Carboxylate salt, carboxylic acid generator, resist composition, and method for producing resist patterns

The carboxylate salt enhances pattern collapse resistance in resist patterns by incorporating a carboxylic acid generator with specific structural components in the resist composition.

JP7864576B2Active Publication Date: 2026-05-25SUMITOMO CHEM CO LTD
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Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
SUMITOMO CHEM CO LTD
Filing Date
2022-07-13
Publication Date
2026-05-25

AI Technical Summary

Technical Problem

Existing resist compositions do not provide sufficient pattern collapse resistance (PCM) for resist patterns.

Method used

A carboxylate salt represented by a specific formula, which includes a carboxylic acid generator with defined structural components, is used in a resist composition to enhance pattern collapse resistance.

Benefits of technology

The use of the carboxylate salt in the resist composition results in resist patterns with improved pattern collapse resistance.

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Patent Text Reader

Abstract

To provide a carboxylate and a carboxylic acid generator that can produce a resist pattern having excellent pattern collapse resistance, and a resist composition comprising the same.SOLUTION: Specifically, a carboxylate represented by, for example, the formula (I-1), a carboxylic acid generator and a resist composition are illustrated.SELECTED DRAWING: None
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