Barrel polishing method

Abstract

To reduce abrasion of a polishing stone without reducing a polishing force of the polishing stone itself and without increasing cost.SOLUTION: A barrel polishing method is for inputting a workpiece 11, a polishing stone 12, water 13, and a buffer material 14 in a barrel tank 10 and polishing the workpiece 11 by the polishing stone 12. The median diameter (D50) of the buffer material 14 is set to 1.2 μm-2000 μm, and the amount of the input buffer material 14 is set to 2 wt%-30 wt% of the water. The buffer material 14 exhibits buffering at the time of collision of the workpiece 11 with the polishing stone 12 or at the time of the polishing stone 12 with another, and thus the polishing stone 12 is hard to be abrased. Blending adjustment of the polishing stone 12 or a great step change is unnecessary, and thus cost is not increased. Abrasion of the polishing stone 12 can be reduced without increasing cost.SELECTED DRAWING: Figure 1

Description

Technical Field

[0001] The present invention Barrel polishing method relates to the following.

Background Art

[0002] Patent Document 1 discloses a barrel polishing method in which a workpiece and abrasive grains are loaded into a barrel tank and the workpiece is polished. In barrel polishing, by applying rotational motion or vibration to the barrel tank, a relative motion difference is generated between the workpiece and the abrasive grains, and the workpiece is polished with the abrasive grains. By polishing with the abrasive grains, desired finishing processes such as chamfering, deburring, base treatment, and gloss improvement of the workpiece can be performed.

Prior Art Documents

Patent Documents

[0003]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0004] The abrasive grains wear themselves more as they polish the workpiece. As the wear of the abrasive grains progresses, the weight of the abrasive grains decreases and the pressing force on the workpiece decreases, so the polishing force decreases. In addition, the drained water after polishing contains abrasive grain wear powder, so wastewater treatment with chemicals or filters is required for environmental protection. However, if the wear amount of the abrasive grains is large, the amount of chemicals used and the number of filter replacements will increase. Furthermore, if the abrasive grain wear powder adheres to the workpiece after polishing and becomes dirty, a cleaning process such as ultrasonic cleaning needs to be performed after the polishing process. However, if the wear amount of the abrasive grains is large, the time required for the cleaning process will be long.

[0005] One way to reduce the wear of the abrasive stones is to reduce the relative motion difference between the workpiece and the abrasive stones by lowering the rotation speed of the barrel tank. However, this method is not practical because it weakens the pressing force of the abrasive stones on the workpiece, reducing the abrasive power and making it impossible to obtain the desired chamfering or deburring amount. One way to reduce the wear of the abrasive stones without reducing the abrasive power is to drastically revise the abrasive stone formulation design. However, adjusting the formulation of multiple types of abrasive stones with different sizes and hardnesses requires not only a huge number of prototypes and a long preparation period, but also changes to the production process, resulting in enormous costs.

[0006] This invention was completed based on the circumstances described above, and aims to reduce wear on abrasive stones without reducing the abrasive power of the abrasive stone itself or increasing costs. [Means for solving the problem]

[0007] The present invention A barrel polishing method comprising placing a workpiece, polishing stones, water, and a buffer material into a barrel tank, and polishing the workpiece with the polishing stones, The median diameter (D50) of the aforementioned buffer material is set to 1.2 μm to 2000 μm. The amount of the buffer material added is set to 2 wt% to 30 wt% relative to the water. [Effects of the Invention]

[0008] The cushioning material provides a buffering effect when the workpiece collides with the abrasive stone, or when the abrasive stones collide with each other, thus reducing wear on the abrasive stones. Since adjustments to the abrasive stone mixture or significant process changes are unnecessary, costs do not increase. Abrasive stone wear can be reduced without increasing costs. [Brief explanation of the drawing]

[0009] [Figure 1] A schematic diagram showing the process of placing a workpiece, polishing stone, water, buffer material, and compound into the barrel tank of Embodiment 1. [Figure 2]Enlarged perspective view of the workpiece [Figure 3] Magnified perspective view of a polishing stone [Figure 4] A schematic diagram showing, in magnified view, how the buffer material is interposed between the abrasive stones. [Modes for carrying out the invention]

