Indication device

Abstract

To provide a display device including a color filter in a desired shape.SOLUTION: According to one embodiment, the display device comprises: a substrate; a semiconductor arranged above the substrate; a first scan line; a second scan line adjacent to the first scan line; a connection electrode electrically connected to the semiconductor; an inorganic insulation layer covering the connection electrode; a first protrusion positioned right above the first scan line and arranged on the inorganic insulation layer; a second protrusion positioned right above the second scan line and arranged on the inorganic insulation layer; a first color filter arranged on the inorganic insulation layer between the first protrusion and the second protrusion; an organic insulation layer covering the first protrusion, the second protrusion and the first color filter; a pixel electrode arranged above the organic insulation layer and electrically connected to the connection electrode; and a common electrode facing the pixel electrode. Width of the first protrusion is smaller than that of the first scan line, and width of the second protrusion is smaller than that of the second scan line.SELECTED DRAWING: Figure 5

Description

Technical Field

[0001] Embodiments of the present invention relate to a display device.

Background Art

[0002] As an example of a display device capable of color display, a COA (Color Filter on Array) type liquid crystal display device in which an array substrate includes a switching element, a pixel electrode, and a color filter has been proposed.

[0003] The color filter is formed of, for example, a negative-type photosensitive resin. With the demand for an expanded color reproduction range, the color of the color filter tends to become darker or the color filter tends to be made thicker. In this case, when patterning the color filter, it is difficult for the exposure light to reach the bottom of the color filter, and the bottom of the color filter may not be sufficiently dried, and there is a risk that a color filter having a desired shape cannot be formed.

[0004] In particular, a liquid crystal display device used in a VR (Virtual Reality) device or the like requires high definition of 1300 ppi or more, and the pixel size is extremely small. For this reason, the aperture of the mask used for patterning the color filter is extremely small, and the exposure amount is limited, so there is a risk that the photosensitive resin may not be sufficiently cured. Therefore, it is required to form a fine color filter into a desired shape.

Prior Art Documents

Patent Documents

[0005]

Patent Document 1

Patent Document 2

Summary of the Invention

Problems to be Solved by the Invention

[0006] One of the objectives of this invention is to provide a display device equipped with a color filter of a desired shape. [Means for solving the problem]

[0007] According to one embodiment, the display device is The device comprises a substrate, a semiconductor disposed above the substrate, a first scan line, a second scan line adjacent to the first scan line, a connecting electrode electrically connected to the semiconductor, an inorganic insulating layer covering the connecting electrode, a first protrusion located directly above the first scan line and disposed on the inorganic insulating layer, a second protrusion located directly above the second scan line and disposed on the inorganic insulating layer, a first color filter disposed on the inorganic insulating layer between the first and second protrusions, an organic insulating layer covering the first protrusion, the second protrusion, and the first color filter, a pixel electrode disposed above the organic insulating layer and electrically connected to the connecting electrode, and a common electrode facing the pixel electrode, wherein the width of the first protrusion is smaller than the width of the first scan line, and the width of the second protrusion is smaller than the width of the second scan line. [Brief explanation of the drawing]

[0008] [Figure 1] Figure 1 is a schematic exploded perspective view of the display device 1 according to this embodiment. [Figure 2] Figure 2 is a schematic plan view of the display panel 2. [Figure 3] Figure 3 is a schematic cross-sectional view of the display panel 2 along the first direction X of the pixel PX shown in Figure 2. [Figure 4] Figure 4 is a schematic plan view of some of the elements of the first substrate SUB1. [Figure 5] Figure 5 is a schematic plan view of the subpixel structures SPR, SPB, and SPG. [Figure 6] Figure 6 is a schematic cross-sectional view of the display panel 2 along line AB shown in Figure 5. [Figure 7] Figure 7 is a schematic cross-sectional view of the first substrate SUB1 along the CD line shown in Figure 5. [Figure 8] Figure 8 is a schematic plan view of some of the elements of the first substrate SUB1. [Figure 9] Figure 9 is a schematic plan view of some of the elements of the first substrate SUB1. [Figure 10] Figure 10 is a schematic cross-sectional view of the display panel 2 along the EF line shown in Figure 9. [Modes for carrying out the invention]

[0009] One embodiment will be described with reference to the drawings. The disclosure is merely an example, and any modifications that a person skilled in the art could easily conceive of while maintaining the spirit of the invention are naturally included within the scope of the present invention. Furthermore, the drawings may schematically represent the width, thickness, shape, etc., of each part in order to clarify the explanation, but these are merely examples and do not limit the interpretation of the present invention. In addition, in this specification and each drawing, the same reference numerals are used for components that perform the same or similar functions as those described above with respect to previously shown drawings, and redundant detailed explanations may be omitted as appropriate.

