Display panel and display apparatus

Abstract

A display panel (51) and a display apparatus. The display panel comprises a display functional layer (30). The display functional layer (30) comprises a barrier wall structure (20), and the barrier wall structure (20) comprises barrier wall layers. The barrier wall structure (20) comprises protruding sub-regions (201) and a recessed sub-region (202) which are interconnected, and the recessed sub-region (202) and the protruding sub-regions (201) each have the barrier wall layers disposed therein. The number of barrier wall layers in the recessed sub-region (202) is greater than or equal to one, and is less than the number of barrier wall layers in the protruding sub-regions (201). The height of the barrier wall structure (20) in the recessed sub-region (202) is less than the height of the barrier wall structure (20) in the protruding sub-regions (201).

Description

Display panel and display device Technical Field

[0001] The present application relates to the field of display technology, and in particular to a display panel and a display device. Background Art

[0002] Organic light-emitting diode (OLED) display technology is a self-luminous display technology that does not require a backlight. It offers advantages such as high brightness, low power consumption, wide viewing angles, and fast response times. It is currently widely used in the mobile phone panel display industry. In addition to the display surface, display panels also contain sensor components such as cameras, which also account for a significant portion of the screen-to-body ratio. How to effectively increase the display surface's screen-to-body ratio and enhance the display panel's aesthetics has become a current design trend.

[0003] Among them, the transmittance is improved by digging holes in the screen body corresponding to the sensor components; however, when the organic layer in the screen body extends to the side of the hole, a water vapor intrusion channel will be formed, causing the water vapor to extend from the hole into the screen body, thereby affecting the performance and stability of the device.

[0004] Currently, multiple retaining walls are often set around the hole to block the extension of the organic layer. However, since the multiple retaining walls need to occupy a larger space, the area corresponding to the sensor component increases, reducing the screen-to-body ratio of the display surface. SUMMARY OF THE INVENTION

[0005] The embodiments of the present application provide a display panel and a display device, which can reduce the width of the retaining wall structure, thereby reducing the width of the transition zone and improving the screen-to-body ratio of the display panel.

[0006] An embodiment of the present application provides a display panel, comprising a display area, a sensor photosensitive area, and a transition area between the display area and the sensor photosensitive area;

[0007] The display panel further includes:

[0008] substrate;

[0009] A display function layer is provided on the substrate, the display function layer includes a display portion provided in the display area and a retaining wall structure provided in the transition area, the retaining wall structure includes a retaining wall layer;

[0010] In which, the retaining wall structure includes a connected raised sub-area and a recessed sub-area, and the retaining wall layer is provided in both the recessed sub-area and the raised sub-area. The number of the retaining wall layers in the recessed sub-area is greater than or equal to 1 and is less than the number of the retaining wall layers in the raised sub-area. The height of the retaining wall structure in the recessed sub-area is less than the height of the retaining wall structure in the raised sub-area.

[0011] According to the above-mentioned object of the present application, an embodiment of the present application further provides a display device, the display device comprising a display panel, the display panel comprising a display area, a sensor photosensitive area, and a transition area located between the display area and the sensor photosensitive area;

[0012] The display panel further includes:

[0013] substrate;

[0014] A display function layer is provided on the substrate, the display function layer includes a display portion provided in the display area and a retaining wall structure provided in the transition area, the retaining wall structure includes a retaining wall layer;

[0015] In which, the retaining wall structure includes a connected raised sub-area and a recessed sub-area, and the retaining wall layer is provided in both the recessed sub-area and the raised sub-area. The number of the retaining wall layers in the recessed sub-area is greater than or equal to 1 and is less than the number of the retaining wall layers in the raised sub-area. The height of the retaining wall structure in the recessed sub-area is less than the height of the retaining wall structure in the raised sub-area. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] FIG1 is a schematic structural diagram of a display panel provided in the related art;

[0017] FIG2 is a schematic structural diagram of a display panel provided in an embodiment of the present application;

[0018] FIG3 is a schematic diagram of a planar distribution of a display panel provided in an embodiment of the present application;

[0019] FIG4 is a schematic structural diagram of a retaining wall structure provided in an embodiment of the present application;

[0020] FIG5 is another structural schematic diagram of a retaining wall structure provided in an embodiment of the present application;

[0021] FIG6 is another structural schematic diagram of a retaining wall structure provided in an embodiment of the present application;

[0022] FIG7 is another structural schematic diagram of a retaining wall structure provided in an embodiment of the present application;

[0023] FIG8 is another structural schematic diagram of a retaining wall structure provided in an embodiment of the present application;

[0024] FIG9 is a schematic diagram of a manufacturing process of a retaining wall structure provided in an embodiment of the present application;

[0025] FIG10 is another structural schematic diagram of a retaining wall structure provided in an embodiment of the present application;

[0026] FIG11 is another structural schematic diagram of a retaining wall structure provided in an embodiment of the present application;

[0027] FIG12 is a schematic structural diagram of a display device provided in an embodiment of the present application. Modes for Carrying Out the Invention

[0028] The following will be combined with the drawings in the embodiments of the present application to clearly and completely describe the technical solutions in the embodiments of the present application. Obviously, the embodiments described are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without making creative efforts are within the scope of protection of this application.

