Compositions, films, optical filters, solid-state image sensors, image display devices, infrared sensors, camera modules, and compounds

Abstract

The present invention provides a composition that can form a film that exhibits an excellent light resistance. This composition comprises a compound given by formula (1) and a curable compound.

Description

[Technical Field]

[0001] The present invention relates to compositions comprising pyrrolopyrrole compounds. Furthermore, the present invention relates to films, optical filters, solid-state image sensors, image display devices, infrared sensors, and camera modules using the aforementioned compositions. The present invention also relates to pyrrolopyrrole compounds. [Background technology]

[0002] Video cameras, digital still cameras, and mobile phones with camera functions use solid-state image sensors for color images, such as CCDs (charge-coupled devices) and CMOS (complementary metal-oxide-semiconductor) sensors. These solid-state image sensors use silicon photodiodes, which are sensitive to infrared light, in their light-receiving sections. For this reason, infrared cut filters are sometimes provided to correct the visual sensitivity.

[0003] Infrared cut filters are manufactured using compositions containing infrared absorbing dyes. Examples of infrared absorbing dyes include pyrrolopyrrole compounds.

[0004] On the other hand, Non-Patent Document 1 describes a compound with the following structure as having strong absorption in the visible and near-infrared regions. Furthermore, Non-Patent Document 1 uses a compound with the following structure as the active layer of an organic thin-film solar cell. [ka] [Prior art documents] [Patent Documents]

[0005] [Non-Patent Document 1] Materials Chemistry Frontiers,2018,2,112-120 [Overview of the project] [Problems that the invention aims to solve]

[0006] Regarding the film obtained by using the composition containing an infrared absorbing dye, further improvement in light resistance has been demanded in recent years.

[0007] Therefore, an object of the present invention is to provide a composition capable of forming a film excellent in light resistance. Another object of the present invention is to provide a film, an optical filter, a solid-state imaging device, an image display device, an infrared sensor, and a camera module using the composition. Another object of the present invention is to provide a compound.

Means for Solving the Problems

[0008] The present invention provides the following. <1> A composition comprising a compound represented by formula (1) and a curable compound;

Chemical Formula

Chemical Formula

Advantages of the Invention

[0009] According to the present invention, it is possible to provide a composition that can form a film with excellent light resistance. Furthermore, according to the present invention, it is possible to provide films, optical filters, solid-state image sensors, image display devices, infrared sensors, camera modules, and compounds. [Brief explanation of the drawing]

[0010] [Figure 1] This is a schematic diagram showing one embodiment of an infrared sensor. [Modes for carrying out the invention]

[0011] The details of the present invention will be described in detail below. In this specification, "~" is used to mean that the numbers before and after it include the lower and upper limits, respectively. In this specification, when groups (atomic groups) are not specified as substituted or unsubstituted, the notation includes both groups (atomic groups) with and without substituents. For example, "alkyl group" includes not only unsubstituted alkyl groups but also substituted alkyl groups. In this specification, "exposure" includes not only exposure using light but also drawing using particle beams such as electron beams and ion beams, unless otherwise specified. Examples of light used for exposure include the emission spectrum of mercury lamps, far ultraviolet light represented by excimer lasers, extreme ultraviolet (EUV) light, X-rays, electron beams, and other active light or radiation. In this specification, "(meth)acrylate" refers to both acrylate and methacrylate, or either of them; "(meth)acrylic" refers to both acrylic and methacrylic, or either of them; and "(meth)acryloyl" refers to both acryloyl and methacryloyl, or either of them. In this specification, weight-average molecular weight and number-average molecular weight are defined as polystyrene equivalent values ​​measured by gel permeation chromatography (GPC). In this specification, Me in the chemical formula represents a methyl group, Et represents an ethyl group, Bu represents a butyl group, and Ph represents a phenyl group. In this specification, infrared radiation refers to light (electromagnetic waves) with a wavelength of 700 to 2500 nm. In this specification, total solids refers to the total mass of the components of the composition excluding the solvent. In this specification, "pigment" means a compound that is poorly soluble in solvents. In this specification, the term "process" includes not only independent processes but also any process that cannot be clearly distinguished from other processes, as long as its intended function is achieved.

[0012] <Composition> The composition of the present invention is characterized by comprising a compound represented by formula (1) and a curable compound.

[0013] The composition of the present invention makes it possible to form a film with excellent light resistance. Although the detailed reason for this effect is unknown, the compound represented by formula (1) has a structure in which multiple pyrrolopyrrole rings are linked by n-valent conjugated linking groups containing aromatic heterocyclic groups. Therefore, it is presumed that when forming a film using a composition containing a curable compound, associations of the compound represented by formula (1) are easily formed in the film during film formation. It is presumed that the formation of such associations in the film improves the light resistance of the resulting film. Furthermore, the formation of these associations in the film can also improve the heat resistance of the resulting film. In addition, because the compound represented by formula (1) has a broad infrared absorption bandwidth, it is also possible to form a film that can block infrared rays across a wide wavelength range by using the composition of the present invention.

[0014] The composition of the present invention can be used as a composition for optical filters. Examples of optical filters include infrared cut filters and infrared transmission filters.

[0015] When the composition of the present invention is used as a composition for forming an infrared cut filter, as the compound represented by the formula (1), X in the formula (1) 1 and X 2 It is preferable to use a compound having a structure in which is C-CN. X in the formula (1) 1 and X 2 A compound having a structure in which is C-CN is a compound excellent in visible transparency and infrared shielding properties. By using a composition containing such a compound, an infrared cut filter having spectroscopic properties excellent in visible transparency and infrared shielding properties can be formed. Further, when the composition of the present invention is used as a composition for forming an infrared transmission filter, the composition of the present invention preferably contains a colorant. Further, as the compound represented by the formula (1), X in the formula (1) 1 and X 2 It is preferable to use a compound having a structure in which is N. X in the formula (1) 1 and X 2 Since a compound having a structure in which is N has absorption in each of the infrared region and the visible region, by using such a compound in combination with a colorant, visible light can be blocked and infrared rays having a wavelength longer than a specific wavelength can be transmitted. An infrared transmission filter having the spectroscopic properties can be formed.

[0016] Hereinafter, each component used in the composition of the present invention will be described.

[0017] <<Compound represented by formula (1) (specific compound)>> The composition of the present invention contains a compound represented by the formula (1) (hereinafter, also referred to as a specific compound).

Chemical formula

[0018] L in equation (1) 1 The symbol represents an n-valent conjugated linking group containing an aromatic heterocyclic group. Here, an n-valent conjugated linking group means an n-valent group in which a conjugated system connects from one bond position to the other bond position. L 1 The n-valent conjugated linking groups represented by include (L1) aromatic heterocyclic groups, (L2) aromatic heterocyclic groups, aromatic hydrocarbon groups, and -CR. L11 =CR L12 Examples include groups that combine - and at least one group selected from -C≡C-, and (L3) groups in which two or more aromatic heterocyclic groups are linked by single bonds or divalent conjugated linking groups. L11 and R L12 Each of these independently represents a hydrogen atom or a substituent.

[0019] The above aromatic heterocyclic group may be either a monocyclic or fused ring, but it is preferable to be a monocyclic ring because it has high linearity and is more easily associated. Furthermore, the above aromatic heterocyclic group is preferably a five-membered or six-membered aromatic heterocyclic group, and it is preferable to be a five-membered aromatic heterocyclic group because it can form a film with better light resistance and heat resistance. Furthermore, the heteroatom constituting the aromatic heterocycle of the aromatic heterocyclic group is preferably a nitrogen atom, an oxygen atom, or a sulfur atom, more preferably a nitrogen atom or a sulfur atom, and even more preferably a sulfur atom. The aromatic heterocyclic group may have substituents. Examples of substituents include the substituent T listed later.

[0020] The aromatic hydrocarbon group may be either a monocyclic or fused ring, but it is preferably a monocyclic ring, and more preferably a benzene ring, because of its high linearity and ease of association. The aromatic hydrocarbon group may have substituents. Examples of substituents include those listed as substituent T later.

[0021] The above -CR L11 =CR L12 R of the group represented by - L11 and R L12 The substituent represented by can be any of the groups listed in substituent T described later, and is preferably a hydrogen atom or an alkyl group. L11 and R L12 Each of these is preferably a hydrogen atom or an alkyl group, independently of the others.

[0022] L 1 In the n-valent conjugated linking group represented by , it is preferable that at least one of the bonding ends with the pyrrolopyrrole ring is an aromatic heterocyclic group, and more preferably that all of the bonding ends with the pyrrolopyrrole ring are aromatic heterocyclic groups, for the reason that a film with superior infrared shielding properties can be formed. Note that the case where all of the bonding ends with the pyrrolopyrrole ring are aromatic heterocyclic groups is, for example, L 1When the n-valent conjugated linking group represented by is a divalent conjugated linking group, it means that both bonding ends with the pyrrolopyrrole ring are aromatic heterocyclic groups.

[0023] L 1 The formula weight of the n-valent conjugated linking group represented by is preferably 60 to 1000, more preferably 120 to 500, and even more preferably 150 to 300.

[0024] R in equation (1) 1 R represents an alkyl group, an aryl group, or a heteroaryl group. 1 If R is an alkyl group or an aryl group, the visible transparency can be improved. Also, R in formula (1) 1 If the group is a heteroaryl group, it can enhance the absorption of light in the visible region.

[0025] R 1 The number of carbon atoms in the alkyl group represented by is preferably 1 to 30. The lower limit is preferably 3 or more. If the specific compound is a pigment, the upper limit of the number of carbon atoms in the alkyl group is preferably 15 or less, more preferably 10 or less, and even more preferably 7 or less. The alkyl group may be linear, branched, or cyclic. The number of carbon atoms in the aryl group is preferably 6 to 40, more preferably 6 to 30, and even more preferably 6 to 20. The heteroaryl group may be a monoring or a fused ring. The number of heteroatoms constituting the heteroaryl ring of the heteroaryl group is preferably 1 to 3. The heteroatoms constituting the heteroaryl ring are preferably nitrogen atoms, oxygen atoms, or sulfur atoms. The number of carbon atoms constituting the heteroaryl ring is preferably 3 to 30, more preferably 3 to 18, and even more preferably 3 to 12. The heteroaryl ring is preferably a 5-membered ring or a 6-membered ring. Alkyl groups, aryl groups, and heteroaryl groups may have substituents or be unsubstituted. Examples of substituents include those listed in substituent T below, and are preferably groups represented by halogen atoms, alkoxy groups, alkylthio groups, acyl groups, alkoxycarbonyl groups, acyloxy groups, aryloxy groups, hydroxyl groups, carboxyl groups, carboxylic acid amide groups, sulfonamide groups, imide groups, or sulfo groups.

[0026] X in equation (1) 1 and X 2 Each of these independently represents N or C-CN, and C-CN is preferred because it is easier to form a film with superior heat resistance. In particular, when used in combination with a resin having an acid group, X 1 and X 2 When using a compound with a C-CN structure, a film with superior heat resistance can be formed compared to when using a compound with a structure where N is used. Also, X in formula (1) 1 and X 2 Compounds with a C-CN structure exhibit excellent visible transparency and readily form films with superior spectral properties.

[0027] Ar in equation (1) 1 and Ar 2 Each of these independently represents either an aryl group or a heteroaryl group, and a heteroaryl group is preferred. The number of carbon atoms in the aryl group is preferably 6 to 40, more preferably 6 to 30, and even more preferably 6 to 20. The heteroaryl group may be a monoring, but it is preferably a fused ring. The number of heteroatoms constituting the heteroaryl ring of the heteroaryl group is preferably 1 to 3. The heteroatoms constituting the heteroaryl ring are preferably nitrogen atoms, oxygen atoms, or sulfur atoms. The number of carbon atoms constituting the heteroaryl ring is preferably 3 to 30, more preferably 3 to 18, and even more preferably 3 to 12. The heteroaryl ring is preferably a 5-membered ring or a 6-membered ring. The heteroaryl group is preferably a group represented by formulas (Har-1) to (Har-10) shown below, and is more preferably a group represented by formulas (Har-1), (Har-2), (Har-4), (Har-7), and (Har-10) due to its excellent lightfastness. [ka]

[0028] In the formula, R a1 ~R a49 Each of the symbols represents an independent hydrogen atom or substituent, and * represents a linkage. a1 ~R a49 The substituent represented by can be any of the groups listed in substituent T below, and is preferably a halogen atom, alkyl group, alkoxy group, aryloxy group, hydroxyl group, aryl group, heteroaryl group, sulfonic acid amide group, cyano group, or silyl group.

[0029] In equation (Har-1), R a1 and R a2 , R a2 and R a3 , R a3 and R a4 They may be joined to each other to form a ring. In equation (Har-2), R a5 and R a6 , R a6 and R a7 , R a7 and R a8 They may be joined to each other to form a ring. In equation (Har-3), R a9 and R a10 , R a10 and R a11 , R a11 and R a12 , R a12 and R a13 They may be joined to each other to form a ring. In equation (Har-4), R a15 and R a16 , R a16 and R a17 , R a17 and R a18 They may be joined to each other to form a ring. In equation (Har-5), R a19 and R a20 , R a20 and R a21 , R a21 and R a22 , R a22 and R a23 , R a23 and R a24 They may be joined to each other to form a ring. In equation (Har-6), R a25 and R a26 , R a26 and R a27 They may be joined to each other to form a ring. In equation (Har-7), R a28 and R a29 , R a29 and R a30 , R a30 and R a31 They may be joined to each other to form a ring. In equation (Har-8), R a32 and R a33 , R a33 and R a34 , R a34 and R a35 , R a35 and R a36 , R a36 and R a37 They may be joined to each other to form a ring. In equation (Har-9), R a38 and R a39 , R a39 and R a40 , R a40 and R a41 , R a41 and R a42 , R a42 and R a43 They may be joined to each other to form a ring. In equation (Har-10), R a44 and Ra45 , R a45 and R a46 , R a46 and R a47 , R a47 and R a48 , R a48 and R a49 They may be joined to each other to form a ring.

[0030] In formulas (Har-1) to (Har-10), the ring formed by the bonding of the above groups is preferably a 5-membered ring or a 6-membered ring.

[0031] Y in equation (1) 1 and Y 2 Each of these independently consists of a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, and -BR. Y1 R Y2 Alternatively, it represents a metal atom, -BR Y1 R Y2 It is preferable that this be the case.

[0032] Y 1 and Y 2 The number of carbon atoms in the alkyl group represented by is preferably 1 to 30, more preferably 1 to 20, even more preferably 1 to 10, even more preferably 1 to 5, and particularly preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have substituents or may be unsubstituted. Examples of substituents include the group listed as substituent T later.

[0033] Y 1 and Y 2 The number of carbon atoms in the aryl group represented by is preferably 6 to 30, more preferably 6 to 20, and even more preferably 6 to 12. The aryl group may have substituents or may be unsubstituted. Examples of substituents include those listed as substituent T later.

[0034] Y 1 and Y 2The number of carbon atoms constituting the heteroaryl group represented by is preferably 1 to 30, and more preferably 1 to 12. Examples of heteroatoms constituting the heteroaryl group include nitrogen, oxygen, and sulfur atoms. The number of heteroatoms constituting the heteroaryl group is preferably 1 to 3, and more preferably 1 or 2. The heteroaryl group is preferably a monocyclic or fused ring, more preferably a monocyclic or a fused ring with 2 to 8 fusions, and even more preferably a monocyclic or a fused ring with 2 to 4 fusions. The heteroaryl group may have substituents or may be unsubstituted. Examples of substituents include those listed as substituent T later.

[0035] Y 1 and Y 2 Examples of metal atoms represented by include magnesium, aluminum, calcium, barium, zinc, tin, aluminum, vanadium, iron, cobalt, nickel, copper, palladium, iridium, and platinum, with aluminum, zinc, vanadium, iron, copper, palladium, iridium, and platinum being preferred.

[0036] -BR Y1 R Y2 R in the group represented by Y1 and R Y2 Each of these independently represents a hydrogen atom or a substituent. Examples of substituents include the groups listed as substituent T later. Y1 and R Y2 Each of these is preferably independently a hydrogen atom, a halogen atom, an alkyl group, an alkenyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, or a heteroaryloxy group; more preferably a halogen atom, an alkyl group, an aryl group, or a heteroaryl group; even more preferably a halogen atom, an alkyl group, or an aryl group; particularly preferably a halogen atom, an aryl group, or an aryl group; and most preferably an aryl group.

[0037] R Y1 and R Y2Examples of halogen atoms represented by include fluorine, chlorine, bromine, and iodine atoms, with fluorine being preferred. R Y1 and R Y2 The number of carbon atoms in the alkyl and alkoxy groups represented by is preferably 1 to 40, more preferably 1 to 30, and even more preferably 1 to 20. The alkyl and alkoxy groups may be linear, branched, or cyclic, but linear or branched is preferred. The alkyl and alkoxy groups may have substituents or may be unsubstituted. Examples of substituents include aryl groups, heteroaryl groups, and halogen atoms. R Y1 and R Y2 The number of carbon atoms in the alkenyl group represented by is preferably 2 to 40, more preferably 2 to 30, and even more preferably 2 to 20. The alkenyl group may have substituents or may be unsubstituted. Examples of substituents include alkyl groups, alkoxy groups, aryl groups, heteroaryl groups, and halogen atoms. R Y1 and R Y2 The number of carbon atoms in the aryl group and aryloxy group represented by is preferably 6 to 20, and more preferably 6 to 12. The aryl group and aryloxy group may have substituents or may be unsubstituted. Examples of substituents include alkyl groups, alkoxy groups, and halogen atoms. R Y1 and R Y2 The heteroaryl group and heteroaryloxy group represented by may be a monocyclic or fused ring. The number of heteroatoms constituting the heteroaryl ring of the heteroaryl group and heteroaryloxy group is preferably 1 to 3. The heteroatoms constituting the heteroaryl ring are preferably nitrogen atoms, oxygen atoms, or sulfur atoms. The number of carbon atoms constituting the heteroaryl ring is preferably 3 to 30, more preferably 3 to 18, and even more preferably 3 to 12. The heteroaryl ring is preferably a 5-membered or 6-membered ring. The heteroaryl group and heteroaryloxy group may have substituents or may be unsubstituted. Examples of substituents include alkyl groups, alkoxy groups, halogen atoms, etc.

[0038] -BR Y1 R Y2 The group R represented by Y1 and R Y2 These may be bonded to each other to form a ring. Examples of the ring that may be formed include the structures shown in (B-1) to (B-5) below. In the following, Rb represents a substituent, and Rb 1 ~Rb 4 Each of the following independently represents a hydrogen atom or substituent, b1 to b3 independently represents an integer from 0 to 4, b4 represents an integer from 0 to 6, and * represents a linkage. Rb and Rb 1 ~Rb 4 Examples of substituents represented by include the groups listed in substituent T described later, with halogen atoms, alkyl groups, and alkoxy groups being preferred. [ka]

[0039] In equation (1), n ​​represents an integer greater than or equal to 2, preferably an integer between 2 and 4, and more preferably 2.

