Stage apparatus, transfer apparatus, and method for manufacturing articles

Abstract

To provide a technique advantageous for reducing a moment acting on a micromotion stage.SOLUTION: A transfer device for transferring a pattern of an original plate onto a substrate includes a coarse motion stage, a coarse motion actuator for driving the coarse motion stage along a predetermined plane, a micromotion stage for holding the substrate, a micromotion actuator for adjusting the position and the attitude of the micromotion stage, and an electromagnetic actuator for transmitting thrust given to the coarse motion stage by the coarse motion actuator to the micromotion stage in a non-contact manner. The electromagnetic actuator includes a fixed iron core which is fixed to the coarse motion stage and has a first end face, a coil wound around the fixed iron core, and a movable iron core which is fixed to the micromotion stage and has a second end face opposite to the first end face, and a maximum value of a difference calculated by subtracting a second distance between the substrate held by the micromotion stage and the farthest position on the second end face from a first distance between the substrate held by the micromotion stage and the farthest position on the first end face is larger than a positive predetermined value.SELECTED DRAWING: Figure 11

Description

Technical Field

[0001] The present invention relates to Stage equipment, a transfer device and an article manufacturing method.

Background Art

[0002] A transfer device that transfers a pattern of a master plate to a substrate may include a coarse movement stage driven by a coarse movement actuator and a fine movement stage disposed on the coarse movement stage and holding the substrate. A fine movement actuator for adjusting the position and orientation of the fine movement stage with respect to the coarse movement stage may be disposed between the coarse movement stage and the fine movement stage. Also, an electromagnetic actuator for transmitting the thrust applied to the coarse movement stage by the coarse movement actuator to the fine movement stage in a non-contact manner may be disposed between the coarse movement stage and the fine movement stage.

Prior Art Documents

Patent Documents

[0003]

Patent Document 1

Patent Document 2

Summary of the Invention

Problems to be Solved by the Invention

[0004] When accelerating the fine movement stage, a moment may act on the fine movement stage. When operating the fine movement actuator to cancel such a moment, heat generation from the fine movement actuator may increase. This heat generation may cause deformation of the fine movement stage, and this deformation may cause a decrease in overlay accuracy.

[0005] An object of the present invention is to provide an advantageous technique for reducing the moment acting on the fine movement stage.

Means for Solving the Problems

[0006] One aspect of the present invention relates to a stage device for holding a substrate, the stage device including a coarse stage, a coarse actuator for driving the coarse stage along a predetermined plane, a fine stage for holding the substrate, a fine actuator for adjusting the position and orientation of the fine stage relative to the coarse stage, and an electromagnetic actuator for non-contactly transmitting the thrust applied to the coarse stage by the coarse actuator to the fine stage, the electromagnetic actuator including a fixed core fixed to the coarse stage and having a first end face, a coil wound around the fixed core, and a movable core fixed to the fine stage and having a second end face facing the first end face, the position of the first end face furthest from the substrate held by the fine stage and the aforementioned substrate and First distance This changes in accordance with the movement of the micro-movement stage in a direction perpendicular to the predetermined plane, and the first distance from 、 The position of the second end face that is furthest from the substrate held by the micro-movement stage and the aforementioned substrate and The maximum difference obtained by subtracting the second distance is greater than a predetermined positive value. Ku , The predetermined value is the drive stroke of the micro-actuator in a direction perpendicular to the predetermined plane. . [Effects of the Invention]

[0007] According to the present invention, an advantageous technique is provided for reducing the moment acting on the micro-movement stage. [Brief explanation of the drawing]

[0008] [Figure 1] A diagram illustrating the configuration of an exposure apparatus according to one embodiment. [Figure 2] A diagram illustrating the configuration of a wafer stage apparatus according to one embodiment. [Figure 3] A diagram illustrating the configuration of a wafer stage apparatus according to one embodiment. [Figure 4] A diagram illustrating the configuration of a micro-movement stage device according to one embodiment. [Figure 5] A diagram illustrating the configuration of a coarse stage device according to one embodiment. [Figure 6]A diagram exemplarily showing the configuration of a coarse movement linear motor according to an embodiment. [Figure 7] A diagram exemplarily showing a shot layout diagram. [Figure 8] A diagram exemplarily showing the configuration of a fine movement electromagnet incorporated in an exposure apparatus or a wafer stage apparatus according to the first embodiment. [Figure 9] A diagram exemplarily showing the configuration of a fine movement electromagnet incorporated in an exposure apparatus or a wafer stage apparatus according to the first embodiment. [Figure 10] A diagram exemplarily showing the configuration of a fine movement stage apparatus incorporated in an exposure apparatus or a wafer stage apparatus according to the first embodiment. [Figure 11] A diagram for explaining the preferable configuration and arrangement of a fixed core and a movable core. [Figure 12] A diagram exemplarily showing the configuration of a fine movement electromagnet incorporated in an exposure apparatus or a wafer stage apparatus according to the second embodiment. [Figure 13] A diagram exemplarily showing the configuration of a fine movement electromagnet incorporated in an exposure apparatus or a wafer stage apparatus according to the second embodiment. [Figure 14] A diagram exemplarily showing the configuration of a fine movement electromagnet incorporated in an exposure apparatus or a wafer stage apparatus according to the second embodiment. [Figure 15] A diagram for explaining the moment acting on a fine movement stage. [Figure 16] A diagram exemplarily showing the configuration of an improved example of a fine movement electromagnet incorporated in an exposure apparatus or a wafer stage apparatus according to the second embodiment. [Figure 17] A diagram exemplarily showing the configuration of an improved example of a fine movement electromagnet incorporated in an exposure apparatus or a wafer stage apparatus according to the second embodiment. [Figure 18] A diagram exemplarily showing the configuration of another improved example of a fine movement electromagnet incorporated in an exposure apparatus or a wafer stage apparatus according to the second embodiment. [Figure 19] A diagram exemplarily showing the configuration of a fine movement electromagnet incorporated in an exposure apparatus or a wafer stage apparatus according to the third embodiment. [Figure 20]A diagram exemplarily showing the configuration of a modified example of a fine movement electromagnet incorporated in an exposure apparatus or a wafer stage apparatus according to the third embodiment. [Figure 21] A diagram exemplarily showing the configuration of a support member of a movable iron core in a modified example of a fine movement electromagnet according to the third embodiment. [Figure 22] A diagram exemplarily showing the configuration of a control system of a wafer stage apparatus according to an embodiment. [Figure 23] A diagram exemplarily showing a position profile and an acceleration profile. [Figure 24] A diagram for explaining an assembly method or a manufacturing method of another improved example of a fine movement electromagnet according to the second embodiment. [Figure 25] A diagram for explaining an assembly method or a manufacturing method of another improved example of a fine movement electromagnet according to the second embodiment. [Figure 26] A diagram for explaining an assembly method or a manufacturing method of another improved example of a fine movement electromagnet according to the second embodiment. [Figure 27] A diagram for explaining an assembly method or a manufacturing method of another improved example of a fine movement electromagnet according to the second embodiment. [Figure 28] A diagram for explaining an assembly method or a manufacturing method of another improved example of a fine movement electromagnet according to the second embodiment. [Figure 29] A diagram exemplarily explaining a wound iron core. [Figure 30] A diagram exemplarily explaining a manufacturing method of a wound iron core. [Figure 31] A diagram for explaining eddy currents generated in an iron core having a complex three-dimensional shape.

Embodiments for Carrying Out the Invention

[0009] Hereinafter, embodiments will be described in detail with reference to the accompanying drawings. Note that the following embodiments do not limit the invention according to the claims, and not all combinations of the features described in the embodiments are essential to the invention. Two or more of the features described in the embodiments may be arbitrarily combined. Also, the same or similar configurations are denoted by the same reference numerals, and redundant descriptions are omitted.

[0010] In the following explanation, directions are described according to the XYZ coordinate system. The XY plane, defined by the X and Y axes, is typically the horizontal plane, and the Z axis is typically parallel to the vertical. The XY directions are directions parallel to the XY plane. The X-axis direction is parallel to the X axis, the Y-axis direction is parallel to the Y axis, and the Z-axis direction is parallel to the Z axis.