[0010] In this embodiment, a liquid crystal display device is disclosed as an example of a display device. However, the technical concept disclosed in this embodiment is applicable to other display devices, such as those equipped with other types of display elements, such as organic electroluminescent display elements, micro-LEDs, or mini-LEDs. Furthermore, the technical concept disclosed in this embodiment is also applicable to array substrates and electronic devices having sensor elements such as capacitive sensors and optical sensors.

[0011] Figure 1 is a schematic exploded perspective view of the display device 1 according to this embodiment.

[0012] In the drawings, for ease of understanding as necessary, the X-axis, Y-axis, and Z-axis orthogonal to each other are described. The direction along the X-axis is referred to as the first direction, the direction along the Y-axis is referred to as the second direction, and the direction along the Z-axis is referred to as the third direction. The first direction X and the second direction Y correspond to directions parallel to the main surface of the substrate constituting the display device 1. The third direction Z corresponds to the thickness direction of the display device 1. Looking at various elements parallel to the third direction Z is referred to as a plan view.

[0013] The display device 1 includes a display panel 2 and a lighting device 3. In the example of FIG. 1, the lighting device 3 is of a side edge type and includes a light guide LG facing the display panel 2 and a plurality of light emitting elements LS facing the side surface of the light guide LG. However, the lighting device 3 is not limited to the example of FIG. 1 and may have other configurations such as a direct bottom type.

[0014] In the example of FIG. 1, both the display panel 2 and the light guide LG are formed in a rectangular shape having a long side along the first direction X and a short side along the second direction Y. However, the display panel 2 and the light guide LG are not limited to the rectangular shape and may have other shapes.

[0015] The display panel 2 is a transmissive liquid crystal panel and includes a first substrate SUB1 (array substrate), a second substrate SUB2 (opposite substrate) facing the first substrate SUB1, and a liquid crystal layer LC disposed between the first substrate SUB1 and the second substrate SUB2. The display panel 2 has, for example, a rectangular display area DA.

[0016] Furthermore, the display device 1 includes an optical sheet group 4, a first polarizing plate 5, and a second polarizing plate 6. The optical sheet group 4 is disposed between the light guide LG and the display panel 2. For example, the optical sheet group 4 includes a diffusion sheet DF that diffuses the light emitted from the light guide LG, and a first prism sheet PR1 and a second prism sheet PR2 on which a large number of prisms are formed.

[0017] The first polarizing plate 5 is disposed between the optical sheet group 4 and the first substrate SUB1. The second polarizing plate 6 is disposed above the second substrate SUB2. The polarization axis of the first polarizing plate 5 and the polarization axis of the second polarizing plate 6 are, for example, in a cross-nicol relationship perpendicular to each other.

[0018] The display device 1 can be used in various devices such as in-vehicle devices, smartphones, tablet terminals, mobile phone terminals, personal computers, television receivers, game devices, head-mounted displays, and the like.

[0019] FIG. 2 is a schematic plan view of the display panel 2.

[0020] The display panel 2 has a display area DA configured to display an image and a peripheral area SA around the display area DA. In the example of FIG. 2, the first substrate SUB1 has a mounting area MA protruding in the second direction Y more than the second substrate SUB2. The mounting area MA is a part of the peripheral area SA.

[0021] The display area DA has a plurality of pixels PX arranged in a matrix in the first direction X and the second direction Y. The pixel PX includes a plurality of sub-pixels. In this embodiment, as an example, the pixel PX includes a red sub-pixel SPR, a green sub-pixel SPG, and a blue sub-pixel SPB. However, the pixel PX may include sub-pixels of other colors such as white.

[0022] The display panel 2 includes a plurality of scanning lines G, a plurality of signal lines S, scanning drivers GD1 and GD2, and a selector circuit ST. The plurality of scanning lines G extend in the first direction X and are arranged in the second direction Y. The plurality of signal lines S extend in the second direction Y and are arranged in the first direction X. Each scanning line G is connected to at least one of the scanning drivers GD1 and the scanning driver GD: Each signal line S is connected to the selector circuit ST.