[0029] The disclosure below provides many different embodiments or examples for realizing different structures of the present application. In order to simplify the disclosure of the present application, the components and settings of specific examples are described below. Of course, they are merely examples and are not intended to limit the present application. In addition, the present application may repeat reference numbers and / or reference letters in different examples, and such repetition is for the purpose of simplicity and clarity, and does not itself indicate the relationship between the various embodiments and / or settings discussed. In addition, the present application provides examples of various specific processes and materials, but those of ordinary skill in the art will appreciate the application of other processes and / or the use of other materials.

[0030] Referring to FIG1 , the display panel includes a substrate 1, a display device layer 2 and a driving circuit 3 arranged on the substrate 1, a display area AA, a frame area BA, and a light-transmitting area TA, wherein a camera and other devices are arranged corresponding to the light-transmitting area AA to realize the multifunctionality of the display panel; therefore, an opening is often set in the light-transmitting area TA of the display panel to improve the transmittance. In order to prevent the organic layer in the encapsulation layer from forming a water vapor intrusion channel at the side wall of the opening, a plurality of retaining walls are often set in the frame area BA around the light-transmitting area TA; for example, a first retaining wall 4 and a second retaining wall 5; it should be noted that since the first retaining wall 4 and the second retaining wall 5 are partially connected to the film in the display device layer 2, the first retaining wall 4 and the second retaining wall 5 are partially connected to the film in the display device layer 2. The first retaining wall 4 and the second retaining wall 5 are formed together, that is, the first retaining wall 4 and the second retaining wall 5 are each formed by stacking multiple film layers, and are obtained through the photolithography process of each film layer. However, since the number of film layers in the first retaining wall 4 and the second retaining wall 5 is large, and the problem of precision fluctuation of each film layer needs to be considered in the photolithography process, it is necessary to reserve a certain width between the first retaining wall 4 and the second retaining wall 5 to buffer the impact of the fluctuation of the precision of the photolithography process, and generally the spacing between the first retaining wall 4 and the second retaining wall 5 is between 25 microns and 30 microns; resulting in the need to reserve a wider position in the border area BA to set the retaining wall, thereby increasing the width of the border area BA and reducing the screen-to-body ratio of the display panel.

[0031] 2 and 3 , an embodiment of the present application provides a display panel, which includes a display area 101 , a sensor photosensitive area 102 , and a transition area 103 located between the display area 101 and the sensor photosensitive area 102 .

[0032] Furthermore, the display panel also includes a substrate 10 and a display function layer 30. The display function layer 30 is arranged on the substrate 10 and includes a display portion 31 arranged in the display area 101 and a retaining wall structure 20 arranged in the transition area 103. The retaining wall structure 20 includes a retaining wall layer.

[0033] Among them, the retaining wall structure 20 includes a connected raised sub-area 201 and a recessed sub-area 202, and retaining wall layers are provided in the recessed sub-area 202 and the raised sub-area 201. The number of retaining wall layers in the recessed sub-area 202 is greater than or equal to 1 and is less than the number of retaining wall layers in the raised sub-area 201. The height of the retaining wall structure 20 in the recessed sub-area 202 is less than the height of the retaining wall structure 20 in the raised sub-area 201.

[0034] During the implementation and application process, the embodiment of the present application can selectively remove part of the retaining wall layer in the recessed sub-area 202 by differentially setting the number of retaining wall layers in the retaining wall structure 20 in the raised sub-area 201 and the recessed sub-area 202, so as to form a concave-convex morphology in the retaining wall structure 20, so that the blocking effect of the retaining wall structure 20 on the film material is close to the blocking effect of more than one retaining wall in the related art; at the same time, in the embodiment of the present application, part of the retaining wall layer in the retaining wall structure 20 can be etched to selectively remove part of the retaining wall layer in the recessed sub-area 202. Compared with the related art, it is not necessary to etch all the film layers, which reduces the number of etching times and thereby reduces the impact of fluctuations in the etching process accuracy. It is not necessary to reserve a large space to buffer the impact of fluctuations in the etching process accuracy, and thus the width of the recessed sub-area 202 can be reduced, and the width of the retaining wall structure 20 can be reduced to reduce the width of the transition area 103, thereby improving the screen-to-body ratio of the display panel.

