Collimator for a physical vapor deposition (PVD) chamber
Patent Information
- Application Number
- US29/951119
- Authority / Receiving Office
- US · United States
- Patent Type
- Designs(United States)
- Current Assignee / Owner
- Filing Date
- 2024-07-08
- Publication Date
- 2026-02-03
- Estimated Expiration
- 2041-02-03
Smart Images

Figure USD1110975-D00000_ABST
Description
[0001] FIG. 1 is a top isometric view of a collimator for physical vapor deposition chamber, showing our new design.
[0002] FIG. 2 is a bottom isometric view thereof.
[0003] FIG. 3 is a top plan view thereof.
[0004] FIG. 4 is a bottom plan view thereof.
[0005] FIG. 5 is a front elevation view thereof.
[0006] FIG. 6 is a back elevation view thereof.
[0007] FIG. 7 is a left elevation view thereof.
[0008] FIG. 8 is a right elevation view thereof; and,
[0009] FIG. 9 is a cross-sectional view taken along line 9-9 in FIG. 3.
[0010] The dash-dash broken lines in the drawings illustrate portions of the article that form no part of the claimed design. The dot-dash broken line in FIG. 3 illustrates the indication of the cross-section and forms no part of the claimed design.
Claims
The ornamental design for a collimator for a physical vapor deposition (PVD) chamber, as shown and described.
Citation Information
Patent Citations
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Pvd) 챔버용 콜리메이터(collimator for use in a physical vapor deposition chamber
KR3010337070001S