[0023] In the example shown in Figure 2, the controller CT is mounted in the mounting area MA. The mounting area MA also has a terminal section T. The flexible printed circuit board F is connected to the terminal section T. The controller CT may also be mounted on the flexible printed circuit board F. The controller CT can be composed of an IC chip or various circuit elements.

[0024] The controller CT controls the scanning drivers GD1 and GD2, as well as the selector circuit ST. The scanning drivers GD1 and GD2 sequentially supply scanning signals to each scanning line G. The selector circuit ST sequentially supplies video signals to each signal line S.

[0025] Each of the sub-pixels SPR, SPG, and SPB includes a pixel electrode PE, a switching element SW (thin-film transistor), and a common electrode CE to which a common voltage is applied. The switching element SW is electrically connected to the pixel electrode PE, the scan line G, and the signal line S. The common electrode CE is formed across multiple sub-pixels. When a potential difference is formed between the pixel electrode PE and the common electrode CE, an electric field corresponding to this potential difference is formed in the liquid crystal layer LC.

[0026] In this embodiment, the scan line G, signal line S, scan drivers GD1 and GD2, selector circuit ST, switching element SW, pixel electrode PE, and common electrode CE are all formed on the first substrate SUB1.

[0027] Figure 3 is a schematic cross-sectional view of the display panel 2 along the first direction X of the pixel PX shown in Figure 2.

[0028] The first substrate SUB1 includes, in addition to the signal lines S, scan lines G, pixel electrodes PE, and common electrodes CE described above, a substrate 10, insulating layers 11-19, alignment films AL1, and color filters CFR, CFG, and CFB.

[0029] The substrate 10 is, for example, a transparent insulating substrate such as a glass substrate or a resin substrate.

[0030] Insulating layers 11 to 15 are sequentially stacked on the substrate 10. Signal lines S are positioned on insulating layer 15 at the boundaries of adjacent subpixels in the first direction X. Insulating layer 16 covers the signal lines S and insulating layer 15. Insulating layer 17 covers insulating layer 16.

[0031] The red color filter CFR is located on the insulating layer 17 in the sub-pixel SPR. The green color filter CFG is located on the insulating layer 17 in the sub-pixel SPG. The blue color filter CFB is located on the insulating layer 17 in the sub-pixel SPB. In the illustrated cross-section, the color filters CFR, CFG, and CFB are spaced apart from each other directly above the signal line S. When illumination light from the illumination device 3 passes through the color filter CFR, a red indicator light is generated. When illumination light passes through the color filter CFG, a green indicator light is generated. When illumination light passes through the color filter CFB, a blue indicator light is generated.

[0032] The insulating layer 18 covers the color filters CFR, CFG, and CFB, and further covers the insulating layer 17 directly above the signal line S. The insulating layer 18 is formed thicker than the other insulating layers 11-16 and 18, and plays the role of a planarizing layer that flattens the irregularities caused by the color filters CFR, CFG, CFB, etc.

[0033] The pixel electrode PE is placed on the insulating layer 18 in each of the sub-pixels SPR, SPG, and SPB. The insulating layer 19 covers the pixel electrode PE and the insulating layer 18. The common electrode CE is placed on the insulating layer 19. In each of the sub-pixels SPR, SPG, and SPB, the pixel electrode PE and the common electrode CE face each other via the insulating layer 19. The alignment film AL1 covers the common electrode CE.

[0034] Although not shown in the cross-section of Figure 3, the common electrode CE has slits in each of the sub-pixels SPR, SPG, and SPB. Through these slits, an electric field acting on the liquid crystal layer LC is formed between the pixel electrode PE and the common electrode CE.

[0035] Insulating layers 11-17 and 19 are inorganic insulating layers, and insulating layer 18 is an organic insulating layer. Specifically, insulating layers 11 and 12 are made of inorganic insulating materials such as silicon nitride and silicon oxide. Insulating layers 13 and 14 are made of silicon oxide. Insulating layers 15-17 are made of inorganic insulating materials such as silicon nitride and silicon oxide. Insulating layer 18 is made of an organic insulating material such as acrylic resin. Insulating layer 19 is made of silicon nitride.

[0036] The alignment film AL1 is a horizontal alignment film formed from, for example, polyimide, and has an orientation restricting force along the XY plane. The color filters CFR, CFG, and CFB are formed from, for example, a negative-type photosensitive resin.

