Modeling system

Abstract

A modeling system according to the present invention comprises: a modeling apparatus which is capable of modeling a model by supplying a modeling material to a weld pool that is formed by irradiating the surface of an object with a modeling beam; and a control device which is capable of controlling the modeling apparatus. The control device controls the modeling apparatus such that: the irradiation position of the modeling beam periodically moves within a modeling unit region that is set on the surface of the object; and the modeling unit region moves on the surface of the object on the basis of path information that shows the movement locus of the modeling unit region. The control device changes, on the basis of the path information, the amount of rotation of the modeling unit region around the rotation axis that intersects with the surface of the object.

Description

Modeling System

[0001] The present invention relates to, for example, the technical field of a modeling system capable of modeling a modeled object.

[0002] An example of a modeling system for forming a modeled object is described in Patent Document 1. One of the technical challenges of such a modeling system is to appropriately form the modeled object.

[0003] US Patent Application Publication No. 2016 / 0311059

[0004] According to a first aspect, a shaping system is provided that includes a shaping device capable of irradiating a surface of an object with a shaping beam and supplying a shaping material to a molten pool formed on the object by the shaping beam to form a shaped object on the object, and a control device capable of controlling the shaping device, wherein the control device controls the shaping device so that the irradiation position of the shaping beam on the surface of the object moves periodically within a shaping unit area set on the surface of the object, and the shaping unit area moves on the surface of the object based on path information indicating the movement trajectory of the shaping unit area, and the control device changes the amount of rotation of the shaping unit area around a rotation axis that intersects the surface of the object based on the path information.

[0005] According to a second aspect, there is provided a modeling device including an irradiation optical system that irradiates a surface of an object with a modeling beam, and a position changing device that can change the positional relationship between the object and the irradiation optical system, and that can model a model on the object by supplying a modeling material to a molten pool formed on the object by the modeling beam, and a control device that can control the modeling device, wherein the irradiation optical system includes a deflection optical system that can move the irradiation position of the modeling beam on the surface of the object by deflecting the modeling beam, and the position changing device is able to move the irradiation position on the surface of the object by changing the positional relationship between the object and the irradiation optical system, and the control device controls the position changing device based on path information so that a model is formed on the object along a movement trajectory, and controls the deflection optical system so that the irradiation position moves periodically on the surface of the object along a scanning direction that intersects the movement trajectory, and the control device controls the deflection optical system to change the scanning direction around a rotation axis that intersects the surface of the object, based on the path information.

[0006] According to a third aspect, there is provided a modeling device including an irradiation optical system that irradiates a modeling beam onto the surface of an object, a position changing device that can change the positional relationship between the object and the irradiation optical system, and that can model a model on the object by supplying modeling material to a molten pool formed on the object by the modeling beam, and a control device that can control the modeling device, wherein the irradiation optical system includes a final optical system having an emission surface, and a deflection optical system that can deflect the modeling beam to move at least one of the emission position and emission angle at which the modeling beam is emitted from the final optical element, and the position changing device can move the irradiation position on the surface of the object by changing the positional relationship between the object and the irradiation optical system, and the control device controls the position changing device based on path information so that a model is formed on the object along a movement trajectory, and controls the deflection optical system to change the movement direction in which the injection position periodically moves on the emission surface based on the path information.

[0007] According to a fourth aspect, there is provided a modeling system comprising: an irradiation optical system that irradiates a surface of an object with a modeling beam; a position changing device that can change the positional relationship between the object and the irradiation optical system, and that can model a model on the object by supplying a modeling material to a molten pool formed on the object by the modeling beam; and a control device that can control the modeling device, wherein the irradiation optical system includes a deflection optical system that can move the irradiation position of the modeling beam by deflecting the modeling beam, and the position changing device is able to move the irradiation position by changing the positional relationship between the object and the irradiation optical system, and the control device controls the position changing device based on path information so that a model is formed on the object along a movement trajectory, and controls the deflection optical system so that the irradiation position moves periodically on the surface of the object along a scanning direction that intersects the movement trajectory, and the control device controls the position changing device based on path information so that the irradiation position moves along the movement trajectory, and controls the change in movement of the irradiation position in a direction that intersects the movement trajectory based on the path information.

[0008] According to a fifth aspect, there is provided a modeling system comprising: an irradiation optical system that irradiates a modeling beam onto the surface of an object; a position changing device that can change the injection position from which the modeling beam is injected of the final optical element of the irradiation optical system; a modeling device that can form a model on the object by supplying modeling material to a molten pool formed on the object by the modeling beam; and a control device that can control the modeling device, wherein the irradiation optical system includes a deflection optical system that can change the injection angle of the modeling beam; the position changing device that can move the irradiation position on the surface of the object by changing the positional relationship between the object and the irradiation optical system; and the control device controls the position changing device based on path information so that a model is formed on the object along a movement trajectory, and controls the periodic change of the injection angle based on the path information.

[0009] According to a sixth aspect, there is provided a method for forming a shape using a forming device capable of forming a shape on an object by irradiating a surface of the object with a forming beam and supplying a forming material to a molten pool formed on the object by the forming beam, the method including controlling the forming device so that the irradiation position of the forming beam on the surface of the object moves periodically within a forming unit area set on the surface of the object, and so that the forming unit area moves on the surface of the object based on path information indicating the movement trajectory of the forming unit area, and changing the amount of rotation of the forming unit area around a rotation axis that intersects the surface of the object based on the path information.

[0010] According to a seventh aspect, there is provided a method for forming a model using a modeling device that includes an irradiation optical system that irradiates a surface of an object with a modeling beam and a position changing device that can change the positional relationship between the object and the irradiation optical system, and that can form a model on the object by supplying a modeling material to a molten pool formed on the object by the modeling beam, wherein the irradiation optical system includes a deflection optical system that can move the irradiation position of the modeling beam on the surface of the object by deflecting the modeling beam, and the position changing device can move the irradiation position on the surface of the object by changing the positional relationship between the object and the irradiation optical system, and the modeling method includes controlling the position changing device based on path information so that the model is formed on the object along a movement trajectory, and controlling the deflection optical system so that the irradiation position moves periodically on the surface of the object along a scanning direction that intersects the movement trajectory, and controlling the deflection optical system to change the scanning direction around a rotation axis that intersects the surface of the object, based on the path information.

[0011] According to an eighth aspect, there is provided a method for forming a model using a modeling device that includes an irradiation optical system that irradiates a modeling beam onto a surface of an object and a position changing device that can change the positional relationship between the object and the irradiation optical system, and that can form a model on the object by supplying a modeling material to a molten pool formed on the object by the modeling beam, wherein the irradiation optical system includes a final optical system having an emission surface and a deflection optical system that can move at least one of the emission position and emission angle at which the modeling beam is emitted from the final optical element by deflecting the modeling beam, and the position changing device can move the irradiation position on the surface of the object by changing the positional relationship between the object and the irradiation optical system, and the modeling method includes controlling the position changing device so that a model is formed on the object along a movement trajectory based on path information, and controlling the deflection optical system to change the movement direction in which the emission position periodically moves on the emission surface based on the path information.

[0012] According to a ninth aspect, there is provided a method for manufacturing a model using a manufacturing device that includes an irradiation optical system that irradiates a surface of an object with a manufacturing beam and a position changing device that can change the positional relationship between the object and the irradiation optical system, and that can manufacture a model on the object by supplying a manufacturing material to a molten pool formed on the object by the manufacturing beam, wherein the irradiation optical system includes a deflection optical system that can move the irradiation position of the manufacturing beam by deflecting the manufacturing beam, and the position changing device changes the positional relationship between the object and the irradiation optical system to change the irradiation position. a position change device that can move the irradiation position in a direction that intersects with the movement trajectory based on path information, and the deflection optical system that can move the irradiation position periodically on the surface of the object along a movement trajectory, and the position change device that can move the irradiation position in a direction that intersects with the movement trajectory based on path information, and the deflection optical system that can move the irradiation position periodically on the surface of the object along a movement trajectory, and the position change device that can move the irradiation position in a direction that intersects with the movement trajectory based on path information, and the deflection optical system that can move the irradiation position periodically on the surface of the object along a movement trajectory.

[0013] According to a tenth aspect, there is provided a manufacturing method for manufacturing a model using a manufacturing device that includes an irradiation optical system that irradiates a modeling beam onto the surface of an object and a position changing device that can change the injection position from which the modeling beam is injected of the final optical element of the irradiation optical system, and that can manufacture a model on the object by supplying a modeling material to a molten pool formed on the object by the modeling beam, wherein the irradiation optical system includes a deflection optical system that can change the injection angle of the modeling beam, and the position changing device can move the irradiation position on the surface of the object by changing the positional relationship between the object and the irradiation optical system, and the manufacturing method includes controlling the position changing device so that the model is formed on the object along a movement trajectory based on path information, and controlling the periodic change of the injection angle based on the path information.

[0014] The functions and other advantages of the present invention will become apparent from the following detailed description of the preferred embodiments.

[0015] FIG. 1 is a cross-sectional view showing the configuration of a modeling system according to this embodiment. FIG. 2 is a block diagram showing the configuration of the modeling system according to this embodiment. FIG. 3 is a cross-sectional view showing the configuration of an irradiation optical system. FIG. 4 is a cross-sectional view showing modeling light emitted from a galvanometer mirror. FIG. 5(a) is a plan view showing the scanning trajectory of a target irradiation area within a modeling unit area, and FIG. 5(b) is a plan view showing the movement trajectory of the target irradiation area on the modeling surface. FIGS. 6(a) and 6(b) are plan views showing the scanning trajectory of a target irradiation area within a modeling unit area, and FIG. 6(c) is a plan view showing the movement trajectory of the target irradiation area on the modeling surface. FIGS. 7(a) to 7(e) are cross-sectional views showing a state in which a certain area on a workpiece is irradiated with modeling light and modeling material is supplied. FIG. 8 schematically shows a target movement trajectory (machining path) divided into multiple partial paths. FIG. 9 shows the data structure of path information including partial path information. FIG. 10 schematically shows a partial path. Fig. 11(a) is a plan view showing a target movement trajectory of a printing unit area, and Fig. 11(b) is a plan view showing a linear object to be printed on a printing surface when the printing unit area moves along the target movement trajectory shown in Fig. 11(a). Fig. 12 schematically shows a partial path. Figs. 13(a) to 13(c) are cross-sectional views showing a process of printing a three-dimensional structure. Figs. 14(a) and 14(b) are plan views showing an example of a printing unit area rotated by a rotation control operation. Fig. 15(a) shows a shaping unit area and a shaping object when a rotation control operation is performed to rotate a shaping unit area whose target irradiation area moves periodically along a single scanning direction, Fig. 15(b) shows a shaping unit area and a shaping object when a rotation control operation is not performed to rotate a shaping unit area whose target irradiation area moves periodically along a single scanning direction, Fig. 15(c) shows a shaping unit area and a shaping object when a rotation control operation is performed to rotate a shaping unit area whose target irradiation area moves periodically along multiple scanning directions, and Fig. 15(d) shows a shaping unit area and a shaping object when a rotation control operation is not performed to rotate a shaping unit area whose target irradiation area moves periodically along multiple scanning directions. Fig. 16 is a flowchart showing the flow of the first rotation control operation.FIG. 17 shows a shaping unit area rotated by a first rotation control operation in a situation where the shaping unit area moves along a partial path with a path angle of 0 degrees, and then moves along a partial path with a path angle of 30 degrees. FIG. 18 is a flowchart showing the flow of a second rotation control operation. FIG. 19 is a flowchart showing the flow of a third rotation control operation. FIG. 20 shows a shaping unit area rotated by a third rotation control operation in a situation where the shaping unit area moves along multiple partial paths. FIG. 21 is a flowchart showing the flow of an irradiation condition changing operation. FIG. 22 shows an example of a registration GUI (Graphical User Interface). FIG. 23 shows an example of a condition input GUI (Graphical User Interface). FIG. 24 shows multiple shaping condition patterns into which shaping conditions are classified. FIGS. 25(a) and 25(b) each show a shaping unit area rotated by a first rotation control operation.

[0016] Hereinafter, an embodiment of a modeling system will be described with reference to the drawings. Hereinafter, an embodiment of a modeling system will be described using a modeling system SYS capable of forming a model on a workpiece W, which is an example of an object. In particular, hereinafter, an embodiment of a modeling system will be described using a modeling system SYS capable of forming a model on a workpiece W by performing additive processing based on laser metal deposition (LMD). The additive processing based on laser metal deposition is additive processing that forms a model that is integrated with the workpiece W or that can be separated from the workpiece W by melting a modeling material M supplied to the workpiece W with modeling light EL (i.e., an energy beam in the form of light). The model may also be referred to as a structure.

[0017] In the following description, the positional relationships of the various components constituting the modeling system SYS will be described using an XYZ Cartesian coordinate system defined by mutually orthogonal X, Y, and Z axes. For ease of explanation, the X-axis and Y-axis directions are each assumed to be horizontal (i.e., a predetermined direction within a horizontal plane), and the Z-axis direction is assumed to be vertical (i.e., a direction perpendicular to the horizontal plane, essentially an up-down direction). Furthermore, the rotation directions around the X-axis, Y-axis, and Z-axis (in other words, tilt directions) are referred to as the θX direction, θY direction, and θZ direction, respectively. Here, the Z-axis direction may be the direction of gravity. Furthermore, the XY plane may be assumed to be horizontal.

[0018] (1) Configuration of the Modeling System SYS (1-1) Overall Configuration of the Modeling System SYS First, the configuration of the modeling system SYS of this embodiment will be described with reference to Fig. 1 and Fig. 2. Fig. 1 is a cross-sectional view schematically showing the configuration of the modeling system SYS of this embodiment. Fig. 2 is a system configuration diagram showing the system configuration of the modeling system SYS of this embodiment.

[0019] The modeling system SYS is capable of performing additive processing on the workpiece W. The modeling system SYS is capable of forming a modeled object that is integrated with (or separable from) the workpiece W by performing additive processing on the workpiece W. In this case, the additional processing performed on the workpiece W corresponds to processing that adds the modeled object that is integrated with (or separable from) the workpiece W to the workpiece W. Note that the modeled object in this embodiment may refer to any object that the modeling system SYS forms. For example, the modeling system SYS is capable of forming a three-dimensional structure ST (that is, a three-dimensional structure that has a size in all three-dimensional directions, a solid object, in other words, a structure that has a size in the X-axis direction, Y-axis direction, and Z-axis direction) as an example of a modeled object.

[0020] When the workpiece W is the stage 31 described below, the modeling system SYS can perform additional processing on the stage 31. When the workpiece W is a mounted object, which is an object placed on the stage 31, the modeling system SYS can perform additional processing on the mounted object. The mounted object placed on the stage 31 may be another three-dimensional structure ST (i.e., an existing structure) that has been modeled by the modeling system SYS. Note that FIG. 1 shows an example in which the workpiece W is an existing structure placed on the stage 31. Also, the following description will be given using an example in which the workpiece W is an existing structure placed on the stage 31.

[0021] The workpiece W may be a product that has a missing portion and needs to be repaired. In this case, the modeling system SYS may perform repair processing to repair the product that needs to be repaired by performing additional processing to form a shaped object to fill the missing portion. In other words, the additional processing performed by the modeling system SYS may include additional processing to add a shaped object to the workpiece W to fill the missing portion.

[0022] As described above, the modeling system SYS is capable of performing additive processing based on the laser build-up welding method. In other words, the modeling system SYS can also be considered a 3D printer that processes objects using additive manufacturing technology. The additive manufacturing technology may also be referred to as rapid prototyping, rapid manufacturing, or additive manufacturing. The laser build-up welding method (LMD) may also be referred to as directed energy deposition (DED).

[0023] A modeling system SYS using additive manufacturing technology sequentially forms multiple structural layers SL (see FIG. 12 , described later) to form a three-dimensional structure ST in which multiple structural layers SL are stacked. In this case, the modeling system SYS first sets the surface of the workpiece W as a modeling surface MS on which the object is actually formed, and forms the first structural layer SL on the modeling surface MS. Thereafter, the modeling system SYS sets the surface of the first structural layer SL as a new modeling surface MS, and forms the second structural layer SL on the new modeling surface MS. Thereafter, the modeling system SYS repeats the same operations to form a three-dimensional structure ST in which multiple structural layers SL are stacked.

[0024] The modeling system SYS performs additive processing by processing the modeling material M using modeling light EL, which is an energy beam. The modeling material M is a material that can be melted by irradiation with modeling light EL of a predetermined intensity or higher. For example, at least one of a metallic material and a resinous material can be used as the modeling material M. Examples of metallic materials include at least one of a material containing copper, a material containing tungsten, and a material containing stainless steel. However, materials other than metallic materials and resinous materials may also be used as the modeling material M. The modeling material M is a powdered material. In other words, the modeling material M is a powder. However, the modeling material M does not have to be a powder. For example, at least one of a wire-shaped modeling material and a gaseous modeling material may be used as the modeling material M.

[0025] Like the modeling material M, the workpiece W may also be an object containing a material that can be melted by irradiation with modeling light EL of a predetermined intensity or higher. The material of the workpiece W may be the same as or different from the modeling material M. For example, at least one of a metallic material and a resinous material can be used as the material of the workpiece W. Examples of metallic materials include at least one of a material containing copper, a material containing tungsten, and a material containing stainless steel. However, materials other than metallic materials and resinous materials may also be used as the material of the workpiece W.

[0026] In order to perform additive processing, the modeling system SYS includes a material supply source 1, a modeling unit 2, a stage unit 3, a light source 4, a gas supply source 5, and a control unit 7, as shown in FIGS. 1 and 2 . The modeling unit 2 and the stage unit 3 may be housed in a chamber space 63IN inside a housing 6. In this case, the modeling system SYS may perform additive processing in the chamber space 63IN. The modeling unit 2 may also be referred to as a modeling device. An apparatus including the modeling unit 2 and the stage unit 3 may also be referred to as a modeling device. The modeling system SYS does not necessarily have to include at least one of the stage unit 3 and the housing 6.

[0027] The material supply source 1 supplies the modeling unit 2 with the modeling material M. The material supply source 1 supplies a desired amount of modeling material M according to the required amount so that the required amount of modeling material M per unit time is supplied to the modeling unit 2 for performing additive processing.

[0028] The modeling unit 2 processes the modeling material M supplied from the material supply source 1 to form a model. In order to form the model, the modeling unit 2 includes a modeling head 21 and a head drive system 22. The modeling head 21 further includes an irradiation optical system 211 and a plurality of material nozzles 212. However, the modeling head 21 may include a plurality of irradiation optical systems 211. The modeling head 21 may also include a single material nozzle 212. The modeling head 21 may also be referred to as a modeling device.

[0029] The irradiation optical system 211 is an optical system for emitting the shaping light EL. Specifically, the irradiation optical system 211 is optically connected to the light source 4 that emits (generates) the shaping light EL via a light transmission member 41. An example of the light transmission member 41 is at least one of an optical fiber and a light pipe.

[0030] In the example shown in FIGS. 1 and 2 , the modeling system SYS includes two light sources 4 (specifically, light sources 4#1 and 4#2), and the irradiation optical system 211 is optically connected to the light sources 4#1 and 4#2 via optical transmission members 41#1 and 41#2, respectively. The irradiation optical system 211 emits both the modeling light EL propagating from the light source 4#1 via the optical transmission member 41#1 and the modeling light EL propagating from the light source 4#2 via the optical transmission member 41#2. In the following description, when it is necessary to distinguish between the two modeling lights EL emitted by the irradiation optical system 211, the modeling light EL generated by the light source 4#1 will be referred to as “modeling light EL#1,” and the modeling light EL generated by the light source 4#2 will be referred to as “modeling light EL#2.” On the other hand, unless otherwise specified, “modeling light EL” refers to at least one of the modeling lights EL#1 and EL#2.

[0031] However, the modeling system SYS may include a single light source 4 instead of the multiple light sources 4. The irradiation optical system 211 may emit a single modeling light EL instead of emitting multiple beams of modeling light EL.

[0032] The irradiation optical system 211 emits the shaping light EL downward (i.e., toward the -Z side). A stage 31 is disposed below the irradiation optical system 211. When a workpiece W is placed on the stage 31, the irradiation optical system 211 irradiates the emitted shaping light EL onto the shaping surface MS. Specifically, the irradiation optical system 211 can irradiate the shaping light EL onto a target irradiation area (target irradiation position) EA that is set on the shaping surface MS as an area to be irradiated (typically, focused) with the shaping light EL. In the following description, when it is necessary to distinguish between two target irradiation areas EA onto which the irradiation optical system 211 irradiates two respective shaping light beams EL, the target irradiation area EA onto which the irradiation optical system 211 irradiates the shaping light EL#1 will be referred to as the "target irradiation area EA#1," and the target irradiation area EA onto which the irradiation optical system 211 irradiates the shaping light EL#2 will be referred to as the "target irradiation area EA#2." Furthermore, the state of the irradiation optical system 211 can be switched between a state in which the target irradiation area EA is irradiated with the shaping light EL and a state in which the target irradiation area EA is not irradiated with the shaping light EL under the control of the control unit 7. The direction of the shaping light EL emitted from the irradiation optical system 211 is not limited to being directly downward (i.e., coinciding with the -Z-axis direction) and may be, for example, a direction tilted by a predetermined angle with respect to the Z-axis. In other words, the third optical system 216 (or the fθ lens 2162) described later is not limited to being an optical system telecentric on the object side and may be an optical system non-telecentric on the object side.

[0033] The irradiation optical system 211 may form a molten pool MP on the printing surface MS by irradiating the printing surface MS with printing light EL. For example, the irradiation optical system 211 may form a molten pool MP#1 on the printing surface MS by irradiating the printing surface MS with printing light EL#1. For example, the irradiation optical system 211 may form a molten pool MP#2 on the printing surface MS by irradiating the printing surface MS with printing light EL#2. The molten pool MP#1 and the molten pool MP#2 may be integrated. If the molten pool MP#1 and the molten pool MP#2 are integrated, it may be considered that a single molten pool MP is formed on the printing surface MS by irradiating the printing light EL#1 and the molten pool EL#2. Alternatively, the molten pool MP#1 and the molten pool MP#2 may be separated from each other. However, the molten pool MP#1 does not necessarily have to be formed on the printing surface MS by irradiating the printing surface MS with printing light EL#1. The molten pool MP#2 does not necessarily have to be formed on the printing surface MS by irradiating the printing surface MS with printing light EL#2.

[0034] The material nozzle 212 supplies (e.g., injects, jets, spouts, or sprays) the modeling material M. The material nozzle 212 is physically connected to the material supply source 1, which is a supply source of the modeling material M, via the supply pipe 11 and the mixer 12. The material nozzle 212 supplies the modeling material M supplied from the material supply source 1 via the supply pipe 11 and the mixer 12. The material nozzle 212 may pressure-feed the modeling material M supplied from the material supply source 1 via the supply pipe 11. That is, the modeling material M from the material supply source 1 and a conveying gas (i.e., a pressure-feed gas, for example, an inert gas such as nitrogen or argon) may be mixed in the mixer 12 and then pressure-feed to the material nozzle 212 via the supply pipe 11. As a result, the material nozzle 212 supplies the modeling material M together with the conveying gas. For example, a purge gas supplied from the gas supply source 5 is used as the conveying gas. However, the gas supplied from a gas supply source other than the gas supply source 5 may be used as the conveying gas. Although the material nozzle 212 is depicted as a tube in FIG. 1 , the shape of the material nozzle 212 is not limited to this. The material nozzle 212 supplies the modeling material M downward (i.e., toward the −Z side). The stage 31 is disposed below the material nozzle 212. When a workpiece W is mounted on the stage 31, the material nozzle 212 supplies the modeling material M toward the modeling surface MS. The direction of travel of the modeling material M supplied from the material nozzle 212 is inclined at a predetermined angle (for example, an acute angle) with respect to the Z-axis direction, but may also be toward the −Z side (i.e., directly downward).

[0035] In this embodiment, the material nozzle 212 supplies the modeling material M to a position where at least one of the modeling lights EL#1 and EL#2 is irradiated (i.e., at least one of the target irradiation areas EA#1 and EA#2). For this reason, the material nozzle 212 and the irradiation optical systems 211#1 and 211#2 are aligned so that a target supply area MA, which is set on the modeling surface MS as an area where the material nozzle 212 supplies the modeling material M, at least partially overlaps with at least one of the target irradiation areas EA#1 and EA#2. The size of the target supply area MA may be larger, smaller, or the same as the size of at least one of the target irradiation areas EA#1 and EA#2.

[0036] The material nozzle 212 may supply the building material M to the molten pool MP. Specifically, the material nozzle 212 may supply the building material M to at least one of the molten pool MP#1 and the molten pool MP#2. However, the material nozzle 212 does not have to supply the building material M to the molten pool MP. For example, the building system SYS may melt the building material M from the material nozzle 212 using the building light EL emitted from the irradiation optical system 211 before the building material M reaches the workpiece W, and then adhere the molten building material M to the workpiece W.

[0037] The irradiation optical system 211 and the material nozzle 212 may be housed in a head housing 213 provided in the object-forming head 21. The head housing 213 is a housing having an accommodation space formed therein for accommodating the irradiation optical system 211 and the material nozzle 212. In this case, the irradiation optical system 211 and the material nozzle 212 may be housed in the accommodation space inside the head housing 213.

[0038] The head drive system 22 moves the object-forming head 21 under the control of the control unit 7. That is, the head drive system 22 moves the irradiation optical system 211 and the material nozzle 212 under the control of the control unit 7. The head drive system 22 moves the object-forming head 21, for example, along at least one of the X-axis direction, the Y-axis direction, the Z-axis direction, the θX direction, the θY direction, and the θZ direction. Note that the operation of moving the object-forming head 21 along at least one of the θX direction, the θY direction, and the θZ direction may be considered equivalent to the operation of rotating the object-forming head 21 around at least one of a rotation axis along the X-axis, a rotation axis along the Y-axis, and a rotation axis along the Z-axis.

[0039] When the head drive system 22 moves the object-forming head 21, the relative positional relationship between the object-forming head 21 and the stage 31 and the workpiece W placed on the stage 31 changes. As a result, the relative positional relationship between the stage 31, the workpiece W, and the irradiation optical system 211 provided in the object-forming head 21 changes. Therefore, the head drive system 22 may be considered to function as a position change device that can change the relative positional relationship between the stage 31, the workpiece W, and the irradiation optical system 211. The head drive system 22 may be considered to function as a moving device that can move the irradiation optical system 211 relative to the stage 31 and the workpiece W. The head drive system 22 may be considered to function as a moving device that can move the irradiation optical system 211 relative to the stage 31 and the workpiece W. Furthermore, when the relative positional relationship between the object-forming head 21 and the stage 31 and the workpiece W changes, the relative positional relationship between the target irradiation areas EA#1 and EA#2 and the target supply area MA and the workpiece W also changes. That is, each of the target irradiation areas EA#1 and EA#2 and the target supply area MA moves along at least one of the X-axis direction, Y-axis direction, Z-axis direction, θX direction, θY direction, and θZ direction on the surface of the workpiece W (more specifically, on the printing surface MS on which additional processing is performed). In this case, it may be considered that the head drive system 22 moves the printing head 21 so that each of the target irradiation areas EA#1 and EA#2 and the target supply area MA moves on the printing surface MS.

[0040] The stage unit 3 includes a stage 31 and a stage drive system 32 .

[0041] The workpiece W is placed on the stage 31. Specifically, the workpiece W is placed on a workpiece placement surface 311, which is one surface of the stage 31 (e.g., the upper surface facing the +Z side). The stage 31 is capable of supporting the workpiece W placed on the stage 31. The stage 31 may be capable of holding the workpiece W placed on the stage 31. In this case, the stage 31 may be equipped with at least one of a mechanical chuck, an electrostatic chuck, a vacuum chuck, or the like to hold the workpiece W. Alternatively, the stage 31 may not be capable of holding the workpiece W placed on the stage 31. In this case, the workpiece W may be placed on the stage 31 in a clampless manner. Furthermore, the workpiece W may be attached to a holder, or the holder to which the workpiece W is attached may be placed on the stage 31. The irradiation optical system 211 described above emits each of the shaping lights EL#1 and EL#2 during at least a portion of the period during which the workpiece W is placed on the stage 31. Furthermore, the material nozzle 212 described above supplies the modeling material M for at least a portion of the period during which the workpiece W is placed on the stage 31 .

[0042] The stage drive system 32 moves the stage 31. The stage drive system 32 moves the stage 31, for example, along at least one of the X-axis, Y-axis, Z-axis, θX direction, θY direction, and θZ direction. Note that the operation of moving the stage 31 along at least one of the θX direction, θY direction, and θZ direction may be considered equivalent to the operation of rotating the stage 31 around at least one of a rotation axis along the X-axis (i.e., A-axis), a rotation axis along the Y-axis (i.e., B-axis), and a rotation axis along the Z-axis (i.e., C-axis).

[0043] When the stage drive system 32 moves the stage 31, the relative positional relationships between the model-forming head 21 and the stage 31 and workpiece W change. As a result, the relative positional relationships between the stage 31, workpiece W, and the irradiation optical system 211 provided in the model-forming head 21 change. For this reason, the stage drive system 32, like the head drive system 22, may be considered to function as a position change device that can change the relative positional relationships between the stage 31, workpiece W, and the irradiation optical system 211. The stage drive system 32 may be considered to function as a moving device that can move the stage 31, workpiece W, and the irradiation optical system 211 relative to each other. The stage drive system 32 may be considered to function as a moving device that can move the stage 31 and workpiece W relative to the irradiation optical system 211. Furthermore, when the relative positional relationships between the stage 31, workpiece W, and the model-forming head 21 change, the relative positional relationships between the target irradiation areas EA#1 and EA#2 and the target supply area MA and the workpiece W also change. That is, each of the target irradiation areas EA#1 and EA#2 and the target supply area MA moves along at least one of the X-axis direction, Y-axis direction, Z-axis direction, θX direction, θY direction, and θZ direction on the surface (more specifically, the build surface MS) of the workpiece W. In this case, it may be considered that the stage drive system 32 moves the stage 31 so that each of the target irradiation areas EA#1 and EA#2 and the target supply area MA moves on the build surface MS.

