Automatic analysis device

Abstract

To improve probe cleaning power of a cleaning unit.SOLUTION: An automatic analyzer according to an embodiment comprises probes and a cleaning unit. The probes dispense a reagent or sample. The cleaning unit cleans the probes. The cleaning unit comprises a first nozzle and a second nozzle. The first nozzle discharges first cleaning water toward a first cleaning position. The second nozzle discharges second cleaning water toward a second cleaning position located below the first cleaning position.SELECTED DRAWING: Figure 3

Description

Technical Field

[0001] The embodiments disclosed in this specification and the drawings relate to an automatic analyzer.

Background Art

[0002] In an automatic analyzer for clinical tests, a biological sample (hereinafter referred to as a sample), such as blood and urine, and a reagent are mixed in a certain amount and reacted, and the amount of transmitted light or scattered light obtained by irradiating the mixed solution with light is measured to determine the concentration, activity value, and time taken for the change of the measurement target substance.

[0003] The sample and the reagent are dispensed using a probe attached to an arm. At this time, since different samples are dispensed using the same probe, washing is required every time the probe is used to prevent the occurrence of carry-over between specimens. Similarly, since different reagents are dispensed using the same probe, washing is required every time the probe is used.

Prior Art Documents

Patent Documents

[0004]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0005] One of the problems to be solved by the embodiments disclosed in this specification and the drawings is to improve the cleaning power of the probe by the cleaning unit. However, the problems to be solved by the embodiments disclosed in this specification and the drawings are not limited to the above problems. The problems corresponding to the respective effects of each configuration shown in the embodiments described later can also be regarded as other problems.

Means for Solving the Problems

[0006] The automated analyzer according to this embodiment comprises a probe and a washing unit. The probe dispenses reagents or samples. The washing unit washes the probe. The washing unit also comprises a first nozzle and a second nozzle. The first nozzle discharges first washing water toward a first washing position. The second nozzle discharges second washing water toward a second washing position located below the first washing position. [Brief explanation of the drawing]

[0007] [Figure 1] Figure 1 is a block diagram showing the functional configuration of an automated analyzer according to the first embodiment. [Figure 2] Figure 2 is a diagram illustrating the configuration of the analytical mechanism according to the first embodiment. [Figure 3] Figure 3 is a diagram illustrating the configuration of a probe cleaning unit according to the first embodiment. [Figure 4] Figure 4 is a block diagram showing the control configuration of the probe cleaning unit according to the first embodiment. [Figure 5] Figure 5 is a flowchart illustrating the procedure for probe cleaning using the automated analyzer according to the first embodiment. [Figure 6] Figure 6 is a flowchart illustrating the processing procedure for a normal cleaning process using an automated analyzer according to the first embodiment. [Figure 7] Figure 7 shows the state in which the probe has started to descend during the normal cleaning process according to the first embodiment. [Figure 8] Figure 8 shows the state in which the probe has been lowered from the first cleaning position during the normal cleaning process according to the first embodiment. [Figure 9] Figure 9 shows the state shown in Figure 8 in a cross-section perpendicular to the vertical direction. [Figure 10] Figure 10 shows the state in which the probe is raised above the first cleaning position during a normal cleaning process according to the first embodiment. [Figure 11]Figure 11 is a flowchart illustrating the processing procedure for a two-stage washing process using an automated analyzer according to the first embodiment. [Figure 12] Figure 12 shows the state in which the probe has started to descend during the two-stage cleaning process according to the first embodiment. [Figure 13] Figure 13 shows the state in which the probe has been lowered from the first cleaning position in the two-stage cleaning process according to the first embodiment. [Figure 14] Figure 14 shows the state in which the probe has been lowered below the second cleaning position in the two-stage cleaning process according to the first embodiment. [Figure 15] Figure 15 shows the state in which the probe is raised above the second cleaning position in the two-stage cleaning process according to the first embodiment. [Figure 16] Figure 16 shows the state in which the probe is raised above the first cleaning position in the two-stage cleaning process according to the first embodiment. [Figure 17] Figure 17 illustrates the configuration of a probe cleaning unit according to a first modification of the first embodiment. [Figure 18] Figure 18 illustrates the configuration of a probe cleaning unit according to a second modification of the first embodiment. [Modes for carrying out the invention]

[0008] The following describes in detail an embodiment of the automated analyzer with reference to the drawings.

[0009] (First Embodiment) Figure 1 is a block diagram showing the functional configuration of the automatic analyzer 1 according to the first embodiment. The automatic analyzer 1 shown in Figure 1 comprises an analysis mechanism 2, an analysis circuit 3, a drive mechanism 4, an input interface 5, an output interface 6, a communication interface 7, a memory circuit 8, and a control circuit 9.

[0010] The analysis mechanism 2 mixes a sample such as blood or urine with a reagent solution used for each test item. Further, depending on the test item, the analysis mechanism 2 mixes a standard solution diluted at a predetermined magnification with the reagent solution used for this test item. The analysis mechanism 2 measures the optical physical property values of the mixture of the sample or the standard solution and the reagent solution. By this measurement, for example, standard data and test data represented by transmitted light intensity or absorbance, and scattered light intensity are generated.

[0011] The analysis circuit 3 is a processor that generates calibration data and analysis data by analyzing the standard data and the test data generated by the analysis mechanism 2. The analysis circuit 3, for example, reads an analysis program from the storage circuit 8 and analyzes the standard data and the test data according to the read analysis program. Incidentally, the analysis circuit 3 may include a storage area that stores at least a part of the data stored in the storage circuit 8.

[0012] The drive mechanism 4 drives the analysis mechanism 2 according to the control of the control circuit 9. The drive mechanism 4 is realized by, for example, gears, a stepping motor, a belt conveyor, and a lead screw.

[0013] The input interface 5 receives settings such as analysis parameters for each test item related to a sample for which an operator has instructed measurement or a sample for which measurement has been requested via the in-hospital network NW. The input interface 5 is realized by, for example, a mouse, a keyboard, a touch pad for which an instruction is input by touching an operation surface, and a touch panel. The input interface 5 is connected to the control circuit 9, converts an operation instruction input from an operator into an electrical signal, and outputs the electrical signal to the control circuit 9.

[0014] In this specification, the input interface 5 is not limited to those equipped with physical operating components such as a mouse and a keyboard. For example, the input interface 5 may include an electrical signal processing circuit that receives an electrical signal corresponding to an operation instruction input from an external input device provided separately from the automatic analysis device 1, and outputs this electrical signal to the control circuit 9.

[0015] The output interface 6 is connected to the control circuit 9 and outputs signals supplied from the control circuit 9. The output interface 6 is implemented by, for example, a display circuit, a printing circuit, and an audio device.