[0011] Figure 1 illustrates the configuration of an exposure apparatus according to one embodiment. This exposure apparatus may be understood as an example of an alignment apparatus that relatively aligns a first object (e.g., a substrate) and a second object (e.g., a master plate), or an example of a transfer apparatus that transfers the pattern of a master plate (reticle) onto a substrate (wafer). A stage plate 692 may be placed on the floor 691 via a mount, and a wafer stage apparatus 500 may be placed on the stage plate 692. A lens barrel plate 696 may also be placed on the floor 691 via a mount 698. The lens barrel plate 696 may support the projection optical system 687 and the reticle plate 694. A reticle stage apparatus 695 may be placed on the reticle plate 694. An illumination optical system 699 may be placed above the reticle plate 694. The illumination optical system 699 projects the image of the reticle placed on the reticle stage of the reticle stage apparatus 695 onto the wafer placed on the wafer stage of the wafer stage apparatus 500, thereby transferring the reticle pattern onto the wafer. The exposure apparatus may be configured as a scanning exposure apparatus.

[0012] The wafer stage apparatus 500 can be understood as a first positioning mechanism for positioning a substrate as a first object, and the reticle stage apparatus 695 can be understood as a second positioning mechanism for positioning a reticle as a second object. At least one of the first positioning mechanism and the second positioning mechanism may include an electromagnetic device or electromagnetic actuator as described below.

[0013] The above-described exposure apparatus or transfer apparatus may be used in a method for manufacturing articles such as semiconductor devices. The method for manufacturing articles may include a transfer step of transferring a pattern from a master plate onto a substrate using the above-described exposure apparatus or transfer apparatus, and a step of obtaining an article by processing the substrate that has undergone the transfer step. The processing of the substrate may include, for example, etching, film deposition, dicing, etc.

[0014] Figure 2 illustrates the overall configuration of the wafer stage apparatus 500. An XY slider 104 may be slidably positioned on the stage base 105 in the XY direction. The XY slider 104 may be subjected to force in the X-axis direction by the X slider 102 and force in the Y-axis direction by the Y slider 103. A fine-adjustment stage apparatus 101 may be mounted on the XY slider 104. Coarse-adjustment linear motors 106 may be provided on both sides of the X slider 102 and the Y slider 103 to drive them in the X-axis and Y-axis directions, respectively.

[0015] Figure 3 illustrates a state in which the micro-movement stage (micro-movement top plate) 101-1 of the micro-movement stage device 101 is conveniently moved upward in the wafer stage device 500. The micro-movement stage 101-1 holds the wafer. The micro-movement stage 101-1 may be understood as having a chuck for holding the wafer. A micro-movement base 101-2 may be fixed on the XY slider 104. Four micro-movement ZLMs (first micro-movement actuators) 101-6 for precise Z-tilt positioning may be provided on the micro-movement base 101-2. Two micro-movement XLMs (second micro-movement actuators) 101-4 for precise positioning around the X and Z axes may also be provided on the micro-movement base 101-2. Two micro-movement YLMs (third micro-movement actuators) 101-5 for precise positioning around the Y and Z axes may also be provided on the micro-movement base 101-2. A micro-adjustment electromagnet 101-3 may be provided in the center of the micro-adjustment base 101-2, which functions to transmit the acceleration forces in the X-axis and Y-axis directions applied to the XY slider 104 to the micro-adjustment base 101-2.

[0016] Here, the fine-motion base 101-2 can be understood as a coarse-motion stage. Alternatively, the XY slider 104 and the fine-motion base 101-2 may be understood as a coarse-motion stage. The coarse-motion linear motor 106 can also be understood as a coarse-motion actuator that drives the fine-motion base 101-2 as a coarse-motion stage along the XY plane, i.e., a predetermined plane. The fine-motion ZLM 101-6, fine-motion XLM 101-4, and Y-fine-motion YLM 101-5 can also be understood as fine-motion actuators for adjusting the position and orientation of the fine-motion stage 101-1 relative to the fine-motion base 101-2 as a coarse-motion stage. The fine-motion electromagnet 101-3 can also be understood as an electromagnetic actuator for non-contact transmission of the thrust applied to the fine-motion base 101-2 as a coarse-motion stage by the coarse-motion linear motor 106 as a coarse-motion actuator to the fine-motion stage 101-1.

[0017] Figure 4 shows the configuration of the fine-movement stage device 101, particularly detailed configuration examples of the fine-movement YLM 101-5 and the fine-movement ZLM 101-6. Note that in Figure 4, a part of the yoke is removed. The fine-movement YLM 101-5 may be composed of a linear motor. The fine-movement YLM 101-5 may include a fine-movement YLM coil base 101-52, a fine-movement YLM coil 101-51, a fine-movement YLM magnet 101-53, a fine-movement YLM yoke 101-54, and a fine-movement LM spacer 101-70. The fine-movement YLM coil base 101-52 may be fixed on the fine-movement base 101-2, and the fine-movement YLM coil 101-51 may be fixed on the coil base 101-52. The fine-adjustment YLM coil 101-51 may be an oval coil having a straight section extending vertically, and four fine-adjustment YLM magnets 101-53 may be arranged with air gaps between them so as to face this straight section. Two YLM yokes 101-54 may be arranged to pass magnetic flux between these magnets. The magnetization direction of the magnets may be in the X-axis direction, adjacent magnets in the Y-axis direction may have opposite polarity, and magnets aligned in the X-axis direction may have the same polarity. A fine-adjustment LM spacer 101-70 may be used to hold the positions of a pair of magnets and yokes against the attractive force acting on them. The magnets, yokes, and spacers may be fixed to a fine-adjustment base 101-2. By passing current through the YLM coil 101-51, a force proportional to the current can be generated in the direction perpendicular to the straight section, i.e., in the Y-axis direction. In addition, by passing currents in opposite directions through two fine-adjustment YLMs 101-51, a moment about the Z-axis can be generated.

[0018] The fine-motion ZLM101-6 may be composed of a linear motor. The fine-motion ZLM101-6 may include a fine-motion ZLM coil base 101-62, a fine-motion ZLM coil 101-61, a fine-motion ZLM magnet 101-63, a fine-motion ZLM yoke 101-64, and a fine-motion LM spacer 101-70. The fine-motion ZLM coil base 101-62 may be fixed on the fine-motion base 101-2, and the fine-motion ZLM coil 101-61 may be fixed on the fine-motion ZLM coil base 101-62. The fine-motion ZLM coil 101-61 may be an oval coil having a horizontally extending straight section, and four fine-motion ZLM magnets 101-63 may be arranged with air gaps between them facing this straight section. Two ZLM yokes 101-64 may be arranged to pass magnetic flux between these magnets. The magnetization direction of the magnets may be along the X-axis, adjacent magnets along the Z-axis may have opposite polarity, and magnets aligned along the X-axis may have the same polarity. The fine-adjustment LM spacers 101-70 can be used to hold the positions of a pair of magnets and yokes against the attractive force acting on them. The magnets, yokes, and spacers can be fixed to the fine-adjustment top plate 101. By passing current through the ZLM coil 101-61, a force proportional to the current can be generated in the direction perpendicular to the straight section, i.e., along the Z-axis. Furthermore, by combining the directions of the currents flowing through the four fine-adjustment ZLMs 101-6, moments around the X-axis and moments around the Y-axis can be generated.

[0019] The XLM101-4 micro-movement control has the same configuration as the YLM101-5 micro-movement control, but rotated 90 degrees. This allows it to generate force in the X-axis direction and moment around the Z-axis.

[0020] Furthermore, four pin units 101-39 may be provided, which can function as temporary storage areas when retrieving a wafer from the micro-movement stage 101 and when placing a wafer on the micro-movement stage 101-1. While it is desirable to have three or more pin units 101-39 for stable temporary wafer placement, a minimum of one is sufficient for transfer. Each pin unit 101-39 has a lifting mechanism for raising and lowering the pin on which the wafer is temporarily placed or placed. Each pin unit 101-39 may have a function to drive the pins to a first state where the upper end of the pin protrudes from the upper surface of the micro-movement stage 101-1, and to drive the pins to a second state where the upper end of the pin is retracted below the upper surface of the micro-movement stage 101-1. In the operation of placing a wafer on the micro-movement stage 101-1, the pin unit 101-39 receives the wafer from a transport mechanism (not shown) in the first state, and then, in the process of transitioning to the second state, passes the wafer on the pins to the micro-movement stage 101-1. In the operation of passing the wafer placed on the micro-movement stage 101-1 to a transport mechanism (not shown), the pin unit 101-39 transitions the pins from the second state to the first state. In this process, the pin unit 101-39 receives the wafer placed on the micro-movement stage 101-1 with its pins and passes it to the transport mechanism (not shown) in the first state.

[0021] The fine-movement stage device 101 does not necessarily have to include the pin unit 101-39. In this case, the fine-movement stage 101-1 can be driven to an upward position by the fine-movement ZLM 101-6, thereby enabling the transfer of wafers to and from a transport mechanism (not shown).