[0044] The light source 4 emits, for example, at least one of infrared light, visible light, and ultraviolet light as the shaping light EL. However, other types of light may be used as the shaping light EL. The shaping light EL may include a plurality of pulsed lights (i.e., a plurality of pulse beams). The shaping light EL may be laser light. In this case, the light source 4 may include a laser light source (for example, a semiconductor laser such as a laser diode (LD)). Examples of laser light sources include fiber lasers, CO ２At least one of a laser, a YAG laser, an excimer laser, etc. may be used. However, the shaping light EL does not have to be laser light. The light source 4 may include any light source (for example, at least one of an LED (Light Emitting Diode), a discharge lamp, etc.).

[0045] As described above, the modeling system SYS includes multiple light sources 4 (specifically, light sources 4#1 and 4#2). In this case, the characteristics of the modeling light EL#1 emitted by light source 4#1 and the characteristics of the modeling light EL#2 emitted by light source 4#2 may be identical. For example, the wavelength of the modeling light EL#1 (typically, the peak wavelength, which is the wavelength at which the intensity is greatest in the wavelength band of the modeling light EL#1) and the wavelength of the modeling light EL#2 (typically, the peak wavelength) may be identical. For example, the wavelength band of the modeling light EL#1 (typically, the range of wavelengths at which the intensity is equal to or greater than a certain value) and the wavelength band of the modeling light EL#2 may be identical. For example, the intensity of the modeling light EL#1 and the intensity of the modeling light EL#2 may be identical. For example, the absorptivity of the workpiece W for the modeling light EL#1 (or the object whose surface MS is the surface; the same applies hereinafter) may be identical to the absorptivity of the workpiece W for the modeling light EL#2. In particular, the absorptivity of the workpiece W for the peak wavelength of the shaping light EL#1 may be the same as the absorptivity of the workpiece W for the peak wavelength of the shaping light EL#2. Alternatively, the characteristics of the shaping light EL#1 emitted by the light source 4#1 may be different from the characteristics of the shaping light EL#2 emitted by the light source 4#2. For example, the wavelength (typically, the peak wavelength) of the shaping light EL#1 may be different from the wavelength (typically, the peak wavelength) of the shaping light EL#2. For example, the wavelength band of the shaping light EL#1 may be different from the wavelength band of the shaping light EL#2. For example, the intensity of the shaping light EL#1 may be different from the intensity of the shaping light EL#2. For example, the absorptivity of the workpiece W for the shaping light EL#1 may be different from the absorptivity of the workpiece W for the shaping light EL#2. In particular, the absorptance of the workpiece W for the peak wavelength of the shaping light EL#1 may be different from the absorptance of the workpiece W for the peak wavelength of the shaping light EL#2.

[0046] In this embodiment, an example is described in which the modeling system SYS includes multiple light sources 4. However, the modeling system SYS does not have to include multiple light sources 4. The modeling system SYS does not have to include a single light source 4. As an example, the modeling system SYS may include a light source that emits (supplies) light of a wide wavelength band or multiple wavelengths as the single light source 4. In this case, the modeling system SYS may generate modeling light EL#1 and modeling light EL#2 of different wavelengths by wavelength-dividing the light emitted from this light source.

[0047] The gas supply source 5 is a supply source of purge gas for purging the chamber space 63IN inside the housing 6. The purge gas includes an inert gas. Examples of the inert gas include nitrogen gas and argon gas. The gas supply source 5 is connected to the chamber space 63IN via a supply port 62 formed in a partition member 61 of the housing 6 and a supply pipe 51 connecting the gas supply source 5 and the supply port 62. The gas supply source 5 supplies purge gas to the chamber space 63IN via the supply pipe 51 and the supply port 62. As a result, the chamber space 63IN becomes a space purged with the purge gas. The purge gas supplied to the chamber space 63IN may be discharged from an exhaust port (not shown) formed in the partition member 61. The gas supply source 5 may be a cylinder containing an inert gas. When the inert gas is nitrogen gas, the gas supply source 5 may be a nitrogen gas generator that generates nitrogen gas using atmospheric air as a raw material.

[0048] In cases where the modeling system SYS performs additive processing in an open space rather than in an enclosed space (chamber space 63IN), the gas supply source 5 may supply purge gas to the space between the irradiation optical system 211 and the workpiece W in order to locally purge this space. Note that even in cases where the modeling system SYS performs additive modeling in the chamber space 63IN, the gas supply source 5 may supply purge gas to the space between the irradiation optical system 211 and the workpiece W in order to locally purge this space.

[0049] As described above, when the material nozzle 212 supplies the modeling material M together with a purge gas, the gas supply source 5 may supply the purge gas to the mixer 12 to which the modeling material M is supplied from the material supply source 1. Specifically, the gas supply source 5 may be connected to the mixer 12 via a supply pipe 52 connecting the gas supply source 5 and the mixer 12. As a result, the gas supply source 5 supplies the purge gas to the mixer 12 via the supply pipe 52. In this case, the modeling material M from the material supply source 1 may be supplied (specifically, pressure-fed) through the supply pipe 11 toward the material nozzle 212 by the purge gas supplied from the gas supply source 5 via the supply pipe 52. In other words, the gas supply source 5 may be connected to the material nozzle 212 via the supply pipe 52, the mixer 12, and the supply pipe 11. In this case, the material nozzle 212 supplies the modeling material M together with the purge gas for pressure-fed the modeling material M.

[0050] The control unit 7 controls the operation of the modeling system SYS. For example, the control unit 7 may control the modeling unit 2 (e.g., at least one of the modeling head 21 and the head drive system 22) included in the modeling system SYS to perform additional processing on the workpiece W. For example, the control unit 7 may control the stage unit 3 (e.g., the stage drive system 32) included in the modeling system SYS to perform additional processing on the workpiece W. For example, the control unit 7 may control the material supply source 1 included in the modeling system SYS to perform additional processing on the workpiece W. For example, the control unit 7 may control the light source 4 included in the modeling system SYS to perform additional processing on the workpiece W. For example, the control unit 7 may control the gas supply source 5 included in the modeling system SYS to perform additional processing on the workpiece W. The control unit 7 may also be referred to as a control device.

[0051] The control unit 7 may include, for example, an arithmetic device and a storage device. The arithmetic device may include, for example, at least one of a CPU (Central Processing Unit) and a GPU (Graphics Processing Unit). The storage device may include, for example, a memory. The control unit 7 functions as a device that controls the operation of the modeling system SYS when the arithmetic device executes a computer program. This computer program is a computer program that causes the arithmetic device to perform (i.e., execute) the operations to be performed by the control unit 7, which will be described later. In other words, this computer program is a computer program that causes the control unit 7 to function so as to cause the modeling system SYS to perform the operations to be performed later. The computer program executed by the arithmetic device may be recorded in a storage device (i.e., a recording medium) included in the control unit 7, or may be recorded in any storage medium (e.g., a hard disk or a semiconductor memory) that is built into the control unit 7 or that can be externally attached to the control unit 7. Alternatively, the computing device may download the computer program to be executed from a device external to the control unit 7 via a network interface.

[0052] The control unit 7 may control the irradiation mode of the shaping light EL by the irradiation optical system 211. The irradiation mode may include, for example, at least one of the intensity of the shaping light EL, the irradiation position of the shaping light EL, and the irradiation timing of the shaping light EL. When the shaping light EL includes multiple pulsed lights, the irradiation mode may include, for example, at least one of the emission duration of the pulsed light, the emission cycle of the pulsed light, and the ratio between the emission duration of the pulsed light and the emission cycle of the pulsed light (so-called duty ratio). Furthermore, the control unit 7 may control the movement mode of the shaping head 21 by the head drive system 22. The control unit 7 may control the movement mode of the stage 31 by the stage drive system 32. The movement mode may include, for example, at least one of the movement amount, the movement speed, the movement direction, and the movement timing (movement time). Furthermore, the control unit 7 may control the supply mode of the shaping material M by the material nozzle 212. The supply mode may include, for example, at least one of the supply amount (particularly, the supply amount per unit time) and the supply timing (supply time).

[0053] The control unit 7 does not have to be provided inside the modeling system SYS. For example, the control unit 7 may be provided outside the modeling system SYS as a server or the like. In this case, the control unit 7 and the modeling system SYS may be connected via a wired and / or wireless network (or a data bus and / or a communication line). As the wired network, for example, a network using a serial bus interface represented by at least one of IEEE1394, RS-232x, RS-422, RS-423, RS-485, and USB may be used. As the wired network, a network using a parallel bus interface may be used. As the wired network, a network using an interface compliant with Ethernet (registered trademark) represented by at least one of 10BASE-T, 100BASE-TX, and 1000BASE-T may be used. As the wireless network, a network using radio waves may be used. An example of a network using radio waves is a network compliant with IEEE 802.1x (for example, at least one of a wireless LAN and Bluetooth (registered trademark)). A network using infrared rays may be used as the wireless network. A network using optical communication may be used as the wireless network. In this case, the control unit 7 and the modeling system SYS may be configured to be able to send and receive various information via the network. Furthermore, the control unit 7 may be able to send information such as commands and control parameters to the modeling system SYS via the network. The modeling system SYS may include a receiving device that receives information such as commands and control parameters from the control unit 7 via the network. The modeling system SYS may include a transmitting device (i.e., an output device that outputs information to the control unit 7) that transmits information such as commands and control parameters to the control unit 7 via the network.Alternatively, a first control device that performs part of the processing performed by the control unit 7 may be provided inside the modeling system SYS, while a second control device that performs another part of the processing performed by the control unit 7 may be provided outside the modeling system SYS.

[0054] A computational model that can be constructed by machine learning may be implemented in the control unit 7 by the computation device executing a computer program. An example of a computational model that can be constructed by machine learning is a computational model including a neural network (so-called artificial intelligence (AI)). In this case, learning of the computational model may include learning of parameters of the neural network (e.g., at least one of a weight and a bias). The control unit 7 may control the operation of the modeling system SYS using the computational model. In other words, the operation of controlling the operation of the modeling system SYS may include the operation of controlling the operation of the modeling system SYS using the computational model. Note that a computational model that has been constructed by offline machine learning using training data may be implemented in the control unit 7. Furthermore, the computational model implemented in the control unit 7 may be updated on the control unit 7 by online machine learning. Alternatively, the control unit 7 may control the operation of the modeling system SYS using a computational model implemented in a device external to the control unit 7 (i.e., a device provided outside the modeling system SYS) in addition to or instead of the computational model implemented in the control unit 7.

[0055] The recording medium for recording the computer program executed by the control unit 7 may be at least one of the following: a CD-ROM, CD-R, CD-RW, a flexible disk, an MO, a DVD-ROM, a DVD-RAM, a DVD-R, a DVD+R, a DVD-RW, a DVD+RW, and an optical disk such as Blu-ray (registered trademark), a magnetic medium such as a magnetic tape, a magneto-optical disk, a semiconductor memory such as a USB memory, and any other medium capable of storing a program. The recording medium may also include a device capable of recording a computer program (for example, a general-purpose device or a dedicated device in which a computer program is implemented in an executable state in at least one of the forms of software and firmware). Furthermore, each process or function included in the computer program may be realized by a logical processing block realized within the control unit 7 when the control unit 7 (i.e., the computer) executes the computer program, or may be realized by a predetermined gate array (for example, hardware such as an FPGA (Field Programmable Gate Array) or an ASIC (Application Specific Integrated Circuit)) provided in the control unit 7, or may be realized in a form in which logical processing blocks and partial hardware modules that realize some elements of the hardware are mixed.

[0056] The modeling system SYS may further include an input unit 8 and a display unit 9. However, the modeling system SYS does not necessarily need to include at least one of the input unit 8 and the display unit 9.

[0057] The input unit 8 is a device that accepts information input to the modeling system SYS from outside the modeling system SYS. For example, the input unit 8 may include an operation device (e.g., at least one of a keyboard, a mouse, and a touch panel) that can be operated by a user of the modeling system SYS. For example, the input unit 8 may include a reading device that can read information recorded as data on a recording medium that can be externally attached to the modeling system SYS. For example, the input unit 8 may include a communication device that can communicate with a device external to the modeling system SYS via a communication line. Note that the input unit 8 may also be referred to as an input device.

[0058] The display unit 9 is a device capable of outputting information as an image. In other words, the display unit 9 is a device capable of displaying an image showing information to be output. The display unit 9 may also be referred to as a display device. The modeling system SYS may include a device in which the input unit 8 and the display unit 9 are integrated. An example of a device in which the input unit 8 and the display unit 9 are integrated is a touch screen in which a display device and a position input device are integrated.

[0059] (1-2) Configuration of Irradiation Optical System 211 Next, the configuration of the irradiation optical system 211 will be described with reference to Fig. 3. Fig. 3 is a cross-sectional view showing the configuration of the irradiation optical system 211.

[0060] 3 , the irradiation optical system 211 includes a first optical system 214, a second optical system 215, and a third optical system 216. The first optical system 214 is an optical system into which the shaping light EL#1 emitted from the light source 4#1 is incident. The first optical system 214 is an optical system that outputs the shaping light EL#1 emitted from the light source 4#1 toward the third optical system 216. The second optical system 215 is an optical system into which the shaping light EL#2 emitted from the light source 4#2 is incident. The second optical system 215 is an optical system that outputs the shaping light EL#2 emitted from the light source 4#2 toward the third optical system 216. The third optical system 216 is an optical system into which the shaping light EL#1 emitted from the first optical system 214 and the shaping light EL#2 emitted from the second optical system 215 are incident. The third optical system 216 is an optical system that emits the shaping light EL#1 emitted from the first optical system 214 and the shaping light EL#2 emitted from the second optical system 215 toward the shaping surface MS. Below, the first optical system 214, the second optical system 215, and the third optical system 216 will be described in order.

[0061] The first optical system 214 includes a collimator lens 2141, a parallel plate 2142, a power meter 2143, and a galvanometer scanner 2144. The galvanometer scanner 2144 includes a focus control optical system 2145 and a galvanometer mirror 2146. However, the first optical system 214 does not necessarily have to include at least one of the collimator lens 2141, the parallel plate 2142, the power meter 2143, and the galvanometer scanner 2144. The galvanometer scanner 2144 does not necessarily have to include at least one of the focus control optical system 2145 and the galvanometer mirror 2146.

[0062] The shaping light EL#1 emitted from the light source 4#1 is incident on the collimator lens 2141. The collimator lens 2141 converts the shaping light EL#1 incident on the collimator lens 2141 into parallel light. Note that if the shaping light EL#1 emitted from the light source 4#1 is parallel light (i.e., if the shaping light EL#1, which is parallel light, enters the first optical system 214), the first optical system 214 does not need to be equipped with the collimator lens 2141. The shaping light EL#1 converted into parallel light by the collimator lens 2141 is incident on the parallel plate 2142. A portion of the shaping light EL#1 incident on the parallel plate 2142 passes through the parallel plate 2142. The other portion of the shaping light EL#1 incident on the parallel plate 2142 is reflected by the parallel plate 2142.

[0063] The shaping light EL#1 that has passed through the parallel plate 2142 is incident on a galvano scanner 2144. Specifically, the shaping light EL#1 that has passed through the parallel plate 2142 is incident on a focus control optical system 2145 of the galvano scanner 2144.

[0064] The focus control optical system 2145 is an optical element that can change the focusing position CP of the shaping light EL#1 (hereinafter referred to as the "focus position CP#1"). Specifically, the focus control optical system 2145 can change the focusing position CP#1 of the shaping light EL#1 along the irradiation direction of the shaping light EL#1 that is irradiated onto the shaping surface MS. In the example shown in FIG. 3, the irradiation direction of the shaping light EL#1 that is irradiated onto the shaping surface MS is a direction in which the Z-axis direction is the main component. In this case, the focus control optical system 2145 can change the focusing position CP#1 of the shaping light EL#1 along the Z-axis direction. Furthermore, because the irradiation optical system 211 irradiates the shaping light EL onto the shaping surface MS from above the workpiece W, the irradiation direction of the shaping light EL#1 is a direction that intersects with the shaping surface MS (e.g., the surface of the workpiece W or the structure layer SL). For this reason, the focus control optical system 2145 may be considered to be able to change the focusing position CP#1 of the shaping light EL#1 along a direction intersecting the shaping surface MS (e.g., the surface of the workpiece W or the structure layer SL). The focus control optical system 2145 may be considered to be able to change the focusing position CP#1 of the shaping light EL#1 along the direction of the optical axis EX of the irradiation optical system 211 (typically, the third optical system 216).

[0065] The irradiation direction of the shaping light EL#1 may refer to the irradiation direction of the shaping light EL#1 emitted from the third optical system 216. In this case, the irradiation direction of the shaping light EL#1 may be the same as the direction along the optical axis of the third optical system 216. The irradiation direction of the shaping light EL#1 may be the same as the direction along the optical axis of the final optical member (final optical element) that is arranged closest to the printing surface MS among the optical members that make up the third optical system 216. The final optical member may be the fθ lens 2162 described below. Furthermore, if the fθ lens 2162 described below is composed of multiple optical members, the final optical member may be the optical member that is arranged closest to the printing surface MS among the multiple optical members that make up the fθ lens 2162.

[0066] The focus control optical system 2145 may include, for example, multiple lenses aligned along the irradiation direction of the shaping light EL#1. In this case, the focus control optical system 2145 may change the focusing position CP#1 of the shaping light EL#1 by moving at least one of the multiple lenses along its optical axis direction.

[0067] When the focus control optical system 2145 changes the condensing position CP#1 of the shaping light EL#1, the positional relationship between the condensing position CP#1 of the shaping light EL#1 and the shaping surface MS changes. In particular, the positional relationship between the condensing position CP#1 of the shaping light EL#1 and the shaping surface MS in the irradiation direction of the shaping light EL#1 changes. For this reason, it can be considered that the focus control optical system 2145 changes the positional relationship between the condensing position CP#1 of the shaping light EL#1 and the shaping surface MS by changing the condensing position CP#1 of the shaping light EL#1.

[0068] As described above, the galvano scanner 2144 does not necessarily have to include the focus control optical system 2145. Even in this case, if the positional relationship between the irradiation optical system 211 and the printing surface MS in the irradiation direction of the printing light EL#1 changes, the positional relationship between the condensing position CP#1 of the printing light EL#1 and the printing surface MS in the irradiation direction of the printing light EL#1 changes. Therefore, even if the galvano scanner 2144 does not include the focus control optical system 2145, the printing system SYS can change the positional relationship between the condensing position CP#1 of the printing light EL#1 and the printing surface MS in the irradiation direction of the printing light EL#1. For example, the printing system SYS may change the positional relationship between the condensing position CP#1 of the printing light EL#1 and the printing surface MS in the irradiation direction of the printing light EL#1 by using the head drive system 22 to move the printing head 21 along the irradiation direction of the printing light EL#1. For example, the modeling system SYS may use the stage drive system 32 to move the stage 31 along the irradiation direction of the modeling light EL#1, thereby changing the positional relationship between the focusing position CP#1 of the modeling light EL#1 in the irradiation direction of the modeling light EL#1 and the modeling surface MS.

[0069] The shaping light EL#1 emitted from the focus control optical system 2145 is incident on the galvanometer mirror 2146. The galvanometer mirror 2146 deflects the shaping light EL#1, thereby changing the emission direction of the shaping light EL#1 emitted from the galvanometer mirror 2146. For this reason, the galvanometer mirror 2146 may also be referred to as a deflection optical system.

[0070] When the emission direction of the shaping light EL#1 emitted from the galvanometer mirror 2146 is changed, the emission position from which the shaping light EL#1 is emitted from the fθ lens 2162 (particularly, its emission surface 2163) is changed, as shown in FIG. 4 , which illustrates the shaping light EL#1 emitted from the fθ lens 2162 (described later), which is the final optical element of the irradiation optical system 211. In this case, the galvanometer mirror 2146 may be considered to be changing (in other words, moving) the emission position from which the shaping light EL#1 is emitted from the fθ lens 2162 by deflecting the shaping light EL#1. The galvanometer mirror 2146 may be considered to be functioning as a position changing device that can change the emission position from which the shaping light EL#1 is emitted from the fθ lens 2162. Alternatively, when the emission direction of the shaping light EL#1 emitted from the galvanometer mirror 2146 is changed, in addition to or instead of changing the emission position at which the shaping light EL#1 is emitted from the fθ lens 2162, the emission angle at which the shaping light EL#1 is emitted from the fθ lens 2162 (particularly, its emission surface 2163) is changed. In this case, the galvanometer mirror 2146 may be considered to be changing (in other words, moving) the emission angle at which the shaping light EL#1 is emitted from the fθ lens 2162 by deflecting the shaping light EL#1. The galvanometer mirror 2146 may be considered to be functioning as a position changing device that can change the emission angle at which the shaping light EL#1 is emitted from the fθ lens 2162.

[0071] When at least one of the emission position and emission angle at which the patterning light EL#1 is emitted from the fθ lens 2162 is changed, the target irradiation area EA#1 onto which the patterning light EL#1 is irradiated on the patterning surface MS moves, as shown in Fig. 4. In other words, the irradiation position onto which the patterning light EL#1 is irradiated on the patterning surface MS moves, as shown in Fig. 4.

[0072] 3 again, the galvanometer mirror 2146 includes, for example, an X-scanning mirror 2146MX, an X-scanning motor 2146AX, a Y-scanning mirror 2146MY, and a Y-scanning motor 2146AY. The shaping light EL#1 emitted from the focus control optical system 2145 is incident on the X-scanning mirror 2146MX. The X-scanning mirror 2146MX reflects the shaping light EL#1 incident on the X-scanning mirror 2146MX toward the Y-scanning mirror 2146MY. The Y-scanning mirror 2146MY reflects the shaping light EL#1 incident on the Y-scanning mirror 2146MY toward the third optical system 216. Note that each of the X-scanning mirror 2146MX and the Y-scanning mirror 2146MY may be referred to as a galvanometer mirror.

[0073] The X-scan motor 2146AX swings or rotates the X-scanning mirror 2146MX around a rotation axis along the Y-axis. As a result, the angle of the X-scanning mirror 2146MX with respect to the optical path of the shaping light EL#1 incident on the X-scanning mirror 2146MX is changed. In this case, due to the swinging or rotation of the X-scanning mirror 2146MX, the shaping light EL#1 moves along the X-axis direction, which intersects with the optical axis EX of the irradiation optical system 211. As a result, the shaping light EL#1 scans the shaping surface MS along the X-axis direction. In other words, the irradiation position of the shaping light EL#1 on the shaping surface MS changes in the X-axis direction. In other words, the target irradiation area EA#1 (i.e., the irradiation position of the shaping light EL#1) moves along the X-axis direction on the shaping surface MS.

[0074] The Y-scan motor 2146AY swings or rotates the Y-scanning mirror 2146MY around a rotation axis along the X-axis. As a result, the angle of the Y-scanning mirror 2146MY with respect to the optical path of the shaping light EL#1 incident on the Y-scanning mirror 2146MY is changed. In this case, due to the swinging or rotation of the Y-scanning mirror 2146MY, the shaping light EL#1 moves along the Y-axis direction, which intersects with the optical axis EX of the irradiation optical system 211. As a result, the shaping light EL#1 scans the shaping surface MS along the Y-axis direction. In other words, the irradiation position of the shaping light EL#1 on the shaping surface MS changes in the Y-axis direction. In other words, the target irradiation area EA#1 (i.e., the irradiation position of the shaping light EL#1) moves along the Y-axis direction on the shaping surface MS.

[0075] In this embodiment, the virtual area on the printing surface MS through which the galvanometer mirror 2146 moves the target irradiation area EA#1 is referred to as the printing unit area BSA (particularly, the printing unit area BSA#1). In this case, the target irradiation area EA#1 may be considered to move on a surface of the printing surface MS that overlaps with the printing unit area BSA#1. Specifically, the virtual area on the printing surface MS through which the galvanometer mirror 2146 moves the target irradiation area EA#1 while the positional relationship between the irradiation optical system 211 and the printing surface MS is fixed (i.e., without changing) is referred to as the printing unit area BSA (particularly, the printing unit area BSA#1). The printing unit area BSA#1 indicates a virtual area (in other words, a range) where the printing head 21 actually performs additional processing using the printing light EL#1 while the positional relationship between the irradiation optical system 211 and the printing surface MS is fixed. The shaping unit area BSA#1 indicates a virtual area (in other words, a range) that the shaping head 21 actually scans with the shaping light EL#1 while the positional relationship between the irradiation optical system 211 and the shaping surface MS is fixed. The shaping unit area BSA#1 indicates a region (in other words, a range) through which the target irradiation area EA#1 actually moves while the positional relationship between the irradiation optical system 211 and the shaping surface MS is fixed. Therefore, the shaping unit area BSA#1 may be considered to be a virtual area determined based on the shaping head 21 (particularly, the irradiation optical system 211). In other words, the shaping unit area BSA#1 may be considered to be a virtual area located on the shaping surface MS at a position determined based on the shaping head 21 (particularly, the irradiation optical system 211). The maximum area over which the galvanometer mirror 2146 can move the target irradiation area EA#1 on the printing surface MS while the positional relationship between the irradiation optical system 211 and the printing surface MS is fixed may be referred to as the printing unit area BSA#1. The printing unit area BSA#1 may also be considered to be a virtual area (typically, a two-dimensional area) set in the traveling direction of the printing light EL1 emitted from the irradiation optical system 211, with the printing head 21 (particularly the irradiation optical system 211) as the reference.

[0076] In this case, the modeling system SYS can use the galvanometer mirror 2146 to move the target irradiation area EA#1 within the modeling unit area BSA#1. Therefore, the operation of deflecting the modeling light EL#1 using the galvanometer mirror 2146 may be considered equivalent to the operation of moving the target irradiation area EA#1 within the modeling unit area BSA#1. Furthermore, as described above, the molten pool MP#1 is formed by irradiating the target irradiation area EA#1 with the modeling light EL#1. In this case, the modeling system SYS may be considered to move the molten pool MP#1 within the modeling unit area BSA#1 using the galvanometer mirror 2146. Therefore, the operation of deflecting the modeling light EL#1 using the galvanometer mirror 2146 may be considered equivalent to the operation of moving the molten pool MP#1 within the modeling unit area BSA#1. In other words, the operation of moving the target irradiation area EA#1 within the shaping unit area BSA#1 may be considered equivalent to the operation of moving the molten pool MP#1 within the shaping unit area BSA#1.

[0077] As described above, even when at least one of the shaping head 21 and the stage 31 moves, the target irradiation area EA#1 moves on the shaping surface MS. However, when at least one of the shaping head 21 and the stage 31 moves, the relative positional relationship between the galvanometer mirror 2146 and the shaping surface MS changes. As a result, the shaping unit area BSA#1 determined based on the shaping head 21 (i.e., the shaping unit area BSA#1 to which the galvanometer mirror 2146 moves the target irradiation area EA#1 on the shaping surface MS) moves on the shaping surface MS. For this reason, in this embodiment, the operation of moving at least one of the shaping head 21 and the stage 31 may be considered equivalent to the operation of moving the shaping unit area BSA#1 relative to the shaping surface MS.

[0078] 5A, as an example of an operation of moving the target irradiation area EA#1 within the shaping unit area BSA#1, the galvanometer mirror 2146 may deflect the shaping light EL#1 so that the target irradiation area EA#1 moves within the shaping unit area BSA#1 along a single scanning direction along the shaping surface MS, assuming that the shaping unit area BSA#1 is stationary (i.e., not moving) on ​​the shaping surface MS. In other words, the galvanometer mirror 2146 may deflect the shaping light EL#1 so that the target irradiation area EA#1 moves along a single scanning direction within a coordinate system defined based on the shaping unit area BSA#1. In particular, the galvanometer mirror 2146 may deflect the shaping light EL#1 so that the target irradiation area EA#1 moves back and forth periodically along the single scanning direction within the shaping unit area BSA#1. In other words, the galvanometer mirror 2146 may deflect the shaping light EL#1 so that the target irradiation area EA#1 moves back and forth periodically on an axis along a single scanning direction within the shaping unit area BSA#1. In this case, the shape of the shaping unit area BSA#1 along which the target irradiation area EA#1 moves may be a rectangle whose longitudinal direction is the movement direction of the target irradiation area EA#1.

[0079] As another example of the operation of moving the molten pool MP#1 within the shaping unit area BSA#1, as shown in Figures 6(a) and 6(b), assuming that the shaping unit area BSA#1 is stationary (i.e., not moving) on ​​the shaping surface MS, the galvanometer mirror 2146 may deflect the shaping light EL#1 so that the target irradiation area EA#1 within the shaping unit area BSA#1 moves along multiple scanning directions along the shaping surface MS. In other words, the galvanometer mirror 2146 may deflect the shaping light EL#1 so that the target irradiation area EA#1 moves along multiple scanning directions within a coordinate system defined based on the shaping unit area BSA#1. In particular, the galvanometer mirror 2146 may deflect the shaping light EL#1 so that the target irradiation area EA#1 periodically moves back and forth along each of the multiple scanning directions within the shaping unit area BSA#1. That is, the galvanometer mirror 2146 may deflect the shaping light EL#1 so that the target irradiation area EA#1 periodically moves back and forth on axes along each of the multiple scanning directions within the shaping unit area BSA#1. Figure 6( a) shows an example in which the target irradiation area EA#1 moves back and forth along each of the X-axis and Y-axis directions within the shaping unit area BSA#1 so that the scanning trajectory (movement trajectory) of the target irradiation area EA#1 within the shaping unit area BSA#1 is circular. In this case, the shape of the shaping unit area BSA#1 through which the target irradiation area EA#1 moves may also be circular. Figure 6( b) shows an example in which the target irradiation area EA#1 moves back and forth along each of the X-axis and Y-axis directions within the shaping unit area BSA#1 so that the scanning trajectory (movement trajectory) of the target irradiation area EA#1 within the shaping unit area BSA#1 is mesh-shaped. In this case, the shape of the shaping unit area BSA#1 in which the target irradiation area EA#1 moves may be rectangular.

[0080] The periodic movement of the target irradiation area EA#1 within the shaping unit area BSA#1 may include spatially periodic movement. That is, the galvanometer mirror 2146 may periodically move the target irradiation area EA#1 within a certain space, thereby periodically moving the target irradiation area EA#1. Alternatively, the periodic movement of the target irradiation area EA#1 within the shaping unit area BSA#1 may include temporally periodic movement in addition to or instead of spatially periodic movement. That is, the galvanometer mirror 2146 may periodically move the target irradiation area EA#1 by periodically moving the target irradiation area EA#1 at a fixed time interval.