[0040] (substituent T) Examples of substituents T include the following groups: halogen atoms (e.g., fluorine atoms, chlorine atoms, bromine atoms, iodine atoms), alkyl groups (preferably alkyl groups having 1 to 30 carbon atoms), alkenyl groups (preferably alkenyl groups having 2 to 30 carbon atoms), alkynyl groups (preferably alkynyl groups having 2 to 30 carbon atoms), aryl groups (preferably aryl groups having 6 to 30 carbon atoms), heteroaryl groups (preferably heteroaryl groups having 1 to 30 carbon atoms), amino groups (preferably amino groups having 0 to 30 carbon atoms), alkoxy groups (preferably alkoxy groups having 1 to 30 carbon atoms), aryloxy groups (preferably Or, an aryloxy group having 6 to 30 carbon atoms), a heteroaryloxy group (preferably a heteroaryloxy group having 1 to 30 carbon atoms), an acyl group (preferably an acyl group having 2 to 30 carbon atoms), an alkoxycarbonyl group (preferably an alkoxycarbonyl group having 2 to 30 carbon atoms), an aryloxycarbonyl group (preferably an aryloxycarbonyl group having 7 to 30 carbon atoms), a heteroaryloxycarbonyl group (preferably a heteroaryloxycarbonyl group having 2 to 30 carbon atoms), an acyloxy group (preferably an acyloxy group having 2 to 30 carbon atoms) Group), acylamino group (preferably an acylamino group having 2 to 30 carbon atoms), aminocarbonylamino group (preferably an aminocarbonylamino group having 2 to 30 carbon atoms), alkoxycarbonylamino group (preferably an alkoxycarbonylamino group having 2 to 30 carbon atoms), aryloxycarbonylamino group (preferably an aryloxycarbonylamino group having 7 to 30 carbon atoms), sulfamoyl group (preferably a sulfamoyl group having 0 to 30 carbon atoms), sulfamoylamino group (preferably a sulfamoylamino group having 0 to 30 carbon atoms), Bamoyl group (preferably a carbamoyl group having 1 to 30 carbon atoms), alkylthio group (preferably an alkylthio group having 1 to 30 carbon atoms), arylthio group (preferably an arylthio group having 6 to 30 carbon atoms), heteroarylthio group (preferably a heteroarylthio group having 1 to 30 carbon atoms), alkylsulfonyl group (preferably an alkylsulfonyl group having 1 to 30 carbon atoms), alkylsulfonylamino group (preferably an alkylsulfonylamino group having 1 to 30 carbon atoms), arylsulfonyl group (preferably an arylsulfonyl group having 6 to 30 carbon atoms),Arylsulfonylamino group (preferably arylsulfonylamino group having 6 to 30 carbon atoms), heteroarylsulfonyl group (preferably heteroarylsulfonyl group having 1 to 30 carbon atoms), heteroarylsulfonylamino group (preferably heteroarylsulfonylamino group having 1 to 30 carbon atoms), alkylsulfinyl group (preferably alkylsulfinyl group having 1 to 30 carbon atoms), arylsulfinyl group (preferably arylsulfinyl group having 6 to 30 carbon atoms), heteroarylsulfinyl C1-C30 heteroarylsulfinyl groups, ureido groups (preferably C1-C30 ureido groups), hydroxyl groups, nitro groups, carboxyl groups, sulfo groups, phosphoric acid groups, carboxylic acid amide groups, sulfonic acid amide groups, imide groups, phosphino groups, mercapto groups, cyano groups, alkylsulfino groups, arylsulfino groups, arylazo groups, heteroarylazo groups, phosphinyl groups, phosphinyloxy groups, phosphinylamino groups, silyl groups, hydrazino groups, and imino groups. These groups may have further substituents if they are further substituted. Examples of substituents include those described above under substituent T.

[0041] The specific compound is preferably a compound represented by formula (2). [ka] In formula (2), L 2 This represents a divalent conjugated linking group containing an aromatic heterocyclic group. R 2 and R 3 Each of these independently represents an alkyl group, an aryl group, or a heteroaryl group. X 3 ~X 6 Each of these independently represents N or C-CN, Ar 3 ~Ar 6 Each of these independently represents an aryl group or a heteroaryl group. Y 3 ~Y 6 Each of these independently consists of a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, and -BR. Y1 RY2 Or it represents a metal atom, R Y1 and R Y2 Each of these independently represents a hydrogen atom or a substituent, and R Y1 and R Y2 They may be joined together to form a ring.

[0042] R in equation (2) 2 and R 3 R in equation (1) 1 This is synonymous with the same thing, and the preferred range is also similar. X in equation (2) 3 ~X 6 X in equation (1) 1 and X 2 This is synonymous with the same thing, and the preferred range is also similar. Ar in equation (2) 3 ~Ar 6 This is the Ar in equation (1). 1 and Ar 2 This is synonymous with the same thing, and the preferred range is also similar. Y in equation (2) 3 ~Y 6 Y in equation (1) 1 and Y 2 This is synonymous with the same thing, and the preferred range is also similar.

[0043] In formula (2), L 2 As a divalent conjugated linking group containing an aromatic heterocyclic group represented by, the L in formula (1) is 1 (L1) to (L3) are listed as n-valent conjugated linking groups represented by .

[0044] L 2 The n-valent conjugated linking group represented by is preferably such that at least one of its bonding ends to the pyrrolopyrrole ring is an aromatic heterocyclic group, and more preferably such that both bonding ends to the pyrrolopyrrole ring are aromatic heterocyclic groups, because it can form a film with superior infrared shielding properties.

[0045] L 2 The divalent conjugated linking group represented by is preferably the group represented by formula (L-1). [ka] In formula (L-1), Z 1 and Z 2 These are S, O, or NR, respectively, independently. Z1 Represents R Z1 represents a hydrogen atom or substituent, W 1 and W 2 Each of these independently applies -CR W1 Or it represents N, R W1 represents a hydrogen atom or substituent, R L1 and R L2 Each of these independently represents a hydrogen atom or a substituent. L 11 This represents a single bond or a divalent conjugated linking group. The above divalent conjugated linking groups include aromatic hydrocarbon groups, aromatic heterocyclic groups, and -CR groups. L11 =CR L12 - represents a group consisting of -C≡C- or a combination thereof, R L11 and R L12 Each of these independently represents a hydrogen atom or a substituent.

[0046] Z 1 and Z 2 These are S, O, or NR, respectively, independently. Z1 It represents and is preferably S. Z1 Examples of substituents represented by include the groups listed above for substituent T, and are preferably alkyl groups.

[0047] W 1 and W 2 Each of these independently applies -CR W1 Alternatively, it represents N, CR W1 It is preferable that this is the case. W1 Examples of substituents represented by include the groups listed above for substituent T, and are preferably alkyl groups or halogen atoms.

[0048] R L1 and R L2Each of these independently represents a hydrogen atom or a substituent, and is preferably a hydrogen atom. Examples of substituents include the groups listed above in substituent T, and is preferably an alkyl group or a halogen atom.

[0049] L 11 represents a single bond or a divalent conjugated linking group, and the above divalent conjugated linking group is an aromatic hydrocarbon group, an aromatic heterocyclic group, or -CR L11 =CR L12 - represents a group consisting of -C≡C- or a combination thereof, R L11 and R L12 Each of these independently represents a hydrogen atom or a substituent.

[0050] The above aromatic heterocyclic group may be either a monocyclic or fused ring, but it is preferable to be a monocyclic ring because it has high linearity and is more easily associated. Furthermore, the above aromatic heterocyclic group is preferably a five-membered or six-membered aromatic heterocyclic group, and it is preferable to be a five-membered aromatic heterocyclic group because it can form a film with better light resistance and heat resistance. Furthermore, the heteroatom constituting the aromatic heterocycle of the aromatic heterocyclic group is preferably a nitrogen atom, an oxygen atom, or a sulfur atom, more preferably a nitrogen atom or a sulfur atom, and even more preferably a sulfur atom. The aromatic heterocyclic group may have substituents. Examples of substituents include the groups listed as substituent T above.

[0051] The aromatic hydrocarbon group may be either a monocyclic or fused ring, but it is preferably a monocyclic ring, and more preferably a benzene ring, because of its high linearity and ease of association. The aromatic hydrocarbon group may have substituents. Examples of such substituents include the substituent T mentioned above.

[0052] The above -CR L11 =CR L12 R of the group represented by - L11 and R L12 The substituent represented by can be any of the groups listed above as substituent T, and is preferably a hydrogen atom or an alkyl group.L11 and R L12 Each of these is preferably a hydrogen atom or an alkyl group, independently of the others.

[0053] L 11 It is preferable that the group is a single bond, -C≡C-, or an aromatic heterocyclic group, and is more preferable to be an aromatic heterocyclic group because it can form a film with better light resistance and heat resistance.

[0054] The group represented by formula (L-1) is preferably the group represented by formula (L-2). [ka] In formula (L-2), Z 1 and Z 2 These are S, O, or NR, respectively, independently. Z1 Represents R Z1 represents a hydrogen atom or substituent, W 1 and W 2 Each of these independently applies -CR W1 Or it represents N, R W1 represents a hydrogen atom or substituent, R L1 and R L2 Each of these independently represents a hydrogen atom or a substituent. L 11 This represents a single bond or a divalent conjugated linking group. The above divalent conjugated linking groups include aromatic hydrocarbon groups, aromatic heterocyclic groups, and -CR groups. L11 =CR L12 - represents a group consisting of -C≡C- or a combination thereof, R L11 and R L12 Each of these independently represents a hydrogen atom or a substituent.

[0055] Z in equation (L-2) 1 and Z 2 This is Z in equation (L-1). 1 and Z 2 This is synonymous with the same thing, and the preferred range is also similar. W in equation (L-2) 1and W 2 This is W in equation (L-1). 1 and W 2 This is synonymous with the same thing, and the preferred range is also similar. R in equation (L-2) L1 and R L2 R in equation (L-1) L1 and R L2 This is synonymous with the same thing, and the preferred range is also similar. L in equation (L-2) 11 L is the L in equation (L-1). 11 This is synonymous with the same thing, and the preferred range is also similar.

[0056] The specific compound is preferably the compound represented by formula (2A). The compound represented by formula (2A) is the compound of the present invention. [ka] In formula (2A), L 2A represents the base expressed by formula (L-1), R 2 and R 3 Each of these independently represents an alkyl group, an aryl group, or a heteroaryl group. Ar 3 ~Ar 6 Each of these independently represents an aryl group or a heteroaryl group. Y 3 ~Y 6 Each of these independently consists of a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, and -BR. Y1 R Y2 Or it represents a metal atom, R Y1 and R Y2 Each of these independently represents a hydrogen atom or a substituent, and R Y1 and R Y2 They may be joined together to form a ring.

[0057] L in equation (2A) 2A The group represented by formula (L-1) is synonymous with the group represented by formula (L-1) described above, and the preferred range is also the same. R in equation (2A) 2and R 3 R in equation (1) 1 This is synonymous with the same thing, and the preferred range is also similar. Ar in equation (2A) 3 ~Ar 6 This is the Ar in equation (1). 1 and Ar 2 This is synonymous with the same thing, and the preferred range is also similar. Y in equation (2A) 3 ~Y 6 Y in equation (1) 1 and Y 2 This is synonymous with the same thing, and the preferred range is also similar.

[0058] The molecular weight of the specific compound is preferably 800 to 6000, more preferably 900 to 4000, and even more preferably 1000 to 3000.

[0059] The maximum absorption wavelength of a particular compound is preferably located at a wavelength of 650 nm or higher, more preferably in the range of 680 to 2000 nm, and even more preferably in the range of 700 to 1500 nm.

[0060] The absorbance and maximum absorption wavelength of a specific compound can be determined by dissolving the compound in a solvent to prepare a solution and measuring the absorbance of the solution. Examples of solvents used for solution preparation include chloroform, dimethyl sulfoxide (DMSO), and tetrahydrofuran (THF). If the specific compound is soluble in chloroform, chloroform is used as the solvent. If the specific compound is insoluble in chloroform but soluble in dimethyl sulfoxide (DMSO) or tetrahydrofuran (THF), dimethyl sulfoxide (DMSO) or tetrahydrofuran (THF) is used as the solvent.

[0061] The specified compound may be a pigment or a dye. In this specification, formula (1) also includes its resonance structure. That is, compounds of the resonance structure of formula (1) are also included in the specified compounds of this invention.

[0062] Specific examples of particular compounds include the compounds (A001 to A015) with the structures described in the examples below.

[0063] The content of the specific compound is preferably 1% by mass or more, more preferably 3% by mass or more, even more preferably 5% by mass or more, and particularly preferably 10% by mass or more, based on the total solid content of the composition. Furthermore, the upper limit of the content of the specific compound is preferably 90% by mass or less, more preferably 80% by mass or less, and even more preferably 60% by mass or less. The composition may contain only one specific compound or two or more. If two or more are included, it is preferable that their total amount falls within the above range. The composition of the present invention may also contain decomposition products of the specific compound.

[0064] <<Curable compound>> The composition of the present invention contains a curable compound. Examples of curable compounds include polymerizable compounds and resins. The resin may be a non-polymerizable resin (a resin without polymerizable groups) or a polymerizable resin (a resin having polymerizable groups). Examples of polymerizable groups include ethylenically unsaturated bond-containing groups, cyclic ether groups, methylol groups, and alkoxymethyl groups. Examples of ethylenically unsaturated bond-containing groups include vinyl groups, vinylphenyl groups, (meth)allyl groups, (meth)acryloyl groups, (meth)acryloyloxy groups, and (meth)acryloylamide groups, with (meth)allyl groups, (meth)acryloyl groups, and (meth)acryloyloxy groups being preferred, and (meth)acryloyloxy groups being more preferred. Examples of cyclic ether groups include epoxy groups and oxetanyl groups, with epoxy groups being preferred.

[0065] It is preferable to use a curable compound that contains at least a resin, and it is even more preferable to use one that contains a resin having an acid group, as this promotes the association formation of the specific compounds mentioned above during film formation, thereby enabling the formation of a film with superior light resistance. Furthermore, when the composition of the present invention is used as a composition for photolithography, it is preferable to use a resin and a polymerizable monomer (monomer-type polymerizable compound) as the curable compound, and it is even more preferable to use a resin and a polymerizable monomer (monomer-type polymerizable compound) having an ethylenically unsaturated bond-containing group.

[0066] (polymerizable compound) Examples of polymerizable compounds include compounds having an ethylenically unsaturated bond-containing group, compounds having a cyclic ether group, compounds having a methylol group, and compounds having an alkoxymethyl group. Compounds having an ethylenically unsaturated bond-containing group can preferably be used as radical polymerizable compounds. Compounds having a cyclic ether group can preferably be used as cationic polymerizable compounds.

[0067] Examples of polymerizable compounds of the resin type include resins containing repeating units having polymerizable groups.

[0068] The molecular weight of monomer-type polymerizable compounds (polymerizable monomers) is preferably less than 2000, and more preferably 1500 or less. The lower limit of the molecular weight of polymerizable monomers is preferably 100 or more, and more preferably 200 or more. The weight-average molecular weight (Mw) of resin-type polymerizable compounds is preferably 2000 to 2000000. The upper limit of the weight-average molecular weight is preferably 1000000 or less, and more preferably 500000 or less. The lower limit of the weight-average molecular weight is preferably 3000 or more, and more preferably 5000 or more.

[0069] The polymerizable monomer, which has an ethylenically unsaturated bond-containing group, is preferably a 3-15 functional (meth)acrylate compound, and more preferably a 3-6 functional (meth)acrylate compound. Specific examples include the compounds described in paragraphs 0095 to 0108 of JP 2009-288705, paragraph 0227 of JP 2013-029760, paragraphs 0254 to 0257 of JP 2008-292970, paragraphs 0034 to 0038 of JP 2013-253224, paragraph 0477 of JP 2012-208494, JP 2017-048367, Japanese Patent No. 6057891, Japanese Patent No. 6031807, and Japanese Patent No. 2017-194662, the contents of which are incorporated herein by reference.

[0070] Compounds containing ethylenically unsaturated bond groups include dipentaerythritol tri(meth)acrylate (commercially available as KAYARAD D-330; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetra(meth)acrylate (commercially available as KAYARAD D-320; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol penta(meth)acrylate (commercially available as KAYARAD D-310; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol hexa(meth)acrylate (commercially available as KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd., and NK Ester A-DPH-12E; manufactured by Shin Nakamura Chemical Industry Co., Ltd.), and compounds in which the (meth)acryloyl group of these compounds is linked via ethylene glycol and / or propylene glycol residues (for example, SR454 and SR499, commercially available from Sartomer). Furthermore, compounds containing ethylenically unsaturated bond-containing groups can also be used, such as diglycerin EO (ethylene oxide) modified (meth)acrylate (commercially available as M-460; manufactured by Toagosei), pentaerythritol tetraacrylate (manufactured by Shin-Nakamura Chemical Industry Co., Ltd., NK ester A-TMMT), 1,6-hexanediol diacrylate (manufactured by Nippon Kayaku Co., Ltd., KAYARAD HDDA), RP-1040 (manufactured by Nippon Kayaku Co., Ltd.), Aronics TO-2349 (manufactured by Toagosei Co., Ltd.), NK Oligo UA-7200 (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.), 8UH-1006, 8UH-1012 (manufactured by Taisei Fine Chemical Co., Ltd.), and light acrylate POB-A0 (manufactured by Kyoeisha Chemical Co., Ltd.).

[0071] Furthermore, as compounds containing ethylenically unsaturated bond groups, it is also preferable to use trifunctional (meth)acrylate compounds such as trimethylolpropane tri(meth)acrylate, trimethylolpropanepropylene oxide-modified tri(meth)acrylate, trimethylolpropaneethylene oxide-modified tri(meth)acrylate, isocyanurate ethylene oxide-modified tri(meth)acrylate, and pentaerythritol tri(meth)acrylate. Commercially available trifunctional (meth)acrylate compounds include Aronics M-309, M-310, M-321, M-350, M-360, M-313, M-315, M-306, M-305, M-303, M-452, M-450 (manufactured by Toagosei Co., Ltd.), NK Ester A9300, A-GLY-9E, A-GLY-20E, A-TMM-3, A-TMM-3L, A-TMM-3LM-N, A-TMPT, TMPT (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.), and KAYARAD GPO-303, TMPTA, THE-330, TPA-330, PET-30 (manufactured by Nippon Kayaku Co., Ltd.).

[0072] Compounds containing ethylenically unsaturated bond groups may further contain acidic groups such as carboxyl groups, sulfo groups, and phosphate groups. Examples of commercially available such compounds include Arronix M-305, M-510, M-520, and Arronix TO-2349 (manufactured by Toagosei Co., Ltd.).

[0073] Compounds having an ethylenically unsaturated bond-containing group can also be compounds having a caprolactone structure. For compounds having a caprolactone structure, refer to paragraphs 0042 to 0045 of Japanese Patent Application Publication No. 2013-253224, which are incorporated herein by reference. Examples of compounds having a caprolactone structure include DPCA-20, DPCA-30, DPCA-60, DPCA-120, etc., which are commercially available as a series from Nippon Kayaku Co., Ltd.

[0074] As the compound having an ethylenically unsaturated bond-containing group, a compound having an ethylenically unsaturated bond-containing group and an alkyleneoxy group can also be used. Such a compound is preferably a compound having an ethylenically unsaturated bond-containing group and an ethyleneoxy group and / or a propyleneoxy group, more preferably a compound having an ethylenically unsaturated bond-containing group and an ethyleneoxy group, and even more preferably a 3- to 6-functional (meth)acrylate compound having 4 to 20 ethyleneoxy groups. As commercially available products, for example, SR-494, a 4-functional (meth)acrylate having 4 ethyleneoxy groups manufactured by Sartomer, and KAYARAD TPA-330, a 3-functional (meth)acrylate having 3 isobutyleneoxy groups, can be mentioned.

[0075] As the compound having an ethylenically unsaturated bond-containing group, a polymerizable compound having a fluorene skeleton can also be used. As commercially available products, Ogsool EA-0200, EA-0300 (manufactured by Osaka Gas Chemical Co., Ltd., (meth)acrylate monomers having a fluorene skeleton), etc. can be mentioned.

[0076] As the compound having an ethylenically unsaturated bond-containing group, it is also preferable to use a compound that substantially does not contain environmentally regulated substances such as toluene. As commercially available products of such compounds, KAYARAD DPHA LT, KAYARAD DPEA-12 LT (manufactured by Nippon Kayaku Co., Ltd.), etc. can be mentioned.