[0037] The pixel electrode PE and the common electrode CE are formed from a transparent conductive material such as indium tin oxide (ITO). The signal line S and the scan line G shown in Figure 1 are formed from a metallic material such as titanium, aluminum, molybdenum, or tungsten. The signal line S and scan line G may be formed as single layers or as laminates in which different types of metal layers are stacked.

[0038] The structure of the first substrate SUB1 is not limited to the example shown in Figure 3. For example, the pixel electrode PE may be positioned above the common electrode CE (on the liquid crystal layer LC side).

[0039] Such a COA method is suitable for display devices that require high resolution exceeding 1400 ppi.

[0040] The second substrate SUB2 faces the first substrate SUB1 in the third direction Z. The liquid crystal layer LC is located between the first substrate SUB1 and the second substrate SUB2. The second substrate SUB2 comprises a substrate 20 and an alignment film AL2. Preferably, the second substrate SUB2 does not have a light-shielding layer such as a so-called black matrix. This ensures that even if misalignment occurs when bonding the first substrate SUB1 and the second substrate SUB2, the display quality of the display device 1 can be maintained in good condition.

[0041] Figure 4 is a schematic plan view of some of the elements of the first substrate SUB1. This figure shows an example of the shapes of scan lines G, signal lines S, and color filters CFR, CFG, and CFB.

[0042] In the example shown in Figure 4, the scan line G extends linearly in the first direction X, and the signal line S extends linearly in the second direction Y. The width of the scan line G along the second direction Y is greater than the width of the signal line S along the first direction X. Note that the scan line G and the signal line S do not necessarily have to be straight and may include curved portions.

[0043] Multiple scan lines G and multiple signal lines S intersect each other. The region enclosed by two adjacent scan lines G and two adjacent signal lines S corresponds to the aperture AP of a subpixel. Each of the subpixels SPR, SPG, and SPB has an aperture AP.

[0044] In the example shown in Figure 4, subpixels SPR, SPG, and SPB are arranged in order in the first direction X, and subpixels SPR, SPB, and SPG are arranged in order in the second direction Y. In this arrangement, in the display area DA, rows of multiple subpixels SPR arranged diagonally intersecting the first direction X and the second direction Y, rows of multiple subpixels SPG arranged diagonally, and rows of multiple subpixels SPB arranged diagonally are alternately formed.

[0045] The color filter CFR is arranged in a row of diagonally aligned sub-pixel SPRs. In other words, the color filter CFRs placed in diagonally adjacent sub-pixel SPRs are integrally formed. In each sub-pixel SPR, the color filter CFR is superimposed on the aperture AP. The color filter CFG is positioned in a row of sub-pixel SPGs arranged diagonally. In each sub-pixel SPG, the color filter CFG is superimposed on the aperture AP. The color filter CFB is positioned in a row of sub-pixel SPBs arranged diagonally. In each sub-pixel SPB, the color filter CFB is superimposed on the aperture AP.

[0046] These color filters CFR, CFG, and CFB are spaced apart from each other in the regions superimposed on the scan line G and the regions superimposed on the signal line S. As will be explained later, in each of the sub-pixels SPR, SPB, and SPG, the contact hole CH3 for connecting the pixel electrode and the connecting electrode is superimposed on the scan line G but not on the color filters CFR, CFG, and CFB.

[0047] The shapes of the color filters CFR, CFG, and CFB are not limited to the illustrated examples. For example, each of the color filters CFR, CFG, and CFB may be arranged for each aperture AP and formed in an island shape, or they may be formed in a stripe shape extending in the second direction Y.

[0048] Each projection PT is located directly above the scan line G and extends linearly in the first direction X. Each projection PT is also formed to intersect with multiple signal lines S. Multiple projections PT are aligned in the second direction Y. Two projections PT are located directly above each scan line G, adjacent to each other in the second direction Y. The contact hole CH3 is located between two projections PT. Such projections PT are superimposed on the edges of the color filters CFR, CFG, and CFB along the first direction X. For example, focusing on a single projection PT, in sub-pixel SPR it is superimposed on the edge of the color filter CFR, in sub-pixel SPG it is superimposed on the edge of the color filter CFG, and in sub-pixel SPB it is superimposed on the edge of the color filter CFB. In each aperture AP, one of the color filters CFR, CFG, or CFB is located between two projections PT adjacent to each other in the second direction Y.

[0049] Figure 5 is a schematic plan view of the subpixel structures SPR, SPB, and SPG. In Figure 5, the connecting electrode CN is shown by a dashed line, the pixel electrode PE is shown by a double dashed line, and the color filter and common electrode are not shown.