[0010] <Embodiment 1> Hereinafter, Embodiment 1 of the present invention will be described with reference to Figures 1 to 4. The barrel polishing method of Embodiment 1 is performed using a barrel tank 10 which constitutes a centrifugal barrel polishing machine (not shown). For polishing, as shown in Figure 1, a plurality of workpieces 11, a plurality of polishing stones 12, a predetermined amount of water 13, a buffer material 14 made of powder and granules, and a compound 15 are put into the barrel tank 10. The buffer material 14 and the compound 15 may be put into the barrel tank 10 separately, or the buffer material 14 and the compound 15 may be put into the barrel tank 10 together as a package. The workpieces 11 may have a shape having at least one plane (a surface with curvature of 0), or they may have a shape without a plane.

[0011] The workpiece 11, abrasive stones 12, water 13, buffer material 14, and compound 15 placed in the barrel tank 10 are defined as a mass. Once the mass is placed in the barrel tank 10, the barrel tank 10 is made to revolve and rotate, causing the mass to flow within the barrel tank 10. This flow of the mass creates a relative difference in motion between the abrasive stones 12 and the workpiece 11, causing the abrasive stones 12 to collide with the surface of the workpiece 11, thereby polishing the surface of the workpiece 11. Polishing is primarily performed to smooth the flat parts 11S and curved parts with small curvature of the workpiece 11, as well as to chamfer the corners 11E and remove burrs.

[0012] During polishing, as shown in Figure 4, the buffer material 14 fills the microscopic depressions on the surfaces of the workpiece 11 and the polishing stone 12. The presence of this buffer material 14 makes it difficult for the protrusions of the polishing stone 12 to enter the depressions of the workpiece 11 when the polishing stone 12 collides with the workpiece 11, and it also makes it difficult for the protrusions of the workpiece 11 to enter the depressions of the polishing stone 12. As a result, excessive wear of the protrusions of the polishing stone 12 due to collision with the inner surface of the depressions of the workpiece 11 and excessive wear of the inner surface of the depressions of the polishing stone 12 due to collision with the protrusions of the workpiece 11 are suppressed, so the polishing stone 12 is less likely to wear down. Similarly, when two polishing stones 12 collide, it is difficult for the protrusions of one polishing stone 12 to enter the depressions of the other polishing stone 12, so the polishing stone 12 is less likely to wear down. If the particle size of the cushioning material 14 is larger than that shown in Figure 4, the protrusions of the abrasive stone 12 and the protrusions of the workpiece 11 are less likely to collide, and excessive wear of the abrasive stone 12 by the protrusions of the workpiece 11 is suppressed, so the abrasive stone 12 is less likely to wear down. Collisions between the protrusions of the abrasive stones 12 are also less likely to occur, so the abrasive stone 12 is less likely to wear down. In this way, the cushioning material 14 exhibits a cushioning effect when the workpiece 11 and the abrasive stone 12 collide, and when the abrasive stones 12 collide with each other, so the wear of the abrasive stone 12 is suppressed.

[0013] The cushioning material 14 can be made from either organic fibrous material or synthetic resin material. Examples of organic fibrous material include wood powder, corn cob, walnut, and peach pit. Examples of synthetic resin material include polystyrene, urethane resin, and acrylic resin. Regarding the size of the cushioning material 14, powders with a median diameter of 1.2 μm to 0.1 mm and granules with a median diameter of 0.1 mm to 2 mm can be used. Cushioning material 14 made of granules with a relatively large median diameter can be recovered and reused after polishing. In particular, cushioning material 14 made of urethane resin, which has high wear resistance, is preferred because it can be repeatedly recovered and reused. These materials are commercially available and easy to obtain, and are also relatively inexpensive. The cushioning material 14 has a lower hardness than the polishing stone 12 and a lower hardness than the workpiece 11. The Mohs hardness of the cushioning material 14 is preferably 5 or less.