[0077] As the compound having an ethylenically unsaturated bond-containing group, it is also preferable to use UA-7200 (manufactured by Shin-Nakamura Chemical Co., Ltd.), DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, UA-306I, AH-600, T-600, AI-600, LINC-202UA (manufactured by Kyoeisha Chemical Co., Ltd.), 8UH-1006, 8UH-1012 (manufactured by Daisheng Fine Chemical Co., Ltd.), Light Acrylate POB-A0 (manufactured by Kyoeisha Chemical Co., Ltd.), etc.

[0078] Compounds having a cyclic ether group include compounds having an epoxy group and compounds having an oxetanyl group, with compounds having an epoxy group being preferred. Compounds having an epoxy group include compounds having 1 to 100 epoxy groups in one molecule. The upper limit of the number of epoxy groups can be, for example, 10 or less, or 5 or less. The lower limit of the number of epoxy groups is preferably 2 or more. Compounds having epoxy groups can also be those described in paragraphs 0034 to 0036 of JP 2013-011869, paragraphs 0147 to 0156 of JP 2014-043556, paragraphs 0085 to 0092 of JP 2014-089408, and those described in JP 2017-179172, and these contents are incorporated herein by reference.

[0079] The compound having a cyclic ether group may be a low molecular weight compound (e.g., molecular weight less than 1000) or a high molecular weight compound (macromolecule) (e.g., molecular weight 1000 or more; if it is a polymer, the weight-average molecular weight is 1000 or more). The weight-average molecular weight of the cyclic ether group is preferably 200 to 100,000, more preferably 500 to 50,000. The upper limit of the weight-average molecular weight is preferably 10,000 or less, more preferably 5,000 or less, and even more preferably 3,000 or less.

[0080] As compounds having a cyclic ether group, the compounds described in paragraphs 0034 to 0036 of Japanese Patent Publication No. 2013-011869, the compounds described in paragraphs 0147 to 0156 of Japanese Patent Publication No. 2014-043556, the compounds described in paragraphs 0085 to 0092 of Japanese Patent Publication No. 2014-089408, and the compounds described in Japanese Patent Publication No. 2017-179172 can also be used.

[0081] Commercially available compounds containing cyclic ether groups include Denacol EX-212L, EX-212, EX-214L, EX-214, EX-216L, EX-216, EX-321L, EX-321, EX-850L, EX-850 (all manufactured by Nagase ChemteX Corporation), ADEKA RESIN EP-4000S, EP-4003S, EP-4010S, EP-4011S (all manufactured by ADEKA Corporation), NC-2000, NC-3000, NC-7300, XD-1000, EPPN-501, EPPN-502 (all manufactured by ADEKA Corporation), Celoxide 2021P, Celoxide 2081, Celoxide 2083, Celoxide 2085, EHPE3150, and EPOLEAD PB. 3600, PB 4700 (all manufactured by Daicel Corporation), Cyclomer P ACA 200M, ACA 230AA, ACA Z250, ACA Z251, ACA Z300, ACA Z320 (all manufactured by Daicel Corporation), jER1031S, jER157S65, jER152, jER154, jER157S70 (all manufactured by Mitsubishi Chemical Corporation), Aronoxetane OXT-121, OXT-221, OX-SQ, PNOX (all manufactured by Toagosei Co., Ltd.), Adegaglycyrrhizol Examples include ED-505 (manufactured by ADEKA Corporation, epoxy group-containing monomer), Marproof G-0150M, G-0105SA, G-0130SP, G-0250SP, G-1005S, G-1005SA, G-1010S, G-2050M, G-01100, G-01758 (manufactured by NOF Corporation, epoxy group-containing polymer), OXT-101, OXT-121, OXT-212, OXT-221 (all manufactured by Toagosei Co., Ltd., oxetanyl group-containing monomer), OXE-10, OXE-30 (all manufactured by Osaka Organic Chemical Industry Co., Ltd., oxetanyl group-containing monomer).

[0082] Compounds containing a methylol group (hereinafter also referred to as methylol compounds) include compounds in which the methylol group is bonded to a nitrogen atom or a carbon atom forming an aromatic ring. Furthermore, compounds having an alkoxymethyl group (hereinafter also referred to as alkoxymethyl compounds) include compounds in which the alkoxymethyl group is bonded to a nitrogen atom or a carbon atom forming an aromatic ring. Preferred compounds in which an alkoxymethyl group or a methylol group is bonded to a nitrogen atom include alkoxymethylated melamine, methylolated melamine, alkoxymethylated benzoguanamine, methylolated benzoguanamine, alkoxymethylated glycoluryl, methylolated glycoluryl, alkoxymethylated urea, and methylolated urea. In addition, compounds described in paragraphs 0134 to 0147 of Japanese Patent Publication No. 2004-295116 and paragraphs 0095 to 0126 of Japanese Patent Publication No. 2014-089408 can also be used.

[0083] (resin) The composition of the present invention may use a resin as the curable compound. It is preferable to use a curable compound that contains at least a resin. The resin is used, for example, to disperse pigments or other materials in the composition, or as a binder. A resin primarily used to disperse pigments or other materials in a composition is also called a dispersant. However, such uses of the resin are merely examples, and the resin may be used for purposes other than those mentioned above. A resin having polymerizable groups also falls under the category of a polymerizable compound.

[0084] The weight-average molecular weight of the resin is preferably between 3,000 and 2,000,000. The upper limit is preferably 1,000,000 or less, and more preferably 500,000 or less. The lower limit is preferably 4,000 or more, and more preferably 5,000 or more.

[0085] Examples of resins include (meth)acrylic resins, epoxy resins, ene-thiol resins, polycarbonate resins, polyether resins, polyarylate resins, polysulfone resins, polyethersulfone resins, polyphenylene resins, polyarylene etherphosphine oxide resins, polyimide resins, polyamide resins, polyamide-imide resins, polyolefin resins, cyclic olefin resins, polyester resins, styrene resins, vinyl acetate resins, polyvinyl alcohol resins, polyvinyl acetal resins, polyurethane resins, and polyurea resins. One of these resins may be used alone, or two or more may be used in mixture form. Among cyclic olefin resins, norbornene resin is preferred from the viewpoint of improving heat resistance. Examples of commercially available norbornene resins include the ARTON series (e.g., ARTON F4520) manufactured by JSR Corporation. Furthermore, the resins include those described in the examples of International Publication No. 2016 / 088645, those described in Japanese Patent Publication No. 2017-057265, those described in Japanese Patent Publication No. 2017-032685, those described in Japanese Patent Publication No. 2017-075248, those described in Japanese Patent Publication No. 2017-066240, those described in Japanese Patent Publication No. 2017-167513, those described in Japanese Patent Publication No. 2017-173787, and those described in paragraphs 0041 to 0060 of Japanese Patent Publication No. 2017-206689. The following resins can also be used: the resin described in paragraphs 0022 to 0071 of Japanese Patent Publication No. 2018-010856, the blocked polyisocyanate resin described in Japanese Patent Publication No. 2016-222891, the resin described in Japanese Patent Publication No. 2020-122052, the resin described in Japanese Patent Publication No. 2020-111656, the resin described in Japanese Patent Publication No. 2020-139021, and the resin described in Japanese Patent Publication No. 2017-138503, which includes a structural unit having a ring structure in the main chain and a structural unit having a biphenyl group in the side chain. Furthermore, a resin having a fluorene skeleton can also be preferably used as the resin. For resins having a fluorene skeleton, the description in U.S. Patent Application Publication No. 2017 / 0102610 can be referenced, and this content is incorporated herein by reference.Furthermore, as the resin, the resin described in paragraphs 0199 to 0233 of Japanese Patent Publication No. 2020-186373, the alkali-soluble resin described in Japanese Patent Publication No. 2020-186325, and the resin represented by Formula 1 described in Korean Published Patent No. 10-2020-0078339 can also be used.

[0086] It is preferable to use a resin having acidic groups as the resin. Examples of acidic groups include carboxyl groups, phosphate groups, sulfo groups, and phenolic hydroxyl groups. There may be only one type of acidic group or two or more types. The resin having acidic groups can also be used as a dispersant. The acid value of the resin having acidic groups is preferably 30 to 500 mg KOH / g. The lower limit is preferably 50 mg KOH / g or more, and more preferably 70 mg KOH / g or more. The upper limit is preferably 400 mg KOH / g or less, more preferably 200 mg KOH / g or less, even more preferably 150 mg KOH / g or less, and most preferably 120 mg KOH / g or less.

[0087] The resin may also preferably include a resin containing repeating units derived from the compound represented by formula (ED1) and / or the compound represented by formula (ED2) (hereinafter, these compounds may be referred to as "ether dimers").

[0088] [ka]

[0089] In formula (ED1), R 1 and R 2 Each of these independently represents a hydrocarbon group having 1 to 25 carbon atoms, which may have a hydrogen atom or a substituent. [ka] In formula (ED2), R represents a hydrogen atom or an organic group having 1 to 30 carbon atoms. For specific examples of formula (ED2), refer to the description in Japanese Patent Publication No. 2010-168539.

[0090] Regarding specific examples of the ether dimer, paragraph number 0317 of JP-A-2013-029760 can be referred to, and this content is incorporated herein.

[0091] As the resin, it is also preferable to use a resin having a polymerizable group. The polymerizable group is preferably an ethylenically unsaturated bond-containing group and a cyclic ether group, and more preferably an ethylenically unsaturated bond-containing group.

[0092] As the resin, it is also preferable to use a resin containing a repeating unit derived from the compound represented by the formula (X).

Chemical formula

[0093] Examples of the compound represented by the formula (X) include ethylene oxide or propylene oxide-modified (meth)acrylate of paracumylphenol. Commercially available products include Aronix M-110 (manufactured by Toagosei Co., Ltd.).

[0094] The resin may also preferably contain a resin as a dispersant. Examples of dispersants include acidic dispersants (acidic resins) and basic dispersants (basic resins). Here, an acidic dispersant (acidic resin) refers to a resin in which the amount of acidic groups is greater than the amount of basic groups. As for acidic dispersants (acidic resins), when the total amount of acidic groups and basic groups is taken as 100 mol%, resins with an acidic group content of 20 mol% or more are preferred, resins with an acidic group content of 50 mol% or more are more preferred, and resins with an acidic group content of 70 mol% or more are even more preferred. There is no particular upper limit, but for example, 90 mol% is an example. The acidic groups of the acidic dispersant (acidic resin) are preferably carboxyl groups. The acid value of the acidic dispersant (acidic resin) is preferably 10 to 105 mg KOH / g. A basic dispersant (basic resin) refers to a resin in which the amount of basic groups is greater than the amount of acidic groups. As a basic dispersant (basic resin), a resin in which the amount of basic groups exceeds 50 mol% when the total amount of acidic groups and basic groups is set to 100 mol% is preferred. There is no particular upper limit, but for example, 90 mol% is an example. The basic group possessed by the basic dispersant is preferably an amino group.

[0095] The resin used as a dispersant is preferably a graft resin. Details of graft resins can be found in paragraphs 0025 to 0094 of Japanese Patent Application Publication No. 2012-255128, which are incorporated herein by reference.

[0096] The resin used as a dispersant is preferably a polyimine-based dispersant containing a nitrogen atom in at least one of its main chain and side chains. Preferably, the polyimine-based dispersant has a main chain having a substructure with functional groups having a pKa of 14 or less, and side chains with 40 to 10,000 atoms, and contains a basic nitrogen atom in at least one of its main chain and side chains. The basic nitrogen atom is not particularly limited as long as it exhibits basic properties. For polyimine-based dispersants, refer to paragraphs 0102 to 0166 of Japanese Patent Application Publication No. 2012-255128, the contents of which are incorporated herein by reference.

[0097] The resin used as a dispersant is preferably a resin with a structure in which multiple polymer chains are bonded to the core. Examples of such resins include dendrimers (including star-shaped polymers). Specific examples of dendrimers include polymer compounds C-1 to C-31 described in paragraphs 0196 to 0209 of Japanese Patent Application Publication No. 2013-043962.

[0098] The resin used as a dispersant is preferably a resin containing repeating units having ethylenically unsaturated bond-containing groups in their side chains. The content of repeating units having ethylenically unsaturated bond-containing groups in their side chains is preferably 10 mol% or more, more preferably 10 to 80 mol%, and even more preferably 20 to 70 mol% of the total repeating units of the resin.

[0099] Furthermore, as a dispersant, the resin described in Japanese Patent Publication No. 2018-087939, the block copolymers (EB-1) to (EB-9) described in paragraphs 0219 to 0221 of Japanese Patent No. 6432077, polyethyleneimine having polyester side chains described in International Publication No. 2016 / 104803, the block copolymer described in International Publication No. 2019 / 125940, the block polymer having acrylamide structural units described in Japanese Patent Publication No. 2020-066687, and the block polymer having acrylamide structural units described in Japanese Patent Publication No. 2020-066688 can also be used.

[0100] Dispersants are also available commercially, and specific examples include the DISPERBYK series from BIC Chemie, the SOLSPERSE series from Lubrizol Nippon, the Efka series from BASF, and the Azisper series from Ajinomoto Fine Techno Co., Ltd. Furthermore, the products described in paragraph 0129 of Japanese Patent Publication No. 2012-137564 and paragraph 0235 of Japanese Patent Publication No. 2017-194662 can also be used as dispersants.

[0101] The content of the curable compound is preferably 1 to 95% by mass of the total solid content of the composition. The lower limit is preferably 2% by mass or more, more preferably 5% by mass or more, even more preferably 7% by mass or more, and particularly preferably 10% by mass or more. The upper limit is preferably 94% by mass or less, more preferably 90% by mass or less, even more preferably 85% by mass or less, and particularly preferably 80% by mass or less.

[0102] When the composition of the present invention contains a polymerizable compound as a curable compound, the content of the polymerizable compound is preferably 1 to 85% by mass of the total solid content of the composition. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 75% by mass or less, and even more preferably 70% by mass or less.

[0103] When the composition of the present invention contains a polymerizable monomer as a curable compound, the content of the polymerizable monomer is preferably 1 to 50% by mass of the total solid content of the composition. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 30% by mass or less, and more preferably 20% by mass or less.

[0104] When the composition of the present invention contains a compound having an ethylenically unsaturated bond-containing group as a curable compound, the content of the compound having an ethylenically unsaturated bond-containing group is preferably 1 to 70% by mass of the total solid content of the composition. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 65% ​​by mass or less, and more preferably 60% by mass or less.

[0105] When the composition of the present invention contains a resin as a curable compound, the resin content is preferably 1 to 85% by mass of the total solid content of the composition. The lower limit is preferably 2% by mass or more, more preferably 5% by mass or more, even more preferably 7% by mass or more, and particularly preferably 10% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 75% by mass or less, even more preferably 70% by mass or less, and particularly preferably 40% by mass or less. Furthermore, the content of the resin having acid groups is preferably 1 to 85% by mass of the total solid content of the composition. The lower limit is preferably 2% by mass or more, more preferably 5% by mass or more, even more preferably 7% by mass or more, and particularly preferably 10% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 75% by mass or less, even more preferably 70% by mass or less, and particularly preferably 40% by mass or less. Furthermore, the content of the resin having an acid group is preferably 5 to 1000 parts by mass per 100 parts by mass of the specific compound. The lower limit is preferably 10 parts by mass or more, and more preferably 30 parts by mass or more. The upper limit is preferably 500 parts by mass or less, and more preferably 300 parts by mass or less.

[0106] When the composition of the present invention contains a resin as a dispersant, the content of the resin as a dispersant is preferably 0.1 to 40% by mass of the total solid content of the composition. The upper limit is preferably 25% by mass or less, and more preferably 20% by mass or less. The lower limit is preferably 0.5% by mass or more, and more preferably 1% by mass or more. Furthermore, the content of the resin as a dispersant is preferably 1 to 100 parts by mass per 100 parts by mass of the specified compound described above. The upper limit is preferably 80 parts by mass or less, more preferably 75 parts by mass or less. The lower limit is preferably 2.5 parts by mass or more, and more preferably 5 parts by mass or more.

[0107] The composition of the present invention may contain only one curable compound or two or more curable compounds. When two or more curable compounds are included, it is preferable that their total amount be within the above range.

[0108] <<Polymerization initiator>> If the composition of the present invention contains a polymerizable compound, it is preferable that the composition of the present invention further contains a polymerization initiator. Examples of polymerization initiators include photopolymerization initiators and thermal polymerization initiators, with photopolymerization initiators being preferred. A photopolymerization initiator is a compound that generates active species such as radicals in response to light energy to initiate or promote the polymerization reaction of a polymerizable compound. A thermal polymerization initiator is a compound that generates active species such as radicals in response to thermal energy to initiate or promote the polymerization reaction of a polymerizable compound. The polymerization initiator is preferably a radical polymerization initiator.

[0109] Examples of thermal polymerization initiators include pinacol compounds, α-hydroxyketone compounds, α-aminoketone compounds, benzyldimethylketal compounds, organic peroxides, and azo compounds.

[0110] Examples of photopolymerization initiators include halogenated hydrocarbon derivatives (e.g., compounds having a triazine skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazole compounds, oxime compounds, organic peroxides, thio compounds, ketone compounds, aromatic onium salts, α-hydroxyketone compounds, and α-aminoketone compounds. From the viewpoint of exposure sensitivity, the photopolymerization initiator is preferably a trihalomethyltriazine compound, benzyldimethylketal compound, α-hydroxyketone compound, α-aminoketone compound, acylphosphine compound, phosphine oxide compound, metallocene compound, oxime compound, hexaarylbiimidazole compound, onium compound, benzothiazole compound, benzophenone compound, acetophenone compound, cyclopentadiene-benzene-iron complex, halomethyloxadiazole compound, and 3-arylsubstituted coumarin compound, more preferably a compound selected from oxime compounds, α-hydroxyketone compounds, α-aminoketone compounds, and acylphosphine compounds, and even more preferably an oxime compound. Furthermore, as photopolymerization initiators, the compounds described in paragraphs 0065-0111 of Japanese Patent Publication No. 2014-130173, the compounds described in Japanese Patent No. 6301489, and MATERIAL STAGE Examples include peroxide-based photopolymerization initiators described in pp. 37-60, Vol. 19, No. 3, 2019; photopolymerization initiators described in International Publication No. 2018 / 221177; photopolymerization initiators described in International Publication No. 2018 / 110179; photopolymerization initiators described in Japanese Patent Publication No. 2019-043864; photopolymerization initiators described in Japanese Patent Publication No. 2019-044030; peroxide-based initiators described in Japanese Patent Publication No. 2019-167313; aminoacetophenone-based initiators having an oxazolidine group described in Japanese Patent Publication No. 2020-055992; oxime-based photopolymerization initiators described in Japanese Patent Publication No. 2013-190459; polymers described in Japanese Patent Publication No. 2020-172619; and compounds represented by Formula 1 described in International Publication No. 2020 / 152120, the contents of which are incorporated herein by reference.

[0111] Specific examples of hexaarylbiimidazole compounds include 2,2',4-tris(2-chlorophenyl)-5-(3,4-dimethoxyphenyl)-4,5-diphenyl-1,1'-biimidazole.

[0112] Commercially available α-hydroxyketone compounds include Omnirad 184, Omnirad 1173, Omnirad 2959, Omnirad 127 (all manufactured by IGM Resins BV), and Irgacure 184, Irgacure 1173, Irgacure 2959, and Irgacure 127 (all manufactured by BASF). Commercially available α-aminoketone compounds include Omnirad 907, Omnirad 369, Omnirad 369E, and Omnirad 379EG (all manufactured by IGM Resins BV), and Irgacure 907, Irgacure 369, Irgacure 369E, and Irgacure 379EG (all manufactured by BASF). Commercially available acylphosphine compounds include Omnirad 819 and Omnirad TPO (both manufactured by IGM Resins BV), and Irgacure 819 and Irgacure TPO (both manufactured by BASF).

