Salt, acid generator, resist composition, and method for producing resist patterns
The use of a specific acid generator salt in resist compositions improves CD uniformity in resist patterns, enhancing the quality of pattern formation.
JP7864578B2Active Publication Date: 2026-05-25SUMITOMO CHEM CO LTD
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Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- SUMITOMO CHEM CO LTD
- Filing Date
- 2022-07-20
- Publication Date
- 2026-05-25
AI Technical Summary
Technical Problem
Existing resist compositions do not achieve satisfactory CD uniformity in resist patterns.
Method used
A resist composition containing a specific acid generator salt represented by formula (I), which includes a sulfonate anion or sulfonylimide anion, is used to form resist patterns with improved CD uniformity.
Benefits of technology
The resist composition enables the production of resist patterns with enhanced CD uniformity, addressing the limitations of existing technologies.
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Abstract
To provide a salt which allows a resist pattern having good CD uniformity (CDU) to be produced, an acid generator, and a resist composition containing the same.SOLUTION: There are provided a salt of a specific structure, an acid generator, and a resist composition.SELECTED DRAWING: None
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