[0035] In one embodiment of the present application, the retaining wall layer includes a first retaining wall layer, a second retaining wall layer, and a third retaining wall layer that are stacked, and the first retaining wall layer is provided with a first opening located in the recessed sub-region.

[0036] In one embodiment of the present application, the first retaining wall layer is located between the substrate and the second retaining wall layer, and the third retaining wall layer is located on a side of the second retaining wall layer away from the first retaining wall layer, wherein the second retaining wall layer and / or the third retaining wall layer covers the first opening.

[0037] In one embodiment of the present application, a second opening is provided in the second retaining wall layer, which is located in the recessed sub-region and communicates with the first opening, and the third retaining wall layer covers the first opening and the second opening;

[0038] Alternatively, the second barrier layer covers the first opening, and the third barrier layer is provided with a third opening located on a side of the second barrier layer away from the substrate and located in the recessed sub-region;

[0039] Alternatively, the second barrier wall layer and the third barrier wall layer cover the first opening.

[0040] In one embodiment of the present application, the first barrier wall layer is located on a side of the second barrier wall layer away from the third barrier wall layer, the third barrier wall layer is located between the substrate and the second barrier wall layer, and at least the third barrier wall layer is spaced between the first opening and the substrate.

[0041] In one embodiment of the present application, a second opening is provided in the second retaining wall layer, which is located in the recessed sub-region and communicates with the first opening.

[0042] In one embodiment of the present application, the first barrier wall layer is disposed between the second barrier wall layer and the third barrier wall layer, and the second barrier wall layer is disposed between the substrate and the first barrier wall layer.

[0043] In one embodiment of the present application, the first retaining wall layer includes a plurality of stacked sub-layers, and the first opening passes through part or all of the plurality of sub-layers.

[0044] In one embodiment of the present application, the display panel is provided with a light-transmitting hole in the sensor photosensitive area, the retaining wall structure includes at least two raised sub-areas, and the recessed sub-area is located between adjacent raised sub-areas, wherein the retaining wall structure is arranged around the light-transmitting hole, and the recessed sub-area is arranged around the light-transmitting hole.

[0045] In one embodiment of the present application, the display panel further includes an encapsulation layer, and the encapsulation layer includes at least two inorganic encapsulation sublayers and an organic encapsulation sublayer sandwiched between two adjacent inorganic encapsulation sublayers, wherein:

[0046] The covering boundary of the organic encapsulation sublayer is located in the concave sub-region, or in the convex sub-region, or on a side of the retaining wall structure away from the light-transmitting hole.

[0047] Specifically, please continue to combine Figures 2 and 3. In the embodiment of the present application, the display panel includes a display area 101, a sensor photosensitive area 102 and a transition area 103; wherein, the display area 101 is the area where the display panel displays the picture, and the sensor photosensitive area 102 is the area of ​​the display panel corresponding to the placement of sensors, such as cameras and other devices, and the transition area 103 is located between the display area 101 and the sensor photosensitive area 102.

[0048] It should be noted that the display panel includes a light-transmitting hole arranged between the sensor photosensitive areas 102. The light-transmitting hole can effectively improve the transmittance of the display panel in the sensor photosensitive area 102 to improve the sensing effect of the sensor, and the transition area 103 is arranged around the light-transmitting hole and can be regarded as the frame area of ​​the light-transmitting hole.

[0049] Furthermore, the display panel further includes a substrate 10 and a display function layer 30 disposed on the substrate 10 . The display function layer 30 includes a display portion 31 located in the display area 101 , a driving circuit unit 32 located in the transition area 103 , and a retaining wall structure 20 .

[0050] In one embodiment, the light-transmitting hole may pass through at least a portion of the substrate 10 and at least a portion of the display function layer 30 . The specific selection may be based on actual light transmittance requirements and is not limited herein.

[0051] Among them, the display part 31 includes a thin film transistor array layer, a planar layer, a pixel definition layer, a spacer layer (PhotoSpacer, PS), an anode layer, an organic light-emitting layer and a cathode layer, etc. arranged in the display area 101; the driving circuit unit 32 may include a circuit structure composed of thin film transistor devices, signal lines and capacitors and other devices arranged in the transition area 103, and can be connected to the display part 31.