[0081] As described above, when the emission direction of the shaping light EL#1 emitted from the galvanometer mirror 2146 is changed, the emission position from which the shaping light EL#1 is emitted from the fθ lens 2162 (particularly, its emission surface 2163) is changed, and as a result, the target irradiation area EA#1 moves on the shaping surface MS. In this case, the periodic movement of the target irradiation area EA#1 within the shaping unit area BSA#1 may be considered equivalent to the periodic movement of the emission position of the shaping light EL#1 on the emission surface 2163 of the fθ lens 2162. In this case, the scanning direction in which the target irradiation area EA#1 periodically moves within the shaping unit area BSA#1 may be considered equivalent to the moving direction in which the emission position of the shaping light EL#1 periodically moves on the emission surface 2163 of the fθ lens 2162.

[0082] However, the galvanometer mirror 2146 does not have to deflect the shaping light EL#1 so that the target irradiation area EA#1 moves back and forth periodically within the shaping unit area BSA#1. For example, the galvanometer mirror 2146 may deflect the shaping light EL#1 so that the target irradiation area EA#1 moves aperiodically along a single scanning direction within the shaping unit area BSA#1. For example, the galvanometer mirror 2146 may deflect the shaping light EL#1 so that the target irradiation area EA#1 moves aperiodically along at least one of multiple scanning directions within the shaping unit area BSA#1. For example, the galvanometer mirror 2146 may deflect the shaping light EL#1 so that the target irradiation area EA#1 moves periodically along at least one of multiple scanning directions within the shaping unit area BSA#1, while the target irradiation area EA#1 moves aperiodically along at least another of the multiple scanning directions within the shaping unit area BSA#1.

[0083] 5(a), 6(a), and 6(b), the operation of periodically moving the target irradiation area EA#1 on the printing surface MS may be referred to as a wobbling operation. In other words, the operation of periodically moving (or deflecting) the printing light EL#1 so that the target irradiation area EA#1 moves periodically on the printing surface MS may be referred to as a wobbling operation.

[0084] The control unit 7 may control the galvanometer mirror 2146 based on scan control information indicating a scanning trajectory, which is a movement trajectory of the target irradiation area EA#1 within the shaping unit area BSA#1. That is, the control unit 7 may control the galvanometer mirror 2146 based on the scan control information so that the target irradiation area EA#1 moves within the shaping unit area BSA#1 along the scanning trajectory indicated by the scan control information. Note that the operation of periodically moving the shaping light EL#1 may be referred to as a wobbling operation, and therefore the scanning trajectory may be referred to as a wobble shape or a wobble-shaped trajectory.

[0085] When the target irradiation area EA#1 periodically moves back and forth, the scanning trajectory of the target irradiation area EA#1 within the shaping unit area BSA#1 may be expressed using trigonometric functions. For example, as shown in Figure 5(a), when the target irradiation area EA#1 periodically moves back and forth along a single scanning direction (e.g., the X-axis direction), the scanning trajectory of the target irradiation area EA#1 may be expressed by Equation 1, "X = Ax × sin(2π × fx × t + αx)," and Equation 2, "Y = C." In addition, "X" in Equation 1 indicates the position of the target irradiation area EA#1 in the X-axis direction within the shaping unit area BSA#1 at time t, "Ax" in Equation 1 indicates an amplitude equivalent to half the amount of back and forth movement of the target irradiation area EA#1 in the X-axis direction (i.e., stroke width), "fx" in Equation 1 indicates the number of back and forth movements of the target irradiation area EA#1 in the X-axis direction (i.e., frequency), "αx" in Equation 1 indicates a phase amount indicating the initial position of the target irradiation area EA#1 in the X-axis direction, "Y" in Equation 2 indicates the position of the target irradiation area EA#1 in the YX-axis direction within the shaping unit area BSA#1 at time t, and "C" in Equation 2 indicates a constant. 6(a) and 6(b), when the target irradiation area EA#1 periodically moves back and forth along a plurality of scanning directions (for example, two scanning directions including the X-axis direction and the Y-axis direction), the scanning trajectory of the target irradiation area EA#1 may be expressed by Equation 1, "X = Ax × sin(2π × fx × t + αx)," and Equation 3, "Y = Ay × sin(2π × fy × t + αy)." Note that "Ay" in Equation 3 indicates an amplitude equivalent to half the amount of reciprocating movement of the target irradiation area EA#1 in the Y-axis direction (i.e., stroke width), "fy" in Equation 3 indicates the number of reciprocating movements of the target irradiation area EA#1 in the Y-axis direction (i.e., frequency), and "αy" in Equation 3 indicates a phase amount indicating the initial position of the target irradiation area EA#1 in the Y-axis direction. The scanning trajectories expressed by Equations 1 and 3 may be considered to be equivalent to the trajectory indicated by a Lissajous curve (in other words, a Lissajous figure).

[0086] In addition, if the amplitude Ay in Equation 3 is equal to the constant C in Equation 2, and the frequency fy and the phase amount αy in Equation 3 are each 0, Equation 3 will be equal to Equation 1. Therefore, even when the target irradiation area EA#1 moves along a single scanning direction (for example, the X-axis direction) as shown in Fig. 5(a), the scanning trajectory of the target irradiation area EA#1 may be considered to be expressible by Equation 1, "X = Ax × sin (2π × fx × t + αx)," and Equation 3, "Y = Ay × cos (2π × fy × t + αy)."

[0087] When the scanning trajectory of the target irradiation area EA#1 can be expressed using trigonometric functions, the periodic movement of the target irradiation area EA#1 may be considered to be a movement including a simple harmonic motion. For example, the periodic movement of the target irradiation area EA#1 shown in FIG. 5(a) may be considered to be a movement including a single simple harmonic motion. In this case, the scanning trajectory of the target irradiation area EA#1 shown in FIG. 5(a) may be considered to be a scanning trajectory including a single simple harmonic motion. On the other hand, for example, the periodic movement of the target irradiation area EA#1 shown in each of FIGS. 6(a) and 6(b) may be considered to be a movement including two simple harmonic motions. In this case, the scanning trajectory of the target irradiation area EA#1 shown in each of FIGS. 6(a) and 6(b) may be considered to be a scanning trajectory including two simple harmonic motions (i.e., a scanning trajectory obtained by combining two simple harmonic motions). In either case, the scanning direction in which the target irradiation area EA#1 periodically moves may be considered to be the direction of the simple harmonic motion.

[0088] The control unit 7 may move at least one of the shaping head 21 and the stage 31 so that the shaping unit area BSA#1 moves on the shaping surface MS during a period in which the target irradiation area EA#1 is moved within the shaping unit area BSA#1 using the galvanometer mirror 2146. In other words, the control unit 7 may control at least one of the head drive system 22 and the stage drive system 32 so that the shaping unit area BSA#1 moves on the shaping surface MS during a period in which the target irradiation area EA#1 is moved within the shaping unit area BSA#1 using the galvanometer mirror 2146.

[0089] For example, in the example shown in FIG. 5A , the control unit 7 may control at least one of the head drive system 22 and the stage drive system 32 so that the shaping unit area BSA#1 moves along a target movement trajectory MT0 that intersects (or, in some cases, is perpendicular to) the movement direction (i.e., the scanning direction) of the target irradiation area EA#1 within the shaping unit area BSA#1. Conversely, the control unit 7 may control the galvanometer mirror 2146 so that the target irradiation area EA#1 periodically moves along a scanning direction that intersects (or, in some cases, is perpendicular to) the target movement trajectory MT0 of the shaping unit area BSA#1 on the shaping surface MS. As a result, on the shaping surface MS, the target irradiation area EA#1 may move along the movement trajectory MT#1 shown in FIG. 5B . Specifically, the target irradiation area EA#1 may move along the target movement trajectory MT0 of the shaping unit area BSA#1 while also moving along a scanning direction that intersects with the target movement trajectory MT0. That is, the target irradiation area EA#1 may move along a wave-shaped (for example, sinusoidal) movement locus MT#1 that oscillates around the target movement locus MT0.

[0090] 6( a) or 6(b), the control unit 7 may control at least one of the head drive system 22 and the stage drive system 32 so that the shaping unit area BSA#1 moves along a target movement trajectory MT0 extending along at least one of a direction along the movement direction (i.e., the scanning direction) of the target irradiation area EA#1 within the shaping unit area BSA#1 and a direction intersecting (or, in some cases, perpendicular to) the movement direction of the target irradiation area EA#1 within the shaping unit area BSA#1. Conversely, the control unit 7 may control the galvanometer mirror 2146 so that the target irradiation area EA#1 periodically moves along each of a scanning direction along the target movement trajectory MT0 of the shaping unit area BSA#1 on the shaping surface MS and a scanning direction intersecting (or, in some cases, perpendicular to) the target movement trajectory MT0. Note that Figure 6(c) shows the movement trajectory MT#1 of the target irradiation area EA#1 on the printing surface MS when the printing unit area BSA#1 shown in Figure 6(a) moves along the target movement trajectory MT0 on the printing surface MS.

[0091] When the shaping light EL#1 is irradiated onto the shaping surface MS so that the target irradiation area EA#1 moves within the shaping unit area BSA#1, a molten pool MP#1 is formed in at least a portion of the shaping unit area BSA#1. As a result, a shaping object is formed within the shaping unit area BSA#1. As described above, the shaping unit area BSA#1 is an area having a width in a direction intersecting the movement direction of the shaping unit area BSA#1 on the shaping surface MS (specifically, the direction in which the target movement trajectory MT0 extends). In this case, a shaping object having a width in a direction intersecting the target movement trajectory MT0 of the shaping unit area BSA#1 is formed on the shaping surface MS along the target movement trajectory MT0. For example, in the example shown in FIGS. 5( a) and 5(b), a shaping object having a width along the X-axis direction and extending along the Y-axis direction is formed. 6(a) and 6(c), an object is formed that has a width along the X-axis direction and extends along the Y-axis direction. For example, when the modeling system unit area BSA shown in Fig. 6(b) moves along the Y-axis direction, an object is formed that has a width along the X-axis direction and extends along the Y-axis direction.

[0092] When the printing surface MS is irradiated with the printing light EL#1 so that the target irradiation area EA#1 moves within the printing unit area BSA#1, the printing unit area BSA#1 is scanned with the printing light EL#1 by the galvanometer mirror 2146. Therefore, compared to when the printing surface MS is irradiated with the printing light EL#1 without using the galvanometer mirror 2146, the amount of energy transmitted from the printing light EL#1 to the printing unit area BSA#1 is less likely to vary within the printing unit area BSA#1. In other words, the distribution of the amount of energy transmitted from the printing light EL#1 to the printing unit area BSA#1 can be made more uniform. As a result, the printing system SYS can print a model on the printing surface MS with relatively high printing accuracy.

[0093] However, the modeling system SYS does not have to irradiate the modeling surface MS with the modeling light EL#1 so that the target irradiation area EA#1 moves within the modeling unit area BSA#1. The modeling system SYS may irradiate the modeling surface MS with the modeling light EL#1 without using the galvanometer mirror 2146. In this case, the target irradiation area EA#1 may move on the modeling surface MS in accordance with the movement of at least one of the modeling head 21 and the stage 31.

[0094] Referring again to FIG. 3 , the shaping light EL#1 reflected by the parallel plate 2142 is incident on the power meter 2143. The power meter 2143 is capable of detecting the intensity of the shaping light EL#1 incident on the power meter 2143. For this reason, the power meter 2143 may be referred to as a detection device. For example, the power meter 2143 may include a light-receiving element that detects the shaping light EL#1 as light. Alternatively, the higher the intensity of the shaping light EL#1, the greater the amount of energy generated by the shaping light EL#1. As a result, the amount of heat generated by the shaping light EL#1 increases. For this reason, the power meter 2143 may detect the intensity of the shaping light EL#1 by detecting the shaping light EL#1 as heat. In this case, the power meter 2143 may include a heat-detecting element that detects the heat of the shaping light EL#1.

[0095] As described above, the power meter 2143 is irradiated with the shaping light EL#1 reflected by the parallel plate 2142. Therefore, the power meter 2143 detects the intensity of the shaping light EL#1 reflected by the parallel plate 2142. Because the parallel plate 2142 is disposed on the optical path of the shaping light EL#1 between the light source 4#1 and the galvanometer mirror 2146, the power meter 2143 may be considered to be detecting the intensity of the shaping light EL#1 traveling along the optical path between the light source 4#1 and the galvanometer mirror 2146. In this case, the power meter 2143 can stably detect the intensity of the shaping light EL#1 without being affected by the deflection of the shaping light EL#1 by the galvanometer mirror 2146. However, the position of the power meter 2143 is not limited to the example shown in FIG. 4 . For example, the power meter 2143 may detect the intensity of the shaping light EL#1 traveling along the optical path between the galvanometer mirror 2146 and the shaping surface MS. The power meter 2143 may detect the intensity of the shaping light EL#1 traveling along the optical path within the galvanometer mirror 2146.

[0096] The detection result of the power meter 2143 is output to the control unit 7. The control unit 7 may control (in other words, change) the intensity of the forming light EL#1 based on the detection result of the power meter 2143 (i.e., the detection result of the intensity of the forming light EL#1). For example, the control unit 7 may control the intensity of the forming light EL#1 so that the intensity of the forming light EL#1 on the forming surface MS becomes a desired intensity. To control the intensity of the forming light EL#1, for example, the control unit 7 may control the light source 4#1 so as to change the intensity of the forming light EL#1 emitted from the light source 4#1 based on the detection result of the power meter 2143. As a result, the forming system SYS can appropriately form a model on the forming surface MS by irradiating the forming surface MS with forming light EL#1 having an appropriate intensity.

[0097] As described above, the shaping light EL#1 has an intensity capable of melting the shaping material M. Therefore, the shaping light EL#1 incident on the power meter 2143 may have an intensity capable of melting the shaping material M. However, if the shaping light EL#1 having an intensity capable of melting the shaping material M is incident on the power meter 2143, the power meter 2143 may be damaged by the shaping light EL#1. Therefore, the shaping light EL#1 may be incident on the power meter 2143 with an intensity not high enough to damage the power meter 2143. In other words, the first optical system 214 may weaken the intensity of the shaping light EL#1 incident on the power meter 2143 so that the shaping light EL#1 incident on the power meter 2143 has an intensity not high enough to damage the power meter 2143.

[0098] For example, in order to weaken the intensity of the shaping light EL#1 incident on the power meter 2143, the reflectivity of the parallel plate 2142 with respect to the shaping light EL#1 may be set to an appropriate value. Specifically, the lower the reflectivity of the parallel plate 2142 with respect to the shaping light EL#1, the lower the intensity of the shaping light EL#1 incident on the power meter 2143. For this reason, the reflectivity of the parallel plate 2142 may be set to a value low enough to achieve a state in which the shaping light EL#1 is incident on the power meter 2143 with an intensity that is not high enough to damage the power meter 2143. For example, the reflectivity of the parallel plate 2142 may be less than 10%. For example, the reflectivity of the parallel plate 2142 may be less than a few percent. Plain glass may be used as the parallel plate 2142 with such low reflectivity.

[0099] For example, in order to weaken the intensity of the shaping light EL#1 entering the power meter 2143, the first optical system 214 may cause the shaping light EL#1 to enter the power meter 2143 via multiple parallel plates 2142. Specifically, the shaping light EL#1 may be reflected multiple times by each of the multiple parallel plates 2142 and enter the power meter 2143. In this case, the intensity of the shaping light EL#1 reflected multiple times by each of the multiple parallel plates 2142 is weaker than the intensity of the shaping light EL#1 reflected once by a single parallel plate 2142. Therefore, there is a high possibility that the shaping light EL#1 having an intensity not high enough to damage the power meter 2143 will enter the power meter 2143.

[0100] A desired coating treatment may be applied to the surface of the parallel plate 2142 (particularly, at least one of the incident surface onto which the shaping light EL#1 is incident and the reflective surface onto which the shaping light EL#1 is reflected). For example, the surface of the parallel plate 2142 may be subjected to anti-reflection coating (AR).

[0101] The second optical system 215 includes a collimator lens 2151, a parallel plate 2152, a power meter 2153, and a galvanometer scanner 2154. The galvanometer scanner 2154 includes a focus control optical system 2155 and a galvanometer mirror 2156. However, the second optical system 215 does not necessarily have to include at least one of the collimator lens 2151, the parallel plate 2152, the power meter 2153, and the galvanometer scanner 2154. The galvanometer scanner 2154 does not necessarily have to include at least one of the focus control optical system 2155 and the galvanometer mirror 2156.

[0102] The shaping light EL#2 emitted from the light source 4#2 is incident on the collimator lens 2151. The collimator lens 2151 converts the shaping light EL#2 incident on the collimator lens 2151 into parallel light. Note that if the shaping light EL#2 emitted from the light source 4#2 is parallel light (i.e., if the shaping light EL#2, which is parallel light, is incident on the second optical system 215), the second optical system 215 does not need to be equipped with the collimator lens 2151. The shaping light EL#2 converted into parallel light by the collimator lens 2151 is incident on the parallel plate 2152. A portion of the shaping light EL#2 incident on the parallel plate 2152 passes through the parallel plate 2152. The other portion of the shaping light EL#2 incident on the parallel plate 2152 is reflected by the parallel plate 2152.

[0103] The shaping light EL#2 that has passed through the parallel plate 2152 is incident on a galvano scanner 2154. Specifically, the shaping light EL#2 that has passed through the parallel plate 2152 is incident on a focus control optical system 2155 of the galvano scanner 2154.

[0104] The focus control optical system 2155 is an optical element that can change the focusing position CP of the shaping light EL#2 (hereinafter referred to as the "focus position CP#2"). Specifically, the focus control optical system 2155 can change the focusing position CP#2 of the shaping light EL#2 along the irradiation direction of the shaping light EL#2 that is irradiated onto the shaping surface MS. In the example shown in FIG. 4, the irradiation direction of the shaping light EL#2 that is irradiated onto the shaping surface MS is a direction in which the Z-axis direction is the main component. In this case, the focus control optical system 2155 can change the focusing position CP#2 of the shaping light EL#2 along the Z-axis direction. Furthermore, because the irradiation optical system 211 irradiates the shaping light EL onto the shaping surface MS from above the workpiece W, the irradiation direction of the shaping light EL#2 is a direction that intersects with the shaping surface MS (e.g., the surface of the workpiece W or the structure layer SL). For this reason, the focus control optical system 2155 may be considered to be able to change the condensing position CP#2 of the shaping light EL#2 along a direction intersecting the shaping surface MS (e.g., the surface of the workpiece W or the structure layer SL). The focus control optical system 2155 may be considered to be able to change the condensing position CP#2 of the shaping light EL#2 along the direction of the optical axis EX of the irradiation optical system 211 (typically, the third optical system 216).

[0105] The irradiation direction of the shaping light EL#2 may refer to the irradiation direction of the shaping light EL#2 emitted from the third optical system 216. In this case, the irradiation direction of the shaping light EL#2 may be the same as the direction along the optical axis of the third optical system 216. The irradiation direction of the shaping light EL#2 may be the same as the direction along the optical axis of the final optical member (final optical element) that is arranged closest to the printing surface MS among the optical members that make up the third optical system 216. The final optical member may be the fθ lens 2162 described below. Furthermore, if the fθ lens 2162 described below is composed of multiple optical members, the final optical member may be the optical member that is arranged closest to the printing surface MS among the multiple optical members that make up the fθ lens 2162.

[0106] The focus control optical system 2155 may include, for example, multiple lenses aligned along the irradiation direction of the shaping light EL#2. In this case, the focus control optical system 2155 may change the focusing position CP of the shaping light EL#2 by moving at least one of the multiple lenses along its optical axis direction.

[0107] When the focus control optical system 2155 changes the condensing position CP#2 of the shaping light EL#2, the positional relationship between the condensing position CP#2 of the shaping light EL#2 and the shaping surface MS changes. In particular, the positional relationship between the condensing position CP#2 of the shaping light EL#2 and the shaping surface MS in the irradiation direction of the shaping light EL#2 changes. For this reason, it can be considered that the focus control optical system 2155 changes the positional relationship between the condensing position CP#2 of the shaping light EL#2 and the shaping surface MS by changing the condensing position CP#2 of the shaping light EL#2.

[0108] The change of the focusing position CP#1 of the shaping light EL#1 along the Z-axis direction by the focus control optical system 2145 of the galvanometer scanner 2144 of the first optical system 214 and the change of the focusing position CP#2 of the shaping light EL#2 along the Z-axis direction by the focus control optical system 2155 of the galvanometer scanner 2154 of the second optical system 215 may be linked to each other. For example, the focusing positions CP#1 and CP#2 may be changed along the Z-axis direction so that the position of the focusing position CP#1 of the shaping light EL#1 in the Z-axis direction and the position of the focusing position CP#2 of the shaping light EL#2 in the Z-axis direction coincide with each other. For example, the focusing positions CP#1 and CP#2 may be changed along the Z-axis direction so that the position of the focusing position CP#1 of the shaping light EL#1 in the Z-axis direction and the position of the focusing position CP#2 of the shaping light EL#2 in the Z-axis direction are maintained apart by a predetermined distance in the Z-axis direction. However, the change in the focusing position CP#1 of the shaping light EL#1 along the Z-axis direction by the focus control optical system 2145 of the galvanometer scanner 2144 of the first optical system 214 and the change in the focusing position CP#2 of the shaping light EL#2 along the Z-axis direction by the focus control optical system 2155 may be performed independently of each other.

[0109] As described above, the galvano scanner 2154 does not necessarily have to include the focus control optical system 2155. Even in this case, if the positional relationship between the irradiation optical system 211 and the printing surface MS in the irradiation direction of the printing light EL#2 changes, the positional relationship between the condensing position CP#2 of the printing light EL#2 and the printing surface MS in the irradiation direction of the printing light EL#2 changes. Therefore, even if the galvano scanner 2154 does not include the focus control optical system 2155, the printing system SYS can change the positional relationship between the condensing position CP#2 of the printing light EL#2 and the printing surface MS in the irradiation direction of the printing light EL#2. For example, the printing system SYS may change the positional relationship between the condensing position CP#2 of the printing light EL#2 and the printing surface MS in the irradiation direction of the printing light EL#2 by using the head drive system 22 to move the printing head 21 along the irradiation direction of the printing light EL#2. For example, the modeling system SYS may use the stage drive system 32 to move the stage 31 along the irradiation direction of the modeling light EL#2, thereby changing the positional relationship between the focusing position CP#2 of the modeling light EL#2 in the irradiation direction of the modeling light EL#2 and the modeling surface MS.

[0110] The shaping light EL#2 emitted from the focus control optical system 2155 is incident on the galvanometer mirror 2156. The galvanometer mirror 2156 deflects the shaping light EL#2, thereby changing the emission direction of the shaping light EL#2 emitted from the galvanometer mirror 2156. For this reason, the galvanometer mirror 2156 may also be referred to as a deflection optical system.

[0111] When the emission direction of the shaping light EL#2 emitted from the galvanometer mirror 2156 is changed, the emission position from which the shaping light EL#2 is emitted from the fθ lens 2162 (particularly, its emission surface 2163) is changed, as shown in FIG. 4 , which illustrates the shaping light EL#2 emitted from the fθ lens 2162 (described later), which is the final optical element of the irradiation optical system 211. In this case, the galvanometer mirror 2156 may be considered to be changing (in other words, moving) the emission position from which the shaping light EL#2 is emitted from the fθ lens 2162 by deflecting the shaping light EL#2. The galvanometer mirror 2156 may be considered to be functioning as a position changing device that can change the emission position from which the shaping light EL#2 is emitted from the fθ lens 2162. Alternatively, when the emission direction of the shaping light EL#2 emitted from the galvanometer mirror 2156 is changed, in addition to or instead of changing the emission position at which the shaping light EL#2 is emitted from the fθ lens 2162, the emission angle at which the shaping light EL#2 is emitted from the fθ lens 2162 (particularly, its emission surface 2163) is changed. In this case, the galvanometer mirror 2156 may be considered to be changing (in other words, moving) the emission angle at which the shaping light EL#2 is emitted from the fθ lens 2162 by deflecting the shaping light EL#2. The galvanometer mirror 2156 may be considered to be functioning as a position changing device that can change the emission angle at which the shaping light EL#2 is emitted from the fθ lens 2162.

[0112] When at least one of the emission position and emission angle at which the patterning light EL#2 is emitted from the fθ lens 2162 is changed, the target irradiation area EA#2 onto which the patterning light EL#2 is irradiated on the patterning surface MS moves, as shown in Fig. 4. In other words, the irradiation position onto which the patterning light EL#2 is irradiated on the patterning surface MS moves, as shown in Fig. 4.

[0113] 3 again, the galvanometer mirror 2156 includes, for example, an X-scanning mirror 2156MX, an X-scanning motor 2156AX, a Y-scanning mirror 2156MY, and a Y-scanning motor 2156AY. The shaping light EL#2 emitted from the focus control optical system 2155 is incident on the X-scanning mirror 2156MX. The X-scanning mirror 2156MX reflects the shaping light EL#2 incident on the X-scanning mirror 2156MX toward the Y-scanning mirror 2156MY. The Y-scanning mirror 2156MY reflects the shaping light EL#2 incident on the Y-scanning mirror 2156MY toward the third optical system 216. Note that each of the X-scanning mirror 2156MX and the Y-scanning mirror 2156MY may be referred to as a galvanometer mirror.

[0114] The X-scan motor 2156AX swings or rotates the X-scanning mirror 2156MX around a rotation axis along the Y-axis. As a result, the angle of the X-scanning mirror 2156MX with respect to the optical path of the shaping light EL#2 incident on the X-scanning mirror 2156MX is changed. In this case, due to the swinging or rotation of the X-scanning mirror 2156MX, the shaping light EL#2 moves along the X-axis direction, which intersects with the optical axis EX of the irradiation optical system 211. As a result, the shaping light EL#2 scans the shaping surface MS along the X-axis direction. In other words, the irradiation position of the shaping light EL#2 on the shaping surface MS changes in the X-axis direction. In other words, the target irradiation area EA#2 (i.e., the irradiation position of the shaping light EL#2) moves along the X-axis direction on the shaping surface MS.

[0115] The Y-scan motor 2156AY swings or rotates the Y-scanning mirror 2156MY around a rotation axis along the X-axis. As a result, the angle of the Y-scanning mirror 2156MY with respect to the optical path of the shaping light EL#2 incident on the Y-scanning mirror 2156MY is changed. In this case, due to the swinging or rotation of the Y-scanning mirror 2156MY, the shaping light EL#2 moves along the Y-axis direction, which intersects with the optical axis EX of the irradiation optical system 211. As a result, the shaping light EL#2 scans the shaping surface MS along the Y-axis direction. In other words, the irradiation position of the shaping light EL#2 on the shaping surface MS changes in the Y-axis direction. In other words, the target irradiation area EA#2 (i.e., the irradiation position of the shaping light EL#2) moves along the Y-axis direction on the shaping surface MS.

[0116] In this embodiment, the virtual area on the printing surface MS through which the galvanometer mirror 2156 moves the target irradiation area EA#2 is referred to as the printing unit area BSA (particularly, the printing unit area BSA#2). In this case, the target irradiation area EA#2 may be considered to move on a surface of the printing surface MS that overlaps with the printing unit area BSA#2. Specifically, the virtual area on the printing surface MS through which the galvanometer mirror 2156 moves the target irradiation area EA#2 while the positional relationship between the irradiation optical system 211 and the printing surface MS is fixed (i.e., without changing) is referred to as the printing unit area BSA (particularly, the printing unit area BSA#2). The printing unit area BSA#2 indicates a virtual area (in other words, a range) where the printing head 21 actually performs additional processing using the printing light EL#2 while the positional relationship between the irradiation optical system 211 and the printing surface MS is fixed. The shaping unit area BSA#2 indicates a virtual area (in other words, a range) that the shaping head 21 actually scans with the shaping light EL#2 while the positional relationship between the irradiation optical system 211 and the shaping surface MS is fixed. The shaping unit area BSA#2 indicates a region (in other words, a range) through which the target irradiation area EA#2 actually moves while the positional relationship between the irradiation optical system 211 and the shaping surface MS is fixed. Therefore, the shaping unit area BSA#2 may be considered to be a virtual area determined based on the shaping head 21 (particularly, the irradiation optical system 211). In other words, the shaping unit area BSA#2 may be considered to be a virtual area located on the shaping surface MS at a position determined based on the shaping head 21 (particularly, the irradiation optical system 211). The maximum area over which the galvanometer mirror 2146 can move the target irradiation area EA#2 on the printing surface MS while the positional relationship between the irradiation optical system 211 and the printing surface MS is fixed may be referred to as the printing unit area BSA#2. The printing unit area BSA#2 may also be considered to be a virtual area (typically a two-dimensional area) set in the traveling direction of the printing light EL1 emitted from the irradiation optical system 211, with the printing head 21 (particularly the irradiation optical system 211) as the reference.

[0117] In this case, the modeling system SYS can use the galvanometer mirror 2156 to move the target irradiation area EA#2 within the modeling unit area BSA#2. Therefore, the operation of deflecting the modeling light EL#2 using the galvanometer mirror 2156 may be considered equivalent to the operation of moving the target irradiation area EA#2 within the modeling unit area BSA#2. Furthermore, as described above, the molten pool MP#2 is formed by irradiating the target irradiation area EA#2 with the modeling light EL#2. In this case, the modeling system SYS may be considered to move the molten pool MP#2 within the modeling unit area BSA#2 using the galvanometer mirror 2156. Therefore, the operation of deflecting the modeling light EL#2 using the galvanometer mirror 2156 may be considered equivalent to the operation of moving the molten pool MP#2 within the modeling unit area BSA#2. In other words, the operation of moving the target irradiation area EA#2 within the shaping unit area BSA#2 may be considered equivalent to the operation of moving the molten pool MP#2 within the shaping unit area BSA#2.

[0118] As described above, when at least one of the shaping head 21 and the stage 31 moves, the target irradiation area EA#2 moves on the shaping surface MS. However, when at least one of the shaping head 21 and the stage 31 moves, the relative positional relationship between the galvanometer mirror 2146 and the shaping surface MS changes. As a result, the shaping unit area BSA#2 determined based on the shaping head 21 (i.e., the shaping unit area BSA#2 to which the galvanometer mirror 2156 moves the target irradiation area EA#2 on the shaping surface MS) moves on the shaping surface MS. For this reason, in this embodiment, the operation of moving at least one of the shaping head 21 and the stage 31 may be considered equivalent to the operation of moving the shaping unit area BSA#2 relative to the shaping surface MS.

