Laminated structures, dry films, cured products, and electronic components

Abstract

Provided is a laminated structure which is not only capable of achieving both contradictory characteristics such as B-HAST resistance and crack resistance at a high level, but also has excellent photopatterning properties.　A laminated structure having a dual-layered resin layer obtained by laminating a resin layer (A) formed from a resin composition (a) and a resin layer (B) formed from a resin composition (b), the laminated structure characterized in that: the resin composition (b) of the resin layer (B) comprises an alkali-soluble resin, a photo-base generator that also functions as a photopolymerization initiator or a photopolymerization initiator and a photo-base generator, and a thermosetting resin; the resin composition (a) of the resin layer (A) contains a carboxyl group-containing resin and a thermosetting resin, and does not substantially contain a photopolymerization initiator; and the difference between the gloss sensitivity and the residual sensitivity is at most 20 steps as obtained by measuring the coating film thickness of a formed pattern obtained by using a step tablet and exposing the dual-layered resin from the resin layer (B)-side and a performing a PEB step, and the coating film thickness of a formed pattern obtained by performing the PEB step after said exposure and then performing a developing step.

Description

Technical Field

[0001] The present invention relates to a laminated structure, a dry film, a cured product, and an electronic component using these, which are suitable for use in semiconductor packages and the like.

Background Art

[0002] In recent years, in response to the higher density of printed wiring boards accompanying the miniaturization, thinning, and shortening of electronic devices, solder resists are also required to have improved workability and high performance. Further, recently, with the miniaturization, weight reduction, and high performance of electronic devices, the miniaturization and multi-pinning of semiconductor packages have been put into practical use and mass production has been progressing. Various semiconductor packages corresponding to such higher density have been proposed.

[0003] For solder resists used in various semiconductor packages corresponding to higher density, in recent years, both high reliability in the use environment and high long-term reliability have been required. One of the reliability tests regarding reliability in the use environment is the Biased High-Acceleration Stress Test (Biased HAST, hereinafter referred to as B-HAST), and one of the long-term reliability tests is the crack resistance test in thermal cycling. Regarding a photocurable / thermosetting resin composition excellent in B-HAST resistance, an unsaturated group-containing monocarboxylic acid (d) is reacted with a reaction product obtained by reacting a compound (a) having two or more phenolic hydroxyl groups in one molecule with an alkylene oxide (b) or a cyclo-carbonate compound (c), and a resin composition containing a carboxyl group-containing photosensitive resin obtained by reacting the resulting reaction product with a polybasic acid anhydride (e) is known (Patent Document 1).

Prior Art Documents

Patent Documents

[0004]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0005] The resin composition described in Reference 1 contains a carboxyl group-containing photosensitive resin with a rigid skeleton, and therefore exhibits excellent B-HAST resistance. However, its crack resistance in thermal cycling is not necessarily sufficient to meet recent requirements.

[0006] When a resin composition containing a resin with a more flexible skeleton, such as a carboxyl group-containing urethane resin, was used instead of the carboxyl group-containing photosensitive resin with the rigid skeleton described above, crack resistance improved, but B-HAST resistance tended to decrease.

[0007] Therefore, the objective of the present invention is to provide laminated structures, dry films, cured products, and electronic components that not only achieve a high level of compatibility between the conflicting properties of B-HAST resistance and crack resistance, but also possess excellent photopatternability. [Means for solving the problem]

[0008] The inventors of this invention have diligently conducted research to solve the above problems and have confirmed that by creating a laminate of two layers with different compositions, it is possible to achieve a high level of both B-HAST resistance and crack resistance, which are conflicting properties. However, it has been found that in a laminated structure in which layers suitable for B-HAST resistance and layers suitable for crack resistance are simply laminated, it is difficult to control the sensitivity of each layer, making it difficult to obtain good photopatterning properties. In recent years, there has been a demand for excellent photopatterning properties that enable solder resist aperture (SRO) diameters of 50 μm or less in semiconductor packaging applications.

[0009] Therefore, in order to obtain a laminated structure that possesses not only B-HAST resistance and crack resistance but also excellent photopatterning properties, we continued our research and development, which led to the completion of the present invention.

[0010] In other words, the laminated structure of the present invention is a laminated structure having two resin layers, one resin layer (A) made of resin composition (a) and the other resin layer (B) made of resin composition (b), The resin composition (b) of the resin layer (B) comprises an alkali-soluble resin, a photobase generator that also functions as a photopolymerization initiator, or a photopolymerization initiator and a photobase generator, and a thermosetting resin. The resin composition (a) of the resin layer (A) comprises a carboxyl group-containing resin and a thermosetting resin, and substantially contains no photopolymerization initiator. The present invention is characterized in that the difference between the gloss sensitivity and residual sensitivity, obtained by measuring the film thickness of the pattern formed after exposure of the two resin layers from the resin layer (B) side via a step tablet and then performing a PEB (POST EXPOSURE BAKE) process, and the film thickness of the pattern formed after development following the exposure and PEB process, is 20 stops or less. Details of the PEB process will be described later. Here, the definitions of gloss sensitivity and residual sensitivity are as follows: The two resin layers are exposed from the resin layer (B) side via a step tablet, and after the PEB process, the gloss sensitivity is defined as the largest number of step stages in which 95% or more of the coating thickness remains after exposure, the PEB process, and development, when the coating thickness before development is set to 100%. The residual sensitivity is defined as the largest number of step stages in which 5% or less of the coating thickness remains after development, when the coating thickness before development is set to 100%. In this invention, the coating thickness of the formed pattern was measured in accordance with JIS K 5600-1-7:2014, as the difference between the measured value obtained as the total thickness of the coating and the measured value obtained as the thickness of the substrate. The measurement method was a mechanical measurement method in which the two resin layers were exposed from the resin layer (B) side via a step tablet using a thickness measuring instrument (DIGIMICRO MF-501, manufactured by Nikon Corporation), and a PEB process was performed at 90°C for 30 minutes. Then, the coating thickness of the formed pattern before development and the coating thickness of the remaining coating formed after development, after exposure and the PEB process were measured. When the coating thickness before development was set to 100%, the largest value of the number of step stages in which 95% or more of the coating thickness remained after development was defined as the gloss sensitivity, and when the coating thickness before development was set to 100%, the largest value of the number of step stages in which the coating thickness remained at 5% or less after development was defined as the residual sensitivity.

[0011] In the laminated structure of the present invention, the thickness of the resin layer (B) is preferably 2 μm or more and half the thickness of the resin layer (A), and the thickness of the resin layer (A) is preferably 10 to 80 μm, and more preferably 20 to 60 μm.

[0012] Furthermore, the dry film of the present invention is characterized by comprising the laminated structure of the present invention and a film provided in contact with at least one surface of the resin layer (B) and the resin layer (A) of the laminated structure.

[0013] Furthermore, the cured product of the present invention is characterized by being obtained by curing the laminated structure of the present invention or the laminated structure of the dry film of the present invention.

[0014] The electronic component of the present invention is characterized by having the cured product of the present invention. [Effects of the Invention]

[0015] According to the present invention, it is possible to provide a laminated structure, a dry film, a cured product thereof, and an electronic component using the cured product thereof, which not only have B-HAST resistance and crack resistance but also excellent photopatterning properties. [Modes for carrying out the invention]

[0016] The following describes in detail embodiments of the laminated structure, dry film, cured product, and electronic component of the present invention. (Laminated structure) The laminated structure of the present invention is a laminated structure having two resin layers, one resin layer (A) made of resin composition (a) and the other resin layer (B) made of resin composition (b), The resin composition (b) of the resin layer (B) comprises an alkali-soluble resin, a photobase generator that also functions as a photopolymerization initiator, or a photopolymerization initiator and a photobase generator, and a thermosetting resin. The resin composition (a) of the resin layer (A) comprises a carboxyl group-containing resin and a thermosetting resin, and substantially contains no photopolymerization initiator. After exposing the two resin layers from the resin layer (B) side via a step tablet and performing a PEB process, the difference between the gloss sensitivity and residual sensitivity obtained by measuring the coating film thickness of the formed pattern and the coating film thickness of the pattern formed after exposure, the PEB process, and development is 20 stops or less, more preferably 14 stops or less.