[0052] The retaining wall structure 20 is arranged on the side of the driving circuit unit 32 away from the display part 31; it should be noted that the display panel also includes an encapsulation layer (not shown in the figure) arranged on the side of the display function layer 30 away from the substrate 10, and the encapsulation layer includes at least two inorganic encapsulation sublayers and an organic encapsulation sublayer sandwiched between two adjacent inorganic encapsulation sublayers, wherein the organic encapsulation sublayer can be made of organic material, which can improve the flatness of the film layer of the display panel and at the same time, can play a role in buffering stress; however, since the organic encapsulation sublayer does not have a water-blocking effect, a water vapor intrusion channel can be formed therein. In order to avoid the phenomenon that the organic encapsulation sublayer extends to the light-transmitting hole of the sensor photosensitive area 102, and water vapor invades the interior of the display panel from the organic encapsulation sublayer at the light-transmitting hole, causing the display panel to fail, the embodiment of the present application sets the retaining wall structure 20 between the light-transmitting hole and the display part 31 and the driving circuit unit 32 to play the role of blocking the organic encapsulation sublayer.

[0053] In an embodiment of the present application, the retaining wall structure 20 includes a connected raised sub-area 201 and a recessed sub-area 202, and the height of the retaining wall structure 20 in the recessed sub-area 202 is less than the height of the retaining wall structure 20 in the raised sub-area 201, so as to form a concave and convex morphology in the retaining wall structure 20, so that the blocking effect of the retaining wall structure 20 on the film material is close to the blocking effect of more than one retaining wall in the related art; at the same time, in an embodiment of the present application, the retaining wall layer in the retaining wall structure 20 can be etched to selectively remove part of the retaining wall layer in the recessed sub-area 202. Compared with the related art, it is not necessary to etch all the film layers, which reduces the number of etching times and thereby reduces the impact of fluctuations in the etching process accuracy. It is not necessary to reserve a large space to buffer the impact of fluctuations in the etching process accuracy, and thereby the width of the recessed sub-area 202 can be reduced, and the width of the retaining wall structure 20 is reduced to reduce the width of the transition zone 103, thereby improving the screen-to-body ratio of the display panel.

[0054] In one embodiment, the covering boundary of the organic encapsulation sub-layer is located in the recessed sub-region 202 , or in the raised sub-region 201 , or on a side of the retaining wall structure 20 away from the light-transmitting hole.

[0055] In one embodiment, the retaining wall structure 20 may include a plurality of raised sub-regions 201 and recessed sub-regions 202 located between adjacent raised sub-regions 201, and grooves may be formed in adjacent retaining wall structures 20 at positions located in the recessed sub-regions 202 to increase the blocking effect of the retaining wall structure 20 on the organic encapsulation sub-layer.

[0056] It is understandable that the transition region 103 and the retaining wall structure 20 are both disposed around the light-transmitting hole, and the groove formed in the recessed sub-region 202 is also disposed around the light-transmitting hole.

[0057] Furthermore, the retaining wall structure 20 includes at least two retaining wall layers, i.e., the retaining wall structure 20 is formed by stacking at least two retaining wall layers. Specifically, each retaining wall layer can be selected to be the same film layer as part of the film layer in the display portion 31 and can be formed in the same photomask. For example, the retaining wall layer can be the same film layer as the planarization layer, pixel definition layer, and spacer layer in the display portion 31 and can be formed in the same photomask.

[0058] It is understandable that the number of the retaining wall layers in the recessed sub-region 202 is greater than 1 and less than the number of the retaining wall layers in the raised sub-region 201 , thereby reducing the number of etching times during the formation of the retaining wall structure 20 .

[0059] In one embodiment, the number of the barrier layers may be greater than or equal to 3, so that the groove formed by the barrier structure 20 in the recessed sub-region 202 has a certain depth, which can effectively block the organic encapsulation sub-layer.

[0060] In one embodiment, the number of the retaining wall structure 20 can be one, that is, the embodiment of the present application sets up a retaining wall structure 20 and forms a concave and convex morphology in the retaining wall structure 20, so that its effect on the organic encapsulation sublayer can be close to that of two retaining walls in the related art, thereby further reducing the width of the transition zone 103.

[0061] In one embodiment of the present application, please refer to Figures 2 and 4, the retaining wall layer includes a first retaining wall layer 21, a second retaining wall layer 22 and a third retaining wall layer 23 that are stacked, wherein the first retaining wall layer 21 is located between the substrate 10 and the second retaining wall layer 22, and the third retaining wall layer 23 is located on the side of the second retaining wall layer 22 away from the first retaining wall layer 21; the first retaining wall layer 21, the second retaining wall layer 22 and the third retaining wall layer 23 are arranged in the raised sub-area 201, and the second retaining wall layer 22 and the third retaining wall layer 23 are arranged in the recessed sub-area 202.

[0062] Specifically, the retaining wall structure 20 includes two raised sub-regions 201 and a recessed sub-region 202 located between the two raised sub-regions 201 .