[0119] The characteristics of the shaping unit area BSA#2 (e.g., shape, movement pattern, etc.) may be the same as the characteristics of the shaping unit area BSA#1 described above. The movement pattern of the target irradiation area EA#2 within the shaping unit area BSA#2 (e.g., scanning trajectory, etc.) may be the same as the movement pattern of the target irradiation area EA#1 within the shaping unit area BSA#1 described above. Therefore, detailed description of the characteristics of the shaping unit area BSA#2 and the movement pattern of the target irradiation area EA#2 within the shaping unit area BSA#2 (e.g., scanning trajectory, etc.) will be omitted, but an example will be briefly described below. As shown in FIG. 5A , under the assumption that the shaping unit area BSA#2 is stationary (i.e., not moving) on ​​the shaping surface MS, the galvanometer mirror 2156 may deflect the shaping light EL#2 within the shaping unit area BSA#2 so that the target irradiation area EA#2 moves along a single scanning direction along the shaping surface MS. As the shaping unit area BSA#2 shown in Fig. 5(a) moves along the target movement trajectory MT0 on the shaping surface MS, the target irradiation area EA#2 may move on the shaping surface MS along the movement trajectory MT#2 shown in Fig. 5(b) (e.g., a wave-shaped movement trajectory MT#2 oscillating around the target movement trajectory MT0). As shown in Fig. 6(a) and Fig. 6(b), under the assumption that the shaping unit area BSA#2 is stationary (i.e., not moving) on ​​the shaping surface MS, the galvanometer mirror 2156 may deflect the shaping light EL#2 so that the target irradiation area EA#2 moves along multiple scanning directions within the shaping unit area BSA#2.

[0120] 5(a), 6(a), and 6(b), the operation of periodically moving the target irradiation area EA#2 on the printing surface MS may be referred to as a wobbling operation. In other words, the operation of periodically moving (or deflecting) the printing light EL#2 so as to periodically move the target irradiation area EA#2 on the printing surface MS may be referred to as a wobbling operation.

[0121] Typically, the shaping unit area BSA#1 and the shaping unit area BSA#2 coincide with each other. In other words, the shaping unit area BSA#1 is identical to the shaping unit area BSA#2. Therefore, the galvanometer mirror 2156 may be considered to deflect the shaping light EL#2 so that the target irradiation area EA#2 moves within the shaping unit area BSA#1. The galvanometer mirror 2146 may be considered to deflect the shaping light EL#1 so that the target irradiation area EA#1 moves within the shaping unit area BSA#2. However, the shaping unit area BSA#1 and the shaping unit area BSA#2 may be partially different.

[0122] When the shaping light EL#2 is irradiated onto the shaping surface MS so that the target irradiation area EA#2 moves within the shaping unit area BSA#2, a molten pool MP#2 is formed in at least a portion of the shaping unit area BSA#2. As a result, a shaping object is formed within the shaping unit area BSA#2. As described above, the shaping unit area BSA#2 is an area having a width in a direction intersecting the movement direction of the shaping unit area BSA#2 on the shaping surface MS (specifically, the direction in which the target movement trajectory MT0 extends). In this case, a shaping object having a width in a direction intersecting the target movement trajectory MT0 of the shaping unit area BSA#2 is formed on the shaping surface MS. For example, in the example shown in FIGS. 5( a) and 5(b), a shaping object having a width along the X-axis direction and extending along the Y-axis direction is formed. For example, in the example shown in FIGS. 6(a) and 6(c), a shaping object having a width along the X-axis direction and extending along the Y-axis direction is formed. For example, when the modeling system unit area BSA shown in FIG. 6B moves along the Y-axis direction, a model that has a width along the X-axis direction and extends along the Y-axis direction is modeled.

[0123] When the printing surface MS is irradiated with the printing light EL#2 so that the target irradiation area EA#2 moves within the printing unit area BSA#2, the printing unit area BSA#2 is scanned with the printing light EL#2 by the galvanometer mirror 2156. Therefore, compared to when the printing surface MS is irradiated with the printing light EL#2 without using the galvanometer mirror 2156, the amount of energy transmitted from the printing light EL#2 to the printing unit area BSA#2 is less likely to vary within the printing unit area BSA#2. In other words, the distribution of the amount of energy transmitted from the printing light EL#2 to the printing unit area BSA#2 can be made uniform. As a result, the printing system SYS can print a model on the printing surface MS with relatively high printing accuracy.

[0124] However, the modeling system SYS does not have to irradiate the modeling surface MS with the modeling light EL#2 so that the target irradiation area EA#2 moves within the modeling unit area BSA#2. The modeling system SYS may irradiate the modeling surface MS with the modeling light EL#2 without using the galvanometer mirror 2156. In this case, the target irradiation area EA#2 may move on the modeling surface MS in accordance with the movement of at least one of the modeling head 21 and the stage 31.

[0125] Referring again to FIG. 4 , the shaping light EL#2 reflected by the parallel plate 2152 is incident on the power meter 2153. The power meter 2153 is a specific example of an electrical component used to control the shaping light EL#2. Specifically, the power meter 2153 can detect the intensity of the shaping light EL#2 incident on the power meter 2153. For example, the power meter 2153 may include a light-receiving element that detects the shaping light EL#2 as light. Alternatively, the higher the intensity of the shaping light EL#2, the greater the amount of energy generated by the shaping light EL#2. As a result, the amount of heat generated by the shaping light EL#2 increases. Therefore, the power meter 2153 may detect the intensity of the shaping light EL#2 by detecting the shaping light EL#2 as heat. In this case, the power meter 2153 may include a heat-detecting element that detects the heat of the shaping light EL#2.

[0126] As described above, the shaping light EL#2 reflected by the parallel plate 2152 is incident on the power meter 2153. Therefore, the power meter 2153 detects the intensity of the shaping light EL#2 reflected by the parallel plate 2152. Because the parallel plate 2152 is disposed on the optical path of the shaping light EL#2 between the light source 4#2 and the galvanometer mirror 2156, the power meter 2153 may be considered to detect the intensity of the shaping light EL#2 traveling along the optical path between the light source 4#2 and the galvanometer mirror 2156. In this case, the power meter 2153 can stably detect the intensity of the shaping light EL#2 without being affected by the deflection of the shaping light EL#2 by the galvanometer mirror 2156. However, the location of the power meter 2153 is not limited to the example shown in FIG. 3 . For example, the power meter 2153 may detect the intensity of the shaping light EL#2 traveling along the optical path between the galvanometer mirror 2156 and the shaping surface MS. The power meter 2153 may detect the intensity of the shaping light EL#2 traveling along the optical path within the galvanometer mirror 2156.

[0127] The detection result of the power meter 2153 is output to the control unit 7. The control unit 7 may control (in other words, change) the intensity of the forming light EL#2 based on the detection result of the power meter 2153 (i.e., the detection result of the intensity of the forming light EL#2). For example, the control unit 7 may control the intensity of the forming light EL#2 so that the intensity of the forming light EL#2 on the forming surface MS becomes a desired intensity. To control the intensity of the forming light EL#2, for example, the control unit 7 may control the light source 4#2 based on the detection result of the power meter 2153 so as to change the intensity of the forming light EL#2 emitted from the light source 4#2. As a result, the forming system SYS can appropriately form a model on the forming surface MS by irradiating the forming surface MS with forming light EL#2 having an appropriate intensity.

[0128] As described above, the shaping light EL#2 has an intensity capable of melting the shaping material M. Therefore, the shaping light EL#2 incident on the power meter 2153 may have an intensity capable of melting the shaping material M. However, if the shaping light EL#2 having an intensity capable of melting the shaping material M is incident on the power meter 2153, the power meter 2153 may be damaged by the shaping light EL#2. Therefore, the shaping light EL#2 may be incident on the power meter 2153 with an intensity not high enough to damage the power meter 2153. In other words, the second optical system 215 may weaken the intensity of the shaping light EL#2 incident on the power meter 2153 so that the shaping light EL#2 incident on the power meter 2153 has an intensity not high enough to damage the power meter 2153.

[0129] For example, in order to weaken the intensity of the shaping light EL#2 incident on the power meter 2153, the reflectivity of the parallel plate 2152 with respect to the shaping light EL#2 may be set to an appropriate value. Specifically, the lower the reflectivity of the parallel plate 2152 with respect to the shaping light EL#2, the lower the intensity of the shaping light EL#2 incident on the power meter 2153. For this reason, the reflectivity of the parallel plate 2152 may be set to a value low enough to achieve a state in which the shaping light EL#2 is incident on the power meter 2153 with an intensity that is not high enough to damage the power meter 2153. For example, the reflectivity of the parallel plate 2152 may be less than 10%. For example, the reflectivity of the parallel plate 2152 may be less than a few percent. Plain glass may be used as the parallel plate 2152 with such low reflectivity.

[0130] For example, in order to weaken the intensity of the shaping light EL#2 entering the power meter 2153, the second optical system 215 may cause the shaping light EL#2 to enter the power meter 2153 via multiple parallel plates 2152. Specifically, the shaping light EL#2 may be reflected multiple times by each of the multiple parallel plates 2152 and enter the power meter 2153. In this case, the intensity of the shaping light EL#2 reflected multiple times by each of the multiple parallel plates 2152 is weaker than the intensity of the shaping light EL#2 reflected once by a single parallel plate 2152. Therefore, there is a high possibility that the shaping light EL#2, whose intensity is not high enough to damage the power meter 2153, will enter the power meter 2153.

[0131] A desired coating treatment may be applied to the surface of the parallel plate 2152 (particularly, at least one of the incident surface onto which the shaping light EL#2 is incident and the reflective surface onto which the shaping light EL#2 is reflected). For example, the surface of the parallel plate 2152 may be subjected to anti-reflection coating (AR).

[0132] The third optical system 216 includes a prism mirror 2161 and an fθ lens 2162 .

[0133] The shaping light EL#1 emitted from the first optical system 214 and the shaping light EL#2 emitted from the second optical system 215 are each incident on a prism mirror 2161. The prism mirror 2161 reflects each of the shaping light EL#1 and EL#2 toward an fθ lens 2162. The prism mirror 2161 reflects the shaping light EL#1 and EL#2, which are incident on the prism mirror 2161 from different directions, in the same direction (specifically, toward the fθ lens 2162).

[0134] Furthermore, if the shaping light EL#1 emitted from the first optical system 214 and the shaping light EL#2 emitted from the second optical system 215 can each be directly incident on the fθ lens 2162, the third optical system 216 does not need to be equipped with a prism mirror 2161.

[0135] The fθ lens 2162 is an optical system for emitting each of the shaping lights EL#1 and EL#2 reflected by the prism mirror 2161 toward the shaping surface MS. In other words, the fθ lens 2162 is an optical system for irradiating each of the shaping lights EL#1 and EL#2 reflected by the prism mirror 2161 onto the shaping surface MS. As a result, the shaping lights EL#1 and EL#2 that have passed through the fθ lens 2162 are irradiated onto the shaping surface MS.

[0136] The fθ lens 2162 may be an optical element capable of focusing each of the shaping lights EL#1 and EL#2 on a focusing surface. In this case, the fθ lens 2162 may be referred to as a focusing optical system. The focusing surface of the fθ lens 2162 may be set, for example, on the shaping surface MS. In this case, the third optical system 216 may be considered to have a focusing optical system whose projection characteristic is fθ. However, the third optical system 216 may also have a focusing optical system whose projection characteristic is different from fθ. For example, the third optical system 216 may have a focusing optical system whose projection characteristic is f tan θ. For example, the third optical system 216 may have a focusing optical system whose projection characteristic is f sin θ.

[0137] In this embodiment, the optical axis of the fθ lens 2162 is used as the optical axis EX of the irradiation optical system 211. As described above, because the optical axis EX of the irradiation optical system 211 is an axis along the Z axis, the optical axis of the fθ lens 2162 is also an axis along the Z axis. Therefore, the fθ lens 2162 emits each of the shaping light EL#1 and EL#2 along the Z axis direction. In this case, the irradiation direction of the shaping light EL#1 and the irradiation direction of the shaping light EL#2 may be the same direction. The irradiation direction of the shaping light EL#1 and the irradiation direction of the shaping light EL#2 may both be in the Z axis direction. The irradiation direction of the shaping light EL#1 and the irradiation direction of the shaping light EL#2 may both be directions along the optical axis EX of the fθ lens 2162. However, the irradiation direction of the shaping light EL#1 and the irradiation direction of the shaping light EL#2 do not have to be the same direction. The irradiation direction of the shaping light EL#1 and the irradiation direction of the shaping light EL#2 may be different from each other.

[0138] (2) Operation of the Modeling System SYS Next, the operation of the modeling system SYS will be described.

[0139] (2-1) Additive Processing Operation Performed by the Modeling System SYS First, the additive processing (additive processing operation) performed by the modeling system SYS on the workpiece W will be described. The additive processing performed on the workpiece W corresponds to an operation of forming a model by adding a model that is integrated with (or separable from) the workpiece W to the workpiece W. For convenience of explanation, the following describes additive processing for forming a three-dimensional structure ST, which is a model having a desired shape. As described above, the modeling system SYS forms the three-dimensional structure ST by performing additive processing based on the laser build-up welding method. For this reason, the modeling system SYS may form the three-dimensional structure ST by performing existing additive processing that complies with the laser build-up welding method. Below, an example of an operation of forming the three-dimensional structure ST using the laser build-up welding method will be briefly described.

[0140] The modeling system SYS models a three-dimensional structure ST on a workpiece W based on three-dimensional model data (in other words, three-dimensional model information) of the three-dimensional structure ST to be modeled. Measurement data of a three-dimensional object measured by at least one of a measuring device installed within the modeling system SYS and a three-dimensional shape measuring device installed separately from the modeling system SYS may be used as the three-dimensional model data. To model the three-dimensional structure ST, the modeling system SYS sequentially models, for example, multiple layered partial structures (hereinafter referred to as "structural layers") SL arranged along the Z-axis direction. For example, the modeling system SYS sequentially models multiple structural layers SL layer by layer based on data of multiple layers obtained by slicing a three-dimensional model of the three-dimensional structure ST along the Z-axis direction. As a result, a three-dimensional structure ST, which is a layered structure in which multiple structural layers SL are stacked, is modeled. The structural layers SL do not necessarily have to be layered structures. The flow of operations for forming a three-dimensional structure ST by sequentially forming a plurality of structural layers SL one by one will be described below.

[0141] First, the operation of forming each structure layer SL will be described with reference to FIGS. 7A to 7E. Under the control of the control unit 7, the forming system SYS moves at least one of the forming head 21 and the stage 31 so that the forming unit areas BSA#1 and BSA#2 are set in desired areas on the forming surface MS corresponding to the surface of the workpiece W or the surface of the formed structure layer SL. Then, the irradiation optical system 211 irradiates the forming unit areas BSA#1 and BSA#2 with the forming light EL#1 and EL#2, respectively. At this time, the focusing positions CP#1 and CP#2 at which the forming light EL#1 and EL#2 are focused in the Z-axis direction may coincide with the forming surface MS. Alternatively, the focusing positions CP#1 and CP#2 at which the forming light EL#1 and EL#2 are focused in the Z-axis direction may be offset from the forming surface MS. As a result, as shown in Figure 7(a), molten pools MP#1 and MP#2 are formed on the printing surface MS irradiated with printing light EL#1 and EL#2, respectively. Furthermore, as shown in Figure 7(b), the printing system SYS supplies printing material M from the material nozzle 212 under the control of the control unit 7. As a result, printing material M is supplied to each of the molten pools MP#1 and MP#2. The printing material M supplied to the molten pool MP#1 is melted by the printing light EL#1 irradiated onto the molten pool MP#1. Similarly, the printing material M supplied to the molten pool MP#2 is melted by the printing light EL#2 irradiated onto the molten pool MP#2.

[0142] Furthermore, the irradiation optical system 211 uses the galvanometer mirrors 2146 and 2156 to move the target irradiation areas EA#1 and EA#2 within the shaping unit areas BSA#1 and BSA#2, respectively, along the scanning trajectories indicated by the above-mentioned scan control information. That is, the irradiation optical system 211 uses the galvanometer mirrors 2146 and 2156 to scan the shaping unit areas BSA#1 and BSA#2 with the shaping light EL#1 and EL#2, respectively, along the scanning trajectories indicated by the above-mentioned scan control information. When the shaping light EL#1 ceases to irradiate the molten pool MP#1 as the target irradiation area EA#1 moves, the molten shaping material M in the molten pool MP#1 cools and solidifies (i.e., solidifies). Similarly, when the shaping light EL#2 ceases to irradiate the molten pool MP#2 as the target irradiation area EA#2 moves, the molten shaping material M in the molten pool MP#2 cools and solidifies (i.e., solidifies). Furthermore, as the target irradiation areas EA#1 and EA#2 move, the molten pools MP#1 and MP#2 also move. As a result, as shown in Figure 7(c), within the building unit areas BSA#1 and BSA#2 through which the molten pools MP#1 and MP#2 move, a model made of the solidified building material M is deposited on the building surface MS.

[0143] 7C, for the sake of convenience, the object formed from the solidified building material M in the shaping unit area BSA#1 is physically separated from the object formed from the solidified building material M in the shaping unit area BSA#2. However, the object formed from the solidified building material M in the shaping unit area BSA#1 may be integrated with the object formed from the solidified building material M in the shaping unit area BSA#2. In particular, when the shaping unit areas BSA#1 and BSA#2 coincide (or partially overlap), the object formed from the solidified building material M in the shaping unit area BSA#1 may be integrated with the object formed from the solidified building material M in the shaping unit area BSA#2.

[0144] During the period when the target irradiation areas EA#1 and EA#2 are moving within the printing unit areas BSA#1 and BSA#2, respectively, the printing system SYS may move at least one of the printing head 21 and the stage 31 so that the printing unit areas BSA#1 and BSA#2 move on the printing surface MS. The printing system SYS may relatively move the irradiation optical system 211 of the printing head 21 and the workpiece W so that the printing unit areas BSA#1 and BSA#2 move on the printing surface MS. In other words, the printing system SYS may move the target irradiation areas EA#1 and EA#2 within the printing unit areas BSA#1 and BSA#2, respectively, and move the printing unit areas BSA#1 and BSA#2 on the printing surface MS in parallel.

[0145] Alternatively, during the period when the target irradiation areas EA#1 and EA#2 are moving within the shaping unit areas BSA#1 and BSA#2, respectively, the shaping system SYS may not move the shaping head 21 and the stage 31 so that the shaping unit areas BSA#1 and BSA#2 do not move on the shaping surface MS. In this case, after the additional processing (i.e., shaping) within the shaping unit areas BSA#1 and BSA#2 is completed, the shaping system SYS may move at least one of the shaping head 21 and the stage 31 so that the shaping unit areas BSA#1 and BSA#2 are set in another area on the shaping surface MS. In other words, after the additional processing (i.e., shaping) within the shaping unit areas BSA#1 and BSA#2 is completed, the shaping system SYS may move at least one of the shaping head 21 and the stage 31 so that the shaping unit areas BSA#1 and BSA#2 move on the shaping surface MS. In this case, the modeling system SYS may move at least one of the modeling head 21 and the stage 31 so that the area on the modeling surface MS where the modeling unit areas BSA#1 and BSA#2 have already been set (i.e., the area where additional processing has already been performed) and the area on the modeling surface MS where the modeling unit areas BSA#1 and BSA#2 have newly been set (i.e., the area where additional processing will now be performed) are adjacent to each other. In particular, the modeling system SYS may move at least one of the modeling head 21 and the stage 31 so that the area on the modeling surface MS where the modeling unit areas BSA#1 and BSA#2 have already been set do not overlap with the area on the modeling surface MS where the modeling unit areas BSA#1 and BSA#2 have newly been set. However, the modeling system SYS may move at least one of the modeling head 21 and the stage 31 so that the area on the modeling surface MS where the modeling unit areas BSA#1 and BSA#2 have already been set partially overlaps with the area on the modeling surface MS where the modeling unit areas BSA#1 and BSA#2 have newly been set.

[0146] 7(d), the manufacturing system SYS repeats a series of manufacturing processes, including forming a molten pool MP#1 by irradiating the manufacturing unit area BSA#1 with the manufacturing light EL#1, forming a molten pool MP#2 by irradiating the manufacturing unit area BSA#2 with the manufacturing light EL#2, supplying the manufacturing material M to the molten pools MP#1 and MP#2, melting the supplied manufacturing material M, and solidifying the molten manufacturing material M, while moving the manufacturing unit areas BSA#1 and BSA#2 along the target movement trajectory MTO on the manufacturing surface MS. In this case, as the manufacturing unit areas BSA#1 and BSA#2 each move, a manufactured object that has a width in a direction intersecting the target movement trajectory MTO and extends along the target movement trajectory MTO is manufactured on the manufacturing surface MS. For example, when the shaping unit areas BSA#1 and BSA#2 move as shown in Figures 5(a) and 5(b), an object having a width along the X-axis direction and extending along the Y-axis direction is formed. For example, when the shaping unit areas BSA#1 and BSA#2 move as shown in Figures 6(a) and 6(c), an object having a width along the X-axis direction and extending along the Y-axis direction is formed.

[0147] 7( e), a structure layer SL corresponding to a structured object, which is an aggregate of the melted and then solidified building material M, is formed on the building surface MS. That is, a structure layer SL corresponding to an aggregate of objects formed on the building surface MS in a pattern corresponding to the target movement trajectories MT0 of the building unit areas BSA#1 and BSA#2 is formed. That is, a structure layer SL having a shape corresponding to the target movement trajectories MT0 of the building unit areas BSA#1 and BSA#2 in plan view is formed.

[0148] Note that, when the target irradiation area EA#1 is set in an area where it is not desired to form an object, the modeling system SYS does not have to irradiate the target irradiation area EA#1 with the modeling light EL#1. Alternatively, the modeling system SYS may irradiate the target irradiation area EA#1 with the modeling light EL#1 and stop the supply of the modeling material M. Alternatively, the modeling system SYS may supply the modeling material M to the target irradiation area EA#1 and irradiate the target irradiation area EA#1 with the modeling light EL#1 at an intensity that does not cause the formation of a molten pool MP. The same applies when the target irradiation area EA#2 is set in an area where it is not desired to form an object.

[0149] The target movement trajectories MT0 of the respective printing unit areas BSA#1 and BSA#2 may be referred to as machining paths (in other words, tool paths) P. In this case, the control unit 7 may move at least one of the printing head 21 and the stage 31 based on the path information 700 indicating the target movement trajectories MT0 (i.e., the machining paths P) so that the respective printing unit areas BSA#1 and BSA#2 move along the target movement trajectories MT0 on the printing surface MS.

[0150] The path information 700 may indicate the target movement trajectory MT0 in units of partial paths PP obtained by dividing (in other words, subdividing) the target movement trajectory MT0 (machining path P). In particular, the path information 700 may indicate the target movement trajectory MT0 in units of linear partial paths PP. For example, FIG. 8 schematically shows the target movement trajectory MT0 (machining path P) divided into multiple partial paths PP. In this case, the path information 700 may include the same number of pieces of partial path information 710, which are information about the partial paths PP, as the number of partial paths PP. In other words, the path information 700 may include multiple pieces of partial path information 710. Note that the machining path P may be the movement trajectory of the target irradiation areas EA#1 and EA#2 in the XY plane, as shown in FIG. 8, or the movement trajectory of the target irradiation areas EA#1 and EA#2 in the XYZ space.

[0151] The path information 700 may be a single file that includes multiple pieces of partial path information 710. Alternatively, the path information 700 may be information that is configured from multiple files, each of which includes a portion of the multiple pieces of partial path information 710.

[0152] 9 shows an example of path information 700 including partial path information 710. As shown in Fig. 9, the partial path information 710 may include ID information 711, position information 712, line width information 713, layer information 714, path length information 715, and path angle information 716. However, the partial path information 710 does not have to include at least one of the line width information 713, layer information 714, path length information 715, and path angle information 716.

[0153] The ID information 711 is identification information for uniquely identifying the partial path PP.

[0154] The position information 712 indicates the position of the partial path PP. In this embodiment, as shown in FIG. 10 , which schematically illustrates the partial path PP, the position information 712 may indicate the position of the start point P_start of the partial path PP and the position of the end point P_end of the partial path PP. That is, the position information 712 indicates the position of the partial path PP using the position of the start point P_start of the partial path PP and the position of the end point P_end of the partial path PP. Even in this case, since the partial path PP is linear as described above, the position information 712 can appropriately indicate the position of the partial path PP. Note that, as described above, when the processing path P is the movement trajectory of the target irradiation areas EA#1 and EA#2 in the XYZ space, the positions of the start point P_start and the end point P_end of the position information 712 of the partial path PP may be positions in the XYZ coordinate system.

[0155] Note that a G-code for controlling a machine tool may be used as the path information 700 including the position information 712. In this case, the position information 712 may have a data format that conforms to the G-code. The path information 700 may also have a data format that conforms to the G-code.

[0156] The line width information 713 indicates a target value for the width of the object to be formed along the partial path PP (hereinafter referred to as the "target line width"). The width of the object may also be referred to as the line width or the bead width. Specifically, as described above, as the forming unit areas BSA#1 and BSA#2 move along the target movement trajectory MT0, an object having a width along a direction intersecting the target movement trajectory MT0 is formed on the forming surface MS. For example, as shown in FIG. 11( a), when the forming unit areas BSA#1 and BSA#2 move along the Y-axis direction, a linear object having a width along the X-axis direction and extending along the Y-axis direction is formed on the forming surface MS, as shown in FIG. 11( b). The structure layer SL described above corresponds to a collection of linear objects shown in FIG. 11( b). 11B, the line width information 713 may indicate a target value of the width D of the linear object (i.e., a target line width). In other words, the line width information 713 may include information regarding the width of the linear object (i.e., a line) to be formed on the formation surface MS.

[0157] The width D of the object may refer to the size of the object in a direction intersecting the target movement trajectory MTO of the shaping unit area BSA. In particular, the width D of the object may refer to the size of the object in a direction perpendicular to the target movement trajectory MTO of the shaping unit area BSA. The width D of the object may refer to the size of the object in a direction intersecting the direction in which the object extends. In particular, the width D of the object may refer to the size of the object in a direction perpendicular to the direction in which the object extends.

[0158] Note that, when a G-code is used as the path information 700 including the position information 712, the control unit 7 (or a device different from the control unit 7) may generate the line width information 713 based on the G-code. For example, the control unit 7 (or a device different from the control unit 7) may generate the line width information 713 by calculating a target line width based on the ratio between an E value of the G-code (e.g., a parameter indicating the supply amount of the modeling material M) and a path length L (described later). As a result, even if the path information 700 does not include the line width information 713, the control unit 7 can acquire the line width information 713.

[0159] The layer information 714 indicates the stacking position of a structural layer SL formed by an object that is modeled along the partial path PP. Specifically, as described above, the three-dimensional structure ST is an aggregate of multiple structural layers SL. The layer information 714 indicates the stacking position of one structural layer SL formed by an object that is modeled along the partial path PP among the multiple structural layers SL. In other words, the layer information 714 indicates which of the multiple structural layers SL the structural layer SL formed by the object that is modeled along the partial path PP is. For example, the layer information 714 may indicate the stacking position of one structural layer SL by indicating the layer number of the one structural layer SL.

[0160] Note that, when a G-code is used as the path information 700 including the position information 712, the control unit 7 (or a device different from the control unit 7) may generate the layer information 714 based on the G-code. For example, the control unit 7 (or a device different from the control unit 7) may generate the layer information 714 by dividing the Z-value of the G-code (e.g., the amount of movement in the Z-axis direction) by the thickness of the structural layer SL. As a result, even if the layer information 714 is not included in the path information 700, the control unit 7 can acquire the layer information 714.

[0161] The path length information 715 indicates a path length L, which is the length of the partial path PP. As shown in Fig. 10 , the path length L means the size of the partial path PP along the extension direction of the partial path PP. The size of the partial path PP along the extension direction of the partial path PP may be the distance between the start point P_start of the partial path PP and the end point P_end of the partial path PP. Furthermore, considering that an object is formed along the partial path PP, the path length L may be considered to indicate the length of the object to be formed along the partial path PP.

[0162] Note that, when a G code is used as the path information 700 including the position information 712, the control unit 7 (or a device different from the control unit 7) may generate the path length information 715 based on the G code. For example, the control unit 7 (or a device different from the control unit 7) may generate the path length information 715 by analyzing the G code. For example, the control unit 7 (or a device different from the control unit 7) may generate the path length information 715 by analyzing the G code and calculating the distance between the start point P_start of the partial path PP and the end point P_end of the partial path PP. As a result, even if the path length information 715 is not included in the path information 700, the control unit 7 can obtain the path length information 715.

[0163] The path angle information 716 indicates the path angle θ of the partial path PP. As shown in FIG. 10 , the path angle θ of the partial path PP may refer to the angle that the partial path PP forms with respect to a reference axis BA that extends from the starting point P_start of the partial path PP along the reference direction. In other words, the path angle θ may be the angle at which the reference axis BA and the partial path PP intersect (the intersection angle). Note that the following description will be given using an example in which the path angle θ in the counterclockwise direction from the reference axis BA (e.g., the direction around the right-hand thread of the Z axis) is a positive angle, while the path angle θ in the clockwise direction from the reference axis BA (e.g., the direction around the left-hand thread of the Z axis) is a negative angle.

[0164] The reference direction in which the reference axis BA extends may be fixed. For example, a direction along the XY plane may be used as the reference direction. For example, the X-axis direction may be used as the reference direction. For example, the Y-axis direction may be used as the reference direction. Alternatively, the reference direction in which the reference axis BA extends may be changeable. For example, the reference direction used to calculate the path angle θ of a partial path PP may be the direction in which another partial path PP located before the partial path PP extends. For example, the reference direction used to calculate the path angle θ of a partial path PP may be the direction in which at least one of a series of multiple partial paths PP extending from the start point P_start of the partial path PP to the opposite side of the partial path PP extends. For example, the reference direction used to calculate the path angle θ of a partial path PP may be the direction in which another partial path PP located before the partial path PP and whose path length L is equal to or greater than a predetermined length extends. The reference direction in which the reference axis BA extends may be a direction in the plane in which the structural layer SL extends, and is not limited to a direction in the XY plane.

[0165] Note that when a G-code is used as the path information 700 including the position information 712, the control unit 7 (or a device different from the control unit 7) may generate the path length information 715 based on the G-code. For example, the control unit 7 (or a device different from the control unit 7) may generate the path angle information 716 by analyzing the G-code. As a result, even if the path angle information 716 is not included in the path information 700, the control unit 7 can obtain the path angle information 716.