[0113] Examples of oxime compounds include the compounds described in Japanese Patent Publication No. 2001-233842, the compounds described in Japanese Patent Publication No. 2000-080068, the compounds described in Japanese Patent Publication No. 2006-342166, the compounds described in JCSPerkin II (1979, pp. 1653-1660), the compounds described in JCSPerkin II (1979, pp. 156-162), and the Journal of Photopolymer Science and Examples include compounds described in Technology (1995, pp. 202-232), compounds described in Japanese Patent Publication No. 2000-066385, compounds described in Japanese Patent Publication No. 2004-534797, compounds described in Japanese Patent Publication No. 2017-019766, compounds described in Japanese Patent Publication No. 6065596, compounds described in International Publication No. 2015 / 152153, compounds described in International Publication No. 2017 / 051680, compounds described in Japanese Patent Publication No. 2017-198865, compounds described in paragraphs 0025-0038 of International Publication No. 2017 / 164127, and compounds described in International Publication No. 2013 / 167515. Specific examples of oxime compounds include 3-benzoyloxyiminobutan-2-one, 3-acetoxyiminobutan-2-one, 3-propionyloxyiminobutan-2-one, 2-acetoxyiminopentan-3-one, 2-acetoxyimino-1-phenylpropane-1-one, 2-benzoyloxyimino-1-phenylpropane-1-one, 3-(4-toluenesulfonyloxy)iminobutan-2-one, and 2-ethoxycarbonyloxyimino-1-phenylpropane-1-one. Commercially available products include Irgacure OXE01, Irgacure OXE02, Irgacure OXE03, Irgacure OXE04 (all manufactured by BASF), TR-PBG-304 (manufactured by Changzhou Strong Electronic New Materials Co., Ltd.), and ADEKA Optomer N-1919 (manufactured by ADEKA Corporation, photopolymerization initiator 2 described in Japanese Patent Publication No. 2012-014052). Furthermore, it is also preferable to use compounds that do not produce color or compounds that are highly transparent and resistant to discoloration as oxime compounds. Commercially available products include ADEKA Arclus NCI-730, NCI-831, NCI-930 (all manufactured by ADEKA Corporation).

[0114] As a photopolymerization initiator, an oxime compound having a fluorene ring can also be used. Specific examples of oxime compounds having a fluorene ring include the compound described in Japanese Patent Publication No. 2014-137466, the compound described in Japanese Patent No. 6636081, and the compound described in Korean Published Patent No. 10-2016-0109444.

[0115] As a photopolymerization initiator, an oxime compound having a skeleton in which at least one benzene ring of the carbazole ring is replaced by a naphthalene ring can also be used. Specific examples of such oxime compounds include those described in International Publication No. 2013 / 083505.

[0116] As a photopolymerization initiator, an oxime compound containing a fluorine atom can also be used. Specific examples of oxime compounds containing a fluorine atom include the compound described in Japanese Patent Publication No. 2010-262028, compounds 24, 36-40 described in Japanese Patent Publication No. 2014-500852, and compound (C-3) described in Japanese Patent Publication No. 2013-164471.

[0117] As a photopolymerization initiator, an oxime compound having a nitro group can be used. The oxime compound having a nitro group is preferably in dimer form. Specific examples of oxime compounds having a nitro group include the compounds described in paragraphs 0031 to 0047 of Japanese Patent Publication No. 2013-114249, paragraphs 0008 to 0012 and 0070 to 0079 of Japanese Patent Publication No. 2014-137466, the compounds described in paragraphs 0007 to 0025 of Japanese Patent No. 4223071, and ADEKA Arclus NCI-831 (manufactured by ADEKA Corporation).

[0118] Oxime compounds having a benzofuran skeleton can also be used as photopolymerization initiators. Specific examples include OE-01 to OE-75, described in International Publication No. 2015 / 036910.

[0119] As photopolymerization initiators, oxime compounds in which a substituent having a hydroxyl group is attached to a carbazole skeleton can also be used. Examples of such photopolymerization initiators include the compounds described in International Publication No. 2019 / 088055.

[0120] Specific examples of oxime compounds that are preferably used in the present invention are shown below, but the present invention is not limited to these.

[0121] [ka] [ka] [ka]

[0122] The oxime compound is preferably one having a maximum absorption wavelength in the range of 350 to 500 nm, and more preferably one having a maximum absorption wavelength in the range of 360 to 480 nm. Furthermore, from the viewpoint of sensitivity, the molar extinction coefficient of the oxime compound at a wavelength of 365 nm or 405 nm is preferably high, more preferably 1,000 to 300,000, even more preferably 2,000 to 300,000, and particularly preferably 5,000 to 200,000. The molar extinction coefficient of the compound can be measured using known methods. For example, it is preferable to measure it using a spectrophotometer (Cary-5 spectrophotometer, Varian) with ethyl acetate solvent at a concentration of 0.01 g / L.

[0123] As the photopolymerization initiator, a bifunctional or trifunctional or higher photoradical polymerization initiator may be used. By using such a photoradical polymerization initiator, two or more radicals are generated from one molecule of the photoradical polymerization initiator, thus providing good sensitivity. Furthermore, when an asymmetric compound is used, the crystallinity decreases and the solubility in solvents, etc., improves, making precipitation less likely over time and improving the long-term stability of the composition. Specific examples of bifunctional or trifunctional or higher photoradical polymerization initiators include the dimers of oxime compounds described in JP 2010-527339, JP 2011-524436, International Publication No. 2015 / 004565, paragraphs 0407-0412 of JP 2016-532675, and paragraphs 0039-0055 of International Publication No. 2017 / 033680, as well as compounds (E) and (G) described in JP 2013-522445, and International Publication No. Examples include Cmpd1-7 described in Patent Publication No. 2016 / 034963, oxime ester photoinitiators described in paragraph 0007 of Japanese Patent Publication No. 2017-523465, photoinitiators described in paragraphs 0020-0033 of Japanese Patent Publication No. 2017-167399, photopolymerization initiators (A) described in paragraphs 0017-0026 of Japanese Patent Publication No. 2017-151342, and oxime ester photoinitiators described in Japanese Patent Publication No. 6469669.

[0124] The polymerization initiator content is preferably 0.1 to 40% by mass, more preferably 0.5 to 35% by mass, and even more preferably 1 to 30% by mass, based on the total solid content of the composition. The composition may contain only one polymerization initiator or two or more. If two or more are included, it is preferable that their total amount falls within the above range.

[0125] <<Other infrared absorbers>> The compositions of the present invention may contain infrared absorbers other than the specific compounds described above (other infrared absorbers). By further including other infrared absorbers, it is possible to form a film that can shield infrared rays over a wider wavelength range. The other infrared absorbers may be dyes or pigments (particles). Examples of other infrared absorbers include pyrrolopyrrole compounds, cyanine compounds, squarylium compounds, phthalocyanine compounds, naphthalocyanine compounds, quaterylene compounds, merocyanine compounds, crokonium compounds, oxonol compounds, iminium compounds, dithiol compounds, triarylmethane compounds, pyromethene compounds, azomethine compounds, anthraquinone compounds, dibenzofuranone compounds, dithiolene metal complexes, metal oxides, and metal borides. Examples of pyrrolopyrrole compounds include those described in paragraphs 0016 to 0058 of Japanese Patent Publication No. 2009-263614, those described in paragraphs 0037 to 0052 of Japanese Patent Publication No. 2011-068731, and those described in paragraphs 0010 to 0033 of International Publication No. 2015 / 166873. Examples of squarylium compounds include those described in paragraphs 0044 to 0049 of Japanese Patent Publication No. 2011-208101, those described in paragraphs 0060 to 0061 of Japanese Patent No. 6065169, those described in paragraph 0040 of International Publication No. 2016 / 181987, those described in paragraph 0015-176046, and those described in paragraph 0072 of International Publication No. 2016 / 190162. Examples include compounds, compounds described in paragraphs 0196 to 0228 of Japanese Patent Publication No. 2016-074649, compounds described in paragraph 0124 of Japanese Patent Publication No. 2017-067963, compounds described in International Publication No. 2017 / 135359, compounds described in Japanese Patent Publication No. 2017-114956, compounds described in Japanese Patent No. 6197940, and compounds described in International Publication No. 2016 / 120166.Examples of cyanine compounds include those described in paragraphs 0044 to 0045 of Japanese Patent Publication No. 2009-108267, those described in paragraphs 0026 to 0030 of Japanese Patent Publication No. 2002-194040, those described in Japanese Patent Publication No. 2015-172004, those described in Japanese Patent Publication No. 2015-172102, those described in Japanese Patent Publication No. 2008-088426, those described in paragraph 0090 of International Publication No. 2016 / 190162, and those described in Japanese Patent Publication No. 2017-031394. Examples of croconium compounds include those described in Japanese Patent Publication No. 2017-082029. Examples of iminium compounds include the compounds described in Japanese Patent Publication No. 2008-528706, Japanese Patent Application Publication No. 2012-012399, Japanese Patent Application Publication No. 2007-092060, and the compounds described in paragraphs 0048 to 0063 of International Publication No. 2018 / 043564. Examples of phthalocyanine compounds include the compounds described in paragraph 0093 of Japanese Patent Application Publication No. 2012-077153, oxytitanium phthalocyanine described in Japanese Patent Application Publication No. 2006-343631, the compounds described in paragraphs 0013 to 0029 of Japanese Patent Application Publication No. 2013-195480, the vanadium phthalocyanine compounds described in Japanese Patent No. 6081771, and the compounds described in International Publication No. 2020 / 071470. Examples of naphthalocyanine compounds include those described in paragraph 0093 of Japanese Patent Publication No. 2012-077153. Examples of dithiolene metal complexes include those described in Japanese Patent Publication No. 5733804. Examples of metal oxides include indium tin oxide, antimony tin oxide, zinc oxide, Al-doped zinc oxide, fluorine-doped tin dioxide, niobium-doped titanium dioxide, and tungsten oxide. For details on tungsten oxide, refer to paragraph 0080 of Japanese Patent Publication No. 2016-006476, which is incorporated herein by reference. Examples of metal borides include lanthanum boride. Examples of commercially available lanthanum boride include LaB6-F (manufactured by Nippon Shinkinzoku Co., Ltd.). In addition, compounds described in International Publication No. 2017 / 119394 can also be used as metal borides.Examples of commercially available indium tin oxide include F-ITO (manufactured by DOWA High-Tech Co., Ltd.).

[0126] Furthermore, as infrared absorbers, the following are used: the squarylium compound described in Japanese Patent Publication No. 2017-197437, the squarylium compound described in Japanese Patent Publication No. 2017-025311, the squarylium compound described in International Publication No. 2016 / 154782, the squarylium compound described in Japanese Patent No. 5884953, the squarylium compound described in Japanese Patent No. 6036689, and the squarylium compound described in Japanese Patent No. 5810604. The following are examples of substances: squarylium compounds described in paragraphs 0090-0107 of International Publication No. 2017 / 213047, pyrrole ring-containing compounds described in paragraphs 0019-0075 of Japanese Patent Publication No. 2018-054760, pyrrole ring-containing compounds described in paragraphs 0078-0082 of Japanese Patent Publication No. 2018-040955, pyrrole ring-containing compounds described in paragraphs 0043-0069 of Japanese Patent Publication No. 2018-002773, and Japanese Patent Publication No. 2018-0 Squallium compounds having an aromatic ring at the amide α position as described in paragraphs 0024 to 0086 of Japanese Patent Publication No. 41047, amide-linked squarylium compounds as described in Japanese Patent Application Publication No. 2017-179131, compounds having a pyrrole-bis-type squarylium skeleton or crokonium skeleton as described in Japanese Patent Application Publication No. 2017-141215, dihydrocarbazole-bis-type squarylium compounds as described in Japanese Patent Application Publication No. 2017-082029, Japanese Patent Application Publication No. Asymmetric compounds described in paragraphs 0027 to 0114 of Japanese Patent Publication No. 2017-068120, pyrrole ring-containing compounds (carbazole type) described in Japanese Patent Application Publication No. 2017-067963, phthalocyanine compounds described in Japanese Patent Application Publication No. 6251530, squarylium compounds described in Japanese Patent Application Publication No. 2020-075959, and copper complexes described in Korean Published Patent No. 10-2019-0135217 can also be used.

[0127] Other infrared absorbers may be compounds represented by formula (PP). [ka] In formula (PP), RP1 and R P2 Each of these independently represents an alkyl group, an aryl group, or a heteroaryl group. X P1 and X P2 Each of these independently represents N or C-CN, Ar P1 and Ar P2 Each of these independently represents an aryl group or a heteroaryl group. Y P1 and Y P2 Each of these independently consists of a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, and -BR. YP1 R YP2 Or it represents a metal atom, R YP1 and R YP2 Each of these independently represents a hydrogen atom or a substituent, and R Y1 and R Y2 They may be joined together to form a ring.

[0128] R YP1 and R YP2 The substituents represented by are the groups listed above as substituent T. YP1 and R YP2 Each of these is preferably independently a hydrogen atom, a halogen atom, an alkyl group, an alkenyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, or a heteroaryloxy group; more preferably a halogen atom, an alkyl group, an aryl group, or a heteroaryl group; even more preferably a halogen atom, an alkyl group, or an aryl group; and particularly preferably an aryl group.

[0129] R in formula (PP) P1 and R P2 R in equation (1) 1 This is synonymous with the same thing, and the preferred range is also similar. X in formula (PP) P1 and X P2 X in equation (1) 1 and X 2 This is synonymous with the same thing, and the preferred range is also similar. Ar in formula (PP) P1 and Ar P2 This is the Ar in equation (1). 1 and Ar 2 This is synonymous with the same thing, and the preferred range is also similar. Y in formula (PP) P1 and Y P2 Y in equation (1) 1 and Y 2 This is synonymous with the same thing, and the preferred range is also similar.

[0130] The content of other infrared absorbers is preferably 1 to 200 parts by mass per 100 parts by mass of the specified compound described above. The lower limit is preferably 5 parts by mass or more, and more preferably 10 parts by mass or more. The upper limit is preferably 150 parts by mass or less, and more preferably 100 parts by mass or less. Furthermore, the total content of the specified compound described above and other infrared absorbers is preferably 10% by mass or more, more preferably 15% by mass or more, and even more preferably 20% by mass or more, based on the total solid content of the composition. The upper limit of the above total content is preferably 80% by mass or less, more preferably 70% by mass or less, and even more preferably 60% by mass or less. If the composition of the present invention contains a compound represented by formula (PP) as described above as another infrared absorber, the content of the compound represented by formula (PP) is preferably 0.1 to 100 parts by mass per 100 parts by mass of the specified compound described above. The lower limit is preferably 0.5 parts by mass or more, and more preferably 1 part by mass or more. The upper limit is preferably 50 parts by mass or less, and more preferably 25 parts by mass or less. Furthermore, the total content of the specified compound described above and the compound represented by formula (PP) described above is preferably 10% by mass or more, more preferably 15% by mass or more, and even more preferably 20% by mass or more, based on the total solid content of the composition. The upper limit of the above total content is preferably 80% by mass or less, more preferably 70% by mass or less, and even more preferably 60% by mass or less. If the composition of the present invention contains two or more other infrared absorbers, it is preferable that their total amount is within the above range.

[0131] <<Coloring agent>> The composition of the present invention may contain a coloring agent. When the composition of the present invention is used as a composition for forming an infrared cut filter, it is preferable that the composition of the present invention contains a coloring agent.

[0132] Examples of colorants include chromatic colorants and black colorants. The colorant may be a pigment or a dye. Pigments and dyes may be used in combination. Furthermore, the pigment may be either an inorganic pigment or an organic pigment. Additionally, materials in which a portion of an inorganic pigment or an organic-inorganic pigment is replaced with an organic chromophore can be used. Replacing inorganic pigments or organic-inorganic pigments with organic chromophores makes hue design easier.

[0133] The average primary particle diameter of the pigment is preferably 1 to 200 nm. The lower limit is preferably 5 nm or more, and more preferably 10 nm or more. The upper limit is preferably 180 nm or less, more preferably 150 nm or less, and even more preferably 100 nm or less. If the average primary particle diameter of the pigment is within the above range, the dispersion stability of the pigment in the composition is good. In this invention, the primary particle diameter of the pigment can be determined by observing the primary particles of the pigment with a transmission electron microscope and obtaining the resulting image. Specifically, the projected area of ​​the primary particles of the pigment is determined, and the corresponding equivalent circle diameter is calculated as the primary particle diameter of the pigment. In this invention, the average primary particle diameter is the arithmetic mean of the primary particle diameters of 400 primary particles of the pigment. Furthermore, primary particles of the pigment refer to independent particles that do not aggregate.

[0134] Examples of chromatic colorants include red colorants, green colorants, blue colorants, yellow colorants, purple colorants, and orange colorants.

[0135] The chromatic colorant preferably contains a pigment. The pigment content in the chromatic colorant is preferably 50% by mass or more, more preferably 70% by mass or more, even more preferably 80% by mass or more, and particularly preferably 90% by mass or more. Examples of pigments are listed below.

[0136] Color Index (CI) Pigment Yellow: 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35: 1, 36, 36: 1, 37, 37: 1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125, 126, 127, 128, 129, 137, 13 8,139,147,148,150,151,152,153,154,155,156,161,162,164,166,167,168,169,170,171,172,173,174,175,176,177,179,180,181,182,185,187,188,193,194,199,213,214,215,228,231,232 (methine-based), 233 (quinoline-based), 234 (aminoketone-based), 235 (aminoketone-based), 236 (aminoketone-based), etc. (all yellow pigments), CIPigment Orange 2, 5, 13, 16, 17: 1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, 73, etc. (all are orange pigments) CIPigment Red 1,2,3,4,5,6,7,9,10,14,17,22,23,31,38,41,48:1,48:2,48:3,48:4,49,49:1,49:2,52:1,52:2,5 3:1,57:1,60:1,63:1,66,67,81:1,81:2,81:3,83,88,90,105,112,119,122,123,144,146,149,150, 155, 166, 168, 169, 170, 171, 172, 175, 176, 177, 178, 179, 184, 185, 187, 188, 190, 200, 202, 206, 207, 208, 209, 210, 216, 220, 224, 226, 242, 246, 254, 255, 264, 269, 270, 272, 279, 291, 294 (xanthene-based, Organo Ultramarine, Bluish Red), 295 (monoazo-based), 296 (diazo-based), 297 (aminoketone-based), etc. (all are red pigments), CIPigment Green 7, 10, 36, 37, 58, 59, 62, 63, 64 (phthalocyanine-based), 65 (phthalocyanine-based), 66 (phthalocyanine-based), etc. (all are green pigments). CIPigment Violet 1, 19, 23, 27, 32, 37, 42, 60 (triarylmethane-based), 61 (xanthene-based), etc. (all are purple pigments) CIPigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 22, 29, 60, 64, 66, 79, 80, 87 (monoazo type), 88 (methine type), etc. (all are blue pigments).

[0137] Furthermore, as a green pigment, zinc halide phthalocyanine pigments can be used, which have an average of 10 to 14 halogen atoms, an average of 8 to 12 bromine atoms, and an average of 2 to 5 chlorine atoms per molecule. A specific example is the compound described in International Publication No. 2015 / 118720. In addition, as a green pigment, compounds described in Chinese Patent Application No. 106909027, phthalocyanine compounds having a phosphate ester as a ligand as described in International Publication No. 2012 / 102395, phthalocyanine compounds described in Japanese Patent Publication No. 2019-008014, phthalocyanine compounds described in Japanese Patent Publication No. 2018-180023, compounds described in Japanese Patent Publication No. 2019-038958, and core-shell dyes described in Japanese Patent Publication No. 2020-076995 can also be used.