[0022] Figure 5 illustrates the detailed configuration of the coarse-motion stage device, particularly the X slider 102, Y slider 103, and XY slider 104. The XY slider 104 may include a lower XY slider component 104-3, a middle XY slider component 104-2, and an upper XY slider component 104-1. The lower XY slider component 104-3 is slidably supported on the stage base 105 in the XY direction, the middle XY slider component 104-2 is placed on it, and the upper XY slider component 104-1 is placed on it.

[0023] The X-slider 102 may include an X-beam 102-1, two X-foots 102-2, and two X-yaw guides 102-3. The two X-yaw guides 102-3 may be fixed to two sides of the stage base 105. The two X-foots 102-2 may be connected by the X-beam 102-1. One X-foot 102-2 may be supported to slide freely in the X-axis direction, facing the side of one X-yaw guide 102-3 and the top surface of the stage base 105 with a gap between them. The other X-foot 102-2 may be supported to slide freely in the X-axis direction, facing the side of the other X-yaw guide 102-3 and the top surface of the stage base 105 with a gap between them. This allows the X-beam 102-1 and the two X-foots 102-2 to be positioned to slide freely in the X-axis direction. Furthermore, both sides of the X-beam 102-1 are slidably facing the inner surface of the XY slider component 104-2 via a small gap, thereby constraining the XY slider 104 to slide freely in the XY direction.

[0024] The Y-slider 103 may include a Y-beam 103-1, Y-foot 103-2, and Y-yaw guide 103-3. Two Y-yaw guides 103-3 may be fixed to two sides of the stage base 105, and two Y-foots 103-2 may be connected by the Y-beam 103-1. One Y-foot 103-2 may be supported to slide freely in the Y-axis direction, facing the side of one Y-yaw guide 103-3 and the top surface of the stage base 105 with a gap between them. The other Y-foot 103-2 may be supported to slide freely in the Y-axis direction, facing the side of the other Y-yaw guide 103-3 and the top surface of the stage base 105 with a gap between them. This allows the Y-beam 103-1 and the two Y-foots 103-2 to be slidably positioned in the X-axis direction. Furthermore, both sides of the Y-beam 103-1 are slidably facing the inner surface of the XY slider upper component 104-1 via a small gap, thereby constraining the XY slider 104 to slide freely in the XY direction.

[0025] Figure 6 illustrates a detailed configuration of the coarse-acting linear motor 106. The coarse-acting linear motor 106 may include a plurality of linear motor coils 106-1, a coil support plate 106-2, a support column 106-3, a coil base 106-4, two linear motor magnets 106-5, a yoke 106-6, two spacers 106-7, and an arm 106-8.

[0026] The multiple linear motor coils 106-1 may be two-phase coil units in which the phases of adjacent linear motor coils 106-1 differ by 90 degrees from each other. The multiple linear motor coils 106-1 may be fixed to a coil support plate 106-2 and fixed to a coil base 106-4 via a support column 106-3. The coil base 106-4 may be fixed to a stage plate 692, or it may be slidably supported by the stage plate 692 in the direction of the coil alignment. In the configuration in which the coil base 106-4 is slidably supported, the reaction of acceleration can be absorbed. The two linear motor magnets 106-5 may each be a four-pole magnet unit, and they may be arranged to sandwich the linear motor coil 106-1 from above and below with an air gap between them.

[0027] A yoke 106-6 may be positioned behind each linear motor magnet 106-5. A spacer 106-7 may be used to maintain a gap between two linear motor magnets 106-5 to counteract attractive forces. The structure consisting of the linear motor magnets 106-5, yoke 106-6, and spacer 106-7 may be fixed to an X-foot 102-2 or a Y-foot 103-2 via an arm 106-8. This structure can provide thrust in the X-axis direction and Y-axis direction to an integrated structure of an X-beam and two X-foots, or a integrated structure of a Y-beam and two Y-foots. In this configuration, force can be continuously generated by passing a position-dependent sinusoidal current through the coil of the two-phase coil facing the magnet.

[0028] Figure 7 illustrates a shot layout diagram, which is an arrangement of multiple shot regions on a wafer 700. Shot regions 701 with sizes Sx and Sy in the X-axis direction and Y-axis direction, respectively, may be arranged on the wafer 700. Multiple shot regions 701 are scanned and exposed, for example, along a step-scan trajectory. During scan exposure, the micro-movement stage 101-1 can be driven to scan in the Y-axis direction in synchronization with the reticle stage by a scanning amount equal to 1 / projection magnification of the reticle stage's scanning amount. After scan exposure is completed, the micro-movement stage 101-1 can make a U-turn in the Y-axis direction while stepping in the X-axis direction to scan and expose the next shot region. By using an electromagnet to accelerate the micro-movement stage 101-1 and a linear motor for position control, high-precision position control and low heat generation can be achieved simultaneously.

[0029] When accelerating the micro-movement stage 101-1, a moment may act on it. If the micro-movement ZLM 101-6 is operated to counteract this moment, the heat generated from the ZLM 101-6 may increase. This heat generation can cause deformation of the micro-movement stage 101-1, and this deformation can lead to a decrease in overlay accuracy.

[0030] To suppress heat generation from the micro-movement ZLM101-6, it is effective to reduce the moment acting on the micro-movement stage 101-1 when accelerating it. To reduce the moment acting on the micro-movement stage 101-1 when accelerating it, it is effective to reduce the distance between the micro-movement XLM101-4, micro-movement YLM101-5, and micro-movement ZLM101-6 and the center of gravity of the micro-movement stage 101-1. To achieve this, it is advantageous to reduce the length in the Z-axis direction of the movable core of the micro-movement electromagnet 101-3 on the micro-movement base 101-2.

[0031] Figures 8, 9, and 10 illustrate the configuration of a micro-movement electromagnet 101-3 incorporated into an exposure apparatus or wafer stage apparatus 500 of the first embodiment. The micro-movement electromagnet 101-3 of the first embodiment has a structure advantageous for reducing the moment acting on the micro-movement stage 101-1 when accelerating the micro-movement stage 101-1. The micro-movement electromagnet 101-3 may include a fixed core (first member) SC, a support member 101-30 that supports the fixed core SC, a movable core (second member) MC, a support member 101-31 that supports the movable core MC, and a coil 101-36. The support member 101-30 fixes the fixed core SC to the micro-movement base 101-2 as a coarse-movement stage, and the support member 101-31 fixes the movable core MC to the micro-movement stage 101-1. The coil 101-36 is wound around the fixed core SC. The central axis of coil 101-36 may be parallel to the XY plane (the plane on which the fine-adjustment base 101-2, acting as a coarse-adjustment stage, moves).

[0032] In the examples shown in Figures 8, 9, and 10, four support members 101-30 are fixed on the micro-movement base 101-2, a fixed core SC is placed on each of them, and a coil 101-36 may be wound around each fixed core SC. The fixed core SC and the movable core MC face each other with a small gap in between. Preferably, the dimension Hi of the movable core MC in the Z-axis direction (the direction perpendicular to the XY plane on which the micro-movement base 101-2 moves as a coarse-movement stage) is smaller than the dimension He of the fixed core SC in the Z-axis direction. In other words, it is preferable to reduce the length of the movable core MC in the Z-axis direction. This is effective in reducing the moment acting on the micro-movement stage 101-1 when accelerating the micro-movement stage 101-1.

[0033] A preferred configuration and arrangement of the fixed core SC and the movable core MC will be described with reference to Figure 11. The fixed core SC, which is fixed to the fine-movement base 101-2 as a coarse-movement stage and around which the coil 101-36 is wound, has a first end face E1. The movable core MC, which is fixed to the fine-movement stage 101-1, has a second end face E2 that faces the first end face E1 through a gap.

[0034] figure11 In this definition, d1 is the first distance from the wafer (substrate) 700 held by the micro-movement stage 101-1 on the first end face E1 to the furthest point. d2 is the second distance from the wafer 700 held by the micro-movement stage 101-1 on the second end face E2 to the furthest point. In this definition, it is preferable that the maximum value of the difference (d1-d2) obtained by subtracting d2 from d1 is greater than a positive predetermined value PV.

[0035] The micro-movement ZLM (first micro-movement actuator) 101-6 may be configured and controlled to drive the micro-movement stage 101-1 such that the difference (d1-d2) is maintained in a range of 0 or greater. The predetermined value PV may be understood as the stroke required for the micro-movement ZLM (first micro-movement actuator) 101-6.