[0014] The material of the cushioning material 14 is preferably elastic. Elastic materials include both materials that can be elastically deformed in their standalone state without being mixed with water 13, and materials that do not elastically deform in their standalone state without being mixed with water 13, but can be elastically deformed when mixed with water 13 to form a slurry. By using an elastic cushioning material 14, the cushioning material 14 and the abrasive stone 12 collide elastically, so the impact during collision is mitigated, a sufficient cushioning effect can be obtained, and wear of the abrasive stone 12 can be suppressed.

[0015] In barrel polishing, the surface of the workpiece 11 is polished fairly evenly across its entire surface. Therefore, when polishing is performed primarily to chamfer or deburr the corners 11E of the workpiece 11, areas other than the corners 11E and burrs (flat areas 11S and curved areas with small curvature) are unnecessarily removed. However, with the barrel polishing method using the cushioning material 14, the amount of polishing in the areas other than the corners 11E and burrs can be reduced as follows.

[0016] In the flat areas 11S and curved areas with small curvature of the workpiece 11, which are not to be polished, the cushioning material 14 is densely arranged over a wide area, covering the areas not to be polished. Therefore, when the polishing stone 12 collides with the cushioning material 14 from an oblique direction to the areas not to be polished, the impacted cushioning material 14 is less likely to shift position due to the presence of adjacent cushioning materials 14, and the areas not to be polished are easily kept covered by the cushioning material 14. In this way, the areas not to be polished are easily kept covered by the cushioning material 14, so polishing by the polishing stone 12 is less likely to progress. In addition, because the cushioning suppression effect of the cushioning material 14 is high, wear of the polishing stone 12 is also suppressed.

[0017] On the other hand, the corners 11E and burrs of the workpiece 11, which are to be polished, are also covered with the cushioning material 14. However, when the polishing stone 12 collides with the cushioning material 14 at the corners 11E and burrs, the cushioning material 14 is flung away from the tip of the corners 11E and burrs, exposing the corners 11E and burrs. As a result, the polishing stone 12 comes into direct contact with the corners 11E and burrs and starts to grind them down. Therefore, polishing progresses more at the corners 11E and burrs than at the non-polishing areas.

[0018] According to the polishing method using the cushioning material 14 of the present embodiment, in polishing the corner portion 11E and burr portion of the workpiece 11, the corner portion 11E and burr portion can be effectively polished by the polishing stone 12, and for the flat surface portion 11S and the curved surface portion with a small curvature that are not the polishing targets, the cushioning material 14 can suppress wasteful polishing, and minimize the material loss of the workpiece 11 and the wasteful consumption of the polishing stone 12.

[0019] The inventor of the present application verified by experiments the extent to which the type, size, and input amount of the cushioning material 14 affect the wear amount of the polishing stone 12, and showed the experimental results in Table 1. In the experiment, a centrifugal barrel polishing machine HS-1-4V manufactured by Chipton Co., Ltd. was used. The capacity of the barrel tank 10 to be used is 1 L. The rotation speed of the barrel tank 10 is 260 rpm, and the polishing time is 30 minutes.

[0020] The workpiece 11 is a rectangular parallelepiped of 15 mm × 15 mm × 20 mm (see FIG. 2), and the material of the workpiece 11 is SS400. The polishing stone 12 is GT-4 manufactured by Chipton Co., Ltd. The polishing stone 12 is a regular triangular prism with a side length of 10 mm and a height of 8 mm (see FIG. 3), and the material of the polishing stone 12 is ceramics. The amount of water 13 to be put into the barrel tank 10 is 0.25 L. The compound 15 is a powder compound CO-56 manufactured by Chipton Co., Ltd. The input amount of the compound 15 is 1 wt% with respect to the water 13. That is, the weight ratio of the water 13 and the compound 15 in the barrel tank 10 (weight of the compound 15 / weight of the water 13) is 0.01.

