Heating chamber for aerosol generator

Abstract

A method (300) of manufacturing a heating chamber (200) for an aerosol generating device (100) is disclosed. The method (300) includes providing a heating chamber (200) including a thermally conductive shell (202) and an opening (204) for receiving an aerosol substrate within the heating chamber (200), depositing a layer (206) of electrically insulating material on an exterior surface (203) of the thermally conductive shell (202) of the heating chamber (200) using vacuum deposition, and attaching a heating element (208) to the heating chamber (200) such that the heating element (208) is in contact with the layer (206) of electrically insulating material, the layer (206) of electrically insulating material preventing any contact between the heating element (208) and the thermally conductive shell (202).

Description

Technical Field

[0001] The present invention relates to an aerosol generating device and a method of manufacturing a heating chamber for an aerosol generating device. The present disclosure is particularly applicable to a portable aerosol generating device that can be self - contained and operate at low temperatures. Such a device can heat tobacco or other suitable aerosol substrate materials by conduction, convection, and / or radiation to generate an aerosol for inhalation, rather than burning them.

Background Art

[0002] (Also known as vaporizers) The popularity and use of risk - reduction devices or risk - modification devices have grown rapidly in recent years as an aid to help habitual smokers who wish to quit smoking conventional tobacco products such as cigarettes, cigars, cigarillos, and rolling tobacco. In contrast to burning tobacco in conventional tobacco products, various devices and systems for heating or warming aerosolizable substances are available.

[0003] Generally available risk - reduction devices or risk - modification devices are substrate - heated aerosol generating devices or heat - not - burn (HNB) devices. This type of device generates an aerosol or vapor by heating an aerosol substrate (i.e., a consumable), typically containing moist leaf tobacco or other suitable aerosolizable material, to a temperature in the range of 150°C to 300°C. By heating the aerosol substrate rather than burning or combusting it, an aerosol is released that contains the components desired by the user but does not contain undesirable by - products of combustion. In addition, the aerosol produced by heating tobacco or other aerosolizable materials typically does not contain the burnt or bitter taste that can be caused by combustion and can be unpleasant to the user.

Summary of the Invention

Problems to be Solved by the Invention

[0004] Within known non-combustion heating devices, it is desirable to improve the efficiency of the heating process while also ensuring the reliable operation of the device. [Means for solving the problem]

[0005] According to a first aspect of the present invention, a method is provided for manufacturing a heating chamber for an aerosol generating apparatus, the method comprising: providing a heating chamber comprising a thermally conductive shell and an opening for receiving an aerosol substrate into the heating chamber; depositing a layer of electrically insulating material on the outer surface of the thermally conductive shell of the heating chamber using vacuum deposition; and mounting a heating element in the heating chamber such that the heating element is in contact with the layer of electrically insulating material, the layer of electrically insulating material preventing any contact between the heating element and the thermally conductive shell.

[0006] In this way, a more efficient heating assembly is provided compared to known aerosol generators. The use of vacuum deposition makes it possible to deposit a very thin and uniform layer of electrically insulating material between the thermally conductive shell and the heating element. Furthermore, vacuum deposition makes it possible to deposit a material having not only a high dielectric breakdown voltage but also high thermal conductivity, ensuring efficient heat transfer to the heating chamber through the layer of electrically insulating material. The arrangement and properties of the electrically insulating material layer function to prevent short circuits between the thermally conductive shell and the heating element, and by reducing the thickness of the electrically insulating material layer, the transfer of thermal energy to the thermally conductive shell is optimized. Thus, this manufacturing method provides a heating chamber for an aerosol generator that can operate with improved efficiency and reliability. The step of depositing a layer of electrically insulating material on the outer surface of the thermally conductive shell of the heating chamber using vacuum deposition may include depositing the layer using either or both physical deposition and / or chemical deposition.

[0007] Preferably, the method involves depositing a layer of electrical insulating material using chemical vapor deposition. In this way, the layer of electrical insulating material can be deposited with high purity and density. Furthermore, chemical vapor deposition makes it possible to deposit the electrical insulating material with a uniform thickness across the entire surface of the thermally conductive shell, thereby ensuring consistent thermal and electrical properties throughout the layer.