[0017] In a laminated structure, when formed on a substrate, the layer in contact with the substrate is resin layer (A), and the layer in contact with the surface of resin layer (A) opposite to the surface in contact with the substrate is resin layer (B). In other words, the laminated structure has a structure in which resin layer (A) and resin layer (B) are laminated on the substrate in that order. Examples of the substrate include printed circuit boards and flexible printed circuit boards that have circuits pre-formed with copper or the like.

[0018] The resin layer (B) is composed of a resin composition (b) containing an alkali-soluble resin, a photo-base generator or a photoinitiator and a photo-base generator having the function of a photoinitiator, and a thermosetting resin. The resin composition (b) of the resin layer (B) containing these components has photosensitivity by the reaction of the photoinitiator with the alkali-soluble resin upon light irradiation, and can be thermally cured with the function of the photo-base generator of the polymerization initiator as a catalyst upon heating. It is a photosensitive thermosetting resin composition.

[0019] The resin layer (A) is composed of a resin composition (a) containing a carboxyl group-containing resin and a thermosetting resin, and substantially free of a photoinitiator. Substantially free of a photoinitiator means that the amount of the photoinitiator is less than 0.5 parts by mass with respect to 100 parts by mass of the carboxyl group-containing resin contained in the resin composition (a). Since the resin composition (a) of the resin layer (A) containing these components does not contain a photoinitiator, it does not have photosensitivity in a single layer. However, since it is laminated in contact with the resin layer (B), active species such as radicals generated from the photoinitiator contained in this resin layer (B) diffuse into this resin layer (A), so that the resin layer (A) also has photosensitivity. Also, it can be thermally cured by heating. Therefore, the laminated structure can form a predetermined pattern by development in the resin layer (B) and the resin layer (A) at once. In particular, when the PEB process is performed after exposure, the effect of forming the pattern at once is remarkable due to the thermal diffusion at that time.

[0020] [Resin layer (A)] (Resin composition (a) of resin layer (A)) The resin layer (A) is composed of a resin composition (a). The resin composition (a) of the resin layer (A) preferably not only functions as an adhesive layer to the substrate but also has properties that can cope with various circuit pattern formations. Therefore, the resin composition (a) of the resin layer (A) uses the base generated from a base generator as a catalyst to cause an addition reaction between a resin having a carboxyl group, especially a carboxyl group-containing resin and a thermosetting component by heating after exposure, and is preferably a photosensitive thermosetting resin composition that can be developed by removing the unexposed portion with an alkaline solution.

[0021] Specific examples of the carboxyl group-containing resin contained in the resin composition (a) of the resin layer (A) include the following compounds.

[0022] (1) A carboxyl group-containing resin obtained by copolymerization of an unsaturated carboxylic acid such as (meth)acrylic acid and an unsaturated group-containing compound such as styrene, α-methylstyrene, lower alkyl (meth)acrylate, and isobutylene.

[0023] (2) A carboxyl group-containing urethane resin obtained by polyaddition reaction of a diisocyanate such as an aliphatic diisocyanate, a branched aliphatic diisocyanate, an alicyclic diisocyanate, or an aromatic diisocyanate, a carboxyl group-containing dialcohol compound such as dimethylolpropionic acid or dimethylolbutanoic acid, and a diol compound such as a polycarbonate polyol, a polyether polyol, a polyester polyol, a polyolefin polyol, an acrylic polyol, or a bisphenol A-based alkylene oxide adduct diol, or a compound having a phenolic hydroxyl group and an alcoholic hydroxyl group.

[0024] (3) A urethane resin containing terminal carboxyl groups, obtained by reacting an acid anhydride at the ends of a urethane resin by polyaddition reaction of a diisocyanate compound such as aliphatic diisocyanate, branched aliphatic diisocyanate, alicyclic diisocyanate, or aromatic diisocyanate with a diol compound such as a polycarbonate polyol, polyether polyol, polyester polyol, polyolefin polyol, acrylic polyol, bisphenol A alkylene oxide adduct diol, or a compound having a phenolic hydroxyl group and an alcoholic hydroxyl group.

[0025] (4) Diisocyanates and carboxyl group-containing urethane resins obtained by polyaddition reactions of (meth)acrylates or partially acid anhydride-modified products thereof of bifunctional epoxy resins such as bisphenol A type epoxy resin, hydrogenated bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, bixylenol type epoxy resin, and biphenol type epoxy resin, carboxyl group-containing dialcohol compounds, and diol compounds.

[0026] (5) A carboxyl group-containing urethane resin obtained by adding a compound having one hydroxyl group and one or more (meth)acryloyl groups in the molecule, such as hydroxyalkyl (meth)acrylate, during the synthesis of the resin described in (2) or (4) above, and then (meth)acrylizing the terminal (meth)acrylic.

[0027] (6) A carboxyl group-containing urethane resin obtained by adding a compound having one isocyanate group and one or more (meth)acryloyl groups in its molecule, such as an equimolar reaction product of isophorone diisocyanate and pentaerythritol triacrylate, to the synthesis of the resin described in (2) or (4) above, and then (meth)acrylicating the terminal (meth)acrylic.

[0028] (7) A carboxyl group-containing resin obtained by reacting a polyfunctional epoxy resin with (meth)acrylic acid and adding dibasic acid anhydrides such as phthalic anhydride, tetrahydrophthalic anhydride, and hexahydrophthalic anhydride to the hydroxyl groups present in the side chains.

[0029] (8) A carboxyl group-containing resin obtained by reacting a polyfunctional epoxy resin, in which the hydroxyl groups of a bifunctional epoxy resin are further epoxidized with epichlorohydrin, with (meth)acrylic acid, and then adding a dibasic acid anhydride to the resulting hydroxyl groups.

[0030] (9) A carboxyl group-containing polyester resin obtained by reacting a polyfunctional oxetane compound with a dicarboxylic acid and adding a dibasic acid anhydride to the resulting primary hydroxyl group.

[0031] (10) A carboxyl group-containing resin obtained by reacting a reaction product obtained by reacting a compound having multiple phenolic hydroxyl groups in one molecule with an alkylene oxide such as ethylene oxide or propylene oxide with an unsaturated group-containing monocarboxylic acid, and then reacting the resulting reaction product with a polybasic acid anhydride.

[0032] (11) A carboxyl group-containing resin obtained by reacting a reaction product obtained by reacting a compound having multiple phenolic hydroxyl groups in one molecule with a cyclic carbonate compound such as ethylene carbonate or propylene carbonate with an unsaturated group-containing monocarboxylic acid, and then reacting the resulting reaction product with a polybasic acid anhydride.

[0033] (12) A carboxyl group-containing resin obtained by reacting an epoxy resin having multiple epoxy groups in one molecule with a compound having at least one alcoholic hydroxyl group and one phenolic hydroxyl group in one molecule, such as p-hydroxyphenethyl alcohol, and an unsaturated group-containing monocarboxylic acid such as (meth)acrylic acid, and then reacting the alcoholic hydroxyl group of the resulting reaction product with a polybasic acid anhydride such as maleic anhydride, tetrahydrophthalic anhydride, trimellitic anhydride, pyromellitic anhydride, or adipic anhydride.

[0034] (13) A carboxyl group-containing resin having at least one of an amide structure and an imide structure. (14) A carboxyl group-containing photosensitive resin having a copolymer structure, obtained by adding a compound having one epoxy group and one or more (meth)acryloyl groups in the molecule, such as glycidyl (meth)acrylate, α-methylglycidyl (meth)acrylate, epoxycyclohexylmethyl (meth)acrylate, etc., to a carboxyl group-containing copolymer resin having a maleimide or maleimide derivative such as N-phenylmaleimide or N-benzylmaleimide, an unsaturated carboxylic acid such as (meth)acrylic acid, an unsaturated group-containing compound having a hydroxyl group such as hydroxyalkyl (meth)acrylate, and an unsaturated group-containing compound having an aromatic ring such as styrene, α-methylstyrene, α-chlorostyrene, vinyltoluene.

[0035] (15) A carboxyl group-containing resin obtained by further adding a compound having one epoxy group and one or more (meth)acryloyl groups in the molecule, such as glycidyl (meth)acrylate or α-methylglycidyl (meth)acrylate, to the carboxyl group-containing resin described in (1) to (13) above. In this specification, (meth)acrylate is a general term referring to acrylates, methacrylates, and mixtures thereof, and the same applies to other similar expressions.

[0036] The carboxyl group-containing resin contained in the resin composition (a) of the resin layer (A) is not limited to those listed above, and one type may be used alone, or multiple types may be used in mixture. Among the above carboxyl group-containing resins, (10), which is an ethylene oxide (EO)-propylene oxide (PO) modified resin derived from a phenol resin, and (11), which is an ethylene carbonate-propylene carbonate modified resin derived from a phenol resin, are preferred because, since the unit having a photosensitive group and the developing unit having a carboxyl group are independent, even after the photosensitive group is crosslinked by exposure, the developability of the developing unit having a carboxyl group is not affected, and a good contrast between the exposed and unexposed areas can be obtained, making it easy to adjust the sensitivity. Furthermore, the carboxyl group-containing resins (10) and (11) may be used in combination with the carboxyl group-containing urethane resins (2) to (6) above.

[0037] The amount of carboxyl group-containing resin in the resin composition (a) of the resin layer (A) is 10 to 70% by mass of the total solid content of the resin composition (a). A concentration of 10% by mass or more improves the coating strength. A concentration of 70% by mass or less results in appropriate viscosity and improved processability. In particular, in this invention, to adjust the residual sensitivity, the amount of resins (10) and (11) in the carboxyl group-containing resin of the resin layer (A) is preferably 30 to 100% by mass, and more preferably 70 to 100% by mass. Within this range, it is possible to narrow the difference between gloss sensitivity and residual sensitivity to 20 stops or less with a constant exposure dose.

[0038] In the present invention, from the viewpoint of adjusting the gloss sensitivity and residual sensitivity of the resin laminated structure, it is preferable that the resin composition (a) of the resin layer (A) substantially does not contain a photopolymerization initiator. Substantially free of a photopolymerization initiator means that the amount of photopolymerization initiator in the resin composition (a) is less than 0.5 parts by mass per 100 parts by mass of carboxyl group-containing resin. This is because, in order to form a pattern in a laminated structure of resin layer (B) and resin layer (A) by development, the resin composition (b) of resin layer (B) contains a photobase generator that functions as a photopolymerization initiator, which is sufficient to cure the resin laminate. If the resin composition (a) of resin layer (A) were to contain a photopolymerization initiator, the residual sensitivity would tend to increase, which would adversely affect fine patterning.

[0039] [Thermosetting resin] The thermosetting resin contained in the resin composition (a) of the resin layer (A) is a resin having functional groups that can undergo a curing reaction by heat. The thermosetting resin is not particularly limited, and epoxy resins, oxetane compounds, compounds having two or more thioether groups in the molecule, i.e., amino resins such as episulfide resins, melamine resins, benzoguanamine resins, melamine derivatives, and benzoguanamine derivatives, blocked isocyanate compounds, cyclocarbonate compounds, bismaleimide, carbodiimide, etc., can be used, and these may be used in combination.

[0040] The epoxy resin mentioned above is a resin having epoxy groups, and any conventionally known resin can be used. Examples include a bifunctional epoxy resin having two epoxy groups in its molecule, and a polyfunctional epoxy resin having many epoxy groups in its molecule. A hydrogenated bifunctional epoxy resin may also be used.

[0041] Examples of epoxy resins that can be used include bisphenol A type epoxy resin, bisphenol F type epoxy resin, hydrogenated bisphenol A type epoxy resin, brominated bisphenol A type epoxy resin, bisphenol S type epoxy resin, phenol novolac type epoxy resin, cresol novolac type epoxy resin, bisphenol A novolac type epoxy resin, biphenyl type epoxy resin, naphthol type epoxy resin, naphthalene type epoxy resin, dicyclopentadiene type epoxy resin, triphenylmethane type epoxy resin, alicyclic epoxy resin, aliphatic chain epoxy resin, phosphorus-containing epoxy resin, anthracene type epoxy resin, norbornene type epoxy resin, adamantane type epoxy resin, fluorene type epoxy resin, aminophenol type epoxy resin, aminocresol type epoxy resin, alkylphenol type epoxy resin, etc. These epoxy resins can be used individually or in combination of two or more types.

[0042] The epoxy resin may be a solid epoxy resin, a semi-solid epoxy resin, or a liquid epoxy resin. Hereinafter, a solid epoxy resin means an epoxy resin that is solid at 40°C, a semi-solid epoxy resin means an epoxy resin that is solid at 20°C and liquid at 40°C, and a liquid epoxy resin means an epoxy resin that is liquid at 20°C.

[0043] As solid epoxy resins, there are naphthalene-type epoxy resins such as DIC's EPICLON HP-4700 (naphthalene-type epoxy resin), DIC's EXA4700 (tetrafunctional naphthalene-type epoxy resin), and Nippon Kayaku's NC-7000 (naphthalene skeleton-containing polyfunctional solid epoxy resin); epoxides of condensates of phenols and aromatic aldehydes having phenolic hydroxyl groups (trisphenol-type epoxy resins) such as Nippon Kayaku's EPPN-502H (trisphenol epoxy resin); dicyclopentadiene aralkyl-type epoxy resins such as DIC's EPICLON HP-7200H (dicyclopentadiene skeleton-containing polyfunctional solid epoxy resin); biphenyl aralkyl-type epoxy resins such as Nippon Kayaku's NC-3000H (biphenyl skeleton-containing polyfunctional solid epoxy resin); biphenyl / phenol novolac-type epoxy resins such as Nippon Kayaku's NC-3000L; and DIC's EPICLON Examples include novolac-type epoxy resins such as N660, EPICLON N690, and EOCN-104S manufactured by Nippon Kayaku Co., Ltd.; biphenyl-type epoxy resins such as YX-4000 manufactured by Mitsubishi Chemical Corporation; phosphorus-containing epoxy resins such as TX0712 manufactured by Nippon Steel Chemical & Material Co., Ltd.; and tris(2,3-epoxypropyl) isocyanurate such as TEPIC manufactured by Nissan Chemical Corporation.

[0044] Examples of semi-solid epoxy resins include bisphenol A type epoxy resins such as EPICLON 860, EPICLON 900-IM, EPICLON EXA-4816, EPICLON EXA-4822 from DIC Corporation, Epotote YD-134 from Nippon Steel Chemical & Material Co., Ltd., jER834, jER872 from Mitsubishi Chemical Corporation, and ELA-134 from Sumitomo Chemical Co., Ltd.; naphthalene type epoxy resins such as EPICLON HP-4032 from DIC Corporation; and phenol novolac type epoxy resins such as EPICLON N-740 from DIC Corporation.

[0045] Examples of liquid epoxy resins include bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol E type epoxy resin, phenol novolac type epoxy resin, tert-butyl-catechol type epoxy resin, glycidylamine type epoxy resin, aminophenol type epoxy resin, and alicyclic epoxy resin.

[0046] Next, examples of oxetane compounds include polyfunctional oxetanes such as bis[(3-methyl-3-oxetanylmethoxy)methyl]ether, bis[(3-ethyl-3-oxetanylmethoxy)methyl]ether, 1,4-bis[(3-methyl-3-oxetanylmethoxy)methyl]benzene, 1,4-bis[(3-ethyl-3-oxetanylmethoxy)methyl]benzene, (3-methyl-3-oxetanyl)methyl acrylate, (3-ethyl-3-oxetanyl)methyl acrylate, (3-methyl-3-oxetanyl)methyl methacrylate, (3-ethyl-3-oxetanyl)methyl methacrylate and their oligomers or copolymers, as well as etherified products of oxetane alcohol with novolac resin, poly(p-hydroxystyrene), cardo-type bisphenols, calixarenes, calixresorcinarenes, or resins having hydroxyl groups such as silsesquioxane. Other examples include copolymers of unsaturated monomers having an oxetane ring and alkyl (meth)acrylates.

[0047] Examples of the episulfide resins mentioned above include bisphenol A type episulfide resins. Furthermore, episulfide resins obtained by replacing the oxygen atoms in the epoxy groups of epoxy resins with sulfur atoms using a similar synthesis method can also be used.

[0048] Among thermosetting resins, epoxy resins are preferred. Furthermore, it is preferable that at least one of solid epoxy resins and semi-solid epoxy resins is used, as this yields a cured product with a high glass transition temperature (Tg) and excellent crack resistance. As for the epoxy resin, aromatic epoxy resins are preferred from the viewpoint of desirable physical properties of the cured product, and among these, naphthalene-type epoxy resins and biphenyl-type epoxy resins are more preferred. In this specification, aromatic epoxy resin means an epoxy resin having an aromatic ring skeleton in its molecule.

[0049] The molecular weight of the thermosetting resin contained in the resin composition (a) of the resin layer (A) is preferably 100 to 2,000 in weight-average molecular weight to adjust the developability and cured coating film characteristics. Within this range, when adjusting the residual sensitivity with the molecular weight of the thermosetting resin, using a low molecular weight component, i.e., a component with a weight-average molecular weight (Mw) of 100 to 1,000, can reduce the number of steps in the residual sensitivity, while using a high molecular weight component, i.e., a component with a weight-average molecular weight of over 1,000 to 2,000, can increase the number of steps in the residual sensitivity. In the examples of the present invention, an epoxy resin with a weight-average molecular weight of 1,000 or less is used to adjust the residual sensitivity so that the number of steps in the residual sensitivity does not become too large.

[0050] Thermosetting resins can be used individually or in combination of two or more types. The blending ratio of thermosetting resins is preferably 10 to 50% by mass, more preferably 15 to 45% by mass, and even more preferably 19 to 40% by mass, based on the total amount of resin composition (a) in terms of solid content.

[0051] [Photopolymerizable monomers] The resin composition (a) of the resin layer (A) is a photosensitive thermosetting resin composition that, as described above, uses a base generated from a base generator as a catalyst to cause an addition reaction between a resin having carboxyl groups and a thermosetting component by heating after exposure, and develops by removing the unexposed areas with an alkaline solution. This eliminates the need to incorporate (meth)acrylate monomers, which were necessary in conventional photosensitive resin compositions that utilize polymerization reactions by radicals generated from photoradical polymerization initiators. However, (meth)acrylate monomers may be incorporated into the resin composition of the resin layer (A) mainly to adjust the sensitivity of the resin layer (A). For example, it is possible to incorporate about 10 to 100 parts by mass of (meth)acrylate monomers per 100 parts by mass of carboxyl group-containing resin of the resin layer (A).

[0052] [Resin layer (B)] (Resin composition (b) constituting the resin layer (B)) The resin layer (B) consists of the resin composition (b). The resin layer (B) primarily functions as a protective layer for the substrate. The resin composition (b) of the resin layer (B) is a photosensitive thermosetting resin composition that allows for radical polymerization by light using a photopolymerization initiator, and uses a base generated from a base generator as a catalyst to cause an addition reaction between an alkali-soluble resin and a thermosetting component by heating after exposure, and allows for development by removing the unexposed areas with an alkaline solution.

[0053] The alkali-soluble resin contained in the resin composition (b) of the resin layer (B) includes, for example, compounds having phenolic hydroxyl groups, compounds having carboxyl groups, and compounds having both phenolic hydroxyl groups and carboxyl groups, and known and conventional compounds are used. In particular, carboxyl group-containing resins or carboxyl group-containing photosensitive resins that have been conventionally used as solder resist compositions and contain compounds having carboxyl groups are used. Here, known and conventional compounds are used as the carboxyl group-containing resin or carboxyl group-containing photosensitive resin and the compound having an ethylenically unsaturated bond. In particular, among alkali-soluble resins, alkali-soluble resins having an imide ring, which have superior properties such as flexibility and heat resistance, can be suitably used. The molecular weight of the carboxyl group-containing resin contained in the resin composition (b) of the resin layer (B) is preferably 1,000 to 10,000 in weight-average molecular weight to adjust the fine patterning properties and surface hardening properties. Within this range, when controlling gloss sensitivity with the molecular weight of the carboxyl group-containing resin component, using a low molecular weight, i.e., a carboxyl group-containing resin with a molecular weight of 1,000 to 5,000, can reduce the number of steps in gloss sensitivity, while using a high molecular weight, i.e., a carboxyl group-containing resin with a molecular weight greater than 5,000 to 10,000, can increase the number of steps in gloss sensitivity. If the alkali-soluble resin having an imide ring, described later, also has carboxyl groups, the gloss sensitivity can be similarly adjusted within the weight-average molecular weight range described above.

[0054] (Alkali-soluble resin containing an imide ring) In the present invention, the alkali-soluble resin having an imide ring has one or more alkali-soluble groups selected from phenolic hydroxyl groups and carboxyl groups, and an imide ring. Known and conventional methods can be used to introduce the imide ring into this alkali-soluble resin. For example, a resin obtained by reacting a carboxylic acid anhydride component with an amine component and / or an isocyanate component can be used. Imidation may be carried out by thermal imidation, chemical imidation, or a combination of both.

[0055] Examples of carboxylic acid anhydride components include tetracarboxylic acid anhydrides and tricarboxylic acid anhydrides, but the formula is not limited to these acid anhydrides. Any compound having an acid anhydride group and a carboxyl group that react with an amino group or an isocyanate group, including its derivatives, can be used. Furthermore, these carboxylic acid anhydride components may be used individually or in combination.

[0056] As amine components, diamines such as aliphatic diamines and aromatic diamines, polyhydric amines such as aliphatic polyetheramines, diamines having carboxylic acids, and diamines having phenolic hydroxyl groups can be used, but are not limited to these amines. Furthermore, these amine components may be used individually or in combination.

[0057] As the isocyanate component, diisocyanates such as aromatic diisocyanates and their isomers and polymers, aliphatic diisocyanates, alicyclic diisocyanates and their isomers, and other general-purpose diisocyanates can be used, but are not limited to these isocyanates. Furthermore, these isocyanate components may be used individually or in combination.

[0058] The alkali-soluble resin having an imide ring as described above may also have an amide bond. This may be a polyamide-imide obtained by reacting an imidide having a carboxyl group with an isocyanate and a carboxylic acid anhydride, or it may be obtained by other reactions. Furthermore, it may have bonds resulting from other additions and condensations.

[0059] In the synthesis of alkali-soluble resins having such alkali-soluble groups and imide rings, known and conventional organic solvents can be used. Such organic solvents are not limited in structure, as long as they do not react with the raw materials (carboxylic acid anhydrides, amines, isocyanates) and dissolve these raw materials. In particular, aprotic solvents such as N,N-dimethylformamide, N,N-dimethylacetamide, N-methyl-2-pyrrolidone, dimethyl sulfoxide, and γ-butyrolactone are preferred due to their high solubility of the raw materials.

[0060] The alkali-soluble resin having one or more alkali-soluble groups from among phenolic hydroxyl groups and carboxyl groups and an imide ring, as described above, is suitable for the photolithography process. To adjust gloss sensitivity and residual sensitivity, its acid value is preferably 20 to 200 mgKOH / g, and more preferably 60 to 150 mgKOH / g. When the acid value is 20 mgKOH / g or higher, solubility to alkali increases, developability improves, and the degree of crosslinking with the thermosetting component after light irradiation increases, allowing for sufficient development contrast. Furthermore, when the acid value is 200 mgKOH / g or lower, the so-called thermal fogging in the PEB process after light irradiation, described later, can be suppressed, and the process margin is increased.

[0061] Furthermore, the molecular weight of this alkali-soluble resin is preferably 1,000 to 100,000 by mass average, and more preferably 2,000 to 50,000, in order to adjust the developability and cured film properties. When the molecular weight is 1,000 or higher, sufficient developability and cured properties can be obtained after exposure and PEB. When the molecular weight is 100,000 or lower, alkali solubility increases and developability improves.

[0062] (Photopolymerization initiator) As the photopolymerization initiator used in the resin composition (b) of the resin layer (B), known and conventional ones can be used, for example, benzoin compounds, acylphosphine oxide compounds, acetophenone compounds, α-aminoacetophenone compounds, oxime ester compounds, thioxanthone compounds, etc. The resin composition (b) of the resin layer (B) enables radical polymerization by light by containing a photopolymerization initiator. In particular, when used in the PEB process after light irradiation, which will be described later, a photopolymerization initiator that also functions as a photobase generator is preferred. Note that in this PEB process, a photopolymerization initiator and a photobase generator may be used in combination. The amount of photopolymerization initiator added is preferably 0.5 to 30 parts by mass per 100 parts by mass of alkali-soluble resin. When the amount is 0.5 parts by mass or more, good surface curability is obtained, and when it is 30 parts by mass or less, halation is less likely to occur and good resolution can be obtained. More preferably, it is 1.0 to 20 parts by mass.

[0063] (Photobase Generator) Photobase generators, which also function as photopolymerization initiators, are compounds that, upon irradiation with light such as ultraviolet or visible light, undergo a change in molecular structure or molecular cleavage, thereby generating one or more basic substances that can function as catalysts for the polymerization reactions of the heat-reactive compounds described later. Examples of basic substances include secondary amines and tertiary amines.

[0064] Examples of photobase generators that also function as photopolymerization initiators include α-aminoacetophenone compounds, oxime ester compounds, and compounds having substituents such as acyloxyimino groups, N-formylated aromatic amino groups, N-acylated aromatic amino groups, nitrobenzylcarbamate groups, and alkoxybenzylcarbamate groups. Among these, oxime ester compounds and α-aminoacetophenone compounds are preferred, with oxime ester compounds being more preferred. As for α-aminoacetophenone compounds, those having two or more nitrogen atoms are particularly preferred.

[0065] Any α-aminoacetophenone compound that has a benzoin ether bond in its molecule and undergoes intramolecular cleavage upon light irradiation, generating a basic substance (amine) that exhibits curing catalytic activity, is acceptable.

[0066] Any oxime ester compound that generates a basic substance upon light irradiation can be used as the oxime ester compound.

[0067] Such photobase generators may be used individually or in combination of two or more. The amount of photobase generator in the resin composition is preferably 1.0 to 40 parts by mass, and more preferably 1.0 to 20 parts by mass, per 100 parts by mass of alkali-soluble resin. When the amount is 1.0 part by mass or more, a good contrast in developability between the irradiated and unirradiated areas can be obtained. When the amount is 40 parts by mass or less, the cured product properties are improved.

[0068] (thermosetting resin) The thermosetting resin (b) of the resin layer (B) can be epoxy resin, oxetane compound, compound having two or more thioether groups in its molecule, i.e., amino resins such as episulfide resin, melamine resin, benzoguanamine resin, melamine derivative, benzoguanamine derivative, blocked isocyanate compound, cyclocarbonate compound, bismaleimide, carbodiimide, etc., similar to the thermosetting resin of the resin layer (A) described above, and these may be used in combination.

[0069] The thermosetting resin (b) of resin layer (B) may be the same thermosetting resin as the thermosetting resin of resin layer (A), or it may be a different thermosetting resin. Furthermore, one type of thermosetting resin may be used alone, or two or more types may be used in combination.

[0070] The proportion of thermosetting resin in the blend is preferably 10 to 50% by mass, more preferably 15 to 45% by mass, and even more preferably 20 to 40% by mass, based on the total amount of the composition in terms of solid content.

[0071] The resin compositions used in resin layer (A) and resin layer (B) as described above may contain the following components as needed.

[0072] (Coloring agent) Colorants may be added to adjust sensitivity. Commonly known and conventional colorants such as red, blue, green, yellow, white, and black may be used, and these can be pigments, dyes, or colorants.

[0073] (Other ingredients) Known and conventional additives such as antioxidants, UV absorbers, fine silica powder, hydrotalcite, and silane coupling agents can be incorporated to adjust sensitivity and improve the properties of the paint.

[0074] [Laminated structure] The thickness of the resin layer (B) is preferably 2 μm or more and half the thickness of the resin layer (A), and the thickness of the resin layer (A) is preferably 10 to 80 μm, and more preferably 20 to 60 μm.

[0075] The laminated structure may be formed by dry-filming the resin composition of resin layer (A) and the resin composition of resin layer (B) onto a substrate such as a wiring board, or by sequentially coating them in liquid form. When used in liquid form, it may be a one-component or two-component or more-component system, but from the viewpoint of storage stability, it is preferable to have two or more components.

[0076] [Dry film] Next, the dry film of the present invention has a resin layer obtained by coating and drying a resin composition (a) of resin layer (A) and a resin composition (b) of resin layer (B) on a first film. When forming the dry film, first, the resin composition (a) of resin layer (A) and the resin composition (b) of resin layer (B) are diluted with the above organic solvent to adjust to an appropriate viscosity, and then coated to a uniform thickness on a carrier film using a comma coater, blade coater, lip coater, rod coater, squeeze coater, reverse coater, transfer roll coater, gravure coater, spray coater, etc. After that, the coated composition can be dried at a temperature of 40 to 130°C for 1 to 30 minutes to form the resin layer. There are no particular restrictions on the coated film thickness, but generally, the film thickness after drying is appropriately selected in the range of 5 to 150 μm, preferably 15 to 60 μm.

[0077] As the first film, a plastic film can be used, such as polyester film like polyethylene terephthalate (PET), polyimide film, polyamide-imide film, polypropylene film, or polystyrene film. There are no particular restrictions on the thickness of the first film, but it is generally appropriately selected within the range of 10 to 150 μm. More preferably, it is in the range of 15 to 130 μm.

[0078] After forming resin layers consisting of resin composition (a) of resin layer (A) and resin composition (b) of resin layer (B) on the first film, it is preferable to further laminate a peelable cover film on the surface of the film for purposes such as preventing dust from adhering to the surface of the film. Examples of peelable second films that can be used include polyethylene film, polytetrafluoroethylene film, polypropylene film, and surface-treated paper. The second film only needs to have an adhesive force that is weaker than the adhesive force between the resin layer and the first film when the cover film is peeled off.

[0079] In addition, in the present invention, a laminated structure may be formed by applying and drying the resin composition (b) of resin layer (B) and the resin composition (a) of resin layer (A) onto the second film, and then laminating the first film onto its surface. That is, in the present invention, when manufacturing a dry film, either the first film or the second film may be used as the film on which the resin composition (a) of resin layer (A) and the resin composition (b) of resin layer (B) are applied.

[0080] The resin composition of resin layer (A) and the resin composition of resin layer (B) can be adjusted to a viscosity suitable for the coating method using, for example, the above-mentioned organic solvent, and then applied to a substrate by methods such as dip coating, flow coating, roll coating, bar coating, screen printing, or curtain coating. After that, the organic solvent contained in the composition can be evaporated and dried (pre-dried) at a temperature of 60 to 100°C to form a tack-free resin layer. In the case of a dry film in which the above composition is applied to a carrier film or cover film, dried, and wound as a film, the resin layer can be formed by laminating the layer of the composition of the present invention onto the substrate using a laminator or the like so that it comes into contact with the substrate, and then peeling off the carrier film.

[0081] The above-mentioned substrates include printed circuit boards and flexible printed circuit boards with circuits pre-formed using copper, etc., as well as materials such as paper phenol, paper epoxy, glass cloth epoxy, glass polyimide, glass cloth / nonwoven fabric epoxy, glass cloth / paper epoxy, synthetic fiber epoxy, copper-clad laminates for high-frequency circuits using fluororesin / polyethylene / polyphenylene ether, polyphenylene oxide / cyanate, etc., and can be described as copper-clad laminates of all grades (FR-4, etc.), as well as metal substrates, polyimide films, PET films, polyethylene naphthalate (PEN) films, glass substrates, ceramic substrates, wafers, etc.

[0082] Volatilization drying, performed after coating the resin composition onto a substrate or the first film of a dry film, can be carried out using a hot air circulation drying oven, an IR oven, a hot plate, a convection oven, etc. (a method in which hot air inside the dryer is brought into countercurrent contact using a heat source equipped with a steam-heated air heating method, or a method in which hot air is blown onto the support from a nozzle). Furthermore, the heating performed in the PEB process and post-cure process described later can be carried out using the above-mentioned hot air circulation drying oven, etc.

[0083] [Cured product] A dry film is formed on a substrate for electronic components, such as a printed circuit board, after peeling off a first film, and cured by exposure and alkaline development. After alkaline development, post-curing is performed as needed. Alternatively, instead of using a dry film, a resin composition (a) for resin layer (A) and a resin composition (b) for resin layer (B) are applied to the substrate, and then cured by exposure and alkaline development. After alkaline development, post-curing is performed as needed.

[0084] (Exposure (light irradiation) process) In this process, the photobase generator contained in the resin composition (b) of the resin layer (B) is activated in a negative pattern by irradiation with active energy rays, thereby curing the exposed area. In the case of compositions using the PEB process described later, a photopolymerization initiator or photobase generator that functions as a photobase generator is activated in a negative pattern to generate a base. The exposure equipment used in this process can include a direct writing device, an exposure device equipped with a metal halide lamp, a light irradiation device equipped with a (ultra) high-pressure mercury lamp, a light irradiation device equipped with a mercury short-arc lamp, or a direct writing device using an ultraviolet lamp such as an (ultra) high-pressure mercury lamp. The patterned exposure mask is a negative-type mask. For exposure, it is preferable to use laser light or scattered light with a maximum wavelength in the range of 350 to 450 nm as the active energy beam. By setting the maximum wavelength within this range, the photobase generator can be efficiently activated. The exposure dose varies depending on the film thickness, but is usually 100 to 1500 mJ / cm². 2 It can be done this way. By exposing (irradiating with light) the resin composition (a) of the laminated resin layer (A) and the resin composition (b) of the resin layer (B), the exposed areas (the parts irradiated with light) harden. In this process, the photobase generator contained in the resin layer is activated by light irradiation in a negative pattern, thereby hardening the light-irradiated areas. In this process, the base generated in the light-irradiated areas destabilizes the photobase generator, and the chemical proliferation of the base allows for sufficient hardening to the depths of the resin layer. Any exposure device that irradiates ultraviolet light in the range of 350 to 450 nm can be used for light irradiation.

[0085] (PEB (POST EXPOSURE BAKE) process) In this process, the exposed area is cured by heating the resin layer after exposure (light irradiation). This process allows for sufficient curing to the depths of the resin layer due to the base generated in the light irradiation process. The heating temperature is, for example, 80 to 140°C. The heating time is, for example, 2 to 140 minutes. Since the curing of the resin composition in this invention is, for example, a ring-opening reaction of epoxy resin by thermal reaction, strain and curing shrinkage can be suppressed compared to cases where curing proceeds by photoradical reaction.

[0086] (Developing process) The development process involves alkaline development to remove unirradiated areas and form a negative-type patterned insulating film. Development methods can include dipping, showering, spraying, and brushing. As the developer, alkaline aqueous solutions such as potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium phosphate, sodium silicate, ammonia, and amines can be used.

[0087] (Post-curing process) This process involves completely heat-curing the resin layer after the development process to obtain a reliable coating. The heating temperature is, for example, 140°C to 180°C. The heating time is, for example, 20 to 120 minutes. Furthermore, light irradiation may be performed before or after post-curing.

[0088] [Electronic components] The laminated structure of the present invention is suitably used for forming a cured film on a printed circuit board for semiconductor packaging and the like, more preferably for forming a permanent film, and even more preferably for forming solder resist, interlayer insulating layers, and coverlays. Furthermore, since the curable resin composition of the present invention yields a cured product with excellent crack resistance, it can be suitably used for forming permanent coatings such as solder resist used in printed circuit boards with fine-pitch wiring patterns where defects due to crack formation are significant, such as package substrates. [Examples]

[0089] The present invention will be described in more detail below with reference to examples, but the present invention is not limited to these examples. [Synthesis Example 1] 220 parts of cresol novolac epoxy resin (DIC Corporation, EPICLON N-695, epoxy equivalent: 220) were placed in a four-necked flask equipped with a stirrer and reflux condenser, and 214 parts of carbitol acetate were added and heated until dissolved. Next, 0.1 parts of hydroquinone as a polymerization inhibitor and 2.0 parts of dimethylbenzylamine as a reaction catalyst were added. This mixture was heated to 95-105°C, and 72 parts of acrylic acid were gradually added dropwise, and the mixture was reacted for 16 hours. The reaction product was cooled to 80-90°C, 106 parts of tetrahydrophthalic anhydride were added, and the mixture was reacted for 8 hours. After cooling, the product was removed. The photosensitive resin solution (A-1) obtained in this manner, which contains both ethylenically unsaturated bonds and carboxyl groups, had a non-volatile content of 65%, a solid acid value of 100 mgKOH / g, and a weight-average molecular weight (Mw) of approximately 3,500.

[0090] [Synthesis Example 2] In a 300 mL four-necked flask equipped with a nitrogen gas inlet tube, thermometer, and stirrer, 6.98 g of 2,2-bis[4-(4-aminophenoxy)phenyl]propane (hereinafter referred to as "BAPP"), 3.80 g of 3,5-diaminobenzoic acid, 8.21 g of Jeffermin XTJ-542 (manufactured by Huntsman, molecular weight 1025.64), and 86.49 g of γ-butyrolactone were charged and dissolved at room temperature. Next, 17.84 g of cyclohexane-1,2,4-tricarboxylic acid-1,2-anhydride and 2.88 g of trimellitic anhydride were charged and held at room temperature for 30 minutes. Then, 30 g of toluene was charged, the temperature was raised to 160°C, and after removing the water produced with the toluene, the mixture was held for 3 hours and cooled to room temperature to obtain the imidide solution. To the obtained imidide solution, 9.61 g of trimellitic anhydride and 17.45 g of trimethylhexamethylene diisocyanate were added and the mixture was held at 160°C for 32 hours. Thus, a polyamide-imide resin solution (A-2) containing carboxyl groups was obtained. The solid content was 40.1%, the solid content acid value was 83.1 mg KOH / g, and the weight-average molecular weight (Mw) was 4,500.

[0091] [Synthesis Example 3] In an autoclave equipped with a thermometer, a nitrogen introduction device / alkylene oxide introduction device, and a stirring device, 119.4 g of novolac-type cresol resin (manufactured by Aica Kogyo Co., Ltd., product name "Shounol CRG-951", OH equivalent: 119.4), 1.19 g of potassium hydroxide, and 119.4 g of toluene were charged. The system was then heated and the temperature increased while stirring and purging with nitrogen. Next, 63.8 g of propylene oxide was gradually added dropwise, at a temperature of 125-132°C and a rate of 0-4.8 kg / cm³. 2The mixture was reacted for 16 hours. After cooling to room temperature, 1.56 g of 89% phosphoric acid was added to the reaction solution and mixed to neutralize the potassium hydroxide, yielding a propylene oxide reaction solution of novolac-type cresol resin with a non-volatile content of 62.1% and a hydroxyl value of 182.2 g / eq. This solution had an average of 1.08 moles of alkylene oxide added per equivalent of phenolic hydroxyl groups. Next, 293.0 g of the obtained alkylene oxide reaction solution of novolac-type cresol resin, 43.2 g of acrylic acid, 11.53 g of methanesulfonic acid, 0.18 g of methylhydroquinone, and 252.9 g of toluene were charged into a reactor equipped with a stirrer, thermometer, and air blowing tube, and the mixture was reacted at 110°C for 12 hours while blowing air at a rate of 10 ml / min and stirring. 12.6 g of water was distilled off as an azeotropic mixture with toluene. The reaction solution was then cooled to room temperature, neutralized with 35.35 g of 15% sodium hydroxide aqueous solution, and then washed with water. Toluene was then removed by distillation using an evaporator while substituting with 118.1 g of diethylene glycol monoethyl ether acetate to obtain a novolac-type acrylate resin solution. Next, 332.5 g of the obtained novolac-type acrylate resin solution and 1.22 g of triphenylphosphine were charged into a reactor equipped with a stirrer, thermometer, and air blowing tube. Air was blown in at a rate of 10 ml / min, and while stirring, 60.8 g of tetrahydrophthalic anhydride was gradually added, and the reaction was carried out at 95-101°C for 6 hours. In this way, a carboxyl group-containing photosensitive resin solution (A-3) with a solids acid value of 88 mg KOH / g, solids content of 71%, and weight-average molecular weight (Mw) of 2,000 was obtained.

[0092] The materials for each example and comparative example shown in Tables 1 and 2 were blended in the amounts indicated in those tables, pre-mixed in a stirrer, and then kneaded in a three-roll mill to prepare resin composition (a) for resin layer (A) and resin composition (b) for resin layer (B). Unless otherwise specified, the values ​​in the tables represent parts by mass of solids.

[0093] <Formation of resin layer (A)> A substrate with a copper thickness of 18 μm covering the entire surface was prepared and pre-treated using MEC CZ8108B. Subsequently, the resin compositions of the examples and comparative examples were applied to the pre-treated substrate by methods such as screen printing, so that the dried film thicknesses (in μm) were as shown in Tables 1 and 2. Then, a resin layer (A) was formed by drying in a hot air circulating drying oven at 90°C for 30 minutes.

[0094] <Formation of resin layer (B)> On the resin layer (A) formed as described above, each resin composition from the examples and comparative examples was applied by methods such as screen printing so that the film thickness after drying was as shown in Tables 1 and 2 (unit: μm). Then, the layers were dried in a hot air circulating drying oven at 90°C for 30 minutes to form resin layer (B).

[0095] In this way, laminated structures made from the resin compositions of the examples and comparative examples were fabricated on the substrate, which was entirely formed with a copper thickness of 18 μm. In the case of the dry film lamination method, first, each resin composition of the examples and comparative examples was diluted with an organic solvent to adjust to an appropriate viscosity. Then, each resin composition of the examples and comparative examples was applied to a carrier film in the same manner as above, dried to form a resin layer (B), and then a resin layer (A) was formed on top of it to produce a dry film. Next, the films were bonded together using a laminator or the like so that the resin layer (A) side was in contact with the substrate, and then the carrier film was peeled off.

[0096] <Sensitivity> Each of the laminated structures obtained on the substrate was exposed using a metal halide lamp-equipped exposure apparatus (HMW-680-GW20) via a 41-step step tablet (STOUFFER T-4105) to perform a PEB process at 90°C for 30 minutes. After development with a 1.0% sodium carbonate aqueous solution at 30°C and 0.2 MPa under development conditions (see Tables 1 and 2) tailored to each composition, the gloss sensitivity and residual sensitivity were evaluated from the patterns formed by the 41-step step tablet. The exposure amount was adjusted so that the gloss sensitivity was 10 steps. The gloss sensitivity and the residual sensitivity were measured as follows according to the above-described definitions. Each of the laminated structures (two resin layers) formed on the obtained substrate was exposed from the resin layer (B) side through a step tablet, and after performing the PEB process, when the coating film thickness of the two resin layers before development of the formed pattern was set to 100%, the maximum value of the number of step stages in which 95% or more of the coating film thickness remained after the exposure, after performing the PEB process, and after development was defined as the gloss sensitivity, and when the coating film thickness before development was set to 100%, the maximum value of the number of step stages in which the coating film thickness became 5% or less after development was defined as the residual sensitivity. Here, after exposing each of the laminated structures formed on the substrate and performing the PEB process, the coating film thicknesses before and after development of the formed pattern were measured as the difference between the measured value obtained as the thickness of the entire coating film and the measured value obtained as the thickness of the substrate in accordance with JIS K 5600-1-7:2014. The measurement method was as follows: By a mechanical measurement method, using a thickness measuring instrument (DIGIMICRO MF-501, manufactured by Nikon Corporation), each of the laminated structures formed on the substrate was exposed from the resin layer (B) side through a step tablet, and after performing a PEB process at 90°C for 30 minutes, the coating film thickness before development of the formed pattern and the coating film thickness of the remaining coating film formed after the exposure, after performing the PEB process, and after development were each measured. When the coating film thickness before development was set to 100%, the maximum value of the number of step stages in which 95% or more of the coating film thickness remained after development was defined as the gloss sensitivity, and when the coating film thickness before development was set to 100%, the maximum value of the number of step stages in which the coating film thickness became 5% or less after development was defined as the residual sensitivity.

[0097] <B-HAST Resistance> The resin composition was formed on a brush-shaped evaluation substrate with L / S = 12 / 13 μm, and the exposure process was carried out under the above conditions. After performing the PEB process at 90 °C for 30 minutes, the development process (30 °C, 0.2 MPa, 1 mass% Na2CO3 aqueous solution) was carried out to obtain a resist pattern. Furthermore, the post-cure process was carried out under the conditions of 150 °C for 60 minutes to cure the coating film. A bias voltage of 5.0 V was applied to the obtained evaluation substrate, and it was placed in a constant temperature and humidity bath at 130 °C and 85% atmosphere, and the lifetime of the test pieces in the 1000 h treatment was evaluated according to the following criteria. 〇: 700 h or more △: More than 200 h and less than 700 h ×: 200 h or less

[0098] <TCT Crack Resistance (Thermal Cycling Resistance)> The resin compositions of each example and each comparative example were formed on an evaluation substrate of BT material, and this test was carried out to evaluate the crack resistance. The exposure process was carried out under the conditions of the evaluation method of <Sensitivity> described above. After performing the PEB process at 90 °C for 30 minutes, the development process (30 °C, 0.2 MPa, 1 mass% Na2CO3 aqueous solution) was carried out to form a □-cut pattern with a size of 200 μm. Furthermore, the post-cure process was carried out under the conditions of 150 °C for 60 minutes to cure the coating film. The obtained evaluation substrate was subjected to 1000 cycles with -65 °C (30 min.) + 175 °C (30 min.) as one cycle using a thermal cycling tester (manufactured by Kusumoto Chemical Co., Ltd.). After 1000 cycles, the presence or absence of cracks at the opening (200 μm square) was confirmed by optical microscope observation and evaluated according to the following criteria. ◎: Crack generation rate is less than 10% 〇: Crack generation rate is 10% or more and less than 20% △: Crack generation rate is 20% or more and less than 40% [[ID=,19]] ×: Crack generation rate is 40% or more

[0099] <Photopatterning Property> The resin compositions of each example and comparative example were formed on a copper-clad substrate, and in order to evaluate the photopatterning properties, an exposure process was performed under the conditions of the <sensitivity> evaluation method described above, followed by a PEB process at 90°C for 30 minutes, and then a development process (30°C, 0.2 MPa, 1 mass% Na2CO3 aqueous solution) to form SRO patterns in 10 μm increments from Φ40 μm to Φ200 μm. Furthermore, the coating film was cured in a post-cure process at 150°C for 60 minutes, and the obtained evaluation substrate was observed using an optical microscope adjusted to 100x magnification to evaluate the minimum size in which the aperture was completely formed. ◎: SRO size Φ50μm or less ○: SRO size over Φ50 and under Φ60μm △: SRO size over Φ60 and under Φ80μm ×: SRO size over Φ80 and under Φ100μm The evaluation results are shown together in Tables 1 and 2.

[0100] [Table 1]

[0101] [Table 2]

[0102] The materials listed in Tables 1 and 2 are as follows: *1) Photosensitive resin solution (A-1) containing both ethylenically unsaturated bonds and carboxyl groups, Mw 3,500 *2) Polyamide-imide resin solution containing carboxyl groups (A-2), Mw 4,500 *3) jER834 (Bisphenol A type epoxy resin, manufactured by Mitsubishi Chemical Corporation), Mw470 *4) IRGACURE OXE-02 (Ethanone, 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazole-3-yl]-,1-(0-acetyloxime), manufactured by BASF Japan) *5) Carboxyl group-containing photosensitive resin solution (A-3) (halogen-free, acid-added, acrylate resin, halogen impurity concentration of 5 ppm by mass or less), Mw2,000 *6) KAYARAD UXE-3000 (carboxyl group-containing bisphenol A type urethane epoxy acrylate, manufactured by Nippon Kayaku Co., Ltd.), Mw 10,000 *7) DPCA-60 (Lactone-modified hexaacrylate of dipentaerythritol, manufactured by Nippon Kayaku Co., Ltd.) *8) NC-3000L (biphenyl aralkyl epoxy resin, manufactured by Nippon Kayaku Co., Ltd.), Mw700 *9) IRGACURE OXE-02 (Ethanone, 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazole-3-yl]-,1-(0-acetyloxime), manufactured by BASF Japan)

[0103] As is clear from the evaluation results shown in Tables 1 and 2, the laminated structures of each example exhibited superior B-HAST resistance, crack resistance, and resolution compared to the laminated structures of each comparative example.

Claims

1. A laminated structure having two layers of resin, one resin layer (A) made of resin composition (a) and the other resin layer (B) made of resin composition (b), The resin composition (b) of the resin layer (B) comprises an alkali-soluble resin, a photobase generator that also functions as a photopolymerization initiator, or a photopolymerization initiator and a photobase generator, and a thermosetting resin. The alkali-soluble resin of the resin composition (b) is one or more of the following: a carboxyl group-containing resin obtained by reacting a polyfunctional epoxy resin with a weight-average molecular weight of 1,000 to 10,000 with (meth)acrylic acid and adding dibasic acid anhydrides such as phthalic anhydride, tetrahydrophthalic anhydride, or hexahydrophthalic anhydride to the hydroxyl groups present in the side chain; and an alkali-soluble resin having an imide ring with an acid value of 20 to 200 mgKOH / g and a weight-average molecular weight of 1,000 to 100,000. The thermosetting resin of the resin composition (b) is a semi-solid epoxy resin, The proportion of the semi-solid epoxy resin in the resin composition (b) is 10 to 50% by mass relative to the total amount of the resin composition (b). The resin composition (a) of the resin layer (A) comprises a carboxyl group-containing resin and a thermosetting resin, and substantially contains no photopolymerization initiator. The carboxyl group-containing resin of the resin composition (a) contains 30 to 100% by mass of one or more of the following: a carboxyl group-containing resin obtained by reacting a reaction product obtained by reacting a compound having multiple phenolic hydroxyl groups in one molecule with an alkylene oxide such as ethylene oxide or propylene oxide with an unsaturated group-containing monocarboxylic acid, and then reacting the resulting reaction product with a polybasic acid anhydride; and a carboxyl group-containing resin obtained by reacting a reaction product obtained by reacting a compound having multiple phenolic hydroxyl groups in one molecule with a cyclic carbonate compound such as ethylene carbonate or propylene carbonate with an unsaturated group-containing monocarboxylic acid, and then reacting the resulting reaction product with a polybasic acid anhydride. The thermosetting resin of the resin composition (a) is a biphenyl-type epoxy resin having a weight-average molecular weight of 100 to 2,000. The proportion of biphenyl-type epoxy resin in the resin composition (a) is 10 to 50% by mass relative to the total amount of resin composition (a). A laminated structure characterized in that the difference between the gloss sensitivity and residual sensitivity, obtained by measuring the film thickness of the pattern formed after exposure of the two resin layers from the resin layer (B) side via a step tablet with laser light or scattered light having a maximum wavelength in the range of 350 to 450 nm at 100 to 1500 mJ / cm², followed by a PEB process at a heating temperature of 80 to 140°C for 2 to 140 minutes, is 20 steps or less.

2. The laminated structure according to claim 1, wherein the thickness of the resin layer (B) is 2 μm or more and half the thickness of the resin layer (A), and the thickness of the resin layer (A) is 10 to 80 μm.

3. A dry film comprising a laminated structure according to claim 1 or 2, and a film provided in contact with at least one surface of the resin layer (B) and the resin layer (A) of the laminated structure.

4. A cured product characterized by being obtained by curing the resin layer of the laminated structure according to claim 1 or 2, or the dry film according to claim 3.

5. An electronic component characterized by having the cured product described in claim 4.

Images