[0016] The display circuit may include, for example, a CRT display, a liquid crystal display, an organic EL display, an LED display, and a plasma display. The display circuit may also include a processing circuit that converts data representing the display target into a video signal and outputs the video signal externally. The printing circuit may include, for example, a printer. The printing circuit may also include an output circuit that outputs data representing the print target externally. The audio device may include, for example, a speaker. The audio device may also include an output circuit that outputs an audio signal externally. The output interface 6 may be implemented as a touch panel or touch screen together with the input interface 5.

[0017] Communication interface 7 connects, for example, to the hospital network NW. Communication interface 7 communicates data with the HIS (Hospital Information System) via the hospital network NW. Alternatively, communication interface 7 may communicate data with the HIS via the Laboratory Information System (LIS), which is connected to the hospital network NW.

[0018] The memory circuit 8 includes a storage medium that can be read by the processor. These storage mediums are, for example, magnetic storage media, optical storage media, or semiconductor memory. The memory circuit 8 does not necessarily have to be implemented using a single storage medium (memory device). For example, the memory circuit 8 may be implemented using multiple memory devices.

[0019] The memory circuit 8 stores the analysis program executed by the analysis circuit 3 and the control program for realizing the functions provided in the control circuit 9. The memory circuit 8 stores the calibration data generated by the analysis circuit 3 for each test item. The memory circuit 8 stores the analysis data generated by the analysis circuit 3 for each sample. The memory circuit 8 stores the test orders entered by the operator or the test orders received by the communication interface 7 via the hospital network NW.

[0020] The control circuit 9 is a processor that functions as the central hub of the automated analyzer 1. The control circuit 9 implements functions corresponding to the executed program by executing the program stored in the memory circuit 8. The control circuit 9 may also include a memory area that stores at least a portion of the data stored in the memory circuit 8.

[0021] The control circuit 9 has a system control function 91, for example, by executing a control program. In this embodiment, the case in which the system control function 91 is realized by a single processor is described, but it is not limited to this. For example, the control circuit may be configured by combining multiple independent processors, and the system control function 91 may be realized by each processor executing an operation program.

[0022] The control circuit 9, through its system control function 91, comprehensively controls each part of the automatic analyzer 1 based on the input information received from the input interface 5. For example, in the system control function 91, the control circuit 9 drives the drive mechanism 4 to perform measurements according to the test items, and controls the analysis circuit 3 to analyze the standard data and test data generated by the analysis mechanism 2.

[0023] Figure 2 is a schematic diagram showing an example of the configuration of the analysis mechanism 2 shown in Figure 1. The analysis mechanism 2 shown in Figure 2 comprises a reaction disk 201, a constant temperature unit 202, a sample disk 203, a first reagent storage unit 204, and a second reagent storage unit 205. The analysis mechanism 2 also comprises a sample dispensing arm 206, a sample dispensing probe 207, a first reagent dispensing arm 208, a first reagent dispensing probe 209, a second reagent dispensing arm 210, a second reagent dispensing probe 211, an electrode unit 212, a photometric unit 213, a washing unit 214, a stirring unit 215, and a probe washing unit 216.

[0024] First, I will explain the reaction disk 201, the constant temperature section 202, the sample disk 203, the first reagent storage room 204, and the second reagent storage room 205.

[0025] The reaction disk 201 holds multiple reaction vessels 2011 arranged in a ring shape. The reaction disk 201 transports the multiple reaction vessels 2011 along a predetermined path. Specifically, the reaction disk 201 is driven by a drive mechanism 4 to alternately rotate and stop at predetermined time intervals (hereinafter referred to as one period or one cycle), for example, every 4.5 seconds or 9 seconds. The reaction vessels 2011 are made of, for example, glass, polypropylene (PP), or acrylic. Multiple positions on the reaction disk 201 are set, including a sample dispensing position, a first reagent dispensing position, a second reagent dispensing position, and a stirring position.

[0026] The constant temperature unit 202 stores a heat transfer medium set to a predetermined temperature and raises the temperature of the mixed liquid contained in the reaction vessel 2011 by immersing the reaction vessel 2011 in the stored heat transfer medium.

[0027] The sample disc 203 holds multiple sample containers, each containing a sample to be measured, arranged in a ring shape. The sample disc 203 transports the multiple sample containers along a predetermined path. In the example shown in Figure 2, the sample disc 203 is positioned adjacent to the reaction disc 201. A sample aspiration position is set at a predetermined location on the sample disc 203. The sample disc 203 may also be covered by a removable cover.

[0028] The first reagent storage unit 204 keeps multiple reagent containers containing a first reagent that reacts with a predetermined component in the sample. In the example shown in Figure 2, the first reagent storage unit 204 is located adjacent to the reaction disk 201. A first reagent rack is rotatably provided inside the first reagent storage unit 204. The first reagent rack holds multiple reagent containers arranged in a ring shape. The first reagent rack is rotated by a drive mechanism 4. A first reagent aspiration position is set at a predetermined location on the first reagent storage unit 204. The reagent containers may also be called reagent bottles. The first reagent storage unit 204 may also be covered with a removable reagent cover.

[0029] The second reagent storage unit 205 keeps multiple reagent containers containing the second reagent cool. In the example shown in Figure 2, the second reagent storage unit 205 is located inside the reaction disk 201. A second reagent rack is rotatably installed inside the second reagent storage unit 205. The second reagent rack holds multiple reagent containers arranged in a ring shape. The second reagent rack is rotated by a drive mechanism 4. A second reagent aspiration position is set at a predetermined location on the second reagent storage unit 205. The second reagent storage unit 205 may also be covered by a removable reagent cover.

[0030] Next, we will describe the sample dispensing arm 206, sample dispensing probe 207, first reagent dispensing arm 208, first reagent dispensing probe 209, second reagent dispensing arm 210, second reagent dispensing probe 211, electrode unit 212, photometric unit 213, washing unit 214, stirring unit 215, and probe washing unit 216.

[0031] The sample dispensing arm 206 is positioned between the reaction disk 201 and the sample disk 203. The sample dispensing arm 206 is provided by a drive mechanism 4 so as to be able to move vertically up and down and rotate horizontally. The sample dispensing arm 206 holds a sample dispensing probe 207 at one end.

[0032] The sample dispensing probe 207 rotates along an arc-shaped rotational trajectory as the sample dispensing arm 206 rotates. A sample dispensing position, a washing position, and a sample aspiration position are set along this rotational trajectory. The sample dispensing position is set, for example, at the intersection of the rotational trajectory of the sample dispensing probe 207 and the movement trajectory of the reaction vessels 2011 arranged in a ring shape on the reaction disk 201. The washing position is set, for example, on the probe washing unit 216. The sample aspiration position is set, for example, at the intersection of the rotational trajectory of the sample dispensing probe 207 and the movement trajectory of the sample containers arranged in a ring shape on the sample disk 203.