[0008] Preferably, the electrical insulating material comprises at least one of silicon oxide, diamond, and diamond-like carbon (DLC). In this way, the layer of electrical insulating material separating the thermally conductive shell from the heating element has a high dielectric breakdown voltage and high thermal conductivity. This further reduces the possibility of short circuits occurring between the thermally conductive shell and the heating element and also improves the efficiency of heat energy transfer to the thermally conductive shell. In one example, the electrical insulating layer is a functionalized silica-like coating, sometimes called a-SiO2, for example, Dursan®. X :CH Y It may include.

[0009] Preferably, the thickness of the electrical insulating material layer is 0.3 μm to 5 μm. For example, the thickness of the deposited layer of electrical insulating material may be 0.3 μm, 0.4 μm, 0.5 μm, 1 μm, 1.5 μm, 2 μm, 2.5 μm, 3 μm, 4 μm, or 5 μm. In particular, a-SiO X :CH Y The layer of electrical insulating material containing preferably has a thickness of 0.4 μm to 1.6 μm.

[0010] Preferably, the method further includes providing a thin-film heater comprising a heating element and a flexible backing film on which the heating element is supported, and attaching the thin-film heater to a heating chamber by pressing the heating element against a layer of electrically insulating material. In this way, a compact heating chamber is produced without compromising on thermal or electrical properties.

[0011] Preferably, the backing film contains polyimide or polyetheretherketone (PEEK). PEEK is a heat-resistant material and is ideal for use in components placed near heat sources. When used in components that are in direct contact with heated components, PEEK reduces heat transfer to other components in the apparatus.

[0012] Preferably, the heating chamber is a tubular heating chamber including a tubular heat-conductive shell. In one embodiment, the method includes pressing a heating element against a layer of electrically insulating material and winding the heating element around the heating chamber. In another embodiment, the method includes pressing a heating element against a layer of electrically insulating material and winding a thin-film heater around the heating chamber.

[0013] Preferably, the method further includes wrapping a heat-shrinkable film around the heating chamber to secure the heating element to the heating chamber. In this way, the heating element remains securely in contact with the heating chamber while also maintaining a compact arrangement of the heating assembly.

[0014] Preferably, the method further includes depositing a layer of electrical insulating material using plasma-enhanced chemical vapor deposition. In this way, plasma-enhanced chemical vapor deposition allows for the use of lower deposition temperatures, improved ability to form more uniform film thicknesses and three-dimensional film layers.

[0015] Preferably, depositing a layer of electrically insulating material using plasma-enhanced chemical deposition involves depositing a thin film containing diamond-like carbon, DLC, or diamond using a radio frequency electrical excitation source and a carrier gas containing CH4.

[0016] Preferably, a layer of electrically insulating material is deposited using plasma-enhanced chemical vapor deposition, using a microwave frequency electrical excitation source and a carrier gas containing silane to deposit silicon oxide, such as silicon dioxide or α-SiO2. X :CH Y This includes depositing a thin film containing [a specific substance].

[0017] According to a second aspect of the present invention, there is provided a heating chamber for an aerosol generating device, manufactured by the method of the first aspect.

[0018] According to a third aspect of the present invention, there is provided an aerosol generating device including the heating chamber of the second aspect.

[0019] Here, embodiments of the present invention will be described by way of example with reference to the drawings.

Brief Description of the Drawings

[0020] [Figure 1] An exemplary aerosol generating device according to an embodiment of the present invention. [Figure 2] A schematic cross-sectional view of a heating chamber according to an embodiment of the present invention. [Figure 3] [[ID=·25]]A flowchart showing method steps for manufacturing a heating chamber according to an embodiment of the present invention.