[0063] A first opening 210 located in the recessed sub-region 202 is provided in the first retaining wall layer 21, that is, the first retaining wall layer 21 is separated in the recessed sub-region 202 to form the first opening 210 arranged around the light-transmitting hole, and the second retaining wall layer 22 and the third retaining wall layer 23 cover the first retaining wall layer 21 and the first opening 210.

[0064] It should be noted that the first retaining wall layer 21 is located at the bottom layer of the retaining wall structure 20, and the second retaining wall layer 22 and the third retaining wall layer 23 will form a groove after covering the first opening 210. Since each retaining wall layer has a certain thickness, the size of the groove will be smaller than the size of the first opening 210. The division range of the recessed sub-area 202 in the accompanying drawings of the embodiment of the present application is divided according to the groove. Therefore, the size of the first opening 210 shown in the figure is slightly larger than the size of the recessed sub-area 202; similarly, in subsequent embodiments, after covering the opening formed in the retaining wall layer, if other retaining wall layers cover the opening, it will cause the size of the groove formed in the retaining wall structure 20 to be smaller than the size of the opening.

[0065] In this embodiment, since a groove is formed in the retaining wall structure 20, and the groove is formed by removing the first retaining wall layer 21 located in the recessed sub-area 202, only one photolithography process is required when forming the retaining wall structure 20 in this embodiment. Compared with the related technology shown in Figure 1, the number of photolithography processes is reduced, and the influence of fluctuations in the accuracy of the photolithography process is reduced. There is no need to reserve a large width for forming the groove, which reduces the width of the groove, reduces the width of the transition zone 103, and improves the screen-to-body ratio of the display panel.

[0066] Optionally, the length of the first opening 210 in a direction parallel to the substrate 10 can be greater than or equal to 10 microns and less than or equal to 15 microns. Compared with the spacing between the first retaining wall 4 and the second retaining wall 5 shown in Figure 1, the length of the first opening 210 in the embodiment of the present application is effectively reduced, which can effectively reduce the width of the transition zone 103.

[0067] Furthermore, in the related technology shown in Figure 1, since the space on both sides of the first retaining wall 4 or the second retaining wall 5 is large, when forming the stacked film layer of the retaining wall, the film layer material is easy to flow to the positions on both sides of the retaining wall, making the first retaining wall 4 and the second retaining wall 5 not easy to form. In order to improve its forming stability, the related technology needs to increase the width of the first retaining wall 4 and the second retaining wall 5 respectively, so that even if the film layer material flows, the convex structure of the retaining wall can be formed. For example, the width of the first retaining wall 4 and the second retaining wall 5 in the related technology generally needs to be set to between 30 microns and 40 microns.

[0068] However, in the embodiment of the present application, since the middle of the retaining wall structure 20 is a groove with a smaller space, when the second retaining wall layer 22 and the third retaining wall layer 23 are formed on the first retaining wall layer 21, there is less space for the film material to flow toward the groove side, so that the flow range of the film material is reduced, and the second retaining wall layer 22 and the third retaining wall layer 23 in the retaining wall structure 20 are easier to form, and the length of the retaining wall structure 20 in the direction parallel to the substrate 10 can be made smaller and less than 30 microns, further reducing the width of the transition zone 103 and improving the screen-to-body ratio.

[0069] Optionally, in order to ensure the blocking effect of the retaining wall structure 20 on the material of the organic encapsulation sub-layer, the length of the retaining wall structure 20 in a direction parallel to the substrate 10 needs to be greater than or equal to 20 micrometers.

[0070] In one embodiment, the first barrier layer 21 can have the same film layer structure as the flat layer in the display portion 31 and be formed in the same photomask as the flat layer. The second barrier layer 22 can have the same film layer structure as the pixel definition layer in the display portion 31 and be formed in the same photomask as the pixel definition layer. The third barrier layer 23 can have the same film layer structure as the spacer layer in the display portion 31 and be formed in the same photomask as the spacer layer.

[0071] In another embodiment of the present application, please refer to Figures 2 and 5. The difference between this embodiment and the embodiment shown in Figure 4 is that: a second opening 220 located in the recessed sub-area 202 is provided in the second retaining wall layer 22, and the second opening 220 is connected to the first opening 210, and the third retaining wall layer 23 covers the first opening 210 and the second opening 220.

[0072] Compared with the embodiment shown in FIG. 4 , the depth of the groove in the retaining wall structure 20 is increased in this embodiment, thereby improving the blocking effect of the retaining wall structure 20 on the film material of the organic encapsulation sub-layer.

[0073] In another embodiment of the present application, please refer to Figures 2 and 6. The difference between this embodiment and the embodiment shown in Figure 4 is that a third opening 230 located in the recessed sub-area 202 is provided in the third retaining wall layer 23, and a second retaining wall layer 22 is separated between the third opening 230 and the substrate 10.