[0138] Furthermore, aluminum phthalocyanine compounds containing a phosphorus atom can also be used as a blue pigment. Specific examples include the compounds described in paragraphs 0022 to 0030 of Japanese Patent Publication No. 2012-247591 and paragraph 0047 of Japanese Patent Publication No. 2011-157478.

[0139] Furthermore, as a yellow pigment, the compounds described in Japanese Patent Publication No. 2017-201003, Japanese Patent Publication No. 2017-197719, Japanese Patent Publication No. 2017-171912 (paragraphs 0011-0062, 0137-0276), Japanese Patent Publication No. 2017-171913 (paragraphs 0010-0062, 0138-0295), Japanese Patent Publication No. 2017-171914 (paragraphs 0011-0062, 0139-0190), and Japanese Patent Publication No. 2017-171915 (paragraphs 0010-0065, 0142-0222) The following are examples of the following compounds: quinophthalone compounds described in paragraphs 0011-0034 of JP 2013-054339, quinophthalone compounds described in paragraphs 0013-0058 of JP 2014-026228, isoindoline compounds described in JP 2018-062644, quinophthalone compounds described in JP 2018-203798, quinophthalone compounds described in JP 2018-062578, quinophthalone compounds described in Japanese Patent No. 6432076, quinophthalone compounds described in JP 2018-155881, and JP 2018-1117 Quinophthalone compounds described in Japanese Patent Publication No. 57, Quinophthalone compounds described in Japanese Patent Publication No. 2018-040835, Quinophthalone compounds described in Japanese Patent Publication No. 2017-197640, Quinophthalone compounds described in Japanese Patent Publication No. 2016-145282, Quinophthalone compounds described in Japanese Patent Publication No. 2014-085565, Quinophthalone compounds described in Japanese Patent Publication No. 2014-021139, Quinophthalone compounds described in Japanese Patent Publication No. 2013-209614, Quinophthalone compounds described in Japanese Patent Publication No. 2013-209435, Quinophthalone compounds described in Japanese Patent Publication No. 2013-181015 Quinophthalone compounds, quinophthalone compounds described in Japanese Patent Publication No. 2013-061622, quinophthalone compounds described in Japanese Patent Publication No. 2013-032486, quinophthalone compounds described in Japanese Patent Publication No. 2012-226110, quinophthalone compounds described in Japanese Patent Publication No. 2008-074987, quinophthalone compounds described in Japanese Patent Publication No. 2008-081565, quinophthalone compounds described in Japanese Patent Publication No. 2008-074986, quinophthalone compounds described in Japanese Patent Publication No. 2008-074985, quinophthalone compounds described in Japanese Patent Publication No. 2008-050420,Quinophthalone compounds described in Japanese Patent Publication No. 2008-031281, Quinophthalone compounds described in Japanese Patent Publication No. 48-032765, Quinophthalone compounds described in Japanese Patent Publication No. 2019-008014, Quinophthalone compounds described in Japanese Patent Publication No. 6607427, Compounds described in Korean Published Patent No. 10-2014-0034963, Compounds described in Japanese Patent Publication No. 2017-095706, Compounds described in Taiwan Patent Application Publication No. 201920495, Patent No. 6607427 The compounds described in the publication, the compounds described in JP 2020-033525, the compounds described in JP 2020-033524, the compounds described in JP 2020-033523, the compounds described in JP 2020-033522, the compounds described in JP 2020-033521, the compounds described in International Publication No. 2020 / 045200, the compounds described in International Publication No. 2020 / 045199, and the compounds described in International Publication No. 2020 / 045197 can also be used. Furthermore, polymerized versions of these compounds are also preferably used from the viewpoint of improving color value.

[0140] As red pigments, diketopyrrolopyrrole compounds in which at least one bromine atom is substituted in the structure described in Japanese Patent Publication No. 2017-201384, diketopyrrolopyrrole compounds described in paragraphs 0016-0022 of Japanese Patent No. 6248838, diketopyrrolopyrrole compounds described in International Publication No. 2012 / 102399, diketopyrrolopyrrole compounds described in International Publication No. 2012 / 117965, naphthol azo compounds described in Japanese Patent Publication No. 2012-229344, The following can also be used as red pigments: the red pigment described in Patent Publication No. 6516119, the red pigment described in Patent Publication No. 6525101, the brominated diketopyrrolopyrrole compound described in paragraph 0229 of Japanese Patent Application Publication No. 2020-090632, the anthraquinone compound described in Korean Published Patent Publication No. 10-2019-0140741, the anthraquinone compound described in Korean Published Patent Publication No. 10-2019-0140744, the perylene compound described in Japanese Patent Application Publication No. 2020-079396, etc. Furthermore, as a red pigment, a compound having a structure in which an aromatic ring group into which an oxygen atom, sulfur atom, or nitrogen atom is bonded to the aromatic ring is bonded to a diketopyrrolopyrrole skeleton can also be used.

[0141] Regarding the preferred diffraction angles that various pigments should possess, refer to the descriptions in Japanese Patent Publication No. 6561862, Japanese Patent Publication No. 6413872, Japanese Patent Publication No. 6281345, and Japanese Unexamined Patent Publication No. 2020-026503, and the contents of these publications are incorporated herein by reference. Furthermore, as a pyrrolopyrrole pigment, it is also preferable to use one in which the crystallite size in the plane direction corresponding to the maximum peak in the X-ray diffraction pattern among the eight (±1±1±1) planes of the crystal lattice is 140 Å or less. Furthermore, regarding the physical properties of the pyrrolopyrrole pigment, it is also preferable to set them as described in paragraphs 0028 to 0073 of Japanese Unexamined Patent Publication No. 2020-097744.

[0142] Dyes can also be used as colorants. There are no particular restrictions on the dyes used, and any known dyes can be used. Examples include pyrazole azo dyes, anilino azo dyes, triarylmethane dyes, anthraquinone dyes, anthrapyridone dyes, benzylidene dyes, oxonol dyes, pyrazolotriazole azo dyes, pyridone azo dyes, cyanine dyes, phenothiazine dyes, pyrrolopyrazole azomethine dyes, xanthene dyes, phthalocyanine dyes, benzopyran dyes, indigo dyes, pyromethene dyes, etc.

[0143] A pigment polymer can also be used as a chromatic colorant. The pigment polymer is preferably a dye that is dissolved in a solvent before use. The pigment polymer may also form particles. When the pigment polymer is in particle form, it is usually used in a dispersed state in a solvent. Particle-form pigment polymers can be obtained, for example, by emulsion polymerization, and the compound and production method described in Japanese Patent Application Publication No. 2015-214682 are specific examples. The pigment polymer has two or more pigment structures in one molecule, and preferably three or more pigment structures. There is no particular upper limit, but it can be 100 or less. The multiple pigment structures in one molecule may be the same pigment structure or different pigment structures. The weight-average molecular weight (Mw) of the pigment polymer is preferably 2000 to 50000. The lower limit is more preferably 3000 or more, and even more preferably 6000 or more. The upper limit is more preferably 30000 or less, and even more preferably 20000 or less. The pigment polymer can also be a compound described in Japanese Patent Publication No. 2011-213925, Japanese Patent Publication No. 2013-041097, Japanese Patent Publication No. 2015-028144, Japanese Patent Publication No. 2015-030742, International Publication No. 2016 / 031442, etc.

[0144] The chromatic colorants include thiazole compounds described in Japanese Patent Publication No. 2012-158649, azo compounds described in Japanese Patent Publication No. 2011-184493, azo compounds described in Japanese Patent Publication No. 2011-145540, triarylmethane dye polymers described in Korean Published Patent No. 10-2020-0028160, xanthene compounds described in Japanese Patent Publication No. 2020-117638, phthalocyanine compounds described in International Publication No. 2020 / 174991, isoindoline compounds or salts thereof described in Japanese Patent Publication No. 2020-160279, and Korean Published Patent No. 10-2020-006 A compound represented by formula 1 described in Japanese Patent Publication No. 9442, a compound represented by formula 1 described in Korean Published Patent Publication No. 10-2020-0069730, a compound represented by formula 1 described in Korean Published Patent Publication No. 10-2020-0069070, a compound represented by formula 1 described in Korean Published Patent Publication No. 10-2020-0069067, a compound represented by formula 1 described in Korean Published Patent Publication No. 10-2020-0069062, a zinc halide phthalocyanine pigment described in Japanese Patent No. 6809649, and an isoindoline compound described in Japanese Patent Publication No. 2020-180176 can be used. The chromatic colorant may be a rotaxane, and the pigment skeleton may be used in a cyclic structure of the rotaxane, in a rod-shaped structure, or in both structures.

[0145] Examples of black coloring agents include bisbenzofuranone compounds, azomethine compounds, perylene compounds, and azo compounds, with bisbenzofuranone compounds and perylene compounds being preferred. Examples of bisbenzofuranone compounds include those described in Japanese Patent Publication No. 2010-534726, Japanese Patent Publication No. 2012-515233, and Japanese Patent Publication No. 2012-515234, and are available, for example, as "Irgaphor Black" manufactured by BASF. Examples of perylene compounds include those described in paragraphs 0016 to 0020 of Japanese Patent Publication No. 2017-226821, CIPigment Black 31, 32, etc. Examples of azomethine compounds include those described in Japanese Patent Publication No. 01-170601 and Japanese Patent Publication No. 02-034664, and are available, for example, as "Chromofine Black A1103" manufactured by Dainichi Seika Co., Ltd.

[0146] If the composition of the present invention contains a coloring agent, the amount of the coloring agent is preferably 1 to 300 parts by mass, more preferably 5 to 200 parts by mass, and even more preferably 10 to 150 parts by mass, per 100 parts by mass of the specified compound described above. Furthermore, the total amount of the specified compound and the coloring agent is preferably 10% by mass or more, more preferably 15% by mass or more, and even more preferably 20% by mass or more, based on the total solid content of the composition. The upper limit of the above total content is preferably 80% by mass or less, more preferably 70% by mass or less, and even more preferably 60% by mass or less. If the composition of the present invention contains two or more coloring agents, it is preferable that their total amount is within the above range.

[0147] <<Dye derivative>> The composition of the present invention may further contain a dye derivative in addition to the specific compound described above. The dye derivative is used as a dispersion aid. Examples of dye derivatives include compounds having a structure in which an acidic group or a basic group is bonded to the dye skeleton.

[0148] Examples of pigment skeletons constituting the pigment derivatives include the squarylium pigment skeleton, pyrrolopyrrole pigment skeleton, diketopyrrolopyrrole pigment skeleton, quinacridone pigment skeleton, anthraquinone pigment skeleton, diantraquinone pigment skeleton, benzoisoindole pigment skeleton, thiadin indigo pigment skeleton, azo pigment skeleton, quinophthalone pigment skeleton, phthalocyanine pigment skeleton, naphthalocyanine pigment skeleton, dioxazine pigment skeleton, perylene pigment skeleton, perinone pigment skeleton, benzimidazolone pigment skeleton, benzothiazole pigment skeleton, benzimidazole pigment skeleton, and benzoxazole pigment skeleton. The squarylium pigment skeleton, pyrrolopyrrole pigment skeleton, diketopyrrolopyrrole pigment skeleton, phthalocyanine pigment skeleton, quinacridone pigment skeleton, and benzimidazolone pigment skeleton are preferred, and the squarylium pigment skeleton and pyrrolopyrrole pigment skeleton are more preferred.

[0149] Examples of acidic groups include carboxyl groups, sulfo groups, phosphate groups, boronic acid groups, carboxylic acid amide groups, sulfonamide groups, imido acid groups, and salts thereof. Examples of atoms or groups of atoms constituting the salt include alkali metal ions (Li + kaNa + , K + (e.g.), alkaline earth metal ions (Ca 2+ Mg 2+ Examples include ammonium ions, imidazolium ions, pyridinium ions, and phosphonium ions. Examples of carboxylic acid amide groups include -NHCOR A1 A group represented by is preferred. As a sulfonamide group, -NHSO2R A2 A group represented by is preferred. As an imido acid group, -SO2NHSO2R A3 -CONHSO2R A4 , -CONHCOR A5 or -SO2NHCOR A6 A group represented by -SO2NHSO2R is preferred. A3 R is more preferable. A1 ~R A6 Each of these independently represents an alkyl group or an aryl group. A1 ~R A6The alkyl and aryl groups represented by may have substituents. The substituents are preferably halogen atoms, and more preferably fluorine atoms.

[0150] Basic groups include amino groups, pyridinyl groups and their salts, ammonium groups, and phthalimidomethyl groups. Atoms or groups of atoms that make up the salts include hydroxide ions, halogen ions, carboxylate ions, sulfonate ions, and phenoxide ions.

[0151] Specific examples of dye derivatives include the compounds described in the examples below. Also, Japanese Patent Publication Nos. 56-118462, 63-264674, 01-217077, 03-009961, 03-026767, 03-153780, 03-045662, 04-285669, 06-145546, and 06- Other examples include compounds described in Japanese Patent Publication No. 212088, Japanese Patent Publication No. 06-240158, Japanese Patent Publication No. 10-030063, Japanese Patent Publication No. 10-195326, paragraphs 0086-0098 of International Publication No. 2011 / 024896, and paragraphs 0063-0094 of International Publication No. 2012 / 102399, the contents of which are incorporated herein by reference.

[0152] The content of the dye derivative is preferably 1 to 50 parts by mass per 100 parts by mass of the specified compound described above. The lower limit is preferably 3 parts by mass or more, and more preferably 5 parts by mass or more. The upper limit is preferably 40 parts by mass or less, and more preferably 30 parts by mass or less. Only one type of dye derivative may be used, or two or more types may be used. When two or more types are used, it is preferable that the total amount is within the above range.

[0153] <<Solvent>> The composition of the present invention preferably contains a solvent. Examples of solvents include water and organic solvents, with organic solvents being preferred. Examples of organic solvents include ester solvents, ketone solvents, alcohol solvents, amide solvents, ether solvents, and hydrocarbon solvents. For further details, please refer to paragraph 0223 of International Publication No. 2015 / 166779, which is incorporated herein by reference. Ester solvents and ketone solvents substituted with cyclic alkyl groups can also be preferably used. Specific examples of organic solvents include polyethylene glycol monomethyl ether, dichloromethane, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, 2-pentanone, 3-pentanone, 4-heptanone, cyclohexanone, 2-methylcyclohexanone, 3-methylcyclohexanone, 4-methylcyclohexanone, cycloheptanone, cyclooctanone, cyclohexyl acetate, cyclopentanone, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol monomethyl ether, propylene Examples include propylene glycol monomethyl ether acetate, 3-methoxy-N,N-dimethylpropanamide, 3-butoxy-N,N-dimethylpropanamide, propylene glycol diacetate, 3-methoxybutanol, methyl ethyl ketone, gamma butyrolactone, sulfolane, anisole, 1,4-diacetoxybutane, diethylene glycol monoethyl ether acetate, butane-1,3-diyl diacetate, dipropylene glycol methyl ether acetate, diacetone alcohol (also known as diacetone alcohol, 4-hydroxy-4-methyl-2-pentanone), 2-methoxypropyl acetate, 2-methoxy-1-propanol, and isopropyl alcohol.However, the amount of aromatic hydrocarbons used as organic solvents (benzene, toluene, xylene, ethylbenzene, etc.) may be reduced for environmental reasons (for example, it may be possible to reduce the amount to 50 ppm (parts per million) or less, 10 ppm or less, or 1 ppm or less relative to the total amount of organic solvent).

[0154] In the present invention, it is preferable to use an organic solvent with a low metal content, and the metal content of the organic solvent is preferably, for example, 10 ppb (parts per billion) or less by mass. If necessary, an organic solvent at the ppt (parts per trillion) level by mass may be used, and such organic solvents are provided, for example, by Toyo Gosei Co., Ltd. (Chemical Daily, November 13, 2015).

[0155] Methods for removing impurities such as metals from organic solvents include, for example, distillation (molecular distillation, thin-film distillation, etc.) and filtration using filters. The pore size of the filter used for filtration is preferably 10 μm or less, more preferably 5 μm or less, and even more preferably 3 μm or less. The material of the filter is preferably polytetrafluoroethylene, polyethylene, or nylon.

[0156] Organic solvents may contain isomers (compounds with the same number of atoms but different structures). Furthermore, they may contain only one type of isomer or multiple types.

[0157] The peroxide content in the organic solvent is preferably 0.8 mmol / L or less, and more preferably substantially peroxide-free.

[0158] The solvent content in the composition is preferably 10 to 97% by mass. The lower limit is preferably 30% by mass or more, more preferably 40% by mass or more, even more preferably 50% by mass or more, even more preferably 60% by mass or more, and particularly preferably 70% by mass or more. The upper limit is preferably 96% by mass or less, and more preferably 95% by mass or less. The composition may contain only one type of solvent or two or more types. If two or more types are included, it is preferable that their total amount falls within the above range.

[0159] <<Hardening agent>> When the composition of the present invention contains a compound having a cyclic ether group, it is preferable to further contain a curing agent. Examples of curing agents include amine compounds, acid anhydride compounds, amide compounds, phenolic compounds, polycarboxylic acids, and thiol compounds. Specific examples of curing agents include succinic acid, trimellitic acid, pyromellitic acid, N,N-dimethyl-4-aminopyridine, and pentaerythritol tetrakis(3-mercaptopropionate). The curing agent may also be a compound described in paragraphs 0072 to 0078 of Japanese Patent Publication No. 2016-075720 or a compound described in Japanese Patent Publication No. 2017-036379. The content of the curing agent is preferably 0.01 to 20 parts by mass, more preferably 0.01 to 10 parts by mass, and even more preferably 0.1 to 6.0 parts by mass, per 100 parts by mass of the compound having a cyclic ether group.

[0160] <<Surfactants>> The composition of the present invention preferably contains a surfactant. Various surfactants can be used, such as fluorinated surfactants, nonionic surfactants, cationic surfactants, anionic surfactants, and silicone surfactants. The surfactant is preferably a silicone surfactant or a fluorinated surfactant. Examples of surfactants are those described in paragraphs 0238 to 0245 of International Publication No. 2015 / 166779, which are incorporated herein by reference.

[0161] Examples of fluorinated surfactants include those described in paragraphs 0060 to 0064 of Japanese Patent Publication No. 2014-041318 (corresponding to paragraphs 0060 to 0064 of International Publication No. 2014 / 017669), those described in paragraphs 0117 to 0132 of Japanese Patent Publication No. 2011-132503, and those described in Japanese Patent Publication No. 2020-008634, the contents of which are incorporated herein by reference. Examples of commercially available fluorine-based surfactants include Megafac F-171, F-172, F-173, F-176, F-177, F-141, F-142, F-143, F-144, F-437, F-475, F-477, F-479, F-482, F-554, F-555-A, F-556, F-557, F-558, F-559, F-560, F-561, F-563, F-565, F-568, F-575, F-780, EXP, MFS-330, and R-01. R-40, R-40-LM, R-41, R-41-LM, RS-43, TF-1956, RS-90, R-94, RS-72-K, DS-21 (all manufactured by DIC Corporation), Florard FC430, FC431, FC171 (all manufactured by Sumitomo 3M Co., Ltd.), Surflon S-382, SC-101, SC-103, SC-104, SC-105, SC-1068, SC-381, SC-383, S-393, KH-40 (all manufactured by AGC Inc.), PolyFox Examples include the PF636, PF656, PF6320, PF6520, PF7002 (all manufactured by OMNOVA), the F-Tergent 208G, 215M, 245F, 601AD, 601ADH2, 602A, 610FM, 710FL, 710FM, 710FS, and the FTX-218 (all manufactured by NEOS Corporation).