[0050] The illustrated scan lines G1 and G2 are included in the multiple scan lines G shown in Figure 4. Scan line G1 and upper scan line GA1 are electrically connected to each other. Upper scan line GA1 superimposes on scan line G1 and extends linearly in the first direction X. The width of upper scan line GA1 along the second direction Y is smaller than the width of scan line G1 along the second direction Y. Scan line G2 and upper scan line GA2 are electrically connected to each other. Upper scan line GA2 superimposes on scan line G2 and extends linearly in the first direction X. The width of upper scan line GA2 along the second direction Y is smaller than the width of scan line G2 along the second direction Y.

[0051] The illustrated protrusions PT0 to PT3 are included in the multiple protrusions PT shown in Figure 4. The protrusions PT0 and PT1 overlap the scan line G1 but not the upper scan line GA1. The upper scan line GA1 is located between the protrusions PT0 and PT1. The width WP of the protrusions PT0 and PT1 along the second direction Y is smaller than the width WG of the scan line G1 along the second direction Y, and smaller than the width WGA of the upper scan line GA1 along the second direction Y. The protrusions PT2 and PT3 overlap the scan line G2 but not the upper scan line GA2. The upper scan line GA2 is located between the protrusions PT2 and PT3. The width WP of the protrusions PT2 and PT3 along the second direction Y is smaller than the width WG of the scan line G2 along the second direction Y, and smaller than the width WGA of the upper scan line GA2 along the second direction Y.

[0052] For example, focusing on the sub-pixel SPG, the connecting electrode CN is positioned between adjacent signal lines S, superimposed on scan line G1 and upper scan line GA1, does not intersect with projection PT0, intersects with projection PT1, and extends to aperture AP.

[0053] The semiconductor SC intersects with the signal line S, and further intersects with the scan line G1 and the upper scan line GA1, and intersects with the protrusions PT0 and PT1, and extends to the aperture AP. The semiconductor SC is electrically connected to the signal line S at contact hole CH1. The semiconductor SC is also electrically connected to the connecting electrode CN at contact hole CH2. Contact hole CH2 is located at the aperture AP and is superimposed on the color filter CFG shown in Figure 4.

[0054] The pixel electrode PE is positioned between adjacent signal lines S, superimposed on scan line G1 and upper scan line GA1, not intersecting with projection PT0, intersecting with projection PT1, and extending to aperture AP. The pixel electrode PE is electrically connected to the connecting electrode CN at contact hole CH3. Contact hole CH3 superimposed on scan line G1 and upper scan line GA1 between projections PT0 and PT1.

[0055] The projection PT0 intersects with multiple signal lines S and multiple semiconductors SC between contact holes CH1 and CH3. The projection PT1 intersects with multiple signal lines S, multiple semiconductors SC, multiple connecting electrodes CN, and multiple pixel electrodes PE between contact holes CH2 and CH3.

[0056] Here, we focused on the sub-pixel SPG, but the other sub-pixels SPR and SPB are configured in a similar way to the sub-pixel SPG.

[0057] Figure 6 is a schematic cross-sectional view of the display panel 2 along the AB line shown in Figure 5. In Figure 6, the semiconductor SC and connecting electrode CN shown in Figure 5 are omitted.

[0058] Multiple protrusions PT, including protrusions PT0 to PT4, are placed on an insulating layer 17 which is an inorganic insulating layer, and are covered with an insulating layer 18 which is an organic insulating layer.

[0059] For example, the green color filter CFG overlaps with the aperture AP between the scanning lines G1 and G2, is disposed on the insulating layer 17 between the protrusions PT1 and PT2, contacts the protrusions PT1 and PT2, and is covered with the insulating layer 18.

[0060] The red color filter CFR is spaced apart from the color filter CFG, is disposed on the insulating layer 17 between the protrusions PT3 and PT, contacts the protrusions PT3 and PT, and is covered with the insulating layer 18.

[0061] The blue color filter CFB is spaced apart from the color filters CFR and CFG, is disposed on the insulating layer 17 between the protrusions PT and PT0, contacts the protrusions PT and PT0, and is covered with the insulating layer 18. Also, the insulating layer 18 contacts the insulating layer 17 between the protrusions PT0 and PT1 and between the protrusions PT2 and PT3.