[0033] The sample dispensing probe 207 is driven by the drive mechanism 4 and moves vertically in the following positions: directly above the opening of the reaction vessel 2011 held on the reaction disk 201 (sample discharge position), directly above the probe washing unit 216 (washing position), and directly above the opening of the sample container held on the sample disk 203 (sample aspiration position).

[0034] Furthermore, the sample dispensing probe 207 dispenses the sample contained in the sample container. Specifically, the sample dispensing probe 207, in accordance with the control circuit 9, aspirates the sample from the sample container located directly below the sample aspiration position. The sample dispensing probe 207, in accordance with the control circuit 9, then discharges the aspirated sample into the reaction vessel 2011 located directly below the sample discharge position. In addition, the sample dispensing probe 207 is washed in the probe washing unit 216 located directly below the washing position, in accordance with the control circuit 9. The sample dispensing probe 207 performs a series of dispensing operations, including sample aspiration and discharge, and the washing operation performed after sample discharge, for example, in one cycle.

[0035] The first reagent dispensing arm 208 is provided, for example, between the reaction disk 201 and the first reagent storage 204. The first reagent dispensing arm 208 is provided by a drive mechanism 4 so as to be able to move vertically up and down and rotate horizontally. The first reagent dispensing arm 208 holds the first reagent dispensing probe 209 at one end.

[0036] The first reagent dispensing probe 209 rotates along an arc-shaped rotational trajectory as the first reagent dispensing arm 208 rotates. The first reagent aspiration position and the first reagent discharge position are located along this rotational trajectory. The first reagent aspiration position corresponds, for example, to the intersection of the rotational trajectory of the first reagent dispensing probe 209 and the movement trajectory of the openings of the reagent containers arranged in a ring shape on the first reagent rack. The first reagent discharge position corresponds, for example, to the intersection of the rotational trajectory of the first reagent dispensing probe 209 and the movement trajectory of the reaction vessels 2011 arranged in a ring shape on the reaction disk 201.

[0037] The first reagent dispensing probe 209 is driven by the drive mechanism 4 and moves vertically either directly above the opening of the reagent container held in the first reagent rack (first reagent aspiration position) or directly above the opening of the reaction vessel 2011 held in the reaction disk 201 (first reagent discharge position).

[0038] Furthermore, the first reagent dispensing probe 209, in accordance with the control circuit 9, aspirates the first reagent from the reagent container located directly below the first reagent aspiration position. The first reagent dispensing probe 209 also, in accordance with the control circuit 9, discharges the aspirated first reagent into the reaction vessel 2011 located directly below the first reagent discharge position. The first reagent dispensing probe 209 performs this series of aspiration and discharge operations once, for example, during one cycle. These dispensing operations are the same when the first reagent dispensing probe 209 dispenses the second reagent.

[0039] The second reagent dispensing arm 210 is provided, for example, between the reaction disk 201 and the second reagent storage 205. The second reagent dispensing arm 210 is provided by a drive mechanism 4 so as to be able to move vertically up and down and rotate horizontally. The second reagent dispensing arm 210 holds the second reagent dispensing probe 211 at one end.

[0040] The second reagent dispensing probe 211 rotates along an arc-shaped rotational trajectory as the second reagent dispensing arm 210 rotates. The second reagent aspiration position and the second reagent discharge position are located along this rotational trajectory. The second reagent aspiration position corresponds, for example, to the intersection of the rotational trajectory of the second reagent dispensing probe 211 and the movement trajectory of the opening of the reagent containers arranged in a ring shape on the second reagent rack. The second reagent discharge position corresponds, for example, to the intersection of the rotational trajectory of the second reagent dispensing probe 211 and the movement trajectory of the reaction vessels 2011 arranged in a ring shape on the reaction disk 201.

[0041] The second reagent dispensing probe 211 is driven by the drive mechanism 4 and moves vertically either directly above the opening of the reagent container held in the second reagent rack (second reagent aspiration position) or directly above the opening of the reaction vessel 2011 held in the reaction disk 201 (second reagent discharge position).

[0042] Furthermore, the second reagent dispensing probe 211, in accordance with the control circuit 9, aspirates the second reagent from the reagent container located directly below the second reagent aspiration position. The second reagent dispensing probe 211 also, in accordance with the control circuit 9, discharges the aspirated second reagent into the reaction vessel 2011 located directly below the second reagent discharge position. The second reagent dispensing probe 211 performs this series of aspiration and discharge operations once, for example, during one cycle.

[0043] The electrode unit 212 is located near the outer periphery of the reaction disk 201. The electrode unit 212 measures the electrolyte concentration of the mixture of sample and reagent discharged into the reaction vessel 2011. The electrode unit 212 has an ion-selective electrode (ISE) and a reference electrode. Following the control of the control circuit 9, the electrode unit 212 measures the potential between the ISE and the reference electrode for the mixture containing the ions to be measured. The electrode unit 212 outputs the measured potential data as standard data or test data to the analysis circuit 3.

[0044] The photometric unit 213 is located near the outer periphery of the reaction disk 201. The photometric unit 213 optically measures predetermined components in the mixture of sample and reagent discharged into the reaction vessel 2011. The photometric unit 213 has a light source and a photodetector. The photometric unit 213 irradiates light from the light source according to the control of the control circuit 9. The irradiated light enters the reaction vessel 2011 from the first side wall and exits from the second side wall opposite the first side wall. The photometric unit 213 detects the light emitted from the reaction vessel 2011 using the photodetector.

[0045] Specifically, for example, the photodetector detects light passing through a mixture of a standard sample and a reagent in the reaction vessel 2011, and generates standard data, expressed as absorbance, based on the intensity of the detected light. The photodetector also detects light passing through a mixture of a test sample and a reagent in the reaction vessel 2011, and generates test data, expressed as absorbance, based on the intensity of the detected light. The photometric unit 213 outputs the generated standard data and test data to the analysis circuit 3.

[0046] The cleaning unit 214 is located near the outer circumference of the reaction disk 201. The cleaning unit 214 cleans the inside of the reaction vessel 2011 after the measurement of the mixed liquid has been completed by the electrode unit 212 or the photometric unit 213. The cleaning unit 214 is equipped with a cleaning liquid supply pump (not shown) that supplies cleaning liquid for cleaning the reaction vessel 2011. The cleaning unit 214 is also equipped with cleaning nozzles that discharge the cleaning liquid supplied from the cleaning liquid supply pump into the reaction vessel 2011 and suck up the mixed liquid and cleaning liquid inside the reaction vessel 2011.

[0047] The stirring unit 215 is located near the outer circumference of the reaction disk 201. The stirring unit 215 has a stirring bar, which is used to stir the mixture of the sample and the first reagent contained in the reaction vessel 2011, which is located at the stirring position on the reaction disk 201. Alternatively, the stirring unit 215 stirs the mixture of the sample, the first reagent, and the second reagent contained in the reaction vessel 2011.

