Recipe creation system, length measurement system, and recipe creation method

Abstract

According to the present invention, a design image based on design data is set for each image acquisition condition, and a length measurement cursor is set in each of the design images. This recipe creating system for creating a recipe in which a procedure for measuring the length of an observed object is described, involves executing: a storage process of storing design data of an observed object including a plurality of layers; a layer-setting process of setting, from among the plurality of layers, at least one layer for each image acquisition condition for the observed object; and a length measurement cursor-setting process of setting a length measurement cursor indicating a length measurement region of the observed object in a design image formed by a design present in the at least one layer set in the setting process.

Description

Technical Field

[0001] The present disclosure relates to a recipe creation system, a length measurement system, and a recipe creation method.

Background Art

[0002] In order to achieve large-scale and high-integration of semiconductor devices, device stacking is progressing. When multi-layerization progresses such as in a 3D-NAND structure, it becomes necessary to measure deep grooves and deep holes. Therefore, a scanning electron microscope equipped with a plurality of detectors (for example, a detector for detecting secondary electrons and a detector for detecting reflected electrons) has been proposed (for example, see Patent Document 1). Since the scanning electron microscope of Patent Document 1 includes a plurality of detectors, SEM images are diversified. For this reason, even at the same measurement position, depending on the SEM image, patterns of a plurality of layers may or may not be observed.

Prior Art Documents

Patent Documents

[0003]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0004] In the manufacturing process of a device, in order to perform dimensional management, measurement of a semiconductor pattern or the like is performed using a CD-SEM (Critical Dimension Scanning Electron Microscope). In order to measure a semiconductor pattern or the like, it is necessary to create a recipe describing the procedure for measurement. When creating a recipe on a CD-SEM, it takes time to move to the measurement coordinate value on the wafer and set a length measurement cursor while checking the pattern (SEM image) to be length-measured.

[0005] Creating recipes on a CD-SEM reduces the uptime of the device. Therefore, there is an offline recipe creation system that allows CD-SEM recipes to be created offline. This offline recipe creation system generates CD-SEM recipes offline (without using SEM images) by using semiconductor pattern design data.

[0006] Figure 11 shows an example of measuring semiconductor patterns according to a recipe created with a conventional offline recipe creation system. As shown in Figure 11, first, a recipe for measuring semiconductor patterns is created in the offline recipe creation system. For example, in the offline recipe creation system, in order to measure the distance between semiconductor patterns, a measuring cursor 1020 is set on semiconductor pattern 1010 in a design image 1000 based on the semiconductor pattern design data.

[0007] The measuring cursor 1020 described above is set on the SEM image 2000 captured by the CD-SEM, and the distance between semiconductor patterns 2010 on the SEM image 2000 is measured. Here, we will explain the case in which SEM image A and SEM image B are acquired due to the diversification of SEM images. SEM image A contains only the semiconductor pattern 2010 that is the target of observation, so the measuring cursor 1020 can accurately measure the distance between the semiconductor pattern 2010. However, SEM image B contains semiconductor patterns 2020 from other layers in addition to the semiconductor pattern 2010 that is the target of observation, so the measuring cursor 1020 overlaps with the semiconductor patterns 2020 of other layers and cannot measure the distance between the semiconductor pattern 2010 that is the target of observation.

[0008] Thus, if the design image 1000 based on the design data displayed in the offline recipe creation system does not substantially match the SEM image 2000, the measuring cursor 1020 cannot be positioned correctly.

[0009] In this case, the user needs to modify the measurement cursor in the CD-SEM, which adds extra work to modifying the recipe. Furthermore, in conventional offline recipe creation systems, there is only one type of design image based on design data for which a measurement cursor can be set, whereas there are multiple SEM images depending on the image acquisition conditions. Therefore, it is difficult to measure the lengths of multiple SEM images with a measurement cursor for one type of design image.