[0021] The cushioning material 14 used in the experiment was wood powder, powder particles made of styrene resin, corn cob (corn), and powder particles made of acrylic resin. In the following description, the input amount of the cushioning material 14 represents the ratio of the input amount of the cushioning material 14 to the input amount of the water 13 into the barrel tank 10. The input amount of the cushioning material 14 = (weight of the cushioning material 14 / weight of the water 13) × 100. The input amount of the cushioning material 14 in the experiment is 0 to 30 wt%.

[0022] In Table 1, the wear rate is the ratio of the amount of wear after polishing to the weight of the polishing stone 12 before polishing (difference between the weight of the polishing stone 12 before polishing and the weight after polishing / weight of the polishing stone 12 before polishing). The wear rate ratio is the ratio of the wear rate of each example or comparative example (wear rate of each example or comparative example / wear rate of comparative example A) when the wear rate under the condition without the cushioning material 14 (comparative example A) is set to 1. The wear rate evaluation was given as "◎ (particularly good)" for a wear rate ratio of 0.8 or less and "〇 (good)" for a wear rate ratio of 0.9 or less. Since the variation in the wear rate ratio when there is no cushioning material 14 is about ±10%, examples with a wear rate ratio greater than 0.9 were considered to be within the normal range of variation and were given as "× (poor)". Examples with a wear rate evaluation of "◎" or "○" are labeled as examples, and examples with a wear rate evaluation of "×" are labeled as comparative examples.

[0023] The R amount is the measured value of the R amount of the corner 11E of the workpiece 11 (the radius of the quarter-circular arc portion at the corner 11E). The measuring instrument used was a Tokyo Seimitsu Contour Record 1600GR. The R amount ratio is the ratio of the R amount of each example (R amount of each example / R amount of Comparative Example A) when the R amount of the condition without cushioning material 14 (Comparative Example A) is set to 1. Since the variation in the R amount ratio when cushioning material 14 is absent is about ±5%, the R amount evaluation was such that an R amount ratio greater than 0.95 was considered within the normal range of variation and was marked as "○ (good)". An R amount ratio of 0.95 or less was marked as "× (poor)".

[0024] [Table 1]

[0025] [Table 2]

[0026] When the cushioning material 14 is one of wood powder, polystyrene, or cone, and the median diameter (D50) of the cushioning material 14 is 250 μm, the wear rate evaluation for Comparative Examples B, C, and D, where the amount of cushioning material 14 added is 1 wt%, is "×". The wear rate evaluation for Examples 1, 9, and 16, where the amount of cushioning material 14 added is 2 wt%, is "〇". The wear rate evaluation for Examples 2-8, 10-15, and 17-23, where the amount of cushioning material 14 added is 3 wt% to 30 wt%, is "◎".

[0027] When the cushioning material 14 is acrylic and the amount of cushioning material 14 added is 3 wt%, the wear rate evaluation for Comparative Example E, where the median diameter of the cushioning material 14 is 0.15 μm, is "×". The wear rate evaluation for Examples 24 to 28, where the median diameter of the cushioning material 14 is 1.20 μm to 10.00 μm, is "〇". The wear rate evaluation for Example 29, where the median diameter of the cushioning material 14 is 50.00 μm, is "◎".

[0028] When the cushioning material 14 is acrylic and the amount of cushioning material 14 added is 3 wt%, the wear rate evaluation for Example 30, where the median diameter of the cushioning material 14 is 2000.00 μm, is "○". The wear rate evaluation for Comparative Example F, where the median diameter of the cushioning material 14 is 3000.00 μm, is "×".

[0029] When the cushioning material 14 is acrylic and the median diameter of the cushioning material 14 is 1.20 μm, the wear rate evaluation for Example 31, where the amount of cushioning material 14 added was 5 wt%, and Example 32, where the amount of cushioning material 14 added was 9 wt%, is "〇". The wear rate evaluation for Examples 33 to 36, where the amount of cushioning material 14 added was 20 wt% or more, is "◎".