[0048] The probe cleaning unit 216 is located between the reaction disk 201 and the sample disk 203. The probe cleaning unit 216 cleans the sample dispensing probe 207 after the sample has been dispensed. The probe cleaning unit 216 is an example of a cleaning unit.

[0049] Figure 3 shows an example of the configuration of the probe cleaning unit 216. Figure 3 shows the probe cleaning unit 216 in a cross-section parallel to the vertical direction. As shown in Figure 3, the probe cleaning unit 216 comprises a cleaning unit body 311, a first nozzle 312, and a second nozzle 314.

[0050] The cleaning unit body 311 is provided with an opening 3111 that opens upwards. The cleaning unit body 311 is formed in a hollow cylindrical shape with an open top. When cleaning the sample dispensing probe 207, the sample dispensing probe 207 is inserted into the opening 3111 from above, thereby inserting the sample dispensing probe 207 into the interior of the cleaning unit body 311.

[0051] The first nozzle 312 is attached to the side of the cleaning unit body 311 via the first nozzle 313. The first nozzle 313 is a through hole formed on the inner surface of the cleaning unit body 311. The first nozzle 312 extends along the horizontal direction. The first nozzle 313 is also oriented horizontally. Two first nozzles 313 are formed on the inner surface of the cleaning unit body 311. The two first nozzles 313 are positioned opposite each other. For example, the first nozzles 313 are positioned at approximately the same height in the vertical direction, on opposite sides of the central axis of the cleaning unit body 311.

[0052] The second nozzle 314 is attached to the side of the cleaning unit body 311 via a second nozzle opening 315. The second nozzle opening 315 is a through-hole formed on the inner surface of the cleaning unit body 311. The second nozzle 314 extends horizontally. The second nozzle opening 315 is also oriented horizontally. The second nozzle 314 is attached below the first nozzle 312. Therefore, the second nozzle opening 315 is located below the first nozzle opening 313.

[0053] Two second nozzles 315 are formed on the inner surface of the cleaning unit body 311. The two second nozzles 315 are positioned opposite each other. For example, the two first nozzles 313 are positioned at approximately the same height in the vertical direction, on opposite sides of the central axis of the cleaning unit body 311. Also, each of the second nozzles 315 is positioned directly below one of the first nozzles 313.

[0054] The number of first nozzles 313 and second nozzles 315 provided on the cleaning unit body 311 may be one or three or more. Furthermore, the second nozzles 315 may be positioned at a location different from directly below any of the first nozzles 313.

[0055] Figure 4 is a block diagram showing an example of the control configuration of the probe cleaning unit 216. The probe cleaning unit 216 further comprises a pure water supply unit 340 and a fine bubble water generation unit 350. The fine bubble water generation unit 350 does not necessarily have to be provided in the probe cleaning unit 216. The fine bubble water generation unit 350 may be provided, for example, within the automatic analyzer 1, or it may be an external device separate from the automatic analyzer 1.

[0056] The pure water supply unit 340 is connected to the first nozzle 312 via a tube (not shown). The pure water supply unit 340 supplies pure water to the inside of the cleaning unit body 311 via the first nozzle 312 and the first spray port 313. The pure water supply unit 340 is also connected to the fine bubble water generation unit 350 via a tube (not shown). The pure water supply unit 340 supplies pure water to the fine bubble water generation unit 350.

[0057] The pure water supply unit 340 controls the supply of pure water, for example, using a pump and an electromagnetic valve. The pure water supply unit 340 controls the supply of pure water used in the first nozzle 312 according to the control of the control circuit 9. The pure water supply unit 340 may supply pure water that has been injected into a bottle, or it may generate pure water by removing impurities from water and supply the generated pure water.

[0058] The first nozzle 312 discharges the first cleaning water W1 toward a first cleaning position P1 set inside the cleaning unit body 311. The first cleaning water W1 is, for example, pure water supplied from the pure water supply unit 340. In this embodiment, an example in which pure water is used as the first cleaning water W1 is described, but fine bubble water may also be used as the first cleaning water W1.

[0059] The first cleaning position P1 is set horizontally at the center of the cleaning unit body 311. The first cleaning position P1 is set vertically at approximately the same position as the first spray port 313. The first nozzle 312 discharges the first cleaning water W1 in a fan-shaped shower pattern, approximately horizontally. By discharging the first cleaning water W1 toward the first cleaning position P1, the first nozzle 312 cleans the dirt adhering to the surface of the portion of the sample dispensing probe 207 located at the first cleaning position P1.

[0060] The fine bubble water generation unit 350 generates fine bubble water using pure water supplied from the pure water supply unit 340. Fine bubble water is, for example, pure water containing fine bubbles. Fine bubbles can be broadly classified into two types based on their diameter: microbubbles and ultrafine bubbles. Fine bubble water only needs to contain either microbubbles or ultrafine bubbles. For example, the fine bubble water generation unit 350 generates fine bubble water by shearing bubbles in pure water. Alternatively, the fine bubble water generation unit 350 may generate fine bubble water by increasing the pressure to reduce the pressure of pure water in which gas has been dissolved, causing it to foam.

[0061] The fine bubble water generating unit 350 is connected to a second nozzle 314 via a tube (not shown). The fine bubble water generating unit 350 supplies fine bubble water to the inside of the cleaning unit body 311 via the second nozzle 314 and the second injection port 315. The fine bubble water generating unit 350 controls the supply of fine bubble water using, for example, a pump and an electromagnetic valve.

[0062] The second nozzle 314 discharges the second cleaning water W2 toward a second cleaning position P2 set inside the cleaning unit body 311. The second cleaning water W2 is, for example, fine bubble water supplied from the fine bubble water generation unit 350. In this embodiment, an example in which fine bubble water is used as the second cleaning water W2 is described, but pure water supplied from the pure water supply unit 340 may also be used as the second cleaning water W2.

[0063] The second cleaning position P2 is located below the first cleaning position P1. Furthermore, the second cleaning position P2 is set to approximately the same position as the second spray port 315 in the vertical direction. The second nozzle 314 discharges the second cleaning water W2 approximately horizontally toward the second cleaning position P2, thereby cleaning the dirt adhering to the surface of the portion of the sample dispensing probe 207 located at the second cleaning position P2.

[0064] The second nozzle 314 discharges the second cleaning water W2 at a flow velocity V2 greater than the flow velocity V1 of the first cleaning water W1 discharged from the first nozzle 312. The flow velocity V2 of the second cleaning water W2 discharged from the second nozzle 314 is optimized for probe cleaning.

