are gaseous under normal conditions (herein, normal conditions refer to 20°C and 1 atm). Surprisingly, these low levels result in unexpected behavior in the powders related to mechanical properties, particularly ductility. In one embodiment, the powder contains 490 ppm by weight or less of oxygen. In another embodiment, the powder contains 290 ppm by weight or less of oxygen. In another embodiment, the powder contains 190 ppm by weight or less of oxygen. In another embodiment, the powder contains 90 ppm by weight or less of oxygen. In another embodiment, the powder contains 44 ppm by weight or less of oxygen. Special processing can keep oxygen levels surprisingly low. In one embodiment, the powder contains 24 ppm by weight or less of oxygen. In one embodiment, the powder contains 19 ppm by weight or less of oxygen. In one embodiment, the powder has an oxygen content of 14 ppm by weight or less. In one embodiment, the powder has an oxygen content of 9 ppm by weight or less. In one embodiment, the powder has an oxygen content of 4 ppm by weight or less. In one embodiment, the powder has an oxygen content of 0.09 ppm by weight or less. In another embodiment, the above is by volume. However, for some applications, low levels of oxygen are preferred. In one embodiment, the oxygen content is 3 ppm by weight or more. In one embodiment, the oxygen content is 64 ppm by weight or more. In one embodiment, the oxygen content is 108 ppm by weight or more. In another embodiment, the above is by volume. In one embodiment, the powder or particulate has a nitrogen content of 490 ppm by weight or less. In another embodiment, the powder or particulate has a nitrogen content of 190 ppm by weight or less. In another embodiment, the powder or particulate has a nitrogen content of 90 ppm by weight or less. In another embodiment, the powder or particulate has a nitrogen content of 40 ppm by weight or less. In another embodiment, the powder or particulate has a nitrogen content of 18 ppm by weight or less. In another embodiment, the powder or particulate has a nitrogen content of 4 ppm by weight or less. In some applications, low levels of nitrogen are preferred. In some embodiments, the nitrogen content is greater than 2 ppm by weight.In another embodiment, the nitrogen content is greater than 48 ppm by weight. In another embodiment, the nitrogen content is greater than 103 ppm by weight. In another embodiment, the above is by volume. In one embodiment, the hydrogen content of the powder is less than or equal to 1.8 ppm by weight. In another embodiment, the hydrogen content of the powder is less than or equal to 0.9 ppm by weight. In another embodiment, the hydrogen content of the powder is less than or equal to 0.4 ppm by weight. In another embodiment, the hydrogen content of the powder is less than or equal to 0.09 ppm by weight. In another embodiment, the hydrogen content of the powder is less than or equal to 0.009 ppm by weight. In another embodiment, the above is by volume. In one embodiment, the above also applies to iron. In one embodiment, the above also applies to iron alloys. In one embodiment, the above also applies to iron-based alloys. In one embodiment, the above also applies to steel. In some embodiments, the foregoing also applies to tool steels. In some embodiments, the foregoing also applies to hot work tool steels. In some embodiments, the foregoing also applies to titanium. In some embodiments, the foregoing also applies to titanium alloys. In some embodiments, the foregoing also applies to titanium-based alloys. In some embodiments, the foregoing also applies to nickel. In some embodiments, the foregoing also applies to nickel alloys. In some embodiments, the foregoing also applies to nickel alloys. In some embodiments, the foregoing also applies to nickel alloys. In some embodiments, the foregoing also applies to aluminum. In some embodiments, the foregoing also applies to aluminum alloys. In some embodiments, the foregoing also applies to aluminum-based alloys. In some embodiments, the foregoing also applies to magnesium. In some embodiments, the foregoing also applies to magnesium alloys. In some embodiments, the foregoing also applies to magnesium-based alloys. In some embodiments, the foregoing also applies to lithium. In some embodiments, the foregoing also applies to lithium alloys. In some embodiments, the foregoing also applies to lithium-based alloys. In some embodiments, the foregoing also applies to copper. In some embodiments, the foregoing also applies to copper alloys. In some embodiments, the foregoing also applies to copper-based alloys.In some embodiments, the foregoing also applies to cobalt. In some embodiments, the foregoing also applies to cobalt alloys. In some embodiments, the foregoing also applies to cobalt-based alloys. In some embodiments, once the metal is melted and prior to atomization, a vacuum of 9 mbar or greater is applied. In another embodiment, once the metal is melted and prior to atomization, a vacuum of 0.9 mbar or greater is applied. In another embodiment, once the metal is melted and prior to atomization, a vacuum of 0.09 mbar or greater is applied. In another embodiment, once the metal is melted and prior to atomization, a vacuum of 0.009 mbar or greater is applied. In another embodiment, once the metal is melted and prior to atomization, a vacuum of 0.00009 mbar or greater is applied. In some embodiments, after applying the vacuum, the chamber is replenished with an inert atmosphere before atomization begins. In some embodiments, the inert atmosphere consists of an inert gas. In some embodiments, an atmosphere with controlled oxygen content is preferred. In some embodiments, the gas used to refill the chamber after applying a vacuum is limited to an oxygen content of 98 ppm by volume or less. In some embodiments, the gas used to refill the chamber after applying a vacuum is limited to an oxygen content of 9 ppm by volume or less. In some embodiments, the gas used to refill the chamber after applying a vacuum is limited to an oxygen content of 2 ppm by volume or less. In some embodiments, the gas used to refill the chamber after applying a vacuum is limited to an oxygen content of 0.09 ppm by volume or less. In some embodiments, the gas used to refill the chamber after applying a vacuum is limited to an oxygen content of 0.009 ppm by volume or less. In some embodiments, the gas used to refill the chamber after applying a vacuum is limited to a nitrogen content of 98 ppm by volume or less. In another embodiment, the gas used to refill the chamber is limited to a nitrogen content of 8 ppm by volume or less. In another embodiment, the gas used to refill the chamber is limited to a nitrogen content of 4 ppm by volume or less. In another embodiment, the gas used for refilling is limited to a nitrogen content of 0.8 ppm by volume or less. In another embodiment, the gas used for refilling is limited to a nitrogen content of 0.08 ppm by volume or less.In another embodiment, the gas used for refilling is limited to a nitrogen content of 0.0008 ppm by volume or less. In another embodiment, the above is by weight. In one embodiment, the inventors have found that the protective gas used to refill the chamber is preferably not helium. In one embodiment, at least two rinse cycles are performed, each reaching a designated vacuum level and refilling with a protective atmosphere. In another embodiment, at least four rinse cycles are performed, each reaching a designated vacuum level and refilling with a protective atmosphere. In another embodiment, at least eight rinse cycles are performed, each reaching a designated vacuum level and refilling with a protective atmosphere. In one embodiment, only the final refill uses a protective atmosphere gas with an extremely low oxygen concentration, while intermediate rinses use less expensive gases. In some applications, the atmosphere within the atomization chamber preferably has a reduced oxygen content. In one embodiment, the oxygen content is less than 16% by volume. In another embodiment, the oxygen content is less than 5.8% by volume. In another embodiment, the oxygen content is less than 3.9% by volume. In another embodiment, the oxygen content is less than 0.9% by volume. In another embodiment, the oxygen content is less than 0.2% by volume. In some other embodiments, the oxygen contents are by weight. In some embodiments, an oxygen trap is used to intentionally react with oxygen in the atomization chamber or melting chamber to further reduce the oxygen content. In some embodiments, the oxygen trap is made of a titanium alloy. In some embodiments, the oxygen trap is made of a magnesium alloy. In some embodiments, the oxygen trap is made of an aluminum alloy. In some embodiments, the oxygen trap is made of a silicon alloy. In some embodiments, the oxygen trap is made of a scandium alloy. In some embodiments, the oxygen trap is made of a zircon alloy. In some embodiments, the oxygen trap is made of a hafnium alloy. In some embodiments, the oxygen trap is made of an alloy that is more reactive with oxygen than silicon according to the Ellingham diagram for the processing conditions. In one embodiment, the oxygen trap comprises an alloy that is more reactive with oxygen than iron according to the Ellingham diagram for the processing conditions.In one embodiment, the oxygen trap is heated to above 120°C. In another embodiment, the oxygen trap is heated to above 320°C. In another embodiment, the oxygen trap is heated to above 420°C. In another embodiment, the oxygen trap is heated to above 520°C. In another embodiment, the oxygen trap is heated to above 720°C. In one embodiment, the oxygen trap is heated above the sublimation temperature of the oxide of the alloy of the oxygen trap, but at the sublimation temperature of the lower oxide. The inventors have discovered that in some embodiments, the oxygen content in the chamber has an unexpected effect on the shape of the powder and deviation from sphericity. In one embodiment, the oxygen content in the atomization chamber is maintained below 280 ppm by volume before atomization is initiated. In another embodiment, the oxygen content in the atomization chamber is maintained below 280 ppm by volume before atomization is initiated. In another embodiment, the oxygen content in the atomization chamber is maintained below 90 ppm by volume before atomization is initiated. In another embodiment, the oxygen content in the spray chamber is maintained below 38 ppm by volume before atomization begins. In another embodiment, the oxygen content in the spray chamber is maintained below 18 ppm by volume before atomization begins. In another embodiment, the oxygen content in the spray chamber is maintained below 8 ppm by volume before atomization begins. In another embodiment, the oxygen content in the spray chamber is maintained below 0.8 ppm by volume before atomization begins. In another embodiment, the oxygen content in the spray chamber is maintained below 0.008 ppm by volume before atomization begins. In another embodiment, the oxygen content is by weight (e.g., the oxygen content in the spray chamber is maintained below 280 ppm by weight before atomization begins). In one set of embodiments, the oxygen content in the spray chamber measured in ppm by volume is A1s, where parameter PA2 is defined above. * PA2 and A1i * It has been found that A1s should be maintained between PA2 and 4.4·10 -5 In another embodiment, A1s is 1.9·10 -5 In another embodiment, A1s is 1.1·10 -5 In another embodiment, A1s is 0.4 10 -5In another embodiment, A1s is 4.4·10 -6 In another embodiment, A1s is 1.4·10 -6 In another embodiment, A1i is 9.2·10 -7 In another embodiment, A1i is 4.2·10 -7 In another embodiment, A1i is 1.2·10 -7 In another embodiment, A1i is 0.2 10 -7 In another embodiment, A1i is 1.2·10 -8 In one embodiment, the nitrogen content in the atomization chamber is maintained below 280 ppm by volume before atomization begins. In another embodiment, the nitrogen content in the spray chamber is maintained below 90 ppm by volume before the start of atomization. In another embodiment, the nitrogen content in the spray chamber is maintained below 38 ppm by volume before the start of atomization. In another embodiment, the nitrogen content in the spray chamber is maintained below 18 ppm by volume before the start of atomization. In another embodiment, the nitrogen content in the spray chamber is maintained below 8 ppm by volume before the start of atomization. In another embodiment, the nitrogen content in the spray chamber is maintained below 0.8 ppm by volume before the start of atomization. In another embodiment, the nitrogen content in the spray chamber is maintained below 0.008 ppm by volume before the start of atomization. In another embodiment, the nitrogen content is by weight (e.g., the nitrogen content in the spray chamber is maintained below 280 ppm by weight before the start of atomization). In one embodiment, the hydrogen content in the spray chamber is maintained below 0.8 ppm by volume before the start of atomization. In another embodiment, the hydrogen content in the atomization chamber is maintained at less than 0.008 ppm by volume before atomization begins. In another embodiment, the hydrogen content is by weight (e.g., the hydrogen content in the atomization chamber is maintained at less than 0.8 ppm by weight before atomization begins). The inventors have also found that elements that are easily oxidized, such as some elements such as S and P, affect the morphology of the powder. In one embodiment, the %Cr content must be limited to 2.9 wt% or less for some molybdenum alloy steels. In another embodiment, the %Cr content must be limited to 1.9 wt% or less for some molybdenum alloy steels. In another embodiment, the %Cr content must be limited to 0.9 wt% or less for some molybdenum alloy steels. In another embodiment, the %Cr content must be limited to 0.09 wt% or less for some molybdenum alloy steels. In one embodiment, the atmosphere in the chamber is intentionally adjusted to increase the surface tension between the liquid metal and the disk material by at least 55 mN / m relative to the surface tension in air, hi one embodiment, the atmosphere in the chamber is intentionally adjusted to increase the surface tension between the liquid metal and the disk material by at least 110 mN / m relative to the surface tension in air.In one embodiment, the atmosphere in the chamber is intentionally adjusted to increase the surface tension between the liquid metal and the disk material by at least 210 mN / m relative to the surface tension in air, hi one embodiment, the atmosphere in the chamber is intentionally adjusted to increase the surface tension between the liquid metal and the disk material by at least 410 mN / m relative to the surface tension in air.