[0030] When the cushioning material 14 is acrylic and the median diameter of the cushioning material 14 is 2000.00 μm, the wear rate evaluation for Example 37, where the amount of cushioning material 14 added is 7 wt%, is "〇". The wear rate evaluation for Examples 38 to 41, where the amount of cushioning material 14 added is 8 wt% to 20 wt%, is "◎".

[0031] There was no significant difference in wear rate between Example 7, in which 20 wt% of the cushioning material 14 was added, and Example 8, in which 30 wt% of the cushioning material 14 was added. Similarly, there was no significant difference in wear rate between Example 22, in which 20 wt% of the cushioning material 14 was added, and Example 23, in which 30 wt% of the cushioning material 14 was added. Therefore, from the viewpoint of the material cost of the cushioning material 14, it is preferable to add 20 wt% or less of the cushioning material 14.

[0032] When the cushioning material 14 is wood powder, the R-value evaluation for Example 4, where the amount of cushioning material 14 added was 5 wt%, and Example 5, where the amount of cushioning material 14 added was 6 wt%, is "○". When the cushioning material 14 is polystyrene, the R-value evaluation for Example 11, where the amount of cushioning material 14 added was 4 wt%, and Example 12, where the amount of cushioning material 14 added was 5 wt%, is "○". When the cushioning material 14 is cone, the R-value evaluation for Example 19, where the amount of cushioning material 14 added was 5 wt%, and Example 20, where the amount of cushioning material 14 added was 6 wt%, is "○". When the cushioning material 14 is acrylic, the R-value evaluation for Example 33, where the amount of cushioning material 14 added was 20 wt%, and Example 34, where the amount of cushioning material 14 added was 28 wt%, is "○". When the cushioning material 14 is acrylic, the R-value evaluation for Example 37, where the amount of cushioning material 14 added was 7 wt%, Example 38, where the amount of cushioning material 14 added was 8 wt%, and Example 39, where the amount of cushioning material 14 added was 9 wt%, is "○".

[0033] Regarding the median diameter of the cushioning material 14, the wear rate evaluation for Comparative Example E, where the median diameter of the cushioning material 14 was 0.15 μm, and for Comparative Example F, where the median diameter was 3000 μm, was "×". The wear rate evaluation for Examples 1 to 41, where the median diameter of the cushioning material 14 was 1.2 μm to 2000 μm, was "〇" or "◎". If the median diameter of the cushioning material 14 is smaller than 1.2 μm, sufficient cushioning effect cannot be achieved. If the median diameter of the cushioning material 14 is larger than 2000 μm, the cushioning material 14 has difficulty interposing between the workpiece 11 and the abrasive stone 12, or between the abrasive stones 12 themselves. From these results, the median diameter of the cushioning material 14 is preferably 1.2 μm to 2000 μm.

[0034] After polishing, the polished workpiece 11 and polishing stone 12 are separated, and sludge such as polishing powder from the workpiece 11 and wear particles from the polishing stone 12 is drained to clean the inside of the barrel tank 10. If the median diameter of the buffer material 14 is greater than 1000 μm, only the polishing stone 12 can be separated and recovered in the cleaning process using a sorting means such as a sieve or filter. By reusing the recovered buffer material 14, running costs can be reduced. Therefore, a median diameter of 1000 μm to 2000 μm is more preferable for the buffer material 14.

[0035] The amount of buffer material 14 to be added to the barrel tank 10 is preferably 2 wt% to 30 wt%. If the amount of buffer material 14 is less than 2 wt%, sufficient buffering effect will not be achieved. If the amount of buffer material 14 is more than 30 wt%, the buffer material 14 is likely to remain on the polished workpiece 11 as dirt.

[0036] In this embodiment 1, the barrel polishing method involves placing a workpiece 11, polishing stones 12, water 13, and a buffer material 14 into a barrel tank 10, and polishing the workpiece 11 with the polishing stones 12. The median diameter (D50) of the buffer material 14 is set to 1.2 μm to 2000 μm. The amount of buffer material 14 added is set to 2 to 30 wt% relative to the water 13. That is, the weight ratio of the buffer material 14 to the water 13 in the barrel tank 10 (weight of buffer material 14 / weight of water 13) is 0.02 to 0.30. By using buffer material 14 with the size and amount set as described above, the buffer material 14 exhibits a high cushioning effect when the workpiece 11 collides with the polishing stones 12, or when the polishing stones 12 collide with each other, so that the polishing stones 12 are less likely to wear down.