[0166] The control unit 7 (or a device different from the control unit 7) may generate the path angle information 716 and then store the generated path angle information 716 in a file containing information indicating a G-code. Alternatively, the control unit 7 (or a device different from the control unit 7) may generate a file containing the path angle information 716 as a file containing information indicating a G-code, and then associate the file containing the generated path angle information 716 with the file containing information indicating a G-code.

[0167] Alternatively, the control unit 7 (or a device different from the control unit 7; hereinafter the same applies in this paragraph) may generate the path angle information 716 based on the position of the start point P_start of the partial path PP and the position of the end point P_end of the partial path PP. For example, as shown in FIG. 12 , the control unit 7 may calculate a movement direction vector d indicating the direction in which the partial path PP extends based on a position coordinate Pstart indicating the position of the start point P_start and a position coordinate Pend indicating the position of the end point P_end. As an example, the control unit 7 may calculate the movement direction vector d using the formula d = (Pend - Pstart) / (||Pend - Pstart||). Then, the control unit 7 may calculate the absolute value |θ| of the path angle θ based on the movement direction vector d and a unit vector e aligned along the reference direction (in the example shown in FIG. 12 , a unit vector ey aligned along the Y-axis direction). As an example, the control unit 7 may calculate the absolute value of the path angle θ using the formula |θ| = arccos(d·ey). Note that "d·ey" means the dot product of the movement direction vector d and the unit vector ey. Furthermore, the control unit 7 may calculate the sign of the path angle θ based on the movement direction vector d and the unit vector e along a direction intersecting the reference direction (in the example shown in FIG. 12, the unit vector ex along the X-axis direction). As an example, the control unit 7 may calculate the sign of the path angle θ using the formula: Sign of path angle θ = -sgn(d·ex). Note that "d·ex" means the dot product of the movement direction vector d and the unit vector ex. "sgn" is a function that returns a positive sign (e.g., 1) when its argument is a positive number, a negative sign (e.g., -1) when its argument is a negative number, and zero when its argument is zero. Therefore, if the function sgn returns a positive sign (e.g., 1), the path angle θ will be a positive angle; if the function sgn returns a negative sign (e.g., -1), the path angle θ will be a negative angle; and if the function sgn returns zero, the path angle θ will be 0 degrees.

[0168] The modeling system SYS repeatedly performs operations for modeling such a structure layer SL based on the three-dimensional model data under the control of the control unit 7. Specifically, before performing operations for modeling the structure layer SL, the control unit 7 first slices the three-dimensional model data at the layer pitch to create multiple slice data corresponding to each of the multiple structure layers SL. The control unit 7 may then generate pass information 700 based on the multiple slice data. Alternatively, a device different from the control unit 7 may generate the pass information 700. The modeling system SYS then performs operations for modeling the first structure layer SL#1 on the modeling surface MS corresponding to the surface of the workpiece W based on the pass information 700 (particularly, at least one partial pass information 710 corresponding to the structure layer SL#1). The control unit 7 then controls the modeling unit 2 and the stage unit 3 to model the first structure layer SL#1 based on the pass information 700. As a result, a structure layer SL#1 is formed on the printing surface MS, as shown in FIG. 13( a). The printing system SYS then sets the surface (i.e., the upper surface) of the structure layer SL#1 as a new printing surface MS, and prints a second structure layer SL#2 on the new printing surface MS. To print the structure layer SL#2, the control unit 7 first controls at least one of the head drive system 22 and the stage drive system 32 so that the printing head 21 moves along the Z axis relative to the stage 31. Specifically, the control unit 7 controls at least one of the head drive system 22 and the stage drive system 32 to move the printing head 21 toward the +Z side and / or move the stage 31 toward the −Z side so that the printing unit areas BSA#1 and BSA#2 are set on the surface of the structure layer SL#1 (i.e., the new printing surface MS). Thereafter, under the control of the control unit 7, the modeling system SYS models the structural layer SL#2 on the structural layer SL#1 based on the pass information 700 (particularly, at least one piece of partial pass information 710 corresponding to the structural layer SL#2) by performing an operation similar to the operation for modeling the structural layer SL#1. As a result, the structural layer SL#2 is modeled as shown in FIG. 13( b). Thereafter, the same operation is repeated until all structural layers SL that constitute the three-dimensional structure ST to be modeled on the workpiece W are modeled.As a result, as shown in FIG. 13( c ), a three-dimensional structure ST is formed by a layered structure in which a plurality of structural layers SL are stacked.

[0169] (2-2) Rotation Control Operation In the present embodiment, the control unit 7 may perform a rotation control operation. The rotation control operation may include an operation of rotating the shaping unit area BSA (i.e., at least one of the shaping unit areas BSA#1 and BSA#2). Specifically, the rotation control operation may include an operation of rotating the shaping unit area BSA around a desired rotation axis RX.

[0170] The rotation axis RX may be a rotation axis that intersects with the printing surface MS. The printing surface MS is typically a surface along the XY plane. In this case, the rotation axis RX may be a rotation axis that intersects with the XY plane. In particular, the rotation axis RX may be a rotation axis that is perpendicular to the XY plane. The rotation axis RX may be a rotation axis that is along the Z axis that intersects with the XY plane. In particular, the rotation axis RX may be a rotation axis that is parallel to the Z axis that intersects with the XY plane. The printing surface MS is typically a surface that intersects with the optical axis EX of the irradiation optical system 211. In this case, the rotation axis RX may be a rotation axis that is along the optical axis EX of the irradiation optical system 211. In particular, the rotation axis RX may be a rotation axis that is parallel to the optical axis EX of the irradiation optical system 211.

[0171] However, the rotation axis RX does not have to be a rotation axis that intersects the printing surface MS. The rotation axis RX does not have to be a rotation axis that intersects the XY plane. In particular, the rotation axis RX does not have to be a rotation axis that is perpendicular to the XY plane. The rotation axis RX does not have to be a rotation axis along the Z axis that intersects the XY plane. In particular, the rotation axis RX does not have to be a rotation axis that is parallel to the Z axis that intersects the XY plane. The rotation axis RX does not have to be a rotation axis that is parallel to the optical axis EX of the irradiation optical system 211. In particular, the rotation axis RX does not have to be a rotation axis that is parallel to the optical axis EX of the irradiation optical system 211.

[0172] The rotation axis RX of the shaping unit area BSA may be a rotation axis that passes through the center (e.g., center of gravity) of the shaping unit area BSA. For example, the rotation axis RX of the shaping unit area BSA#1 may be a rotation axis that passes through the center (e.g., center of gravity) of the shaping unit area BSA#1. For example, the rotation axis RX of the shaping unit area BSA#2 may be a rotation axis that passes through the center (e.g., center of gravity) of the shaping unit area BSA#2. However, the rotation axis RX of the shaping unit area BSA may be a rotation axis that does not pass through the center (e.g., center of gravity) of the shaping unit area BSA.

[0173] 14(a) and 14(b) show examples of a shaping unit area BSA rotated by a rotation control operation. Fig. 14(a) shows a rotation control operation for rotating the shaping unit area BSA shown in Fig. 6(b) around the rotation axis RX. That is, Fig. 14(a) shows a rotation control operation for rotating the shaping unit area BSA, in which the target irradiation area EA moves along multiple scanning directions, around the rotation axis. On the other hand, Fig. 14(b) shows a rotation control operation for rotating the shaping unit area BSA shown in Fig. 5(a) around the rotation axis RX. That is, Fig. 14(b) shows a rotation control operation for rotating the shaping unit area BSA, in which the target irradiation area EA moves along a single scanning direction, around the rotation axis.

[0174] 14( a) and 14(b), when the shaping unit area BSA rotates, the scanning direction of the target irradiation area EA within the shaping unit area BSA changes. Specifically, when the shaping unit area BSA rotates around the rotation axis RX, the scanning direction of the target irradiation area EA also rotates around the rotation axis RX. Therefore, the rotation control operation may be considered equivalent to an operation of changing (e.g., rotating) the scanning direction of the target irradiation area EA within the shaping unit area BSA.

[0175] As described above, the periodic movement of the target irradiation area EA may be considered to be a movement including simple harmonic motion. In this case, as described above, the scanning direction in which the target irradiation area EA periodically moves may be considered to be the direction of simple harmonic motion. Therefore, the rotation control operation may be considered to be equivalent to an operation of changing (e.g., rotating) the direction of the simple harmonic motion of the target irradiation area EA within the shaping unit area BSA.

[0176] As described above, the emission position (or emission angle; the same applies hereinafter in this paragraph) at which the modeling light EL is emitted from the fθ lens 2162 (particularly, its emission surface 2163) is changed, resulting in a movement of the target irradiation area EA on the modeling surface MS. In this case, as described above, the scanning direction in which the target irradiation area EA periodically moves may be considered equivalent to the movement direction in which the emission position of the modeling light EL periodically moves on the emission surface 2163 of the fθ lens 2162. For this reason, the rotation control operation may be considered equivalent to an operation of changing (e.g., rotating) the movement direction in which the emission position of the modeling light EL periodically moves on the emission surface 2163 of the fθ lens 2162.

[0177] As described above, the scanning direction of the target irradiation area EA within the shaping unit area BSA may intersect with the target movement trajectory MT0 of the shaping unit area BSA. Therefore, the rotation control operation may be considered equivalent to an operation of changing (e.g., rotating) the direction in which the target irradiation area EA intersects with the target movement trajectory MT0 of the shaping unit area BSA. In other words, the rotation control operation may be considered equivalent to an operation of changing (e.g., rotating) the direction in which the target irradiation area EA, which is moved within the shaping unit area BSA by the galvanometer mirror 2146 or 2156, intersects with the target movement trajectory MT0 of the shaping unit area BSA. The rotation control operation may be considered equivalent to an operation of changing (e.g., rotating) the movement direction in which the target irradiation area EA, which is moved within the shaping unit area BSA by the galvanometer mirror 2146 or 2156, moves so as to intersect with the target movement trajectory MT0 of the shaping unit area BSA. The rotation control operation may be considered equivalent to an operation of changing the pattern in which the target irradiation area EA moves within the shaping unit area BSA along a direction that intersects with the target movement trajectory MT0 of the shaping unit area BSA using the galvanometer mirror 2146 or 2156.

[0178] 14( a) and 14(b), when the shaping unit area BSA rotates, the scanning trajectory of the target irradiation area EA within the shaping unit area BSA also rotates. Specifically, when the shaping unit area BSA rotates around the rotation axis RX, the scanning trajectory of the target irradiation area EA also rotates around the rotation axis RX. Therefore, the rotation control operation may be considered equivalent to an operation of rotating the scanning trajectory of the target irradiation area EA within the shaping unit area BSA.

[0179] As described above, the virtual area to which the galvanometer mirror 2146 moves the target irradiation area EA#1 on the printing surface MS is the printing unit area BSA#1. Therefore, the control unit 7 may rotate the printing unit area BSA#1 by controlling the galvanometer mirror 2146. In other words, the control unit 7 may control the galvanometer mirror 2146 to rotate the printing unit area BSA#1.

[0180] As described above, the virtual area to which the galvanometer mirror 2156 moves the target irradiation area EA#2 on the printing surface MS is the printing unit area BSA#2. Therefore, the control unit 7 may rotate the printing unit area BSA#2 by controlling the galvanometer mirror 2156. In other words, the control unit 7 may control the galvanometer mirror 2156 to rotate the printing unit area BSA#2.

[0181] The control unit 7 may change (in other words, control or adjust) the amount of rotation of the shaping unit area BSA. That is, the amount of rotation of the shaping unit area BSA may be variable.

[0182] The amount of rotation of the shaping unit area BSA may be considered to be equivalent to the rotation angle of the shaping unit area BSA. The rotation angle of the shaping unit area BSA may refer to the rotation angle of the shaping unit area BSA from the shaping unit area BSA in the reference posture. In this case, the rotation angle of the shaping unit area BSA in the reference posture may be defined as 0 degrees. As shown in the left diagrams of FIGS. 14( a) and 14(b), a shaping unit area BSA in the reference posture may be used in which the scanning direction of the target irradiation area EA within the shaping unit area BSA is the X-axis direction or the Y-axis direction.

[0183] The operation of changing the rotation amount of the shaping unit area BSA may be considered equivalent to the operation of changing the scanning direction of the target irradiation area EA within the shaping unit area BSA. For example, the operation of changing the rotation amount of the shaping unit area BSA from one rotation amount to another rotation amount different from the one rotation amount may be considered equivalent to the operation of changing the scanning direction of the target irradiation area EA within the shaping unit area BSA from one direction to another direction different from the one direction. The operation of changing the rotation amount of the shaping unit area BSA may be considered equivalent to the operation of changing the direction of simple harmonic motion of the target irradiation area EA within the shaping unit area BSA. For example, the operation of changing the rotation amount of the shaping unit area BSA from one rotation amount to another rotation amount may be considered equivalent to the operation of changing the direction of simple harmonic motion of the target irradiation area EA within the shaping unit area BSA from one direction to another direction different from the one direction. The operation of changing the rotation amount of the shaping unit area BSA may be considered equivalent to the operation of changing the movement direction in which the emission position (or emission angle) of the shaping light EL periodically moves on the emission surface 2163 of the fθ lens 2162. For example, the operation of changing the rotation amount of the shaping unit area BSA from one rotation amount to another may be considered equivalent to the operation of changing the movement direction in which the emission position of the shaping light EL periodically moves on the emission surface 2163 of the fθ lens 2162 from one direction to another direction different from the one direction. The operation of changing the rotation amount of the shaping unit area BSA may be considered equivalent to the operation of changing the direction in which the target irradiation area EA intersects with the target movement trajectory MT0 of the shaping unit area BSA. For example, the operation of changing the rotation amount of the shaping unit area BSA from one rotation amount to another may be considered equivalent to the operation of changing the direction in which the target irradiation area EA intersects with the target movement trajectory MTO of the shaping unit area BSA from one direction to another direction different from the one direction. The operation of changing the rotation amount of the shaping unit area BSA may be considered equivalent to the operation of changing the pattern in which the target irradiation area EA moves along the direction intersecting with the target movement trajectory MTO of the shaping unit area BSA.For example, the operation of changing the rotation amount of the shaping unit area BSA from one rotation amount to another may be considered equivalent to the operation of changing the pattern in which the target irradiation area EA moves along a direction intersecting the target movement trajectory MT0 of the shaping unit area BSA from one pattern to another pattern different from the one pattern.In particular, in this embodiment, the control unit 7 may perform a rotation control operation so that the deviation between the scanning direction of the target irradiation area EA within the shaping unit area BSA and the width direction of the object is smaller than when a rotation control operation is not performed.

[0184] For example, Fig. 15(a) shows the shaping unit area BSA and the shaped object when a rotation control operation is performed to rotate the shaping unit area BSA, in which the target irradiation area EA periodically moves along a single scanning direction. Fig. 15(b) shows the shaping unit area BSA and the shaped object when a rotation control operation is not performed to rotate the shaping unit area BSA, in which the target irradiation area EA periodically moves along a single scanning direction. As shown in Figs. 15(a) and 15(b), the control unit 7 may perform the rotation control operation so that the deviation between the scanning direction of the target irradiation area EA and the width direction of the shaped object when the rotation control operation shown in Fig. 15(a) is performed is smaller than the deviation between the scanning direction of the target irradiation area EA and the width direction of the shaped object when the rotation control operation shown in Fig. 15(b) is not performed.

[0185] The width direction of the object may refer to a direction intersecting the target movement trajectory MTO of the shaping unit area BSA. In particular, the width direction of the object may refer to a direction perpendicular to the target movement trajectory MTO of the shaping unit area BSA. The width direction of the object may refer to a direction intersecting the extension direction of the object. In particular, the width direction of the object may refer to a direction perpendicular to the extension direction of the object.

[0186] For example, Fig. 15(c) shows the shaping unit area BSA and the shaped object when a rotation control operation is performed to rotate the shaping unit area BSA, in which the target irradiation area EA periodically moves along multiple scanning directions. Fig. 15(d) shows the shaping unit area BSA and the shaped object when a rotation control operation is not performed to rotate the shaping unit area BSA, in which the target irradiation area EA periodically moves along multiple scanning directions. As shown in Figs. 15(c) and 15(d), the control unit 7 may perform the rotation control operation so that the deviation between the scanning direction of the target irradiation area EA and the width direction of the shaped object when the rotation control operation shown in Fig. 15(c) is performed is smaller than the deviation between the scanning direction of the target irradiation area EA and the width direction of the shaped object when the rotation control operation shown in Fig. 15(d) is not performed. In particular, the control unit 7 may perform the rotation control operation so that the deviation between one scanning direction of the target irradiation area EA and the width direction of the object when the rotation control operation is performed is smaller than the deviation between the same scanning direction of the target irradiation area EA and the width direction of the object when the rotation control operation is not performed. In other words, the control unit 7 may perform the rotation control operation so that the deviation between one direction of the simple harmonic motion of the target irradiation area EA and the width direction of the object when the rotation control operation is performed is smaller than the deviation between the same direction of the simple harmonic motion of the target irradiation area EA and the width direction of the object when the rotation control operation is not performed.

[0187] The deviation between the scanning direction of the target irradiation area EA and the width direction of the object may refer to the angle formed by an axis extending in the scanning direction of the target irradiation area EA and an axis extending in the width direction of the object. In this case, the control unit 7 may perform the rotation control operation so that the angle formed by the axis extending in the scanning direction of the target irradiation area EA and the axis extending in the width direction of the object when the rotation control operation is performed is smaller than the angle formed by the axis extending in the scanning direction of the target irradiation area EA and the axis extending in the width direction of the object when the rotation control operation is not performed.

[0188] The scanning direction of the target irradiation area EA within the shaping unit area BSA may be considered to be equivalent to the width direction of the shaping unit area BSA (i.e., the width direction intersecting the target movement trajectory MT0). In this case, performing a rotation control operation to reduce the deviation between the scanning direction of the target irradiation area EA within the shaping unit area BSA and the width direction of the object compared to when the rotation control operation is not performed may be considered equivalent to performing a rotation control operation to reduce the deviation between the width direction of the shaping unit area BSA within the shaping unit area BSA and the width direction of the object compared to when the rotation control operation is not performed. In other words, the control unit 7 may perform a rotation control operation to reduce the deviation between the scanning direction of the target irradiation area EA within the shaping unit area BSA and the width direction of the object compared to when the rotation control operation is not performed.

[0189] 15B and 15D , if the rotation control operation for reducing the deviation between the scanning direction of the target irradiation area EA and the width direction of the object is not performed, the deviation between the scanning direction of the target irradiation area EA within the printing unit area BSA and the width direction of the object may become larger than the allowable limit. In particular, when the printing system SYS prints a linear object whose extension direction changes (e.g., a curved object), the deviation between the scanning direction of the target irradiation area EA within the printing unit area BSA and the width direction of the object may become larger than the allowable limit as printing of the object progresses. As a result, the printing system SYS may not be able to print a linear object having the same width D as the target line width indicated by the line width information 713. On the other hand, when a rotation control operation is performed to reduce the misalignment between the scanning direction of the target irradiation area EA and the width direction of the object, as shown in Figures 15(a) and 15(c), the misalignment between the scanning direction of the target irradiation area EA within the printing unit area BSA and the width direction of the object is unlikely to exceed the tolerance. For example, even when the printing system SYS prints a linear object whose extension direction changes (e.g., a curved object), the rotation amount of the printing unit area BSA is changed as the printing of the object progresses, so the misalignment between the scanning direction of the target irradiation area EA within the printing unit area BSA and the width direction of the object is unlikely to exceed the tolerance. As a result, the printing system SYS can appropriately print a linear object having the same width D as the target line width indicated by the line width information 713. Therefore, when the rotation control operation is performed, the printing accuracy of the printing system SYS is improved compared to when the rotation control operation is not performed.

[0190] In consideration of the effects achieved by such a rotation control operation, the control unit 7 may perform the rotation control operation so that the deviation between the scanning direction of the target irradiation area EA in the shaping unit area BSA and the width direction of the model is equal to or less than a tolerance. The control unit 7 may perform the rotation control operation so that the deviation between the scanning direction of the target irradiation area EA in the shaping unit area BSA and the width direction of the model is zero. The control unit 7 may perform the rotation control operation so that the scanning direction of the target irradiation area EA in the shaping unit area BSA is aligned with the width direction of the model.

[0191] As described above, the control unit 7 forms a modeling object that has a width in a direction intersecting with the target movement trajectory MT0 and extends along the target movement trajectory MT0, based on the path information 700 that indicates the target movement trajectory MT0 of the modeling unit area BSA. Therefore, it can be said that the path information 700 indicates information regarding the width direction of the modeling object. Therefore, in this embodiment, the control unit 7 may change the amount of rotation of the modeling unit area BSA based on the path information 700.

[0192] For example, the control unit 7 may calculate the amount of rotation of the shaping unit area BSA located at a certain position on the shaping surface MS based on the path information 700. Thereafter, the control unit 7 may change the amount of rotation of the shaping unit area BSA so that the amount of rotation of the shaping unit area BSA matches the calculated amount of rotation at the time when the shaping unit area BSA is located at a certain position on the shaping surface MS. In other words, the control unit 7 may control the amount of rotation of the shaping unit area BSA based on the path information 700.

[0193] For example, the control unit 7 may calculate the timing for changing the rotation amount of the shaping unit area BSA based on the path information 700, and change the rotation amount of the shaping unit area BSA at the calculated timing. That is, the control unit 7 may control the timing for changing the rotation amount of the shaping unit area BSA based on the path information 700. The control unit 7 may control the timing for changing the rotation amount of the shaping unit area BSA from one rotation amount to another based on the path information 700.

[0194] In this embodiment, the control unit 7 may perform at least one of a first rotation control operation, a second rotation control operation, and a third rotation control operation as a rotation control operation that changes the rotation amount of the shaping unit area BSA based on the path information 700. The first rotation control operation, the second rotation control operation, and the third rotation control operation will be described below in order.

[0195] (2-2-1) First Rotation Control Operation First, the first rotation control operation will be described with reference to Fig. 16. Fig. 16 is a flowchart showing the flow of the first rotation control operation.

[0196] 16 , the control unit 7 acquires path information 700 (step S10). For example, the control unit 7 may acquire the path information 700 by generating the path information 700 by itself. For example, the control unit 7 may acquire the path information 700 generated by a path generation device from the path generation device that generates the path information 700. Note that, when a G code is used as the path information 700 as described above, the control unit 7 may acquire the G code as the path information 700.

[0197] Thereafter, the control unit 7 calculates the path angle θ based on the path information 700 acquired in step S10 (step S11). For example, if a G-code is used as the path information 700 as described above, the control unit 7 may calculate the path angle θ by analyzing the G-code. Specifically, the control unit 7 may identify a processing path P (i.e., a target movement trajectory MT0 of the printing unit area BSA) used by the printing system SYS to print the object from the path information 700, and calculate the path angle θ of each of multiple partial paths PP obtained by dividing the identified processing path P. Note that the method for calculating the path angle θ has already been described, and therefore its description will be omitted. However, as described above, if the path information 700 already includes path angle information 716 indicating the path angle θ, the control unit 7 does not need to calculate the path angle θ in step S11.

[0198] Thereafter, the modeling system SYS starts modeling of the object (Step S12). After the modeling of the object starts, the control unit 7 rotates the modeling unit area BSA based on the path angle θ calculated in Step S11 (Step S13). Specifically, the control unit 7 rotates the modeling unit area BSA moving along one partial path PP by a target rotation amount determined based on the path angle θ of the one partial path PP (Step S13).

[0199] For example, Fig. 17 shows a shaping unit area BSA that is rotated by the first rotation control operation in a situation where the shaping unit area BSA moves along a partial path PP#11 with a path angle θ of 0 degrees, and then moves along a partial path PP#12 with a path angle θ of -30 degrees. Fig. 17 also shows an example in which the angle at which the partial path PP intersects with a reference axis BA extending along a reference direction along the Y axis is used as the path angle θ. Fig. 17 also shows an example in which the angle at which the reference axis BB extending along the X axis, which is perpendicular to the reference axis BA, intersects with an axis along the scanning direction of the target irradiation area EA within the shaping unit area BSA is used as the rotation angle indicating the amount of rotation of the shaping unit area BSA. In the following explanation, we will use an example in which the rotation angle in the counterclockwise direction from the reference axis BB (e.g., the direction around the right-hand thread of the Z-axis) is a positive angle, while the rotation angle in the clockwise direction from the reference axis BB (e.g., the direction around the left-hand thread of the Z-axis) is a negative angle.

[0200] 17 , the control unit 7 may rotate the shaping unit area BSA moving along the partial path PP#11 so that the scanning direction of the target irradiation area EA within the shaping unit area BSA moving along the partial path PP#11 intersects (or is perpendicular to, in some cases) the partial path PP#11. In this case, the control unit 7 may rotate the shaping unit area BSA moving along the partial path PP#11 by a target rotation amount determined based on the path angle θ of the partial path PP#11. For example, the control unit 7 may calculate a target rotation amount (e.g., a target rotation angle) of the shaping unit area BSA moving along the partial path PP#11 based on the path angle θ of the partial path PP#11, and rotate the shaping unit area BSA moving along the partial path PP#11 so that the rotation amount (e.g., the rotation angle) of the shaping unit area BSA moving along the partial path PP#11 matches the calculated target rotation amount (e.g., the calculated target rotation angle). As an example, the control unit 7 may calculate the same angle as the path angle θ of the partial path PP#11 as the target rotation angle of the shaping unit area BSA moving along the partial path PP#11. In this case, the control unit 7 may rotate the shaping unit area BSA moving along the partial path PP#11 so that the rotation angle of the shaping unit area BSA moving along the partial path PP#11 matches the path angle θ of the partial path PP#11, which is 0 degrees. As a result, as shown in FIG. 17 , the scanning direction of the target irradiation area EA within the shaping unit area BSA moving along the partial path PP#11 intersects with (or is perpendicular to, in some cases) the partial path PP#11.

[0201] Thereafter, the state of the shaping unit area BSA changes from a first state in which the shaping unit area BSA moves along the partial path PP#11 to a second state in which the shaping unit area BSA moves along the partial path PP#12. The first state may be referred to as the first movement mode of the shaping unit area BSA, and the second state may be referred to as the second movement mode of the shaping unit area BSA. In this case, the control unit 7 may rotate the shaping unit area BSA moving along the partial path PP#12 so that the scanning direction of the target irradiation area EA within the shaping unit area BSA moving along the partial path PP#12 intersects (or is perpendicular to, in some cases) the partial path PP#12. In other words, the control unit 7 may change the amount of rotation of the shaping unit area BSA at the timing when the state of the shaping unit area BSA changes from the first state to the second state. In this case, the control unit 7 may rotate the shaping unit area BSA moving along the partial path PP#12 by a target rotation amount determined based on the path angle θ of the partial path PP#12. For example, the control unit 7 may calculate a target rotation amount (e.g., a target rotation angle) of the shaping unit area BSA moving along the partial path PP#12 based on the path angle θ of the partial path PP#12, and rotate the shaping unit area BSA moving along the partial path PP#12 so that the rotation amount (e.g., the rotation angle) of the shaping unit area BSA moving along the partial path PP#12 matches the calculated target rotation amount (e.g., the calculated target rotation angle). As an example, the control unit 7 may calculate the same angle as the path angle θ of the partial path PP#12 as the target rotation angle of the shaping unit area BSA moving along the partial path PP#12. In this case, the control unit 7 may rotate the shaping unit area BSA moving along the partial path PP#12 so that the rotation angle of the shaping unit area BSA moving along the partial path PP#12 matches the path angle θ of the partial path PP#12, which is −30 degrees. As a result, as shown in FIG. 17 , the scanning direction of the target irradiation area EA within the shaping unit area BSA moving along the partial path PP#12 intersects with (or is perpendicular to, in some cases) the partial path PP#12.

[0202] Thereafter, the control unit 7 repeats the same operation until the modeling system SYS finishes modeling of the model (step S15). That is, the control unit 7 may change the rotation amount of the modeling unit area BSA every time the path angle θ of the partial path PP changes. Specifically, the control unit 7 may change the rotation amount of the modeling unit area BSA from a first target rotation amount corresponding to the first angle to a second target rotation amount corresponding to the second angle at the timing when the path angle θ of the partial path PP through which the modeling unit area BSA moves changes from a first angle to a second angle.

[0203] In this way, by performing the first rotation control operation, the control unit 7 can change the rotation amount of the shaping unit area BSA in real time based on the path angle θ of the partial path PP along which the shaping unit area BSA moves. Therefore, it is unlikely that the deviation between the scanning direction of the target irradiation area EA within the shaping unit area BSA and the width direction of the object will exceed the tolerance. This improves the shaping accuracy of the shaping system SYS.

[0204] 16 , the control unit 7 calculates the target rotation amount of the printing unit area BSA moving along each partial path PP based on the path angle θ of each partial path PP after the printing system SYS starts printing the object. However, the control unit 7 may calculate the target rotation amount of the printing unit area BSA moving along each partial path PP in advance based on the path angle θ of each partial path PP before the printing system SYS starts printing the object. In this case, the control unit 7 may rotate the printing unit area BSA moving along each partial path PP after the printing system SYS starts printing the object so that the rotation amount of the printing unit area BSA moving along each partial path PP matches the target rotation amount calculated in advance for each partial path PP. The same applies to the second and third rotation control operations described later.

[0205] (2-2-2) Second Rotation Control Operation Next, the second rotation control operation will be described with reference to Fig. 18. Fig. 18 is a flowchart showing the flow of the second rotation control operation. Note that the same processes as those described in the first rotation control operation are assigned the same step numbers, and detailed descriptions thereof will be omitted.

[0206] 18 , in the case of performing the second rotation control operation, similarly to the case of performing the first rotation control operation, the control unit 7 acquires the path information 700 (step S10) and calculates the path angle θ (step S11). Thereafter, the modeling system SYS starts modeling of the object (step S12).

[0207] When performing the second rotation control operation after the start of modeling of the object, the control unit 7 rotates the modeling unit area BSA based on the path angle θ calculated in step S11 (step S13), as in the case of performing the first rotation control operation. However, in the second rotation control operation, even if the path angle θ of the partial path PP along which the modeling unit area BSA is moving changes, the control unit 7 may not rotate the modeling unit area BSA if the amount of change is less than a predetermined angle threshold. In other words, even if the path angle θ of the partial path PP along which the modeling unit area BSA is moving changes, the control unit 7 may maintain the current amount of rotation of the modeling unit area BSA if the amount of change is less than a predetermined angle threshold.