[0036] In one example, the predetermined value PV is the difference dwu between the maximum thickness of the wafer (substrate) that can be handled and the standard thickness of the substrate. The standard thickness of the substrate is the distance between the chuck surface of the micro-adjustment stage 101-1 and the image plane FP of the projection optical system 687, when the chuck surface of the micro-adjustment stage 101-1 is positioned at a reference height (reference position in the Z-axis direction). The chuck surface of the micro-adjustment stage 101-1 is the surface defined by the tips of the multiple pins that support the wafer, if the chuck holding the wafer is a pin chuck. The chuck surface of the micro-adjustment stage 101-1 may also be understood as the bottom surface of the wafer or the side surface of the micro-adjustment stage 101-1.

[0037] As another example, a calibration mark may be provided on the micro-adjustment stage 101-1, and there may be a height difference hm between the surface of a substrate with a standard substrate thickness and the surface of the calibration mark. In such a case, the predetermined value PV may be the sum of the difference dwu between the maximum thickness of the substrate that can be handled and the standard substrate thickness, and the height difference hm.

[0038] In another example, the wafer stage device 500 may not have a pin unit for wafer transfer, and instead employ a configuration in which a micro-movement stage 101-1 is raised and lowered by a micro-movement ZLM (first micro-movement actuator) 101-6 for wafer transfer. In such a case, the predetermined value PV may be the sum of the difference dwu between the maximum thickness of the substrate that can be handled and the standard substrate thickness, the height difference hm, and the amount of drive hu of the micro-movement stage 101-1 for substrate transfer.

[0039] To reduce the weight of the movable core MC, it is preferable that the dimension of the second end face E2 in the direction perpendicular to the XY plane (e.g., Hi) is smaller than the dimension of the first end face E1 in the direction perpendicular to the XY plane (e.g., He). Reducing the weight of the movable core MC serves to reduce the moment acting on the micro-movement stage 101-1 during acceleration of the micro-movement stage 101-1.

[0040] Figures 12, 13, and 14 illustrate the configuration of a micro-movement electromagnet 101-3 incorporated into an exposure apparatus or wafer stage apparatus 500 of a second embodiment. Matters not mentioned as being in the second embodiment may follow those of the first embodiment. The micro-movement electromagnet 101-3 of the second embodiment has a structure that is more advantageous for reducing the moment acting on the micro-movement stage 101-1 when accelerating the micro-movement stage 101-1. The micro-movement electromagnet 101-3 may include a fixed core (first member) SC, a support member 101-30 that supports the fixed core SC, a movable core (second member) MC, a support member 101-31 that supports the movable core MC, and a coil 101-36. The support member 101-30 fixes the fixed core SC to the micro-movement base 101-2 as a coarse-movement stage, and the support member 101-31 fixes the movable core MC to the micro-movement stage 101-1. The coil 101-36 is wound around a fixed core SC. The central axis of the coil 101-36 may be positioned at an angle perpendicular to the XY plane (the plane on which the fine-movement base 101-2, acting as a coarse-movement stage, moves). Such a configuration is advantageous for reducing the height of the structure consisting of the fixed core SC and the coil 101-36, which is effective for reducing the Z-axis dimension of the movable core MC. In a cross-section perpendicular to the XY plane and parallel to the central axis of the coil 101-36, the fixed core SC may include an L-shaped portion. The fine-movement base 101-2 may have an opening, and a portion of the fine-movement electromagnet 101a-3 may be positioned within the opening.

[0041] Here, the moment acting on the micro-movement stage 101-1 will be explained with reference to Figure 15. When the micro-movement stage device 101 is modeled as shown in Figure 15, the moment M acting on the micro-movement stage 101-1 when the micro-movement stage 101-1 of mass m is accelerated at acceleration a is M = m·a·(hg+hu+he). hg is the distance in the Z-axis direction between the center of gravity G of the structure consisting of the micro-movement stage 101-1 and the components that move with the micro-movement stage 101-1 (movable iron core MC and support member 101-31, etc.) and the lower surface of the micro-movement stage 101-1 (the surface on the micro-movement base 101-2 side). hu is the distance in the Z-axis direction between the lower surface of the micro-movement stage 101-1 and the upper end of the micro-movement electromagnet 101-3 (the end on the micro-movement stage 101-1 side). he is the distance in the Z-axis direction between the upper end of the fixed iron core SC and the point of application of the micro-movement electromagnet 101-3. Such moments can be canceled out by the micro-movement ZLM101-6. However, operating the micro-movement ZLM101-6 to cancel out the moments generates heat, which can deform the micro-movement stage 101-1 and consequently reduce the overlay accuracy. Therefore, as mentioned above, it is important to minimize the moments generated when accelerating the micro-movement stage 101-1.

[0042] Furthermore, deformation of the micro-movement stage 101-1 can also be caused by the heat generated by the micro-movement electromagnet 101-3. The heat generated by the micro-movement electromagnet 101-3 can be caused by eddy currents in the magnetic circuit. Figure 31 schematically shows the configuration of a fixed core SC having a three-dimensional structure. In the example in Figure 31, the fixed core SC is composed of a laminate of multiple electromagnetic steel sheets, and the lamination method is in the Z-axis direction. Each electromagnetic steel sheet is covered with an insulating film. In Figure 31, the direction of magnetic flux in the magnetic circuit is indicated by black arrows, and the magnetic flux flows through a three-dimensional path. Magnetic flux flowing in the Z-axis direction is indicated by thick black arrows. Since the direction of the thick black arrows is parallel to the normal direction of the electromagnetic steel sheets, eddy currents generated by changes in current flow along the surface of the electromagnetic steel sheets, and there is nothing to suppress them. Therefore, large eddy currents can be generated, as shown by the thick white arrows. As a result, the fixed iron core SC generates heat, which is transferred to the micro-movement stage 101-1, causing deformation of the micro-movement stage 101-1 and potentially reducing the overlay accuracy. Furthermore, the magnetic flux in the Z-axis direction, indicated by the thick black arrow, is parallel to the normal direction of the electrical steel sheet, resulting in high magnetic resistance, a decrease in magnetic flux value, and a reduction in attractive force, which can be detrimental.

[0043] The following describes an improved example of the micro-movement electromagnet 101-3 incorporated into the exposure apparatus or wafer stage apparatus 500 of the second embodiment. Matters not mentioned herein may follow the improved example of the first embodiment. Figures 16 and 17 illustrate the configuration of the improved example of the micro-movement electromagnet 101-3 of the second embodiment. Figure 17 also illustrates the configuration of the micro-movement electromagnet 101-3 with the micro-movement base 101-2 removed.

[0044] In this improved example, four openings 301-21 are provided in the micro-movement base 101-2, and a portion of each micro-movement electromagnet 101-3 may be placed in the corresponding opening 301-21. A portion of each of the four micro-movement electromagnets 101-3 may be placed below the micro-movement base 101-2. Each micro-movement electromagnet 101-3 may be supported by the micro-movement base 101-2 via a support member 301-30. Such a configuration is advantageous for reducing the height of the micro-movement electromagnets 101-3 on the micro-movement base 101-2 and for reducing the dimensions of the micro-movement electromagnets 101-3 in the XY direction.

[0045] The micro-movement electromagnet 101-3 may include a fixed core (first member) SC, a support member 301-30 supporting the fixed core SC, a movable core (second member) MC, a support member 101-31 supporting the movable core MC, and a coil 301-36. The fixed core (first member) SC may include a first element 301-32, a second element 301-33, a third element 301-34, and a fourth element 301-35. The movable core (second member) MC may include element 101-38, but may also include one or more other elements in addition to element 101-38. The fixed core (first member) SC has a first end face E1, and the movable core (second member) MC may have a second end face E2 facing the first end face E1 with a gap between them. In this example, the first end face E1 is provided on the second element 301-33, the third element 301-34, and the fourth element 301-35, respectively, and the second end face E2 is provided on element 101-38.

[0046] The fixed core (first member) SC may be composed of a laminate of multiple electromagnetic steel sheets. Each of the multiple electromagnetic steel sheets may be coated with an insulating film. In other words, each of the first elements 301-32, second elements 301-33, third elements 301-34, and fourth elements 301-35 constituting the fixed core (first member) SC may be composed of a laminate of multiple electromagnetic steel sheets. The movable core (second member) MC may be composed of a laminate of multiple electromagnetic steel sheets. In other words, at least one element 101-38 constituting the movable core (second member) MC may be composed of a laminate of multiple electromagnetic steel sheets. Each of the multiple electromagnetic steel sheets may be coated with an insulating film.