[0074] Specifically, the second barrier layer 22 covers the sidewalls of the first barrier layer 21 and the first opening 210 , the third barrier layer 23 covers the sidewalls of the second barrier layer 22 , and the bottom of the third opening 230 exposes a portion of the upper surface of the second barrier layer 22 .

[0075] In another embodiment of the present application, please refer to Figures 2 and 7. The difference between this embodiment and the embodiment shown in Figure 4 is that the first retaining wall layer 21 includes multiple sub-layers, and the first opening 210 in the first retaining wall layer 21 passes through part or all of the multiple sub-layers.

[0076] Specifically, the first barrier layer 21 includes a first sublayer 211 and a second sublayer 212 stacked together, and the first sublayer 211 is located between the second sublayer 212 and the substrate 10 , while the first opening 210 passes through the first sublayer 211 and the second sublayer 212 .

[0077] It can be understood that, correspondingly, the flat layer in the display portion 31 is also a stacked structure of multiple flat sub-layers, and the number of the multiple flat sub-layers can be the same as the number of the multiple sub-layers in the first barrier layer 21 .

[0078] In other embodiments, the first opening 210 may also pass through any one of the first sub-layer 211 and the second sub-layer 212 , and the first retaining wall layer 21 may also include a greater number of sub-layers, which is not limited herein.

[0079] In another embodiment of the present application, please refer to Figures 2, 8 and 9. The difference between this embodiment and the embodiment shown in Figure 4 is that: the first retaining wall layer 21 is located on the side of the second retaining wall layer 22 away from the third retaining wall layer 23, and the third retaining wall layer 23 is located between the substrate 10 and the second retaining wall layer 22, and a first opening 210 located in the recessed sub-area 202 is provided in the first retaining wall layer 21, and the second retaining wall layer 22 and the third retaining wall layer 23 are separated between the first opening 210 and the substrate 10.

[0080] Among them, the third barrier layer 23 can be the same film layer structure as the flat layer in the display part 31, and can be formed in the same photomask as the flat layer. The second barrier layer 22 can be the same film layer structure as the pixel definition layer in the display part 31, and can be formed in the same photomask as the pixel definition layer. The first barrier layer 21 can be the same film layer structure as the spacer layer in the display part 31, and can be formed in the same photomask as the spacer layer.

[0081] In this embodiment, the first opening 210 is the groove in the retaining wall structure 20. Then, in the process, after the stacked first retaining wall layer 21, the second retaining wall layer 22 and the third retaining wall layer 23 are formed in sequence on the substrate 10, a mask 40 can be formed on the side of the third retaining wall layer 23 away from the second retaining wall layer 22, and the mask 40 can include a first area 41 and a second area 42. According to the difference in transmittance between the first area 41 and the second area 42, the patterning process of the photolithography process is realized to remove the first retaining wall layer 21 outside the raised sub-area 201, and then form the first opening 210 in the recessed sub-area 202, that is, to form a groove.

[0082] In another embodiment of the present application, please refer to Figures 2 and 10. The difference between this embodiment and the embodiment shown in Figure 8 is that: a second opening 220 located in the recessed sub-area 202 is provided in the second retaining wall layer 22, and the second opening 220 is connected to the first opening 210, wherein a third retaining wall layer 23 is separated from the first opening 210 (second opening 220) and the substrate 10.

[0083] Specifically, the first barrier layer 21 covers the sidewalls of the second barrier layer 22 and the sidewalls of the second opening 220 , and the length of the first opening 210 parallel to the substrate 10 is shorter than the length of the second opening 220 parallel to the substrate 10 .

[0084] In another embodiment of the present application, please refer to Figures 2 and 11. The difference between this embodiment and the embodiment shown in Figure 4 is that the first retaining wall layer 21 is located between the second retaining wall layer 22 and the third retaining wall layer 23, and the second retaining wall layer 22 is located between the substrate 10 and the first retaining wall layer 21.

[0085] Among them, the second barrier layer 22 can have the same film layer structure as the flat layer in the display part 31, and be formed in the same photomask as the flat layer. The first barrier layer 21 can have the same film layer structure as the pixel definition layer in the display part 31, and be formed in the same photomask as the pixel definition layer. The third barrier layer 23 can have the same film layer structure as the spacer layer in the display part 31, and be formed in the same photomask as the spacer layer.

[0086] Furthermore, a second barrier layer 22 is spaced between the first opening 210 and the substrate 10 , and a third barrier layer 23 covers the first barrier layer 21 and the first opening 210 .

[0087] In other embodiments of the present application, the display panel also includes a border area (not shown in the figure) adjacent to the surrounding display area 101, and the retaining wall structure 20 can also be arranged in the border area and arranged around the display area 101, which can also block the organic encapsulation sublayer, so that the organic encapsulation sublayer is restricted to the side of the retaining wall structure 20 close to the display area 101.