[0208] Specifically, the control unit 7 may not rotate the shaping unit area BSA if the change in the pass angle θ while the rotation amount of the shaping unit area BSA is fixed is less than a predetermined angle threshold. In other words, the control unit 7 may not rotate the shaping unit area BSA if the change in the pass angle θ since the last rotation of the shaping unit area BSA is less than a predetermined angle threshold. On the other hand, the control unit 7 rotates the shaping unit area BSA if the change in the pass angle θ while the rotation amount of the shaping unit area BSA is fixed is equal to or greater than a predetermined angle threshold. In other words, the control unit 7 rotates the shaping unit area BSA if the change in the pass angle θ since the last change in the rotation amount of the shaping unit area BSA is equal to or greater than a predetermined angle threshold. In this way, in the second rotation control operation, the control unit 7 rotates the shaping unit area BSA every time the pass angle θ changes by equal to or greater than the predetermined angle threshold. In other words, in the second rotation control operation, the control unit 7 rotates the shaping unit area BSA every time the change in the pass angle θ becomes equal to or greater than a predetermined angle threshold.

[0209] Therefore, in the second rotation control operation, the control unit 7 determines whether the change in the path angle θ is equal to or greater than a predetermined angle threshold (step S21). In particular, the control unit 7 determines whether the change in the path angle θ since the last change in the rotation amount of the shaping unit area BSA is equal to or greater than the predetermined angle threshold (step S21). If the determination in step S21 determines that the change in the path angle θ is equal to or greater than the predetermined angle threshold (step S21: Yes), the control unit 7 rotates the shaping unit area BSA based on the path angle θ of the partial path PP through which the shaping unit area BSA is moving at that time (step S13). That is, the control unit 7 rotates the shaping unit area BSA by a target rotation amount determined based on the path angle θ of the partial path PP through which the shaping unit area BSA is moving at that time (step S13). On the other hand, if the determination in step S21 determines that the change in the path angle θ is not equal to or greater than the predetermined angle threshold (step S21: No), the control unit 7 does not need to rotate the shaping unit area BSA. That is, the control unit 7 maintains the current rotation amount of the shaping unit area BSA.

[0210] Thereafter, the control unit 7 repeats the same operation until the modeling system SYS finishes modeling of the object (Step S14). That is, the control unit 7 may change the amount of rotation of the modeling unit area BSA every time the amount of change in the path angle θ of the partial path PP along which the modeling unit area BSA moves becomes equal to or greater than a predetermined angle threshold.

[0211] In this way, by performing the second rotation control operation, the control unit 7 can change the rotation amount of the shaping unit area BSA based on the path angle θ of the partial path PP along which the shaping unit area BSA moves. In particular, by performing the second rotation control operation, the control unit 7 can reduce the frequency of changing the rotation amount of the shaping unit area BSA compared to when performing the first rotation control operation. This reduces the processing load on the control unit 7.

[0212] Note that even when the second rotation control operation is performed, the possibility that the deviation between the scanning direction of the target irradiation area EA within the shaping unit area BSA and the width direction of the shaping object becomes so large as to exceed the tolerance is reduced compared to when the rotation control operation is not performed. Therefore, even when the second rotation control operation is performed, the shaping accuracy of the shaping system SYS is improved compared to when the rotation control operation is not performed. Note that, taking such an effect into consideration, the above-mentioned angle threshold may be set to an appropriate value that can avoid the occurrence of a situation in which the deviation between the scanning direction of the target irradiation area EA within the shaping unit area BSA and the width direction of the shaping object becomes so large as to exceed the tolerance.

[0213] In the above description, the control unit 7 determines whether the amount of change in the path angle θ is equal to or greater than the predetermined angle threshold after the start of modeling of the object (step S21 in FIG. 18 ). However, the control unit 7 may determine in advance whether the amount of change in the path angle θ is equal to or greater than the predetermined angle threshold before the start of modeling of the object. For example, the control unit 7 may determine in advance whether the amount of change in the path angle θ is equal to or greater than the predetermined angle threshold before the start of modeling of the object by simulating the operation of modeling the object. In this case, information on the determination result as to whether the amount of change in the path angle θ is equal to or greater than the predetermined angle threshold may be associated with the path information 700 and recorded. For example, information on the determination result as to whether the amount of change in the path angle θ of one partial path PP is equal to or greater than the predetermined angle threshold may be associated with the partial path information 710 of one partial path PP included in the path information 700 and recorded. In this case, information on the determination result as to whether the amount of change in the path angle θ of the partial path PP is equal to or greater than the predetermined angle threshold may be recorded in a file including the path information 700. Alternatively, information regarding the determination result as to whether the amount of change in the path angle θ of the partial path PP is equal to or greater than a predetermined angle threshold may be recorded as a file separate from the path information 700. Even when information regarding the determination result as to whether the amount of change in the path angle θ of the partial path PP is equal to or greater than a predetermined angle threshold is recorded as a file separate from the path information 700, the file containing information regarding the determination result as to whether the amount of change in the path angle θ of the partial path PP is equal to or greater than a predetermined angle threshold may be associated with the file containing the path information 700.

[0214] (2-2-3) Third Rotation Control Operation Next, the third rotation control operation will be described with reference to Fig. 19. Fig. 19 is a flowchart showing the flow of the third rotation control operation.

[0215] 19 , in the third rotation control operation, as in the second rotation control operation, the control unit 7 acquires the path information 700 (step S10) and calculates the path angle θ (step S11). Thereafter, the modeling system SYS starts modeling of the object (step S12).

[0216] When the third rotation control operation is performed after the start of modeling of the object, as in the case of the second rotation control operation, the control unit 7 rotates the modeling unit area BSA each time the change in the path angle θ becomes equal to or greater than the predetermined angle threshold (steps S21 and S13). However, in the third rotation control operation, when the modeling unit area BSA is moving along a series of multiple partial paths PP whose path length L is shorter than the predetermined length threshold, the control unit 7 rotates the modeling unit area BSA each time the change in the path angle θ becomes equal to or greater than the predetermined angle threshold. On the other hand, when the modeling unit area BSA is moving along partial paths PP whose path length L is longer than the predetermined length threshold, the control unit 7 may rotate the modeling unit area BSA even when the change in the path angle θ is less than the predetermined angle threshold.

[0217] Specifically, as shown in FIG. 19, the control unit 7 determines whether the path length L of one partial path PP is shorter than a predetermined length threshold (step S31).

[0218] If it is determined in step S31 that the path length L of the partial path PP is longer than the predetermined length threshold (step S31: No), the control unit 7 rotates the shaping unit area BSA moving along the partial path PP based on the path angle θ of the partial path PP calculated in step S11 (step S13). That is, the control unit 7 rotates the shaping unit area BSA moving along the partial path PP by a target rotation amount determined based on the path angle θ of the partial path PP (step S13).

[0219] On the other hand, if it is determined that the path length L of one partial path PP is shorter than a predetermined length threshold (step S31: Yes), the control unit 7 determines whether the path length L of another partial path PP located immediately before the one partial path PP is shorter than a predetermined length threshold (step S32).

[0220] If it is determined in step S32 that the path length L of the other partial path PP is longer than the predetermined length threshold (step S32: No), the state of the shaping unit area BSA is assumed to transition from a state in which the shaping unit area BSA moves along the other partial path PP, which is longer than the predetermined length threshold, to a state in which the shaping unit area BSA moves along the first partial path PP of a series of partial paths PP, which is shorter than the predetermined length threshold. In this case, the control unit 7 rotates the shaping unit area BSA moving along the one partial path PP based on the path angle θ of the one partial path PP calculated in step S11 (step S13). That is, the control unit 7 rotates the shaping unit area BSA moving along the one partial path PP by a target rotation amount determined based on the path angle θ of the one partial path PP (step S13).

[0221] On the other hand, if the result of the determination in step S32 is that the path length L of the other partial paths PP is shorter than the predetermined length threshold (step S32: Yes), it is assumed that the shaping unit area BSA has already moved along a series of multiple partial paths PP that are shorter than the predetermined length threshold. In this case, the control unit 7 determines whether the amount of change in the path angle θ is equal to or greater than the predetermined angle threshold (step S21). In particular, the control unit 7 determines whether the amount of change in the path angle θ since the last change in the rotation amount of the shaping unit area BSA is equal to or greater than the predetermined angle threshold (step S21).

[0222] If the determination result in step S21 indicates that the change in the path angle θ is equal to or greater than the predetermined angle threshold (step S21: Yes), the control unit 7 rotates the shaping unit area BSA based on the path angle θ of the partial path PP through which the shaping unit area BSA is moving at that time (step S13). That is, the control unit 7 rotates the shaping unit area BSA by a target rotation amount determined based on the path angle θ of the partial path PP through which the shaping unit area BSA is moving at that time (step S13). On the other hand, if the determination result in step S21 indicates that the change in the path angle θ is not equal to or greater than the predetermined angle threshold (step S21: No), the control unit 7 does not need to rotate the shaping unit area BSA. That is, the control unit 7 maintains the current rotation amount of the shaping unit area BSA.

[0223] Thereafter, the control unit 7 repeats the same operation until the modeling system SYS finishes modeling of the object (step S14).

[0224] Here, a specific example of the third rotation control operation will be described with reference to Fig. 20. Fig. 20 shows a shaping unit area BSA moving along a partial path PP#20 having a path angle θ of 0 degrees and longer than a predetermined length threshold, then moving along a partial path PP#21 having a path angle θ of -10 degrees and shorter than a predetermined length threshold, then moving along a partial path PP#22 having a path angle θ of -20 degrees and shorter than a predetermined length threshold, then moving along a partial path PP#23 having a path angle θ of -30 degrees and shorter than a predetermined length threshold, then moving along a partial path PP#24 having a path angle θ of -40 degrees and shorter than a predetermined length threshold, and then moving along a partial path PP#25 having a path angle θ of -50 degrees. 20 shows a shaping unit area BSA rotated by the third rotation control operation under the following circumstances: the shaping unit area BSA moves along a partial path PP#25 having a path angle θ of −60 degrees and shorter than the predetermined length threshold, then moves along a partial path PP#26 having a path angle θ of −70 degrees and shorter than the predetermined length threshold, then moves along a partial path PP#27 having a path angle θ of −80 degrees and shorter than the predetermined length threshold, then moves along a partial path PP#28 having a path angle θ of −80 degrees and shorter than the predetermined length threshold, and then moves along a partial path PP#29 having a path angle θ of −90 degrees and longer than the predetermined length threshold. That is, FIG. 20 shows a shaping unit area BSA rotated by the third rotation control operation under the following circumstances: the shaping unit area BSA moves along a partial path PP#20 longer than the predetermined length threshold, then moves along a series of partial paths PP#21 to PP#28 shorter than the predetermined length threshold, and then moves along a partial path PP#29 longer than the predetermined length threshold.

[0225] The definitions of the path angle θ and the rotation angle of the printing unit area BSA in Fig. 20 are the same as those in Fig. 17. In Fig. 20, the path angle θ of each of a series of partial paths PP#21 to PP#28 that are shorter than a predetermined length threshold may be considered equivalent to the angle each of the partial paths PP#21 to PP#28 makes with respect to the partial path PP#20 that is longer than the predetermined length threshold and is located immediately before the series of partial paths PP#21 to PP#28 that are shorter than the predetermined length threshold. In the following explanation, an example will be given in which the predetermined angle threshold is 30 degrees.

[0226] As shown in FIG. 20 , the path length L of the partial path PP#20 is longer than a predetermined length threshold (step S31: No in FIG. 19 ). Therefore, the control unit 7 may rotate the shaping unit area BSA moving along the partial path PP#20 by a target rotation amount determined based on the path angle θ of the partial path PP#20, regardless of the amount of change in the path angle θ. As an example, the control unit 7 may calculate the same angle as the path angle θ of the partial path PP#20 as the target rotation angle of the shaping unit area BSA moving along the partial path PP#20. In this case, the control unit 7 may rotate the shaping unit area BSA moving along the partial path PP#20 so that the rotation angle of the shaping unit area BSA moving along the partial path PP#20 matches 0 degrees, which is the path angle θ of the partial path PP#20. As a result, as shown in FIG. 20, the scanning direction of the target irradiation area EA within the shaping unit area BSA moving along the partial path PP#20 intersects with the partial path PP#20 (orthogonal in some cases).

[0227] Thereafter, the state of the shaping unit area BSA changes from a state in which the shaping unit area BSA moves along the partial path PP#20 to a state in which the shaping unit area BSA moves along the partial path PP#21. In this case, the path length L of the partial path PP#21 is shorter than a predetermined length threshold (step S31 in FIG. 19 : Yes), and the path length L of the partial path PP#20 immediately preceding the partial path PP#21 is longer than a predetermined length threshold (step S32 in FIG. 19 : No). Therefore, the control unit 7 may rotate the shaping unit area BSA moving along the partial path PP#21 by a target rotation amount determined based on the path angle θ of the partial path PP#21, regardless of the amount of change in the path angle θ. As an example, the control unit 7 may calculate the same angle as the path angle θ of the partial path PP#21 as the target rotation angle of the shaping unit area BSA moving along the partial path PP#21. In this case, the control unit 7 may rotate the shaping unit area BSA moving along the partial path PP#21 so that the rotation angle of the shaping unit area BSA moving along the partial path PP#21 matches the path angle θ of the partial path PP#21, which is −10 degrees. As a result, as shown in FIG. 20 , the scanning direction of the target irradiation area EA within the shaping unit area BSA moving along the partial path PP#21 intersects with (or is perpendicular to, in some cases) the partial path PP#21.

[0228] Thereafter, the state of the shaping unit area BSA changes from a state in which the shaping unit area BSA moves along the partial path PP#21 to a state in which the shaping unit area BSA moves along the partial path PP#22. In this case, the path length L of the partial path PP#22 is shorter than a predetermined length threshold (step S31 in FIG. 19 : Yes), and the path length L of the partial path PP#21 immediately preceding the partial path PP#22 is shorter than a predetermined length threshold (step S32 in FIG. 19 : Yes). Therefore, the control unit 7 determines whether the change in the path angle θ since the last change in the rotation amount of the shaping unit area BSA exceeds a predetermined angle threshold (step S21 in FIG. 19 ). Because the rotation amount of the shaping unit area BSA was last changed when the shaping unit area BSA moved along the partial path PP#21 with a path angle θ of −10 degrees, the change in the path angle θ at the time when the shaping unit area BSA moved along the partial path PP#21 with a path angle θ of −20 degrees was 10 degrees. Therefore, the change in the path angle θ (10 degrees) is not greater than the predetermined angle threshold (30 degrees) (step S21: No). Therefore, the control unit 7 does not need to rotate the shaping unit area BSA moving along the partial path PP#22. In this case, the rotation amount of the shaping unit area BSA moving along the partial path PP#22 is maintained at the same amount as the rotation amount of the shaping unit area BSA moving along the partial path PP#21. Note that, as shown in FIG. 20 , even if the rotation amount is not changed in this way, it is unlikely that the deviation between the scanning direction of the target irradiation area EA within the shaping unit area BSA and the width direction of the object will be large enough to exceed the allowable amount.

[0229] Thereafter, the state of the shaping unit area BSA changes from a state in which the shaping unit area BSA moves along partial path PP#22 to a state in which the shaping unit area BSA moves along partial path PP#23. In this case, the path length L of partial path PP#23 is shorter than a predetermined length threshold (step S31: Yes in FIG. 19 ), and the path length L of partial path PP#22 immediately preceding partial path PP#23 is shorter than a predetermined length threshold (step S32: Yes in FIG. 19 ). Furthermore, the change in path angle θ (20 degrees) at the time when the shaping unit area BSA moves along partial path PP#23 is not greater than a predetermined angle threshold (30 degrees) (step S21: No in FIG. 19 ). Therefore, the control unit 7 does not need to rotate the shaping unit area BSA moving along partial path PP#23. In this case, the rotation amount of the shaping unit area BSA moving along partial path PP#23 is maintained at the same amount as the rotation amount of the shaping unit area BSA moving along partial path PP#21. Note that, even if the rotation amount is not changed in this way, as shown in Fig. 20, it is unlikely that the deviation between the scanning direction of the target irradiation area EA within the shaping unit area BSA and the width direction of the object will become so large as to exceed the allowable amount.

[0230] Thereafter, the state of the shaping unit area BSA changes from a state in which the shaping unit area BSA moves along the partial path PP#23 to a state in which the shaping unit area BSA moves along the partial path PP#24. In this case, the path length L of the partial path PP#24 is shorter than a predetermined length threshold (step S31: Yes in FIG. 19 ), and the path length L of the partial path PP#23 immediately preceding the partial path PP#24 is shorter than a predetermined length threshold (step S32: Yes in FIG. 19 ). Meanwhile, the change in the path angle θ (30 degrees) at the time when the shaping unit area BSA moves along the partial path PP#24 is equal to or greater than a predetermined angle threshold (30 degrees) (step S21: Yes in FIG. 19 ). Therefore, the control unit 7 may rotate the shaping unit area BSA moving along the partial path PP#24 by a target rotation amount determined based on the path angle θ of the partial path PP#24. As an example, the control unit 7 may calculate the same angle as the path angle θ of the partial path PP#24 as the target rotation angle of the shaping unit area BSA moving along the partial path PP#24. In this case, the control unit 7 may rotate the shaping unit area BSA moving along the partial path PP#24 so that the rotation angle of the shaping unit area BSA moving along the partial path PP#24 matches the path angle θ of the partial path PP#24, which is −40 degrees. As a result, as shown in FIG. 20 , the scanning direction of the target irradiation area EA within the shaping unit area BSA moving along the partial path PP#24 intersects with (or is perpendicular to, in some cases) the partial path PP#24.

[0231] Thereafter, the state of the shaping unit area BSA changes from a state in which the shaping unit area BSA moves along partial path PP#24 to a state in which the shaping unit area BSA moves along partial path PP#25. In this case, the path length L of partial path PP#25 is shorter than a predetermined length threshold (step S31 in FIG. 19 : Yes), and the path length L of partial path PP#24 immediately preceding partial path PP#25 is shorter than a predetermined length threshold (step S32 in FIG. 19 : Yes). Therefore, the control unit 7 determines whether the change in the path angle θ since the last change in the rotation amount of the shaping unit area BSA exceeds a predetermined angle threshold (step S21 in FIG. 19 ). Because the rotation amount of the shaping unit area BSA was last changed when the shaping unit area BSA moved along partial path PP#24 with a path angle θ of −40 degrees, the change in the path angle θ at the time when the shaping unit area BSA moved along partial path PP#25 with a path angle θ of −50 degrees was 10 degrees. Therefore, the change in the path angle θ (10 degrees) is not greater than the predetermined angle threshold (30 degrees) (step S21: No in FIG. 19 ). Therefore, the control unit 7 does not need to rotate the shaping unit area BSA moving along partial path PP#25. In this case, the rotation amount of the shaping unit area BSA moving along partial path PP#25 is maintained at the same amount as the rotation amount of the shaping unit area BSA moving along partial path PP#24. Note that, as shown in FIG. 20 , even if the rotation amount is not changed in this way, it is unlikely that the deviation between the scanning direction of the target irradiation area EA within the shaping unit area BSA and the width direction of the object will become so large as to exceed the allowable amount.

[0232] Thereafter, the control unit 7 repeats the same operation. As a result, as shown in FIG. 20 , the rotation amount of the shaping unit area BSA moving along partial path PP#26 is maintained at the same amount as the rotation amount of the shaping unit area BSA moving along partial path PP#24. The rotation amount of the shaping unit area BSA moving along partial path PP#27 is changed to a target rotation amount determined based on the path angle θ of partial path PP#27. The rotation amount of the shaping unit area BSA moving along partial path PP#28 is maintained at the same amount as the rotation amount of the shaping unit area BSA moving along partial path PP#27. The rotation amount of the shaping unit area BSA moving along partial path PP#29 is changed to a target rotation amount determined based on the path angle θ of partial path PP#29.

[0233] In the above description, after the start of modeling of the object, the control unit 7 determines whether the path length L of one partial path PP is longer than a predetermined length threshold (step S31 in FIG. 19 ), whether the path length L of another partial path PP located immediately before the one partial path PP is shorter than the predetermined length threshold (step S32 in FIG. 19 ), and whether the amount of change in the path angle θ is equal to or greater than a predetermined angle threshold (step S21 in FIG. 19 ). However, before the start of modeling of the object, the control unit 7 may previously determine whether the path length L of one partial path PP is longer than a predetermined length threshold, whether the path length L of another partial path PP located immediately before the one partial path PP is shorter than the predetermined length threshold, and whether the amount of change in the path angle θ is equal to or greater than a predetermined angle threshold. For example, the control unit 7 may perform the above-described determination before the start of modeling of the object by simulating the operation of modeling the object. In this case, information related to the determination result may be recorded in association with the path information 700. For example, information regarding the determination result for one partial path PP may be recorded in association with the partial path information 710 of one partial path PP included in the path information 700. In this case, the information regarding the determination result may be recorded in a file including the path information 700. Alternatively, the information regarding the determination result may be recorded as a file separate from the path information 700. Even when the information regarding the determination result is recorded as a file separate from the path information 700, the file including the information regarding the determination result may be associated with the file including the path information 700.

[0234] (2-3) Irradiation Condition Changing Operation In the present embodiment, the control unit 7 may perform an irradiation condition changing operation in addition to the rotation control operation described above. The irradiation condition changing operation may include an operation of changing the irradiation conditions of the shaping light EL based on the shaping conditions for shaping a shaped object.

[0235] In this case, when the modeling conditions are the first modeling conditions, the control unit 7 may use the first irradiation condition as the irradiation condition of the modeling light EL to model a model. The first irradiation condition may be set based on the first modeling condition. On the other hand, when the modeling conditions are other modeling conditions different from the first modeling conditions, the control unit 7 may use other irradiation conditions different from the first irradiation condition as the irradiation condition of the modeling light EL to model a model. The other irradiation condition may be set based on the other modeling conditions. The other irradiation condition is typically different from the first irradiation condition. However, the other irradiation condition may be the same as the first irradiation condition.

[0236] In this case, compared to when the irradiation conditions of the modeling light EL are not changed based on the modeling conditions, the modeling system SYS can model a model using appropriate irradiation conditions based on the modeling conditions.

[0237] The control unit 7 may change the irradiation conditions of the shaping light EL#1 and the irradiation conditions of the shaping light EL#2 separately. Alternatively, the control unit 7 may change the irradiation conditions of the shaping light EL#1 and the irradiation conditions of the shaping light EL#2 together. The control unit 7 may change at least one of the irradiation conditions of the shaping light EL#1 and the irradiation conditions of the shaping light EL#2 so that the irradiation conditions of the shaping light EL#1 and the irradiation conditions of the shaping light EL#2 are the same. Alternatively, the control unit 7 may change at least one of the irradiation conditions of the shaping light EL#1 and the irradiation conditions of the shaping light EL#2 so that the irradiation conditions of the shaping light EL#1 and the irradiation conditions of the shaping light EL#2 are different.

[0238] The control unit 7 may change the irradiation conditions for each partial pass PP based on the printing conditions. Specifically, the control unit 7 may change the irradiation conditions of the printing light EL for forming an object along each partial pass PP based on the printing conditions for forming an object along each partial pass PP. However, the control unit 7 may change the irradiation conditions for each pass group including at least two partial passes PP based on the printing conditions.

[0239] (2-3-1) Specific Examples of Modeling Conditions (2-3-1-1) First Specific Example of Modeling Conditions The modeling conditions may include a condition related to the path angle θ of the partial paths PP. In this case, the control unit 7 may change the irradiation conditions of the modeling light EL for modeling an object along each partial path PP, based on the path angle θ of each partial path PP.

[0240] For example, when forming an object along a first partial path PP having a first path angle θ, the control unit 7 may form the object using first irradiation conditions as irradiation conditions of the patterning light EL for forming the object along the first partial path PP. The first irradiation conditions may be set based on the first path angle.

[0241] For example, when forming an object along a second partial pass PP in which the path angle θ is a second path angle different from the first path angle, the control unit 7 may form the object using second irradiation conditions as irradiation conditions of the patterning light EL for forming the object along the second partial pass PP. The second irradiation conditions may be set based on the second path angle. The second irradiation conditions are typically different from the first irradiation conditions. However, the second irradiation conditions may be the same as the first irradiation conditions.

[0242] For example, when forming an object along a third partial pass PP in which the path angle θ is a third path angle different from the first and second path angles, the control unit 7 may form the object using third irradiation conditions as irradiation conditions for the patterning light EL for forming the object along the third partial pass PP. The third irradiation conditions may be set based on the third path angle. The third irradiation conditions are typically different from the first and second irradiation conditions. However, the third irradiation conditions may be the same as at least one of the first and second irradiation conditions.

[0243] In this way, when the modeling conditions include a condition related to the pass angle θ of the partial pass PP, the modeling system SYS can model a model using irradiation conditions that are appropriately selected based on the pass angle θ. As a result, the modeling system SYS can appropriately model a model compared to when irradiation conditions are not selected based on the pass angle θ.

[0244] The first pass angle may be a positive angle. That is, the first pass angle may be an angle included in the range of +0 degrees to +180 degrees. The second pass angle may be a negative angle. That is, the second pass angle may be an angle included in the range of -0 degrees to -180 degrees. The third pass angle may be 0 degrees.

[0245] (2-3-1-2) Second Specific Example of Modeling Conditions The modeling conditions may include a condition related to a target line width of the object to be modeled along each partial path PP. In this case, the control unit 7 may change the irradiation conditions of the modeling light EL for modeling the object along each partial path PP, based on the target line width of the object to be modeled along each partial path PP.

[0246] For example, when forming an object having a first width along the fourth partial pass PP (i.e., an object whose target line width is the first width), the control unit 7 may form the object using fourth irradiation conditions as irradiation conditions for the modeling light EL for forming the object along the fourth partial pass PP. The fourth irradiation conditions may be set based on the first width.

[0247] For example, when forming an object having a second width different from the first width along the fifth partial pass PP (i.e., an object having a target line width of the second width), the control unit 7 may form the object using fifth irradiation conditions as irradiation conditions for the forming light EL for forming the object along the fifth partial pass PP. The fifth irradiation conditions may be set based on the second width. The fifth irradiation conditions are typically different from the fourth irradiation conditions. However, the fifth irradiation conditions may be the same as the fourth irradiation conditions.

[0248] In this way, when the modeling conditions include conditions related to the target line width of the object, the modeling system SYS can model the object using irradiation conditions that are appropriately selected based on the target line width. As a result, the modeling system SYS is more likely to be able to model an object having the same width as the target line width, compared to when irradiation conditions are not selected based on the target line width.

[0249] (2-3-1-3) Third Specific Example of Modeling Conditions The modeling conditions may include conditions related to the stacking position of the structure layer SL formed by the modeling object to be modeled along the partial paths PP. In this case, the control unit 7 may change the irradiation conditions of the modeling light EL for modeling the model along each partial path PP, based on the stacking position of the structure layer SL formed by the modeling object to be modeled along each partial path PP.

[0250] For example, when forming a modeled object that forms a first structural layer SL that is stacked at the first stacking position along the sixth partial pass PP, the control unit 7 may form the modeled object using sixth irradiation conditions as irradiation conditions for the modeling light EL for forming the modeled object along the sixth partial pass PP. The sixth irradiation conditions may be set based on the stacking position of the first structural layer SL (i.e., the first stacking position).

[0251] For example, when forming a modeled object that includes a second structure layer SL that is stacked at a second stacking position along the seventh partial pass PP, which is different from the first stacking position, the control unit 7 may form the modeled object using seventh irradiation conditions as irradiation conditions for the modeling light EL for forming the modeled object along the seventh partial pass PP. The seventh irradiation conditions may be set based on the stacking position of the second structure layer SL (i.e., the second stacking position). The seventh irradiation conditions are typically different from the sixth irradiation conditions. However, the seventh irradiation conditions may be the same as the sixth irradiation conditions.

[0252] In this way, when the modeling conditions include conditions related to the stacking position of the structure layer SL formed by the modeling object, the modeling system SYS can model the model using irradiation conditions that are appropriately selected based on the stacking position of the structure layer SL. As a result, the modeling system SYS is more likely to be able to appropriately model a model for constituting the structure layer SL that is stacked at a desired stacking position, compared to when the irradiation conditions are not selected based on the stacking position of the structure layer SL.

[0253] As an example, the top structural layer SL and the bottom structural layer SL of the plurality of structural layers SL are not sandwiched between two other structural layers SL. On the other hand, a structural layer SL (hereinafter referred to as a middle structural layer SL) different from the top structural layer SL and the bottom structural layer SL of the plurality of structural layers SL is sandwiched between two other structural layers SL. Therefore, during the additional processing operation, the characteristics of the heat applied to the top structural layer SL and the bottom structural layer SL may differ from the characteristics of the heat applied to the middle structural layer SL. In this case, the control unit 7 may set the irradiation conditions of the shaping light EL for forming the top structural layer SL and the bottom structural layer SL so that the irradiation conditions of the shaping light EL for forming the middle structural layer SL are different from the irradiation conditions of the shaping light EL for forming the middle structural layer SL. In other words, the first structural layer SL stacked at the first stacking position may include at least one of the top structural layer SL and the bottom structural layer SL. That is, the first stacking position may include at least one of a stacking position of the top layer and a stacking position of the bottom layer. The second structural layer SL stacked at the second stacking position may include a structural layer SL of the middle layer. That is, the second stacking position may include a structural layer SL of the middle layer. As a result, the modeling system SYS can appropriately model the structural layer SL of the top layer, the structural layer SL of the middle layer, and the structural layer SL of the bottom layer.

[0254] (2-3-1-4) Fourth Specific Example of Modeling Conditions The modeling conditions may include a condition related to the path length L of the partial paths PP. In this case, the control unit 7 may change the irradiation conditions of the modeling light EL for modeling an object along each partial path PP, based on the path length L of each partial path PP.

[0255] For example, when forming an object along an eighth partial path PP whose path length L is the first length, the control unit 7 may form the object using eighth irradiation conditions as irradiation conditions of the patterning light EL for forming the object along the eighth partial path PP. The eighth irradiation conditions may be set based on the first length.

[0256] For example, when forming a model along a ninth partial path PP in which the path length L is a second length different from the first length, the control unit 7 may form the model using ninth irradiation conditions as irradiation conditions for the modeling light EL for forming the model along the ninth partial path PP. The ninth irradiation conditions may be set based on the second length. The ninth irradiation conditions are typically different from the eighth irradiation conditions. However, the ninth irradiation conditions may be the same as the eighth irradiation conditions.

[0257] In this way, when the modeling conditions include conditions related to the path length L, the modeling system SYS can model an object using irradiation conditions that are appropriately selected based on the path length L. As a result, the modeling system SYS is more likely to be able to model an object having the same length as the path length L, compared to when irradiation conditions are not selected based on the path length L.