[0054] As previously mentioned, centrifugal atomization of high-melting-point alloys using a rotating disk has not been pursued for production rates or production batches beyond experimental research batches due to the expected degradation of the powder morphology. Consequently, some systems may choose to employ significantly degraded powder morphology. To remedy this problem, some systems employ fluids to directly cool the rotating disk or powder. The coolant often consists of water or another liquid, and in some embodiments, high flow rates of gas are injected into the chamber to cool the powder during production. In some specific applications, the inventors have found that in some embodiments, cooling gas jets, fluids, or cooling curtains can be used. Examples of inert gases that can be used in different applications include nitrogen, helium, argon, neon, xenon, krypton, or any other gas that does not react with the molten composition. In some specific applications, it is preferable to use any cooling fluid other than helium. In some specific applications, it is preferable to use any cooling fluid other than helium. In some specific applications, it is preferable to use any cooling fluid other than argon. In some specific applications, it is preferable to use any cooling fluid other than nitrogen. In some applications, the inventors have found that intensive cooling must be avoided. In one embodiment, the inventors have found that, particularly for average particle sizes less than 72 microns, the 7.1 * 10 2 We have found that cooling rates of less than 10 °C / s are preferred. In one embodiment, we have found that for some applications, especially for particles less than 47 microns, a cooling rate of less than 10 °C / s is preferred. 4 It has been found that cooling at rates less than °C / s is considered acceptable. In some applications, the cooling rate is 9.6·10 4Less than °C / s or 9.4 10 3 Cooling rates of less than 980°C / s are preferred, and in some applications, even lower cooling rates may be preferred. In some applications, cooling rates are less than 980°C / s, 710°C / s, 93°C / s, or even 46°C / s. Additionally, in certain applications, the inventors have found that not using gas jets or cooling curtains to cool the powder is beneficial to the production of powders. For many of the powders considered herein, direct contact with water or water vapor resulting from the interaction of water with hot rotating bodies is highly detrimental to the morphological quality of the produced powder, often resulting in powders with excessive oxygen content on the surface. Other liquids tend to affect morphology as well. High gas flow rates also tend to create internal porosity in some powders, and gases that act as oxygen sources often also act as a source of surface oxidation due to the large amounts required, even when very pure gases are used. In one embodiment, contact of the liquid with the atomizing disk is permitted at a rate of 0.9 L / s or less. In another embodiment, the liquid is allowed to contact the spray disc at a rate of 0.9 L / min or less. In another embodiment, the liquid is allowed to contact the spray disc at a rate of 0.9 L / h or less. In another embodiment, the liquid is allowed to contact the spray disc at a rate of 0.09 L / h or less. In one embodiment, it is necessary that no liquid contacts the spray disc during the atomization process. In one embodiment, the amount of liquid contacting the spray disc refers to the average amount for the entire atomization batch. In an embodiment, what has been said about the liquid contacting the spray disc also applies to free liquid in the atomization chamber (as opposed to liquid circulating in a closed circuit). In one embodiment, the liquid consists of water. In one embodiment, 9 m3 of the gas injected into the atomization chamber is 3 3 / s of gas is allowed to come into contact with the atomized powder after it leaves the disk during the atomization process. In another embodiment, 0.9 m / s of gas injected into the atomization chamber is allowed to come into contact with the atomized powder after it leaves the disk during the atomization process. 3 3 / s of gas is allowed to come into contact with the atomized powder after it leaves the disk during the atomization process. In another embodiment, 0.9 m / s of gas injected into the atomization chamber is allowed to come into contact with the atomized powder after it leaves the disk during the atomization process. 3 / min of gas is allowed to come into contact with the atomized powder after it leaves the disk during the atomization process. In another embodiment, 0.9 m 3 / h of gas is allowed to come into contact with the atomized powder after it leaves the disk during the atomization process. In another embodiment, 0.09 m 3 / h or less of gas is allowed to come into contact with the atomized powder after it leaves the disk during the atomization process. The inventors have surprisingly discovered that the present invention enables the atomization of high morphological quality fine powders of highly reactive, ultralight, low-melting-point alloys, which were previously thought to be impossible to atomize. Even more surprisingly, this can be achieved by centrifugal atomization using a rotating body. In one embodiment, high morphological quality refers to a sphericity of 55% or greater. In another embodiment, high morphological quality refers to a sphericity of 78% or greater. In another embodiment, high morphological quality refers to a sphericity of 86% or greater. In another embodiment, high morphological quality refers to a sphericity of 97% or greater. In another embodiment, high morphological quality refers to a sphericity of 98.2% or greater. In another embodiment, high morphological quality refers to a sphericity of 99.1% or greater. The sphericity of a powder is a dimensionless parameter defined as the ratio of the surface area of ​​a sphere having the same volume as the particle to the surface area of ​​the particle. Particle sphericity is determined by dynamic image analysis. In one embodiment, high morphology quality means a porosity of 38% or less by volume. In another embodiment, high morphology quality means a porosity of 18% or less by volume. In another embodiment, high morphology quality means a porosity of 8% or less by volume. In another embodiment, high morphology quality means a porosity of 0.8% or less by volume. In one embodiment, powder refers to particulate matter with a diameter of 1000 microns or less. In one embodiment, fine refers to D 50 In another embodiment, fine refers to a particle size of 780 microns or less. 50 In another embodiment, fine refers to a particle size of 380 microns or less. 50 In another embodiment, fine refers to a particle size of 180 microns or less. 50 In another embodiment, fine refers to a particle size of 80 microns or less.50 In another embodiment, fine refers to a D 50 In another embodiment, fine refers to a D 50 In another embodiment, fine refers to a D 50 In one embodiment, highly reactive means that the Ellingham diagram cuts the Y-axis of the Ellingham diagram at -210 Kcal or less. In one embodiment, highly reactive means that the Ellingham diagram cuts the Y-axis of the Ellingham diagram at -230 Kcal or less. In another embodiment, highly reactive means that the Ellingham diagram cuts the Y-axis of the Ellingham diagram at -260 Kcal or less. In one embodiment, very lightweight means that the density under normal conditions is 3.4 g / cm 3 In another embodiment, very light weight means a density of 2.6 g / cm or less under normal conditions. 3 In another embodiment, very light weight means a density of 1.8 g / cm or less under normal conditions. 3 In another embodiment, very light weight means a density of 1.6 g / cm or less under normal conditions. 3 In another embodiment, very light weight means a density of 0.98 g / cm under normal conditions. 3 In another embodiment, very light weight means a density of 0.68 g / cm under normal conditions. 3In one embodiment, the low melting point alloy refers to an alloy having a melting point of 590°C or less. In another embodiment, the low melting point alloy refers to an alloy having a melting point of 490°C or less. In another embodiment, the low melting point alloy refers to an alloy having a melting point of 290°C or less. In another embodiment, the low melting point alloy refers to an alloy having a melting point of 190°C or less. In another embodiment, the low melting point alloy refers to an alloy having a melting point of 140°C or less. In another embodiment, the low melting point alloy refers to an alloy having a melting point of 90°C or less. In one embodiment, the atomization refers to centrifugal atomization. In one embodiment, the atomization refers to centrifugal atomization by a rotating disk. In the inventor's opinion, the present invention provides an atomized powder of a magnesium-based lithium alloy that is of high morphological quality. In one embodiment, the powder produced is a magnesium-based lithium-based alloy. In one embodiment, %Mg is 3.2 wt% or more. In another embodiment, %Mg is 6.2 wt% or more. In another embodiment, %Mg is 12 wt% or more. In another embodiment, %Mg is 22 wt% or more. In another embodiment, %Mg is 36 wt% or more. This invention, in the inventor's view, is solely an atomized powder of a lithium-based magnesium alloy, which has high morphological quality. In one embodiment, the powder produced is a lithium-based magnesium alloy. In one embodiment, %Li is 3.2 wt% or more. In another embodiment, %Li is 6.2 wt% or more. In another embodiment, %Li is 12 wt% or more. In another embodiment, %Li is 22 wt% or more. In another embodiment, %Li is 36 wt% or more. This invention, in the inventor's view, is solely an atomized powder of a lithium-based aluminum alloy, which has high morphological quality. In one embodiment, the powder produced is a lithium-based alloy of aluminum. In one embodiment, %Al is 3.2 wt% or more. In another embodiment, %Al is 6.2 wt% or more. In another embodiment, %Al is 12 wt% or more. In another embodiment, %Al is 22 wt% or more. In another embodiment, %Al is 36 wt% or more. The present invention, in the inventor's opinion, is the sole invention of an atomized powder of lithium-based aluminum alloy, having high morphological quality.In one embodiment, the powder produced is an aluminum-based alloy comprising lithium. In one embodiment, %Li is 3.2 wt% or greater. In another embodiment, %Li is 6.2 wt% or greater. In another embodiment, %Li is 12 wt% or greater. In another embodiment, %Li is 22 wt% or greater. In another embodiment, %Li is 36 wt% or greater. The present invention provides atomized powders of molten metal (MM) gallium alloys having high morphological quality. In one embodiment, the powder produced is a molten metal (MM) gallium-based alloy. In one embodiment, %MM is 3.2 wt% or greater. In another embodiment, %MM is 6.2 wt% or greater. In another embodiment, %MM is 12 wt% or greater. In another embodiment, %MM is 22 wt% or greater. In another embodiment, %MM is 36 wt% or greater. In one embodiment, the molten metal is aluminum. In one embodiment, the molten metal is titanium. In one embodiment, the molten metal is iron. In one embodiment, the molten metal is nickel. In one embodiment, the molten metal is cobalt. In the inventor's opinion, the present invention provides an atomized powder of an aluminum alloy comprising gallium, which is of high morphological quality. In one embodiment, the powder produced is an aluminum-based alloy comprising gallium. In one embodiment, %Ga is 3.2 wt% or more. In another embodiment, %Ga is 6.2 wt% or more. In another embodiment, %Ga is 12 wt% or more. In another embodiment, %Ga is 22 wt% or more. In another embodiment, %Ga is 36 wt% or more. In the inventor's opinion, the present invention provides an atomized powder of a titanium alloy comprising gallium, which is of high morphological quality. In one embodiment, the powder produced is a titanium-based alloy comprising gallium. In one embodiment, %Ga is 3.2 wt% or more. In another embodiment, %Ga is 6.2 wt% or more. In another embodiment, %Ga is 12 wt% or more. In another embodiment, %Ga is 22 wt% or more. In another embodiment, %Ga is 36 wt% or more. In the inventor's opinion, the present invention provides an atomized powder of an iron-based alloy comprising gallium, which has high morphological quality. In one embodiment, the powder produced is an iron-based alloy comprising gallium. In one embodiment, %Ga is 3.2 wt% or more. In another embodiment, %Ga is 6.2 wt% or more. In another embodiment, %Ga is 12 wt% or more. In another embodiment, %Ga is 22 wt% or more. In another embodiment, %Ga is 36 wt% or greater. In the inventor's opinion, the present invention provides, by itself, an atomized powder of a gallium-containing nickel alloy having high morphological quality. In one embodiment, the powder produced is a gallium-containing nickel-based alloy. In one embodiment, %Ga is 3.2 wt% or greater. In another embodiment, %Ga is 6.2 wt% or greater. In another embodiment, %Ga is 12 wt% or greater. In another embodiment, %Ga is 22 wt% or greater. In another embodiment, %Ga is 36 wt% or greater. In the inventor's opinion, the present invention provides, by itself, an atomized powder of a gallium-containing cobalt-based alloy having high morphological quality. In one embodiment, the powder produced is a gallium-containing cobalt-based alloy. In one embodiment, %Ga is 3.2 wt% or greater. In another embodiment, %Ga is 6.2 wt% or greater. In another embodiment, %Ga is 12 wt% or greater. In another embodiment, %Ga is 22 wt% or greater. In another embodiment, %Ga is 36 wt% or greater. In this paragraph, for an alloy to be an alloy based on a particular metal, that metal must be the majority component of the alloy. In one embodiment, the component with the largest weight percentage is the majority component.