[0062] The protrusion PT has an equal thickness T1 along the third direction Z. For example, the thickness T1 of each of the protrusions PT1 and PT2 is smaller than the thickness T2 of the color filter CFG along the third direction Z (T1 < T2). For other protrusions PT, it is also smaller than the thickness of any of the color filters CFR, CFG, and CFB. In one example, the thickness T2 of the color filter is about 3 μm, and the thickness T1 of the protrusion PT is 2 μm or less.

[0063] The protrusion PT has an equal width W1 along the second direction Y. For example, the width W1 of each of the protrusions PT1 and PT2 is smaller than the thickness T1 (W1 < T1). That is, each of the protrusions PT is formed in a wall shape extending in the third direction Z. In one example, the width W1 of the protrusion PT is about 1 μm.

[0064] Such protrusions PT are preferably formed from a negative-type photosensitive resin with excellent processability (e.g., an acrylic-based photosensitive resin). Alternatively, the protrusions PT may be formed from a positive-type photosensitive resin (e.g., a novolac-based photosensitive resin). While it is desirable for the protrusions PT to be transparent to ensure thorough exposure to the depths, they may also be colored, such as black.

[0065] Figure 7 is a schematic cross-sectional view of the first substrate SUB1 along the CD line shown in Figure 5. Note that the alignment film is not shown in Figure 7.

[0066] The semiconductor SC of the switching element SW is placed on an insulating layer 13 and covered with an insulating layer 14. The semiconductor SC is transparent and is an oxide semiconductor containing, for example, indium, gallium, etc. The semiconductor SC has a low-resistance region SCA and SCB and a high-resistance region SCC. The high-resistance region SCC is located between the low-resistance region SCA and the low-resistance region SCB. The semiconductor SC is located between the insulating layer 13, which is a silicon oxide layer, and the insulating layer 14, which is a silicon oxide layer.

[0067] The lower gate electrode GEB is positioned on the insulating layer 12 and covered by the insulating layer 13. The lower gate electrode GEB is included in the scan line G2 shown in Figure 5. The lower gate electrode GEB faces the semiconductor SC via the insulating layer 13. In other words, the lower gate electrode GEB corresponds to the region of the scan line G2 that overlaps with the semiconductor SC.

[0068] The gate electrode GEA is positioned on the insulating layer 14 and covered by the insulating layer 15. The gate electrode GEA is included in the upper scan line GA2 shown in Figure 5. The gate electrode GEA faces the high-resistance region SCC of the semiconductor SC via the insulating layer 14. In other words, the gate electrode GEA corresponds to the region of the upper scan line GA2 that overlaps with the semiconductor SC.

[0069] The source electrode SE is placed on the insulating layer 15 and covered by the insulating layer 16. The source electrode SE is included in the signal line S shown in Figure 5. The source electrode SE is in contact with the low-resistance region SCA of the semiconductor SC at the contact hole CH1 that penetrates the insulating layers 14 and 15.

[0070] The connecting electrode CN is positioned on the insulating layer 16 and covered by the insulating layer 17. In other words, the connecting electrode CN is located on a different layer from the source electrode SE and the signal line S. The connecting electrode CN is a transparent electrode formed of a transparent conductive material such as ITO. The connecting electrode CN is in contact with the low-resistance region SCB of the semiconductor SC at a contact hole CH2 that penetrates the insulating layers 14, 15, and 16. The contact hole CH2 is superimposed on the color filter CFG.

[0071] The pixel electrode PE is placed on an insulating layer 18 and covered with an insulating layer 19. The pixel electrode PE is in contact with the connecting electrode CN at a contact hole CH3 that penetrates the insulating layers 17 and 18. The contact hole CH3 is superimposed on the gate electrode GEA, located between protrusions PT2 and PT3, and also located between adjacent color filters CFG and CFR, and does not superimpose on either color filter.

[0072] The metal layer ML is positioned on top of the insulating layer 19 in the contact hole CH3. The common electrode CE covers the metal layer ML, is positioned on top of the insulating layer 19, and is covered with the alignment film AL1 shown in Figure 3. In other words, the metal layer ML and the common electrode CE are electrically connected and at the same potential. In the illustrated example, the metal layer ML is located between the insulating layer 19 and the common electrode CE, but the common electrode CE may be located between the insulating layer 19 and the metal layer ML. Also, in the illustrated example, the filler material 20 is filled into the depression created by the contact hole CH3. The filler material 20 is made of an organic insulating material, is positioned on top of the common electrode CE, and is covered with the alignment film AL1.