[0258] (2-3-2) Specific Examples of Irradiation Conditions (2-3-2-1) First Specific Example of Irradiation Conditions The irradiation conditions may include a condition related to the scanning trajectory of the target irradiation area EA within the shaping unit area BSA. The condition related to the scanning trajectory may be referred to as a condition related to the wobble shape. In this case, the control unit 7 may change the scanning trajectory of the target irradiation area EA for forming the object along each partial path PP, based on the shaping conditions for forming the object to be formed along each partial path PP. In other words, the control unit 7 may change the scanning trajectory of the target irradiation area EA within the shaping unit area BSA that moves along each partial path PP, based on the shaping conditions for forming the object to be formed along each partial path PP.

[0259] For example, when the printing conditions are first printing conditions, the control unit 7 may print a model by controlling at least one of the galvanometer mirrors 2146 and 2156 so that the target irradiation area EA moves along a first scanning trajectory within the printing unit area BSA. The first scanning trajectory may be set based on the first printing conditions. On the other hand, when the printing conditions are second printing conditions different from the first printing conditions, the control unit 7 may print a model by controlling at least one of the galvanometer mirrors 2146 and 2156 so that the target irradiation area EA moves along a second scanning trajectory different from the first scanning trajectory within the printing unit area BSA. The second scanning trajectory may be set based on the second printing conditions. The second scanning trajectory is typically different from the first scanning trajectory. However, the second scanning trajectory may be the same as the first scanning trajectory.

[0260] The conditions related to the scanning trajectory of the target irradiation area EA may include conditions related to the type of shape of the scanning trajectory. An example of the type of shape of the scanning trajectory is a "sine wave" type shown in Fig. 5(a). Another example of the type of shape of the scanning trajectory is a "circle" type shown in Fig. 6(a). Another example of the type of shape of the scanning trajectory is a "rectangle" type shown in Fig. 6(b).

[0261] The conditions related to the scanning trajectory of the target irradiation area EA may include conditions related to the waveform of the scanning trajectory. For example, as described above, the scanning trajectory of the target irradiation area EA may be expressible by Equation 1, "X = Ax × sin(2π × fx × t + αx)," and Equation 3, "Y = Ay × sin(2π × fy × t + αy)." In this case, the conditions related to the waveform of the scanning trajectory may include at least one of a condition related to the amplitude Ax, a condition related to the amplitude Ay, a condition related to the frequency fx, a condition related to the frequency fy, a condition related to the phase amount αx, and a condition related to the phase amount αy.

[0262] The amplitude Ax may be considered to be substantially equivalent to the size of the shaping unit area BSA in the X-axis direction. In this case, the conditions related to the amplitude Ax may be considered to be equivalent to the conditions related to the size of the shaping unit area BSA in the X-axis direction (pattern size). Similarly, the amplitude Ay may be considered to be substantially equivalent to the size of the shaping unit area BSA in the Y-axis direction. In this case, the conditions related to the amplitude Ay may be considered to be equivalent to the conditions related to the size of the shaping unit area BSA in the Y-axis direction (pattern size).

[0263] Furthermore, each of the frequencies fx and fy may be considered to be equivalent to the drive frequency of at least one of the galvanometer mirrors 2146 and 2156. Specifically, the frequency fx indicating the scanning trajectory of the target irradiation area EA#1 may be considered to be equivalent to the drive frequency of the X-scanning mirror 2146MX of the galvanometer mirror 2146. The frequency fy indicating the scanning trajectory of the target irradiation area EA#1 may be considered to be equivalent to the drive frequency of the Y-scanning mirror 2146MY of the galvanometer mirror 2146. The frequency fx indicating the scanning trajectory of the target irradiation area EA#2 may be considered to be equivalent to the drive frequency of the X-scanning mirror 2156MX of the galvanometer mirror 2156. The frequency fy indicating the scanning trajectory of the target irradiation area EA#2 may be considered to be equivalent to the drive frequency of the Y-scanning mirror 2156MY of the galvanometer mirror 2156. In this case, the condition related to the frequency fx indicating the scanning trajectory of the target irradiation area EA#1 may be considered equivalent to the condition related to the drive frequency of the X scanning mirror 2146MX. The condition related to the frequency fy indicating the scanning trajectory of the target irradiation area EA#1 may be considered equivalent to the condition related to the drive frequency of the Y scanning mirror 2146MY. The condition related to the frequency fx indicating the scanning trajectory of the target irradiation area EA#2 may be considered equivalent to the condition related to the drive frequency of the X scanning mirror 2156MX. The condition related to the frequency fy indicating the scanning trajectory of the target irradiation area EA#2 may be considered equivalent to the condition related to the drive frequency of the Y scanning mirror 2156MY.

[0264] (2-3-2-2) Second Specific Example of Irradiation Conditions The irradiation conditions may include conditions related to the characteristics of the shaping light EL. In this case, the control unit 7 may change the characteristics of the shaping light EL for forming an object along each partial path PP, based on the shaping conditions for forming the object along each partial path PP.

[0265] For example, when the printing conditions are first printing conditions, the control unit 7 may print a model by irradiating the printing surface MS with printing light EL having a first characteristic. The first characteristic may be set based on the first printing conditions. On the other hand, when the printing conditions are second printing conditions that are different from the first printing conditions, the control unit 7 may print a model by irradiating the printing surface MS with printing light EL having a second characteristic. The second characteristic may be set based on the second printing conditions. The second characteristic is typically different from the first characteristic. However, the second characteristic may be the same as the first characteristic.

[0266] The characteristics of the shaping light EL may include the intensity of the shaping light EL. The characteristics of the shaping light EL may include the intensity distribution of the shaping light EL on the shaping surface MS. If the shaping light EL includes pulsed light, the characteristics of the shaping light EL may include at least one of the emission time of the pulsed light, the emission cycle of the pulsed light, and the ratio between the emission time of the pulsed light and the emission cycle of the pulsed light (so-called duty ratio). If the shaping light EL includes pulsed light, the characteristics of the shaping light EL may include the modulation mode of the intensity of the pulsed light (e.g., the presence or absence of DC modulation that periodically changes the DC component of the intensity of the pulsed light).

[0267] (2-3-2-3) Third Specific Example of Irradiation Conditions The irradiation conditions may include conditions related to the target size of the molten pool MP to be formed on the printing surface MS by the printing light EL. In this case, the control unit 7 may change the target size of the molten pool MP to be formed to print an object along each partial path PP, based on the printing conditions for printing an object along each partial path PP.

[0268] For example, when the building conditions are first building conditions, the control unit 7 may build a model by forming a molten pool MP on the building surface MS that has the same size as a first target size. The first target size may be set based on the first building conditions. On the other hand, when the building conditions are second building conditions that are different from the first building conditions, the control unit 7 may build a model by forming a molten pool MP on the building surface MS that has the same size as a second target size. The second target size may be set based on the second building conditions. The second target size is typically different from the first target size. However, the second target size may be the same as the first target size.

[0269] (2-3-3) Flow of Irradiation Condition Changing Operation Next, the flow of the irradiation condition changing operation will be described with reference to Fig. 21. Fig. 21 is a flowchart showing the flow of the irradiation condition changing operation.

[0270] 21, the control unit 7 acquires path information 700 (step S40). The operation of step S40 may be the same as the operation of step S10 in FIG.

[0271] Thereafter, the control unit 7 calculates the printing conditions for printing the object based on the path information 700 acquired in step S40 (step S41). For example, when a G-code is used as the path information 700 as described above, the control unit 7 may calculate the printing conditions by analyzing the G-code. Specifically, the control unit 7 may identify, from the path information 700, a processing path P (i.e., a target movement trajectory MT0 of the printing unit area BSA) for the printing system SYS to print the object, and calculate the printing conditions for printing the object along each of a plurality of partial paths PP obtained by dividing the identified processing path P.

[0272] If the modeling conditions include a condition related to the path angle θ of the partial path PP, the control unit 7 may calculate the path angle θ of each partial path PP based on the path information 700. Note that the method for calculating the path angle θ has already been explained, and therefore its explanation will be omitted. However, as described above, if the path information 700 already includes path angle information 716 indicating the path angle θ, the control unit 7 does not need to calculate the path angle θ in step S41.

[0273] If the modeling conditions include conditions related to the target line width of the object to be modeled along the partial paths PP, the control unit 7 may calculate the target line width of each partial path PP based on the path information 700. Note that the method for calculating the target line width has already been explained, and therefore its explanation will be omitted. However, as described above, if the path information 700 already includes line width information 713 indicating the target line width, the control unit 7 does not need to calculate the target line width in step S41.

[0274] If the modeling conditions include conditions related to the stacking position of the structural layer SL formed by the object modeled along the partial paths PP, the control unit 7 may calculate the stacking position of the structural layer SL formed by the object modeled along each partial path PP, based on the path information 700. Note that the method for calculating the stacking position of the structural layer SL has already been explained, and therefore its explanation will be omitted. However, as described above, if the path information 700 already includes layer information 714 indicating the stacking position of the structural layer SL, the control unit 7 does not need to calculate the stacking position of the structural layer SL in step S41.

[0275] If the modeling conditions include a condition related to the path length L of the partial path PP, the control unit 7 may calculate the path length L of each partial path PP based on the path information 700. Note that the method for calculating the path length L has already been explained, and therefore its explanation will be omitted. However, as described above, if the path information 700 already includes the path length information 715 indicating the path length L, the control unit 7 does not need to calculate the path length L in step S41.

[0276] In parallel with or before or after the operations from step S40 to step S41, the control unit 7 registers the irradiation conditions of the shaping light EL (step S42). In particular, the control unit 7 registers a plurality of irradiation conditions of the shaping light EL (step S42). In this case, the control unit 7 selects one irradiation condition corresponding to the shaping conditions calculated in step S41 from the plurality of irradiation conditions registered in step S42 as the irradiation condition actually used by the shaping system SYS.

[0277] The control unit 7 may register the irradiation conditions of the modeling light EL based on instructions from a user of the modeling system SYS. That is, the control unit 7 may register the irradiation conditions of the modeling light EL specified by the user of the modeling system SYS. Alternatively, the control unit 7 may register the irradiation conditions of the modeling light EL regardless of instructions from the user of the modeling system SYS. For example, the control unit 7 may register default irradiation conditions. For example, the control unit 7 may register irradiation conditions as initial conditions.

[0278] When the irradiation conditions of the modeling light EL are registered based on an instruction from a user of the modeling system SYS, the control unit 7 may control the display unit 9 to display a registration GUI (Graphical User Interface) 90 that the user can operate to register the irradiation conditions. In this case, the user may register the irradiation conditions of the modeling light EL using the registration GUI 90. Specifically, the user may register the irradiation conditions of the modeling light EL of the user by operating the input unit 8 including an operation device that the user can operate (e.g., at least one of a keyboard, a mouse, and a touch panel) while viewing the registration GUI 90.

[0279] 22 shows an example of the registration GUI 90. The registration GUI 90 may include an ID label 901 indicating an ID for uniquely identifying the registered irradiation condition, a name label 902 indicating the name (pattern name) of the registered irradiation condition, a registration button 903 that the user should press to actually register each irradiation condition, and a text box 904 for inputting the angle threshold used in the second and third rotation control operations. Note that when an irradiation condition for which an angle threshold has not been input is used, the modeling system SYS does not need to perform the second and third rotation control operations.

[0280] When the user presses the registration button 903, the control unit 7 may control the display unit 9 to display a condition input GUI 91 that the user can operate to input details of the irradiation conditions. An example of the condition input GUI 91 is shown in FIG. 23 . As shown in Figure 23, the condition input GUI 91 may include a text box 911 for inputting conditions regarding the type of shape of the scanning trajectory of the target irradiation area EA within the shaping unit area BSA, a text box 912 for inputting conditions regarding the waveform of the scanning trajectory of the target irradiation area EA within the shaping unit area BSA, a text box 913 for inputting conditions regarding the characteristics of the shaping light EL (in the example shown in Figure 23, conditions regarding the presence or absence of DC modulation and the modulation point in DC modulation), a text box 914 for inputting conditions regarding the target size of the molten pool MP, and a text box 915 for inputting conditions regarding the relationship between the phase of movement of the target irradiation area EA#1 within the shaping unit area BSA#1 and the phase of movement of the target irradiation area EA#2 within the shaping unit area BSA#2.

[0281] 21 , the modeling system SYS then starts modeling of the object (step S43). After the modeling of the object starts, the control unit 7 changes the irradiation conditions based on the modeling conditions (step S44). Specifically, the control unit 7 may change the irradiation conditions of the modeling light EL for modeling the object along the one partial path PP, based on the modeling conditions for modeling the object along the one partial path PP. For example, the control unit 7 may select the irradiation conditions of the modeling light EL for modeling the object along the one partial path PP from the multiple irradiation conditions registered in step S42, based on the modeling conditions for modeling the object along the one partial path PP. Then, the control unit 7 may change the irradiation conditions of the modeling light EL for modeling the object along the one partial path PP so that the irradiation conditions of the modeling light EL for modeling the object along the one partial path PP become the selected irradiation conditions.

[0282] In step S44, the control unit 7 may classify the printing conditions for forming the object to be printed along one partial path PP into one of a plurality of printing condition patterns. Thereafter, the control unit 7 may select the irradiation conditions of the printing light EL for forming the object along one partial path PP, based on the one printing condition pattern into which the printing conditions have been classified. In this case, the control unit 7 does not need to change the irradiation conditions even when the printing conditions are slightly different. This reduces the processing load for performing the irradiation condition change operation.

[0283] An example of multiple modeling condition patterns is shown in FIG. 24 . FIG. 24 shows fourteen types of modeling condition patterns. That is, FIG. 24 shows an example in which modeling conditions are classified into one of fourteen types of modeling condition patterns. As shown in FIG. 24 , the multiple modeling condition patterns may include a first modeling condition pattern into which modeling conditions in which a target line width is less than 1 mm are classified. The multiple modeling condition patterns may include a second modeling condition pattern into which modeling conditions in which a target line width is 1 mm or more and less than 2 mm are classified. The multiple modeling condition patterns may include a third modeling condition pattern into which modeling conditions in which a target line width is 2 mm or more, the stacking position of the structural layer SL is the lowest layer, and the path length L is 1 mm or more are classified. The multiple modeling condition patterns may include a fourth modeling condition pattern into which modeling conditions are classified, where the target line width is 2 mm or more, the stacking position of the structure layer SL is the lowest layer, the path length L is less than 1 mm, and the pass angle θ is 0 degrees. The multiple modeling condition patterns may include a fifth modeling condition pattern into which modeling conditions are classified, where the target line width is 2 mm or more, the stacking position of the structure layer SL is the lowest layer, the path length L is less than 1 mm, and the pass angle θ is a positive angle (i.e., greater than 0 degrees and less than 180 degrees). The multiple modeling condition patterns may include a sixth modeling condition pattern into which modeling conditions are classified, where the target line width is 2 mm or more, the stacking position of the structure layer SL is the lowest layer, the path length L is less than 1 mm, and the pass angle θ is a negative angle (i.e., less than −0 degrees and greater than −180 degrees). The plurality of modeling condition patterns may include a seventh modeling condition pattern into which modeling conditions are classified, where the target line width is 2 mm or more, the stacking position of the structural layer SL is a middle layer, and the path length L is 1 mm or more. The plurality of modeling condition patterns may include an eighth modeling condition pattern into which modeling conditions are classified, where the target line width is 2 mm or more, the stacking position of the structural layer SL is a middle layer, the path length L is less than 1 mm, and the path angle θ is 0 degrees.The multiple modeling condition patterns may include a ninth modeling condition pattern into which modeling conditions are classified, where the target line width is 2 mm or more, the stacking position of the structural layer SL is a middle layer, the path length L is less than 1 mm, and the pass angle θ is a positive angle (i.e., greater than 0 degrees and less than 180 degrees). The multiple modeling condition patterns may include a tenth modeling condition pattern into which modeling conditions are classified, where the target line width is 2 mm or more, the stacking position of the structural layer SL is a middle layer, the path length L is less than 1 mm, and the pass angle θ is a negative angle (i.e., less than −0 degrees and greater than −180 degrees). The multiple modeling condition patterns may include an eleventh modeling condition pattern into which modeling conditions are classified, where the target line width is 2 mm or more, the stacking position of the structural layer SL is the top layer, and the path length L is 1 mm or more. The multiple modeling condition patterns may include a twelfth modeling condition pattern into which modeling conditions are classified, where the target line width is 2 mm or more, the stacking position of the structure layer SL is the top layer, the path length L is less than 1 mm, and the pass angle θ is 0 degrees. The multiple modeling condition patterns may include a thirteenth modeling condition pattern into which modeling conditions are classified, where the target line width is 2 mm or more, the stacking position of the structure layer SL is the top layer, the path length L is less than 1 mm, and the pass angle θ is a positive angle (i.e., greater than 0 degrees and less than 180 degrees). The multiple modeling condition patterns may include a fourteenth modeling condition pattern into which modeling conditions are classified, where the target line width is 2 mm or more, the stacking position of the structure layer SL is the top layer, the path length L is less than 1 mm, and the pass angle θ is a negative angle (i.e., less than −0 degrees and greater than −180 degrees).

[0284] Each of the modeling condition patterns may be associated with irradiation conditions that should be used when the modeling conditions are classified into that modeling condition pattern.

[0285] For example, as shown in FIG. 24, the first modeling condition pattern may be associated with an irradiation condition named “ultra-fine line” as the irradiation condition to be used when the modeling conditions are classified into the first modeling condition pattern. The irradiation condition named "ultra-fine line" may be an irradiation condition in which the shape type of the scanning trajectory of the target irradiation area EA within the shaping unit area BSA is a "circle" type, the amplitude Ax (i.e., the size of the shaping unit area BSA in the X-axis direction (pattern size)) and the amplitude Ay (i.e., the size of the shaping unit area BSA in the Y-axis direction (pattern size)) are each a first size, the phase amounts αx and αy are set to phase amounts that can realize a state in which the phase of the movement of the target irradiation area EA#1 within the shaping unit area BSA#1 and the phase of the movement of the target irradiation area EA#2 within the shaping unit area BSA#2 are in opposite phase, the frequencies fx and fy (i.e., the drive frequency of at least one of the galvanometer mirrors 2146 and 2156) are 1 kHz, DC modulation is performed, no angle threshold is set, and the target size of the molten pool MP is a first target size.

[0286] 24, the second modeling condition pattern may be associated with an irradiation condition named “thin wire” as an irradiation condition to be used when the modeling conditions are classified into the second modeling condition pattern. The irradiation condition named “thin wire” may differ from the irradiation condition named “ultra-thin wire” in that the amplitudes Ax and Ay are each a second size that is larger than the first size.

[0287] 24, the third building condition pattern may be associated with an irradiation condition named “bottom layer straight line” as an irradiation condition to be used when the building conditions are classified into the third building condition pattern. The irradiation condition named “bottom layer straight line” may differ from the irradiation condition named “thin wire” in that the amplitudes Ax and Ay are each set to a third size that is larger than the second size, and the target size of the molten pool MP is set to a second target size that is different from the first target size.

[0288] For example, as shown in FIG. 24, the fourth modeling condition pattern may be associated with an irradiation condition named “bottom layer straight line” as the irradiation condition to be used when the modeling conditions are classified into the fourth modeling condition pattern.

[0289] 24, the fifth modeling condition pattern may be associated with an irradiation condition named "bottom layer left curve" as an irradiation condition to be used when the modeling conditions are classified into the fifth modeling condition pattern. The irradiation condition named "bottom layer left curve" may differ from the irradiation condition named "bottom layer straight line" in that the angle threshold is set to a predetermined first angle (e.g., 45 degrees).

[0290] 24, the sixth modeling condition pattern may be associated with an irradiation condition named “bottom layer right curve” as an irradiation condition to be used when the modeling conditions are classified into the sixth modeling condition pattern. The irradiation condition named “bottom layer right curve” may be the same as the irradiation condition named “bottom layer left curve.”

[0291] 24 , the seventh printing condition pattern may be associated with an irradiation condition named “straight line” as an irradiation condition to be used when the printing conditions are classified into the seventh printing condition pattern. The irradiation condition named “straight line” may differ from the irradiation condition named “thin line” in that the shape type of the scanning trajectory of the target irradiation area EA within the printing unit area BSA is “sine wave,” the amplitudes Ax and Ay are each a fourth size larger than the second size, and the target size of the molten pool MP is a third target size different from the first target size. The irradiation condition named “straight line” may differ from the irradiation condition named “bottom-layer straight line” in that the shape type of the scanning trajectory of the target irradiation area EA within the printing unit area BSA is “sine wave,” the amplitudes Ax and Ay are each a fourth size smaller than the third size, and the target size of the molten pool MP is a third target size different from the second target size.

[0292] For example, as shown in FIG. 24, the eighth modeling condition pattern may be associated with an irradiation condition named “straight line” as the irradiation condition to be used when the modeling conditions are classified into the eighth modeling condition pattern.

[0293] 24, the ninth printing condition pattern may be associated with an irradiation condition named “left curve” as the irradiation condition to be used when the printing conditions are classified into the ninth printing condition pattern. The irradiation condition named “left curve” may differ from the irradiation condition named “straight line” in that the shape type of the scanning trajectory of the target irradiation area EA within the printing unit area BSA is “circle,” the angle threshold is set to a predetermined second angle (e.g., 30 degrees), and the target size of the molten pool MP is a fourth target size that is different from the third target size.

[0294] 24, an irradiation condition named “right curve” may be associated with the tenth modeling condition pattern as an irradiation condition to be used when the modeling conditions are classified into the tenth modeling condition pattern. The irradiation condition named “right curve” may be the same as the irradiation condition named “left curve.”

[0295] 24, the 11th building condition pattern may be associated with an irradiation condition named “top layer straight line” as the irradiation condition to be used when the building conditions are classified into the 11th building condition pattern. The irradiation condition named “top layer straight line” may differ from the irradiation condition named “straight line” in that the target size of the molten pool MP is a fifth target size that is different from the third target size.

[0296] For example, as shown in FIG. 24, the 12th modeling condition pattern may be associated with an irradiation condition named “top layer straight line” as the irradiation condition to be used when the modeling conditions are classified into the 12th modeling condition pattern.

[0297] 24, the 13th printing condition pattern may be associated with an irradiation condition named “Top Layer Left Curve” as the irradiation condition to be used when the printing conditions are classified into the 13th printing condition pattern. The irradiation condition named “Top Layer Left Curve” may differ from the irradiation condition named “Top Layer Straight Line” in that the type of shape of the scanning trajectory of the target irradiation area EA within the printing unit area BSA is a “sine wave” type, and the angle threshold is set to a predetermined third angle (e.g., 15 degrees).

[0298] 24, the 14th modeling condition pattern may be associated with an irradiation condition named “top layer right curve” as an irradiation condition to be used when the modeling conditions are classified into the 14th modeling condition pattern. The irradiation condition named “top layer right curve” may be the same as the irradiation condition named “top layer left curve.”

[0299] (3) Technical Effects of the Modeling System As described above, in this embodiment, the modeling system SYS can perform a rotation control operation to rotate the modeling unit area BSA. Therefore, as described above, the modeling system SYS can appropriately model a linear object having the same width D as the target line width. Therefore, when the rotation control operation is performed, the modeling accuracy of the modeling system SYS is improved compared to when the rotation control operation is not performed.

[0300] In addition, the modeling system SYS can perform an irradiation condition changing operation to change the irradiation conditions of the modeling light EL based on the modeling conditions for modeling the object. Therefore, compared to a case where the irradiation conditions of the modeling light EL are not changed based on the modeling conditions, the modeling system SYS can model the object using appropriate irradiation conditions based on the modeling conditions.

[0301] (4) Modification When the first rotation control operation is performed as described above, the control unit 7 changes the amount of rotation of the shaping unit area BSA#1 each time the path angle θ of the partial path PP changes. In this case, the control unit 7 typically changes the amount of rotation of the shaping unit area BSA#1 by inputting a galvanometer control signal that changes the amount of rotation of the shaping unit area BSA#1 to the galvanometer mirror 2146. Here, if the control unit 7 inputs the galvanometer control signal to the galvanometer mirror 2146 at the timing when the path angle θ of the partial path PP changes, depending on the responsiveness of the galvanometer mirror 2146, it may not be possible to change the amount of rotation of the shaping unit area BSA#1 at the timing when the path angle θ of the partial path PP changes. 25( a), due to a control delay between when a galvanometer control signal is input to the galvanometer mirror 2146 and when the galvanometer mirror 2146 starts operating based on the galvanometer control signal, the control unit 7 may be unable to change the rotation amount of the shaping unit area BSA#1 some time after the path angle θ of the partial path PP changes. Therefore, the control unit 7 may input a galvanometer control signal to the galvanometer mirror 2146 for changing the rotation amount of the shaping unit area BSA#1 at a timing that is earlier by a delay time corresponding to the control delay. Specifically, the control unit 7 may input a galvanometer control signal to the galvanometer mirror 2146 for changing the rotation amount of the shaping unit area BSA#1 at a second timing that is earlier by the delay time than the first timing at which the path angle θ of the partial path PP changes. In other words, the control unit 7 may input a galvanometer control signal for changing the rotation amount of the shaping unit area BSA#1 to the galvanometer mirror 2146 at a second timing that is earlier by the delay time than the first timing at which the rotation amount of the shaping unit area BSA#1 is changed. As a result, as shown in FIG. 25B, the control unit 7 can change the rotation amount of the shaping unit area BSA#1 at the first timing at which the path angle θ of the partial path PP changes, even if there is a control delay in the galvanometer mirror 2146. Note that the control unit 7 may perform a similar operation when changing the rotation amount of the shaping unit area BSA#2.The control unit 7 may perform the same operation when performing the second and third rotation control operations.

[0302] In the above description, the modeling system SYS rotates the modeling unit area BSA by performing a rotation control operation. However, as shown in FIG. 6A , if the shape of the modeling unit area BSA is circular (particularly, a perfect circle), the orientation of the modeling unit area BSA does not change even if the modeling unit area BSA rotates. In this case, if the shape of the modeling unit area BSA is circular (particularly, a perfect circle), the modeling system SYS does not need to rotate the modeling unit area BSA. In this case, the modeling system SYS may determine whether the shape of the modeling unit area BSA is circular (particularly, a perfect circle). If it is determined that the shape of the modeling unit area BSA is circular (particularly, a perfect circle), the modeling system SYS does not need to rotate the modeling unit area BSA. On the other hand, if it is determined that the shape of the modeling unit area BSA is not circular (particularly, a perfect circle), the modeling system SYS may rotate the modeling unit area BSA.

[0303] In the above description, the modeling system SYS rotates the modeling unit area BSA by performing a rotation control operation. Here, the modeling system SYS may perform a shape modification operation to change the shape of the modeling unit area BSA in addition to the rotation control operation to rotate the modeling unit area BSA. Note that the modeling system SYS may perform the shape modification operation instead of the rotation control operation.

[0304] In the above description, the modeling unit 2 melts the modeling material M by irradiating the modeling light EL onto the modeling material M. However, the modeling unit 2 may melt the modeling material M by irradiating the modeling material M with an arbitrary energy beam. Examples of the arbitrary energy beam include at least one of a charged particle beam and an electromagnetic wave. Examples of the charged particle beam include at least one of an electron beam and an ion beam.

[0305] In the above description, the manufacturing unit 2 manufactures the three-dimensional structure ST by performing additive processing based on the laser build-up welding method. However, the manufacturing unit 2 may manufacture the three-dimensional structure ST by performing additive processing based on another method capable of manufacturing the three-dimensional structure ST. Examples of other methods capable of manufacturing the three-dimensional structure ST include at least one of powder bed fusion (PBF) methods such as selective laser sintering (SLS), binder jetting, material jetting, stereolithography, and laser metal fusion (LMF).

[0306] The modeling system SYS may perform both additive processing and removal processing. For example, the modeling system SYS may perform additive processing using one of the modeling lights EL#1 and EL#2, and may perform removal processing using the other of the modeling lights EL#1 and EL#2. In this case, the modeling system SYS can perform additive processing and removal processing simultaneously. Note that, if the modeling system SYS does not need to perform additive processing and removal processing simultaneously, the modeling system SYS may perform additive processing and removal processing using the same modeling light EL.

[0307] In addition to at least one of additive processing and subtractive processing, the modeling system SYS may perform a remelt process to reduce the flatness of the surface of the workpiece W (or a modeled object formed on the workpiece W) processed by the additive processing or subtractive processing (i.e., reduce the surface roughness or make the surface closer to a flat surface). For example, the modeling system SYS may perform at least one of additive processing and subtractive processing using one of the modeling lights EL#1 and EL#2, and may perform a remelt process using the other of the modeling lights EL#1 and EL#2. In this case, the modeling system SYS can simultaneously perform at least one of additive processing and subtractive processing and the remelt process. Note that if the modeling system SYS does not need to simultaneously perform at least one of additive processing and subtractive processing and the remelt process, the modeling system SYS may perform at least one of additive processing and subtractive processing and the remelt process using the same modeling light EL.

[0308] The above-described modeling unit 2 (particularly, the modeling head 21) may be attached to a robot. The robot may typically be an articulated robot. For example, the modeling unit 2 (particularly, the modeling head 21) may be attached to a welding robot for welding. For example, the modeling unit 2 (particularly, the modeling head 21) may be attached to a self-propelled mobile robot.