[0055] In this specification, D50 This refers to the particle size at which 50% of the volume of the sample is made up of smaller particles in the cumulative particle size distribution. Particle size is measured by laser diffraction in accordance with ISO 13320-2009.

[0056] In another embodiment, the disclosed D 50 The value of D means the particle size at which 50% of the sample mass is made up of smaller particles in the cumulative particle size distribution. 50 Particle size is measured by laser diffraction according to ISO 13320-2009.

[0057] Any embodiment disclosed herein can be combined with any other embodiment in any combination, provided they are not mutually exclusive. Some combinations of embodiments are as follows: [1] A method for producing a metal-based alloy powder or particulate material using centrifugal atomization in a closed chamber, comprising the steps of: a) providing a composition comprising at least one metal; b) melting the composition; and c) atomizing the molten composition by centrifugal atomization or rotary atomization. [2] A method for producing a metal-based alloy powder using centrifugal atomization in a closed chamber, comprising the steps of: a) providing a composition comprising at least one metal; b) melting the composition; and c) centrifugal atomization of the molten composition. [3] A method according to any one of [1] to [2], wherein the atmosphere in the closed atomization chamber is pressurized. [4] A method according to any one of [1] to [2], wherein the atmosphere in the closed atomization chamber is cooled. [5] A method according to any one of [1] to [2], wherein the atmosphere in the closed atomization chamber is pressurized or cooled. [6] A method according to any one of [1] to [5], wherein the atomization chamber consists of an atomization disk. [7] The method according to any of [1] to [6], wherein atomization is performed using a spray disk. [8] The method according to any of [1] to [7], wherein PA2 is greater than 4,500,000. [9] The method according to any of [1] to [7], wherein PA2 is greater than 5,000,000.

[10] The method according to any of [1] to [7], wherein PA2 is greater than 6,000,000.

[11] The method according to any of [1] to [7], wherein PA2 is greater than 7,000,000.

[12] The method according to any of [1] to [7], wherein PA2 is less than 70,000,000.

[13] The method according to any of [1] to [7], wherein PA2 is less than 40,000,000.

[14] The method according to any of [1] to [7], wherein PA2 is less than 30,000,000.

[15] The method according to any of [1] to [7], wherein PA2 is less than 20,000,000.

[16] PA2=K1 * PA1+K2 * P, where P is the absolute pressure in the atomization chamber in Pa, and PA1 = ρ * N 2* d 2 and ρ is kg / m 3where K1 is the density of the composition to be atomized at its melting point under an absolute pressure of 1 bar measured in rad / s, N is the rotational speed of the atomization disk in rad / s, and d is the diameter of the atomization disk in m.

[17] A method according to any of [8] to

[16] , wherein K1 = 0.0033 at 1 / Pa and K2 = 22 at 1 / Pa.

[18] A method according to any of [8] to

[16] , wherein the atomized composition is an aluminum-based alloy, and K1 = 0.01 at 1 / Pa and K2 = 20 at 1 / Pa.

[19] A method according to any of [8] to

[16] , wherein K1 = 0.015 at 1 / Pa and K2 = 22 at 1 / Pa when the atomized composition is a magnesium-based alloy.

[20] A method according to any of [8] to

[16] , wherein K1 = 0.0033 at 1 / Pa and K2 = 20 at 1 / Pa when the atomized composition is an iron-based alloy.

[21] A method according to any of [8] to

[16] , wherein K1 = 0.0033 at 1 / Pa and K2 = 21 at 1 / Pa when the composition being sprayed is a nickel-based alloy.

[22] A method according to any of [8] to

[16] , wherein K1 = 0.0033 at 1 / Pa and K2 = 21 at 1 / Pa when the composition being sprayed is a cobalt-based alloy.

[23] A method according to any of [8] to

[16] , wherein K1 = 0.0033 at 1 / Pa and K2 = 21 at 1 / Pa when the composition being sprayed is a copper-based alloy.

[24] A method according to any of [1] to

[23] , wherein the absolute pressure in the atomization chamber is greater than 1.2 bar.

[25] A method according to any of [1] to

[23] , wherein the absolute pressure in the atomization chamber is greater than 2.6 bar.

[26] A method according to any of [1] to

[23] , wherein the absolute pressure in the atomization chamber is greater than 2.8 bar.

[27] The method according to any one of [1] to

[27] , wherein the absolute pressure in the spray chamber is less than 999.4 bar.

[28] The method according to any one of [1] to

[27] , wherein the absolute pressure in the spray chamber is less than 99.2 bar.

[29] The method according to any one of [1] to

[27] , wherein the absolute pressure in the spray chamber is less than 29.6 bar.

[30] The method according to any one of [1] to

[27] , wherein the absolute pressure in the spray chamber is less than 19.2 bar.

[31] PA3 is less than 10000, PA3 = PA1 / P, and PA1 = ρ * N 2* d 2and ρ is kg / m 3 is the density of the composition sprayed at its melting point under an absolute pressure of 1 bar measured in rpm, N is the rotation speed of the spray disc (rad / s), d is the diameter of the spray disc (m), and P is the pressure in the spray chamber (Pa).

[32] The method according to any of [1] to

[30] . PA3 is less than 7000, PA3 = PA1 / P, and PA1 = ρ * N 2* d 2 and ρ is kg / m 3 is the density of the composition sprayed at its melting point under an absolute pressure of 1 bar measured in rpm, N is the rotation speed of the spray disc (rad / s), d is the diameter of the spray disc (m), and P is the pressure in the spray chamber (Pa), according to any of the methods [1] to

[31] .

[33] PA3 is less than 6000, PA3 = PA1 / P, and PA1 = ρ * N 2* d 2 and ρ is kg / m 3where N is the density of the composition to be sprayed at its melting point under an absolute pressure of 1 bar measured at 1000 K, N is the rotation speed of the spray disc (rad / s), d is the diameter of the spray disc (m), and P is the pressure in the spray chamber (Pa).

[34] A method according to any of [1] to

[33] , wherein the compositions to be sprayed are superheated to a temperature equal to or greater than their melting point.

[35] A method according to any of [1] to

[33] , wherein the compositions to be sprayed are superheated to a temperature of at least 52°C above their melting temperature (Tm).

[36] A method according to any of [1] to

[33] , wherein the compositions to be sprayed are superheated to a temperature of at least 106°C above their melting temperature (Tm).

[37] A method according to any of [1] to

[36] , wherein the compositions to be sprayed are superheated to a temperature less than 396°C + Tm, where Tm is the melting temperature of the composition to be sprayed in degrees Celsius (°C).

[38] The method according to any of [1] to

[36] , wherein the composition to be sprayed is heated to a temperature below 294°C + Tm, where Tm is the melting temperature of the composition to be sprayed in degrees Celsius (°C).

[39] The method according to any of [1] to

[38] , wherein the contact angle between the molten composition and the spray disk is greater than 76°.

[40] The method according to any of [1] to

[38] , wherein the contact angle between the molten composition and the spray disk is greater than 96°.

[41] The method according to any of [1] to

[38] , wherein the contact angle between the molten composition and the spray disk is greater than 106°.

[42] The method according to any of [1] to

[41] , wherein the contact angle between the molten composition and the spray disk is less than 168°.

[43] The method according to any of [1] to

[41] , wherein the contact angle between the molten composition and the spray disk is greater than 158°.

[44] The contact angle between the molten composition and the spray disk is between Cs and Ci, wherein Cs=185°-0.2 * (T-Tm) and Ci=120°-0.2 *(T-Tm), where T is the temperature of the molten composition to be atomized in degrees Celsius (°C) and Tm is the melting temperature of the composition to be atomized in degrees Celsius (°C).

[45] The method according to any of

[39] to

[44] , wherein the contact angle is measured according to the sessile drop method.

[46] The method according to any of [1] to

[45] , wherein the surface tension between the molten composition and the surface of the spray disk is greater than 680 mN / m.

[47] The method according to any of [1] to

[45] , wherein the surface tension between the molten composition and the surface of the spray disk is greater than 780 mN / m.

[48] The method according to any of [1] to

[47] , wherein the surface tension between the molten composition and the surface of the spray disk is less than 1750 mN / m.

[49] The method according to any of [1] to

[47] , wherein the surface tension between the molten composition and the surface of the spray disk is less than 1550 mN / m.

[50] The surface tension between the molten composition and the surface of the spray disc, measured in mN / m, is between STs and STi, where STs = 1450 - 0.8 * (T-Tm) and STi=820-0.7 *(T-Tm), where T is the temperature of the molten composition to be atomized in degrees Celsius (°C) and Tm is the melting temperature of the composition to be atomized in degrees Celsius (°C).

[51] A method according to any of

[46] to

[50] , wherein the surface tension is measured according to the sessile drop method.

[52] A method according to any of [1] to

[51] , wherein the spray disc is made of a material comprising ceramic.

[53] A method according to any of [1] to

[51] , wherein the spray disc is ceramic.

[54] A method according to any of [1] to

[51] , wherein the spray disc is made of a material comprising titanate.

[55] A method according to any of [1] to

[51] , wherein the spray disc is made of a material comprising barium titanate.

[56] A method according to any of [1] to

[51] , wherein the spray disc is made of a material comprising barium titanate in which the barium is at least partially substituted with strontium.

[57] A method according to any one of [1] to

[52] , wherein the spray disc is made of a material consisting of a metal.

[58] A method according to any one of [1] to

[51] , wherein the spray disc is metal.

[59] A method according to any one of [1] to

[52] , wherein the spray disc is made of a material consisting of an intermetallic compound.

[60] A method according to any one of [1] to

[59] , wherein the spray chamber is constructed by integrating the spray disc and the shaft.

[61] A method according to any one of [1] to

[60] , wherein the spray disc is at least partially coated.

[62] A method according to any one of [1] to

[60] , wherein the coating consists of titanate.

[63] A method according to any one of

[61] to

[62] , wherein the coating consists of titanate.

[64] A method according to any one of

[60] to

[61] , wherein the coating consists of barium titanate.

[65] A method according to any one of

[61] to

[62] , wherein the coating consists of barium titanate, the barium being at least partially substituted with strontium.

[66] A method according to any of

[61] to

[65] , wherein the coating thickness is 2.1 microns or more.

[67] A method according to any of

[61] to

[65] , wherein the coating thickness is 72.1 microns or more.

[68] A method according to any of

[61] to

[67] , wherein the coating thickness is less than 490 microns.

[69] The method according to any of

[61] to

[67] , wherein the coating has a thickness of less than 160 microns.

[70] The method according to any of

[61] to

[69] , wherein the coating consists of at least two layers.

[71] The method according to

[70] , wherein the layers have different compositions.

[72] The method according to any of

[70] to

[71] , wherein the first coating layer applied to the spray disk is a metallic coating layer.

[73] The method according to any of

[70] to

[71] , wherein the first coating layer applied to the spray disk is a ceramic coating layer.

[74] The method according to any of

[70] to

[71] , wherein the thickness of each coating layer is according to any of

[68] to

[69] .

[75] The method according to any of

[61] to

[74] , wherein the coating is applied by plasma spraying.

[76] The method according to any of [6] to

[75] , wherein the coating is applied by plasma spraying.

[77] The method according to any of [1] to

[76] , wherein the composition comprising at least one metal provided in step a) is a composition comprising a metal-based alloy. (

[78] The method according to any of [1] to

[76] , wherein the composition comprising at least one metal provided in step a) is a composition comprising an aluminium-based alloy.

[79] Any of [1] to

[76] , wherein the composition comprising at least one metal provided in step a) is a composition comprising an aluminium-based alloy.

[80] The method according to any of [1] to

[76] , wherein the composition of at least one metal provided in step a) is a magnesium-based alloy.

[81] The method according to any of [1] to

[76] , wherein the composition of at least one metal provided in step a) is a magnesium-based alloy.

[82] The method according to any of [1] to

[76] , wherein the composition of at least one metal provided in step a) is a lithium-based alloy.

[83] The method according to any of [1] to

[76] , wherein the composition of at least one metal provided in step a) is a lithium-based alloy.