[0073] In display devices requiring high resolution in the display area DA, the pixel size is small, and the spacing between adjacent signal lines S is extremely small. Therefore, the connecting electrode CN for electrically connecting the switching element SW and the pixel electrode PE is formed in a different layer from the signal lines S, and is formed as a transparent electrode made of a transparent conductive material. This prevents unwanted contact between the signal lines S and the connecting electrode CN. Furthermore, since the semiconductor SC connected to the connecting electrode CN at the aperture AP is transparent, the reduction in transmittance at the aperture AP is suppressed.

[0074] According to this embodiment, deformation of the color filter caused by insufficient exposure or the like is suppressed. For example, the green color filter CFG has a lower transmittance of ultraviolet light (e.g., 365 nm) used for exposure compared to the red color filter CFR and the blue color filter CFB. As a result, ultraviolet light does not easily reach the bottom of the color filter CFG, which may lead to underexposure at the bottom. If the color filter CFG is developed and fired under such underexposure conditions, voids may form at the bottom or spread to the area where contact holes CH3 should be formed. Therefore, as in this embodiment, by forming the protrusions PT before forming the color filter, the penetration of the developer into the bottom of the color filter is suppressed, and unwanted spreading of the color filter is also suppressed. This makes it possible to suppress deformation of the color filter.

[0075] Furthermore, since deformation of the color filter is suppressed, the color filter can be reliably covered with the insulating layer 18. As a result, leakage of impurities from the color filter is suppressed.

[0076] Furthermore, because the spreading of the color filter toward the contact hole CH3 is suppressed, the pixel electrode PE is not interrupted at the contact hole CH3, and the switching element SW and the pixel electrode PE can be reliably electrically connected.

[0077] Furthermore, even if the colorant content in the color filter increases or the color filter becomes thicker due to the demand for a wider color reproduction range, the color filter can be processed with high precision, and a color filter of the desired shape can be formed.

[0078] In this embodiment, examples were described in which the color filters CFR, CFG, and CFB are placed between a pair of protrusions. However, it is sufficient if the protrusion PT is provided between the color filter of a color prone to underexposure (for example, a green color filter) and the contact hole CH3.

[0079] Next, we will explain other configuration examples.

[0080] Figure 8 is a schematic plan view of some of the elements of the first substrate SUB1. The example shown in Figure 8 differs from the example shown in Figure 4 in that each projection PT is interrupted at a position where it overlaps with the signal line S. In the illustrated example, one projection PT is located between adjacent signal lines, extends linearly in the first direction X, and has an end E1 that overlaps with one signal line and an end E2 that overlaps with the other signal line S.

[0081] In this configuration example, as in the configuration example above, it is possible to suppress the spreading along the second direction Y toward the contact hole CH3 of the color filter.

[0082] Figure 9 is a schematic plan view of some of the elements of the first substrate SUB1. The example shown in Figure 9 differs from the example shown in Figure 8 in that it adds another projection, a projection PTY, located directly above the signal line S. The projection PTY extends linearly in the second direction Y, intersects with multiple scan lines G, and connects to a projection PT extending in the first direction X. The projection PTY is formed from the same material as the projection PT.

[0083] Figure 10 is a schematic cross-sectional view of the display panel 2 along the EF line shown in Figure 9. The protrusion PTY is superimposed on the signal line S, placed on an inorganic insulating layer 17, and covered with an organic insulating layer 18. Each of the color filters CFR, CFG, and CFB is positioned on the insulating layer 17 between adjacent protrusions PTY, in contact with the protrusions PTY, and covered by the insulating layer 18.

[0084] In this configuration example, as in the above configuration example, the protrusion PT can suppress the spreading along the second direction Y toward the contact hole CH3 of the color filter. Furthermore, the protrusion PTY can also suppress the spreading along the first direction X of the color filter.

[0085] In this embodiment, for example, scan line G1 corresponds to the first scan line, scan line G2 corresponds to the second scan line, projection PT1 corresponds to the first projection, projection PT2 corresponds to the second projection, projection PT3 corresponds to the third projection, projection PTY corresponds to the fourth projection, color filter CFG corresponds to the first color filter, and color filter CFR or CFB corresponds to the second color filter.

[0086] All display devices that a person skilled in the art can implement by appropriately modifying the design based on the display devices described above as embodiments of the present invention also fall within the scope of the present invention, insofar as they encompass the gist of the present invention.