[0010] Therefore, this disclosure provides a recipe creation system that can set a design image based on design data for each image acquisition condition and set a length measuring cursor for each of the multiple design images. [Means for solving the problem]

[0011] To solve the above problems, the recipe creation system of this disclosure is a recipe creation system that creates a recipe describing a procedure for measuring the length of an object to be observed using a computer system, the computer system performing a storage process that stores design data of an object to be observed, including multiple layers, in a storage device; a layer setting process that sets one or more layers from among the multiple layers for each image acquisition condition of the object to be observed; and a length measuring cursor setting process that sets a length measuring cursor indicating the length measuring area of ​​the object to be observed on a design image composed of the designs present in the one or more layers set by the setting process. [Effects of the Invention]

[0012] According to this disclosure, a design image based on design data can be set for each image acquisition condition, and a length measuring cursor can be set for each of the multiple design images.

[0013] Other issues, configurations, and effects not mentioned above will be clarified by the following description of the embodiments. [Brief explanation of the drawing]

[0014] [Figure 1] This diagram shows the overall configuration of the length measuring system in Example 1. [Figure 2] This is a data flow diagram in the offline recipe creation system of Example 1. [Figure 3] This is a flowchart showing the processes executed in the offline recipe creation system of Example 1. [Figure 4] This is a diagram showing the design layout setting screen of Example 1. [Figure 5] This is a diagram showing the layer details setting screen of Example 1. [Figure 6] This is a diagram showing an example where the offline recipe creation system of Example 1 sets a length measurement cursor for a design image. [Figure 7] This is a diagram showing the SEM image display screen of Example 2. [Figure 8] This is a diagram showing the SEM image display screen of Example 3. [Figure 9] This is a diagram showing the configuration of a system including the learning system of Example 4. [Figure 10] This is a diagram showing the result output of the learning system of Example 4. [Figure 11] This is a diagram showing an example of measuring the length of a semiconductor pattern according to a recipe created by a conventional offline recipe creation system.

Embodiments for Carrying Out the Invention

[0015] Embodiments of the present disclosure will be described in detail based on the drawings. In the following embodiments, it is needless to say that the configuration (including the steps of the flowchart) is not necessarily essential except in cases where it is particularly specified and cases where it is considered clearly essential in principle. Hereinafter, preferred examples of the present disclosure will be described using the drawings. ​​​​​​​FIG. 1 is a diagram showing the overall configuration of the length measurement system of Example 1. Referring to FIG. 1, the configuration of the length measurement system 1 will be described. As shown in FIG. 1, the length measurement system 1 includes an offline recipe creation system 100 and a CD-SEM (charged particle beam apparatus) 200. The offline recipe creation system 100 and the CD-SEM 200 are communicably connected. The offline recipe creation system 100 has a computer system including a processor, a memory, etc., and is an information processing device such as a personal computer, a server, a tablet, or a smartphone. The offline recipe creation system 100 generates a recipe for the CD-SEM (information describing the procedure for measuring the measurement target) offline (without using SEM images). The CD-SEM 200 is a device for measuring the dimensions of a fine pattern of a semiconductor, and performs length measurement of a desired location according to the recipe. The CD-SEM 200 includes a plurality of detectors and can image the observation target under various image acquisition conditions according to the recipe.

[0017] [Configuration of Offline Recipe Creation System 100] Next, the configuration of the offline recipe creation system 100 will be described. The offline recipe creation system 100 includes a control unit 110, an input unit 120, and an output unit 130. The control unit 110 is a computer system and includes a processor 111, a main storage unit 112, an auxiliary storage unit 113, an input / output interface 114 (hereinafter, the interface is abbreviated as I / F), and a communication I / F 115.