[84] The method according to any of [1] to

[76] , wherein the composition of at least one metal provided in step a) is a copper-based alloy.

[85] The method according to any of [1] to

[76] , wherein the composition of at least one metal provided in step a) is a copper-based alloy.

[86] The method according to any of [1] to

[76] , wherein the composition comprising at least one metal provided in step a) is a composition comprising a germanium-based alloy.

[87] The method according to any of [1] to

[76] , wherein the composition comprising at least one metal provided in step a) is a composition comprising a germanium-based alloy.

[88] The method according to any of [1] to

[76] , wherein the composition comprising at least one metal provided in step a) is a composition comprising a silver-based alloy.

[89] The method according to any of [1] to

[76] , wherein the composition comprising at least one metal provided in step a) is a composition comprising a silver-based alloy.

[90] The method according to any of [1] to

[76] , wherein the composition comprising at least one metal provided in step a) is a composition comprising a gold-based alloy.

[91] The method according to any of [1] to

[76] , wherein the composition comprising at least one metal provided in step a) is a composition comprising a gold-based alloy.

[92] A method according to any of

[77] to

[91] , wherein the alloy comprises at least one element selected from the following methods: %Mg, %Si, %Zn with a content of 0.3 wt% or more and 9.8 wt% or less.

[93] A method according to any of

[77] to

[91] , wherein the alloy comprises at least two elements selected from the methods whereby the %Mg, %Si, %Zn contents are equal to or greater than 0.3wt% and equal to or less than 9.8wt%.

[94] A method according to any of

[77] to

[93] , wherein the alloy comprises at least one element selected from the methods whereby the %Sc, %Zr, %Cu, %Mn and %Fe contents are equal to or greater than 0.002wt% and equal to or less than 5.9wt%.

[95] A method according to any of

[77] to

[93] , wherein the alloy comprises at least two elements selected from the methods whereby the %Sc, %Zr, %Cu, %Mn and %Fe contents are equal to or greater than 0.002wt% and equal to or less than 5.9wt%.

[96] A method according to any of

[77] to

[93] , wherein the alloy consists of at least three elements selected from Sc, %Zr, %Cu, %Mn and %Fe with contents of ≧0.002wt% and ≦5.9wt%.

[97] A method according to any of

[77] to

[96] , wherein the alloy contains %K, %P or %Cr less than 94ppm by weight.

[98] A method according to any of

[77] to

[97] , wherein the alloy contains %Sb or %Li less than 0.8ppm by weight.

[99] A method according to any of

[77] to

[98] , wherein the alloy contains Na, Ga or Ca less than 590ppm by weight.

[0100] A method according to any of

[77] to

[99] , wherein the alloy comprises %Sr less than 1.9wt%.

[0101] A method according to any of [1] to

[38] , wherein the contact angle between the molten composition and the spray disc is greater than 76°.

[0102] The method according to any one of [1] to

[38] , wherein the contact angle between the molten composition and the spray disc is greater than 98°.

[0103] The method according to any one of [1] to

[38] , wherein the contact angle between the molten composition and the spray disc is greater than 106°.

[0104] The method according to any one of [1] to

[38] and

[0101] to

[0103] , wherein the contact angle between the molten composition and the spray disc is less than 172°.

[0105] The method according to any one of [1] to

[38] and

[0101] to

[0103] , wherein the contact angle between the molten composition and the spray disc is less than 156°.

[106] The contact angle between the molten composition and the spray disc is between Cs and Ci, wherein Cs=185°-0.2. * (T-Tm) and Ci=120-0.2 *(T-Tm), where T is the temperature of the molten composition being sprayed in degrees Celsius (°C) and Tm is the melting temperature of the composition being sprayed in degrees Celsius (°C).

[0107] The method according to any of

[0101] to

[0106] , wherein the contact angle is measured according to the sessile drop method.

[0108] The method according to any of [1] to

[38] and

[0101] to

[0107] , wherein the surface tension between the molten composition and the surface of the spray disc is greater than 810 mN / m.

[109] The method according to any of [1] to

[38] and

[0101] to

[0107] , wherein the surface tension between the molten composition and the surface of the spray disc is greater than 910 mN / m.

[0110] The method according to any one of [1] to

[38] and

[0101] to

[0109] , wherein the surface tension between the molten composition and the surface of the spray disc is less than 2190 mN / m.

[111] The method according to any one of [1] to

[38] and

[0101] to

[0109] , wherein the surface tension between the molten composition and the surface of the spray disc is less than 1990 mN / m.

[112] The surface tension between the molten composition and the surface of the spray disc, measured in mN / m, is between STs and STi, and STs=1700-0.8 * (T-Tm) and STi=1100-0.9 *(T-Tm), where T is the temperature of the molten composition to be atomized in degrees Celsius (°C) and Tm is the melting temperature of the composition to be atomized in degrees Celsius (°C).

[0113] The method according to any of

[0108] to

[0112] , wherein the surface tension is measured according to the sessile drop method.

[0114] The method according to any of [1] to

[38] and

[0101] to

[0113] , wherein the spray disc is made of a material consisting of alumina (Al2O3).

[0115] The method according to any of [1] to

[38] and

[0101] to

[0113] , wherein the spray disc is made of alumina (Al2O3).

[0116] The method according to any of [1] to

[38] and

[0101] to

[0113] , wherein the spray disc is made of a material consisting of aluminum nitride (AlN).

[0117] A method according to any one of [1] to

[38] and

[0101] to

[0113] , wherein the spray disc is made of aluminum nitride (AIN).

[0118] A method according to any one of [1] to

[38] and

[0101] to

[0113] , wherein the spray disc is made of a material consisting of a stable oxide.

[0119] A method according to any one of [1] to

[38] and

[0101] to

[0113] , wherein the spray disc is made of a material consisting of magnesium oxide (MgO).

[0120] A method according to any one of [1] to

[38] and

[0101] to

[0113] , wherein the metal part of the spray disc is made of a material consisting of an oxide that operates in an oxidation state of III or higher.

[0121] A method according to any one of [1] to

[38] and

[0101] to

[0113] , wherein the metal part of the spray disc is made of a material that contains, in large part, an oxide that operates in an oxidation state of III or higher.

[0122] A method according to any of [1] to

[38] and

[0101] to

[0113] , wherein the metal part of the spray disc is made from a material consisting of oxides operating in an oxidation state of IV or higher.

[0123] A method according to any of [1] to

[38] and

[0101] to

[0113] , wherein the metal part of the spray disc is made from a material containing, in large part, oxides operating in an oxidation state of IV or higher.

[0124] A method according to any of [1] to

[38] and

[0101] to

[0113] , wherein the spray disc is made from a material consisting of titanium oxide.

[0125] The method according to any of [1] to

[38] and

[0101] to

[0113] , wherein the spray disc consists of titanium oxide.

[0126] The method according to any of

[0124] to

[0125] , wherein the predominant phase identified as titanium oxide with a %Ti greater than 50 wt% has an oxygen content greater than 26 wt%.

[0127] The method according to any of

[0124] to

[0125] , wherein the predominant phase identified as titanium oxide with a %Ti greater than 50 wt% has an oxygen content less than 39 wt%.

[0128] The method according to any of [1] to

[38] and

[0101] to

[0113] , wherein the spray disc is made from a material consisting of TiN and the nitrogen content of the sprayed molten composition is less than 1500 ppm by weight.

[0129] The method according to any of [1] to

[38] and

[0101] to

[0113] , wherein the atomizing disc is TiN and the nitrogen content of the molten composition to be sprayed is less than 1500 ppm by weight.

[0130] The method according to any of [1] to

[38] and

[0101] to

[0113] , wherein the atomizing disc is made of a material consisting of a metal.

[0131] The method according to any of [1] to

[38] and

[0101] to

[0113] , wherein the atomizing disc is made of a material consisting of an intermetallic compound.

[0132] The method according to any of [1] to

[38] and

[0101] to

[0113] , wherein the atomizing disc is made of a material consisting of an intermetallic compound.

[133] The method according to any of [1] to

[38] and

[0101] to

[0132] , wherein the atomizing chamber is constructed by integrating the atomizing disc and the shaft.

[0134] The method according to any of [1] to

[38] and

[0101] to

[0133] , wherein the spray disc is at least partially coated.

[0135] The method according to any of [1] to

[38] and

[0101] to

[0133] , wherein the spray disc is coated.

[0136] The method according to any of

[0134] to

[0135] , wherein the coating consists of alumina (Al2O3).

[0137] The method according to any of

[0134] to

[0135] , wherein the coating is made of alumina (Al2O3).

[0138] The method according to any of

[0134] to

[0135] , wherein the coating consists of aluminium nitride (AlN).

[0139] A method according to any of

[0134] to

[0135] , wherein the coating is made of aluminum nitride (AIN).

[0140] A method according to any of

[0134] to

[0135] , wherein the coating consists of a stable oxide.

[0141] A method according to any of

[0134] to

[0135] , wherein the coating consists of magnesium oxide (MgO).

[0142] A method according to any of

[0134] to

[0135] , wherein the metal part of the coating consists of an oxide operating in an oxidation state III or higher.

[0143] A method according to any of

[0134] to

[0135] , wherein the metal part of the coating comprises a majority of oxides operating in an oxidation state III or higher.

[0144] A method according to any of

[0134] to

[0135] , wherein the metal part of the coating consists of an oxide operating in an oxidation state IV or higher.

[0145] A method according to any of

[0134] to

[0135] , wherein the metallic portion of the coating comprises a majority of oxides operating in an oxidation state of IV or higher.

[0146] A method according to any of

[0134] to

[0135] , wherein the coating consists of titanium oxide.

[0147] A method according to any of

[0134] to

[0135] , wherein the coating is made of titanium oxide.

[0148] A method according to any of

[0146] to

[0147] , wherein the predominant phase of titanium oxide with %Ti greater than 50wt% has an oxygen content greater than 26wt%.

[0149] A method according to any of

[0146] to

[0147] , wherein the predominant phase of titanium oxide with %Ti greater than 50wt% has an oxygen content less than 39wt%.

[0150] A method according to any of

[0134] to

[0135] , wherein the coating consists of TiN and the nitrogen content of the sprayed molten composition is less than 1500 ppm by weight.

[0151] Any of

[0134] to

[0135] , wherein the coating consists of TiN and the nitrogen content of the sprayed molten composition is less than 1500 ppm by weight. A method according to any one of

[0152] to

[0135] , wherein the coating consists of a metal.

[0153] A method according to any one of

[0134] to

[0135] , wherein the coating is a metal.

[0154] A method according to any one of

[0134] to

[0135] , wherein the coating consists of an intermetallic compound.

[0155] A method according to any one of

[0134] to

[0154] , wherein the coating has a thickness of 2.1 microns or greater.

[0156] A method according to any one of

[0134] to

[0154] , wherein the coating has a thickness of 72.1 microns or greater.

[0157] A method according to any one of

[0134] to

[0156] , wherein the coating has a thickness of less than 490 microns.

[0158] A method according to any one of

[0134] to

[0156] , wherein the coating has a thickness of less than 160 microns.

[0159] A method according to any of

[0134] to

[0158] , wherein the coating consists of at least two layers.

[0160] A method according to

[0159] , wherein the layers have different compositions.

[0161] A method according to any of

[0159] to

[0160] , wherein the first coating layer applied on the spray disc is a metallic coating layer.

[0162] A method according to any of

[0159] to

[0160] , wherein the first coating layer applied on the spray disc is a ceramic coating layer.

[0163] A method according to any of

[0159] to

[0162] , according to any of

[0157] to

[0158] in the thickness of each layer.

[0164] A method according to any of

[0134] to

[0163] , wherein the coating is applied by plasma spraying.

[0165] A method according to any of

[0101] to

[0164] , wherein the spray disc is supported via a cage structure.

[0166] The method according to any of [1] to

[0165] , wherein the composition comprising at least one metal provided in step a) is a composition comprising a metal-based alloy.

[0167] The method according to any of [1] to

[38] and

[0101] to

[0165] , wherein the composition comprising at least one metal provided in step a) is a composition comprising an iron-based alloy.

[0168] The method according to any of [1] to

[38] and

[0101] to

[0165] , wherein the composition comprising at least one metal provided in step a) is an iron-based alloy.

[0169] The method according to any of [1] to

[38] and

[0101] to

[0165] , wherein the composition comprising at least one metal provided in step a) is a composition comprising a magnesium-based alloy.