Modes for Carrying Out the Invention

[0021] FIG. 1 illustrates an aerosol generating device 100 according to an embodiment of the present invention. The aerosol generating device 100 is illustrated in an assembled configuration with the internal components visible. The aerosol generating device 100 is a heat-not-burn device, sometimes also referred to as a tobacco vapor device, and includes a heating chamber 200 configured to receive an aerosol generating material, such as an aerosol substrate like a tobacco rod. The heating chamber 200 is operable to heat the rod of the aerosol generating material without burning it to generate vapor or aerosol for the user to inhale. Of course, those skilled in the art will understand that the aerosol generating device 100 depicted in FIG. 1 is merely an exemplary aerosol generating device according to the present invention. Other types and configurations of tobacco vapor products, vaporizers or e-cigarettes can also be used as the aerosol generating device according to the present invention.

[0022] Figure 2 shows a cross-sectional view of a heating chamber 200 according to an embodiment of the present invention. The heating chamber 200 includes a thermally conductive shell 202 configured to hold an aerosol substrate (also referred to as a consumable) therein. In particular, the thermally conductive shell 202 defines a cylindrical cavity in which a rod of the aerosol substrate can be positioned. The thermally conductive shell 202 is tubular, for example cylindrical, and has an opening 204 located at a longitudinal end of the thermally conductive shell 202. In use, a user can insert the aerosol substrate through the opening 204 of the heating chamber 200 such that the aerosol substrate is positioned within the heating chamber 200 and in contact with the inner surface 201 of the thermally conductive shell 202. The length of the thermally conductive shell 202 can be configured such that a portion of the aerosol substrate protrudes through the opening 204 of the thermally conductive shell 202 (i.e., outside of the heating chamber 200) and can be received in the user's mouth.

[0023] The thermally conductive shell 202 preferably includes a material that enables efficient heat transfer to the aerosol substrate through the side walls of the thermally conductive shell 202 while maintaining sufficient structural stability. Examples of such materials include steel or stainless steel.

[0024] Those skilled in the art will understand that the heating chamber 200 (and the thermally conductive shell 202) is not limited to being tubular. For example, the thermally conductive shell 202 can be formed as a cubic, conical, hemispherical or other shaped cavity and configured to receive a complementary shaped aerosol substrate. Moreover, in some embodiments, the thermally conductive shell 202 may not completely surround the aerosol substrate and instead may only contact a limited area of the aerosol substrate.

[0025] A layer 206 of electrical insulating material surrounds the outer surface 203 of the thermal conductive shell 202. In particular, the layer 206 of electrical insulating material is adjacent to (i.e., in contact with) the outer surface 203 of the thermal conductive shell 202. In Figure 2, the layer 206 of electrical insulating material is depicted as extending along the entire length of the outer surface 203 of the thermal conductive shell 202. However, those skilled in the art will understand that in other embodiments, the layer 206 of electrical insulating material may extend only along a portion of the length of the thermal conductive shell 202.

[0026] The electrical insulating material layer 206 is deposited using vacuum deposition technology, preferably using chemical deposition or plasma-enhanced chemical deposition. Thus, the electrical insulating material layer 206 can be deposited as a thin layer, for example, 0.3 μm to 5 μm thick, while exhibiting high purity and homogeneity.

[0027] A thin-film heater 207 surrounds a layer 206 of electrically insulating material. The thin-film heater 207 includes a heating element 208 mounted on a flexible backing film 210. The heating element 208 may include one or more heater tracks extending across the entire surface of the flexible backing film 210. The heating element 208 includes a heating material suitable for converting electrical energy into heat (such as stainless steel, titanium, nickel, nichrome, nickel-based alloy, or silver). During use, the heating element 208 may be powered from a power source such as a battery (not shown) so that its temperature rises and thermal energy is transferred across the layer 206 of electrically insulating material to the thermally conductive shell 202. The aerosol substrate received in the heating chamber 200 is conductively heated by the thermally conductive shell 202 to generate an aerosol for the user to inhale.

[0028] The flexible backing film 210 preferably contains a flexible material having high dielectric capacity and low thermal mass, such as polyimide or polyetheretherketone (PEEK).