[0162] Furthermore, acrylic compounds having a molecular structure with a functional group containing a fluorine atom, in which the fluorine atom-containing functional group is cleaved and the fluorine atom volatilizes when heated, can also be suitably used as fluorine-based surfactants. Examples of such fluorine-based surfactants include the Megafac DS series manufactured by DIC Corporation (Chemical Daily (February 22, 2016), Nikkei Sangyo Shimbun (February 23, 2016)), such as Megafac DS-21.

[0163] Furthermore, it is also preferable to use a polymer of a fluorine atom-containing vinyl ether compound having a fluorinated alkyl group or a fluorinated alkylene ether group and a hydrophilic vinyl ether compound as the fluorine-based surfactant. Examples of such fluorine-based surfactants include the fluorine-based surfactant described in Japanese Patent Application Publication No. 2016-216602, the details of which are incorporated herein by reference.

[0164] Block polymers can also be used as fluorine-based surfactants. Fluorine-containing polymer compounds can also be preferably used as fluorine-based surfactants, including repeating units derived from a (meth)acrylate compound having a fluorine atom and repeating units derived from a (meth)acrylate compound having two or more (preferably five or more) alkylene oxy groups (preferably ethylene oxy groups, propylene oxy groups). Furthermore, fluorine-containing surfactants described in paragraphs 0016 to 0037 of Japanese Patent Application Publication No. 2010-032698, and the following compounds are also examples of fluorine-based surfactants used in the present invention. [ka] The weight-average molecular weight of the above compounds is preferably 3,000 to 50,000, for example, 14,000. In the above compounds, the percentage indicating the proportion of repeating units is expressed as mole percent.

[0165] Furthermore, as a fluorine-based surfactant, a fluorine-containing polymer having an ethylenically unsaturated bond-containing group in its side chain can also be used. Specific examples include the compounds described in paragraphs 0050 to 0090 and 0289 to 0295 of Japanese Patent Publication No. 2010-164965, and Megafac RS-101, RS-102, RS-718K, RS-72-K, etc., manufactured by DIC Corporation. Additionally, as a fluorine-based surfactant, the compounds described in paragraphs 0015 to 0158 of Japanese Patent Publication No. 2015-117327 can also be used.

[0166] Furthermore, using the surfactant described in International Publication No. 2020 / 084854 as a substitute for surfactants having a perfluoroalkyl group with 6 or more carbon atoms is also preferable from an environmental regulatory standpoint.

[0167] Furthermore, it is also preferable to use a fluorine-containing imide salt compound represented by formula (fi-1) as a surfactant. [ka] In equation (fi-1), m represents 1 or 2, n represents an integer from 1 to 4, a represents 1 or 2, and X a+ This refers to α-valent metal ions, primary ammonium ions, secondary ammonium ions, tertiary ammonium ions, quaternary ammonium ions, or NH4. + It represents.

[0168] Nonionic surfactants include glycerol, trimethylolpropane, trimethylolethane and their ethoxylates and propoxylates (e.g., glycerol propoxylate, glycerol ethoxylate, etc.), polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene octylphenyl ether, polyoxyethylene nonylphenyl ether, polyethylene glycol dilaurate, polyethylene glycol distearate, and sorbitan lipids. Examples include fatty acid esters, Pluronic L10, L31, L61, L62, 10R5, 17R2, 25R2 (manufactured by BASF), Tetronic 304, 701, 704, 901, 904, 150R1 (manufactured by BASF), Solspers 20000 (manufactured by Lubrizol Nippon Co., Ltd.), NCW-101, NCW-1001, NCW-1002 (manufactured by Wako Pure Chemical Industries, Ltd.), Paionin D-6112, D-6112-W, D-6315 (manufactured by Takemoto Oil & Fat Co., Ltd.), Orfin E1010, Surfinol 104, 400, 440 (manufactured by Nisshin Chemical Industry Co., Ltd.).

[0169] Cationic surfactants include tetraalkylammonium salts, alkylamine salts, benzalkonium salts, alkylpyridium salts, and imidazolium salts. Specific examples include dihydroxyethylstearylamine, 2-heptadecenyl-hydroxyethylimidazoline, lauryldimethylbenzylammonium chloride, cetylpyridinium chloride, and stearamidemethylpyridium chloride.

[0170] Examples of anionic surfactants include dodecylbenzenesulfonic acid, sodium dodecylbenzenesulfonate, sodium lauryl sulfate, sodium alkyldiphenyl ether disulfonate, sodium alkylnaphthalene sulfonate, sodium dialkyl sulfosuccinate, sodium stearate, potassium oleate, sodium dioctyl sulfosuccinate, sodium polyoxyethylene alkyl ether sulfate, sodium polyoxyethylene alkyl ether sulfate, sodium polyoxyethylene alkylphenyl ether sulfate, sodium dialkyl sulfosuccinate, sodium stearate, sodium oleate, and sodium t-octylphenoxyethoxypolyethoxyethyl sulfate.

[0171] Examples of silicone-based surfactants include SH8400, SH8400 FLUID, FZ-2122, 67 Additive, 74 Additive, M Additive, SF 8419 OIL (all manufactured by Dow Toray Industries, Inc.), TSF-4440, TSF-4300, TSF-4445, TSF-4460, TSF-4452 (all manufactured by Momentive Performance Materials, Inc.), KP-341, KF-6000, KF-6001, KF-6002, KF-6003 (all manufactured by Shin-Etsu Chemical Co., Ltd.), BYK-307, BYK-322, BYK-323, BYK-330, BYK-3760, BYK-UV3510 (all manufactured by BIC Chemie Inc.).

[0172] Furthermore, silicone-based surfactants can also be compounds with the following structure. [ka]

[0173] The surfactant content is preferably 0.001 to 1% by mass, more preferably 0.001 to 0.5% by mass, and even more preferably 0.001 to 0.2% by mass, based on the total solid content of the composition. The composition may contain only one type of surfactant or two or more types. If two or more types are included, it is preferable that their total amount falls within the above range.

[0174] <<Polymerization inhibitor>> The composition of the present invention may contain a polymerization inhibitor. Examples of polymerization inhibitors include hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, benzoquinone, 4,4'-thiobis(3-methyl-6-tert-butylphenol), 2,2'-methylenebis(4-methyl-6-t-butylphenol), and N-nitrosophenylhydroxyamine salts (ammonium salts, cerium salts, etc.), with p-methoxyphenol being preferred. The content of the polymerization inhibitor is preferably 0.0001 to 5% by mass of the total solid content of the composition. The composition may contain only one polymerization inhibitor or two or more. If two or more are included, it is preferable that their total amount is within the above range.

[0175] <<Silane coupling agent>> The composition of the present invention may contain a silane coupling agent. In this specification, a silane coupling agent means a silane compound having a hydrolyzable group and other functional groups. A hydrolyzable group is a substituent that is directly bonded to a silicon atom and can form a siloxane bond by at least one of a hydrolysis reaction and a condensation reaction. Examples of hydrolyzable groups include halogen atoms, alkoxy groups, and acyloxy groups, with alkoxy groups being preferred. That is, silane coupling agents are preferably compounds having an alkoxysilyl group. Examples of functional groups other than hydrolyzable groups include vinyl groups, (meth)acryloyl groups, mercapto groups, epoxy groups, oxetanyl groups, amino groups, ureido groups, sulfide groups, isocyanate groups, and phenyl groups, with (meth)acryloyl groups and epoxy groups being preferred. Examples of silane coupling agents include the compounds described in paragraphs 0018 to 0036 of Japanese Patent Publication No. 2009-288703 and the compounds described in paragraphs 0056 to 0066 of Japanese Patent Publication No. 2009-242604, the details of which are incorporated herein by reference. The content of the silane coupling agent is preferably 0.01 to 15.0% by mass, and more preferably 0.05 to 10.0% by mass, of the total solid content of the composition. The composition may contain only one type of silane coupling agent or two or more types. If two or more types are included, it is preferable that their total amount is within the above range.

[0176] <<UV absorber>> The compositions of the present invention may contain ultraviolet absorbers. Examples of ultraviolet absorbers include conjugated diene compounds, aminodiene compounds, salicylate compounds, benzophenone compounds, benzotriazole compounds, acrylonitrile compounds, hydroxyphenyltriazine compounds, indole compounds, triazine compounds, and merocyanine dyes. Specific examples of such compounds include those described in paragraphs 0038-0052 of Japanese Patent Publication No. 2009-217221, paragraphs 0052-0072 of Japanese Patent Publication No. 2012-208374, paragraphs 0317-0334 of Japanese Patent Publication No. 2013-068814, and paragraphs 0061-0080 of Japanese Patent Publication No. 2016-162946, the contents of which are incorporated herein by reference. Examples of commercially available ultraviolet absorbers include the Tinuvin series and Uvinul series manufactured by BASF. Furthermore, an example of a benzotriazole compound is the MYUA series manufactured by Miyoshi Oil & Fat Co., Ltd. (Chemical Daily, February 1, 2016). In addition, as an ultraviolet absorber, compounds described in paragraphs 0049 to 0059 of Japanese Patent No. 6268967 and paragraphs 0059 to 0076 of International Publication No. 2016 / 181987 can also be used. The content of the ultraviolet absorber is preferably 0.01 to 30% by mass, and more preferably 0.05 to 25% by mass, of the total solid content of the composition. The composition may contain only one type of ultraviolet absorber or two or more types. If two or more types are included, it is preferable that their total amount be within the above range.

[0177] <<Antioxidant>> The composition of the present invention may contain an antioxidant. Examples of antioxidants include phenol compounds, phosphite ester compounds, and thioether compounds. As the phenol compound, any phenol compound known as a phenolic antioxidant can be used. A preferred phenol compound is a hindered phenol compound. Compounds having a substituent at the ortho position adjacent to the phenolic hydroxyl group are preferred. As the substituent, substituted or unsubstituted alkyl groups having 1 to 22 carbon atoms are preferred. Furthermore, compounds having both a phenol group and a phosphite ester group in the same molecule are also preferred as antioxidants. In addition, phosphorus-based antioxidants can also be suitably used as antioxidants. Examples of phosphorus-based antioxidants include tris[2-[[2,4,8,10-tetrakis(1,1-dimethylethyl)dibenzo[d,f][1,3,2]dioxaphosfepin-6-yl]oxy]ethyl]amine, tris[2-[(4,6,9,11-tetra-tert-butyldibenzo[d,f][1,3,2]dioxaphosfepin-2-yl)oxy]ethyl]amine, and ethylbis(2,4-di-tert-butyl-6-methylphenyl) phosphate. Examples of commercially available antioxidants include ADEKA AO-20, ADEKA AO-30, ADEKA AO-40, ADEKA AO-50, ADEKA AO-50F, ADEKA AO-60, ADEKA AO-60G, ADEKA AO-80, and ADEKA AO-330 (all manufactured by ADEKA Corporation). Alternatively, compounds described in paragraphs 0023-0048 of Japanese Patent No. 6268967, International Publication No. 2017 / 006600, and International Publication No. 2017 / 164024 can also be used as antioxidants. The antioxidant content is preferably 0.01-20% by mass, and more preferably 0.3-15% by mass, of the total solid content of the composition. The composition may contain only one antioxidant or two or more. If two or more types are included, it is preferable that their total amount falls within the above range.

[0178] <<Component B>> The composition of the present invention may optionally contain sensitizers, curing accelerators, fillers, thermosetting accelerators, plasticizers, and other auxiliary agents (e.g., conductive particles, defoamers, flame retardants, leveling agents, peel accelerators, fragrances, surface tension modifiers, chain transfer agents, etc.). By appropriately including these components, properties such as film properties can be adjusted. These components can be described, for example, in paragraphs 0183 onwards of Japanese Patent Application Publication No. 2012-003225 (paragraph 0237 of the corresponding US Patent Application Publication No. 2013 / 0034812), paragraphs 0101-0104, 0107-0109, etc., of Japanese Patent Application Publication No. 2008-250074, and these contents are incorporated herein. The composition of the present invention may also optionally contain latent antioxidants. Examples of latent antioxidants include compounds in which the antioxidant portion is protected by a protecting group, and which function as antioxidants when heated at 100-250°C or at 80-200°C in the presence of an acid / base catalyst, thereby removing the protecting group. Examples of latent antioxidants include compounds described in International Publication No. 2014 / 021023, International Publication No. 2017 / 030005, and Japanese Patent Publication No. 2017-008219. Examples of commercially available latent antioxidants include ADEKA Arclus GPA-5001 (manufactured by ADEKA Corporation).

[0179] <container> There are no particular limitations on the container used to house the composition of the present invention, and any known container can be used. Furthermore, to suppress the incorporation of impurities into the raw materials and composition, it is preferable to use a multilayer bottle with an inner wall made of six types of resin in six layers, or a bottle with a seven-layer structure of six types of resin. Examples of such containers include the container described in Japanese Patent Application Publication No. 2015-123351. In addition, the inner wall of the container is preferably made of glass, stainless steel, or the like to prevent metal leaching from the inner wall, improve the stability of the composition over time, and suppress deterioration of its components.

[0180] <Method for preparing the composition> The composition of the present invention can be prepared by mixing the aforementioned components. When preparing the composition, all components may be dissolved or dispersed simultaneously in a solvent, or, if necessary, two or more solutions or dispersions containing the components in appropriate proportions may be prepared in advance and mixed at the time of use (application) to prepare the composition.

[0181] The preparation of the composition may include a process for dispersing the pigment. Examples of mechanical forces used in the pigment dispersion process include compression, squeezing, impact, shearing, and cavitation. Specific examples of these processes include bead mills, sand mills, roll mills, ball mills, paint shakers, microfluidizers, high-speed impellers, sand grinders, flow jet mixers, high-pressure wet atomization, and ultrasonic dispersion. Furthermore, in the grinding of pigments using a sand mill (bead mill), it is preferable to process the material under conditions that enhance grinding efficiency, such as by using small-diameter beads or increasing the bead packing density. It is also preferable to remove coarse particles after the grinding process by filtration or centrifugation. Furthermore, for the process and disperser used to disperse the pigment, the processes and dispersers described in "Complete Collection of Dispersion Technology, published by Joho Kiko Co., Ltd., July 15, 2005," "Comprehensive Data Collection on Dispersion Technology and Practical Industrial Applications, Centered on Suspension (Solid / Liquid Dispersion Systems), published by Keiei Kaihatsu Center Publishing Department, October 10, 1978," and paragraph 0022 of Japanese Patent Publication No. 2015-157893 can be suitably used. In addition, in the process of dispersing the pigment, the pigment may be refined by a salt milling process. For materials, equipment, processing conditions, etc. used in the salt milling process, refer to, for example, the descriptions in Japanese Patent Publication No. 2015-194521 and Japanese Patent Publication No. 2012-046629.

[0182] In preparing the composition, it is preferable to filter the composition with a filter for purposes such as removing foreign matter and reducing defects. Any filter that has been conventionally used for filtration purposes can be used without particular limitations. For example, filters made of materials such as fluororesins such as polytetrafluoroethylene (PTFE), polyamide resins such as nylon (e.g., nylon-6, nylon-6,6), and polyolefin resins such as polyethylene and polypropylene (PP) (including high-density and ultra-high molecular weight polyolefin resins) can be used. Among these materials, polypropylene (including high-density polypropylene) and nylon are preferred.

[0183] The pore size of the filter is preferably 0.01 to 7.0 μm, more preferably 0.01 to 3.0 μm, and even more preferably 0.05 to 0.5 μm. If the filter pore size is within the above range, fine foreign matter can be removed more reliably. The nominal value of the filter pore size can be referred to from the filter manufacturer. Various filters provided by Nippon Pall Co., Ltd. (DFA4201NIEY, DFA4201NAEY, DFA4201J006P, etc.), Advantec Toyo Co., Ltd., Nippon Integris Co., Ltd. (formerly Nippon Microlith Co., Ltd.), and KITZ Microfilter Corporation can be used.

[0184] Furthermore, it is also preferable to use fibrous filter media as a filter. Examples of fibrous filter media include polypropylene fiber, nylon fiber, and glass fiber. Commercially available products include the SBP type series (SBP008, etc.), TPR type series (TPR002, TPR005, etc.), and SHPX type series (SHPX003, etc.) from Rokitechno Co., Ltd.

[0185] When using filters, different filters (for example, a first filter and a second filter) may be combined. In this case, filtration with each filter may be performed only once or two or more times. Filters with different pore sizes within the range described above may also be combined. Furthermore, filtration with the first filter may be performed only on the dispersion, and after mixing in other components, filtration with the second filter may be performed.

[0186] <Membrane> Next, the film of the present invention will be described. The film of the present invention is obtained from the composition of the present invention described above. The film of the present invention can preferably be used as an optical filter. The applications of the optical filter are not particularly limited, but examples include infrared cut filters and infrared transmission filters. Examples of infrared cut filters include infrared cut filters on the light-receiving side of a solid-state image sensor (for example, for infrared cut filters for wafer-level lenses), infrared cut filters on the back side (opposite side from the light-receiving side) of a solid-state image sensor, and infrared cut filters for ambient light sensors (for example, illuminance sensors that sense the illuminance and color tone of the environment in which an information terminal device is placed and adjust the color tone of the display, and color correction sensors that adjust the color tone). In particular, it can preferably be used as an infrared cut filter on the light-receiving side of a solid-state image sensor. Examples of infrared transmission filters include filters that block visible light and selectively transmit infrared rays of a specific wavelength or higher.

[0187] The film of the present invention may have a pattern or may be a film without a pattern (a flat film). Furthermore, the film of the present invention may be used laminated on a support, or the film of the present invention may be used after being peeled off the support. Examples of support materials include semiconductor substrates such as silicon substrates and transparent substrates.

[0188] A charge-coupled device (CCD), complementary metal-oxide-semiconductor (CMOS), transparent conductive film, etc., may be formed on the semiconductor substrate used as a support. A black matrix that isolates each pixel may also be formed on the semiconductor substrate. Furthermore, if necessary, an undercoat layer may be provided on the semiconductor substrate to improve adhesion with the upper layer, prevent diffusion of materials, or flatten the substrate surface.

[0189] The transparent substrate used as a support is not particularly limited as long as it is made of a material that can transmit at least visible light. Examples include substrates made of glass, resin, etc. Examples of resins include polyester resins such as polyethylene terephthalate and polybutylene terephthalate, polyolefin resins such as polyethylene, polypropylene, and ethylene vinyl acetate copolymer, norbornene resin, acrylic resins such as polyacrylate and polymethyl methacrylate, urethane resin, vinyl chloride resin, fluororesin, polycarbonate resin, polyvinyl butyral resin, and polyvinyl alcohol resin. Examples of glass include soda-lime glass, borosilicate glass, alkali-free glass, quartz glass, and copper-containing glass. Examples of copper-containing glass include copper-containing phosphate glass and copper-containing fluorophosphate glass. Commercially available copper-containing glass can also be used. An example of a commercially available copper-containing glass is NF-50 (manufactured by AGC Techno Glass Co., Ltd.).

[0190] The thickness of the film of the present invention can be appropriately adjusted depending on the purpose. The film thickness is preferably 20 μm or less, more preferably 10 μm or less, and even more preferably 5 μm or less. The lower limit of the film thickness is preferably 0.1 μm or more, and more preferably 0.2 μm or more.

[0191] When the film of the present invention is used as an infrared cut filter, it is preferable that the film of the present invention has a maximum absorption wavelength in the range of wavelengths 650 to 1500 nm (preferably 660 to 1200 nm, more preferably 660 to 1000 nm). Furthermore, it is preferable that the average transmittance of light at wavelengths 420 to 550 nm is 50% or more, more preferably 70% or more, even more preferably 80% or more, and particularly preferable 85% or more. Furthermore, it is preferable that the transmittance across the entire range of wavelengths 420 to 550 nm is 50% or more, more preferably 70% or more, and even more preferably 80% or more. In addition, it is preferable that the film of the present invention has a transmittance of 15% or less at at least one point in the range of wavelengths 650 to 1500 nm (preferably 660 to 1200 nm, more preferably 660 to 1000 nm), more preferably 10% or less, and even more preferably 5% or less. Furthermore, when the absorbance at the maximum absorption wavelength is set to 1, the film of the present invention preferably has an average absorbance in the wavelength range of 420 to 550 nm of less than 0.030, and more preferably less than 0.025.