[0088] It should be noted that, in the embodiment of the present application, the retaining wall structure 20 may also include a plurality of raised sub-areas 201 and a plurality of recessed sub-areas 202, and the plurality of raised sub-areas 201 and the plurality of recessed sub-areas 202 are alternately arranged, that is, the raised sub-areas 201 are adjacent to the recessed sub-areas 202, and a recessed sub-area 202 may be spaced between the raised sub-areas 201 and the raised sub-areas 201, and a raised sub-area 201 may be spaced between the recessed sub-areas 202 and the recessed sub-areas 202; wherein, the height of the retaining wall structure 20 in different raised sub-areas 201 may be the same or different, and similarly, the height of the retaining wall structure 20 in different recessed sub-areas 202 may be the same or different, but the height of the retaining wall structure 20 in any raised sub-area 201 is greater than the height of the retaining wall structure 20 in any recessed sub-area 202.

[0089] Continuing from the above, the embodiment of the present application can selectively remove part of the retaining wall layer in the recessed sub-area 202 by differentially setting the number of retaining wall layers in the retaining wall structure 20 in the raised sub-area 201 and the recessed sub-area 202, so as to form a concave-convex morphology in the retaining wall structure 20, so that the blocking effect of the retaining wall structure 20 on the film material is close to the blocking effect of more than one retaining wall in the related art; at the same time, in the embodiment of the present application, part of the retaining wall layer in the retaining wall structure 20 can be etched to selectively remove part of the retaining wall layer in the recessed sub-area 202. Compared with the related art, it is not necessary to etch all the film layers, which reduces the number of etching times and thereby reduces the impact of fluctuations in the etching process accuracy. It is not necessary to reserve a large space to buffer the impact of fluctuations in the etching process accuracy, and thus the width of the recessed sub-area 202 can be reduced, and the width of the retaining wall structure 20 can be reduced to reduce the width of the transition area 103, thereby improving the screen-to-body ratio of the display panel.

[0090] In addition, an embodiment of the present application further provides a display device, which includes the display panel described in the above embodiment.

[0091] In one embodiment, referring to FIG. 12 , the display device includes a display panel 51 and a sensor 52 disposed on one side of the display panel 51 , and the sensor 52 is disposed corresponding to the sensor photosensitive area 102 of the display panel 51 .

[0092] The display device can be a display device such as a mobile phone, a television, a computer, a tablet, or a watch.

[0093] In the above embodiments, the description of each embodiment has its own focus. For parts that are not described in detail in a certain embodiment, reference can be made to the relevant descriptions of other embodiments.

[0094] The above is a detailed introduction to a display panel and a display device provided in the embodiments of the present application. Specific examples are used herein to illustrate the principles and implementation methods of the present application. The description of the above embodiments is only used to help understand the technical solutions and core ideas of the present application. Ordinary technicians in this field should understand that they can still modify the technical solutions recorded in the aforementioned embodiments, or make equivalent replacements for some of the technical features therein. These modifications or replacements do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present application.

Claims

1. A display panel, comprising a display area, a sensor photosensitive area, and a transition area between the display area and the sensor photosensitive area; The display panel further includes: substrate; A display function layer is disposed on the substrate, the display function layer comprises a display portion disposed in the display area and a retaining wall structure disposed in the transition area, the retaining wall structure comprises a retaining wall layer; Wherein, the retaining wall structure includes a connected raised sub-area and a recessed sub-area, the retaining wall layer is arranged in both the recessed sub-area and the raised sub-area, the number of the retaining wall layers in the recessed sub-area is greater than or equal to 1 and is less than the number of the retaining wall layers in the raised sub-area, and the height of the retaining wall structure in the recessed sub-area is less than the height of the retaining wall structure in the raised sub-area.

2. The display panel according to claim 1, wherein: The retaining wall layer comprises a first retaining wall layer, a second retaining wall layer and a third retaining wall layer which are stacked, and the first retaining wall layer is provided with a first opening located in the recessed sub-region.

3. The display panel according to claim 2, wherein: The first barrier layer is located between the substrate and the second barrier layer, and the third barrier layer is located on a side of the second barrier layer away from the first barrier layer, wherein the second barrier layer and / or the third barrier layer covers the first opening.

4. The display panel according to claim 3, wherein: The second retaining wall layer is provided with a second opening located in the recessed sub-area and connected to the first opening, and the third retaining wall layer covers the first opening and the second opening; Alternatively, the second barrier layer covers the first opening, and the third barrier layer is provided with a third opening located at a side of the second barrier layer away from the substrate and located in the recessed sub-region; Alternatively, the second barrier layer and the third barrier layer cover the first opening.

