Electron beam application device

The automated electron beam application device addresses the manual and time-consuming surface cleaning challenges by using a photocathode, cathode heater, and atomic hydrogen generation to control surface cleaning, achieving stable and efficient electron beam emission for prolonged operation.

WO2024262001A1PCT designated stage expired Publication Date: 2024-12-26HITACHI HIGH TECH CORP
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Patent Information

Application Number
PCT/JP2023/023303
Authority / Receiving Office
WO · WO
Patent Type
Applications
Current Assignee / Owner
Filing Date
2023-06-23
Publication Date
2024-12-26

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Abstract

An electron beam application device according to the present invention is characterized by comprising: a photocathode 1 provided with a photoelectric film 10; a cathode heater 2 for heating the photocathode 1; an atomic hydrogen generating means 4 for generating atomic hydrogen by dissociating a hydrogen molecule; control means 7, 8 for controlling the surface cleaning of the surface of the photoelectric film 10; and a measuring means 18 for measuring the probe value of an electron beam probe 27 emitted from the photocathode 1. The present invention is further characterized in that, when the probe value measured by the measuring means 18 is lower than a predetermined value, the control means 7, 8 determine a surface cleaning condition of the photoelectric film 10, control the cathode heater 2 and the atomic hydrogen generating means 4 under the determined surface cleaning condition, and perform the surface cleaning of the surface of the photoelectric film 10.
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Citation Information

Patent Citations

  • Electron microscope

    JP2002313273A

  • Cleaning device for charged particle beam source, and charged particle beam device using same

    JP2007172862A

  • Field-emission electron gun, and control method therefor

    JP2011171088A

  • Handheld material analyser

    US20200088660A1

  • Electron beam application device

    WO2022101957A1

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