[0065] Furthermore, the diameter D2 of the second nozzle 314 is smaller than the diameter D1 of the first nozzle 312. The diameter D2 of the second nozzle 314 is formed to a nozzle diameter that can produce a flow velocity optimized for probe cleaning.

[0066] Furthermore, the first nozzle 312 forms a water film that prevents the second cleaning water W2 from splashing to the outside by releasing the first cleaning water W1. For example, the first nozzle 312 forms a fan-shaped water film by releasing the first cleaning water W1.

[0067] Furthermore, as shown in Figure 3, the probe cleaning unit 216 further includes an outlet 316 and a waste liquid pipe 317. The outlet 316 is formed at the bottom of the cleaning unit body 311. The waste liquid pipe 317 is connected to the outlet 316. The waste liquid pipe 317 is connected to a waste liquid bottle (not shown). The waste liquid supplied via the waste liquid pipe 317 is stored in the waste liquid bottle. The first cleaning water W1 and the second cleaning water W2 used to clean the sample dispensing probe 207 are discharged from inside the cleaning unit body 311 through the outlet 316 and supplied to the waste liquid bottle via the waste liquid pipe 317.

[0068] Furthermore, the control circuit 9 controls the discharge state of the first washing water W1 and the second washing water W2 using the system control function 91. The control circuit 9 also determines whether or not to use the second washing water W2 for washing the sample dispensing probe 207 based on carryover information using the system control function 91. Carryover information includes, for example, the type of sample and the testing method. The control circuit 9 also initiates the discharge of the second washing water W2 from the second nozzle 314 using the system control function 91 when the tip of the sample dispensing probe 207 approaches the second washing position P2. In addition, if the second washing water W2 is being discharged, the control circuit 9 reduces the amount of the first washing water W1 discharged from the first nozzle 312.

[0069] (Probe cleaning process) Next, the operation of the probe cleaning process performed by the system control function 91 of the control circuit 9 will be described. The probe cleaning process is a process of cleaning the sample dispensing probe 207. Figure 5 is a flowchart of an example of the probe cleaning process procedure. Note that the processing procedures in each process described below are merely examples, and each process can be modified as appropriate as possible. In addition, steps in the processing procedures described below can be omitted, replaced, and added as appropriate depending on the embodiment. In the flowchart of Figure 5, the operation during one cycle in the test starts with the sample dispensing probe 207, which dispensed the sample at the sample dispensing position, having moved to the cleaning position.

[0070] (Step S101) The control circuit 9 acquires information regarding the carryover. Specifically, the control circuit 9 acquires the inspection method and the type of sample to be inspected as information regarding the carryover.

[0071] (Step S102) The control circuit 9 determines the likelihood of carryover based on information regarding carryover. Specifically, the control circuit 9 determines whether inter-sample carryover is likely to occur based on the testing method and sample type.

[0072] (Step S103) If inter-sample carryover is likely to occur (step S102-No), the control circuit 9 performs a normal washing process. In the normal washing process, the sample dispensing probe 207 is washed using only the first washing water W1 released from the first nozzle 312. The details of the normal washing process will be described later.

[0073] (Step S104) If there is a high probability of carryover occurring (step S102-Yes), the control circuit 9 performs a two-stage cleaning process. The two-stage cleaning process involves two stages of cleaning: cleaning using the first cleaning water W1, and cleaning using both the first cleaning water W1 and the second cleaning water W2. The details of the two-stage cleaning process will be described later.

[0074] Once the cleaning of the sample dispensing probe 207 by normal cleaning or two-stage cleaning is complete, the control circuit 9 terminates the probe cleaning process. Subsequently, the control circuit 9 moves the sample dispensing probe 207 from the cleaning position to the sample aspiration position and aspirates the next sample from the sample container directly below the sample aspiration position.

[0075] (Normal cleaning process) Next, the operation of the normal cleaning process performed in step S103 when the likelihood of carryover is low will be described. Figure 6 is a flowchart of an example of the procedure for the normal cleaning process. Figures 7 to 10 show the state of the probe cleaning unit 216 and the sample dispensing probe 207 during the normal cleaning process. Figures 7 to 10 show the probe cleaning unit 216 in a cross-section parallel to the vertical direction. In Figures 7 to 10, the direction of movement of the sample dispensing probe 207 is indicated by a dashed-dotted arrow, and the first cleaning water W1 discharged from the first nozzle 312 is indicated by a solid arrow.

[0076] (Step S201) The control circuit 9 initiates the descent of the sample dispensing probe 207. Simultaneously, the control circuit 9 controls the pure water supply unit 340 to initiate the discharge of the first washing water W1 from the first nozzle 312. Figure 7 shows the state after the descent of the sample dispensing probe 207 has begun and the discharge of the first washing water W1 from the first nozzle 312 has begun.

[0077] (Step S202) The control circuit 9 continuously acquires the position of the sample dispensing probe 207. For example, the control circuit 9 acquires the position of the sample dispensing probe 207 by detecting the position of the tip of the sample dispensing probe 207. The control circuit 9 lowers the sample dispensing probe 207 while the first washing water W1 is released from the first nozzle 312 until the sample dispensing probe 207 reaches its lowest position. The lowest position is the lowest position within the range of movement of the sample dispensing probe 207 during the normal washing process. The lowest position during the normal washing process is set lower than the first washing position P1.

[0078] While the sample dispensing probe 207 is descending, the tip of the sample dispensing probe 207 is inserted into the interior of the cleaning unit body 311 through an opening 3111 provided at the top of the cleaning unit body 311, and descends within the interior of the cleaning unit body 311. Figure 8 shows the state in which the sample dispensing probe 207 has descended below the first cleaning position P1 during the process of step S202. Figure 9 shows the state shown in Figure 8 in a cross-section perpendicular to the vertical direction. As shown in Figures 8 and 9, at the first cleaning position P1, the first cleaning water W1 released in a fan shape from the first nozzle 312 is sprayed onto the surface of the sample dispensing probe 207. Then, at the first cleaning position P1, the dirt adhering to the surface of the sample dispensing probe 207 is washed away by the first cleaning water W1 released from the first nozzle 312. As the sample dispensing probe 207 descends, it is washed by the first washing water W1, starting from the portion that reaches the first washing position P1. At the first washing position P1, the strong water flow formed by the first washing water W1 removes large contaminants adhering to the surface of the sample dispensing probe 207. The first washing water W1 released at the first washing position P1 is used to wash the sample dispensing probe 207 and is then discharged as waste liquid through the waste liquid pipe 317 into the waste liquid bottle.

[0079] (Step S203) When the sample dispensing probe 207 reaches its lowest position (step S202-Yes), the control circuit 9 stops the descent of the sample dispensing probe 207 and then starts the upward movement of the sample dispensing probe 207.