[0037] By setting the size and amount of the cushioning material 14 within the above range, wear of the abrasive stone 12 can be suppressed without reducing the abrasive power of the abrasive stone 12 itself. In order to achieve both the abrasive power of the abrasive stone 12 and the reduction of wear of the abrasive stone 12, it is not necessary to adjust the composition of multiple types of abrasive stones 12 with different sizes and hardnesses, thus eliminating the need for a huge number of prototypes and a long preparation period, and also eliminating the need to change the production process. Therefore, it is possible to avoid the increase in costs caused by adjusting the composition of the abrasive stone 12. According to this embodiment, wear of the abrasive stone 12 can be reduced without reducing the abrasive power of the abrasive stone 12 itself or increasing costs.

[0038] When wood powder or polystyrene is used as an additive in barrel polishing, it is expected to prevent plate-shaped workpieces 11 from sticking to other workpieces 11 or the inner wall of the barrel tank 10. However, the amount of additive used to prevent sticking, relative to the water, is preferably 1 wt% to 2 wt%. Adding more than 2 wt% of the additive to the water is undesirable from a cost standpoint because it results in an excessive anti-sticking effect. Unlike the anti-sticking additive, the buffer material 14 used in the barrel polishing method of this embodiment is added at a rate of 2 wt% or more relative to the water 13.

[0039] The greater the amount of cushioning material 14 added, the greater the interference effect of the cushioning material 14. However, in the region where the amount of cushioning material 14 exceeds 20 wt%, the rate of increase in cushioning effect relative to the increase in cushioning material 14 becomes smaller. Therefore, considering the amount of cushioning material 14 used, it is preferable to keep the amount of cushioning material 14 at 20 wt% or less.

[0040] If the amount of cushioning material 14 added is less than 3 wt%, the effect of reducing wear on the abrasive stone 12 is low. If the amount of cushioning material 14 added is 3 wt% or more, the effect of reducing wear on the abrasive stone 12 is high. If the amount of cushioning material 14 added is more than 6 wt%, the cushioning material 14 is more likely to remain on the corners 11E and burrs of the workpiece 11 without being repelled when the abrasive stone 12 collides with them, and the amount of chamfering on the corners 11E and the amount of deburring on the burrs is reduced. If the amount of cushioning material 14 added is 6 wt% or less, the cushioning material 14 is more likely to be repelled when the abrasive stone 12 collides with the corners 11E and burrs of the workpiece 11, so the wear effect on the corners 11E and burrs is high. Therefore, the amount of cushioning material 14 added is preferably between 3 wt% and 6 wt%.

[0041] As the compound 15, one made of a lubricating material can be used. In this case, the polishing stone 12 becomes more slippery on the flat surface 11S of the workpiece 11 due to the compound 15, so the contact area between the workpiece 11 and the polishing stone 12 increases. This improves the polishing efficiency on the flat surface 11S of the workpiece 11.

[0042] As the compound 15, a material that exhibits etching properties on the workpiece 11 can be used. When an etching compound 15 is added, the surface of the workpiece 11 becomes brittle and easily removed by etching, or it melts and becomes easily removed, thus improving the polishing efficiency on the surface of the workpiece 11. Furthermore, if a compound 15 containing abrasive grains is used, the polishing efficiency on the surface of the workpiece 11 is improved by the abrasive grains.

[0043] If the buffer material 14 is made of a material containing resin components, such as wood powder, then it is preferable that the compound 15 is made of a material that does not contain fatty acid salts. If the buffer material 14 contains resin components, the pH of the water 13 in the barrel tank 10 will decrease due to the influence of the resin components. If the compound 15 contains fatty acid salts, then free fatty acids will be generated from the compound 15 due to the decrease in pH. Since free fatty acids are oily, there is a concern that they may adhere to the surfaces of the workpiece 11, abrasive stone 12, and buffer material 14 as dirt. By using a compound 15 that does not contain fatty acid salts, it is possible to prevent free fatty acid dirt from adhering to the surfaces of the workpiece 11, abrasive stone 12, and buffer material 14.