[0047] A magnetic circuit comprising a fixed core (first member) SC, a movable core (second member) MC, and a gap (space between the first end face E1 and the second end face E2) may include at least one transition section CP in which the lamination direction in a laminate of multiple electromagnetic steel sheets changes at a right angle. The transition section CP may include a contact portion between a first portion (e.g., first elements 301-32) whose lamination direction is a first direction (e.g., the Y-axis direction) and a second portion (e.g., third elements 301-34) whose lamination direction is a second direction perpendicular to the first direction (e.g., the X-axis direction). The transition section CP may include a portion that brings the first portion (e.g., first elements 301-32) whose lamination direction is a first direction and the second portion (e.g., third elements 301-34) whose lamination direction is a second direction perpendicular to the first direction face each other via a solid member. The solid member may be, for example, an insulating film coating each of the multiple electromagnetic steel sheets.

[0048] In the examples of Figures 16 and 17, the change section CP is provided on the fixed core (first member) SC. Also in the examples of Figures 16 and 17, the change section CP includes a portion where the fixed core (first member) SC and the movable core (second member) MC face each other with a gap in between. The latter configuration may be understood as a configuration in which the first part of the first and second parts constituting the change section CP is provided on the fixed core (first member) SC and the second part is provided on the movable core (second member) MC. The change section CP may be provided additionally to the movable core (second member) MC, or it may be provided only on the movable core (second member) MC. In the examples of Figures 16 and 17, the second elements 301-33, the third elements 301-34 and the fourth element 301-3 have an L-shape, and the first element 301-32 has a rectangular parallelepiped shape.

[0049] Figure 18 illustrates the configuration of another improved example of the micro-movement electromagnet 101-3 of the second embodiment. The micro-movement electromagnet 101-3 may include a fixed core (first member) SC, a support member 201a-30 supporting the fixed core SC, a movable core (second member) MC, a support member 101-31 supporting the movable core MC, and a coil 201a-36. The fixed core (first member) SC may include a first element 201a-32, a second element 201a-33, a third element 201a-34, and a fourth element 201a-35. The movable core (second member) MC may include element 101-38, but may also include one or more other elements in addition to element 101-38. The fixed core (first member) SC has a first end face E1, and the movable core (second member) MC may have a second end face E2 that faces the first end face E1 with a gap between them. In this example, the first end face E1 is provided on the second element 201a-33, the third element 201a-34, and the fourth element 201a-35, respectively, and the second end face E2 is provided on element 101-38. In the improved example in Figure 18, the first element 201a-32 has an E-shape, and the coil 201a-36 is wound around the central teeth of the first element 201a-32. Also in the improved example in Figure 18, the second element 201a-33, the third element 201a-34, and the fourth element 201a-35 have a rectangular parallelepiped shape.

[0050] The assembly or manufacturing method of the micro-electric electromagnet 101-3 of another improved example shown in Figure 24 will be described below with reference to Figures 24 to 28. Figure 24 shows the micro-electric electromagnet 101-3 of the improved example shown in Figure 18 in a disassembled state. The first element 201a-32 and the support member 201a-30 can be joined by adhesive, clamps, fittings, etc. Also, the coil 201a-36 and the coil base 201a-42 can be joined by adhesive, etc. Furthermore, the second element 201b-33, the third element 201b-34 and the fourth element 201b-35 can be joined via the tip component spacer 201a-40 by adhesive, clamps, fittings, etc.

[0051] As illustrated in Figure 25, the first element 201a-32 is inserted into the opening 201a-21 of the micro-adjustment base 101-2, and the combination of the first element 201a-32 and the support member 201a-30 can be positioned on the micro-adjustment base 101-2. The support member 201a-30 can then be fixed to the micro-adjustment base 101-2. The support member 201a-30 can be fixed to the micro-adjustment base 101-2 by means of, for example, screw fastening, adhesive, clamping, fitting, etc.

[0052] Next, as illustrated in Figure 26, the assembly of coil 201a-36 and coil base 201a-42 can be positioned on the fine adjustment base 101-2, and the coil base 201a-42 can be fixed to the fine adjustment base 101-2. The coil base 201a-42 can be fixed to the fine adjustment base 101-2 by means of, for example, screw fastening, adhesive, clamping, fitting, etc.

[0053] Next, as illustrated in Figure 27, the tip component base 201a-41 can be fixed to the fine adjustment base 101-2 by, for example, screw fastening, adhesive, clamping, fitting, etc.

[0054] Next, as illustrated in Figure 28, the second element 201b-33, the third element 201b-34, the fourth element 201b-35, and the combined body of the second element 201b-33, the third element 201b-34, and the fourth element 201b-35 can be fixed to the end component base 201a-41. This can be done by fixing the end component spacer 201a-40 to the end component base 201a-41 by screw fastening, adhesive, clamping, fitting, etc.

[0055] The replacement of coil 201a-36 can be performed by following the reverse procedure described above to return to the state shown in Figure 25, fixing the new coil 201a-36 to the fine adjustment base 101-2 as illustrated in Figure 21, and then following the procedure illustrated in Figures 27 and 28.

[0056] When forming a fixed iron core SC by joining multiple elements, there is a concern that minute relative displacement may occur between the two elements along the interface at the boundary between two elements (for example, the boundary between the second element 201a-33 and the first element 201a-32), potentially generating particles. To address this, a coating to prevent particle generation may be applied to the interface, a collection pan may be provided near the interface, or a collection magnet may be provided near the interface. Furthermore, when fixing the tip component spacer 201a-40 to the tip component base 201a-41, a thin spacer may be inserted between the two to maintain a non-contact state between the first element 201a-32 and the second element 201a-33, the third element 201a-34, and the fourth element 201a-35.

[0057] The exposure apparatus and micro-movement electromagnet 101-3 of the third embodiment will be described below. Matters not mentioned as belonging to the third embodiment may follow those of the first or second embodiment. Figure 19 illustrates the configuration of the micro-movement electromagnet 101-3 of the third embodiment. The micro-movement electromagnet 101-3 may include a fixed core (first member) SC, a support member 301a-30 supporting the fixed core SC, a movable core (second member) MC, a support member 301a-31 supporting the movable core MC, and a coil 301a-36. The fixed core (first member) SC may include a first element 301a-32, a second element 301a-37, a third element 301a-33, a fourth element 301a-34, and a fifth element 301a-35. The movable core (second member) MC may include elements 301a-38, but may also include one or more other elements in addition to elements 301a-38. The fixed core (first member) SC has a first end face E1, and the movable core (second member) MC may have a second end face E2 facing the first end face E1 through a gap. In this example, the first end face E1 is provided on the third element 301a-33, the fourth element 301a-34, and the fifth element 301a-35, and the second end face E2 is provided on element 301a-38.

[0058] The fixed core (first member) SC may be composed of a laminate of multiple electromagnetic steel sheets. Each of these electromagnetic steel sheets may be covered with an insulating film. In other words, the third element 301a-33 and the fourth element 301a-34, and the fifth element 301a-35, which constitute part of the fixed core (first member) SC, may be composed of a laminated core made of multiple electromagnetic steel sheets. Furthermore, the first element 301a-32 and the second element 301a-37, which constitute other parts of the fixed core (first member) SC, may be composed of a wound core that can be formed by winding electromagnetic steel sheets. When used as a component of the fixed core (first member) SC, the wound core has a form of structure in which multiple electromagnetic steel sheets are laminated. The movable core (second member) MC may be composed of a laminated core made of multiple electromagnetic steel sheets. In other respects, element 301a-38, which is at least one element constituting the movable core (second member) MC, may be composed of a laminate of multiple electrical steel sheets. Each of these multiple electrical steel sheets may be covered with an insulating film.

[0059] The magnetic circuit, composed of a fixed core (first member) SC, a movable core (second member) MC, and a gap (space between the first end face E1 and the second end face E2), may include transition sections CP and CP' where the lamination direction in a laminate of multiple electromagnetic steel sheets changes at a right angle. The transition section CP may include a contact portion between a first portion (e.g., fifth element 301a-38) where the lamination direction is a first direction (e.g., the Z-axis direction) and a second portion (e.g., second element 301a-37) where the lamination direction is a second direction perpendicular to the first direction (e.g., the X-axis direction). The transition section CP may include a portion that brings the first portion (e.g., fifth element 301a-38) where the lamination direction is a first direction and the second portion (e.g., second element 301a-37) where the lamination direction is a second direction perpendicular to the first direction face each other via a solid member. The solid member may be, for example, an insulating film covering each of the multiple electromagnetic steel sheets. The transition section CP' includes a portion in which the lamination direction gradually changes from a first direction (e.g., the X-axis direction) to a second direction perpendicular to the first direction (e.g., the Z-axis direction). The transition section CP', which includes the portion in which the lamination direction gradually changes, may be part of the wound core. The fixed core (first member) SC includes a first portion P1 in which the lamination direction is the first direction (e.g., the X-axis direction) and a second portion P2 in which the lamination direction is the second direction (e.g., the Z-axis direction), with the lamination direction gradually changing between the first portion P1 and the second portion P2. The transition section CP' is the portion between the first portion P1 and the second portion P2.