[0029] The thin-film heater 207 is wrapped circumferentially around the heating chamber 200 such that the heating element 208 is adjacent to (i.e., in contact with) the layer 206 of the electrically insulating material. That is, the layer 206 of the electrically insulating material acts as a barrier separating the heating element 208 from the thermal conductive shell 202 so as to prevent contact between the heating element 208 and the thermal conductive shell 202. The flexible backing film 210 is on the opposite side of the heating element 208 from the layer 206 of the electrically insulating material, i.e., the heating element 208 is mounted on the inner surface of the flexible backing film 210 with respect to the heating chamber 200.

[0030] Those skilled in the art will understand that in alternative embodiments, the heating chamber 200 may not include the thin-film heater 207. In other words, the heating element 208 may not be formed as a thin-film heater, and the heating chamber may not include the flexible backing film 210. For example, the heating element 208 may be a standalone heating element 208 that is directly applied to, for example, the layer 206 of the electrically insulating material, or bonded to it. In particular, the heating element 208 may be wrapped around the heating chamber 200, for example, circumferentially, so that the heating element 208 is in contact with the layer 206 of the electrically insulating material.

[0031] The electrical insulating material layer 206 preferably includes a material having a high dielectric breakdown voltage and high thermal conductivity. Therefore, the electrical insulating material layer 206 prevents short circuits between the heating element 208 and the thermal conductive shell 202 while enabling efficient heat transfer from the heating element 208 to the thermal conductive shell 202. Those skilled in the art will understand that the thermal conductive shell 202 is not a resistive heater and therefore should not receive current. The electrical insulating material layer 206 separates the heating element 208 from the thermal conductive shell 202, ensuring that no current flows from the heating element 208 to the thermal conductive shell 202. Furthermore, those skilled in the art will understand that the thin thickness of the electrical insulating material layer 206 allows for high efficiency in heat transfer from the heating element 208 to the thermal conductive shell 202.

[0032] Examples of materials suitable for the electrical insulating layer 206 include silica (SiO2), diamond, and diamond-like carbon (DLC), all of which can be deposited using chemical vapor deposition due to their high-temperature stability and resistance to degassing.

[0033] The heat-shrinkable film 212 is preferably wrapped circumferentially around the heating element 208 (e.g., a thin-film heater 207) so that the heating element 208 is fixed to the layer 206 of the electrically insulating material. In other words, the heat-shrinkable film 212 acts as an outer layer surrounding the outside of the heating chamber 200, thereby solidifying the structure and ensuring that the heating element 208 maintains contact with the layer 206 of the electrically insulating material. In some examples, the heat-shrinkable film 212 may include polyimide or polyetheretherketone (PEEK). Such materials provide desirable high electrical and thermal conductivity for the outer layer of the heating chamber 200.

[0034] Figure 3 illustrates a flowchart of a method 300 for manufacturing a heating chamber according to one embodiment of the present invention.

[0035] Method 300 begins in step 302, providing a heating chamber 200 comprising a thermally conductive shell 202 and an opening 204 for receiving an aerosol substrate into the heating chamber 200. In step 304, a layer 206 of electrical insulating material is deposited on the outer surface 203 of the thermally conductive shell 202 using vacuum deposition. Vacuum deposition is performed significantly below atmospheric pressure, i.e., in a vacuum. Preferably, the layer 206 of electrical insulating material is deposited using chemical deposition. However, in some examples, the layer 206 of electrical insulating material may be deposited using physical deposition.

[0036] Chemical vapor deposition is a technique in which a substrate is exposed to one or more volatile precursors in a vacuum (or low-pressure plasma) environment, which react and / or decompose on the surface of the substrate to produce a thin film deposit. In this case, the substrate is a thermally conductive shell 202, and the layer 206 of the electrically insulating material is the thin film deposit.

[0037] In some embodiments, plasma-enhanced deposition can be used to form a layer 206 of an electrically insulating material. Plasma-enhanced deposition utilizes plasma to provide some of the energy necessary for the deposition reaction to occur. Specifically, deposition is achieved by introducing a reaction gas between parallel electrodes, and the reaction gas is excited into the plasma by capacitive coupling between the electrodes. This induces a chemical reaction, resulting in the deposition of the reaction product (i.e., the electrically insulating material 206) onto the substrate (i.e., the thermally conductive shell 202). Advantageously, plasma-enhanced deposition can be performed at lower temperatures than other chemical deposition techniques.