[0192] When the film of the present invention is used as an infrared transmission filter, it is preferable that the film of the present invention has any of the following spectral characteristics (i1) to (i3). (i1): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 850 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1000 to 1500 nm. A film having such spectral characteristics can block light in the wavelength range of 400 to 850 nm and transmit light with a wavelength greater than 950 nm. (i2): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 950 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1100 to 1500 nm. A film having such spectral characteristics can block light in the wavelength range of 400 to 950 nm and transmit light with a wavelength greater than 1050 nm. (i3): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 1050 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1200 to 1500 nm. A film having such spectral characteristics can block light in the wavelength range of 400 to 1050 nm and transmit light with a wavelength greater than 1150 nm.

[0193] The film of the present invention can also be used in combination with a color filter containing a chromatic coloring agent. The color filter can be manufactured using a coloring composition containing a chromatic coloring agent. When the film of the present invention is used as an infrared cut filter and in combination with a color filter, it is preferable that the color filter is positioned on the optical path of the film of the present invention. For example, it is preferable to laminate the film of the present invention and the color filter to form a laminate. In the laminate, the film of the present invention and the color filter may or may not be adjacent in the thickness direction. If the film of the present invention and the color filter are not adjacent in the thickness direction, the film of the present invention may be formed on a support other than the support on which the color filter is formed, and other components constituting a solid-state image sensor (e.g., microlenses, planarization layers, etc.) may be interposed between the film of the present invention and the color filter.

[0194] The film of the present invention can be used in various devices such as solid-state image sensors like CCDs (charge-coupled devices) and CMOS (complementary metal-oxide-semiconductor) sensors, as well as infrared sensors and image display devices.

[0195] <Memory manufacturing method> The film of the present invention can be manufactured by a process of applying the composition of the present invention.

[0196] Examples of supports include those mentioned above. Known methods can be used for coating the composition. For example, drop casting; slit coating; spray coating; roll coating; spin coating; casting; slit and spin coating; pre-wetting (for example, the method described in Japanese Patent Publication No. 2009-145395); various printing methods such as inkjet (for example, on-demand, piezo, and thermal), nozzle jet printing, flexographic printing, screen printing, gravure printing, reverse offset printing, and metal mask printing; transfer methods using molds, etc.; and nanoimprint methods. The application method for inkjet printing is not particularly limited, and examples include the method shown in "Expanding and Usable Inkjet Printing - Infinite Possibilities Seen in Patents," published in February 2005 by Sumibe Techno Research (especially pages 115-133), as well as the methods described in Japanese Patent Publication Nos. 2003-262716, 2003-185831, 2003-261827, 2012-126830, and 2006-169325.

[0197] The composition layer formed by applying the composition may be dried (pre-baked). When pre-baking is performed, the pre-baking temperature is preferably 150°C or lower, more preferably 120°C or lower, and even more preferably 110°C or lower. The lower limit can be, for example, 50°C or higher, and also 80°C or higher. The pre-baking time is preferably 10 seconds to 3000 seconds, more preferably 40 to 2500 seconds, and even more preferably 80 to 220 seconds. Drying can be performed using a hot plate, oven, etc.

[0198] The method for manufacturing the film may further include a step of forming a pattern. Examples of pattern formation methods include a pattern formation method using photolithography and a pattern formation method using dry etching, with the pattern formation method using photolithography being preferred. However, if the film of the present invention is used as a flat film, the step of forming a pattern may not be necessary. The step of forming a pattern will be described in detail below.

[0199] (When forming patterns using photolithography) The photolithography method for forming a pattern preferably includes a step of exposing a composition layer formed by coating the composition of the present invention in a patterned manner (exposure step), and a step of developing and removing the unexposed parts of the composition layer to form a pattern (development step). If necessary, a step of baking the developed pattern (post-bake step) may be provided. Each step will be described below.

[0200] In the exposure process, the composition layer is exposed in a pattern. For example, the composition layer can be exposed in a pattern by using a stepper exposure machine or a scanner exposure machine to expose it through a mask having a predetermined mask pattern. This allows the exposed areas to be cured.

[0201] Examples of radiation (light) that can be used during exposure include g-rays and i-rays. Light with a wavelength of 300 nm or less (preferably light with a wavelength of 180 to 300 nm) can also be used. Examples of light with a wavelength of 300 nm or less include KrF rays (wavelength 248 nm) and ArF rays (wavelength 193 nm), with KrF rays (wavelength 248 nm) being preferred. Long-wave light sources with wavelengths of 300 nm or more can also be used.

[0202] Furthermore, exposure may be performed by continuously irradiating with light, or by irradiating with light in pulses (pulsed exposure). Pulsed exposure is an exposure method that involves repeatedly irradiating and pausing with light in short cycles (for example, at the millisecond level or less).

[0203] The irradiation dose (exposure dose) is, for example, 0.03 to 2.5 J / cm². 2 Preferably, 0.05 to 1.0 J / cm² 2 This is more preferable. The oxygen concentration during exposure can be appropriately selected. In addition to exposure in air, exposure may be carried out in a low-oxygen atmosphere with an oxygen concentration of 19 vol% or less (e.g., 15 vol%, 5 vol%, or substantially oxygen-free), or in a high-oxygen atmosphere with an oxygen concentration exceeding 21 vol% (e.g., 22 vol%, 30 vol%, or 50 vol%). Furthermore, the exposure intensity can be appropriately set, usually 1000 W / m². 2 ~100,000 W / m 2 (For example, 5000W / m 2 , 15000W / m 2 , or 35000W / m 2 The oxygen concentration and exposure intensity can be combined as appropriate; for example, an oxygen concentration of 10% by volume and an illuminance of 10,000 W / m². 2 At an oxygen concentration of 35% by volume, the illuminance is 20,000 W / m². 2 This can be done as follows.

[0204] Next, the unexposed portions of the composition layer after exposure are developed and removed to form a pattern. The development and removal of the unexposed portions of the composition layer can be done using a developer. This causes the unexposed portions of the composition layer in the exposure process to dissolve in the developer, leaving only the photocured portions on the support. The temperature of the developer is preferably, for example, 20 to 30°C. The development time is preferably 20 to 180 seconds. In addition, to improve the ability to remove residue, the developer may be emptied every 60 seconds, and the process of supplying fresh developer may be repeated several times.

[0205] Examples of developing solutions include organic solvents and alkaline developers, with alkaline developers being preferred. As the alkaline developer, an alkaline aqueous solution (alkaline developer) obtained by diluting an alkaline agent with pure water is preferred. Examples of alkaline agents include organic alkaline compounds such as ammonia, ethylamine, diethylamine, dimethylethanolamine, diglycolamine, diethanolamine, hydroxyamine, ethylenediamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, ethyltrimethylammonium hydroxide, benzyltrimethylammonium hydroxide, dimethylbis(2-hydroxyethyl)ammonium hydroxide, choline, pyrrole, piperidine, and 1,8-diazabicyclo[5.4.0]-7-undecene, as well as inorganic alkaline compounds such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, sodium silicate, and sodium metasilicate. Alkaline agents with larger molecular weights are preferred from an environmental and safety perspective. The concentration of the alkaline agent in the alkaline aqueous solution is preferably 0.001 to 10% by mass, and more preferably 0.01 to 1% by mass. The developer may also contain a surfactant. A nonionic surfactant is preferred as the surfactant. For convenience of transport and storage, the developer may be manufactured as a concentrated solution and then diluted to the required concentration at the time of use. The dilution ratio is not particularly limited, but can be set in the range of 1.5 to 100 times, for example. It is also preferable to wash (rinse) with pure water after development. It is preferable to supply the rinsing solution to the developed composition layer while rotating the support on which the developed composition layer has formed. It is also preferable to move the nozzle that discharges the rinsing solution from the center of the support to the periphery of the support. In this case, when moving the nozzle from the center to the periphery of the support, the speed of movement of the nozzle may be gradually reduced. By performing rinsing in this manner, in-plane variation of the rinse can be suppressed. Furthermore, a similar effect can be obtained by gradually decreasing the rotation speed of the support while moving the nozzle from the center to the periphery of the support.

[0206] After development and drying, it is preferable to perform additional exposure or heat treatment (post-bake). Additional exposure and post-bake are curing treatments after development to ensure complete hardening. The heating temperature in post-bake is preferably 100 to 240°C, and more preferably 200 to 240°C. Post-bake can be performed continuously or in batches using heating means such as a hot plate, convection oven (hot air circulation dryer), or high-frequency heater to achieve the above conditions. When performing additional exposure, it is preferable that the light used for exposure has a wavelength of 400 nm or less. The additional exposure may also be performed by the method described in Korean Published Patent No. 10-2017-0122130.

[0207] (When forming patterns using the dry etching method) Pattern formation by dry etching can be carried out by coating the above composition onto a support to form a composition layer, curing the composition layer to form a cured material layer, then forming a patterned photoresist layer on this cured material layer, and then dry etching the cured material layer using an etching gas with the patterned photoresist layer as a mask. Pre-baking is preferable when forming the photoresist layer. For pattern formation by dry etching, refer to paragraphs 0010 to 0067 of Japanese Patent Application Publication No. 2013-064993, which are incorporated herein by reference.

[0208] <Optical filters> The optical filter of the present invention has the film of the present invention described above. Examples of types of optical filters include infrared cut filters and infrared transmit filters.

[0209] The optical filter of the present invention may further include, in addition to the film of the present invention described above, a copper-containing layer, a dielectric multilayer film, an ultraviolet absorption layer, and the like. Examples of ultraviolet absorption layers include the absorption layers described in paragraphs 0040 to 0070 and 0119 to 0145 of International Publication No. 2015 / 099060. Examples of dielectric multilayer films include the dielectric multilayer films described in paragraphs 0255 to 0259 of Japanese Patent Application Publication No. 2014-041318. As copper-containing layers, glass substrates made of copper-containing glass (copper-containing glass substrates) or layers containing copper complexes (copper complex-containing layers) can also be used. Examples of copper-containing glass substrates include copper-containing phosphate glass and copper-containing fluorine phosphate glass. Examples of commercially available copper-containing glass include NF-50 (manufactured by AGC Techno Glass Co., Ltd.), BG-60, BG-61 (both manufactured by Schott), and CD5000 (manufactured by HOYA Corporation).

[0210] <Solid-state image sensor> The solid-state image sensor of the present invention includes the film of the present invention as described above. The configuration of the solid-state image sensor is not particularly limited as long as it has the film of the present invention and functions as a solid-state image sensor. For example, the following configurations can be given.

[0211] The imaging device has a support on which a plurality of photodiodes constituting the light-receiving area of ​​a solid-state image sensor and a transfer electrode made of polysilicon or the like are provided. The photodiodes and transfer electrode have a light-shielding film made of tungsten or the like with an opening only for the light-receiving portion of the photodiode. The light-shielding film has a device protection film made of silicon nitride or the like formed to cover the entire surface of the light-shielding film and the light-receiving portion of the photodiode. The device protection film has the film of the present invention. Furthermore, the device protection film may have a configuration in which a light-gathering means (e.g., a microlens; the same applies hereinafter) is provided below the film of the present invention (on the side closer to the support), or a configuration in which the light-gathering means is provided on the film of the present invention. The color filter may also have a structure in which the film forming each pixel is embedded in a space partitioned, for example, in a grid pattern by partitions. In this case, it is preferable that the partitions have a lower refractive index than each pixel. Examples of imaging devices having such a structure include the devices described in Japanese Patent Application Publication No. 2012-227478 and Japanese Patent Application Publication No. 2014-179577.

[0212] <Image display device> The image display device of the present invention includes the film of the present invention. Examples of image display devices include liquid crystal displays and organic electroluminescent (organic EL) displays. For definitions and details of image display devices, see, for example, "Electronic Display Devices" (by Akio Sasaki, Kogyo Chosakai Co., Ltd., published in 1990) and "Display Devices" (by Yoshiaki Ibuki, Sangyo Tosho Co., Ltd., published in 1989). Liquid crystal displays are described, for example, in "Next-Generation Liquid Crystal Display Technology" (edited by Tatsuo Uchida, Kogyo Chosakai Co., Ltd., published in 1994). There are no particular limitations on the liquid crystal display devices to which the present invention can be applied; for example, it can be applied to various types of liquid crystal display devices described in the above-mentioned "Next-Generation Liquid Crystal Display Technology". The image display device may also have a white organic EL element. The white organic EL element is preferably in a tandem structure. The tandem structure of organic EL elements is described in Japanese Patent Publication No. 2003-045676, supervised by Akiyoshi Mikami, "The Cutting Edge of Organic EL Technology Development - High Brightness, High Precision, Long Lifespan, and Know-how Collection," Technical Information Association, pp. 326-328, 2008, etc. The spectrum of white light emitted by the organic EL element preferably has strong maximum emission peaks in the blue region (430-485 nm), the green region (530-580 nm), and the yellow region (580-620 nm). In addition to these emission peaks, it is even more preferable to have a maximum emission peak in the red region (650-700 nm).

[0213] <Infrared sensor> The infrared sensor of the present invention includes the film of the present invention described above. The configuration of the infrared sensor is not particularly limited as long as it functions as an infrared sensor. Hereinafter, one embodiment of the infrared sensor of the present invention will be described with reference to the drawings.

[0214] In Figure 1, reference numeral 110 denotes a solid-state image sensor. An infrared cut filter 111 and an infrared transmission filter 114 are arranged on the imaging area of ​​the solid-state image sensor 110. A color filter 112 is also arranged on the infrared cut filter 111. Microlenses 115 are arranged on the incident light hν side of the color filter 112 and the infrared transmission filter 114. A planarization layer 116 is formed to cover the microlenses 115.

[0215] The infrared cut filter 111 can be formed using the composition of the present invention. The color filter 112 is a color filter in which pixels that transmit and absorb light of specific wavelengths in the visible region are formed, and is not particularly limited; conventionally known color filters for pixel formation can be used. For example, a color filter in which red (R), green (G), and blue (B) pixels are formed can be used. For example, the description in paragraphs 0214 to 0263 of Japanese Patent Application Publication No. 2014-043556 can be referenced, and this content is incorporated herein. The characteristics of the infrared transmission filter 114 are selected according to the emission wavelength of the infrared LED used. The infrared transmission filter 114 can be formed using the composition of the present invention.

[0216] In the infrared sensor shown in Figure 1, an additional infrared cut filter (another infrared cut filter) may be placed on the planarization layer 116, separate from the infrared cut filter 111. Examples of other infrared cut filters include those having a copper-containing layer and / or a dielectric multilayer film. Details of these are described above. Furthermore, a dual bandpass filter may be used as the other infrared cut filter.

[0217] <Camera Module> The camera module of the present invention includes a solid-state image sensor and the film of the present invention described above. Preferably, the camera module further includes a lens and a circuit for processing images obtained from the solid-state image sensor. The solid-state image sensor used in the camera module may be the solid-state image sensor described in this disclosure or a known solid-state image sensor. Also, known lenses and circuits for processing images obtained from the solid-state image sensor can be used in the camera module. Examples of camera modules can be found in Japanese Patent Application Publication No. 2016-006476 and Japanese Patent Application Publication No. 2014-197190, the contents of which are incorporated herein by reference. [Examples]

[0218] The present invention will be further described in detail below with reference to examples. The materials, amounts used, proportions, processing content, and processing procedures shown in the following examples can be modified as appropriate, as long as they do not depart from the spirit of the present invention. In addition, Me in the structural formula represents a methyl group, Et represents an ethyl group, and Ph represents a phenyl group.

[0219] <Synthesis of the compound represented by formula (1)> <<Synthesis of Compound A001>> Compound A001 was synthesized according to the method described in Materials Chemistry Frontiers, 2018, 2, 112-120. [ka]

[0220] <<Synthesis of compounds A002-A008 and A014>> Compounds A002, A003, A004, A005, A006, A007, A008, and A014 were synthesized using the same method as compound A-001. [ka] [ka] [ka] <<Synthesis of Compound A009>> (A009) was synthesized according to the following scheme. In the following structural formulas, Ph represents a phenyl group. [ka]

[0221] Compound a was synthesized according to the method described in Tetrahedron 62 (2006) 6018-6028. 10 parts by mass of compound a, 7 parts by mass of 2-cyanothiophene (manufactured by Tokyo Chemical Industry Co., Ltd.), 50 parts by mass of t-amyl alcohol, and 12.5 parts by mass of sodium t-butoxide (manufactured by Tokyo Chemical Industry Co., Ltd.) were placed in a flask and stirred at an external temperature of 120°C for 4 hours. After the reaction, the mixture was allowed to cool to an internal temperature of 60°C, and 100 parts by mass of methanol, 100 parts by mass of water, and 8 parts by mass of acetic acid were added. The precipitated crystals were filtered off and washed with 140 parts by mass of methanol. 100 parts by mass of methanol was added to the obtained crystals and heated under reflux for 30 minutes, then allowed to cool to 30°C, and the crystals were filtered off. The obtained crystals were air-dried at 50°C to obtain 5 parts by mass of compound b. 7 parts by mass of compound b and 10 parts by mass of 2-(2-benzothiazolyl)acetonitrile were stirred in 140 parts by mass of toluene, and 18 parts by mass of phosphorus oxychloride were added dropwise. The mixture was heated under reflux for 3.5 hours. After the reaction was complete, the mixture was cooled to an internal temperature of 25°C, and 210 parts by mass of methanol were added dropwise over 60 minutes while maintaining an internal temperature of 30°C or lower. After the addition was complete, the mixture was stirred at room temperature for 30 minutes. The precipitated crystals were filtered off and washed with 140 parts by mass of methanol. 100 parts by mass of methanol were added to the obtained crystals, and the mixture was heated under reflux for 30 minutes. The mixture was allowed to cool to 30°C, and the crystals were filtered off. The obtained crystals were air-dried at 50°C to obtain 6 parts by mass of compound c. 14 parts by mass of 2-aminoethyl diphenylboric acid was stirred in 120 parts by mass of 1,2-dichlorobenzene. At an external temperature of 40°C, 17 parts by mass of titanium tetrachloride were added dropwise over 10 minutes, and the mixture was stirred for 30 minutes. 6 parts by mass of compound c were added, and the temperature was raised to an external temperature of 125°C and heated for 60 minutes. The mixture was allowed to cool to an internal temperature of 30°C, and 120 parts by mass of methanol were added dropwise while maintaining the internal temperature below 30°C. After addition, the mixture was stirred for 30 minutes, the crystals were filtered off, and the mixture was washed with 60 parts by mass of methanol. 100 parts by mass of methanol were added to the obtained crystals and heated under reflux for 30 minutes, allowed to cool to 30°C, and the crystals were filtered off. The obtained crystals were air-dried at 50°C to obtain 7 parts by mass of compound d. Six parts by mass of compound d were stirred in 300 parts by mass of chloroform, and 1.26 g of N-bromosuccinimide was added over 10 minutes at an external temperature of 0°C, while stirring continued for 2 hours. The mixture was then stirred at room temperature for 12 hours. 300 parts by weight of distilled water were added dropwise to the reaction solution, and the organic phase was separated by liquid-liquid extraction. The mixture was washed with a brine, dehydrated and dried over magnesium sulfate, and the solvent was removed by distillation. The resulting crude product was purified by silica gel column chromatography (solvent: chloroform) to obtain 1 part by mass of compound e. 1 part by mass of compound e, 0.09 parts by mass of bis(triphenylphosphine)palladium(II) dichloride (manufactured by Tokyo Chemical Industry Co., Ltd.), 2.4 parts by mass of potassium acetate, 3.3 parts by mass of bis(pinacolato)diboron (manufactured by Tokyo Chemical Industry Co., Ltd.), and 60 parts by mass of dimethylformamide were placed in a flask, frozen and degassed, then purged with argon, stirred at an external temperature of 80°C for 2 hours, and then cooled with water to room temperature. 100 parts by mass of methanol was added, the crystals were filtered off, and the mixture was washed with 140 parts by mass of methanol. 100 parts by mass of dimethylformamide was added to the obtained crystals and heated under reflux for 30 minutes, then allowed to cool to 30°C, and the crystals were filtered off. 100 parts by mass of chloroform was added to the obtained crystals and heated under reflux for 30 minutes, then allowed to cool to 30°C, and the crystals were filtered off. The obtained crystals were air-dried at 50°C to obtain 0.1 parts by mass of compound A009. Mass spectrometry using MALDI TOF-MASS (time-of-flight mass spectrometry) identified the compound as A009. ·MALDI TOF-MASS:Calc.for [M+H]+ :1867.5found:1867.4