[0080] Figure 10 shows the state in which the sample dispensing probe 207 has risen above the first washing position P1 during the process of step S203. As shown in Figure 10, even when the sample dispensing probe 207 is raised, at the first washing position P1, the dirt adhering to the surface of the sample dispensing probe 207 is washed by the first washing water W1 released from the first nozzle 312. Then, when the sample dispensing probe 207 is removed from inside the washing unit body 311, the control circuit 9 stops the release of the first washing water W1 from the first nozzle 312, and the normal washing process ends.

[0081] (Two-stage washing process) Next, the operation of the two-stage washing process, which is performed in step S104 when there is a high probability of carryover occurring, will be described. Figure 11 is a flowchart of an example of the procedure for the two-stage washing process. Figures 12 to 16 show the state of the probe washing unit 216 and the sample dispensing probe 207 during the two-stage washing process. Figures 12 to 16 show the probe washing unit 216 in a cross-section parallel to the vertical direction. In Figures 12 to 16, the direction of movement of the sample dispensing probe 207 is indicated by a dashed-dotted arrow, and the first washing water W1 released from the first nozzle 312 and the second washing water W2 released from the second nozzle 314 are indicated by solid arrows.

[0082] (Step S301) The control circuit 9 initiates the descent of the sample dispensing probe 207. Simultaneously, the control circuit 9 initiates the discharge of the first washing water W1 from the first nozzle 312. Figure 12 shows the state after the descent of the sample dispensing probe 207 has begun and the discharge of the first washing water W1 from the first nozzle 312 has begun.

[0083] The tip of the sample dispensing probe 207 is inserted into the interior of the cleaning unit body 311 through an opening 3111 provided at the top of the cleaning unit body 311, and descends within the cleaning unit body 311.

[0084] (Step S302) The control circuit 9 continuously acquires the position of the sample dispensing probe 207. For example, the control circuit 9 acquires the position of the sample dispensing probe 207 by detecting the position of the tip of the sample dispensing probe 207. The control circuit 9 lowers the sample dispensing probe 207 while the first washing water W1 is released from the first nozzle 312 until the sample dispensing probe 207 reaches a reference position. The reference position is preset near the second washing position P2. For example, the reference position is set to be below the first washing position P1 and slightly above the second washing position P2.

[0085] Figure 13 shows the state in which the tip of the sample dispensing probe 207 has been lowered below the first washing position P1. As shown in Figure 13, when the sample dispensing probe 207 has not reached the reference position, the first washing water W1, which is discharged in a fan shape from the first nozzle 312, is sprayed onto the surface of the sample dispensing probe 207 at the first washing position P1, just as in the case of normal washing. Then, at the first washing position P1, the dirt adhering to the surface of the sample dispensing probe 207 is washed away by the first washing water W1 discharged from the first nozzle 312. At the first washing position P1, large pieces of dirt adhering to the surface of the sample dispensing probe 207 are removed by the thick water flow formed by the first washing water W1.

[0086] (Step S303) When the sample dispensing probe 207 reaches the reference position (step S302-Yes), the control circuit 9 controls the fine bubble water generation unit 350 to start the discharge of the second washing water W2 from the second nozzle 314. At the same time, the control circuit 9 reduces the flow velocity V1 of the first washing water W1 discharged from the first nozzle 312. In this case, the control circuit 9 reduces the flow velocity V1 of the first washing water W1 to the extent that a water film is formed that prevents droplets from scattering from the inside to the outside of the washing unit body 311.

[0087] Figure 14 shows the state in which the tip of the sample dispensing probe 207 is lowered below the second washing position P2 when the second washing water W2 is discharged from the second nozzle 314. As shown in Figure 14, when the tip of the sample dispensing probe 207 is lowered below the second washing position P2, the first washing water W1 is ejected in a fan shape from the first nozzle 312 toward the first washing position P1. At the first washing position P1, a thin film of water is formed horizontally by the first washing water W1 ejected from the first nozzle 312.

[0088] Simultaneously, at the second washing position P2, the second washing water W2 released from the second nozzle 314 is sprayed onto the surface of the sample dispensing probe 207. At the second washing position P2, the dirt adhering to the surface of the sample dispensing probe 207 is washed by the second washing water W2 released from the second nozzle 314. As the sample dispensing probe 207 descends, it is washed by the second washing water W2 sequentially, starting from the portion that reaches the second washing position P2. After being used to wash the sample dispensing probe 207, the second washing water W2 released to the second washing position P2 is discharged as waste liquid through the waste liquid pipe 317 into the waste liquid bottle.

[0089] The flow velocity V2 of the second washing water W2 is greater than the flow velocity V1 of the first washing water W1. Therefore, at the second washing position P2, the sample dispensing probe 207 is washed with a higher washing force than at the first washing position P1. Also, since the diameter D2 of the second nozzle 314 is smaller than the diameter D1 of the first nozzle 312, the diameter of the second washing water W2 discharged from the second nozzle 314 is smaller than the diameter of the first washing water W1 discharged from the first nozzle 312. In other words, at the second washing position P2, the pressure per unit area increases due to the fast, narrow water flow formed by the second washing water W2, so fine dirt that cannot be removed at the first washing position P1 can be removed.

[0090] Furthermore, because a second washing water W2 with a high flow rate is used, at the second washing position P2, the second washing water W2 that collides with the surface of the sample dispensing probe 207 is scattered into the surrounding area. The droplets scattered laterally and downward are collected at the outlet 316. The droplets scattered upward are prevented from moving upward by the thin film of water formed by the first washing water W1 at the first washing position P1, which acts as a drip-proof film. As a result, droplets scattered upward are prevented from passing through the opening 3111 and scattering outside the washing unit body 311.

[0091] (Step S304) The control circuit 9 lowers the sample dispensing probe 207 while releasing the first washing water W1 from the first nozzle 312 and the second washing water W2 from the second nozzle 314 until the sample dispensing probe 207 reaches its lowest position. The lowest position in the two-stage washing process is set lower than the second washing position P2.

[0092] (Step S305) When the sample dispensing probe 207 reaches its lowest position (step S304-Yes), the control circuit 9 stops the descent of the sample dispensing probe 207 and then starts the sample dispensing probe 207 rising. Even while the sample dispensing probe 207 is rising, at the second washing position P2, the second washing water W2 released from the second nozzle 314 washes any dirt adhering to the surface of the sample dispensing probe 207.

[0093] (Step S306) The control circuit 9 raises the sample dispensing probe 207 while the first washing water W1 is released from the first nozzle 312 and the second washing water W2 is released from the second nozzle 314, until the sample dispensing probe 207 reaches a reference position.

[0094] (Step S307) When the sample dispensing probe 207 reaches the reference position (step S306-Yes), the control circuit 9 stops the discharge of the second washing water W2 from the second nozzle 314. At the same time, the control circuit 9 increases the flow rate V1 of the first washing water W1 discharged from the first nozzle 312.