[0087] Within the scope of the concept of the present invention, a person skilled in the art can conceive of various modifications, and such modifications are also understood to fall within the scope of the present invention. For example, any modifications made by a person skilled in the art to add, delete, or change the design of any of the above-described embodiments, or to add, omit, or change the conditions of any process, are also included within the scope of the present invention, as long as they retain the essence of the present invention.

[0088] Furthermore, any other effects and advantages brought about by the embodiments described above that are obvious from the description herein or that can be appropriately conceived by those skilled in the art are naturally considered to be brought about by the present invention. [Explanation of Symbols]

[0089] 1…Display device 2…Display panel 3…Lighting device SUB1…First substrate SUB2…Second substrate LC…Liquid crystal layer SPR, SPG, SPB... Sub-pixels AP... Aperture 11-19…Insulating layer G…Scanning line S…Signal line ML…Metal layer CH1~CH3...Contact holes CFR, CFG, CFB...Color filters SC... Semiconductor PE... Pixel electrode CE... Common electrode PT... projection CN... connecting electrode

Claims

1. circuit board and A semiconductor placed above the substrate, The first scan line and, A first upper scan line superimposed on the first scan line, having a width smaller than the first scan line, and electrically connected to the first scan line, A second scan line adjacent to the first scan line, A second upper scan line superimposed on the second scan line, having a smaller width than the second scan line, and electrically connected to the second scan line, A connecting electrode electrically connected to the semiconductor, An inorganic insulating layer covering the aforementioned connecting electrode, A first projection is located directly above the first scanning line, does not overlap with the first upper scanning line, and is positioned on the inorganic insulating layer, A second projection is located directly above the second scanning line, does not overlap with the second upper scanning line, and is positioned on the inorganic insulating layer, Between the first projection and the second projection, a first color filter is disposed on the inorganic insulating layer, The first protrusion, the second protrusion, and the organic insulating layer covering the first color filter, A pixel electrode is disposed above the organic insulating layer and electrically connected to the connecting electrode, The pixel electrode and a common electrode facing the aforementioned pixel electrode are provided, The width of the first projection is smaller than the width of the first scan line. A display device in which the width of the second projection is smaller than the width of the second scan line.

2. The display device according to claim 1, wherein the first color filter is a green color filter.

3. Furthermore, a third projection is located directly above the second scanning line, does not overlap with the second upper scanning line, is positioned on the inorganic insulating layer, and is spaced apart from the second projection, The device comprises a second color filter that is in contact with the third projection, is positioned on the inorganic insulating layer, and is spaced apart from the first color filter, The display device according to claim 1, wherein the organic insulating layer covers the third projection and the second color filter, and is in contact with the inorganic insulating layer between the second projection and the third projection.

4. The display device according to claim 3, wherein the pixel electrode is in contact with the connecting electrode in a contact hole that penetrates the organic insulating layer and the inorganic insulating layer directly above the second upper scanning line between the second projection and the third projection.

5. The display device according to claim 3, wherein the second color filter is a red color filter or a blue color filter.

6. The display device according to claim 1, wherein the thickness of each of the first and second protrusions is less than the thickness of the first color filter on the inorganic insulating layer.

7. The display device according to claim 6, wherein the width of each of the first and second protrusions is less than the thickness of each of the first and second protrusions.

8. The display device according to claim 7, wherein the first projection and the second projection are formed of a negative-type photosensitive resin.

9. Furthermore, it includes a plurality of signal lines that intersect the first scan line and the second scan line, The display device according to claim 1, wherein each of the first projection and the second projection is formed to intersect with the plurality of signal lines.

10. Furthermore, it includes a plurality of signal lines that intersect the first scan line and the second scan line, The display device according to claim 1, wherein each of the first projection and the second projection is interrupted at a position where it overlaps with the plurality of signal lines.

11. Furthermore, a signal line intersecting the first scan line and the second scan line, The display device according to claim 1, comprising: a fourth projection located directly above the signal line and positioned on the inorganic insulating layer, and connected to the first projection and the second projection.

12. The display device according to claim 1, wherein the semiconductor is a transparent oxide semiconductor.

13. The display device according to claim 1, wherein the connecting electrode is a transparent electrode.

14. A first substrate comprising the semiconductor, the first scanning line, the second scanning line, the connecting electrode, the first color filter, the pixel electrode, and the common electrode, A second substrate facing the first substrate, The liquid crystal layer between the first substrate and the second substrate, The display device according to claim 1, comprising:

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