[0170] The method according to any of [1] to

[38] and

[0101] to

[0165] , wherein the composition comprising at least one metal provided in step a) is a composition comprising a magnesium-based alloy.

[0171] The method according to any of [1] to

[38] and

[0101] to

[0165] , wherein the composition comprising at least one metal provided in step a) is a composition comprising a lithium-based alloy.

[0172] The method according to any of [1] to

[38] and

[0101] to

[0165] , wherein the composition comprising at least one metal provided in step a) is a lithium-based alloy.

[0173] The method according to any of [1] to

[38] and

[0101] to

[0165] , wherein the composition comprising at least one metal provided in step a) is a composition comprising a copper-based alloy.

[0174] The method according to any of [1] to

[38] and

[0101] to

[0165] , wherein the composition comprising at least one metal provided in step a) is a composition comprising a copper-based alloy.

[0175] The method according to any of [1] to

[38] and

[0101] to

[0165] , wherein the composition comprising at least one metal provided in step a) is a composition comprising a nickel-based alloy.

[0176] The method according to any of [1] to

[38] and

[0101] to

[0165] , wherein the composition comprising at least one metal provided in step a) is a nickel-based alloy.

[0177] The method according to any of [1] to

[38] and

[0101] to

[0165] , wherein the composition comprising at least one metal provided in step a) is a composition comprising a cobalt-based alloy.

[0178] The method according to any of [1] to

[38] and

[0101] to

[0165] , wherein the composition comprising at least one metal provided in step a) is a composition comprising a cobalt-based alloy.

[0179] The method according to any of [1] to

[38] and

[0101] to

[0165] , wherein the composition comprising at least one metal provided in step a) is a composition comprising a titanium-based alloy.

[0180] The method according to any of [1] to

[38] and

[0101] to

[0165] , wherein the composition consisting of at least one metal provided in step a) is a titanium-based alloy.

[0181] The method according to any of

[0101] to

[0180] , wherein the alloy contains %S at least 25 ppm by weight.

[0182] The method according to any of

[0101] to

[0181] , wherein the alloy contains %S less than 400 ppm by weight.

[0183] The method according to any of

[0101] to

[0182] , wherein the alloy contains %P at least 55 ppm by weight.

[0184] The method according to any of

[0101] to

[0183] , wherein the alloy contains %P less than 400 ppm by weight.

[0185] The method according to any of

[0101] to

[0184] , wherein the alloy contains %B at least 6 ppm by weight.

[186] The method according to any of

[0101] to

[0183] wherein the alloy contains %B less than 400 ppm by weight.

[0187] The method according to any of

[0101] to

[0186] wherein the alloy contains %C less than 4.9 wt%.

[0188] The method according to any of

[0101] to

[0187] wherein the alloy contains the sum of %Mo+%Cr+%W+%V+%Si+%Mn more than 10.5 wt%.

[0189] The method according to any of

[0101] to

[0188] wherein the alloy has the composition %Cr+%Ta+%Hf more than 10 wt% and %C less than 1.9 wt%.

[0190] The method according to any of

[0101] to

[0189] wherein the alloy contains %Si less than 6.29 wt%.

[0191] A method according to any of

[0101] to

[0190] , wherein the alloy contains %Al not more than 0.09wt%.

[0192] A method according to any of

[0101] to

[0191] , wherein the alloy contains %Ti not more than 0.09wt%.

[0193] A method according to any of

[0101] to

[0192] , wherein the alloy contains %Ti of at least 0.0012wt.

[0194] A method according to any of [1] to

[0193] , wherein the oxygen content in the sprayed molten composition is not more than 790ppm by weight.

[0195] A method according to any of [1] to

[0193] , wherein the oxygen content in the sprayed molten composition is not more than 180ppm by weight.

[0196] A method according to any of [1] to

[0195] , wherein there is no direct contact of the molten composition with a liquid.

[0197] A method according to any of [1] to

[0195] , wherein there is no direct contact between the molten composition and any liquid-containing substance.

[0198] A method according to any of [1] to

[0195] , wherein there is no direct contact between the molten composition and water.

[0199] A method according to any of [1] to

[0195] , wherein there is no direct contact between the molten composition and an aqueous fluid.

[0200] A method according to any of [1] to

[0199] , wherein there is no direct contact between the produced powder and a liquid.

[0201] A method according to any of [1] to

[0199] , wherein there is no direct contact between the produced powder and a liquid-containing substance.

[0202] A method according to any of [1] to

[0199] , wherein there is no direct contact between the produced powder and water.

[0203] A method according to any of [1] to

[0199] , wherein there is no direct contact between the produced powder and an aqueous fluid.

[0204] A method according to any of [1] to

[0203] , wherein there is no contact between the molten composition and a cooling gas.

[0205] The method according to any one of [1] to

[0195] , wherein the spray disc is cooled.

[0206] The method according to any one of [1] to

[0195] , wherein the spray chamber consists of a cooled gas curtain.

[0207] The method according to any one of [1] to

[0195] , wherein a circulating gas is introduced into the spray chamber during the atomization step.

[0208] The method according to

[0207] , wherein the circulating gas is an inert gas.

[0209] The flow rate of the circulating gas is 990 m 3

[0210] The method according to any one of

[0207] to

[0208] , wherein the flow rate of the circulating gas is less than 98 m 3 / min or less.

[0211] A method according to any of

[0207] to

[0208] , wherein the circulation gas is a cooling gas.

[0212] A method according to any of

[0207] to

[0211] , wherein the circulation gas is a protective gas.

[0213] A method according to

[0212] , wherein the protective gas is cooled by contact with a cold wall.

[0214] A method according to

[0212] , wherein the protective gas is cooled by contact with a heat exchanger.

[0215] A method according to any of [1] to

[0214] , wherein at least a portion of the gas in the chamber is forced into contact with a cooling element.

[0216] A method according to

[0215] , wherein the portion of the gas in the chamber that is forced into contact with the cooling element reduces its temperature by at least 2°C.

[217] A method according to any of

[0217] to

[0218] , wherein the portion of the gas in the chamber that is forced into contact with the cooling element reduces its temperature by at least 2°C.3 / min.

[0218] A method according to any of [1] to

[0195] , wherein a gas is introduced into the atomization chamber during the atomization step.

[0219] A method according to any of

[0218] , wherein the gas is a cooling gas.

[0220] A method according to any of

[0204] to

[0219] , wherein the cooling gas is an inert gas.

[0221] A method according to

[0220] , wherein the inert gas is helium.

[0222] A method according to

[0220] , wherein the inert gas is argon.

[0223] A method according to

[0220] , wherein the inert gas is nitrogen.

[0224] A method according to

[0220] , wherein the inert gas is xenon.

[0225] A method according to

[0220] , wherein the inert gas is krypton.

[0226] The method according to

[0220] , wherein the inert gas is a gas that does not react with the molten composition being sprayed.

[0227] The method according to

[0220] , wherein the inert gas is a mixture of two or more inert gases.

[0228] The method according to

[0220] , wherein the inert gas is a mixture of at least two gases.

[0229] The method according to any of [1] to

[0228] , wherein the gas is introduced to locally cool elements of the spray disc.

[0230] The method according to any of

[0207] to

[0229] , wherein the gas consists of a mist containing a liquid.

[0231] The method according to

[0230] , wherein the mist consists of a lubricating fluid or particles.

[0232] The method according to

[0231] , wherein the lubricating fluid is oil.

[0233] The method according to any of

[0207] to

[0232] , wherein the gas cools bearings of the spray disc.

[0234] A method according to any one of

[0207] to

[0233] , wherein the gas cools the bearings of the atomizing disc.

[0235] A method according to any one of

[0207] to

[0234] , wherein the gas cools the atomizing disc.

[0236] A method according to any one of

[0207] to

[0234] , wherein the gas introduced is 0.12 m 3 / min or more.

[0237] The method according to any one of

[0207] to

[0235] . 3 / min or less.

[0238] A method according to any of [1] to

[0237] , wherein the spray disc is externally cooled.

[0239] A method according to any of [1] to

[0238] , wherein the radial stress on the spray disc due to centrifugal force is less than 290 MPa.

[0240] A method according to any of [1] to

[0239] , wherein the radial stress on the spray disc due to centrifugal force is 14 MPa or more.

[0241] A method according to any of

[76] to

[0240] , wherein the cage is made of a metallic material.

[0242] A method according to any of

[76] to

[0240] , wherein the cage is of metallic construction.

[0243] A method according to any of

[76] to

[0242] , wherein the cage material has an elongation at break of 0.8% or more at the processing temperature.

[0244] The method according to

[0243] , wherein the elongation at break at the processing temperature is measured in accordance with ASTM E21-17.

[0245] The method according to any of

[0241] to

[0244] , wherein the spray disk is ceramic.

[0246] The stress in the ceramic spray disk at the interface between the ceramic spray disk and the metal structure is measured by LFC. * σ creep Less than and LSC * σ creep A method according to

[0245] , where LFC is 1. A method according to

[0246] , where LSC is 0.7.

[0249] σ creep The method according to any one of

[0246] to

[0248] , wherein σ is the creep resistance of the metallic material for 10 hours at a fixed working temperature. creep

[0251] The method according to any one of

[0246] to

[0248] , wherein σ is the creep resistance of the metallic material at 800°C for 10 hours. creep The method according to any one of

[0241] to

[0250] , wherein the σ of the metal material is 12 MPa or more. creep is measured in accordance with ASTM E139-11(2018), by the method according to any one of

[0246] to

[0251] . creep

[0254] A method according to any one of

[0246] to

[0252] , in which the stress in the ceramic spray disk at the interface between the ceramic spray disk and the metal structure is determined by finite element simulation (FEM).

[0255] A method according to any one of

[0246] to

[0252] , in which the stress in the ceramic spray disk at the interface between the ceramic spray disk and the metal structure is determined by finite element simulation (FEM).

[0256] A method according to any one of

[0246] to

[0252] , in which the stress in the ceramic spray disk at the interface between the ceramic spray disk and the metal structure is determined by finite element simulation (FEM). ceramic -a metal ) * (T work -295) * (E ceramic +E metal ) / 2], where e0 is the initial interference due to the tolerance of / 1, and a ceramic is from room temperature to T work is the average thermal expansion coefficient of ceramics up to T work is the steady-state regime processing temperature in Kelvin, and E ceramic is from room temperature to T work is the average elastic modulus up to metal From room temperature to T work

[0256] The method according to any one of

[0246] to

[0253] , wherein the modulus of elasticity of a ceramic is measured at room temperature according to ASTM C1161-18.

[0257] The method according to

[0255] , wherein the modulus of elasticity of a ceramic is measured at room temperature according to ASTM C1211-18. work

[0255] The method according to

[0258] wherein the coefficient of thermal expansion is measured in accordance with ASTM E831-14.

[0259] The method according to any of

[0244] and

[0251] , wherein the processing temperature is the temperature of the molten composition.

[0260] The method according to any of

[0244] and

[0251] , wherein the processing temperature is the temperature of the spray disk.

[0261] The method according to any of [1] to

[0260] , wherein the temperature of the spray disk is the measured temperature.

[0262] The method according to any of

[76] to

[0260] , wherein the temperature of the spray disk is calculated using finite element simulation (FEM).

[0263] The method according to any of [1] to

[0260] , wherein the temperature of the spray disk is Tm-25(°C), where Tm is the melting temperature of the composition being atomized.

[0264] The method according to any one of [1] to

[0260] , wherein the temperature of the spray disc is Tm+40 (°C), where Tm is the melting temperature of the composition being atomized. work ) is the temperature of the molten composition being sprayed, where the steady state operating temperature (T work ) is the temperature of the molten composition being sprayed in degrees Celsius (°C). work) is Tm-25 (°C), where Tm is the melting temperature of the composition being sprayed.

[0267] A method according to any of

[0249] to

[0258] , where the steady-state processing temperature (Twork) is Tm+40 (°C), where Tm is the melting temperature of the composition being sprayed.

[0268] A method according to any of

[0249] to

[0258] , where the stationary processing temperature is determined by finite element simulation (FEM).

[0269] A method according to any of [1] to

[0268] , where the molten composition being sprayed has a solid phase part.

[0270] A method according to

[0269] , where the solid fraction is less than 39 wt%.