[0095] Figure 15 shows the state in which the sample dispensing probe 207 is raised above the second washing position P2 during the process in step S307. As shown in Figure 15, even when the sample dispensing probe 207 is raised, the dirt adhering to the surface of the sample dispensing probe 207 is washed away by the first washing water W1 released from the first nozzle 312 at the first washing position P1.

[0096] Figure 16 shows the state in which the sample dispensing probe 207 has risen above the first washing position P1. When the sample dispensing probe 207 is removed from inside the washing unit body 311, the control circuit 9 stops the discharge of the first washing water W1 from the first nozzle 312, and the two-stage washing process ends.

[0097] The effects of the automated analyzer 1 according to this embodiment will be described below.

[0098] The automated analyzer 1 according to this embodiment includes a probe for dispensing reagents or samples and a cleaning unit for cleaning the probe. Specifically, the automated analyzer 1 includes a sample dispensing probe 207 for dispensing samples and a probe cleaning unit 216 for cleaning the sample dispensing probe 207. The probe cleaning unit 216 includes a first nozzle 312 and a second nozzle 314. The first nozzle 312 discharges first cleaning water W1 toward a first cleaning position P1. The second nozzle 314 discharges second cleaning water W2 toward a second cleaning position P2 located below the first cleaning position P1. For example, the second nozzle 314 is located below the first nozzle 312.

[0099] With the above configuration, according to the automated analyzer 1 of this embodiment, the probe washing unit 216 can wash the sample dispensing probe 207 at both a first washing position P1 where the first washing water W1 is sprayed and a second washing position P2 where the second washing water W2 is sprayed. By performing a two-stage washing using the first washing water W1 and the second washing water W2, the washing power of the sample dispensing probe 207 by the probe washing unit 216 can be improved. Furthermore, by achieving high washing power, it is possible to suppress inter-sample carryover and ensure accuracy during micro-dispensing.

[0100] In this embodiment, the configuration of the probe washing unit 216 for washing the sample dispensing probe 207 has been described, but it is not limited to this configuration. For example, a probe washing unit for washing reagent dispensing probes (first reagent dispensing probe 209 and second reagent dispensing probe 211) may be configured similarly to the probe washing unit 216. In this case, the cleaning power of the reagent dispensing probes by the probe washing unit can be improved.

[0101] Furthermore, the second nozzle 314 can discharge the second washing water W2 at a flow rate greater than that of the first washing water W1 discharged from the first nozzle 312. With this configuration, at the second washing position P2, the sample dispensing probe 207 can be washed using a high-speed water flow with higher washing power than at the first washing position P1.

[0102] Furthermore, the diameter D2 of the second nozzle 314 is smaller than the diameter D1 of the first nozzle 312. Therefore, at the second washing position P2, the sample dispensing probe 207 can be washed using a narrower water flow than at the first washing position P1. By narrowing the water flow, it becomes easier to direct the second washing water W2 to the target location. In addition, by using a fast, narrow water flow, the pressure per unit area increases, so fine dirt that cannot be removed at the first washing position P1 can be removed. Moreover, by using a narrow water flow, the amount of washing water used can be reduced.

[0103] In other words, according to this embodiment, after using a wide water flow from the first washing water W1 to wash away large dirt particles, the cleaning power can be enhanced by using a high-speed, narrow water flow from the second washing water W2 to further remove fine dirt particles.

[0104] Furthermore, the first nozzle 312 can form a water film that prevents the second cleaning water W2 from splashing to the outside by releasing the first cleaning water W1. With this configuration, at the first cleaning position P1, a thin film of water is formed horizontally by the first cleaning water W1 ejected from the first nozzle 312. At the second cleaning position P2, droplets generated when the second cleaning water W2 collides with the surface of the sample dispensing probe 207 are prevented from moving upward by the thin film of water formed by the first cleaning water W1. As a result, droplets that would normally be scattered upward from the second cleaning position P2 are prevented from splashing outside the cleaning unit body 311 through the opening 3111. Because droplets generated during cleaning are prevented from splashing outside the cleaning unit body 311, at the second cleaning position P2, the sample dispensing probe 207 can be cleaned using a water flow with a high flow rate, further enhancing the cleaning power. In other words, according to this embodiment, cleaning power can be enhanced by using a high-speed shower without contaminating the surroundings with splashes generated during cleaning.

[0105] Furthermore, the first nozzle 312 can form a fan-shaped water film by releasing the first cleaning water W1. This increases the surface area of ​​the water film formed by the first cleaning water W1. This configuration further enhances the effect of suppressing splashes from flying out of the cleaning unit body 311.

[0106] Furthermore, the first cleaning water W1 may be released while continuously swinging the direction of the spray opening 313 of the first nozzle 312 from side to side so that a water film is formed over a wide area by the first cleaning water W1.

[0107] Furthermore, the first washing water W1 is pure water, and the second washing water W2 is fine bubble water. By using fine bubble water as the second washing water W2, the cleaning power at the second washing position P2 can be further enhanced.

[0108] Furthermore, it is known that the effect of increasing cleaning power by using fine bubble water instead of pure water improves as the flow velocity increases. For example, when using fine bubble water, the rate of improvement in cleaning power when the flow velocity is increased is greater compared to when using pure water. As described above, in this embodiment, a water film is formed by the first cleaning water W1 at the first cleaning position P1, so the flow velocity of the water flow at the second cleaning position P2 can be increased. Therefore, the effect of increasing cleaning power by using fine bubble water can be efficiently utilized.

[0109] Furthermore, the automated analyzer 1 according to this embodiment further includes a control circuit 9 that controls the discharge state of the first wash water W1 and the second wash water W2. The control circuit 9 is an example of a control means. The control circuit 9 can determine whether or not to use the second wash water W2 to wash the sample dispensing probe 207 based on information regarding carryover. Information regarding carryover includes, for example, the type of sample and the testing method. Specifically, the control circuit 9 determines the possibility of carryover occurring based on the type of sample and the testing method. If the possibility of carryover occurring is low, the control circuit 9 washes the sample dispensing probe 207 using only the first wash water W1 discharged from the first nozzle 312. On the other hand, if there is a high possibility of carryover occurring, the control circuit 9 can wash the sample dispensing probe 207 using both the first wash water W1 discharged from the first nozzle 312 and the second wash water W2 discharged from the second nozzle 314.

[0110] With the above configuration, if the likelihood of carryover is low, the throughput can be improved and the amount of water used for washing can be saved by performing washing using only the first washing water W1. On the other hand, if the likelihood of carryover is high, washing can be performed using both the first washing water W1 and the second washing water W2, allowing for a washing method with higher cleaning power.