[0222] <<Synthesis of Compound A010>> Compound f was synthesized according to the method described in paragraph 0072 of Japanese Patent Publication No. 6353060. [ka]

[0223] Compound A010 was synthesized in the same manner as compound A009, except that 2-(2-benzothiazolyl)acetonitrile was replaced with compound f, and 2-cyanothiazole was used instead of 2-cyanothiophene. Mass spectrometry using MALDI TOF-MASS (time-of-flight mass spectrometry) identified the compound as A010. ·MALDI TOF-MASS:Calc.for [M+H] + :2121.3found:2121.5 [ka]

[0224] <<Synthesis of Compound A011>> Compound g was synthesized using 2-octanol (manufactured by Tokyo Chemical Industry Co., Ltd.) as a raw material, according to the method described in paragraph 0072 of Japanese Patent Publication No. 6353060. Furthermore, compound h was synthesized using compound g as a raw material, according to the method described in Tetrahedron 62 (2006) 6018-6028, using the scheme shown below. [ka]

[0225] Compound i was synthesized in the same manner as A009, except that compound h was used instead of compound a, and 2-(2-benzothiazolyl)acetonitrile was replaced with compound f. [ka]

[0226] Compound A011 was synthesized using compound i and 2,5-thiophene-diboronic acid bis(pinacol) according to the method described in polymer Chemistry (2013), 4(4), 895-899. Mass spectrometry by MALDI TOF-MASS (time-of-flight mass spectrometry) identified the compound as A011. ·MALDI TOF-MASS:Calc.for [M+H] + :2233.3found:2233.1 [ka]

[0227] <<Synthesis of Compound A012>> Compound j was synthesized using the same method as compound a. [ka] Compound A012 was synthesized in the same manner as compound A009, except that compound a was replaced with compound j and 2-(2-benzothiazolyl)acetonitrile was replaced with compound f. Mass spectrometry using MALDI TOF-MASS (time-of-flight mass spectrometry) identified it as compound A012. ·MALDI TOF-MASS:Calc.for [M+H] + :2051.3found:2051.2 [ka]

[0228] <<Synthesis of Compound A013>> Compound A013 was synthesized in the same manner as compound A009, except that compound f was replaced with 2-(2-benzothiazolyl)acetonitrile. Mass spectrometry using MALDI TOF-MASS (time-of-flight mass spectrometry) identified it as compound A013. ·MALDI TOF-MASS:Calc.for [M+H] +:2119.3found:2119.3 [ka]

[0229] <<Synthesis of Compound A015>> Compound k was synthesized using Fineoxocol 2000 (manufactured by Nissan Chemical Industries, Ltd.) as a raw material, according to the method described in paragraph 0072 of Japanese Patent No. 6353060. [ka] Compound m was synthesized in the same manner as compound A011, except that compound g was replaced with compound k. [ka]

[0230] Compound A015 was synthesized using the same method as compound A009, except that compound m was used instead of compound e. Mass spectrometry using MALDI TOF-MASS (time-of-flight mass spectrometry) identified it as compound A015. ·MALDI TOF-MASS:Calc.for [M+H] + :2711.9found:2712.0 [ka]

[0231] <Preparation of Pigment Dispersion> The pigments, pigment derivatives, dispersants, and solvents of the types listed in the table below were mixed in the parts by mass indicated in the dispersion column of the table below. Then, 230 parts by mass of 0.3 mm diameter zirconia beads were added, and the mixture was dispersed using a paint shaker for 5 hours. The beads were then separated by filtration to produce a pigment dispersion.

[0232] [Table 1]

[0233] The details of the materials listed in the table above, specifically those indicated by abbreviations, are as follows:

[0234] (Pigment) A001~A013: Compounds with the following structure (specific compounds) [ka] [ka] [ka] [ka]

[0235] A101, A102: Compounds with the following structure (comparative compounds) [ka]

[0236] P001~P006: Compounds with the following structure (infrared absorbers) [ka]

[0237] PR254: CIPigment Red 254 (red pigment) PB15:6: CIPigment Blue 15:6 (blue pigment) Irgaphor Black: Irgaphor Black (manufactured by BASF, black pigment) PV23: CIPigment Violet23 (purple pigment) Metal azo pigment 1: Metal azo pigment 1 manufactured by the following method 46.2 g of diazobarbituric acid and 38.4 g of barbituric acid were added to 1100 g of distilled water at 85°C. Then, potassium hydroxide aqueous solution was added to this solution to adjust the pH to approximately 5, and the mixture was stirred for 90 minutes to produce an azobarbituric acid precursor. Next, 1500 g of distilled water at 82°C was added to the azobarbituric acid precursor. Then, 10 g of 30% hydrochloric acid was added dropwise. Next, 79.4 g of melamine was added. Then, a mixture of 0.282 mol of approximately 25% zinc chloride solution and 0.0015 mol of approximately 30% copper(II) chloride solution was added dropwise. The solution was then maintained at 82°C for 3 hours, after which KOH was added to adjust the pH to approximately 5.5. Next, the temperature of this solution was raised to 90°C, and while maintaining the temperature at 90°C, 100 g of distilled water was added to dilute it. Next, 21 g of 30% hydrochloric acid was added dropwise to this solution, and the solution was heat-treated at 90°C for 12 hours. Then, potassium hydroxide aqueous solution was added to the heat-treated solution to adjust the pH to approximately 5. Next, the pigment was isolated from this solution on a suction filter, washed, dried in a vacuum drying cabinet at 80°C, and then ground in a standard laboratory mill for approximately 2 minutes to produce metal azo pigment 1.

[0238] (Pigment derivatives) B-1~B-8: Compounds with the following structure [ka] [ka]

[0239] (Dispersant) D-1: Resin with the following structure (the values ​​attached to the main chain are molar ratios, and the values ​​attached to the side chains are the number of repeating units. Weight-average molecular weight: 28000) [ka] D-2: Resin with the following structure (the values ​​attached to the main chain are molar ratios, and the values ​​attached to the side chains are the number of repeating units. Weight-average molecular weight: 28000) [ka]

[0240] (solvent) S001: Propylene glycol monomethyl ether acetate

[0241] <Preparation of Composition> The materials other than the solvent shown in the table below were mixed in the proportions shown in the table below, and the solvent shown in the table below was added to adjust the solid content concentration to 20% by mass. After stirring, the mixture was filtered through a nylon filter with a pore size of 0.45 μm (manufactured by Nippon Pall Co., Ltd.) to prepare the composition. The values ​​in the "Amount of Blending" column in the table are the parts by mass values ​​in terms of solid content.

[0242] [Table 2] [Table 3]

[0243] The details of the materials listed in the table above, specifically those indicated by abbreviations, are as follows:

[0244] (Pigment dispersion) IR001~IR013, IR101, IR102, IR201~IR206, Red1, Blue1, Yellow1, Bk1, Violet1: Pigment dispersions as described above

[0245] (Infrared filtration agent) A014, A015: Compounds with the following structure (specific compounds) [ka]

[0246] (resin) B001: Polymethyl methacrylate (weight-average molecular weight 24000, dispersion degree 1.8, glass transition temperature 75°C) B002: Resin with the following structure (resin containing acid groups. The values ​​appended to the main chain represent the molar ratio of repeating units. Weight-average molecular weight 20000, degree of dispersion 1.9, glass transition temperature 100°C) [ka] B003: Resin with the following structure (resin containing acid groups. The values ​​appended to the main chain represent the molar ratio of repeating units; weight-average molecular weight 15000, dispersion 2.1, glass transition temperature 120°C) [ka] B004: Resin with the following structure (polyimide resin, weight-average molecular weight 25000, dispersion degree 2.2, glass transition temperature 310℃) [ka]

[0247] (polymerizable compound) M-1: Aronics M-305 (manufactured by Toagosei Co., Ltd., a mixture of pentaerythritol triacrylate and pentaerythritol tetraacrylate. The pentaerythritol triacrylate content is 55% to 63% by mass.) M-2: KAYARAD RP-1040 (manufactured by Nippon Kayaku Co., Ltd., ethylene oxide-modified pentaerythritol tetraacrylate) M-3: Aronics M-510 (manufactured by Toagosei Co., Ltd., polybasic acid modified acrylic oligomer)

[0248] (Photopolymerization initiator) C-1: Irgacure OXE01 (BASF, oxime ester initiator) C-2: Irgacure OXE02 (BASF, oxime ester initiator)

[0249] (Surfactants) F-1: Megafuck RS-72-K (manufactured by DIC Corporation, fluorine-based surfactant) F-2: Compound with the following structure (weight-average molecular weight 14000, the percentage indicating the proportion of repeating units is in mole percent) [ka] F-3: KF-6001 (manufactured by Shin-Etsu Chemical Co., Ltd., polydimethylsiloxane modified with carbinols at both ends, hydroxyl value 62 mg KOH / g)

[0250] (Polymerization inhibitor) G-1: p-Methoxyphenol G-2: ADEKA Stub AO-80 (Manufactured by ADEKA Corporation)

[0251] (Other additives) U-1: Uvinul3050 (BASF product, UV absorber) U-2: Tinuvin477 (BASF-made, hydroxyphenyltriazine-based UV absorber) U-3: Tinuvin326 (BASF product, UV absorber)

[0252] (solvent) S001: Propylene glycol monomethyl ether acetate S002: Propylene glycol monomethyl ether

[0253] <Evaluation of infrared shielding, light resistance, and heat resistance> Each composition was applied to a glass substrate by spin coating to a film thickness of 1.0 μm after deposition, and exposed using an i-line stepper exposure system FPA-3000i5+ (manufactured by Canon Corporation) at a density of 1000 mJ / cm². 2 The entire surface was exposed with the specified exposure level. Then, the film was fabricated by heating it at 200°C for 2 minutes using a hot plate.

[0254] -Regarding the evaluation of infrared shielding properties- For glass substrates on which the above film was fabricated, the transmittance in the wavelength range of 400 to 1100 nm was measured using an ultraviolet-visible-near-infrared spectrophotometer (U-4100, manufactured by Hitachi High-Technologies Corporation). The average transmittance in the wavelength range of 700 nm to less than 850 nm (average transmittance 1) and the average transmittance in the wavelength range of 850 nm to less than 1000 nm (average transmittance 2) were determined, and the infrared shielding performance was evaluated according to the following criteria. A: The average transmittance is less than 5%. B: The average transmittance is between 5% and 10%. C: The average transmittance is between 10% and 20%. D: The average transmittance is 20% or higher.

[0255] -Regarding the evaluation of lightfastness- The transmittance of the glass substrate on which the above film was deposited was measured in the wavelength range of 400 to 1100 nm using an ultraviolet-visible-near-infrared spectrophotometer (U-4100, manufactured by Hitachi High-Technologies Corporation). Next, the glass substrate on which the above film was deposited was irradiated with 250,000 lux of light using a xenon lamp for 100 hours, and the transmittance of the film after xenon lamp irradiation was measured. The change in transmittance (ΔT1) at each wavelength in the wavelength range of 700 to 1100 nm before and after xenon lamp irradiation was determined, and the light resistance was evaluated based on the largest value of ΔT1 across the entire measurement wavelength range according to the following criteria. A smaller value of ΔT1 indicates better light resistance. Transmittance change (ΔT1) = |Transmittance of the film before xenon lamp irradiation - Transmittance of the film after xenon lamp irradiation| A: ΔT1 is less than 3% B: ΔT1 is between 3% and 5%. C:ΔT1 is between 5% and less than 10% D:ΔT1 is 10% or more.

[0256] -Regarding the evaluation of heat resistance- The transmittance of the glass substrate on which the above film was deposited was measured in the wavelength range of 400 to 1100 nm using an ultraviolet-visible-near-infrared spectrophotometer (U-4100, manufactured by Hitachi High-Technologies Corporation). Next, the glass substrate on which the above film was deposited was heated at 200°C for 1 hour using a hot plate. The change in transmittance (ΔT2) at each wavelength in the wavelength range of 700 to 1100 nm before and after heating was determined, and the heat resistance was evaluated based on the largest value of ΔT2 across the entire measured wavelength range according to the following criteria. A smaller value of ΔT2 indicates better heat resistance. Transmittance change (ΔT2) = |Transmittance of the film before heating - Transmittance of the film after heating| A: ΔT2 is less than 3% B: ΔT2 is between 3% and 5%. C:ΔT2 is between 5% and less than 10% D:ΔT2 is 10% or more.

[0257] [Table 4]

[0258] As shown in the table above, the examples exhibited superior light resistance and heat resistance compared to the comparative examples.

[0259] By using the film of the embodiment in an optical filter, solid-state image sensor, image display device, infrared sensor, or camera module, high-performance optical filters, solid-state image sensors, image display devices, infrared sensors, and camera modules can be obtained. [Explanation of Symbols]

[0260] 110: Solid-state image sensor, 111: Infrared cut filter, 112: Color filter, 114: Infrared transmission filter, 115: Microlens, 116: Planarization layer

Claims

1. A composition comprising a compound represented by formula (1) and a curable compound; 【Chemistry 1】 In formula (1), L １ This represents an n-valent conjugated linking group containing an aromatic heterocyclic group. R １ This represents an alkyl group, an aryl group, or a heteroaryl group. X １ and X ２ This represents C-CN, Ar １ and Ar ２ Each of these independently represents an aryl group or a heteroaryl group. Y １ and Y ２ each independently represents a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, -BR Ｙ１ R Ｙ２ or a metal atom, R Ｙ１ and R Ｙ２ Each of these independently represents a hydrogen atom or a substituent, R Ｙ１ and R Ｙ２ They may be bonded together to form a ring. n represents an integer greater than or equal to 2.

2. The composition according to claim 1, wherein the compound represented by formula (1) is the compound represented by formula (2); 【Chemistry 2】 In formula (2), L ２ This represents a divalent conjugated linking group containing an aromatic heterocyclic group. R ２ and R ３ Each of these independently represents an alkyl group, an aryl group, or a heteroaryl group. X ３ ~X ６ This represents C-CN, Ar ３ ~Ar ６ Each of these independently represents an aryl group or a heteroaryl group. Y ３ ~Y ６ These are, independently, a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, and -BR. Ｙ１ R Ｙ２ Or it represents a metal atom, R Ｙ１ and R Ｙ２ Each of these independently represents a hydrogen atom or a substituent, R Ｙ１ and R Ｙ２ They may be joined together to form a ring.

3. L in formula (2) above ２ The composition according to claim 2, wherein at least one of the bonding ends with the pyrrolopyrrole ring is an aromatic heterocyclic group.

4. L in formula (2) above ２ The composition according to claim 2, wherein both bonding ends with the pyrrolopyrrole ring are aromatic heterocyclic groups.

5. L in formula (2) above ２ The composition according to claim 2, wherein is a group represented by formula (L-1); 【Transformation 3】 In formula (L-1), Z １ and Z ２ These are S, O, or NR, respectively, independently. Ｚ１ Represents R Ｚ１ represents a hydrogen atom or substituent, W １ and W ２ Each of these independently corresponds to -CR Ｗ１ Or it represents N, R Ｗ１ represents a hydrogen atom or substituent, R Ｌ１ and R Ｌ２ Each of these independently represents a hydrogen atom or a substituent. L １１ This represents a single bond or a divalent conjugated linking group. The aforementioned divalent conjugated linking group is an aromatic hydrocarbon group, an aromatic heterocyclic group, -CR Ｌ１１ =CR Ｌ１２ - represents a group consisting of -C≡C- or a combination thereof, R Ｌ１１ and R Ｌ１２ Each of these independently represents a hydrogen atom or a substituent.

6. Z in equation (L-1) １ and Z ２ The composition according to claim 5, wherein S is

7. The composition according to claim 5, wherein the group represented by formula (L-1) is the group represented by formula (L-2); 【Chemistry 4】 In formula (L-2), Z １ and Z ２ These are S, O, or NR, respectively, independently. Ｚ１ Represents R Ｚ１ represents a hydrogen atom or substituent, W １ and W ２ Each of these independently corresponds to -CR Ｗ１ Or it represents N, R Ｗ１ represents a hydrogen atom or substituent, R Ｌ１ and R Ｌ２ Each of these independently represents a hydrogen atom or a substituent. L １１ This represents a single bond or a divalent conjugated linking group. The aforementioned divalent conjugated linking group is an aromatic hydrocarbon group, an aromatic heterocyclic group, -CR Ｌ１１ =CR Ｌ１２ - represents a group consisting of -C≡C- or a combination thereof, R Ｌ１１ and R Ｌ１２ Each of these independently represents a hydrogen atom or a substituent.

8. Furthermore, the composition according to claim 1 or 2 further contains at least one selected from an infrared absorber other than the compound represented by formula (1) and a colorant.

9. The composition according to claim 1 or 2, wherein the curable compound comprises a resin having an acid group.

10. The curable compound includes a polymerizable compound, The composition according to claim 1 or 2, further comprising a polymerization initiator.

11. The composition according to claim 1 or 2, which is for use as an infrared cut filter or an infrared transmit filter.

12. A film obtained using the composition described in claim 1 or 2.

13. An optical filter comprising the film described in claim 12.

14. A solid-state image sensor comprising the film described in claim 12.

15. An image display device comprising the film described in claim 12.

16. An infrared sensor comprising the film described in claim 12.

17. A camera module comprising the film described in claim 12.

18. Compounds represented by formula (2A); 【Transformation 5】 In formula (2A), L ２Ａ represents the base expressed by formula (L-1), R ２ and R ３ Each of these independently represents an alkyl group, an aryl group, or a heteroaryl group. Ar ３ ~Ar ６ Each of these independently represents an aryl group or a heteroaryl group. Y ３ ~Y ６ These are, independently, a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, and -BR. Ｙ１ R Ｙ２ Or it represents a metal atom, R Ｙ１ and R Ｙ２ Each of these independently represents a hydrogen atom or a substituent, R Ｙ１ and R Ｙ２ They may be joined together to form a ring; 【Transformation 6】 In formula (L-1), Z １ and Z ２ These are S, O, or NR, respectively, independently. Ｚ１ Represents R Ｚ１ represents a hydrogen atom or substituent, W １ and W ２ Each of these independently corresponds to -CR Ｗ１ Or it represents N, R Ｗ１ represents a hydrogen atom or substituent, R Ｌ１ and R Ｌ２ Each of these independently represents a hydrogen atom or a substituent. L １１ This represents a single bond or a divalent conjugated linking group. The divalent conjugated system linking group is an aromatic hydrocarbon group, an aromatic heterocyclic group, -CR Ｌ１１ =CR Ｌ１２ -, -C≡C- or a group combining these, and R Ｌ１１ and R Ｌ１２ each independently represent a hydrogen atom or a substituent.

Images