[0309] (5) Supplementary Notes The following supplementary notes are added to the above-described embodiment. [Supplementary Note 1] A shaping system comprising: a shaping device capable of irradiating a surface of an object with a shaping beam and shaping a model on the object by supplying a shaping material to a molten pool formed on the object by the shaping beam; and a control device capable of controlling the shaping device, wherein the control device controls the shaping device so that an irradiation position of the shaping beam on the surface of the object periodically moves within a shaping unit area set on the surface of the object, and the shaping unit area moves on the surface of the object based on path information indicating a movement trajectory of the shaping unit area, and the control device changes an amount of rotation of the shaping unit area around a rotation axis intersecting with the surface of the object based on the path information. [Supplementary Note 2] The shaping system described in Supplementary Note 1, wherein the control device sets an amount of rotation of the shaping unit area moving along a movement trajectory to an amount of rotation determined based on an intersection angle between an axis along the movement trajectory and a predetermined reference axis. [Supplementary Note 3] The modeling system according to Supplementary Note 2, wherein the control device changes a rotation amount of the modeling unit area that moves along the one movement trajectory every time the intersection angle changes by a predetermined angle. [Supplementary Note 4] The modeling system according to Supplementary Note 2 or 3, wherein the modeling device, when the intersection angle is a first angle, models the model using first irradiation conditions as irradiation conditions for the modeling beam, and when the intersection angle is a second angle different from the first angle, models the model using second irradiation conditions as irradiation conditions for the modeling beam. [Supplementary Note 5] The modeling system according to Supplementary Note 4, wherein the modeling device, when the intersection angle is a third angle different from the first and second angles, models the model using third irradiation conditions as irradiation conditions for the modeling beam. [Supplementary Note 6] The modeling system according to Supplementary Note 5, wherein the first angle is zero degrees, the second angle is a positive angle, and the third angle is a negative angle.[Supplementary Note 7] The control device controls the modeling device to move the modeling unit area based on the path information, thereby modeling, as the modeled object, a linear structure extending along a movement trajectory of the modeling unit area; the modeling device uses fourth irradiation conditions as irradiation conditions for the modeling beam to model the linear structure having a first width in a direction intersecting with the movement trajectory; and the modeling device uses fifth irradiation conditions as irradiation conditions for the modeling beam, which are different from the fourth irradiation conditions, to model the linear structure having a second width in a direction intersecting with the movement trajectory, which is different from the first width. The modeling system described in any one of Supplementary Notes 1 to 6. [Supplementary Note 8] The modeling system described in any one of Supplementary Notes 1 to 7, wherein the control device controls the modeling device to model, as the modeled object, a three-dimensional structure in which a plurality of structural layers are stacked, the modeling device models a first structural layer among the plurality of structural layers by using sixth irradiation conditions as irradiation conditions of the modeling beam, and the modeling device models a second structural layer among the plurality of structural layers, the second structural layer being different from the first structural layer, by using seventh irradiation conditions as irradiation conditions of the modeling beam that are different from the sixth irradiation conditions. [Supplementary Note 9] The modeling system described in Supplementary Note 8, wherein the first structural layer includes at least one of an uppermost structural layer and a lowermost structural layer among the plurality of structural layers, and the second structural layer includes another structural layer different from the uppermost structural layer and the lowermost structural layer among the plurality of structural layers. [Supplementary Note 10] The modeling system according to any one of Supplementary Notes 1 to 9, wherein the modeling device models the object using an eighth irradiation condition as the irradiation condition of the modeling beam when the modeling unit area moves along a movement trajectory having a first length, and the modeling device models the object using a ninth irradiation condition as the irradiation condition of the modeling beam, the ninth irradiation condition being different from the eighth irradiation condition, when the modeling unit area moves along a movement trajectory having a second length different from the first length. [Supplementary Note 11] The modeling system according to any one of Supplementary Notes 1 to 10, wherein the modeling device includes an irradiation optical system that irradiates the modeling beam, and a position changing device that can change a positional relationship between the object and the irradiation optical system.[Supplementary Note 12] The modeling system according to Supplementary Note 11, wherein the control device controls the position changing device based on the path information so that a model is formed on the object along the movement trajectory. [Supplementary Note 13] The modeling system according to any one of Supplements 1 to 12, wherein the periodic movement of the irradiation position on the surface of the object includes spatially periodic movement. [Supplementary Note 14] The modeling system according to any one of Supplements 1 to 12, wherein the periodic movement of the irradiation position on the surface of the object includes temporally periodic movement. [Supplementary Note 15] The shaping system described in any one of Supplementary Notes 1 to 14, wherein the shaping device includes a deflection optical system capable of moving the irradiation position of the shaping beam on the surface of the object by deflecting the shaping beam, and the control device controls the deflection optical system to change the rotation amount of the shaping unit area around the rotation axis at a second timing earlier than a first timing at which the rotation amount of the shaping unit area around the rotation axis should be changed, by inputting a control signal to the deflection optical system to change the rotation amount of the shaping unit area around the rotation axis at the first timing.[Supplementary Note 16] A modeling system comprising: an irradiation optical system that irradiates a surface of an object with a modeling beam; and a position changing device that can change the positional relationship between the object and the irradiation optical system, and that can model a model on the object by supplying a modeling material to a molten pool formed on the object by the modeling beam; and a control device that can control the modeling device, wherein the irradiation optical system includes a deflection optical system that can move the irradiation position of the modeling beam on the surface of the object by deflecting the modeling beam, and the position changing device is able to move the irradiation position on the surface of the object by changing the positional relationship between the object and the irradiation optical system, and the control device controls the position changing device based on path information so that the model is formed on the object along a movement trajectory, and controls the deflection optical system so that the irradiation position moves periodically on the surface of the object along a scanning direction that intersects with the movement trajectory, and the control device controls the deflection optical system to change the scanning direction around a rotation axis that intersects with the surface of the object, based on the path information. [Supplementary Note 17] The control device controls the deflection optical system so that the irradiation position moves periodically along the scanning direction, based on scan control information indicating a scanning trajectory, which is a trajectory of periodic movement of the irradiation position by the deflection optical system, and the control device rotates the scanning direction about the rotation axis by rotating the scanning trajectory about the rotation axis based on the path information. [Supplementary Note 18] The control device sets the amount of rotation of the scanning direction during a period in which the irradiation position moves along one movement trajectory by the position changing device to an amount of rotation determined based on an intersection angle between an axis along the one movement trajectory and a predetermined reference axis. [Supplementary Note 19] The control device changes the amount of rotation of the scanning direction every time the intersection angle changes by a predetermined angle.[Supplementary Note 20] The modeling system according to Supplementary Note 18 or 19, wherein the modeling device models the object using first irradiation conditions as irradiation conditions for the modeling beam when the intersection angle is a first angle, and the modeling device models the object using second irradiation conditions as irradiation conditions for the modeling beam when the intersection angle is a second angle different from the first angle. [Supplementary Note 21] The modeling system according to Supplementary Note 20, wherein the modeling device models the object using third irradiation conditions as irradiation conditions for the modeling beam when the intersection angle is a third angle different from the first and second angles. [Supplementary Note 22] The modeling system according to Supplementary Note 21, wherein the first angle is zero degrees, the second angle is a positive angle, and the third angle is a negative angle. [Supplementary Note 23] The control device controls the position changing device to move the irradiation position based on the path information, thereby controlling the modeling device to model, as the modeled object, a linear structure extending along the movement trajectory; the modeling device uses fourth irradiation conditions as irradiation conditions for the modeling beam to model the linear structure having a first width in a direction intersecting the movement trajectory; and the modeling device uses fifth irradiation conditions as irradiation conditions for the modeling beam that are different from the fourth irradiation conditions to model the linear structure having a second width in a direction intersecting the movement trajectory that is different from the first width. The modeling system described in any one of Supplementary Notes 16 to 22. [Supplementary Note 24] The control device controls the modeling device to model, as the modeled object, a three-dimensional structure in which a plurality of structural layers are stacked, the modeling device models a first structural layer of the plurality of structural layers using a sixth irradiation condition as the irradiation condition of the modeling beam, and the modeling device models a second structural layer of the plurality of structural layers, different from the first structural layer, using a seventh irradiation condition as the irradiation condition of the modeling beam, different from the sixth irradiation condition. This is the modeling system described in any one of Supplementary Notes 16 to 23.[Supplementary Note 25] The modeling system described in Supplementary Note 24, wherein the first structure layer includes at least one of an uppermost structure layer and a lowermost structure layer of the plurality of structure layers, and the second structure layer includes another structure layer different from the uppermost structure layer and the lowermost structure layer of the plurality of structure layers. [Supplementary Note 26] The modeling device models the modeled object using an eighth irradiation condition as the irradiation condition of the modeling beam when the irradiation position is moved by the position changing device along the movement trajectory having a first length, and when the irradiation position is moved by the position changing device along the movement trajectory having a second length different from the first length, the modeling device models the modeled object using a ninth irradiation condition as the irradiation condition of the modeling beam different from the eighth irradiation condition. [Supplementary Note 27] The modeling system described in any one of Supplementary Notes 16 to 16, wherein the periodic movement of the irradiation position along the scanning direction includes spatially periodic movement. [Supplementary Note 28] The shaping system according to any one of Supplementary Notes 16 to 26, wherein the periodic movement of the irradiation position along the scanning direction includes periodic movement in time. [Supplementary Note 29] The shaping system according to any one of Supplementary Notes 16 to 28, wherein the control device controls the deflection optical system to change the scanning direction about the rotation axis at a second timing earlier than a first timing at which the scanning direction should be changed about the rotation axis by inputting a control signal to the deflection optical system to control the deflection optical system to change the scanning direction about the rotation axis at the first timing.[Supplementary Note 30] A modeling system comprising: an irradiation optical system that irradiates a surface of an object with a modeling beam; and a position changing device that can change the positional relationship between the object and the irradiation optical system, and that can form a model on the object by supplying a modeling material to a molten pool formed on the object by the modeling beam; and a control device that can control the modeling device, wherein the irradiation optical system includes a final optical system having an emission surface, and a deflection optical system that can deflect the modeling beam to move at least one of the emission position and emission angle at which the modeling beam is emitted from the final optical element, and the position changing device can move the irradiation position on the surface of the object by changing the positional relationship between the object and the irradiation optical system, and the control device controls the position changing device based on path information so that a model is formed on the object along a movement trajectory, and controls the deflection optical system to change the movement direction in which the emission position periodically moves on the emission surface, based on the path information. [Supplementary Note 31] The shaping system according to Supplementary Note 30, wherein the periodic movement of the injection position includes a spatially periodic movement. [Supplementary Note 32] The shaping system according to Supplementary Note 30, wherein the periodic movement of the injection position includes a temporally periodic movement.[Supplementary Note 33] A modeling system comprising: an irradiation optical system that irradiates a surface of an object with a modeling beam; and a position changing device that can change the positional relationship between the object and the irradiation optical system, and that can form a model on the object by supplying a modeling material to a molten pool formed on the object by the modeling beam; and a control device that can control the modeling device, wherein the irradiation optical system includes a deflection optical system that can move an irradiation position of the modeling beam by deflecting the modeling beam, and the position changing device is able to move the irradiation position by changing the positional relationship between the object and the irradiation optical system, and the control device controls the position changing device based on path information so that a model is formed on the object along a movement trajectory, and controls the deflection optical system so that the irradiation position moves periodically on the surface of the object along a scanning direction that intersects with the movement trajectory, and the control device controls the position changing device based on path information so that the irradiation position moves along the movement trajectory, and controls change of movement of the irradiation position in a direction that intersects with the movement trajectory, based on the path information. [Supplementary Note 34] The modeling system described in Supplementary Note 33, wherein the control device controls, based on the path information, a timing at which the direction in which the irradiation position intersects with the movement trajectory is changed. [Supplementary Note 35] The modeling system described in Supplementary Note 33 or 34, wherein the control device controls, based on the path information, a timing at which the direction in which the irradiation position intersects with the movement trajectory is changed from a first direction to a second direction. [Supplementary Note 36] The modeling system described in any one of Supplements 33 to 35, wherein the control device changes, based on the path information, from controlling the irradiation position to move in a first direction intersecting with the movement trajectory in a first pattern to controlling the irradiation position to move in a second direction different from the first direction in the first pattern. [Supplementary Note 37] The modeling system described in any one of Supplements 33 to 35, wherein the control device changes, based on the path information, from controlling the irradiation position to move in a first pattern in the direction intersecting with the movement trajectory in a first pattern to controlling the irradiation position to move in a second pattern different from the first pattern.[Supplementary Note 38] The cyclic movement of the irradiation position along a direction intersecting with the movement trajectory includes spatially cyclic movement. [Supplementary Note 39] A shaping system comprising: an irradiation optical system that irradiates a surface of an object with a shaping beam; and a position changing device capable of changing an injection position from which the shaping beam is emitted of a final optical element of the irradiation optical system, and capable of shaping a model on the object by supplying a modeling material to a molten pool formed on the object by the shaping beam; and a control device capable of controlling the shaping device, wherein the irradiation optical system includes a deflection optical system, and the deflection optical system is capable of changing an injection angle of the shaping beam, and the position changing device is capable of moving the irradiation position on the surface of the object by changing a positional relationship between the object and the irradiation optical system, and the control device controls the position changing device based on path information so that the model is formed on the object along the movement trajectory, and controls the periodic change of the injection angle based on the path information. [Supplementary Note 40] A modeling method for forming a model on an object using a modeling device that can form a model on the object by irradiating a surface of the object with a modeling beam and supplying a modeling material to a molten pool formed on the object by the modeling beam, the modeling method comprising: controlling the modeling device so that, within a modeling unit area set on the surface of the object, the irradiation position of the modeling beam on the surface of the object moves periodically, and the modeling unit area moves on the surface of the object based on path information that indicates a movement trajectory of the modeling unit area; and changing an amount of rotation of the modeling unit area around a rotation axis that intersects with the surface of the object based on the path information.[Supplementary Note 41] A modeling method for forming a model using a modeling device including an irradiation optical system that irradiates a surface of an object with a modeling beam and a position changing device that can change a positional relationship between the object and the irradiation optical system, and that can form a model on the object by supplying a modeling material to a molten pool formed on the object by the modeling beam, wherein the irradiation optical system includes a deflection optical system that can move an irradiation position of the modeling beam on the surface of the object by deflecting the modeling beam, and the position changing device can move the irradiation position on the surface of the object by changing the positional relationship between the object and the irradiation optical system, the modeling method comprising: controlling the position changing device based on path information so that the model is formed on the object along a movement trajectory, and controlling the deflection optical system so that the irradiation position moves periodically on the surface of the object along a scanning direction that intersects with the movement trajectory; and controlling the deflection optical system to change the scanning direction around a rotation axis that intersects with the surface of the object, based on the path information. [Supplementary Note 42] A modeling method for forming a model using a modeling device including an irradiation optical system that irradiates a surface of an object with a modeling beam and a position changing device that is capable of changing a positional relationship between the object and the irradiation optical system, and that is capable of forming a model on the object by supplying a modeling material to a molten pool formed on the object by the modeling beam, wherein the irradiation optical system includes a final optical system having an emission surface, and a deflection optical system that is capable of deflecting the modeling beam to move at least one of an emission position and an emission angle at which the modeling beam is emitted from the final optical element, and the position changing device is capable of moving the irradiation position on the surface of the object by changing the positional relationship between the object and the irradiation optical system, and the modeling method includes: controlling the position changing device, based on path information, so that the model is formed on the object along a movement trajectory, and controlling the deflection optical system to change a movement direction in which the emission position periodically moves on the emission surface, based on the path information.[Supplementary Note 43] A modeling method for forming a model using a modeling device including an irradiation optical system that irradiates a surface of an object with a modeling beam and a position changing device that is capable of changing a positional relationship between the object and the irradiation optical system, and that is capable of forming a model...

Claims

1. a molding device capable of irradiating a surface of an object with a molding beam and supplying a molding material to a molten pool formed on the object by the molding beam, thereby molding a model on the object; A control device capable of controlling the molding device; Equipped with the control device controls the modeling device so that an irradiation position of the modeling beam on the surface of the object periodically moves within a modeling unit area set on the surface of the object, and the modeling unit area moves on the surface of the object based on path information indicating a movement trajectory of the modeling unit area; The control device changes a rotation amount of the shaping unit area around a rotation axis intersecting a surface of the object based on the path information. Molding system.

2. The control device sets a rotation amount of the shaping unit area moving along one movement trajectory to a rotation amount determined based on an intersection angle between an axis along the one movement trajectory and a predetermined reference axis. The molding system of claim 1 .

3. The control device changes a rotation amount of the shaping unit area that moves along the one movement trajectory every time the intersection angle changes by a predetermined angle. The molding system of claim 2 .

4. when the intersection angle is a first angle, the modeling device models the model by using a first irradiation condition as an irradiation condition of the modeling beam, When the intersection angle is a second angle different from the first angle, the modeling device models the model by using a second irradiation condition as an irradiation condition of the modeling beam. The molding system according to claim 2 or 3.

5. When the intersection angle is a third angle different from the first and second angles, the modeling device models the model by using a third irradiation condition as an irradiation condition of the modeling beam. The molding system of claim 4 .

6. the first angle is zero degrees; the second angle is a positive angle, The third angle is a negative angle. The molding system of claim 5 .

7. the control device controls the modeling device so as to move the modeling unit area based on the path information, thereby modeling, as the modeling object, a linear structure extending along a movement trajectory of the modeling unit area; and the modeling device uses a fourth irradiation condition as an irradiation condition of the modeling beam to model the linear structure having a first width in a direction intersecting the movement trajectory, The modeling device uses a fifth irradiation condition, which is different from the fourth irradiation condition, as an irradiation condition of the modeling beam to model the linear structure having a second width in a direction intersecting the movement trajectory, which is different from the first width. The molding system according to claim 1 .

8. the control device controls the modeling device so as to model, as the modeled object, a three-dimensional structure in which a plurality of structural layers are stacked; and the modeling device models a first structure layer of the plurality of structure layers using a sixth irradiation condition as an irradiation condition of the modeling beam, The modeling device models a second structure layer different from the first structure layer among the plurality of structure layers by using a seventh irradiation condition different from the sixth irradiation condition as an irradiation condition of the modeling beam. The molding system according to claim 1 .

9. the first structural layer includes at least one of an uppermost structural layer and a lowermost structural layer among the plurality of structural layers; The second structural layer includes another structural layer different from the uppermost structural layer and the lowermost structural layer of the plurality of structural layers. The molding system of claim 8 .

10. when the modeling unit area moves along a movement trajectory having a first length, the modeling device models the model by using an eighth irradiation condition as an irradiation condition of the modeling beam; and When the modeling unit area moves along a movement trajectory having a second length different from the first length, the modeling device models the model using a ninth irradiation condition different from the eighth irradiation condition as an irradiation condition of the modeling beam. The molding system according to claim 1 .

11. The modeling apparatus includes an irradiation optical system that irradiates the modeling beam, and a position changing device that can change a positional relationship between the object and the irradiation optical system. The molding system according to claim 1 .

12. The control device controls the position changing device based on the path information so that a model is formed on the object along the movement trajectory. The molding system of claim 11 .

13. The periodic movement of the irradiation position on the surface of the object includes a spatially periodic movement. The molding system according to claim 1 .

14. The periodic movement of the irradiation position on the surface of the object includes a periodic movement in time. The molding system according to claim 1 .

15. the modeling apparatus includes a deflection optical system capable of moving an irradiation position of the modeling beam on a surface of the object by deflecting the modeling beam, The control device controls the deflection optical system so as to change the amount of rotation of the shaping unit area around the rotation axis at the first timing by inputting a control signal to the deflection optical system so as to change the amount of rotation of the shaping unit area around the rotation axis at a second timing earlier than a first timing at which the amount of rotation of the shaping unit area around the rotation axis. The molding system according to claim 1 .

16. a modeling device including an irradiation optical system that irradiates a modeling beam onto a surface of an object, and a position changing device that can change a positional relationship between the object and the irradiation optical system, and that can model a model on the object by supplying a modeling material to a molten pool formed on the object by the modeling beam; A control device capable of controlling the molding device; Equipped with the irradiation optical system includes a deflection optical system capable of moving an irradiation position of the shaping beam on a surface of the object by deflecting the shaping beam, the position changing device is capable of moving the irradiation position on a surface of the object by changing a positional relationship between the object and the irradiation optical system; the control device controls the position change device based on path information so that a model is formed on the object along a movement trajectory, and controls the deflection optical system so that the irradiation position moves periodically on a surface of the object along a scanning direction that intersects with the movement trajectory; The control device controls the deflection optical system based on the path information so as to change the scanning direction around a rotation axis intersecting a surface of the object. Molding system.

17. the control device controls the deflection optical system based on scanning control information indicating a scanning trajectory, which is a trajectory of a periodic movement of the irradiation position by the deflection optical system, so that the irradiation position moves periodically along the scanning direction; The control device rotates the scanning trajectory around the rotation axis based on the path information, thereby rotating the scanning direction around the rotation axis. The molding system of claim 16.

18. The control device sets a rotation amount of the scanning direction during a period in which the irradiation position is moved along one of the movement trajectories by the position changing device to a rotation amount determined based on an intersection angle at which an axis along the previous one of the movement trajectories intersects with a predetermined reference axis.

18. The molding system according to claim 16 or 17.

19. The control device changes the amount of rotation of the scanning direction every time the intersection angle changes by a predetermined angle.

20. The molding system of claim 18.

20. when the intersection angle is a first angle, the modeling device models the model by using a first irradiation condition as an irradiation condition of the modeling beam, When the intersection angle is a second angle different from the first angle, the modeling device models the model by using a second irradiation condition as an irradiation condition of the modeling beam.

20. The molding system of claim 18.

21. When the intersection angle is a third angle different from the first and second angles, the modeling device models the model by using a third irradiation condition as an irradiation condition of the modeling beam. The molding system of claim 20.

22. the first angle is zero degrees; the second angle is a positive angle, The third angle is a negative angle.

22. The molding system of claim 21.

23. the control device controls the position changing device to move the irradiation position based on the path information, and thereby controls the modeling device to model, as the modeled object, a linear structure extending along the movement trajectory; the modeling device uses a fourth irradiation condition as an irradiation condition of the modeling beam to model the linear structure having a first width in a direction intersecting the movement trajectory, The modeling device uses a fifth irradiation condition, which is different from the fourth irradiation condition, as an irradiation condition of the modeling beam to model the linear structure having a second width in a direction intersecting the movement trajectory, which is different from the first width.

18. The molding system according to claim 16 or 17.

24. the control device controls the modeling device so as to model, as the modeled object, a three-dimensional structure in which a plurality of structural layers are stacked; and the modeling device models a first structure layer of the plurality of structure layers using a sixth irradiation condition as an irradiation condition of the modeling beam, The shaping device uses a seventh irradiation condition that is different from the sixth irradiation condition as the irradiation condition for the shaping beam, and forms a second structural layer that is different from the one of the shaping layers of the shaping layers.

18. The molding system according to claim 16 or 17.

25. the first structural layer includes at least one of an uppermost structural layer and a lowermost structural layer among the plurality of structural layers; The second structural layer includes another structural layer different from the uppermost structural layer and the lowermost structural layer of the plurality of structural layers.

25. The molding system of claim 24.

26. when the irradiation position is moved by the position changing device along the movement trajectory having a first length, the modeling device models the model using an eighth irradiation condition as the irradiation condition of the modeling beam, When the irradiation position is moved by the position changing device along the movement trajectory having a second length different from the first length, the modeling device models the model using a ninth irradiation condition different from the eighth irradiation condition as the irradiation condition of the modeling beam.

18. The molding system according to claim 16 or 17.

27. The periodic movement of the irradiation position along the scanning direction includes a spatially periodic movement.

18. The molding system according to claim 16 or 17.

28. The periodic movement of the irradiation position along the scanning direction includes a periodic movement in time.

18. The molding system according to claim 16 or 17.

29. The control device controls the deflection optical system to change the scanning direction around the rotation axis at the first timing by inputting a control signal to the deflection optical system to control the deflection optical system to change the scanning direction around the rotation axis at a second timing earlier than a first timing at which the scanning direction should be changed around the rotation axis.

18. The molding system according to claim 16 or 17.

30. a modeling device including an irradiation optical system that irradiates a modeling beam onto a surface of an object, and a position changing device that can change a positional relationship between the object and the irradiation optical system, and that can model a model on the object by supplying a modeling material to a molten pool formed on the object by the modeling beam; A control device capable of controlling the molding device; Equipped with the irradiation optical system includes a final optical element having an exit surface, and a deflection optical system capable of moving at least one of an exit position and an exit angle at which the shaping beam is emitted from the final optical element by deflecting the shaping beam; the position changing device is capable of moving an irradiation position of the shaping beam on a surface of the object by changing a positional relationship between the object and the irradiation optical system; The control device controls the position change device so that a model is formed on the object along a movement trajectory based on path information, and controls the deflection optical system so as to change a movement direction in which the emission position periodically moves on the emission surface based on the path information. Molding system.

31. The periodic movement of the injection position includes a spatially periodic movement. The molding system of claim 30.

32. The periodic movement of the injection position includes a periodic movement in time. The molding system of claim 30.

33. a modeling device including an irradiation optical system that irradiates a modeling beam onto a surface of an object, and a position changing device that can change a positional relationship between the object and the irradiation optical system, and that can model a model on the object by supplying a modeling material to a molten pool formed on the object by the modeling beam; A control device capable of controlling the molding device; Equipped with the irradiation optical system includes a deflection optical system capable of moving an irradiation position of the shaping beam by deflecting the shaping beam, the position change device is capable of moving the irradiation position by changing a positional relationship between the object and the irradiation optical system, the control device controls the position change device based on path information so that a model is formed on the object along a movement trajectory, and controls the deflection optical system so that the irradiation position moves periodically on a surface of the object along a scanning direction that intersects with the movement trajectory; The control device controls the position change device so that the projection position moves along the movement trajectory based on path information, and controls a change in the movement of the projection position in a direction intersecting the movement trajectory based on the path information. Molding system.

34. The control device controls a timing at which a direction in which the projection position intersects with the movement trajectory is changed based on the path information.

34. The molding system of claim 33.

35. The control device controls a timing at which a direction in which the projection position intersects with the movement trajectory is changed from a first direction to a second direction based on the path information.

35. The molding system of claim 33 or 34.

36. The control device changes, based on the path information, from controlling the projection position to move in a first pattern in a first direction intersecting with the movement trajectory to controlling the projection position to move in the first pattern in a second direction different from the first direction.

35. The molding system of claim 33 or 34.

37. The control device changes the control so that the irradiation position moves in a direction intersecting the movement trajectory in a first pattern based on the path information to a control so that the irradiation position moves in a second pattern different from the first pattern.

35. The molding system of claim 33 or 34.

38. The periodic movement of the irradiation position along a direction intersecting the movement trajectory includes a spatially periodic movement.

35. The molding system of claim 33 or 34.

39. a modeling device including an irradiation optical system that irradiates a modeling beam onto a surface of an object, and a position changing device that can change an injection position from which the modeling beam is injected of a final optical element of the irradiation optical system, and that can form a model on the object by supplying a modeling material to a molten pool formed on the object by the modeling beam; A control device capable of controlling the molding device; Equipped with the illumination optical system includes a deflection optical system; the deflection optical system is capable of changing an exit angle of the shaping beam; the position changing device is capable of moving an irradiation position of the shaping beam on a surface of the object by changing a positional relationship between the object and the irradiation optical system; The control device controls the position change device based on path information so that a model is formed on the object along a movement trajectory, and controls a periodic change of the emission angle based on the path information. Molding system.

40. A manufacturing method for manufacturing a model using a manufacturing device capable of manufacturing a model on an object by irradiating a surface of the object with a manufacturing beam and supplying a modeling material to a molten pool formed on the object by the manufacturing beam, the method comprising: controlling the modeling device so that an irradiation position of the modeling beam on the surface of the object is periodically moved within a modeling unit area set on the surface of the object, and the modeling unit area is moved on the surface of the object based on path information indicating a movement trajectory of the modeling unit area; changing a rotation amount of the shaping unit area around a rotation axis intersecting a surface of the object based on the path information; A molding method comprising:

41. A modeling method for manufacturing a model using a modeling device that includes an irradiation optical system that irradiates a modeling beam onto a surface of an object, and a position changing device that can change a positional relationship between the object and the irradiation optical system, and that can manufacture a model on the object by supplying a modeling material to a molten pool formed on the object by the modeling beam, the method comprising: the irradiation optical system includes a deflection optical system capable of moving an irradiation position of the shaping beam on a surface of the object by deflecting the shaping beam, the position changing device is capable of moving the irradiation position on a surface of the object by changing a positional relationship between the object and the irradiation optical system; The molding method includes: controlling the position changing device based on path information so that a model is formed on the object along a movement trajectory, and controlling the deflection optical system so that the irradiation position moves periodically on the surface of the object along a scanning direction that intersects with the movement trajectory; controlling the deflection optical system to change the scanning direction around a rotation axis that intersects with a surface of the object based on the path information; A molding method comprising:

42. A modeling method for manufacturing a model using a modeling device that includes an irradiation optical system that irradiates a modeling beam onto a surface of an object, and a position changing device that can change a positional relationship between the object and the irradiation optical system, and that can manufacture a model on the object by supplying a modeling material to a molten pool formed on the object by the modeling beam, the method comprising: the irradiation optical system includes a final optical element having an exit surface, and a deflection optical system capable of moving at least one of an exit position and an exit angle at which the shaping beam is emitted from the final optical element by deflecting the shaping beam; the position changing device is capable of moving an irradiation position of the shaping beam on a surface of the object by changing a positional relationship between the object and the irradiation optical system; The molding method includes: Controlling the position change device so that a model is formed on the object along a movement trajectory based on path information; controlling the deflection optical system so as to change a moving direction in which the exit position periodically moves on the exit surface based on the path information; A molding method comprising:

43. A modeling method for manufacturing a model using a modeling device that includes an irradiation optical system that irradiates a modeling beam onto a surface of an object, and a position changing device that can change a positional relationship between the object and the irradiation optical system, and that can manufacture a model on the object by supplying a modeling material to a molten pool formed on the object by the modeling beam, the method comprising: the irradiation optical system includes a deflection optical system capable of moving an irradiation position of the shaping beam by deflecting the shaping beam, the position change device is capable of moving the irradiation position by changing a positional relationship between the object and the irradiation optical system, The molding method includes: controlling the position changing device based on path information so that a model is formed on the object along a movement trajectory, and controlling the deflection optical system so that the irradiation position moves periodically on the surface of the object along a scanning direction that intersects with the movement trajectory; Controlling the position changing device so that the projection position moves along the movement trajectory based on path information, and controlling a change in the movement of the projection position in a direction intersecting the movement trajectory based on the path information; A molding method comprising:

44. A modeling method for manufacturing a model using a modeling device that includes an irradiation optical system that irradiates a modeling beam onto a surface of an object, and a position changing device that can change an injection position from which the modeling beam is emitted of a final optical element of the irradiation optical system, and that can manufacture a model on the object by supplying a modeling material to a molten pool formed on the object by the modeling beam, the method comprising: the illumination optical system includes a deflection optical system; the deflection optical system is capable of changing an exit angle of the shaping beam; the position changing device is capable of moving an irradiation position of the shaping beam on a surface of the object by changing a positional relationship between the object and the irradiation optical system; The molding method includes: Controlling the position change device so that a model is formed on the object along a movement trajectory based on path information; controlling a periodic change in the emission angle based on the path information; A molding method comprising: