Process for preparing high-purity norbornenesilyl ether

Abstract

A process for preparing high-purity norbornene alkylsilyl ethers is disclosed and claimed. Specifically, a process for preparing high-purity norbornene methylsilyl ethers on an industrial scale is disclosed and claimed. The high-purity monomers prepared according to the process of the present invention are useful in a variety of applications, including, but not limited to, the preparation of high-quality, high-purity polynorbornenes that can be used in a variety of electronic applications, among other applications.

Description

[Technical Field]

[0001] Mutual citation for related applications This application claims the benefit of U.S. Provisional Application No. 63 / 452,364, filed on 15 March 2023, the entire disclosure of which is incorporated herein by reference.

[0002] Embodiments of the present invention relate to industrial-scale processes for preparing a variety of norbornene silyl ethers. More specifically, they relate to processes for preparing high-purity norbornene alkyl silyl ethers useful as monomers in a variety of industrial applications, including as starting materials in the manufacture of electronic and optoelectronic polymer materials. [Background technology]

[0003] Functionalized norbornene monomers are widely used in the preparation of polymers with a wide range of applications, particularly in the electronics industry. Polynorbornene, in particular, is utilized in various electronic materials due to its unique film-forming properties that provide desirable electronic material characteristics. Such applications include, among others, use as dielectrics, photoresists, and protective layers. However, because these applications require very high-purity materials, it is especially important that the functionalized norbornene monomers are free from impurities that may hinder the formation of high-molecular-weight polymers. [Overview of the Initiative] [Problems that the invention aims to solve]

[0004] U.S. Patent No. 9,382,271 discloses a process for preparing various norbornene alkylsilyl ether monomers. However, the process disclosed in this patent requires stoichiometric amounts of bases such as tert-butoxide potassium, resulting in a large amount of waste. Therefore, such a process is industrially undesirable and incurs significant costs for waste disposal.

[0005] Therefore, there is a need to develop an environmentally friendly and industrially feasible process for preparing high-purity norbornene alkylsilyl ether monomers.

[0006] Further purposes and uses of the present invention are described in the detailed description below. [Means for solving the problem]

[0007] A process for preparing high-purity norbornene alkylsilyl ether of formula (I) is further described below. Specifically, a process for preparing industrial-scale high-purity norbornene methylsilyl ether is disclosed. Surprisingly, a catalytic amount of tris(pentafluorophenyl)borane facilitates the reaction of norbornene alkanol of formula (II) and silane of formula (III) as described herein. The high-purity norbornene alkylsilyl ether monomer of formula (I) prepared according to the process of the present invention is useful in a variety of applications, including, but not limited to, the preparation of high-quality, high-purity polynorbornene usable in a variety of electronic applications. [Modes for carrying out the invention]

[0008] In this specification, the articles "a," "an," and "the" are considered to include multiple subjects unless explicitly limited to a single subject.

[0009] The numbers, numerical values, and / or formulas indicating quantities of components, reaction conditions, etc., described herein and in the claims attached herein, reflect the various uncertainties of the measurements performed to obtain those numbers, numerical values, and / or formulas, and therefore, unless otherwise stated, all shall be considered to include the term "approximately".

[0010] Where a numerical range is disclosed herein, such range is continuous and includes both the minimum and maximum values ​​of the range, as well as all values ​​between such minimum and maximum values. Furthermore, where a range refers to an integer, it includes all integers between the minimum and maximum values ​​of the range. Also, where multiple ranges are provided to describe a feature or characteristic, such ranges can be combined. That is, unless otherwise specified, all ranges disclosed herein should be understood to include any and all subranges contained therein. For example, the explicitly stated range "1 to 10" should be considered to include any and all subranges between the minimum value of 1 and the maximum value of 10. Exemplary subranges of the range 1 to 10 include, but are not limited to, 1 to 6.1, 3.5 to 7.8, and 5.5 to 10.

[0011] As used herein, the term "alkyl" refers to a linear or branched saturated hydrocarbon substituent having a specific number of carbon atoms. Specific alkyl groups include methyl, ethyl, n-propyl, isopropyl, and tert-butyl. Derived terms such as "alkoxy," "thioalkyl," "alkoxyalkyl," "hydroxyalkyl," "alkylcarbonyl," "alkoxycarbonylalkyl," "alkoxycarbonyl," "diphenylalkyl," "phenylalkyl," "phenylcarboxyalkyl," and "phenoxyalkyl" should be interpreted accordingly.

[0012] As used herein, the term "cycloalkyl" includes all known cyclic groups. Representative examples of "cycloalkyl" include, but are not limited to, cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, and cyclooctyl. Derived terms such as "cycloalkoxy," "cycloalkylalkyl," "cycloalkylaryl," and "cycloalkylcarbonyl" should be interpreted accordingly.

[0013] As used herein, the term "perhaloalkyl" refers to an alkyl group as defined above, in which all hydrogen atoms of the alkyl group are replaced by halogen atoms selected from fluorine, chlorine, bromine, or iodine. Examples include trifluoromethyl, trichloromethyl, tribromomethyl, triiodomethyl, pentafluoroethyl, pentachloroethyl, pentabromoethyl, pentaiodoethyl, and linear or branched heptafluoropropyl, heptachloropropyl, heptabromopropyl, nonafluorobutyl, nonachlorobutyl, undecafluoropentyl, undecachloropentyl, tridecafluorohexyl, and tridecachlorohexyl. The derived expression "perhalokoxy" should be interpreted accordingly. Furthermore, some of the alkyl groups described herein, such as "alkyl," may be partially fluorinated, i.e., only some of the hydrogen atoms of the alkyl group are replaced by fluorine atoms, and should be interpreted accordingly.

[0014] As used herein, the term "acyl" has the same meaning as "alkanoyl" and can also be structurally represented as "R-CO-", where R is an alkyl as defined herein, having a specific number of carbon atoms. In addition, "alkylcarbonyl" has the same meaning as "acyl" as defined herein. Specifically, "(C1-C4)acyl" means formyl, acetyl or ethanol, propanoyl, n-butanoyl, etc. Derived expressions such as "acyloxy" and "acyloxyalkyl" should be interpreted accordingly.

[0015] As used herein, the term "aryl" means substituted or unsubstituted phenyl or naphthyl. Specific examples of substituted phenyl or naphthyl include, for example, o-, p-, m-tolyl, 1,2-, 1,3-, 1,4-xylyl, 1-methylnaphthyl, and 2-methylnaphthyl. "Substituted phenyl" or "substituted naphthyl" includes any of the possible substituents further defined herein or known in the art.

[0016] As used herein, the expression "arylalkyl" means that the aryl as defined herein is further bonded to the alkyl as defined herein. Representative examples include, for example, benzyl, phenylethyl, 2-phenylpropyl, 1-naphthylmethyl, 2-naphthylmethyl, and the like.

[0017] As used herein, the expression "alkenyl" means an acyclic straight-chain or branched hydrocarbon chain having a specific number of carbon atoms and containing at least one carbon-carbon double bond, including ethenyl, as well as linear or branched propenyl, butenyl, pentenyl, hexenyl, and the like. The derived expressions "arylalkenyl" and 5- or 6-membered "heteroarylalkenyl" should be interpreted accordingly. Exemplary explanations of such derived expressions include furan-2-ethenyl, phenylethenyl, 4-methoxyphenylethenyl, and the like.

[0018] As used herein, the expression "heteroaryl" includes all known heteroatoms containing an aromatic radical. Representative 5-membered heteroaryl radicals include furanyl, thienyl or thiophenyl, pyrrolyl, isopyrrolyl, pyrazolyl, imidazolyl, oxazolyl, thiazolyl, isothiazolyl, and the like. Representative 6-membered heteroaryl radicals include radicals such as pyridinyl, pyridazinyl, pyrimidinyl, pyrazinyl, triazinyl, and the like. Representative examples of bicyclic heteroaryl radicals include, for example, radicals such as benzofuranyl, benzothiophenyl, indolyl, quinolinyl, isoquinolinyl, cinnolyl, benzimidazolyl, indazolyl, pyridofuranyl, pyridothienyl, and the like.

[0019] As used herein, the term "heterocyclic" includes all known heteroatoms, including cyclic radicals. Representative five-membered heterocyclic radicals include tetrahydrofuranyl, tetrahydrothiophenyl, pyrrolidinyl, 2-thiazolinyl, tetrahydrothiazolyl, and tetrahydrooxazolyl. Representative six-membered heterocyclic radicals include piperidinyl, piperazinyl, morpholinyl, and thiomorpholinyl. Other heterocyclic radicals are not limited to and include, for example, azilidinyl, azepanyl, diazepanyl, diazabicyclo[2.2.1]hept-2-yl, and triazocanyl.

[0020] "Halogen" or "halo" refers to chloro, fluoro, bromo, and iodine.

[0021] In a broad sense, the term “substitution” is intended to include all acceptable substituents of an organic compound. In some of the specific embodiments disclosed herein, the term “substitution” means substitution with one or more substituents independently selected from the group consisting of (C1-C6)alkyl, (C2-C6)alkenyl, (C1-C6)perfluoroalkyl, phenyl, hydroxy, -CO2H, ester, amide, (C1-C6)alkoxy, (C1-C6)thioalkyl, and (C1-C6)perfluoroalkoxy. However, any other preferred substituents known to those skilled in the art may also be used in these embodiments.

[0022] Any atom in the text, illustrations, examples, and tables of the specification that does not satisfy the valence is presumed to have a suitable number of hydrogen atoms that satisfy such valence.

[0023] Therefore, according to the present invention, a process for preparing the compound of formula (I) is provided. [ka] Here, n is an integer from 1 to 10, where one or more CH2 may be substituted with (C1-C 10 ) alkyl or (C1-C 10 ) perfluoroalkyl, m is an integer from 0 to 2, R1, R2, and R3 may be the same or different and are independent of each other, and are hydrogen, halogen, methyl, ethyl, linear or branched (C3-C 12 ) alkyl, (C3-C 12 ) cycloalkyl, (C6-C 12 ) bicycloalkyl, (C7-C 14 ) tricycloalkyl, (C6-C 10 ) aryl, (C6-C 10 ) aryl(C1-C3)alkyl, (C5-C 10 ) heteroaryl, (C5-C 10 ) heteroaryl(C1-C3)alkyl, (C1-C 12 ) alkoxy, (C3-C 12 ) cycloalkoxy, (C6-C 12 ) bicycloalkoxy, (C7-C[[ID=三十一]] 14 ) tricycloalkoxy, (C6-C 10 ) aryloxy(Ci-C3)alkyl, (C5-C 10 ) heteroaryloxy(C1-C3)alkyl, (C6-C 10 ) aryloxy, (C5-C 10 ) heteroaryloxy, and (C1-C6) acyloxy, R4, R5, and R6 may be the same or different and are independent of each other, and are methyl, ethyl, linear or branched (C3-C 12 ) alkyl, and substituted or unsubstituted (C6-C 14 ) aryl,

[0024] The process is Under an inert atmosphere, introducing a solution of tris(pentafluorophenyl)borane into a suitable reactor, Into the above solution, a compound of formula (II) [ka] and the silane of formula (III) R4R5R6SiH (III) These are added simultaneously at a temperature of approximately 40°C to 90°C for a period of approximately 10 minutes to 120 minutes. The reaction mixture should be allowed to react for at least approximately 15 minutes. The reaction mixture is cooled to room temperature and treated with an aqueous solution of a base selected from the group consisting of lithium carbonate, lithium bicarbonate, sodium carbonate, sodium bicarbonate, potassium carbonate, potassium bicarbonate, ammonium hydroxide, tetramethylammonium hydroxide, and pyridine. The reaction mixture is distilled under reduced pressure at a temperature of approximately 130°C to 170°C to obtain the compound of formula (I).

[0025] Surprisingly, it was found that the compound of formula (I) could be obtained in quantitative yield and high purity, as summarized in Scheme I, by quantitatively adding a mixture containing substantially equimolar amounts of the compound of formula (II) and the compound of formula (III) to a solution containing a catalytic amount of tris(pentafluorophenyl)borane.

[0026] [ka]

[0027] Furthermore, various other Lewis acid catalysts having properties similar to tris(pentafluorophenyl)borane can also be used as catalysts in the process of the present invention. In this specification, "Lewis acid" means any substance that takes up an electron pair to form a covalent bond; that is, an electron pair acceptor. Examples of such Lewis acids include, but are not limited to, tris(2,4,6-trifluorophenyl)borane, tris(2,6-difluorophenyl)borane, tris(4-fluorophenyl)borane, and tris(4-trifluoromethylphenyl)borane.

[0028] Generally, to bring about the desired reaction as shown in Scheme I, it is advantageous to use a Lewis acid that is also soluble in solvents that are miscible or compatible with the compounds of formulas (II) and (III). Therefore, the Lewis acid of formula (IV) is a suitable Lewis acid applicable in the process of the present invention.

[0029] M(R7) x X y (IV)

[0030] Here, M is selected from the group consisting of boron, aluminum, gallium, indium, and thallium, and R7 is independently a substituted monovalent (C6-C) which may be the same as or different from each other. 14 ) represents an aryl group, where the aryl group is substituted with at least one electron-withdrawing group selected from the group consisting of -CF3, -NO2, -CN, and halogens, where X is a halogen, x is an integer between 1 and 3, and y is an integer between 0 and 3, where x + y = 3. In some embodiments, R7 is substituted with at least two halogens. In some other embodiments, a Lewis acid suitable for the process of the present invention is represented by formula (V).

[0031] B(R8) x X y (V)

[0032] Here, each R8 may be independent, identical or different from one another, and may be a substituted monovalent (C6-C 14 ) represents an aryl group, where the aryl group is substituted with at least one electron-withdrawing group selected from the group consisting of -CF3, -NO2, -CN, and halogens, where X is a halogen, x is an integer between 1 and 3, and y is an integer between 0 and 3, where x + y = 3. In some embodiments, R7 is substituted with at least two halogens.

[0033] Advantageously, tris(pentafluorophenyl)borane has been found to provide good catalytic activity in the preparation of the compound of formula (I). As mentioned above, since the amount of tris(pentafluorophenyl)borane used is catalytic, the purification of the final product requires minimal effort. The amount of tris(pentafluorophenyl)borane that can be used generally depends on the type of compound of formula (I) being prepared. Generally, the amount of tris(pentafluorophenyl)borane used is 0.1 mol% or less relative to the moles used of the compound of formula (II). That is, the molar ratio of formula (II):tris(pentafluorophenyl)borane is generally 2000:≤2. In some other embodiments, the molar ratio of the compound of formula (II):tris(pentafluorophenyl)borane is generally about 2000:1. That is, the molar percentage of tris(pentafluorophenyl)borane is about 0.05 mol% relative to the moles used of the compound of formula (II). Therefore, in some embodiments, tris(pentafluorophenyl)borane in amounts lower than 0.1 mol%, such as 0.05 mol%, 0.001 mol%, or less, may be used to obtain a higher purity compound of formula (I). Similarly, in some other embodiments, tris(pentafluorophenyl)borane in amounts higher than 0.2 mol%, may be used, depending on the type of compound of formula (I) being prepared. All such variations in the catalytic amount of tris(pentafluorophenyl)borane used are within the scope of the process of the present invention.

[0034] By implementing the process conditions according to the present invention, it has become possible to prepare a high-purity compound of formula (I). As used herein, "high purity" means a product independent of other impurities. Thus, in some embodiments, the compound of formula (I) prepared according to the present invention is at least 99% pure. In some other embodiments, the compound of formula (I) is at least 99.5% pure. In yet another embodiment, the compound of formula (I) is at least 99.8% pure.

[0035] By suitably using various silanes of formula (III), various norbornene alkanols of formula (II) can be used to form the corresponding silyl ethers of formula (I). In some embodiments, the compound of formula (II) used is n = 1, with R1, R2, and R3 being hydrogen atoms, R4 being methyl atoms, and R5 and R6 being phenyl atoms.

[0036] Generally, the process of the present invention is carried out under an inert atmosphere. Any known inert atmosphere may be used herein. In some embodiments, the inert atmosphere used is nitrogen. Other inert atmospheres that may be used include helium or argon.

[0037] Surprisingly, it was found that when an equimolar mixture of the compound of formula (II) and the compound of formula (III) was added to a solution of tris(pentafluorophenyl)borane at a moderately low temperature, the compound of formula (I) was formed. Tris(pentafluorophenyl)borane is soluble in any inert solvent. Suitable solvents include hydrocarbon solvents such as hexane, heptane, petroleum ether, benzene, toluene, and xylene, and halohydrocarbon solvents such as dichloromethane, 1,1-dichloroethane, chloroform, and carbon tetrachloride, as well as mixtures of any combination thereof. In some embodiments, the solvent used is toluene.

[0038] As mentioned above, generally, the compounds of formula (II) and formula (III) used are equimolar. However, various other molar ratios that can yield a high yield of the compound of formula (I) can also be used, as is well understood by those skilled in the art. Therefore, in some embodiments, a slight excess of the compound of formula (III) is used. For example, using a 5-10 mol% excess of the compound of formula (III) appears to yield a higher yield of the compound of formula (I).

[0039] As shown in Scheme I, according to the process of the present invention, a substantially equimolar mixture of the compound of formula (II) and the compound of formula (III) is slowly added to a stirred solution of tris(pentafluorophenyl)borane under an inert atmosphere to form the compound of formula (I), with the simultaneous generation of hydrogen. The reaction can preferably be carried out at a temperature moderately elevated above room temperature. For example, such a reaction can be carried out in a suitable reactor system at a temperature range of about 40°C to about 90°C. In some embodiments, the reaction can be carried out at a temperature range of about 50°C to about 80°C, in some other embodiments at a temperature range of about 60°C to about 70°C, and in some other embodiments at a temperature of about 65°C. In some other embodiments, the reaction can be carried out at a temperature higher than about 90°C.

[0040] Generally, the reaction between the compound of formula (II) and the compound of formula (III) is exothermic in the presence of tris(pentafluorophenyl)borane; therefore, the addition of the reactants is carried out in a predetermined order. The mixture is generally added slowly over a period of one hour or more. In some embodiments, the addition of the mixture is carried out over a period of about 10 to 120 minutes. In some other embodiments, the addition of the mixture may be carried out for more than 120 minutes, as is obvious to the art. After the addition of the mixture, it is generally advantageous to allow the reaction to proceed for a further period of about 10 minutes, or 20 minutes or more. Suitable reactor systems include, but are not limited to, vented glass reactors, suitable glass vessels and / or reactors, and glass-lined metal ones.

[0041] After the reaction is complete, it is extremely important to remove all residual catalyst tris(pentafluorophenyl)borane from the reaction mixture. Fortunately, it has been found that substantially all residual tris(pentafluorophenyl)borane can be removed by treating the reaction mixture with a suitable base. Suitable bases include, but are not limited to, alkali metal bases such as hydroxides, alkoxides, carbonates, or bicarbonates of lithium, sodium, potassium, or cesium, and alkaline earth metal bases such as hydroxides, alkoxides, carbonates, or bicarbonates of calcium or magnesium. Suitable inorganic or organic bases include, but are not limited to, ammonia, trialkylamines, imidazoles, and pyridines. Specific examples of alkali groups include lithium hydroxide, lithium methoxide, lithium ethoxide, lithium tert-butoxide, lithium carbonate, lithium bicarbonate, sodium hydroxide, sodium methoxide, sodium ethoxide, sodium tert-butoxide, sodium carbonate, sodium bicarbonate, potassium hydroxide, potassium methoxide, potassium ethoxide, potassium tert-butoxide, potassium carbonate, potassium bicarbonate, cesium hydroxide, methoxide, cesium ethoxide, tert-butoxide, cesium carbonate, cesium bicarbonate, calcium hydroxide, calcium methoxide, calcium ethoxide, calcium tert-butoxide, calcium carbonate, calcium bicarbonate, magnesium hydroxide, magnesium methoxide, magnesium ethoxide, magnesium tert-butoxide, magnesium carbonate, magnesium bicarbonate, ammonia, trimethylamine, triethylamine, imidazole, and any combination of these mixtures. In some embodiments, the base used to remove tris(pentafluorophenyl)borane is sodium carbonate in aqueous solution form.

[0042] Generally, the progress of a reaction can be monitored by separating a sample from the reactor and analyzing it using appropriate methods such as thin-layer chromatography (TLC), gas chromatography (GC), liquid chromatography (LC), or high-performance liquid chromatography (HPLC), or a combination of GC / mass spectrometry (MS), LC / MS, or other known techniques.

[0043] The various norbornene alkanols of formula (II) described herein are known and can be readily prepared by known methods. For example, U.S. Patent No. 9,382,271 describes a process for preparing high-purity norbornene alkanols, the relevant portion of which is incorporated herein by reference.

[0044] After treatment with an aqueous sodium carbonate solution, the reaction mixture is isolated and subjected to distillation. It has been found to be advantageous to remove volatile organic substances, such as solvents (e.g., toluene), present in the resulting product mixture under relatively low temperature and reduced pressure conditions. Therefore, in some embodiments, the resulting product mixture is distilled at a temperature of about 130°C to 160°C and a pressure of 100 to 200 Torr. Subsequently, the product is subjected to reduced-pressure distillation at a temperature of about 160°C to 170°C and 1 to 2 Torr to obtain a compound of formula (I) of extremely high purity as described herein.

[0045] Surprisingly, the process of the present invention can also yield a compound of formula (I) that is substantially free of boron residue from the catalyst used. Therefore, in some embodiments, the amount of boron present in the compound of formula (I) is less than 5 ppm, less than 4 ppm, less than 3 ppm, less than 2 ppm, and less than 1 ppm. In some other embodiments, the amount of boron present in the compound of formula (I) is about 1 ppm to 2 ppm. It is extremely important that the compound of formula (I) is not only highly pure but also boron-free, because it is used as a monomer in the preparation of high-quality polymers, as illustrated by the following specific examples.

[0046] In another embodiment of the present invention, a process for preparing the compound of formula (I) described herein is further provided, which is: The process involves introducing a toluene solution of tris(pentafluorophenyl)borane into a suitable reactor under a nitrogen atmosphere, To the above solution, equimolar amounts of the compound of formula (II) described herein and the silane of formula (III) described herein are added at a temperature of approximately 60°C to approximately 70°C for a period of approximately 120 minutes. The reaction mixture should be allowed to fully react for approximately 15 to 30 minutes. The reaction mixture is cooled to room temperature and treated with sodium carbonate. Toluene is removed by vacuum distillation at a temperature of approximately 130°C and a pressure of 100-200 Torr. The method includes obtaining a compound of formula (I) with a purity of at least 99% and a residual boron content of less than approximately 5 ppm by vacuum distillation at a temperature of approximately 160°C to 170°C and less than 1 Torr.

[0047] Another embodiment of the present invention also provides a process for preparing (bicyclo[2.2.1]hept-5-en-2-ylmethoxy)(methyl)diphenylsilane of formula (IB). [ka]

[0048] The process in question is The process involves introducing a toluene solution of tris(pentafluorophenyl)borane into a suitable reactor under a nitrogen atmosphere, To the above solution, equimolar amounts of norbornene methanol (IIB) and methyldiphenylsilane (IIIB) are added over a period of approximately 100 to 120 minutes. [ka] (C6H5)2(CH3)SiH (IIIB) The reaction mixture is allowed to react for another 20 minutes. The reaction mixture is cooled to room temperature and treated with sodium carbonate. To remove toluene by evaporation, The present invention includes performing vacuum distillation to obtain (bicyclo[2.2.1]hept-5-en-2-ylmethoxy)(methyl)diphenylsilane of formula (IB) having a purity of 99% or more and a residual boron content of less than approximately 2 ppm. In another embodiment of the process of the present invention, the (bicyclo[2.2.1]hept-5-en-2-ylmethoxy)(methyl)diphenylsilane has a purity of at least 99.8% and a residual boron content of less than approximately 1 ppm.

[0049] The present invention can be further illustrated by the following examples, which are provided for illustrative purposes and do not limit the scope of the invention.

[0050] (General) Examples

[0051] The following abbreviations are used to describe some compounds, apparatus, and / or methods employed herein to illustrate specific embodiments of the present invention.

[0052] NBMeOH: norbornene methanol; DPMS: Diphenylmethylsilane; FAB: Tris(pentafluorophenyl)borane; Pd-1206: (Acetonitrile) bis(triisopropylphosphine)palladium(acetate)tetrakis(pentafluorophenyl)borate; DANFABA: Dimethylanilinium tetrakis(pentafluorophenyl) borate; EA: Ethyl acetate; GC-FID: Gas chromatography-flame ionization detector; GPC: Gel Permeation Chromatography; M W :Weight average molecular weight; PDI: Dispersity Index

[0053] Example 1

[0054] NBMeOSiPh2Me:(Bicyclo[2.2.1]hept-5-en-2-ylmethoxy)(methyl)diphenylsilane

[0055] A solution of FAB (0.98 g) in toluene (2930 mL) was placed in a stirring reactor of appropriate size. The reactor was then sealed and filled with nitrogen, and a pressure test was performed. The reactor was operated in vent mode with a high flow rate of nitrogen flowing through the vent system. The reactor was heated to 65°C. After reaching the temperature, a mixture of NBMeOH (584 g) and DPMS (971 g) was quantitatively added to the reactor (over 100 minutes) to generate hydrogen and the compound of the present invention. After quantitative addition was complete, the reaction mixture was held at this temperature for 20 minutes and then cooled to room temperature (approximately 25°C). A solution of sodium carbonate (4100 g, 2.5 wt%) was added to the cooled reaction mixture and stirred for 30 minutes. After allowing the layers to settle for approximately 30-45 minutes, the lower aqueous layer was decanted and discarded. The process was repeated twice with deionized water (4100 g). Subsequently, volatile organic substances (mainly toluene) were removed under reduced pressure (approximately 100 Torr and 160°C).

[0056] Subsequently, the obtained compound of the present invention was purified by vacuum distillation using a short-pass wiped film evaporator. A first distillation pass at 130°C and approximately 1 Torr removed minor impurities (approximately 5% by weight). A second distillation pass at 164°C and approximately 1 Torr yielded the compound of the present invention (approximately 85% recovered). The purity of the compound of the present invention was >99%, as determined by GC FID and yield. Residual boron (from FAB) was approximately 1 ppm.

[0057] High-quality polymers were obtained by polymerization of the compounds of the present invention, as shown below.

[0058] Copolymerization of the compound of the present invention in Example 1

[0059] In a 40 mL vial, toluene (15 mL), hexylnorbornene (0.8 g), the compound of the present invention from Example 1 (1.5 g), and 1-hexene (0.2 g) were charged and heated to 80°C. Then, a catalyst solution of Pd-1206 (0.00044 g) and DANFABA (0.00029 g) in 0.1 mL of anhydrous EA was added to the reaction mixture to initiate polymerization. After 35 minutes, 0.2 g of hexylnorbornene dissolved in 0.4 mL of toluene was further added. After 3.5 hours, the conversion rate of the obtained polymer was 82%. The molecular weight of the polymer was determined by GPC, and M W The figures were 156,000 and PDI: 3.1.

[0060] Comparative Example 1

[0061] NBMeOSiPh2Me:(Bicyclo[2.2.1]hept-5-en-2-ylmethoxy)(methyl)diphenylsilane

[0062] A solution of FAB (0.98 g) in toluene (2900 mL) was placed in a stirring reactor of appropriate size. The reactor was then sealed and filled with nitrogen, and a pressure test was performed. The reactor was then operated in vent mode with a high flow rate of nitrogen through the vent system. The reactor was then heated to 65°C. A mixture of NBMeOH (584 g) and DPMS (971 g) was quantitatively charged into the reactor (over 100 minutes) to produce hydrogen and the compound of the present invention. After the weighing and addition was complete, the mixture was reacted for a further 20 minutes while maintaining the reaction temperature at 65°C. Then, pyridine (26 g) was added by sealed transfer to deactivate the FAB, the contents were cooled, and discharged by sealed transfer. Finally, volatile organic matter (mainly toluene) was removed by stripping under reduced pressure (approximately 100 Torr and 160°C).

[0063] Subsequently, the crude compound of the present invention obtained was purified by vacuum distillation using a short-pass wiped film evaporator. A first distillation pass at 130°C and approximately 1 Torr further removed minor residual impurities (approximately 5% by weight). A second distillation pass at 164°C and approximately 1 Torr yielded the compound of the present invention (approximately 85% recovered). The purity of the compound of the present invention was >99%, as determined by GC FID. Residual boron (from FAB) was approximately 12 ppm.

[0064] The following example shows that the compound of the present invention produced in Comparative Example 1 produces a copolymer of inferior quality with low conversion.

[0065] Copolymerization of the compound of the present invention in Comparative Example 1

[0066] In a 40 mL vial, toluene (15 mL), hexylnorbornene (0.8 g), NBMeOSiPh2Me (1.5 g) from Comparative Example 1, and 1-hexene (0.2 g) were charged and heated to 80°C. Then, a catalyst solution of Pd-1206 (0.00044 g) and DANFABA (0.00029 g) in 0.1 mL of anhydrous EA was added to the reaction mixture to initiate polymerization. After 35 minutes, 0.2 g of hexylnorbornene dissolved in 0.4 mL of toluene was added. After 3.5 hours, the conversion rate of the obtained polymer was 36%. The molecular weight of the polymer was determined by GPC, and M W The figures were 245,000 and PDI: 2.1.

[0067] Comparative Example 2

[0068] NBMeOSiPh2Me:(Bicyclo[2.2.1]hept-5-en-2-ylmethoxy)(methyl)diphenylsilane

[0069] Comparative Example 2 demonstrates that adding the reactants in an order other than that described in the process of the present invention reduces the conversion rate and decreases the purity of the compound of the present invention.

[0070] In a suitably sized four-necked round-bottom flask equipped with a thermometer inlet, a stirring bar, an N2 inlet via a septum, a gas outlet, an oil bubbler, and a reflux condenser, norbornene methanol (NBMeOH) (10 g) and toluene (100 mL) were charged. Subsequently, FAB (0.82 g) as a 10 wt% solution in toluene (9 mL) was added under a high flow rate of N2. To this stirred mixture, a solution of diphenylmethylsilane (15.9 g) in toluene (80 mL) was slowly added dropwise to control gas generation and exothermic reaction (maintaining the temperature below 50°C). After the addition was complete (approximately 1 hour), the reaction mixture was stirred for 18 hours.

[0071] Subsequently, the reaction mixture was filtered through a silica gel plug (10 cm in diameter x 2.5 cm in height). The silica gel plug was washed with toluene (100 mL x 2), and residual washing solvent from the silica gel cake was confirmed by TLC to confirm that the target product had already been completely eluted from the plug. The resulting solution was concentrated to a small volume, and 8.9 g of the target substance (34% yield) was isolated as a colorless liquid without further purification.

[0072] Although the present invention has been described with reference to the above examples, the present invention is not limited to these examples and encompasses the general scope described herein in general. Various modifications and embodiments can be made without departing from its spirit and scope.

Claims

1. A process for preparing the compound of formula (I), 【Chemistry 1】 In equation (I), n is an integer between 1 and 10, where there is one or more CHs. ２ However, (C １ -C １０ ) alkyl or (C １ -C １０ ) It may also be substituted with a perfluoroalkyl group. m is an integer between 0 and 2, R １ 、 R ２ 、 and R ３ may be the same or different and are independent of each other, and are hydrogen, halogen, methyl, ethyl, linear or branched (C ３ - C １２ ) alkyl, (C ３ - C １２ ) cycloalkyl, (C ６ - C １２ ) bicycloalkyl, (C ７ - C １４ ) tricycloalkyl, (C ６ - C １０ ) aryl, (C ６ - C １０ ) aryl(C １ - C ３ ) alkyl, (C ５ - C １０ ) heteroaryl, (C ５ - C １０ ) heteroaryl(C １ - C ３ ) alkyl, (C １ - C １２ ) alkoxy, (C ３ - C １２ ) cycloalkoxy, (C ６ - C １２ ) bicycloalkoxy, (C ７ - C １４ ) tricycloalkoxy, (C ６ - C １０ ) aryloxy(C １ - C ３ ) alkyl, (C ５ - C １０ ) heteroaryloxy(C １ - C ３ ) alkyl, (C ６ - C １０ ) aryloxy, (C<000​​​​​​​ R ４ , R ５ , and R ６ These may be the same or different, and may be methyl, ethyl, linear or branched (C) independently of each other. ３ -C １２ ) alkyl, and substituted or unsubstituted (C ６ -C １４ ) Selected from the group consisting of aryls, The aforementioned process, The process involves introducing a solution of tris(pentafluorophenyl)borane into a suitable reactor under an inert atmosphere, A mixture of the compound of formula (II) and the silane of formula (III) is added to the aforementioned solution at a temperature of 25°C to 80°C over a period of 10 to 120 minutes. 【Chemistry 2】 10 ４ 10 ５ 10 ６ THIS IS NOT The reaction mixture is then allowed to react for a further period of 15 to 120 minutes. The reaction mixture is cooled to room temperature and treated with a suitable base selected from the group consisting of lithium carbonate, lithium bicarbonate, sodium carbonate, sodium bicarbonate, potassium carbonate, potassium bicarbonate, ammonium hydroxide, tetramethylammonium hydroxide, and pyridine. The process comprises distilling the reaction mixture at a temperature of 130°C to 170°C under reduced pressure to obtain the compound of formula (I).

2. The process according to claim 1, wherein the compound of formula (I) has a purity of at least 99%.

3. The process according to claim 1, wherein the compound of formula (I) has a purity of at least 99.5%.

4. The process according to claim 1, wherein the compound of formula (I) has a purity of at least 99.8%.

5. n is 1, R １ , R ２ , and R ３ Each of them is hydrogen, and R ４ is methyl, R ５ and R ６ The process according to claim 1, wherein each of them is phenyl.

6. The process according to claim 1, wherein tris(pentafluorophenyl)borane is present in a catalytic amount.

7. The process according to claim 1, wherein the amount of tris(pentafluorophenyl)borane used is less than 0.2 mol% based on the moles of the compound of formula (II) used.

8. The process according to claim 1, wherein the amount of tris(pentafluorophenyl)borane used is 0.1 mol% to 0.2 mol% relative to the moles of the compound of formula (II) used.

9. The process according to claim 1, wherein the inert atmosphere is nitrogen.

10. The process according to claim 1, wherein tris(pentafluorophenyl)borane is dissolved in toluene.

11. A process for preparing the compound of formula (I), 【Transformation 3】 In equation (I), n is an integer between 1 and 10, where there is one or more CHs. ２ However, (C １ -C １０ ) alkyl or (C １ -C １０ ) It may also be substituted with a perfluoroalkyl group. m is an integer between 0 and 2, R １ 、R ２ 、and R ３ may be the same or different and are each independently hydrogen, halogen, methyl, ethyl, linear or branched (C ３ -C １２ ) alkyl, (C ３ -C １２ ) cycloalkyl, (C ６ -C １２ ) bicycloalkyl, (C ７ -C １４ ) tricycloalkyl, (C ６ -C １０ ) aryl, (C ６ -C １０ ) aryl(C １ -C ３ ) alkyl, (C ５ -C １０ ) heteroaryl, (C ５ -C １０ ) heteroaryl(C １ -C ３ ) alkyl, (C １ -C １２ ) alkoxy, (C ３ -C １２ ) cycloalkoxy, (C ６ -C １２ ) bicycloalkoxy, (C ７ -C １４ ) tricycloalkoxy, (C ６ -C １０ ) aryloxy(C １ -C ３ ) alkyl, (C ５ -C １０ ) heteroaryloxy(C １ -C ３ ) alkyl, (C ６ -C １０ ) aryloxy, (C ５ -C １０ ) heteroaryloxy, and, (C １ -C ６ ) acyloxy, and are selected from the group consisting of R ４ , R ５ , and R ６ These may be the same or different, and may be methyl, ethyl, linear or branched (C) independently of each other. ３ -C １２ ) alkyl, and substituted or unsubstituted (C ６ -C １４ ) Selected from the group consisting of aryls, The aforementioned process, The process involves introducing a toluene solution of tris(pentafluorophenyl)borane into a suitable reactor under a nitrogen atmosphere, A mixture of the compound of formula (II) and the silane of formula (III) is added to the aforementioned solution at a temperature of 60°C to 70°C over a period of 120 minutes. 【Chemistry 4】 10 ４ 10 ５ 10 ６ THIS IS NOT The reaction mixture is further allowed to react completely for a period of 15 to 30 minutes. The reaction mixture is cooled to room temperature and treated with sodium carbonate. Toluene is removed by vacuum distillation at a temperature of 130°C and a pressure of 100-200 Torr. A process comprising: obtaining a compound of formula (I) having a purity of at least 99% and a residual boron content of less than 5 ppm by vacuum distillation at a temperature of 160°C to 170°C and less than 1 Torr.

12. The process according to claim 11, wherein the compound of formula (I) has a purity of at least 99.5% and contains less than 2 ppm of residual boron.

13. n is 1, R １ , R ２ , and R ３ Each of them is hydrogen, and R ４ is methyl, R ５ and R ６ The process according to claim 11, wherein each of them is phenyl.

14. The process according to claim 11, wherein tris(pentafluorophenyl)borane is present in a catalytic amount.

15. The process according to claim 11, wherein the amount of tris(pentafluorophenyl)borane used is less than 0.2 mol% based on the moles of the compound of formula (II) used.

16. The process according to claim 11, wherein the amount of tris(pentafluorophenyl)borane used is 0.1 mol% to 0.2 mol% relative to the moles of the compound of formula (II) used.

17. The process according to claim 11 for preparing (bicyclo[2.2.1]hept-5-en-2-ylmethoxy)(methyl)diphenylsilane with a purity of at least 99.8%.

18. A process for preparing (bicyclo[2.2.1]hept-5-en-2-ylmethoxy)(methyl)diphenylsilane of formula (IB), 【Transformation 5】 The process involves introducing a toluene solution of tris(pentafluorophenyl)borane into a suitable reactor under a nitrogen atmosphere, To the aforementioned solution, equimolar amounts of norbornene methanol (IIB) and methyldiphenylsilane (IIIB) are added over a period of 100 to 120 minutes. 【Transformation 6】 (C ６ H ５ ) ２ (CH) ３ )SiH (IIIB) The reaction mixture is allowed to react for another 20 minutes. The reaction mixture is cooled to room temperature and treated with sodium carbonate. Removing toluene by evaporation, A process comprising distilling under reduced pressure to obtain (bicyclo[2.2.1]hept-5-en-2-ylmethoxy)(methyl)diphenylsilane of formula (IB) having a purity of at least 99% and less than 2 ppm of residual boron.

19. The process according to claim 18, wherein the purity of (bicyclo[2.2.1]hept-5-en-2-ylmethoxy)(methyl)diphenylsilane is at least 99.8% and the residual boron content is less than 1 ppm.

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