[0038] In one example, a plasma can be generated from a carrier gas containing CH4 using radio frequency discharge between two electrodes. The resulting chemical reaction deposits a thin film containing diamond or diamond-like carbon (DLC) onto a thermally conductive shell 202. The thin film corresponds to a layer 206 of electrically insulating material.

[0039] In another example, a microwave frequency discharge between two electrodes can be used to excite oxygen and form a plasma. Next, a mixture of silane (SiH4) diluted in a carrier gas such as argon is introduced into the plasma afterglow. For example, a 5% silane mixture in argon may be introduced. The resulting chemical reaction deposits a thin film containing silicon oxide (e.g., silicon dioxide) onto the thermally conductive shell 202. The thin film corresponds to a layer 206 of electrically insulating material. For example, the deposited thin film could be a functionalized silica-like coating, e.g., a-SiO2. X :CH Y It may include.

[0040] The chemical vapor deposition process is continued until a layer 206 of an electrically insulating material of a desired thickness, for example, 0.5 μm to 5 μm, is deposited.

[0041] In step 306, the heating element 208 is mounted in the heating chamber 200 such that the heating element 208 is in contact with the layer 206 of the electrically insulating material. That is, the heating element 208 is positioned adjacent to the outer surface of the layer 206 of the electrically insulating material so that the heating element 208 is in contact with the layer 206 of the electrically insulating material. When in use, the heating element 208 can be operated to transfer heat across the electrically insulating layer 206 to the thermal conductive shell 202. The layer 206 of the electrically insulating material separates the heating element 208 from the thermal conductive shell 202 so that they do not come into contact, thereby preventing current from flowing from the heating element 208 to the thermal conductive shell 202.

[0042] In some embodiments, such as the embodiment depicted in Figure 2, the heating element 208 is contained within a thin-film heater 207. In this case, method 300 further includes providing a thin-film heater 207 comprising the heating element 208 and a flexible backing film 210 on which the heating element 208 is supported, and attaching the thin-film heater 207 to the heating chamber 200 by pressing the heating element 208 against a layer 206 of an electrically insulating material. Alternatively, in other embodiments, the heating element 208 may be a standalone heating element 208, and the thin-film heater 207 may not be provided.

[0043] In the embodiment depicted in Figure 2, where the heating chamber 200 is tubular, the heating element 208 is wrapped circumferentially around the layer 206 of the electrically insulating material of the heating chamber 200. In particular, a thin-film heater 207, including the heating element 208 and a flexible backing film 210, is wrapped around the layer 206 of the electrically insulating material of the heating chamber 200. The flexible backing film 210 is positioned on the opposite side of the heating element 208 from the layer 206 of the electrically insulating material, thereby providing structural support. Naturally, those skilled in the art will understand that in embodiments where the heating element 208 is not contained within the thin-film heater 207, the heating element 208 can be wrapped around the heating chamber 200 without the flexible backing film 210. In some examples, the heating element 208 is supported on a carrier film, and the heating element 208 can be wrapped around the heating chamber 200 using the carrier film. Once the heating element 208 is correctly positioned relative to the layer 206 of the electrically insulating material, the carrier film can be removed.

[0044] In step 308, the heat shrink film 212 is preferably wrapped around the heating chamber 200 to secure the heating element 208 to the heating chamber 200. For example, in embodiments where the heating chamber 200 includes a thin-film heater 207, the heat shrink film 212 is operated to surround the flexible backing film 210 to which the heating element 208 is attached. Alternatively, in embodiments where the heating element 208 is not contained within the thin-film heater 207, the heat shrink film 212 may be operated to surround and contact the heating element 208. As depicted in Figure 2, the heat shrink film 212 may also extend beyond the length of the heating element 208 and / or the flexible backing film 210 and overlap with the layer 206 of the electrically insulating layer.