[0018] The processor 111 is a central processing unit that controls the operation of each part of the control unit 110. The processor 111 is, for example, a CPU (Central Processing Unit), a DSP (Digital Signal Processor), or an ASIC (Application Specific Integrated Circuit). The processor 111 deploys programs stored in the auxiliary storage unit 113 into the working area of ​​the main memory unit 112 in an executable format. The main memory unit 112 stores programs executed by the processor 111, data processed by the processor, etc. The main memory unit 112 is, for example, flash memory or RAM (Random Access Memory). The auxiliary storage unit 113 stores various programs and various data. The auxiliary storage unit 113 stores various programs such as the OS (Operating System) and the length measurement cursor setting program 113a. The auxiliary storage unit 113 is, for example, a solid-state drive (SSD) or a hard disk drive (HDD). The input unit 120 is, for example, a keyboard or mouse. The output unit 130 is, for example, a display unit.

[0019] The CD-SEM200 also includes a control unit 210, an input unit 220, and an output unit 230. The control unit 210, input unit 220, and output unit 230 of the CD-SEM200 are the same as the control unit 110, input unit 120, and output unit 130 of the offline recipe creation system 100 described above, so their explanation will be omitted.

[0020] [Data flow in the offline recipe creation system 100] Figure 2 is a data flow diagram of the offline recipe creation system in Example 1. The data flow in the offline recipe creation system 100 will be explained with reference to Figure 2.

[0021] (1. Design data input) First, the user inputs design data 201 of the object to be observed (semiconductor pattern) into the offline recipe creation system 100. The design data 201 is, for example, CAD (Computer-Aided Design) data. The input design data 201 is registered in the design data DB 202. The design data DB 202 is stored, for example, in the auxiliary storage unit 113.

[0022] (2. Enter image acquisition conditions) Next, the user inputs one or more image acquisition conditions 203 for imaging the target object with the CD-SEM200. Image acquisition conditions include, for example, information such as the imaging position (coordinate values), imaging range, imaging magnification, and the detector to be used.

[0023] (3. Design Layout Settings) Next, the user sets the design layout 204 for each of the input image acquisition conditions 203. The setting of the design layout 204 is explained in detail in Figures 4 and 5 below.

[0024] (4. Creating a design template) When the design layout 204 is set for each image acquisition condition 203, the offline recipe creation system 100 creates a design template 205. The design template 205 is data that combines designs contained in one or more layers selected by the user from among the one or more layers that make up the design data.

[0025] (5. Measurement cursor settings) Once a design template is created, the offline recipe creation system 100 sets a length measuring cursor 206 for each of the design templates 205. The length measuring cursor indicates the length measuring area (X-direction size, Y-direction size) of the SEM image captured by the CD-SEM 200.

[0026] (6. Recipe creation and saving) The offline recipe creation system 100 creates a recipe in which a measuring cursor 206 is set in the design template 205 and saves it in the recipe file DB207. The recipe file DB207 is stored, for example, in the auxiliary storage unit 113.

[0027] (7. Submit the recipe) The offline recipe creation system 100 sends the recipes stored in the recipe file DB207 to the CD-SEM200.

[0028] The CD-SEM200 images the object of observation according to the image acquisition conditions 203 defined in the recipe, and measures the length of the object of observation within the length measurement range indicated by the length measurement cursor defined in the recipe.

[0029] [Data processing in the offline recipe creation system 100 (recipe creation method)] Figure 3 is a flowchart showing the processes performed by the offline recipe creation system of Example 1. The data processing performed by the offline recipe creation system 100 will be explained with reference to Figure 3. Each step in the flowchart shown in Figure 3 is performed, for example, by the processor 111 of the control unit 110 of the offline recipe creation system 100 executing the length measuring cursor setting program 113a stored in the auxiliary storage unit 113. Note that "1. Design data input", "2. Image acquisition condition input", "3. Design layout setting", "4. Design template creation", "5. Length measuring cursor setting", "6. Recipe creation and saving", and "7. Recipe transmission" in Figure 2 correspond to steps S301 to S307 in Figure 3, respectively.

[0030] (Step S301: Input of design data) The user inputs design data (layout file) of the object to be observed (e.g., a semiconductor pattern) into the offline recipe creation system 100. This design data (layout file) consists of multiple layers. The offline recipe creation system 100 can store multiple design data in the design data DB 202.