[0271] A method according to any of

[0269] to

[0270] , where the solid fraction is more than 0.01 wt%.

[0272] A method according to any one of [1] to

[0271] , wherein the spray disc is flat.

[0273] A method according to any one of [1] to

[0271] , wherein the spray disc is cup-shaped.

[0274] A method according to any one of [1] to

[0271] , wherein the spray disc is cone-shaped.

[0275] A method according to any one of [1] to

[0271] , wherein the spray disc is an integrally formed bulk disc.

[0276] A method according to any one of [1] to

[0275] , wherein the diameter of the spray disc is 36 mm or more.

[0277] A method according to any one of [1] to

[0275] , wherein the diameter of the spray disc is 56 mm or more.

[0278] A method according to any one of [1] to

[0277] , wherein the diameter of the spray disc is less than 690 mm.

[0279] A method according to any one of [1] to

[0277] , wherein the diameter of the spray disc is less than 490 mm.

[0280] A method according to any of [1] to

[0279] , wherein the spray disc consists of protrusions.

[0281] A method according to any of [1] to

[0279] , wherein at least some of the protrusions are axially asymmetric.

[0282] A method according to any of [1] to

[0279] , wherein the spray disc consists of protrusions distributed radially.

[0283] A method according to

[0282] , wherein the protrusions have a single curvature.

[0284] A method according to

[0282] , wherein the protrusions have a double curvature.

[0285] A method according to

[0282] , wherein the protrusions are radially linear protrusions.

[0286] A method according to

[0282] , wherein the protrusions are backwardly curved.

[0287] A method according to

[0282] , wherein the protrusions are radially curved.

[0288] A method according to

[0282] , wherein the protrusions are curved forward.

[0289] A method according to any of

[0282] to

[0288] , wherein the number of protrusions is 2.

[0290] A method according to any of

[0280] to

[0289] , wherein the protrusions are vanes.

[0291] A method according to any of [1] to

[0290] , wherein the produced batch is a large production batch of 6 kg or more.

[0292] A method according to any of [1] to

[0290] , wherein the produced batch is a very large production batch of 2100 kg or more.

[0293] A method according to any of [1] to

[0292] , wherein the batch productivity is a large batch productivity of 32 kg / h or more.

[0294] A method according to any of [1] to

[0293] , wherein the batch productivity is a large batch productivity of 19400 kg / h or less.

[0295] The method according to any of [1] to

[0294] , wherein the surface of the spray disk is modified to change the wetting behavior of the molten composition on the spray disk.

[0296] The method according to any of [1] to

[0295] , wherein the surface of the spray disk is modified to increase wettability.

[0297] The method according to any of [1] to

[0295] , wherein the surface of the spray disk is modified such that the contact angle between the molten composition and the modified surface of the spray disk is less than 89°.

[0298] The method according to any of [1] to

[0295] , wherein the surface of the spray disk is modified such that the contact angle between the molten composition and the modified surface of the spray disk is 95°.

[0299] The method according to any of [1] to

[0295] , wherein the surface of the spray disk is modified such that the contact angle hysteresis between the molten composition and the modified surface of the spray disk is less than 25°.

[0300] The method according to any of

[0296] , wherein the wettability is quantified by the contact angle between the liquid and the solid surface.

[0301] A method according to any of

[0295] to

[0299] , wherein the modification of the atomization disc consists of engraving a pattern.

[0302] A method according to any of

[0295] to

[0299] , wherein the modification of the surface of the spray disc consists of engraving a pattern.

[0303] A method according to any of

[0295] to

[0299] , wherein the modification of the surface of the spray disc consists of engraving with a random pattern.

[0304] A method according to any of

[0295] to

[0299] , wherein the modification of the surface of the spray disc is effected by engraving with a random pattern.

[0305] A method according to any of

[0295] to

[0299] , wherein modifying the surface of the spray disc comprises providing a texture to the surface of the spray disc.

[0306] A method according to

[0305] , wherein the texture is provided by etching.

[0307] A method according to

[0305] , wherein the texture is provided by applying a coating.

[0308] A method according to

[0305] , wherein the texture is provided by a laser light source.

[0309] A method according to

[0305] , wherein the texture is provided via an electron beam source.

[0310] A method according to

[0305] , wherein the texture is provided by laser engraving.

[0311] A method according to any of

[0305] to

[0310] , wherein the pitch of the texture patterns is 9 mm or less.

[0312] A method according to any of

[0305] to

[0310] , wherein the pitch of the texture patterns is 190 microns or less.

[0313] The method according to any of

[0311] to

[0312] , wherein the pitch of the texture pattern is the smallest distance between two adjacent topological relative extremes of the same sign.

[0314] The method according to any of [1] to

[0313] , wherein the spray chamber consists of at least one bearing.

[0315] The method of [1] to

[0313] , wherein the spray chamber consists of a bearing.

[0316] The method of [1] to

[0315] , wherein the spray chamber constitutes a shaft.

[0317] The method according to any of

[0316] , wherein the distance of the bearing to the spray disk is 990 mm or less.

[0318] The method according to any of

[0315] to

[0317] , wherein the bearing is at least one bearing.

[0319] The method according to any of

[0315] to

[0317] , wherein the bearing is all bearings on the shaft.

[0320] A method according to any of

[0315] to

[0317] , wherein the bearings are the two bearings on the shaft closest to the spray disk.

[0321] A method according to any of

[0315] to

[0317] , wherein the bearings are the bearings on the shaft closest to the spray disk.

[0322] A method according to any of

[0315] to

[0321] , wherein the bearings have angular contact of 12°.

[0323] A method according to any of

[0315] to

[0321] , wherein the bearings have angular contact of 15.5° or more.

[0324] A method according to any of

[0315] to

[0323] , wherein the bearings have angular contact of 34° or less.

[0325] A method according to any of

[0315] to

[0323] , wherein the bearing has angular contact of 29° or less.

[0326] A method according to any of

[0315] to

[0325] , wherein the bearing has progressive angular contact.

[0327] A method according to any of

[0315] to

[0325] , wherein the bearing has progressive angular contact with a reduction in the space between the outer and inner diameters of the rings.

[0328] A method according to any of

[0315] to

[0327] , wherein the bearing has a space between the outer and inner rings of 0.06 mm or more.

[0329] A method according to any of

[0315] to

[0328] , wherein the bearing has a relative radial displacement between the outer and inner rings.

[0330] A method according to any of

[0315] to

[0329] , wherein the bearing has a relative radial displacement between the outer and inner rings of 2.1 mm or more.

[0331] A method according to any one of

[0315] to

[0330] , wherein the bearing constitutes a cylinder as the rotating body.

[0332] A method according to any one of

[0315] to

[0331] , wherein the bearing constitutes a ball as the rotating body.

[0333] A method according to any one of

[0315] to

[0332] , wherein the bearing consists of a ceramic rotating body.

[0334] A method according to any one of

[0315] to

[0332] , wherein the bearing consists of a high-temperature performance metal ring.

[0335] A method according to any one of

[0315] to

[0332] , wherein the bearing consists of a high-temperature performance metal outer ring.

[0336] A method according to any one of

[0315] to

[0332] , wherein the high-temperature performance metal material is a material that has high hardness after prolonged exposure to high temperatures.

[0337] A method according to

[0336] , wherein the high hardness is 54 HRc or more.

[0338] The method according to any one of

[0336] to

[0337] , wherein the hardness is measured at room temperature in accordance with ASTM E18-18a.

[0339] The method according to any one of

[0336] to

[0337] , wherein the hardness is measured at a processing temperature in accordance with ASTM E18-18a.

[0340] The method according to

[0339] , wherein the long exposure time is 35 minutes or more.

[0341] The method according to

[0339] , wherein the high temperature is 85°C or more.

[0342] The method according to any one of

[0315] to

[0341] , wherein the bearing comprises a high temperature exposure resistant lubricant.

[0343] The bearing has a high maximum processing temperature.

[0344] A method according to any of

[0315] to

[0341] , wherein the lubricant comprises a lubricant.

[0344] A method according to

[0343] , wherein the maximum processing temperature is equal to or greater than 86°C.

[0345] A method according to any of

[0315] to

[0344] , wherein the lubricant is applied to the bearing.

[0346] A method according to any of

[0315] to

[0344] , wherein the lubricant is applied continuously to the bearing.

[0347] A method according to any of

[0345] to

[0346] , wherein the application of the lubricant consists of pulses of application, and time passes without the application of new lubricant.

[0348] A method according to any of

[0315] to

[0347] , wherein the outer ring of the bearing is flexible.

[0349] A method according to any of

[0315] to

[0348] , wherein the inner ring of the bearing is outside processing tolerances at room temperature, but within processing tolerances at processing temperature.

[0350] A method according to any of

[0315] to

[0349] , wherein the shaft connecting the bearing and the spray disc is made of a low thermal conductivity material.

[0351] A method according to

[0350] , wherein the low thermal conductivity material is made of a metal or metal alloy.

[0352] A method according to

[0350] , wherein the low thermal conductivity is 90 W / mK or less.

[0353] A method according to any of

[0350] to

[0352] , wherein the thermal conductivity is measured at room temperature in accordance with ASTM E1461-13.

[0354] A method according to any of

[0350] to

[0352] , wherein the thermal conductivity is measured at standard processing temperatures in accordance with ASTM E1461-13.

[0355] A method according to any of

[0315] to

[0354] , wherein cooling is applied around the bearing.

[0356] A method according to any of

[0315] to

[0354] , wherein cooling is applied directly to the shaft on which the bearing is mounted.

[0357] A method according to any of

[0315] to

[0354] , wherein cooling is applied directly to a component of the bearing.

[0358] A method according to any of

[0355] to

[0357] , wherein the cooling medium consists of a phase that changes on contact with the surface to be cooled, such phase change consisting of evaporation or sublimation.

[0359] A method according to any of [1] to

[0358] , wherein the powder produced has an oxygen content of 490 ppm by weight or less.

[0360] A method according to any of [1] to

[0359] , wherein the powder produced has a nitrogen content of 490 ppm by weight or less.

[0361] A method according to any of [1] to

[17] , wherein the powder produced is iron powder.

[0362] The method according to any one of [1] to

[17] , wherein the produced powder is a powder of an alloy consisting of iron.

[0363] The method according to any one of [1] to

[17] , wherein the produced powder is a powder of an alloy whose majority component is iron.

[0364] The method according to any one of [1] to

[17] , wherein the produced powder is an iron-based alloy powder.

[0365] The method according to any one of [1] to

[17] , wherein the produced powder is a tool steel powder.

[0366] The method according to any one of [1] to

[17] , wherein the produced powder is a hot work tool steel powder.

[0367] The method according to any one of [1] to

[17] , wherein the produced powder is a titanium-based alloy powder.

[0368] The method according to any one of [1] to

[17] , wherein the produced powder is a powder of an alloy consisting of titanium.

[0369] The method according to any one of [1] to

[17] , wherein the produced powder is a powder of an alloy whose majority component is titanium.

[0370] The method according to any of [1] to

[17] and

[21] , wherein the produced powder is a nickel-based alloy powder.

[0371] The method according to any of [1] to

[17] and

[21] , wherein the produced powder is a powder of an alloy consisting of nickel.

[0372] The method according to any of [1] to

[17] and

[21] , wherein the produced powder is a powder of an alloy consisting mostly of nickel.

[0373] The method according to any of [1] to

[18] , wherein the produced powder is an aluminium-based alloy powder.

[0374] The method according to any of [1] to

[18] , wherein the produced powder is a powder of an alloy consisting mostly of aluminium.

[0375] The method according to any of [1] to

[18] , wherein the produced powder is a powder of an alloy consisting mostly of aluminium.

[0376] The method according to any of [1] to

[17] and

[19] , wherein the produced powder is a powder of a magnesium-based alloy.

[0377] A method according to any of [1] to

[17] and

[19] , wherein the produced powder is a powder of an alloy consisting of magnesium.

[0378] A method component according to any of [1] to

[17] and

[19] , wherein the produced powder is a powder of an alloy consisting mostly of magnesium.

[0379] A method according to any of [1] to

[17] , wherein the produced powder is a lithium-based alloy powder.

[0380] The method according to any of [1] to

[17] , wherein the produced powder is a powder of an alloy comprising lithium.