[0060] In the example shown in Figure 19, the change sections CP and CP' are provided on the fixed core (first member) SC. At least one of the change sections CP and CP' may be additionally provided on the movable core (second member) MC, or it may be provided only on the movable core (second member) MC. One of the fixed core (first member) SC and the movable core (second member) MC is composed of at least one laminated core, the other of the fixed core (first member) SC and the movable core (second member) MC is composed of a wound core, and the change section may be composed of a wound core.

[0061] The first element 301a-32, the second element 301a-37, the third element 301a-33, and the fourth element 301a-34 and the fifth element 301a-35 may be integrated using adhesive or by fastening with clamp components. In this example, the variable parts CP and CP' are provided on the fixed core (first member) SC, and the coil 301a-36 is wound around the fixed core (first member) SC. The coil 301a-36 may be wound around a portion of the fixed core (first member) SC different from the portion where the variable parts CP and CP' are located. By passing an electric current through the coil 301a-36, an attractive force is generated between the first end face E1 and the second end face E2. In the example shown in Figure 19, the first element 301a-32 and the second element 301a-37 have a U-shape, and the coil 301a-36 is wound around one tooth of the first element 301a-32 and one tooth of the second element 301a-37 that are integrated.

[0062] The variable sections CP and CP' are provided so that the magnetic flux passing through the magnetic circuit, which is composed of a fixed core (first member) SC, a movable core (second member) MC, and an air gap, does not flow through the multiple electromagnetic steel sheets constituting the fixed core SC and the movable core MC in the direction of their stacking. Alternatively, the variable sections CP and CP' may be provided so that the magnetic flux passing through the fixed core SC and the movable core MC flows along the plane direction of each electromagnetic steel sheet. Alternatively, the variable sections CP and CP' may be provided so that the magnetic resistance of the magnetic circuit, which is composed of a fixed core (first member) SC, a movable core (second member) MC, and an air gap, is smaller than when the variable sections CP and CP' are not provided. Alternatively, the variable sections CP and CP' may be provided so that the eddy currents generated in the magnetic circuit, which is composed of a fixed core (first member) SC, a movable core (second member) MC, and an air gap, are smaller than when the variable sections CP and CP' are not provided.

[0063] In the example shown in Figure 19, the stacking direction (Z-axis direction) of the third element 301a-33, the fourth element 301a-34, and the fifth element 301a-35, which have the first end face E1, is the same as the stacking direction (Z-axis direction) of the element 301a-38, which has the second end face E2. This can contribute to reducing magnetic resistance near the air gap and increasing magnetic flux.

[0064] Instead of the configuration example in Figure 19, the stacking direction of the third element 301a-33, the fourth element 301a-34, and the fifth element 301a-35 may be in the X-axis direction. Such a configuration may contribute to reducing the magnetic resistance and increasing the magnetic flux near the boundary between the third element 301a-33, the fourth element 301a-34, and the fifth element 301a-35 and the first element 301a-32 and the second element 301a-37.

[0065] Figure 20 illustrates an exemplary configuration of a modified micro-movement electromagnet 101-3 of the third embodiment. Parts not mentioned as modifications may follow the configuration of the third embodiment shown in Figure 19. The micro-movement electromagnet 101-3 may include a fixed core (first member) SC, support members 301b-30 supporting the fixed core SC, a movable core (second member) MC, support members 301b-31 supporting the movable core MC, and a coil 301b-36. The fixed core (first member) SC may include a first element 301b-32 and a second element 301b-33. The movable core (second member) MC may include a third element 301b-37 and a fourth element 301b-38. The fixed core (first member) SC has a first end face E1, and the movable core (second member) MC may have a second end face E2 that faces the first end face E1 across a gap. In this example, the first end face E1 is provided on the first element 301b-32 and the second element 301b-33, and the second end face E2 is provided on the third element 301b-37 and the fourth element 301b-38.

[0066] The fixed core (first member) SC may be composed of a laminate of multiple electromagnetic steel sheets. Each of these electromagnetic steel sheets may be coated with an insulating film. In other words, the first elements 301b-32 and 2 elements 301b-33, which constitute part of the fixed core (first member) SC, may be composed of a laminate of multiple electromagnetic steel sheets. When used as a component of the fixed core (first member) SC, the wound core also has a structure in which multiple electromagnetic steel sheets are laminated. The movable core (second member) MC may be composed of a laminate of multiple electromagnetic steel sheets. In other words, the third elements 301b-37 and 4th elements 301b-38, which constitute the movable core (second member) MC, may be composed of a laminate of multiple electromagnetic steel sheets. Each of these electromagnetic steel sheets may be coated with an insulating film.

[0067] The magnetic circuit, composed of a fixed core (first member) SC, a movable core (second member) MC, and a gap (space between the first end face E1 and the second end face E2), may include transition sections CP' and CP'' in which the lamination direction of the laminated electromagnetic steel sheets changes at a right angle. In this example, the transition section CP' is provided in the fixed core (first member) SC, and the transition section CP'' is provided in the movable core (second member) MC.

[0068] The transition section CP' includes a portion in which the lamination direction gradually changes from a first direction (e.g., the X-axis direction) to a second direction perpendicular to the first direction (e.g., the Z-axis direction). The transition section CP', which includes the portion in which the lamination direction gradually changes, may be part of the wound core. The fixed core (first member) SC includes a first portion P1 in which the lamination direction is the first direction (e.g., the X-axis direction) and a second portion P2 in which the lamination direction is the second direction (e.g., the Z-axis direction), with the lamination direction gradually changing between the first portion P1 and the second portion P2. The transition section CP' is the portion between the first portion P1 and the second portion P2.

[0069] The movable core (second member) MC includes a third portion P3 whose stacking direction is a first direction (e.g., the X-axis direction) and a fourth portion P4 whose stacking direction is a second direction (e.g., the Y-axis direction), with the stacking direction gradually changing between the third portion P3 and the fourth portion P4. The change portion CP is the portion between the third portion P3 and the fourth portion P4.

[0070] By passing an electric current through coil 301b-36, an attractive force is generated between the first end face E1 and the second end face E2. In the example in Figure 20, the first element 301b-32 and the second element 301b-33 have a U-shape, and coil 301b-36 is wound around a portion where one tooth of the first element 301a-32 and one tooth of the second element 301a-37 are integrated.

[0071] The variable sections CP' and CP'' are provided so that the magnetic flux passing through the magnetic circuit, which is composed of a fixed core (first member) SC, a movable core (second member) MC, and an air gap, does not flow through the multiple electromagnetic steel sheets constituting the fixed core SC and the movable core MC in the direction of their stacking. Alternatively, the variable sections CP' and CP'' may be provided so that the magnetic flux passing through the fixed core SC and the movable core MC flows along the plane direction of each electromagnetic steel sheet. Alternatively, the variable sections CP' and CP'' may be provided so that the magnetic resistance of the magnetic circuit, which is composed of a fixed core (first member) SC, a movable core (second member) MC, and an air gap, is smaller than when the variable sections CP' and CP'' are not provided. Alternatively, the variable sections CP' and CP'' may be provided so that the eddy currents generated in the magnetic circuit, which is composed of a fixed core (first member) SC, a movable core (second member) MC, and an air gap, are smaller than when the variable sections CP' and CP'' are not provided.

[0072] In the example in Figure 20, the stacking direction (X-axis direction) of the first element 301b-32 and the second element 301b-33 at the first end face E1 is the same as the stacking direction (X-axis direction) of the third element 301b-37 and the fourth element 301b-38 at the second end face E2. This can contribute to reducing magnetic resistance near the air gap and increasing magnetic flux. Also, in the example in Figure 23, in the magnetic circuit composed of a fixed core (first member) SC, a movable core (second member) MC, and an air gap, the stacking direction does not change abruptly, which is advantageous for reducing magnetic resistance and increasing magnetic flux.

[0073] Figure 21 illustrates the structure of support members 301b-31 that support the movable core MC. The support members 301b-31 may have a star wheel shape to support the movable core MC, which may be composed of a wound core.