5. The display panel according to claim 2, wherein: The first barrier layer is located on a side of the second barrier layer away from the third barrier layer, the third barrier layer is located between the substrate and the second barrier layer, and at least the third barrier layer is spaced between the first opening and the substrate.

6. The display panel according to claim 5, wherein: The second barrier layer is provided with a second opening located in the recessed sub-region and connected with the first opening.

7. The display panel according to claim 2, wherein: The first barrier layer is disposed between the second barrier layer and the third barrier layer, and the second barrier layer is disposed between the substrate and the first barrier layer.

8. The display panel according to claim 2, wherein: The first barrier layer includes a plurality of stacked sub-layers, and the first opening passes through a portion or all of the plurality of sub-layers.

9. The display panel according to claim 1, wherein: The display panel is provided with a light-transmitting hole in the sensor photosensitive area, the retaining wall structure includes at least two raised sub-areas, and the recessed sub-area is located between adjacent raised sub-areas, wherein the retaining wall structure is arranged around the light-transmitting hole, and the recessed sub-area is arranged around the light-transmitting hole.

10. The display panel according to claim 9, wherein: The display panel further includes an encapsulation layer, and the encapsulation layer includes at least two inorganic encapsulation sublayers and an organic encapsulation sublayer sandwiched between two adjacent inorganic encapsulation sublayers, wherein: The covering boundary of the organic encapsulation sublayer is located in the recessed sub-region, or in the raised sub-region, or on a side of the retaining wall structure away from the light-transmitting hole.

11. A display device, comprising a display panel, wherein the display panel comprises a display area, a sensor photosensitive area, and a transition area between the display area and the sensor photosensitive area; The display panel further includes: substrate; A display function layer is disposed on the substrate, the display function layer comprises a display portion disposed in the display area and a retaining wall structure disposed in the transition area, the retaining wall structure comprises a retaining wall layer; Wherein, the retaining wall structure includes a connected raised sub-area and a recessed sub-area, the retaining wall layer is arranged in both the recessed sub-area and the raised sub-area, the number of the retaining wall layers in the recessed sub-area is greater than or equal to 1 and is less than the number of the retaining wall layers in the raised sub-area, and the height of the retaining wall structure in the recessed sub-area is less than the height of the retaining wall structure in the raised sub-area.

12. The display device according to claim 11, wherein: The retaining wall layer comprises a first retaining wall layer, a second retaining wall layer and a third retaining wall layer which are stacked, and the first retaining wall layer is provided with a first opening located in the recessed sub-region.

13. The display device according to claim 12, wherein: The first barrier layer is located between the substrate and the second barrier layer, and the third barrier layer is located on a side of the second barrier layer away from the first barrier layer, wherein the second barrier layer and / or the third barrier layer covers the first opening.

14. The display device according to claim 13, wherein: The second retaining wall layer is provided with a second opening located in the recessed sub-area and connected to the first opening, and the third retaining wall layer covers the first opening and the second opening; Alternatively, the second barrier layer covers the first opening, and the third barrier layer is provided with a third opening located at a side of the second barrier layer away from the substrate and located in the recessed sub-region; Alternatively, the second barrier layer and the third barrier layer cover the first opening.

15. The display device according to claim 12, wherein: The first barrier layer is located on a side of the second barrier layer away from the third barrier layer, the third barrier layer is located between the substrate and the second barrier layer, and at least the third barrier layer is spaced between the first opening and the substrate.

16. The display device according to claim 15, wherein: The second barrier layer is provided with a second opening located in the recessed sub-region and connected with the first opening.

17. The display device according to claim 12, wherein: The first barrier layer is disposed between the second barrier layer and the third barrier layer, and the second barrier layer is disposed between the substrate and the first barrier layer.

18. The display device according to claim 12, wherein: The first barrier layer includes a plurality of stacked sub-layers, and the first opening passes through a portion or all of the plurality of sub-layers.

19. The display device according to claim 11, wherein: The display panel is provided with a light-transmitting hole in the sensor photosensitive area, the retaining wall structure includes at least two raised sub-areas, and the recessed sub-area is located between adjacent raised sub-areas, wherein the retaining wall structure is arranged around the light-transmitting hole, and the recessed sub-area is arranged around the light-transmitting hole.

20. The display device according to claim 19, wherein: The display panel further includes an encapsulation layer, and the encapsulation layer includes at least two inorganic encapsulation sublayers and an organic encapsulation sublayer sandwiched between two adjacent inorganic encapsulation sublayers, wherein: The covering boundary of the organic encapsulation sublayer is located in the recessed sub-region, or in the raised sub-region, or on a side of the retaining wall structure away from the light-transmitting hole.

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