[0381] The method according to any of [1] to

[17] , wherein the produced powder is a powder of an alloy comprising a majority of lithium.

[0382] The method according to any of [1] to

[17] and

[23] , wherein the produced powder is a powder of a copper-based alloy.

[0383] The method according to any of [1] to

[17] and

[23] , wherein the produced powder is a powder of an alloy comprising copper.

[0384] The method according to any of [1] to

[17] and

[23] , wherein the produced powder is a powder of an alloy comprising a majority of copper.

[0385] The method according to any of [1] to

[17] and

[22] , wherein the produced powder is a powder of a cobalt-based alloy.

[0386] The method according to any of [1] to

[17] and

[22] , wherein the produced powder is a powder of an alloy comprising cobalt.

[0387] A method according to any of [1] to

[17] and

[22] , wherein the powder produced is a powder of an alloy the majority of which is cobalt.

[0388] A method according to any of [1] to

[0387] , wherein a vacuum is applied to the chamber after the metal has melted and before atomization.

[0389] A method according to any of

[0388] to

[0389] , wherein the applied vacuum is 0.9 mbar or greater.

[0390] A method according to any of

[0388] to

[0389] , wherein, after applying the vacuum, the chamber is refilled with an inert atmosphere before atomization begins.

[0391] A method according to any of

[0390] to

[0392] , wherein the inert atmosphere consists of an inert gas.

[0392] A method according to any of

[0388] to

[0391] , wherein at least two rinse cycles are performed, achieving a vacuum level in each cycle and then refilling with the inert atmosphere gas.

[0393] A method according to any of

[0388] to

[0392] , wherein a cheaper gas is used in the intermediate rinses.

[0394] A method according to any of

[0388] to

[0389] , wherein after applying a vacuum the chamber is refilled with gas before spraying begins.

[0395] A method according to

[0394] , wherein the gas used to refill the chamber after applying a vacuum contains not more than 98 ppm by volume of oxygen.

[0396] A method according to

[0394] , wherein the gas used to refill the chamber after applying a vacuum contains not more than 98 ppm by volume of nitrogen.

[0397] A method according to

[0394] , wherein the gas used to refill the chamber after applying a vacuum contains no more than 4 ppm by volume of hydrogen.

[0398] A method according to any of

[0394] to

[0397] , wherein at least two rinse cycles are performed, achieving a vacuum level each time before refilling the gas.

[0399] A method according to any of

[0394] to

[0398] , wherein a cheaper gas is used for intermediate rinses.

[0400] A method according to any of [1] to

[0399] , wherein the atomization system used to atomize the composition comprises a melting chamber.

[0401] A method according to any of

[0400] , wherein the melting chamber comprises at least one oxygen trap.

[0402] A method according to any of [1] to

[0401] , wherein the atomization chamber comprises at least one oxygen trap.

[0403] A method according to any of

[0401] to

[0402] , wherein the atomization chamber comprises at least one oxygen trap.

[0403] A method according to any of

[0401] to

[0402] , wherein the oxygen trap comprises a titanium alloy.

[0404] The method according to any one of

[0401] to

[0403] , wherein the oxygen trap comprises a magnesium alloy.

[0405] The method according to any one of

[0401] to

[0404] , wherein the oxygen trap comprises an aluminum alloy.

[0406] The method according to any one of

[0401] to

[0405] , wherein the oxygen trap comprises a silicon alloy.

[0407] The method according to any one of

[0401] to

[0406] , wherein the oxygen trap comprises a scandium alloy.

[0408] The method according to any one of

[0401] to

[0407] , wherein the oxygen trap comprises a zirconium alloy.

[0409] The method according to any one of

[0401] to

[0408] , wherein the oxygen trap is comprised of a hafnium alloy.

[0410] The method according to any one of

[0401] to

[0409] , wherein the oxygen trap comprises an alloy that is more reactive to oxygen than silicon, according to the Elihan diagram for the processing conditions.

[0411] A method according to any of

[0401] to

[0410] , wherein the oxygen trap is heated to above 120°C.

[0412] A method according to any of

[0401] to

[0410] , wherein the oxygen trap is heated above the lowest oxide sublimation temperature of the alloy in the oxygen trap.

[0413] A method according to any of [1] to

[0412] , wherein the oxygen content in the atomization chamber is maintained at 280 ppm by volume or less before atomization begins.

[0414] A1s The oxygen content in the atomization chamber measured in ppm per volume. * PA2 and A1i * A method according to any of [1] to

[0413] between PA2.

[0415] A1s is 4.4 10 -5 The method according to

[0414] is as follows:

[0416] A1i is 9.2 10 -7

[0414] A method according to any of [1] to

[0413] , wherein the oxygen content is maintained according to any of

[0414] to

[0416] .

[0418] A method according to any of [1] to

[0417] , wherein the chamber atmosphere consists of nitrogen.

[0419] A method according to any of [1] to

[0418] , wherein the nitrogen content in the atomization chamber is less than 280 ppm by volume.

[0420] A method according to any of [1] to

[0417] , wherein the nitrogen content in the atomization chamber is maintained according to

[0419] before atomization begins.

[0421] A method according to any of [1] to

[17] , for producing a molybdenum alloy steel powder.

[0422] A method according to

[17] , for obtaining a molybdenum alloy steel powder having a %Cr content of less than 2.9 wt%.

[0423] A method according to any of [1] to

[0422] , wherein the atmosphere in the chamber is changed to increase the surface tension between the molten composition and the spray disc.

[0424] A method according to

[0423] , wherein the increase in surface tension is at least 55 mN / m over the surface tension in air.

[0425] A method according to any of [1] to

[0424] , wherein the spray chamber consists of a cooling liquid.

[0426] A method according to

[0425] , wherein less than 0.9 l / s of cooling liquid contacts the spray disc during the spraying process.

[0427] A method according to any of [1] to

[0425] , wherein no cooling liquid contacts the spray disc during the spraying process.

[0428] A method according to any of [1] to

[0427] , wherein gas is injected into the spray chamber.

[0429] A method according to any of [1] to

[0429] , wherein less than 9 m / s of gas is injected into the spray chamber. 3

[0428] The method according to any of [1] to

[0429] , wherein less than / s contacts the atomized powder after it leaves the spray disc during the atomization process.

[0430] The method according to any of [1] to

[0429] , wherein the powder produced has a sphericity of 78% or more.

[0431] The method according to any of [1] to

[0429] , wherein the powder produced has a sphericity of 86% or more.

[0432] The method according to any of [1] to

[0429] , wherein the powder produced has a sphericity of 97% or more.

[0433] The method according to any of

[0430] to

[0432] , wherein the sphericity is measured by light scattering diffraction.

[0434] The method according to any of [1] to

[0433] , wherein the powder produced has a porosity level of 38% or less by volume.

[0435] The method according to any of [1] to

[0433] , wherein the powder produced has a porosity level of 18% or less by volume.

[0436] The powder produced is D of 780 microns or less 50

[0436] The method according to any one of [1] to

[0435] , wherein the powder produced has a D50 of 380 microns or less.

[0438] D50 refers to the particle size that occupies 50% of the volume of the sample. 50

[0439] Step a) is a method according to any one of

[0436] to

[0437] , wherein the particle size distribution is smaller than the particle size distribution measured by laser diffraction in accordance with ISO 133320-2009.

[0440] The method according to any of [1] to

[0435] , wherein the composition comprising at least one metal provided in step a) is an alloy having a higher oxygen affinity in air at room temperature according to the Ellingham diagram than aluminum.

[0441] The method according to any of [1] to

[0435] , wherein the composition comprising at least one metal provided in step a) is an alloy cutting the Y axis of the Ellingham diagram below t-210 Kcal.

[0442] The method according to any of [1] to

[0435] , wherein the composition comprising at least one metal provided in step a) is an alloy having a higher oxygen affinity in air at room temperature according to the Ellingham diagram than aluminum. 3

[0442] The method according to any of [1] to

[0435] , wherein the composition consisting of at least one metal provided in step a) is a low-melting-point alloy having a melting point of 590°C or less.

[0443] A lithium-based alloy powder produced in accordance with any of the methods of [1] to

[17] .

[0444] A lithium-based alloy powder produced by any of the methods of [1] to

[17] , comprising 3.2 wt% Mg or more.

[0445] A lithium-based alloy powder produced by any of the methods of [1] to

[17] , consisting of aluminum.

[0446] A lithium-based alloy powder produced by any of the methods of [1] to

[17] , comprising 3.2 wt% Al or more.

[0447] A lithium-based alloy powder produced in accordance with any of

[0443] to

[0446] , wherein the majority of the component is lithium.

[0448] Magnesium-based alloy powder produced according to any of the methods of [1] to

[17] .

[0449] Magnesium-based alloy powder produced according to any of the methods of [1] to

[17] , containing %Li of 3.2wt% or more.

[0450] Magnesium-based alloy powder produced according to any of the methods of

[0448] to

[0449] , the majority of the component being magnesium.

[0451] Aluminum-based alloy powder produced according to any of the methods of [1] to

[18] .

[0452] Aluminum-based alloy powder produced according to any of the methods of [1] to

[18] , containing %Li of 3.2% or more.

[0453] Gallium-based alloy powder produced according to any of the methods of [1] to

[17] .

[0454] Gallium-based alloy powder containing 3.2wt% or more of molten metal (%MM), produced by any of the methods of [1] to

[17] .

[0455] A gallium-based alloy according to

[0454] , wherein MM is aluminum.

[0456] A gallium-based alloy according to

[0454] , wherein MM is nickel.

[0457] A gallium-based alloy according to

[0454] , wherein MM is titanium.

[0458] A gallium-based alloy according to

[0454] , wherein MM is iron.

[0459] A gallium-based alloy according to

[0454] , wherein MM is cobalt.

[0460] A gallium-based alloy powder according to any of

[0453] to

[0459] , wherein the majority of the component is gallium.

[0461] An aluminum-based alloy powder produced according to any of the methods [1] to

[17] consisting of gallium.

[0462] An aluminum-based alloy powder produced according to any of the methods [1] to

[17] containing 3.2 wt% or more of Ga.

[0463] An aluminum-based alloy powder according to any of the methods

[0461] to

[0462] , the majority of whose constituents are aluminum.

[0464] A titanium-based alloy powder produced according to any of the methods [1] to

[17] consisting of gallium.

[0465] A titanium-based alloy powder produced according to any of the methods [1] to

[17] , the majority of whose constituents are titanium.

[0466] A titanium-based alloy powder according to any of the methods

[0464] to

[0465] , the major constituent being titanium.

[0467] An iron-based alloy powder produced according to any of the methods [1] to

[17] and

[20] , consisting of gallium.

[0468] An iron-based alloy powder produced according to any of the methods of [1] to

[17] and

[20] , comprising 3.2 wt% or more of Ga.

[0469] An iron-based alloy powder according to any of the methods of

[0467] to

[0468] , wherein the majority of the component is iron.

[0470] A nickel-based alloy powder produced according to any of the methods of [1] to

[17] and

[19] , consisting of gallium.

[0471] A nickel-based alloy powder produced according to any of the methods of [1] to

[17] and

[21] , comprising 3.2 wt% or more of Ga.

[0472] A nickel-based alloy powder according to any of the methods of

[0470] to

[0471] , wherein the majority of the component is nickel.

[0473] A cobalt-based alloy powder produced according to any of the methods of [1] to

[17] and

[22] , consisting of gallium.

[0474] A cobalt-based alloy powder produced in accordance with any of the processes [1] to

[17] and

[22] containing %Ga equal to or greater than 3.2 wt%.

[0475] A cobalt alloy in accordance with any of the processes

[0473] to

[0474] , the majority of the constituent being cobalt.

[0476] Operation of a process in accordance with any of the processes [1] to

[0475] to produce a powder.

[0477] A molybdenum alloy steel powder produced in accordance with any of the processes [1] to

[17] , in which %Cr is limited to 2.9 wt% or less.

[0478] The method according to any of

[0255] ,

[0256] ,

[0338] ,

[0349] ,

[0353] and

[0439] , wherein the room temperature is 23±2°C.

[0479] The method according to any of [1] to

[0435] and

[0439] to

[0478] , wherein the powder produced is a particulate material.

[0480] The method according to

[0479] , wherein the particulate material is a powder having a diameter of 1000 microns or less.