[0074] Here, we will explain the wound core with reference to Figure 29. Figure 29(a) shows an example of a wound core. Figure 29(b) shows a wound core obtained by cutting the wound core exemplified in Figure 29(a) with a wire cutter or the like; such a wound core is also called a cut core. A wound core can be manufactured by winding hoop material around a core (not shown). As exemplified in Figure 30, hoop material can be manufactured with a slitter exemplified in Figure 25. The original coil roll is fed in the direction of sheet feeding, and the hoop material is obtained by cutting it to the desired width with a slitter that includes circular blades installed along the way. This width is determined by the spacing of the circular blades of the slitter.

[0075] As illustrated in Figure 29(a), a wound core is a laminate of multiple electrical steel sheets, and a single wound core has multiple lamination directions. In other words, a wound core can be used as a component constituting the aforementioned change section. The lamination direction is the direction that penetrates the point of interest in the wound core perpendicular to the electrical steel sheets. The width direction is the direction determined by the slitter and is also the axial direction. The axial direction is the direction parallel to any point on the widest surface of each electrical steel sheet.

[0076] In one aspect, the electromagnetic device of the present invention may comprise a plurality of core members composed of stacked cores or wound cores, and a coil for generating magnetic flux in the core members. Here, the stacking direction of one stacked core and the width direction of one wound core may be perpendicular, or the stacking directions of one stacked core and another stacked core may be perpendicular, or the width directions of one wound core and another wound core may be perpendicular.

[0077] The control system of the wafer stage apparatus 500 will be described below. Figure 22 shows an illustrative configuration of the control system of the wafer stage apparatus 500. The moving target provisioning unit 5101 provides a moving target. The position profile generator 5102 generates a position profile showing the relationship between time and the position of the micro-movement stage 101-1 at that time, based on the moving target provided by the moving target provisioning unit 5101. The position profile generator 5102 also generates a target position according to the generated position profile. The acceleration profile generator 5103 generates an acceleration profile showing the relationship between time and the acceleration of the micro-movement stage 101-1 at that time, based on the moving target provided by the moving target provisioning unit 5101. The acceleration profile generator 5103 also generates a target acceleration according to the generated acceleration profile. Figure 23 illustrates the position profile generated by the position profile generator 5102 and the acceleration profile generated by the acceleration profile generator 5103.

[0078] The micro-position sensor 5156 measures the position of the micro-position stage 101-1. The micro-position control system 5121 generates a manipulated variable using PID calculation or the like, according to the deviation between the target position given by the position profile generated by the position profile generator 5102 and the current position given by the micro-position sensor 5156. The current amplifier 5122 supplies current to the micro-XLM 101-4 and micro-YLM 101-5 according to the manipulated variable generated by the micro-position control system 5121. This allows the micro-position stage 101-1 to be feedback controlled.

[0079] The coarse position sensor 5135 measures the position of the fine position base 101-2. The coarse position control system 5133 generates a manipulated variable using PID calculations or the like, according to the deviation between the target position given by the position profile generated by the position profile generator 5102 and the current position given by the coarse position sensor 5135. The current amplifier 5131 supplies a current to the coarse linear motor 106 corresponding to the manipulated variable generated by the coarse position control system 5133 and the target acceleration given by the acceleration profile generator 5103. This allows the fine position base 101-2 to be controlled by feedback and feedforward.

[0080] The target acceleration generated by the acceleration profile generator 5103 is also supplied to the electromagnet current control system 5515, which controls the micro-movement electromagnets 101-3 according to the target acceleration. When the micro-movement stage 101-1 (micro-movement stage device 101) is accelerating, force is mainly applied to the micro-movement stage 101-1 by the micro-movement electromagnets 101-3. The micro-movement XLM 101-4 and micro-movement YLM 101-5 can be controlled to generate thrust to reduce slight positional deviations between the target position and the measured current position. This can reduce the heat generated by the micro-movement XLM 101-4 and micro-movement YLM 101-5.

[0081] The coarse-motion position control system 5133 moves the position of the fine-motion base 101-2 according to the position profile generated by the position profile generator 5102. The fine-motion electromagnet 101-3 is advantageous because it generates a large attractive force with very little heat generation. However, the air gap between the first end face E1 and the second end face E2 of the fine-motion electromagnet 101-3 must be maintained. In other words, in order for the fine-motion electromagnet 101-3 to continuously apply the desired force to the fine-motion stage 101-1, it is necessary to move the stator (fixed iron core and coil) of the fine-motion electromagnet 101-3 in accordance with the movement of the fine-motion stage 101-1 to maintain the air gap. Furthermore, the heat generated by the fine-motion ZLM can be reduced by reducing the height of the fine-motion electromagnet 101-3 on the fine-motion base 101-2. As a result, high-precision position control of the fine-motion stage 101-1, reduced heat generation, and reduced overlay error can be achieved.

[0082] This is achieved by the coarse motion position control system 5133. The coarse motion position, that is, the position of the fine motion base 101-2, is measured by a coarse motion position sensor 5135, which is represented by an encoder, and the coarse motion linear motor 106 is driven by the coarse motion position control system 5133 based on the deviation between this position and the target position. As a result, both the position of the fine motion stage 101-1 (movable element of the fine motion electromagnet 101-3) and the position of the fine motion base 101-2 (stator of the fine motion electromagnet 101-3) are controlled based on the output of the position profile generator 5102, and the air gap is maintained. The fine motion position sensor 5156 that measures the position of the fine motion stage 101-1 may be replaced by a sensor that measures the relative position between the fine motion stage 101-1 and the fine motion base 101-2.

[0083] The disclosures herein include the following transfer apparatus and methods for manufacturing articles. (Item 1) A transfer device for transferring the pattern of the original plate onto a substrate, The system includes a coarse motion stage, a coarse motion actuator for driving the coarse motion stage along a predetermined plane, a fine motion stage for holding the substrate, a fine motion actuator for adjusting the position and orientation of the fine motion stage relative to the coarse motion stage, and an electromagnetic actuator for non-contact transmission of the thrust applied to the coarse motion stage by the coarse motion actuator to the fine motion stage. The electromagnetic actuator includes a fixed core fixed to the coarse movement stage and having a first end face, a coil wound around the fixed core, and a movable core fixed to the fine movement stage and having a second end face facing the first end face. The maximum difference obtained by subtracting the second distance from the position on the second end face that is furthest from the substrate held by the micro-movement stage, from the first distance on the first end face that is furthest from the substrate held by the micro-movement stage, is greater than a positive predetermined value. A transfer apparatus characterized by the following features. (Item 2) The micro-movement actuator drives the micro-movement stage such that the difference is maintained in a range of 0 or more. The transfer apparatus according to item 1, characterized in that it is a transfer device. (Item 3) The predetermined value is the difference between the maximum thickness of a substrate that can be handled and the standard substrate thickness. A transfer apparatus according to item 1 or 2, characterized in that it is a transfer device. (Item 4) The aforementioned fine-adjustment stage has a calibration mark, The predetermined value is the sum of the difference between the maximum thickness of a handleable substrate and the standard substrate thickness, and the height difference between the surface of the substrate having the standard substrate thickness and the surface of the calibration mark. A transfer apparatus according to item 1 or 2, characterized in that it is a transfer device. (Item 5) The aforementioned fine-adjustment stage has a calibration mark, The predetermined value is the sum of the difference between the maximum thickness of the substrate that can be handled and the standard substrate thickness, the height difference between the surface of the substrate having the standard substrate thickness and the surface of the calibration mark, and the amount of drive of the micro-movement stage for transferring the substrate. A transfer apparatus according to item 1 or 2, characterized in that it is a transfer device. (Item 6) The dimension of the second end face in a direction perpendicular to the plane is smaller than the dimension of the first end face in a direction perpendicular to the plane. A transfer apparatus according to item 1 or 2, characterized in that it is a transfer device. (Item 7) The central axis of the coil is parallel to the plane. A transfer apparatus according to any one of items 1 to 6, characterized in that it is a transfer apparatus. (Item 8) The central axis of the coil is positioned at an angle perpendicular to the plane. A transfer apparatus according to any one of items 1 to 6, characterized in that it is a transfer apparatus. (Item 9) The coarse stage has an opening, and a portion of the fixed core is positioned within the opening. The transfer apparatus according to item 8, characterized in that it is a transfer device. (Item 10) The fixed core and the movable core constitute a magnetic circuit, the magnetic circuit includes a laminate composed of a plurality of electromagnetic steel sheets, and the laminate includes a transition section in which the lamination direction of the plurality of electromagnetic steel sheets changes at a right angle. A transfer apparatus according to any one of items 1 to 9, characterized in that (Item 11) The modified portion includes a contact portion between a first portion whose stacking direction is a first direction and a second portion whose stacking direction is a second direction perpendicular to the first direction. The transfer apparatus according to item 10, characterized in that (Item 12) The modified portion includes a portion where a first portion whose stacking direction is a first direction and a second portion whose stacking direction is a second direction perpendicular to the first direction face each other via a solid member. The transfer apparatus according to item 10, characterized in that (Item 13) The aforementioned change section is provided in at least one of the fixed core and the movable core. The transfer apparatus according to item 10, characterized in that (Item 14) The modified portion includes a portion where a first portion whose stacking direction is a first direction and a second portion whose stacking direction is a second direction perpendicular to the first direction face each other with an air gap between them. The transfer apparatus according to item 10, characterized in that (Item 15) The first portion is provided on the fixed core, and the second portion is provided on the movable core. The transfer apparatus according to item 14, characterized in that (Item 16) Each of the fixed core and the movable core is composed of at least one stacked core. A transfer apparatus according to any one of items 10 to 15, characterized in that it is a transfer apparatus. (Item 17) At least one of the fixed core and the movable core is composed of a plurality of stacked cores. A transfer apparatus according to any one of items 10 to 15, characterized in that it is a transfer apparatus. (Item 18) The aforementioned multiple stacked iron cores are arranged in close proximity to each other and fixed by fixing members. A transfer apparatus as described in item 17, characterized by the features described herein. (Item 19) The aforementioned change portion includes a portion in which the stacking direction gradually changes from a first direction to a second direction perpendicular to the first direction. The transfer apparatus according to item 10, characterized in that (Item 20) The aforementioned change section is composed of a wound iron core. A transfer apparatus as described in item 11, characterized by the features described herein. (Item 21) One of the fixed core and the movable core includes at least one stacked core, The other of the fixed core and the movable core includes a wound core. The aforementioned change section is composed of the wound iron core. The transfer apparatus according to item 10, characterized in that (Item 22) Each of the fixed core and the movable core is composed of a wound core. The axial direction of the wound core constituting the fixed core and the axial direction of the wound core constituting the movable core are perpendicular to each other, The change section is composed of the winding core that constitutes the fixed core and the winding core that constitutes the movable core, The transfer apparatus according to item 10, characterized in that (Item 23) The aforementioned modification section is provided on the fixed iron core, and the coil is wound around the fixed iron core. The transfer apparatus according to item 10, characterized in that (Item 24) The coil is wound around a portion of the fixed iron core that is different from the portion where the variable section is located. A transfer apparatus according to item 23, characterized in that it is a transfer device. (Item 25) A transfer step of transferring the pattern of the master plate onto a substrate using a transfer apparatus described in any one of items 1 to 24, A step of obtaining an article from the substrate that has undergone the transfer step, A method for manufacturing articles, characterized by including the following:

[0084] The invention is not limited to the embodiments described above, and various modifications and changes are possible within the scope of the gist of the invention. [Explanation of symbols]

[0085] SC: Fixed core (first component), MC: Movable core (second component), 101-1: Fine adjustment stage, 101-2: Fine adjustment base, 101-36: Coil

Claims

1. A stage device for holding a substrate, The system includes a coarse motion stage, a coarse motion actuator for driving the coarse motion stage along a predetermined plane, a fine motion stage for holding the substrate, a fine motion actuator for adjusting the position and orientation of the fine motion stage relative to the coarse motion stage, and an electromagnetic actuator for non-contact transmission of the thrust applied to the coarse motion stage by the coarse motion actuator to the fine motion stage. The electromagnetic actuator includes a fixed core fixed to the coarse movement stage and having a first end face, a coil wound around the fixed core, and a movable core fixed to the fine movement stage and having a second end face facing the first end face. The first distance between the first end face, the position furthest from the substrate held by the micro-movement stage, and the substrate changes according to the movement of the micro-movement stage in a direction perpendicular to the predetermined plane. If the maximum difference obtained by subtracting the second distance between the first distance and the position on the second end face furthest from the substrate held by the micro-movement stage and the substrate is greater than a positive predetermined value, The predetermined value is the drive stroke of the micro-movement actuator in a direction perpendicular to the predetermined plane. A stage apparatus characterized by the following features.

2. The micro-movement actuator drives the micro-movement stage such that the difference is maintained in a range of 0 or more. The stage apparatus according to feature 1.

3. The predetermined value is the difference between the maximum thickness of a substrate that can be handled and the standard substrate thickness. The stage apparatus according to feature 1.

4. The aforementioned fine-adjustment stage has a calibration mark, The predetermined value is the sum of the difference between the maximum thickness of a handleable substrate and the standard substrate thickness, and the height difference between the surface of the substrate having the standard substrate thickness and the surface of the calibration mark. The stage apparatus according to feature 1.

5. The aforementioned fine-adjustment stage has a calibration mark, The predetermined value is the sum of the difference between the maximum thickness of the substrate that can be handled and the standard substrate thickness, the height difference between the surface of the substrate having the standard substrate thickness and the surface of the calibration mark, and the amount of drive of the micro-movement stage for transferring the substrate. The stage apparatus according to feature 1.

6. The dimension of the second end face in a direction perpendicular to the predetermined plane is smaller than the dimension of the first end face in a direction perpendicular to the predetermined plane. The stage apparatus according to feature 1.

7. The central axis of the coil is parallel to the predetermined plane. The stage apparatus according to feature 1.

8. The central axis of the coil is positioned at an angle perpendicular to the predetermined plane. The stage apparatus according to feature 1.

9. The coarse stage has an opening, and a portion of the fixed core is positioned within the opening. The stage apparatus according to feature 8.

10. The fixed core and the movable core constitute a magnetic circuit, the magnetic circuit includes a laminate composed of a plurality of electromagnetic steel sheets, and the laminate includes a transition section in which the lamination direction of the plurality of electromagnetic steel sheets changes at a right angle. The stage apparatus according to any one of claims 1 to 6.

11. The modified portion includes a contact portion between a first portion whose stacking direction is a first direction and a second portion whose stacking direction is a second direction perpendicular to the first direction. The stage apparatus according to feature 10.

12. The modified portion includes a portion where a first portion whose stacking direction is a first direction and a second portion whose stacking direction is a second direction perpendicular to the first direction face each other via a solid member. The stage apparatus according to feature 10.

13. The aforementioned change portion is provided in at least one of the fixed core and the movable core. The stage apparatus according to feature 10.

14. The modified portion includes a portion where a first portion whose stacking direction is a first direction and a second portion whose stacking direction is a second direction perpendicular to the first direction face each other with an air gap between them. The stage apparatus according to feature 10.

15. The first portion is provided on the fixed core, and the second portion is provided on the movable core. The stage apparatus according to feature 14.

16. Each of the fixed core and the movable core is composed of at least one stacked core. The stage apparatus according to feature 10.

17. At least one of the fixed core and the movable core is composed of a plurality of stacked cores. The stage apparatus according to feature 10.

18. The aforementioned multiple stacked iron cores are arranged in close proximity to each other and fixed by fixing members. The stage apparatus according to feature 17.

19. The aforementioned change portion includes a portion in which the stacking direction gradually changes from a first direction to a second direction perpendicular to the first direction. The stage apparatus according to feature 10.

20. The aforementioned change section is composed of a wound iron core. The stage apparatus according to feature 11.

21. One of the fixed core and the movable core includes at least one stacked core, The other of the fixed core and the movable core includes a wound core. The aforementioned change section is composed of the wound iron core. The stage apparatus according to feature 10.

22. Each of the fixed core and the movable core is composed of a wound core. The width direction of the wound core constituting the fixed core and the width direction of the wound core constituting the movable core are perpendicular to each other, The change section is composed of the winding core that constitutes the fixed core and the winding core that constitutes the movable core, The stage apparatus according to feature 10.

23. The aforementioned modification section is provided on the fixed iron core, and the coil is wound around the fixed iron core. The stage apparatus according to feature 10.

24. The coil is wound around a portion of the fixed iron core that is different from the portion where the variable section is located. The stage apparatus according to feature 23.

25. A transfer device for transferring the pattern of the original plate onto a substrate, Having the stage device described in claim 1, A transfer apparatus characterized by the following features.

26. A transfer step of transferring the pattern of the master plate to a substrate using the transfer apparatus described in claim 25, A step of obtaining an article from the substrate that has undergone the transfer step, A method for manufacturing articles, characterized by including the following:

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