[0045] Once the heating chamber 200 and heating element 208 are wrapped in the heat-shrinkable film 212, heat can be applied to the heat-shrinkable film 212 so that it shrinks and tightens around the heating chamber 200. This ensures that the heating element 208 (e.g., thin-film heater 207) is securely attached to the heating chamber 200, particularly to the layer 206 of the electrically insulating material.

Claims

1. A method for manufacturing a heating chamber for an aerosol generator, To provide a heating chamber comprising a heat-conductive shell and an opening for receiving an aerosol substrate into the heating chamber, Using vacuum deposition, a layer of electrically insulating material is deposited on the outer surface of the heat-conductive shell of the heating chamber, To provide a thin-film heater including a heating element and a flexible backing film that supports the heating element, This includes mounting the thin-film heater in the heating chamber such that the heating element is in contact with the layer of the electrically insulating material, A method wherein the layer of the electrically insulating material prevents any contact between the heating element and the heat-conductive shell.

2. The method according to claim 1, wherein depositing the layer of the electrically insulating material using vacuum deposition is further comprising depositing the layer of the electrically insulating material using chemical deposition.

3. The aforementioned electrical insulating material is, silicon dioxide, Diamonds, and Diamond-like carbon (DLC) The method according to claim 1 or 2, comprising at least one of the following.

4. The method according to any one of claims 1 to 3, wherein the electrically insulating material comprises a-SiOx:CHY.

5. The method according to any one of claims 1 to 4, wherein the thickness of the deposited layer of the electrical insulating material is 0.3 μm to 5 μm.

6. The method according to any one of claims 1 to 5, wherein the flexible backing film comprises polyimide or polyetherketone (PEEK).

7. The method according to any one of claims 1 to 6, wherein the heating chamber is a tubular heating chamber including a tubular heat-conductive shell, and the method comprises pressing the heating element against a layer of the electrically insulating material to wrap the thin film heater around the heating chamber.

8. A method for manufacturing a heating chamber for an aerosol generator, To provide a heating chamber comprising a heat-conductive shell and an opening for receiving an aerosol substrate into the heating chamber, Using vacuum deposition, a layer of electrically insulating material is deposited on the outer surface of the heat-conductive shell of the heating chamber, This includes mounting the heating element in the heating chamber such that the heating element is in contact with the layer of the electrically insulating material, The layer of the electrically insulating material prevents any contact between the heating element and the heat-conductive shell. The heating chamber is a tubular heating chamber including a tubular heat-conductive shell, and the method includes pressing the heating element against the layer of the electrically insulating material and wrapping the heating element around the heating chamber.

9. The method according to claim 7 or 8, further comprising wrapping a heat-shrinkable film around the heating chamber to fix the heating element to the heating chamber.

10. The method according to any one of claims 1 to 9, further comprising depositing a layer of the electrically insulating material using plasma-enhanced chemical vapor deposition.

11. A radio frequency electrical excitation source and CH ４ The method according to claim 10, comprising depositing a thin film containing diamond-like carbon (DLC) or diamond using a carrier gas containing the above.

12. The method according to claim 10, comprising depositing a thin film containing silicon oxide using a microwave frequency electrical excitation source and a carrier gas containing silane.

13. A heating chamber for an aerosol generator, A thermally conductive shell having an opening for receiving an aerosol substrate, A thin-film heater comprising a heating element and a flexible backing film supporting the heating element, A layer of electrically insulating material is disposed on the outer surface of the thermal conductive shell to prevent any contact between the heating element and the thermal conductive shell, A heating chamber in which the heating element of the thin-film heater is in contact with the layer of the electrically insulating material.

14. A heating chamber for an aerosol generator, A tubular thermally conductive shell having an opening for receiving an aerosol substrate, A layer of electrically insulating material disposed on the outer surface of the thermally conductive shell, A heating element is wound so as to be in contact with the layer of the electrically insulating material, A heating chamber in which the layer of the electrically insulating material is disposed on the outer surface of the thermally conductive shell to prevent any contact between the heating element and the thermally conductive shell.

15. An aerosol generator comprising a heating chamber according to claim 13 or 14.

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