[0481] The method according to any of

[19] to

[23] ,

[34] to

[38] ,

[44] ,

[50] ,

[0106] ,

[0112] ,

[0128] ,

[0129] ,

[0150] ,

[0151] ,

[0194] ,

[0195] ,

[0226] ,

[0263] to

[0267] and

[0269] , wherein the composition to be sprayed is a composition consisting of at least one metal provided in step a).

[0482] The method according to any of

[60] ,

[0133] ,

[0234] ,

[0316] ,

[0319] ,

[0320] ,

[0321] ,

[0350] and

[0356] , wherein the shaft is a main shaft.

[0484] The method according to any of [1] to

[0483] , wherein the spray disc is a spray rotor.

[0485] A method according to any one of

[0369] to

[0484] , wherein the majority component is the component having a higher weight ratio.

[0058] Any embodiment disclosed herein can be combined with any other embodiment in any combination provided they are not mutually exclusive.

[0059] Example Example 1: A setup as shown in Figure 2 was fabricated using a metal structure surrounding a disk (2) made of molybdenum alloy TZM, a disk (1) made of Ti2O3, and a shaft made of nickel alloy (Inconel 718). The radius of the disk was 80 mm. The cylindrical portion of the disk and the corresponding cylindrical portion of the metallography in contact with the disk were polished to N1 before assembly. The assembly tolerance was H7-G8. The average steady-state processing temperature at the interface of the ceramic and metal structure was estimated to be 1420°C. Using this setup, an iron-based alloy with the following composition was sprayed: %Mn=0.92%; %Mo=3.02%; %V=0.46%; %P=0.005%; %S=0.0008%; other %Fe and trace elements (wt%). Atomization was performed at 38,000 rpm in a 9 bar Ar atmosphere with an oxygen content of 18 ppm by volume. D was obtained in 1 hour 58 minutes. 50 produced 6400 kg of 26 micron powder. Figure 3(c) is a scanning electron micrograph (SEM) of the iron-based alloy powder obtained using the atomization parameters disclosed above.

[0060] Example 2 For comparison, the iron-based alloy was sprayed using a similar setup as described above in Example 1, but in this case using an 80 mm diameter atomizer disk operating at 18500 rpm in an Ar atmosphere at 1.1 bar, with a PA2 value of 2.9·10 6 The powder produced had a characteristic size D of 97 microns. 50 Figure 5 shows a scanning electron micrograph (SEM) of the iron-based alloy powder produced using the atomization parameters described above. As shown in Figure 5, the powder produced has significant collision and crushing of satellite particles attached to the main particles. The presence of such particles makes classification and separation of the powder difficult.

[0061] Example 3 The setup shown in Figure 2 was manufactured with a metal structure surrounding a disk (2) made of molybdenum alloy TZM, a disk (1) made of alumina, and a shaft made of nickel alloy (Inconel 718). The radius of the disk was 80 mm. Both the cylindrical part of the disk and the corresponding cylindrical part of the metal structure in contact with the disk were polished to N1 before mounting. The assembly tolerance was H7 to G8. The average steady-state processing temperature at the interface between the ceramic and metal structure was evaluated to be 730 °C. The setup was operated to atomize a scandium-containing aluminum alloy with the following composition (wt%): %Mg = 4.6 wt%; %Sc = 0.78 wt%; %Zr = 0.4 wt%; %Mn = 0.5 wt%; %Si = 0.3 wt%; %Fe = 0.2 wt%. The remaining %Al and trace elements were included. Atomization was carried out at 28,000 rpm in an Ar atmosphere at 6 bar, producing 2,200 kg of powder with a D50 of 48 microns in 1 hour 46 minutes and an oxygen content of 0.5 ppm by volume.

[0062] Example 4 The setup shown in Figure 4(c) was fabricated with a disk (2) whose surrounding metallography consisted of a molybdenum alloy TZM, a disk (1) made of vanes made of Al2O3, and a shaft made of a nickel-based alloy (Inconel 718). The disk had a radius of 50 mm. Both the cylindrical portion of the disk and the corresponding cylindrical portion of the metal structure that contacted the disk were polished with N1 before mounting. The mounting tolerance was H7 to G8. Using this setup, an aluminum alloy with the following composition was atomized: %Si = 9.4; %Fe = 0.3; %Cu = 0.03; %Mn = 0.3; %Mg = 0.3; %Zn = 0.06; others including %Al and trace elements. Atomization was performed with the vaned disk at an angular speed of 42,000 rpm in a nitrogen atmosphere at 1.6 bar with an oxygen content of less than 3.0 ppm by volume. D 50 produced 590 kg / h of 69 micron powder.

[0063] Example 5: A magnesium-based alloy was atomized using the ceramic disk and metal shaft shown in Figure 4(a) as the atomizing element. The atomization system included two bearings with 25° angular contact and ceramic rotors. 0.39 m of cooling gas was injected into the atomization chamber during atomization. 3 / min and cooled the atomization system. 50 produced 32 micron powder at 360 kg / h.

[0064] Example 6: An aluminum-based alloy was atomized using a monolithic disk and shaft made of stainless steel (AISI 304), as shown in Figure 4(b). The disk was coated with titanate. The aluminum alloy was melted and atomized in a mixed atmosphere of argon and nitrogen at an angular rotation speed of 28,000 rpm. 50 produced a fine powder of 56 microns. Figure 3(a) is a scanning electron micrograph (SEM) of the aluminum-based alloy powder produced using the atomization parameters described above.

[0065] Example 7 A metal-based alloy was atomized in an atomization system with two bearings having an angular contact angle of 31°. The hardness of the metal rings of the bearings was measured after exposure to 103°C for 50 minutes. The measurement was performed at 24°C according to ASTM E18-18a, resulting in a hardness of 56HRc. 50 produced 425 kg / h of 39 micron powder.

[0066] Example 8: A tool steel for demanding cold work applications was manufactured using a metallic disk and shaft made of a nickel-based alloy (Inconel 718). The disk was coated with a multi-layer coating (two layers) consisting of a 96 micron thick metal (NiCrAlY) first layer and a 385 micron thick top ceramic layer (a mixture of Zr-Y oxides). The coating layers were applied by thermal spraying to a 5 micron roughness finish. The pressure in the spray chamber was 3.8 bar. 50 produced a fine tool steel powder of 42 microns. Figure 3(d) is a scanning electron micrograph (SEM) of the tool steel powder produced using the aforementioned atomization parameters.

[0067] Example 9: A CoCrMo superalloy with this composition, including trace elements, was atomized using the setup shown in Figure 4(c). In this case, the metallography around the disk (2) was produced using a molybdenum-based alloy, and the shaft was produced using a refractory superalloy. The manufacturing conditions were similar to those described in Examples 1, 3, and 4. Atomization was performed using a protruding ceramic disk (TiN) in a closed atomization chamber operating at 2.6 bar. The sphericity of the powder produced was 98.2%.

[0068] Example 10: A tin-based solder alloy was successfully produced and processed using a metal disk with a diameter of 215 mm. The composition to be sprayed was superheated to 206°C, which is higher than the melting point of such a composition. The surface tension between the liquid alloy and the disk was 790 mN / m. The surface tension between the liquid alloy and the disk was determined using the sessile drop method. This method was adapted from the description in ISIJ Int., 55 (2015), pp. 1642 (CJ Xuan, H. Shibata, Z. Zhao, PG Joensson, and K. Nakajima) and the description in ISIJ Int., 55 (2015), pp. 1882 (CJ Xuan, H. Shibata, S. Sukenaga, PG Joensson, and K. Nakajima). The obtained stabilized surface tension value is the first measurement in which the surface tension fluctuates less than the threshold value (50 mN / m) within 100 seconds after recording. This resulted in a powder size D50 of 39 microns. Figure 3(b) is a scanning electron micrograph (SEM) of the tin-based solder alloy obtained using the aforementioned atomization parameters.

[0069] Example 11: A metal disk and shaft made of a refractory steel alloy were used to atomize a copper-based alloy. The disk was coated with a ceramic coating to protect it. The copper-based alloy was heated to a temperature 135°C higher than its melting point (Tm = 994°C). Atomization was carried out in an atomization chamber equipped with an oxygen trap made of a titanium alloy, so that the oxygen content during atomization was 0.7 ppm by volume or less. The powder produced had a sphericity of 92% or more.

[0070] Example 12 Table 1 below confirms the appropriate contact angle measurements (contact angle between the disk material and the molten metal of 106 degrees or more and 168 degrees or less) for a given disk material and a given molten material.

[0071] [Table 1] The contact angle between the molten metal and the disk was measured using the sessile drop method. This method was based on the description in ISIJ Int., 55 (2015) from page 1642 (CJ Xuan, H. Shibata, Z. Zhao, PG Joensson and K. Nakajima) and ISIJ Int., 55 (2015) from page 1882 (CJ Xuan, H. Shibata, S. Sukenaga, PG Joensson and K. Nakajima). The measured contact angle was the stabilized value 500 seconds after the moment of complete melting.

[0072] Example 13 Table 2 below confirms the measurement of the appropriate contact angle (surface tension between the molten metal and the disk material of 780 mN / m or more and 1750 mN / m or less) for a given disk material and a given molten material.

[0073] [Table 2] The surface tension between the molten metal and the disk was measured using the sessile drop method, which was based on the method described in ISIJ Int., 55 (2015) p. 1642 (CJ Xuan, H. Shibata, Z. Zhao, PG Joensson and K. Nakajima) and ISIJ Int., 55 (2015) p. 1882 (CJ Xuan, H. Shibata, S. Sukenaga, PG Joensson and K. Nakajima). The stabilized surface tension values ​​obtained were the first measurements in which the surface tension fluctuated less than the threshold value (50 mN / m) within 100 seconds after recording.

[0074] Example 14 The following composition disclosed in Table 3 was used to produce a spray chamber having an absolute pressure of 1.2 bar to 29.6 bar, an oxygen content of 0.8 ppm to 18 ppm, and a parameter PA2 of 4.5·10 6 Over 70·10 6 In an inert atmosphere of 50 This test confirmed whether spherical powder (sphericity over 94%) with a diameter of <75 mm could be sprayed properly.

[0075] [Table 3-1]

[0076] [Table 3-2]

[0077] [Table 3-3]

[0078] [Table 3-4]

[0079] [Table 3-5]

[0080] [Table 3-6] Trace elements total less than 0.9 wt% Ten compositions were identified within the given range.

Claims

1. 1. A method for producing a metal-based alloy powder by centrifugal atomization in a sealed atomization chamber, comprising: a) providing a composition comprising at least one metal; b) melting the composition; c) atomizing the molten composition using an atomizing disk by centrifugal atomization; and The atmosphere in the spray chamber is pressurized or cooled, PA2 is between 4,500,000 and 70,000,000, where PA2=K1 ＊ PA1 + K2 ＊ P, where P is the absolute pressure in the atomization chamber in Pa; PA1 = ρ ＊ N ２＊ d ２ where ρ is kg / m ３ is the density of the composition sprayed at its melting point under an absolute pressure of 1 bar measured at 1000 kJ / s, N is the rotational speed of the spray disk in rad / s, d is the diameter of the spray disk in m, K1 = 0.0033, and K2 = 22.

2. 2. The method of claim 1, wherein the absolute pressure in the atomization chamber is greater than 1.2 bar and less than 99.2 bar.

3. 3. The method of claim 1 or 2, wherein the contact angle between the molten composition and the spray disc is greater than 96° and less than 168° as measured using the sessile drop method.

4. 4. The method of any one of claims 1 to 3, wherein the atomizing disc is ceramic and is supported via a metallic cage structure.

5. 5. The method according to claim 1, wherein the atomizing chamber comprises at least one bearing having an angular contact angle of 15.5° to 34°.

6. 6. The method according to any one of claims 1 to 5, wherein the spray chamber has at least one bearing consisting of at least one ring, the hardness of which is 54 HRc or more after exposure at 85°C for 35 minutes or more.

7. 7. The method according to claim 1, wherein the surface tension between the molten composition and the spray disk surface, as measured using a sessile drop method, is greater than 780 mN / m and less than 1750 mN / m.

8. 8. The method of any one of claims 1 to 7, wherein the atomization chamber constitutes an oxygen trap and the oxygen content is maintained at or below 280 ppm by volume before atomization begins.

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