[0031] (Step S302: Input of image acquisition conditions for SEM images) Next, the user enters the image acquisition conditions for the SEM image. The coordinate values ​​and magnification of the image acquisition conditions can also be entered using a file that lists the coordinate values ​​and magnifications in pairs.

[0032] (Step S303: Setting the design layout for each image acquisition condition) Next, the user sets the design layout for each image acquisition condition of the SEM image. Specifically, the user sets the design layout for each image acquisition condition of the SEM image on the design layout setting screen (see Figure 4). First, the user sets the design data name 402 for each image acquisition condition. The user also selects the image acquisition condition 403 from the pull-down menu. The image acquisition conditions are saved as templates based on the user's prior settings. Alternatively, the user can enter the image acquisition conditions each time on the design layout screen. Next, the user sets the top cell name 401 of the design layout that constitutes the object of observation. The design layout is composed of patterns as cells, and the top cell is composed of multiple cells. It is also possible to set different design data names and top cell names for each image acquisition condition.

[0033] Furthermore, the user sets one or more layers for each image acquisition condition. By selecting the layer setting button 404 shown in Figure 4, the layer detail setting screen shown in Figure 5 is displayed. On the layer detail setting screen, the user imagines the design that may be observed when the CD-SEM200 images the target under the image acquisition conditions and selects the layer on which that design will be placed. The layer detail setting screen displays all layer numbers 502 included in the top cell. For each layer, the user sets the layer type 503 and the layer order 504. For example, for layer type 503, the user sets the layer containing the design of the target to Target, sets the layer containing the potentially observable design to Lower, Middle, or Reference, and sets the layer containing the unobservable design to None (not use). The user also sets the layer order 504, starting from the top layer. In addition, for layer existence 501, the user sets the layer containing the potentially observable design to "Yes" and the layer containing the unobservable design to "No".

[0034] After completing the various settings described above, the user selects the Register button 505 to register the layer details for each image acquisition condition. When the Register button 505 is selected, the design layout settings screen (Figure 4) is displayed. If the Save button 406 is selected here, the various information set for each image acquisition condition is saved. Since the images observed differ for each image acquisition condition, the user repeats the layer settings for each image acquisition condition.

[0035] (Step S304: Creating a design template) The offline recipe creation system 100 creates a design template based on image acquisition conditions and design layout settings. The design template is a file that represents a design image composed of designs included in the layers set in the design layout settings, using specified coordinate values ​​and imaging magnification.

[0036] (Step S305: Setting the measuring cursor) The offline recipe creation system 100 sets the length measuring cursor based on the created design template. The computer system automatically sets the length measuring cursor from the design image based on the design template, avoiding designs other than the Target. In other words, in this embodiment, the length measuring cursor can be set according to the design image for each image acquisition condition.

[0037] (Step S306: Creating and saving the recipe) The processes described in steps S305 and S306 above are repeated for each design template to set a length measuring cursor for each design template. Then, the computer system creates a recipe based on the image acquisition conditions and length measuring cursor set in the design template. The design template and recipe are saved in the recipe file DB207.

[0038] (Step S307: Submitting the recipe) The offline recipe creation system 100 sends the saved recipes to the CD-SEM200. The CD-SEM200 selects the received recipe and executes it.

[0039] (Example of setting the length measuring cursor) Figure 6 shows an example of the offline recipe creation system of Example 1 setting a length measuring cursor for a design image. The example of setting the length measuring cursor will be explained with reference to Figure 6.

[0040] The design image 601, based on the design data set in image acquisition condition A, includes a line pattern 602. The offline recipe creation system 100 sets a measuring cursor 603 for measuring the width of the line pattern 602 based on the design template set in image acquisition condition 1.

[0041] The SEM image 604 captured by the CD-SEM200 under image acquisition condition A includes a line pattern 605. Since the measuring cursor 606 is set on the line pattern 605 in the SEM image 604, the width of the line pattern 605 can be accurately measured.

[0042] The design image 611, based on the design data set in image acquisition condition B, is an overlay pattern in which the line pattern 612 and the underlying hole 613 overlap. The offline recipe creation system 100 sets a measuring cursor 614 to measure the width of the line pattern 612, avoiding the hole 613, based on the design template set in image acquisition condition B.

[0043] The SEM image 615 captured by the CD-SEM200 under image acquisition condition B includes a line pattern 616 and a hole 617. Since the measuring cursor 618 is set on the line pattern 616 of the SEM image 615, avoiding the hole 617, the width of the line pattern 616 can be accurately measured.

[0044] The design image 621, based on the design data set in image acquisition condition C, is a pattern that includes a vertical line pattern 622 and a horizontal line pattern 623 in the layer below or above it. The offline recipe creation system 100 sets a measuring cursor 624 for measuring the width of the vertical line pattern 622, based on the design template set in image acquisition condition C, so as not to include the horizontal line pattern 623.

[0045] The SEM image 625 captured by the CD-SEM200 under image acquisition condition 3 includes a vertical line pattern 626 and a horizontal line pattern 627. Since the measuring cursor 628 is set on the vertical line pattern 626 of the SEM image 625 so as not to include the horizontal line pattern 627, the width of the vertical line pattern 626 can be accurately measured.

[0046] (Effects of Example 1) In Example 1, a design image based on design data can be set for each image acquisition condition, and a length measurement cursor can be set for each design image. This allows the length measurement cursor to be set to match the various SEM images acquired by the CD-SEM200. As a result, the number of cases where the design image does not match the SEM image can be reduced, eliminating the need to correct the length measurement cursor while viewing the SEM image on the CD-SEM200.

[0047] The offline recipe creation system 100 can display the design image and the measuring cursor on a single screen. This allows the user to easily set the measuring cursor when setting it manually.

[0048] Furthermore, experienced users can select the appropriate layer from among multiple layers that make up the design data for each image acquisition condition and set the design image.

[0049] Furthermore, since the user can select the design to be observed using layer type 503, the offline recipe creation system 100 can set the length measuring cursor while avoiding designs other than the design to be observed. [Examples]

[0050] In Example 2, the CD-SEM200 receives a design template from the offline recipe creation system 100 and displays a design image based on the received design template. In Example 2, the design image is also overlaid and displayed on the SEM image captured by the CD-SEM200.

[0051] Next, we will describe the procedure by which the CD-SEM200 in Example 2 overlays a design image onto the SEM image.

[0052] (1. Select a recipe using the CD-SEM200) The CD-SEM200 stores the recipe received from the offline recipe creation system 100 (see step S307 in Figure 3). The user selects the recipe received from the offline recipe creation system 100 on the CD-SEM200.

[0053] (2. Executing the recipe) The CD-SEM200 then executes the selected recipe. The CD-SEM200 images the target object according to the image acquisition conditions set in the recipe and measures the length of the target object in the SEM image using the length measuring cursor set in the recipe.

[0054] (3. Check the execution results (overlay display of the design)) Once the above-described recipe has been executed, the user visually checks the SEM image display screen (Figure 7) to see if the measurement cursor set on the design image based on the design template has been used to measure the object being observed. The SEM image display screen (Figure 7) is displayed on the output unit (display unit) 230 of the CD-SEM200. When image acquisition condition 701 is selected on the SEM image display screen, the SEM image acquired under the selected image acquisition condition is displayed in the image display area 705.

[0055] In Example 2, the CD-SEM200 displays a design image overlaid on the SEM image. To operate it, select a design image from the pull-down menu for Design 702 on the SEM image display screen (Figure 7), and then select Design 706 from the pull-down menu for Overlay 703. The design image will then be displayed overlaid on the SEM image in the image display area 705. Alternatively, selecting Cursor 708 from the pull-down menu for Overlay 703 will display a measuring cursor overlaid on the SEM image in the image display area 705. Note that both Design 706 and Cursor 708 can be selected simultaneously, and it is also possible to display both the design image and the measuring cursor overlaid on the SEM image at the same time.

[0056] (Effects of Example 2) In Example 2, the design image and measurement cursor can be overlaid on the SEM image, making it easy to confirm the position of the measurement cursor. Without this display function, if the measurement cursor display and the SEM image are out of sync, resulting in a measurement error, the original design image cannot be viewed on the CD-SEM200. Therefore, even to correct the original design image, it is necessary to return to the offline recipe creation system and check the screen, which takes time. By using the overlay image to check where the discrepancy is, it becomes possible to correct the design to better match the SEM image, thus shortening the recipe creation time. [Examples]

[0057] In Example 3, the CD-SEM200 can change the design image in accordance with the SEM image. In Example 3, if there is a discrepancy between the SEM image displayed in the image display area 705 (see Example 2) and the design image, resulting in a measurement error, the CD-SEM200 can change the design image while referring to the SEM image.

[0058] (1. Display of design image) In Example 3, the CD-SEM200 displays the SEM image 801 and the design image 802 on the output unit (display unit) 230. The SEM image 801 contains two horizontal line patterns 804 that are not present in the design image 802. Also, similar to Example 2, the CD-SEM200 in Example 3 displays an overlay image 803, which is the design image overlaid on the SEM image. The measuring cursor 806 is also overlaid on this overlay image 803. The horizontal line patterns 804, which are on a layer not set in the design image 802, are present in the SEM image 801. Therefore, in region R in Figure 8, the measuring cursor 806 overlaps with the horizontal line patterns 804, resulting in a measurement error. Thus, in the CD-SEM200, it is necessary to readjust the position and range of the measuring cursor 806 by referring to the SEM image 801 so that the measuring cursor 806 does not overlap with the horizontal line patterns 804.

[0059] (2. Correction of design image and measurement cursor) The user modifies the design image in the CD-SEM200 to match the SEM image. For example, when the Design Setting button 704 in Figure 7 is selected, the same screen as the design layout setting screen (Figure 4) displayed in the offline recipe creation system 100 is displayed in the CD-SEM200. On that screen, the user selects the SEM image acquisition conditions 403 and the layer setting button 404 in the layer settings 405, and the layer details setting screen (Figure 5) is displayed in the CD-SEM200. Here, the user selects layer number 502, which corresponds to the two horizontal lines visible in the SEM image, and sets the layer existence status 501 to "Yes". Then, the user selects the register button 505 to return to the design layout setting screen (Figure 3), and selects the save button 406 to make the modifications.

[0060] If the save button 406 is selected, the design template managed by the offline recipe creation system 100 will also be modified accordingly. The design template managed by the offline recipe creation system 100 and the design template managed by the CD-SEM200 will be synchronized to have the same content.

[0061] (Effects of Example 3) As described above, in Example 3, the user can modify the layer existence status 501 on the CD-SEM200 and display the modified design image. Then, the user can select design 702 again on the image display screen (Figure 7), set the display of Design 706 to On in Overlay 703, and display the modified design image 809.

[0062] Furthermore, when saving the modified length measuring cursor 808, which has been corrected to not overlap with the horizontal pattern 807 in accordance with the revised design image, by pressing the save button 707 on the device, the length measuring cursor of the recipe on the offline recipe creation system 100 can also be saved in sync, significantly reducing the recipe creation time.

[0063] In Example 3, the design image and the measurement cursor can be modified on the CD-SEM200. [Examples]

[0064] In Examples 2 and 3, the user sets the design layout for each image acquisition condition. In Example 4, the AI-trained system automatically sets the design image based on the image acquisition condition. In Example 1, a user with expertise who can predict the SEM images acquired based on the image acquisition condition sets the design image for each image acquisition condition, but this function allows anyone to set the image by having the AI ​​learn the skills of an expert.

[0065] (1. Learning using a learning system) As shown in Figure 9, the offline recipe creation system 901 and the CD-SEM200 are connected to the learning system 903 via a network. In the offline recipe creation system 901, when setting the design layout for each image acquisition condition, a design setting 905 is made to indicate whether or not a layer exists for each image acquisition condition 904. This information (learning data) is input to the learning system 903.

[0066] Furthermore, the modifications to the design settings 905 for the presence or absence of layers for each image acquisition condition 904 performed on the CD-SEM200 are also input into the learning system 903. Alternatively, the design settings 905 can be modified using the offline recipe creation system 901, and the modifications can be input into the learning system 903. This makes the design settings 905 for each image acquisition condition 904 more suitable for the SEM image, improving accuracy. By repeatedly inputting this information into the learning system 903, the design settings 905 for each image acquisition condition can be further trained in the learning system 903.

[0067] (2. Automatic design settings in the offline recipe creation system) The user selects image acquisition conditions. Based on the selected image acquisition conditions, the learning system 903 acquires a design image that matches the conditions and automatically sets it. At this time, a length measuring cursor may be set on the design image. The design image to be set includes all items that can be set on the design layout setting screen (Figure 3) for each image acquisition condition.

[0068] As shown in Figure 10, when the image acquisition condition 1001 is input to the offline recipe creation system 901, the learning system 903 can output a design image 1002 based on the image acquisition condition 1001. For example, if the user selects image acquisition condition A, the offline recipe creation system 901 automatically sets a design image 1006 that does not include the patterns of layer 2 and layer 3 from the layers included in the original design 1004. Also, if the user selects image acquisition condition B, the offline recipe creation system 901 automatically sets a design image 1007 that does not include the pattern of layer 3 from the layers included in the original design 1004. Also, if the user selects image acquisition condition C, the offline recipe creation system 901 automatically sets a design image 1008 that does not include the pattern of layer 2 from the layers included in the original design 1004.

[0069] (Effects of Example 4) This eliminates the need for layer settings for each image acquisition condition, which was previously only possible for experienced users, and significantly improves the efficiency of recipe creation.

[0070] This disclosure is not limited to the embodiments described above, but includes various modifications. The embodiments described above are explained in detail to make the disclosure easier to understand, and are not necessarily limited to having all the configurations described. It is also possible to replace parts of the configuration of one embodiment with the configuration of another embodiment, and to add configurations from other embodiments to the configuration of one embodiment. Furthermore, it is possible to add, delete, or replace parts of the configuration of each embodiment with other configurations.

[0071] For example, in Example 1, an example was described in which the offline recipe creation system 100 automatically sets a length measuring cursor on a design image, but the user may set the length measuring cursor manually. In this case, the system may determine whether the position of the manually set length measuring cursor is appropriate and provide a warning or other notification. [Explanation of symbols]

[0072] 1: Measurement system, 100: Offline recipe creation system, 110: Control unit, 111: Processor, 112: Main memory unit, 113: Auxiliary memory unit, 114: Input / Output I / F, 115: Communication I / F, 120: Input unit, 130: Output unit, 200: CD-SEM, 201: Design data, 202: Design data DB, 203: Image acquisition conditions, 204: Design layout, 205: Design template, 206: Measurement cursor, Recipe file DB, 210: Control unit, 220: Input unit, 230: Output unit

Claims

1. A recipe creation system that creates a recipe describing the procedure for measuring an object of observation using a computer system, The aforementioned computer system, A storage process that stores the design data of the object to be observed, which includes multiple layers, in a storage device, A layer setting process that sets one or more layers from the plurality of layers for each image acquisition condition of the observed target, A measurement cursor setting process is performed to automatically set a measurement cursor indicating the measurement area of ​​the object to be observed on a design image composed of designs existing in the one or more layers set by the layer setting process, The aforementioned computer system, Further, a layer type setting process is performed to set a layer type that indicates whether or not each of the aforementioned plurality of layers is to be the object of observation. The measurement cursor setting process includes setting the measurement cursor in the design image while avoiding the designs of layers other than the layer set as the observation target by the layer type setting process. A recipe creation system characterized by the following features.

2. The aforementioned computer system, The recipe creation system according to claim 1, further characterized by performing a display process that displays the design image and the measuring cursor on a single screen.

3. The recipe creation system according to claim 1, characterized in that the layer setting process includes a process of setting one or more layers from the plurality of layers according to the user's selection.

4. The recipe creation system according to claim 1, characterized in that the layer setting process includes a process of setting one or more layers from the plurality of layers based on the image acquisition conditions.

5. The aforementioned computer system, The recipe creation system according to claim 1, further characterized by performing a transmission process to transmit a recipe including the image acquisition conditions and the length measurement cursor to a charged particle beam apparatus that measures the length of the object to be observed according to the recipe.

6. A length-measuring system comprising: a recipe creation system that creates a recipe describing a procedure for measuring the length of an object to be observed using a first computer system; and a charged particle beam apparatus that executes the recipe using a second computer system to measure the length of the object to be observed, The first computer system is A storage process that stores the design data of the object to be observed, which includes multiple layers, in a storage device, A layer setting process that sets one or more layers from the plurality of layers for each image acquisition condition of the observed target, A measurement cursor setting process is performed to automatically set a measurement cursor indicating the measurement area of ​​the object to be observed on a design image composed of designs existing in the one or more layers set by the layer setting process, The second computer system is A receiving process for receiving the aforementioned design image, The system performs a display process that captures an SEM image of the measurement area indicated by the measurement cursor, and displays the design image received by the reception process. The first computer system is Further, a layer type setting process is performed to set a layer type that indicates whether or not each of the aforementioned plurality of layers is to be the object of observation. The measurement cursor setting process includes setting the measurement cursor in the design image while avoiding the designs of layers other than the layer set as the observation target by the layer type setting process. A length measuring system characterized by the following features.

7. The measurement system according to claim 6, characterized in that the display process includes the process of overlaying the measurement cursor onto the SEM image and displaying it.

8. The second computer system is The length measuring system according to claim 6, further characterized in that a correction process is performed to correct the length measuring cursor on the SEM image displayed by the display process.

9. The learning system further comprises a learning system trained using training data that includes the image acquisition conditions and one or more layers set in the image acquisition conditions, The length measuring system according to claim 6, characterized in that the learning system executes the layer setting process which sets one or more layers from the plurality of layers for each image acquisition condition of the object to be observed.

10. The first computer system or the second computer system is Further layer modification processing is performed to modify one or more layers set in the image acquisition conditions, The length measuring system according to claim 9, characterized in that the learning system performs additional learning using learning data which includes the image acquisition conditions and one or more layers modified by the layer modification process.

11. A method for creating a recipe that describes the procedure for measuring the length of an object to be observed, The design data of the object to be observed, which includes multiple layers, is stored in a storage device. For each image acquisition condition of the observed object, one or more layers are selected from the plurality of layers. Automatically set a length measuring cursor indicating the length measuring area of ​​the object to be observed in the design image composed of the designs present in the one or more layers set above, and create a recipe including the image acquisition conditions and the set length measuring cursor. It has, The system further includes setting a layer type that indicates whether or not each of the aforementioned plurality of layers is the object of observation, Setting the measurement cursor includes setting the measurement cursor while avoiding the design of layers other than the layer designated as the object of observation in the design image. A method for creating recipes characterized by the following features.

12. The recipe creation method according to claim 11, further comprising displaying the design image and the length measuring cursor on a single screen.

13. The recipe creation method according to claim 11, characterized in that setting one or more layers includes setting one or more layers from among the multiple layers according to the user's selection.

14. The recipe creation method according to claim 11, characterized in that setting one or more layers includes setting one or more layers from among the multiple layers based on the image acquisition conditions.

15. The recipe creation method according to claim 11, further comprising transmitting a recipe including the image acquisition conditions and the length measuring cursor to a charged particle beam apparatus that measures the length of the object to be observed according to the recipe.

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