Salt, acid generator, resist composition, and method for producing resist patterns

JP7864575B2Active Publication Date: 2026-05-25SUMITOMO CHEM CO LTD
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Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
SUMITOMO CHEM CO LTD
Filing Date
2022-07-13
Publication Date
2026-05-25

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Benefits of technology

【0006】 本発明の塩を含有するレジスト組成物を用いることにより、良好なマスクエラーファクタ(MEF)でレジストパターンを製造することができる。

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Abstract

To provide a salt that can produce a resist pattern having excellent mask error factors, and a resist composition comprising the same.SOLUTION: The present invention provides a salt represented by a specific structural formula, an acid generator and a resist composition.SELECTED DRAWING: None
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