[0044] It is preferable that the abrasive stone 12 has a shape having a flat portion 12S, as shown in Figure 3. If the abrasive stone 12 has a shape that does not have a flat portion 12S, such as a sphere, then when it collides with another abrasive stone 12, it will always be a point contact, making it easy for the cushioning material 14 to be thrown off, and making it difficult to obtain the wear reduction effect of the abrasive stone 12. In contrast, if the abrasive stone 12 has a shape having a flat portion 12S, when the abrasive stones 12 collide with each other, the flat portions 12S will come into contact with each other. In this case, the cushioning material 14 is more likely to be interposed between the flat portions 12S, so the wear reduction effect of the abrasive stone 12 is enhanced.

[0045] <Other examples> The present invention is not limited to the embodiments described above and in the drawings, and the following embodiments, for example, are also included in the technical scope of the present invention. The cushioning material may be an organic fibrous material other than wood flour, corn cob, or walnut. The cushioning material may be made of synthetic resin materials other than polystyrene resin, urethane resin, or acrylic resin. The cushioning material may be made of materials other than organic fibrous materials and synthetic resin materials. The hardness of the cushioning material can be the same as that of an abrasive stone. The hardness of the cushioning material can be the same as that of the workpiece. The new Mohs hardness of the cushioning material may be higher than 5. The cushioning material may be made of a material that does not have elasticity. You may polish the workpiece without adding any polishing compound. The compound may be made of materials that do not have lubricating properties. The compound may be made of materials that do not exhibit etching properties. The compound does not need to contain abrasive particles. The compound is a ramen ingredient containing fatty acid salts. The compound is not limited to a powder; it may also be in liquid form. The cushioning material may have a shape that does not have a flat surface. [Explanation of symbols]

[0046] 10… Barrel tank 11…Work 12...polishing stone 12S… Flat surface of the abrasive stone 13…Water 14...Cushioning material 15... Compound

Claims

1. A barrel polishing method comprising placing a workpiece, polishing stones, water, and a buffer material into a barrel tank, and polishing the workpiece with the polishing stones, The median diameter (D50) of the aforementioned cushioning material is set to 1.2 μm to 2000 μm. A barrel polishing method wherein the amount of the buffer material added is 2 wt% to 30 wt% relative to the water.

2. The barrel polishing method according to claim 1, wherein the amount of the buffer material added is 2 wt% to 20 wt% relative to the water.

3. The barrel polishing method according to claim 1, wherein the amount of the buffer material added is 3 wt% to 6 wt% relative to the water.

4. The barrel polishing method according to any one of claims 1 to 3, wherein the cushioning material is either an organic fibrous material or a synthetic resin material.

5. The barrel polishing method according to claim 4, wherein the cushioning material is one of wood powder, corn cob, walnut, polystyrene resin, urethane, or acrylic resin.

6. The barrel polishing method according to any one of claims 1 to 5, wherein the cushioning material has a lower hardness than the polishing stone.

7. The barrel polishing method according to any one of claims 1 to 6, wherein the cushioning material has a lower hardness than the workpiece.

8. The barrel polishing method according to any one of claims 1 to 6, wherein the new Mohs hardness of the cushioning material is 5 or less.

9. The barrel polishing method according to any one of claims 1 to 8, wherein the median diameter (D50) of the cushioning material is 1000 μm to 2000 μm.

10. The aforementioned cushioning material is made of a material containing a resin component, The barrel polishing method according to any one of claims 1 to 9, wherein a compound made of a material that does not contain fatty acid salts is introduced into the barrel tank.

11. The barrel polishing method for suppressing wear of an abrasive stone according to any one of claims 1 to 10, wherein the abrasive stone has a shape having a flat surface.

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