[0111] Furthermore, the control circuit 9 can initiate the discharge of the second washing water W2 from the second nozzle 314 when the tip of the sample dispensing probe 207 approaches the second washing position P2. By discharging the second washing water W2 only when the sample dispensing probe 207 approaches the second washing position P2, the amount of water used for washing can be saved.

[0112] Furthermore, the control circuit 9 can reduce the amount of the first cleaning water W1 discharged from the first nozzle 312 when the second cleaning water W2 is being discharged. For example, the control circuit 9 reduces the flow velocity V1 of the first cleaning water W1 to the extent that a water film is formed that prevents splashes from scattering from the inside to the outside of the cleaning unit body 311. By reducing the amount of the first cleaning water W1 discharged when it is not being used for cleaning, the amount of water used for cleaning can be saved.

[0113] (First variation) A first modification of the first embodiment will now be described. This modification is a modification of the configuration of the first embodiment as follows. The same configuration, operation, and effects as in the embodiment will not be described.

[0114] Figure 17 shows an example of the configuration of the probe cleaning unit 216 related to the automated analyzer 1 of this modified example. In this modified example, the second nozzle 314 and the second spray port 315 are positioned above the second cleaning position P2. The second nozzle 314 extends along a direction inclined with respect to the horizontal. The second spray port 315 faces downward. Therefore, the second nozzle 314 discharges the second cleaning water W2 toward the second cleaning position P2, which is set diagonally downward.

[0115] With the above configuration, by tilting the second nozzle 314 downwards, the second washing water W2 collides downwards with the surface of the sample dispensing probe 207 at the second washing position P2. Therefore, the amount of splashes that scatter upwards when the second washing water W2 collides can be reduced.

[0116] (Second variation) A second modification of the first embodiment will now be described. This modification is a modification of the configuration of the first embodiment as follows. The same configuration, operation, and effects as in the embodiment will not be described.

[0117] Figure 18 shows an example of the configuration of the probe cleaning unit 216 related to the automated analyzer 1 of this modified example. In this modified example, the opening 3111 is formed to be as small as possible while allowing the tip of the sample dispensing probe 207 to be inserted.

[0118] With the above configuration, by making the opening 3111 formed at the top of the cleaning unit body 311 as small as possible, it is possible to further suppress the scattering of droplets generated when cleaning the sample dispensing probe 207 from the inside to the outside of the cleaning unit body 311.

[0119] (Other variations) Furthermore, the fine bubble water generating unit 350 does not necessarily have to be provided. In this case, for example, a replaceable bottle containing fine bubble water is provided, and the fine bubble water is supplied from this bottle to the second nozzle 314.

[0120] Furthermore, while an example has been described in which pure water is used as the first washing water W1 and fine bubble water is used as the second washing water W2, this is not the only example. For instance, fine bubble water may be used as the first washing water W1, and pure water may be used as the second washing water W2.

[0121] Furthermore, the probe cleaning unit 216 may also include a suction device for sucking air from inside the cleaning unit body 311. In this case, a suction port connected to the suction device is formed on the inner wall of the cleaning unit body 311. By driving the suction device when cleaning the sample dispensing probe 207, the suction device sucks up the air inside the cleaning unit body 311 along with the droplets generated by the cleaning, thereby further suppressing the scattering of droplets to the outside.

[0122] In addition to the cleaning method using the first cleaning water W1 and the cleaning method using the second cleaning water W2, cleaning using fine bubble water and ultrasound (ultrasonic cleaning) may also be performed. In this case, a storage section (cleaning pool) for storing fine bubble water is provided at the bottom of the cleaning unit body 311, and an ultrasonic generator is attached near this storage section. By inserting the sample dispensing probe 207 into the fine bubble water stored in this storage section and radiating ultrasound into the storage section, dirt adhering to the surface and interior of the sample dispensing probe 207 can be cleaned.

[0123] According to at least one embodiment described above, the cleaning power of the probe by the cleaning unit can be improved.

[0124] While several embodiments have been described, these embodiments are presented as examples only and are not intended to limit the scope of the invention. These embodiments can be implemented in a variety of other forms, and various omissions, substitutions, modifications, and combinations of embodiments are possible without departing from the spirit of the invention. These embodiments and their variations are included in the scope and spirit of the invention, as well as in the claims and their equivalents. [Explanation of symbols]

[0125] 1…Automatic analyzer 2…Analysis mechanism 3…Analysis circuit 4…Drive mechanism 5…Input Interface 6…Output Interface 7…Communication Interface 8…Memory circuit 9…Control circuit 91... System control function 201...Reaction disk 2011…Reaction vessel 202… Constant temperature section 203... Sample Disc 204… Reagent storage 205… Reagent storage 206... Sample dispensing arm 207... Sample dispensing probe 208… Reagent dispensing arm 209…Reagent dispensing probe 210… Reagent dispensing arm 211…Reagent dispensing probe 212... Electrode Unit 213... Photometer unit 214... Washing Unit 215…Agitation unit 216…Probe cleaning unit 311...Main unit of the cleaning section 3111…Opening 312, 314… nozzles 313, 315...Injection port 316…Discharge port 317...Waste liquid pipe 340...Pure water supply section 350... Fine bubble water generation unit D1, D2... diameter P1, P2... Washing positions W1, W2... Washing water

Claims

1. A probe for dispensing reagents or samples, A cleaning unit for cleaning the probe, Equipped with, The cleaning unit comprises a first nozzle that discharges first cleaning water toward a first cleaning position, and a second nozzle that discharges second cleaning water toward a second cleaning position located below the first cleaning position. The first nozzle releases the first cleaning water to form a water film that prevents the second cleaning water from splashing to the outside. Automatic analyzer.

2. The first nozzle forms the fan-shaped water film by discharging the first cleaning water. The automated analyzer according to claim 1.

3. The second nozzle discharges the second cleaning water at a flow velocity greater than the flow velocity of the first cleaning water discharged from the first nozzle. The automated analyzer according to claim 1.

4. The diameter of the second nozzle is smaller than the diameter of the first nozzle. The automated analyzer according to claim 3.

5. The first washing water is pure water. The second washing water is fine bubble water. An automated analyzer according to any one of claims 1 to 4.

6. The system further comprises control means for controlling the discharge state of the first and second washing waters. An automated analyzer according to any one of claims 1 to 5.

7. The control means determines, based on information regarding carryover, whether or not to use the second cleaning water for cleaning the probe. The automated analyzer according to claim 6.

8. The control means causes the second nozzle to start discharging the second cleaning water when the tip of the probe approaches the second cleaning position. The automated analyzer according to claim 6 or 7.

9. The control means reduces the amount of the first cleaning water discharged from the first nozzle when the second cleaning water is being discharged. The automated analyzer according to claim 8.

10. The second nozzle is positioned above the second cleaning position and discharges the second cleaning water downwards. An automated analyzer according to any one of claims 1 to 9.

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